JPH09243817A - Formation of resin pattern and production of color filter substrate - Google Patents

Formation of resin pattern and production of color filter substrate

Info

Publication number
JPH09243817A
JPH09243817A JP5470796A JP5470796A JPH09243817A JP H09243817 A JPH09243817 A JP H09243817A JP 5470796 A JP5470796 A JP 5470796A JP 5470796 A JP5470796 A JP 5470796A JP H09243817 A JPH09243817 A JP H09243817A
Authority
JP
Japan
Prior art keywords
resin film
resin
colored resin
pressing
colored
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5470796A
Other languages
Japanese (ja)
Inventor
Kazuyuki Hosokawa
和行 細川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5470796A priority Critical patent/JPH09243817A/en
Publication of JPH09243817A publication Critical patent/JPH09243817A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide high-accuracy resin patterns and a color filter substrate by a printing method and electrodeposition method without utilizing a photolithography technique. SOLUTION: A resin film 2 consisting of a photosensitive type resin or thermosetting resin is formed on a base 1. The resin film 2 heated to the temp. at which the solvent contained in the resin film 2 is removed is selectively pressed. The non-pressed parts of the resin film 2 are removed in a developing stage, by which resin patterns 5' are formed, thereafter, the resin patterns 5' remaining on the base 1 are cured to form the resin patterns 5. An equally good alternative is to selectively press the resin film 2 consisting of the photosensitive resin while heating the resin film 2 and to cure the pressed parts by irradiation with UV rays, then to form the resin patterns 5 by removing the non-pressed parts. The first, second, third colored resin patterns are formed by utilizing a method for forming the resin patterns described above.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は樹脂パターンの形成
方法とカラーフィルタ基板の製造方法、特に液晶表示パ
ネル等に使用するカラーフィルタ基板の製造に利用する
樹脂パターンの形成方法と、その樹脂パターンの形成方
法を利用したカラーフィルタ基板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a resin pattern and a method for manufacturing a color filter substrate, and more particularly, a method for forming a resin pattern used for manufacturing a color filter substrate used for a liquid crystal display panel and the like. The present invention relates to a method for manufacturing a color filter substrate using the forming method.

【0002】近年、液晶表示パネルは薄型・軽量・低消
費電力等の利点を活かして様々な分野で急速に普及し、
その市場動向はカラー化・大画面化・高精細化・低価格
化に向かって進んでいる。
In recent years, liquid crystal display panels have rapidly spread in various fields by taking advantage of their thinness, light weight and low power consumption.
The market trend is toward color, larger screens, higher definition, and lower prices.

【0003】カラー液晶表示パネルの構成部品の一つで
あるカラーフィルタ基板についても、高品質化および低
価格化が急務である。
There is also an urgent need to improve the quality and the cost of the color filter substrate, which is one of the components of the color liquid crystal display panel.

【0004】[0004]

【従来の技術】支持体の表面に樹脂パターンを形成した
製品、例えばガラスや各種プラスチック類にてなる透光
性基板またはフィルムを支持体とし、その支持体の表面
に透光性の多数の着色パターンを形成したカラーフィル
タ基板において、複数色の着色樹脂パターンの形成方法
は、一般に、着色剤分散法・印刷法・染色法・電着法が
知られている。
2. Description of the Related Art A product having a resin pattern formed on the surface of a support, such as a transparent substrate or film made of glass or various plastics, is used as a support, and the surface of the support is provided with many transparent colorings. As a method of forming a colored resin pattern of a plurality of colors on a color filter substrate having a pattern, a colorant dispersion method, a printing method, a dyeing method, and an electrodeposition method are generally known.

【0005】前記従来方法において、フォトリソグラフ
ィー技術を利用し、着色剤を分散せしめて着色樹脂のパ
ターンを支持体の表面に形成する着色剤分散法は、微細
な着色パターンを高精度に形成できる特徴がある反面、
高精度を要するフォトリソグラフィー工程の繰り返しを
必要とし工程が複雑となるため、高価かつコストダウン
が困難である。
In the conventional method, the colorant dispersion method in which a colorant is dispersed by using a photolithography technique to form a pattern of a colored resin on the surface of a support is capable of forming a fine colored pattern with high accuracy. On the other hand,
Since the photolithography process requiring high accuracy is required to be repeated and the process is complicated, it is expensive and cost reduction is difficult.

【0006】前記従来方法において、版を使用する等の
印刷技術を利用し、着色パターンを支持体の表面に形成
する印刷法は、製造工程が他の方法に比べて簡易であり
安価に製造できる反面、着色パターンの形状が不正確と
なり厚さむらが生じ易いため、最近の高性能化に対し追
従し難いという問題点がある。
In the conventional method, the printing method of forming a colored pattern on the surface of the support by using a printing technique such as using a plate has a simple manufacturing process and can be manufactured at a low cost. On the other hand, since the shape of the colored pattern is inaccurate and thickness unevenness is likely to occur, there is a problem that it is difficult to follow the recent improvement in performance.

【0007】前記従来方法において、染色技術とフォト
リソグラフィー技術を利用した染色法は、高解像性と着
色パターンの精度が着色剤分散法と同程度であり、色調
が着色剤分散法より優れるという特徴がある反面、被染
色パターンの形成・染色・防染処理を染色の色別に繰り
返す必要があるため、製造工程が複雑となって高価かつ
コストダウンが困難であった。
In the conventional method, the dyeing method using the dyeing technique and the photolithography technique has high resolution and the accuracy of the coloring pattern is similar to the colorant dispersion method, and the color tone is superior to the colorant dispersion method. On the other hand, there are features, but it is necessary to repeat the formation of the pattern to be dyed, dyeing, and dye-proofing treatment for each color of dyeing, which complicates the manufacturing process and makes it difficult to reduce the cost.

【0008】前記従来方法において、電着技術を利用し
た前記電着法は、フォトリソグラフィー技術を利用しな
いため製造工程が着色剤分散法および染色法より簡易で
ある反面、電着液の管理が難しく、着色パターンの特性
にばらつきが生じ易いという問題点がある。
In the conventional method, the electrodeposition method using the electrodeposition technology does not use the photolithography technology, so that the manufacturing process is simpler than the colorant dispersion method and the dyeing method, but it is difficult to control the electrodeposition solution. However, there is a problem that the characteristics of the coloring pattern are likely to vary.

【0009】以上説明した如く、従来技術にはそれぞれ
に問題点を抱えているが、感光性樹脂(一般に紫外線硬
化性樹脂)または熱硬化性樹脂に、着色剤を分散させた
着色剤分散法が、一般に広く利用されている。
As described above, each of the conventional techniques has its own problems, but a colorant dispersion method in which a colorant is dispersed in a photosensitive resin (generally an ultraviolet curable resin) or a thermosetting resin is used. Widely used in general.

【0010】[0010]

【発明が解決しようとする課題】現在主流の着色剤分散
法は、他の方法に比べて高精度パターンが形成されるこ
とで優れている。しかし、マスクを使用した露光処理と
その現像処理を樹脂の色別に繰り返す必要がある。
The colorant dispersion method, which is currently the mainstream, is superior to other methods in that a highly accurate pattern is formed. However, it is necessary to repeat the exposure process using the mask and the development process for each color of the resin.

【0011】しかも、カラーフィルタの高品質化に伴っ
てパターン精度の一層の高精度化が必要となり、必然的
に製造装置の高精度化・マスクの高品質化・製造歩留り
向上の難しさ等、高価格化にならざるを得ない状態であ
る。
Further, as the quality of the color filter is improved, it is necessary to further improve the pattern accuracy, and it is inevitable that the manufacturing apparatus has higher accuracy, the mask has higher quality, and the manufacturing yield is higher. The price is inevitably high.

【0012】特に、露光精度を確保するプロキシミティ
露光機においては、マスクと基板間ギャップをできるだ
け狭める必要から、マスクに異物等が付着しているとそ
の異物等が基板に転移し易いため、マスクの頻繁な洗浄
工程が生産性を極端に低下させている。
Particularly, in a proximity exposure machine which secures the exposure accuracy, since it is necessary to narrow the gap between the mask and the substrate as much as possible, if foreign matter or the like adheres to the mask, the foreign matter or the like easily transfers to the substrate. The frequent washing process of the product significantly reduces productivity.

【0013】[0013]

【課題を解決するための手段】本発明は、フォトリソグ
ラフィー技術を必要とせず、従来の印刷法および電着法
より高精度かつ安定で信頼性に優れた樹脂パターンの形
成方法と、それを利用したカラーフィルタ基板を提供す
ることである。
According to the present invention, a method for forming a resin pattern, which does not require a photolithography technique and which is more accurate, stable and more reliable than conventional printing methods and electrodeposition methods, and the use thereof are provided. Another object of the present invention is to provide a color filter substrate.

【0014】本発明による第1の樹脂パターンの形成方
法は、支持体の表面に感光性樹脂または熱硬化性樹脂の
樹脂膜を形成させる成膜工程と、該樹脂の溶剤を除去す
る温度に該樹脂膜を加熱しながら選択的に押圧し、その
押圧部を該支持体に被着させる被着工程と、該樹脂膜の
非押圧部を除去する現像工程と、該支持体に被着する該
樹脂膜の押圧部を硬化させる硬化工程を含むことであ
る。
The first method for forming a resin pattern according to the present invention comprises a film forming step of forming a resin film of a photosensitive resin or a thermosetting resin on the surface of a support, and a temperature for removing a solvent of the resin. A step of selectively pressing the resin film while heating and applying the pressing part to the support, a developing step of removing the non-pressing part of the resin film, and a step of applying the resin film to the support. This is to include a curing step of curing the pressing portion of the resin film.

【0015】本発明による第2の樹脂パターンの形成方
法は、支持体の表面に感光性樹脂の樹脂膜を形成させる
成膜工程と、該樹脂の溶剤を除去する温度に該樹脂膜を
加熱しながら選択的に押圧し、その押圧部を該支持体に
押し付けると共に、該押圧部に該樹脂膜が感光する光を
選択的に照射する押圧露光工程と、該樹脂膜の非押圧部
を除去する現像工程と、該支持体に被着する該樹脂膜の
押圧部を硬化させる硬化工程を含むことである。
The second method for forming a resin pattern according to the present invention comprises a film forming step of forming a resin film of a photosensitive resin on the surface of a support, and heating the resin film to a temperature at which the solvent of the resin is removed. While pressing selectively, the pressing part is pressed against the support, and the pressing exposure step of selectively irradiating the pressing part with light that the resin film is exposed to, and the non-pressing part of the resin film are removed. This is to include a developing step and a curing step of curing the pressing portion of the resin film adhered to the support.

【0016】本発明による第1のカラーフィルタ基板の
製造方法は、第1の着色剤を感光性樹脂または熱硬化性
樹脂に分散させた第1の着色樹脂にてなる第1の着色樹
脂膜を支持体の表面に形成させる第1の成膜工程と、該
第1の着色樹脂膜に含む溶剤を除去する温度に、該第1
の着色樹脂膜を加熱しながら選択的に押圧し、その押圧
部を該支持体に被着させる第1の被着工程と、該第1の
着色樹脂膜の非押圧部を除去する第1の現像工程と、該
支持体に被着する該第1の着色樹脂膜の押圧部を硬化さ
せる第1の硬化工程と、第2の着色剤を感光性樹脂また
は熱硬化性樹脂に分散させた第2の着色樹脂にてなる第
2の着色樹脂膜を、該支持体の表面に形成させる第2の
成膜工程と、該第2の着色樹脂膜に含む溶剤を除去する
温度に該第2の着色樹脂膜を加熱しながら選択的に押圧
し、その押圧部を該支持体に被着させる第2の被着工程
と、該第2の着色樹脂膜の非押圧部を除去する第2の現
像工程と、該支持体に被着する該第2の着色樹脂膜の押
圧部を硬化させる第2の硬化工程と、第3の着色剤を感
光性樹脂または熱硬化性樹脂に分散させた第3の着色樹
脂にてなる第3の着色樹脂膜を、該支持体の表面に形成
させる第3の成膜工程と、該第3の着色樹脂膜に含む溶
剤を除去する温度に該第3の着色樹脂膜を加熱しながら
選択的に押圧し、その押圧部を該支持体に被着させる第
3の被着工程と、該第3の着色樹脂膜の非押圧部を除去
する第3の現像工程と、該支持体に被着する該第3の着
色樹脂膜の押圧部を硬化させる第3の硬化工程とを含む
ことである。
According to the first method of manufacturing a color filter substrate of the present invention, a first colored resin film made of a first colored resin in which a first colored agent is dispersed in a photosensitive resin or a thermosetting resin is used. The first film forming step for forming on the surface of the support and the temperature for removing the solvent contained in the first colored resin film
A first attaching step of selectively pressing the colored resin film while heating and applying the pressed portion to the support; and a first removing the non-pressed portion of the first colored resin film. A developing step, a first curing step of curing the pressing portion of the first colored resin film adhered to the support, and a second curing step in which a second colorant is dispersed in a photosensitive resin or a thermosetting resin. The second film forming step of forming a second colored resin film made of the second colored resin on the surface of the support, and the second film forming step at a temperature at which the solvent contained in the second colored resin film is removed. A second attaching step of selectively pressing the colored resin film while heating and applying the pressed portion to the support, and a second development for removing the non-pressed portion of the second colored resin film. Process, a second curing process for curing the pressing portion of the second colored resin film adhered to the support, and a third coloring agent for the photosensitive resin or the heat. A third film forming step of forming a third colored resin film made of a third colored resin dispersed in a volatile resin on the surface of the support, and a solvent contained in the third colored resin film. Third pressing step of selectively pressing the third colored resin film while heating the third colored resin film to a temperature for removal, and applying the pressing portion to the support, and non-pressing of the third colored resin film That is, it includes a third developing step of removing a portion and a third curing step of curing the pressing portion of the third colored resin film adhered to the support.

【0017】本発明による第2のカラーフィルタ基板の
製造方法は、第1の着色剤を感光性樹脂に分散させた第
1の着色樹脂にてなる第1の着色樹脂膜を、支持体の表
面に形成させる第1の成膜工程と、該第1の着色樹脂膜
に含む溶剤を除去する温度に該第1の着色樹脂膜を加熱
しながら、選択的に押圧すると共に、その押圧部に該第
1の着色樹脂膜が感光する光を選択的に照射する第1の
押圧露光工程と、該第1の着色樹脂膜の非押圧部を除去
し第1の樹脂パターンを形成させる第1の現像工程と、
該第1の樹脂パターンを硬化させる第1の硬化工程と、
第2の着色剤を感光性樹脂に分散させた第2の着色樹脂
にてなる第2の着色樹脂膜を、該支持体の表面に形成さ
せる第2の成膜工程と、該第2の着色樹脂膜に含む溶剤
を除去する温度に該第2の着色樹脂膜を加熱しながら、
選択的に押圧すると共に、その押圧部に該第2の着色樹
脂膜が感光する光を選択的に照射する第2の押圧露光工
程と、該第2の着色樹脂膜の非押圧部を除去し第2の樹
脂パターンを形成させる第2の現像工程と、該第2の樹
脂パターンを硬化させる第2の硬化工程と、第3の着色
剤を感光性樹脂に分散させた第3の着色樹脂にてなる第
3の着色樹脂膜を、該支持体の表面に形成させる第3の
成膜工程と、該第3の着色樹脂膜に含む溶剤を除去する
温度に該第3の着色樹脂膜を加熱しながら、選択的に押
圧すると共に、その押圧部に該第3の着色樹脂膜が感光
する光を選択的に照射する第3の押圧露光工程と、該第
3の着色樹脂膜の非押圧部を除去し第3の樹脂パターン
を形成させる第3の現像工程と、該第3の樹脂パターン
を硬化させる第3の硬化工程とを含むことである。
In the second method for manufacturing a color filter substrate according to the present invention, the first colored resin film made of the first colored resin in which the first colored agent is dispersed in the photosensitive resin is formed on the surface of the support. The first film forming step of forming the first colored resin film, and selectively pressing the first colored resin film while heating the first colored resin film to a temperature at which the solvent contained in the first colored resin film is removed, A first press exposure step of selectively irradiating light that the first colored resin film sensitizes, and a first development in which a non-pressed portion of the first colored resin film is removed to form a first resin pattern. Process,
A first curing step of curing the first resin pattern,
A second film forming step of forming a second colored resin film made of a second colored resin in which a second colorant is dispersed in a photosensitive resin, on the surface of the support, and the second coloring While heating the second colored resin film to a temperature at which the solvent contained in the resin film is removed,
A second press exposure step of selectively pressing and selectively irradiating the pressed portion with light that the second colored resin film sensitizes, and removing a non-pressed portion of the second colored resin film. A second developing step of forming a second resin pattern, a second curing step of curing the second resin pattern, and a third coloring resin in which a third colorant is dispersed in a photosensitive resin. Forming a third colored resin film on the surface of the support, and heating the third colored resin film to a temperature at which the solvent contained in the third colored resin film is removed. However, a third pressing exposure step of selectively pressing and irradiating the pressing portion with light that the third colored resin film exposes, and a non-pressing portion of the third colored resin film And a third developing step of removing the third resin pattern to form a third resin pattern, and a third developing step of curing the third resin pattern. It is to include a curing step.

【0018】前記第1の樹脂パターンの形成方法は、樹
脂膜の所定部を適当温度に加熱しながら押圧すること
で、その押圧部は樹脂膜の現像に耐える接着力で支持体
に被着するようになる。
In the first resin pattern forming method, a predetermined portion of the resin film is pressed while being heated to an appropriate temperature, and the pressing portion is adhered to the support with an adhesive force that can withstand the development of the resin film. Like

【0019】そのため、フォトリソグラフィー技術を必
要とせず、従って従来の着色剤分散法および染色法より
も容易、かつ、従来の印刷法および電着法より高精度で
信頼性に優れた樹脂パターン形成が可能となる。
Therefore, the photolithography technique is not required, and therefore, the resin pattern formation which is easier than the conventional colorant dispersion method and the dyeing method and which is more accurate and more reliable than the conventional printing method and the electrodeposition method can be performed. It will be possible.

【0020】前記第2の樹脂パターンの形成方法は、樹
脂膜の所定部を適当温度に加熱しながら押圧すると共
に、光線照射によって樹脂膜の所定部を露光させる。そ
のため、前記第1の樹脂パターンの形成方法と同一効果
が得られると共に、第1の樹脂パターンの形成方法より
も工程が少なく、かつ、紫外線硬化性樹脂を使用した前
記露光時の紫外線強度は、通常時より著しく低減可能に
なる。
In the second method of forming a resin pattern, a predetermined portion of the resin film is pressed while being heated to an appropriate temperature, and the predetermined portion of the resin film is exposed by light irradiation. Therefore, the same effect as that of the method for forming the first resin pattern can be obtained, the number of steps is smaller than that of the method for forming the first resin pattern, and the ultraviolet intensity at the time of exposure using the ultraviolet curable resin is: It can be significantly reduced compared to normal times.

【0021】前記第1のカラーフィルタ基板の製造方法
は、前記第1の樹脂パターンの形成方法を利用し、支持
体に3色の樹脂パターン(画素)を形成せしめる構成で
あり、第1の樹脂パターンの形成方法と同一効果をカラ
ーフィルタ基板にもたらすことになる。
The method of manufacturing the first color filter substrate utilizes the method of forming the first resin pattern to form resin patterns (pixels) of three colors on the support, and the first resin The same effect as that of the pattern forming method is brought to the color filter substrate.

【0022】前記第2のカラーフィルタ基板の製造方法
は、前記第2の樹脂パターンの形成方法を利用し、支持
体に3色の樹脂パターン(画素)を形成せしめる構成で
あり、第2の樹脂パターンの形成方法と同一効果をカラ
ーフィルタ基板にもたらすことになる。
The method of manufacturing the second color filter substrate is a structure in which resin patterns (pixels) of three colors are formed on the support by using the method of forming the second resin pattern. The same effect as that of the pattern forming method is brought to the color filter substrate.

【0023】[0023]

【発明の実施の形態】図1は本発明の第1の実施例によ
る樹脂パターン形成方法の説明図、図2は本発明の第2
の実施例による樹脂パターン形成方法の説明図である。
1 is an explanatory view of a resin pattern forming method according to a first embodiment of the present invention, and FIG. 2 is a second view of the present invention.
FIG. 6 is an explanatory diagram of a resin pattern forming method according to the example of FIG.

【0024】図1(a)において、ガラス等にてなる板
状支持体1の表面に、感光性樹脂または熱硬性型樹脂に
てなる樹脂膜2を成膜する。樹脂膜2は通常の方法、例
えばスピンコータまたはロールコータを使用して均一厚
さに成膜し、その厚さは必要とする膜厚より多少厚く、
例えば1.5μmの厚さの樹脂膜2が必要なときには、
1.8μm程度の厚さに成膜する。
In FIG. 1A, a resin film 2 made of a photosensitive resin or a thermosetting resin is formed on the surface of a plate-like support 1 made of glass or the like. The resin film 2 is formed to have a uniform thickness by using a usual method, for example, a spin coater or a roll coater, and the thickness is slightly thicker than the required film thickness.
For example, when the resin film 2 having a thickness of 1.5 μm is required,
The film is formed to a thickness of about 1.8 μm.

【0025】図1(b)において、下面が平坦な部材3
を用い、樹脂膜2の硬化温度より低く樹脂膜2に含まれ
る溶剤を除去するのに適当な温度、例えば90℃程度に
樹脂膜2を加熱しながら、樹脂膜2上の所望パターン部
分(所定部)を押圧する。
In FIG. 1B, the member 3 having a flat lower surface
While heating the resin film 2 at a temperature lower than the curing temperature of the resin film 2 and suitable for removing the solvent contained in the resin film 2, for example, about 90 ° C. Part).

【0026】樹脂膜2の加熱方法としては、例えば支持
体1をホットプレート8に搭載して加熱する。その結
果、樹脂膜2は溶剤が除去されて半硬化(プリベーキン
グ)状態になり、部材3による樹脂膜2の押圧部4は、
例えば深さ0.3μm程度の凹状に形成される。
As a method of heating the resin film 2, for example, the support 1 is mounted on a hot plate 8 and heated. As a result, the resin film 2 is in a semi-cured (pre-baked) state by removing the solvent, and the pressing portion 4 of the resin film 2 by the member 3 is
For example, it is formed in a concave shape having a depth of about 0.3 μm.

【0027】かかる押圧部4の支持体1に対する被着力
は、樹脂膜2が熱硬化性樹脂にてなるとき、前記押圧に
よって現像可能な状態(非押圧部より被着力が大)にな
るが、樹脂膜2が感光性樹脂にてなるとき、前記押圧部
に光例えは紫外線を照射し、押圧部を現像可能な架橋構
造にする必要がある。
When the resin film 2 is made of a thermosetting resin, the pressing force of the pressing portion 4 with respect to the support 1 becomes a developable state (the adhesion force is larger than that of the non-pressing portion) by the pressing, When the resin film 2 is made of a photosensitive resin, it is necessary to irradiate the pressing portion with light, for example, ultraviolet rays so that the pressing portion has a crosslinkable structure capable of developing.

【0028】ただし、紫外線硬化型樹脂にてなる樹脂膜
2の押圧部を、架橋構造とするのに必要な紫外線強度
は、20mJ/cm2 程度であり、通常の紫外線硬化型
樹脂膜に必要な紫外線強度の1/10〜1/5程度で済
む。
However, the ultraviolet intensity required to make the pressing portion of the resin film 2 made of an ultraviolet curable resin a crosslinked structure is about 20 mJ / cm 2, which is necessary for a normal ultraviolet curable resin film. It is about 1/10 to 1/5 of the ultraviolet intensity.

【0029】そこで、樹脂膜2を現像即ち樹脂膜2を適
当な溶剤で洗浄すると、図1(c)に示す如く、支持体
1の表面には樹脂パターン5′が形成される。なお、樹
脂膜2が富士ハントエレクトロニクステクノロジ株式会
社製のCR:7001、CG:7001またはCB:7
001で成膜されたものであるとき、前記溶剤として炭
酸水素ナトリウムを主成分とした無機アルカリ現像液を
使用する。
Therefore, when the resin film 2 is developed, that is, the resin film 2 is washed with an appropriate solvent, a resin pattern 5'is formed on the surface of the support 1 as shown in FIG. 1 (c). In addition, the resin film 2 is CR: 7001, CG: 7001 or CB: 7 manufactured by Fuji Hunt Electronics Technology Co., Ltd.
When the film is formed with 001, an inorganic alkali developing solution containing sodium hydrogen carbonate as a main component is used as the solvent.

【0030】次いで、樹脂パターン5′の硬化処理を施
す、即ち適当な温度例えば200℃で所定時間だけ加熱
すると、樹脂パターン5′は完全に硬化して図1(d)
に示す如く、支持体1の表面に樹脂パターン5が完成す
る。
Then, the resin pattern 5'is subjected to a curing treatment, that is, when it is heated at an appropriate temperature, for example, 200 ° C. for a predetermined time, the resin pattern 5'is completely cured, and FIG.
As shown in, the resin pattern 5 is completed on the surface of the support 1.

【0031】図2(a)において、ガラス等にてなる板
状支持体1の表面に、感光性樹脂にてなる樹脂膜9を成
膜する。樹脂膜9は通常の方法、例えばスピンコータま
たはロールコータを使用して均一厚さに成膜し、その厚
さは必要とする膜厚より多少厚く、例えば1.5μmの
厚さの樹脂膜2が必要なときには、1.8μm程度の厚
さに成膜する。
In FIG. 2A, a resin film 9 made of a photosensitive resin is formed on the surface of the plate-shaped support 1 made of glass or the like. The resin film 9 is formed to have a uniform thickness by using a usual method, for example, a spin coater or a roll coater, and the thickness thereof is slightly thicker than a required film thickness, for example, the resin film 2 having a thickness of 1.5 μm. When necessary, the film is formed to a thickness of about 1.8 μm.

【0032】図2(b)において、樹脂膜9に含まれる
溶剤を除去するのに適当な温度、例えば90℃程度に樹
脂膜9を加熱しながら、下面が平坦かつ透光性を有する
部材10で樹脂膜9上の所定部を押圧すると共に、部材
10を通して部材10押圧部に光線、例えば樹脂膜9が
紫外線硬化型樹脂にてなるときは紫外線UVを照射す
る。
In FIG. 2B, while the resin film 9 is heated to a temperature suitable for removing the solvent contained in the resin film 9, for example, about 90.degree. While pressing a predetermined portion on the resin film 9, the member 10 pressing portion is irradiated with light rays, for example, ultraviolet rays UV when the resin film 9 is made of an ultraviolet curable resin, through the member 10.

【0033】樹脂膜9の加熱方法としては、例えば支持
体1をホットプレート8に搭載して加熱し、樹脂膜9の
押圧部が現像処理に耐えうる架橋構造とする紫外線UV
は、非押圧部を照射しないように適当なマスク(図示せ
ず)を使用する。
As a method for heating the resin film 9, for example, the support 1 is mounted on a hot plate 8 and heated so that the pressing portion of the resin film 9 has a cross-linked structure that can withstand the developing process.
Uses a suitable mask (not shown) so as not to irradiate the non-pressed portion.

【0034】その結果、紫外線照射で架橋構造となった
樹脂膜9の部材10押圧部は、深さ0.3μm程度の凹
状になり、樹脂膜9全体はホットプレート8等からの加
熱によって、溶剤が除去されて半硬化(プリベーキン
グ)状態となる。
As a result, the member 10 pressing portion of the resin film 9 which has a cross-linked structure by the irradiation of ultraviolet rays has a concave shape with a depth of about 0.3 μm, and the entire resin film 9 is heated by the hot plate 8 etc. Are removed to be in a semi-cured (pre-baked) state.

【0035】樹脂膜9の押圧部に照射する前記紫外線U
Vの強度は例えば20mJ/cm2程度であり、この値
は、通常時即ち部材10による押圧なしで、樹脂膜9を
現像に耐える架橋構造とするのに必要な紫外線強度(1
00〜200mJ/cm2 )の、1/10〜1/5であ
る。
The ultraviolet rays U radiated to the pressing portion of the resin film 9
The intensity of V is, for example, about 20 mJ / cm 2 , and this value is an ultraviolet intensity (1 that is necessary for forming the resin film 9 in a crosslinked structure that can withstand development under normal conditions, that is, without pressing by the member 10.
It is 1/10 to ⅕ of 100 to 200 mJ / cm 2 .

【0036】次いで、樹脂膜9を現像即ち樹脂膜9を適
当な溶剤で洗浄(現像)すると、図2(c)に示す如
く、支持体1の表面に被着する樹脂パターン5が完成す
る。なお、前記紫外線強度20mJ/cm2 は、樹脂膜
9に富士ハントエレクトロニクステクノロジ株式会社製
のCR:7001、CG:7001またはCB:700
1を使用したときであり、その溶剤(現像液)として
は、炭酸水素ナトリウムを主成分とした無機アルカリ現
像液を使用した。
Next, the resin film 9 is developed, that is, the resin film 9 is washed (developed) with an appropriate solvent, and as shown in FIG. 2C, the resin pattern 5 to be adhered to the surface of the support 1 is completed. The ultraviolet intensity of 20 mJ / cm 2 is obtained by applying Fuji Hunt Electronics Technology Co., Ltd. CR: 7001, CG: 7001 or CB: 700 to the resin film 9.
1 was used, and as the solvent (developing solution), an inorganic alkaline developing solution containing sodium hydrogen carbonate as a main component was used.

【0037】図3は本発明の第1の実施例によるカラー
フィルタ基板の製造方法の説明図、図4は本発明の第2
の実施例によるカラーフィルタ基板の製造方法の説明
図、図5は本発明の第3の実施例によるカラーフィルタ
基板の製造方法の説明図である。
FIG. 3 is an explanatory view of a method of manufacturing a color filter substrate according to the first embodiment of the present invention, and FIG. 4 is a second view of the present invention.
5 is an explanatory view of a method of manufacturing a color filter substrate according to the embodiment of the present invention, and FIG. 5 is an explanatory view of a method of manufacturing a color filter substrate according to the third embodiment of the present invention.

【0038】図3(a)において、ガラス等にてなりブ
ラックマスク7が形成された板状支持体(基板)1の表
面に、第1の着色樹脂膜、例えば赤色着色剤を紫外線硬
化型樹脂(または紫外線以外の感光性樹脂または熱硬化
型樹脂)に分散させた着色樹脂膜11を成膜する。
In FIG. 3 (a), a first colored resin film, for example, a red colorant, is applied to the surface of a plate-shaped support (substrate) 1 made of glass or the like and having a black mask 7 formed thereon by an ultraviolet curable resin. (Or a colored resin film 11 dispersed in a photosensitive resin other than ultraviolet rays or a thermosetting resin) is formed.

【0039】ブラックマスク7は、画素間(着色樹脂パ
ターン間)の洩れ光防止、コントラストおよび色純度の
低下防止等のため形成されるものであり、一般に金属ク
ローム膜からパターン形成される。
The black mask 7 is formed to prevent leakage of light between pixels (between the colored resin patterns) and to prevent deterioration of contrast and color purity, and is generally formed of a metal chrome film.

【0040】樹脂膜11の成膜は通常の方法、例えばス
ピンコータまたはロールコータを使用して均一厚さに成
膜し、その厚さは必要とする膜厚より多少厚く、例えば
1.5μmの厚さの樹脂膜11が必要なときには、1.
8μm程度にする。
The resin film 11 is formed by a usual method, for example, by using a spin coater or a roll coater to a uniform thickness, and the thickness is a little thicker than a required film thickness, for example, a thickness of 1.5 μm. When the resin film 11 is needed, 1.
It is about 8 μm.

【0041】図3(b)において、下面の複数の所定部
に突起13が形成された押圧平版12を、適当な押圧力
で樹脂膜11に押し付ける。その際、樹脂膜11はその
硬化温度より適当に低く、かつ、樹脂膜11に含まれる
溶剤を除去するのに適当な温度、例えば樹脂膜11に赤
色着色剤を紫外線硬化型樹脂に分散させた樹脂(富士ハ
ントエレクトロニクステクノロジ株式会社製のCR:7
001)を使用したとき、樹脂膜11の加熱温度は90
℃程度である。 突起13の高さは、突起13の中間部
迄が樹脂膜11に埋入する程度、例えば数μm程度であ
り、樹脂膜11の前記加熱方法として本実施例では、支
持体1をホットプレート14に搭載し、支持体1を介し
て樹脂膜11が加熱されるようにした。
In FIG. 3B, the pressing planographic plate 12 having the projections 13 formed on a plurality of predetermined portions on the lower surface is pressed against the resin film 11 with an appropriate pressing force. At that time, the resin film 11 is appropriately lower than its curing temperature and at a temperature suitable for removing the solvent contained in the resin film 11, for example, a red colorant is dispersed in the ultraviolet curable resin in the resin film 11. Resin (CR: 7 manufactured by Fuji Hunt Electronics Technology Co., Ltd.
001) is used, the heating temperature of the resin film 11 is 90
It is about ℃. The height of the protrusion 13 is such that the intermediate portion of the protrusion 13 is embedded in the resin film 11, for example, about several μm. And the resin film 11 was heated via the support 1.

【0042】その結果、樹脂膜11は溶剤が除去されて
半硬化(プリベーキング)状態となり、突起13による
樹脂膜11の押圧部15は、例えば深さ0.3μm程度
の凹状に形成され、熱硬化性樹脂にてなる押圧部15の
支持体1に対する被着力は、その周囲の非押圧部より現
像可能に強くなり、感光性樹脂にてなる押圧部15は、
選択に適当強度の光例えば20mJ/cm2 程度の紫外
線を照射し、現像可能な架橋構造とする。
As a result, the resin film 11 is in a semi-cured (pre-baked) state by removing the solvent, and the pressing portion 15 of the resin film 11 by the protrusion 13 is formed in a concave shape with a depth of about 0.3 μm, for example, and is heated. The adherence force of the pressing portion 15 made of a curable resin to the support 1 is stronger than the surrounding non-pressing portion so that it can be developed, and the pressing portion 15 made of a photosensitive resin is
For selection, light having an appropriate intensity, for example, ultraviolet light of about 20 mJ / cm 2 is irradiated to form a developable crosslinked structure.

【0043】図3(b)内において、実線矢印Fは平版
12を樹脂膜11に向けて押す力、破線矢印H-1はホッ
トプレート14からの熱線を示す。また、突起13はそ
の下面が平坦であり、例えば押圧平版12本体に対し1
0μm程度突出し、かつ、少なくとも突起13の表面に
は樹脂膜11が被着しない非親水性膜、例えばシリコン
樹脂膜16を形成させることが望ましい。
In FIG. 3B, a solid arrow F indicates a force for pushing the lithographic plate 12 toward the resin film 11, and a broken arrow H −1 indicates a heat ray from the hot plate 14. The lower surface of the protrusion 13 is flat, and the protrusion 13 is
It is desirable to form a non-hydrophilic film, for example, a silicon resin film 16, which projects by about 0 μm and on which at least the surface of the protrusion 13 is not coated with the resin film 11.

【0044】次いで、樹脂膜11を現像液で洗浄する現
像処理、即ち樹脂膜11に前記CR:7001樹脂を使
用したときには、炭酸水素ナトリウムを主成分とした無
機アルカリ現像液で洗浄すると、図3(c)に示す如
く、樹脂膜11の非押圧部が除去され、支持体1の表面
には、突起13により押圧され支持体1の表面に被着し
た押圧部15が取り残されるようになる。
Next, a developing treatment for washing the resin film 11 with a developing solution, that is, when the CR: 7001 resin is used for the resin film 11, washing with an inorganic alkali developing solution containing sodium hydrogen carbonate as a main component is performed. As shown in (c), the non-pressed portion of the resin film 11 is removed, and the pressing portion 15 pressed by the protrusion 13 and adhered to the surface of the support 1 is left on the surface of the support 1.

【0045】そこで、取り残された押圧部15の硬化処
理、即ち樹脂膜11が完全硬化する温度に加熱すると、
押圧部15は完全に硬化(ポストベーキング)し、第1
の着色樹脂パターン(赤色樹脂パターン)18が完成す
る。
Therefore, when the remaining pressure portion 15 is cured, that is, heated to a temperature at which the resin film 11 is completely cured,
The pressing portion 15 is completely cured (post-baked), and the first
The colored resin pattern (red resin pattern) 18 of is completed.

【0046】以下、樹脂パターン18の形成と同様な工
程を経て、第2の着色樹脂パターン19、例えば緑色着
色剤が分散された樹脂パターン19を形成し、さらに第
3の着色樹脂パターン20、例えば青色着色剤が分散さ
れた樹脂パターン20を順次形成し、図3(d)に示す
カラーフィルタ基板21が完成する。
Thereafter, a second colored resin pattern 19, for example, a resin pattern 19 in which a green colorant is dispersed, is formed through the same steps as the formation of the resin pattern 18, and further a third colored resin pattern 20, for example, is formed. The resin pattern 20 in which the blue colorant is dispersed is sequentially formed to complete the color filter substrate 21 shown in FIG.

【0047】なお、樹脂パターン18〜20の形成に際
し、前記CR:7001樹脂およびCG:7001樹脂
とCB:7001樹脂(何れも富士ハントエレクトロニ
クステクノロジ株式会社製の商品名)を使用したとき、
樹脂を現像に耐えうる架橋構成とするため照射する前記
紫外線の強度は100〜200mj/cm2 であり、そ
の後の加熱条件は温度で200℃程度で約10分程度
(ホットプレート使用時)である。
When the resin patterns 18 to 20 are formed by using the CR: 7001 resin, the CG: 7001 resin and the CB: 7001 resin (all are trade names of Fuji Hunt Electronics Technology Co., Ltd.),
The intensity of the ultraviolet rays irradiated to make the resin have a cross-linking structure that can withstand development is 100 to 200 mj / cm 2 , and the heating condition thereafter is about 200 ° C. for about 10 minutes (when using a hot plate). .

【0048】また、樹脂パターン18〜20に熱硬化性
樹脂を使用したとき、それらを完全硬化(ポストベーキ
ング)させるには約200℃に加熱するが、その加熱時
間はホットプレート使用時で10分程度、オーブン使用
時には1〜2時間程度である。
When a thermosetting resin is used for the resin patterns 18 to 20, it is heated to about 200 ° C. to completely cure (post-baking) them, but the heating time is 10 minutes when using a hot plate. About 1 to 2 hours when using an oven.

【0049】図4(a)において、ガラス等にてなりブ
ラックマスク7が形成された板状支持体(基板)1の表
面に、第1の着色樹脂膜、例えば赤色着色剤を紫外線硬
化型樹脂(または紫外線以外の感光性樹脂または熱硬化
型樹脂)に分散させた着色樹脂膜11を、厚さ1.8μ
m程度に前記第1の実施例のそれと同様に成膜する。
In FIG. 4 (a), a first colored resin film, for example, a red colorant, is applied to the surface of a plate-shaped support (substrate) 1 made of glass or the like and having a black mask 7 formed thereon, using an ultraviolet curable resin. (Or a colored resin film 11 dispersed in a photosensitive resin or a thermosetting resin other than ultraviolet rays) having a thickness of 1.8 μm.
A film is formed to a thickness of about m in the same manner as that of the first embodiment.

【0050】図4(b)において、下面の複数の所定部
に突起13が形成された押圧平版12を、適当な押圧力
Fで樹脂膜11に押し付ける。その際、樹脂膜11はそ
の硬化温度より適当に低く、かつ、樹脂膜11に含まれ
る溶剤を除去するのに適当な温度、例えば樹脂膜11に
赤色着色剤を紫外線硬化型樹脂に分散させた樹脂(富士
ハントエレクトロニクステクノロジ株式会社製のCR:
7001)を使用したときには、樹脂膜11を90℃程
度に、上下両方向から加熱した状態で行なう。
In FIG. 4B, the pressing lithographic plate 12 having the projections 13 formed on a plurality of predetermined portions on the lower surface is pressed against the resin film 11 with an appropriate pressing force F. At that time, the resin film 11 is appropriately lower than its curing temperature and at a temperature suitable for removing the solvent contained in the resin film 11, for example, a red colorant is dispersed in the ultraviolet curable resin in the resin film 11. Resin (CR made by Fuji Hunt Electronics Technology Co., Ltd .:
When 7001) is used, the resin film 11 is heated to about 90 ° C. in both upper and lower directions.

【0051】樹脂膜11の前記加熱方法として本実施例
では、支持体1をホットプレート14に搭載し、支持体
1を介して樹脂膜11が下方から加熱されるようにする
と共に、押圧平版12を介して、即ち押圧平版12にヒ
ーターを内蔵せしめる等によって、樹脂膜11を上方か
らも加熱する。
In this embodiment, as a method for heating the resin film 11, the support 1 is mounted on the hot plate 14 so that the resin film 11 is heated from below via the support 1, and the pressing plate 12 is used. The resin film 11 is also heated from above, that is, by incorporating a heater in the pressing planographic plate 12.

【0052】その結果、樹脂膜11は溶剤が除去されて
半硬化(プリベーキング)状態となり、突起13による
樹脂膜11の押圧部15は、例えば深さ0.3μm程度
の凹状に形成され、熱硬化性樹脂にてなり非押圧部より
強い押圧部15の支持体1に対する被着力は、図3を用
いて説明した実施例より強固になる。
As a result, the resin film 11 is in a semi-cured (pre-baked) state because the solvent is removed, and the pressing portion 15 of the resin film 11 by the protrusion 13 is formed in a concave shape with a depth of about 0.3 μm, for example, and is heated. The adherence of the pressing portion 15 made of a curable resin and stronger than the non-pressing portion to the support 1 is stronger than that in the embodiment described with reference to FIG.

【0053】ただし、樹脂膜11が感光性樹脂にてなる
とき、押圧部15にはマスクを使用して選択に適当強度
の光、例えば20mJ/cm2 程度の紫外線を照射し、
押圧部15のみを現像可能な架橋構造とする。
However, when the resin film 11 is made of a photosensitive resin, a mask is used for the pressing portion 15 to irradiate light having an appropriate intensity for selection, for example, ultraviolet rays of about 20 mJ / cm 2 ,
Only the pressing portion 15 has a crosslinkable structure capable of developing.

【0054】その結果、樹脂膜11は溶剤が除去されて
半硬化(プリベーキング)状態となり、突起13による
樹脂膜11の押圧部15は、例えば深さ0.3μm程度
の凹状に形成され、かつ、現像可能状態になる。
As a result, the resin film 11 is in a semi-cured (pre-baked) state because the solvent is removed, and the pressing portion 15 of the resin film 11 by the protrusion 13 is formed in a concave shape with a depth of about 0.3 μm, for example. , Ready for development.

【0055】図4(b)内において、破線矢印H-1はホ
ットプレート14からの熱線、破線矢印H-2は押圧平版
12を介して樹脂膜11を加熱する熱線であり、突起1
3の表面には樹脂膜11が被着しないシリコン樹脂膜1
6を形成してある。
In FIG. 4B, a broken line arrow H -1 is a heat line from the hot plate 14, a broken line arrow H -2 is a heat line for heating the resin film 11 via the pressing planographic plate 12, and the projection 1
Silicon resin film 1 in which resin film 11 does not adhere to the surface of 3
6 is formed.

【0056】そこで、樹脂膜11を現像液で洗浄する現
像処理、即ち樹脂膜11に前記CR:7001樹脂を使
用したときには、炭酸水素ナトリウムを主成分とした無
機アルカリ現像液で洗浄すると、支持体1の表面には押
圧部15が取り残されるようになり、前記第1の実施例
において説明した方法と同一方法で、押圧部15の硬化
処理を施すと図4(c)に示す如く、支持体1の表面に
第1の着色樹脂パターン(赤色樹脂パターン)18が完
成する。
Therefore, the developing treatment for washing the resin film 11 with a developing solution, that is, when the CR: 7001 resin is used for the resin film 11, if the washing is carried out with an inorganic alkaline developing solution containing sodium hydrogen carbonate as a main component, The pressing portion 15 is left on the surface of No. 1, and when the pressing portion 15 is hardened by the same method as described in the first embodiment, as shown in FIG. The first colored resin pattern (red resin pattern) 18 is completed on the surface of No. 1.

【0057】次いで、樹脂パターン18の形成と同様な
工程を経て、第2の着色樹脂パターン19、例えば緑色
着色剤が分散された樹脂パターン19を形成し、さらに
第3の着色樹脂パターン20、例えば青色着色剤が分散
された樹脂パターン20を順次形成し、図4(d)に示
すカラーフィルタ基板21が完成する。
Then, a second colored resin pattern 19, for example, a resin pattern 19 in which a green colorant is dispersed, is formed through the same steps as the formation of the resin pattern 18, and further a third colored resin pattern 20, for example, is formed. The resin pattern 20 in which the blue colorant is dispersed is sequentially formed, and the color filter substrate 21 shown in FIG. 4D is completed.

【0058】図5(a)において、ガラス等にてなりブ
ラックマスク7が形成された板状支持体(基板)1の表
面に、第1の着色樹脂膜、例えば赤色着色剤を感光性樹
脂の一種である紫外線硬化型樹脂に分散させた着色樹脂
膜31を成膜する。
In FIG. 5A, a first colored resin film, for example, a red colorant is used as a photosensitive resin on the surface of the plate-shaped support (substrate) 1 made of glass or the like and on which the black mask 7 is formed. A colored resin film 31 dispersed in a kind of ultraviolet curable resin is formed.

【0059】樹脂膜31の成膜は通常の方法、例えばス
ピンコータまたはロールコータを使用して均一厚さに成
膜し、その厚さは必要とする膜厚より多少厚く、例えば
1.5μmの厚さの樹脂膜31が必要なときには、1.
8μm程度にする。
The resin film 31 is formed by a usual method, for example, by using a spin coater or a roll coater to a uniform thickness, and the thickness is a little thicker than the required film thickness, for example, 1.5 μm. When the resin film 31 of the depth is required, 1.
It is about 8 μm.

【0060】図5(b)において、下面の複数の所定部
に突起13が形成され透光性材料、例えばガラスにてな
る押圧平版32を、適当な押圧力Fで樹脂膜31に押し
付け、樹脂膜31に押圧部35を形成させる。
In FIG. 5B, a pressing plate 32 made of a translucent material, such as glass, having projections 13 formed on a plurality of predetermined portions on the lower surface is pressed against the resin film 31 with an appropriate pressing force F, The pressing portion 35 is formed on the film 31.

【0061】押圧平版32の下面は、突起13形成部を
除いて遮光膜36が形成されており、樹脂膜31は樹脂
膜31に含まれる溶剤を除去するのに適当な温度、例え
ば樹脂膜31に赤色着色剤を紫外線硬化型樹脂(富士ハ
ントエレクトロニクステクノロジ株式会社製のCR:7
001)を使用したときには、樹脂膜31が90℃程度
になるように、例えばホットプレート14に支持体1を
搭載し、支持体1を介して樹脂膜31を加熱する共に、
押圧部35には押圧平版32を透過し、押圧部35を架
橋構造にする紫外線UVを照射する。
A light-shielding film 36 is formed on the lower surface of the pressing lithographic plate 32 except for the projection 13 forming portion, and the resin film 31 has a temperature suitable for removing the solvent contained in the resin film 31, for example, the resin film 31. A red colorant is added to the UV curable resin (CR: 7 manufactured by Fuji Hunt Electronics Technology Co., Ltd.
001) is used, the support 1 is mounted on, for example, the hot plate 14 so that the temperature of the resin film 31 is about 90 ° C., and the resin film 31 is heated via the support 1.
The pressing portion 35 is irradiated with ultraviolet rays UV that pass through the pressing planographic plate 32 and make the pressing portion 35 have a crosslinked structure.

【0062】紫外線UVの強度は、通常時における強度
の1/5程度、即ち押圧力Fを印加しない樹脂膜31を
架橋構造とするのに必要な紫外線強度が、100〜20
0mj/cm2 であるのに対し、本実施例における紫外
線UVの強度は20mj/cm2 で済むようになる。
The intensity of the ultraviolet rays UV is about ⅕ of the ordinary intensity, that is, the ultraviolet ray intensity required for forming the resin film 31 to which the pressing force F is not applied has a crosslinked structure is 100 to 20.
Whereas it is 0 mJ / cm 2, the strength of the ultraviolet UV in this embodiment is as suffices 20 mJ / cm 2.

【0063】その結果、押圧部35は例えば深さ3μm
程度の凹状となって硬化し、かつ支持体1に対する押圧
部35の被着力は、その周囲の非押圧部より強くなる。
なお、押圧平版32の突起13の表面は、前出の押圧平
版12のそれと同じく、樹脂膜31の被着を防止する非
親水性膜、例えばシリコン樹脂膜16を被着させること
が望ましい。
As a result, the pressing portion 35 has, for example, a depth of 3 μm.
The depression portion 35 is hardened into a concave shape, and the adherence of the pressing portion 35 to the support 1 is stronger than that of the surrounding non-pressing portion.
It is desirable that the surface of the projection 13 of the pressure plate 32 is coated with a non-hydrophilic film, for example, a silicon resin film 16 that prevents the resin film 31 from being deposited, as in the case of the pressure plate 12 described above.

【0064】次いで、樹脂膜31を現像液で洗浄する現
像処理、即ち樹脂膜31に前記CR:7001を使用し
たときには、炭酸水素ナトリウムを主成分とした無機ア
ルカリ現像液で洗浄すると、図5(c)に示す如く、支
持体11の表面には、押圧部35が硬化し取り残された
赤色樹脂パターン18が形成されるようになる。
Next, a developing treatment for washing the resin film 31 with a developing solution, that is, when CR: 7001 is used for the resin film 31, washing with an inorganic alkaline developing solution containing sodium hydrogen carbonate as a main component is performed. As shown in c), the red resin pattern 18 is formed on the surface of the support 11 because the pressing portion 35 is hardened and left unremoved.

【0065】以下樹脂パターン18と同様に第2の樹脂
パターン19、例えば緑色着色剤が分散された樹脂パタ
ーン19を形成し、さらに第3の樹脂パターン20、例
えば青色着色剤が分散された樹脂パターン20を順次形
成し、図5(d)に示すカラーフィルタ基板21が完成
する。
Similar to the resin pattern 18, a second resin pattern 19, for example, a resin pattern 19 in which a green colorant is dispersed is formed, and a third resin pattern 20, for example, a resin pattern in which a blue colorant is dispersed, is formed. 20 are sequentially formed to complete the color filter substrate 21 shown in FIG.

【0066】なお、図5(b)において、実線矢印Fは
押圧平版32を樹脂膜31に押し込む力、破線矢印H-1
はホットプレート14からの熱線、一点鎖線UVは押圧
平版32を透過して押圧部35に照射する紫外線であ
る。
In FIG. 5 (b), the solid line arrow F is the force for pushing the pressing plate 32 into the resin film 31, and the broken line arrow H -1.
Is a heat ray from the hot plate 14, and a dashed-dotted line UV is an ultraviolet ray which is transmitted through the pressing planographic plate 32 and is applied to the pressing portion 35.

【0067】図6は本発明の第4の実施例に使用する樹
脂膜押圧用円筒版の説明図、図7は本発明の第5の実施
例に使用する樹脂膜押圧用円筒版の説明図である。図
3、4または5を使用し説明した前記実施例では、複数
の突起13を設けた押圧平版12または32を利用して
いる。かかる押圧平版12または32は、樹脂膜に対し
複数の所定部を同時に押圧可能にする利点があるが、本
発明の第4または第5の実施例では、押圧平版12また
は32に代えて押圧円筒版を使用する。
FIG. 6 is an illustration of a resin film pressing cylinder plate used in the fourth embodiment of the present invention, and FIG. 7 is an illustration of a resin film pressing cylinder plate used in the fifth embodiment of the present invention. Is. In the embodiment described with reference to FIGS. 3, 4 and 5, the pressing planographic plate 12 or 32 provided with a plurality of protrusions 13 is used. The pressing planographic plate 12 or 32 has an advantage that a plurality of predetermined portions can be simultaneously pressed against the resin film, but in the fourth or fifth embodiment of the present invention, a pressing cylinder is used instead of the pressing planographic plate 12 or 32. Use the edition.

【0068】図6において、押圧平版12に代えて使用
する押圧円筒版41は、回転可能な円筒面の複数の所定
個所に突起42が形成され、かつ、軸心を水平に支持し
た状態で円筒面が上下動可能に、図示しない押圧装置に
装着され使用する。
In FIG. 6, a pressing cylinder plate 41 used in place of the pressing planographic plate 12 has a cylindrical shape in which projections 42 are formed at a plurality of predetermined positions on a rotatable cylindrical surface and the shaft center is supported horizontally. It is used by mounting it on a pressing device (not shown) so that its surface can move up and down.

【0069】押圧平版12の突起13に相当する複数の
突起42の先端面は、円筒版母体44の軸心に対し適当
に大径の円筒面の一部であり、突起42の表面は非親水
性膜(図示せず)で被覆してある。
The tip surfaces of the plurality of projections 42 corresponding to the projections 13 of the pressing planographic plate 12 are a part of a cylindrical surface having an appropriately large diameter with respect to the axis of the cylindrical plate mother body 44, and the surfaces of the projections 42 are non-hydrophilic. Coated with a flexible film (not shown).

【0070】突起42を樹脂膜11に押圧するには図6
(b)に示す如く、支持体1を搭載し固定したホットプ
レート14を、所定速度で所定方向(図の左方向)に移
動させると共に、円筒版41を所定速度で左方向に回転
させる。
To press the protrusion 42 against the resin film 11, FIG.
As shown in (b), the hot plate 14 on which the support 1 is mounted and fixed is moved in a predetermined direction (left direction in the figure) at a predetermined speed, and the cylindrical plate 41 is rotated leftward at a predetermined speed.

【0071】その結果、樹脂膜11の所定部は図の左側
から順次突起42に押圧され、その押圧部は、支持体1
をホットプレート14で所定温度に加熱することとあい
まって、支持体1に被着されるようになる。
As a result, the predetermined portion of the resin film 11 is pressed against the protrusion 42 in sequence from the left side of the drawing, and the pressed portion is the support 1
When heated to a predetermined temperature on the hot plate 14, it becomes attached to the support 1.

【0072】以下、図3を用いた第1の実施例および図
4を用いた第1の実施例における樹脂膜11の現像とそ
の現像によって支持体1に残置する樹脂パターンの硬化
工程によって、第1の樹脂パターン18が形成(図3お
よび図4参照)され、その樹脂パターン18と同様に、
第2の樹脂パターン19と第3の樹脂パターン20を形
成し、図3(d)または図4(d)に示すカラーフィル
タ基板21が完成する。
In the following, by the developing process of the resin film 11 in the first embodiment using FIG. 3 and the first embodiment using FIG. 4 and the curing process of the resin pattern remaining on the support 1 by the development, The resin pattern 18 of No. 1 is formed (see FIGS. 3 and 4), and like the resin pattern 18,
The second resin pattern 19 and the third resin pattern 20 are formed, and the color filter substrate 21 shown in FIG. 3D or 4D is completed.

【0073】図7において、押圧平版32に代えて使用
するため透光材料にてなる押圧円筒版45は、回転可能
な円筒面の複数の所定個所に突起42が形成され、か
つ、軸心を水平に支持した状態で円筒面が上下動可能
に、図示しない押圧装置に装着され使用する。
In FIG. 7, a pressing cylinder plate 45 made of a light-transmitting material to be used in place of the pressing planographic plate 32 has projections 42 formed at a plurality of predetermined positions on a rotatable cylindrical surface and has an axial center. It is used by mounting it on a pressing device (not shown) so that the cylindrical surface can move up and down while being supported horizontally.

【0074】押圧平版32の突起13に相当する複数の
突起42の先端面は、円筒版母体44の軸心に対し適当
に大径の円筒面の一部であり、突起42の表面は、紫外
線の透過を妨げない非親水性膜(図示せず)で被覆し、
突起42が形成されない表面には、遮光膜43が形成し
てある。
The tip surfaces of the plurality of projections 42 corresponding to the projections 13 of the pressing planographic plate 32 are a part of a cylindrical surface having an appropriately large diameter with respect to the axial center of the cylindrical plate matrix 44, and the surfaces of the projections 42 are ultraviolet rays. Coated with a non-hydrophilic membrane (not shown) that does not prevent permeation of
A light shielding film 43 is formed on the surface where the protrusions 42 are not formed.

【0075】突起42を紫外線硬化型樹脂にてなる樹脂
膜31に押圧するには、図7(b)に示す如く、支持体
1を搭載し固定したホットプレート14を、所定速度で
所定方向(図の左方向)に移動させると共に、紫外線源
(または紫外線源からの光学系)46および円筒マスク
47を内蔵した円筒版45を、所定速度で左方向に回転
させる。
In order to press the protrusion 42 against the resin film 31 made of an ultraviolet curable resin, as shown in FIG. 7B, the hot plate 14 on which the support 1 is mounted and fixed is moved at a predetermined speed in a predetermined direction ( While moving to the left in the figure), the cylindrical plate 45 containing the ultraviolet light source (or the optical system from the ultraviolet light source) 46 and the cylindrical mask 47 is rotated leftward at a predetermined speed.

【0076】円筒マスク47は下部に紫外線照射用の窓
48があけられている。そして、樹脂膜31の所定部は
図の左側から順次突起42に押圧され、その押圧部は、
支持体1をホットプレート14で所定温度に加熱される
と共に、紫外線が照射され架橋構造になる。
A window 48 for irradiating ultraviolet rays is opened at the bottom of the cylindrical mask 47. Then, a predetermined portion of the resin film 31 is sequentially pressed by the protrusion 42 from the left side of the drawing, and the pressing portion is
The support 1 is heated to a predetermined temperature by the hot plate 14 and irradiated with ultraviolet rays to form a crosslinked structure.

【0077】以下、図5を用いた第3の実施例における
樹脂膜31の現像工程によって、第1の樹脂パターン1
8が形成(図5参照)され、その樹脂パターン18と同
様に、第2の樹脂パターン19と第3の樹脂パターン2
0を形成し、図5(d)またに示すカラーフィルタ基板
21が完成する。
Hereinafter, the first resin pattern 1 is formed by the developing process of the resin film 31 in the third embodiment shown in FIG.
8 is formed (see FIG. 5), and like the resin pattern 18, the second resin pattern 19 and the third resin pattern 2 are formed.
0 is formed, and the color filter substrate 21 shown in FIG.

【0078】[0078]

【発明の効果】以上説明したように、本発明による樹脂
パターンの形成方法およびカラーフィルタ基板の製造方
法は、フォトリソグラフィー技術を必要としないため、
従来の着色剤分散法および染色法より形成または製造が
容易である。
As described above, the method for forming a resin pattern and the method for manufacturing a color filter substrate according to the present invention do not require a photolithography technique.
Easier to form or manufacture than conventional colorant dispersion and dyeing methods.

【0079】さらに、本発明による樹脂パターンの形成
方法およびカラーフィルタ基板の製造方法を、従来の印
刷法および電着法と対比させたとき、印刷法のインク転
写時の糸引きが生じないないためパターン精度および信
頼性に優れ、電着法における煩雑な電着液の管理を必要
としない。
Further, when the resin pattern forming method and the color filter substrate manufacturing method according to the present invention are compared with the conventional printing method and electrodeposition method, stringing does not occur during ink transfer in the printing method. It has excellent pattern accuracy and reliability, and does not require complicated management of the electrodeposition liquid in the electrodeposition method.

【0080】従って、本発明による樹脂パターンの形成
方法およびカラーフィルタ基板の製造方法は、従来の着
色剤分散法および染色法における精度と信頼性を確保
し、かつ、従来の着色剤分散法および染色法より安価な
製品を提供可能にする。
Therefore, the resin pattern forming method and the color filter substrate manufacturing method according to the present invention ensure accuracy and reliability in the conventional colorant dispersion method and dyeing method, and the conventional colorant dispersion method and dyeing method. It enables us to provide products that are cheaper than the law.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の第1の実施例による樹脂パターン形
成方法の説明図
FIG. 1 is an explanatory diagram of a resin pattern forming method according to a first embodiment of the present invention.

【図2】 本発明の第2の実施例による樹脂パターン形
成方法の説明図
FIG. 2 is an explanatory view of a resin pattern forming method according to a second embodiment of the present invention.

【図3】 本発明の第1の実施例によるカラーフィルタ
基板の製造方法の説明図
FIG. 3 is an explanatory diagram of a method for manufacturing a color filter substrate according to the first embodiment of the present invention.

【図4】 本発明の第2の実施例によるカラーフィルタ
基板の製造方法の説明図
FIG. 4 is an explanatory diagram of a method for manufacturing a color filter substrate according to a second embodiment of the present invention.

【図5】 本発明の第3の実施例によるカラーフィルタ
基板の製造方法の説明図
FIG. 5 is an explanatory diagram of a method of manufacturing a color filter substrate according to a third embodiment of the present invention.

【図6】 本発明の第4の実施例に使用する樹脂膜押圧
用円筒版の説明図
FIG. 6 is an explanatory view of a resin film pressing cylinder plate used in a fourth embodiment of the present invention.

【図7】 本発明の第5の実施例に使用する樹脂膜押圧
用円筒版の説明図
FIG. 7 is an explanatory view of a resin film pressing cylinder plate used in a fifth embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 支持体 2,9,11,31 樹脂膜 3 樹脂膜押圧部材 4,15 樹脂膜の押圧部 5,18,19,20 樹脂パターン 5′ 硬化前の樹脂パターン 8,14 ホットプレート 12,32 押圧平版 21 カラーフィルタ基板 41,45 押圧円筒版 F 押圧力 H-1,H-2 熱線 UV 紫外線1 Support 2,9,11,31 Resin Film 3 Resin Film Pressing Member 4,15 Resin Film Pressing Part 5,18,19,20 Resin Pattern 5 ′ Resin Pattern Before Curing 8,14 Hot Plate 12,32 Pressing Flat plate 21 Color filter substrate 41, 45 Pressing cylinder plate F Pressing force H -1 , H -2 Heat ray UV UV

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 支持体の表面に感光性樹脂または熱硬化
性樹脂の樹脂膜を形成させる成膜工程と、 該樹脂の溶剤を除去する温度に該樹脂膜を加熱しながら
選択的に押圧し、その押圧部を該支持体に被着させる被
着工程と、 該樹脂膜の非押圧部を除去する現像工程と、 該支持体に被着する該樹脂膜の押圧部を硬化させる硬化
工程を含むこと、 を特徴とする樹脂パターンの形成方法。
1. A film forming step of forming a resin film of a photosensitive resin or a thermosetting resin on the surface of a support, and selectively pressing while heating the resin film to a temperature at which the solvent of the resin is removed. A depositing step of depositing the pressing portion on the support, a developing step of removing the non-pressing portion of the resin film, and a curing step of curing the pressing portion of the resin film deposited on the support. A method for forming a resin pattern, comprising:
【請求項2】 支持体の表面に感光性樹脂の樹脂膜を形
成させる成膜工程と、 該樹脂の溶剤を除去する温度に該樹脂膜を加熱しながら
選択的に押圧すると共に、その押圧部に該樹脂膜が感光
する光を選択的に照射する押圧露光工程と、 該樹脂膜の非押圧部を除去する現像工程と、 該支持体に被着する該樹脂膜の押圧部を硬化させる硬化
工程を含むこと、 を特徴とする樹脂パターンの形成方法。
2. A film forming step of forming a resin film of a photosensitive resin on the surface of a support, and a step of selectively pressing the resin film while heating the resin film to a temperature at which the solvent of the resin is removed, and a pressing portion thereof. A pressure exposure step of selectively irradiating the resin film with light to which the resin film is exposed, a development step of removing the non-pressed portion of the resin film, and a curing step of curing the pressed portion of the resin film adhered to the support. A method of forming a resin pattern, comprising the steps of:
【請求項3】 前記感光性樹脂が紫外線硬化型樹脂であ
り、前記光が紫外線であること、 を特徴とする請求項2記載の樹脂パターンの形成方法。
3. The method for forming a resin pattern according to claim 2, wherein the photosensitive resin is an ultraviolet curable resin, and the light is ultraviolet light.
【請求項4】 第1の着色剤を感光性樹脂または熱硬化
性樹脂に分散させた第1の着色樹脂にてなる第1の着色
樹脂膜を支持体の表面に形成させる第1の成膜工程と、 該第1の着色樹脂膜に含む溶剤を除去する温度に、該第
1の着色樹脂膜を加熱しながら選択的に押圧し、その押
圧部を該支持体に被着させる第1の被着工程と、 該第1の着色樹脂膜の非押圧部を除去する第1の現像工
程と、 該支持体に被着する該第1の着色樹脂膜の押圧部を硬化
させる第1の硬化工程と、 第2の着色剤を感光性樹脂または熱硬化性樹脂に分散さ
せた第2の着色樹脂にてなる第2の着色樹脂膜を、該支
持体の表面に形成させる第2の成膜工程と、 該第2の着色樹脂膜に含む溶剤を除去する温度に該第2
の着色樹脂膜を加熱しながら選択的に押圧し、その押圧
部を該支持体に被着させる第2の被着工程と、 該第2の着色樹脂膜の非押圧部を除去する第2の現像工
程と、 該支持体に被着する該第2の着色樹脂膜の押圧部を硬化
させる第2の硬化工程と、 第3の着色剤を感光性樹脂または熱硬化性樹脂に分散さ
せた第3の着色樹脂にてなる第3の着色樹脂膜を、該支
持体の表面に形成させる第3の成膜工程と、 該第3の着色樹脂膜に含む溶剤を除去する温度に該第3
の着色樹脂膜を加熱しながら選択的に押圧し、その押圧
部を該支持体に被着させる第3の被着工程と、 該第3の着色樹脂膜の非押圧部を除去する第3の現像工
程と、 該支持体に被着する該第3の着色樹脂膜の押圧部を硬化
させる第3の硬化工程とを含むこと、 を特徴とするカラーフィルタ基板の製造方法。
4. A first film forming method for forming a first colored resin film made of a first colored resin in which a first colored agent is dispersed in a photosensitive resin or a thermosetting resin on a surface of a support. And a step of selectively pressing the first colored resin film while heating the first colored resin film to a temperature at which the solvent contained in the first colored resin film is removed, and applying the pressing portion to the support. Adhering step, first developing step of removing the non-pressed portion of the first colored resin film, and first curing of hardening the pressed portion of the first colored resin film attached to the support. Second step of forming a second colored resin film made of a second colored resin in which a second colored agent is dispersed in a photosensitive resin or a thermosetting resin on the surface of the support. And the temperature at which the solvent contained in the second colored resin film is removed.
A second attaching step of selectively pressing the colored resin film while heating and applying the pressed portion to the support; and a second removing step of removing the non-pressed portion of the second colored resin film. A developing step, a second curing step of curing the pressing portion of the second colored resin film adhered to the support, and a third step of dispersing a third colorant in a photosensitive resin or a thermosetting resin. A third film forming step of forming a third colored resin film made of the third colored resin on the surface of the support, and the third film forming step at a temperature at which the solvent contained in the third colored resin film is removed.
Third heating step of selectively pressing the colored resin film while heating, and applying the pressed portion to the support, and a third step of removing the non-pressed portion of the third colored resin film. A method of manufacturing a color filter substrate, comprising: a developing step; and a third curing step of curing a pressing portion of the third colored resin film adhered to the support.
【請求項5】 第1の着色剤を感光性樹脂に分散させた
第1の着色樹脂にてなる第1の着色樹脂膜を、支持体の
表面に形成させる第1の成膜工程と、 該第1の着色樹脂膜に含む溶剤を除去する温度に該第1
の着色樹脂膜を加熱しながら、選択的に押圧すると共
に、その押圧部に該第1の着色樹脂膜が感光する光を選
択的に照射する第1の押圧露光工程と、 該第1の着色樹脂膜の非押圧部を除去し第1の樹脂パタ
ーンを形成させる第1の現像工程と、 該第1の樹脂パターンを硬化させる第1の硬化工程と、 第2の着色剤を感光性樹脂に分散させた第2の着色樹脂
にてなる第2の着色樹脂膜を、該支持体の表面に形成さ
せる第2の成膜工程と、 該第2の着色樹脂膜に含む溶剤を除去する温度に該第2
の着色樹脂膜を加熱しながら、選択的に押圧すると共
に、その押圧部に該第2の着色樹脂膜が感光する光を選
択的に照射する第2の押圧露光工程と、 該第2の着色樹脂膜の非押圧部を除去し第2の樹脂パタ
ーンを形成させる第2の現像工程と、 該第2の樹脂パターンを硬化させる第2の硬化工程と、 第3の着色剤を感光性樹脂に分散させた第3の着色樹脂
にてなる第3の着色樹脂膜を、該支持体の表面に形成さ
せる第3の成膜工程と、 該第3の着色樹脂膜に含む溶剤を除去する温度に該第3
の着色樹脂膜を加熱しながら、選択的に押圧すると共
に、その押圧部に該第3の着色樹脂膜が感光する光を選
択的に照射する第3の押圧露光工程と、 該第3の着色樹脂膜の非押圧部を除去し第3の樹脂パタ
ーンを形成させる第3の現像工程と、 該第3の樹脂パターンを硬化させる第3の硬化工程とを
含むこと、 を特徴とするカラーフィルタ基板の製造方法。
5. A first film forming step of forming on a surface of a support a first colored resin film made of a first colored resin in which a first colorant is dispersed in a photosensitive resin, The first colored resin film is heated to a temperature at which the solvent contained in the first colored resin film is removed.
And a first pressing and exposing step of selectively pressing the colored resin film while heating the colored resin film, and selectively irradiating the pressing portion with light that the first colored resin film sensitizes. A first developing step of removing a non-pressed portion of the resin film to form a first resin pattern, a first curing step of curing the first resin pattern, and a second colorant to a photosensitive resin. A second film forming step of forming a second colored resin film made of the dispersed second colored resin on the surface of the support, and a temperature for removing the solvent contained in the second colored resin film. The second
And a second pressing and exposing step of selectively pressing the colored resin film while heating the colored resin film, and selectively irradiating the pressing portion with light that the second colored resin film sensitizes. A second developing step of removing the non-pressed portion of the resin film to form a second resin pattern, a second curing step of curing the second resin pattern, and a third colorant as a photosensitive resin. A third film forming step of forming a third colored resin film composed of the dispersed third colored resin on the surface of the support, and a temperature for removing the solvent contained in the third colored resin film. The third
And a third press exposure step of selectively pressing the colored resin film while heating the colored resin film, and selectively irradiating the pressing portion with light that the third colored resin film exposes. A color filter substrate, comprising: a third developing step of removing a non-pressed portion of the resin film to form a third resin pattern; and a third curing step of curing the third resin pattern. Manufacturing method.
【請求項6】 前記第1、第2および第3の着色樹脂膜
を選択的に押圧するのに際し、平板の複数の所定部に先
端が平坦な複数の突起を形成した押圧平版を使用するこ
と、 を特徴とする請求項4または5記載のカラーフィルタ基
板の製造方法。
6. Use of a pressure lithographic plate in which a plurality of predetermined portions of a flat plate are formed with a plurality of protrusions having flat tips when selectively pressing the first, second and third colored resin films. The method for manufacturing a color filter substrate according to claim 4 or 5, wherein:
【請求項7】 前記第1、第2および第3の着色樹脂膜
を選択的に押圧するのに際し、円筒面の複数の所定部に
突起が突出し、該突起の先端面が該円筒面と同心かつ大
径の円筒面の一部である押圧円筒版を使用すること、 を特徴とする請求項4または5記載のカラーフィルタ基
板の製造方法。
7. When selectively pressing the first, second, and third colored resin films, protrusions protrude from a plurality of predetermined portions of a cylindrical surface, and the tip surfaces of the protrusions are concentric with the cylindrical surface. A method of manufacturing a color filter substrate according to claim 4 or 5, wherein a pressing cylinder plate which is a part of a large-diameter cylindrical surface is used.
【請求項8】 前記感光性樹脂が紫外線硬化性樹脂であ
り、前記光が紫外線であること、 を特徴とする請求項4または5記載のカラーフィルタ基
板の製造方法。
8. The method for manufacturing a color filter substrate according to claim 4, wherein the photosensitive resin is an ultraviolet curable resin, and the light is ultraviolet light.
【請求項9】 前記押圧平版または押圧円筒版を前記溶
剤除去温度に加熱し、前記第1、第2および第3の着色
樹脂膜の所定部を押圧すること、 を特徴とする請求項7または8記載のカラーフィルタ基
板の製造方法。
9. The pressing planographic plate or pressing cylinder plate is heated to the solvent removal temperature to press a predetermined portion of the first, second, and third colored resin films. 8. The method for manufacturing a color filter substrate according to item 8.
JP5470796A 1996-03-12 1996-03-12 Formation of resin pattern and production of color filter substrate Withdrawn JPH09243817A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5470796A JPH09243817A (en) 1996-03-12 1996-03-12 Formation of resin pattern and production of color filter substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5470796A JPH09243817A (en) 1996-03-12 1996-03-12 Formation of resin pattern and production of color filter substrate

Publications (1)

Publication Number Publication Date
JPH09243817A true JPH09243817A (en) 1997-09-19

Family

ID=12978281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5470796A Withdrawn JPH09243817A (en) 1996-03-12 1996-03-12 Formation of resin pattern and production of color filter substrate

Country Status (1)

Country Link
JP (1) JPH09243817A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000264000A (en) * 1999-03-15 2000-09-26 Dainippon Printing Co Ltd Color-changing vapor deposition medium and its manufacture
US7698999B2 (en) 2004-03-04 2010-04-20 Asml Netherlands B.V. Printing apparatus and device manufacturing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000264000A (en) * 1999-03-15 2000-09-26 Dainippon Printing Co Ltd Color-changing vapor deposition medium and its manufacture
US7698999B2 (en) 2004-03-04 2010-04-20 Asml Netherlands B.V. Printing apparatus and device manufacturing method
US7730834B2 (en) 2004-03-04 2010-06-08 Asml Netherlands B.V. Printing apparatus and device manufacturing method

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