JPH09167751A - Rotary substrate treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent generation of a substrate of inferior quality by a method wherein whether a vertically moving member is moved to the prescribed position is confirmed by detecting the vertical position of the detection shaft which integrally moves in vertical direction with the vertically moving member. SOLUTION: When a rotary stand 12 is rotated while a substrate W is being treated, a vertically moving member 20 is in the upper position adjacent to the backside of the substrate W as shown by a two dot chain line. The valve disc 30, on the lower end of a detection shaft 24 droopingly provided in the center part 20, is on the uppermost position as shown by a two dot chain line, and the plane surface on the upper surface side is positioned close to the upper valve seat 36 of a guide cylinder 32. As a result, the upper aperture 40 of the guide cylinder 32 is closed, and the vacuum pressure increases in the guide cylinder 32, the hollow part of a rotary shaft 14 and a vacuum suction path 44. The increase in vacuum pressure is detected by a pressure gauge 46, and the state that the vertically moving member 20 is on the upper position adjacent to the backside of the substrate W, can be confirmed.

Description

Detailed Description of the Invention

[0001]

[0001] The present invention relates to a semiconductor wafer,
While holding substrates such as glass substrates for liquid crystal display devices and glass substrates for photomasks in a horizontal position and rotating them around the vertical axis, supply treatment liquids such as photoresist liquid, cleaning liquid, developing liquid, and etching liquid to the substrate surface. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary substrate processing apparatus that performs processing by supporting a substrate, and more particularly to a rotary substrate processing apparatus that supports a substrate at a small distance from the upper surface of a turntable.

[0002]

2. Description of the Related Art A substrate such as a semiconductor wafer is supported in a horizontal position at a predetermined distance from the upper surface of a turntable which is supported in a horizontal position and can be rotated about a vertical axis. An example of a rotary substrate processing apparatus that supplies a substrate to a substrate surface for processing is disclosed in Japanese Patent Laid-Open No. 5-90
As disclosed in Japanese Patent No. 238 and Japanese Utility Model Laid-Open No. 4-65446, a plurality of support pins are erected on the upper surface of the rotary table.
The substrate is positioned and held by these support pins. In such a processing apparatus, since the substrate is held in a state of being slightly floated from the upper surface of the turntable, it is possible to avoid damage or contamination of the back surface of the substrate that occurs when the substrate is placed in contact with the turntable. On the other hand, another problem arises in that the mist of the processing liquid scattered during the processing of the substrate goes around to the lower side of the substrate and adheres to the back surface of the substrate, and the back surface of the substrate is contaminated by the mist. As one of methods for solving such a problem, a so-called back rinse in which a rinse liquid such as pure water is sprayed onto the back surface of the substrate to prevent the mist from wrapping around the back surface of the substrate while processing the substrate while rotating the substrate. In Japanese Patent Laid-Open No. 7-130695, a vertical moving member having at least the same size as the substrate is brought close to the back surface of the substrate to prevent mist from wrapping around the back surface of the substrate during substrate processing. A rotary substrate processing apparatus configured to do so is disclosed.

The processing apparatus disclosed in the above publication is shown in FIG. 4 in a partially cutaway front view, and FIG.
As shown in an enlarged sectional view of a part thereof, a substrate rotation holder 70 that holds the substrate W in a horizontal posture and rotates about a vertical axis.
have. In the substrate rotation holder 70, a rotation shaft 74 is vertically provided at the center of the lower surface, is supported in a horizontal posture and is rotatable about a vertical axis, and is connected to a motor 76 via the rotation shaft 74. Is equipped with. A plurality of support pins 78 for abutting the peripheral edge of the substrate W to position and support the substrate W in a horizontal posture are screwed and fixed on the upper surface of the turntable 72. Further, as shown in FIG. The minute protrusion 80 is provided in a protruding manner. The support pin 78 is formed integrally with a cylindrical body portion 78a and an upper portion of the body portion 78a, an outer peripheral edge of which extends outwardly from an outer peripheral surface of the body portion 78a, and an upper surface of the support pin 78 abuts on the peripheral edge of the substrate W. A brim portion 78b for supporting the
A small protrusion 78 that is integrally formed on the upper portion of the collar portion 78b and contacts the peripheral edge of the substrate W to restrict the horizontal movement of the substrate W.
c.

On the upper surface side of the rotary table 72, a circular vertical moving member 82 made of a thin plate material is arranged. Guide holes 84 having a diameter slightly larger than that of the body portion 78a of the support pin 78 are formed at positions corresponding to the respective support pins 78 on the rotary table 72 in the peripheral portion of the vertical movement member 82. The support pins 78 penetrate the guide holes 84 and the support pins 78 are rotated.
The vertical movement member 82 is guided by the body portion 78a of the support pin 78 so that it can be moved only in the vertical direction. The vertical movement member 82 is at least as large as the substrate W in order to prevent the mist from adhering to the back surface of the substrate W.
It is formed to have a slightly larger diameter. The vertical moving member 8
Instead of forming the circular guide hole 84 in 2, the U-shaped notch opened to the outside may be formed in the peripheral edge of the vertical moving member.

Around the periphery of the rotary table 72, a plurality of, for example, three openings 86 are formed equidistantly in the circumferential direction, and the vertical moving member 82 is vertically moved at the position of each opening 86. A push-up mechanism 88 for driving is provided respectively. The push-up mechanism 88 includes an operating piece 90a and a hanging piece 9
And a weight 92 is attached to the lower end of the hanging piece 90b.
A pin 94 is inserted through an intermediate bent portion of the push-up member 90, and both ends of the pin 94 are supported by bearings 96, respectively, and the pin shaft is arranged parallel to the tangential direction of the circular rotary table 72. . The push-up member 90 is attached to the turntable 72 so that the operating piece 90a is located outside the pin 94, and is swingable around the axis of the pin 94. The operating piece 90a passes through the opening 86. It is configured so as to be capable of swinging displacement upward from the upper surface of the rotary table 72.

Around the substrate rotation holder 70, a cup body 98 for preventing the processing liquid from scattering is disposed so as to be able to move up and down. Further, above the substrate rotation holder 70, a photoresist liquid, a cleaning liquid such as pure water, or the like, depending on the content of the treatment,
A nozzle 100 for supplying a processing liquid such as a developing liquid and an etching liquid is arranged so as to be reciprocally movable in the horizontal direction.

On the side of the rotary substrate processing apparatus having the above-described structure, the substrate W is carried into the processing apparatus and transferred onto the substrate rotation holder 70, or the processed substrate W is processed.
A transfer arm 102 for receiving the substrate from the substrate rotation holder 70 and carrying it out of the processing apparatus is disposed so as to be able to move up and down and move back and forth in the horizontal direction. This transfer arm 1
The substrate 02 has a substrate platform 102a whose front end is formed in a U shape in plan view so as not to interfere with the support pins 78 on the rotary table 72 when the substrate W is loaded and unloaded. The substrate mounting portion 102a of the transfer arm 102 is configured to support the substrate W by point contact from the lower surface side by three protrusions (not shown).

The operation of the above-described processing apparatus will be described. First, when the substrate W is carried into the processing apparatus by the transfer arm 102, the cup body 98 is lowered and the rotary table 72 is stopped. At this time, the lifting mechanism 88
As shown by the solid line in FIG. 5, in the lifting member 90 of FIG. 5, the operating piece 90a is in a horizontal posture due to the weight of the weight 92 attached to the lower end of the hanging piece 90b, and the operating piece 90a is in the rotary table. It is located below the upper surface of 72. For this reason,
As shown by the solid line in FIG. 5, the up-and-down moving member 82 is in contact with and supported by the plurality of minute projections 80 on the upper surface of the turntable 72, and is in the lower position.

In this state, the transfer arm 102
The substrate W is placed on the substrate platform 102a, enters the processing apparatus, moves to a position above the substrate rotation holder 70, and then descends to support the substrate W on the rotary table 3. Hand over to. Then, the transfer arm 102 retracts and retracts outside the processing apparatus. In order that the series of substrate transfer operations at this time can be carried out without any hindrance, the distance between the lower surface of the substrate W supported on the support pins 78 and the upper surface of the vertically moving member 82 at the lower position is set to the transport distance. Arm 102
The height of the support bin 78 (the position of the upper surface of the collar portion 78b) is appropriately set so as to be slightly larger than the thickness.

Next, in the processing, first, the cup main body 98 is raised to a predetermined position surrounding the substrate rotation holder 70, and then the motor 76 is driven, so that the turntable 72 and the substrate W are separated from each other. Rotate together. And
The nozzle 100 moves to a position above the rotation center of the substrate rotation holder 70 (a position indicated by a chain double-dashed line in FIG. 4).

As the rotary table 72 starts to rotate and the rotational speed gradually increases, the centrifugal force acting on the weight 92 of the push-up mechanism 88 increases, and the push-up member 90 starts rocking clockwise in FIG. . Then, the operating pieces 90a of the push-up members 90 respectively project from the upper surface of the turntable 72, and the operating pieces 90a raise the vertical moving member 82 upward while keeping the horizontal posture, as shown by the chain double-dashed line in FIG. Then, the peripheral edge of the upper surface of the vertically moving member 82 contacts the lower surface of the flange 78b of the support pin 78. By moving the vertical movement member 82 to the upper position in this manner, the lower surface of the substrate W and the upper surface of the vertical movement member 82 come close to each other with a slight gap, for example, a gap of 1 to 1.5 mm. During processing, this state is maintained.

When the turntable 72 reaches a predetermined rotation speed,
The processing liquid is supplied from the nozzle 100 onto the substrate W,
Required processing is performed on. At this time, the excess processing liquid is scattered from the peripheral edge of the substrate W to the surroundings, and a part of the scattered processing liquid becomes mist and drifts in the cup body 98, but the vertical movement member 82 rises to form the substrate W. Since the distance between the vertical movement member 82 and the vertical movement member 82 is extremely narrow, the mist hardly wraps around the back surface of the substrate W, and the adhesion of the mist to the back surface of the substrate W is prevented.

When the processing of the substrate W is completed, the motor 76 stops and the rotation speed of the turntable 72 gradually decreases. Along with this, the centrifugal force acting on the weight 92 of the lifting mechanism 88 is also reduced, and the lifting member 90 swings back to the original position shown by the solid line in FIG. Then, the vertically moving member 82, which is supported and lifted by the operating piece 90a of the pushing-up member 90, descends to the original lower position shown by the solid line in FIG.

When the rotary table 72 is completely stopped, the cup body 98 descends and the nozzle 100 retreats, and then the transfer arm 102 is driven so that the substrate mounting portion 102a moves to the substrate W and the vertical moving member 82. It enters the relatively large space formed between. Then, when the transfer arm 102 moves up, the processed substrate W is transferred from the substrate rotation holder 70 onto the substrate platform 102a, and then the transfer arm 102 retracts to move the substrate W. Unloaded from the processor.

[0015]

When the rotary substrate processing apparatus having the above-described configuration shown in FIGS. 4 and 5 is used, the substrate rotation holder 70 rotates and the substrate W is processed while being rotated integrally therewith. While moving, the vertical moving member 82 disposed on the rotary table 72 rises to prevent the mist from wrapping around to the back surface side of the substrate W and prevent the mist from adhering to the back surface of the substrate W. No need to do back rinse. Further, when carrying in and carrying out the substrate W, the vertical movement member 8
2 is lowered and the transfer arm 1 for the substrate rotation holder 70 is moved.
The forward / backward movement of 02 is performed without any trouble.

However, the substrate W is transferred by the transfer arm 102.
When the wafer W is carried into the processing apparatus and transferred onto the substrate rotation holder 70, or the processed substrate W on the substrate rotation holder 70 is received and carried out from the processing apparatus, the transfer arm 102 is used. If the vertical movement member 82 is not lowered to the lower position for some reason when entering the inside, the lower surface or the tip end surface of the substrate platform 102a of the transfer arm 102 contacts the upper surface or the peripheral edge of the vertical movement member 82. As a result, the operation of loading and unloading the substrate may be hindered, and a part of the device may be damaged.

Also, during the processing of the substrate, the vertical moving member 82
Is not raised to the upper position, it is impossible to prevent the processing liquid mist from wrapping around to the back surface side of the substrate, and the mist adheres to the back surface side of the substrate. As a result, the quality of the substrate is deteriorated.

The present invention has been made in view of the above circumstances, and supports the substrate at a slight distance from the upper surface of the rotary table, and vertically moves the vertical moving member disposed on the rotary table. In the rotary substrate processing apparatus, the vertical movement member is set to the lower position or the upper position in order to prevent the processing liquid mist from adhering to the back surface of the substrate during processing and to perform the loading and unloading of the substrate without hindrance. Check that it is in the position, and prevent malfunction of the vertical moving member from interfering with board loading and unloading operations and damaging part of the equipment due to board loading and unloading operations. Provided is a rotary substrate processing apparatus, which prevents a processing liquid mist from adhering to the back surface side of a substrate during processing of a substrate due to a malfunction of a vertically moving member, and prevents defective quality of the substrate from occurring. And an object thereof.

[0019]

The invention according to claim 1 is
A rotating table is vertically installed at the center of the lower surface and is supported in a horizontal posture and rotatable about a vertical axis. The rotating table is fixedly mounted on the upper surface of the rotating platform to keep the substrate in the horizontal posture and the upper surface of the rotating table. A substrate supporting means for supporting at a predetermined distance from the rotating table, a rotating means for rotating the rotating shaft of the rotating table, and at least about the same size as the substrate, arranged on the upper surface side of the rotating table, and horizontal. An up / down moving member supported in a vertically movable manner while maintaining a posture, and the up / down moving member is rotated to a lower position in contact with or close to the upper surface of the rotating table while the rotating table is stopped. In the rotary substrate processing apparatus provided with a vertical moving means for moving the substrate to an upper position near the back surface of the substrate supported by the substrate supporting means while the substrate is being processed, Vertical movement member at the center of the bottom surface A detection shaft that vertically moves integrally is provided vertically, and a detection unit that detects the vertical position of the detection shaft and confirms whether the vertical movement member has moved to a predetermined position is provided. Characterize.

According to a second aspect of the present invention, in the rotary substrate processing apparatus according to the first aspect, the rotary shaft of the rotary table is hollow, and the central part of the rotary table communicates with the hollow part of the rotary shaft. The detecting shaft of the vertically moving member is penetrated to form a through hole that allows the vertically moving member to move up and down, and the detecting means is configured as follows. That is, the valve body that is formed at the lower end of the detection shaft and moves in the vertical direction, and the lower surface of the valve body when the vertical movement member moves to a lower position where it contacts or approaches the upper surface of the rotary table. Of the lower valve seat and the upper valve seat, the lower valve seat being in close contact with the side and the upper valve seat being in close contact with the upper surface of the valve body when the vertically moving member moves to the upper position close to the lower surface of the base plate. Each part has a container shape with an opening, and a guide cylinder fitted in the hollow part of the rotary shaft, a vacuum suction path connected to the hollow part of the rotary shaft by a flow path, the vacuum suction path and the rotation. The above-mentioned detection means is provided with a vacuum suction means for vacuum-sucking the inside of the guide cylinder through the hollow portion of the shaft, and a pressure detection means interposed in the vacuum suction path for detecting the vacuum pressure thereof.

According to a third aspect of the present invention, in the rotary substrate processing apparatus according to the second aspect, when the upper surface side of the valve body comes into close contact with the upper valve seat of the guide cylinder, the air leaks to the outside through the through hole of the rotary table. It is characterized in that a leak portion is provided.

According to a fourth aspect of the present invention, in the rotary substrate processing apparatus according to any one of the first to third aspects, the detection means detects that the vertical moving member has not moved to a predetermined position. It is characterized in that an informing means is provided for issuing an alarm when the warning is given.

In the rotary substrate processing apparatus according to the first aspect of the present invention, when the vertical moving member moves in the vertical direction, the detection shaft vertically provided at the center of the lower surface of the vertical moving member integrally moves in the vertical direction. By detecting the vertical position of the detection shaft by the detection means, it becomes possible to confirm whether or not the vertical movement member has moved to a predetermined position.

In the rotary substrate processing apparatus according to the second aspect of the present invention, the detection shaft vertically provided at the center of the lower surface of the vertically moving member passes through the through hole formed at the center of the rotary table. The valve body that moves up and down and is formed at the lower end of the detection shaft moves up and down inside the guide cylinder that is fitted in the hollow portion of the rotating shaft. Further, the inside of the guide cylinder is vacuum-sucked by the vacuum suction means through the hollow portion of the rotating shaft and the vacuum suction passage connected to the hollow portion by a flow path. When the vertical movement member moves to a lower position where it contacts or approaches the upper surface of the rotary table, the lower surface side of the valve element comes into close contact with the lower valve seat of the guide cylinder, so that the opening formed in the lower valve seat portion is opened. Since it is blocked, the air pressure in the hollow portion of the rotary shaft and the vacuum suction path decreases (vacuum pressure increases). By detecting this increase in vacuum pressure by the pressure detection means, the vertical movement member is rotated by the rotary table. It is confirmed that it has moved to a lower position in contact with or close to the upper surface of. Further, when the vertical movement member moves to the upper position close to the lower surface of the base plate, the upper surface side of the valve body comes into close contact with the upper valve seat of the guide cylinder, thereby closing the opening formed in the upper valve seat portion. Therefore, the air pressure in the guide cylinder, the hollow part of the rotary shaft, and the vacuum suction path decreases (vacuum pressure increases),
By detecting the increase in the vacuum pressure by the pressure detecting means, it is confirmed that the vertical moving member has moved to the upper position close to the lower surface of the substrate.

In the rotary substrate processing apparatus according to the third aspect of the present invention, when the upper surface side of the valve body is in close contact with the upper valve seat of the guide cylinder, the inside of the guide cylinder is partially leaked to the outside air through the through hole of the rotary table due to the leak portion. Since there is a leak, the vacuum pressure in the vacuum suction passage at this time is lower than the vacuum pressure when the lower surface side of the valve body is in close contact with the lower valve seat of the guide cylinder. That is, the vacuum pressure in the vacuum suction path when the vertical moving member moves to the upper position close to the lower surface of the substrate, the vacuum suction path when the vertical moving member moves to the lower position contacting or close to the upper surface of the rotary table. It becomes lower than the vacuum pressure. Therefore, it is possible to confirm whether the vertically moving member is at the upper position or the lower position from the difference in the vacuum pressure.

In the rotary substrate processing apparatus according to the fourth aspect of the present invention, when the detecting means detects that the vertically moving member has not moved to the predetermined position, an alarm is issued and the operation of the vertically moving member is notified. The operator is notified that something is wrong.

[0027]

Preferred embodiments of the present invention will be described below with reference to the drawings.

FIGS. 1 and 2 show a first embodiment of the present invention.
As an example, FIG. 1 is a front sectional view showing a schematic configuration of a main part of a rotary substrate processing apparatus, and FIG. 2 is a partially enlarged sectional view thereof.

This rotary substrate processing apparatus has a substrate rotation holder 1 for holding a substrate W in a horizontal posture and rotating it about a vertical axis.
In the substrate rotation holder 10, the rotation shaft 14 is vertically provided at the center of the lower surface of the substrate rotation holder 10 and is supported in a horizontal posture and rotatable about a vertical axis.
The rotary table 12 is connected to the rotary table 12 via the rotary table 4. A plurality of support pins 16 for abutting against the peripheral edge of the substrate W to position and support the substrate W in a horizontal posture are screwed and fixed on the upper surface of the turntable 12, and a plurality of minute protrusions 18 are provided in a protruding manner. There is. These configurations are similar to those of the processing apparatus described above with reference to FIGS. 4 and 5, and the configuration of the support pins 16 is not different from that shown in FIG. . Although not shown, the substrate rotation holder 10 is similar to the processing apparatus shown in FIGS. 4 and 5.
A cup main body for preventing the scattering of the processing liquid is vertically arranged around the substrate, and a nozzle for supplying the processing liquid is horizontally reciprocated above the substrate rotation holder 10. It is arranged. Further, on the side of this processing apparatus, the substrate W is loaded into the processing apparatus and the substrate rotation holder 1
0, a transfer arm for receiving the processed substrate W from the substrate rotation holder 10 and carrying it out of the processing apparatus is provided so as to be able to move up and down and move back and forth in the horizontal direction. There is.

On the upper surface side of the rotary table 12, a circular vertical moving member 20 made of a thin plate material is arranged. And
Similar to the processing apparatus shown in FIGS. 4 and 5, the vertical movement member 20 is at least as large as the substrate W, and is formed to have a diameter slightly larger than the substrate W in the illustrated example. Instead of forming the circular guide hole 22 in the vertical moving member 20, a U-shaped notch opened to the outside may be formed in the peripheral edge of the vertical moving member. Also,
Guide holes 22 each having a diameter slightly larger than the body of the support pin 16 are formed in the peripheral portion of the vertical movement member 20 at positions corresponding to the support pins 16 on the rotary table 12, respectively. Since the support pin 16 is attached to the rotary table 12 by penetrating therethrough, the vertical movement member 20 is guided by the body of the support pin 16 and can move only in the vertical direction.

Further, this processing apparatus is also provided with the lifting mechanism having the above-described structure as described with reference to FIGS. 4 and 5, and the vertically moving member 20 is driven vertically by the lifting mechanism. However, since the push-up mechanism has already been described in detail, the illustration of the push-up mechanism is omitted in FIGS. 1 and 2, and the description thereof is also omitted here. The vertical moving means for moving the vertical moving member 20 in the vertical direction is as shown in FIGS.
Not only the push-up mechanism 88 as shown in FIG. 4 but also any mechanism may be used as long as the vertical moving member can be moved vertically. However, since the vertical moving means itself is not directly related to the gist of the present invention, The above description is omitted.

In this processing apparatus, a detection shaft 24 is vertically provided at the center of the lower surface of the vertical movement member 20, and the detection shaft 24 moves vertically with the vertical movement member 20.
Further, the rotating shaft 14 is formed in a hollow shape, and a through hole 28 is formed in the center of the rotating table 12 so as to communicate with the hollow portion 26 of the rotating shaft 12 and to penetrate the detecting shaft 24 to allow its vertical movement. Has been formed.

At the lower end of the detecting shaft 24, a valve body 30 having a shape in which an inverted conical portion is integrally formed on the lower surface side of a circular plate portion is integrally formed. Further, a guide cylinder 32 in the form of a cylindrical container is fitted to the upper end of the hollow portion 26 of the rotary shaft 14, and the valve body 30 of the detection shaft 24 is inserted into the guide cylinder 32. The body 30 is vertically movable within the guide tube 32. The guide cylinder 32 includes a lower valve seat 34 that is in close contact with the lower conical surface of the valve body 30, and the valve body 3
0 has an upper valve seat 36 that is in close contact with the upper surface side plane, and has openings 38 in the respective parts of the lower valve seat 34 and the upper valve seat 36,
40 are formed. Then, as shown by the solid line in FIG. 2, when the up-and-down moving member 20 moves to the lower position close to the upper surface of the turntable 12, the lower conical surface of the valve body 30 comes into close contact with the lower valve seat 34. The lower opening 38 is closed. Further, as shown by the two-dot chain line in FIG. 1 and in FIG. 2, when the vertical movement member 20 moves to the upper position close to the lower surface of the substrate W, the upper surface side plane of the valve body 30 has the upper valve seat 36. And closes the upper opening 40. Further, the circular plate portion of the valve body 30 is formed with a leak pore 42 penetrating therethrough. And the valve body 30
The inner surface of the guide cylinder 32 is closed when the upper surface side of the guide closes the upper valve seat 36 and closes the upper opening 40.
A part of the air leaks to the outside air through the through hole 28 of the rotary table 12. The leak pores 42 are
It does not necessarily have to be formed on the circular plate portion of the valve body 30.

In the hollow portion 26 of the rotary shaft 14, a vacuum suction passage 4 is provided through a vacuum seal and a housing (not shown).
4 is connected to the vacuum suction passage 44, and the vacuum suction passage 44 is connected to the vacuum suction source. The inside of the guide cylinder 32 can be vacuum-sucked through the vacuum suction passage 44 and the hollow portion 26 of the rotary shaft 14. Also,
A pressure gauge with two contacts 46 is provided in the vacuum suction passage 44, and the air pressure (vacuum pressure) in the vacuum suction passage 44 is detected by the pressure gauge 46. Although not shown, it is advisable to provide an alarm device that issues an alarm when the pressure gauge with two contacts 46 detects that the vertical movement member 20 has not moved to a predetermined position.

Next, a detecting operation for confirming whether or not the vertical moving member 20 is moved to a predetermined position in the rotary substrate processing apparatus having the above-mentioned structure will be described.

The inside of the guide cylinder 32 is vacuumed by a vacuum suction source through the vacuum suction passage 44 and the hollow portion 26 of the rotary shaft 14 at all times or at an arbitrary timing, and is vacuum sucked by a two-contact pressure gauge 46. The vacuum pressure in the passage 44 is monitored constantly or at any timing. When the substrate W is loaded into the processing apparatus and the processed substrate W is loaded from the processing apparatus, the rotary table 12 is used.
2 has stopped, and the vertical movement member 20 is
As shown by the solid line, it is in the lower position close to the upper surface of the turntable 12. Further, the valve body 30 at the lower end of the detection shaft 24 vertically provided at the center of the lower surface of the vertically moving member 20 is at the lowermost position shown by the solid line in FIG. 2, and the conical surface on the lower surface side is the guide cylinder. It is in close contact with the lower valve seat 34 of 32.
As a result, the lower opening 38 of the guide cylinder 32 is closed, and as a result, the vacuum pressure in the hollow portion 26 of the rotary shaft 14 and the vacuum suction passage 44 increases. By detecting the increase in the vacuum pressure by the pressure gauge with two contacts 46,
It is confirmed that the up-and-down moving member 20 is in the lower position close to the upper surface of the turntable 12.

On the other hand, when the rotary table 12 is stopped but the vertical moving member 20 is not lowered to the lower position close to the upper surface of the rotary table 12, the conical surface on the lower surface side of the valve body 30 is Is not in close contact with the lower valve seat 34 of the guide cylinder 32,
The hollow portion 26 of the rotary shaft 14 and the inside of the guide cylinder 32 are in communication with each other through the lower opening 38. As a result, the hollow portion 26 of the rotary shaft 14 leaks to the outside through the inside of the guide cylinder 32 and the through hole 28 of the rotary table 12, and the vacuum pressure in the vacuum suction passage 44 does not rise. At this time,
An abnormality is detected by the pressure gauge with two contacts 46, and an alarm is issued from the alarm device. Also, the transfer arm does not enter.

When the turntable 12 is rotating during the processing of the substrate W, the vertical moving member 20 is placed on the back surface of the substrate W as shown in FIG. 1 and by the chain double-dashed line in FIG. It is in a close up position. The valve element 30 at the lower end of the detection shaft 24 vertically provided at the center of the lower surface of the vertically moving member 20 is at the uppermost position shown by the chain double-dashed line in FIG. It is in close contact with the upper valve seat 36 of 32. As a result, the upper opening 40 of the guide cylinder 32 is closed, and as a result, the vacuum pressure in the inside of the guide cylinder 32, the hollow portion 26 of the rotary shaft 14 and the vacuum suction passage 44 increases. At this time, a leak pore 42 is formed in the circular plate portion of the valve body 30, and the guide cylinder 3 is passed through the leak pore 42 and the through hole 28 of the rotary base 12.
Since the inside of 2 partially leaks to the outside, the turntable 12
The vacuum pressure in the vacuum suction passage 44 does not rise as much as when the vertical movement member 20 is in the lower position close to the upper surface of the rotary table 12 after stopping. The rise of the vacuum pressure is detected by the pressure gauge with two contacts 46, whereby it is confirmed that the vertical movement member 20 is at the upper position close to the back surface of the substrate W.

On the other hand, when the rotary table 12 is rotating but the vertical moving member 20 is not raised to the upper position close to the rear surface of the substrate W, the upper surface side plane of the valve body 30 is a guide cylinder. It is not in close contact with the upper valve seat 36 of 32, and the inside of the guide cylinder 32 and the through hole 28 of the rotary base 12 are in communication with each other through the upper opening 40. As a result, the vacuum pressure in the inside of the guide tube 32, the hollow portion 26 of the rotary shaft 14 and the vacuum suction passage 44 does not rise. At this time, an abnormality is detected by the pressure gauge with two contacts 46, and an alarm is issued from the alarm device.

It should be noted that leak holes 4 are formed in the circular plate portion of the valve body 30.
When 2 is not formed, it is not possible to distinguish whether the vertical moving member 22 is in the lower position or the upper position by only detecting the vacuum pressure. In this case, therefore, the substrate rotation holder 1
The position of the vertical moving member 22 may be detected by combining a signal indicating whether 0 is rotating or stopped and a signal from the pressure gauge.

The detecting means for detecting the vertical position of the detection shaft vertically provided on the lower surface of the vertical moving member and confirming whether the vertical moving member is at a predetermined lower position or upper position is shown in FIGS. The configuration is not limited to that shown in FIG.
For example, as shown in FIG. 3, a rotary shaft 52, which is driven to rotate by a motor 50, is disposed so as to extend downward, and a vertical movement member 56 is provided in a hollow portion 54 formed at the axial center of the rotary shaft 52. A lower end of the detecting shaft 58 is further extended from the lower end of the rotating shaft 52 by inserting a detecting shaft 58 vertically provided at the center of the lower surface, and a light shielding plate is provided on an extending portion 58a of the detecting shaft 58. 6
0 is attached, and two sets of light projecting portions 62a and 64a and light receiving portions 62b and 6 are provided at two positions above and below so as to sandwich the light shielding plate 60.
4b may be arranged in each sensor. Reference numeral 66 in the drawing is a bearing.

In the processing apparatus shown in FIG. 3, when the up-and-down moving member 56 is in the lower position close to the upper surface of the turntable 12 as shown by the chain double-dashed line, the light beam emitted from the light projecting section 64a is emitted. The light is blocked by the light shielding plate 60, and no signal is output from the light receiving portion 64b. This confirms that the vertical movement member 56 is in the lower position close to the upper surface of the turntable 12. Further, when the vertical movement member 56 is in the upper position close to the back surface of the substrate W as shown by the solid line, the light beam emitted from the light projecting portion 62a is blocked by the light shielding plate 60, and a signal is received from the light receiving portion 62b. No output. Accordingly, it is confirmed that the vertical movement member 56 is in the upper position close to the back surface of the substrate W. The vertical position of the detection shaft 58 vertically provided on the lower surface of the vertical movement member 56 may be detected by a mechanical contact type detector instead of being detected by the optical sensor.

[0043]

The substrate is supported at a slight distance from the upper surface of the rotary table, and the vertical moving member arranged on the rotary table is moved in the vertical direction, so that the processing liquid mist on the back surface of the substrate during processing can be prevented. By configuring the rotary substrate processing apparatus that prevents the adhesion and can carry in and carry out the substrate without any trouble as in the invention according to claim 1, the substrate can be carried in due to the malfunction of the vertical moving member. Also, it is possible to prevent the operation of loading and unloading from being hindered, and to prevent damage to a part of the equipment due to the operation of loading and unloading the substrate, and the backside of the substrate during processing of the substrate due to malfunction of the vertically moving member. It is possible to prevent the processing liquid mist from adhering to the side and prevent the quality of the substrate from being deteriorated.

In the rotary substrate processing apparatus according to the second aspect of the present invention, whether or not the vertical moving member is at a predetermined position indicates the vacuum pressure in the vacuum suction passage connected to the hollow portion of the rotary shaft of the rotary table. Since it is confirmed by the detection, the above effect of the invention according to claim 1 is surely exhibited.

In the rotary substrate processing apparatus according to the third aspect of the present invention, the vertical moving member is located at the upper position or the lower position due to the difference in vacuum pressure of the vacuum suction path connected to the hollow portion of the rotary shaft of the rotary table. You can check which one is in.

In the rotary substrate processing apparatus according to the fourth aspect of the present invention, the operator can accurately know that there is something wrong with the operation of the vertical moving member by an alarm.

[Brief description of the drawings]

FIG. 1 is a front sectional view showing an example of an embodiment of the present invention and showing a schematic configuration of a main part of a rotary substrate processing apparatus.

FIG. 2 is an enlarged cross-sectional view of a part of the processing apparatus shown in FIG.

FIG. 3 is a front cross-sectional view showing another example of the embodiment of the present invention and showing a schematic configuration of a main part of a rotary substrate processing apparatus.

FIG. 4 is a partially cutaway front view showing an example of a schematic configuration of a conventional rotary substrate processing apparatus.

5 is a partially enlarged sectional view of the processing apparatus shown in FIG.

[Explanation of symbols]

 10 substrate rotation holder 12 rotary table 14, 52 rotary shaft 16 support pin 20, 56 vertical moving member 24, 58 detection shaft 26, 54 hollow portion of rotary shaft 28 rotary table through hole 30 valve body 32 guide cylinder 34, 36 Valve Seat 38, 40 Opening 42 Leakage Pore 44 Vacuum Suction Path 46 2 Contact Pressure Gauge 50 Motor 60 Light Shading Plate 62a, 64a Light Emitting Section 62b, 64b Light Receiving Section

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁶ Identification code Internal reference number FI Technical display location G03F 7/30 502 G03F 7/30 502 H01L 21/027 H01L 21/30 564C 21/306 569C 21 / 306 J

Claims (4)

[Claims] 1. A rotary table having a rotation shaft vertically provided at a central portion of a lower surface and rotatably supported in a horizontal posture and rotatable about a vertical axis; and a substrate fixed to an upper surface of the rotary platform to horizontally position the substrate. And a substrate supporting means for supporting the rotary table at a predetermined distance from the upper surface of the rotary table, a rotating means for rotating the rotary shaft of the rotary table, and at least about the same size as the substrate, on the upper surface side of the rotary table. An up-and-down moving member that is arranged and supported to be movable in the up-and-down direction while maintaining a horizontal posture, and the up-and-down moving member at a lower position that is in contact with or close to the upper surface of the rotating table while the rotating table is stopped. A rotary substrate processing apparatus comprising: a vertical moving unit that moves the rotary table to an upper position near the back surface of the substrate supported by the substrate supporting unit while the substrate is being processed by rotating the rotary table. , The center of the lower surface of the vertical moving member A detection shaft that vertically moves integrally with the vertical movement member is provided vertically, and the vertical position of the detection shaft is detected to detect whether the vertical movement member moves to a predetermined position. A rotary substrate processing apparatus comprising means. 2. The rotary shaft of the rotary table is hollow, and the detection shaft of the vertical moving member is pierced through the central part of the rotary table so as to communicate with the hollow part of the rotary shaft and allow its vertical movement. A hole is formed, the detection means is formed at the lower end of the detection shaft and moves vertically, and the vertical movement member is moved to a lower position where the vertical movement member comes into contact with or comes close to the upper surface of the rotary table. A lower valve seat that is in close contact with the lower surface side of the valve element, and an upper valve seat that is in close contact with the upper surface side of the valve element when the vertical movement member moves to an upper position close to the lower surface of the substrate; Each part of the valve seat and the upper valve seat has a container shape with an opening, and a guide cylinder fitted in the hollow part of the rotary shaft, and a vacuum suction path connected to the hollow part of the rotary shaft in a flow path, Through the vacuum suction path and the hollow part of the rotary shaft, Rotary substrate processing apparatus of a vacuum suction unit, the vacuum suction path interposed which are configured with a pressure detecting means for detecting the vacuum pressure, the claims 1, wherein the vacuum suction of. 3. The rotary substrate processing apparatus according to claim 2, further comprising a leak portion that leaks to the outside air through the through hole of the rotary table when the upper surface side of the valve body comes into close contact with the upper valve seat of the guide cylinder. 4. The rotary type according to claim 1, further comprising notification means for issuing an alarm when the detection means detects that the vertically moving member has not moved to a predetermined position. Substrate processing equipment.