JPH09299809A - Harmful substance removing agent, its preparation, and harmful substance removing method using the agent - Google Patents

Harmful substance removing agent, its preparation, and harmful substance removing method using the agent

Info

Publication number
JPH09299809A
JPH09299809A JP8140822A JP14082296A JPH09299809A JP H09299809 A JPH09299809 A JP H09299809A JP 8140822 A JP8140822 A JP 8140822A JP 14082296 A JP14082296 A JP 14082296A JP H09299809 A JPH09299809 A JP H09299809A
Authority
JP
Japan
Prior art keywords
harmful substance
substance removing
removing agent
metal oxide
agent according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8140822A
Other languages
Japanese (ja)
Other versions
JP3884503B2 (en
Inventor
Eiji Nomura
英司 野村
Toshihiro Koyama
俊洋 小山
Junko Koizumi
純子 小泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ishihara Sangyo Kaisha Ltd
Original Assignee
Ishihara Sangyo Kaisha Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ishihara Sangyo Kaisha Ltd filed Critical Ishihara Sangyo Kaisha Ltd
Priority to JP14082296A priority Critical patent/JP3884503B2/en
Publication of JPH09299809A publication Critical patent/JPH09299809A/en
Application granted granted Critical
Publication of JP3884503B2 publication Critical patent/JP3884503B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve handling, to have high photocatalytic activity, to keep the activity over a long period of time, and to be used in a humid atmosphere. SOLUTION: A harmful substance removing agent is composed of at least photosemiconductor in which metal oxide which has constituted metal oxide sol is used as a binder and metal oxide. A mixture of the photosemiconductor and the metal oxide sol is pelletized or molded and dried to prepare the agent. The agent is brought into contact with fluids containing harmful substances, or the agent is is contacted with the fluid while being irradiated with light to remove the harmful substances.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、有害物質を除去す
る有害物質除去剤およびその製造方法、それを用いた有
害物質除去方法に関する。
TECHNICAL FIELD The present invention relates to a harmful substance removing agent for removing harmful substances, a method for producing the same, and a method for removing harmful substances using the same.

【0002】[0002]

【従来の技術】近年の地球環境、生活環境に対する問題
意識の高まりとともに、各種工場、自動車等から排出さ
れる有機ハロゲン化物や炭化水素類や生活空間における
悪臭成分などの有害物質を除去する技術に対する関心が
高まってきている。また、青果物が発散するエチレン
が、これら青果物の腐敗を早める作用があるなどの問題
がクローズアップされて来つつある。このような有害物
質の除去方法には活性炭、ゼオライト等の吸着剤を用い
る方法が一般的に行われている。しかし、この方法は有
害物質を単に吸着するだけであるため、有害物質が多量
にある場合、吸着飽和に達しこれ以上有害物質を吸着し
なくなる。また、吸着した有害物質が状態の変化に伴い
脱離するという問題がある。このため、酸化チタンなど
の光半導体が有する触媒作用により有害物質を酸化分解
し、無害化する方法が提案されている。
2. Description of the Related Art With the increasing awareness of global environment and living environment problems in recent years, there has been developed a technology for removing harmful substances such as organic halides and hydrocarbons emitted from various factories and automobiles, and malodorous components in living spaces. Interest is growing. In addition, ethylene, which is emitted from fruits and vegetables, has the effect of accelerating the decay of these fruits and vegetables. As a method for removing such harmful substances, a method using an adsorbent such as activated carbon or zeolite is generally used. However, since this method simply adsorbs the harmful substance, when a large amount of the harmful substance is present, the saturation of adsorption is reached and the harmful substance is not adsorbed any more. Further, there is a problem that the adsorbed harmful substance is desorbed as the state changes. Therefore, a method has been proposed in which a harmful substance is oxidized and decomposed by the catalytic action of an optical semiconductor such as titanium oxide to render it harmless.

【0003】[0003]

【発明が解決しようとする課題】前記の酸化チタンなど
の光半導体は、光触媒活性により有害物質を無害化でき
る。しかし、粉末であるということから、被処理流体か
らの分離回収が非常に困難になるという問題がある。こ
の問題を解決するために、光触媒活性を維持しながら取
り扱い性を向上させた、光半導体である酸化チタンと高
純度ベントナイトからなる造粒体が提案されている(特
願平7−129383号)。しかしながら、この造粒体
はベントナイトを用いているため、水分によって形が崩
れ、崩壊しやすい。このため水分が多量に存在する雰囲
気では使用し難く、適用範囲が制約されるという問題が
ある。また、ガラスやセラミックスなどの基板上に光半
導体を固定して得た固定化光半導体が検討されている。
このものは、分離・回収が容易であるが、被処理流体と
の接触などにより固定した光半導体が担体から剥離して
しまい、光触媒活性が長期間にわたって維持できないと
いう問題がある。しかも、固定化処理のために高温度の
焼成が必要であり、これにより光半導体の光触媒活性が
低下するという問題もある。
The above-mentioned optical semiconductors such as titanium oxide can make harmful substances harmless by photocatalytic activity. However, since it is a powder, there is a problem that it becomes very difficult to separate and collect it from the fluid to be processed. In order to solve this problem, there has been proposed a granulated body comprising titanium oxide, which is an optical semiconductor, and high-purity bentonite, which has improved handleability while maintaining photocatalytic activity (Japanese Patent Application No. 7-129383). . However, since this granule uses bentonite, its shape tends to collapse due to moisture, and it tends to collapse. Therefore, it is difficult to use in an atmosphere where a large amount of water is present, and there is a problem that the application range is restricted. Further, a fixed optical semiconductor obtained by fixing an optical semiconductor on a substrate such as glass or ceramics is under study.
This product is easy to separate and collect, but there is a problem that the photo-semiconductor immobilized is separated from the carrier due to contact with the fluid to be treated and the photocatalytic activity cannot be maintained for a long time. Moreover, there is a problem in that high-temperature baking is required for the immobilization treatment, which lowers the photocatalytic activity of the photosemiconductor.

【0004】[0004]

【課題を解決するための手段】本発明者らは、取り扱い
性が良く、高い光触媒活性を持ち、かつ、その光触媒活
性を長期間にわたって維持でき、しかも、湿潤下でも使
用できる有害物質除去剤を得るために、種々の探索を行
った結果、金属酸化物ゾルを構成していた金属酸化物を
結着剤として用いると所望の有害物質除去剤が得られる
こと、しかも、このようにして得た有害物質除去剤が種
々の有害物質除去処理に適用できるものであることを見
出し本発明を完成した。すなわち、本発明は悪臭成分な
どの有害物質の除去能力に優れ、かつ、取り扱いの容易
な有害物質除去剤を提供することにある。また、本発明
は、前記の有害物質除去剤を簡便かつ廉価に製造する方
法を提供することにある。さらに、本発明は、前記有害
物質除去剤を用いて有害物質を除去する方法を提供する
ことにある。
Means for Solving the Problems The present inventors have developed a harmful substance removing agent which is easy to handle, has a high photocatalytic activity, and can maintain the photocatalytic activity for a long period of time, and which can be used even under wet conditions. As a result of various searches to obtain the above, it was found that the desired toxic substance removing agent can be obtained by using the metal oxide that constitutes the metal oxide sol as the binder, The present invention has been completed by finding that the harmful substance removing agent can be applied to various harmful substance removing treatments. That is, the present invention is to provide a harmful substance removing agent which has excellent ability to remove harmful substances such as malodorous components and is easy to handle. Another object of the present invention is to provide a method for easily and inexpensively producing the harmful substance removing agent. Furthermore, the present invention is to provide a method for removing harmful substances using the harmful substance removing agent.

【0005】本発明は、金属酸化物ゾルを構成していた
金属酸化物を結着剤として用いた、少なくとも光半導体
と該金属酸化物から成る造粒体あるいはそれらの成形体
であることを特徴とする有害物質除去剤である。本発明
の有害物質除去剤の形態は使用場面に応じて適宜設計す
ることができ、たとえば、球状、円柱状、リング状、板
状、ハニカム状などの形状が挙げられる。また、造粒体
あるいは成形体を粉砕した不定形状でも良い。本発明で
は、有害物質との接触面積を大きくでき、しかも、圧力
損失を低くできることから、ハニカム形状を有する構造
体とするのが好ましい。ハニカム形状を有する構造体と
は、三角形、四角形、六角形、円、楕円などの形の断面
を有する貫通孔を多数存在させた構造体のことである。
造粒体あるいは成形体の大きさは、使用場面に応じて適
宜設計することができる。
The present invention is characterized in that it is a granulated body containing at least an optical semiconductor and the metal oxide or a molded body thereof using the metal oxide constituting the metal oxide sol as a binder. It is a harmful substance remover. The form of the harmful substance removing agent of the present invention can be appropriately designed according to the use scene, and examples thereof include a spherical shape, a cylindrical shape, a ring shape, a plate shape, and a honeycomb shape. Further, it may have an irregular shape obtained by crushing a granulated body or a molded body. In the present invention, a structure having a honeycomb shape is preferable because the contact area with a harmful substance can be increased and the pressure loss can be reduced. The honeycomb-shaped structure is a structure having a large number of through holes having a cross section of a triangle, a quadrangle, a hexagon, a circle, an ellipse, or the like.
The size of the granulated body or the molded body can be appropriately designed depending on the use scene.

【0006】光半導体はいわゆる光触媒作用を示し、光
を照射すると発現する強い酸化力により有害物質を酸化
分解し、無害化することができる。たとえば、酸化チタ
ン、酸化亜鉛、酸化タングステン、酸化鉄、チタン酸ス
トロンチウム、硫化モリブデン、硫化カドミウムなどの
公知の光半導体を、単一または2種以上組み合わせて用
いることができる。特に、高い光触媒作用を有し、化学
的に安定であり、かつ、無害である酸化チタンが好まし
い。酸化チタンとは、いわゆる酸化チタンのほか、含水
酸化チタン、水和酸化チタン、水酸化チタン、メタチタ
ン酸、オルトチタン酸をも包含する。中でもアナタース
型結晶形を有する酸化チタンが優れた光触媒活性を有
し、さらに、その粒子径が1〜50nmの小さなものが
より好ましい。さらに好ましい酸化チタンの粒子径は1
〜30nmである。また、前記の光半導体に、鉄、コバ
ルト、ニッケル、銅、亜鉛、ルテニウム、ロジウム、パ
ラジウム、銀、金、白金などの他金属あるいはそれらの
他金属の化合物を含有させても良く、特に、酸化亜鉛お
よび/または水酸化亜鉛を担持した酸化チタンは、有害
物質の吸着能力と光触媒作用による分解能力を併せ持っ
たものであり、より好ましいものである。
The photo-semiconductor exhibits a so-called photocatalytic action, and can oxidize and decompose harmful substances and render them harmless by the strong oxidizing power that appears when light is irradiated. For example, known optical semiconductors such as titanium oxide, zinc oxide, tungsten oxide, iron oxide, strontium titanate, molybdenum sulfide, and cadmium sulfide can be used alone or in combination of two or more kinds. In particular, titanium oxide, which has a high photocatalytic action, is chemically stable, and is harmless, is preferable. Titanium oxide includes not only so-called titanium oxide but also hydrous titanium oxide, hydrated titanium oxide, titanium hydroxide, metatitanic acid and orthotitanic acid. Among them, titanium oxide having an anatase type crystal form has excellent photocatalytic activity, and more preferably, it has a small particle size of 1 to 50 nm. More preferable titanium oxide particle size is 1
3030 nm. Further, the above optical semiconductor may contain another metal such as iron, cobalt, nickel, copper, zinc, ruthenium, rhodium, palladium, silver, gold or platinum, or a compound of the other metal, in particular, oxidation. Titanium oxide carrying zinc and / or zinc hydroxide has both the adsorption ability of harmful substances and the decomposition ability by photocatalysis, and is more preferable.

【0007】本発明に用いる光半導体は種々の方法で得
ることができ、たとえば、酸化チタンは、(1)硫酸チ
タニル、硫酸チタン、塩化チタン、有機チタン化合物な
どのチタン化合物を熱加水分解する方法、(2)硫酸チ
タニル、硫酸チタン、塩化チタン、有機チタン化合物な
どのチタン化合物にアルカリを添加し中和する方法、
(3)塩化チタン、有機チタン化合物などを気相酸化す
る方法、(4)前記(1)、(2)の方法で得られた酸
化チタンを800℃程度以下の温度で焼成する方法など
を用いて得ることができる。
The optical semiconductor used in the present invention can be obtained by various methods. For example, for titanium oxide, (1) a method of thermally hydrolyzing a titanium compound such as titanyl sulfate, titanium sulfate, titanium chloride or an organic titanium compound. And (2) a method of adding an alkali to a titanium compound such as titanyl sulfate, titanium sulfate, titanium chloride, or an organic titanium compound to neutralize it,
(3) A method of vapor-phase oxidizing titanium chloride, an organic titanium compound, or the like, (4) A method of firing the titanium oxide obtained by the methods (1) and (2) above at a temperature of about 800 ° C. or less, and the like. Can be obtained.

【0008】本発明の有害物質除去剤において、結着剤
として作用する金属酸化物は、水やアルコールなどの分
散媒に分散した金属酸化物ゾルの状態のものを用いる。
本発明において、金属酸化物ゾルとは、いわゆる金属酸
化物を含有したゾルのほか、含水金属酸化物を含有した
ゾル、水和金属酸化物を含有したゾル、あるいは金属水
酸化物を含有したゾルをも包含する。このような金属酸
化物ゾルを構成していた金属酸化物としては、ケイ素、
アルミニウム、チタン、鉄、亜鉛、コバルト、ニッケル
などの金属の酸化物(含水酸化物、水和酸化物あるいは
水酸化物を包含する)を用いることができ、特に、ケイ
素、アルミニウムおよびチタンから選ばれる元素の少な
くとも1種の酸化物(含水酸化物、水和酸化物あるいは
水酸化物を包含する)が好ましい。金属酸化物の含有量
は、有害物質除去剤に対して、5〜30重量%が好まし
く、さらに、10〜20重量%がより好ましい。金属酸
化物の含有量が前記の範囲より少ない場合には、結着力
が不足して有害物質除去剤の強度が弱くなるため好まし
くなく、また、前記の範囲より多い場合には、光半導体
の吸着能や光触媒活性が発揮されにくくなるため好まし
くない。金属酸化物の粒子径は、結着性の観点から1〜
100nmが好ましく、1〜50nmがより好ましい。
In the harmful substance removing agent of the present invention, the metal oxide acting as a binder is a metal oxide sol dispersed in a dispersion medium such as water or alcohol.
In the present invention, the metal oxide sol, in addition to the so-called sol containing a metal oxide, a sol containing a hydrous metal oxide, a sol containing a hydrated metal oxide, or a sol containing a metal hydroxide. Also includes. Examples of the metal oxide that constitutes such a metal oxide sol include silicon,
Oxides of metals such as aluminum, titanium, iron, zinc, cobalt and nickel (including hydrous oxides, hydrated oxides or hydroxides) can be used, and particularly selected from silicon, aluminum and titanium. At least one oxide of the element (including hydrous oxide, hydrated oxide or hydroxide) is preferred. The content of the metal oxide is preferably 5 to 30% by weight, and more preferably 10 to 20% by weight, based on the harmful substance removing agent. When the content of the metal oxide is less than the above range, it is not preferable because the binding force is insufficient and the strength of the harmful substance removing agent becomes weak, and when it is more than the above range, adsorption of the optical semiconductor Performance and photocatalytic activity are less likely to be exhibited, which is not preferable. The particle size of the metal oxide is 1 to 1 from the viewpoint of binding property.
100 nm is preferable and 1-50 nm is more preferable.

【0009】本発明において、金属酸化物ゾルを構成し
ていた金属酸化物のほかに、有機質バインダを結着剤と
して用いると、より一層強固な有害物質除去剤とするこ
とができるため好ましい形態である。有機質バインダと
しては、一般に有機質バインダと称される有機物を用い
ることができ、たとえば、かんしょ、ばれいしょ、タピ
オカ、小麦、コンスターチなどのでん粉質、ふのり、ガ
ラクタン(寒天)、アルギン酸ナトリウムなどの海そう
類、トロロアロイ、トラガントゴム、アラビアゴムなど
の植物粘質物、デキストリン、レバンなどの微生物によ
る粘質物、にかわ、ゼラチン、カゼイン、コラーゲンな
どのたん白質、ビスコース、メチルセルローズ、エチル
セルローズ、ヒドロキシエチルセルローズ、カルボキシ
セルローズなどのセルローズ、可溶性でん粉、カルボキ
シメチルでん粉、ジアルデヒドでん粉などのでん粉、ポ
リビニルアルコール、ポリアクリル酸ナトリウム、ポリ
エチレンオキシド、ユリア系ポリマー、フェノール系ポ
リマーなどの合成品などの水溶性有機質バインダ、ポリ
酢酸ビニル、酢ビ・エチレン系共重合体、酢ビ・アクリ
ル系共重合体、酢ビ・Veova共重合体、その他酢ビ
・重合性ビニルモノマー、アクリル系エマルションポリ
アクリル酸エステル、アクリル・Veova共重合体、
酢ビ・Veova・アクリル系、エチレン・酢ビ・アク
リル系、アクリル・スチレン系、ポリ塩化ビニル、塩ビ
・塩化ビニリデン共重合体、合成ゴムラテックスなどの
エマルションポリマーなどが挙げられる。本発明におい
ては、水分による崩壊性がより一層少ない有害物質除去
剤とすることができることから、エマルションポリマー
を配合するのがより好ましい。有機質バインダの含有量
は、有害物質除去剤に対して、0.5〜20重量%が好
ましく、さらに、1〜10重量%がより好ましい。有機
質バインダの含有量が前記の範囲より少ない場合には、
有機質バインダを添加した効果が認められにくいため好
ましくなく、また、前記の範囲より多い場合には、光半
導体の吸着能や光触媒活性が発揮されにくくなるため好
ましくない。
In the present invention, when an organic binder is used as a binder in addition to the metal oxides which have constituted the metal oxide sol, it is possible to make a more robust harmful substance removing agent, and therefore in a preferable form. is there. As the organic binder, an organic substance generally called an organic binder can be used. For example, starchy substances such as kansho, potato, tapioca, wheat, and corn starch, fungi, galactan (agar), seaweeds such as sodium alginate, Plant mucilages such as troloalloy, tragacanth and acacia, microbial mucilages such as dextrin and levan, proteins such as glue, gelatin, casein and collagen, viscose, methyl cellulose, ethyl cellulose, hydroxyethyl cellulose, carboxy cellulose, etc. Cellulose, soluble starch, carboxymethyl starch, starch such as dialdehyde starch, polyvinyl alcohol, sodium polyacrylate, polyethylene oxide, urea-based polymer, phenol-based starch Water-soluble organic binders for synthetic products such as polymers, polyvinyl acetate, vinyl acetate / ethylene copolymers, vinyl acetate / acrylic copolymers, vinyl acetate / Veova copolymers, and other vinyl acetate / polymerizable vinyl monomers , Acrylic emulsion polyacrylic acid ester, acrylic-Veova copolymer,
Examples thereof include vinyl acetate / Veova / acrylic, ethylene / vinyl acetate / acrylic, acrylic / styrene-based, polyvinyl chloride, vinyl chloride / vinylidene chloride copolymer, and emulsion polymers such as synthetic rubber latex. In the present invention, it is more preferable to add an emulsion polymer, since it can be used as a harmful substance-removing agent that is less disintegratable by water. The content of the organic binder is preferably 0.5 to 20% by weight, and more preferably 1 to 10% by weight, based on the harmful substance removing agent. When the content of the organic binder is less than the above range,
It is not preferable because the effect of adding the organic binder is hard to be recognized, and when the amount is more than the above range, it is not preferable because the adsorption ability and photocatalytic activity of the optical semiconductor are difficult to be exhibited.

【0010】なお、本発明の有害物質除去剤には、光半
導体と金属酸化物の他に、あるいはさらに添加する有機
質バインダの他に、吸着剤を含有させても良い。吸着剤
としては、有害物質を吸着できる通常のものが使用で
き、たとえば、活性炭、活性アルミナ、シリカゲル、ゼ
オライトなどを用いることができる。
The harmful substance removing agent of the present invention may contain an adsorbent in addition to the optical semiconductor and the metal oxide, or in addition to the organic binder to be added. As the adsorbent, a normal adsorbent capable of adsorbing harmful substances can be used, and for example, activated carbon, activated alumina, silica gel, zeolite or the like can be used.

【0011】また、本発明の有害物質除去剤には、必要
に応じて、種々の補強材、フィラーを含有させても良
い。補強材としては、酸化チタン繊維、チタン酸カリウ
ム繊維、結晶セルロースなどを用いることができる。
If desired, the harmful substance removing agent of the present invention may contain various reinforcing materials and fillers. As the reinforcing material, titanium oxide fiber, potassium titanate fiber, crystalline cellulose, or the like can be used.

【0012】本発明の有害物質除去剤を製造するには、
光半導体と金属酸化物ゾルとの混合物を造粒あるいは成
形し、次いで、乾燥する方法が好ましい。この方法に
は、光半導体を造粒、成形する際に、金属酸化物ゾルを
加えることを包含する。また、本発明の有害物質除去剤
を製造するには、光半導体と金属酸化物ゾルと有機質バ
インダとの混合物を造粒あるいは成形し、次いで、乾燥
する方法が好ましい。この方法には、光半導体を造粒、
成形する際に、金属酸化物ゾルと有機質バインダとを加
えることを包含する。金属酸化物ゾルには、必要に応じ
て、種々の分散安定化剤を含有させていても良い。前記
の造粒、成形を行うには、たとえば、転動造粒機、押し
出し造粒機、撹拌造粒機、解砕機、圧縮成形機、スプレ
ー造粒機、金型成形機などの機械を用いて行うことがで
き、転動造粒機、押し出し造粒機あるいは圧縮成形機で
得られた造粒体、成形体は、その強度が比較的強いため
好ましい。得られた造粒体あるいは成形体を乾燥する。
乾燥温度は、室温〜150℃の温度が好ましい。乾燥し
て得た造粒体、成形体を、必要に応じて、150〜30
0℃の温度で焼成しても良い。この焼成により、造粒体
あるいは成形体の強度を高めることができる。しかしな
がら、焼成温度が300℃より高いと、光半導体の光触
媒活性が低下するため好ましくない。乾燥前の造粒体あ
るいは成形体を、必要に応じて、ロッシュ型造粒機、マ
ルメライザーなどの転動造粒機にかけて、球形の造粒体
に整粒した後、乾燥させても良い。
To produce the harmful substance removing agent of the present invention,
A method in which a mixture of an optical semiconductor and a metal oxide sol is granulated or molded and then dried is preferable. This method includes adding a metal oxide sol when granulating and molding an optical semiconductor. Further, in order to produce the harmful substance removing agent of the present invention, a method in which a mixture of an optical semiconductor, a metal oxide sol and an organic binder is granulated or molded and then dried is preferable. This method involves granulating optical semiconductors,
It includes adding a metal oxide sol and an organic binder at the time of molding. If necessary, the metal oxide sol may contain various dispersion stabilizers. In order to carry out the above-mentioned granulation and molding, for example, a machine such as a rolling granulator, an extrusion granulator, a stirring granulator, a crusher, a compression molding machine, a spray granulator, a mold molding machine is used. A granulated product or molded product obtained by a tumbling granulator, an extrusion granulator or a compression molding machine is preferable because its strength is relatively high. The obtained granulated body or molded body is dried.
The drying temperature is preferably room temperature to 150 ° C. If necessary, the granulated product and the molded product obtained by drying may be added to 150 to
You may bake at the temperature of 0 degreeC. By this firing, the strength of the granulated body or the molded body can be increased. However, if the baking temperature is higher than 300 ° C., the photocatalytic activity of the photosemiconductor is lowered, which is not preferable. If necessary, the granulated product or the molded product before drying may be subjected to a rolling granulator such as a Roche type granulator or a marumerizer to form a spherical granulated product, and then dried.

【0013】また、本発明の有害物質除去剤を製造する
には、光半導体と金属酸化物ゾルとの混合物を乾燥し、
次いで粗粉砕する方法であっても良い。さらに、本発明
の有害物質除去剤を製造するには、光半導体と金属酸化
物ゾルと有機質バインダとの混合物を乾燥し、次いで粗
粉砕する方法であっても良い。前記の乾燥の温度は、室
温〜150℃の温度が好ましい。また、前記の粗粉砕に
は、常用される粉砕機を用いて行うことができ、得られ
たものを必要に応じて篩分しても良い。このようにして
得られた粉砕物を、必要に応じて150〜300℃の温
度で焼成しても良い。
Further, in order to produce the harmful substance removing agent of the present invention, a mixture of an optical semiconductor and a metal oxide sol is dried,
Then, a method of coarsely crushing may be used. Further, in order to produce the harmful substance removing agent of the present invention, a method of drying a mixture of an optical semiconductor, a metal oxide sol and an organic binder, and then coarsely pulverizing the mixture may be used. The drying temperature is preferably room temperature to 150 ° C. The coarse pulverization can be carried out using a commonly used pulverizer, and the obtained product may be sieved if necessary. The pulverized product thus obtained may be fired at a temperature of 150 to 300 ° C., if necessary.

【0014】次に、本発明の有害物質除去剤を用いて、
流体中の有害物質を除去するには、有害物質除去剤に、
有害物質を含む流体を接触させて、有害物質を吸着させ
て除去したり、あるいは、該有害物質除去剤に、光を照
射しながら、有害物質を含む流体を接触させて、光触媒
作用により有害物質を分解し、無害化して除去したりす
ることができる。このため、本発明の有害物質除去剤
は、有害物質を含む流体の存在する場所に、たとえば、
各種工場やそれらに隣接した場所、トイレ、居間、台
所、冷蔵庫、自動車、靴箱などの居住空間に有害物質と
接触するように置くだけでも良い。流体中の有害物質と
しては、アンモニア、アルデヒド類、メルカプタン類、
アミン類、硫化水素、硫化メチルなどの悪臭成分、窒素
酸化物、炭化水素類、有機ハロゲン化合物、細菌、菌な
どを対象とすることができる。特に、本発明の有害物質
除去剤は悪臭成分を効率良く除去することができる。有
害物質除去剤に照射する光は、その波長が400nm以
下の紫外光が含まれていれば良く、光源としては、たと
えば、水銀ランプ、キセノンランプ、水銀−キセノンラ
ンプ、殺菌灯、ブラックライト、白色蛍光灯などの人工
光源、太陽光の自然光を用いることができる。また、前
記の人工光源や自然光を併用したり、あるいは、それら
から放射する光を集光して用いても良い。有害物質除去
剤への光照射は、必ずしも連続して行う必要はなく、断
続的に行っても良い。有害物質除去剤に有害物質を含む
流体を接触させるには、送風機やポンプを用いて行うと
強制的に接触させることができるため、より効率的に除
去することができる。さらに、本発明の有害物質除去剤
と光源と送風機とを組み込んで空気清浄装置とすること
もできる。具体的には、本発明の有害物質除去剤を網状
基材から成る任意の形状の箱の中に充填し、これを空気
清浄装置内の気体の流通経路に設け、該有害物質除去剤
に光があたるように光源を配置して、空気清浄装置とす
ることができる。
Next, using the harmful substance removing agent of the present invention,
To remove harmful substances in fluids,
A harmful substance is adsorbed and removed by bringing it into contact with a fluid containing the harmful substance, or a fluid containing the harmful substance is brought into contact with the harmful substance removing agent while irradiating light, and the harmful substance is caused by photocatalysis. Can be decomposed, made harmless and removed. Therefore, the harmful substance removing agent of the present invention is, for example, at a place where a fluid containing a harmful substance is present,
It may be placed in contact with harmful substances in various factories or places adjacent to them, toilets, living rooms, kitchens, refrigerators, automobiles, shoe boxes, and other living spaces. Hazardous substances in the fluid include ammonia, aldehydes, mercaptans,
It is possible to target amines, hydrogen sulfide, malodorous components such as methyl sulfide, nitrogen oxides, hydrocarbons, organic halogen compounds, bacteria, fungi and the like. In particular, the harmful substance removing agent of the present invention can efficiently remove malodorous components. The light for irradiating the harmful substance removing agent may be ultraviolet light having a wavelength of 400 nm or less, and examples of the light source include a mercury lamp, a xenon lamp, a mercury-xenon lamp, a germicidal lamp, a black light, and a white light. An artificial light source such as a fluorescent lamp or natural light of sunlight can be used. Further, the artificial light source and natural light may be used in combination, or the light emitted from them may be condensed and used. The irradiation of the harmful substance removing agent does not necessarily have to be performed continuously, and may be performed intermittently. When a fluid containing a harmful substance is brought into contact with the harmful substance removing agent by using a blower or a pump, the fluid can be forcibly brought into contact with the harmful substance removing agent, so that the harmful substance can be removed more efficiently. Furthermore, the harmful substance removing agent of the present invention, a light source, and a blower may be incorporated to form an air cleaning device. Specifically, the harmful substance removing agent of the present invention is filled in a box of an arbitrary shape made of a reticulated base material, which is provided in a gas flow path in an air purifying device, and the harmful substance removing agent is exposed to light. The light source can be arranged so as to hit the light source to form an air cleaning device.

【0015】[0015]

【実施例】以下に本発明の実施例を示すが、本発明はこ
れに限定されるものではない。
EXAMPLES Examples of the present invention will be described below, but the present invention is not limited to these examples.

【0016】1.試料の作製1. Sample preparation

【0017】実施例1 硫酸チタニルを熱加水分解し、生じた沈殿を濾過、洗浄
した後、乾燥、粉砕することにより含水酸化チタン(試
料A)を得た。X線回折の結果、試料Aはアナタース型
の酸化チタンであり、X線粒径は7nmであった。この
試料Aを80重量部と市販の酸化ケイ素ゾル(触媒化成
工業製 Cataloid S−20L、粒子径:10
〜20nm)を酸化ケイ素として20重量部と適当量の
水を加え、混練後押し出し造粒し、5mmφのうどん状
に成形し、110℃の温度で乾燥することによって、本
発明の有害物質除去剤(試料E)を得た。
Example 1 Titanyl sulfate was thermally hydrolyzed, and the resulting precipitate was filtered, washed, dried and pulverized to obtain hydrous titanium oxide (Sample A). As a result of X-ray diffraction, Sample A was anatase-type titanium oxide, and the X-ray particle size was 7 nm. 80 parts by weight of this sample A and a commercially available silicon oxide sol (Cataloid S-20L manufactured by Catalyst Kasei Kogyo Co., Ltd., particle size: 10)
20 nm) as silicon oxide, 20 parts by weight and an appropriate amount of water are added, and the mixture is kneaded, then extruded and granulated, shaped into a 5 mmφ udon shape, and dried at a temperature of 110 ° C. to remove the harmful substance removing agent of the present invention. (Sample E) was obtained.

【0018】実施例2 実施例1に記載した試料Aを純水に分散させ、塩化亜鉛
を溶解した後、水酸化ナトリウム水溶液にて中和し、引
き続き濾過、洗浄、乾燥、粉砕することにより、水酸化
亜鉛が担持された含水酸化チタン(試料B)を得た。水
酸化亜鉛の担持量はモル比でZn:Ti=15:85と
した。X線回折の結果、試料Bはアナタース型の酸化チ
タンを含有したものであり、そのX線粒径は7nmであ
った。次に、この試料Bを実施例1の試料Aに代えて用
いること以外、実施例1と同様の方法で、本発明の有害
物質除去剤(試料F)を得た。
Example 2 The sample A described in Example 1 was dispersed in pure water, dissolved with zinc chloride, neutralized with an aqueous solution of sodium hydroxide, and subsequently filtered, washed, dried and pulverized. A hydrous titanium oxide supporting zinc hydroxide (Sample B) was obtained. The molar amount of zinc hydroxide supported was Zn: Ti = 15: 85. As a result of X-ray diffraction, Sample B contained anatase-type titanium oxide, and its X-ray particle size was 7 nm. Next, a harmful substance removing agent (Sample F) of the present invention was obtained in the same manner as in Example 1 except that this sample B was used in place of the sample A in Example 1.

【0019】実施例3 実施例1において、酸化ケイ素ゾルに代えて市販の酸化
チタンゾル(石原産業製 CS−N、粒子径:5〜10
nm)を酸化チタンとして20重量部用いること以外、
実施例1と同様の方法で、本発明の有害物質除去剤(試
料G)を得た。
Example 3 In Example 1, a commercially available titanium oxide sol (CS-N manufactured by Ishihara Sangyo, particle size: 5 to 10) was used instead of the silicon oxide sol.
nm) as titanium oxide, except that
In the same manner as in Example 1, a harmful substance removing agent of the present invention (Sample G) was obtained.

【0020】実施例4 実施例1において、酸化ケイ素ゾルに代えて市販の酸化
アルミニウムゾル(日産化学製 ベーマイト系ゾルAS
−520、粒子径:10〜20nm)を酸化アルミニウ
ムとして20重量部用いること以外、実施例1と同様の
方法で、本発明の有害物質除去剤(試料H)を得た。
Example 4 In Example 1, a commercially available aluminum oxide sol (boehmite sol AS manufactured by Nissan Kagaku Co., Ltd.) was used in place of the silicon oxide sol.
-520, particle size: 10 to 20 nm) was used as aluminum oxide in an amount of 20 parts by weight to obtain a harmful substance removing agent (Sample H) of the present invention in the same manner as in Example 1.

【0021】実施例5 実施例1で得られた含水酸化チタン(試料A)を80重
量部、市販の酸化ケイ素ゾル(触媒化成工業製 Cat
aloid S−20L、粒子径:10〜20nm)を
酸化ケイ素として15重量部、ポリ酢酸ビニルエマルシ
ョンを樹脂分換算で5重量部と適当量の水を加え、混練
後、押し出し造粒し、5mmφのうどん状に成形し、1
10℃の温度で乾燥することによって、本発明の有害物
質除去剤(試料I)を得た。
Example 5 80 parts by weight of the hydrous titanium oxide (Sample A) obtained in Example 1 and a commercially available silicon oxide sol (Catalyst Kasei Kogyo Cat
Alloyd S-20L, particle diameter: 10 to 20 nm) as silicon oxide, 15 parts by weight, polyvinyl acetate emulsion is added to 5 parts by weight in terms of resin content and an appropriate amount of water, and after kneading, extrusion granulation is performed to obtain a 5 mmφ product. Udon-shaped, 1
The harmful substance removing agent of the present invention (Sample I) was obtained by drying at a temperature of 10 ° C.

【0022】実施例6 実施例5において、ポリ酢酸ビニルエマルションに代え
てアクリル系エマルションポリアクリル酸エステルを用
いること以外は実施例5と同様にして、本発明の有害物
質除去剤(試料J)を得た。
Example 6 A harmful substance removing agent (Sample J) of the present invention was prepared in the same manner as in Example 5 except that an acrylic emulsion polyacrylic ester was used in place of the polyvinyl acetate emulsion. Obtained.

【0023】実施例7 実施例1に記載した試料Aを80重量部、市販の酸化ケ
イ素ゾル(触媒化成工業製 Cataloid S−2
0L、粒子径:10〜20nm)を酸化ケイ素として2
0重量部と適当量の水を加え、混合物を得た。得られた
混合物を圧縮成形機にて成形し、110℃の温度で乾燥
することによって、厚み15mm、孔径1mm、200
メッシュのハニカム成形体である本発明の有害物質除去
剤(試料K)を得た。
Example 7 80 parts by weight of the sample A described in Example 1 and a commercially available silicon oxide sol (Cataloid S-2 manufactured by Catalyst Kasei Kogyo Co., Ltd.) were used.
0L, particle size: 10 to 20 nm) as silicon oxide 2
A mixture was obtained by adding 0 part by weight and an appropriate amount of water. The obtained mixture is molded with a compression molding machine and dried at a temperature of 110 ° C. to obtain a thickness of 15 mm, a pore diameter of 1 mm, and a thickness of 200 mm.
A harmful substance removing agent (Sample K) of the present invention, which is a honeycomb formed body of mesh, was obtained.

【0024】比較例1 実施例1において、酸化ケイ素ゾルを加えないこと以外
は実施例1と同様に試料Aを造粒して、比較試料Tを得
た。
Comparative Example 1 A comparative sample T was obtained by granulating the sample A in the same manner as in Example 1 except that the silicon oxide sol was not added.

【0025】比較例2 実施例1において、酸化ケイ素ゾルに代えて粘土鉱物
(豊順洋行製ベントナイト SUPER CLAY)を
用いること以外は実施例1と同様に試料Aを造粒して、
比較試料Uを得た。
Comparative Example 2 Sample A was granulated in the same manner as in Example 1 except that a clay mineral (bentonite SUPER CLAY manufactured by Toyojun Yoko) was used in place of the silicon oxide sol.
Comparative sample U was obtained.

【0026】2.試料の強度 実施例の試料E、F、G、H、I、Jと比較試料Uはい
ずれも粉落ちが少なく、また、1.5kg重程度の力を
加えてもつぶれなかった。一方、比較試料Tの強度は弱
く、指で軽くつまむ程度で粉化した。この結果から、本
発明の有害物質除去剤は強度が大きく、粉化し難いもの
であり、長期間の使用に耐えられるものであることがわ
かった。
2. Sample Strength The samples E, F, G, H, I, and J of the example and the comparative sample U all had less powder falling off, and did not collapse even when a force of about 1.5 kg was applied. On the other hand, the strength of the comparative sample T was weak, and it was pulverized to the extent that it was lightly pinched with a finger. From this result, it was found that the harmful substance removing agent of the present invention has high strength, is difficult to be pulverized, and can withstand long-term use.

【0027】3.試料の耐水性 実施例で得られた試料を純水中に浸すことにより、耐水
性の評価を行った。実施例の試料E、F、G、H、I、
J、Kはいずれも水に浸しても型くずれせず、その形状
を維持していた。一方、比較試料T、Uは水に浸すこと
で崩壊し、粉状化した。この結果から、本発明の有害物
質除去剤は耐水性に優れていることが明らかとなった。
3. Water Resistance of Samples Water resistance was evaluated by immersing the samples obtained in the examples in pure water. Example samples E, F, G, H, I,
Both J and K did not lose their shape when immersed in water and maintained their shapes. On the other hand, the comparative samples T and U disintegrated and powdered when immersed in water. From this result, it became clear that the harmful substance removing agent of the present invention has excellent water resistance.

【0028】4.吸着作用による有害物質除去能力 実施例2の試料Fの有害物質除去能力を調べるために、
試料Fを粉砕した後、0.5〜1mmの粒分を集めて試
料Lを得た。試料L0.1gを容量2.8lのパイレッ
クスガラス製の容器に入れ、悪臭ガスの代表例であるア
ンモニアとメチルメルカプタンをそれぞれ500ppm
相当分添加し、1時間後の除去能力を調べた。比較試料
として、市販の無機系吸着剤ミズカナイト(MZ、水澤
化学製)を用いた。得られた結果を表1に示す。試料L
は、比較試料に比べ、アンモニアおよびメチルメルカプ
タンの吸着力が大きく、本発明の有害物質除去剤は吸着
作用による有害物質除去能力が優れていることがわかっ
た。
4. Hazardous substance removing ability by adsorption To examine the harmful substance removing ability of the sample F of Example 2,
After crushing the sample F, a particle L of 0.5 to 1 mm was collected to obtain a sample L. 0.1 g of the sample L was placed in a Pyrex glass container having a capacity of 2.8 l, and ammonia and methyl mercaptan, which are typical examples of malodorous gas, were 500 ppm each.
A considerable amount was added, and the removal capacity after 1 hour was examined. As a comparative sample, a commercially available inorganic adsorbent Mizukanite (MZ, manufactured by Mizusawa Chemical Co., Ltd.) was used. The results obtained are shown in Table 1. Sample L
In comparison with the comparative sample, it was found that the adsorption power of ammonia and methyl mercaptan was larger, and that the harmful substance removing agent of the present invention has an excellent ability to remove harmful substances by the adsorption action.

【0029】[0029]

【表1】 [Table 1]

【0030】5.光触媒作用による有害物質除去能力 実施例2の試料F、実施例1の試料E、実施例3の試料
G、実施例4の試料H、実施例5の試料I、実施例6の
試料Jの有害物質除去能力を調べるために、それぞれの
試料を粉砕した後、0.5〜1mmの粒分を集めて、そ
れぞれ試料M、N、O、P、Q、Rを得た。試料M、
N、O、P、Q、Rのそれぞれ0.1gを容量0.8l
のパイレックスガラス製の容器に入れ、悪臭ガスの代表
例であるアセトアルデヒドを150ppm相当分加え
た。パイレックスガラス製の容器の外側からブラックラ
イトによる光照射を行い、アセトアルデヒド濃度の経時
変化をガスクロマトグラフで追跡した。なお、試料面で
の光量は1.0mW/cm2 とした。比較として、ブラ
ックライトによる光照射を行わない状態でアセトアルデ
ヒドの濃度変化を調べた。表2にそれぞれの結果を合わ
せて記す。紫外線照射の有無でアセトアルデヒド濃度に
大きな差が見られ、本発明の有害物質除去剤の光触媒作
用による有害物質除去能力が確認できた。
5. Hazardous substance removing ability by photocatalytic action Sample F of Example 2, Sample E of Example 1, Sample G of Example 3, Sample H of Example 4, Sample I of Example 5, and Sample J of Example 6 are harmful. In order to examine the substance removing ability, each sample was crushed, and then 0.5 to 1 mm particles were collected to obtain samples M, N, O, P, Q, and R, respectively. Sample M,
N, O, P, Q, R 0.1g each 0.8g capacity
Was placed in a Pyrex glass container, and acetaldehyde, which is a typical example of malodorous gas, was added in an amount corresponding to 150 ppm. Light irradiation with black light was performed from the outside of the Pyrex glass container, and the time-dependent change in acetaldehyde concentration was traced by gas chromatography. The amount of light on the sample surface was 1.0 mW / cm 2 . As a comparison, the change in the concentration of acetaldehyde was examined without the light irradiation by the black light. The results are shown in Table 2 together. A large difference was found in the acetaldehyde concentration depending on the presence or absence of ultraviolet irradiation, and the ability of the harmful substance removing agent of the present invention to remove harmful substances by the photocatalytic action was confirmed.

【0031】[0031]

【表2】 [Table 2]

【0032】実施例7および実施例1で得られた試料K
およびEをそれぞれパイレックスガラス製の円筒容器中
に置き、所定濃度のアセトアルデヒドを導入した。吸着
が平衡に達した後、ブラックライトによる光照射を行な
いながら容器中のアセトアルデヒドの分解によって生じ
た二酸化炭素濃度を測定することにより、試料の有害ガ
ス除去能力を評価した。得られた結果を表3に示した。
この結果より、本発明の有害物質除去剤は、光触媒作用
による有害物質の除去能力に優れており、特にハニカム
形状にすることにより、より一層性能が向上することが
わかった。以上の結果より、本発明の有害物質除去剤
は、優れた有害物質除去能力を有し、その有害物質除去
能力を長期間にわたって持続できることがわかった。
Sample K obtained in Examples 7 and 1
And E were respectively placed in a cylindrical container made of Pyrex glass, and acetaldehyde having a predetermined concentration was introduced. After the adsorption reached equilibrium, the harmful gas removing ability of the sample was evaluated by measuring the carbon dioxide concentration generated by the decomposition of acetaldehyde in the container while performing light irradiation with black light. Table 3 shows the obtained results.
From these results, it was found that the harmful substance removing agent of the present invention is excellent in the ability to remove harmful substances by photocatalytic action, and the performance is further improved particularly by forming a honeycomb shape. From the above results, it was found that the harmful substance removing agent of the present invention has an excellent harmful substance removing ability and can maintain the harmful substance removing ability for a long period of time.

【0033】[0033]

【表3】 [Table 3]

【0034】[0034]

【発明の効果】本発明は、金属酸化物ゾルを構成してい
た金属酸化物を結着剤として用いた、少なくとも光半導
体と該金属酸化物から成る造粒体あるいはそれらの成形
体であることを特徴とする有害物質除去剤であって、優
れた有害物質除去能力を有し、その有害物質除去能力を
長期間にわたって持続できる。しかも、分離・回収など
の取り扱い性の良いものであるため、有害物質除去剤と
して幅広い用途に適用でき、工業用途ばかりでなく、一
般家庭の用途としても適用可能である。
INDUSTRIAL APPLICABILITY The present invention is a granule containing at least an optical semiconductor and the metal oxide or a molded product thereof, which uses the metal oxide constituting the metal oxide sol as a binder. A toxic substance removing agent characterized by having excellent toxic substance removing ability, and capable of sustaining the toxic substance removing ability for a long period of time. Moreover, since it is easy to handle such as separation / recovery, it can be applied to a wide range of applications as a harmful substance remover, and can be applied not only to industrial applications but also to general households.

【0035】さらに、本発明の製造方法は、前記の有害
物質除去剤を簡便、かつ、廉価に製造できるなど、有用
な方法である。
Furthermore, the production method of the present invention is a useful method in that the above-mentioned harmful substance removing agent can be produced simply and inexpensively.

【0036】さらに、本発明の有害物質除去方法は、前
記の有害物質除去剤を用いた簡便な方法であるため、工
業用途ばかりでなく、一般家庭の用途にも適用できる方
法である。
Further, the method for removing harmful substances of the present invention is a simple method using the above-mentioned harmful substance removing agent, and is therefore applicable not only to industrial applications but also to general household applications.

Claims (16)

【特許請求の範囲】[Claims] 【請求項1】金属酸化物ゾルを構成していた金属酸化物
を結着剤として用いた、少なくとも光半導体と該金属酸
化物から成る造粒体あるいはそれらの成形体であること
を特徴とする有害物質除去剤。
1. A granulated body containing at least an optical semiconductor and the metal oxide, or a molded body thereof, which uses a metal oxide constituting a metal oxide sol as a binder. Hazardous substance remover.
【請求項2】金属酸化物の粒子径が1〜100nmであ
ることを特徴とする請求項1に記載の有害物質除去剤。
2. The harmful substance removing agent according to claim 1, wherein the particle size of the metal oxide is 1 to 100 nm.
【請求項3】金属酸化物の含有量が5〜30重量%であ
ることを特徴とする請求項1に記載の有害物質除去剤。
3. The harmful substance removing agent according to claim 1, wherein the content of the metal oxide is 5 to 30% by weight.
【請求項4】金属酸化物の含有量が10〜20重量%で
あることを特徴とする請求項1に記載の有害物質除去
剤。
4. The harmful substance removing agent according to claim 1, wherein the content of the metal oxide is 10 to 20% by weight.
【請求項5】金属酸化物がケイ素、アルミニウムおよび
チタンから選ばれる元素の少なくとも1種の酸化物であ
ることを特徴とする請求項1に記載の有害物質除去剤。
5. The harmful substance removing agent according to claim 1, wherein the metal oxide is at least one oxide of an element selected from silicon, aluminum and titanium.
【請求項6】光半導体がアナタース型結晶形を有する酸
化チタンであり、その粒子径が1〜50nmであること
を特徴とする請求項1に記載の有害物質除去剤。
6. The harmful substance removing agent according to claim 1, wherein the optical semiconductor is titanium oxide having an anatase type crystal form, and the particle diameter thereof is 1 to 50 nm.
【請求項7】光半導体が酸化亜鉛および/または水酸化
亜鉛を担持した酸化チタンであることを特徴とする請求
項1に記載の有害物質除去剤。
7. The harmful substance removing agent according to claim 1, wherein the optical semiconductor is titanium oxide carrying zinc oxide and / or zinc hydroxide.
【請求項8】金属酸化物ゾルを構成していた金属酸化物
および有機質バインダを結着剤として用いて成ることを
特徴とする請求項1に記載の有害物質除去剤。
8. The harmful substance removing agent according to claim 1, wherein the metal oxide constituting the metal oxide sol and the organic binder are used as a binder.
【請求項9】有機質バインダの含有量が0.5〜20重
量%であることを特徴とする請求項8に記載の有害物質
除去剤。
9. The harmful substance removing agent according to claim 8, wherein the content of the organic binder is 0.5 to 20% by weight.
【請求項10】有機質バインダがエマルションポリマー
であることを特徴とする請求項8に記載の有害物質除去
剤。
10. The harmful substance removing agent according to claim 8, wherein the organic binder is an emulsion polymer.
【請求項11】造粒体あるいはそれらの成形体がハニカ
ム形状を有する構造体であることを特徴とする請求項1
または8に記載の有害物質除去剤。
11. A granulated body or a molded body thereof is a honeycomb-shaped structure.
Or the harmful substance removing agent according to 8.
【請求項12】光半導体と金属酸化物ゾルとの混合物を
造粒あるいは成形し、次いで、乾燥することを特徴とす
る有害物質除去剤の製造方法。
12. A method for producing a harmful substance removing agent, which comprises granulating or molding a mixture of an optical semiconductor and a metal oxide sol, and then drying.
【請求項13】光半導体と金属酸化物ゾルと有機質バイ
ンダとの混合物を造粒あるいは成形し、次いで、乾燥す
ることを特徴とする有害物質除去剤の製造方法。
13. A method for producing a harmful substance removing agent, which comprises granulating or molding a mixture of an optical semiconductor, a metal oxide sol and an organic binder, and then drying.
【請求項14】造粒あるいは成形を押し出し造粒機、転
動造粒機あるいは圧縮成形機で行うことを特徴とする請
求項12または13に記載の有害物質除去剤の製造方
法。
14. The method for producing a harmful substance removing agent according to claim 12, wherein the granulation or molding is performed by an extrusion granulator, a rolling granulator or a compression molding machine.
【請求項15】請求項1に記載の有害物質除去剤に有害
物質を含む流体を接触させて、該有害物質を除去するこ
とを特徴とする有害物質除去方法。
15. A method for removing harmful substances, which comprises removing the harmful substances by bringing a fluid containing the harmful substances into contact with the harmful substance removing agent according to claim 1.
【請求項16】請求項1に記載の有害物質除去剤に光を
照射しながら有害物質を含む流体を接触させて、該有害
物質を除去することを特徴とする有害物質除去方法。
16. A method for removing a harmful substance, which comprises contacting a fluid containing a harmful substance while irradiating the harmful substance removing agent according to claim 1 with the fluid to remove the harmful substance.
JP14082296A 1996-05-09 1996-05-09 Hazardous substance removing agent and method of removing harmful substance using the same Expired - Fee Related JP3884503B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
JP14082296A JP3884503B2 (en) 1996-05-09 1996-05-09 Hazardous substance removing agent and method of removing harmful substance using the same

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Publication Number Publication Date
JPH09299809A true JPH09299809A (en) 1997-11-25
JP3884503B2 JP3884503B2 (en) 2007-02-21

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Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002166173A (en) * 2000-11-29 2002-06-11 Inr Kenkyusho:Kk Photocatalyst apparatus
JP2003093890A (en) * 2001-09-25 2003-04-02 Mitsubishi Heavy Ind Ltd Method for preparing photocatalyst
JP2005066433A (en) * 2003-08-22 2005-03-17 Kusatsu Electric Co Ltd Photocatalyst molding
US6914031B2 (en) 1999-12-27 2005-07-05 Yamaha Corporation Photocatalyst granules

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6914031B2 (en) 1999-12-27 2005-07-05 Yamaha Corporation Photocatalyst granules
JP2002166173A (en) * 2000-11-29 2002-06-11 Inr Kenkyusho:Kk Photocatalyst apparatus
JP2003093890A (en) * 2001-09-25 2003-04-02 Mitsubishi Heavy Ind Ltd Method for preparing photocatalyst
JP2005066433A (en) * 2003-08-22 2005-03-17 Kusatsu Electric Co Ltd Photocatalyst molding

Also Published As

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