JPH09248977A - Electrolytic processing method for lithographic printing plate support - Google Patents

Electrolytic processing method for lithographic printing plate support

Info

Publication number
JPH09248977A
JPH09248977A JP14052496A JP14052496A JPH09248977A JP H09248977 A JPH09248977 A JP H09248977A JP 14052496 A JP14052496 A JP 14052496A JP 14052496 A JP14052496 A JP 14052496A JP H09248977 A JPH09248977 A JP H09248977A
Authority
JP
Japan
Prior art keywords
electrolytic
flow velocity
counter electrode
electrolyte
web
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14052496A
Other languages
Japanese (ja)
Other versions
JP3625103B2 (en
Inventor
Mutsumi Matsuura
睦 松浦
Akio Uesugi
彰男 上杉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP14052496A priority Critical patent/JP3625103B2/en
Publication of JPH09248977A publication Critical patent/JPH09248977A/en
Application granted granted Critical
Publication of JP3625103B2 publication Critical patent/JP3625103B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an electrolytic processing method which can obtain the improvement in surface quality nonuniformity and the grains of stable honeycomb-shaped pits. SOLUTION: In an electrolytic processing method for applying electrochemical processing continuously in which an alternating current is supplied between an aluminum web 1 and counter electrodes 3a, 3b in electrolytic processing liquid composed mainly of nitric acid or hydrochloric acid containing metal ions, electrolyte 5 is supplied coutercurrently to the advance direction of the metal web 1, the flow velocity 16 of the electrolyte is made 500-4000mm/sec, and the flow velocity distribution of the electrolyte in the width direction of an electrolytic bath is regulated to be ±50% or less of the average flow velocity.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、平版印刷版支持体
の電解処理方法に関する、特に電解液をアルミニウムウ
エブと対極との間に供給する方法に関するものである。
TECHNICAL FIELD The present invention relates to a method for electrolytically treating a lithographic printing plate support, and more particularly to a method for supplying an electrolytic solution between an aluminum web and a counter electrode.

【0002】[0002]

【従来の技術】印刷版支持体、特に平版印刷版支持体と
しては、アルミニウム板が用いられ、ユーザーの多様化
からアルミニウム板も純アルミニウムに近いものから、
マンガンを添加し強度を上げたものまで多様化してい
る。そしてその様なアルミニウム板を平版印刷版支持体
として使用するためには、感光材との適度な接着性と保
水性を有していることが必要である。このためには、ア
ルミニウム板の表面を均一かつ緻密な砂目を有するよう
に粗面化しなければならない。この粗面化処理は、実際
に印刷を行ったとき、版材の汚れ性能などの印刷性能に
著しい影響を及ぼすので、その良否は版材製造上重要な
要素となっている。
2. Description of the Related Art Aluminum plates are used as printing plate supports, especially lithographic printing plate supports. From the diversification of users, aluminum plates are close to pure aluminum.
It has been diversified to include manganese added to increase strength. In order to use such an aluminum plate as a lithographic printing plate support, it is necessary to have appropriate adhesiveness to a photosensitive material and water retention. For this purpose, the surface of the aluminum plate must be roughened so that it has uniform and fine grain. This surface roughening treatment has a significant effect on printing performance such as stain performance of the printing plate material when printing is actually performed, and its quality is an important factor in plate material manufacturing.

【0003】印刷版用アルミニウム支持体の粗面化方法
としては、機械的な砂目立て法、電気化学的な砂目立て
法などがあり、又それらを適時組合わせた形で粗面化を
行っている。機械的な砂目立て法としては、例えばボー
ルグレイン,ワイヤーグレイン,ブラッシグレイン,液
体ホーニング法などがある。また電気化学的砂目立て方
法としては、交流電解エッチング法が一般的に使用され
ており、電流としては普通の正弦波交流電流あるいは矩
形波など、特殊交番電流が用いられている。またこの電
気化学的砂目立ての前処理として、苛性ソーダなどでエ
ッチング処理をしても良い。
As a method for roughening the aluminum support for printing plates, there are a mechanical graining method, an electrochemical graining method, and the like, and the roughening is carried out by combining them in a timely manner. There is. Mechanical graining methods include, for example, ball grain, wire grain, brush grain, and liquid honing. An alternating current electrolytic etching method is generally used as the electrochemical graining method, and a special alternating current such as an ordinary sinusoidal alternating current or a rectangular wave is used as the current. In addition, as a pretreatment for the electrochemical graining, an etching treatment with caustic soda may be performed.

【0004】その中で交流電解エッチング方法において
は、直流電流によって生じる現象と異なり、炭素や金属
などによる対極が非常に劣化し易いという問題があっ
た。例えば炭素を対極とすると極性変化のため酸化還元
の反応が繰返され、バインダーの劣化が激しく長時間安
定稼働が非常に難しい。このような課題に対して、特公
昭61−48596号公報には、主体極に接続された回
路に補助対極に対する回路を並列に連結すると共に、ア
ノード電流の主対極における流れを制御するこめのダイ
オード又はダイオード的作用をなす機構を補助対極に対
する回路に設けたことを特徴とする電解処理装置が開示
されている。
Among them, the AC electrolytic etching method has a problem that unlike a phenomenon caused by a DC current, a counter electrode due to carbon or metal is apt to be deteriorated. For example, when carbon is used as the counter electrode, the oxidation-reduction reaction is repeated due to the change in polarity, and the binder is severely deteriorated, and stable operation for a long time is extremely difficult. To solve such a problem, Japanese Patent Publication No. 61-48596 discloses a diode for connecting a circuit connected to a main electrode in parallel with a circuit for an auxiliary counter electrode and controlling a flow of an anode current in a main counter electrode. Alternatively, there is disclosed an electrolytic treatment apparatus characterized in that a mechanism that acts as a diode is provided in a circuit for the auxiliary counter electrode.

【0005】例えば、図4に示すように、被処理材であ
る金属ウエブ1がドラムローラ2の内周で支持され、対
向する主対極3a,3bとの間に、電解液供給口4から
金属イオンを含む電解処理液5を補給し電解液排出口6
から排出することによって満し、主対極3a,3bには
交流電源7より交番電流を供給して、電気化学的処理を
施す電解処理装置であって、金属ウエブ1との対極を主
対極3a,3bと補助対極8によって形成し、主対極3
a,3bに接続された回路に補助対極8に対する回路を
並列に連結し、アノード電流の主対極における回路を並
列に連結し、アノード電流の主対極における流れを制御
するためのダイオード9又はダイオード的作用をなす機
構を補助対極8に対する回路に設けて電流を流す電解処
理装置である。この際主対極3a,3bはお互いに反対
の極性をもつもので、電源7には互いに反対側に結線さ
れており、更に主対極3a,3bは夫々多数本の(例え
ばn=10〜14本)の小電極(3a1 ,3a2 ,3a
3 ・・・3an )(3b1 ,3b2 ,3b3 ・・・3b
n )がお互いに絶縁体10を境として構成されたもので
電流効率をあげるために工夫されている。
For example, as shown in FIG. 4, a metal web 1 as a material to be treated is supported on the inner circumference of a drum roller 2 and is connected to the opposing main counter electrodes 3a and 3b from an electrolytic solution supply port 4 through a metal. Electrolyte solution 5 containing ions is replenished and electrolyte solution outlet 6
The main electrode 3a, 3b is filled with the alternating current from the AC power source 7 to perform an electrochemical treatment, and the counter electrode with the metal web 1 is the main electrode 3a, 3b. 3b and the auxiliary counter electrode 8 to form the main counter electrode 3
A circuit for the auxiliary counter electrode 8 is connected in parallel to the circuit connected to a and 3b, a circuit in the main counter electrode of the anode current is connected in parallel, and a diode 9 or diode-like diode for controlling the flow of the anode current in the main counter electrode is connected. This is an electrolytic treatment apparatus in which a mechanism for acting is provided in a circuit for the auxiliary counter electrode 8 to flow an electric current. At this time, the main counter electrodes 3a and 3b have polarities opposite to each other, and are connected to the power source 7 on opposite sides. Further, the main counter electrodes 3a and 3b each have a large number (for example, n = 10 to 14). ) Small electrodes (3a 1 , 3a 2 , 3a
3 ... 3a n ) (3b 1 , 3b 2 , 3b 3 ... 3b
n ) are formed with the insulator 10 as a boundary, and are devised to improve current efficiency.

【0006】従来は電解液供給口4は1ケ所であったた
め、ここから補給された電解液は金属ウエブ1と電極3
a,3bとの間の定められた狭い空間の間(例えば10
mm)を通ってドラムローラ3の反対側に流れ、電解液
排出口6に出て行くので、流路における電解によって次
第に電解液が疲労し主対極の初めと、終りでは電解液が
疲労してその成分に差が出て来て充分な電解効率が得ら
れず、また液の入口と出口との温度差が大きくなり所望
の砂目が得られなかった。上記の欠点を改善するため本
出願人は先に電解液供給口を対極間に2ケ所以上設ける
ことを特徴とする電解処理装置として特開平2−151
98号公報を開示した。
In the past, the electrolyte solution supply port 4 was provided at one place, so the electrolyte solution supplied from here was the metal web 1 and the electrode 3.
Between a defined narrow space between a and 3b (for example, 10
mm) through the drum roller 3 to the opposite side of the drum roller 3 and exits to the electrolyte discharge port 6. Therefore, the electrolyte is gradually fatigued by the electrolysis in the flow path, and the electrolyte is fatigued at the beginning and the end of the main counter electrode. The components differed from each other and sufficient electrolysis efficiency could not be obtained, and the temperature difference between the inlet and the outlet of the liquid became large, so that the desired grain could not be obtained. In order to improve the above-mentioned drawbacks, the applicant of the present invention discloses an electrolytic treatment apparatus characterized in that two or more electrolytic solution supply ports are first provided between counter electrodes.
No. 98 has been disclosed.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、前記特
開平2−15198号公報に記載の装置を用いても、電
解処理での面質ムラの改善は充分とは言えず、より一層
の改善が望まれていた。
However, even if the apparatus described in Japanese Patent Laid-Open No. 2-15198 is used, the unevenness of surface quality in the electrolytic treatment cannot be said to be sufficient, and further improvement is desired. It was rare.

【0008】本発明の目的は、前記問題点を解消し、面
質ムラの改善と、安定したハニカム状ピットの砂目が得
られる電解処理方法を提供することにある。
It is an object of the present invention to provide an electrolytic treatment method which solves the above problems, improves the unevenness of surface quality, and obtains stable pits of honeycomb-shaped pits.

【0009】[0009]

【課題を解決するための手段】本発明の上記目的は、 金属イオンを含む硝酸又は塩酸を主体とする電解処
理液中で、アルミニウムウエブと対極との間に交番電流
を供給し、連続的に電気化学的処理を施す電解処理方法
において、前記電解液を前記金属ウエブの進行方向に対
向して供給し、該電解液の流速を500〜4000mm
/secにすることを特徴とする平版印刷版支持体の電
解処理方法。 金属イオンを含む硝酸又は塩酸を主体とする電解処
理液中で、アルミニウムウエブと対極との間に交番電流
を供給し、連続的に電気化学的処理を施す電解処理方法
において、前記電解液の電解槽内巾方向の流速分布を平
均流速±50%以内に規定することを特徴とする平版印
刷版支持体の電解処理方法。によって達成される。
The above object of the present invention is to continuously supply an alternating current between an aluminum web and a counter electrode in an electrolytic treatment solution mainly containing nitric acid or hydrochloric acid containing metal ions, and continuously In an electrolytic treatment method of performing an electrochemical treatment, the electrolytic solution is supplied so as to face the traveling direction of the metal web, and the flow rate of the electrolytic solution is 500 to 4000 mm.
/ Sec, a method of electrolytically treating a lithographic printing plate support. In an electrolytic treatment solution mainly composed of nitric acid or hydrochloric acid containing metal ions, an alternating current is supplied between an aluminum web and a counter electrode, and in the electrolytic treatment method of continuously performing an electrochemical treatment, electrolysis of the electrolytic solution is performed. An electrolytic treatment method for a lithographic printing plate support, characterized in that the flow velocity distribution in the width direction of the tank is regulated within an average flow velocity ± 50%. Achieved by

【0010】[0010]

【発明の実施の形態】本発明において、電解液の流速を
500〜4000mm/secにするということは、5
00mm/sec未満の流速だと砂目に巨大ピットが生
成するので好ましくなく、又流速がそれより遅くなると
ウロコ状の水素ガスムラが発生するので面質上好ましく
なく、流速が4000mm/secより速いと全体的に
砂目が大きくなり不均一で未エッチ部分が多く発生して
好ましくない。流速としては1000〜3000mm/
secがより好ましい。ウエブのスピードとしては5〜
200m/minの範囲であるが、30m/min以上
で効果が大きい。電流密度は5〜200A/dm2 であ
り、より好ましくは15〜100A/dm2 である。電
極とウエブとの間隔は5〜50mmで電力コスト上は5
〜20mmが望ましい。
BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, setting the flow rate of the electrolytic solution to 500 to 4000 mm / sec means 5
If the flow velocity is less than 00 mm / sec, it is not preferable because huge pits are formed in the sand, and if the flow velocity is slower than that, scale-like hydrogen gas unevenness is generated, which is not preferable in terms of surface quality, and if the flow velocity is faster than 4000 mm / sec. It is not preferable because the grain size becomes large as a whole and it is uneven and many unetched parts are generated. The flow velocity is 1000-3000 mm /
sec is more preferable. The speed of the web is 5
Although the range is 200 m / min, the effect is large at 30 m / min or more. The current density is 5 to 200 A / dm 2 , and more preferably 15 to 100 A / dm 2 . The distance between the electrode and the web is 5 to 50 mm, which is 5 in terms of power cost.
-20 mm is desirable.

【0011】又、本発明において巾方向流速分布が平均
流速±30%よりも大きくなってしまうと巾方向での砂
目立て性が大きく変化してしまい、印刷性能差が発生し
たり、ベース濃度(高感度可視光センサーによる測定)
に60mV以上の濃度差が発生し、インキプリセッティ
ング適正(刷版の絵柄面積を測定し、インキ供給量を調
整する装置に対する適性「デミア適性」とも言う)が悪
くなってしまうためである。特に平均流速±30%以内
が望ましい。本発明において巾方向流速分布を平均流速
±50%以内に規定するためには、巾方向に摩擦抵抗を
増加させるためのガイドベーンを巾方向に適当に間隔を
違えて挿入する方法等が用いられる。
Further, in the present invention, when the flow velocity distribution in the width direction is larger than the average flow velocity ± 30%, the graining property in the width direction is greatly changed, which causes a difference in printing performance and a base density ( (Measurement with high-sensitivity visible light sensor)
This is because a density difference of 60 mV or more occurs in the ink, and the ink presetting suitability (also referred to as “demia suitability” for a device that measures the pattern area of a printing plate and adjusts the ink supply amount) deteriorates. Particularly, the average flow velocity is preferably within ± 30%. In the present invention, in order to define the widthwise flow velocity distribution within an average flow velocity of ± 50%, a method of inserting guide vanes for increasing frictional resistance in the width direction at appropriate intervals in the width direction or the like is used. .

【0012】本発明の実施態様について図を用いて説明
する。図2は本発明の特徴をフラット型セルに適用した
1実施例であり、支持体1は図上左から右に進み、電解
液供給口4のスリットは支持体進行方向に対向する方向
に向いて開口しており、該電解液の流速を500〜40
00mm/secにすることが示される。図1はラジア
ル型セルと特開平2−15198号公報との組み合わせ
の一実施例である。1は金属ウエブであり、2はウエブ
を支えるラジアルドラムローラであり、ウエブと主対極
3a,3bとのクリアランスは一定に保って走行してい
る。クリアランスは通常5〜50mm程度が適当であ
る。又電解液供給口は4a,4bと2つである。この場
合主対極の損耗を防ぐため特公昭61−48596号公
報に記載のように補助対極とダイオードを用いることも
出来る。主対極と補助対極の比は、求める電解エッチン
グ条件により異なる。7は交流電源であり、通常0.1
Hz〜500Hzの交流電源が使用される。周波数につ
いては求めるエッチング形態によって変化させるが、3
a,3bの主対極の劣化が15Hz以下であると大き
く、特にカーボンの場合顕著である。波形としては、い
ろいろあるが、特公昭56〜19280号,特公昭55
−19191号各公報に記載の特殊交番波形を用いるこ
とも出来る。ダイオードを用いた場合、これにより補助
対極に流れる電流を制御する。補助対極の材料として
は、劣化に強い白金及び磁性酸化鉄の焼結体を用いるこ
とが好ましい。本発明の電解液供給口4としては例えば
従来のものを4aとすると、主体極3a,3bの間に絶
縁体10を挟んで電解液供給口4bを設けることが出来
る。各電解液供給口では電解処理液5は供給管11より
電解液供給口4内に入り、ディストリビュータ12によ
りドラムローラの幅方向全体に均一に分布するようキャ
ビティ13に入り、金属ウエブの進行方向に対向したス
リット14より電解槽15の巾に噴出される、電解槽1
5内の流速は500〜4000mm/secに保たれ
る。本発明の請求項2の特徴を図3で示すと、図3は図
2の平面図に相当し、巾方向の均一性を増加させるため
には、供給口4においては、巾方向のディストリビュー
ター12を巾方向の中心部の抵抗を増やすべく電解槽と
同様に密にとり、電解槽15においてもガイドベーン1
7が中央部程密に設ける様に設置しなければならない。
これは図1においても同様の考え方で処理をする。これ
によって電解槽の中の電解液温度の均一性及び攪拌効果
が良くなり電解効率が上昇するのである。
An embodiment of the present invention will be described with reference to the drawings. FIG. 2 shows one embodiment in which the features of the present invention are applied to a flat type cell. The support 1 advances from left to right in the figure, and the slit of the electrolyte solution supply port 4 faces in a direction opposite to the support advancing direction. And the flow rate of the electrolytic solution is 500 to 40
It is shown to be 00 mm / sec. FIG. 1 shows an embodiment of a combination of a radial type cell and Japanese Patent Application Laid-Open No. 2-15198. Reference numeral 1 is a metal web, 2 is a radial drum roller that supports the web, and runs while maintaining a constant clearance between the web and the main counter electrodes 3a and 3b. A clearance of 5 to 50 mm is usually suitable. Further, there are two electrolytic solution supply ports 4a and 4b. In this case, in order to prevent wear of the main counter electrode, an auxiliary counter electrode and a diode can be used as described in Japanese Patent Publication No. 61-48596. The ratio between the main counter electrode and the auxiliary counter electrode differs depending on the required electrolytic etching conditions. 7 is an AC power supply, usually 0.1
An AC power supply of Hz to 500 Hz is used. The frequency varies depending on the etching pattern to be obtained, but 3
The deterioration of the main counter electrodes of a and 3b is large when the frequency is 15 Hz or less, and is particularly remarkable in the case of carbon. There are various waveforms, but Japanese Patent Publication Nos. 56-19280 and 55
It is also possible to use the special alternating waveform described in each publication of No. 19191. When a diode is used, this controls the current flowing through the auxiliary counter electrode. As a material for the auxiliary counter electrode, it is preferable to use a sintered body of platinum and magnetic iron oxide, which is resistant to deterioration. As the electrolytic solution supply port 4 of the present invention, for example, if the conventional one is 4a, the electrolytic solution supply port 4b can be provided by sandwiching the insulator 10 between the main electrodes 3a and 3b. At each electrolytic solution supply port, the electrolytic treatment solution 5 enters into the electrolytic solution supply port 4 through the supply pipe 11, and enters into the cavity 13 by the distributor 12 so as to be uniformly distributed in the entire width direction of the drum roller, and in the traveling direction of the metal web. The electrolytic cell 1 ejected from the slits 14 facing each other to the width of the electrolytic cell 15.
The flow velocity in 5 is maintained at 500 to 4000 mm / sec. 3 is equivalent to the plan view of FIG. 2, and in order to increase the uniformity in the width direction, in the supply port 4, the distributor in the width direction is shown. In order to increase the resistance of the central portion in the width direction, 12 are densely packed in the same manner as the electrolytic cell, and in the electrolytic cell 15, the guide vane 1 is also used.
7 must be installed so that they are closer to the center.
This is processed in the same way in FIG. As a result, the uniformity of the temperature of the electrolytic solution in the electrolytic cell and the stirring effect are improved, and the electrolytic efficiency is increased.

【0013】[0013]

【実施例】【Example】

(実施例−1,−2,−3)図1に示すラジアル型セル
を用いて電解液流速の実験を行った。アルミニウムエブ
進行速度としては40m/分,電極とウエブ間の距離2
0mmにして電流密度50A/dm2 で電気量250c
/dm2 を流し、電解液流速条件を500,2,00
0,4,000mm/secの三条件に変えて流した。
(Examples 1, -2, -3) The radial flow cell shown in FIG. Aluminum moving speed is 40m / min, distance between electrode and web is 2
Electricity of 250c at 0mm and current density of 50A / dm 2.
/ Dm 2 and the electrolyte flow rate condition is 500, 2,000
The flow was changed under the three conditions of 0,4,000 mm / sec.

【0014】(比較例−1,−2)電解液流速を除く以
外の条件は実施例−1〜−3と同様で、流速400m/
secを比較例−1、流速5,000mm/secを比
較例−2として前記流速5条件に対し、面質及び砂目形
状の効果を表1とした。
(Comparative Examples-1 and -2) The conditions are the same as in Examples -1 to -3 except that the flow rate of the electrolytic solution is excluded, and the flow rate is 400 m /
Table 1 shows the effects of surface quality and grain shape under the flow rate of 5 conditions, where sec is Comparative Example-1 and flow rate is 5,000 mm / sec is Comparative Example-2.

【0015】[0015]

【表1】 [Table 1]

【0016】表1より比較例−1の流速400mm/s
ecは面質不良であり、砂目形状も巨大ピットが存在し
不良であった。比較例−2の流速5000mm/sec
では面質は一応良かったが、砂目形状に未エッチング部
が多くマクロピットであり、好ましくなかった。一方流
速500mm/sec〜4,000mm/secの範囲
は面質も良好であり、砂目形状も均一であった。電解液
流速が500mm/secより4000mm/secに
速くなるとピットの径も比較的に大きくなる
From Table 1, the flow velocity of Comparative Example-1 is 400 mm / s.
ec was poor in surface quality, and the grain shape was also poor due to the presence of huge pits. Flow rate of Comparative Example-2 5000 mm / sec
The surface quality was good for a while, but it was not preferable because there were many unetched parts in the grain shape and macro pits. On the other hand, in the flow velocity range of 500 mm / sec to 4,000 mm / sec, the surface quality was good and the grain shape was uniform. When the electrolyte flow velocity increases from 500 mm / sec to 4000 mm / sec, the pit diameter also becomes relatively large.

【0017】(実施例−4,−5と比較例−3)JIS
A1050−H16アルミニウム圧延板をブラシグレイ
ンにて機械的粗面化を行い、ついで25重量%の苛性ソ
ーダ水溶液中に50℃でエッチング10g/m2 行い、
アルミニウム板の表面に付着した水酸化アルミニウムを
主体としたスマットを1.5重量%の硝酸でデスマット
を行い、次に硝酸1.5重量%含有する水溶液中、40
℃,電流速度20A/dm2 ,電気量200C/dm2
で電解粗面化処理を行い、電解粗面化で生成したピット
のエッジに相当する部分のエッチングを苛性ソーダ水溶
液25重量%,40℃で,1g/m2 エッチングを行
い、このようにして得られたアルミニウム板の表面に付
着した水酸化アルミニウムを主体としたスマットを硫酸
400g/リットル、液温60℃の水溶液中10秒間浸
漬して除去し、以上のようにして得られたアルミニウム
板に酸化皮膜量が2.5g/m2 となるように硫酸20
0g/リットル含有する水溶液30℃で陽極酸化処理を
おこなった。その際、実施例−4,−5としてそれぞれ
±30%,±50%の巾方向流速分布で電解粗面化を行
ったものと、比較例−3として±55%流速分布のもの
を行なった結果を表2に示す。
(Examples 4 and -5 and Comparative Example 3) JIS
A1050-H16 rolled aluminum plate was mechanically roughened with a brush grain and then etched in a 25 wt% caustic soda aqueous solution at 50 ° C. to 10 g / m 2 .
The smut mainly composed of aluminum hydroxide adhered to the surface of the aluminum plate was desmutted with 1.5% by weight of nitric acid, and then 40% in an aqueous solution containing 1.5% by weight of nitric acid.
℃, current speed 20A / dm 2 , electricity quantity 200C / dm 2
Electrolytic surface roughening treatment is carried out with, and the portion corresponding to the edge of the pit formed by electrolytic surface roughening is etched by 1 g / m 2 etching at 25% by weight of a caustic soda aqueous solution at 40 ° C. The smut mainly composed of aluminum hydroxide attached to the surface of the aluminum plate was immersed in an aqueous solution of 400 g of sulfuric acid and a liquid temperature of 60 ° C. for 10 seconds to be removed, and an oxide film was formed on the aluminum plate thus obtained. 20 g of sulfuric acid so that the amount becomes 2.5 g / m 2.
Anodizing treatment was performed at 30 ° C. in an aqueous solution containing 0 g / liter. At that time, electrolytic surface roughening was performed with a widthwise flow velocity distribution of ± 30% and ± 50% as Examples-4 and -5, respectively, and as a comparative example-3, a flow velocity distribution of ± 55% was performed. The results are shown in Table 2.

【0018】[0018]

【表2】 [Table 2]

【0019】砂目形状とベース濃度分布についてセンタ
ー部とエッジ部について観察した結果、分布±30%と
±50%のものは製品として合格範囲であったが、±5
5%のものについてはエッジ部が未エッチングの状態で
あり、ベース濃度もバラツキが多く、製品として不合格
であった。
As a result of observing the center part and the edge part with respect to the grain shape and the base concentration distribution, those having a distribution of ± 30% and ± 50% were within the acceptable range as a product, but were ± 5.
In the case of 5%, the edge portion was not etched, and the base concentration also varied, and the product was rejected.

【0020】[0020]

【発明の効果】本発明の電解液供給の方向をウエブに対
向させ、電解液流速を500〜4000mm/secに
することより、又、巾方向流速分布±50%以内にする
ことにより、電気化学的処理工程の面質が従来より一層
良化し、砂目形状も安定的にハニカム状ピットが得られ
るようになった。又電解槽内の巾方向の砂目立てが均一
化されるため、アルミニウム支持体の巾方向による印刷
性能差がなくなり、又巾方向ベース濃度差が少なくなる
ためデミア適性が良くなる。
The electrochemistry of the present invention is controlled by making the direction of the electrolytic solution supply face the web and setting the electrolytic solution flow velocity to 500 to 4000 mm / sec, and by setting the widthwise flow velocity distribution within ± 50%. The surface quality of the static treatment process has improved even more than before, and it has become possible to obtain honeycomb-shaped pits with a stable grain pattern. Further, since the graining in the width direction in the electrolytic cell is made uniform, there is no difference in the printing performance of the aluminum support in the width direction, and the difference in the base concentration in the width direction is small, so that the demier suitability is improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明を適用するラジアル型セルの一例の側面
図。
FIG. 1 is a side view of an example of a radial type cell to which the present invention is applied.

【図2】本発明を適用するフラットセルの一例の側面
図。
FIG. 2 is a side view of an example of a flat cell to which the present invention is applied.

【図3】本発明の巾方向の流速分布を平均流速の±50
%以内に規定する実施例の平面図。
FIG. 3 shows a widthwise flow velocity distribution of the present invention of ± 50 of the average flow velocity.
The top view of the Example prescribed | regulated within%.

【図4】従来の電解処理装置の側面図。FIG. 4 is a side view of a conventional electrolytic treatment apparatus.

【符号の説明】[Explanation of symbols]

1 金属ウエブ 2 ラジアルドラムローラ 3,3a,3b 主対極 4,4a,4b 電解液供給口 5 電解処理液 6 電解液排出口 7 交流電源 8 パスローラ 9 給電ローラ 10 絶縁体 11 供給管 12 ディストリビュータ 13 キャビティ 14 スリット 15 電解槽 16 電解液流速 17 ガイドベーン 1 Metal Web 2 Radial Drum Rollers 3, 3a, 3b Main Counter Electrode 4, 4a, 4b Electrolyte Supply Port 5 Electrolysis Treatment Solution 6 Electrolyte Discharge Port 7 AC Power Supply 8 Pass Roller 9 Power Supply Roller 10 Insulator 11 Supply Pipe 12 Distributor 13 Cavity 14 Slit 15 Electrolyzer 16 Electrolyte Flow Rate 17 Guide Vane

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属イオンを含む硝酸又は塩酸を主体と
する電解処理液中で、アルミニウムウエブと対極との間
に交番電流を供給し、連続的に電気化学的処理を施す電
解処理方法において、前記電解液を前記金属ウエブの進
行方向に対向して供給し、該電解液の流速を500〜4
000mm/secにすることを特徴とする平版印刷版
支持体の電解処理方法。
1. An electrolytic treatment method in which an alternating current is supplied between an aluminum web and a counter electrode in an electrolytic treatment liquid mainly containing nitric acid or hydrochloric acid containing metal ions to continuously perform an electrochemical treatment, The electrolytic solution is supplied so as to face the traveling direction of the metal web, and the flow rate of the electrolytic solution is 500 to 4
A method for electrolytically treating a lithographic printing plate support, which is characterized in that it is 000 mm / sec.
【請求項2】 金属イオンを含む硝酸又は塩酸を主体と
する電解処理液中で、アルミニウムウエブと対極との間
に交番電流を供給し、連続的に電気化学的処理を施す電
解処理方法において、前記電解液の電解槽内巾方向の流
速分布を平均流速±50%以内に規定することを特徴と
する平版印刷版支持体の電解処理方法。
2. An electrolytic treatment method in which an alternating current is supplied between an aluminum web and a counter electrode in an electrolytic treatment liquid mainly containing nitric acid or hydrochloric acid containing metal ions to continuously perform an electrochemical treatment, A method for electrolytically treating a lithographic printing plate support, characterized in that the flow velocity distribution of the electrolytic solution in the width direction in the electrolytic cell is regulated within an average flow velocity ± 50%.
JP14052496A 1996-01-12 1996-06-03 Method for electrolytic treatment of lithographic printing plate support Expired - Fee Related JP3625103B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14052496A JP3625103B2 (en) 1996-01-12 1996-06-03 Method for electrolytic treatment of lithographic printing plate support

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP410796 1996-01-12
JP8-4107 1996-01-12
JP14052496A JP3625103B2 (en) 1996-01-12 1996-06-03 Method for electrolytic treatment of lithographic printing plate support

Publications (2)

Publication Number Publication Date
JPH09248977A true JPH09248977A (en) 1997-09-22
JP3625103B2 JP3625103B2 (en) 2005-03-02

Family

ID=26337825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14052496A Expired - Fee Related JP3625103B2 (en) 1996-01-12 1996-06-03 Method for electrolytic treatment of lithographic printing plate support

Country Status (1)

Country Link
JP (1) JP3625103B2 (en)

Also Published As

Publication number Publication date
JP3625103B2 (en) 2005-03-02

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