JPH0948632A - Alkali-free glass substrate - Google Patents

Alkali-free glass substrate

Info

Publication number
JPH0948632A
JPH0948632A JP21810395A JP21810395A JPH0948632A JP H0948632 A JPH0948632 A JP H0948632A JP 21810395 A JP21810395 A JP 21810395A JP 21810395 A JP21810395 A JP 21810395A JP H0948632 A JPH0948632 A JP H0948632A
Authority
JP
Japan
Prior art keywords
glass
glass substrate
alkali
bao
sro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21810395A
Other languages
Japanese (ja)
Other versions
JP3666610B2 (en
Inventor
Shinkichi Miwa
晋吉 三和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Priority to JP21810395A priority Critical patent/JP3666610B2/en
Publication of JPH0948632A publication Critical patent/JPH0948632A/en
Application granted granted Critical
Publication of JP3666610B2 publication Critical patent/JP3666610B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Glass Compositions (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an alkali-free glass substrate completely satisfying required properties for a glass substrate used for a TFT-type active matrix liquid crystal display. SOLUTION: This substrate is composed of 50-65wt.% SiO2 , 11-22 wt.% Al2 O3 , 4-8.9wt.% B2 O3 , 3-10wt.% MgO, 0-4.5wt.% CaO, 0-10wt.% SrO, 0.5-9wt.% BaO, 0-5wt.% ZnO, 0-5wt.% ZrO2 and 0-5wt.% TiO2 and under a restriction of (MgO+ CaO+SrO+BaO+ZnO)=5-20wt.%, substantially free from an alkali metal oxide and has <=2.6g/cm<3> density.

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【産業上の利用分野】本発明は、液晶ディスプレイ、Ｅ
Ｌディスプレイ等のディスプレイ、フィルター、センサ
ー等の基板として用いられる無アルカリガラス基板に関
するものである。The present invention relates to a liquid crystal display, E
The present invention relates to a non-alkali glass substrate used as a substrate for displays such as L displays, filters, and sensors.

【０００２】[0002]

【従来の技術】従来より、液晶ディスプレイ等のフラッ
トパネルディスプレイ、フィルター、センサー等の基板
として、ガラス基板が広く使用されている。2. Description of the Related Art Conventionally, glass substrates have been widely used as substrates for flat panel displays such as liquid crystal displays, filters and sensors.

【０００３】この種のガラス基板の表面には、透明導電
膜、絶縁膜、半導体膜、金属膜等が成膜され、しかもフ
ォトリソグラフィ−エッチング（フォトエッチング）に
よって種々の回路やパターンが形成される。これらの成
膜、フォトエッチング工程において、ガラス基板には、
種々の熱処理や薬品処理が施される。A transparent conductive film, an insulating film, a semiconductor film, a metal film, etc. are formed on the surface of a glass substrate of this kind, and various circuits and patterns are formed by photolithography-etching (photoetching). . In these film formation and photo etching steps, the glass substrate is
Various heat treatments and chemical treatments are performed.

【０００４】例えば薄膜トランジスタ（ＴＦＴ）型アク
ティブマトリックス液晶ディスプレイの場合、ガラス基
板上に絶縁膜や透明導電膜が成膜され、さらにアモルフ
ァスシリコンや多結晶シリコンのＴＦＴが、フォトエッ
チングによって多数形成される。このような工程におい
て、ガラス基板は、数百度の熱処理を受けると共に、硫
酸、塩酸、アルカリ溶液、フッ酸、バッファードフッ酸
等の種々の薬品による処理を受ける。In the case of a thin film transistor (TFT) type active matrix liquid crystal display, for example, an insulating film and a transparent conductive film are formed on a glass substrate, and a large number of amorphous silicon and polycrystalline silicon TFTs are formed by photoetching. In such a step, the glass substrate is subjected to heat treatment at several hundreds of degrees and is also treated with various chemicals such as sulfuric acid, hydrochloric acid, an alkaline solution, hydrofluoric acid, and buffered hydrofluoric acid.

【０００５】特にバッファードフッ酸は、絶縁膜のエッ
チングに広く用いられるが、ガラスを侵食してその表面
を白濁させやすく、またガラス成分と反応して反応生成
物ができ、これが工程中のフィルターをつまらせたり、
基板上に付着することがあり、また塩酸は、ＩＴＯ膜や
クロム膜のエッチングに用いられるが、これもガラスを
侵食してその表面を変色させたり、ガラス成分と反応し
て反応生成物ができやすいため、この種のガラス基板に
は、耐バッファードフッ酸性と耐塩酸性を付与すること
が大変重要となる。Particularly, buffered hydrofluoric acid is widely used for etching an insulating film, but it easily corrodes the glass to make the surface cloudy, and reacts with a glass component to form a reaction product, which is a filter in the process. Squeeze
Hydrochloric acid may adhere to the substrate, and hydrochloric acid is used for etching the ITO film and the chromium film, but this also corrodes the glass and discolors its surface, or reacts with the glass components to form reaction products. Since it is easy, it is very important to impart buffered hydrofluoric acid resistance and hydrochloric acid resistance to this type of glass substrate.

【０００６】従ってＴＦＴ型アクティブマトリックス液
晶ディスプレイに使用されるガラス基板には、以下のよ
うな特性が要求される。Therefore, the glass substrate used for the TFT type active matrix liquid crystal display is required to have the following characteristics.

【０００７】（１）ガラス中にアルカリ金属酸化物が含
有されていると、熱処理中にアルカリイオンが成膜され
た半導体物質中に拡散し、膜特性の劣化を招くため、実
質的にアルカリ金属酸化物を含有しないこと。(1) If the glass contains an alkali metal oxide, alkali ions are diffused into the semiconductor material on which the film is formed during the heat treatment and the film characteristics are deteriorated. Do not contain oxides.

【０００８】（２）フォトエッチング工程において使用
される種々の酸、アルカリ等の薬品によって劣化しない
ような耐薬品性を有すること。(2) It has chemical resistance so as not to be deteriorated by various chemicals such as acid and alkali used in the photoetching process.

【０００９】（３）成膜、アニール等の工程における熱
処理によって、熱収縮しないこと。そのため高い歪点を
有すること。例えば多結晶シリコンＴＦＴ−ＬＣＤの場
合、その工程温度が約６００℃以上であるため、このよ
うな用途のガラス基板には、歪点が６５０℃以上である
ことが要求される。(3) Heat shrinkage does not occur due to heat treatment in steps such as film formation and annealing. Therefore, it must have a high strain point. For example, in the case of a polycrystalline silicon TFT-LCD, the process temperature is about 600 ° C. or higher, and thus the glass substrate for such an application is required to have a strain point of 650 ° C. or higher.

【００１０】また溶融性、成形性を考慮して、この種の
ガラス基板には、以下のような特性も要求される。Further, in consideration of meltability and moldability, the glass substrate of this kind is required to have the following characteristics.

【００１１】（４）ガラス中に基板として好ましくない
溶融欠陥が発生しないよう、溶融性に優れていること。(4) It has excellent meltability so that melting defects that are not desirable as a substrate in the glass do not occur.

【００１２】（５）ガラス中に溶融、成形中に発生する
異物が存在しないように、耐失透性に優れていること。(5) The glass is excellent in devitrification resistance so that foreign substances generated during melting and molding do not exist in the glass.

【００１３】また近年、ＴＦＴ型アクティブマトリック
ス液晶ディスプレイ等の電子機器は、パーソナルな分野
への利用が進められており、機器の軽量化が要求されて
いる。これに伴ってガラス基板にも軽量化が要求されて
おり、薄板化が進められている。しかしながらこの種の
電子機器は、大型化も進められており、ガラス基板の強
度を考慮すると、薄板化については自ずと限界がある。
そこでガラス基板の軽量化を図る目的で、ガラスの密度
を低くすることが望まれている。Further, in recent years, electronic devices such as TFT type active matrix liquid crystal displays have been increasingly used in personal fields, and it is required to reduce the weight of the devices. Along with this, the glass substrate is also required to be lightweight, and thinning is being promoted. However, this type of electronic device is also being made larger, and considering the strength of the glass substrate, there is naturally a limit to thinning.
Therefore, it is desired to reduce the density of the glass for the purpose of reducing the weight of the glass substrate.

【００１４】[0014]

【発明が解決しようとする課題】従来よりＴＦＴ型アク
ティブマトリックス液晶ディスプレイ基板に用いられて
いる無アルカリガラスとしては、石英ガラス、バリウム
硼珪酸ガラス及びアルミノ珪酸塩ガラスが存在するが、
いずれも一長一短がある。As the alkali-free glass conventionally used for the TFT type active matrix liquid crystal display substrate, there are quartz glass, barium borosilicate glass and aluminosilicate glass.
Both have advantages and disadvantages.

【００１５】すなわち石英ガラスは、耐薬品性、耐熱性
に優れ、低密度であるが、材料コストが高いという難点
がある。That is, although quartz glass is excellent in chemical resistance and heat resistance and has a low density, it has a drawback that the material cost is high.

【００１６】またバリウム硼珪酸ガラスとしては、市販
品としてコーニング社製＃７０５９が存在するが、この
ガラスは耐酸性に劣り、フォトエッチング工程において
ガラス基板の表面に変質や白濁、荒れが生じやすく、し
かも基板からの溶出成分によって薬液を汚染しやすい。
さらにこのガラスは、歪点が低いため、熱収縮や熱変形
を起こしやすく、耐熱性に劣っている。またその密度
も、２．７６ｇ／ｃｍ3と高い。As for barium borosilicate glass, # 7059 manufactured by Corning Co., Ltd. is commercially available, but this glass is inferior in acid resistance, and alteration, white turbidity and roughness are likely to occur on the surface of the glass substrate in the photoetching process. Moreover, the chemical solution is easily contaminated by the components eluted from the substrate.
Furthermore, since this glass has a low strain point, it is likely to undergo heat shrinkage or thermal deformation, and is inferior in heat resistance. The density is also high at 2.76 g / cm 3 .

【００１７】アルミノ珪酸塩ガラスは、耐熱性に優れて
いるが、現在市場にあるガラス基板の多くが、溶融性が
悪く、大量生産に不向きである。またこのガラス基板
は、密度が高かったり、耐バッファードフッ酸性に劣る
ものが多く、全ての要求特性を満足するものは未だ存在
しないというのが実情である。Aluminosilicate glass has excellent heat resistance, but most of the glass substrates currently on the market have poor meltability and are not suitable for mass production. In addition, many of these glass substrates have high density and are inferior in buffered hydrofluoric acid resistance, and the fact is that none of them satisfy all the required characteristics.

【００１８】本発明の目的は、上記した要求特性項目
（１）〜（５）の全て満足し、しかも密度が２．６ｇ／
ｃｍ3 以下である無アルカリガラス基板を提供すること
である。The object of the present invention is to satisfy all the above-mentioned required characteristic items (1) to (5) and to have a density of 2.6 g /
It is to provide a non-alkali glass substrate having a size of 3 cm 3 or less.

【００１９】[0019]

【課題を解決するための手段】本発明の無アルカリガラ
ス基板は、重量百分率で、ＳｉＯ2 ５０〜６５％、Ａ
ｌ2 Ｏ3 １１〜２２％、Ｂ2 Ｏ3 ４〜８．９％、Ｍ
ｇＯ ３〜１０％、ＣａＯ ０〜４．５％、ＳｒＯ ０
〜１０％、ＢａＯ ０．５〜９％、ＺｎＯ ０〜５％、
ＺｒＯ2 ０〜５％、ＴｉＯ2 ０〜５％、ＭｇＯ＋Ｃ
ａＯ＋ＳｒＯ＋ＢａＯ＋ＺｎＯ ５〜２０％の組成を有
し、実質的にアルカリ金属酸化物を含有せず、密度が
２．６ｇ／ｃｍ3 以下であることを特徴とする。The alkali-free glass substrate of the present invention has a weight percentage of SiO 2 of 50 to 65%, A 2.
l 2 O 3 11 to 22%, B 2 O 3 4 to 8.9%, M
gO 3-10%, CaO 0-4.5%, SrO 0
-10%, BaO 0.5-9%, ZnO 0-5%,
ZrO 2 0-5%, TiO 2 0-5%, MgO + C
It has a composition of aO + SrO + BaO + ZnO 5 to 20%, contains substantially no alkali metal oxide, and has a density of 2.6 g / cm 3 or less.

【００２０】また本発明の無アルカリガラス基板は、好
ましくは、重量百分率で、ＳｉＯ2５０〜６５％、Ａｌ2
Ｏ3 １１〜２２％、Ｂ2 Ｏ3 ４〜８．９％、Ｍｇ
Ｏ３〜１０％、ＣａＯ ０〜２％、ＳｒＯ ０．５〜１
０％、ＢａＯ ０．５〜９％、ＺｎＯ ０〜５％、Ｚｒ
Ｏ2 ０〜１．８％、ＴｉＯ2 ０〜５％、ＭｇＯ＋Ｃ
ａＯ＋ＳｒＯ＋ＢａＯ＋ＺｎＯ ５〜２０％の組成を有
することを特徴とする。The alkali-free glass substrate of the present invention preferably has a weight percentage of SiO 2 50 to 65% and Al 2
O 3 11~22%, B 2 O 3 4~8.9%, Mg
O3-10%, CaO 0-2%, SrO 0.5-1
0%, BaO 0.5-9%, ZnO 0-5%, Zr
O 2 0 to 1.8%, TiO 2 0 to 5%, MgO + C
It is characterized by having a composition of aO + SrO + BaO + ZnO 5 to 20%.

【００２１】[0021]

【作用】以下、本発明の無アルカリガラス基板の構成成
分を上記のように限定した理由を説明する。The reason why the components of the alkali-free glass substrate of the present invention are limited as described above will be described below.

【００２２】ＳｉＯ2 は、ガラスのネットワークフォー
マーとなる成分であって、その含有量は、５０〜６５％
である。５０％より少ないと、耐薬品性、特に耐酸性が
低下すると共に歪点が低くなるため耐熱性が悪くなり、
また６５％より多いと、高温粘度が大きくなり、溶融性
が悪くなると共にクリストバライトの失透物が析出しや
すくなる。SiO 2 is a component that serves as a glass network former, and its content is 50 to 65%.
It is. If it is less than 50%, the chemical resistance, particularly the acid resistance is lowered and the strain point is lowered, so that the heat resistance is deteriorated,
On the other hand, if it is more than 65%, the viscosity at high temperature becomes large, the meltability deteriorates, and the devitrified substance of cristobalite tends to precipitate.

【００２３】Ａｌ2 Ｏ3 は、ガラスの耐熱性、耐失透性
を高めると共に、密度を低下させるために不可欠な成分
であり、その含有量は、１１〜２２％である。１１％よ
り少ないと、失透温度が著しく上昇し、ガラス中に失透
異物が生じやすくなる。また２２％より多いと、耐酸
性、特に耐バッファードフッ酸性が低下し、ガラス基板
の表面に白濁が生じやすくなる。Al 2 O 3 is an essential component for increasing the heat resistance and devitrification resistance of glass and reducing the density, and the content thereof is 11 to 22%. If it is less than 11%, the devitrification temperature rises remarkably, and devitrification foreign matter is likely to occur in the glass. If it is more than 22%, the acid resistance, particularly the buffered hydrofluoric acid resistance is lowered, and the surface of the glass substrate is liable to be clouded.

【００２４】Ｂ2 Ｏ3 は、融剤として働き、粘性を下
げ、溶融性を改善すると共に密度を低下させるための成
分であり、その含有量は、４〜８．９％である。４％よ
り少ないと、融剤としての働きが不十分となると共に、
ガラスの密度が高くなり、しかも耐バッファードフッ酸
性が低下する。また８．９％より多いと、耐塩酸性が低
下するため好ましくない。B 2 O 3 is a component that acts as a flux, lowers the viscosity, improves the meltability and lowers the density, and its content is 4 to 8.9%. If it is less than 4%, the function as a flux becomes insufficient and
The density of the glass becomes high, and the buffered hydrofluoric acid resistance decreases. Further, if it is more than 8.9%, the hydrochloric acid resistance is deteriorated, which is not preferable.

【００２５】ＭｇＯは、歪点を下げずに高温粘性を下
げ、ガラスの溶融性を改善する作用を有しており、二価
のアルカリ土類酸化物の中で、最も密度を下げる効果が
大きい成分であり、その含有量は、３〜１０％である。
３％より少ないと、上記の効果が小さくなり、１０％よ
り多いと、失透温度が著しく上昇し、エンスタタイト
（ＭｇＯ・ＳｉＯ2 ）の結晶異物がガラス中に析出しや
すくなると共に、ガラスの耐バッファードフッ酸性が著
しく悪化する。MgO has the effect of lowering the high temperature viscosity without lowering the strain point and improving the meltability of glass, and has the greatest effect of lowering the density of the divalent alkaline earth oxides. It is a component and its content is 3 to 10%.
If it is less than 3%, the above effect becomes small, and if it is more than 10%, the devitrification temperature rises remarkably, and crystalline foreign matter of enstatite (MgO.SiO 2 ) easily precipitates in the glass, and Buffered hydrofluoric acid resistance significantly deteriorates.

【００２６】ＣａＯも、ＭｇＯと同様に歪点を下げずに
高温粘性を下げ、ガラスの溶融性を改善する作用を有す
る成分であり、その含有量は、０〜４．５％、好ましく
は０〜２％である。４．５％より多いと、ガラスの耐バ
ッファードフッ酸性が著しく悪化するため好ましくな
い。すなわちガラスをバッファードフッ酸で処理する際
に、ガラス中のＣａＯ成分と、バッファードフッ酸によ
る反応生成物が、ガラス表面に多量に析出してガラス基
板を白濁させやすくなると共に、反応生成物によってガ
ラス基板上に形成される素子や薬液が汚染されやすくな
るため好ましくない。CaO is also a component which, like MgO, has a function of lowering the high temperature viscosity without lowering the strain point and improving the meltability of glass, and the content thereof is 0 to 4.5%, preferably 0. ~ 2%. If it exceeds 4.5%, the buffered hydrofluoric acid resistance of the glass is significantly deteriorated, which is not preferable. That is, when the glass is treated with buffered hydrofluoric acid, the CaO component in the glass and the reaction product of the buffered hydrofluoric acid tend to be deposited on the glass surface in a large amount to easily cloud the glass substrate, and the reaction product This is not preferable because the element and the chemical liquid formed on the glass substrate are easily contaminated.

【００２７】ＳｒＯとＢａＯは、共にガラスの耐薬品性
を向上させると共に、失透性を改善するための成分であ
るが、多量に含有させると、溶融性を損なうと共にガラ
スの密度が高くなるため好ましくない。従ってＳｒＯの
含有量は、０〜１０％、好ましくは０．５〜１０％であ
り、ＢａＯの含有量は、０．５〜９％である。すなわち
ＳｒＯとＢａＯを共存させると、失透性を改善する効果
がより一層大きくなり、ガラスの溶融成形性を大幅に向
上させることが可能となる。Both SrO and BaO are components for improving the chemical resistance of the glass and improving the devitrification property. However, if contained in a large amount, the meltability is impaired and the glass density increases. Not preferable. Therefore, the content of SrO is 0 to 10%, preferably 0.5 to 10%, and the content of BaO is 0.5 to 9%. That is, when SrO and BaO coexist, the effect of improving the devitrification is further enhanced, and the melt moldability of glass can be significantly improved.

【００２８】ＺｎＯは、耐バッファードフッ酸性を改善
すると共に、失透性を改善する成分であり、その含有量
は、０〜５％である。５％より多いと、逆にガラスが失
透しやすくなると共に、歪点が低下するため耐熱性が得
られない。ZnO is a component that improves the buffered hydrofluoric acid resistance and the devitrification resistance, and the content thereof is 0 to 5%. On the other hand, if it is more than 5%, the glass tends to devitrify and the strain point decreases, so that heat resistance cannot be obtained.

【００２９】ただしＭｇＯ、ＣａＯ、ＳｒＯ、ＢａＯ及
びＺｎＯの合量が５％より少ないと、ガラスの高温での
粘性が高くなり、溶融性が悪くなると共に、ガラスが失
透しやすくなり、２０％より多いと、ガラスの密度が高
くなり、２．６ｇ／ｃｍ3 以下にするのが困難となる。However, if the total amount of MgO, CaO, SrO, BaO and ZnO is less than 5%, the viscosity of the glass at a high temperature becomes high, the melting property deteriorates, and the glass tends to devitrify. If the amount is larger, the density of the glass will be higher, and it will be difficult to reduce it to 2.6 g / cm 3 or less.

【００３０】ＺｒＯ2 は、ガラスの耐薬品性、特に耐酸
性を改善すると共に、高温粘性を下げて溶融性を向上さ
せる成分であり、その含有量は、０〜５％、好ましくは
０〜１．８％である。５％より多いと、失透温度が上昇
し、ジルコンの失透異物が析出しやすくなる。ZrO 2 is a component that improves the chemical resistance, particularly acid resistance, of the glass and lowers the high temperature viscosity to improve the meltability, and its content is 0 to 5%, preferably 0 to 1 0.8%. If it is more than 5%, the devitrification temperature rises, and devitrification foreign matter of zircon is likely to deposit.

【００３１】ＴｉＯ2 は、耐薬品性、特に耐バッファー
ドフッ酸性を改善すると共に、高温粘性を低下し、溶融
性を向上させる成分であり、その含有量は、０〜５％で
ある。５％より多いと、ガラスに着色を生じ、透過率が
低下するためディスプレイ用ガラス基板として好ましく
ない。TiO 2 is a component that improves chemical resistance, particularly buffered hydrofluoric acid resistance, lowers high temperature viscosity and improves meltability, and the content thereof is 0 to 5%. When it is more than 5%, the glass is colored and the transmittance is lowered, which is not preferable as a glass substrate for a display.

【００３２】また本発明においては、上記成分以外に
も、特性を損なわない範囲で、他の成分を添加させるこ
とが可能であり、例えば清澄剤としてＡｓ2 Ｏ3 、Ｓｂ
2 Ｏ3、Ｆ2 、Ｃｌ2 、ＳＯ3 等の成分を添加させるこ
とが可能である。In the present invention, in addition to the above-mentioned components, other components may be added within a range that does not impair the characteristics. For example, As 2 O 3 and Sb may be used as a fining agent.
It is possible to add components such as 2 O 3 , F 2 , Cl 2 , and SO 3 .

【００３３】ただし一般に融剤として使用されるＰｂＯ
とＰ2 Ｏ5 は、ガラスの耐薬品性を著しく低下させるた
め、本発明においては添加を避けるべきであり、特にＰ
ｂＯは、溶融時に融液の表面から揮発し、環境を汚染す
る虞れもあるため好ましくない。However, PbO generally used as a fluxing agent
Since P and P 2 O 5 significantly reduce the chemical resistance of glass, their addition should be avoided in the present invention.
bO is not preferable because it may volatilize from the surface of the melt during melting and may contaminate the environment.

【００３４】[0034]

【実施例】以下、本発明の無アルカリガラス基板を実施
例に基づいて詳細に説明する。EXAMPLES The alkali-free glass substrate of the present invention will be described in detail below based on examples.

【００３５】表１、２は、実施例のガラス（試料Ｎｏ．
１〜１０）と比較例のガラス（試料Ｎｏ．１１〜１３）
を示すものである。Tables 1 and 2 show the glasses of the examples (Sample No.
1-10) and glass of comparative example (Sample Nos. 11-13)
Is shown.

【００３６】[0036]

【表１】 [Table 1]

【００３７】[0037]

【表２】 [Table 2]

【００３８】表中の各試料は、次のようにして作製し
た。まず表の組成となるようにガラス原料を調合し、白
金坩堝に入れ、１５８０℃で、２４時間溶融した後、カ
ーボン板上に流し出し、板状に成形した。次いでこれら
の板状ガラスの両面を光学研磨することによってガラス
基板とした。Each sample in the table was prepared as follows. First, glass raw materials were prepared so as to have the composition shown in the table, put in a platinum crucible, melted at 1580 ° C. for 24 hours, poured out onto a carbon plate, and molded into a plate shape. Then, both surfaces of these plate-like glasses were optically polished to obtain glass substrates.

【００３９】表から明らかなように、実施例であるＮ
ｏ．１〜１０の各試料は、いずれも密度が２．５９ｇ／
ｃｍ3 以下、歪点が６６４℃以上、失透温度が１１１８
℃以下、１０2.5 ポイズに相当する温度が１６３０℃以
下であり、いずれも良好な特性を有していた。またこれ
らの試料は、耐塩酸性と耐バッファードフッ酸性にも優
れていた。As is clear from the table, the N
o. Each of the samples 1 to 10 has a density of 2.59 g /
cm 3 or less, strain point 664 ° C. or more, devitrification temperature 1118
The temperature corresponding to 10 ° C. or less and 10 2.5 poise was 1630 ° C. or less, and all had good characteristics. Further, these samples were also excellent in hydrochloric acid resistance and buffered hydrofluoric acid resistance.

【００４０】それに対し、比較例であるＮｏ．１１の試
料は、実施例に比べて密度が大きいため、重量が大きい
と考えられる。しかも歪点が低いため、耐熱性に劣り、
且つ、耐塩酸性も悪かった。またＮｏ．１２の試料は、
実施例に比べて密度が高く、また歪点が低いため、耐熱
性に劣り、しかも耐塩酸性と耐バッファードフッ酸性が
悪かった。さらにＮｏ．１３の試料は、実施例に比べて
失透温度と高温粘性が大幅に高いため溶融性に劣ると共
に、耐塩酸性も悪かった。On the other hand, No. The sample of No. 11 has a higher density than that of the example, and is considered to have a large weight. Moreover, since the strain point is low, it is inferior in heat resistance,
Moreover, the hydrochloric acid resistance was also poor. No. 12 samples are
Since the density was higher and the strain point was lower than in the examples, the heat resistance was poor, and the hydrochloric acid resistance and the buffered hydrofluoric acid resistance were poor. Furthermore, No. The sample of No. 13 was inferior in meltability because the devitrification temperature and the viscosity at high temperature were significantly higher than those in Examples, and also had poor hydrochloric acid resistance.

【００４１】尚、密度は、周知のアルキメデス法によっ
て測定したものである。また歪点は、ＡＳＴＭ Ｃ３３
６−７１の方法に基づいて測定し、失透温度は、各試料
から３００〜５００μｍの粒径を有するガラス粉末を作
製し、これを白金ボート内に入れ、温度勾配炉に２４時
間保持した後の失透観察によって求めたものである。The density is measured by the well-known Archimedes method. The strain point is ASTM C33
The devitrification temperature was measured according to the method of 6-71, and glass powder having a particle diameter of 300 to 500 μm was prepared from each sample, put in a platinum boat, and held in a temperature gradient furnace for 24 hours. It was obtained by observation of devitrification.

【００４２】また１０2.5 ポイズ温度は、高温粘度であ
る１０2.5 ポイズに相当する温度を示すものであり、こ
の温度が低いほど、溶融成形性に優れていることにな
る。The 10 2.5 poise temperature is a temperature corresponding to 10 2.5 poise which is a high temperature viscosity, and the lower the temperature, the better the melt moldability.

【００４３】さらに耐塩酸性は、各試料を８０℃に保持
された１０重量％塩酸水溶液に２４時間浸漬した後、ガ
ラス基板の表面状態を観察することによって評価した。
ガラス基板の表面が変色したものを×、全く変化がない
ものを○で示した。Further, the hydrochloric acid resistance was evaluated by immersing each sample in a 10% by weight aqueous hydrochloric acid solution kept at 80 ° C. for 24 hours and then observing the surface condition of the glass substrate.
The case where the surface of the glass substrate is discolored is indicated by x, and the case where there is no change is indicated by o.

【００４４】また耐バッファードフッ酸性は、各試料
を、２０℃に保持された３８．７重量％フッ化アンモニ
ウム、１．６重量％フッ酸からなるバッファードフッ酸
に３０分間浸漬した後、ガラス基板の表面状態を観察す
ることによって評価した。ガラス基板の表面が白濁した
ものを×、全く変化のなかったものを○で示した。The buffered hydrofluoric acid resistance was determined by immersing each sample in buffered hydrofluoric acid consisting of 38.7 wt% ammonium fluoride and 1.6 wt% hydrofluoric acid kept at 20 ° C. for 30 minutes. It was evaluated by observing the surface condition of the glass substrate. The case where the surface of the glass substrate was clouded was indicated by x, and the case where there was no change was indicated by o.

【００４５】[0045]

【発明の効果】以上のように本発明の無アルカリガラス
基板は、実質的にアルカリ金属酸化物を含有せず、耐熱
性、耐薬品性、溶融成形性に優れ、しかも低密度である
ため、特に軽量化が要求されるＴＦＴ型アクティブマト
リックス液晶ディスプレイに使用されるガラス基板とし
て好適である。As described above, the alkali-free glass substrate of the present invention contains substantially no alkali metal oxide, is excellent in heat resistance, chemical resistance, melt moldability, and has a low density. In particular, it is suitable as a glass substrate used for a TFT active matrix liquid crystal display, which needs to be lightweight.

Claims (2)

【特許請求の範囲】[Claims] 【請求項１】 重量百分率で、ＳｉＯ2 ５０〜６５
％、Ａｌ2 Ｏ3 １１〜２２％、Ｂ2 Ｏ3 ４〜８．９
％、ＭｇＯ ３〜１０％、ＣａＯ ０〜４．５％、Ｓｒ
Ｏ ０〜１０％、ＢａＯ ０．５〜９％、ＺｎＯ ０〜
５％、ＺｒＯ2０〜５％、ＴｉＯ2 ０〜５％、ＭｇＯ
＋ＣａＯ＋ＳｒＯ＋ＢａＯ＋ＺｎＯ５〜２０％の組成を
有し、実質的にアルカリ金属酸化物を含有せず、密度が
２．６ｇ／ｃｍ3 以下であることを特徴とする無アルカ
リガラス基板。1. The composition according to claim 1, wherein the weight percentage of SiO 2 is 50-65.
%, Al 2 O 3 11 to 22%, B 2 O 3 4 to 8.9
%, MgO 3-10%, CaO 0-4.5%, Sr
O 0-10%, BaO 0.5-9%, ZnO 0-
5%, ZrO 2 0-5%, TiO 2 0-5%, MgO
+ CaO + SrO + BaO + ZnO A composition of 5 to 20%, containing substantially no alkali metal oxide, and having a density of 2.6 g / cm 3 or less, an alkali-free glass substrate. 【請求項２】 重量百分率で、ＳｉＯ2 ５０〜６５
％、Ａｌ2 Ｏ3 １１〜２２％、Ｂ2 Ｏ3 ４〜８．９
％、ＭｇＯ ３〜１０％、ＣａＯ ０〜２％、ＳｒＯ
０．５〜１０％、ＢａＯ ０．５〜９％、ＺｎＯ ０〜
５％、ＺｒＯ2０〜１．８％、ＴｉＯ2 ０〜５％、Ｍ
ｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ＋ＺｎＯ ５〜２０％の
組成を有することを特徴とする請求項１の無アルカリガ
ラス基板。2. A weight percentage of SiO 2 50-65.
%, Al 2 O 3 11 to 22%, B 2 O 3 4 to 8.9
%, MgO 3-10%, CaO 0-2%, SrO
0.5-10%, BaO 0.5-9%, ZnO 0-
5%, ZrO 2 0 to 1.8%, TiO 2 0 to 5%, M
The alkali-free glass substrate according to claim 1, which has a composition of gO + CaO + SrO + BaO + ZnO 5 to 20%.
JP21810395A 1995-08-02 1995-08-02 Alkali-free glass substrate Expired - Fee Related JP3666610B2 (en)

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US7576021B2 (en) 2004-04-05 2009-08-18 Nippon Sheet Glass Co., Ltd. Mother glass composition for graded index lens, graded index lens, manufacturing method of graded index lens, optical product and optical instrument using the same
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US8753993B2 (en) * 2006-02-10 2014-06-17 Corning Incorporated Glass compositions having high thermal and chemical stability and methods of making thereof
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US20130065747A1 (en) * 2006-02-10 2013-03-14 Paul Stephen Danielson Glass compositions having high thermal and chemical stability and methods of making thereof
JP2009525942A (en) * 2006-02-10 2009-07-16 コーニング インコーポレイテッド Glass composition having high thermal and chemical stability and method for producing the same
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KR101399745B1 (en) * 2006-02-10 2014-05-26 코닝 인코포레이티드 Glass composition having high thermal and chemical stability and methods of making thereof
JP2007008812A (en) * 2006-09-21 2007-01-18 Nippon Electric Glass Co Ltd Alkali free glass substrate
WO2009090013A1 (en) * 2008-01-17 2009-07-23 Schott Ag Alkali-free glass
US8713967B2 (en) 2008-11-21 2014-05-06 Corning Incorporated Stable glass sheet and method for making same
US8598056B2 (en) 2010-10-06 2013-12-03 Corning Incorporated Alkali-free glass compositions having high thermal and chemical stability
CN103261109A (en) * 2010-12-07 2013-08-21 旭硝子株式会社 Alkali free glass and method for producing alkali free glass
CN103261109B (en) * 2010-12-07 2016-10-12 旭硝子株式会社 Alkali-free glass and the manufacture method of alkali-free glass
WO2013047586A1 (en) * 2011-09-30 2013-04-04 ＡｖａｎＳｔｒａｔｅ株式会社 Glass substrate for flat panel display
JPWO2013047586A1 (en) * 2011-09-30 2015-03-26 ＡｖａｎＳｔｒａｔｅ株式会社 Glass substrate for flat panel display
JP2019163209A (en) * 2013-07-16 2019-09-26 コーニング インコーポレイテッド Alkali-free aluminosilicate glasses, suitable as substrate for induction heating cooktops
CN104276755A (en) * 2013-10-31 2015-01-14 东旭集团有限公司 Alkali-free aluminium borosilicate glass with high chemical durability
US20220169561A1 (en) * 2020-12-02 2022-06-02 Taiwan Glass Industry Corp. Glass composition with low thermal expansion coefficient and glass fiber made of the same
JP2022088298A (en) * 2020-12-02 2022-06-14 台湾玻璃工業股▲ふん▼有限公司 Glass composition comprising low thermal expansion coefficient and glass fiber thereof

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