JPH09264823A - Sample holding substrate and method therefor - Google Patents

Sample holding substrate and method therefor

Info

Publication number
JPH09264823A
JPH09264823A JP8075627A JP7562796A JPH09264823A JP H09264823 A JPH09264823 A JP H09264823A JP 8075627 A JP8075627 A JP 8075627A JP 7562796 A JP7562796 A JP 7562796A JP H09264823 A JPH09264823 A JP H09264823A
Authority
JP
Japan
Prior art keywords
sample
holding substrate
substrate
sample holding
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8075627A
Other languages
Japanese (ja)
Inventor
Isao Suzuki
功 鈴木
Tatsuya Hatanaka
達也 畠中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP8075627A priority Critical patent/JPH09264823A/en
Publication of JPH09264823A publication Critical patent/JPH09264823A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To obtain a sample holding substrate suitable for observing a munite sample and capable of obtaining a sharp image by pressing a sample to a metal thin film to fix the same and holding the sample wirhout embedding the same in an adhesive. SOLUTION: As a material of a substrate 6, any one capable of holding the mechanical strength of a sample holding substrate 2, for example, a conductive material such as metal, an insulating material such as glass or a flexible material like a resign can be used. A metal thin film 12 is formed on the surface to which a minute sample 4 is bonded of the sample holding substrate 2. The metal thin film 12 forms a cavity having a shape almost the same to that of the sample by pressing the sample 4 and the sample 4 is held to this cavity. As a material of the metal thin film 2, indium, gold, silver, lead, tin, aluminum, copper, platinum, palladium or an alloy material of them can be used. An intermediate layer 10 can be formed by using an adhesive, for example, an acrylic, chloroprene rubber type or polyvinyl acetate type adhesive.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、各種微量粉末など
の試料を観察する際に試料を保持するための試料保持基
板、およびこの試料保持基板の試料保持方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sample holding substrate for holding a sample when observing a sample such as various kinds of minute powders, and a sample holding method for the sample holding substrate.

【0002】[0002]

【従来の技術】図2は、電子顕微鏡による微小粉末の観
察方法を示す図である。図示するように、電子顕微鏡等
で微小粉末を観察する際には、試料保持基板2上に試料
4を保持した後、図中矢印で示すような流れで電子ビー
ムを試料およびその近傍で走査しながら照射し、例えば
その結果励起される二次電子を検出し、その変化によっ
て粉末試料の形状を得ている。
2. Description of the Related Art FIG. 2 is a diagram showing a method of observing fine powder by an electron microscope. As shown in the figure, when observing the fine powder with an electron microscope or the like, after the sample 4 is held on the sample holding substrate 2, the sample and its vicinity are scanned with an electron beam in the flow shown by the arrow in the figure. While irradiating, secondary electrons excited as a result are detected, and the shape of the powder sample is obtained by the change.

【0003】電子顕微鏡で試料の観察を行う際に、電子
ビームを走査している間に試料が移動すると、得られる
画像が不連続で歪んだものとなり、鮮明な画像を得られ
なくなる。そのため、粉末試料などのように移動しやす
い微小試料を観察する場合、予め、試料を試料保持基板
に保持させる必要がある。
When observing a sample with an electron microscope, if the sample moves while scanning the electron beam, the obtained image becomes discontinuous and distorted, and a clear image cannot be obtained. Therefore, when observing a small sample that is easy to move such as a powder sample, it is necessary to hold the sample on the sample holding substrate in advance.

【0004】図3は従来の試料保持方法を示す図であ
る。従来、試料保持基板2に試料を保持させるために、
銅泊からなる基体6、およびこの基体上にアクリル系な
どの接着剤中に銅微粒子を分散した接着剤層8を塗布し
た粘着テープを用い、この接着剤層8上に粉末試料4を
ばらまき、さらにこの粉末試料4を押さえ付けることで
接着層に試料を付着させていた。しかしながら、接着層
表面に粉末試料を直接密着させ、より微小な粉末試料の
観察を行うと、画像が歪み、鮮明な画像が得られなくな
るという問題が生じた。
FIG. 3 is a diagram showing a conventional sample holding method. Conventionally, in order to hold a sample on the sample holding substrate 2,
Using a base 6 made of copper foil, and an adhesive tape obtained by applying an adhesive layer 8 in which fine copper particles are dispersed in an adhesive such as an acrylic adhesive on the base, the powder sample 4 is scattered on the adhesive layer 8. Further, the powder sample 4 was pressed to adhere the sample to the adhesive layer. However, when the powder sample is directly adhered to the surface of the adhesive layer and a finer powder sample is observed, there arises a problem that the image is distorted and a clear image cannot be obtained.

【0005】[0005]

【発明が解決しようとする課題】上述したように、従来
の試料保持基板を使用し、より微小な試料を高倍率で観
察しようとすると鮮明な画像が得られないという問題が
生じた。本発明は、このような問題に鑑みなされたもの
であり、電子顕微鏡を用いた微小試料の観察に適した、
鮮明な画像を得ることのできる試料保持基板を提供する
ことを目的とする。
As described above, when a conventional sample holding substrate is used and an attempt is made to observe a finer sample at a high magnification, there arises a problem that a clear image cannot be obtained. The present invention has been made in view of such a problem, and is suitable for observing a micro sample using an electron microscope,
An object of the present invention is to provide a sample holding substrate capable of obtaining a clear image.

【0006】[0006]

【課題を解決するための手段】本願第一の発明は、基体
と、この基体表面に形成された厚さ5nm以上、表面粗
さ10μm(Rmax )の金属薄膜とを有する試料保持基
板である。本願第二の発明は、前記金属薄膜は、モース
硬度4以下、ブリネル硬度30以下、もしくはビッカー
ス硬度40以下の金属材料からなる前記第一の発明に記
載の試料保持基板である。
The first invention of the present application is a sample holding substrate having a substrate and a metal thin film having a thickness of 5 nm or more and a surface roughness of 10 μm (Rmax) formed on the substrate surface. A second invention of the present application is the sample holding substrate according to the first invention, wherein the metal thin film is made of a metal material having a Mohs hardness of 4 or less, a Brinell hardness of 30 or less, or a Vickers hardness of 40 or less.

【0007】本願第三の発明は、前記金属薄膜は、粘度
2000(poise/20℃)以上の接着剤層を介し
て基体表面に形成される前記本願第一の発明に記載の試
料保持基板である。
A third invention of the present application is the sample holding substrate according to the first invention of the present application, wherein the metal thin film is formed on the surface of the substrate through an adhesive layer having a viscosity of 2000 (poise / 20 ° C.) or more. is there.

【0008】本願第四の発明は、基体と、この基体表面
に形成された厚さ10nm以上、表面粗さ10μm(R
max )、モース硬度3以下の金属薄膜とを有する試料保
持基板表面に試料を散布する工程と、前記試料保持基板
表面に分散媒体を滴下する工程と、前記試料が分散する
ように前記分散媒体を撹拌する工程と、前記分散媒体を
乾燥させた後、試料を試料保持基板に押圧する工程とを
有する試料保持基板の試料保持方法である。
A fourth invention of the present application is a substrate, a thickness of 10 nm or more formed on the surface of the substrate, and a surface roughness of 10 μm (R
max), a step of spraying a sample on the surface of a sample holding substrate having a metal thin film having a Mohs hardness of 3 or less, a step of dropping a dispersion medium on the surface of the sample holding substrate, and a step of applying the dispersion medium so that the sample is dispersed. It is a sample holding method for a sample holding substrate, which comprises a step of stirring and a step of pressing the sample against the sample holding substrate after drying the dispersion medium.

【0009】[0009]

【発明の実施の形態】本発明者は、従来の試料保持基板
を用いて微小試料の形状を電子顕微鏡を用い、高倍率で
観察した際に、得られる画像が歪むことに気付いた。本
発明者はこの原因解明のために鋭意研究を続け、試料保
持基板表面に形成された接着層に問題があるという知見
を得、本発明に至った。
BEST MODE FOR CARRYING OUT THE INVENTION The present inventor has noticed that an image obtained is distorted when the shape of a micro sample is observed at a high magnification using an electron microscope using a conventional sample holding substrate. The present inventor has conducted extensive research to elucidate the cause, and has found that there is a problem in the adhesive layer formed on the surface of the sample holding substrate, resulting in the present invention.

【0010】従来の試料保持基板は表面に接着層が形成
されており、この接着層に残存する溶媒成分が電子ビー
ムの照射により揮発する。その結果電子ビーム照射部で
は接着層が収縮するため、試料が、電子ビームの被照射
部側に微妙に移動する。そのため、電子ビームの走査方
向と垂直成分の画像が滑らかに繋がらなくなり、鮮明な
画像が得られなくなると推測した。
An adhesive layer is formed on the surface of the conventional sample holding substrate, and the solvent component remaining on the adhesive layer is volatilized by irradiation with an electron beam. As a result, the adhesive layer contracts in the electron beam irradiation portion, and the sample slightly moves toward the electron beam irradiation portion. Therefore, it is assumed that the image of the vertical component and the scanning direction of the electron beam are not smoothly connected, and a clear image cannot be obtained.

【0011】本発明は、揮発性の低い材料を試料保持基
板表面に形成することで、収縮のない表面層を試料保持
基板に形成したことを骨子とする。図1は、本発明の試
料保持基体に試料を保持させた概略断面図である。
The gist of the present invention is to form a surface layer without shrinkage on the sample holding substrate by forming a material having low volatility on the surface of the sample holding substrate. FIG. 1 is a schematic sectional view of a sample holding substrate of the present invention holding a sample.

【0012】以下、図面を用いて本発明を説明する。本
発明に係る基体6は、試料保持基板2の機械的な強度を
保てるものであれば特に制限されず用いることができ、
金属などの導電性の材料でも、ガラスなどの絶縁性の材
料でも、あるいは樹脂のように可撓性を有する材料を用
いることもできる。
The present invention will be described below with reference to the drawings. The substrate 6 according to the present invention can be used without particular limitation as long as it can maintain the mechanical strength of the sample holding substrate 2,
A conductive material such as metal, an insulating material such as glass, or a flexible material such as resin can be used.

【0013】例えば銅、アルミニウムあるいはポリイミ
ドなどからなり、厚さ1μm〜1mm程度の板状あるい
はフィルム状のものを使用することができる。また、後
述する金属薄膜表面を平滑にする必要があることから、
基体6の試料を保持する側の表面についても平滑なもの
を使用することが好ましく、20μm(Rmax )以下の
平滑さを有する基体を用いることが望ましい。
For example, a plate-like or film-like material having a thickness of about 1 μm to 1 mm and made of copper, aluminum or polyimide can be used. Further, since it is necessary to smooth the surface of the metal thin film described later,
It is preferable to use a smooth surface for the sample holding side of the substrate 6, and it is desirable to use a substrate having a smoothness of 20 μm (Rmax) or less.

【0014】また、後述する金属薄膜12が薄い場合、
あるいは中間層10を介さずに金属薄膜を成膜した場合
には、金属薄膜12に十分な凹みを形成するために、硬
度がモース硬度3以下、ブリネル硬度20以下、もしく
はビッカース硬度30以下の基体材料を使用することが
好ましい。
If the metal thin film 12 described later is thin,
Alternatively, when a metal thin film is formed without interposing the intermediate layer 10, a substrate having a hardness of 3 or less on the Mohs hardness, 20 or less on the Brinell hardness, or 30 or less on the Vickers hardness in order to form a sufficient depression in the metal thin film 12. Preference is given to using materials.

【0015】本発明に係る金属薄膜12は前記試料保持
基体2表面の使用が付着される側に形成され、従来の接
着層に代わり、試料を保持するためのものである。この
金属薄膜12は、微小試料4を押圧することで試料形状
と略同形の凹みを形成し、この凹みに試料を保持する。
金属薄膜12の硬度が高い、あるいは基体6との間隔が
試料粒径に対し極端に狭いと、試料を保持するに十分な
大きさの凹みが形成されなかったり、試料が破壊される
ため、その厚さを5nm以上にする必要がある。さらに
その硬度がモース硬度3以下、ブリネル硬度30以下、
もしくはビッカース硬度40以下の基体材料を使用する
ことが好ましい。
The metal thin film 12 according to the present invention is formed on the side of the surface of the sample holding substrate 2 to which the use is attached, and is for holding the sample instead of the conventional adhesive layer. The metal thin film 12 forms a recess having substantially the same shape as the sample shape by pressing the minute sample 4, and holds the sample in this recess.
If the hardness of the metal thin film 12 is high, or if the distance between the metal thin film 12 and the substrate 6 is extremely narrow with respect to the sample particle size, a dent having a size large enough to hold the sample is not formed or the sample is destroyed. The thickness needs to be 5 nm or more. Furthermore, the hardness is 3 or less Mohs hardness, 30 or less Brinell hardness,
Alternatively, it is preferable to use a base material having a Vickers hardness of 40 or less.

【0016】さらに、金属薄膜12表面は、表面粗さ1
0μm(Rmax )以下にする必要がある。電子顕微鏡な
どで試料を観察する場合、電子線をビーム状に絞った状
態で試料に照射するが、試料保持基板2の表面粗さが1
0μmを越えると、電子ビームの焦点からずれた位置に
試料が配置される恐れがあり、鮮明な画像が得られなく
なるためである。
Further, the surface of the metal thin film 12 has a surface roughness of 1.
It should be 0 μm (Rmax) or less. When observing a sample with an electron microscope or the like, the sample is irradiated with an electron beam focused into a beam, but the surface roughness of the sample holding substrate 2 is 1
This is because if the thickness exceeds 0 μm, the sample may be placed at a position deviated from the focus of the electron beam, and a clear image cannot be obtained.

【0017】また、薄膜材料として金属を用いる理由
は、試料保持基板2に導電性が必要なためである。試料
保持基板として絶縁物を使用すると、電子ビームを試料
および試料保持基板に照射した際に試料表面が帯電する
(チャージアップ現象)。試料保持基板表面2が帯電さ
れると、その帯電電荷と電子ビームとが反発し、電子ビ
ームを所望の位置に照射することができなくなる。本発
明では試料保持基板2表面を導電性材料で形成すること
で、チャージアップ現象を抑えることが可能となる。
The reason for using metal as the thin film material is that the sample holding substrate 2 needs to be electrically conductive. When an insulator is used as the sample holding substrate, the sample surface is charged when the sample and the sample holding substrate are irradiated with an electron beam (charge-up phenomenon). When the sample holding substrate surface 2 is charged, the charged electric charges and the electron beam repel each other, and the electron beam cannot be irradiated to a desired position. In the present invention, the charge-up phenomenon can be suppressed by forming the surface of the sample holding substrate 2 with a conductive material.

【0018】上述するような金属薄膜12材料として
は、インジウム、金、銀、鉛、錫、アルミニウム、銅、
白金、パラジウムまたはこれらの合金材料を使用でき、
例えばスパッタ法、蒸着法など既知の薄膜技術で成膜す
ればよい。
As the material of the metal thin film 12 as described above, indium, gold, silver, lead, tin, aluminum, copper,
Platinum, palladium or alloy materials of these can be used,
For example, the film may be formed by a known thin film technique such as a sputtering method or a vapor deposition method.

【0019】前記金属薄膜12は、直接前記基体表面に
形成することもできるが、10nm以上、2000(p
oise/20℃)以上の粘度を有する中間層10を介
して形成することが望ましい。
The metal thin film 12 may be directly formed on the surface of the substrate, but is 10 nm or more, 2000 (p
It is desirable to form the intermediate layer 10 having a viscosity of (oise / 20 ° C.) or higher.

【0020】粉体試料4として硬度が低い材料を用い観
察する場合、金属薄膜12の硬度で試料が破壊されてし
まう恐れがある。このような場合、金属薄膜の厚さを薄
く、例えば厚さ100nm以下、好ましくは50nm以
下の金属薄膜を、厚さ10nm以上、好ましくは100
nm以上の中間層10を介して形成することでより凹み
を生じやすくすることが可能となる。この場合において
も金属薄膜12の厚みを5nm以上とする必要がある。
これは金属薄膜12の厚さが5nm未満であると、金属
薄膜12の粒界から接着層中に含有される溶剤成分が気
化し、収縮するためである。
When the powder sample 4 is made of a material having a low hardness, the sample may be destroyed by the hardness of the metal thin film 12. In such a case, the metal thin film is thin, for example, a metal thin film having a thickness of 100 nm or less, preferably 50 nm or less, and a thickness of 10 nm or more, preferably 100 nm.
By forming the intermediate layer 10 having a thickness of not less than 10 nm, it becomes possible to make the depression more likely to occur. Also in this case, the thickness of the metal thin film 12 needs to be 5 nm or more.
This is because when the thickness of the metal thin film 12 is less than 5 nm, the solvent component contained in the adhesive layer vaporizes from the grain boundaries of the metal thin film 12 and shrinks.

【0021】この中間層10は、例えばアクリル系、ク
ロロプレンゴム系、ポリウレタン系あるいはポリ酢酸ビ
ニル系などの接着剤を用いることができる。最も簡単に
このような試料保持基板を作成するには、市販の、電子
写真顕微鏡用の両面テープを用い、両面テープのフィル
ム自体を基体、接着層を中間層として利用し、中間層の
表面に金属薄膜を形成すればよい。
For the intermediate layer 10, for example, an acrylic type adhesive, a chloroprene rubber type adhesive, a polyurethane type adhesive or a polyvinyl acetate type adhesive can be used. The simplest way to create such a sample-holding substrate is to use a commercially available double-sided tape for an electrophotographic microscope, use the double-sided tape film itself as the substrate, and use the adhesive layer as the intermediate layer. A metal thin film may be formed.

【0022】本発明の、試料保持基板は以下のような利
点をさらに有する。接着層に直接試料を付着させる従来
の試料保持基板は、接着層の厚さを制御することが困難
なため、均一な厚さの接着層を形成するためにはその膜
厚が数十nm必要となる。このような従来の試料測定基
板を用いて試料を観測する際に、試料が微小化されてい
き、粒径10nm以下の試料を測定しようとすると、接
着層中に試料が埋没し、試料を測定できなくなる恐れが
ある。
The sample holding substrate of the present invention further has the following advantages. The thickness of the conventional sample holding substrate that directly attaches the sample to the adhesive layer is several tens of nm in order to form an adhesive layer with a uniform thickness because it is difficult to control the thickness of the adhesive layer. Becomes When observing a sample using such a conventional sample measurement substrate, the sample is miniaturized, and if an attempt is made to measure a sample having a particle size of 10 nm or less, the sample is buried in the adhesive layer and the sample is measured. You may not be able to.

【0023】これに対し、本発明の試料保持基板は固体
である金属薄膜上に試料を押圧させることで試料を固定
するため、試料を接着剤の中に埋没させることなく保持
することが可能となる。
On the other hand, since the sample holding substrate of the present invention fixes the sample by pressing the sample on the solid metal thin film, the sample can be held without being buried in the adhesive. Become.

【0024】さらに、試料を水やアルコールなどの液体
状の分散媒体とともに試料保持基板表面に配置し、液体
を撹拌させることで、粉体試料を分散した状態で試料保
持基板表面に配置することが可能となる。従来のように
接着層に直接試料を付着させる場合、水やアルコールな
どに触れることで、接着層の粘着力が低下し、試料の保
持力を喪失する恐れがある。これに対し本発明の試料保
持基板は、金属薄膜が表面に形成され、この金属薄膜に
形成される凹みによって試料を保持するため、水やアル
コールなどの液体に対しても試料の保持能力が影響を受
けることがない。
Further, by placing the sample on the surface of the sample holding substrate together with a liquid dispersion medium such as water or alcohol and stirring the liquid, the powder sample can be placed on the surface of the sample holding substrate in a dispersed state. It will be possible. When the sample is directly attached to the adhesive layer as in the conventional case, the adhesive force of the adhesive layer may be reduced and the sample holding force may be lost by contact with water or alcohol. On the other hand, in the sample holding substrate of the present invention, the metal thin film is formed on the surface, and the sample is held by the recess formed in the metal thin film. Therefore, the sample holding ability is affected by the liquid such as water or alcohol. Never receive.

【0025】試料保持基板へ試料を保持させるために
は、分散した状態で試料を試料保持基板表面に配置した
後、試料が崩れない程度の力で試料を試料保持基板へ押
圧する。通常、試料表面に薬包紙や、口紙のように粘着
性の低い中間媒体を試料上に載せ、中間媒体を指で軽く
押さえる。試料の形状、接着層の有無、金属薄膜の材質
および厚さによって多少異なるが、通常30〜300g
/cm2 程度の力で押圧する。このようにすることで、
金属薄膜が凹むとともに金属薄膜に試料が食い込み、試
料が試料保持基板上に保持される。
In order to hold the sample on the sample holding substrate, the sample is placed on the surface of the sample holding substrate in a dispersed state, and then the sample is pressed against the sample holding substrate with a force not to collapse the sample. Usually, an intermediate medium having low adhesiveness such as a medicine packing paper or a mouth paper is placed on the sample, and the intermediate medium is lightly pressed with a finger. It varies depending on the shape of the sample, the presence or absence of the adhesive layer, the material and the thickness of the metal thin film, but it is usually 30 to 300 g.
Press with a force of about / cm 2 . By doing this,
When the metal thin film is recessed, the sample bites into the metal thin film, and the sample is held on the sample holding substrate.

【0026】[0026]

【実施例】【Example】

実施例1 試料保持基板の作成 基体及び接着層として、厚さ200μm、幅0.5c
m、長さ1.0cmからの導電性テープ(日新EM社
製、SEM用導電性カーボン両面テープ)を用い、接着
層の片側に、金の薄膜を膜厚1μmとなるようにスパッ
タコーティングし、表面粗さ5μm(Rmax )の試料保
持基板を作成した。
Example 1 Preparation of Sample Holding Substrate As a substrate and an adhesive layer, thickness 200 μm, width 0.5 c
m, 1.0 cm long conductive tape (Nisshin EM, conductive carbon double-sided tape for SEM) was used to sputter coat one side of the adhesive layer with a gold thin film to a thickness of 1 μm. A sample holding substrate having a surface roughness of 5 μm (Rmax) was prepared.

【0027】試料の保持 粉末試料として、粒径1μm以下の酸化鉄微小粉末試料
を使用し、この粉末試料0.2gを前記試料保持基板表
面に撒き、続いて試料保持基板上の試料上にエチルアル
コール1gを滴下し、撹拌した。
Holding of Sample As a powder sample, a fine iron oxide powder sample having a particle size of 1 μm or less was used, 0.2 g of this powder sample was scattered on the surface of the sample holding substrate, and then ethyl was placed on the sample on the sample holding substrate. 1 g of alcohol was added dropwise and stirred.

【0028】エチルアルコールが蒸発するまで前記試料
保持基板を放置し、乾燥した後に薬包紙を試料保持基板
上に載置し約100g/cm程度の力で押圧した。この
試料保持基板を45゜傾けても試料は移動せず、試料が
固定・保持されていることが確認できた。
The sample holding substrate was left to stand until the ethyl alcohol was evaporated, dried, and then the medicine packing paper was placed on the sample holding substrate and pressed with a force of about 100 g / cm. It was confirmed that the sample did not move even when the sample holding substrate was tilted at 45 °, and the sample was fixed and held.

【0029】電子顕微鏡での試料の観察 試料を固定・保持した試料保持基板を走査型電子顕微鏡
用試料台に装着して、電子顕微鏡装置(FESEM、日
立社製S−900)内にいれ、加速電圧5kVで5万倍
にしてモニターで観察した後、画像を出力した。
Observation of Sample with Electron Microscope A sample holding substrate on which a sample is fixed and held is mounted on a sample stand for a scanning electron microscope, placed in an electron microscope apparatus (FESEM, Hitachi S-900), and accelerated. An image was output after observing on a monitor at a voltage of 5 kV and 50,000 times.

【0030】実施例2 基体として、厚さ15μm、幅0.5cm、長さ1.0
cmのアルミ箔を用い、このアルミ箔上に中間層として
接着剤(ソニーボンドT−4000:ソニーケミカル社
製)を膜厚10μmとなるように塗布し、さらに中間層
上に膜厚1μmの白金層をスパッタにより成膜した。後
は実施例1と同様にして試料の保持、観察を行った。
Example 2 A substrate having a thickness of 15 μm, a width of 0.5 cm and a length of 1.0
cm aluminum foil, an adhesive (Sony Bond T-4000: manufactured by Sony Chemical Co., Ltd.) was applied as an intermediate layer on the aluminum foil so as to have a film thickness of 10 μm, and platinum having a film thickness of 1 μm was further applied on the intermediate layer. The layer was deposited by sputtering. After that, the sample was held and observed in the same manner as in Example 1.

【0031】比較例 次に、実施例1で用いた導電性テープの接着層に直接試
料を振り撒き、粘着させることで試料保持基板に固定・
保持した。
Comparative Example Next, the sample was directly sprinkled on the adhesive layer of the conductive tape used in Example 1 and adhered to fix it to the sample holding substrate.
Held.

【0032】その後電子顕微鏡での試料の観察を本発明
の試料保持基板を用いたときと同様にして行った。本発
明の試料保持基板を使用した観察では(実施例1及び
2)、鮮明な粉体の画像を得ることができた。
Thereafter, the sample was observed with an electron microscope in the same manner as when the sample holding substrate of the present invention was used. In the observation using the sample holding substrate of the present invention (Examples 1 and 2), a clear image of powder could be obtained.

【0033】比較例の試料保持基板を使用した観察で
は、試料が重なり合い焦点のずれた部分が多く、試料の
分散した部位を探すのに手間取った。また、比較例の試
料の分散している部位について画像出力したが、画像の
下部では不連続な形状になってしまった。
In the observation using the sample holding substrate of the comparative example, there were many parts where the samples were overlapped with each other and the focus was deviated, and it took a lot of time to find the part where the samples were dispersed. Also, an image was output for the dispersed portion of the sample of the comparative example, but the shape was discontinuous at the bottom of the image.

【0034】このことから比較例においては電子顕微鏡
の走査中に試料保持基板上の試料が移動しているのに対
して、本実施例ではその移動が確認されず、試料の固定
・保持が確実に行われていることが確認できた。
From this fact, in the comparative example, the sample on the sample holding substrate moved during the scanning of the electron microscope, but in the present example, the movement was not confirmed, and the sample was securely fixed and held. I was able to confirm that it is being done in.

【0035】[0035]

【発明の効果】本発明によれば、電子顕微鏡を用いた微
小試料の観察に適した、鮮明な画像を得ることのできる
試料保持基板を提供することが可能となる。
According to the present invention, it is possible to provide a sample holding substrate suitable for observing a minute sample using an electron microscope and capable of obtaining a clear image.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の試料保持基板を用いたときの試料保
持の様子を示すための図である。
FIG. 1 is a diagram showing how a sample is held when a sample holding substrate of the present invention is used.

【図2】 電子顕微鏡の走査方法を示すための図であ
る。
FIG. 2 is a diagram showing a scanning method of an electron microscope.

【図3】 従来の試料保持基板を用いたときの試料保持
の様子を示すための図である。
FIG. 3 is a diagram showing how a sample is held when a conventional sample holding substrate is used.

【符号の説明】[Explanation of symbols]

2・・・試料保持基板 4・・・試料 6・・・基体 8・・・接着層 10・・・中間層 12・・・金属薄膜 2 ... Sample holding substrate 4 ... Sample 6 ... Substrate 8 ... Adhesive layer 10 ... Intermediate layer 12 ... Metal thin film

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 基体と、この基体表面に形成された厚さ
5nm以上、表面粗さ10μm(Rmax )の金属薄膜と
を有することを特徴とする試料保持基板。
1. A sample holding substrate comprising a substrate and a metal thin film having a thickness of 5 nm or more and a surface roughness of 10 μm (Rmax) formed on the surface of the substrate.
【請求項2】 前記金属薄膜は、モース硬度4以下、ブ
リネル硬度30以下、もしくはビッカース硬度40以下
の金属材料からなることを特徴とする請求項1記載の試
料保持基板。
2. The sample holding substrate according to claim 1, wherein the metal thin film is made of a metal material having a Mohs hardness of 4 or less, a Brinell hardness of 30 or less, or a Vickers hardness of 40 or less.
【請求項3】 前記金属薄膜は、2000(poise
/20℃)以上の粘度を有する中間層を介して基体表面
に形成されることを特徴とする請求項1記載の試料保持
基板。
3. The thin metal film comprises 2000 (poise)
The sample holding substrate according to claim 1, wherein the sample holding substrate is formed on the surface of the substrate through an intermediate layer having a viscosity of / 20 ° C or higher.
【請求項4】 基体、およびこの基体表面に形成された
厚さ10nm以上、表面粗さ10μm(Rmax )、金属
薄膜とを有する試料保持基板表面に試料を散布する工程
と、前記試料保持基板表面に分散媒体を滴下する工程
と、前記試料が分散するように前記分散媒体を撹拌する
工程と、前記分散媒体を乾燥させた後、前記試料を試料
保持基板に押圧する工程とを有することを特徴とした試
料保持基板の試料保持方法。
4. A step of spraying a sample on the surface of a sample holding substrate having a substrate, a thickness of 10 nm or more, a surface roughness of 10 μm (Rmax) and a metal thin film formed on the surface of the substrate, and the surface of the sample holding substrate. And a step of stirring the dispersion medium so that the sample is dispersed, and a step of pressing the sample onto the sample holding substrate after the dispersion medium is dried. Holding method for the sample holding substrate.
JP8075627A 1996-03-29 1996-03-29 Sample holding substrate and method therefor Pending JPH09264823A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8075627A JPH09264823A (en) 1996-03-29 1996-03-29 Sample holding substrate and method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8075627A JPH09264823A (en) 1996-03-29 1996-03-29 Sample holding substrate and method therefor

Publications (1)

Publication Number Publication Date
JPH09264823A true JPH09264823A (en) 1997-10-07

Family

ID=13581671

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8075627A Pending JPH09264823A (en) 1996-03-29 1996-03-29 Sample holding substrate and method therefor

Country Status (1)

Country Link
JP (1) JPH09264823A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003042951A (en) * 2001-07-31 2003-02-13 Fujitsu Ltd Simple method for analyzing adsorbed gas component
KR101347557B1 (en) * 2013-02-20 2014-01-03 한국과학기술원 Method for high-resolution afm measurement for three dimensional structure of free-standing nano structure
JP2016075525A (en) * 2014-10-03 2016-05-12 株式会社トクヤマ Method for preparing sample for observing particles with electron microscope and method for observing particles with electron microscope
CN117030410A (en) * 2023-10-10 2023-11-10 北京科技大学 Preparation method of ultrathin metal material metallographic sample

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003042951A (en) * 2001-07-31 2003-02-13 Fujitsu Ltd Simple method for analyzing adsorbed gas component
KR101347557B1 (en) * 2013-02-20 2014-01-03 한국과학기술원 Method for high-resolution afm measurement for three dimensional structure of free-standing nano structure
JP2016075525A (en) * 2014-10-03 2016-05-12 株式会社トクヤマ Method for preparing sample for observing particles with electron microscope and method for observing particles with electron microscope
CN117030410A (en) * 2023-10-10 2023-11-10 北京科技大学 Preparation method of ultrathin metal material metallographic sample
CN117030410B (en) * 2023-10-10 2023-12-15 北京科技大学 Preparation method of ultrathin metal material metallographic sample

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