JPH09314569A - Die for molding embossed product and embossing processing method by said die - Google Patents
Die for molding embossed product and embossing processing method by said dieInfo
- Publication number
- JPH09314569A JPH09314569A JP13458096A JP13458096A JPH09314569A JP H09314569 A JPH09314569 A JP H09314569A JP 13458096 A JP13458096 A JP 13458096A JP 13458096 A JP13458096 A JP 13458096A JP H09314569 A JPH09314569 A JP H09314569A
- Authority
- JP
- Japan
- Prior art keywords
- die
- mold
- product
- glossy
- resist film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
- B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、製品表面に微細な
凹凸、所謂シボ形状を有するプラスチック或いはゴム製
品を成形するための金型及びこの金型のシボ加工法に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold for molding a plastic or rubber product having fine irregularities on the surface of the product, that is, a so-called embossed shape, and a method for embossing the mold.
【０００２】[0002]
【従来の技術】プラスチックおよびゴム成形品には、近
年デザインの多様性がもとめられており、微妙で複雑な
模様や落ち着いた質感を出すために艶消し仕上げをする
等の要求が高くなっている。これらの要求に応える手法
が、シボ加工と呼ばれる加工を金型上に施す技術であ
る。そして、そのようなシボ加工を施した金型をシボ加
工金型と呼び、またシボ加工金型で成形された製品面に
シボ形状を有する製品をシボ製品と呼んでいる。2. Description of the Related Art In recent years, plastic and rubber molded products have been required to have a variety of designs, and there has been an increasing demand for matte finish for producing subtle and complicated patterns and calm textures. . A technique that meets these demands is a technique for performing a process called graining on a die. Then, a mold subjected to such a texture processing is called a textured mold, and a product formed by the textured mold and having a textured surface is called a textured product.
【０００３】金型に対するシボ加工は、写真製版技術に
より形成したレジストフィルムで金型表面を覆い、次い
でエッチングを施したり、あるいは更にサンドブラスト
のような機械的手法を加えることによって金型内の成形
品表面に該当する部分に付加価値の高い模様を形成して
いる。このように形成した模様のことをシボ模様と呼
び、金型にシボ模様を与えるために模様を食刻すること
をシボ加工と呼んでいる。The embossing process for the mold is carried out by covering the mold surface with a resist film formed by photoengraving technique and then performing etching, or by adding a mechanical method such as sandblasting to the molded product in the mold. A pattern with high added value is formed on the part corresponding to the surface. The pattern formed in this way is called a grain pattern, and etching the pattern in order to give the mold a grain pattern is called grain processing.
【０００４】[0004]
【発明が解決しようとする課題】図３のフローは、一般
的なプラスチック製品の成形用金型のシボ加工方法であ
って、この方法の場合には、金型１の表面にレジストフ
ィルム２を貼り合わせ、更にこの上にシボパターンフィ
ルム３を貼り合わせたのち（ステップ１）、ステップ２
において露光・現像・焼付を行い、次にステップ３にお
いて不要部分のフィルムを除去しマスキングを行い、次
にステップ４でエッチングを行い、これを数回繰り返し
てエッチングを完了し（ステップ５）、次にステップ６
においてブラストを行ってシボ加工を完了するものであ
る。The flow of FIG. 3 is a general method for forming a grain in a molding die for plastic products, and in the case of this method, a resist film 2 is formed on the surface of the die 1. After pasting, and further pasting the grain pattern film 3 on this (step 1), step 2
In step 3, exposure / development / baking are performed, then in step 3, the film of the unnecessary portion is removed and masking is performed, and then in step 4, etching is performed, and this is repeated several times to complete the etching (step 5). Step 6
The blasting is performed to complete the embossing.
【０００５】しかし、上記エッチング処理のみでは、金
型１のエッチング面には腐食による微細な凹凸１ａが存
在するため、得られる成形品面にもこの微細な凹凸が転
写され、これが爪等の接触により傷つきやすい、つまり
製品として耐傷性が弱いという難がある。However, since only the above-mentioned etching treatment causes fine irregularities 1a due to corrosion on the etched surface of the die 1, the fine irregularities are transferred to the surface of the molded product to be obtained, which is brought into contact with a nail or the like. Therefore, there is a problem that it is easily scratched, that is, the product has poor scratch resistance.
【０００６】この問題点の解決策として、一般には、エ
ッチング完了後にビーズ状のガラス等を用いたブラスト
処理（ステップ６）により、微細な凹凸１ａを潰してエ
ッチング面をある程度滑らかにする方法が取られている
（ステップ６）。As a solution to this problem, generally, after etching is completed, a method of blasting using glass beads or the like (step 6) to crush the fine irregularities 1a to smooth the etched surface to some extent is taken. (Step 6).
【０００７】他方、近年はデザインの多様性から、従来
のシボ模様のように均質な意匠とは異なる光沢部と非光
沢部の組合わせになる優れた意匠性を有するシボ模様も
考案されている。このようなシボ製品を得るための金型
のシボ加工ステップを図４に示す。On the other hand, in recent years, due to the variety of designs, a textured pattern having an excellent design property, which is a combination of a glossy portion and a non-glossy portion, which is different from a homogeneous design like a conventional textured pattern, has been devised. . FIG. 4 shows the steps of die-texturing the die for obtaining such an embossed product.
【０００８】この図４において、ステップ１〜４までは
上記図３の加工例と同一で行い、最終段階ではステップ
５に示すように、金型１の表面からレジストフィルム２
を除去してシボ加工を完了するものである。このように
すると、レジストフィルム２を除去した部分２ａが平滑
となり、ここに該当する成形品側のシボ凹部は光沢を呈
するようになる。In FIG. 4, steps 1 to 4 are performed in the same manner as in the processing example of FIG. 3, and at the final stage, as shown in step 5, from the surface of the mold 1 to the resist film 2
Is removed to complete the embossing. By doing so, the portion 2a from which the resist film 2 has been removed becomes smooth, and the textured concave portion on the side of the molded product corresponding to this becomes glossy.
【０００９】図５は、上記図４の加工法を用いて製作さ
れた金型と成形品を示すものであって、このシボ加工金
型４において、レジストフィルムで保護されてエッチン
グされず鏡面状態を保持する金型シボ凸部６ｂを転写し
たシボ製品５の製品シボ凹部７ｂは、光沢を有する。一
方、シボ加工金型４表面をエッチングして生じた金型シ
ボ凹部６ａは表面に腐食による微細凹凸６ａ′を有し、
これを転写したシボ製品５の製品シボ凸部７ａ表面にも
微細凹凸７ａ′がある。この微細凹凸７ａ′が光を乱反
射し、非光沢部として前述の光沢部とコントラストを形
成することにより、製品のシボによる意匠性を高めるも
のである。但し、この製品シボ凸部７ａの微細凹凸７
ａ′は、爪等の接触により傷つきやすく、シボ模様の外
観を損ね、製品価値を低下させる難点があった。FIG. 5 shows a mold and a molded product manufactured by using the processing method shown in FIG. 4, in which the textured mold 4 is protected by a resist film and is not etched and is in a mirror surface state. The product embossed concave portion 7b of the embossed product 5 to which the die embossed convex portion 6b for holding is transferred has gloss. On the other hand, the mold texture recess 6a formed by etching the surface of the textured mold 4 has fine irregularities 6a 'due to corrosion on the surface,
Fine unevenness 7a 'is also present on the surface of the product textured convex portion 7a of the textured product 5 to which this is transferred. The fine irregularities 7a 'diffusely reflect light and form a contrast with the above-mentioned glossy portion as a non-glossy portion, thereby enhancing the design of the product due to grain. However, the fine concavo-convex portion 7 of the product embossed protrusion 7a
There is a problem that a'is easily scratched by contact with a nail or the like, impairs the appearance of the grain pattern, and lowers the product value.
【００１０】上述のように、一般的にはビーズ状のガラ
ス等を用いたブラストにより耐傷性向上を図るが、光沢
部と非光沢部のコントラストを有するシボ加工の場合に
は、レジストフィルム２を剥離後にビーズ状のガラス等
を用いたブラストを施すと、エッチングされた金型シボ
凹部６ａのみならず、金型レジストフィルム２で保護さ
れていた鏡面状態の金型シボ凸部６ｂにもブラスト打痕
跡が印され、製品の光沢部と非光沢部のコントラストが
損なわれるという欠点があった。As described above, the scratch resistance is generally improved by blasting using bead-shaped glass or the like. However, in the case of the embossing having the contrast between the glossy portion and the non-glossy portion, the resist film 2 is used. Blasting using bead-shaped glass or the like after peeling off blasts not only on the etched mold recesses 6a but also on the mirror-finished mold recesses 6b protected by the mold resist film 2. There is a defect that a mark is printed and the contrast between the glossy part and the non-glossy part of the product is impaired.
【００１１】そこで、レジストフィルム２を有した状態
で金型シボ凸部６ｂを保護してブラストすることも可能
ではあるが、金型シボ凸部６ｂが鏡面状態であり、レジ
ストフィルム２の密着性が弱いために剥離し易く、金型
シボ凸部６ｂの鏡面部分にブラスト打痕跡が印され、や
はり製品の光沢部と非光沢部のコントラストが損なわれ
る。Therefore, it is possible to protect and blast the metal mold grain convex portion 6b with the resist film 2, but the metal mold grain convex portion 6b is a mirror surface state, and the adhesiveness of the resist film 2 is high. Since it is weak, it is easy to peel off, and a blast dent mark is printed on the mirror surface portion of the mold embossed convex portion 6b, and the contrast between the glossy portion and the non-glossy portion of the product is also impaired.
【００１２】従って、本発明の目的は、光沢部と非光沢
部のコントラストを有するシボ製品を得るための金型の
シボ加工の場合において、光沢部と非光沢部のコントラ
ストを有したままで製品面の耐傷性を改善する技術を開
発することである。より具体的には、従来のシボ加工金
型に比較し、光沢部と非光沢部のコントラストによる意
匠性および耐傷性のいずれにも優れたシボ製品を成形可
能な射出成形用金型とこの金型のシボ加工法を提供する
ことである。[0012] Therefore, an object of the present invention is, in the case of the embossing of a mold for obtaining an embossed product having a contrast between a glossy portion and a non-glossy portion, a product having the contrast between the glossy portion and the non-glossy portion is kept. It is to develop a technique for improving the scratch resistance of the surface. More specifically, compared to the conventional embossing die, an injection molding die that can mold embossed products that are excellent in both design and scratch resistance due to the contrast between the glossy part and the non-glossy part, and this mold. It is to provide a texturing method for a mold.
【００１３】[0013]
【課題を解決するための手段】本発明者らは、金型の表
面状態と成形品に関して鋭意研究した結果、光沢部と非
光沢部のコントラストを有するシボ製品の射出成形用金
型に関し、予め金型表面をアランダム等によるブラスト
処理で非光沢処理を施しておき、金型上に写真製版技術
によりレジストフィルムを形成して金型表面を覆い、次
いでエッチングを施した後、レジストフィルムを除去し
ないままガラス等のビーズをブラストしてエッチング部
のみアルミナランダムおよびエッチングによる微細凹凸
跡を潰して滑らかな光沢部とし、併せて耐傷性を改善す
ることで、光沢部と非光沢部のコントラストによる意匠
性および耐傷性のいずれにも優れたシボ製品を成形可能
な射出成形用シボ加工金型を完成した。この金型を使用
すると、ガラスビーズブラストにより形成された表面の
滑らかな金型シボ凹部およびアランダムにより形成され
た粗い金型シボ凸部を有することから、従来の金型で得
られるシボ製品の凹凸部の光沢部と非光沢部に対して光
沢部と非光沢部が反転し、これによりコントラストが高
まり、以て意匠性と耐傷性に優れたシボ製品の成形が可
能である。Means for Solving the Problems As a result of earnest studies on the surface condition of a mold and a molded product, the inventors of the present invention have previously described a mold for injection molding of an embossed product having a contrast between a glossy part and a non-glossy part. The surface of the mold is non-glossy treated by blasting with alundum, etc., a resist film is formed on the mold by photolithography to cover the surface of the mold, and then the resist film is removed after etching. Without blasting, beads of glass etc. are blasted and only the etched part is crushed by alumina random and fine irregularities due to etching to make a smooth glossy part, and the scratch resistance is also improved. We have completed an embossing die for injection molding, which is capable of molding embossed products that are excellent in both scratch resistance and scratch resistance. When this mold is used, since it has a smooth mold wrinkle concave portion formed by glass bead blasting and a rough mold wrinkle convex portion formed by alundum, it is possible to obtain a textured product obtained by a conventional mold. The glossy part and the non-glossy part are reversed with respect to the glossy part and the non-glossy part of the uneven part, which increases the contrast, and thus it is possible to mold the embossed product excellent in design and scratch resistance.
【００１４】[0014]
【発明の実施の形態】次に本発明における金型表面のシ
ボ加工方法とこの加工方法により得られる金型の実施形
態を図１及び図２に基づいて説明する。先ず、シボ加工
ステップを図１に基づいて説明する。ステップ１は、金
型１の表面に、エッチングのためのシボパターンをレジ
ストフィルムで形成する前に、予め金型１の表面全体を
アルミナランダム等をブラストして表面に微細な凹凸１
ｂを形成し、粗しておく。この金型表面に形成された微
細な凹凸１ｂは、本金型１を用いてシボ製品を成形する
際に製品表面に転写され、光を乱反射して非光沢部を形
成する。BEST MODE FOR CARRYING OUT THE INVENTION Next, an embodiment of a surface-texturing method for a die and a die obtained by this method according to the present invention will be described with reference to FIGS. 1 and 2. First, the embossing step will be described with reference to FIG. In step 1, before forming a grain pattern for etching on the surface of the mold 1 with a resist film, the entire surface of the mold 1 is previously blasted with alumina random or the like to form fine irregularities 1 on the surface.
Form b and roughen. The fine irregularities 1b formed on the surface of the mold are transferred to the surface of the product when the embossed product is formed using the main mold 1, and diffusely reflect light to form a non-glossy portion.
【００１５】次いで、従来法と同じく写真製版技術によ
り、金型表面に希望するシボパターンを形成するための
レジストフィルム２とシボパターンフィルム３を形成す
る（ステップ２）。この際、本法においては予めブラス
トにより金型表面が粗してあるため、金型面とレジスト
フィルム２の密着が良好であることからエッチング時の
レジスト剥離が少なく、エッチングパターンの乱れが少
ないのみならず、後述するエッチング部のガラスビーズ
によるブラスト処理時にも、剥離しにくいためにブラス
ト処理空気圧力を高く設定でき、ブラストによるエッチ
ング部の微細凹凸潰しに十分な効果を得ることができ
る。Next, the resist film 2 and the embossed pattern film 3 for forming a desired embossed pattern are formed on the surface of the mold by the photolithographic technique as in the conventional method (step 2). At this time, in this method, since the mold surface is roughened by blasting in advance, the adhesion between the mold surface and the resist film 2 is good, so that resist peeling during etching is small and etching pattern disorder is small. Of course, even during the blasting treatment with the glass beads in the etching portion, which will be described later, the air pressure of the blasting treatment can be set high because it is difficult to peel, and a sufficient effect can be obtained for crushing fine irregularities in the etching portion by the blasting.
【００１６】次に、マスキングを行い（ステップ４）、
次にエッチングを行い（ステップ５）、このエッチング
後、レジストフィルム２を残したままでエッチング部を
ガラス等のビーズによりブラストし、エッチング部に腐
食により生じる微細凹凸を潰し、表面を滑らかにする
（ステップ６）。Next, masking is performed (step 4),
Next, etching is performed (step 5), and after this etching, the etched portion is blasted with beads such as glass while leaving the resist film 2 to crush fine irregularities caused by corrosion in the etched portion to smooth the surface (step 6).
【００１７】このようにして、表面を滑らかに処理した
金型表面のエッチングによる凹部は、本金型を用いてシ
ボ製品を成形する際に製品表面に転写されて表面の滑ら
かな凸部となり、光を良く反射して光沢部を形成する。
更に、シボ製品の凸部表面が滑らかであることから、爪
等による傷がつきにくく、耐傷性に優れる。更に、本発
明によれば、従来法とは逆に製品のシボ凹凸の凸部が滑
らかで傷つきにくく、凹部に傷のつきやすい微細凹凸が
存在して保護されやすい構成となるため、光沢と非光沢
のコントラストを維持した意匠性に優れた外観を長期間
効果的に保持する。In this way, the concave portions due to the etching of the surface of the mold whose surface has been smoothly treated are transferred to the surface of the product when the embossed product is molded by using the main mold, and become the smooth convex parts of the surface, It reflects light well and forms a glossy part.
Further, since the surface of the convex portion of the embossed product is smooth, it is less likely to be scratched by nails and the like and has excellent scratch resistance. Further, according to the present invention, contrary to the conventional method, since the convex portion of the textured unevenness of the product is smooth and is not easily scratched, and the concave and convex fine scratches are present on the concave portion, it is easy to protect, so that the gloss and It effectively retains the glossy contrast and excellent design for a long period of time.
【００１８】なお、ブラスト投射材の素材は、アランダ
ム、ガラス以外にもスチール、プラスチック、あるいは
胡桃破砕片等でもよく、特に制限はない。また、ランダ
ム形状のブラスト投射材を用いるところに粒径の小さい
ビーズ状のブラスト投射材を用いてもよい。The material of the blast blasting material may be steel, plastic, walnut crushed pieces, etc. other than alundum and glass, and is not particularly limited. In addition, a bead-shaped blast blasting material having a small particle size may be used instead of using a random blast blasting material.
【００１９】金型材質についても、軟鉄、ベリリューム
銅等一般に金型素材に多く用いられる素材の他、アルミ
ニューム系素材やチタン系素材等を用いてもよく、特に
制限はない。また、本発明による射出成形用金型で成形
される樹脂も、ポリオレフィン樹脂、ポリスチレン樹
脂、ＡＢＳ樹脂などの汎用性樹脂やポリカーボネート樹
脂、ポリアミド樹脂などの工業用樹脂だけでなく、各種
の樹脂を混合したものや補強剤を混合したものでもよ
く、特に制限はない。With respect to the mold material, in addition to materials generally used for mold materials such as soft iron and beryllium copper, aluminum-based materials and titanium-based materials may be used without any particular limitation. Further, the resin molded by the injection molding die according to the present invention is not limited to general-purpose resins such as polyolefin resin, polystyrene resin, ABS resin and industrial resins such as polycarbonate resin and polyamide resin, and various resins are mixed. It may be a mixture of the above-mentioned materials and a reinforcing agent and is not particularly limited.
【００２０】図２は本発明に係るシボ金型および得られ
るシボ製品の表面構造の模式的部分断面図である。シボ
金型４の鋼材はＳ５５Ｃであり、その表面はエッチング
処理の施された金型シボ凹部８ａとレジストフィルムに
より保護されエッチングされなかった金型シボ凸部８ｂ
が多数組合わさって構成されている。金型シボ凸部８
ｂ、金型シボ凹部８ａは、共にエッチング前に予めアラ
ンダム＃１５０、ブラスト空気圧力２ｋｇ／ｃｍ2 の条
件でブラストして表面に微細な凹凸が形成してある。FIG. 2 is a schematic partial sectional view of the surface structure of the embossing die according to the present invention and the resulting embossing product. The steel material of the embossing die 4 is S55C, and the surface thereof is a die embossing concave portion 8a subjected to etching treatment and a die embossing convex portion 8b protected by a resist film and not etched.
Is made up of many unions. Mold texture convex section 8
Before the etching, both the b and the mold embossed concave portion 8a are blasted under the conditions of Alundum # 150 and the blast air pressure of 2 kg / cm 2 to form fine irregularities on the surface.
【００２１】金型シボ凸部８ｂは、エッチング時にレジ
ストフィルムで保護されているため、このブラストされ
た表面状態を保持している。金型シボ凹部８ａは、エッ
チング処理後ガラスビーズ＃１００、ブラスト空気圧力
２ｋｇ／ｃｍ2 の条件でブラストを施し、エッチングに
より生じる微細凹凸が潰され、滑らかな表面状態となっ
ている。表面粗さは、金型シボ凸部８ｂがＲｚ＝０．４
１μｍ、金型シボ凹部８ａがＲｚ＝０．３４μｍであっ
た。また、金型シボ凸部８ｂ、金型シボ凹部８ａの段差
は、１４．８４μｍであった。Since the mold embossment 8b is protected by the resist film during etching, it retains this blasted surface condition. After the etching treatment, the mold embossed concave portions 8a are blasted under the conditions of glass beads # 100 and a blasting air pressure of 2 kg / cm 2 , and fine irregularities generated by etching are crushed to have a smooth surface state. As for the surface roughness, Rz = 0.4 in the die convex convex portion 8b.
1 μm, Rz = 0.34 μm in the mold embossed concave portion 8a. The step difference between the mold embossed convex portion 8b and the mold embossed concave portion 8a was 14.84 μm.
【００２２】上記シボ加工金型と樹脂材料としてポリス
チレン（ＳＥＨＩ１１９、出光石油化学株式会社）を用
いて射出成形を行ったところ、光沢部と非光沢部のコン
トラストによる意匠性および耐傷性のいずれにも優れた
シボ製品が得られた。When injection molding was performed using the textured mold and polystyrene (SEHI119, Idemitsu Petrochemical Co., Ltd.) as the resin material, both the design and scratch resistance due to the contrast between the glossy part and the non-glossy part were obtained. An excellent wrinkle product was obtained.
【００２３】［比較例１］実施例と同じ金型鋼材に、図
４に示す従来法により光沢部と非光沢部の組合せになる
シボ加工を施した。シボ金型４の表面は製品において光
沢部を形成すべく、予め鏡面に仕上げておき、その上に
写真製版技術によりシボパターンのレジストフィルムを
形成して金型表面を覆った後、エッチングを施して金型
面上に凹部となるエッチング部と凸部となる非エッチン
グ部を形成した。なお、レジストフィルムを形成する際
のフィルム素材、露光時間、現像時間、焼付時間等条件
及びエッチングの際のエッチング液、エッチング時間等
条件は、全て実施例と同じとした。[Comparative Example 1] The same die steel material as in the example was subjected to the embossing by the conventional method shown in FIG. 4 so as to form a combination of a glossy portion and a non-glossy portion. The surface of the embossing die 4 is mirror-finished in advance so as to form a glossy part in the product, and a resist film having an embossing pattern is formed on the surface by photolithography to cover the die surface and then etching is performed. As a result, an etched portion which becomes a concave portion and a non-etched portion which becomes a convex portion are formed on the mold surface. The film material used for forming the resist film, the exposure time, the development time, the baking time and other conditions, and the etching solution and the etching time and other conditions during etching were all the same as in the examples.
【００２４】上記シボ加工金型と実施例と同じ樹脂材料
ポリスチレン（ＳＥＨＩ１１９、出光石油化学株式会
社）を用いて射出成形を行った。得られたシボ製品は、
耐傷性が実施例に比べ著しく劣るものであった。非光沢
部は爪で用意に傷がつき、傷部は更に光沢を失って白化
するか、逆に光沢を生じてシボ模様の外観を損ね、製品
価値を著しく低下させた。Injection molding was carried out using the textured mold and the same resin material polystyrene (SEHI119, Idemitsu Petrochemical Co., Ltd.) as in the examples. The obtained grain product is
The scratch resistance was significantly inferior to the examples. The non-glossy part was easily scratched with nails, and the scratched part further lost gloss and became white, or conversely, glossed and impaired the appearance of the textured pattern, significantly reducing the product value.
【００２５】［比較例２］金型面上へのレジストフィル
ム形成前に予めアランダム＃１５０でのブラスト処理を
行わないこと以外は、実施例と同じ金型鋼材、レジスト
フィルム形成条件、エッチング条件でシボ加工を施し
た。金型面を予めアルミナランダム＃１５０でブラスト
処理していないため、金型面とレジストフィルムの密着
が弱く、ガラスビーズ＃１００でのブラスト工程におい
て目標ブラスト空気圧力２ｋｇ／ｃｍ2 に対し、０．５
ｋｇ／ｃｍ2 でレジストフィルムの剥離が生じた。[Comparative Example 2] The same die steel material, resist film forming conditions, and etching conditions as those in the example except that the blast treatment with Alundum # 150 was not performed before forming the resist film on the die surface. It was textured with. Since the die surface was not previously blasted with alumina random # 150, the adhesion between the die surface and the resist film was weak, and the target blast air pressure was 2 kg / cm 2 in the blasting step with glass beads # 100. 5
Peeling of the resist film occurred at kg / cm 2 .
【００２６】上記シボ加工金型と実施例と同じ樹脂材料
ポリスチレン（ＳＥＨＩ１１９、出光石油化学株式会
社）を用いて射出成形を行った。得られたシボ製品は、
金型においてレジストフィルムによりガラスビーズブラ
スト処理から本来保護されるべき金型非光沢部にガラス
ビーズが当たり、光沢を生じてシボ模様のパターンが損
なわれていたために、製品価値が著しく低下した。Injection molding was performed using the textured mold and the same resin material polystyrene (SEHI119, Idemitsu Petrochemical Co., Ltd.) as in the examples. The obtained grain product is
In the mold, the glass beads hit the non-glossy part of the mold, which was originally to be protected from the glass bead blasting treatment by the resist film, and the gloss was generated to impair the grain pattern, resulting in a marked decrease in product value.
【００２７】また、金型エッチング部に対してガラスビ
ーズによるブラスト空気圧力が不十分で、エッチングに
より生じた微細凹凸を十分に潰し、滑らかな表面状態と
することができなかった。このため、得られたシボ製品
は、光沢部の光沢が悪く、十分な光沢部と非光沢部のコ
ントラストが得られていない上、光沢部の耐傷性が実施
例に較べ著しく劣るものであった。Further, the air pressure of the blast by the glass beads was insufficient for the etched portion of the mold, and the fine irregularities caused by the etching could not be sufficiently crushed to form a smooth surface state. For this reason, the obtained embossed product had poor gloss in the glossy part, sufficient contrast between the glossy part and the non-glossy part was not obtained, and the scratch resistance of the glossy part was significantly inferior to the examples. .
【００２８】なお、本比較例の場合の表面粗さは、金型
シボ凸部８ｂがＲｚ＝０．２４μｍ、金型シボ凹部８ａ
がＲｚ＝０．９２μｍであった。また、金型シボ凸部８
ｂ、金型シボ凹部８ａの段差は、１３．５４μｍであっ
た。The surface roughness of this comparative example is Rz = 0.24 μm in the mold wrinkle convex portion 8b and the mold wrinkle concave portion 8a.
Was Rz = 0.92 μm. In addition, the mold texture convex portion 8
b, the step difference between the mold embossed concave portions 8a was 13.54 μm.
【００２９】[0029]
【発明の効果】このように、本発明によれば、予めブラ
スト処理で金型表面上に非光沢処理を施し、金型上に写
真製版技術によりパターンレジストフィルムを形成して
エッチングを行った後、ガラス等のビーズをブラストし
てエッチング部表面のみ平滑化、光沢化を図った。この
結果、金型は、光沢部と非光沢部のコントラストによる
意匠性および耐傷性のいずれにも優れたシボ製品の成形
が可能である。As described above, according to the present invention, after the surface of the mold is subjected to the non-gloss treatment by the blast treatment, the pattern resist film is formed on the mold by the photolithography technique, and the etching is performed. The surface of the etched part was smoothed and glossed by blasting beads such as glass. As a result, the mold is capable of forming a textured product having excellent design and scratch resistance due to the contrast between the glossy part and the non-glossy part.
【００３０】又、本発明によるシボ加工法は、先に金型
表面をブラストして微細な凹凸を形成するだけのため、
従来のシボ加工に比較してコストの上昇は少ない。Further, in the embossing method according to the present invention, since the mold surface is first blasted to form fine irregularities,
The cost does not increase as compared with the conventional embossing.
【図１】実施例の光沢部と非光沢部コントラストを有す
るシボ製品を得るための金型のシボ加工ステップ例を示
すフロー図。FIG. 1 is a flow chart showing an example of a graining step of a die for obtaining a grained product having a glossy portion and a non-glossy portion contrast of an embodiment.
【図２】同じく実施例のシボ加工ステップにより製作さ
れたシボ加工金型およびこれを用いて成形されたシボ製
品の模式的部分断面図である。FIG. 2 is a schematic partial cross-sectional view of an embossing die manufactured by the embossing step of the example and an embossed product molded using the die.
【図３】一般的な金型のシボ加工ステップ例を示すフロ
ー図。FIG. 3 is a flowchart showing an example of a general die-texturing step.
【図４】光沢部と非光沢部コントラストを有するシボ製
品を得るための金型のシボ加工ステップ例を示すフロー
図。FIG. 4 is a flow chart showing an example of a die texturing step for obtaining an embossed product having a glossy portion and a non-glossy portion contrast.
【図５】図４のシボ加工ステップにより製作されたシボ
加工金型およびこれを用いて成形されたシボ製品の模式
的部分断面図。FIG. 5 is a schematic partial cross-sectional view of a graining die manufactured by the graining step of FIG. 4 and a grained product molded by using the graining die.
１ 金型 ２ レジストフィルム ３ シボパターンフィルム ４ シボ加工金型 ５ シボ製品 ６ａ 金型シボ凹部 ６ｂ 金型シボ凸部 ７ａ 製品シボ凸部 ７ｂ 製品シボ凹部 ８ａ 金型シボ凹部 ８ｂ 金型シボ凸部 ９ａ 製品シボ凸部 ９ｂ 製品シボ凹部 1 die 2 resist film 3 embossed pattern film 4 embossing die 5 embossed product 6a die embossed recess 6b die embossed convex portion 7a product embossed convex portion 7b product embossed depression 8a die embossed recessed portion 8b die embossed convex portion 9a Product texture convex portion 9b Product texture concave portion
Claims (2)
型シボ凹部を平滑に形成して成るシボ製品成形用金型。1. A mold for forming an embossed product, wherein fine embossments are formed on the embossed convex parts of the mold, and the embossed concave parts are formed smoothly.
し、次に、前記ブラスト処理した金型上に写真製版技術
によりレジストフィルム層を形成して金型表面を覆い、
次に、エッチングを施した後、レジストフィルムを除去
しないままブラストしてエッチング部分のみアルミナラ
ンダムおよびエッチングによる微細凹凸跡を潰して滑ら
かな光沢部を形成し、次にレジストフィルムを除去する
ことにより、金型シボ凸部に非光沢部を形成して製品の
シボ凹部に光沢部を形成する金型のシボ加工法。2. A mold surface is subjected to a blast treatment to make it non-glossy, and then a resist film layer is formed on the blasted mold by a photomechanical technique to cover the mold surface.
Next, after performing etching, blasting is performed without removing the resist film to form a smooth glossy portion by crushing fine irregularities due to alumina random and etching only on the etched portion, and then by removing the resist film, A method of embossing a mold in which a non-glossy part is formed on the convex part of the mold and a glossy part is formed on the concave part of the product.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13458096A JP3479185B2 (en) | 1996-05-29 | 1996-05-29 | Grain processing method for molds for forming grain products |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13458096A JP3479185B2 (en) | 1996-05-29 | 1996-05-29 | Grain processing method for molds for forming grain products |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09314569A true JPH09314569A (en) | 1997-12-09 |
| JP3479185B2 JP3479185B2 (en) | 2003-12-15 |
Family
ID=15131691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13458096A Expired - Fee Related JP3479185B2 (en) | 1996-05-29 | 1996-05-29 | Grain processing method for molds for forming grain products |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3479185B2 (en) |
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