JPH0955369A - Vacuum treatment apparatus and detection method for mixing of air into vacuum treatment apparatus - Google Patents
Vacuum treatment apparatus and detection method for mixing of air into vacuum treatment apparatusInfo
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- JPH0955369A JPH0955369A JP20889995A JP20889995A JPH0955369A JP H0955369 A JPH0955369 A JP H0955369A JP 20889995 A JP20889995 A JP 20889995A JP 20889995 A JP20889995 A JP 20889995A JP H0955369 A JPH0955369 A JP H0955369A
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- Japan
- Prior art keywords
- gas
- shutoff valve
- automatic shutoff
- vacuum processing
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Drying Of Semiconductors (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は半導体装置の製造工
程に用いられるドライエッチング装置等の真空処理装置
及び真空処理装置への大気混入の検知方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum processing apparatus such as a dry etching apparatus used in a manufacturing process of a semiconductor device, and a method for detecting atmospheric contamination in the vacuum processing apparatus.
【０００２】[0002]
【従来の技術】従来の真空処理装置は、図５に示すよう
に、真空処理を行う真空処理室６と、例えば危険ガスが
貯蔵されているガスシリンダ９と、このガスシリンダ９
に順次接続された一次側ガス配管１５Ａと、ガス質量流
量制御器１６と二次側ガス配管１３Ａと、ガスシリンダ
収納容器８とガス配管収納容器１４と、これらの収納容
器に接続されたガス漏洩検知器１１と、この検知器１１
と連動する自動遮断弁１２とから主に構成されている。
このような真空処理装置は、例えば特開昭６１−１８９
６４１号公報に記載されている。2. Description of the Related Art A conventional vacuum processing apparatus, as shown in FIG. 5, includes a vacuum processing chamber 6 for performing vacuum processing, a gas cylinder 9 in which, for example, a dangerous gas is stored, and this gas cylinder 9
Primary gas pipe 15A, gas mass flow controller 16, secondary gas pipe 13A, gas cylinder storage container 8, gas pipe storage container 14, and gas leaks connected to these storage containers. Detector 11 and this detector 11
It is mainly composed of an automatic shutoff valve 12 which is interlocked with.
Such a vacuum processing apparatus is disclosed, for example, in Japanese Patent Laid-Open No. 61-189.
No. 641 publication.
【０００３】次に、この真空処理装置をドライエッチン
グ装置とした場合についてその動作を説明する。ガスシ
リンダ９から供給されるガスは、一次側ガス配管１５Ａ
を通り、ガス質量流量制御器１６によりガス流量を一定
に制御されて二次側ガス配管１３Ａを通り真空処理室６
に導入され、所要の処理圧力に保たれながら高周波電力
により励起されてプラズマ化し、被処理物のエッチング
を行う、ガスシリンダ９はガスシリンダ収納容器８に又
一次側ガス配管１５Ａはガス配管収納容器１４にそれぞ
れ収納され、ガス漏洩検知器１１によりガスシリンダ収
納容器８及びガス配管収納容器１４内で発生するガス漏
洩の有無をモニタする。ガス漏洩検知器１１がガス漏洩
を検知したとき、ガス漏洩警報信号を発して自動遮断弁
１２を閉じガスシリンダ９からの危険ガスの供給を停止
することにより、ガスシリンダ収納容器８及び、ガス配
管収納容器１４からのガス漏洩を抑え人体への危険性を
回避する。Next, the operation of the vacuum processing apparatus when it is a dry etching apparatus will be described. The gas supplied from the gas cylinder 9 is the primary gas pipe 15A.
Through the secondary gas pipe 13A, the gas flow rate is controlled to be constant by the gas mass flow controller 16, and the vacuum processing chamber 6
The gas cylinder 9 is introduced into the gas cylinder storage container 8 and the primary side gas pipe 15A is connected to the gas pipe storage container. The gas leak detector 11 monitors the presence or absence of gas leakage occurring in the gas cylinder storage container 8 and the gas pipe storage container 14. When the gas leak detector 11 detects a gas leak, a gas leak warning signal is issued, the automatic shutoff valve 12 is closed, and the supply of the dangerous gas from the gas cylinder 9 is stopped, whereby the gas cylinder storage container 8 and the gas pipe are connected. The gas leakage from the storage container 14 is suppressed and the danger to the human body is avoided.
【０００４】[0004]
【発明が解決しようとする課題】この従来の真空処理装
置では、ガス漏洩検知器を用いてガスシリンダ収納容器
及びガス配管収納容器からのガス漏洩のみを検知してい
るために、大気圧よりも低圧になっているガス質量流量
制御器の二次側ガス配管への大気成分の混入については
検知できない。その結果、所定のガス種及びガス流量が
得られず処理不良を生じさせ半導体装置の歩留りを低下
させるという問題があった。In this conventional vacuum processing apparatus, a gas leak detector is used to detect only gas leaks from the gas cylinder storage container and the gas pipe storage container. It is not possible to detect the inclusion of atmospheric components in the secondary gas pipe of the gas mass flow controller, which has a low pressure. As a result, there is a problem that a predetermined gas type and a gas flow rate cannot be obtained, a processing defect is caused, and the yield of the semiconductor device is reduced.
【０００５】本発明の目的は、ガス配管で生じる大気混
入を検知し、被処理物の処理不良を防止できる真空処理
装置及び真空処理装置への大気混入の検知方法を提供す
ることにある。It is an object of the present invention to provide a vacuum processing apparatus which can detect atmospheric contamination that occurs in a gas pipe and prevent processing defects of an object to be processed, and a method of detecting atmospheric contamination of the vacuum processing apparatus.
【０００６】[0006]
【課題を解決するための手段】第１の発明の真空処理装
置は、ガスシリンダに順次接続された一次側自動遮断弁
と質量流量制御器と二次側自動遮断弁とからなる複数組
のガスラインと、前記ガスラインの各前記二次側自動遮
断弁に一端が接続され他端が一系統にまとめられたガス
配管と、このガス配管に接続された最終自動遮断弁と、
この最終自動遮断弁に接続された質量流量計と、この質
量流量計に接続された真空処理室と、前記質量流量計に
接続され複数組の前記ガスラインを流れる処理ガスの総
設定流量の値を記憶しこの設定値と前記質量流量計の測
定値とを比較し測定値が設定値より大きい場合は警報を
発生すると共に前記一次側自動遮断弁と前記二次側自動
遮断弁を閉る為の信号を送出する検知制御手段とを含む
ことを特徴とするものであり、又この検知制御手段は、
一次側自動遮断弁又は二次側自動遮断弁又は最終自動遮
断弁を閉じて、真空処理室を真空引きした時に、質量流
量計に設定値以上のガスが流れた場合警報を発生する機
能を合せ持つものである。A vacuum processing apparatus according to a first aspect of the present invention comprises a plurality of sets of gas including a primary-side automatic shutoff valve, a mass flow controller, and a secondary-side automatic shutoff valve that are sequentially connected to a gas cylinder. A line, a gas pipe in which one end is connected to each of the secondary side automatic shutoff valves of the gas line and the other end is integrated into one system, and a final automatic shutoff valve connected to the gas pipe,
A mass flowmeter connected to the final automatic shutoff valve, a vacuum processing chamber connected to the mass flowmeter, and a value of the total set flow rate of the processing gas flowing through the plurality of gas lines connected to the mass flowmeter. In order to close the primary side automatic shutoff valve and the secondary side automatic shutoff valve, an alarm is generated if the set value is compared with the measured value of the mass flowmeter and the measured value is larger than the set value. And a detection control means for transmitting a signal of
When the primary automatic shutoff valve, the secondary automatic shutoff valve, or the final automatic shutoff valve is closed and the vacuum processing chamber is evacuated, a function to generate an alarm when the gas flow exceeds the set value in the mass flowmeter is added. To have.
【０００７】第２の発明の真空処理装置への大気混入の
検査方法は、第１の発明の真空処理装置を用い、各ライ
ンの自動遮断弁の少くとも１つを閉めて真空処理室を真
空引きし、この時質量流量計に流れるガス量を所定値と
比較し、多い場合は警報を発生させるものである。A second aspect of the present invention is directed to a method for inspecting the vacuum processing apparatus for air contamination, wherein the vacuum processing apparatus of the first aspect is used, and at least one of the automatic shutoff valves in each line is closed to evacuate the vacuum processing chamber. At this time, the amount of gas flowing through the mass flow meter is compared with a predetermined value, and if the amount is large, an alarm is generated.
【０００８】[0008]
【発明の実施の形態】次に本発明について図面を参照し
て説明する。図１は本発明の第１の実施の形態を説明す
る為の真空処理装置の構成図である。DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings. FIG. 1 is a block diagram of a vacuum processing apparatus for explaining a first embodiment of the present invention.
【０００９】図１において真空処理装置は、一次側ガス
配管１５によりガスシリンダ９に順次接続された一次側
自動遮断弁１と質量流量制御器２と二次側自動遮断弁３
からなる複数組のガスライン（ガス−１〜ガス−Ｎ）
と、この各ガスラインの二次側自動遮断弁３に一端が接
続され他端が一系統にまとめられた二次側ガス配管１３
と、この二次側ガス配管１３に順次接続された最終自動
遮断弁４と質量流量計５と真空処理室６と、この質量流
量計５に接続され複数組のガスラインを流れる処理ガス
の総設定流量の値を記憶しこの設定値と質量流量計の測
定値とを比較し測定値が設定値より大きい場合はブザー
や表示等で警報を発生すると共に、一次側遮断弁１と質
量流量制御器２と二次側自動遮断弁３を閉じる為の信号
を送出する検知制御部７とから主に構成されている。こ
の検知制御部はメモリー、比較回路、ＣＰＵ等から構成
されており、一次側自動遮断弁１又は二次側自動遮断弁
３又は最終自動遮断弁４を閉じて真空処理室６を真空引
きした時に、質量流量計５に設定値以上のガスが流れた
場合警報を発生する機能をも合せ持っている。尚、図１
において８はガスシリンダ収納容器，１０は減圧弁，１
１はガス漏洩検知器，１２は自動遮断弁である。In FIG. 1, the vacuum processing apparatus includes a primary side automatic shutoff valve 1, a mass flow controller 2 and a secondary side automatic shutoff valve 3 which are sequentially connected to a gas cylinder 9 by a primary side gas pipe 15.
Multiple gas lines consisting of (gas-1 to gas-N)
And a secondary side gas pipe 13 in which one end is connected to the secondary side automatic shutoff valve 3 of each gas line and the other end is integrated into one system.
And a final automatic shutoff valve 4, a mass flow meter 5, a vacuum processing chamber 6 that are sequentially connected to the secondary gas pipe 13, and a total of processing gas that is connected to the mass flow meter 5 and flows through a plurality of gas lines. Stores the set flow rate value, compares this set value with the measured value of the mass flow meter, and when the measured value is larger than the set value, an alarm is generated with a buzzer or display, and the primary shutoff valve 1 and mass flow rate control It is mainly composed of a container 2 and a detection control section 7 which sends a signal for closing the secondary side automatic shutoff valve 3. This detection control unit is composed of a memory, a comparison circuit, a CPU, etc., and when the primary side automatic shutoff valve 1, the secondary side automatic shutoff valve 3 or the final automatic shutoff valve 4 is closed and the vacuum processing chamber 6 is evacuated. The mass flow meter 5 also has a function of issuing an alarm when a gas having a value higher than a set value flows. FIG.
8 is a gas cylinder storage container, 10 is a pressure reducing valve, 1
Reference numeral 1 is a gas leak detector, and 12 is an automatic shutoff valve.
【００１０】次にこのように構成された真空処理装置の
動作について説明する。図２は本発明の第２の実施の形
態の大気混入の検知方法を説明する為の動作フローチャ
ートである。以下図１と併用して説明する。Next, the operation of the vacuum processing apparatus thus constructed will be described. FIG. 2 is an operation flowchart for explaining the method for detecting the atmospheric mixture according to the second embodiment of the present invention. A description will be given below in combination with FIG.
【００１１】まず図２のステップ１（Ｓ−１と記す、続
くステップも同様にＳ−（ｎ）と記す）において、全ラ
インに流すガスのＮ2 流量換算係数ＣＦ，設定流量Ｑ
set 及び許容誤差ｄを検知制御部７に入力する。そして
ガスシリンダ９より減圧弁１０により減圧されたガスを
各ラインに供給する。次にＳ−２において、各ラインの
一時側自動遮断弁（Ｖ1st ）１を開き、ガス毎に校正さ
れた質量流量制御器２で設定流量Ｑset に制御させ、二
次側自動遮断弁（Ｖ2nd ）３を開き、更に最終自動遮断
弁（ＶF ）４を開くことにより、ガスはＮ2 ガスにて校
正された質量流量計５へ導入される。次にＳ−３におい
て、このとき質量流量計５での観測値ＱTが検知制御部
７に送られる。検知制御部７は、全ガスをＮ2 流量換算
した総和に対して許容誤差ｄ以下か否かの判断を行い、
許容誤差ｄ以下の場合には真空処理室６においてＳ−４
のプラズマ処理を行い、例えばＡｌ膜のドライエッチン
グを行う。また許容誤差ｄを超える場合には、検知制御
部７はＳ−６において「異常流量検出」すなわち大気混
入検知の警報を発する。どちらの処理を行ってもＳ−５
において全一次側自動遮断弁１、全質量流量計２、全二
次側自動遮断弁３および最終自動遮断弁４を閉じ終了す
る。First, in step 1 of FIG. 2 (denoted as S-1 and the subsequent steps are similarly denoted as S- (n)), the N 2 flow rate conversion coefficient CF and the set flow rate Q of the gas flowing through all lines are set.
The set and the allowable error d are input to the detection control unit 7. Then, the gas reduced in pressure by the pressure reducing valve 10 from the gas cylinder 9 is supplied to each line. Next, in S-2, the temporary automatic shutoff valve (V 1st ) 1 of each line is opened, and the mass flow rate controller 2 calibrated for each gas is controlled to the set flow rate Q set , and the secondary automatic shutoff valve ( open V 2nd) 3, by opening further final automatic isolating valve (V F) 4, gas is introduced into the mass flowmeter 5 which has been calibrated in N 2 gas. Next, in S-3, the observed value Q T of the mass flowmeter 5 at this time is sent to the detection control unit 7. The detection control unit 7 determines whether or not the allowable error d is less than or equal to the total sum of all gases converted into N 2 flow rates,
If the allowable error is less than d, S-4 in the vacuum processing chamber 6
Plasma treatment is performed and, for example, dry etching of the Al film is performed. When the allowable error d is exceeded, the detection control unit 7 issues an alarm of "abnormal flow rate detection", that is, detection of atmospheric mixture in S-6. S-5
In step 1, all the primary side automatic shutoff valves 1, the total mass flow meter 2, all the secondary side automatic shutoff valves 3 and the final automatic shutoff valve 4 are closed.
【００１２】次に具体的に説明する。ここで、ガス−１
＝Ｃｌ2 ，ガス−２＝ＢＣｌ3 ，ガス−３＝Ｎ2 で設定
流量がそれぞれ５０、２００、２０ｓｃｃｍ、Ｎ2 換算
係数がそれぞれ０．８６、０．４０、１．０とＳ−１で
入力された場合、ガス配管系が正常なとき真空処理室６
へ導入される混合ガスのＮ2 換算流量は Σ（ＱSET （ｎ）ＣＦ（ｎ））＝５０×０．８６＋２０
０×０．４０＋２０×１．０＝１４３．０ｓｃｃｍ である。Next, a detailed description will be given. Where gas-1
= Cl 2, gas -2 = BCl 3, respectively set in the gas -3 = N 2 flow rate 50,200,20sccm, N 2 conversion factors respectively 0.86,0.40,1.0 and S-1 If input, when the gas piping system is normal, vacuum processing chamber 6
The N 2 conversion flow rate of the mixed gas introduced into the system is Σ (Q SET (n) CF (n)) = 50 × 0.86 + 20
It is 0 × 0.40 + 20 × 1.0 = 143.0 sccm 2.
【００１３】このとき、質量流量制御器２から質量流量
計５までのガス配管に、５ｓｃｃｍの空気が混入した場
合、空気のＮ2 換算係数が１．１０であることから質量
流量計５で観測されるＱT は ＱT ＝１４３＋５×１．１０＝１４８．５ｓｃｃｍ と観測される。このときの許容誤差ｄ＝２％とＳ−１で
予め設定している場合Ｓ−３で｜ΔＱ｜＝｜〔（１４
８．５−１４３）／１４３〕｜×１００＝３．８＞２
（％）となり、Ｓ−６で「異常流量検出」警報を発して
終了となる。At this time, when 5 sccm of air is mixed in the gas pipe from the mass flow controller 2 to the mass flow meter 5, the mass flow meter 5 observes that the N 2 conversion coefficient of air is 1.10. The observed Q T is observed as Q T = 143 + 5 × 1.10 = 148.5 sccm. When the allowable error d = 2% at this time and S-1 is set in advance, | ΔQ | = | [(14
8.5-143) / 143] | × 100 = 3.8> 2
(%), The "abnormal flow rate detection" alarm is issued in S-6, and the process ends.
【００１４】また、あるガスの質量流量制御器２が設定
した流量通りに制御できない場合、例えばＣｌ2 ガスが
設定流量５０ｓｃｃｍに対して５５ｓｃｃｍと誤制御さ
れたとき、質量流量計５でＱT は５５×０．８６＋２０
０×０．４０＋２０×１．０＝１４７．３ｓｃｃｍを観
測するから、誤差ΔＱはＳ−３で ｜ΔＱ｜＝｜〔（１４７．３＋１４３）／１４３〕｜×
１００＝３．０＞２（％） となり、Ｓ−６で「異常流量検出」警報を発して停止と
なる。When the mass flow rate controller 2 for a certain gas cannot control the flow rate as set, for example, when Cl 2 gas is erroneously controlled to 55 sccm with respect to the set flow rate of 50 sccm, Q T is measured by the mass flowmeter 5. 55 x 0.86 + 20
Since 0 × 0.40 + 20 × 1.0 = 147.3 sccm is observed, the error ΔQ is S−3 | ΔQ | = | [(147.3 + 143) / 143] | ×
100 = 3.0> 2 (%), and the "abnormal flow rate detection" alarm is issued in S-6 and the operation is stopped.
【００１５】次に本発明の第３の実施の形態としてライ
ンの途中における大気混入の検知方法について説明す
る。図３は本発明の第３の実施の形態を説明する為の動
作フローチャートである。Next, as a third embodiment of the present invention, a method of detecting atmospheric mixture in the middle of a line will be described. FIG. 3 is an operation flowchart for explaining the third embodiment of the present invention.
【００１６】まず図３のＳ−１１において、全一次側自
動遮断弁１，全質量流量制御器２，全二次側自動遮断弁
３および最終自動遮断弁４を閉じた状態で、最終自動遮
断弁４から真空処理室６内までを充分真空排気し、Ｓ−
１２でこのときの質量流量計５の観測値ＱT が設定値、
たとえば０ｓｃｃｍより大きい場合にはＳ−１７で「最
終自動遮断弁４から質量流量計５の間での大気漏洩検
知」警報を発し終了する。Ｓ−１２で質量流量計５の観
測値ＱT が０ｓｃｃｍの場合は、Ｓ−１３で最終自動遮
断弁４を開けた状態で充分真空排気し、Ｓ−１４でこの
ときの質量流量計５の観測値ＱT が０ｓｃｃｍより大き
い場合にはＳ−１８で「二次側自動遮断弁３から最終自
動遮断弁４の間での大気漏洩検知」警報を発し終了す
る。First, in S-11 of FIG. 3, the final automatic shutoff is performed with the all primary side automatic shutoff valve 1, the total mass flow controller 2, the all secondary side automatic shutoff valve 3 and the final automatic shutoff valve 4 closed. Sufficiently evacuate the inside of the vacuum processing chamber 6 from the valve 4 and press the S-
12, the observed value Q T of the mass flowmeter 5 at this time is the set value,
For example, if it is larger than 0 sccm, an alarm of "atmospheric leak detection between the final automatic shutoff valve 4 and the mass flowmeter 5" is issued in S-17, and the process ends. When the observed value Q T of the mass flowmeter 5 is 0 sccm in S-12, the final automatic shut-off valve 4 is fully evacuated in S-13 in S-13, and the mass flowmeter 5 of the mass flowmeter 5 at this time is in S-14. When the observed value Q T is larger than 0 sccm, an alarm of "atmospheric leak detection between the secondary side automatic shutoff valve 3 and the final automatic shutoff valve 4" is issued at S-18 and the process ends.
【００１７】Ｓ−１４で質量流量計５の観測値ＱT が０
ｓｃｃｍの場合は、Ｓ−１５で全ての質量流量制御器２
と二次側自動遮断弁３を開けた状態で充分真空排気し、
Ｓ−１６でこのときの質量流量計５の観測値ＱT が０ｓ
ｃｃｍより大きい場合にはＳ−１９で「一次側自動遮断
弁１と二次側自動遮断弁３の間で大気漏洩検知」警報を
発し、Ｓ−２０で一度全ての質量流量制御器２と二次側
自動遮断弁３を閉じる。そして、Ｓ−２２でまずガス−
１の質量流量制御器２と二次側自動遮断弁３を開き充分
真空排気し、Ｓ−２３でこのとき質量流量計５の観測値
ＱT が０ｓｃｃｍより大きい場合にはＳ−２５で「ガス
−１の一次側自動遮断弁１と二次側自動遮断弁３の間で
大気漏洩検知」警報を発する。At S-14, the observed value Q T of the mass flowmeter 5 is 0.
In the case of sccm, all mass flow controllers 2 in S-15
With the secondary side automatic shutoff valve 3 open, exhaust the vacuum enough,
In S-16, the observed value Q T of the mass flowmeter 5 at this time is 0 s.
If it is larger than ccm, an alarm of "atmosphere leakage detection between primary side automatic shutoff valve 1 and secondary side automatic shutoff valve 3" is issued in S-19, and all mass flow controllers 2 and 2 are once activated in S-20. The secondary automatic shutoff valve 3 is closed. Then, in S-22, first, gas-
The mass flow controller 2 of No. 1 and the secondary side automatic shutoff valve 3 are opened to evacuate sufficiently, and in S-23, when the observed value Q T of the mass flow meter 5 is larger than 0 sccm, in S-25, “gas” is selected. -1 "Atmosphere leak detection between primary side automatic shutoff valve 1 and secondary side automatic shutoff valve 3" is issued.
【００１８】Ｓ−２３で質量流量計５の観測値ＱT が０
ｓｃｃｍの場合は、ガス−２から順番にガス−Ｎまで同
様の動作を行う（Ｓ−２０〜Ｓ−２４）ことにより、ど
のガスの一次側自動遮断弁１と二次側自動遮断弁３の間
で大気漏洩が発生しているのかを検知しＳ−２５で警報
を発する。At S-23, the observed value Q T of the mass flowmeter 5 is 0.
In the case of sccm, by performing the same operation from gas-2 to gas-N in order (S-20 to S-24), the primary side automatic shutoff valve 1 and the secondary side automatic shutoff valve 3 of which gas are selected. It detects if an air leak has occurred between them and issues an alarm at S-25.
【００１９】次に本発明の第４の実施の形態を図４の動
作フローチャートを併用して説明する。Next, a fourth embodiment of the present invention will be described with reference to the operation flowchart of FIG.
【００２０】まず図４のＳ−３１において、全ガスのＮ
2 流量換算係数ＣＦ，設定流量Ｑset および許容誤差ｄ
を検知制御部７に入力する。次でＳ−３３において全て
の一次側自動遮断弁１を閉じ、全ての質量流量制御器２
と二次側自動遮断弁３と最終自動遮断弁４を開き、充分
真空排気した後、Ｓ−３５で、ガス−１の一次側自動遮
断弁１を開き、質量流量制御器２にて設定流量に制御さ
れたガスを真空処理室６に導入する。次でＳ−３６でこ
のとき質量流量計５での観測値ＱT が、ガス−１をＮ2
換算した流量ＱSET （１）ＣＦ（１）に対して許容誤差
ｄ以下か否かを判断し、許容誤差ｄを超える場合はＳ−
３８で「ガス−１の質量流量制御器２の制御流量異常検
知」警報を発する。また、許容誤差ｄ以下の場合、ガス
−２からガス−Ｎまで順番に同様な処理を行い（Ｓ−３
３〜Ｓ−３７）質量流量制御器２の異常箇所を特定す
る。First, in S-31 of FIG.
2 Flow rate conversion coefficient CF, set flow rate Q set and tolerance d
Is input to the detection control unit 7. Next, in S-33, all the primary side automatic shutoff valves 1 are closed, and all the mass flow controllers 2
After opening the secondary side automatic shutoff valve 3 and the final automatic shutoff valve 4 and sufficiently evacuating, the primary side automatic shutoff valve 1 of the gas-1 is opened at S-35, and the set flow rate is set by the mass flow controller 2. The gas controlled to 1 is introduced into the vacuum processing chamber 6. Next, in S-36, the observed value Q T in the mass flowmeter 5 is N 2 for gas-1.
It is judged whether or not the converted flow rate Q SET (1) CF (1) is less than or equal to the allowable error d. If the allowable error d is exceeded, S-
At 38, a "control flow rate abnormality detection of gas-1 mass flow rate controller 2" alarm is issued. If the allowable error is less than or equal to d, the same process is sequentially performed from gas-2 to gas-N (S-3
3 to S-37) Identify the abnormal portion of the mass flow controller 2.
【００２１】次に具体例を挙げて説明する。ガス−１＝
Ｃｌ2 の設定流量が５０ｓｃｃｍ，Ｎ2 換算係数が０．
８６と入力された場合に、ガス配管系が正常なとき真空
処理室６へ導入されるガス−１のＮ2 換算流量は、 ＱSET （１）×ＣＦ（１）＝５０×０．８６＝４３ｓｃ
ｃｍ である。Next, a specific example will be described. Gas-1 =
The set flow rate of Cl 2 is 50 sccm, and the N 2 conversion coefficient is 0.
When 86 is input, the N 2 conversion flow rate of gas-1 introduced into the vacuum processing chamber 6 when the gas piping system is normal is Q SET (1) × CF (1) = 50 × 0.86 = 43sc
cm.
【００２２】このとき質量流量制御器２が設定した流量
通りに制御できない場合、すなわち設定流量５０ｓｃｃ
ｍに対して５５ｓｃｃｍと誤制御されたとき、質量流量
計５でＱT は ＱT ＝５５×０．８６＝４７．３ｓｃｃｍ と観測される。このときの許容誤差ｄ＝２％と予め決め
てある場合 ｜ΔＱ｜＝｜〔（４７．３−４３）／４３〕｜×１００
＝１０．０＞２（％） となり、「ガス−１の質量流量制御器２の制御流量異常
検知」警報を発する。At this time, if the mass flow rate controller 2 cannot control the flow rate as set, that is, the set flow rate 50 scc
When erroneously controlled to 55 sccm with respect to m, Q T is observed by the mass flowmeter 5 as Q T = 55 × 0.86 = 47.3 sccm. When the allowable error d at this time is predetermined as d = 2% | ΔQ | = | [(47.3-43) / 43] | × 100
= 10.0> 2 (%), and a "Gas-1 mass flow rate controller 2 control flow rate abnormality detection" alarm is issued.
【００２３】[0023]
【発明の効果】以上説明したように本発明による真空処
理装置は、真空処理室へガスを導入する直前に質量流量
計を設け、且つ真空処理中にこの質量流量計で観測され
た流量と、設定された流量を比較するという手段を講じ
ることにより、二次側ガス配管における大気成分の混入
を検知できるという効果を有する。また、真空処理に用
いられるガスの質量流量制御器の誤動作を検知できる効
果も有する。As described above, the vacuum processing apparatus according to the present invention is provided with a mass flow meter immediately before introducing gas into the vacuum processing chamber, and the flow rate observed by this mass flow meter during vacuum processing, By taking measures to compare the set flow rates, it is possible to detect the mixing of atmospheric components in the secondary gas pipe. In addition, it also has an effect of detecting a malfunction of the gas mass flow rate controller used for vacuum processing.
【００２４】さらに、各ガス配管を真空排気しながら各
種弁を開閉したときの質量流量計が流量を検出したか否
かで、どの部分で大気混入しているか検知できるという
効果を有する。Further, there is an effect that it is possible to detect in which part the atmosphere is mixed by the mass flow meter detecting the flow rate when various valves are opened and closed while evacuating each gas pipe.
【図１】本発明の第１の実施形態の真空処理装置の構成
図。FIG. 1 is a configuration diagram of a vacuum processing apparatus according to a first embodiment of the present invention.
【図２】本発明の第２の実施の形態を説明する為の動作
フローチャート。FIG. 2 is an operation flowchart for explaining a second embodiment of the present invention.
【図３】本発明の第３の実施の形態を説明する為の動作
フローチャート。FIG. 3 is an operation flowchart for explaining a third embodiment of the present invention.
【図４】本発明の第４の実施の形態を説明する為の動作
フローチャート。FIG. 4 is an operation flowchart for explaining a fourth embodiment of the present invention.
【図５】従来の真空処理装置の構成図。FIG. 5 is a configuration diagram of a conventional vacuum processing apparatus.
１ 一次側自動遮断弁 ２ 質量流量制御器 ３ 二次側自動遮断弁 ４ 最終自動遮断弁 ５ 質量流量計 ６ 真空処理室 ７ 検知制御部 ８ ガスシリンダ収納容器 ９ ガスシリンダ １０ 減圧弁 １１ ガス漏洩検知器 １２ 自動遮断弁 １３，１３Ａ 二次側ガス配管 １４ ガス配管収納容器 １５，１５Ａ 一次側ガス配管 １６ ガス質量流量制御器 1 Primary side automatic shutoff valve 2 Mass flow controller 3 Secondary side automatic shutoff valve 4 Final automatic shutoff valve 5 Mass flowmeter 6 Vacuum processing chamber 7 Detection control section 8 Gas cylinder storage container 9 Gas cylinder 10 Pressure reducing valve 11 Gas leak detection Device 12 Automatic shutoff valve 13, 13A Secondary side gas pipe 14 Gas pipe storage container 15, 15A Primary side gas pipe 16 Gas mass flow controller
Claims (6)
動遮断弁と質量流量制御器と二次側自動遮断弁とからな
る複数組のガスラインと、前記ガスラインの各前記二次
側自動遮断弁に一端が接続され他端が一系統にまとめら
れたガス配管と、このガス配管に接続された最終自動遮
断弁と、この最終自動遮断弁に接続された質量流量計
と、この質量流量計に接続された真空処理室と、前記質
量流量計に接続され複数組の前記ガスラインを流れる処
理ガスの総設定流量の値を記憶しこの設定値と前記質量
流量計の測定値とを比較し測定値が設定値より大きい場
合は警報を発生すると共に前記一次側自動遮断弁と前記
二次側自動遮断弁を閉る為の信号を送出する検知制御手
段とを含むことを特徴とする真空処理装置。1. A plurality of sets of gas lines each comprising a primary-side automatic shutoff valve, a mass flow controller, and a secondary-side automatic shutoff valve, which are sequentially connected to a gas cylinder, and each secondary-side automatic shutoff of the gas line. A gas pipe with one end connected to the valve and the other end integrated into one system, a final automatic shutoff valve connected to this gas pipe, a mass flowmeter connected to this final automatic shutoff valve, and this mass flowmeter And a vacuum processing chamber connected to the mass flowmeter, and stores the value of the total set flow rate of the processing gas flowing through the plurality of sets of gas lines connected to the mass flowmeter and compares the set value with the measured value of the mass flowmeter. When the measured value is larger than the set value, a vacuum process is provided, which includes an alarm and a detection control means for sending a signal for closing the primary side automatic shutoff valve and the secondary side automatic shutoff valve. apparatus.
二次側自動遮断弁又は最終自動遮断弁を閉じて、真空処
理室を真空引きした時に、質量流量計に設定値以上のガ
スが流れた場合警報を発生する機能を合せ持つ請求項１
記載の真空処理装置。2. The detection control means closes the primary-side automatic shut-off valve, the secondary-side automatic shut-off valve or the final automatic shut-off valve, and when the vacuum processing chamber is evacuated, the mass flowmeter receives a gas of a set value or more. Claim 1 which also has the function to generate an alarm when it flows
The vacuum processing apparatus as described in the above.
置を用い、前記一次側自動遮断弁と前記二次側自動遮断
弁と前記最終自動遮断弁を開き、各ラインに前記各質量
流量制御器により設定されたガスを流し、このガス流量
の総和を前記質量流量計で測定し、この測定値が所定の
値以上である場合は大気混入の警報を発生させることを
特徴とする真空処理装置への大気混入の検知方法。3. The vacuum processing apparatus according to claim 1, wherein the primary side automatic shutoff valve, the secondary side automatic shutoff valve, and the final automatic shutoff valve are opened, and each mass flow rate is set in each line. A vacuum process characterized by flowing a gas set by a controller, measuring the total of the gas flow rates with the mass flow meter, and generating an alarm of atmospheric mixing when the measured value is a predetermined value or more. A method for detecting atmospheric contamination of equipment.
記一次側自動遮断弁と前記二次側自動遮断弁と前記最終
自動遮断弁を閉じたのち前記真空処理室を真空引きし、
この時前記質量流量計で測定されたガス量が所定の値以
上である場合は大気混入の警報を発させることを特徴と
する真空処理装置への大気混入の検知方法。4. The vacuum processing apparatus according to claim 2, wherein the primary side automatic shutoff valve, the secondary side automatic shutoff valve, and the final automatic shutoff valve are closed and then the vacuum processing chamber is evacuated.
At this time, when the amount of gas measured by the mass flowmeter is equal to or more than a predetermined value, an alarm of atmospheric mixture is issued, and a method of detecting atmospheric mixture to the vacuum processing apparatus.
以下の場合、前記最終自動遮断弁を開け前記真空処理室
を真空引きし、この時前記質量流量計で測定されたガス
量が所定の値以上である場合は大気混入の警報を発生さ
せる請求項４記載の真空処理装置への大気混入の検知方
法。5. When the gas amount measured by the mass flow meter is less than a predetermined value, the final automatic shutoff valve is opened to evacuate the vacuum processing chamber, and at this time, the gas amount measured by the mass flow meter is The method for detecting atmospheric contamination of a vacuum processing apparatus according to claim 4, wherein an alarm of atmospheric contamination is generated when the value is equal to or more than a predetermined value.
で測定されたガス量が所定値以下の場合、前記二次側自
動遮断弁を開け前記真空処理室を真空引きし、この時前
記質量流量計で測定されたガス量が所定の値以上の場合
は大気混入の警報を発生させる請求項５記載の真空処理
装置への大気混入の検知方法。6. When the gas amount measured by the mass flowmeter after opening the final automatic shutoff valve is less than a predetermined value, the secondary side automatic shutoff valve is opened and the vacuum processing chamber is evacuated. The method for detecting atmospheric contamination of a vacuum processing apparatus according to claim 5, wherein an alarm of atmospheric contamination is generated when the amount of gas measured by the mass flow meter is equal to or larger than a predetermined value.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7208899A JP2885142B2 (en) | 1995-08-16 | 1995-08-16 | Vacuum processing apparatus and method for detecting atmospheric contamination in vacuum processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7208899A JP2885142B2 (en) | 1995-08-16 | 1995-08-16 | Vacuum processing apparatus and method for detecting atmospheric contamination in vacuum processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0955369A true JPH0955369A (en) | 1997-02-25 |
| JP2885142B2 JP2885142B2 (en) | 1999-04-19 |
Family
ID=16563979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7208899A Expired - Lifetime JP2885142B2 (en) | 1995-08-16 | 1995-08-16 | Vacuum processing apparatus and method for detecting atmospheric contamination in vacuum processing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2885142B2 (en) |
Cited By (11)
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|---|---|---|---|---|
| JPH1187318A (en) * | 1997-09-08 | 1999-03-30 | Nec Kyushu Ltd | Dry etching device and method for inspecting gas flow control |
| JP2000138210A (en) * | 1998-11-04 | 2000-05-16 | Tokyo Electron Ltd | Spin coater and aging processing device |
| WO2000029526A1 (en) * | 1998-11-13 | 2000-05-25 | Alfa Laval Ab | Method and arrangement to monitor a fatty oil treatment process carried through under vacuum |
| JP2001093851A (en) * | 1999-07-21 | 2001-04-06 | Tokyo Electron Ltd | Method and apparatus for heat treatment |
| JP2007265684A (en) * | 2006-03-27 | 2007-10-11 | Toyota Motor Corp | Gas flow control device, fuel cell system, and gas flow control method |
| KR100969990B1 (en) * | 2008-03-21 | 2010-07-15 | 주식회사 아토 | Checking method and apparatus of mass flow controller |
| KR20180126378A (en) * | 2017-05-17 | 2018-11-27 | 가부시키가이샤 스크린 홀딩스 | Heat treatment apparatus and heat treatment method |
| JP2019081945A (en) * | 2017-10-27 | 2019-05-30 | ベイジン ジュンタイイノベーション テクノロジー カンパニー，リミティッド | Method and system for adjusting process gas flow in vacuum coating apparatus |
| JP2022017382A (en) * | 2013-08-12 | 2022-01-25 | アプライド マテリアルズ インコーポレイテッド | Substrate processing system, device, and method with environmental control of factory interface |
| US11782404B2 (en) | 2014-11-25 | 2023-10-10 | Applied Materials, Inc. | Substrate processing systems, apparatus, and methods with substrate carrier and purge chamber environmental controls |
| CN117782471A (en) * | 2024-02-27 | 2024-03-29 | 中国重型机械研究院股份公司 | Device and method for detecting conduction capacity of argon blowing pipeline of RH vacuum tank dip pipe |
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Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1187318A (en) * | 1997-09-08 | 1999-03-30 | Nec Kyushu Ltd | Dry etching device and method for inspecting gas flow control |
| JP2000138210A (en) * | 1998-11-04 | 2000-05-16 | Tokyo Electron Ltd | Spin coater and aging processing device |
| KR100509224B1 (en) * | 1998-11-04 | 2005-08-18 | 동경 엘렉트론 주식회사 | A coating film formation apparatus and aging process apparatus |
| WO2000029526A1 (en) * | 1998-11-13 | 2000-05-25 | Alfa Laval Ab | Method and arrangement to monitor a fatty oil treatment process carried through under vacuum |
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| JP2007265684A (en) * | 2006-03-27 | 2007-10-11 | Toyota Motor Corp | Gas flow control device, fuel cell system, and gas flow control method |
| KR100969990B1 (en) * | 2008-03-21 | 2010-07-15 | 주식회사 아토 | Checking method and apparatus of mass flow controller |
| JP2022017382A (en) * | 2013-08-12 | 2022-01-25 | アプライド マテリアルズ インコーポレイテッド | Substrate processing system, device, and method with environmental control of factory interface |
| US11782404B2 (en) | 2014-11-25 | 2023-10-10 | Applied Materials, Inc. | Substrate processing systems, apparatus, and methods with substrate carrier and purge chamber environmental controls |
| KR20180126378A (en) * | 2017-05-17 | 2018-11-27 | 가부시키가이샤 스크린 홀딩스 | Heat treatment apparatus and heat treatment method |
| JP2018195689A (en) * | 2017-05-17 | 2018-12-06 | 株式会社Ｓｃｒｅｅｎホールディングス | Thermal treatment equipment and thermal treatment method |
| US11081409B2 (en) | 2017-05-17 | 2021-08-03 | SCREEN Holdings Co., Ltd. | Heat treatment apparatus of light irradiation type and heat treatment method |
| JP2019081945A (en) * | 2017-10-27 | 2019-05-30 | ベイジン ジュンタイイノベーション テクノロジー カンパニー，リミティッド | Method and system for adjusting process gas flow in vacuum coating apparatus |
| CN117782471A (en) * | 2024-02-27 | 2024-03-29 | 中国重型机械研究院股份公司 | Device and method for detecting conduction capacity of argon blowing pipeline of RH vacuum tank dip pipe |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2885142B2 (en) | 1999-04-19 |
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