JPH09296057A - Method for forming irregular surface on polymer molding - Google Patents

Method for forming irregular surface on polymer molding

Info

Publication number
JPH09296057A
JPH09296057A JP11065196A JP11065196A JPH09296057A JP H09296057 A JPH09296057 A JP H09296057A JP 11065196 A JP11065196 A JP 11065196A JP 11065196 A JP11065196 A JP 11065196A JP H09296057 A JPH09296057 A JP H09296057A
Authority
JP
Japan
Prior art keywords
plasma
organic polymer
polymer material
film
decomposable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11065196A
Other languages
Japanese (ja)
Other versions
JP2840731B2 (en
Inventor
Toshihiro Hirotsu
敏博 広津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP8110651A priority Critical patent/JP2840731B2/en
Publication of JPH09296057A publication Critical patent/JPH09296057A/en
Application granted granted Critical
Publication of JP2840731B2 publication Critical patent/JP2840731B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemical Or Physical Treatment Of Fibers (AREA)

Abstract

PROBLEM TO BE SOLVED: To form a desired surface structure on a molding by irradiating the surface of a molding of a mixture containing a plasmadecomposable organic polymer and a non-plasma-decomposable organic polymer with a plasma to decompose and remove part of the plasmadecomposable organic polymer on the surface. SOLUTION: A benzene solution containing about 3wt.% plasmadecomposable organic polymer material (e.g. polymethyl methacrylate) is mixed with a benzene solution containing about 3wt.% non-plasma-decomposable organic polymer material (e.g. polystyrene) in a weight ratio of 5/95-95/5. Next, the combined solution is cast, and the wet film is dried at room temperature to form a film having a specified thickness. The surface of this film is irradiated with an oxygen plasma having a gas pressure of about 0.02-0.1Torr and a power of about 2-200W for about 1-60min to remove part of the plasmadecomposable organic polymer ad to thereby obtain a film having an irregular structure on the order of 100Å to several μm.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は高分子成形体の凹凸
状表面の新規な形成方法に関するものである。さらに詳
しくいえば、本発明は、特定の複数の高分子材料から成
るフィルム、繊維、ブロック、粒体などの各種形状の高
分子成形体の表面に、多孔状や突起状の表面、すなわち
凹凸状表面を効率よく形成させる方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel method for forming an uneven surface of a polymer molded article. More specifically, the present invention provides a porous or protruding surface, that is, an uneven surface, on a surface of a polymer molded body having various shapes such as a film, a fiber, a block, and a granule composed of a plurality of specific polymer materials. The present invention relates to a method for efficiently forming a surface.

【0002】[0002]

【従来の技術】有機高分子材料は成形が容易であり、そ
の種類に応じ高範囲の弾性や強度などの機械的性質や親
水性から疎水性まで様々な性質を有するものを得ること
ができるので、フィルム、繊維、構造体、粒体などの成
形体として、多くの分野において幅広く用いられてい
る。
2. Description of the Related Art An organic polymer material is easy to mold, and can have various mechanical properties such as elasticity and strength and various properties from hydrophilic to hydrophobic depending on the kind. It is widely used in many fields as molded articles such as films, fibers, structures, and granules.

【0003】このような有機高分子材料から成る成形体
の機能は、その表面構造によって大きく左右されること
が知られており、必要に応じ種々の表面処理、例えば加
熱溶融状態下での延伸処理、プラズマや紫外線による酸
化エッチング処理、機械的なエッチング処理などによ
り、それぞれの目的に応じて加工されている。
It is known that the function of a molded article made of such an organic polymer material is greatly influenced by its surface structure. If necessary, various surface treatments, for example, a stretching treatment under a heated and melted state are required. It is processed according to each purpose by oxidative etching using plasma or ultraviolet light, mechanical etching, or the like.

【0004】このようにして表面処理された成形体のう
ち、例えば多孔状や突起状などの表面を有する高分子成
形体は、機能性構造材料、分離膜、医療材料、機能性繊
維などとして有用である。しかしながら、従来の高分子
成形体の表面構造形成方法は、いずれも任意の表面構造
を形成させることが困難であって、予め表面構造を機能
設計的に構築しにくいという欠点があった。
[0004] Among the molded bodies that have been surface-treated in this way, polymer molded bodies having, for example, porous or protruding surfaces are useful as functional structural materials, separation membranes, medical materials, functional fibers, and the like. It is. However, any of the conventional methods for forming a surface structure of a polymer molded article has a disadvantage that it is difficult to form an arbitrary surface structure, and it is difficult to construct the surface structure in advance in a functional design.

【0005】[0005]

【発明が解決しようとする課題】本発明は、このような
事情のもとで、フィルム状、繊維状、ブロック状、粉体
状などの高分子成形体の表面に多孔状や突起状などの所
望の凹凸状構造を任意に効率よく形成させる簡便な方法
を提供することを目的としてなされたものである。
SUMMARY OF THE INVENTION Under such circumstances, the present invention provides a method for forming a porous, protruding or the like on the surface of a polymer molded product such as a film, a fiber, a block, or a powder. An object of the present invention is to provide a simple method for forming a desired uneven structure arbitrarily and efficiently.

【0006】[0006]

【課題を解決するための手段】本発明者は、前記目的を
達成するために鋭意研究を重ねた結果、成形材料とし
て、プラズマ分解性有機高分子材料とプラズマ非分解性
有機高分子材料との混合物から成る成形体の表面にプラ
ズマを照射して表面に存在するプラズマ分解性高分子材
料の少なくとも一部を分解除去することにより、その目
的を達成しうることを見出し、この知見に基づいて本発
明を完成するに至った。
Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above-mentioned object, and as a result, as a molding material, a plasma decomposable organic polymer material and a plasma non-decomposable organic polymer material have been used. It has been found that the object can be achieved by irradiating the surface of the molded body composed of the mixture with plasma to decompose and remove at least a part of the plasma-decomposable polymer material present on the surface. The invention has been completed.

【0007】すなわち、本発明は、プラズマ分解性有機
高分子材料とプラズマ非分解性有機高分子材料との混合
物から成る成形体の表面にプラズマを照射し、表面に存
在するプラズマ分解性有機高分子材料の少なくとも一部
を分解除去することを特徴とする高分子成形体の凹凸状
表面の形成方法を提供するものである。
That is, according to the present invention, the surface of a molded article made of a mixture of a plasma-decomposable organic polymer material and a plasma non-decomposable organic polymer material is irradiated with plasma, and the plasma-decomposable organic polymer present on the surface is irradiated. Disclosed is a method for forming a concavo-convex surface of a polymer molding, which comprises decomposing and removing at least a part of a material.

【0008】[0008]

【発明の実施の形態】本発明方法においては、成形材料
として、プラズマ分解性有機高分子材料とプラズマ非分
解性有機高分子材料との混合物を用いることが必要であ
る。ここで、プラズマ分解性及びプラズマ非分解性と
は、プラズマ照射により完全に分解するもの又は全く分
解しないものである必要はなく、成形体を形成する2種
又はそれ以上の有機高分子材料において、相対的に、一
方が他方よりプラズマにより分解しやすいという関係が
あればよい。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In the method of the present invention, it is necessary to use a mixture of a plasma-decomposable organic polymer material and a plasma non-decomposable organic polymer material as a molding material. Here, the plasma-decomposable and non-decomposable plasma does not need to be completely decomposed by plasma irradiation or not decomposed at all, and in two or more organic polymer materials forming a molded body, It suffices that there is a relation that one is relatively more easily decomposed by plasma than the other.

【0009】このプラズマ分解性有機高分子材料として
は、例えばポリ(メタクリル酸メチル)、ポリ(メタク
リル酸エチル)、ポリ(メタクリル酸イソプロピル)、
ポリ(メタクリル酸ブチル)、ポリビニルアルコール、
ポリ酢酸ビニル、セルロース及びその誘導体、さらには
これらを主成分とするコポリマーなどを挙げることがで
きる。これらは単独で用いてもよいし、2種以上を組み
合わせて用いてもよい。
Examples of the plasma-decomposable organic polymer material include poly (methyl methacrylate), poly (ethyl methacrylate), poly (isopropyl methacrylate),
Poly (butyl methacrylate), polyvinyl alcohol,
Examples thereof include polyvinyl acetate, cellulose and derivatives thereof, and copolymers containing these as main components. These may be used alone or in combination of two or more.

【0010】一方、プラズマ非分解性有機高分子材料と
しては、例えばポリアクリロニトリル、ポリスチレン、
ポリジメチルシロキサン、ポリスルホン、ポリフェニレ
ンエーテル、スチレン/ブタジエンゴム、イソプレンゴ
ム、フッ素ゴムなどを挙げることができる。これらは単
独で用いてもよいし、2種以上を組み合わせて用いても
よい。
On the other hand, as the plasma non-decomposable organic polymer material, for example, polyacrylonitrile, polystyrene,
Examples thereof include polydimethylsiloxane, polysulfone, polyphenylene ether, styrene / butadiene rubber, isoprene rubber, and fluorine rubber. These may be used alone or in combination of two or more.

【0011】このような異種の高分子材料を混合するこ
とにより、その組合せや混合比に応じて、バルク的には
相容的な三次元構造が形成され、そしてこのような構造
形成により、成分材料の相乗的な物性が得られることが
知られている。一方、この混合材料から成る成形体の表
面においては、高分子材料の組合せや混合比に応じて、
海島構造や縞状構造などが形成される。本発明方法によ
れば、成形体表面におけるこのような構造を構成する高
分子材料の一成分(プラズマ分解性高分子材料)の少な
くとも一部をプラズマによる照射処理により、選択的に
除去し、凹凸状の表面構造を形成させることができる。
By mixing such different types of polymer materials, a three-dimensional structure compatible with the bulk is formed according to the combination and the mixing ratio. It is known that synergistic physical properties of materials can be obtained. On the other hand, on the surface of the molded body made of this mixed material, depending on the combination and mixing ratio of the polymer materials,
A sea-island structure or a striped structure is formed. According to the method of the present invention, at least a part of one component (plasma-decomposable polymer material) of the polymer material constituting such a structure on the surface of the molded body is selectively removed by irradiation treatment with plasma, and the unevenness is obtained. Surface structure can be formed.

【0012】本発明方法においては、前記プラズマ分解
性高分子材料とプラズマ非分解性高分子材料との混合割
合は特に制限はなく、成形体の所望物性や所望表面構造
などに応じて適宜選定すればよいが、一般には重量比
5:95ないし95:5の範囲で選ばれる。
In the method of the present invention, the mixing ratio of the plasma-decomposable polymer material and the non-plasma-decomposable polymer material is not particularly limited, and may be appropriately selected according to the desired physical properties and desired surface structure of the molded article. The weight ratio is generally selected in the range of 5:95 to 95: 5.

【0013】本発明方法において用いられる高分子成形
体の形状については特に制限はなく、例えばフィルム、
繊維、ブロック、粒体など、任意の形状にすることがで
きる。
[0013] The shape of the polymer molded article used in the method of the present invention is not particularly limited.
Any shape, such as fibers, blocks, and granules, can be used.

【0014】また、本発明方法において用いられるプラ
ズマ源については、非重合性プラズマ源であればよく、
特に制限はない。例えばアルゴンやヘリウムなどを用い
た非反応性プラズマであってもよいし、酸素や空気など
を用いた酸化反応性プラズマであってもよく、成形体を
構成する各高分子材料のエッチング特性や耐エッチング
特性に応じて、適宜選定するのがよい。
The plasma source used in the method of the present invention may be a non-polymerizable plasma source.
There is no particular limitation. For example, non-reactive plasma using argon, helium, or the like may be used, or oxidation-reactive plasma using oxygen, air, or the like may be used. It is preferable to appropriately select according to the etching characteristics.

【0015】一般に、プラズマ照射は、高分子材料本来
の特性をそこなうことなく、成形体表面を100Åない
し数μm程度の層の厚さにエッチングすることができ
る。一方、本発明における混合高分子材料から成る成形
体表面の相分離構造の大きさは、一般に数百Åないし数
μm径であるので、プラズマ照射によって選択的にエッ
チング除去され、凹凸状の表面構造を形成させるのに適
している。
In general, the plasma irradiation can etch the surface of the molded product to a thickness of about 100 μm to several μm without deteriorating the inherent properties of the polymer material. On the other hand, the size of the phase-separated structure on the surface of the molded body made of the mixed polymer material according to the present invention is generally several hundreds of μm to several μm in diameter, so that it is selectively etched away by plasma irradiation to form the uneven surface structure. It is suitable for forming

【0016】このプラズマ照射は、従来公知の方法によ
って実施することができる。プラズマの発生は、一般に
は、真空条件下にラジオ波を使った励起法によって行わ
れるが、この発生法については特に制限はなく、波長が
より長いキロヘルツオーダーのオーディオ波、メガヘル
ツオーダーのラジオ波、より短波長のマイクロ波を用い
ることが可能である。プラズマとして用いるガスの圧力
は、通常0.01〜1.0torrの範囲、好ましくは
0.02〜0.1torrの範囲で選ばれる。また、適
正な放電出力は、ガスの種類や圧力、プラズマ発生装置
などに依存するが、放電が発生できればよく、特に制限
はない。一般には2〜200Wの範囲で放電が発生し、
効率よくエッチングされる。処理時間は1〜60分間程
度で十分である。
This plasma irradiation can be carried out by a conventionally known method. The generation of plasma is generally performed by an excitation method using radio waves under vacuum conditions, but there is no particular limitation on the generation method, and audio waves having a longer wavelength, kilohertz-order audio waves, megahertz-order radio waves, It is possible to use shorter wavelength microwaves. The pressure of the gas used as the plasma is generally selected in the range of 0.01 to 1.0 torr, preferably in the range of 0.02 to 0.1 torr. Further, the appropriate discharge output depends on the type and pressure of the gas, the plasma generator, and the like, but is not particularly limited as long as the discharge can be generated. Generally, discharge occurs in the range of 2 to 200 W,
Etching is efficient. A processing time of about 1 to 60 minutes is sufficient.

【0017】このようなプラズマ照射により、高分子成
形体の表面におけるプラズマ分解性高分子材料が選択的
に分解除去され、凹凸状の表面構造が形成される。例え
ば、成形体表面に海島構造や縞状構造を有する場合、プ
ラズマ分解性高分子材料が優先的に除去され、多孔状や
突起状構造などが形成される。
[0017] By such plasma irradiation, the plasma-decomposable polymer material on the surface of the polymer molded body is selectively decomposed and removed, thereby forming an uneven surface structure. For example, when the molded body has a sea-island structure or a striped structure, the plasma-decomposable polymer material is preferentially removed to form a porous or protruding structure.

【0018】[0018]

【発明の効果】本発明によれば、フィルム、繊維、ブロ
ック、粒体などの高分子成形体の表面をプラズマにより
照射処理するという簡便な方法で、多孔状や突起状の表
面構造を任意に効率よく形成させることができる。この
ような表面構造を有する高分子成形体は、例えば機能性
構造材料、分離膜、医療材料、機能性繊維などとして有
用である。
According to the present invention, a porous or protruding surface structure can be arbitrarily adjusted by a simple method of irradiating the surface of a polymer molded product such as a film, fiber, block, or granular material with plasma. It can be formed efficiently. The polymer molded article having such a surface structure is useful, for example, as a functional structural material, a separation membrane, a medical material, a functional fiber, and the like.

【0019】[0019]

【実施例】次に、本発明を実施例によりさらに詳細に説
明するが、本発明は、これらの例によってなんら限定さ
れるものではない。
EXAMPLES Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.

【0020】実施例1 ポリ(メタクリル酸メチル)(以下、PMMAと略記す
る)3重量%を含有するベンゼン溶液と分子量25万の
ポリスチレン3重量%を含有するベンゼン溶液とを、重
量比1:9の割合で混合して得られた溶液をキャスト
し、室温下で風乾して、厚さ約45μmのフィルムを作
成した。このフィルムは、表面の走査型電子顕微鏡写真
から、PMMA成分が0.6〜0.7μm径の島構造を
形成していることが確認された。次に、このフィルムの
表面に0.1トール、50Wの酸素プラズマを30分間
照射したところ、平均1μm径の多孔構造をもつ表面が
形成された。
Example 1 A benzene solution containing 3% by weight of poly (methyl methacrylate) (hereinafter abbreviated as PMMA) and a benzene solution containing 3% by weight of polystyrene having a molecular weight of 250,000 were mixed at a weight ratio of 1: 9. The resulting solution was cast and air-dried at room temperature to form a film having a thickness of about 45 μm. From the scanning electron micrograph of the surface of this film, it was confirmed that the PMMA component formed an island structure having a diameter of 0.6 to 0.7 μm. Next, when the surface of this film was irradiated with oxygen plasma of 0.1 Torr and 50 W for 30 minutes, a surface having a porous structure with an average diameter of 1 μm was formed.

【0021】実施例2 実施例1と同様にして、PMMAとポリスチレンとの重
量比2:8の混合物から成る厚さ約45μmのフィルム
を作成した。このフィルムは、表面の走査型電子顕微鏡
写真から、PMMA成分が2μm径の島構造を形成して
いることが確認された。次に、このフィルムの表面に、
実施例1と同条件で酸素プラズマを照射したところ、約
2.5μm径の多孔構造をもつ表面が形成された。
Example 2 In the same manner as in Example 1, a film having a thickness of about 45 μm and made of a mixture of PMMA and polystyrene in a weight ratio of 2: 8 was prepared. From the scanning electron micrograph of the surface of this film, it was confirmed that the PMMA component formed an island structure having a diameter of 2 μm. Next, on the surface of this film,
When oxygen plasma was irradiated under the same conditions as in Example 1, a surface having a porous structure with a diameter of about 2.5 μm was formed.

【0022】実施例3 実施例1と同様にして、PMMAとポリスチレンとの重
量比8:2の混合物から成る厚さ約45μmのフィルム
を作成した。このフィルムは、表面の走査型電子顕微鏡
写真から、PMMA成分が海構造を、ポリスチレンが島
構造を形成していることが確認された。次に、このフィ
ルムの表面に、実施例1と同条件で酸素プラズマを照射
したところ、5〜10μm径のポリスチレン部分から成
る突起構造をもつ表面が形成された。
Example 3 In the same manner as in Example 1, a film having a thickness of about 45 μm made of a mixture of PMMA and polystyrene in a weight ratio of 8: 2 was prepared. From the scanning electron micrograph of the surface of this film, it was confirmed that the PMMA component formed a sea structure and the polystyrene formed an island structure. Next, when the surface of this film was irradiated with oxygen plasma under the same conditions as in Example 1, a surface having a protrusion structure composed of polystyrene portions having a diameter of 5 to 10 μm was formed.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 プラズマ分解性有機高分子材料とプラズ
マ非分解性有機高分子材料との混合物から成る成形体の
表面にプラズマを照射し、表面に存在するプラズマ分解
性有機高分子材料の少なくとも一部を分解除去すること
を特徴とする高分子成形体の凹凸状表面形成方法。
1. At least one of the plasma-decomposable organic polymer materials existing on the surface of a molded body made of a mixture of a plasma-decomposable organic polymer material and a plasma non-decomposable organic polymer material, which is irradiated with plasma. A method for forming a concavo-convex surface on a polymer molded body, which comprises decomposing and removing a portion.
【請求項2】 プラズマ分解性有機高分子材料とプラズ
マ非分解性有機高分子材料との混合割合が、重量比で
5:95ないし95:5である請求項1記載の形成方
法。
2. The method according to claim 1, wherein the mixing ratio of the plasma-decomposable organic polymer material and the plasma non-decomposable organic polymer material is 5:95 to 95: 5 by weight.
【請求項3】 成形体がフィルム、繊維、ブロック又は
粒体である請求項1又は2記載の形成方法。
3. The method according to claim 1, wherein the molded body is a film, a fiber, a block or a granule.
JP8110651A 1996-05-01 1996-05-01 Method for forming uneven surface of polymer molded article Expired - Lifetime JP2840731B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8110651A JP2840731B2 (en) 1996-05-01 1996-05-01 Method for forming uneven surface of polymer molded article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8110651A JP2840731B2 (en) 1996-05-01 1996-05-01 Method for forming uneven surface of polymer molded article

Publications (2)

Publication Number Publication Date
JPH09296057A true JPH09296057A (en) 1997-11-18
JP2840731B2 JP2840731B2 (en) 1998-12-24

Family

ID=14541081

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (7)

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JP2002009202A (en) * 2000-06-21 2002-01-11 Fujitsu Ltd Manufacturing method for low-dielectric constant resin insulating layer, and manufacturing method for circuit board using the insulating layer as well as manufacturing method for thin-film multilayer circuit using the insulating layer
WO2003048236A1 (en) * 2001-12-04 2003-06-12 Bridgestone Corporation Powdery rubber having unevened surface and rubber compositions and tires using the same
WO2007086568A1 (en) * 2006-01-30 2007-08-02 Kyocera Corporation Resin film, adhesive sheet, wiring substrates, and electronic devices
WO2008102620A1 (en) * 2007-02-20 2008-08-28 Nitto Denko Corporation Process for producing columnar structure having two-stage hierarchical structure
WO2009069393A1 (en) 2007-11-27 2009-06-04 Kureha Corporation Method for manufacturing porous polymer molded article
WO2009119144A1 (en) 2008-03-26 2009-10-01 株式会社クレハ Method for producing polymer molded body
GB2587611A (en) * 2019-09-24 2021-04-07 Inst Jozef Stefan A method for producing polymeric surface modification layers

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JPH05347284A (en) * 1992-06-16 1993-12-27 Fujitsu Ltd Surface flattening method of polymer blend film

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JPH05347284A (en) * 1992-06-16 1993-12-27 Fujitsu Ltd Surface flattening method of polymer blend film

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002009202A (en) * 2000-06-21 2002-01-11 Fujitsu Ltd Manufacturing method for low-dielectric constant resin insulating layer, and manufacturing method for circuit board using the insulating layer as well as manufacturing method for thin-film multilayer circuit using the insulating layer
JP4640878B2 (en) * 2000-06-21 2011-03-02 富士通株式会社 Method of manufacturing circuit board using low dielectric constant resin insulating layer and method of manufacturing thin film multilayer circuit film using low dielectric constant resin insulating layer
WO2003048236A1 (en) * 2001-12-04 2003-06-12 Bridgestone Corporation Powdery rubber having unevened surface and rubber compositions and tires using the same
US7344777B2 (en) 2001-12-04 2008-03-18 Bridgestone Corporation Powder rubber subjected to treatment of making unevenness on surface thereof and rubber composition using the same and tire
WO2007086568A1 (en) * 2006-01-30 2007-08-02 Kyocera Corporation Resin film, adhesive sheet, wiring substrates, and electronic devices
US8129623B2 (en) 2006-01-30 2012-03-06 Kyocera Corporation Resin film, adhesive sheet, circuit board, and electronic apparatus
WO2008102620A1 (en) * 2007-02-20 2008-08-28 Nitto Denko Corporation Process for producing columnar structure having two-stage hierarchical structure
JP2008200793A (en) * 2007-02-20 2008-09-04 Nitto Denko Corp Method for manufacturing columnar structure having two-stage layer
WO2009069393A1 (en) 2007-11-27 2009-06-04 Kureha Corporation Method for manufacturing porous polymer molded article
WO2009119144A1 (en) 2008-03-26 2009-10-01 株式会社クレハ Method for producing polymer molded body
GB2587611A (en) * 2019-09-24 2021-04-07 Inst Jozef Stefan A method for producing polymeric surface modification layers

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