JPH09222431A - Force microscope apparatus - Google Patents

Force microscope apparatus

Info

Publication number
JPH09222431A
JPH09222431A JP8030624A JP3062496A JPH09222431A JP H09222431 A JPH09222431 A JP H09222431A JP 8030624 A JP8030624 A JP 8030624A JP 3062496 A JP3062496 A JP 3062496A JP H09222431 A JPH09222431 A JP H09222431A
Authority
JP
Japan
Prior art keywords
cantilever
optical
photodetector
light source
force microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8030624A
Other languages
Japanese (ja)
Inventor
Takashi Morimoto
高史 森本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Construction Machinery Co Ltd
Original Assignee
Hitachi Construction Machinery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Construction Machinery Co Ltd filed Critical Hitachi Construction Machinery Co Ltd
Priority to JP8030624A priority Critical patent/JPH09222431A/en
Publication of JPH09222431A publication Critical patent/JPH09222431A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01QSCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q20/00Monitoring the movement or position of the probe
    • G01Q20/02Monitoring the movement or position of the probe by optical means

Abstract

PROBLEM TO BE SOLVED: To provide a force microscope apparatus whose configuration can be made easy even when an optical lever-type displacement detection optical system is used. SOLUTION: A scanning mechanism 1, an approach and retreat mechanism 5, an optical microscope 11, a laser light source 6 and a photodetector 7 are attached to a support structure 12. A reflection member 10 which comprises a reflecting face 10a is attached to the rear of a probe 4 at a cantilever 3. When the angle of the reflecting face 10a is selected properly, the laser light source 6 and the photodetector 7 can be arranged in positions which are deviated from the opticap path of the optical microscope 11, and the configuration of an apparatus can be made easy.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光学顕微鏡と光てこ方
式の変位検出光学系とを用いた力顕微鏡装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a force microscope apparatus using an optical microscope and an optical lever type displacement detecting optical system.

【0002】[0002]

【従来の技術】力顕微鏡は、先端の尖った探針を試料に
対してナノメートル(nm)オーダまで接近させ、その
とき探針と試料との間に生じる原子間力を測定すること
により、試料表面の形状等を原子寸法レベルで計測する
装置である。このような力顕微鏡装置は、ばね定数が極
めて低いカンチレバーと呼ばれるレバーを用い、このカ
ンチレバーの先端に備えた探針に作用する原子間力をカ
ンチレバーのたわみ量として検出する。そして、このカ
ンチレバーのたわみ量は光てこ方式と呼ばれる変位検出
光学系により検出される。
2. Description of the Related Art In a force microscope, a probe with a sharp tip is brought close to a sample to the order of nanometer (nm), and the atomic force generated between the probe and the sample at that time is measured. This is a device that measures the shape of the sample surface at the atomic level. Such a force microscope apparatus uses a lever called a cantilever having an extremely low spring constant, and detects an atomic force acting on a probe provided at the tip of the cantilever as a deflection amount of the cantilever. The deflection amount of the cantilever is detected by a displacement detection optical system called an optical lever method.

【0003】図2は光てこ方式を用いた従来の原子間力
顕微鏡装置の概略構成図である。この図で、1は測定対
象となる試料、2は試料1を載置するとともにこれを二
次元(X軸およびY軸方向)に走査させる走査機構、3
はカンチレバー、4はカンチレバー3の先端に取り付け
られた探針、5はカンチレバー3を固定しこれを図で上
下方向(Z軸方向)に変位させて探針4を試料1に接
近、退避させる接近・退避機構である。6はレーザ光
源、7はカンチレバーの背面で反射したレーザ光源6か
らの光を受光する光検出器である。8は走査機構2、接
近・退避機構5、光源6、および光検出器7を支持する
支持構造である。レーザ光源6、カンチレバー3の背面
の反射面、および光検出器7で構成される光てこ方式の
変位検出光学系は、例えば特開平5−187862号公
報等に開示されている。
FIG. 2 is a schematic configuration diagram of a conventional atomic force microscope apparatus using an optical lever system. In this figure, 1 is a sample to be measured, 2 is a scanning mechanism on which the sample 1 is placed and which is scanned two-dimensionally (X-axis and Y-axis directions), 3
Is a cantilever, 4 is a probe attached to the tip of the cantilever 3, and 5 is a cantilever 3 fixed and displaced in the vertical direction (Z-axis direction) in the figure to move the probe 4 toward and away from the sample 1. -It is a retracting mechanism. Reference numeral 6 is a laser light source, and 7 is a photodetector for receiving the light from the laser light source 6 reflected by the back surface of the cantilever. Reference numeral 8 denotes a support structure that supports the scanning mechanism 2, the approaching / retracting mechanism 5, the light source 6, and the photodetector 7. An optical lever type displacement detection optical system including a laser light source 6, a reflecting surface on the back surface of the cantilever 3, and a photodetector 7 is disclosed in, for example, Japanese Patent Application Laid-Open No. 5-187862.

【0004】接近・退避機構5を駆動して探針4を試料
1に対してナノメートル領域まで接近させると原子間力
が作用し、カンチレバー3にたわみ変形を生じる。この
カンチレバー3のたわみ変形は光検出器7上の反射光の
位置変化として検出することができる。この位置変化は
カンチレバー3のたわみ変形量に比較して、てこの原理
(光てこ方式)により拡大され、探針4のナノメートル
オーダの微小変位を検出する。走査機構7により試料1
をX、Y方向に走査して光検出器7の検出信号をチェッ
クすることにより、カンチレバー3のたわみ量、したが
って試料1の表面形状を求めることができる。
When the approaching / retracting mechanism 5 is driven to bring the probe 4 closer to the sample 1 to the nanometer range, an atomic force acts and the cantilever 3 is flexibly deformed. The flexural deformation of the cantilever 3 can be detected as a position change of the reflected light on the photodetector 7. This change in position is magnified by the lever principle (optical lever method) as compared with the amount of flexural deformation of the cantilever 3 to detect a minute displacement of the probe 4 on the order of nanometers. Sample 1 by scanning mechanism 7
By scanning in the X and Y directions and checking the detection signal of the photodetector 7, the deflection amount of the cantilever 3, and thus the surface shape of the sample 1 can be obtained.

【0005】[0005]

【発明が解決しようとする課題】このような力顕微鏡装
置の測定範囲は最大でも数10μmである。このため、
例えば光ディスク等の大きな試料における1つのピット
の細部の異常をチェックするような場合、そのような微
少な部分に探針の先端を目視で合わせることは不可能で
ある。したがって、力顕微鏡装置は、試料を移動させる
走査機構2とともに、力顕微鏡装置の測定範囲より大き
な視野を持つ光学顕微鏡を備えているのが通常である。
この力顕微鏡装置では、光学顕微鏡により探針4を支持
するカンチレバー3を観察することができるので、探針
4を試料1上の目的の位置に容易に位置合わせすること
ができる。しかしながら、図2に示す光てこ方式の変位
検出光学系を用いるものでは、光学顕微鏡の観察光路と
光てこ方式の変位検出光学系をほぼ同軸上に配置しなけ
ればならず、力顕微鏡装置の構成を困難にしていた。
The measuring range of such a force microscope apparatus is several tens of μm at the maximum. For this reason,
For example, when checking the abnormality of the details of one pit in a large sample such as an optical disk, it is impossible to visually align the tip of the probe with such a minute portion. Therefore, the force microscope apparatus is usually provided with the scanning mechanism 2 for moving the sample and an optical microscope having a field of view larger than the measurement range of the force microscope apparatus.
In this force microscope apparatus, the cantilever 3 supporting the probe 4 can be observed by the optical microscope, so that the probe 4 can be easily aligned with the target position on the sample 1. However, in the case of using the optical lever type displacement detection optical system shown in FIG. 2, the observation optical path of the optical microscope and the optical lever type displacement detection optical system must be arranged substantially coaxially, and the structure of the force microscope apparatus is configured. Was making it difficult.

【0006】本発明の目的は、上記従来技術における課
題を解決し、光てこ方式の変位検出光学系を用いても、
構成を容易にすることができる力顕微鏡装置を提供する
ことにある。
An object of the present invention is to solve the above-mentioned problems in the prior art and to use an optical lever type displacement detection optical system,
An object of the present invention is to provide a force microscope device that can be easily configured.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
め、本発明は、試料を載置する機構と、この機構に対向
して配置される光学顕微鏡と、探針を備えかつ先端が前
記光学顕微鏡の光路内に配置されたカンチレバーと、こ
のカンチレバーの変位を検出する光源および光検出器よ
り成る変位検出光学系と、前記カンチレバーの先端を前
記試料に対して接離させる変位機構とを備えた力顕微鏡
装置において、前記カンチレバーの背面に、この背面に
対して所定角度の反射面を有する反射部材を設けたこと
を特徴とする。
In order to achieve the above object, the present invention comprises a mechanism for mounting a sample, an optical microscope arranged to face this mechanism, a probe, and a tip having the above-mentioned structure. A cantilever arranged in the optical path of the optical microscope, a displacement detection optical system including a light source and a photodetector for detecting the displacement of the cantilever, and a displacement mechanism for bringing the tip of the cantilever into and out of contact with the sample. In the force microscope apparatus, a reflecting member having a reflecting surface at a predetermined angle with respect to the back surface of the cantilever is provided on the back surface of the cantilever.

【0008】[0008]

【作用】カンチレバー背面に所定角度の反射面を設ける
ことにより、光源からの光を当該所定角度に応じて反射
させ、、この反射光を光検出器へ入射させる。光検出器
における反射光の入射位置によりカンチレバーのたわみ
変形量を検出することができる。上記反射面を設けるこ
とにより、光源および光検出器を光学顕微鏡の光路から
外した位置に配置することができ、力顕微鏡装置の構成
が著しく容易になる。
By providing a reflecting surface at a predetermined angle on the back surface of the cantilever, the light from the light source is reflected according to the predetermined angle, and the reflected light is made incident on the photodetector. The deflection deformation amount of the cantilever can be detected by the incident position of the reflected light on the photodetector. By providing the reflecting surface, the light source and the photodetector can be arranged at positions separated from the optical path of the optical microscope, and the configuration of the force microscope apparatus is significantly facilitated.

【0009】[0009]

【実施例】以下、本発明を図示の実施例に基づいて説明
する。図1は本発明の実施例に係る力顕微鏡装置の概略
構成図である。この図で、図2に示す部分と同一又は等
価な部分には同一符号が付してある。10はカンチレバ
ー3の背面に取付けられた反射部材、10aは反射部材
10の反射面を示す。図示の例の場合、反射面10aは
カンチレバー3の背面と45度以上の角度を有する。1
1は光学顕微鏡であり、その光路に探針4が入るような
位置に配置されている。12は支持構造であり、光学顕
微鏡11を支持する支持部12a、接近・退避機構5を
支持する支持部12b、レーザ光源6を支持する支持部
12c、光検出器7を支持する支持部12dを備えてい
る。支持部12cと支持部12dは、支持部12bに対
して反対側に配置され、かつ、支持部12dは支持部1
2cの上側に配置されている。反射部材10の反射面1
0aはレーザ光源6のレーザ光を光検出器7へ反射する
角度に選定されている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the illustrated embodiments. FIG. 1 is a schematic configuration diagram of a force microscope apparatus according to an embodiment of the present invention. In this figure, the same or equivalent parts as those shown in FIG. 2 are designated by the same reference numerals. Reference numeral 10 denotes a reflecting member attached to the back surface of the cantilever 3, and 10 a denotes a reflecting surface of the reflecting member 10. In the illustrated example, the reflecting surface 10a forms an angle of 45 degrees or more with the back surface of the cantilever 3. 1
Reference numeral 1 denotes an optical microscope, which is arranged at a position where the probe 4 is inserted in the optical path thereof. Reference numeral 12 denotes a support structure, which includes a support portion 12a for supporting the optical microscope 11, a support portion 12b for supporting the approaching / retracting mechanism 5, a support portion 12c for supporting the laser light source 6, and a support portion 12d for supporting the photodetector 7. I have it. The support portion 12c and the support portion 12d are arranged on the opposite side to the support portion 12b, and the support portion 12d is the support portion 1
It is located above 2c. Reflective surface 1 of reflective member 10
0a is selected as an angle for reflecting the laser light of the laser light source 6 to the photodetector 7.

【0010】次に、本実施例の動作を説明する。まず、
光学顕微鏡11の焦点を調節してその視野内にカンチレ
バー3および探針4を捉え、以後、捕捉された光学顕微
鏡像に基づいて走査機構2を駆動し、試料1の測定対象
個所を探針4に一致させる。これにより、測定態勢が完
了する。測定中、原子間力によるカンチレバー3のたわ
み変形量は、反射部材10の反射面10aの角度の変化
として現れ、この角度の変化に応じてレーザ光源6から
のレーザ光の反射面10aにおける反射角度が変化し、
光検出器7への入射位置が変化する。結局、カンチレバ
ー3のたわみ変形量は光検出器7におけるレーザ光の入
射位置により検出することができる。
Next, the operation of this embodiment will be described. First,
The focus of the optical microscope 11 is adjusted to capture the cantilever 3 and the probe 4 in the field of view, and thereafter, the scanning mechanism 2 is driven based on the captured optical microscope image, and the measurement target portion of the sample 1 is probed 4 To match. This completes the measurement system. During the measurement, the amount of flexural deformation of the cantilever 3 due to the interatomic force appears as a change in the angle of the reflection surface 10a of the reflection member 10, and the reflection angle of the laser light from the laser light source 6 at the reflection surface 10a changes in accordance with the change in the angle. Changes,
The incident position on the photodetector 7 changes. After all, the amount of flexural deformation of the cantilever 3 can be detected by the incident position of the laser light on the photodetector 7.

【0011】このように、本実施例では、カンチレバー
の背面に反射部材を設け、その反射面がレーザ光源から
の光を光検出器へ入射させるような反射面となるように
選定したので、レーザ光源と光検出器を光学顕微鏡の光
路から外れた位置に配置することができる。そして、レ
ーザ光源と光検出器の配置位置に応じて反射面の角度を
適切に選定すれば変位検出光学系を構成することができ
るので、レーザ光源と光検出器の配置位置の選定の自由
度が著しく大きくなり、装置の構成を容易とすることが
できる。
As described above, in this embodiment, the reflecting member is provided on the back surface of the cantilever, and the reflecting surface is selected so that the light from the laser light source is incident on the photodetector. The light source and the photodetector can be placed out of the optical path of the optical microscope. Since the displacement detection optical system can be configured by appropriately selecting the angle of the reflecting surface according to the arrangement position of the laser light source and the photodetector, the degree of freedom in selecting the arrangement position of the laser light source and the photodetector. Is significantly increased, and the configuration of the device can be facilitated.

【0012】[0012]

【発明の効果】以上述べたように、本発明では、カンチ
レバーの背面に反射部材を設け、その反射面が光源から
の光を光検出器へ入射させるような反射面となるように
選定したので、光てこ方式の変位検出光学系を光学顕微
鏡の光路から外れた位置に配置することができ、光源と
光検出器の配置位置選定の自由度が大きくなり、装置の
構成を容易とすることができる。
As described above, in the present invention, the reflecting member is provided on the back surface of the cantilever, and the reflecting surface is selected so as to allow the light from the light source to enter the photodetector. , The optical lever type displacement detection optical system can be arranged at a position deviated from the optical path of the optical microscope, and the degree of freedom in selecting the arrangement positions of the light source and the photodetector is increased, and the device configuration can be simplified. it can.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例に係る力顕微鏡装置の概略構成
を示す図である。
FIG. 1 is a diagram showing a schematic configuration of a force microscope apparatus according to an embodiment of the present invention.

【図2】従来の力顕微鏡装置の概略構成を示す図であ
る。
FIG. 2 is a diagram showing a schematic configuration of a conventional force microscope apparatus.

【符号の説明】[Explanation of symbols]

1 試料 2 走査機構 3 カンチレバー 4 探針 5 接近・退避機構 6 レーザ光源 7 光検出器 10 反射部材 10a 反射面 11 光学顕微鏡 12 支持構造 12a、12b、12c、12d 支持部 1 sample 2 scanning mechanism 3 cantilever 4 probe 5 approaching / retracting mechanism 6 laser light source 7 photodetector 10 reflecting member 10a reflecting surface 11 optical microscope 12 supporting structure 12a, 12b, 12c, 12d supporting portion

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 試料を載置する機構と、この機構に対向
して配置される光学顕微鏡と、探針を備えかつ先端が前
記光学顕微鏡の光路内に配置されたカンチレバーと、こ
のカンチレバーの変位を検出する光源および光検出器よ
り成る変位検出光学系と、前記カンチレバーの先端を前
記試料に対して接離させる変位機構とを備えた力顕微鏡
装置において、前記カンチレバーの背面に、この背面に
対して所定角度の反射面を有する反射部材を設けたこと
を特徴とする力顕微鏡装置。
1. A mechanism for mounting a sample, an optical microscope arranged to face the mechanism, a cantilever having a probe and a tip arranged in an optical path of the optical microscope, and displacement of the cantilever. In a force microscope apparatus provided with a displacement detection optical system including a light source and a photodetector for detecting, and a displacement mechanism for bringing the tip of the cantilever into and out of contact with the sample, on the back surface of the cantilever, with respect to this back surface. And a reflecting member having a reflecting surface of a predetermined angle.
【請求項2】 請求項1において、前記反射面の所定の
角度は、入射光と反射光の両方を前記光学顕微鏡の光路
の一方側に存在せしめる角度であることを特徴とする力
顕微鏡装置。
2. The force microscope apparatus according to claim 1, wherein the predetermined angle of the reflecting surface is an angle that allows both incident light and reflected light to exist on one side of the optical path of the optical microscope.
JP8030624A 1996-02-19 1996-02-19 Force microscope apparatus Pending JPH09222431A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8030624A JPH09222431A (en) 1996-02-19 1996-02-19 Force microscope apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8030624A JPH09222431A (en) 1996-02-19 1996-02-19 Force microscope apparatus

Publications (1)

Publication Number Publication Date
JPH09222431A true JPH09222431A (en) 1997-08-26

Family

ID=12309020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8030624A Pending JPH09222431A (en) 1996-02-19 1996-02-19 Force microscope apparatus

Country Status (1)

Country Link
JP (1) JPH09222431A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1247063A1 (en) * 1999-12-22 2002-10-09 MFI Technologies Corporation Scanning force microscope probe cantilever with reflective structure

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1247063A1 (en) * 1999-12-22 2002-10-09 MFI Technologies Corporation Scanning force microscope probe cantilever with reflective structure
EP1247063A4 (en) * 1999-12-22 2005-03-23 Suss Microtec Test Sys Gmbh Scanning force microscope probe cantilever with reflective structure

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