JPH09237957A - Alumina circuit board and manufacture thereof - Google Patents

Alumina circuit board and manufacture thereof

Info

Publication number
JPH09237957A
JPH09237957A JP8042527A JP4252796A JPH09237957A JP H09237957 A JPH09237957 A JP H09237957A JP 8042527 A JP8042527 A JP 8042527A JP 4252796 A JP4252796 A JP 4252796A JP H09237957 A JPH09237957 A JP H09237957A
Authority
JP
Japan
Prior art keywords
weight
circuit board
alumina
metal
conductor layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8042527A
Other languages
Japanese (ja)
Inventor
Katsura Hayashi
桂 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP8042527A priority Critical patent/JPH09237957A/en
Publication of JPH09237957A publication Critical patent/JPH09237957A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/009After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/5133Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of one or more of the refractory metals
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/5138Metallising, e.g. infiltration of sintered ceramic preforms with molten metal with a composition mainly composed of Mn and Mo, e.g. for the Moly-manganese method
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844Uses not provided for elsewhere in C04B2111/00 for electronic applications

Abstract

PROBLEM TO BE SOLVED: To provide a reliable circuit board, using as its insulating substrate alumina ceramic containing blackening agent, and, even after electroless plating, free from plate sticking to its portions where the plate is undesirable. SOLUTION: A conductor paste containing either or both of W and Mo as the main components is applied to a molded body that contains Al2 O3 as the main component and 0.01-5wt.% of at least one element selected from Mo, W and Nb in terms of metal, and, in some cases, has carbon powder added. The workpiece is then fired in a non-oxidizing atmosphere to obtain a board 1 made of black ceramic, the total amount of carbon of which is 0.005-3wt.%. Thereafter, an electroless plating layer 3 of Ni, Au or the like is formed on the surface of the conductor layer 2 on the board 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、多層配線基板及び
半導体素子収納用パッケージなどに適した黒色系のアル
ミナ質セラミックスを絶縁基板とし、導体層の表面に無
電解メッキ層が施された回路基板とその製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a circuit board in which a black alumina ceramic suitable for a multilayer wiring board, a package for housing a semiconductor element, etc. is used as an insulating board and an electroless plating layer is formed on the surface of a conductor layer. And its manufacturing method.

【0002】[0002]

【従来技術】従来から、アルミナ質セラミックスは、高
絶縁抵抗、耐薬品性等に優れることから、多層配線基板
及び半導体素子収納用パッケージなどの絶縁基板として
多用されている。このような絶縁基板として用いられる
アルミナ質セラミックスに要求される性質としては、耐
熱性等の熱的性質、強度等の機械的性質、耐食性等の化
学的性質、導電性等の電磁気的性質がある。また、これ
らの性質のほかに外観が黒色であることも好まれる。こ
れは、黒色の場合には僅かな塵埃でも発見が容易であ
り、また、黒色の場合には部品が摩耗したり、破損した
場合、その部位をはっきりと識別することができ、また
レーザーによるマーキングや光学的にワイヤーボンディ
ングする際の視認性を高めることができるためである。
さらに、黒色は重厚感があり、審美性に優れるからであ
る。
2. Description of the Related Art Conventionally, alumina-based ceramics have been widely used as insulating substrates such as multilayer wiring boards and semiconductor element housing packages because they are excellent in high insulation resistance and chemical resistance. Properties required for the alumina ceramics used as such an insulating substrate include thermal properties such as heat resistance, mechanical properties such as strength, chemical properties such as corrosion resistance, and electromagnetic properties such as conductivity. . In addition to these properties, a black appearance is also preferable. This is because if it is black, it is easy to find even a small amount of dust, and if it is black, the part can be clearly identified when it is worn or damaged, and it can be marked with a laser. This is because the visibility at the time of optically wire-bonding can be improved.
In addition, black has a profound feeling and is excellent in aesthetics.

【0003】このような黒色系のアルミナ質セラミック
スは、従来より、黒色化剤として、Cr、Nb、W、M
oなどの酸化物を添加し、成形後1300℃以上の温度
で焼成することにより製造され、詳細には、特公昭56
−23532号、特公昭61−12868号、特開平1
−282147号等に記載されている。
Such black alumina ceramics have conventionally been used as blackening agents for Cr, Nb, W and M.
It is produced by adding an oxide such as o and firing at a temperature of 1300 ° C. or higher after molding.
No. 23532, Japanese Examined Patent Publication No. 61-12868, JP-A-1
No. -282147.

【0004】一方、回路基板においては、導体の酸化防
止と低抵抗化のために、導体層の表面にメッキ層を形成
することが行われており、最近では、無電解メッキ法に
より形成することが行われている。この無電解メッキ法
は、導体層が形成された基板をメッキ液中に浸漬して金
属のイオン化傾向の差を利用して導体層の表面にメッキ
層を形成するものである。
On the other hand, in the circuit board, a plating layer is formed on the surface of the conductor layer in order to prevent oxidation of the conductor and to reduce the resistance. Recently, the plating layer is formed by electroless plating. Is being done. In this electroless plating method, a substrate on which a conductor layer is formed is immersed in a plating solution to form a plating layer on the surface of the conductor layer by utilizing the difference in ionization tendency of metal.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、無電解
メッキ法によりメッキを行う場合、アルミナ質セラミッ
クス中に黒色化剤として、W、Mo等の化合物等が含ま
れていると、セラミックス焼成時、特にWやMo等の導
体との同時焼成時に非酸化性雰囲気で焼成すると、その
雰囲気による還元作用によって、セラミックスの表面の
上記黒色化剤が還元されて金属として析出してしまう結
果、メッキ処理時に導体層以外に、この析出金属の表面
にまでメッキ層が形成されてしまうという問題があっ
た。
However, when plating is performed by the electroless plating method, if a compound such as W or Mo is contained as a blackening agent in the alumina-based ceramics, especially when firing the ceramics. When firing in a non-oxidizing atmosphere at the time of co-firing with a conductor such as W or Mo, the blackening agent on the surface of the ceramic is reduced by the reducing action of the atmosphere and deposited as a metal. In addition to the layers, there is a problem that a plating layer is formed even on the surface of the deposited metal.

【0006】このような導体層以外での不要なメッキの
付着現象は、電気回路の高密度化によって導体層間の間
隔が狭くなるに伴い、回路の信頼性を損ねる大きな問題
となっている。
Such an unnecessary adhesion phenomenon of plating on the layers other than the conductor layer has become a serious problem that impairs the reliability of the circuit as the distance between the conductor layers becomes narrower due to the higher density of the electric circuit.

【0007】従って、本発明は、黒色化剤を含有するア
ルミナ質セラミックスを絶縁基板とする回路基板におい
て、無電解メッキによっても不要なメッキ付着を起すこ
とのない信頼性の高い回路基板を提供することを目的と
するものである。
Therefore, the present invention provides a highly reliable circuit board which does not cause unnecessary plating adhesion even by electroless plating in a circuit board using an alumina ceramic containing a blackening agent as an insulating substrate. That is the purpose.

【0008】[0008]

【課題を解決するための手段】本発明者は、上記の課題
に対して、検討を重ねた結果、黒色化剤を含むアルミナ
質セラミックス中に、炭素を一定量含有せしめることに
よって、無電解メッキ液中での還元作用を抑制でき、こ
れにより不要なメッキを付着を防止できることを見出
し、本発明に至った。
As a result of repeated studies on the above problems, the present inventor found that a certain amount of carbon was contained in alumina ceramics containing a blackening agent to achieve electroless plating. The present inventors have found that the reducing action in a liquid can be suppressed, and thus unnecessary plating can be prevented from adhering to the present invention.

【0009】即ち、本発明のアルミナ質回路基板は、A
2 3 を主体とし、Mo、WおよびNbの群から選ば
れる少なくとも1種を金属換算で0.01〜5重量%、
さらに炭素を全量中0.005〜3重量%の割合で含有
する黒色系セラミックスからなる絶縁基板の表面に、
W、Moの少なくとも1種を主体とする導体層を形成
し、さらに該導体層の表面に無電解メッキ層が形成され
てなることを特徴とするものである。
That is, the alumina-based circuit board of the present invention is
l 2 O 3 as a main component, Mo, at least one of 0.01 to 5 wt% in terms of metal selected from the group consisting of W and Nb,
Further, on the surface of the insulating substrate made of black ceramics containing carbon in a proportion of 0.005 to 3% by weight in the total amount,
The present invention is characterized in that a conductor layer mainly containing at least one of W and Mo is formed, and an electroless plating layer is further formed on the surface of the conductor layer.

【0010】さらに、本発明のアルミナ質回路基板の製
造方法によれば、Al2 3 に対して、Mo、Wおよび
Nbの群から選ばれる少なくとも1種の金属、あるいは
その化合物を金属換算で0.01〜5重量%、場合によ
って炭素粉末を3重量%以下の割合で含有するシート状
成形体の表面にW,Moの少なくとも1種を主体とする
導体ペーストを塗布して非酸化性雰囲気中で焼成して全
炭素量が0.005〜3重量%の黒色系セラミックスか
らなる絶縁基板の表面に導体層を形成した基板を作製し
た後、前記導体層の表面に無電解メッキ法によって、メ
ッキ層を形成したことを特徴とするものである。
Further, according to the method for producing an alumina circuit board of the present invention, at least one metal selected from the group consisting of Mo, W and Nb, or a compound thereof, in terms of metal, is added to Al 2 O 3 . A non-oxidizing atmosphere is obtained by applying a conductor paste mainly containing at least one of W and Mo to the surface of a sheet-shaped compact containing 0.01 to 5% by weight, and optionally 3% by weight or less of carbon powder. After firing in, a substrate having a conductor layer formed on the surface of an insulating substrate made of black ceramics having a total carbon content of 0.005 to 3% by weight is prepared, and then the surface of the conductor layer is electroless plated by an electroless plating method. It is characterized in that a plating layer is formed.

【0011】また、上記構成において、黒色化剤とし
て、さらにCr、またはCr化合物を添加して、セラミ
ックス中にCrを金属換算で0.03〜1.5重量%の
割合で含有することを特徴とするものである。
In the above structure, Cr or a Cr compound is further added as a blackening agent, and Cr is contained in the ceramic in a proportion of 0.03 to 1.5% by weight in terms of metal. It is what

【0012】[0012]

【作用】本発明のアルミナ質回路基板によれば、絶縁基
板のアルミナ質セラミックス中に、黒色化剤とともに、
一定量の炭素を含有せしめることにより、無電解メッキ
液により還元作用によって、生成した金属がセラミック
ス中の炭素により炭化されてそのイオン化傾向を低下さ
せてメッキの付着を抑制することができる。その結果、
導体層以外の部分への不要なメッキ付着が防止でき、黒
色を有しながらも信頼性の高い回路を形成することがで
きる。よって、高密度配線化により配線層間の距離が2
00μm以下、特に100μm以下、さらには50μm
以下と間隔が狭くなった場合においても本発明の構成に
よれば、高信頼性の回路を形成することができる。
According to the alumina-based circuit board of the present invention, in the alumina-based ceramic of the insulating substrate, together with the blackening agent,
By containing a certain amount of carbon, the generated metal is carbonized by the carbon in the ceramic by the reducing action of the electroless plating solution, the ionization tendency thereof is lowered, and the adhesion of the plating can be suppressed. as a result,
It is possible to prevent unnecessary plating from adhering to portions other than the conductor layer, and it is possible to form a highly reliable circuit while having a black color. Therefore, due to high-density wiring, the distance between wiring layers is 2
00 μm or less, especially 100 μm or less, further 50 μm
According to the configuration of the present invention, a highly reliable circuit can be formed even when the interval becomes narrower than the following.

【0013】[0013]

【発明の実施の形態】本発明のアルミナ質回路基板は、
図1に示すようにアルミナ質セラミックスからなる絶縁
基板1と、少なくとも絶縁基板1の表面に導体層2が形
成されており、さらに導体層2の表面にはメッキ層3が
形成されるものである。
BEST MODE FOR CARRYING OUT THE INVENTION The alumina-based circuit board of the present invention is
As shown in FIG. 1, an insulating substrate 1 made of alumina ceramics, a conductor layer 2 is formed on at least the surface of the insulating substrate 1, and a plating layer 3 is further formed on the surface of the conductor layer 2. .

【0014】本発明によれば、上記アルミナ質セラミッ
クスは、Al2 3 を主体とし、少なくともMo、Wお
よびNbの群から選ばれる少なくとも1種を金属換算で
0.01〜5重量%、特に0.5〜3重量%の割合で含
有するものである。これらの添加物は、いわゆる黒色化
するためのものであり、これらの含有量が0.01重量
%より少ないと黒色化が不十分であり、5重量%を越え
ると電気絶縁性が低下して、回路基板として使用できな
いためである。
According to the present invention, the above-mentioned alumina-based ceramic is mainly composed of Al 2 O 3 and contains at least one selected from the group consisting of Mo, W and Nb in an amount of 0.01 to 5% by weight in terms of metal, especially The content is 0.5 to 3% by weight. These additives are for so-called blackening. If the content of these additives is less than 0.01% by weight, the blackening is insufficient, and if it exceeds 5% by weight, the electrical insulation is deteriorated. , Because it cannot be used as a circuit board.

【0015】黒色化のための好適な態様としては、Cr
を金属換算で0.03〜1.5重量%、Nb、Moおよ
びWのうちの少なくとも1種を金属換算で0.5〜3重
量%の割合で含有し、その合計量が1〜4重量%となる
ように調製するのがよい。これは、上記の組み合わせに
よって、深みのある黒色が得られるためである。ただ
し、Cr量が1.5重量%を越えると、焼結性が低下
し、ボイドが増加し強度が低下する傾向にあり、Nb、
MoおよびWのうちの少なくとも1種が3重量%を越え
ると、電気絶縁性が低下する傾向にあるためである。
A preferred embodiment for blackening is Cr
In an amount of 0.03 to 1.5% by weight in terms of metal and at least one of Nb, Mo and W in an amount of 0.5 to 3% by weight in terms of metal, and the total amount is 1 to 4% by weight. It is better to prepare it so that it becomes%. This is because a deep black color is obtained by the above combination. However, if the amount of Cr exceeds 1.5% by weight, the sinterability tends to decrease, the number of voids tends to increase, and the strength tends to decrease.
This is because if at least one of Mo and W exceeds 3% by weight, the electrical insulation tends to decrease.

【0016】また、本発明においては、アルミナ質セラ
ミックス中における全炭素量が0.005〜3重量%、
特に0.01〜2重量%であることが重要である。この
全炭素量を上記の範囲に限定したのは、0.005重量
%未満では不要なメッキ付着の改善が出来ず、3重量%
を越えるとセラミックスにボイドが増加して強度が低下
するためである。この炭素には、セラミックス中に遊離
炭素として存在するか、または金属炭化物中の炭素分が
含まれる。
Further, in the present invention, the total amount of carbon in the alumina ceramics is 0.005 to 3% by weight,
It is particularly important that the content is 0.01 to 2% by weight. The reason why the total carbon amount is limited to the above range is that if less than 0.005% by weight, unnecessary plating adhesion cannot be improved and 3% by weight
This is because the voids increase in the ceramics and the strength decreases when it exceeds. This carbon exists as free carbon in the ceramics or includes carbon content in the metal carbide.

【0017】また、本発明におけるアルミナ質セラミッ
クスには、焼結助剤成分として、Si、MgおよびCa
のうちの少なくとも1種を酸化物換算で0.1〜8重量
%の割合で含有する事が焼結性を改善する上で望まし
い。しかし、8重量%を越えるとセラミックス中のガラ
ス成分が過多となりボイドが増加し強度が低下する傾向
に有るからである。
Further, the alumina-based ceramics of the present invention contains Si, Mg and Ca as sintering aid components.
In order to improve the sinterability, it is desirable to contain at least one of the above in a ratio of 0.1 to 8% by weight in terms of oxide. However, if it exceeds 8% by weight, the glass component in the ceramics becomes excessive and voids increase, and the strength tends to decrease.

【0018】さらに、本発明の回路基板において、上記
アルミナ質セラミックスからなる絶縁基板の表面に形成
される導体層としては、W、Moのうちの少なくとも1
種であり、5〜20μmの厚みで形成される。また、こ
の導体層の表面に形成される無電解メッキ層としては、
Ni、Au、Co、Crのうちの少なくとも1種の金属
から構成されるもので、導体層の表面に0.05〜3μ
mの厚みで形成される。
Further, in the circuit board of the present invention, the conductor layer formed on the surface of the insulating substrate made of alumina ceramics is at least one of W and Mo.
It is a seed and is formed with a thickness of 5 to 20 μm. Further, as the electroless plating layer formed on the surface of this conductor layer,
It is composed of at least one metal selected from Ni, Au, Co and Cr, and is 0.05 to 3 μm on the surface of the conductor layer.
It is formed with a thickness of m.

【0019】本発明におけるアルミナ質セラミックスを
製造するには、まず、Al2 3 粉末に対して、Mo、
WおよびNbの群から選ばれる金属、またはその酸化物
や炭化物のうちの少なくとも1種を金属換算で0.01
〜5重量%の割合で添加する。また、所望により、Si
2 、MgO、CaOの少なくとも一種を0.1〜8重
量%、Crの酸化物または炭化物を金属換算で0.03
〜1.5重量%の割合で添加する。
In order to produce the alumina-based ceramics of the present invention, first, Al 2 O 3 powder is mixed with Mo,
0.01 or more of at least one metal selected from the group consisting of W and Nb, or an oxide or carbide thereof, in terms of metal.
~ 5% by weight. Also, if desired, Si
0.1 to 8% by weight of at least one of O 2 , MgO and CaO, and 0.03 in terms of metal of oxide or carbide of Cr.
~ 1.5 wt% added.

【0020】そして、この混合物にさらに有機バインダ
ー等の成形用助剤を添加して、これを所望の成形手段、
例えば、ドクターブレード法、圧延法、金型プレス、冷
間静水圧プレス、押出し成形等により任意の形状に成形
する。
Then, a molding aid such as an organic binder is further added to the mixture, and the mixture is mixed with a desired molding means,
For example, a doctor blade method, a rolling method, a die press, a cold isostatic press, an extrusion molding, or the like is used to form an arbitrary shape.

【0021】次に、この成形体は、200〜500℃の
加湿された窒素水素混合雰囲気中で有機バインダー等の
成形用助剤を分解除去した後、1400〜1600℃の
窒素水素混合雰囲気中で焼成することにより、相対密度
96%以上に緻密化することができる。
Next, this molded body is decomposed and removed by a molding aid such as an organic binder in a humidified nitrogen-hydrogen mixed atmosphere at 200 to 500 ° C., and then in a nitrogen-hydrogen mixed atmosphere at 1400 to 1600 ° C. By calcination, the relative density can be densified to 96% or more.

【0022】本発明によれば、最終的に得られる焼結体
中に炭素を0.005〜3重量%の割合で含有せしめる
ことが必要である。そのためには、成形体作製時に添加
物としてCr、Mo、WおよびNbの群から選ばれる少
なくと1種の金属炭化物を添加するか、または炭素粉末
を3重量%以下の割合で添加して制御する。また、成形
用助剤は、通常完全に除去するものであるが、この分解
除去工程を制御して、添加した有機バインダーの分解除
去における残炭素量によっても制御することができる。
また、導体層を有する回路基板を作製するには、上記の
ようにして作製したアルミナ質セラミック基板の表面
に、Mo−Mn等のメタライズインクを回路パターンに
塗布して1300〜1500℃で焼き付け処理するか、
望ましくは上記のアルミナ質成形体の表面にW、Mo等
の金属を主体とするメタライズインクを回路パターンに
塗布し、所望により多層圧着後に、窒素などの非酸化性
雰囲気中で1350〜1650℃の温度で0.5〜5時
間程度、メタライズインクととも同時焼成することによ
り導体層を有する回路基板を作製することができる。
According to the present invention, it is necessary to contain carbon in a proportion of 0.005 to 3% by weight in the finally obtained sintered body. For that purpose, at least one kind of metal carbide selected from the group of Cr, Mo, W and Nb is added as an additive at the time of forming a molded body, or carbon powder is added at a ratio of 3% by weight or less to control. To do. Further, although the molding aid is usually completely removed, it can also be controlled by controlling the decomposition and removal step and the residual carbon amount in the decomposition and removal of the added organic binder.
Further, in order to manufacture a circuit board having a conductor layer, a circuit pattern is coated with a metallized ink such as Mo-Mn on the surface of the alumina-based ceramic board manufactured as described above and baked at 1300 to 1500 ° C. Or,
Desirably, a metallized ink mainly composed of a metal such as W or Mo is applied to a circuit pattern on the surface of the above-mentioned alumina-based molded body, and if desired after multi-layer pressure bonding, it is heated at 1350 to 1650 ° C in a non-oxidizing atmosphere such as nitrogen. A circuit board having a conductor layer can be produced by co-firing with a metallizing ink at a temperature of about 0.5 to 5 hours.

【0023】そののち、上記のようにして得られた回路
基板を、Ni、Au等のメッキ金属が配合された無電解
メッキ液中に浸漬することにより、導体層のみにメッキ
層を形成することができる。
After that, the circuit board obtained as described above is dipped in an electroless plating solution containing a plating metal such as Ni or Au to form a plating layer only on the conductor layer. You can

【0024】[0024]

【実施例】原料粉末として、平均粒径が1μmのAl2
3 粉末に対して、焼結助剤としてSiO2 3重量%、
CaO1重量%、MgO2重量%の割合で添加し、さら
に黒色化剤として表1の金属または化合物、さらに場合
によっては炭素粉末を用いて、表1に示すような割合と
なるように秤量後、有機バインダーとしてポリエチレン
グリコールを添加して、ボールミルで混合し、これをテ
ープ成形した。そしてそのテープ成形体の表面にWメタ
ライズインクを回路パターンに焼成後の厚みが15μm
となるようにスクリーン印刷した。そしてこのシート状
成形体を250〜500℃の加湿された窒素水素混合雰
囲気中で脱バインダー処理し、さらに1550℃の窒素
水素混合雰囲気中で2時間焼成した。その後、この基板
を無電解メッキ液に浸漬して、導体層の表面に0.5μ
mの厚みのAuメッキ層を形成した。
[Example] As a raw material powder, Al 2 having an average particle size of 1 μm
3 % by weight of SiO 2 as a sintering aid to O 3 powder,
1% by weight of CaO and 2% by weight of MgO were added, and a metal or compound of Table 1 was used as a blackening agent, and further carbon powder was used in some cases. Polyethylene glycol was added as a binder, mixed by a ball mill, and tape-molded. The thickness of the tape molded body after firing W metallized ink into a circuit pattern is 15 μm.
It was screen printed so that Then, the sheet-shaped compact was debindered in a humidified nitrogen-hydrogen mixed atmosphere at 250 to 500 ° C., and was further fired in a nitrogen-hydrogen mixed atmosphere at 1550 ° C. for 2 hours. After that, this substrate is immersed in an electroless plating solution to form 0.5μ on the surface of the conductor layer.
An Au plating layer having a thickness of m was formed.

【0025】また、アルミナ質セラミックスの強度等の
物性を測定するために、上記の混合粉末を6×4×50
mmの大きさにプレス成形した後、上記と同様な温度で
焼成して焼結体を作製した。
Further, in order to measure the physical properties such as strength of the alumina-based ceramics, the mixed powder described above was used in an amount of 6 × 4 × 50.
After press-molding to a size of mm, it was fired at the same temperature as above to produce a sintered body.

【0026】[0026]

【表1】 [Table 1]

【0027】得られた焼結体に対して、アルキメデス法
により相対密度を、JIS3081に基づき3点曲げ抗
折強度を測定し、炭素分析装置によって、セラミックス
中の全炭素量を測定した。また、セラミックス自体の絶
縁抵抗を測定し、セラミックスの色調を調べた。さら
に、回路基板において、無電解メッキ後の回路パターン
における導体線路間へのメッキの付着を観察した。これ
らの結果は、いずれも表2に示した。
With respect to the obtained sintered body, the relative density was measured by the Archimedes method, and the three-point bending bending strength was measured based on JIS3081, and the total carbon amount in the ceramics was measured by the carbon analyzer. In addition, the insulation resistance of the ceramics itself was measured to examine the color tone of the ceramics. Further, on the circuit board, adhesion of plating between the conductor lines in the circuit pattern after electroless plating was observed. The results are shown in Table 2.

【0028】[0028]

【表2】 [Table 2]

【0029】表1、2の結果によれば、全炭素量が0.
005重量%よりも少ない試料No.1では、導体層以外
でのメッキの付着が多数認められ、3重量%を越える試
料No.7では、強度が低く、絶縁抵抗が1012Ω−cm
と小さくなり、絶縁基板として適さないものであった。
また、黒色化剤としてのMo、WおよびNbの総量が5
重量%を越える試料No.11、16、18では、強度が
低下したり、不要な部分へのメッキの付着が生じる等の
問題があった。また、上記総量が0.01重量%より少
ない試料No.19では、良好な黒色化ができなかった。
According to the results shown in Tables 1 and 2, the total carbon content was 0.
In Sample No. 1 with less than 005 wt%, many adhesion of plating other than the conductor layer was observed, and in Sample No. 7 with more than 3 wt%, strength was low and insulation resistance was 10 12 Ω-cm.
It became smaller and was not suitable as an insulating substrate.
Further, the total amount of Mo, W and Nb as a blackening agent is 5
Samples Nos. 11, 16 and 18 in which the content was more than 10% by weight had problems such as a decrease in strength and the deposition of plating on unnecessary portions. Further, in Sample No. 19 in which the total amount was less than 0.01% by weight, good blackening could not be achieved.

【0030】これらの比較例に対して、本発明品は、い
ずれも45kg/mm2 以上の高い強度を有しつつ、絶
縁抵抗1013Ω−cm以上、黒〜黒紫色を呈し、且つ無
電解メッキによる導体層以外へのメッキの付着は認めら
れなかった。
In contrast to these comparative examples, the products of the present invention have high strength of 45 kg / mm 2 or more, insulation resistance of 10 13 Ω-cm or more, black to black purple, and electroless. No adhesion of plating to the parts other than the conductor layer due to plating was observed.

【0031】[0031]

【発明の効果】以上詳述した通り、本発明のアルミナ質
回路基板は、黒色系で、高強度,高電気絶縁性等の物性
を有するとともに、無電解メッキにおいて導電線路間の
不要なメッキ付着を防止できる結果、微細配線を有する
回路基板の製造においても不良が少ない生産性に優れた
基板を提供できる。
As described in detail above, the alumina-based circuit board of the present invention is black and has physical properties such as high strength and high electric insulation, and unnecessary plating adhesion between conductive lines in electroless plating. As a result, it is possible to provide a board having excellent productivity with few defects even in the manufacture of a circuit board having fine wiring.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の回路基板の概略図である。FIG. 1 is a schematic view of a circuit board of the present invention.

【符号の説明】[Explanation of symbols]

1 絶縁基板 2 導体層 3 メッキ層 1 Insulating substrate 2 Conductor layer 3 Plating layer

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 // H05K 1/03 610 H01L 23/14 M ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location // H05K 1/03 610 H01L 23/14 M

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】Al2 3 を主体とし、Mo、WおよびN
bの群から選ばれる少なくとも1種を金属換算で0.0
1〜5重量%、さらに炭素を全量中0.005〜3重量
%の割合で含有する黒色系セラミックスからなる絶縁基
板の表面に、W、Moの少なくとも1種を主体とする導
体層を形成し、さらに該導体層の表面に無電解メッキ層
が形成されてなることを特徴とするアルミナ質回路基
板。
1. Mainly composed of Al 2 O 3 , Mo, W and N
At least one selected from the group b is 0.0 in terms of metal.
1 to 5% by weight, and a conductor layer mainly containing at least one of W and Mo is formed on the surface of an insulating substrate made of black ceramics containing carbon in an amount of 0.005 to 3% by weight in the total amount. An alumina-based circuit board, further comprising an electroless plating layer formed on the surface of the conductor layer.
【請求項2】前記セラミックスが、さらにCrを金属換
算で0.03〜1.5重量%の割合で含有することを特
徴とする請求項1記載のアルミナ質回路基板。
2. The alumina circuit board according to claim 1, wherein the ceramic further contains Cr in a ratio of 0.03 to 1.5% by weight in terms of metal.
【請求項3】Al2 3 に対して、Mo、WおよびNb
の群から選ばれる少なくとも1種の金属、あるいはその
化合物を金属換算で0.01〜5重量%、炭素粉末を0
〜3重量%(0を含む)の割合で含有するシート状成形
体の表面にW,Moの少なくとも1種を主体とする導体
ペーストを塗布して非酸化性雰囲気中で焼成して全炭素
量が0.005〜3重量%の黒色系セラミックスからな
る絶縁基板の表面に導体層を形成した基板を作製した
後、前記導体層の表面に無電解メッキ法によって、メッ
キ層を形成したことを特徴とするアルミナ質回路基板の
製造方法。
3. Mo, W and Nb with respect to Al 2 O 3 .
0.01 to 5% by weight of metal, or at least one metal selected from the group
To 3 wt% (including 0) of the sheet-shaped molded body is coated with a conductive paste containing at least one of W and Mo and baked in a non-oxidizing atmosphere to obtain a total carbon content. Of 0.005 to 3% by weight of black ceramics on which a conductor layer is formed on the surface of the substrate, and then a plating layer is formed on the surface of the conductor layer by electroless plating. And a method for manufacturing an alumina circuit board.
【請求項4】前記成形体中に、さらにCrを金属換算で
0.03〜1.5重量%の割合で含有することを特徴と
する請求項3記載のアルミナ質回路基板の製造方法。
4. The method for producing an alumina-based circuit board according to claim 3, wherein the molded body further contains Cr in a proportion of 0.03 to 1.5% by weight in terms of metal.
JP8042527A 1996-02-29 1996-02-29 Alumina circuit board and manufacture thereof Pending JPH09237957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8042527A JPH09237957A (en) 1996-02-29 1996-02-29 Alumina circuit board and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8042527A JPH09237957A (en) 1996-02-29 1996-02-29 Alumina circuit board and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH09237957A true JPH09237957A (en) 1997-09-09

Family

ID=12638558

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8042527A Pending JPH09237957A (en) 1996-02-29 1996-02-29 Alumina circuit board and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH09237957A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231424A (en) * 2001-01-31 2002-08-16 Kyocera Corp Ceramic heater and method of its manufacture and wafer heating system using this ceramic heater
WO2010095723A1 (en) * 2009-02-20 2010-08-26 大日本印刷株式会社 Conductive substrate
WO2023022051A1 (en) * 2021-08-20 2023-02-23 住友化学株式会社 Method for producing alumina sintered body

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002231424A (en) * 2001-01-31 2002-08-16 Kyocera Corp Ceramic heater and method of its manufacture and wafer heating system using this ceramic heater
WO2010095723A1 (en) * 2009-02-20 2010-08-26 大日本印刷株式会社 Conductive substrate
US9420698B2 (en) 2009-02-20 2016-08-16 Dai Nippon Printing Co., Ltd. Conductive substrate comprising a metal fine particle sintered film
WO2023022051A1 (en) * 2021-08-20 2023-02-23 住友化学株式会社 Method for producing alumina sintered body

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