JPH09306038A - Stamper for optical disk - Google Patents

Stamper for optical disk

Info

Publication number
JPH09306038A
JPH09306038A JP12007296A JP12007296A JPH09306038A JP H09306038 A JPH09306038 A JP H09306038A JP 12007296 A JP12007296 A JP 12007296A JP 12007296 A JP12007296 A JP 12007296A JP H09306038 A JPH09306038 A JP H09306038A
Authority
JP
Japan
Prior art keywords
stamper
substrate
contact angle
optical disk
protective layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12007296A
Other languages
Japanese (ja)
Inventor
Takanori Tamura
孝憲 田村
Keiichi Ota
圭一 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP12007296A priority Critical patent/JPH09306038A/en
Publication of JPH09306038A publication Critical patent/JPH09306038A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To make the generation of a pit decentering and a double transfer in forming a substrate for an optical disk by making a contact angle of a mirror finished part with respect to water to be in the range of 80 deg.-100 deg.. SOLUTION: A positive type photoresist layer is formed on a glass substrate and it is irradiated with a laser beam. This is developed and recesses corresponding to pits and grooves are formed. Next, a metallic film is formed on the surface of the substrate by a sputtering or the like. Then, nickel, an electroformed body or the like are formed on the metallic film and these are stripped off from the photoresist layer and the glass substrate together with the metallic film to be made to be a stamper. Next, these are subjected to a surface processing to be made to be a stamper having irregular parts corresponding to pits or guiding grooves and a mirror finished part on its surface. Then, the wettability of the surface of the obtained stamper, that is, the contact angle is adjusted to be in the range of 80 deg.-100 deg.. This adjustment is performed by leaving one part of a resin protective layer in stripping off the protective layer formed on the irregular surface of the stamper.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は光ディスク用スタン
パーに関する。詳しくは、光ディスク用樹脂基板成形時
に金型中に取付けて、その表面の情報を基板に転写する
ために用いる光ディスク用スタンパーに関する。
TECHNICAL FIELD The present invention relates to a stamper for optical disks. More specifically, the present invention relates to a stamper for an optical disc, which is mounted in a mold at the time of molding a resin substrate for an optical disc and used to transfer information on its surface to the substrate.

【0002】[0002]

【従来の技術】近年、大容量、高速のメモリ媒体として
光記録媒体が注目されている。光記録媒体としては再生
専用型光ディスク(CD,CD−ROM等)、記録再生
型光ディスク(ライトワンス型)、記録、再生、消去、
再書込可能型光ディスク(リライタブル型)等が知られ
ている。これらの光記録媒体の基板としては一般に樹脂
基板(ポリカーボネート樹脂、アクリル樹脂等)が用い
られている。
2. Description of the Related Art In recent years, optical recording media have attracted attention as large-capacity, high-speed memory media. As the optical recording medium, a read-only type optical disc (CD, CD-ROM, etc.), a recording / playback type optical disc (write-once type), recording, reproducing, erasing,
A rewritable optical disk (rewritable type) and the like are known. A resin substrate (polycarbonate resin, acrylic resin, etc.) is generally used as the substrate of these optical recording media.

【0003】これらのディスク基板は生産性の面から通
常、射出成形法や射出圧縮成形法を用いて成形される。
具体的には、固定金型と可動金型との間に形成されるキ
ャビティー内に薄板・環状の金属製スタンパーを取付
け、キャビティー内に溶融樹脂を注入することによって
行なわれる。そして、スタンパーの信号(ピット)やト
ラッキング用案内溝等のプリフォーマット情報が転写さ
れた偏平なディスク基板が成形される。
From the viewpoint of productivity, these disk substrates are usually molded by injection molding or injection compression molding.
Specifically, this is performed by mounting a thin plate / annular metal stamper in a cavity formed between a fixed mold and a movable mold, and injecting molten resin into the cavity. Then, a flat disk substrate on which preformat information such as stamper signals (pits) and tracking guide grooves is transferred is molded.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、このよ
うに成形して得られた樹脂製の光ディスク用基板では、
射出成形時にプリフォーマット情報のピットのずれやピ
ットの二重転写が発生するという問題があった。これら
のピットずれや二重転写は光ディスク(追記型、書換え
可能型)においてIDエラーの原因となる。また、ゾー
ン記録フォーマットの光ディスクの場合には、ゾーンの
かわりめにおいて、ピットずれや二重転写が起こるの
で、記録領域のバーストエラーの原因となるといった問
題があった。
However, in the resin-made optical disk substrate obtained by molding in this manner,
There was a problem that the pit deviation of the preformat information and the double transfer of the pit occurred during the injection molding. These pit shifts and double transfer cause ID errors in optical disks (write-once type, rewritable type). Further, in the case of an optical disc of the zone recording format, there is a problem that a pit shift or double transfer occurs in place of the zone, which causes a burst error in the recording area.

【0005】本発明者等は基板成形時におけるこのよう
な問題点につき、鋭意検討した結果、ピットずれ及び二
重転写はピットや案内溝を転写するスタンパーからの基
板の離型性が不均一であることに大きな原因があること
が判明した。この基板の離型性を改善する方法として (1)スタンパーのピット深さ、ピット形状の制御 (2)樹脂に添加する離型剤の種類、添加量の調製 (3)離型条件(例えば、離型エアー吹き出し条件)の
制御 等が知られているが、いずれも十分に満足し得る方法で
はない。本発明の目的は光ディスク用基板成形時にピッ
トずれや二重転写の発生の少ない光ディスク用スタンパ
ーを提供することにある。
The inventors of the present invention have made diligent studies on such problems at the time of molding a substrate, and as a result, pit shift and double transfer result in uneven releasability of the substrate from the stamper transferring pits and guide grooves. It turns out that there is a major cause. As a method of improving the releasability of the substrate, (1) control of the pit depth and pit shape of the stamper (2) adjustment of the type and amount of release agent added to the resin (3) release conditions (for example, Control of release air blowing condition), etc. are known, but none of them are fully satisfactory. An object of the present invention is to provide an optical disk stamper in which pit displacement and double transfer are less likely to occur during molding of an optical disk substrate.

【0006】[0006]

【課題を解決するための手段】本発明の要旨は、光ディ
スク基板を成形する際に金型中に取付けて用いる光ディ
スク用スタンパーであって、表面にピット又は案内溝に
対応する凹凸部及び鏡面部とを有し、鏡面部の水に対す
る接触角が80°〜100°の範囲にあることを特徴と
する光ディスク用スタンパーに存する。
SUMMARY OF THE INVENTION The gist of the present invention is an optical disk stamper that is used by being mounted in a mold when an optical disk substrate is molded, and has an uneven portion and a mirror surface portion corresponding to pits or guide grooves on the surface. And a contact angle of water on the mirror surface portion with respect to water is in the range of 80 ° to 100 °.

【0007】以下本発明のスタンパーの一例につき図面
を参照しながら説明する。光ディスク用スタンパーは通
常、次のような工程で作製されている。まず、よく研磨
されたガラス基板上にポジ型ホトレジストを均一の厚さ
に塗布し、ホトレジスト層を形成する。次いで、このホ
トレジスト層のピット及びグルーブ対応部にレーザー光
を照射する。ホトレジスト層におけるレーザー光が照射
された部分は非照射部に比較してアルカリ現像液に溶解
しやすくなるため、ホトレジスト層にアルカリ現像液を
塗布して現像を行うと、レーザー光が照射された部分に
ピット及びグルーブに相当する凹部が形成される。その
後ガラス基板上に形成された凹凸面に電導性を付与する
金属膜をスパッタリング等により形成する。ここで、金
属膜を形成する金属としては、たとえば銀(Ag)、ニ
ッケル(Ni)などがあげられる。次いで、メッキ等の
電気鋳造法によって金属膜上に、たとえばニッケル(N
i)電鋳体を形成し、このニッケル(Ni)電鋳体を金
属膜とともにホトレジスト層およびガラス基板から剥離
してスタンパーとする。
An example of the stamper of the present invention will be described below with reference to the drawings. An optical disk stamper is usually manufactured by the following steps. First, a positive photoresist is applied to a well-polished glass substrate to a uniform thickness to form a photoresist layer. Then, laser light is applied to the pits and grooves corresponding to the photoresist layer. The portion of the photoresist layer that is irradiated with the laser light is more easily dissolved in the alkali developing solution than the non-irradiated portion. Therefore, when applying the alkali developing solution to the photoresist layer and performing development, the portion that is irradiated with the laser light is A concave portion corresponding to a pit and a groove is formed in the. After that, a metal film imparting electric conductivity is formed on the uneven surface formed on the glass substrate by sputtering or the like. Here, examples of the metal forming the metal film include silver (Ag) and nickel (Ni). Then, for example, nickel (N) is formed on the metal film by electroforming such as plating.
i) An electroformed body is formed, and this nickel (Ni) electroformed body is separated from the photoresist layer and the glass substrate together with the metal film to form a stamper.

【0008】得られたスタンパーは更に複製されるが、
複製の段階によってファーザースタンパー、マザースタ
ンパー、サンスタンパーと呼ばれる場合もある。このよ
うなスタンパーは光ディスク用基板成形時に金型に装着
するので、通常、金型との接触面、すなわちスタンパー
の裏面(スタンパーの凹凸が形成された側の反対面)を
研磨して平面仕上げされる。
The stamper obtained is further duplicated,
Depending on the stage of reproduction, it is sometimes called the father stamper, mother stamper, or sun stamper. Since such a stamper is attached to a mold during molding of an optical disk substrate, the contact surface with the mold, that is, the back surface of the stamper (the opposite surface of the stamper on the side where the unevenness is formed) is polished to be a flat surface. It

【0009】一般に、このスタンパーの裏面の研磨は研
磨液を供給しながら、ラッピング又はポリッシングテー
プ等の研磨装置を用いて行なわれる。このスタンパーの
裏面の研磨方法は2つの方法により実施されている。す
なわち、1つの方法は、ニッケル電鋳体がガラス基板上
に形成された状態で研磨装置に装着し、該電鋳体の裏面
(凹凸が形成された側の反対側)に研磨液を供給しなが
ら、研磨を行ないその表面を平面、特に鏡面仕上げを行
なう。
Generally, the back surface of the stamper is polished by using a polishing device such as lapping or polishing tape while supplying a polishing liquid. The back surface of this stamper is polished by two methods. That is, one method is to mount a nickel electroformed body on a glass substrate in a polishing apparatus, and supply a polishing liquid to the back surface of the electroformed body (the side opposite to the side where irregularities are formed). On the other hand, polishing is performed to make the surface flat, especially mirror-finished.

【0010】また、もう1つの方法は、ニッケル電鋳体
をガラス基板から分離した後、得られるスタンパーの凹
凸が形成された側の面に樹脂の保護層を形成してその裏
面の研磨を行なう方法であるが、この方法の場合には研
磨後、該保護層を剥離してスタンパーとする。本発明に
おいては、得られたスタンパーの表面の濡れ性、特に水
に対する接触角を80°〜100°、好ましくは90°
〜95°の範囲にすることを特徴とするものである。
In another method, after separating the nickel electroformed body from the glass substrate, a resin protective layer is formed on the surface of the resulting stamper on the side where the unevenness is formed, and the back surface is polished. In this method, the protective layer is peeled off after polishing to obtain a stamper. In the present invention, the wettability of the surface of the obtained stamper, especially the contact angle with water is 80 ° to 100 °, preferably 90 °.
It is characterized in that it is in the range of up to 95 °.

【0011】上記の水に対する接触角はスタンパーの表
面の濡れ性の指標を示すものであり、便宜上スタンパー
の鏡面部で測定した値を示すものであり、接触角が下限
未満では離型ムラやピットずれが発生しやすくなり、ま
た上限より大きいと、二重転写やピットずれが発生しや
すくなる。従って、スタンパー表面の水に対する接触角
が80°〜100°の範囲内であれば、離型ムラ、ピッ
トずれ及び二重転写の発生が防止できる。
The above contact angle with respect to water is an index of the wettability of the surface of the stamper, and is a value measured on the mirror surface portion of the stamper for convenience. Misalignment is likely to occur, and if it exceeds the upper limit, double transfer and pit misalignment are likely to occur. Therefore, if the contact angle of water on the stamper surface is in the range of 80 ° to 100 °, it is possible to prevent uneven release, pit shift, and double transfer.

【0012】上記スタンパーの材質、すなわちニッケル
電鋳体自身の表面の水に対する接触角は50°前後であ
り、本発明の範囲の濡れ性(接触角)に調整するにはス
タンパーの表面処理をすることが必要である。スタンパ
ーの表面処理方法としては上記接触角の範囲内に入る処
理方法であれば特に制限はない。1つの方法としては上
記したスタンパーの裏面の研磨方法の後者の方法、すな
わち、スタンパーの凹凸面に樹脂の保護層を形成する
際、樹脂、特に塩化ビニル−酢酸ビニル共重合体(平均
分子量が5万以下のもの、望ましくは1〜4万のもの)
に脂肪酸、特に炭素数5〜18の脂肪酸、好ましくは炭
素数8〜15の脂肪酸例えば、カプリン酸、ラウリン
酸、ミリスチン酸、パルミチン酸等を0.1重量%以
上、望ましくは0.3〜2重量%を配合したものを保護
層として用い、次いでスタンパー裏面を研磨後に保護層
をスタンパーより剥離し、スタンパー表面に上記脂肪酸
の一部を残存させる方法がある。表面の濡れ性が改善さ
れ、鏡面部における水の接触角を上記範囲内に調節でき
る。また、他の方法としては上記スタンパーの裏面の研
磨方法の前者の方法を採用して得られたスタンパーの表
面(凹凸面が形成された側)に上記した保護層に用いた
樹脂を少量塗布してスタンパー表面の濡れ性を改善し
て、水に対する接触角を上記範囲内に調節してもよい。
The material of the stamper, that is, the contact angle of water on the surface of the nickel electroformed body itself is about 50 °, and the surface treatment of the stamper is performed to adjust the wettability (contact angle) within the range of the present invention. It is necessary. The surface treatment method of the stamper is not particularly limited as long as it is a treatment method falling within the above contact angle range. One method is the latter method of polishing the back surface of the stamper, that is, when forming a protective layer of resin on the uneven surface of the stamper, the resin, especially vinyl chloride-vinyl acetate copolymer (average molecular weight of 5 10,000 or less, preferably 10,000 to 40,000)
In addition, 0.1% by weight or more of fatty acids, particularly fatty acids having 5 to 18 carbon atoms, preferably fatty acids having 8 to 15 carbon atoms, such as capric acid, lauric acid, myristic acid, palmitic acid, and preferably 0.3 to 2 There is a method in which a mixture of the components by weight% is used as a protective layer, and then the back surface of the stamper is polished and then the protective layer is peeled off from the stamper to leave a part of the fatty acid on the stamper surface. The wettability of the surface is improved, and the contact angle of water on the mirror surface portion can be adjusted within the above range. As another method, a small amount of the resin used for the above-mentioned protective layer is applied to the surface of the stamper obtained by adopting the former method of polishing the back surface of the stamper (the side on which the uneven surface is formed). The wettability of the stamper surface may be improved to adjust the contact angle to water within the above range.

【0013】[0013]

【実施例】【Example】

実施例1 ニッケル電鋳体からなるスタンパーの表面(凹凸面)に
保護層(塩化ビニル−酢酸ビニル共重合体(平均分子量
2万)にラウリル酸0.3重量%添加したもの)を形成
し、次いでスタンパー裏面を研磨処理した後、スタンパ
ー表面の保護層を剥離してスタンパーを得、スタンパー
表面の鏡面部における水に対する接触角は95°であっ
た。
Example 1 A protective layer (vinyl chloride-vinyl acetate copolymer (average molecular weight 20,000) to which 0.3% by weight of lauric acid was added) was formed on the surface (uneven surface) of a stamper made of a nickel electroformed body, Then, after the back surface of the stamper was polished, the protective layer on the surface of the stamper was peeled off to obtain a stamper, and the contact angle of water on the mirror surface portion of the stamper surface was 95 °.

【0014】上記Ni製のスタンパーを金型面に取付
け、この金型間のキャビティー内にポリカーボネート溶
融樹脂材を金型温度110°Cで射出し、型締め圧力を
ディスク面圧力300kg/cm2 で加圧保持した状態
で冷却し、次いで常圧に戻し、金型とディスク基板との
間にエアーを供給し、これらを分離させた。得られたデ
ィスク基板(130mmφ×1.2mm厚)は多数の成
形ショット(35000回)を行なってもスタンパーの
溝、ピットの転写性は良好であり、離型ムラピットずれ
や二重転写は全く見られなかった。
The Ni stamper is attached to the mold surfaces, and the polycarbonate molten resin material is injected into the cavity between the molds at a mold temperature of 110 ° C., and the mold clamping pressure is set to 300 kg / cm 2 of the disk surface pressure. It was cooled in a state of being pressurized and held by, then returned to normal pressure, and air was supplied between the mold and the disk substrate to separate them. The obtained disk substrate (130 mmφ × 1.2 mm thickness) had good transferability of the grooves and pits of the stamper even after a large number of molding shots (35,000 times), and no mold release uneven pit deviation or double transfer was observed. I couldn't do it.

【0015】比較例1 実施例1において、スタンパーの表面に保護層として、
塩化ビニル−酢酸ビニル共重合体(平均分子量3.9
万)にジオクチルフタレートを3重量%添加したものを
用いたこと以外は同様にして行なった。得られたスタン
パー表面の鏡面部における水に対する接触角は70°で
あり、このスタンパーを用いて実施例1と同様にしてデ
ィスク基板の成形を行なった。その結果、得られたディ
スク基板は初期から離型ムラが発生した。
Comparative Example 1 In Example 1, as a protective layer on the surface of the stamper,
Vinyl chloride-vinyl acetate copolymer (average molecular weight 3.9
In the same manner as above, except that 3% by weight of dioctyl phthalate was added to 10,000). The contact angle of water on the mirror surface portion of the obtained stamper surface was 70 °, and a disk substrate was molded in the same manner as in Example 1 using this stamper. As a result, the obtained disk substrate had mold release unevenness from the beginning.

【0016】比較例2 実施例1において、スタンパーの表面に保護層として、
塩化ビニル−酢酸ビニル共重合体(平均分子量3.1
万)にシリコンオイルを15重量%添加したものを用い
たこと以外は同様にして行なった。得られたスタンパー
表面の鏡面部における水に対する接触角は60°であ
り、このスタンパーを用いて実施例1と同様にしてディ
スク基板の成形を行なった。その結果、得られたディス
ク基板は初期から著しく離型ムラが発生した。
Comparative Example 2 In Example 1, as a protective layer on the surface of the stamper,
Vinyl chloride-vinyl acetate copolymer (average molecular weight 3.1
In the same manner as above, except that 15% by weight of silicon oil was added. The contact angle of water on the mirror surface portion of the obtained stamper was 60 °, and a disk substrate was molded in the same manner as in Example 1 using this stamper. As a result, the obtained disc substrate had remarkably uneven release from the beginning.

【0017】比較例3 実施例1において、スタンパー表面に保護層として6フ
ッ化プロピレンプラズマ重合膜のフッ素樹脂膜を用いた
こと以外は同様にして行なった。得られたスタンパー表
面の鏡面部における水に対する接触角は110°であ
り、このスタンパーを用いて実施例1と同様にしてディ
スク基板の成形を行なった。その結果、得られたディス
ク基板は初期からピットずれや二重転写が発生した。
Comparative Example 3 The same procedure as in Example 1 was repeated except that a fluororesin film of propylene hexafluoride plasma polymerized film was used as a protective layer on the stamper surface. The contact angle of water on the mirror surface portion of the obtained stamper was 110 °, and a disk substrate was formed in the same manner as in Example 1 using this stamper. As a result, the obtained disk substrate had pit shift and double transfer from the initial stage.

【0018】[0018]

【発明の効果】本発明のスタンパーを用いて光ディスク
基板を成形すれば、長期にわたり二重転写やピットむら
のない基板が安定して成形できる。
EFFECTS OF THE INVENTION By molding an optical disk substrate using the stamper of the present invention, it is possible to stably mold a substrate free from double transfer and uneven pits for a long period of time.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 光ディスク基板を成形する際に金型中に
取付けて用いる光ディスク用スタンパーであって、表面
にピットまたは案内溝に対応する凹凸部及び鏡面部とを
有し、鏡面部の水に対する接触角が80°〜100°の
範囲にあることを特徴とする光ディスク用スタンパー。
1. A stamper for an optical disk, which is used by being mounted in a mold when molding an optical disk substrate, having a concave and convex portion corresponding to a pit or a guide groove and a mirror surface portion on the surface, and for the water on the mirror surface portion. An optical disk stamper having a contact angle in the range of 80 ° to 100 °.
【請求項2】 スタンパーの表面に炭素数8〜15の脂
肪酸を存在させることにより鏡面部の水に対する接触角
を80°〜100°としたことを特徴とする請求項1に
記載の光ディスク用スタンパー。
2. The stamper for an optical disk according to claim 1, wherein the contact angle of the mirror surface with water is 80 ° to 100 ° by allowing a fatty acid having 8 to 15 carbon atoms to exist on the surface of the stamper. .
JP12007296A 1996-05-15 1996-05-15 Stamper for optical disk Pending JPH09306038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12007296A JPH09306038A (en) 1996-05-15 1996-05-15 Stamper for optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12007296A JPH09306038A (en) 1996-05-15 1996-05-15 Stamper for optical disk

Publications (1)

Publication Number Publication Date
JPH09306038A true JPH09306038A (en) 1997-11-28

Family

ID=14777212

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12007296A Pending JPH09306038A (en) 1996-05-15 1996-05-15 Stamper for optical disk

Country Status (1)

Country Link
JP (1) JPH09306038A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006289519A (en) * 2005-04-06 2006-10-26 Hitachi Industrial Equipment Systems Co Ltd Nano print die, its manufacturing method, nano print device and nano print method using this die
US7829166B2 (en) 2004-09-02 2010-11-09 Teijin Chemicals Ltd. Optical disk

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7829166B2 (en) 2004-09-02 2010-11-09 Teijin Chemicals Ltd. Optical disk
JP2006289519A (en) * 2005-04-06 2006-10-26 Hitachi Industrial Equipment Systems Co Ltd Nano print die, its manufacturing method, nano print device and nano print method using this die
JP4584754B2 (en) * 2005-04-06 2010-11-24 株式会社日立産機システム Nanoprint mold, method for producing the same, nanoprint apparatus using the mold, and nanoprint method

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