JPH09217179A - Method for regenerating electroless plating bath - Google Patents

Method for regenerating electroless plating bath

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Publication number
JPH09217179A
JPH09217179A JP5107796A JP5107796A JPH09217179A JP H09217179 A JPH09217179 A JP H09217179A JP 5107796 A JP5107796 A JP 5107796A JP 5107796 A JP5107796 A JP 5107796A JP H09217179 A JPH09217179 A JP H09217179A
Authority
JP
Japan
Prior art keywords
plating bath
electroless plating
plating
electroless
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5107796A
Other languages
Japanese (ja)
Inventor
Fujio Matsui
冨士夫 松井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
C Uyemura and Co Ltd
Original Assignee
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by C Uyemura and Co Ltd filed Critical C Uyemura and Co Ltd
Priority to JP5107796A priority Critical patent/JPH09217179A/en
Publication of JPH09217179A publication Critical patent/JPH09217179A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for regenerating an electroless plating bath capable of regenerating and recycling an aged electroless plating bath in which a large amt. of phosphorous and ions are accumulated by easily, surely and inexpensively removing the phosphorous acid ions from the electroless plating bath without introducing impurities therein. SOLUTION: The hardly soluble phosphite is formed and settled and the precipitate is removed by executing treatments of one or >=2 of the following (1), (2) and (3):(1) If the metals are the same as the constituting metals of the electroless plating film precipitated from the electroless plating bath or if the constituting metals are >=2 kinds, the sulfate, chloride, carbooxide, hydroxide of the same metals as the metals of at least one kind thereof or the double salts thereof are added to the plating bath at such ratios at which the concn. higher than the conon. of the metal ions in the plating work of the plating bath is attained. (2). The electroless plating bath is raised to a temp. higher than the temp. of the plating work temp. (3) The pH of the electroless plating bath is raised to the pH higher than the plating work.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、次亜リン酸又は次
亜リン酸塩を還元剤とする無電解ニッケル又はニッケル
合金めっき浴等の無電解めっき浴中に蓄積した多量の亜
リン酸塩を簡単かつ確実に除去して当該無電解めっき浴
を再使用し得るようにした無電解めっき浴の再生方法に
関する。
TECHNICAL FIELD The present invention relates to a large amount of phosphite accumulated in an electroless plating bath such as electroless nickel or nickel alloy plating bath using hypophosphorous acid or hypophosphite as a reducing agent. The present invention relates to a method for regenerating an electroless plating bath, by which the electroless plating bath can be reused simply and surely.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来よ
り、次亜リン酸又は次亜リン酸塩を還元剤とする無電解
めっき、特に無電解ニッケルめっき(無電解Ni−Pめ
っき)は各種分野で広く用いられている。この種の無電
解めっきは、次亜リン酸イオンの還元作用で金属イオン
が還元されて被めっき物に析出していくことにより、め
っきが行われる。
2. Description of the Related Art Conventionally, various electroless platings using hypophosphorous acid or hypophosphite as a reducing agent, particularly electroless nickel plating (electroless Ni-P plating), are available. Widely used in the field. In this type of electroless plating, plating is performed by reducing metal ions by the reducing action of hypophosphite ions and precipitating them on an object to be plated.

【0003】従って、めっきの進行により、めっき浴中
の金属イオン及び次亜リン酸イオンが低下し、析出速度
が低下したり析出物の組成(例えば、Ni−Pめっき浴
であればNiとPの合金組成)が変化する。このため、
不足した金属イオン及び次亜リン酸イオンを適宜補給
し、これらのイオンの濃度を初期のレベルに戻し、めっ
きを継続していくことが行われている。
Accordingly, as the plating proceeds, the metal ions and hypophosphite ions in the plating bath decrease, and the deposition rate decreases and the composition of the precipitate (for example, Ni and P in a Ni-P plating bath). Alloy composition) changes. For this reason,
Insufficient metal ions and hypophosphite ions are appropriately replenished, the concentration of these ions is returned to the initial level, and plating is continued.

【0004】しかし、上記のように次亜リン酸イオンの
還元作用で金属イオンを還元する時、同時に次亜リン酸
イオンが酸化されて亜リン酸イオン(HPO 3 2-)が
生成し、これが漸次めっき浴中に蓄積されていく。
However, as described above, hypophosphite ion
When reducing metal ions by reduction,
Ions are oxidized and phosphite ions (HPO Three 2-)But
It forms and accumulates gradually in the plating bath.

【0005】この亜リン酸イオン(HPO 3 2-)は、
少量であればめっきに殆んど影響を与えないが、多量に
蓄積して例えば50〜100g/L以上、特に150g
/L以上になるとめっきに影響を与える場合が生じ、例
えば被めっき物とめっき皮膜との密着性に問題を与えた
り、めっき皮膜中に共析してその均一性や耐食性に悪影
響を与え、はなはだしい場合はめっき浴を分解させる場
合がある。
This phosphite ion (HPO Three 2-)
A small amount has almost no effect on plating, but a large amount
Accumulate, for example, 50-100g / L or more, especially 150g
/ L or more may affect the plating.
For example, it gave a problem to the adhesion between the object to be plated and the plating film.
Deposits in the plating film and adversely affects its uniformity and corrosion resistance.
To dissolve the plating bath,
There is a match.

【0006】このため、Ni−Pめっきを行う場合に
は、3〜10ターン(1ターンは最初のNi−P浴中に
含まれていたニッケルイオン全量が消費乃至は析出した
量で、例えば最初のNi−P浴中にニッケルイオンが6
g/L存在していたとすると、6g/Lのニッケルイオ
ンが消費乃至は析出した場合を1ターンとする。従って
この場合、3〜10ターンはニッケルイオンが18〜6
0g/L消費乃至は析出したことを意味する。)使用し
た後は、Ni−P浴を廃棄していたのが実情である。
Therefore, when performing Ni-P plating, 3 to 10 turns (1 turn is the amount of nickel ions contained in the first Ni-P bath consumed or deposited, for example, the first 6 in the Ni-P bath of nickel
If g / L is present, one turn is made when 6 g / L of nickel ions are consumed or deposited. Therefore, in this case, nickel ions are 18 to 6 for 3 to 10 turns.
It means 0 g / L consumption or precipitation. ) The fact is that the Ni-P bath was discarded after use.

【0007】従って、Ni−P浴の寿命は比較的短く、
またNi−P浴の廃棄に伴う廃液処理が産業上の問題と
なっているため、その対策として種々のNi−P浴の再
生方法も提案されているが、従来の再生方法は、処理方
法が複雑であったり、再生しためっき浴中にめっきに有
害な不純物イオンが混入したり、装置コストが高いなど
の問題があるため、広く実施されるには至っていない。
Therefore, the life of the Ni-P bath is relatively short,
Further, since waste liquid treatment associated with the disposal of Ni-P baths has become an industrial problem, various methods for regenerating Ni-P baths have been proposed as countermeasures, but the conventional regeneration methods are It is not widely used because it is complicated, impurities ions harmful to plating are mixed in the regenerated plating bath, and the cost of the apparatus is high.

【0008】本発明は上記事情に鑑みなされたもので、
簡単かつ確実にしかも有害な不純物イオンを混入するよ
うな不都合なく、次亜リン酸又はその塩を還元剤とする
無電解めっき浴を再生し、再使用することができる無電
解めっき浴の再生方法を提供することを目的とする。
[0008] The present invention has been made in view of the above circumstances,
A method of regenerating an electroless plating bath that can be simply and reliably regenerated and can be reused without inconvenience of mixing harmful impurity ions with the use of hypophosphorous acid or a salt thereof as a reducing agent. The purpose is to provide.

【0009】[0009]

【課題を解決するための手段及び発明の実施の形態】本
発明者は上記目的を達成し、長期間めっきを行って亜リ
ン酸塩が100g/L以上蓄積した無電解ニッケル又は
ニッケル合金めっき浴等の無電解めっき浴から効率よ
く、しかもめっき浴中にめっき不純物を持ち込むことな
く簡単に除去する方法について鋭意検討を行った結果、
下記(i),(ii),(iii)のいずれか1又は2
以上の処置、即ち、(i)上記無電解めっき浴から析出
される無電解めっき皮膜の構成金属と同じ又はこの構成
金属が2種以上である場合は少なくともその1種と同じ
金属の硫酸塩、塩化物、炭酸化物、水酸化物又はこれら
の複塩を上記めっき浴のめっき作業における金属イオン
濃度よりも高濃度になるように添加する(但し、上記金
属の硫酸塩又は塩化物の添加処理は(ii)及び/又は
(iii)の処置を伴う)、(ii)上記無電解めっき
浴をそのめっき作業温度より高温度に上げる、(ii
i)上記無電解めっき浴をそのめっき作業におけるpH
より高pHに上げるという処理を施すことにより、難溶
性亜リン酸塩が確実に生成、沈殿し、従ってこの沈殿物
を除去することによって、上記無電解めっき浴中の亜リ
ン酸塩(HPO 3 2-イオン)が低減し、この再生めっ
き浴を用いてめっきを行った場合、めっき皮膜の外観も
良好で、析出速度も最初のめっき浴のレベルに戻ること
を知見し、本発明をなすに至ったものである。
Means for Solving the Problems and Embodiments of the Invention
The inventor achieved the above-mentioned object and performed plating for a long time.
Electroless nickel with phosphate accumulated over 100g / L or
Efficient from electroless plating bath such as nickel alloy plating bath
In addition, do not bring plating impurities into the plating bath.
As a result of earnestly studying how to remove easily and easily,
Any one or two of the following (i), (ii), (iii)
The above treatment, that is, (i) deposition from the electroless plating bath
The same as or the same as the constituent metal of the electroless plating film
If there are two or more metals, at least one of them
Metal sulfates, chlorides, carbonates, hydroxides or these
Double salt of metal ions in the plating work of the above plating bath
Add so that the concentration is higher than the concentration
The addition treatment of genus sulfate or chloride is (ii) and / or
(With the treatment of (iii)), (ii) the above electroless plating
Elevate the bath above its plating temperature, (ii
i) pH of the electroless plating bath in the plating operation
Insoluble due to the treatment of raising the pH to higher
Phosphite is surely formed and precipitates, so this precipitate
By removing the impurities in the electroless plating bath.
Phosphate (HPO Three 2-Ion) is reduced,
When plating is performed using a bath, the appearance of the plating film is also
Good, deposition rate returns to initial plating bath level
Based on the above findings, the present invention has been completed.

【0010】従って、本発明は、次亜リン酸又はその塩
を還元剤とし、亜リン酸塩が蓄積された無電解めっき浴
を再生する方法において、上記(i),(ii),(i
ii)のいずれか1又は2以上の処置を施して難溶性亜
リン酸塩を生成、沈殿させ、次いでこの沈殿物を除去す
ることを特徴とする無電解めっき浴の再生方法を提供す
る。
Therefore, the present invention provides a method for regenerating an electroless plating bath in which phosphite is accumulated by using hypophosphorous acid or a salt thereof as a reducing agent, wherein the above (i), (ii), (i)
There is provided a method for regenerating an electroless plating bath, which comprises performing any one or more treatments of ii) to produce and precipitate a sparingly soluble phosphite, and then removing the precipitate.

【0011】以下、本発明につき更に詳述すると、本発
明の再生対象となる無電解めっき浴は、次亜リン酸又は
次亜リン酸ナトリウム等の次亜リン酸塩を還元剤として
いるものであればいずれのものでもよく、例えば、無電
解ニッケル、コバルト、銅などの単一めっき浴、無電解
ニッケル−コバルト、ニッケル−銅、ニッケル−タング
ステン、コバルト−タングステン等の合金めっき浴が挙
げられるが、特に無電解ニッケル及びニッケル合金めっ
き浴が好適に適用される。これら無電解めっき浴は酸性
タイプ、中性タイプ、アルカリ性タイプのいずれでもよ
く、またその組成は公知のものとすることができるが、
特にpH4〜6の酸性浴に好ましく適用される。
The present invention will be described in more detail below. The electroless plating bath to be regenerated according to the present invention uses hypophosphite or hypophosphite such as sodium hypophosphite as a reducing agent. Any one may be used as long as it is a single plating bath of electroless nickel, cobalt, copper or the like, or an electroless nickel-cobalt, nickel-copper, nickel-tungsten, cobalt-tungsten or other alloy plating bath. Particularly, electroless nickel and nickel alloy plating baths are preferably applied. These electroless plating baths may be any of an acidic type, a neutral type, and an alkaline type, and may have a known composition.
Particularly, it is preferably applied to an acidic bath having a pH of 4 to 6.

【0012】本発明の再生方法は、上記のようなめっき
浴の使用により、次亜リン酸イオンHPO 2 2-の消費
(酸化)で亜リン酸塩(亜リン酸イオンHPO 3 2-
が蓄積しためっき浴(この場合、再生時期は適宜選定さ
れ、限定されるものではないが、通常50g/L以上で
あり、好ましくは100g/L以上、特に150g/L
以上、場合によっては200g/L以上蓄積しためっき
浴)に適用されるが、その方法は、下記(i),(i
i),(iii)のいずれか1又は2以上の処置を施
し、これによって難溶性亜リン酸塩を生成、沈殿させ、
この沈殿物を除去するものである。 (i)上記無電解めっき浴から析出される無電解めっき
皮膜の構成金属と同じ又はこの構成金属が2種以上であ
る場合は少なくともその1種と同じ金属の硫酸塩、塩化
物、炭酸化物、水酸化物又はこれらの複塩を上記めっき
浴のめっき作業における金属イオン濃度よりも高濃度に
なるように添加する。
The regenerating method of the present invention uses the plating as described above.
By using the bath, hypophosphite HPO Two 2-Consumption of
(Oxidation) with phosphite (phosphite ion HPO Three 2-)
Plating bath (in this case, the regeneration time should be selected appropriately)
It is usually, but not limited to, 50 g / L or more.
Yes, preferably 100 g / L or more, especially 150 g / L
Above, depending on the case, the plating accumulated more than 200g / L
Bath), the method is as follows (i), (i
Any one or more of i) and (iii) is applied.
To produce and precipitate a sparingly soluble phosphite,
This precipitate is removed. (I) Electroless plating deposited from the electroless plating bath
Same as the constituent metal of the film or two or more kinds of this constituent metal
If at least one of them is the same metal sulfate, chloride
The above substances, carbonates, hydroxides or their double salts
Higher concentration than metal ion concentration in bath plating
Add so that it becomes.

【0013】この処置は、例えば無電解ニッケルめっき
浴であれば、硫酸ニッケル、塩化ニッケル、炭酸ニッケ
ル、水酸化ニッケル、塩基性炭酸ニッケル〔NiCO3
・Ni(OH)2・nH2O〕などを添加するものであ
り、また例えば無電解ニッケル−銅合金めっき浴の場合
には、上記のほか、銅の硫酸塩、塩化物、炭酸塩、水酸
化物、これらの複塩を添加するものである。
For this treatment, for example, in the case of an electroless nickel plating bath, nickel sulfate, nickel chloride, nickel carbonate, nickel hydroxide, basic nickel carbonate [NiCO 3
Ni (OH) 2 .nH 2 O] or the like. For example, in the case of an electroless nickel-copper alloy plating bath, copper sulfate, chloride, carbonate, water Oxides and double salts thereof are added.

【0014】この場合、この処置における添加量は、そ
のめっき浴の通常のめっき作業における金属イオン濃度
(通常のめっき管理金属イオン濃度)より高濃度であれ
ばよいが、好ましくは当該めっき管理金属イオン濃度の
1を超え10重量倍以下、好ましくは1.2〜10重量
倍、特に1.5〜6重量倍になるように添加すること
が、難溶性亜リン酸塩の生成、沈殿の点で好適である。
In this case, the amount added in this treatment may be higher than the metal ion concentration (normal plating control metal ion concentration) in the normal plating operation of the plating bath, but the plating control metal ion is preferable. From the viewpoint of production and precipitation of the sparingly soluble phosphite, it is preferable to add it in an amount of more than 1 and 10 times by weight or less, preferably 1.2 to 10 times by weight, and particularly 1.5 to 6 times by weight. It is suitable.

【0015】なお、上記金属の硫酸塩又は塩化物の添加
処置は、難溶性亜リン酸塩を迅速に生成、沈殿させる点
から、後述する(ii)及び(iii)の処置のいずれ
か一方又は双方の処置と共に行う必要がある。
The above-mentioned treatment for adding a metal sulfate or chloride causes one of the treatments (ii) and (iii) described later, because it forms and precipitates a sparingly soluble phosphite rapidly. It must be done with both treatments.

【0016】また、上記水酸化物、炭酸化物の添加は、
通常、下記(iii)のpH上昇を伴う。 (ii)上記無電解めっき浴をそのめっき作業温度(通
常のめっき管理温度)より高温度に上げる。
The addition of the above hydroxides and carbonates is
Usually, the following (iii) pH increase is accompanied. (Ii) Raise the electroless plating bath to a temperature higher than the plating operation temperature (normal plating control temperature).

【0017】この場合、通常のめっき管理温度より5℃
以上であることが好ましい。例えば、通常の酸性タイプ
の無電解ニッケルめっき浴は90℃でめっきすることが
多く、このようなめっき浴に対しては95℃以上、特に
97℃以上、場合によっては沸点に上げる。 (iii)上記無電解めっき浴をそのめっき作業におけ
るpH(通常のめっき管理pH)より高pHに上げる。
In this case, the normal plating control temperature is 5 ° C.
It is preferable that it is above. For example, a typical acidic type electroless nickel plating bath is often plated at 90 ° C., and for such a plating bath, the boiling point is raised to 95 ° C. or higher, particularly 97 ° C. or higher, depending on the case. (Iii) The electroless plating bath is raised to a pH higher than the pH in the plating operation (ordinary plating control pH).

【0018】この場合、通常のめっき管理pHより0.
1以上、特に1以上pHを上げることが好ましく、例え
ばpH4〜6の酸性タイプの無電解めっき浴の場合、p
H4.5〜12、好ましくはpH4.5〜7、特にpH
5〜7の範囲において上記のような高pHにすることが
好ましい。
In this case, the normal plating control pH is less than 0.
It is preferable to increase the pH by 1 or more, particularly by 1 or more. For example, in the case of an acidic type electroless plating bath having a pH of 4 to 6, p
H 4.5-12, preferably pH 4.5-7, especially pH
In the range of 5 to 7, it is preferable to set the high pH as described above.

【0019】なお、めっき浴のpHを上げる方法として
は、水酸化ナトリウム等の水酸化アルカリを添加する方
法が挙げられるほか、(i)で述べた金属の水酸化物や
炭酸化物を添加する方法が挙げられる。なお、後者の場
合、この(iii)の処置においては、その添加によっ
てpHが上昇するため、(i)の処置よりも金属イオン
の添加量は少なくてもよい。
As a method of increasing the pH of the plating bath, there is a method of adding an alkali hydroxide such as sodium hydroxide, and a method of adding the metal hydroxide or carbonate described in (i). Is mentioned. In the latter case, in the treatment of (iii), the addition raises the pH, so that the amount of metal ion added may be smaller than that of the treatment of (i).

【0020】この(iii)の方法を実施する場合、め
っき浴は室温でもよいが、40〜90℃、特に50〜7
0℃に上げて放置することが好ましい。
When the method (iii) is carried out, the plating bath may be at room temperature, but 40 to 90 ° C., especially 50 to 7
It is preferable to raise the temperature to 0 ° C. and let it stand.

【0021】なお、上記(i),(ii),(iii)
の処置は、必要により撹拌下に放置して難溶性亜リン酸
塩を生成、沈殿させるが、この場合、放置時間は30分
〜24時間、特に1〜5時間とすることが好ましい。
The above (i), (ii), (iii)
If necessary, the treatment (1) is left under agitation to form and precipitate the sparingly soluble phosphite. In this case, it is preferable that the time is left for 30 minutes to 24 hours, particularly 1 to 5 hours.

【0022】生じた沈殿の分離、除去は濾過などの常法
に従って行うことができる。この場合、高温度下で濾別
することが好ましく、まためっき槽近くに別槽及び複数
の濾過装置を設置し、一方を休止中に沈殿生成、濾別を
行うことができ、めっき浴を取り出して別槽で濾過処理
してもよい。
Separation and removal of the formed precipitate can be carried out by a conventional method such as filtration. In this case, it is preferable to perform filtration at a high temperature, and a separate tank and a plurality of filtration devices are installed near the plating tank, and precipitation can be performed and filtration can be performed while one of the tanks is stopped. Alternatively, filtration may be performed in a separate tank.

【0023】この再生された無電解めっき浴は、金属イ
オン濃度、次亜リン酸イオン濃度、pHなどを調整した
後、再度同じようにめっきに使用でき、この無電解めっ
き浴中に再度亜リン酸イオンが蓄積されてきた場合は上
述したように再生処理を行うことにより、繰り返して使
用でき、従って無電解めっき浴の寿命を延長することが
できる。
This regenerated electroless plating bath can be used again for plating in the same manner after the metal ion concentration, hypophosphite ion concentration, pH, etc. have been adjusted. When acid ions are accumulated, they can be repeatedly used by performing the regeneration treatment as described above, and thus the life of the electroless plating bath can be extended.

【0024】[0024]

【発明の効果】本発明によれば、亜リン酸イオンが多量
に蓄積した老化した無電解めっき浴から亜リン酸イオン
を不純物を導入することなく簡単かつ確実にしかも安価
に除去し、再生、再使用することができる。
According to the present invention, phosphite ions can be easily, reliably and inexpensively removed and regenerated from an aged electroless plating bath in which a large amount of phosphite ions have accumulated, without introducing impurities, and regeneration, Can be reused.

【0025】[0025]

【実施例】以下、実施例を示し、本発明を具体的に説明
するが、本発明は下記の実施例に制限されるものではな
い。なお、下記の例で、比重は20℃における値であ
る。
The present invention will be described below in more detail with reference to Examples, but the present invention is not limited to the following Examples. In the following examples, the specific gravity is the value at 20 ° C.

【0026】〔実施例1〕下記組成の無電解ニッケルめ
っき浴を建浴した。 硫酸ニッケル 5.0 g/L(Ni2+
として) NaH2PO2・H2O 25.0 g/L 酢酸ナトリウム 18.0 g/L りんご酸 40.0 g/L Pb2+ 0.3mg/L (NaH2PO3 0 g/L) pH 4.5 比重 1.045 上記無電解ニッケルめっき浴を用い、硫酸ニッケル、N
aH2PO2・H2O及びpH調整剤としてNaOH(又
はH2SO4)を所定間隔で上記Ni2+濃度、NaH2
2・H2O濃度及びpH4.5になるように補給し、ま
た必要に応じて酢酸ナトリウム、りんご酸、Pb2+を適
宜補給しながらめっきを行い、8ターン使用した(な
お、8ターン使用液は5.0g/L×8=40g/Lの
Ni2+を補給した浴である)。また、めっき温度は90
℃である。この8ターン使用後のめっき浴の分析を行っ
た結果は下記の通りである。 Ni2+ 5.0 g/L NaH2PO2・H2O 13.9 g/L NaH2PO3 205 g/L 比重 1.249 次に、上記8ターン使用しためっき浴に硫酸ニッケルを
Ni2+として30g/Lになるように添加した後、95
℃に1時間保った。生じた沈殿を除去した後、めっき浴
の分析を行った結果を下記に示す。 Ni2+ 9.4 g/L NaH2PO2・H2O 5.5 g/L NaH2PO3 119 g/L 比重 1.166 この処理後のめっき浴をNi2+濃度が5.0g/Lにな
るように希釈し、更にNaH2PO2・H2O、酢酸ナト
リウム、りんご酸、Pb2+濃度が建浴時の濃度と同じに
なるように調整し、更にpHを4.5に調整して、90
℃で30分めっきを行った。この場合、めっき浴は1L
とし、これに常法によって前処理した1dm2の軟鋼板
を浸漬し、めっき前後の重量からめっき速度を求めた。
その結果を表1に示す。
[Example 1] An electroless nickel plating bath having the following composition was constructed. Nickel sulfate 5.0 g / L (Ni 2+
As) NaH 2 PO 2 · H 2 O 25.0 g / L sodium acetate 18.0 g / L malic acid 40.0 g / L Pb 2+ 0.3 mg / L (NaH 2 PO 3 0 g / L) pH 4.5 Specific gravity 1.045 Using the above electroless nickel plating bath, nickel sulfate, N
aH 2 PO 2 · H 2 O and NaOH (or H 2 SO 4 ) as a pH adjusting agent at the above-mentioned predetermined Ni 2+ concentration and NaH 2 P
Replenishing was performed so that the concentration of O 2 · H 2 O and pH was 4.5, and if necessary, sodium acetate, malic acid, and Pb 2+ were appropriately replenished, and plating was performed for 8 turns (8 turns). The solution used is a bath supplemented with 5.0 g / L × 8 = 40 g / L Ni 2+ ). The plating temperature is 90
° C. The results of the analysis of the plating bath after using this for 8 turns are as follows. Ni 2+ 5.0 g / L NaH 2 PO 2 · H 2 O 13.9 g / L NaH 2 PO 3 205 g / L Specific gravity 1.249 Then, nickel sulfate was used as Ni in the plating bath used for 8 turns. 95% after adding 2+ to 30 g / L
Hold at ℃ for 1 hour. The results of the analysis of the plating bath after removing the generated precipitate are shown below. Ni 2+ 9.4 g / L NaH 2 PO 2 · H 2 O 5.5 g / L NaH 2 PO 3 119 g / L Specific gravity 1.166 The plating bath after this treatment has a Ni 2+ concentration of 5.0 g. / L, and further adjust NaH 2 PO 2 · H 2 O, sodium acetate, malic acid, and Pb 2+ to the same concentration as at the time of the construction bath, and further adjust the pH to 4.5. Adjust to 90
The plating was performed at 30 ° C. for 30 minutes. In this case, the plating bath is 1L
Then, a 1 dm 2 mild steel sheet pretreated by a conventional method was dipped in this, and the plating rate was determined from the weight before and after plating.
Table 1 shows the results.

【0027】〔実施例2〕上記8ターン使用しためっき
浴にNi(OH)2を18g/L添加すると、pHが
4.7のNi(OH)2懸濁液となった。これを60℃
に1時間保った後、生じた沈殿を除去した。この処理後
のめっき浴の分析結果を表1に示す。また、この処理後
のめっき浴につき実施例1と同様にして建浴時のめっき
浴と同じ濃度に調整し、pH4.5、90℃で30分め
っきを行った。その結果を表1に示す。
Example 2 When 18 g / L of Ni (OH) 2 was added to the plating bath used for the above 8 turns, a Ni (OH) 2 suspension having a pH of 4.7 was obtained. 60 ℃
After keeping at room temperature for 1 hour, the formed precipitate was removed. Table 1 shows the analysis result of the plating bath after this treatment. In addition, the plating bath after this treatment was adjusted to the same concentration as the plating bath at the time of construction in the same manner as in Example 1, and plating was performed at pH 4.5 and 90 ° C. for 30 minutes. Table 1 shows the results.

【0028】〔実施例3〕上記8ターン使用しためっき
浴にNaOHを添加し、pH12.0に調整した後、こ
れを55℃に2時間保った。生じた沈殿を除去した後の
めっき浴の組成を分析した結果を表1に示す。また、こ
のめっき浴を建浴時のめっき浴と同じ濃度に調整し、p
H4.5、90℃で30分めっきを行った。その結果を
表1に示す。
Example 3 NaOH was added to the plating bath used for the above 8 turns to adjust the pH to 12.0, and this was kept at 55 ° C. for 2 hours. Table 1 shows the results of analyzing the composition of the plating bath after removing the generated precipitate. Also, adjust this plating bath to the same concentration as the plating bath at the time of construction and p
The plating was performed at H4.5 and 90 ° C. for 30 minutes. Table 1 shows the results.

【0029】〔実施例4〕上記8ターン使用しためっき
浴に塩基性炭酸ニッケルNiCO3・Ni(OH)2・n
2Oを45g/L添加すると、pHが4.6の炭酸ニ
ッケル懸濁液となった。これを60℃、1時間保ち、生
じた沈殿を除去した。この処理後のめっき浴の分析結果
を表1に示す。また、これを最初の建浴時の浴組成と同
じ濃度となるように調整し、pH4.5、90℃で30
分めっきを行った。その結果を表1に示す。
Example 4 Basic nickel carbonate NiCO 3 .Ni (OH) 2 .n was added to the plating bath used for 8 turns.
When H 2 O was added at 45 g / L, a nickel carbonate suspension having a pH of 4.6 was obtained. This was kept at 60 ° C for 1 hour to remove the generated precipitate. Table 1 shows the analysis result of the plating bath after this treatment. In addition, adjust this so that it has the same concentration as the bath composition at the time of the first bath, and adjust the pH to 4.5 at 90 ° C for 30
The plating was performed. Table 1 shows the results.

【0030】[0030]

【表1】 [Table 1]

【0031】なお、表2に上記建浴時から8ターン使用
後までの析出速度の変動を示す。
Table 2 shows the fluctuation of the deposition rate from the time of the above-mentioned bathing to the use after 8 turns.

【0032】[0032]

【表2】 [Table 2]

【0033】以上の結果より、本発明に係る再生方法に
よって無電解ニッケルめっき浴が確実に再生され、再使
用し得ることが認められた。
From the above results, it was confirmed that the electroless nickel plating bath can be reliably regenerated and reused by the regenerating method according to the present invention.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 次亜リン酸又はその塩を還元剤とし、亜
リン酸塩が蓄積された無電解めっき浴を再生する方法に
おいて、下記(i),(ii),(iii)のいずれか
1又は2以上の処置を施して難溶性亜リン酸塩を生成、
沈殿させ、次いでこの沈殿物を除去することを特徴とす
る無電解めっき浴の再生方法。 (i)上記無電解めっき浴から析出される無電解めっき
皮膜の構成金属と同じ又はこの構成金属が2種以上であ
る場合は少なくともその1種と同じ金属の硫酸塩、塩化
物、炭酸化物、水酸化物又はこれらの複塩を上記めっき
浴のめっき作業における金属イオン濃度よりも高濃度に
なるように添加する(但し、上記金属の硫酸塩又は塩化
物の添加処理は(ii)及び/又は(iii)の処置を
伴う)。 (ii)上記無電解めっき浴をそのめっき作業温度より
高温度に上げる。 (iii)上記無電解めっき浴をそのめっき作業におけ
るpHより高pHに上げる。
1. A method for regenerating an electroless plating bath in which phosphite is accumulated, using hypophosphorous acid or a salt thereof as a reducing agent, wherein any one of the following (i), (ii) and (iii) is used. Generates sparingly soluble phosphite by one or more treatments,
A method for regenerating an electroless plating bath, which comprises depositing and then removing the deposit. (I) Sulfate, chloride, carbonate of the same metal as the constituent metal of the electroless plating film deposited from the electroless plating bath, or at least one metal when the constituent metals are two or more kinds, A hydroxide or a double salt thereof is added so as to have a higher concentration than the metal ion concentration in the plating operation of the plating bath (however, the treatment of adding the metal sulfate or chloride is (ii) and / or (Iii) with treatment). (Ii) Raise the electroless plating bath to a temperature higher than the plating operation temperature. (Iii) The electroless plating bath is raised to a pH higher than that in the plating operation.
【請求項2】 無電解めっき浴が無電解ニッケル又はニ
ッケル合金めっき浴である請求項1記載の再生方法。
2. The regeneration method according to claim 1, wherein the electroless plating bath is an electroless nickel or nickel alloy plating bath.
JP5107796A 1996-02-14 1996-02-14 Method for regenerating electroless plating bath Pending JPH09217179A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5107796A JPH09217179A (en) 1996-02-14 1996-02-14 Method for regenerating electroless plating bath

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5107796A JPH09217179A (en) 1996-02-14 1996-02-14 Method for regenerating electroless plating bath

Publications (1)

Publication Number Publication Date
JPH09217179A true JPH09217179A (en) 1997-08-19

Family

ID=12876757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5107796A Pending JPH09217179A (en) 1996-02-14 1996-02-14 Method for regenerating electroless plating bath

Country Status (1)

Country Link
JP (1) JPH09217179A (en)

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