JPH09328336A - Coating film having photocatalyst activity and composition forming the same coating film - Google Patents
Coating film having photocatalyst activity and composition forming the same coating filmInfo
- Publication number
- JPH09328336A JPH09328336A JP8146254A JP14625496A JPH09328336A JP H09328336 A JPH09328336 A JP H09328336A JP 8146254 A JP8146254 A JP 8146254A JP 14625496 A JP14625496 A JP 14625496A JP H09328336 A JPH09328336 A JP H09328336A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- composition
- component
- coating film
- fine particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 26
- 238000000576 coating method Methods 0.000 title claims abstract description 26
- 239000000203 mixture Substances 0.000 title claims abstract description 19
- 230000000694 effects Effects 0.000 title abstract description 7
- 239000011941 photocatalyst Substances 0.000 title abstract description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 39
- 239000010419 fine particle Substances 0.000 claims abstract description 27
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 239000002245 particle Substances 0.000 claims abstract description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 20
- 239000000126 substance Substances 0.000 abstract description 11
- -1 acetate compound Chemical class 0.000 abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 239000013522 chelant Substances 0.000 abstract description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- 239000005046 Chlorosilane Substances 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 34
- 229910010413 TiO 2 Inorganic materials 0.000 description 26
- 238000012360 testing method Methods 0.000 description 25
- 239000003795 chemical substances by application Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- 239000011521 glass Substances 0.000 description 14
- 230000001699 photocatalysis Effects 0.000 description 10
- 238000004528 spin coating Methods 0.000 description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 9
- 239000006185 dispersion Substances 0.000 description 8
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 6
- 230000003197 catalytic effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 150000003609 titanium compounds Chemical class 0.000 description 3
- 229910052726 zirconium Inorganic materials 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000000844 anti-bacterial effect Effects 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000001877 deodorizing effect Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- YOBOXHGSEJBUPB-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;zirconium Chemical compound [Zr].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O YOBOXHGSEJBUPB-MTOQALJVSA-N 0.000 description 1
- 241000208125 Nicotiana Species 0.000 description 1
- 235000002637 Nicotiana tabacum Nutrition 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NOKSMMGULAYSTD-UHFFFAOYSA-N [SiH4].N=C=O Chemical class [SiH4].N=C=O NOKSMMGULAYSTD-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical group [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 230000000843 anti-fungal effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- SGNLDVYVSFANHW-UHFFFAOYSA-N pentane-2,4-dione;zirconium Chemical compound [Zr].CC(=O)CC(C)=O SGNLDVYVSFANHW-UHFFFAOYSA-N 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Catalysts (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ガラス、プラスチ
ック、金属、セラミックスなどの各種基材に汚れの分解
性、防曇性、脱臭性、防かび性、抗菌性を付与し、太陽
光、蛍光灯等のエネルギーを有効利用可能な光触媒活性
被膜、及び該被膜を形成するための組成物に関する。TECHNICAL FIELD The present invention imparts stain decomposability, antifogging property, deodorizing property, mold resistance and antibacterial property to various substrates such as glass, plastic, metal, ceramics, etc. The present invention relates to a photocatalytically active coating capable of effectively utilizing energy of a lamp or the like, and a composition for forming the coating.
【0002】[0002]
【従来の技術】環境問題等の顕在化に伴い、室内空間に
おける脱臭性とともに室内及び室外のガラス、外壁材、
タイル等の建築材料の防汚性、防かび性、抗菌性、防曇
性等が求められている。また、建築材料に限らず家電製
品、事務用品、各種車両等の構成材料に関しても同様の
特性が要求されてきている。2. Description of the Related Art With the emergence of environmental problems and the like, deodorizing properties in the indoor space and indoor and outdoor glass, outer wall materials,
Building materials such as tiles are required to have antifouling properties, antifungal properties, antibacterial properties, antifog properties, and the like. Moreover, similar characteristics are required not only for building materials but also for constituent materials such as home electric appliances, office supplies and various vehicles.
【0003】こうした要求に対する従来技術としてはT
iO2 に代表される半導体光触媒物質を、スプレー法、
スピン法、ディップ法、スパッタ法等の従来公知の方法
で基材表面に形成することが提案されていた(特開平6
−278241)。As a conventional technique for such a requirement, T is
The semiconductor photocatalyst substance represented by iO 2, spraying,
It has been proposed to form it on the surface of the substrate by a conventionally known method such as a spin method, a dip method, a sputtering method, etc.
-278241).
【0004】しかし、従来技術で形成した被膜は、触媒
活性、機械的強度及びその耐薬品性が不充分であったた
め、使用中に触媒活性が低下したり、傷ついたりして実
用的観点からは満足しえなかった。However, since the coating formed by the conventional technique has insufficient catalytic activity, mechanical strength and chemical resistance, the catalytic activity is lowered or scratched during use, and from a practical point of view. I wasn't satisfied.
【0005】また、従来提案されている被膜は、その膜
の屈折率が大きいためガラス等の透明材料上に被膜を形
成すると強い干渉縞が発生し意匠性に問題を残してい
た。さらに、従来の提案は光触媒活性を高めるために、
基材と光触媒層の間にSiO2膜等の中間層を設けてお
り、コスト等の観点からも不利なものであった。Further, the conventionally proposed coating has a large refractive index, so that when the coating is formed on a transparent material such as glass, strong interference fringes are generated, leaving a problem in design. Furthermore, conventional proposals have been made to enhance photocatalytic activity.
An intermediate layer such as a SiO 2 film is provided between the base material and the photocatalyst layer, which is disadvantageous from the viewpoint of cost and the like.
【0006】[0006]
【発明が解決しようとする課題】本発明は中間層を設け
る等の特別な前処理を必要とせず、基材に直接塗布する
だけで光触媒活性、機械的強度及び耐薬品性が優れた被
膜が形成可能な光触媒活性を有する被膜形成用組成物、
該組成物を用いて形成した光触媒活性を有する被膜とそ
の製造方法、及び該被膜を有する基材の提供を目的とす
る。The present invention does not require a special pretreatment such as providing an intermediate layer, and a film having excellent photocatalytic activity, mechanical strength and chemical resistance can be obtained by directly applying it to a substrate. A film-forming composition having photocatalytic activity that can be formed;
An object of the present invention is to provide a film having photocatalytic activity formed by using the composition, a method for producing the film, and a substrate having the film.
【0007】[0007]
【課題を解決するための手段】本発明は、(1)平均粒
子径が100nm未満のTiO2 微粒子(以下、化合物
(1)ともいう)と、(2)Zr元素含有化合物(以
下、化合物(2)ともいう)と、(3)Si元素含有化
合物(以下、化合物(3)ともいう)とを含み、(1)
に対する(2)、(3)の重量比が、(1):(ZrO
2 換算の(2)):(SiO2 換算の(3))=1:
0.02〜0.5:0.2〜2.5である組成物を提供
する。The present invention provides (1) TiO 2 fine particles having an average particle size of less than 100 nm (hereinafter, also referred to as compound (1)) and (2) a Zr element-containing compound (hereinafter, compound ( (2)) and (3) Si element-containing compound (hereinafter, also referred to as compound (3)), and (1)
The weight ratio of (2) and (3) to (1) :( ZrO
2 conversion (2)): (SiO 2 conversion (3)) = 1:
A composition is provided that is 0.02-0.5: 0.2-2.5.
【0008】本発明に用いる化合物(1)は触媒活性を
発現するための必須成分であり、平均粒子径100nm
未満の微粒子である。TiO2 微粒子の形状に特に制限
はないが、球状、針状形態のものが膜の緻密性を向上さ
せ、機械的強度を高められる点で好ましい。The compound (1) used in the present invention is an essential component for expressing the catalytic activity, and has an average particle diameter of 100 nm.
Is less than fine particles. The shape of the TiO 2 fine particles is not particularly limited, but spherical and acicular shapes are preferable because they can improve the denseness of the film and increase the mechanical strength.
【0009】また、微粒子の平均粒子径は100nm以
上では膜の外観(特に透明性)、機械的強度の点で良好
な物性が得られない。また、触媒活性の観点からTiO
2 の結晶形態はアナターゼ型が好ましい。Further, if the average particle size of the fine particles is 100 nm or more, good physical properties cannot be obtained in terms of film appearance (particularly transparency) and mechanical strength. Further, from the viewpoint of catalytic activity, TiO 2
The crystal form of 2 is preferably anatase type.
【0010】本発明の特徴の1つはTiO2 源としてあ
らかじめ微粒子化した材料を用いたことにある。このも
のは各種チタン化合物、(例えば、チタンアルコキシ
ド、チタンアセチルアセトン化合物、チタンオクチレン
グリコール化合物等の各種チタンキレート化合物等)を
熱分解して得られるTiO2 膜に比べ、触媒活性及び機
械的強度のバランスが優れている。この理由は以下のよ
うに推察される。One of the characteristics of the present invention is that a material which has been made into fine particles is used as a TiO 2 source. This product has a catalytic activity and mechanical strength higher than that of a TiO 2 film obtained by thermally decomposing various titanium compounds (for example, various titanium chelate compounds such as titanium alkoxide, titanium acetylacetone compound and titanium octylene glycol compound). Good balance. The reason is presumed as follows.
【0011】TiO2 微粒子を用いた膜は微粒子の連鎖
構造により、機械的強度が確保され、かつ微粒子間の隙
間が細孔形成に寄与するため、結果として膜の表面積が
増大し触媒活性が高くなると考えられる。一方、各種チ
タン化合物を熱分解した膜は、熱分解されて揮発部分が
多く存在するため、チタン化合物の連鎖構造がとりにく
く膜の緻密性にかけ、光触媒活性はそこそこ発現しても
機械的強度が発現しにくいと考えられる。The membrane using TiO 2 fine particles has a mechanical structure secured by the chain structure of the fine particles, and the gaps between the fine particles contribute to the formation of pores. As a result, the surface area of the membrane is increased and the catalytic activity is high. It is considered to be. On the other hand, a film obtained by thermally decomposing various titanium compounds has many volatilized parts by being thermally decomposed, so that the chain structure of the titanium compound is difficult to be taken, and the denseness of the film is exerted. It is considered to be difficult to develop.
【0012】本発明に用いる化合物(2)、(3)は膜
の耐久性、すなわち、機械的強度及び耐薬品性を飛躍的
に高めるための必須成分である。化合物(2)、(3)
はそれぞれZr元素、Si元素を含有する化合物であっ
て、熱処理工程の際に、ZrO2 、SiO2 成分となり
うる化合物である。The compounds (2) and (3) used in the present invention are essential components for dramatically improving the durability of the film, that is, the mechanical strength and chemical resistance. Compound (2), (3)
Are compounds containing Zr element and Si element, respectively, which can be ZrO 2 and SiO 2 components in the heat treatment step.
【0013】化合物(2)としては、ジルコニウムテト
ラアルコキシド、ジルコニウムアセチルアセトンキレー
ト化合物、ジルコニウムアルコキシアセチルアセトンキ
レート化合物、ジルコニウムアセテート化合物等が挙げ
られる。Examples of the compound (2) include zirconium tetraalkoxide, zirconium acetylacetone chelate compound, zirconium alkoxyacetylacetone chelate compound and zirconium acetate compound.
【0014】具体的には、Zr(acac)4 、Zr
(OR)4 、Zr(acac)(OR)3 、Zr(ac
ac)2 (OR)2 、Zr(acac)3 (OR)、Z
rO(OC2 H3 O2 )2 等が例示できる。ここでac
acはC5 H7 O2 のアセチルアセトンを、ORはOC
3 H7 、OC4 H9 等のアルコキシ基を意味する。Specifically, Zr (acac) 4 , Zr
(OR) 4 , Zr (acac) (OR) 3 , Zr (ac
ac) 2 (OR) 2 , Zr (acac) 3 (OR), Z
Examples thereof include rO (OC 2 H 3 O 2 ) 2 . Where ac
ac is C 5 H 7 O 2 acetylacetone, OR is OC
It means an alkoxy group such as 3 H 7 or OC 4 H 9 .
【0015】また、化合物(3)としては、アルコキシ
シラン化合物、クロロシラン化合物、イソシアネートシ
ラン化合物、又はそれらの部分加水分解生成物等が挙げ
られる。Examples of the compound (3) include alkoxysilane compounds, chlorosilane compounds, isocyanate silane compounds, and partial hydrolysis products thereof.
【0016】具体的には、Si(OR)4 、R1 Si
(OR)3 、R1 R2 Si(OR)2、Si(NCO)4
、R1 Si(NCO)3 、R1 R2 Si(NCO)
2 、エチルシリケート40(テトラエトキシシランの部
分加水分解生成物であって平均重合度が5であるもの)
等、及びそれらの部分加水分解生成物等が例示できる。
ここでR1 、R2 はアルキル基を意味する。Specifically, Si (OR) 4 , R 1 Si
(OR) 3 , R 1 R 2 Si (OR) 2 , Si (NCO) 4
, R 1 Si (NCO) 3 , R 1 R 2 Si (NCO)
2 , ethyl silicate 40 (a partial hydrolysis product of tetraethoxysilane and having an average degree of polymerization of 5)
Etc., and their partial hydrolysis products and the like.
Here, R 1 and R 2 mean an alkyl group.
【0017】化合物(2)、(3)は1種の材料に限定
されず、2種以上の化合物の混合物、共加水分解生成物
であってもよい。The compounds (2) and (3) are not limited to one kind of material, and may be a mixture of two or more kinds of compounds or a cohydrolysis product.
【0018】化合物(2)の化合物(1)に対する重量
比[(化合物(2)のZrO2 換算重量)/(1)]は
0.02〜0.5である。0.02より少ないと添加の
効果、機械的強度及び耐薬品性が発現せず、0.5より
多いと光触媒活性及び被膜の基材への密着性の低下を招
くためである。The weight ratio of compound (2) to compound (1) [(weight of compound (2) in terms of ZrO 2 ) / (1)] is 0.02 to 0.5. This is because if it is less than 0.02, the effect of addition, mechanical strength and chemical resistance are not expressed, and if it is more than 0.5, the photocatalytic activity and the adhesion of the coating to the substrate are deteriorated.
【0019】化合物(3)の化合物(1)に対する重量
比[(化合物(3)のSiO2 換算重量)/(1)]は
0.2〜2.5である。0.2未満では添加効果が発現
せず、機械的強度及び耐薬品性が向上せず、2.5より
多いと光触媒活性が低下するためである。A weight ratio of the compound (3) to the compound (1) [(weight of the compound (3) in terms of SiO 2 ) / (1)] is 0.2 to 2.5. This is because if it is less than 0.2, the effect of addition is not exhibited, the mechanical strength and chemical resistance are not improved, and if it is more than 2.5, the photocatalytic activity is lowered.
【0020】また、化合物(2)、(3)を各単独で用
いてもそこそこ機械的強度及び耐薬品性は向上するが、
本発明のように化合物(2)、(3)が共存する場合に
みられるような効果は期待できない。Further, if the compounds (2) and (3) are used alone, their mechanical strength and chemical resistance are improved to some extent.
The effects as seen when the compounds (2) and (3) coexist as in the present invention cannot be expected.
【0021】化合物(3)に対する化合物(2)の重量
比は特に限定されないが(化合物(2)のZrO2 換算
重量)/(化合物(3)のSiO2 換算重量)は、0.
05〜0.7であることが望ましい。0.05未満では
化合物(2)及び化合物(3)の相乗効果が得られにく
く、また、0.7超では化合物(2)の悪影響が出始
め、すなわち、基材への膜の密着性が低下するようにな
るためである。The weight ratio of the compound (2) to the compound (3) is not particularly limited, but (the ZrO 2 equivalent weight of the compound (2)) / (the SiO 2 equivalent weight of the compound (3)) is 0.
It is desirable that it is 05 to 0.7. If it is less than 0.05, the synergistic effect of the compound (2) and the compound (3) is difficult to obtain, and if it exceeds 0.7, the adverse effect of the compound (2) begins to appear, that is, the adhesion of the film to the substrate is This is because it will decrease.
【0022】本発明の組成物の塗布方法としては、スプ
レー塗布、スピンコート塗布、フレキソ印刷塗布、スク
リーン印刷塗布、ディップコート塗布、刷毛塗り、フロ
ーコート塗布等の方法が用いられる。As the method for applying the composition of the present invention, spray coating, spin coating, flexographic printing, screen printing, dip coating, brush coating, flow coating and the like can be used.
【0023】本発明の組成物を用いれば、従来技術のよ
うに被膜と基材との間にSiO2 膜のような中間層を設
ける必要がなく、直接基材に塗布し、熱処理することで
優れた光触媒活性、機械的強度及び耐薬品性を有する被
膜が得られる。すなわち、特別な前処理が必要なくコス
ト的にも有利な方法と考えられる。しかし、何らかの目
的で前処理を施すことは支障ない。By using the composition of the present invention, it is not necessary to provide an intermediate layer such as a SiO 2 film between the coating film and the substrate as in the prior art, and the composition can be directly applied to the substrate and heat treated. A film having excellent photocatalytic activity, mechanical strength and chemical resistance is obtained. That is, it is considered that the method is advantageous in terms of cost without requiring special pretreatment. However, there is no problem in performing pretreatment for any purpose.
【0024】本発明における熱処理条件は、温度は80
〜700℃、時間は5〜60分の範囲が好ましく、温度
プロファイルは適宜目的に応じて設定できる。本発明は
上記のように低温処理でも特性発現可能であるという特
徴を有する。The heat treatment condition in the present invention is that the temperature is 80.
The temperature profile can be set appropriately depending on the purpose. The present invention is characterized in that the characteristics can be exhibited even at low temperature treatment as described above.
【0025】被膜の厚さは30〜300nmに設定する
ことが好ましい。30nm未満では充分な光触媒活性が
得られにくく、また、300nm超では機械的強度が低
下するため、傷等が目立つようになり実用特性が低下す
るためである。The thickness of the coating is preferably set to 30 to 300 nm. This is because if it is less than 30 nm, it is difficult to obtain sufficient photocatalytic activity, and if it exceeds 300 nm, mechanical strength is lowered, so that scratches and the like become conspicuous and practical characteristics are lowered.
【0026】本発明における基材は特に限定されず、ガ
ラス、セラミックス、プラスチック、金属及びそれらの
複合体、積層体が利用できる。基材の表面は、基材その
ものの表面でも、表面処理された表面(例えば、ゾルゲ
ル膜、スパッタ膜、CVD膜、蒸着膜等が設けられたガ
ラス表面)などの基材そのものとは異なる材質の表面で
もよい。基材の形状は特に限定されず、平面状のもので
もよく、全面又は部分的に曲率を有するものなど、目的
に応じた任意の形状でよい。The substrate in the present invention is not particularly limited, and glass, ceramics, plastics, metals and their composites and laminates can be used. The surface of the substrate is made of a material different from that of the substrate itself such as a surface of the substrate itself or a surface-treated surface (for example, a glass surface provided with a sol-gel film, a sputter film, a CVD film, a vapor deposition film, etc.). It may be the surface. The shape of the base material is not particularly limited, and may be a planar shape, or an arbitrary shape depending on the purpose, such as a shape having a curvature on the whole surface or a part thereof.
【0027】[0027]
【実施例】実施例、比較例で用いた評価方法は次のとお
りである。EXAMPLES The evaluation methods used in Examples and Comparative Examples are as follows.
【0028】光触媒活性:タバコの悪臭成分であるアセ
トアルデヒドの光分解反応速度を評価した。実験は50
mm角の試料を3リットルの石英製角型反応管に入れ、
アセトアルデヒド蒸気を反応管に導入し、試料面での紫
外線強度が1.5mW/cm2 となるように石英反応管
外部から試料にブラックライトを照射し、アセトアルデ
ヒドの減少量をガスクロマトグラフで測定してアセトア
ルデヒド分解の速度を求めた。分解速度は単位時間、単
位面積当たりの重量減少量[μg/(h・cm2 )]で
表現した。Photocatalytic activity: The rate of photodecomposition of acetaldehyde, which is a malodorous component of tobacco, was evaluated. 50 experiments
Put the mm square sample in a 3 liter quartz square reaction tube,
Introduce acetaldehyde vapor into the reaction tube, irradiate the sample with black light from the outside of the quartz reaction tube so that the UV intensity on the surface of the sample becomes 1.5 mW / cm 2, and measure the decrease in acetaldehyde with a gas chromatograph. The rate of acetaldehyde decomposition was determined. The decomposition rate was expressed by the amount of weight loss per unit time and unit area [μg / (h · cm 2 )].
【0029】耐磨耗性:テーバー試験機にて荷重500
g、摩耗1000回行い、試験前後のヘーズの変化量を
求めた。Abrasion resistance: load of 500 on Taber tester
g, abrasion 1000 times, and the amount of change in haze before and after the test was determined.
【0030】外観品質:得られた試験片の外観を肉眼で
干渉縞の有無を確認した。Appearance quality: The appearance of the obtained test piece was visually checked for the presence of interference fringes.
【0031】防曇性:初期防曇性と耐久防曇性に分けて
次の方法で評価した。初期防曇性は息を試料に吹きかけ
曇りが発生するか否か肉眼で観察した。耐久防曇性は、
得られた試験片を60℃の温水に3日浸漬後、初期防曇
性と同様の方法で評価した。防曇性評価において、○は
曇り発生せず、×は曇り発生、とした。Anti-fogging property: Initial anti-fog property and durable anti-fog property were classified and evaluated by the following methods. The initial anti-fog property was visually observed by blowing a breath on the sample to see if fogging occurred. The durable anti-fog property is
The obtained test piece was immersed in warm water at 60 ° C. for 3 days and then evaluated in the same manner as the initial antifogging property. In the evaluation of the antifogging property, ∘ indicates that no fogging occurred, and x indicates that fogging occurred.
【0032】耐薬品性:0.1NのNaOH水溶液に2
4時間浸漬後、膜の外観に変化を肉眼で観察した。Chemical resistance: 2 in 0.1N NaOH aqueous solution
After soaking for 4 hours, changes in the appearance of the film were visually observed.
【0033】[実施例1]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量%、平
均粒子径60nm)56gに、エタノール478g、テ
トラメトキシシラン12.5g及びジルコニウムトリブ
トキシアセチルアセトネートZr(C5 H7 O3 )(O
Bu)3 2.3gを添加した。上記溶液を25℃で1時
間撹拌し処理剤1を得た。この場合、SiO2 換算重量
/TiO2 換算重量=0.87であり、ZrO2 換算重
量/TiO2 換算重量=0.09となる。Example 1 In 56 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles, average particle diameter 60 nm), 478 g of ethanol, 12.5 g of tetramethoxysilane and zirconium tributoxyacetylacetonate Zr ( C 5 H 7 O 3 ) (O
2.3 g of Bu) 3 were added. The above solution was stirred at 25 ° C. for 1 hour to obtain treating agent 1. In this case, the SiO 2 equivalent weight / TiO 2 equivalent weight = 0.87, and the ZrO 2 equivalent weight / TiO 2 equivalent weight = 0.09.
【0034】あらかじめ洗浄されたガラス基板に処理剤
1を1cc滴下し、スピンコート塗布し、その後650
℃で5分間熱処理し試験片を得た。本試験片の設けられ
た被膜の膜厚は86nmであった。この試験片の評価結
果を表1に示す(以下、同様)。1 cc of the treating agent 1 was dropped on a glass substrate which had been washed in advance, spin coating was performed, and then 650
A heat treatment was performed at 5 ° C for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 86 nm. The evaluation results of this test piece are shown in Table 1 (hereinafter the same).
【0035】[実施例2]実施例1において12.5g
のテトラメトキシシランを12.0gのエチルシリケー
ト40に変更した他は実施例1と同様の方法で試験片を
作成し評価した。[Example 2] 12.5 g in Example 1
A test piece was prepared and evaluated in the same manner as in Example 1 except that 12.0 g of ethyl silicate 40 was used in place of tetramethoxysilane in Example 1.
【0036】[実施例3]実施例1の平均粒子径60n
mの酸化チタン微粒子を平均粒子径を33nmのものに
変更した他は実施例1と同様の方法で試験片を作成し評
価した。Example 3 Average particle size of Example 1 60 n
A test piece was prepared and evaluated in the same manner as in Example 1 except that the titanium oxide fine particles of m had an average particle diameter of 33 nm.
【0037】[実施例4]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量%、平
均粒子径60nm)56gに、エタノール330g、テ
トラメトキシシラン4.3g及びZr(C5 H7 O3 )
(OBu)3 2.5gを添加した。上記溶液を25℃で
1時間撹拌し処理剤4を得た。この場合、SiO2 換算
重量/TiO2 換算重量=0.29であり、ZrO2 換
算重量/TiO2 換算重量=0.10となる。Example 4 In 56 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles, average particle diameter 60 nm) was added 330 g of ethanol, 4.3 g of tetramethoxysilane and Zr (C 5 H 7 O 3). )
2.5 g of (OBu) 3 was added. The above solution was stirred at 25 ° C. for 1 hour to obtain treating agent 4. In this case, the weight calculated as SiO 2 / the weight calculated as TiO 2 = 0.29, and the weight calculated as ZrO 2 / the weight calculated as TiO 2 = 0.10.
【0038】あらかじめ洗浄されたガラス基板に処理剤
4を1cc滴下し、スピンコート塗布し、その後650
℃で5分間熱処理し試験片を得た。本試験片の設けられ
た被膜の膜厚は86nmであった。1 cc of the treating agent 4 was dropped on a glass substrate which had been washed in advance, spin coating was performed, and then 650
A heat treatment was performed at 5 ° C for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 86 nm.
【0039】[実施例5]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量%、平
均粒子径60nm)56gに、エタノール395g、テ
トラメトキシシラン6.5g及びZr(C5 H7 O3 )
(OBu)3 5.0gを添加した。上記溶液を25℃で
1時間撹拌し処理剤5を得た。この場合、SiO2 換算
重量/TiO2 換算重量=0.45であり、ZrO2 換
算重量/TiO2 換算重量=0.20となる。Example 5 In 56 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles, average particle diameter 60 nm), 395 g of ethanol, 6.5 g of tetramethoxysilane and Zr (C 5 H 7 O 3 )
5.0 g of (OBu) 3 was added. The above solution was stirred at 25 ° C. for 1 hour to obtain treating agent 5. In this case, the weight calculated as SiO 2 / the weight calculated as TiO 2 = 0.45, and the weight calculated as ZrO 2 / the weight calculated as TiO 2 = 0.20.
【0040】あらかじめ洗浄されたガラス基板に処理剤
5を1cc滴下し、スピンコート塗布し、その後650
℃で5分間熱処理し試験片を得た。本試験片の設けられ
た被膜の膜厚は86nmであった。1 cc of the treating agent 5 was dropped on a glass substrate which had been washed in advance, spin coating was performed, and then 650
A heat treatment was performed at 5 ° C for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 86 nm.
【0041】[実施例6]実施例5において5.0gの
Zr(C5 H7 O3 )(OBu)3 のかわりに5.96
gのジルコニウムテトラアセチルアセトネートを用いた
他は実施例5と同様の方法で試験片を作成し評価した。Example 6 Instead of 5.0 g of Zr (C 5 H 7 O 3 ) (OBu) 3 in Example 5, 5.96 was used.
Test pieces were prepared and evaluated in the same manner as in Example 5 except that g of zirconium tetraacetylacetonate was used.
【0042】[比較例1]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量%、平
均粒子径60nm)56gに、エタノール455g、テ
トラメトキシシラン12.5gを添加した。上記溶液を
25℃で1時間撹拌し処理剤R1を得た。[Comparative Example 1] To 56 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles, average particle diameter 60 nm), 455 g of ethanol and 12.5 g of tetramethoxysilane were added. The above solution was stirred at 25 ° C. for 1 hour to obtain a treating agent R1.
【0043】あらかじめ洗浄されたガラス基板に処理剤
R1を1cc滴下し、スピンコート塗布し、その後65
0℃で5分間熱処理し試験片を得た。本試験片の設けら
れた被膜の膜厚は83nmであった。1 cc of the treating agent R1 was dropped on a glass substrate which had been washed in advance, spin coating was performed, and then 65
A heat treatment was performed at 0 ° C. for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 83 nm.
【0044】[比較例2]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量% 平
均粒子径60nm)56gに、エタノール446g、Z
r(C5 H7 O3)(OBu)3 22.0gを添加し
た。上記溶液を25℃で1時間撹拌し処理剤R2を得
た。[Comparative Example 2] 56 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles having an average particle diameter of 60 nm) was mixed with 446 g of ethanol and Z.
22.0 g of r (C 5 H 7 O 3 ) (OBu) 3 was added. The above solution was stirred at 25 ° C. for 1 hour to obtain a treating agent R2.
【0045】あらかじめ洗浄されたガラス基板に処理剤
R2を1cc滴下し、スピンコート塗布し、その後65
0℃で5分間熱処理し試験片を得た。本試験片の設けら
れた被膜の膜厚は86nmであった。1 cc of the treating agent R2 was dropped on a glass substrate which had been washed in advance, spin coating was performed, and then 65
A heat treatment was performed at 0 ° C. for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 86 nm.
【0046】[比較例3]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量%、平
均粒子径60nm)56gに、エタノール224gを添
加した。上記溶液を25℃で1時間撹拌し処理剤R3を
得た。[Comparative Example 3] 224 g of ethanol was added to 56 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles, average particle diameter 60 nm). The above solution was stirred at 25 ° C. for 1 hour to obtain a treating agent R3.
【0047】あらかじめ洗浄されたガラス基板に処理剤
R3を1cc滴下し、スピンコート塗布し、その後65
0℃で5分間熱処理し試験片を得た。本試験片の設けら
れた被膜の膜厚は92nmであった。1 cc of the treating agent R3 was dropped on a glass substrate which had been washed in advance, spin coating was performed, and then 65
A heat treatment was performed at 0 ° C. for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 92 nm.
【0048】[比較例4]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量% 平
均粒子径60nm)56gに、エタノール478g、テ
トラメトキシシラン1.43g及びZr(C5 H7 O
3 )(OBu)3 0.3gを添加した。上記溶液を25
℃で1時間撹拌し処理剤R4を得た。この場合、SiO
2 換算重量/TiO2 換算重量=0.10であり、Zr
O2 換算重量/TiO2 換算重量=0.01となる。Comparative Example 4 56 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles having an average particle diameter of 60 nm) was added to 478 g of ethanol, 1.43 g of tetramethoxysilane and Zr (C 5 H 7 O).
3 ) 0.3 g of (OBu) 3 was added. 25 above solution
It stirred at 1 degreeC for 1 hour, and obtained the processing agent R4. In this case, SiO
2 converted weight / TiO 2 converted weight = 0.10, and Zr
O 2 equivalent weight / TiO 2 equivalent weight = 0.01.
【0049】あらかじめ洗浄されたガラス基板に処理剤
R4を1cc滴下し、スピンコート塗布し、その後65
0℃で5分間熱処理し試験片を得た。本試験片の設けら
れた被膜の膜厚は85nmであった。1 cc of the treating agent R4 was dropped onto a glass substrate which had been washed in advance, spin coating was performed, and then 65
A heat treatment was performed at 0 ° C. for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 85 nm.
【0050】[比較例5]酸化チタン微粒子のエタノー
ル分散溶液(アナターゼTiO2 微粒子10重量% 平
均粒子径60nm)28gに、エタノール638g、テ
トラメトキシシラン21.6g及びZr(C5 H7 O
3 )(OBu)3 12.6gを添加した。上記溶液を2
5℃で1時間撹拌し処理剤R5を得た。この場合、Si
O2 換算重量/TiO2 換算重量=3.01であり、Z
rO2 換算重量/TiO2 換算重量=1.00となる。[Comparative Example 5] Ethanol 638 g, tetramethoxysilane 21.6 g and Zr (C 5 H 7 O) were added to 28 g of an ethanol dispersion solution of titanium oxide fine particles (10% by weight of anatase TiO 2 fine particles having an average particle diameter of 60 nm).
3 ) 12.6 g of (OBu) 3 was added. 2 above solution
It stirred at 5 degreeC for 1 hour, and obtained the processing agent R5. In this case Si
O 2 equivalent weight / TiO 2 equivalent weight = 3.01 and Z
rO 2 converted weight / TiO 2 converted weight = 1.00.
【0051】あらかじめ洗浄されたガラス基板に処理剤
R5を1cc滴下し、スピンコート塗布し、その後65
0℃で5分間熱処理し試験片を得た。本試験片の設けら
れた被膜の膜厚は78nmであった。1 cc of the treating agent R5 was dropped on a glass substrate which had been washed in advance, and spin coating was performed.
A heat treatment was performed at 0 ° C. for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 78 nm.
【0052】[比較例6]テトラブトキシチタン23.
8gに、エタノール478g、テトラメトキシシラン1
2.5g及びZr(C5 H7 O3 )(OBu)3 2.3
gを添加した。上記溶液を25℃で1時間撹拌し処理剤
R6を得た。この場合、SiO2 換算重量/TiO2 換
算重量=0.87であり、ZrO2 換算重量/TiO2
換算重量=0.09となる。Comparative Example 6 Tetrabutoxytitanium 23.
8g, ethanol 478g, tetramethoxysilane 1
2.5 g and Zr (C 5 H 7 O 3 ) (OBu) 3 2.3
g was added. The above solution was stirred at 25 ° C. for 1 hour to obtain a treating agent R6. In this case, the weight calculated as SiO 2 / the weight calculated as TiO 2 = 0.87, and the weight calculated as ZrO 2 / TiO 2
The converted weight is 0.09.
【0053】あらかじめ洗浄されたガラス基板に処理剤
R6を1cc滴下し、スピンコート塗布し、その後65
0℃で5分間熱処理し試験片を得た。本試験片の設けら
れた被膜の膜厚は77nmであった。1 cc of the treating agent R6 was dropped on a glass substrate which had been washed in advance, spin coating was performed, and then 65
A heat treatment was performed at 0 ° C. for 5 minutes to obtain a test piece. The film thickness of the coating provided on this test piece was 77 nm.
【0054】[0054]
【表1】 [Table 1]
【0055】[0055]
【発明の効果】本発明の組成物を用いることにより、中
間層を設ける等の特別な前処理を必要とせず、基材に直
接塗布するだけで光触媒活性、機械的強度及び耐薬品性
が優れた被膜を形成できる。EFFECTS OF THE INVENTION By using the composition of the present invention, photocatalytic activity, mechanical strength and chemical resistance are excellent by simply applying it directly to a substrate without requiring a special pretreatment such as providing an intermediate layer. Can form a coated film.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 遠藤 栄治 神奈川県横浜市神奈川区羽沢町1150番地 旭硝子株式会社中央研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Eiji Edo 1150 Hazawa-machi, Kanagawa-ku, Yokohama, Kanagawa Prefecture Asahi Glass Co., Ltd. Central Research Laboratory
Claims (4)
O2 微粒子と、(2)Zr元素含有化合物と、(3)S
i元素含有化合物とを含み、(1)に対する(2)、
(3)の重量比が、(1):(ZrO2 換算の
(2)):(SiO2 換算の(3))=1:0.02〜
0.5:0.2〜2.5である組成物。1. Ti having an average particle size of less than 100 nm.
O 2 fine particles, (2) Zr element-containing compound, (3) S
and a compound containing an i element, (2) with respect to (1),
The weight ratio of (3) is (1): ((2) in terms of ZrO 2 ): ((3) in terms of SiO 2 ) = 1: 0.02
A composition that is 0.5: 0.2 to 2.5.
の製造方法であって、請求項1の組成物を直接基材に塗
布した後、熱処理を施す、光触媒活性を有する被膜の製
造方法。2. A method for producing a photocatalytically active coating formed on a substrate, which comprises directly applying the composition of claim 1 and then subjecting the composition to heat treatment. .
を有する基材。3. A substrate having a coating formed using the composition of claim 1.
項3の基材。4. The substrate according to claim 3, wherein the film thickness of the coating is 30 to 300 nm.
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JP14625496A JP3852131B2 (en) | 1996-06-07 | 1996-06-07 | Film having photocatalytic activity and composition for forming the same |
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JP14625496A JP3852131B2 (en) | 1996-06-07 | 1996-06-07 | Film having photocatalytic activity and composition for forming the same |
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JP3852131B2 JP3852131B2 (en) | 2006-11-29 |
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Cited By (11)
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WO1999033565A1 (en) * | 1997-12-24 | 1999-07-08 | Sumitomo Metal Industries, Ltd. | Titanium oxide-based photocatalyst, process for preparing the same, and use thereof |
EP1016459A1 (en) * | 1997-06-20 | 2000-07-05 | Sumitomo Metal Industries Limited | Titanium oxide-based photocatalyst, process for preparing the same, and use thereof |
EP1036826A1 (en) * | 1997-12-02 | 2000-09-20 | Showa Denko Kabushiki Kaisha | Photocatalytic oxide composition, thin film, and composite |
EP1081108A1 (en) * | 1999-09-02 | 2001-03-07 | Central Glass Company, Limited | Article with photocatalytic film |
WO2004011554A1 (en) * | 2002-07-26 | 2004-02-05 | Matsushita Electric Works, Ltd. | Photocatalyst-containing silicone resin composition, and coated article having cured coating film therefrom |
JP2007161770A (en) * | 2005-12-09 | 2007-06-28 | Sumitomo Osaka Cement Co Ltd | Coating fluid for forming hydrophilic film, its manufacturing method, hydrophilic film and method of forming hydrophilic film |
US7521391B2 (en) | 2004-03-17 | 2009-04-21 | Sumitomo Chemical Company, Limited | Coating composition of photocatalyst |
EP2133311A1 (en) | 2008-06-09 | 2009-12-16 | Sumitomo Chemical Company, Limited | Zirconium oxalate sol |
JP2010270094A (en) * | 2008-06-09 | 2010-12-02 | Sumitomo Chemical Co Ltd | Zirconium oxalate sol |
US8404307B2 (en) | 2002-03-27 | 2013-03-26 | Sumitomo Osaka Cement Co., Ltd. | Hydrophilic film, process for producing same, and coating material for forming hydrophilic film |
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1996
- 1996-06-07 JP JP14625496A patent/JP3852131B2/en not_active Expired - Fee Related
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1016459A1 (en) * | 1997-06-20 | 2000-07-05 | Sumitomo Metal Industries Limited | Titanium oxide-based photocatalyst, process for preparing the same, and use thereof |
EP1016459A4 (en) * | 1997-06-20 | 2001-02-07 | Sumitomo Metal Ind | Titanium oxide-based photocatalyst, process for preparing the same, and use thereof |
EP1036826A1 (en) * | 1997-12-02 | 2000-09-20 | Showa Denko Kabushiki Kaisha | Photocatalytic oxide composition, thin film, and composite |
EP1036826A4 (en) * | 1997-12-02 | 2001-02-07 | Showa Denko Kk | Photocatalytic oxide composition, thin film, and composite |
WO1999033565A1 (en) * | 1997-12-24 | 1999-07-08 | Sumitomo Metal Industries, Ltd. | Titanium oxide-based photocatalyst, process for preparing the same, and use thereof |
EP1081108A1 (en) * | 1999-09-02 | 2001-03-07 | Central Glass Company, Limited | Article with photocatalytic film |
US6582839B1 (en) | 1999-09-02 | 2003-06-24 | Central Glass Company, Limited | Article with photocatalytic film |
US8404307B2 (en) | 2002-03-27 | 2013-03-26 | Sumitomo Osaka Cement Co., Ltd. | Hydrophilic film, process for producing same, and coating material for forming hydrophilic film |
KR100688307B1 (en) * | 2002-07-26 | 2007-03-02 | 마츠시다 덴코 가부시키가이샤 | Photocatalyst-containing silicone resin composition, and coated article having cured coating film therefrom |
WO2004011554A1 (en) * | 2002-07-26 | 2004-02-05 | Matsushita Electric Works, Ltd. | Photocatalyst-containing silicone resin composition, and coated article having cured coating film therefrom |
US7521391B2 (en) | 2004-03-17 | 2009-04-21 | Sumitomo Chemical Company, Limited | Coating composition of photocatalyst |
JP2007161770A (en) * | 2005-12-09 | 2007-06-28 | Sumitomo Osaka Cement Co Ltd | Coating fluid for forming hydrophilic film, its manufacturing method, hydrophilic film and method of forming hydrophilic film |
EP2133311A1 (en) | 2008-06-09 | 2009-12-16 | Sumitomo Chemical Company, Limited | Zirconium oxalate sol |
JP2010270094A (en) * | 2008-06-09 | 2010-12-02 | Sumitomo Chemical Co Ltd | Zirconium oxalate sol |
US8298979B2 (en) | 2008-06-09 | 2012-10-30 | Daiichi Kigenso Kagaku Kogyo Co., Ltd. | Zirconium oxalate sol |
US20200079687A1 (en) * | 2017-05-04 | 2020-03-12 | Agc Glass Europe | Coated substrate |
US11008248B2 (en) * | 2017-05-04 | 2021-05-18 | Agc Glass Europe | Coated substrate |
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