JPH09265137A - Method and device for controlling environment of exposure device - Google Patents
Method and device for controlling environment of exposure deviceInfo
- Publication number
- JPH09265137A JPH09265137A JP9927896A JP9927896A JPH09265137A JP H09265137 A JPH09265137 A JP H09265137A JP 9927896 A JP9927896 A JP 9927896A JP 9927896 A JP9927896 A JP 9927896A JP H09265137 A JPH09265137 A JP H09265137A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- signal
- acoustic
- air
- acoustic noise
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はチャンバー内に配置
された露光装置の環境制御方法及び装置に関し、特に、
チャンバー内の音響雑音を減衰させる方法及び装置に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an environment control method and apparatus for an exposure apparatus arranged in a chamber, and more particularly,
A method and apparatus for attenuating acoustic noise in a chamber.
【０００２】[0002]
【発明の背景】半導体集積回路製造用等に用いられる露
光装置においては、装置温度と装置内清浄度の管理を行
うために、露光装置本体を環境制御チャンバー内に収容
している。そして、空気供給装置（以下、「空調機」と
略称する）から供給される温度制御された空気を塵埃除
去フィルタで濾過した後に、露光装置本体に流すように
なっている。半導体集積回路の集積度が向上するにつ
れ、露光装置本体内に浮遊する極めて微細な塵埃を除去
する必要性から、塵埃除去フィルタも更なる微細化が進
んでいる。また、紫外線リソグラフィでの配線形成に使
用される化学増幅型フォトレジストの性能変化を抑制す
るため、塵埃除去フィルタに加えて、化学物質除去フィ
ルタを設けている。即ち、この化学物質除去フィルタに
よって、空気中の反応性化学物質を除去している。BACKGROUND OF THE INVENTION In an exposure apparatus used for manufacturing a semiconductor integrated circuit or the like, the exposure apparatus main body is housed in an environmental control chamber in order to control the apparatus temperature and the cleanliness inside the apparatus. Then, the temperature-controlled air supplied from an air supply device (hereinafter, simply referred to as "air conditioner") is filtered by a dust removing filter and then flown to the exposure apparatus main body. As the degree of integration of semiconductor integrated circuits is improved, it is necessary to remove extremely fine dust floating in the exposure apparatus main body, and therefore the dust removal filter is further miniaturized. In addition to the dust removal filter, a chemical substance removal filter is provided in order to suppress the performance change of the chemically amplified photoresist used for wiring formation in ultraviolet lithography. That is, this chemical substance removal filter removes the reactive chemical substance in the air.
【０００３】[0003]
【従来技術】図２は、従来の投影露光装置用の環境制御
装置を示す。図において、投影露光装置本体１０は、温
度制御された空気（１４）が循環する環境制御チャンバ
ー１２内に収容されている。環境制御チャンバー１２内
には、投影露光装置本体１０内を通過した空気を冷却す
る空気冷却器１６と、この冷却された空気を適正温度ま
で加熱する空気再加熱機１８とが装備されている。投影
露光装置本体１０の側部には、投影露光装置本体１０近
傍の空気の温度を検出する温度センサ２０が配置されて
おり、この温度センサ２０によって検出された温度に基
づいて温度コントローラ２２が空気再加熱機１８を制御
するようになっている。2. Description of the Related Art FIG. 2 shows a conventional environment control device for a projection exposure apparatus. In the figure, the projection exposure apparatus main body 10 is housed in an environment control chamber 12 in which temperature-controlled air (14) circulates. The environment control chamber 12 is equipped with an air cooler 16 that cools the air that has passed through the projection exposure apparatus main body 10 and an air reheater 18 that heats the cooled air to an appropriate temperature. A temperature sensor 20 that detects the temperature of the air in the vicinity of the projection exposure apparatus main body 10 is arranged on the side of the projection exposure apparatus main body 10. Based on the temperature detected by the temperature sensor 20, the temperature controller 22 controls the air The reheater 18 is controlled.
【０００４】空気再加熱機１８によって温度制御された
空気は、送風機２４によって投影露光装置本体１０側に
送り込まれる。送風機２４の送風口近傍には、化学物質
除去フィルタ２６が配置され、空気中の反応性化学物質
を除去するようになっている。化学物質除去フィルタ２
６の前方（風下）には、塵埃除去フィルタ２８が配置さ
れ、空気中の塵埃を除去するようになっている。環境制
御チャンバー１２内には、もう１つ化学物質除去フィル
タ３０が配置され、チャンバー１２内に取り込まれる外
気中の反応性化学物質を除去するようになっている。The air whose temperature is controlled by the air reheater 18 is blown into the projection exposure apparatus main body 10 by a blower 24. A chemical substance removal filter 26 is arranged near the blower opening of the blower 24 to remove reactive chemical substances in the air. Chemical substance removal filter 2
A dust removal filter 28 is disposed in front of (downwind of) 6 to remove dust in the air. Another chemical substance removing filter 30 is arranged in the environment control chamber 12 so as to remove the reactive chemical substance in the outside air taken into the chamber 12.
【０００５】近年、投影露光装置の更なる精度向上の要
請に応じ、露光装置本体１０内各部でのより高精度の温
度制御が必要になってきている。そこで、現在では、環
境チャンバー１２内に複数の空気吹出し口を設けるよう
になってきている。チャンバー内に複数の空気吹出し口
を設ける等の措置を講ずると、空気流量の増大や空気流
に対する圧力損失の増大を招くため、必然的に空調機容
量を増加させる必要が生じる。In recent years, in response to a request for further improvement in accuracy of the projection exposure apparatus, it is necessary to control the temperature in each section of the exposure apparatus main body 10 with higher accuracy. Therefore, at present, a plurality of air outlets are provided in the environmental chamber 12. If measures such as providing a plurality of air outlets in the chamber are taken, the air flow rate and the pressure loss with respect to the air flow will increase, so that it becomes necessary to increase the air conditioner capacity.
【０００６】[0006]
【発明が解決しようとする課題】環境チャンバー内の空
気流量の増大や、圧力損失への対処には、空調機の大容
量かで対処できるものの、半面、空調機から発生する振
動が問題になりつつある。すなわち、以前は空調機の容
量が小さいため、空調機から発生する振動レベルも小さ
く、あまり問題にならなかったが、空調機の容量が増大
するにつれて、そこから発生する振動も大きくなり、露
光装置の精度に影響を及ぼすレベルにまで達してきてい
る。空調機等から発生する振動の内、床や機械的結合部
分を通じて伝わる振動については、ラバーパッド等の受
動的な防振手段によって比較的容易に対処できる。しか
しながら、環境制御用媒体である空気の圧力波、いわゆ
る音響雑音の形で露光装置本体に伝わる振動について
は、現在までは有効な対処方法は見出されていない。こ
こで、空気の流路中にバッフルを形成して振動を減衰さ
せる方法や、流路を２系等の異なる長さに分けて干渉を
起こさせることで伝搬を防止する方法が考えられる。し
かし、このような方法によると、装置自体が大型化する
と共に、大きな圧力損失を生じてしまう。また、低い周
波数帯域を十分にカバーできないという不都合がある。Although it is possible to deal with the increase in the air flow rate in the environmental chamber and the pressure loss with a large capacity of the air conditioner, the vibration generated from the air conditioner becomes a problem. It's starting. That is, since the capacity of the air conditioner was small in the past, the vibration level generated from the air conditioner was also small, which was not a problem, but as the capacity of the air conditioner increased, the vibration generated from it also increased, and the exposure apparatus Has reached a level that affects the accuracy of. Among the vibrations generated from the air conditioner and the like, the vibrations transmitted through the floor and the mechanical coupling portion can be relatively easily dealt with by the passive vibration damping means such as a rubber pad. However, no effective coping method has been found until now for the vibration transmitted to the exposure apparatus main body in the form of pressure waves of air, which is a medium for environmental control, so-called acoustic noise. Here, a method of forming a baffle in the air flow path to damp the vibration, or a method of preventing the propagation by dividing the flow path into two different lengths such as two systems and causing interference. However, according to such a method, the size of the apparatus itself becomes large and a large pressure loss occurs. Further, there is an inconvenience that the low frequency band cannot be sufficiently covered.
【０００７】[0007]
【発明の目的】本発明は、上記のような状況に鑑みて成
されたものであり、装置自体の外径寸法に与える影響が
小さく、圧力損失が小さく、且つ、広い周波数範囲の音
響雑音に対処できる環境制御方法及び装置を提供するこ
とを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above situation and has a small influence on the outer diameter of the apparatus itself, a small pressure loss, and acoustic noise in a wide frequency range. It is an object of the present invention to provide an environment control method and device that can deal with the problem.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
に、本発明の環境制御方法においては、チャンバー内で
発生する音を検出し、検出した音と逆位相の音を発生さ
せて、音響雑音を能動的に打ち消している。In order to achieve the above object, in the environment control method of the present invention, a sound generated in the chamber is detected and a sound having a phase opposite to that of the detected sound is generated to generate a sound. Actively cancels noise.
【０００９】本発明の環境制御装置は、チャンバー内の
音響雑音を検出し、電気信号に変換する検出手段と；こ
の様に変換された電気信号に基づき、検出された音響雑
音を打ち消すような位相の音響信号を生成する信号処理
手段と；信号処理手段からの音響信号を所定のレベルま
で増幅する増幅手段と；増幅された音響信号をチャンバ
ー内に放出する出力手段とを備えている。この時、検出
手段は露光装置の近傍に配置し、出力手段は空調手段の
空気吹出し口近傍に配置することが望ましい。The environmental control device of the present invention comprises a detecting means for detecting acoustic noise in the chamber and converting it into an electric signal; a phase for canceling the detected acoustic noise based on the electric signal thus converted. Signal processing means for generating the acoustic signal of (1); amplification means for amplifying the acoustic signal from the signal processing means to a predetermined level; and output means for emitting the amplified acoustic signal into the chamber. At this time, it is preferable that the detecting means is arranged near the exposure device and the output means is arranged near the air outlet of the air conditioning means.
【００１０】[0010]
【発明の作用及び効果】本発明は上記のように、空調装
置等から発生する音響雑音に対し、位相反転した音響信
号を発生するため、音響雑音によって露光装置本体に伝
わる振動を減衰できる。また、本発明による能動的な消
音手段は、装置全体の外径寸法に与える影響が小さく、
また、圧力損失も小さい。更に、対応できる周波数範囲
も広いため、投影露光装置の精度向上に大きく貢献でき
る。As described above, the present invention generates an acoustic signal whose phase is inverted with respect to the acoustic noise generated from the air conditioner or the like, so that the vibration transmitted to the exposure apparatus main body due to the acoustic noise can be attenuated. Further, the active muffling means according to the present invention has a small influence on the outer diameter of the entire device,
Also, the pressure loss is small. Furthermore, since the frequency range that can be handled is wide, it can greatly contribute to the improvement of the accuracy of the projection exposure apparatus.
【００１１】[0011]
【発明の実施の態様】以下、本発明の実施の形態を実施
例を参照して説明する。本実施例は、半導体製造用の投
影露光装置用の環境制御技術に本発明を適用したもので
ある。Embodiments of the present invention will be described below with reference to examples. The present embodiment applies the present invention to an environment control technique for a projection exposure apparatus for semiconductor manufacturing.
【００１２】[0012]
【実施例】図１は、本実施例にかかる投影露光装置用の
環境制御装置を示す。図において、投影露光装置本体１
１０は、温度制御された空気（１１４）が循環する環境
制御チャンバー１１２内に収容されている。環境制御チ
ャンバー１１２内には、投影露光装置本体１１０内を通
過した空気を冷却する空気冷却器１１６と、この冷却さ
れた空気を適正温度まで加熱する空気再加熱機１１８と
が装備されている。投影露光装置本体１１０の側部に
は、投影露光装置本体１１０近傍の空気の温度を検出す
る温度センサ１２０が配置されており、この温度センサ
１２０によって検出された温度に基づいて温度コントロ
ーラ１２２が空気再加熱機１１８を制御するようになっ
ている。FIG. 1 shows an environment control device for a projection exposure apparatus according to this embodiment. In the figure, the projection exposure apparatus main body 1
10 is housed in an environmental control chamber 112 in which temperature controlled air (114) circulates. The environment control chamber 112 is equipped with an air cooler 116 that cools the air that has passed through the projection exposure apparatus main body 110, and an air reheater 118 that heats the cooled air to an appropriate temperature. A temperature sensor 120 that detects the temperature of the air in the vicinity of the projection exposure apparatus main body 110 is arranged on the side of the projection exposure apparatus main body 110. Based on the temperature detected by the temperature sensor 120, the temperature controller 122 causes The reheater 118 is controlled.
【００１３】空気再加熱機１１８によって温度制御され
た空気は、送風機１２４によって投影露光装置本体１１
０側に送り込まれる。送風機１２４の送風口近傍には、
化学物質除去フィルタ１２６が配置され、空気中の反応
性化学物質を除去するようになっている。化学物質除去
フィルタ１２６の前方（風下）には、塵埃除去フィルタ
１２８が配置され、空気中の塵埃を除去するようになっ
ている。環境制御チャンバー１１２内（図の左上部）に
は、もう１つ化学物質除去フィルタ１３０が配置され、
チャンバー１１２内に取り込まれる外気中の反応性化学
物質を除去するようになっている。The air whose temperature is controlled by the air reheater 118 is supplied to the projection exposure apparatus main body 11 by the blower 124.
It is sent to the 0 side. In the vicinity of the blower opening of the blower 124,
A chemical substance removal filter 126 is arranged to remove reactive chemical substances in the air. A dust removing filter 128 is arranged in front of (downwind of) the chemical substance removing filter 126 to remove dust in the air. In the environmental control chamber 112 (upper left part of the figure), another chemical substance removal filter 130 is arranged,
The reactive chemical substance in the outside air taken into the chamber 112 is removed.
【００１４】投影露光装置１１０においては、照明系１
３２によってレチクルステージ１３４上に載置されたレ
チクル１３６に露光光が照射されるようになっている。
レチクル１３６上に形成されたパターン（図示せず）
は、投影光学系１３８によってウエハ１４０上に投影さ
れる。ウエハ１４０は、ウエハステージ１４２上に載置
されており、ウエハステージ１４２の端部には移動鏡１
４４が設置されている。移動鏡１４４は、レーザ干渉計
１４６から射出されるレーザ光を反射し、その反射光に
基づいてレーザ干渉計１４６はウエハステージ１４２の
位置を計測するようになっている。In the projection exposure apparatus 110, the illumination system 1
The exposure light is applied to the reticle 136 placed on the reticle stage 134 by 32.
Pattern formed on reticle 136 (not shown)
Are projected onto the wafer 140 by the projection optical system 138. The wafer 140 is placed on the wafer stage 142, and the movable mirror 1 is placed at the end of the wafer stage 142.
44 are installed. The movable mirror 144 reflects the laser light emitted from the laser interferometer 146, and the laser interferometer 146 measures the position of the wafer stage 142 based on the reflected light.
【００１５】環境チャンバー１１２内の上部には、当該
チャンバー１１２内で発生する音響雑音を検出するマイ
クロフォン１４８が設置されている。マイクロフォン１
４８は、検出した音声信号を電気信号に変換して、信号
処理回路１５０に供給するようになっている。信号処理
回路１５０は、マイクロフォン１４８から供給された電
気信号に基づき、検出された音響雑音を打ち消すような
位相（逆位相）の音響信号に対応する電気信号を生成
し、これを増幅器１５２に供給する。増幅器１５２は、
信号処理回路１５０からの信号を所定のレベルまで増幅
して、スピーカ１５４に供給する。増幅器１５２による
信号の増幅率は、スピーカ１５４が作動するに十分な値
とする。スピーカ１５４は、増幅器１５２から供給され
た電気信号を音響信号に変換して、環境チャンバー１１
２内に放出する。A microphone 148 for detecting acoustic noise generated in the chamber 112 is installed above the environment chamber 112. Microphone 1
48 converts the detected audio signal into an electric signal and supplies it to the signal processing circuit 150. The signal processing circuit 150 generates an electric signal corresponding to an acoustic signal having a phase (anti-phase) that cancels the detected acoustic noise based on the electric signal supplied from the microphone 148, and supplies this to the amplifier 152. . The amplifier 152 is
The signal from the signal processing circuit 150 is amplified to a predetermined level and supplied to the speaker 154. The amplification factor of the signal by the amplifier 152 is set to a value sufficient for the speaker 154 to operate. The speaker 154 converts the electric signal supplied from the amplifier 152 into an acoustic signal, and the environmental chamber 11
Release into 2.
【００１６】以上説明したように、本実施例において
は、マイクロフォン１４８で検出された音響雑音と逆位
相の音響信号をスピーカ１５４から環境チャンバー１１
２内に流しているため、音響雑音が打ち消され、音響雑
音によって生じる装置振動が抑制される。なお、マイク
ロフォン１４８とスピーカ１５４は、送風機１２４等の
空調装置との位置関係より、最も良好に音響雑音を検出
でき、また消去できる位置に配置する。また、必要に応
じて、複数のマイクロフォン及びスピーカを使用しても
良い。例えば、振動や温度等の環境の影響を受けやすい
干渉計の光路付近にマイクロフォン及びスピーカを設置
し、独立制御によって当該光路近傍における環境（音響
雑音による影響）を制御するようにしても良い。更に、
移動鏡１４４の振動はウエハステージ１４２の位置計測
に大きく影響するため、移動鏡１４４付近の音響（振
動）環境を独立に制御するようにしても良い。As described above, in this embodiment, an acoustic signal having a phase opposite to the acoustic noise detected by the microphone 148 is output from the speaker 154 to the environmental chamber 11.
Since it is flowing inside 2, the acoustic noise is canceled and the device vibration caused by the acoustic noise is suppressed. It should be noted that the microphone 148 and the speaker 154 are arranged at positions where the acoustic noise can be detected and erased best in view of the positional relationship with the air conditioner such as the blower 124. Also, multiple microphones and speakers may be used if desired. For example, a microphone and a speaker may be installed near the optical path of an interferometer that is easily affected by the environment such as vibration and temperature, and the environment (influence of acoustic noise) near the optical path may be controlled by independent control. Furthermore,
Since the vibration of the movable mirror 144 greatly affects the position measurement of the wafer stage 142, the acoustic (vibration) environment near the movable mirror 144 may be controlled independently.
【００１７】以上、本発明を実施例に基づいて説明した
が、本発明はこの実施例に限定されるものではなく、特
許請求の範囲に示された本発明の技術的思想としての要
旨を逸脱しない範囲で変更が可能である。The present invention has been described above based on the embodiment, but the present invention is not limited to this embodiment, and deviates from the gist as the technical idea of the present invention shown in the claims. It is possible to change within the range not to.
【図面の簡単な説明】[Brief description of drawings]
【図１】図１は、本発明の実施例にかかる環境制御装置
を示す概念図（正面図）である。FIG. 1 is a conceptual diagram (front view) showing an environment control device according to an embodiment of the present invention.
【図２】図２は、従来の環境制御装置を示す概念図（正
面図）である。FIG. 2 is a conceptual diagram (front view) showing a conventional environment control device.
【符号の説明】 １１２・・・環境チャンバー １４８・・・マイクロフォン １５０・・・信号処理回路 １５２・・・増幅器 １５４・・・スピーカ[Explanation of reference numerals] 112 ... Environmental chamber 148 ... Microphone 150 ... Signal processing circuit 152 ... Amplifier 154 ... Speaker
Claims (3)
作環境を制御する方法において、 前記チャンバー内の音響雑音を検出し；前記検出された
音響雑音と逆位相の音響信号を前記チャンバー内に発生
させることを特徴とする環境制御方法。1. A method for controlling an operating environment of an exposure apparatus housed in a chamber, wherein acoustic noise in the chamber is detected; and an acoustic signal having a phase opposite to that of the detected acoustic noise is generated in the chamber. An environmental control method characterized by:
作環境を制御する装置において、 前記チャンバー内の音響雑音を検出し、電気信号に変換
する検出手段と；前記電気信号に基づき、前記検出され
た音響雑音を打ち消すような位相の音響信号を生成する
信号処理手段と；前記信号処理手段からの前記音響信号
を所定のレベルまで増幅する増幅手段と；前記増幅され
た音響信号を前記チャンバー内に放出する出力手段とを
備えたことを特徴とする環境制御装置。2. An apparatus for controlling an operating environment of an exposure apparatus housed in a chamber, comprising: detecting means for detecting acoustic noise in the chamber and converting the acoustic noise into an electric signal; Signal processing means for generating an acoustic signal having a phase that cancels out acoustic noise; amplification means for amplifying the acoustic signal from the signal processing means to a predetermined level; and the amplified acoustic signal in the chamber. An environment control device, comprising: an output unit for discharging.
を更に備えるとともに、 前記検出手段は前記露光装置の近傍に配置され、 前記出力手段は前記空調手段の空気吹出し口近傍に配置
されていることを特徴とする請求項２に記載の環境制御
装置。3. An air-conditioning unit for supplying temperature-controlled air is further provided, the detecting unit is arranged in the vicinity of the exposure device, and the output unit is arranged in the vicinity of an air outlet of the air-conditioning unit. The environment control device according to claim 2, wherein
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9927896A JP3837773B2 (en) | 1996-03-28 | 1996-03-28 | Environmental control method and apparatus for exposure apparatus |
| US08/824,467 US6002987A (en) | 1996-03-26 | 1997-03-26 | Methods to control the environment and exposure apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9927896A JP3837773B2 (en) | 1996-03-28 | 1996-03-28 | Environmental control method and apparatus for exposure apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH09265137A true JPH09265137A (en) | 1997-10-07 |
| JP3837773B2 JP3837773B2 (en) | 2006-10-25 |
Family
ID=14243207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9927896A Expired - Fee Related JP3837773B2 (en) | 1996-03-26 | 1996-03-28 | Environmental control method and apparatus for exposure apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3837773B2 (en) |
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| US6834548B1 (en) | 2003-06-18 | 2004-12-28 | International Business Machines Corporation | Method and apparatus for reduction of high-frequency vibrations in thick pellicles |
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| US6450288B1 (en) | 1998-01-28 | 2002-09-17 | Nikon Corporation | Air-conditioning apparatus, partition and exposure apparatus |
| US6834548B1 (en) | 2003-06-18 | 2004-12-28 | International Business Machines Corporation | Method and apparatus for reduction of high-frequency vibrations in thick pellicles |
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| JP2008270735A (en) * | 2007-02-14 | 2008-11-06 | Integrated Dynamics Engineering Gmbh | Method for adapting vibration isolation system |
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| CN106766085A (en) * | 2016-12-08 | 2017-05-31 | 顾青林 | A kind of air-conditioning and its noise cancellation method |
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| CN113296366A (en) * | 2020-02-05 | 2021-08-24 | 佳能株式会社 | Vibration control device, exposure device, and article manufacturing method |
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