JPH09188956A - Processing device for sewing data - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a data processing device capable of displaying the embroidery pattern according to the real sewing pattern in the case when the selected embroidery pattern and the mode state of real sewing embroidery pattern is not equal. SOLUTION: The embroidery patterns based on the display data corresponding to the shapes of embroidery patterns is displayed and one of the displayed embroidery patterns is selected and displayed. When the selected embroidery pattern is in horizontal direction(step S30, NO) the display data of the selected embroidery pattern is converted, the selected embroidery pattern is rotated in right angle and displayed in length width direction(step S34).

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sewing data processing device for processing sewing pattern data for forming embroidery in a domestic sewing machine or an industrial sewing machine.

[0002]

2. Description of the Related Art Conventionally, a sewing data processing device is provided with a function of selecting one embroidery pattern from the embroidery patterns displayed on a screen and creating embroidery data of the selected embroidery pattern. There is. The embroidery patterns selected in this manner include a vertically long embroidery pattern and a horizontally long embroidery pattern. When the embroidery pattern is displayed vertically when selected, the longitudinal direction of the embroidery pattern is displayed vertically (vertically) on the screen. When the embroidery pattern is displayed horizontally when selected, the longitudinal direction of the embroidery pattern is displayed. The direction was configured to be displayed horizontally (sideways) on the screen. Here, in the case of the sewing data processing device in which the display screen corresponds to the front surface of the sewing machine, the vertical direction of the screen corresponds to the front-back direction of the sewing machine, and the horizontal direction of the screen corresponds to the left-right direction of the sewing machine.

In general, the outer shape of a sewing machine is such that a bed portion that serves as a machine base extends horizontally (in the left-right direction), and a pedestal portion that extends vertically is formed at the right end portion of the bed portion. Further, a device (embroidery machine) for moving an embroidery frame on which a cloth to be embroidered is stretched is attached to the bed, and the cloth is moved relative to a sewing needle that moves up and down at a certain position. . The embroidery machine moves the embroidery frame by combining movements in two orthogonal directions generated by a member that moves in the front-rear direction and a member that moves in the left-right direction. The movable range of the embroidery frame corresponds to the size of the sewable area for embroidery, and the sewable area is a rectangle having a moving amount in each direction as one side. Generally, the movable range of the embroidery frame is increased by increasing the moving range of the member that moves in each direction, but in reality, the pedestal portion is formed on the right side of the sewing needle as described above. Therefore, the right end of the embroidery frame is prevented from moving to the right. When the embroidery frame comes closest to the pedestal portion in this way, the embroidery frame cannot move further to the right, and at this time, the sewing needle sewes the leftmost side of the sewable area.

As described above, the movable range in the left-right direction of the embroidery frame (sewable region) is the shorter movable range in the left-right direction of the moving mechanism or the distance between the pedestal portion and the sewing needle. . On the other hand, since no obstacle is formed in the front-rear direction of the sewing machine, the movable range of the embroidery frame in the front-rear direction (sewing area) is determined by the movable distance of the front-rear moving mechanism. It In addition, the moving distance of the embroidery frame in the front-rear direction and the moving distance of the left-right direction are not necessarily the same.

Therefore, the size of the sewable embroidery pattern is subject to certain restrictions in relation to the movable distance of the embroidery frame. Therefore, when it is desired to sew the selected embroidery pattern in the maximum size, the longitudinal direction of the selected embroidery pattern,
There is a case where it is desired that the longer movable distance of the embroidery frame is made to substantially coincide with and the sewing is started in a direction different from that at the time of selection.

[0006]

However, as described above, in the conventional sewing data processing apparatus, the vertically long embroidery pattern remains in the vertical direction and the vertically long embroidery pattern is arranged so that the embroidery pattern can be easily grasped at the time of selection. Since the selected embroidery pattern is displayed while the embroidery pattern is still in the horizontal direction, the displayed embroidery pattern may be different in direction from the actually formed embroidery pattern. In such a case, since it is not possible to confirm the state at the time of sewing on the screen, it is extremely difficult to assume the finished state at the time of sewing.

The present invention has been made in view of the above points, and when the selected sewing pattern and the mode of the sewing pattern to be actually sewn differ from each other, the sewing is performed according to the mode in which the actual sewing is performed. An object of the present invention is to provide a sewing data processing device capable of displaying a pattern.

[0008]

In order to solve the above-mentioned problems, a first aspect of the present invention is a sewing data processing apparatus for displaying a sewing pattern based on sewing pattern data corresponding to the shape of the sewing pattern. 1 display means, sewing pattern selection means for selecting one of the sewing patterns displayed by the first display means, the selected sewing pattern, and the mode of the sewing pattern actually sewn are different. In this case, the second display means for displaying the sewing pattern in accordance with the manner of actual sewing is configured.

According to the sewing data processing apparatus configured as described above, the sewing pattern is displayed by the first display means based on the sewing pattern data corresponding to the shape of the sewing pattern, and is displayed by the first display means. One of the sewing patterns is selected by the sewing pattern selection means. When the selected sewing pattern and the mode of the actually sewn sewing pattern are different, the second display means displays the sewing pattern according to the mode of the actual sewing. .

According to a second aspect of the present invention, in the sewing data processing device, first display means for displaying the sewing pattern based on the sewing pattern data corresponding to the shape of the sewing pattern,
The sewing pattern selection means for selecting one of the sewing patterns displayed by the first display means, the second display means for displaying the selected sewing pattern based on the sewing pattern data, and the selection. When the direction of the sewing pattern and the direction of the sewing pattern at the time of sewing are different, the sewing pattern data of the selected sewing pattern is changed corresponding to the difference,
Display state changing means for changing the display state of the selected sewing pattern on the second display means.

According to the sewing data processing apparatus configured as described above, the sewing pattern is displayed by the first display means based on the sewing pattern data corresponding to the shape of the sewing pattern, and is displayed by the first display means. One of the selected sewing patterns is selected by the sewing pattern selection means, and the selected sewing pattern is displayed by the second display means based on the sewing pattern data. When the direction of the selected sewing pattern and the direction of the sewing pattern at the time of sewing are different, the display state changing means changes the sewing pattern data of the selected sewing pattern corresponding to the difference. Then, the display state of the selected sewing pattern on the second display means is changed.

According to a third aspect of the present invention, in the sewing data processing device, first display means for displaying the sewing pattern based on the sewing pattern data corresponding to the shape of the sewing pattern,
The sewing pattern selection means for selecting one of the sewing patterns displayed by the first display means, the second display means for displaying the selected sewing pattern based on the sewing pattern data, and the selection. Determining means for determining whether or not the selected sewing pattern is accommodated in the sewable area, and the selected sewing pattern when it is determined that the selected sewing pattern is not accommodated in the sewable area Display state changing means for changing the sewing pattern data of the pattern and changing the display state of the selected sewing pattern on the second display means.

According to the sewing data processing apparatus configured as described above, the sewing pattern is displayed by the first display means based on the sewing pattern data corresponding to the shape of the sewing pattern, and is displayed by the first display means. One of the selected sewing patterns is selected by the sewing pattern selection means, and the selected sewing pattern is displayed based on the sewing pattern data. Then, the determining means determines whether or not the selected sewing pattern is accommodated in the sewable area, and displays if the selected sewing pattern is determined not to be accommodated in the sewable area. The sewing pattern data of the selected sewing pattern is changed by the state changing means, and the display state of the selected sewing pattern on the second display means is changed.

According to a fourth aspect of the present invention, in the sewing data processing apparatus according to the second or third aspect, the partial area is defined based on the sewing pattern data for each partial area forming the selected sewing pattern. The display state changing means further includes third display means for displaying each, and the display state changing means changes the sewing pattern data for each of the partial areas in response to a change in the sewing pattern data of the selected sewing pattern, The display state of the sewing pattern for each of the partial areas on the display means is changed.

According to the sewing data processing apparatus constructed as described above, the third display means displays each of the partial areas on the basis of the sewing pattern data for each of the partial areas forming the selected sewing pattern. It Then, the display state changing means changes the sewing pattern data for each of the partial areas in response to the change of the sewing pattern data of the selected sewing pattern, and the sewing for each of the partial areas in the third display means is performed. The pattern display status is changed.

According to a fifth aspect of the present invention, in the sewing data processing apparatus according to any one of the second to fourth aspects, the sewing pattern data of the sewing pattern displayed by the first display means is stored. It is configured so as to further include the first storage means.

According to the sewing data processing apparatus configured as described above, the sewing pattern data of the sewing pattern displayed by the first display means is stored by the first storage means. Further, the invention according to claim 6 is the sewing data processing apparatus according to any one of claims 2 to 5, further comprising a second storage means for storing the sewing pattern data changed by the display state changing means. Further, it is configured to be provided.

According to the sewing data processing apparatus configured as described above, the second storage means stores the sewing pattern data changed by the display state changing means.
The invention according to claim 7 is the sewing data processing device according to any one of claims 2 to 6, wherein
The display means and the second display means are configured to display the sewing pattern on a binary monotone screen.

[0019]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings. The following description will be made on the case where the present invention is applied to a domestic embroidery sewing machine.

First, the entire system for performing embroidery will be described. The actual embroidery work is performed by the procedure in which the embroidery data processing circuit first creates embroidery data, and then the embroidery sewing machine embroiders a desired pattern based on the embroidery data.

FIG. 1 shows the outline of a domestic embroidery sewing machine.
The embroidery sewing machine 20 is arranged on the sewing machine bed, and moves the embroidery frame 21 holding the work cloth 22 to a predetermined position indicated by the XY coordinate system unique to the apparatus by the horizontal movement mechanism.
By performing the sewing operation with the sewing needle 23, the work cloth 22 is embroidered with a predetermined pattern. Embroidery sewing machine 20
A flash memory device, which is a device for reading an external storage memory, a liquid crystal screen 25 with a touch panel, an embroidery data processing circuit, and a control device. A worker inserts a flash memory 10 as an external storage memory that stores embroidery data into the flash memory insertion port 2
4 is inserted, the stored embroidery data is read out. The embroidery data usually includes coordinate data indicating the position of the needle drop point in the XY coordinate system. In addition, the operator edits the embroidery data using the touch panel,
The edited embroidery data is displayed on the liquid crystal screen as binary monotone. The control device including a microcomputer controls the horizontal movement mechanism of the embroidery frame 21 based on the embroidery data edited by the embroidery data processing circuit, and embroiders the work cloth 22. Here, the sewing machine that performs display based on the sewing data is described. However, two types of data, the display data and the embroidery data (data indicating the needle drop position), are stored in the sewing machine in advance.
Sewing machine stored in OM or external ROM card,
The embroidery data processing circuit of the present invention described below can be applied to a sewing machine that creates embroidery position data from display data and a sewing machine that creates display data and embroidery data from common data.

Next, the structure of the embroidery data processing circuit will be described with reference to FIG. The embroidery data processing circuit
CP for performing various processing in embroidery data processing
U2, ROM for storing various processing programs and data
3, and a RAM 4 for storing various data such as image data of embroidery patterns and figures forming an embroidery frame. The embroidery data creation process described later is performed by the CPU 2 executing a program stored in the ROM 3 or an external recording medium.

Further, the embroidery data processing circuit includes a flash memory device 5, an interface 6, and an input unit 11.
have. The flash memory 10 is inserted into the flash memory device 5, and the created embroidery data is stored in the flash memory 10. The input unit 11 is configured by a touch panel on a liquid crystal screen provided on the embroidery sewing machine 20, and is used for inputting a pattern selection and a layout instruction, which will be described later. Instruction information input from the touch panel is sent to the CPU 2 and RA via the interface 6.
M4.

The embroidery data processing circuit further includes a liquid crystal screen (LCD) 7 for displaying image data of an embroidery pattern, an embroidery area, etc. on the screen 25, and a display controller (LCDC) for controlling the liquid crystal screen 7. ) 8. Further, the display control device 8 includes an image storage device (VRAM) 9
Are connected and configured to enable monochrome bitmap graphics display.

In the above configuration, the CPU2, R
The OM3, the RAM4, the interface 6 and the touch panel 11 correspond to the sewing pattern selecting means, and the CPU2, RO
The M3 and the RAM 4 correspond to the display state changing means and the judging means, and the liquid crystal screen 7 corresponds to the first, second and third displaying means.

In the flow charts of FIGS. 3, 4, 10 and 11, the first display means functions in step S8, the sewing pattern selection means functions in step S10, and the second and second sewing steps in steps S34 and S54. The third display means and the display state changing means function, the determining means functions in step S51, and the second storage means functions in steps S35 and S55.

Next, with reference to FIGS. 3 to 11, the operation of the sewing data processing circuit for the display state changing processing according to the present invention will be described. FIG. 3 is a flowchart showing a process of creating embroidery data. In the following processing, the screen display shown in FIGS. 5 to 9 will be described as an example. here,
5 is an example of the pattern type selection screen displayed on the liquid crystal screen, FIGS. 6 and 8 are examples of the pattern selection screen displayed on the liquid crystal screen, and FIGS. 7 and 9 show the selected pattern. It is an example of a screen.

First, when the power source of the embroidery sewing machine 20 is turned on (step S2), the pattern type selection screen shown in FIG. 5 is displayed on the liquid crystal screen 25 (step S4). Next, the embroidery data processing circuit is in a standby state until one pattern type is selected from the displayed pattern type selection screen (step S6). Here, the pattern type 101 of FIG. 5 is selected, and when the pattern type 101 of FIG. 5 is selected (step S6, YES), the pattern selection screen shown in FIG.
5 is displayed (step S8).

At this time, when the "return" (return key) is pressed (step S9, YES), the screen returns to the pattern type selection screen (FIG. 5) again and the above steps S4 to S9 are repeated. On the other hand, when the pattern selection screen (FIG. 6) is displayed, an embroidery pattern can be selected from the displayed patterns (step S10). Here, it is assumed that the embroidery pattern 102 in FIG. 6 is selected. Embroidery pattern 102 of FIG.
Is selected (YES in step S10), the display state changing process of the selected pattern is performed (step S1).
2) As shown in FIG. 7, the selected pattern is displayed on the liquid crystal screen 2.
5 is displayed. Regarding the display state changing process of the selected pattern, two examples will be described below.

After the display state changing process of the selected pattern,
When "Return" is pressed (YES in step S14), the screen returns to the pattern selection screen (FIG. 6) again, and steps S8 to S are performed.
14 is repeated, and a plurality of patterns can be selected. On the other hand, when a key for instructing other processing is pressed with the pattern selected as shown in FIG. 7 (step S20,
YES), other processing is performed (step S2).
2). Examples of other processing include, for example, a key for instructing editing work such as movement, rotation, enlargement / reduction, left / right reversal, and arrangement change of the selected embroidery pattern.

The above steps are repeated until the operator presses the sewing start key 26 (FIG. 1) provided on the main body of the embroidery sewing machine. When the sewing start key 26 (FIG. 1) is pressed (step S16, YES), embroidery data is created based on the edited state of the selected embroidery pattern, and sewing is started under the control of the controller (step S18). .

Next, the display state changing process of the selected pattern will be described. First Example First, with reference to FIG. 4, a first example of the display state changing process of the selected pattern will be described. In the first embodiment, when the pattern selected on the pattern selection screen (FIG. 6) is displayed horizontally, the selected pattern is displayed vertically and is displayed on the screen.

When the subroutine shown in FIG. 4 is called in step S12 of FIG. 3, the CPU 2 determines whether or not the selected pattern is vertically displayed (step S).
30). That is, the CPU 2 determines whether the selected pattern is the vertical display or the horizontal display based on the code data indicating whether each selected pattern is the vertical display or the horizontal display.

For each pattern, there are identification data for identifying the pattern, display data for displaying the pattern, and sewing data for sewing the pattern, and the display state of the pattern ( The code data indicating vertical display or horizontal display is included. FIG. 11 shows an example of a data table of the code data. Here, based on the code data, it is identified whether the selected pattern is the vertical display or the horizontal display. However, the storage address of the vertical display pattern and the storage address of the horizontal display pattern are separately set in advance. Separately, the display state of the selected pattern can be identified based on the position of the storage address.

It is possible to create sewing data from the display data or display data from the sewing data, and the display data is common to the displays in steps S4 and S8 in FIG. Used.

Then, when the selected pattern is in the vertical display as shown in FIG. 8 (step S30, YES), the data of the selection screen is used to select the vertical display as shown in FIG. The entire 103 of the selected pattern and the partial areas 104 to 109 for each sewing color of the selected pattern are displayed on the liquid crystal screen 25 (step S32), and the process returns to the main routine of FIG.

On the other hand, when the selected pattern is a horizontal display as shown in FIG. 6 (step S30, NO), the display data of the selected screen is rotated by 90 degrees, and as shown in FIG. The entire selected pattern 103 and the partial areas 104 to 109 for each sewing color of the selected pattern are displayed on the liquid crystal screen 25 (step S34). Generally, as shown in FIG. 1, the movable range of the embroidery frame in the left-right direction of the sewing machine is limited to a certain extent by the presence of the pedestal portion, but there is no obstacle that prevents the embroidery frame from moving in the front-back direction of the sewing machine. Not not. Therefore, when it is desired to sew the selected embroidery pattern in the maximum size, the longitudinal direction of the selected embroidery pattern and the longer of the movable distance of the embroidery frame, that is, the longitudinal direction of the sewing machine in general. (Longitudinal direction of LCD screen)
To match. In the first embodiment, when a large pattern is actually sewn, it is assumed that the pattern is sewn in the vertical direction, and the horizontal display pattern is converted into the vertical display uniformly in advance. By matching the direction of the pattern displayed in this manner with the direction of the pattern at the time of sewing, the state at the time of sewing can be confirmed on the screen and the finished state at the time of sewing can be assumed. Also, since it is not possible to display images of three or more colors on a monotone liquid crystal screen, it is necessary to check the display state for each sewing color, but a pattern is also displayed for the partial area for each sewing color in the state at the time of sewing. Therefore, the finished state at the time of sewing can be confirmed for each color.

After that, the display data rotated 90 degrees is R.
Stored in AM4 or external storage means (step S3
5) Return to the main routine of FIG. By storing the data rotated by 90 degrees in this way, when the same pattern is selected again, it is possible to quickly display the pattern without performing the same calculation again. Instead of providing steps S34 and S35, display data indicating the state at the time of sewing may be stored in advance in the internal ROM 3 or an external recording medium and immediately displayed on the screen.

Second Embodiment Next, with reference to FIG. 10, a second embodiment of the display state changing process of the selected pattern will be described. The second embodiment is a case where the selected pattern is displayed vertically on the screen when the pattern selected in the pattern selection screen (FIG. 6) is not accommodated in the sewable area. .

When the subroutine shown in FIG. 10 is called in step S12 of FIG. 3, the CPU 2 determines whether or not the selected pattern is displayed vertically (step S50). That is, the CPU 2 determines whether the selected pattern is the vertical display or the horizontal display based on the code data indicating whether each selected pattern is the vertical display or the horizontal display. Similar to the first embodiment, the display state of the selected pattern can be identified based on the position of the storage address, instead of identifying the display state of the selected pattern based on the data structure of each pattern and the code data. And
Detailed description is omitted.

Then, when the selected pattern is in the vertical display as shown in FIG. 8 (step S50, YES), the data of the selection screen is used to select the vertical display as shown in FIG. The entire 103 of the formed pattern and the partial areas 104 to 109 for each sewing color of the selected pattern are displayed on the liquid crystal screen 25 (step S52), and the process returns to the main routine of FIG.

On the other hand, when the selected pattern is displayed horizontally (step S50, NO) as shown in FIG. 6, it is determined whether or not the selected pattern can be accommodated in the sewing area while being displayed horizontally. It is determined (step S51). Here, it is assumed that the data regarding the sewable area has been input in advance. If the selected pattern can be accommodated in the sewable area while being displayed horizontally (step S51, YES), the data of the selection screen is used to display the entire pattern that is displayed horizontally and the selected pattern. Each partial area for each sewing color of the pattern is displayed on the liquid crystal screen 25 (step S52), and the process returns to the main routine of FIG. If the selected pattern cannot be accommodated in the sewing area while being displayed horizontally (step S51, NO), the display data of the selected screen is changed to 9
After being rotated by 0 °, the entire selected pattern 103 and the partial regions 104 to 109 for each sewing color of the selected pattern are displayed on the liquid crystal screen 25 as shown in FIG. 7 (step S54). ).

Generally, as shown in FIG. 1, the movable range of the embroidery frame in the left-right direction of the sewing machine is limited to a certain extent by the presence of the pedestal, but the movement of the embroidery frame in the front-back direction of the sewing machine is hindered. Is not formed. For this reason,
When you want to sew the selected embroidery pattern in the maximum size, the longer direction of the selected embroidery pattern and the longer the movable distance of the embroidery frame, that is, generally the front-back direction of the sewing machine (LCD screen). Vertical direction). Also in the second embodiment, similarly to the first embodiment, when the pattern cannot be sewn in the horizontal direction, the pattern displayed in the horizontal direction is displayed in the vertical direction on the assumption that the pattern is sewn in the vertical direction. Converting. With this configuration, the state at the time of sewing can be confirmed on the screen and the finished state at the time of sewing can be assumed. Also, since it is not possible to display images of three or more colors on a monotone liquid crystal screen, it is necessary to check the display state for each sewing color, but a pattern is also displayed for the partial area for each sewing color in the state at the time of sewing. Therefore, the finished state at the time of sewing can be confirmed for each color.

Thereafter, the display data rotated 90 degrees is R
It is stored in AM4 or external storage means (step S5).
5) Return to the main routine of FIG. By storing the data rotated by 90 degrees in this way, when the same pattern is selected again, it is possible to quickly display the pattern without performing the same calculation again. Instead of providing steps S54 and S55, it is also possible to store display data indicating the state at the time of sewing in the internal ROM 3 or an external recording medium in advance and display it immediately on the screen.

In the first and second embodiments, the sewing pattern is automatically displayed in accordance with the sewing state. However, the sewing pattern may be rotated 90 degrees by the operator's selection operation. . Further, during editing, the embroidery pattern may be displayed in the direction in which the selection screen is displayed, and at the same time as the start of sewing, a display that matches the sewing state may be automatically performed.

Further, the display of the embroidery pattern for each of the above partial areas is configured so that it can be displayed immediately by the data stored in advance, or in order to reduce the data capacity, the sewing data can be displayed based on the basic data. It is possible to construct the display data from the needle drop point. It is also possible to use these two methods together.

Further, in the above embodiment, the case where one embroidery pattern is sewn with threads of a plurality of colors has been described. However, when the colors are different for each sewing pattern, the sewing for one color is regarded as one embroidery pattern. Alternatively, each embroidery pattern may be regarded as a partial area (or a part of the partial area), and confirmation may be made for each color. In this case, as a result of selecting a plurality of embroidery patterns, the sewing area required for embroidery becomes a horizontally long (or vertically long) area, and the longitudinal direction of the sewing area is aligned with the front-back direction due to the size of the embroidery frame. In such a case, the embroidery pattern may be changed in direction by automatically determining that it is possible to sew only in a specific direction of the embroidery frame as a result of the selected pattern and its arrangement. good.

Each of the data on the pattern type selection screen (FIG. 5) and the pattern selection screen (FIGS. 6 and 8) is RO in the embroidery sewing machine 20 as binary bitmap data.
It is recorded on an external recording medium such as M3 or a floppy disk or a flash memory. These data are
It is read out as necessary according to the instruction from the CPU 2,
It is displayed on the liquid crystal screen 25.

The present embodiment has been described by taking the sewing machine having the sewing mechanism as an example. However, if the movement amount of the embroidery frame of the sewing machine used for sewing is known in advance, the sewing machine can be used as a data creating apparatus having no sewing mechanism. Of course, the present invention can be applied.

[0050]

As described above, according to the sewing data processing apparatus of the first aspect, when the selected sewing pattern and the mode of the sewing pattern to be actually sewn are different, the sewing data is actually sewn. Since the sewing pattern is displayed in accordance with this mode, the finished state at the time of sewing can be confirmed accurately.

Further, according to the sewing data processing device of the second aspect, when the direction of the selected sewing pattern is different from the direction of the sewing pattern at the time of sewing, the sewing pattern is selected corresponding to the difference. Since the sewing pattern data of the sewing pattern is changed and the display state of the selected sewing pattern is changed, the finished state at the time of sewing can be accurately confirmed.

Further, according to the sewing data processing device of the third aspect, when it is determined that the selected sewing pattern is not accommodated in the sewable area, the sewing pattern data of the selected sewing pattern is changed. Since the display state of the selected sewing pattern is changed, the finished state at the time of sewing can be accurately confirmed.

Further, according to the sewing data processing apparatus of the fourth aspect, the sewing pattern data for each partial area is changed corresponding to the change of the sewing pattern data of the selected sewing pattern,
Since the display state of the sewing pattern for each partial area is changed,
A pattern is displayed in the state at the time of sewing for the partial areas for each sewing color, and the finished state at the time of sewing can be confirmed for each color.

Further, according to the sewing data processing apparatus of the fifth aspect, since the first storage means for storing the sewing pattern data of the displayed sewing pattern is further provided, it is possible to immediately perform the arithmetic processing without performing the arithmetic processing. The pattern can be displayed on.

Further, according to the sewing data processing apparatus of the sixth aspect, since the second storage means for storing the sewing pattern data changed by the display state changing means is further provided, the arithmetic processing is not performed. The pattern whose display state has been changed can be immediately displayed on the screen.

Further, according to the sewing data processing apparatus of the seventh aspect, since the first display means and the second display means display the sewing pattern on the binary monotone screen, an inexpensive display means is used. It is possible to accurately recognize the partial regions of various sewing patterns in the edited state.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an appearance of a home embroidery sewing machine.

FIG. 2 is a block diagram showing an internal configuration of an embroidery data processing circuit.

FIG. 3 is a flowchart showing a process of creating embroidery data.

FIG. 4 is a flowchart showing a first example of a display state changing process of a selected pattern.

FIG. 5 is an example of a pattern type selection screen displayed on a liquid crystal screen.

FIG. 6 is an example of a pattern selection screen displayed on a liquid crystal screen.

FIG. 7 is an example of a screen showing a selected pattern displayed on the liquid crystal screen.

FIG. 8 is an example of a pattern selection screen displayed on a liquid crystal screen.

FIG. 9 is an example of a screen showing a selected pattern displayed on the liquid crystal screen.

FIG. 10 is a flowchart showing a second example of the display state changing process of the selected pattern.

FIG. 11 is a diagram showing an example of a data table of code data.

[Explanation of symbols]

 2 ... CPU 3 ... ROM 4 ... RAM 5 ... Flash memory device 7 ... Liquid crystal display 10 ... Flash memory 20 ... Home sewing machine

Claims (7)

[Claims] 1. A first display means for displaying a sewing pattern based on sewing pattern data corresponding to the shape of the sewing pattern, and a sewing pattern for selecting one of the sewing patterns displayed by the first display means. And a second display unit for displaying the sewing pattern according to the actually sewn pattern when the selected sewing pattern and the actually sewn pattern are different from each other. A sewing data processing device characterized by being provided. 2. A first display means for displaying a sewing pattern based on sewing pattern data corresponding to the shape of the sewing pattern, and a sewing pattern for selecting one of the sewing patterns displayed by the first display means. Selecting means, second display means for displaying the selected sewing pattern based on the sewing pattern data, and a case where the direction of the selected sewing pattern and the direction of the sewing pattern at the time of sewing are different, Display state changing means for changing the sewing pattern data of the selected sewing pattern corresponding to the difference and changing the display state of the selected sewing pattern on the second display means. A sewing data processing device characterized by: 3. A first display means for displaying the sewing pattern based on the sewing pattern data corresponding to the shape of the sewing pattern, and a sewing pattern for selecting one of the sewing patterns displayed by the first display means. Selection means, second display means for displaying the selected sewing pattern based on the sewing pattern data, and determination for determining whether or not the selected sewing pattern is accommodated in the sewable area Means, and when it is determined that the selected sewing pattern is not accommodated in the sewable area, the sewing pattern data of the selected sewing pattern is changed, and the sewing pattern selected by the second display means is changed. A sewing data processing device, comprising: a display state changing means for changing a display state. 4. A third display means for displaying each of the partial areas based on the sewing pattern data for each of the partial areas forming the selected sewing pattern is further provided, and the display state changing means selects the selected one. The sewing pattern data for each of the partial areas is changed corresponding to the change of the sewing pattern data of the sewing pattern, and the display state of the sewing pattern for each of the partial areas on the third display means is changed. Item 2. The sewing data processing device according to item 2 or 3. 5. The method according to claim 2, further comprising a first storage means for storing sewing pattern data of the sewing pattern displayed by the first display means. Sewing data processing device. 6. The sewing data according to claim 2, further comprising a second storage unit for storing the sewing pattern data changed by the display state changing unit. Processing equipment. 7. The sewing data processing device according to claim 2, wherein the first display means and the second display means display a sewing pattern on a binary monotone screen.