JPH09298139A - Aligner - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the throughput of an aligner from being reduced when the peripheral region of a substrate is exposed by a method wherein when an exposure part is restarted, the exposure of the substrate is executed on the basis of the state of the exposure treatment of the substrate prior to the restarting. SOLUTION: An upper controller 9 controls exposure data including an exposure to a square-shaped substrate 5, an exposure patterned region and the like and sends a command signal SI to a lower controller 10 each time each side of the substrate 5 is performed an exposure treatment on the basis of the exposure data. Moreover, the controller 9 makes the contents, which are indicated by the signal SI sent to the controller 10, store in a storage part 11 at any time. In the case where the exposure treatment is interrupted by the generation of service interruption or the like, the controller 9 reads out the contents stored in the part 11 when an exposure part is restarted to resume the exposure treatment which is performed before the interruption. The controller 10 resumes the exposure treatment on the basis of the state of the exposure treatment before the restarting, whereby the exposure treatment of the substrate 5, which exists in a main body part 2 and is not finished can be rapidly performed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure apparatus, which is applied to a resist layer formed on a substrate, for example, when the resist layer in an area unrelated to the original pattern transfer is exposed and stripped. It is suitable.

[0002]

2. Description of the Related Art Conventionally, when a semiconductor element or a liquid crystal display element is manufactured, a desired pattern formed on a reticle is projected and exposed on a substrate coated with a resist in a lithographic process to obtain a desired pattern on the substrate. To form a pattern. At this time, a marginal area is formed to some extent in the peripheral area of the pattern image projected and exposed on the substrate. For example, in the case of a rectangular substrate, the pattern image is exposed and projected on the central portion, and the peripheral portion, which is the peripheral area, becomes the blank area.

In the lithographic process, in order to prevent the resist layer in such a blank region from remaining after the exposure process and adhering to the mask pattern in a subsequent process step, the peripheral effect is prevented. The resist layer in the blank area is subjected to an exposure process using an exposure apparatus for exposure, and is peeled off.

[0004]

However, in such an exposure apparatus, when the operation of the apparatus is stopped due to a power failure or the like, the substrate which remains in the apparatus in an unexposed state or a state in which exposure processing is being performed is used. When the device is restarted, it is once discharged to the outside of the apparatus, re-input, and the exposure process is restarted from the beginning. Therefore, a time for discharging and recharging the substrate and a time for re-exposing the already exposed portion from the beginning are required, which causes a problem that the throughput in the exposure processing is reduced.

Some exposure apparatuses have a substrate buffering mechanism. That is, a plurality of substrates are stored in the storage unit and the substrates are transported to and from the exposure stage. Accordingly, the exposure processing of each substrate can be continuously performed, and the exposure processing can be performed on a large number of substrates in a short time. However, in such a case, since the substrates are discharged and reloaded for all the substrates stored in the storage unit, the time required for discharging and reloading the substrates is increased.

The present invention has been made in consideration of the above points, and it is an object of the present invention to propose an exposure apparatus capable of preventing a decrease in throughput when exposing a peripheral region of a substrate in a lithographic process.

[0007]

In order to solve such a problem, in the present invention, a non-volatile storage means (11) for storing the exposure processing state for the peripheral area of the photosensitive substrate (5).
And an exposure control unit (9 and 10) for performing exposure based on the exposure processing state stored in the storage unit (11) when the exposure unit (7) that emits exposure light is restarted. .

When the exposure unit is restarted, the exposure is performed based on the exposure processing state before the restart, so that the exposure process of the unexposed substrate existing in the exposure unit is promptly performed when the exposure unit is stopped. Therefore, it is possible to prevent the substrate from being discharged and reloaded.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below in detail with reference to the drawings.

(1) First Embodiment In FIG. 1, reference numeral 1 denotes an exposure apparatus as a whole, and an exposure process is performed on a resist layer in a peripheral region existing on a photosensitive substrate and unrelated to original pattern transfer. Has been done. Incidentally, the peripheral portion of the photosensitive substrate thus exposed is peeled off after being developed, and is treated so as not to adhere to the area where the original pattern is transferred as dust or the like. The exposure apparatus 1 is composed of a main body 2 and a control unit 3, and the main body 2 performs an exposure process on a peripheral region on a substrate in accordance with a control command given from the control unit 3.

The main body 2 exposes a rectangular substrate 5 provided on the substrate stage 4 and coated with a photoresist.
The substrate stage 4 performs alignment processing on the rectangular substrate 5 at a predetermined exposure position, and holds the rectangular substrate 5 at this exposure position.
A moving portion 6 having a T-shape is provided above the substrate stage 4. Further, an exposure section 7 is provided on an arm section 6A of the moving section 6 which extends above the substrate stage 4 in the vertical direction. The moving unit 6 is configured to move along the X-axis direction shown in the figure, and the exposing unit 7 provided on the arm 6A is moved in parallel with the rectangular substrate 5. Further, the exposure part 7 is composed of two exposure light irradiation parts which are arranged at intervals substantially the same as the width of the rectangular substrate 5, and the substrate below the slit-shaped emission port (not shown) formed in the bottom part. Square substrate 5 placed on stage 4
The exposure light is applied to the.

As shown in FIG. 2, the exposure light thus radiated is locally radiated only to a peripheral region 5A which is a predetermined region along two opposite sides of the rectangular substrate 5, and only the peripheral region 5A is exposed. Let Further, the substrate stage 4 is supported by a rotating unit 8 which is a rotatable column, and after the peripheral region 5A is subjected to an exposure process, the rotating unit 8 rotates the substrate stage 4 by 90 degrees and similarly. By performing the exposure process, as shown in FIG. 3, the peripheral region 5B, which is a predetermined region along the other two sides of the rectangular substrate 5, is exposed. In this way, the main body 2 is configured to expose the peripheral regions 5A and 5B along the four sides of the rectangular substrate 5 by exposure.

The main body 2 is controlled by the control unit 3 to perform the exposure process, and the rectangular substrate 5 is subjected to the exposure process according to a control signal given from the control unit 3. The control unit 3 is composed of an upper controller 9, a lower controller 10 and a storage unit 11. The host controller 9 manages the exposure data including the exposure amount and the exposure pattern area for the rectangular substrate 5. The upper controller 9 issues a command signal S1 to the lower controller 10 each time each side of the rectangular substrate 5 is exposed based on the exposure data. Here, the command signal S1 has an instruction content of “which side should start the exposure processing”. Further, the upper controller 9 causes the storage unit 11 to store the instruction content of the command signal S1 issued to the lower controller 10 at any time. If the exposure process is interrupted due to the occurrence of a power failure, etc.
At the time of restart, the stored contents of the storage unit 11 are read out and the exposure process that was performed before the interruption is restarted.

The lower controller 10 uses the command signal S1.
A control signal S2 for exposure processing is sent to the main body 2 in accordance with the instruction content indicated by. The control signal S2 has the control contents of "start / stop irradiation of exposure light" and "start / stop movement of the moving part" in order to execute the exposure process according to the command signal S1. . Further, the subordinate controller 10 controls the exposure processing of the main body 2 by the control signal S2 and detects the exposure processing state of the main body 2 as needed. When the lower controller 10 detects that the exposure processing by the command signal S1 is completed, it sends the response signal S3 to the upper controller 9 and waits for the next instruction.

Further, the storage unit 11 can electrically erase and rewrite the stored contents, and can retain the stored contents even if there is no power supply voltage (hereinafter referred to as an electrically erased read-only memory). It consists of Therefore, the storage unit 11 keeps the exposure device 1 even when the exposure apparatus 1 is stopped due to a power failure or the like
The stored contents can be retained.

In the above structure, the control unit 3 controls the exposure processing of the main body unit 2 according to the procedure described below when the exposure apparatus 1 is activated. The following five cases can be considered as the exposure processing state of the rectangular substrate 5 remaining in the main body 2 at the time of restart. The first is the case where no exposure processing is performed (hereinafter, this is referred to as the first case). The second is the case where the exposure process is performed up to the middle of the peripheral region 5A, that is, the first side exposed after the start of the exposure process (hereinafter, this is referred to as the second case). The third is a case where the exposure process is interrupted immediately after the exposure of the first side is completed and the exposure of the second side of the peripheral region 5B is next started (hereinafter, this is referred to as a third case). ). The fourth is a case where the exposure process is performed up to the middle of the second side (hereinafter, this is referred to as a fourth case). Fifth is a case where the exposure process is interrupted when the exposure process is completed for both the first side and the second side (hereinafter, this is referred to as the fifth case).

As shown in FIG. 4, first, the procedure by the host controller 9 (FIG. 1) is started in step SP1, and the host controller 9 determines whether or not the exposure process is completed in step SP2, that is, the substrate stage 4 ( It is determined whether or not the rectangular substrate 5 (FIG. 1) remains on the (FIG. 1). If the host controller 9 does not remain, the step S
Proceed to P15 to end the procedure. Further, if the rectangular substrate 5 remains, the host controller 9 proceeds to step SP3.
Proceed to. Next, the host controller 9 reads the exposure processing state of the remaining rectangular substrate 5 from the recording unit 11 (FIG. 1) in step SP3, and in the first or second case,
That is, it is determined whether or not the exposure of the first side is incomplete. The host controller 9 proceeds to step SP10 if the exposure processing state is not the first or second case. In the case of the first or second case, the upper controller 9 causes the lower controller 10 (FIG. 1) to issue the command signal S1 in step SP4. At this time, the host controller 9 issues the command signal S1 and the command signal S1.
The instruction content indicated by 1 is stored in the storage unit 11 (FIG. 1). Thereafter, the upper controller 9 waits for a response at step SP5 until the lower controller 10 sends a response signal S3 indicating that the exposure processing by the command signal S1 is completed.

In step SP6, the lower controller 10 advances the control processing to step SP7 in response to the command signal S1 from the upper controller 9. The lower controller 10 waits for an instruction at step SP6 until the command signal S1 is issued. Subsequently, the lower controller 10 determines in step SP7 whether the instruction content indicated by the command signal S1 is the exposure of the first side. If the exposure is not for the first side, the lower controller 10 proceeds to step SP13. If the command signal S1 is for instructing the exposure of the first side, the lower controller 10 proceeds to step SP8 for the first
Perform edge exposure. When the exposure of the first side is completed in this way, the lower controller 10 sends a response signal S3 to the upper controller 9 in step SP9 to notify that the instructed exposure process is completed. The lower controller 10 returns to the instruction waiting state again after sending the response signal S3 (SP6).

In response to the notification by the response signal S3, the host controller 9 advances the processing to step SP11.
The host controller 9 executes the first or second step SP3.
If it is determined that it is not the case, step SP10
Then, it is determined whether or not it is the third or fourth case, and if it is the third or fourth case, the process proceeds to step SP11. It should be noted that when the higher-level controller 9 determines in step SP10 that it is not the third or fourth case, step S10
Proceed to P15 to end the procedure. Upper controller 9
In the third or fourth case, at step SP11, the lower controller 10 is issued a command signal S1. At this time, the host controller 9 stores the instruction content indicated by the command signal S1 in the storage unit 11 together with issuing the command signal S1. Thereafter, the upper controller 9 sends the command signal S from the lower controller 10.
The response is awaited at step SP12 until the response signal S3 indicating that the exposure processing by 1 has been completed is transmitted.

Next, at step SP6, the command signal S1
Is issued, the control process of the lower controller 10 is advanced to the next step. Then, the lower controller 10
In step SP7, it is determined whether or not the instruction content indicated by the command signal S1 is the exposure of the first side.
Since the exposure is not for the first side here, the lower controller 10 proceeds to step SP13. Lower controller 1
0 causes the second side exposure to be performed because the instruction content of the command signal S1 in step SP13 is the second side exposure. When the exposure of the second side is completed, the lower controller 10 sends a response signal S3 to the upper controller 9 in step SP14 to notify that the instructed exposure process is completed. The low-order controller 10 returns to the instruction waiting state again after sending the response signal S3 (S
P6). When the exposure of the second side is completed in this way, the procedure of exposure control is ended in step SP15.

As described above, in the exposure apparatus 1, each time the host controller 9 issues an exposure control instruction, the instruction content is stored in the non-volatile storage unit 11, and the exposure unit 7 is stopped to perform the exposure process. Is interrupted, the memory content stored in the storage unit 11 is read at the time of restart and the exposure process is restarted from the interrupted portion.
It is possible to save the trouble of discharging and re-inputting the rectangular substrate 5 out of the apparatus, which has been done when the conventional exposure process is interrupted.

According to the above configuration, the non-volatile storage unit 11 for storing the exposure processing state for the peripheral area of the rectangular substrate 5, and the exposure processing state stored in the storage unit 11 when the exposure unit 7 is restarted. Based on the above, the upper controller 9 and the lower controller 10 that perform the exposure restart the exposure processing based on the exposure processing state before the restart at the time of restart, so that the main body when the exposure unit 7 is stopped. Part 2
Since it is possible to quickly perform the exposure processing of the rectangular substrate 5 in which the exposure is not completed, it is possible to prevent the rectangular substrate 5 from being discharged and reloaded, and thus the peripheral region of the rectangular substrate 5 can be prevented. It is possible to realize the exposure apparatus 1 capable of preventing a decrease in throughput during exposure.

(2) Second Embodiment In FIG. 5 in which parts corresponding to those in FIG. 1 are designated by the same reference numerals, numeral 20 indicates an exposure apparatus as a whole, and the original pattern transfer existing in the peripheral portion on the photosensitive substrate is transferred. The resist layer in a region irrelevant to is subjected to exposure processing. By the way, the resist on the peripheral portion of the photosensitive substrate thus exposed is peeled off after being developed, and is treated so as not to adhere as dust or the like to the area where the original pattern is transferred. The exposure apparatus 20 is composed of a main body 2 having the same configuration as that shown in FIG. 1 and a controller 21, and the main body 2 exposes a peripheral area on a substrate in accordance with a control command given from the controller 21. It is designed to be applied.

The main body 2 subjects the rectangular substrate 5 arranged on the substrate stage 4 to an exposure process. The substrate stage 4 performs alignment processing on the rectangular substrate 5 at a predetermined exposure position, and holds the rectangular substrate 5 at this exposure position. A moving portion 6 having a T-shape is provided above the substrate stage 4. The moving part 6
An exposure section 7 is provided on an arm section 6A that extends vertically above the substrate stage 4. The moving unit 6 is configured to move along the X-axis direction shown in the figure, and the exposing unit 7 provided on the arm 6A is moved in parallel with the rectangular substrate 5. Further, the exposure part 7 is composed of two exposure light irradiation parts which are arranged at intervals substantially the same as the width of the rectangular substrate 5, and the substrate below the slit-shaped emission port (not shown) formed in the bottom part. Exposure light is applied to the rectangular substrate 5 arranged on the stage 4.

The exposure light thus radiated is locally radiated only to the peripheral region 5A, which is a predetermined region along the two opposite sides of the rectangular substrate 5, and exposes only the peripheral region 5A (FIG. 2). Further, the substrate stage 4 is supported by a rotating unit 8 which is a rotatable column, and after the peripheral region 5A is subjected to an exposure process, the rotating unit 8 rotates the substrate stage 4 by 90 degrees and similarly. By performing the exposure process, the peripheral region 5B which is a predetermined region along the other two sides of the rectangular substrate 5
Is exposed to light (FIG. 3). In this way, the main body 2 is configured to expose the peripheral regions 5A and 5B along the four sides of the rectangular substrate 5 by exposure.

The main body 2 is controlled by the control unit 21 to perform the exposure process, and performs the exposure process on the rectangular substrate 5 in accordance with a control signal given from the control unit 21. The control unit 21 is composed of an upper controller 22, a lower controller 10, and a storage unit 11. The upper controller 22 manages the exposure data including the exposure amount and the exposure pattern for the rectangular substrate 5. The upper controller 22 issues a command signal S4 to the lower controller 10 each time each side of the rectangular substrate 5 is exposed based on the exposure data.
Here, the command signal S4 has an instruction content of “which side should start the exposure processing”. The upper controller 22 also causes the storage unit 11 to store the instruction content of the command signal S4 issued to the lower controller 10 at any time. When the exposure process is interrupted due to the occurrence of a power failure or the like, the host controller 9 reads the stored contents of the storage unit 11 at the time of restart and restarts the exposure process that was performed before the interruption.

The lower controller 10 sends a command signal S4
A control signal S2 for exposure processing is sent to the main body 2 in accordance with the instruction content indicated by. The control signal S2 has the control contents of "start / stop irradiation of exposure light" and "start / stop movement of the moving part" in order to execute the exposure process according to the command signal S4. . Further, the subordinate controller 10 controls the exposure processing of the main body 2 by the control signal S2 and detects the exposure processing state of the main body 2 as needed. When detecting that the exposure process by the command signal S4 is completed, the lower controller 10 sends a response signal S3 to the upper controller 21,
Wait for the next instruction.

Further, the storage unit 11 can electrically erase and rewrite the stored contents, and can retain the stored contents even if there is no power supply voltage (hereinafter referred to as an electrically erased read-only memory). It consists of Therefore, the storage unit 11 keeps the exposure device 1 even when the exposure apparatus 1 is stopped due to a power failure or the like
The stored contents can be retained.

In the above structure, the control unit 21 controls the exposure processing of the main body unit 2 according to the procedure described below when the exposure apparatus 20 is activated. As shown in FIG. 6, first, in step SP20, the procedure by the host controller 22 (FIG. 5) is started.
In P21, it is determined whether or not the exposure processing is completed based on the exposure processing state recorded in the recording unit 11. When the exposure process is completed, the host controller 22 proceeds to step SP32 to end the procedure. If the exposure process is not completed, the host controller 22 proceeds to the next step SP22. The host controller 22 is
At step SP22, the command signal S4 is issued to the lower controller 10 (FIG. 5). On this occasion,
The upper controller 22 stores the instruction content indicated by the command signal S4 in the storage unit 11 (FIG. 5) as well as issuing the command signal S4. After that, the upper controller 22 waits for a response in step SP23 until the lower controller 10 sends a response signal S3 indicating that the exposure processing by the command signal S4 is completed.

Next, at step SP24, the command signal S
4 is issued, the control process of the lower controller 10 is advanced to the next step. The lower controller 10 waits for an instruction until the command signal S4 is issued. Then, the lower-level controller 10 proceeds to step S.
In P25, it is determined whether or not the instruction content indicated by the command signal S4 is for instructing the exposure of the first side. If the exposure is not for the first side, the lower controller 10 proceeds to step SP30. The lower controller 10
When the command signal S4 is for instructing the exposure of the first side, the exposure of the first side is executed in step SP26. When the exposure of the first side is completed, the lower controller 10 sends a response signal S3 to the upper controller 22 in step SP27 to notify that the instructed exposure process is completed. The lower-level controller 10 returns to the instruction waiting state again after sending the response signal S3 (SP2
4).

In response to the notification by the response signal S3, the host controller 22 advances the processing to step SP28. Since the upper controller 22 performs the exposure process on the second side in step SP28, the lower controller 1
A command signal S4 is issued to 0. At this time, the upper controller 22 issues the command signal S4 and stores the instruction content indicated by the command signal S4 in the storage unit 11. After this, the host controller 22
The response is awaited at step SP29 until the response signal S3 indicating that the exposure process by the command signal S4 is completed is sent from the lower controller 10.

Next, at step SP24, the command signal S
4 is issued, the control process of the lower controller 10 is advanced to the next step. Then, the lower controller 10
In step SP25, it is determined whether the instruction content indicated by the command signal S4 is the exposure of the first side. Since the low-order controller 10 is not the exposure for the first side, the process proceeds to step SP30. Lower controller 10
In step SP30, since the instruction content by the command signal S4 is the exposure of the second side, the second side is exposed. When the exposure of the second side is completed, the lower controller 10 sends a response signal S3 to the upper controller 22 in step SP31 to notify that the instructed exposure process is completed. The lower-level controller 10 returns to the instruction waiting state again after sending the response signal S3 (SP2
4). When the exposure of the second side is completed in this way, step S
In P32, the exposure control procedure is ended.

As described above, in the exposure apparatus 20, each time the host controller 22 issues an exposure control instruction, the instruction content is stored in the non-volatile storage unit 11, and the exposure unit 7 is stopped to perform exposure. When the processing is interrupted, the memory content stored in the storage unit 11 is read at the time of restart, and the exposure processing is restarted.
It is possible to save the trouble of discharging and re-inputting the rectangular substrate 5 out of the apparatus, which has been done when the conventional exposure process is interrupted. Further, regardless of the progress of the exposure process, the rectangular substrate 5 that has not been exposed is uniformly restarted from the first side when the process is resumed after the process is interrupted. Can be simplified.

According to the above configuration, the nonvolatile storage unit 11 for storing the exposure processing state for the peripheral area of the rectangular substrate 5, and the exposure processing state stored in the storage unit 11 when the exposure unit 7 is restarted. Based on the above, the upper controller 22 and the lower controller 10 that perform the exposure uniformly restart the exposure process from the first side at the time of restarting, so that the main body unit is stopped when the exposure unit 7 is stopped. Since it is possible to quickly perform the exposure processing of the unexposed rectangular substrate 5 present in the second substrate 2, it is possible to prevent the rectangular substrate 5 from being discharged and re-input, and thus, the simplified processing procedure. As a result, it is possible to realize the exposure apparatus 20 capable of preventing a decrease in throughput when exposing the peripheral region of the rectangular substrate 5.

(3) Other Embodiments In the first and second embodiments described above, the case where the storage section 11 which is an electrically erasable read-only memory is provided has been described, but the present invention is not limited to this. Alternatively, the present invention can be applied to the case where a storage unit including a hard disk is provided. In short, any non-volatile storage means that can retain the stored contents even when the power supply voltage is used up is sufficient.

Further, in the above-mentioned first and second embodiments, the case of the exposure apparatuses 1 and 20 for exposing and processing the square-shaped exposure pattern on the rectangular substrate 5 has been described, but the present invention is not limited to this. Alternatively, for example, it may be applied to an exposure apparatus that performs exposure processing on a substrate with a square-shaped exposure pattern as shown in FIG.

Further, in the above-mentioned first and second embodiments, the exposure apparatus 1 for loading and unloading the rectangular substrates 5 one by one.
However, the present invention is not limited to this, and has, for example, a storage unit for storing a plurality of substrates, and by inputting and discharging each storage unit, a large number of substrates can be input and output at one time. It may be applied to the obtained exposure apparatus. In such an exposure apparatus, every substrate in the storage unit is discharged and reloaded every time the exposure process is stopped, and therefore, by applying the present invention, the time and effort required for discharging and reloading can be saved. As compared with the exposure apparatus according to the first and second embodiments described above, a greater effect can be obtained.

Further, in the above-mentioned first and second embodiments, the case of the exposure apparatuses 1 and 20 in which the rectangular substrate 5 is irradiated with the exposure light from the slits provided at the bottom of the exposure unit 7 respectively, has been described. However, the present invention is not limited to this,
For example, the exposure light may be irradiated onto the substrate by the exposure unit having two slits, and the same effect as that of the embodiment can be obtained regardless of the number of slits provided in the exposure unit.

In the above-mentioned first and second embodiments, the upper controller 9 or 22 and the lower controller 1
The case of the exposure apparatus 1 or 20 in which the exposure process is controlled by the control unit 3 or 21 provided with 0 has been described, but the present invention is not limited to this, and the upper controller 9 or 22 and the lower controller 10 are divided, for example. Instead, it may be applied to an exposure apparatus having an exposure processing controller integrated into one. In this case, control in the exposure processing controller is defined by multitasking corresponding to the upper controller and lower controller, and parallel processing is performed, and command signals and response signals are exchanged between both tasks in the form of intertask communication. As a result, the same effect as that of the embodiment can be obtained.

[0040]

As described above, according to the present invention, the non-volatile storage means for storing the exposure processing state for the peripheral area and the exposure stored in the storage means at the time of restarting the exposure unit for irradiating the exposure light. An exposure control unit that executes exposure based on the processing state is provided, and when the exposure unit is restarted, the exposure is performed based on the exposure processing state before the restart, so that the exposure unit exists in the exposure unit when the exposure unit is stopped. Since it is possible to quickly perform the exposure processing of the unexposed substrate, it is possible to prevent the substrate from being discharged and re-input,
Thus, it is possible to realize an exposure apparatus capable of preventing a decrease in throughput when exposing the peripheral area of the substrate in the lithographic process.

[Brief description of drawings]

FIG. 1 is a block diagram showing a configuration of an exposure apparatus according to a first embodiment.

FIG. 2 is a plan view showing an exposure direction and an exposure area with respect to a substrate.

FIG. 3 is a plan view showing an exposure pattern of a substrate according to an example.

FIG. 4 is a flow chart showing a control procedure of exposure processing according to the first embodiment.

FIG. 5 is a block diagram showing a configuration of an exposure apparatus according to a second embodiment.

FIG. 6 is a flow chart showing a control procedure of exposure processing according to the second embodiment.

FIG. 7 is a plan view showing an exposure pattern according to another embodiment.

[Explanation of symbols]

1, 20 ... Exposure device, 2 ... Main body part, 3, 21 ... Control part, 4 ... Substrate stage, 5 ... Rectangular substrate, 5A, 5
B: peripheral area, 6: moving part, 6A: arm part, 7
...... Exposure unit, 8 ...... Rotating unit, 9, 22 ...... Upper controller, 10 ...... Lower controller, 11 ...... Memory unit.

Claims (4)

[Claims] 1. A holding unit for holding a photosensitive substrate, an exposing unit for irradiating exposure light, and a moving unit for relatively moving the holding unit and the exposing unit, exposing a peripheral region of the photosensitive substrate. In the exposure apparatus, a non-volatile storage unit that stores an exposure processing state for the peripheral area and the exposure processing state stored in the storage unit when the exposure unit is restarted An exposure apparatus comprising: 2. The exposure apparatus according to claim 1, wherein the storage means is a hard disk or an electrically erasable read-only memory. 3. The photosensitive substrate is a prismatic photosensitive substrate, and the exposure control means exposes two opposing sides of the rectangular substrate as a first peripheral region, and then exposes the first peripheral region substantially. 2. The exposure according to claim 1, wherein two opposite sides of the rectangular substrate which are orthogonal to each other are exposed as a second peripheral region, and the exposure is restarted from the first peripheral region at the time of the restart. apparatus. 4. The photosensitive substrate is a prismatic photosensitive substrate, and the exposure control means exposes two opposing sides of the rectangular substrate as a first peripheral region, and then exposes the first peripheral region substantially. The two opposite sides of the rectangular substrate which are orthogonal to each other are exposed as a second peripheral region, and when the exposure of the first peripheral region is not completed at the time of the restart, the exposure is performed from the first peripheral region. And restarting the exposure from the second peripheral area when the exposure of the first peripheral area is completed and the exposure of the second peripheral area is not completed at the time of the restart. The exposure apparatus according to claim 1.