JPH0938862A - Grinding/polishing/cleaning material projecting method by centrifugal grinding/polishing/cleaning material projecting device - Google Patents

Grinding/polishing/cleaning material projecting method by centrifugal grinding/polishing/cleaning material projecting device

Info

Publication number
JPH0938862A
JPH0938862A JP21256095A JP21256095A JPH0938862A JP H0938862 A JPH0938862 A JP H0938862A JP 21256095 A JP21256095 A JP 21256095A JP 21256095 A JP21256095 A JP 21256095A JP H0938862 A JPH0938862 A JP H0938862A
Authority
JP
Japan
Prior art keywords
polishing
cleaning
grinding
cleaning material
impeller
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21256095A
Other languages
Japanese (ja)
Other versions
JP3305924B2 (en
Inventor
Hitoshi Rokutanda
等 六反田
Hiroaki Suzuki
浩昭 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sintokogio Ltd
Original Assignee
Sintokogio Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintokogio Ltd filed Critical Sintokogio Ltd
Priority to JP21256095A priority Critical patent/JP3305924B2/en
Publication of JPH0938862A publication Critical patent/JPH0938862A/en
Application granted granted Critical
Publication of JP3305924B2 publication Critical patent/JP3305924B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PROBLEM TO BE SOLVED: To project evenly to an object to be processed by moving a center position in a projecting area of a grinding/polishing/cleaning material within a prescribed area during one grinding/polishing/cleaning step. SOLUTION: A control gage actuation mechanism 2 comprises an electric cylinder 21 arranged for vertical movement through a supporting member 20 and an adjusting member 22 fixed in a tip of a piston rod of the electric cylinder 21 by a spring and coupled with a cylindrical member 8 by a pin. The control gage is provided in such manner that it is rotated reciprocatingly through the cylindrical member 8 by expansion actuating of the electric cylinder 21. A center position of a projecting area of a grinding/polishing/cleaning material is reciprocally moved within a prescribed area at a rate of 2/minute by turning an impeller to one direction to project the grinding/polishing/cleaning material and actuating expansion of the electric cylinder 21 of the control gage actuation mechanism 2 during one grinding/polishing/cleaning step.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、インペラの回転により
研掃材に遠心力を付与して研掃材を投射する遠心式研掃
材投射装置を用いて被処理品をバッチ式に研掃するよう
にした研掃方法における研掃材の投射方法の改良に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention uses a centrifugal abrasive cleaning material projecting device for projecting abrasive cleaning material by applying centrifugal force to the abrasive cleaning material by rotating an impeller. The present invention relates to the improvement of the projection method of the abrasive material in the abrasive cleaning method.

【0002】[0002]

【従来の技術】従来、遠心式研掃材投射装置を装着した
研掃設備を用いて被処理品をバッチ式に研掃するに当た
り、特開昭56ー119373号公報で開示されるよう
に、一研掃工程中に、インペラを所定時間正転させた後
逆転させて、研掃材を被処理品に対して一様に投射する
方法が提案されている。
2. Description of the Related Art Conventionally, when a workpiece is batch-cleaned using a polishing equipment equipped with a centrifugal polishing material projection device, as disclosed in JP-A-56-119373, A method has been proposed in which, during one polishing step, the impeller is rotated in the forward direction for a predetermined time and then rotated in the reverse direction so that the polishing material is uniformly projected onto the article to be processed.

【0003】[0003]

【発明が解決しようとする課題】しかし、このようにイ
ンペラを正逆回転させる研掃材投射方法では、従来一般
に行われているインペラを一方向に回転させた場合と比
較すると、確かに研掃材の投射領域の中心位置が二つの
位置に生じて、被処理品に対して研掃材がより一様に投
射されることになるが、インペラの回転を変更する時点
でインペラの回転を一時停止させなければならず(0.
5〜1.5分)、その結果、研掃処理に必要な時間が永
くなるなどの新たな問題が生じている。本発明は、上記
の事情に鑑みて為されたもので、その目的は、研掃材を
被処理品に対してさらに一様に投射することが可能な遠
心式研掃材投射装置による研掃材投射方法を提供するこ
とにある。
However, in the polishing / blasting material projection method in which the impeller is rotated in the normal and reverse directions as described above, compared with the case where the impeller is rotated in one direction, which is generally used in the past, the polishing / cleaning material is surely removed. The center position of the material projection area occurs at two positions, and the abrasive material is projected more evenly on the workpiece, but the impeller rotation is temporarily stopped when the impeller rotation is changed. Must be stopped (0.
5 to 1.5 minutes), and as a result, new problems such as a longer time required for the blasting treatment occur. The present invention has been made in view of the above circumstances, and an object thereof is to carry out polishing with a centrifugal abrasive cleaning material projection device capable of projecting the abrasive cleaning material more uniformly onto the object to be treated. It is to provide a material projection method.

【0004】[0004]

【課題を解決するための手段】上記の目的を達成するた
めに本発明における遠心式研掃材投射装置における研掃
材投射領域の制御方法は、インペラの回転により研掃材
に遠心力を付与して研掃材を投射する遠心式研掃材投射
装置を用いて被処理品をバッチ式に研掃するようにした
研掃方法における研掃材の投射方法であって、一研掃工
程中に、前記研掃材の投射領域の中心位置を所定の区域
内で移動させるようにしたことを特徴とする。
In order to achieve the above object, a method of controlling a polishing / blasting material projection area in a centrifugal type polishing / polishing material projection apparatus according to the present invention is to apply a centrifugal force to the polishing / cleaning material by rotating an impeller. A method of projecting a polishing / cleaning material in a batch-type polishing / cleaning method, in which a workpiece is batch-cleaned using a centrifugal polishing / cleaning material projection device In addition, the center position of the projection area of the abrasive material is moved within a predetermined area.

【0005】なお、インペラの回転方向は、第1回目の
研掃工程(1バッチ)と第2回目の研掃工程とは逆にし
ても良い。また、研掃材の投射領域の中心位置を移動さ
せる速度は、被処理品の形態に応じて適宜選択すること
ができる。
The direction of rotation of the impeller may be reversed between the first polishing step (1 batch) and the second polishing step. Further, the speed of moving the center position of the projection area of the abrasive material can be appropriately selected according to the form of the article to be processed.

【0006】[0006]

【実施例】本発明の一実施例について図1〜図3に基づ
き詳細に説明する。本発明の実施に使用する遠心式研掃
材投射装置は、図示しない無端状エプロンの回転により
被処理品を転動させるようにした研掃室を備えて被処理
品をバッチ式に研掃するキャビネットに装着してある。
そして、この遠心式研掃材投射装置は、図1に示すよう
に、遠心式研掃材投射機構1と、コントロールゲージを
作動するコントロールゲージ作動機構2とで構成してあ
る。そして、遠心式研掃材投射機構1においては、図2
に示すように、インペラ3を包囲するカバー本体4の右
側壁外面に、中央部に孔5を有する補助カバー6が装着
してあり、孔5にはコロガリ軸受7が嵌着してある。コ
ロガリ軸受7の内側には短尺の円筒体8が嵌着してあっ
て、円筒体8は前記カバー本体4の側壁外面に垂直な中
心軸を有して垂直面内で回転可能になっている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail with reference to FIGS. The centrifugal abrasive cleaning material projection device used in the practice of the present invention is equipped with an abrasive cleaning chamber adapted to roll an object to be processed by rotation of an endless apron (not shown), and to inspect the object to be processed in batches. It is installed in the cabinet.
As shown in FIG. 1, this centrifugal abrasive cleaning / projecting apparatus is composed of a centrifugal abrasive cleaning / projecting material projection mechanism 1 and a control gauge operating mechanism 2 for operating a control gauge. Then, in the centrifugal abrasive cleaning projection mechanism 1, as shown in FIG.
As shown in FIG. 3, an auxiliary cover 6 having a hole 5 in the center is mounted on the outer surface of the right side wall of the cover body 4 surrounding the impeller 3, and the roller bearing 7 is fitted in the hole 5. A short cylindrical body 8 is fitted inside the roller bearing 7, and the cylindrical body 8 has a central axis perpendicular to the outer surface of the side wall of the cover body 4 and is rotatable in a vertical plane. .

【0007】また、前記円筒体8には、この円筒体8を
貫通するとともに前記インペラ3内に位置するコントロ
ールゲージ9の右端が、その鍔部10aを円筒体8に掛
止させて着脱自在に取り付けてあり、コントロールゲー
ジ9は、研掃材排出口10bを有し、かつその右端に
は、ゴム製の環状弾性部材11を介して導入筒12の左
端が当接させてあり、導入筒12はコントロールゲージ
9と挟持機構13とをもって着脱自在に挟持されてい
る。そして、挟持機構13は、図2に示すように、前記
円筒体8の右端に装着した押え部材14を介して前記補
助カバー6に取り付けた前後方向へ延びる支持部材15
と、支持部材15に螺着した押えボルト16とで構成し
てある(図1参照)。
Further, the right end of the control gauge 9 which penetrates the cylindrical body 8 and is located in the impeller 3 is detachably attached to the cylindrical body 8 by engaging the flange portion 10a with the cylindrical body 8. The control gauge 9 has a polishing / cleaning material discharge port 10b, and the right end of the control gauge 9 is in contact with the left end of the introduction tube 12 via a rubber-made elastic elastic member 11. Is detachably held by the control gauge 9 and the holding mechanism 13. As shown in FIG. 2, the holding mechanism 13 includes a support member 15 attached to the auxiliary cover 6 via a holding member 14 attached to the right end of the cylindrical body 8 and extending in the front-rear direction.
And a holding bolt 16 screwed to the support member 15 (see FIG. 1).

【0008】また、図2に示すように、前記コロガリ軸
受7における転動体7aの左側位置には環状の充填部材
17が装着してあり、充填部材17は、フェルトまたは
金属繊維を固めて製造した構造を成していてある程度の
伸縮性を有しており、かつ補助カバー6の左面に取り付
けたライナ18により押えられるようにして支持されて
いる。
Further, as shown in FIG. 2, an annular filling member 17 is mounted on the left side of the rolling element 7a in the roller bearing 7, and the filling member 17 is manufactured by solidifying felt or metal fiber. It has a structure and has a certain degree of elasticity, and is supported by being pressed by a liner 18 attached to the left side of the auxiliary cover 6.

【0009】また、前記コントロールゲージ作動機構2
は、支持部材20を介して上下動可能に枢支して配設し
た電動シリンダ21と、電動シリンダ21のピストンロ
ッドの先端に螺着されて前記円筒体8にピン連結された
調節部材22とで構成してある。そして、前記電動シリ
ンダ21の伸縮作動により、コントロールゲージ9は円
筒体8を介して正逆回転するようになっている。なお、
図中23はカバーライナ、24は導入管である。
Further, the control gauge operating mechanism 2
Is an electric cylinder 21 pivotally supported so as to be vertically movable via a support member 20, and an adjusting member 22 screwed to a tip of a piston rod of the electric cylinder 21 and pin-connected to the cylindrical body 8. It is composed of. The control gauge 9 is rotated forward and backward through the cylindrical body 8 by the expansion and contraction operation of the electric cylinder 21. In addition,
In the figure, 23 is a cover liner, and 24 is an introduction pipe.

【0010】次に、このように構成した遠心式研掃材投
射装置を用いて本発明の方法により被処理品をバッチ式
に研掃し、従来の研掃材投射方法と比較試験を行った。
すなわち、図示しないキャビネットに被処理品として配
管継手を投入した後、インペラを一方方向へ回転させて
研掃材を投射し、かつ一研掃工程中にコントロールゲー
ジ作動機構2の電動シリンダ21を伸縮作動させて2回
/分の割合で前記研掃材の投射領域の中心位置を所定の
区域内で往復移動させる。一方、比較のために、同様に
して配管継手をキャビネットに投入した後、インペラ3
を一方方向へ回転させて研掃材を投射したり、またイン
ペラ3を所定時間一方方向へ回転させた後一時停止させ
てさらにインペラ3を反対方向へ回転させて研掃材を投
射し、配管継手を研掃した。そして、5%硫酸銅法を用
いて配管継手の清掃度を測定し、その結果を図3に示
す。
Then, the centrifugal abrasive cleaning material projecting device thus constructed was used to batch-process the objects to be treated by the method of the present invention, and a comparative test was conducted with the conventional abrasive cleaning material projecting method. .
That is, after inserting a pipe joint as an article to be processed into a cabinet (not shown), the impeller is rotated in one direction to project the polishing material, and the electric cylinder 21 of the control gauge operating mechanism 2 is expanded and contracted during one polishing step. It is operated to reciprocate the center position of the projection area of the abrasive cleaning material within a predetermined area at a rate of 2 times / minute. On the other hand, for comparison, after inserting the pipe joint into the cabinet in the same manner, the impeller 3
To rotate the impeller 3 in one direction to project the abrasive, or to rotate the impeller 3 in one direction for a predetermined time and then temporarily stop the impeller 3 to rotate in the opposite direction to project the abrasive. The fitting was cleaned. Then, the cleaning degree of the pipe joint was measured using the 5% copper sulfate method, and the result is shown in FIG.

【0011】なお、5%硫酸銅法による清掃度とは、研
掃後の配管継手に硫酸銅液を塗布して金属部に銅を析出
させるとともに砂部を黒くし、そのときのある測定面積
における銅析出面積の占める割合をいう。図3による
と、本発明の方法では研掃時間12分で所定の清掃度を
得ることができたが、インペラを正回転・逆回転させる
方法では16分、一方方向へ回転される方法では20
分、それぞれ研掃時間がかかった。したがって、図3か
らは、本発明の方法が、従来の方法と比較して研掃時間
を大幅に短縮することができることが判る。
The degree of cleaning by the 5% copper sulphate method means that the pipe joint after scouring and cleaning is coated with copper sulphate solution to deposit copper on the metal part and blacken the sand part, and a certain measurement area at that time The ratio of the copper deposition area in the above. According to FIG. 3, in the method of the present invention, a predetermined cleaning degree could be obtained in a polishing time of 12 minutes, but in the method of rotating the impeller forward and backward, it was 16 minutes, and in the method of rotating it in one direction, it was 20 minutes.
Each time, it took time to clean. Therefore, it can be seen from FIG. 3 that the method of the present invention can significantly shorten the polishing time as compared with the conventional method.

【0012】なお、インペラ3の回転方向は、第1回目
の研掃工程(1バッチ)で正回転とした場合、第2回目
の研掃工程では逆回転させるようにする。このように、
インペラを正転と逆転の両方を行うことにより、インペ
ラを構成するブレードの表裏両面を使用することにな
り、インペラを一方方向だけに回転させてブレードの片
面だけを使用する場合に比較して寿命が大幅に永くな
る。
It should be noted that the rotation direction of the impeller 3 is set such that, when the impeller 3 is rotated in the normal direction in the first polishing step (1 batch), it is rotated in the reverse direction in the second polishing step. in this way,
By performing both forward and reverse rotations of the impeller, both front and back surfaces of the blades that make up the impeller are used, and the life is longer than when the impeller is rotated in only one direction and only one side of the blade is used. Will be significantly longer.

【0013】[0013]

【発明の効果】以上の説明から明らかなように本発明
は、一研掃工程中に、研掃材の投射領域の中心位置を所
定の区域内で移動させるようにしたから、研掃材を被処
理品に対してさらに一様に投射することができるため、
従来の研掃材投射方法に比べて研掃処理に必要な時間を
大幅に短くすることが可能になり、しかも、インペラを
バッチ毎に正回転および逆回転させることにより、研掃
材をディストリビュータおよびコントロールゲージにお
いて2方向へ流すことになるため、コントロールゲージ
の片寄り摩耗がなくなり、インペラを一方方向だけに回
転させる従来の研掃材投射方法に比べてディストリビュ
ータおよびコントロールゲージの寿命が永くなるなどの
優れた効果を奏する。
As is apparent from the above description, according to the present invention, the center position of the projection area of the abrasive cleaning material is moved within a predetermined area during one polishing operation. Since it is possible to project more evenly on the object to be processed,
Compared with the conventional method of projecting abrasives, the time required for abrasive cleaning can be significantly shortened, and moreover, by rotating the impeller forward and backward for each batch, the abrasive cleaning agent Since the control gage flows in two directions, uneven wear of the control gage is eliminated, and the life of the distributor and control gage is extended compared to the conventional method of projecting abrasives by rotating the impeller in only one direction. It has an excellent effect.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の研掃材投射方法の実施に使用する遠心
式投射装置の正面図である。
FIG. 1 is a front view of a centrifugal projection device used for carrying out a polishing agent projection method of the present invention.

【図2】図1のA−A断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】清掃度と研掃時間との関係について、本発明の
研掃材投射方法と従来の研掃材投射方法とを比較するた
めのグラフである。
FIG. 3 is a graph for comparing the cleaning / cleaning material projection method of the present invention and the conventional cleaning / cleaning material projection method with respect to the relationship between the cleaning degree and the cleaning / cleaning time.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 インペラの回転により研掃材に遠心力を
付与して研掃材を投射する遠心式研掃材投射装置を用い
て被処理品をバッチ式に研掃するようにした研掃方法に
おける研掃材の投射方法であって、一研掃工程中に、前
記研掃材の投射領域の中心位置を所定の区域内で移動さ
せるようにしたことを特徴とする遠心式研掃材投射装置
による研掃材投射方法。
1. A polishing and cleaning method in which a workpiece is batch-cleaned by using a centrifugal-type cleaning-and-cleaning-material projection device that applies a centrifugal force to the cleaning and cleaning material by rotating an impeller to project the cleaning and cleaning material. A method of projecting a polishing / cleaning material in the method, wherein a center position of a projection area of the polishing / cleaning material is moved within a predetermined area during one polishing / cleaning step. Method of projecting abrasive cleaning material with a projection device.
JP21256095A 1995-07-28 1995-07-28 Abrasive blasting method by centrifugal blasting equipment Expired - Fee Related JP3305924B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21256095A JP3305924B2 (en) 1995-07-28 1995-07-28 Abrasive blasting method by centrifugal blasting equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21256095A JP3305924B2 (en) 1995-07-28 1995-07-28 Abrasive blasting method by centrifugal blasting equipment

Publications (2)

Publication Number Publication Date
JPH0938862A true JPH0938862A (en) 1997-02-10
JP3305924B2 JP3305924B2 (en) 2002-07-24

Family

ID=16624723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21256095A Expired - Fee Related JP3305924B2 (en) 1995-07-28 1995-07-28 Abrasive blasting method by centrifugal blasting equipment

Country Status (1)

Country Link
JP (1) JP3305924B2 (en)

Also Published As

Publication number Publication date
JP3305924B2 (en) 2002-07-24

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