JPH09161226A - Production of recording and reproducing separation head - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a process for producing a recording and reproducing separation head which is small in the magnetization transition width in a track width direction at the time of recording with respect to the recording and reproducing separation head. SOLUTION: An upper shielding film 18 and a magnetic gap film 20 are etched down to the middle of the upper shielding film until the track width size approximately equal to the track width size of an upper magnetic core 31 is attained, by which a projecting part is formed. The spread of the leaking magnetic flux at the track end at the time of recording is suppressed and the magnetization transition width at the track end is diminished. Either of a photoresist and the upper magnetic core used at the time of etching the nonmagneic metallic films and upper magnetic core formed by electroplating is used as a mask for the mask at the time of etching.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head used in a magnetic recording field such as a magnetic disk device and a magnetic tape device, and more particularly to an improved method of manufacturing a recording / reproducing separation head.

[0002]

2. Description of the Related Art In recent years, a recording / reproducing separation head using a magnetoresistive (MR) head has been used as a high-density recording head. Magnetoresistive effect (GM
A recording / reproducing separation head utilizing R) is also being developed. In this recording / reproducing separation head using MR or GMR, it is desirable to dispose the recording head and the reproducing head as close to each other as possible. Generally, as a recording magnetic core, a magnetic core etched to a desired track width dimension and In this case, one magnetic shield film of the MR element is also used as a recording magnetic pole, and is designed so that the distance between the reproducing gap and the recording gap is as small as possible. When the magnetic shield film is used as a magnetic pole in this way,
Since the magnetic shield film needs to enhance the shield effect, the MR
Since it is formed so as to completely cover the element portion, the dimension of the magnetic shield film in the track width direction becomes larger than the recording track width. When recording on a magnetic recording medium with such a recording head, there is a problem that the magnetization transition width at the track end portion becomes large, but the recording track density is not remarkably high and it must be manufactured at low cost. This method has been used for a low price magnetic disk device because of its easy manufacturing method.

However, when the recording track density becomes higher and the track width becomes 3 μm or less in the future, the size of the magnetization transition width at the track end becomes unignorable, and the magnetic shield film is recorded. A major issue is how to reduce the width of the transition of magnetization at the track end of the head used for the magnetic pole by an inexpensive method.

It is known in the prior art that it is desirable to match the track width dimensions of the two magnetic poles of the recording head as much as possible in order to reduce the magnetization transition width at the track end. As a manufacturing method for matching the width dimensions, Japanese Patent Publication No. 1-50007 discloses a method in which both magnetic poles are simultaneously etched using a metal oxide film to obtain the same dimensions without displacement.

[0005]

[Problems to be Solved by the Invention] However, the above Japanese Patent Publication No. 1
The method described in Japanese Patent No. 50007 cannot be used in the case where it is also used as a magnetic shield film because both magnetic poles are completely etched, and in terms of the manufacturing process, the metal oxide film is first used as a photoresist. The mask is etched, and then the mask is used to etch the upper magnetic core, the gap film, and the lower magnetic film.
There is a problem that it is difficult to obtain dimensional accuracy in the step of etching the metal oxide film mask, and the process is complicated and is not suitable as an inexpensive magnetic head manufacturing method.

Further, particularly when the magnetic core is formed by using a plating method capable of forming the track width dimension with high precision, even if the track width dimension of the upper magnetic core is formed with high precision by the plating method, metal oxidation is performed. If the upper magnetic core is not etched again after the film has been etched, the dimensions will not match, which will increase the number of repetitions of etching and complicate the process, making it difficult to manufacture an inexpensive magnetic head. There was a problem such as becoming.

An object of the present invention is to solve the above-mentioned problems, and a magnetization transition of a track end recorded on a magnetic recording medium is performed by an inexpensive method without impairing the shield effect of the MR head. It is an object of the present invention to provide a method of manufacturing a recording / reproducing separation head having an effect that the width can be substantially reduced.

[0008]

A method of manufacturing a recording / reproducing separation head according to the present invention is a recording / reproducing separation head using a magnetic shield film of a reproducing head as one magnetic pole of a recording head, the magnetic shield film of the reproducing head. A protrusion is provided on a part of the magnetic head so as to have approximately the same size as the magnetic core of the recording head, or a magnetic film having a saturation magnetic flux density higher than that of the magnetic shield film is formed on the magnetic shield film of the reproducing head. A method of manufacturing a recording / reproducing separation head in which a protrusion is provided so as to have substantially the same size as the magnetic core of the recording head, and the dimension of the magnetic shield film facing the recording magnetic core in the track width direction is made substantially the same as the recording head magnetic core. The nonmagnetic metal film is continuously formed after the magnetic film of the magnetic core of the recording head is formed by using the electroplating method. A step of ion milling a part of the recording magnetic gap film and the magnetic shield film as a mask is included, or the magnetic film of the magnetic core of the recording head is etched by ion milling using a photoresist as a mask. Re-covering the area other than the track width part with another photoresist while leaving the resist and performing ion milling, including the step of etching a part of the magnetic gap film and the magnetic shield film, or from the desired film thickness Forming a thick magnetic core,
Subsequently, the method is characterized by including a step of re-covering a region other than the track width portion with a photoresist, performing ion milling, and etching a part of the magnetic gap film and the magnetic shield film.

That is, according to the method of manufacturing the recording / reproducing separation head of the present invention, a mask is formed at the same time when the magnetic core or the magnetic core is formed except a part of the magnetic shield film, that is, a part of the magnetic shield film facing the magnetic core. A step of etching using a material is added, a part of the magnetic gap film and the magnetic shield film, and the minimum necessary film thickness are etched to provide a difference in the film thickness of the magnetic shield film and The recording / reproducing separation head having a small magnetization transition width is manufactured by concentrating the magnetic flux generated by spreading the magnetic field in the gap.

According to the present invention, the film thickness of a part of the magnetic shield film can be left in the required area, so that the magnetic flux at the time of recording can be concentrated in the gap portion without impairing the magnetic shield effect. It is possible to obtain almost the same effect as when the magnetic core dimensions are perfectly matched, and the mask formed at the same time as the upper magnetic core or the upper magnetic core itself is used. It is possible to provide a recording / reproducing separation head having a small transition width.

[0011]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows the shape of the air bearing surface of a recording / reproducing separation head manufactured by the method of the present invention. As shown in FIG. 1, a base film 12, a lower magnetic shield film 13, a lower gap film 14, an MR sensor film 1 are formed on a substrate 11.
5, the electrode film 16, the upper gap film 17, and the upper shield film 18 are sequentially laminated, and the structure and manufacturing method thereof are the same as the structure and manufacturing method of the MR head disclosed heretofore.

The difference from the prior art is that a magnetic film (protrusion) 19 having a saturation magnetic flux density higher than that of the material of the upper shield film 18 is arranged on the upper shield film 18 as shown in FIG. As shown in FIG. 3, a part of the upper shield film 18 is formed with a protrusion so that the width dimension thereof is substantially the same as that of the recording upper magnetic core film 31. The purpose of forming such a protrusion will be described below.

FIG. 16 shows a conventional recording magnetic pole portion in which the magnetic gap film 20 and the upper magnetic core film 31 are formed without forming a protrusion on the upper shield film 18. In FIG. 16, the leakage magnetic flux 21 in the track width direction from the end portion of the upper magnetic core film 31 spreads in the width direction and flows to the upper shield film 18, so that the magnetic field distribution at the track end portion of the magnetic gap portion does not become steep. The width of the magnetic transition is also widened.

On the other hand, in the present embodiment, as shown in FIG. 3, a part of the upper magnetic shield film 18 is etched together with the magnetic gap 20 to have the same size as the upper magnetic core film 31, and the protrusion is formed. The leakage magnetic flux 21 due to the formation of
Does not spread, the magnetic field distribution at the track edge becomes steep, and the magnetization transition width can be reduced. Further, as shown in FIG. 2, when a magnetic film 19 having a high saturation magnetic flux density, which is different from the upper magnetic shield film 18, is arranged on the protrusion, the magnetic field distribution can be made steeper.

Although the height of the protrusion is determined by the etching amount, the magnetic field distribution is affected by the height L of the protrusion shown in FIGS. 2 and 3, and if the height is too small, the effect cannot be obtained. The height L of the portion needs to be at least a magnetic gap length Gl or more, and preferably twice or more the magnetic gap length Gl.
The film thickness T of the magnetic shield film remaining after the etching process is at least 1 μm as a value capable of obtaining the shield effect.
m or more is required.

Next, a method of manufacturing the recording / reproducing separation head of this embodiment will be described. FIGS. 4 to 7 show a method of manufacturing the recording / reproducing separation head having the structure shown in FIG. 2 by using a plating method, omitting the reproducing MR element part, and manufacturing the recording magnetic pole part. It only shows. FIG. 8 is a plan view showing the element portion of the recording / reproducing separation head shown in FIG.

In FIG. 4, the upper shield layer 18 is made of NiFe (permalloy) and is formed by sputtering to have a thickness of 2 to 3 μm. continue,
The magnetic film 19 having a saturation magnetic flux density higher than that of NiFe is continuously formed. As the magnetic film 19, CoNiFe, Fe-45Ni, or the like is used, and is formed to have a thickness of about 0.5 to 1.5 μm by a sputtering method.

After that, the magnetic gap film 20 is formed to a thickness of about 0.2 to 0.5 μm by the sputtering method, so that the interlayer insulating film 42 including the coil portion is formed as shown in FIG. Subsequently, a plating base film 31 ′ and an upper magnetic core film 31 shown in FIG. 4 are formed. In this forming method, as shown in detail in FIG.
1'is formed using NiFe or the same material as the upper magnetic core film 31 to a thickness of about 0.1 to 0.2 μm by a sputtering method, and a required track width dimension is formed thereon by using a positive photoresist. The photoresist frame 33 is formed so that Then, the upper magnetic core film 31
The mask material 32 and the mask material 32 are formed by electroplating. The upper magnetic core film 31 has CoNiFe, Fe-45Ni, and Ni-.
18Fe or the like is used to form a thickness of about 2 to 4 μm, and a nonmagnetic metal film such as Cr or Cu capable of electroplating is formed on the mask material 32 to a thickness of about 1 to 3 μm. After that, the magnetic film, the photoresist frame and the like in the unnecessary regions are removed by means such as chemical etching and ion milling to obtain the shape shown in FIG.

After that, a photoresist is formed and covered on the entire surface of the device, and the photoresist removing portion 43 shown in FIG. 8 is formed through the steps of exposure and development. The portion to be removed at this time includes the tip of the interlayer insulating film 42 and is formed so that the portion defining the track width of the mask material 32 on the upper magnetic core film 31 is completely exposed.

After that, as shown in FIG. 6, the track portion is further etched by an ion milling method using Ar ions or (Ar + O ² ) ions to form the magnetic gap film 20.
And etching is performed until the magnetic film 19 is completely removed. As a result, the track portion can be formed as shown in FIG. 6, and when the photoresist covering the entire element surface is removed and the mask material 32 is removed by chemical etching, the track width dimension of the upper magnetic core is determined after plating. There is almost no change from the size of the above, and a desirable shape as shown in FIG. 7 is formed.

Here, the film thickness of the upper shield film 18 left after etching needs to be at least 1 μm or more as a value for obtaining the shield effect as described above, and this amount should be secured. In this method, the mask material 32
When a metal film having good corrosion resistance such as Cr is used as the metal film, it may be left as it is without being removed.

9 to 12 show another method of manufacturing the recording / reproducing separation head, and show a method of forming the recording / reproducing separation head having the structure shown in FIG. 2 by combining the sputtering method and the ion milling method. It is shown. FIG.
12 to 12 are different from the methods shown in FIGS. 4 to 7 and 5 in that the photoresist 34 is used instead of the mask material 32, and the upper magnetic core film 31 is formed by sputtering. The basic way is the same, except that is different.

FIGS. 13 to 15 show a method for forming the recording / reproducing separation head structure of the present invention by a simpler method. The upper magnetic core film 31 is formed thick in advance, and FIG. In the same manner as the method shown in FIGS. 7 to 7, the track portion is etched with Ar ions or the like. In this case, although it is difficult to control the film thickness of the upper magnetic core film 31, in the recording / reproducing separation head in which the film thickness tolerance is allowed to be large, the magnetization transition width in the track width direction is small at the lowest cost. It can be used as a possible method.

Further, in the embodiments shown in FIGS. 4 to 7, 9 to 12 and 13 to 15, an example in which the magnetic film 19 having a high saturation magnetic flux density is arranged on the upper magnetic shield film 18 is shown. However, this part is entirely covered by the upper magnetic shield film 18
The same method can be used for the production.

After forming the upper magnetic core film 31 as described above, a lead wire (not shown) for conducting electricity, a protective film 44 shown in FIG. 1, a terminal for connecting a lead wire (see FIG. (Not shown) or the like is formed to complete the recording / reproducing separation head by a generally known method.

As is clear from the above description, according to the above-described embodiment, in the recording / reproducing separation head in which the magnetic shield film (upper shield film 18) of the reproducing head (MR head) is used as one magnetic pole of the recording head. , A step portion (protrusion) is provided so that a part of the magnetic shield film of the reproducing head has approximately the same size as the magnetic core of the recording head, and the size in the track width direction of the recording magnetic core facing part of the magnetic shield film is recorded. There is provided a method of manufacturing a recording / reproducing separation head, which is characterized in that a portion approximately matched with a head magnetic core is produced.

Further, the recording magnetic core facing portion of the magnetic shield film may include a magnetic film (19) made of a material having a higher saturation magnetic flux density than the magnetic shield film other than the facing portion. good.

The height L of the stepped portion (protrusion) of the magnetic shield film is at least the recording magnetic gap length G1 and the film thickness T of the magnetic shield film in the area other than the stepped portion.
Is at least 1 μm or more.

[0030]

As described above, according to the method of manufacturing the recording / reproducing separation head of the present invention, there is no need for a mask material that must be formed by etching in advance, and only the photoresist or the plating method can be used at the same time. Since the formed mask material can process both track widths of the recording magnetic poles to have substantially the same dimensions, the manufacturing method is simplified, and the shield film has a structure capable of ensuring a required film thickness, which results in low cost. Thus, it is possible to provide a high performance recording / reproducing separation head having a small magnetization transition width in the track width direction.

[Brief description of the drawings]

FIG. 1 is a diagram showing a structure of a medium air bearing surface of a recording / reproducing separation head manufactured by a method of the present invention.

FIG. 2 is a diagram showing a shape of a recording magnetic pole and a leakage magnetic flux in the embodiment of the present invention.

FIG. 3 is a diagram showing a shape of a recording magnetic pole and a leakage magnetic flux in the embodiment of the present invention.

FIG. 4 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by electroplating.

FIG. 4 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by electroplating.

FIG. 4 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by electroplating.

FIG. 7 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by electroplating.

FIG. 8 is an element plan view of a recording / reproducing separation head manufactured by the manufacturing method of the present invention.

FIG. 9 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by a sputtering method and an ion milling method.

FIG. 9 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by the sputtering method and the ion milling method.

FIG. 9 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by the sputtering method and the ion milling method.

FIG. 12 is a diagram showing a process of forming the shape of the recording magnetic pole of the present invention by the sputtering method and the ion milling method.

FIG. 13 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by a simple method using electroplating.

FIG. 14 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by a simple method using electroplating.

FIG. 15 is a diagram showing a step of forming the shape of the recording magnetic pole of the present invention by a simple method using electroplating.

FIG. 16 is a diagram showing a shape of a recording magnetic pole of a conventional recording / reproducing separation head and a leakage magnetic flux in a track width direction.

[Explanation of symbols]

11 ... Substrate, 12 ... Underlayer film, 13 ... Bottom shield film, 1
4 ... Lower gap film, 15 ... MR sensor film, 16 ... Electrode film, 17 ... Upper gap film, 18 ... Upper shield film, 1
9 ... Magnetic film, 20 ... Magnetic gap film, 21 ... Leakage magnetic flux at track end, 31 ... Upper magnetic core film, 31 '... Plating base film, 32 ... Mask material, 33 ... Photoresist frame, 42 ... Interlayer insulating film , 43 ... Photoresist removing section,
44 ... Protective film.

Claims (1)

[Claims] 1. A recording / reproducing separation head using a magnetic shield film of a reproducing head as one magnetic pole of a recording head, wherein a part of the magnetic shield film of the reproducing head has substantially the same size as a magnetic core of the recording head. As described above, the protrusion is formed on the magnetic shield film of the reproducing head with a magnetic film having a saturation magnetic flux density higher than that of the magnetic shield film so that the protrusion has approximately the same size as the magnetic core of the recording head. In a method of manufacturing a recording / reproducing separation head in which the dimension of the magnetic shield film in the track width direction of the recording magnetic core facing portion is made substantially equal to that of the recording head magnetic core, a magnetic film of the magnetic core of the recording head is formed by electroplating After forming, the non-magnetic metal film is continuously formed,
This method includes a step of ion milling a part of the recording magnetic gap film and the magnetic shield film using the nonmagnetic metal film as a mask, or etching the magnetic film of the magnetic core of the recording head by ion milling using a photoresist as a mask. Then, a step of re-covering a region other than the track width portion with another photoresist while leaving this photoresist and performing ion milling to etch a part of the magnetic gap film and the magnetic shield film, or , Including a step of forming a magnetic core thicker than a desired film thickness, subsequently re-covering a region other than the track width portion with photoresist, performing ion milling, and etching a part of the magnetic gap film and the magnetic shield film. A method of manufacturing a recording / reproducing separation head, comprising: