JPH09323472A - Forming method for liquid crystal color filter and the filter obtained by the method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To manufacture a low-cost liquid crystal color filter by dividing and discharging photoreactive resin in which colorants are dispersed in photosensitive resin and forming continued stripes on a board on a support fed at a predetermined speed, then emitting a light and curing the stripes, and thereafter removing the unnecessary part of the stripes by developing. SOLUTION: A black matrix board is made of a glass board formed with a black matrix 2. Photoreactive resin in which R, G, B colorants are dispersed with photosensitive resin used as a base material is divided and discharged by a die while moving the board to form R, G, B stripes 6. Then, a light having a central wavelength of 365nm is emitted to the stripes 6 from a surface direction of the board by using a photomask to reactively curing the R, G, B stripes 6b. Thereafter, a development is executed, the stripes 6b on the matrix 2 of unreacted state are dissolved and removed by development, thereby obtaining a liquid color filter 5 formed with R, G, B pixels 3 in an opening 4 formed on the matrix board.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a liquid crystal color filter used in a liquid crystal display, and a structure of a liquid crystal color filter obtained by the production method.

[0002]

2. Description of the Related Art R conventionally used for displays and the like
The liquid crystal color filter including the GB and the black matrix is configured as a substrate independently of a counter substrate such as an array substrate. As a method for forming the black matrix, a photolithographic method of a metal thin film such as chromium, a photolithographic method of a black pigment resist, a printing method using a screen plate, a relief printing plate, an intaglio printing plate, and a lithographic printing plate as an original plate are used. The RGB is created by a photolithographic method of pigment resist, a method of printing pigment ink, electrodeposition of paint, or the like. These methods are properly combined and used according to the size, shape, positional accuracy, cost, work efficiency, etc., according to their needs.

Among the above-mentioned methods, as in the conventional example shown in FIG. 21, a metal chrome thin film is etched by a photolithographic method to form a chrome thin film black matrix 21, and RGB has a pigment resist on the entire surface of the substrate. For a long time, the color filter 20 for liquid crystal, which is formed by a method of forming and combining the RGB dot patterns 22 by photolithography after coating, has been used most frequently.

[0004]

In the color filter 20 for liquid crystal produced by the conventional method, the manufacturing cost is high, and therefore another manufacturing method which is more inexpensive has been required. In addition, the RGB array can be selected freely and easily, the surface smoothness is good, the array and the RGB surface are almost the same, the surface step is small, and the power consumption of the equipment used is reduced. Fabrication methods and structures for increasing the aperture ratio have been required for liquid crystal color filters in order to improve the transmittance of the liquid crystal.

An object of the present invention is to provide a method for producing a color filter for liquid crystal, which can produce a color filter for liquid crystal at low cost.

[0006]

In order to solve this problem, in the method for producing a color filter for liquid crystal according to the present invention, the photoreactive resin is divided and discharged onto a support that runs in one direction at a constant speed. Then, after forming continuous stripes on the substrate, unnecessary portions of the stripes are removed to create RGB pixels.

According to the present invention, various kinds of RGB arrays can be freely and easily prepared, and the surface smoothness is good, the surface step is small, the aperture ratio is high, and the image quality is high. A color filter for liquid crystal can be manufactured at low cost.

[0008]

BEST MODE FOR CARRYING OUT THE INVENTION The invention according to claim 1 of the present invention divides a photoreactive resin in which a photosensitive resin is used as a base material and a colorant is dispersed on a support that runs in one direction at a constant speed. A method for producing a color filter for liquid crystal, in which a continuous linear line is formed on a substrate by discharging, and the linear line is irradiated with light, and then unnecessary portions of the linear line are removed by development to form RGB pixels. By irradiating the filaments formed by overlapping the photoreactive resin on the substrate, the filaments in the openings are cured by reaction and the filaments other than the openings are not reacted. The unreacted filaments are then dissolved to remove unnecessary portions, leaving only the filaments in the reaction-cured state, leaving the openings formed on the substrate. Can form RGB pixels.

Therefore, the amount of the RGB photoresist material used is 1/10 to 1 as compared with the conventionally used coating method such as the spinner method, since the photoresist material is consumed only for the necessary linear stripes. It becomes as small as / 20, the manufacturing cost can be reduced, and the color filter for liquid crystal can be obtained at low cost.

Regarding the performance, regarding the RGB arrangement, it is possible to easily create not only stripes but also deltas, diagonal mosaic arrays, etc., by the method of creating the printing stripes. Regarding smoothness, black matrix and array and R
Since the GBs can have the same thickness, a liquid crystal color filter having a small surface step and excellent smoothness can be produced. Regarding the aperture ratio, high-definition patterning can be performed, so that a black matrix having a narrow line width can be formed, and a high aperture ratio can be obtained.

The invention according to claim 2 is the method for producing a color filter for liquid crystal according to claim 1, wherein the divided discharge is performed by a die coating method using a die having a predetermined slit, width and pitch. In this method, the photoreactive resin is divided and discharged from a die for die coating having predetermined slits, widths and pitches while moving the support, and the filaments can be formed by superposing on the substrate.

According to a third aspect of the present invention, there is provided a method for producing a color filter for liquid crystal according to the first aspect, wherein the divided discharges are discharge pipes having a predetermined inner and outer diameters and arranged at a predetermined pitch. The drawing method is used, and while moving the support, the photoreactive resin is divided and discharged from the discharge pipes having a predetermined inner and outer diameter and arranged at a predetermined pitch, to form a line on the substrate. it can.

A fourth aspect of the present invention is a method for producing a color filter for liquid crystal according to the first aspect, which is a method of forming continuous filaments on a substrate on which a black matrix is formed, and the substrate is fixed. The light-reactive resin can be superposed on the black matrix while traveling in a constant direction at a speed to form a filament.

According to a fifth aspect of the present invention, there is provided a method for producing a color filter for liquid crystal according to the first aspect, in which continuous filaments are formed on an array substrate on which a circuit is formed by a laminated array structure. In this method, the linear substrate can be formed by stacking the photoreactive resin on the array structure while running the array substrate at a constant speed in a certain direction. Therefore, since the black matrix is substituted by the array structure, the formation of the black matrix can be omitted, and the manufacturing cost can be reduced.

A sixth aspect of the present invention is the method for producing a color filter for liquid crystal according to the first aspect, wherein light is applied to the linear stripes by using a photomask from the front side of the substrate which is the linear stripe forming side. By irradiating the filaments from the surface side on the substrate, the filaments in the black matrix openings and array openings are cured by reaction, and the filaments on the black matrix and the array are cured. The article remains unreacted.

The invention according to claim 7 is the method for producing the color filter for liquid crystal according to claim 1, wherein the irradiation of light to the filament is performed from the back surface side of the substrate which is the opposite side of the filament formation. By irradiating the filaments from the back surface side of the substrate, the filaments in the black matrix openings and the array openings are reactively cured, and the filaments on the black matrix and the array are not cured. It remains a reaction. in this case,
Since the array shape is used as a photomask for patterning RGB, the photolithography method is used but the photomask is not used, and the cost can be reduced in this respect as well.

An eighth aspect of the present invention is a method for producing a color filter for liquid crystal according to the first aspect, which is a method in which continuous linear stripes are directly formed on a substrate by dividing and discharging, such as transfer. It is possible to form the filament without performing the step of.

A ninth aspect of the present invention is the method for producing a color filter for liquid crystal according to the first aspect, wherein a continuous filament is once formed by dividing and discharging it onto a medium substrate, and then the substrate is formed. In this method, the photoreactive resin is divided and discharged while moving the intermediary substrate to form linear lines on the intermediary substrate, and then the linear lines are superposed on and contacted with the substrate. The intermediate substrate can be pressed and heated on the substrate to form filaments on the substrate.

The invention according to a tenth aspect is the first to ninth aspects.
It is a color filter for liquid crystal having a structure obtained by the method for producing a color filter for liquid crystal according to any one of 1 to 3, and a manufacturing cost is lower and an inexpensive color filter for liquid crystal can be provided as compared with the conventional method.

FIG. 1 shows an embodiment of the present invention.
This will be described with reference to FIG. (Embodiment 1) FIGS. 1 and 2 show the structure and arrangement of each part, and FIGS. 3 to 6 show a state in the middle of preparation.

1 and 2, a black matrix substrate (an example of a support) 1 has a thickness of 1.1 mm, for example.
It is composed of a glass substrate having a length and width of 300 × 300 mm and a black matrix 2 formed thereon. The black matrix openings 4 have a horizontal pitch of 100 microns, a vertical pitch of 250 microns, a width and a length of 50 microns, respectively.
It is 120 microns.

As shown in FIG. 3, while the black matrix substrate 1 is running at a constant speed in a certain direction, the black matrix substrate 1 is overlaid on the black matrix 2 and die RG is formed by a die coating method.
Form the B line 6. That is, while moving the black matrix substrate 1 at a speed of 20 mm / sec, the photoreactive resin 6A in which a photosensitive resin as a base material and RGB colorants are dispersed is separately discharged from the die 9 for die coating, and superposed on the black matrix 2. To form the RGB line 6.

Divided discharge by this die coating method is performed by using a die coating die 9 having a predetermined slit, width and pitch, and the formed RGB filaments 6 have a width of 120 microns as shown in FIG. It has a continuous shape.

Next, as shown in FIG. 5, light irradiation A having a center wavelength of 365 nm is performed on the RGB stripes 6 from the surface direction of the black matrix substrate 1 using a photomask 13. The irradiation energy is 100 mj / square centimeter. Of the RGB filaments 6, the RGB filaments 6b in the portion of the black matrix opening 4 are reactively cured by the light irradiation A, and the RGB filaments 6a on the black matrix 2 remain unreacted.

Next, development is performed, and the RGB lines 6a on the unreacted black matrix 2 are dissolved by development to remove unnecessary portions, and the RGB lines of the black matrix opening 4 in the reaction-cured state are removed. Leave Article 6b.
The raised portion 6c, which was generated before development and was on the RGB filaments 6a on the black matrix 2 in the unreacted state, disappears when dissolved by the development.

As a result, as shown in FIG. 6, RGB pixels 3 are formed in the openings 4 of the black matrix 2 formed on the black matrix substrate 1. The dimensions of one color at the time of printing are a pitch of 300 microns, a width of 120 microns, a maximum thickness of 2.5 microns, and an average thickness of 1.7 microns. After dissolution by development, the pitch is 300 microns, The width was 110 microns, the maximum thickness was 1.6 microns, and the average thickness was 1.5 microns.

FIG. 2 shows the liquid crystal color filter 5 produced in the above steps, that is, in the steps of FIGS. In the opening 4 of the black matrix 2 formed on the black matrix substrate 1, the first color 3a, the second color 3b, and the third color 3a.
The RGB pixel 3 including the color 3c is formed. Here, the RGB pixel 3 has a thickness of 1.5 μm and the black matrix 2 has a thickness of 1.5 μm, so that a smooth surface with small steps can be obtained.

(Embodiment 2) FIGS. 7 and 8 show the structure and arrangement of each part, and FIGS. 9 to 13 show a state in the middle of preparation.

As shown in FIG. 9, a medium substrate (another example of a support) 1 made of a polyimide sheet having a thickness of 100 μm 1
While moving 1 in a constant direction at a constant speed of 20 mm / sec, the photoreactive resin 6A is divided and discharged from the die 9 for die coating, and the RGB filaments 6 are formed on the intermediate substrate 11 by overlapping.

Next, as shown in FIG. 10, the RGB filaments 6 are superposed on and brought into contact with the array structure 15 on the array substrate 14. As the array substrate 14, for example, a substrate having a thickness of 1.1 mm, a length of 300 mm and a width of 300 mm, and forming a circuit by a laminated array structure was used.
The array openings 16 have a horizontal pitch of 100 microns, a vertical pitch image of 250 microns, and a width and length of 50 microns and 120 microns, respectively.

Next, the intermediate substrate 11 is pressed and heated on the array substrate 14 to form the RGB filaments 6 on the array structure 15 on the array substrate 14. Pressurization and heating conditions are 200 g / square centimeter, 70 ° C., and 3 minutes.
At the time of divided discharge by this die coating method, the photoreactive resin 6A is one in which a photosensitive resin as a base material and RGB colorants are dispersed, and the divided discharge has a predetermined slit, width and pitch. The RGB filaments 6 formed by using the die 9 for die coating have a continuous shape with a width of 120 microns as shown in FIG.

Next, as shown in FIG. 12, the array substrate 1
Light irradiation A having a central wavelength of 365 nm is performed on the RGB filaments 6 from the rear surface direction of 4. Irradiation energy is 10
It is 0 mj / square centimeter. Of the RGB filaments 6, the RGB filaments 6e in the array opening 16 portion are reactively cured by the light irradiation A, and the RGB filaments 6d on the array structure 15 remain unreacted.

Next, development is performed, and the RGB filaments 6d on the unreacted array structure 15 are dissolved by development to remove unnecessary portions, and the RGB rays of the portion of the array opening 16 in the reaction-cured state. Leave Article 6e. The raised portion 6f, which had been present before the development and was on the RGB line 6d on the array structure 15 in the unreacted state, disappears when it is dissolved by the development.

As a result, as shown in FIG. 13, the RG is formed in the array opening 16 of the array structure 15 on the array substrate 14.
B pixel 3 is formed. The size of one color at the time of printing is a pitch of 300 μm, and the pitch between the colors is 100 μm when the three colors of RGB can be formed.

FIG. 8 shows the liquid crystal color filter 5 produced in the above steps, that is, in the steps of FIGS. RGB pixels 3 of a first color 3a, a second color 3b, and a third color 3c are formed in an array opening 16 of an array structure 15 formed on the array substrate 14. Where R
The thickness of the GB pixel 3 is 1.5 μm, and the array structure 15
Has a thickness of 1.5 μm, and a smooth surface with small steps can be obtained.

(Embodiment 3) FIGS. 14 and 15 show the structure and arrangement of each part, and FIGS. 16 to 20 show a state in the middle of production.

As shown in FIG. 16, an intermediate substrate 11 made of a polyimide sheet having a thickness of 100 μm is formed at a speed of 2 mm.
While moving in a fixed direction at a constant speed of 0 mm / sec, the photoreactive resin 6A is divided and discharged from the drawing discharge pipe 10 by a drawing method, and the RGB filaments 6 are formed on the intermediary substrate 11 in an overlapping manner.

Next, as shown in FIG. 17, the RGB filaments 6 are superposed on and brought into contact with the array structure 15 on the array substrate 14. As the array substrate 14, for example, a substrate having a thickness of 1.1 mm, a length of 300 mm and a width of 300 mm, and forming a circuit by a laminated array structure was used.
The array openings 16 have a horizontal pitch of 100 microns, a vertical pitch image of 250 microns, and a width and length of 50 microns and 120 microns, respectively.

Then, the intermediate substrate 11 is transferred to the array substrate 14 by applying pressure and heat to transfer the array substrate 1 onto the array substrate 1.
The RGB filaments 6 are formed so as to overlap with 5. Pressurization and heating conditions are 200 g / square centimeter, 70 ° C., and 3 minutes. At the time of divided discharge by this drawing method, the photoreactive resin 6A
Uses a photosensitive resin as a base material and RGB colorants dispersed therein, and the divided discharge is performed using a discharge pipe 10 having a predetermined inner and outer diameter and arranged at a predetermined pitch,
The formed RGB filaments 6 have a width of 12 as shown in FIG.
It has a continuous shape of 0 micron.

Next, as shown in FIG. 19, the array substrate 1
Light irradiation A having a central wavelength of 365 nm is performed on the RGB filaments 6 from the rear surface direction of 4. Irradiation energy is 10
It is 0 mj / square centimeter. Of the RGB filaments 6, the RGB filaments 6e in the array opening 16 portion are reactively cured by the light irradiation A, and the RGB filaments 6d on the array structure 15 remain unreacted.

Next, development is carried out and the RGB filaments 6d on the array structure 15 in the unreacted state are dissolved by development to remove unnecessary portions, and the RGB rays in the portion of the array opening 16 in the reaction cured state. Leave Article 6e. The raised portion 6f, which had been present before the development and was on the RGB line 6d on the array structure 15 in the unreacted state, disappears when it is dissolved by the development.

As a result, as shown in FIG. 20, RG is formed in the array opening 16 of the array structure 15 on the array substrate 14.
B pixel 3 is formed. The size of one color at the time of printing is a pitch of 300 μm, and the pitch between the colors is 100 μm when the three colors of RGB can be formed.

FIG. 15 shows the color filter 5 for liquid crystal produced in the above steps, that is, the steps of FIGS. RGB pixels 3 of a first color 3a, a second color 3b, and a third color 3c are formed in an array opening 16 of an array structure 15 formed on the array substrate 14. Here, the RGB pixel 3 has a thickness of 1.5 μm, and the array structure 15 has a thickness of 1.5 μm, so that a smooth surface with a small step can be obtained.

Although the three embodiments have been described above, the die-coating method or the drawing method is used as the divided discharge method of the photoreactive resin 6A as the material, the black matrix substrate 1 or the array substrate 15 as the target substrate, and the light irradiation A. It has been confirmed that it is possible to create another combination in which the direction of is the front side or the back side of the substrate, and the formation of the RGB stripes 6 is direct on the target substrate or indirectly via the intermediary substrate 11.

Further, in the embodiment, the method of sequentially printing the RGB filaments 6 and then simultaneously developing and dissolving and forming is shown, but it is also possible to form the RGB filaments 6 by simultaneously printing and then developing and dissolving simultaneously. In addition, after printing the R line on the first color, the R line is developed and dissolved.
It has been confirmed that it can also be formed by the method of printing the line and B line, and developing and melting. It has been confirmed that changing the order of the R, G, and B filaments does not affect the performance shape. Moreover, it has been confirmed that the RGB line 6 can be formed not only by a straight line but also by arranging it obliquely.

Next, regarding the display quality, the easiness of production correlated with the manufacturing yield, and the productivity directly related to the cost, the conventional method shown in FIG. 21 is shown as a representative example of the second embodiment of the present invention. It will be described in Table 1 in comparison with the one created by.

[0047]

[Table 1]

Regarding the manufacturing cost, regarding the amount of RGB photoresist material used, both the die coating method and the drawing method consume the photoresist material only for the necessary number of stripes. The amount of material used is 1/1 compared to the coating method
From 0 to 1/20, the manufacturing cost can be reduced.

Further, in comparison of the number of steps as an index of productivity, three colors are prepared in the conventional example, three colors of six steps of washing, resist coating, drying, exposure, developing and drying in the conventional example.
In contrast to the eight steps required in the second embodiment, eight steps of cleaning, first-color printing, second-color printing, third-color printing, drying, backside exposure, development and drying are required. Less than half.

Further, since the color filter is formed on the array substrate and the array structure is substituted for the black matrix, the cost can be reduced in the following two points. The first is
The process is shortened by omitting the black matrix.
In the patterning of RGB, since the array shape is used as a photomask, the mask cost is that the photomask is not used even though the photolithography method is used. Also in this respect, the cost can be reduced.

From the above points, the manufacturing cost can be reduced and the liquid crystal color filter can be obtained at a lower cost than the conventional method. With regard to the performance, regarding the RGB arrangement, depending on the method of forming the printed stripes, it is possible to easily form not only stripes but also deltas, diagonal mosaic arrangements, and the like.

Regarding the smoothness, since the RGB matrix and the array can have the same RGB thickness, a color filter for liquid crystal having a small surface step and excellent smoothness can be produced.

With respect to the aperture ratio, since high-definition patterning can be performed, a black matrix having a narrow line width can be formed, and a high aperture ratio can be obtained.

[0054]

As described above, according to claim 1 of the present invention, from the viewpoint of cost, the amount of RGB photoresist material used can be reduced and the manufacturing cost can be reduced. It is easy to do, and from the viewpoint of performance, various RGB arrays can be freely and easily created, and if the surface of the RGB matrix and the RGB are almost the same, the surface smoothness is good, the surface step is small, and the aperture ratio is high. In addition, a color filter for liquid crystal having high image quality can be obtained.

According to claim 5 of the present invention described above,
Since the black matrix is substituted by the array structure, the formation of the black matrix can be omitted, and the manufacturing cost can be reduced.

According to the seventh aspect of the present invention described above, since the array shape is used as a photomask for patterning RGB, the photolithography method is used but the photomask is not used. The cost can be reduced.

Further, according to the tenth aspect of the present invention described above, it is possible to provide a color filter for liquid crystal, which is lower in manufacturing cost and cheaper than that manufactured by the conventional method.

[Brief description of drawings]

FIG. 1 is a plan view showing the concept of a liquid crystal color filter according to a first embodiment of the present invention.

FIG. 2 is a plan view showing an arrangement of respective portions of the liquid crystal color filter.

FIG. 3 is a diagram showing the progress of steps in the method for producing the same color filter for liquid crystal, and is a conceptual diagram showing a state in which filaments are formed on a substrate by a die coating method.

FIG. 4 is a diagram showing the progress of steps in the method of producing the same color filter for liquid crystal, showing a plan view of a state after the RGB filaments are formed.

FIG. 5 is a diagram showing the progress of steps in the method of producing the same color filter for liquid crystal, showing a cross-sectional view of a state in which light is irradiated from the front side of the substrate using a photomask.

FIG. 6 is a diagram showing the progress of steps in the method for producing the same color filter for liquid crystal, showing a cross-sectional view of the state in which the RGB filaments have been developed and dissolved.

FIG. 7 is a plan view showing the concept of a liquid crystal color filter according to a second embodiment of the present invention.

FIG. 8 is a plan view showing an arrangement of respective portions of the liquid crystal color filter.

FIG. 9 is a diagram showing the progress of steps in the method for producing the same color filter for liquid crystal, and is a conceptual diagram showing a state in which a line is formed on an intermediate substrate by a die coating method.

FIG. 10 is a diagram showing the progress of steps in the method for producing the same color filter for liquid crystal, and is a conceptual diagram showing a state in which filaments on the intermediary substrate are transferred and formed on the substrate.

FIG. 11 is a view showing the progress of steps in the method of producing the same color filter for liquid crystal, showing a plan view of the state after the RGB filaments are formed.

FIG. 12 is a diagram showing the progress of steps in the method for producing a color filter for liquid crystal, showing a cross-sectional view of the state of backside exposure in which light is irradiated from the backside of the substrate.

FIG. 13 is a view showing the progress of steps in the method for producing the same color filter for liquid crystal, showing a cross-sectional view of the state in which the RGB filaments have been developed and dissolved.

FIG. 14 is a plan view showing the concept of a liquid crystal color filter according to a third embodiment of the present invention.

FIG. 15 is a plan view showing an arrangement of each part of the liquid crystal color filter.

FIG. 16 is a view showing the progress of steps in the method for producing a color filter for liquid crystal, which is a conceptual diagram showing a state in which a line is formed on an intermediate substrate by a drawing method.

FIG. 17 is a diagram showing the progress of steps in the method for producing the same color filter for liquid crystal, showing a conceptual diagram of a state in which the filaments on the intermediary substrate are transferred and formed on the substrate.

FIG. 18 is a diagram showing the progress of steps in the method of producing the same color filter for liquid crystal, showing a plan view of the state after the formation of the RGB stripes.

FIG. 19 is a diagram showing the progress of steps in the method for producing a color filter for liquid crystal, showing a cross-sectional view of the state of backside exposure in which light is irradiated from the backside of the substrate.

FIG. 20 is a diagram showing the progress of steps in the method for producing the same color filter for liquid crystal, showing a cross-sectional view of a state after the RGB stripes have been developed and dissolved.

FIG. 21 is a plan view showing an example of preparation by a photolithography method, which is a conventional example.

[Explanation of symbols]

 1 Black Matrix Substrate (Support) 2 Black Matrix 3 RGB Pixel 4 Black Matrix Opening 5 Color Filter for Liquid Crystal 6 RGB Line 6A Photoreactive Resin 6a RGB Line Black Matrix Upper Part 6b RGB Line Black Matrix Opening Part portion 6c Ridge portion of RGB filaments 6d RGB array upper portion of RGB filaments 6e Array opening portion of RGB filaments 6f Ridge portion of RGB filaments 9 Die coat die 10 Drawing discharge pipe 11 Media base (support) 13 Photomask 14 Array substrate (substrate) 15 Array structure 16 Array opening A Light irradiation

Claims (10)

[Claims] 1. A continuous linear strip is formed on a substrate by separately discharging a photoreactive resin in which a photosensitive resin is a base material and a colorant is dispersed on a support that runs in one direction at a constant speed. Then, a method for producing a color filter for a liquid crystal, in which after irradiating the filaments with light, unnecessary portions of the filaments are removed by development to form RGB pixels. 2. The method for producing a color filter for liquid crystal according to claim 1, wherein the divided discharge is performed by a die coating method using a die having a predetermined slit, width and pitch. 3. The method for producing a color filter for liquid crystal according to claim 1, wherein the divided discharge is performed by a drawing method using a discharge pipe having a predetermined inner and outer diameter and arranged at a predetermined pitch. 4. The method for producing a color filter for liquid crystal according to claim 1, wherein continuous filaments are formed on a substrate on which a black matrix is formed. 5. The method for producing a color filter for liquid crystal according to claim 1, wherein continuous stripes are formed on an array substrate which forms a circuit by a laminated array structure. 6. The method for producing a color filter for liquid crystal according to claim 1, wherein the irradiation of light to the filament is performed from the front side of the substrate, which is the filament forming side, using a photomask. 7. The method for producing a color filter for liquid crystal according to claim 1, wherein the irradiation of the light on the filament is performed from the back surface side of the substrate which is the opposite side of the filament formation. 8. The method for producing a color filter for liquid crystal according to claim 1, wherein the continuous filaments are directly formed on the substrate by dividing and discharging. 9. The method for producing a color filter for a liquid crystal according to claim 1, wherein a continuous filament is once formed by being divided and ejected onto an intermediate substrate, and then transferred and formed on a substrate. 10. A color filter for liquid crystal having a structure obtained by the method for producing a color filter for liquid crystal according to claim 1.