JPH09279354A - Internally coated copper or copper alloy tube and its production - Google Patents
Internally coated copper or copper alloy tube and its productionInfo
- Publication number
- JPH09279354A JPH09279354A JP11533996A JP11533996A JPH09279354A JP H09279354 A JPH09279354 A JP H09279354A JP 11533996 A JP11533996 A JP 11533996A JP 11533996 A JP11533996 A JP 11533996A JP H09279354 A JPH09279354 A JP H09279354A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- plating
- alloy tube
- copper alloy
- plating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Chemically Coating (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は給水・給湯用建築管
あるいはファンコイルユニットなどの空調用配管等とし
て用いられる内面錫めっき銅又は銅合金管及びその製造
方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an inner surface tinned copper or copper alloy tube used as a water supply / hot water supply construction pipe or an air conditioning pipe such as a fan coil unit, and a method for producing the same.
【0002】[0002]
【従来の技術】従来、給水・給湯用配管あるいは空調用
配管としては加工性、ろう付性などの点からりん脱酸銅
管(JIS H3300 C1220T)が使用されて
いた。しかし、りん脱酸銅管は給水・給湯用配管の用途
では銅イオンが水中に溶出するため、これを抑制すると
の観点から内面に錫被覆を施す技術が考案された(特開
平4−45282号公報参照)。この技術は銅管内面に
無電解錫めっき液を流通することによりめっきを行うも
のであるので、管径に対して長尺な管でも適用でき、銅
イオン溶出防止効果に極めて優れているため非常に有意
義な技術といえる。2. Description of the Related Art Conventionally, a phosphorous deoxidized copper pipe (JIS H3300 C1220T) has been used as a pipe for supplying water and hot water or a pipe for air conditioning because of its workability and brazing property. However, in the phosphorous deoxidized copper pipe, copper ions are eluted into water for the purpose of water supply and hot water supply pipes. Therefore, from the viewpoint of suppressing copper ions, a technique of coating the inner surface with tin was devised (Japanese Patent Laid-Open No. 4-45282). See the bulletin). Since this technology performs plating by circulating an electroless tin plating solution on the inner surface of the copper pipe, it can be applied to long pipes with respect to the pipe diameter, and is extremely effective in preventing copper ion elution. It can be said that this is a meaningful technique.
【0003】ところが、この技術には被覆層である錫の
耐食性についての問題があり、流水中に錫層が腐食を受
け、管の地肌が露出するといったことが生じる場合があ
った。 これに対応するため、さらに錫めっき表面に酸
化膜を形成させる技術(特開平4−99180号公報)
や、錫層を合金化する技術(特開平4−131384号
公報)などが考案され、多少の改善がなされたものの、
その効果は十分でなかった。However, this technique has a problem with respect to the corrosion resistance of tin as a coating layer, and the tin layer may be corroded in running water and the background of the pipe may be exposed. To cope with this, a technique of further forming an oxide film on the tin-plated surface (JP-A-4-99180)
Although a technique for alloying a tin layer (Japanese Patent Laid-Open No. 4-131384) was devised, and some improvements were made,
The effect was not sufficient.
【0004】[0004]
【発明が解決しようとする課題】本発明は上記従来の問
題点に鑑みてなされたもので、銅又は銅合金管内面の錫
めっき層の耐食性を一層向上させることを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above conventional problems, and an object thereof is to further improve the corrosion resistance of the tin plating layer on the inner surface of the copper or copper alloy tube.
【0005】[0005]
【課題を解決するための手段】上記課題に沿って本発明
者が種々研究を行った結果、銅又は銅合金管内面に被覆
した錫めっき層の耐食性は、該錫めっき層の表面粗度あ
るいは表面粗度と膜厚の相互関係に大きく依存すること
を知見し、その錫めっき層表面粗度と膜厚をコントロー
ルすることにより、耐食性を格段に向上させた内面錫め
っき銅又は銅合金管を得るに至った。As a result of various researches conducted by the present inventors along with the above problems, the corrosion resistance of the tin-plated layer coated on the inner surface of the copper or copper alloy pipe is determined by the surface roughness of the tin-plated layer or the We have found that the surface roughness and film thickness are highly dependent on each other, and by controlling the surface roughness and film thickness of the tin plating layer, we have developed an inner surface tin-plated copper or copper alloy tube with significantly improved corrosion resistance. I got it.
【0006】すなわち、本発明に関わる内面被覆銅又は
銅合金管は、内面に被覆層として錫めっき層を有する銅
又は銅合金管において、そのめっき層の表面粗度がRa
(中心線平均粗さ)≦0.8μmであることを特徴とす
る。あるいは、そのめっき層の表面粗度Raとめっき層
厚さの比(Ra/めっき層厚さ)が1.5以下であるこ
とを特徴とする。なお、本発明において中心線平均粗さ
Raの定義はJISB 0601に準じる。That is, the inner surface-coated copper or copper alloy tube according to the present invention is a copper or copper alloy tube having a tin plating layer as a coating layer on the inner surface, and the surface roughness of the plating layer is Ra.
(Center line average roughness) ≦ 0.8 μm. Alternatively, the ratio of the surface roughness Ra of the plating layer to the plating layer thickness (Ra / plating layer thickness) is 1.5 or less. In the present invention, the definition of the center line average roughness Ra is in accordance with JISB0601.
【0007】錫めっき層の耐食性はその表面に形成され
る安定した酸化皮膜によるものであり、Ra≦0.8μ
mあるいはRaとめっき層厚さの比(Ra/めっき層厚
さ)が1.5以下のとき、安定した錫酸化膜が均一に形
成される。逆にいえば、Ra>0.8μmでかつ(Ra
/めっき層厚さ)が1.5をこえると安定した錫酸化膜
が均一に形成されない。なお、前記特開平4−4528
2号公報で無電解錫めっきにより形成された錫めっき層
が耐食性に劣るのは、めっき表面の粗度がコントロール
されておらず、Ra>0.8μmかつRaと膜厚の比
(Ra/めっき層厚さ)が1.5をこえる箇所があり、
その部位で錫めっき層が腐食を受けたためと考えられ
る。The corrosion resistance of the tin-plated layer is due to the stable oxide film formed on its surface, Ra ≦ 0.8 μ
When the ratio of m or Ra to the plating layer thickness (Ra / plating layer thickness) is 1.5 or less, a stable tin oxide film is uniformly formed. Conversely, if Ra> 0.8 μm and (Ra
If the (plating layer thickness) exceeds 1.5, a stable tin oxide film cannot be formed uniformly. Incidentally, the above-mentioned JP-A-4-4528.
No. 2, the tin plating layer formed by electroless tin plating is inferior in corrosion resistance because the roughness of the plating surface is not controlled and Ra> 0.8 μm and the ratio of Ra to film thickness (Ra / plating). There are places where the layer thickness) exceeds 1.5,
It is considered that the tin plating layer was corroded at that portion.
【0008】また、本発明に関わる内面被覆銅又は銅合
金管の製造方法は、上記要件を備えた銅又は銅合金管を
得るためのもので、銅又は銅合金管の端部から錫めっき
液を流通させてめっきを行い、内面被覆銅又は銅合金管
を製造する方法において、内表面粗度がRa≦0.8μ
mの銅又は銅合金管に80℃以下でめっき液を0.05
〜2.5m/sの速度で流通させることによりめっきす
ることを特徴とする。The method for producing an inner surface coated copper or copper alloy tube according to the present invention is for obtaining a copper or copper alloy tube having the above-mentioned requirements, and a tin plating solution is applied from the end of the copper or copper alloy tube. In the method for producing an inner surface-coated copper or copper alloy tube, the inner surface roughness is Ra ≦ 0.8 μm.
0.05m of copper or copper alloy tube with plating solution below 80 ℃
The method is characterized in that plating is performed by circulating at a speed of up to 2.5 m / s.
【0009】[0009]
【発明の実施の形態】本発明方法には特に無電解Snめ
っきが好適に適用される。また、本発明において無電解
めっきは化学めっきと置換めっきの双方を意味する。錫
めっきの膜厚のコントロールはめっき液の温度とめっき
時間でコントロールできるが、錫めっき層のRaをコン
トロールするには母材(銅又は銅合金管自体)の内表面
粗度Ra、めっき温度、めっき液流通速度の管理が重要
である。Raを0.8μm以下にする、又はRaと膜厚
の比(Ra/めっき層厚さ)を1.5以下にするために
は母材の内表面粗度をRa≦0.8μmとしなければな
らず、めっき温度は80℃以下でなければならず、さら
にめっき液流通速度は0.05〜2.5m/sでなけれ
ばならない。BEST MODE FOR CARRYING OUT THE INVENTION Electroless Sn plating is particularly preferably applied to the method of the present invention. Further, in the present invention, electroless plating means both chemical plating and displacement plating. The thickness of the tin plating can be controlled by controlling the temperature of the plating solution and the plating time. However, in order to control the Ra of the tin plating layer, the inner surface roughness Ra of the base material (copper or copper alloy tube itself), the plating temperature, It is important to control the flow rate of the plating solution. In order to set Ra to 0.8 μm or less, or to set the ratio of Ra to film thickness (Ra / plating layer thickness) to 1.5 or less, the inner surface roughness of the base material must be Ra ≦ 0.8 μm. The plating temperature must be 80 ° C. or lower, and the plating solution flow rate must be 0.05 to 2.5 m / s.
【0010】80℃を超えるめっき温度でめっきした
り、めっき液流通速度が2.5m/sを超えるとRaが
大きくなる傾向にあるため、Raを0.8μm以下又は
Raと膜厚の比(Ra/めっき層厚さ)を1.5以下に
コントロールするのが難しい。従って、めっきの温度は
80℃以下、流通速度は2.5m/s以下が必須とな
る。しかし、めっき速度は温度が高いほうが速いため工
業的に考えると30℃以上でのめっきが望ましい。一
方、流通速度が0.05m/s未満になるとSnの供給
量が少なくなり、めっきムラが生じる場合があるため
0.05m/s以上でのめっきが必須となる。Ra tends to increase when plating is performed at a plating temperature higher than 80 ° C. or when the plating solution flow rate exceeds 2.5 m / s. Therefore, Ra is 0.8 μm or less or the ratio of Ra to the film thickness ( It is difficult to control Ra / plating layer thickness) to 1.5 or less. Therefore, it is essential that the plating temperature be 80 ° C. or lower and the flow rate be 2.5 m / s or lower. However, the higher the temperature is, the faster the plating rate is, so from an industrial viewpoint, plating at 30 ° C. or higher is desirable. On the other hand, when the flow rate is less than 0.05 m / s, the supply amount of Sn becomes small and uneven plating may occur, so plating at 0.05 m / s or more is essential.
【0011】[0011]
【実施例】りん脱酸銅管(JIS H3300 C12
20T、外径15.88mm、肉厚0.71mm、長さ
4000mm)の内表面Raを変えた材料に、表1に示
す無電解めっき液を流通し供試材を作製した。各供試材
のRa、めっき条件及びめっき後特性を表2に示す。Example: Phosphorus deoxidized copper tube (JIS H3300 C12
20T, outer diameter 15.88 mm, wall thickness 0.71 mm, length 4000 mm) with different inner surface Ra, the electroless plating solutions shown in Table 1 were circulated to prepare test materials. Table 2 shows Ra, plating conditions and post-plating properties of each test material.
【0012】[0012]
【表1】 [Table 1]
【0013】[0013]
【表2】 [Table 2]
【0014】これらの供試材を用いジェット試験及び通
水試験を行った。ジェット試験及び通水試験の評価方法
を以下に示す。 <ジェット試験>表2に示す供試材から長さ60mmの
半割管を切り出し試験材とした。この試験材に、福岡県
北九州市の水道水にCl-を80ppm加えた60℃の
水中で、これと同じ水で直径2mm、流速10m/sの
ジェット水流をめっき面に垂直に180日間噴射して腐
食(潰食)の発生状況を調べた。 <通水試験>表2に示す材料から長さ500mmの管を
切り出し試験管とした。これらの試験管を直列に接続し
て、その管内に福岡県北九州市の水道水にCl-を50
ppm加えた水を流速1.0m/sで300日間連続通
水を行った。試験後各供試管を半割し、Sn皮膜が腐食
して剥離し母材が露出している状況を観察するため、画
像解析装置で剥離率を調べた。A jet test and a water flow test were conducted using these test materials. The evaluation methods of the jet test and the water flow test are shown below. <Jet test> A half-divided tube having a length of 60 mm was cut out from the test material shown in Table 2 to obtain a test material. To this test material, tap water of Kitakyushu City, Fukuoka Prefecture, which was added with 80 ppm of Cl − at 60 ° C., was jetted with the same water for 180 days perpendicularly to the plating surface with a diameter of 2 mm and a flow rate of 10 m / s. The state of occurrence of corrosion (erosion) was investigated. <Water Flow Test> A tube having a length of 500 mm was cut out from the materials shown in Table 2 to obtain a test tube. Connect these tubes in series, Cl in Kitakyushu, Fukuoka Prefecture of tap water in the tube - 50
Water added with ppm was continuously flowed for 300 days at a flow rate of 1.0 m / s. After the test, each test tube was halved and the peeling rate was examined by an image analyzer in order to observe the situation in which the Sn coating was corroded and peeled off to expose the base material.
【0015】めっき後の外観、ジェット試験結果、通水
試験結果を表3に示す。Table 3 shows the appearance, the jet test result and the water flow test result after plating.
【0016】[0016]
【表3】 [Table 3]
【0017】表3に示すように、めっき後のRaが0.
8μm以下又はRaと膜厚の比(Ra/めっき層厚さ)
が1.5以下で均一にめっきされた実施例1〜6では、
ジェット試験においても腐食は認められず、通水試験に
おいてもSn層が腐食して剥離するといったことは見ら
れなかった。一方、母材のRa、流速、めっき温度が所
定の条件でない比較例7、8、10はいずれもめっき後
のRaが0.8を超えかつRaと膜厚の比(Ra/めっ
き層厚さ)が1.5を超えているため、ジェット試験で
はSn層が剥離したあと母材の腐食が進行しており、通
水試験ではSnの腐食によるSn皮膜の剥離が認められ
る。また比較例9は流速が所定の条件より遅いため、め
っきムラが発生しておりめっきムラの部分で腐食や剥離
が生じている。As shown in Table 3, Ra after plating was 0.
8 μm or less or ratio of Ra to film thickness (Ra / plating layer thickness)
Is 1.5 or less, and in Examples 1 to 6 which are uniformly plated,
No corrosion was observed in the jet test, and no Sn layer was corroded and separated in the water flow test. On the other hand, in each of Comparative Examples 7, 8 and 10 in which the Ra of the base material, the flow rate, and the plating temperature are not predetermined conditions, the Ra after plating exceeds 0.8 and the ratio of Ra to the film thickness (Ra / plating layer thickness). ) Is more than 1.5, the corrosion of the base metal is progressing after the Sn layer is peeled off in the jet test, and the Sn coating is peeled off due to the corrosion of Sn in the water flow test. Further, in Comparative Example 9, since the flow velocity is slower than the predetermined condition, uneven plating occurs, and corrosion or peeling occurs at the uneven plating portion.
【0018】[0018]
【発明の効果】本発明によれば、内面被覆銅又は銅合金
管の錫めっき表面層の粗度と膜厚をコントロールするこ
とにより、耐食性の優れた内面被覆銅又は銅合金管を得
ることができ、内面被覆銅又は銅合金管の信頼性と寿命
を格段に向上させることができる。INDUSTRIAL APPLICABILITY According to the present invention, an inner surface-coated copper or copper alloy tube having excellent corrosion resistance can be obtained by controlling the roughness and film thickness of the tin-plated surface layer of the inner surface-coated copper or copper alloy tube. Therefore, the reliability and life of the inner surface coated copper or copper alloy tube can be significantly improved.
Claims (3)
銅又は銅合金管において、そのめっき層の表面粗度がR
a(中心線平均粗さ、以下同じ)≦0.8μmであるこ
とを特徴とする内面被覆銅又は銅合金管。1. A copper or copper alloy tube having a tin plating layer as a coating layer on the inner surface thereof, wherein the surface roughness of the plating layer is R.
a (center line average roughness, the same applies hereinafter) ≦ 0.8 μm, an inner surface-coated copper or copper alloy tube.
銅又は銅合金管において、そのめっき層の表面粗度Ra
とめっき層厚さの比(Ra/めっき層厚さ)が1.5以
下であることを特徴とする内面被覆銅又は銅合金管。2. A copper or copper alloy tube having a tin plating layer as a coating layer on its inner surface, wherein the surface roughness Ra of the plating layer is
And the plating layer thickness ratio (Ra / plating layer thickness) is 1.5 or less, an inner surface-coated copper or copper alloy tube.
流通させてめっきを行い内面被覆銅又は銅合金管を製造
する方法において、内表面粗度がRa≦0.8μmの銅
又は銅合金管に80℃以下でめっき液を0.05〜2.
5m/sの速度で流通させることによりめっきすること
を特徴とする内面被覆銅又は銅合金管の製造方法。3. A method for producing an inner surface-coated copper or copper alloy tube by carrying out plating by passing a tin plating solution from the end portion of the copper or copper alloy tube, wherein copper having an inner surface roughness of Ra ≦ 0.8 μm or The copper alloy tube is coated with the plating solution at a temperature of 80 ° C. or lower at 0.05-2.
A method for producing an inner surface-coated copper or copper alloy tube, which comprises plating by circulating at a speed of 5 m / s.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11533996A JP2998924B2 (en) | 1996-04-11 | 1996-04-11 | Inner surface coated copper or copper alloy tube and method for producing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11533996A JP2998924B2 (en) | 1996-04-11 | 1996-04-11 | Inner surface coated copper or copper alloy tube and method for producing the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH09279354A true JPH09279354A (en) | 1997-10-28 |
JP2998924B2 JP2998924B2 (en) | 2000-01-17 |
Family
ID=14660102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11533996A Expired - Fee Related JP2998924B2 (en) | 1996-04-11 | 1996-04-11 | Inner surface coated copper or copper alloy tube and method for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2998924B2 (en) |
-
1996
- 1996-04-11 JP JP11533996A patent/JP2998924B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2998924B2 (en) | 2000-01-17 |
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