JPH09157730A - Vacuum degassing equipment of vessel lifting system - Google Patents

Vacuum degassing equipment of vessel lifting system

Info

Publication number
JPH09157730A
JPH09157730A JP25410896A JP25410896A JPH09157730A JP H09157730 A JPH09157730 A JP H09157730A JP 25410896 A JP25410896 A JP 25410896A JP 25410896 A JP25410896 A JP 25410896A JP H09157730 A JPH09157730 A JP H09157730A
Authority
JP
Japan
Prior art keywords
lance
vacuum
tank
vacuum chamber
vacuum degassing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP25410896A
Other languages
Japanese (ja)
Inventor
Kosuke Yamashita
幸介 山下
Keiichi Katahira
圭一 片平
Hikari Motomiya
光 本宮
Hikofumi Taniishi
彦文 谷石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP25410896A priority Critical patent/JPH09157730A/en
Priority to PCT/JP1996/002831 priority patent/WO1997012067A1/en
Publication of JPH09157730A publication Critical patent/JPH09157730A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21CPROCESSING OF PIG-IRON, e.g. REFINING, MANUFACTURE OF WROUGHT-IRON OR STEEL; TREATMENT IN MOLTEN STATE OF FERROUS ALLOYS
    • C21C7/00Treating molten ferrous alloys, e.g. steel, not covered by groups C21C1/00 - C21C5/00
    • C21C7/10Handling in a vacuum

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Treatment Of Steel In Its Molten State (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide vacuum degassing equipment of a vessel lifting system to which a lance device designed to blow oxygen, gaseous fuel, powder, etc., in the vacuum chamber of the vacuum degassing equipment of the vessel lifting system is applicable without any problems in terms of the equipment and operation. SOLUTION: A supporting frame 22 is disposed on a supporting stand 2 which supports the vacuum chamber 1 immersed at its lower part into molten metal 5 housed in a ladle 6 and is lifted by a lifting device. The lance device 10 freely liftably supports the lance 8 for blowing the oxygen, gaseous fuel, powder, etc., into the vacuum vessel 1 is disposed at the supporting frame 22. The lance device is simultaneously lifted together with the vacuum vessel 1. The vacuum chamber 1 is divided to a top cap section 10 to be fixed to the supporting stand 2 and a lower vessel 1u. The top cap section 10 is fixed to the supporting stand 2 and the lower part 1u is made attachable and detachable to and from the top cap part 10. Only the lower part 1u is exchanged to lessen the burden for the exchange work.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、製鋼工程での真空
脱ガス精錬に際して用いられる槽昇降方式の真空脱ガス
設備に関するものであり、より具体的には、下部を取鍋
内の溶鋼に浸漬する真空槽内に酸素、燃料ガス、粉体等
を吹き込むためのランスを昇降自在に支持するランス装
置の設備構造に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum degassing equipment of a tank elevating system used for vacuum degassing and refining in a steelmaking process, and more specifically, a lower part is immersed in molten steel in a ladle. The present invention relates to a facility structure of a lance device that supports a lance for blowing oxygen, fuel gas, powder, etc. in a vacuum chamber that can be raised and lowered.

【0002】[0002]

【従来の技術】例えば、鉄鋼の分野では、溶鋼の脱水
素、脱窒素等の脱ガス、真空脱炭および溶鋼の清浄化や
成分調整のために、一般にDH式真空脱ガス設備や、R
H式真空脱ガス設備、その他の方式の真空脱ガス設備が
用いられており、近年では、これらの真空脱ガス設備に
おいて操業の効率化を図るため、真空槽内に酸素、燃料
ガス、粉体等を吹き込むためのランスを昇降自在に支持
したランス装置を設置することが提案されている。通
常、これらの真空脱ガス設備では、真空槽の下部槽また
は下部槽に形成された浸漬管を取鍋内の溶鋼中に浸漬し
て操業する必要があり、そのために取鍋あるいは真空槽
を昇降させる機構を備えている必要がある。
2. Description of the Related Art For example, in the field of iron and steel, DH type vacuum degassing equipment and R are generally used for dehydrogenation of molten steel, degassing such as denitrification, vacuum decarburization, cleaning of molten steel and adjustment of components.
H-type vacuum degassing equipment and other types of vacuum degassing equipment are used, and in recent years, in order to improve the efficiency of operation in these vacuum degassing equipment, oxygen, fuel gas, powders are placed in the vacuum tank. It has been proposed to install a lance device that supports a lance for blowing air etc. so that the lance can be moved up and down. Usually, in these vacuum degassing equipment, it is necessary to operate the lower tank of the vacuum tank or the dip pipe formed in the lower tank by immersing it in the molten steel in the ladle. It is necessary to have a mechanism to make it.

【0003】従来、真空槽内に酸素、燃料ガス、粉体等
を吹き込むためのランスを昇降自在に支持するランス装
置を設置する場合には、例えば図3に示すように、真空
槽1が支持架台2に固定されているために、真空槽1の
下方に油圧シリンダー等の昇降装置3により昇降する昇
降台4を配置し、溶鋼5を収容した取鍋6をその昇降台
4上に移動し、この昇降台を上昇させて真空槽1下部の
浸漬管7を取鍋6内の溶鋼5中に浸漬して真空脱ガス操
業を行うようにしている。
Conventionally, when a lance device for supporting a lance for injecting oxygen, fuel gas, powder, etc. in a vertically movable manner is installed in the vacuum chamber, the vacuum chamber 1 is supported as shown in FIG. 3, for example. Since it is fixed to the gantry 2, an elevating table 4 which is moved up and down by an elevating device 3 such as a hydraulic cylinder is arranged below the vacuum chamber 1, and a ladle 6 containing molten steel 5 is moved onto the elevating table 4. The elevation table is raised to immerse the dip pipe 7 in the lower portion of the vacuum tank 1 in the molten steel 5 in the ladle 6 to perform vacuum degassing operation.

【0004】このような槽固定方式(取鍋昇降方式)の
真空脱ガス設備においては、ランス8とランスを昇降さ
せるランス昇降装置9からなるランス装置10を設置す
る場合、真空槽1の上方の建屋11の柱12にランス昇
降装置9を取り付け、真空槽1の天蓋部にランス8を挿
通する開口部13とシール装置14を設けることによ
り、設備の構造上、操業上支障がなく、真空脱ガス設備
におけるランス装置の機能、目的を達成させることがで
きる。
In the vacuum degassing equipment of such a tank fixing system (ladle raising / lowering system), when the lance device 10 including the lance 8 and the lance lifting device 9 for raising and lowering the lance is installed, the vacuum chamber 1 above the vacuum chamber 1 is installed. The lance lifting device 9 is attached to the pillar 12 of the building 11, and the opening 13 for inserting the lance 8 and the sealing device 14 are provided in the canopy portion of the vacuum tank 1 so that the structure of the facility does not hinder the operation and the vacuum removal is performed. The function and purpose of the lance device in the gas facility can be achieved.

【0005】しかしながら、真空脱ガス設備の中には、
槽固定方式ではなく真空槽を昇降させる槽昇降方式(取
鍋固定方式)も採用されている。この槽昇降方式のもの
としては、レバータイプ(梃子方式)の昇降方式、4本
柱シリンダー昇降方式、あるいはウインチ昇降方式等が
ある。
However, in the vacuum degassing equipment,
Instead of the tank fixing method, the tank lifting method that raises and lowers the vacuum tank (fixed ladle method) is also used. Examples of this tank elevating system include a lever type (lever system) elevating system, a four-column cylinder elevating system, and a winch elevating system.

【0006】レバータイプ(梃子方式)の昇降方式は、
図4に示すように、真空槽1を支持する支持架台2を、
支持台15の支軸16を中心に上下に回動自在に支持さ
せ、油圧シリンダー等の昇降装置17により、支持架台
2をカウンターウエイト18を介して上下に回動させる
ことにより真空槽1を昇降させるように構成されたもの
であり、このレバータイプ昇降方式では、真空槽1は支
持台15の支軸16を中心として円弧状の軌跡cbを描
くように昇降させるようにしている。
The lever type (lever type) lifting system is
As shown in FIG. 4, the support base 2 that supports the vacuum chamber 1 is
The support stand 15 is rotatably supported up and down about a support shaft 16, and a lift 17 such as a hydraulic cylinder is used to move the support stand 2 up and down through a counterweight 18 to move the vacuum tank 1 up and down. In this lever type lifting method, the vacuum chamber 1 is moved up and down so as to draw an arcuate locus cb around the support shaft 16 of the support base 15.

【0007】また、4本柱シリンダー昇降方式は、図5
に示すように、真空槽1を支持した支持架台2を油圧シ
リンダー等の昇降装置17により昇降自在な4本柱19
で支持し、昇降装置17により4本柱を同時に昇降させ
るように構成されたものであり、この4本柱シリンダー
昇降方式では、真空槽1は鉛直線状に昇降させるように
している。
The four-column cylinder lifting method is shown in FIG.
As shown in FIG. 4, the support base 2 supporting the vacuum chamber 1 can be lifted and lowered by a lifting device 17 such as a hydraulic cylinder.
It is structured such that the four columns are simultaneously moved up and down by the elevating device 17, and in this four-column cylinder up-and-down method, the vacuum chamber 1 is vertically moved up and down.

【0008】そして、ウインチ昇降方式では、図6に示
すように、真空槽1を支持した支持架台2をウインチ2
0でチェーン21を介して巻上げ・巻き下げして真空槽
1を鉛直線状に昇降させるようにしている。
In the winch raising / lowering method, as shown in FIG. 6, the support base 2 supporting the vacuum chamber 1 is attached to the winch 2
At 0, the vacuum chamber 1 is hoisted and unwound via the chain 21 to vertically move up and down.

【0009】しかしながら、これら槽昇降方式の真空脱
ガス設備においては、脱ガスが主目的に行われているの
みで、真空槽に酸素、燃料ガス、粉体等を吹き込むため
には、前記真空槽に直接開口部を固定的に設けた固定ラ
ンスが僅かに例として実施されているのみで、前記昇降
可能なランス装置が真空脱ガス設備と組み合わされた例
は何れも槽固定方式、すなわち、取鍋昇降方式に依存し
ていた実情にあり、槽昇降方式の真空脱ガス設備に昇降
自在に支持したランス装置を直接配設した例は過去にそ
の実例を見ない。
However, in these vacuum evacuation equipment of the tank elevating type, degassing is mainly performed, and in order to blow oxygen, fuel gas, powder, etc. into the vacuum tank, the vacuum tank is used. Only a fixed lance having a fixed opening directly provided in the above is implemented as an example, and the examples in which the lance device capable of moving up and down is combined with the vacuum degassing equipment are all tank fixing methods, that is, In the actual situation, which depended on the pan raising / lowering method, there is no actual case in the past where a lance device supported to be able to move up and down is directly provided in a vacuum degassing equipment of a tank raising / lowering method.

【0010】仮に、上記レバータイプ昇降方式、4本柱
シリンダー昇降方式、ウインチ昇降方式の槽昇降方式の
真空脱ガス設備に直接ランス装置を昇降自在に取り付け
ようとした場合には以下のような問題点があるため実現
しえなかった。
If it is attempted to directly attach the lance device to the vacuum degassing equipment of the lever type lifting system, the four column cylinder lifting system, and the winch lifting system of the tank lifting system, the following problems will occur. It couldn't be realized because of the points.

【0011】まず、レバータイプ昇降方式では、真空槽
の昇降軌跡が円弧状であるのに対してランスの昇降軌跡
はまったく異なるが鉛直線状であるため、操業を続ける
うちに真空槽やレバーの熱変形が生じた場合に真空槽の
天蓋部のランス孔の芯の位置と、昇降するランスの芯の
位置が微妙に合わなくなり、高いシール性を維持しなが
らランスを真空槽内に挿入することができなくなること
と、真空槽が操業位置に停止するまでランスを真空槽内
に挿入できなかった。
First of all, in the lever type lifting system, the lifting path of the vacuum chamber is arcuate, whereas the lifting path of the lance is completely different, but it is a vertical line. When the thermal deformation occurs, the position of the core of the lance hole on the canopy of the vacuum chamber and the position of the core of the lance that moves up and down do not match finely, and insert the lance into the vacuum chamber while maintaining high sealing performance. And the lance could not be inserted into the vacuum chamber until the vacuum chamber stopped at the operating position.

【0012】一方、4本柱シリンダー昇降方式、ウイン
チ昇降方式では、操業中の真空槽内の真空度の変化に応
じて、真空槽の高さを変えたり、真空度による湯面位置
の変動に応じて、ランス高さ位置を頻繁に変化させる必
要がある。
On the other hand, in the 4-column cylinder lifting system and the winch lifting system, the height of the vacuum chamber is changed according to the change of the vacuum degree in the vacuum chamber during operation, or the position of the molten metal is changed due to the vacuum degree. Accordingly, it is necessary to change the lance height position frequently.

【0013】しかし、ランスを真空槽内に挿入した状態
で真空槽を頻繁に昇降させる場合、ランスを真空槽の昇
降に同期させて上下動させるにしても微妙にズレが生じ
て、ランスと真空槽とが相対的に上下動することになる
上、ランス芯とシール装置のランス孔の芯とが微妙にズ
レるなどすることで、ランス外表面およびシール装置の
ランス孔の損耗が激しくなってシール性が悪化するた
め、真空槽内の真空度が低下し、真空槽内での真空度を
安定確保できず、安定操業ができなくなる。
However, when the vacuum chamber is frequently moved up and down with the lance inserted in the vacuum chamber, even if the lance is moved up and down in synchronism with the vertical movement of the vacuum chamber, a slight deviation occurs, and the lance and the vacuum chamber are vacuumed. The tank moves up and down relatively, and the lance core and the lance hole core of the sealing device are slightly deviated from each other. Since the property deteriorates, the degree of vacuum in the vacuum chamber decreases, and the degree of vacuum in the vacuum chamber cannot be secured stably, so that stable operation cannot be performed.

【0014】また、昇降シール装置の損耗が激しくなっ
て寿命が短くなるため、補修や、交換回数増の問題もあ
る上、頻繁にランス芯とランス孔との位置合わせを行う
必要があって、これらのメンテナンス時間が多く、コス
ト増、生産性低下を生じるといった問題もある。
Further, since the lifting seal device is heavily worn and shortens its life, there is a problem that the number of repairs and replacements is increased, and it is necessary to frequently align the lance core and the lance hole. There is also a problem that the maintenance time is long, the cost is increased, and the productivity is lowered.

【0015】[0015]

【発明が解決しようとする課題】本発明は、槽昇降方式
の真空脱ガス設備において、真空槽内で酸素、燃料ガ
ス、粉体等の吹き込みを目的とするランス装置を、設備
的、操業的に問題がなく適用可能な槽昇降方式の真空脱
ガス設備を提供するものである。
DISCLOSURE OF THE INVENTION The present invention relates to a vacuum evacuation equipment of a chamber elevating system, which is equipped with a lance device for blowing oxygen, fuel gas, powder, etc. in a vacuum chamber. It is intended to provide a vacuum evacuation equipment of a tank elevating system which can be applied without any problem.

【0016】[0016]

【課題を解決するための手段】本発明の第一の発明は、
槽昇降方式の真空脱ガス設備において、真空槽に酸素、
燃料ガス、粉体等を吹き込むためのランスを昇降自在に
支持したランス装置を、前記槽昇降方式の真空脱ガス設
備に直接配設したことを特徴とする槽昇降方式の真空脱
ガス設備である。本発明の第二の発明は、槽昇降方式の
真空脱ガス設備において、下部を取鍋に収容した溶湯中
に浸漬する真空槽を支持し昇降装置により昇降する支持
架台上に、支持架構を配設し、この支持架構に、真空槽
に酸素、燃料ガス、粉体等を吹き込むためのランスを昇
降自在に支持するランス装置を配設し、このランス装置
を真空槽と同時昇降させるようにしたことを特徴とする
槽昇降方式の真空脱ガス処理設備である。本発明の第三
の発明は、第一の発明において、真空槽を、支持架台に
固定する天蓋部と下部槽とに分割し、天蓋部を支持架台
に固定し、下部を天蓋部に対して着脱可能にしたことを
特徴とする槽昇降方式の真空脱ガス処理設備である。本
発明の第四の発明は、前記第一〜第三の発明において真
空脱ガス設備がRH式真空脱ガス設備であることを特徴
とする槽昇降方式の真空脱ガス設備である。
Means for Solving the Problems The first invention of the present invention is:
In the vacuum degassing equipment of the tank lifting type, oxygen in the vacuum tank,
A vacuum evacuation equipment of a tank elevating system characterized in that a lance device for supporting a lance for injecting fuel gas, powder, etc. to be lifted up and down is directly arranged in the vacuum evacuation equipment of the tank elevating system. . A second invention of the present invention is that, in a vacuum evacuation equipment of a tank elevating system, a supporting frame is arranged on a supporting frame which supports a vacuum tank immersed in a molten metal contained in a ladle and is elevated by an elevating device. A lance device for supporting a lance for blowing oxygen, fuel gas, powder, etc. into the vacuum chamber is provided on the support frame so that the lance can be moved up and down, and the lance device is moved up and down simultaneously with the vacuum chamber. It is a vacuum degassing treatment facility of a tank elevating type characterized by the following. In a third aspect of the present invention, in the first aspect, the vacuum chamber is divided into a canopy portion that is fixed to the support frame and a lower chamber, the canopy portion is fixed to the support frame, and the lower portion is attached to the canopy part. This is a vacuum degassing equipment of the tank lifting type, which is detachable. A fourth invention of the present invention is a tank-lifting vacuum degassing equipment characterized in that the vacuum degassing equipment in the first to third inventions is an RH type vacuum degassing equipment.

【0017】[0017]

【発明の実施の形態】以下に、本発明の実施の形態を図
1〜図2に示す例に基づいて説明する。 (実施例1)図1は、本発明を適用して真空槽内に酸素
あるいは燃料ガス等を吹き込むランス装置を設置した、
真空脱ガス設備例を概念的に示したものである。ここに
示されるRH式真空脱ガス設備においては、操業中に取
鍋6の位置を固定し、この取鍋6に収容されている溶鋼
5に真空槽1の下部の浸漬管7を浸漬させるために、真
空槽1を油圧シリンダー(昇降装置)17により昇降す
る4本の支持柱19に支持された支持架台2に固定し、
油圧シリンダー17により4本の支持柱19、支持架台
2を介して真空槽1を昇降させる、4本柱シリンダー昇
降式による槽昇降方式の真空脱ガス設備が採用されてい
る。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the examples shown in FIGS. (Embodiment 1) FIG. 1 shows a lance device for injecting oxygen or fuel gas into a vacuum chamber according to the present invention.
1 is a conceptual illustration of an example of vacuum degassing equipment. In the RH type vacuum degassing equipment shown here, in order to fix the position of the ladle 6 during operation and to immerse the molten steel 5 contained in the ladle 6 into the dipping pipe 7 under the vacuum tank 1. Then, the vacuum tank 1 is fixed to a support frame 2 supported by four support columns 19 which are vertically moved by a hydraulic cylinder (elevating device) 17,
A vacuum evacuation equipment of a tank elevating system by a four-column cylinder elevating system is employed, in which the vacuum tank 1 is elevated and lowered by the hydraulic cylinder 17 via the four support columns 19 and the support base 2.

【0018】この槽昇降方式のRH式真空脱ガス設備に
おいては、真空槽1内に酸素あるいは燃料ガス等を吹き
込むランス装置10を設置するため、真空槽1を支持す
る支持架台2に門型の支持架構22を配設し、この支持
架構に支柱23を立設して、この支柱にはランス昇降装
置9が設置されている。
In this RH type vacuum degassing equipment of the chamber lifting type, since the lance device 10 for blowing oxygen or fuel gas into the vacuum chamber 1 is installed, the support frame 2 supporting the vacuum chamber 1 is of a gate type. A support frame 22 is arranged, a column 23 is erected on the support frame, and a lance lifting device 9 is installed on the column.

【0019】この昇降装置9には、酸素あるいは燃料ガ
ス等の供給源(図示省略)に接続された供給ホース24
を介して接続されたランス8が、真空槽1の天蓋部のラ
ンス孔13、シール装置14に挿通され昇降可能に装着
されてランス装置10が形成されている。
The hoisting device 9 has a supply hose 24 connected to a supply source (not shown) of oxygen or fuel gas.
A lance device 10 is formed by inserting a lance 8 connected through the lance 8 into the lance hole 13 of the canopy portion of the vacuum chamber 1 and the sealing device 14 so as to be movable up and down.

【0020】真空脱ガス操業に際しては、油圧シリンダ
ー17により支持柱19を上昇させて真空槽1を、その
下方に搬入される取鍋6に干渉しない位置に退避させる
とともに、ランス昇降装置9によりランス8の位置を調
整する。そして、取鍋6を真空槽1下方の操業位置に搬
入した後、油圧シリンダー17により支持柱19を介し
て真空槽1を下降させ、下部の浸漬管7を取鍋6内の溶
鋼5中に所定深さ浸漬するとともに、ランス昇降装置9
によりランス8の先端位置を真空度調整された真空槽1
内に吸い上げられ循環する溶鋼5の湯面上の所定位置に
位置決めする。
In the vacuum degassing operation, the hydraulic cylinder 17 raises the support column 19 to evacuate the vacuum chamber 1 to a position where it does not interfere with the ladle 6 carried in below, and the lance lifting device 9 causes the lance to move. Adjust the position of 8. Then, after the ladle 6 is carried into the operating position below the vacuum tank 1, the vacuum tank 1 is lowered by the hydraulic cylinder 17 through the support column 19, and the lower immersion pipe 7 is placed in the molten steel 5 in the ladle 6. Dip to a predetermined depth and lift the lance 9
Vacuum chamber 1 with the tip position of the lance 8 adjusted by the vacuum degree
The molten steel 5 sucked up and circulated therein is positioned at a predetermined position on the molten metal surface.

【0021】酸素、燃料ガス、粉体等は、必要なタイミ
ングでその供給源から供給ホース24を介してランス8
に導き、真空槽1内を循環する溶鋼5中に適量吹き込ん
で真空脱ガス操業を実施するようにしている。図中、2
5は真空槽1内からの含塵排ガスを排出(吸引)する排
ガスダクトである。
Oxygen, fuel gas, powder, etc. are supplied from the supply source via the supply hose 24 at the required timing to the lance 8.
Then, an appropriate amount is blown into the molten steel 5 circulating in the vacuum chamber 1 to carry out the vacuum degassing operation. 2 in the figure
An exhaust gas duct 5 discharges (sucks) the dust-containing exhaust gas from the vacuum chamber 1.

【0022】なお、このランス装置は非処理中(待機
中)において、真空槽内に酸素あるいは燃料ガス等を供
給して、真空槽内を保熱したり、地金を溶融したりする
場合もある。
In this lance device, during non-treatment (standby), oxygen or fuel gas may be supplied into the vacuum chamber to keep the vacuum chamber in heat or to melt the metal. .

【0023】この実施例においては、4本柱シリンダー
昇降方式による槽昇降方式の真空脱ガス設備において、
真空槽1を支持する支持架台2に門型の支持架構22を
配設し、この支持架構に支柱23を立設して、この支柱
にはランス装置10を設置したことを特徴としている。
In this embodiment, in the vacuum degassing equipment of the tank raising and lowering system by the four column cylinder raising and lowering system,
It is characterized in that a gate-shaped support frame 22 is arranged on a support frame 2 supporting the vacuum chamber 1, a column 23 is erected on this support frame, and the lance device 10 is installed on this column.

【0024】すなわち、ランス装置10を、真空槽1を
固定した支持架台2に配設した支持架構22に立設した
支柱23に配設することにより、ランス装置10と真空
槽1の位置を固定して、ランス8と真空槽1の天蓋部お
よびシール装置14のランス孔13の中心位置を常に一
致させた状態にして、真空槽1とランス装置10を同期
昇降させることができることを特徴としている。
That is, the lance device 10 and the vacuum chamber 1 are fixed in position by arranging the lance device 10 on a column 23 standing on a support frame 22 provided on a support frame 2 to which the vacuum chamber 1 is fixed. Then, the vacuum chamber 1 and the lance device 10 can be moved up and down synchronously with the lance 8 and the canopy portion of the vacuum chamber 1 and the central positions of the lance holes 13 of the sealing device 14 always aligned with each other. .

【0025】このようにすることにより、ランスを真空
槽内に挿入した状態で真空槽を頻繁に昇降する操業を行
った場合でも、ランス装置のランスと真空槽の天蓋部の
ランス孔間の芯ズレの問題を著しく改善して位置合わせ
作業負担を軽減するとともに、ランスとランス孔との相
対的な上下動頻度を減少してシール装置およびランスの
損耗を軽減し、さらにシール性を確実に維持して真空槽
の真空度を高位に安定確保することが可能である。した
がって、付帯作業時間を大幅に削減でき、真空脱ガス操
業の生産性を向上させるとともに、設備コストも低減さ
せ、高真空度の真空脱ガス操業を安定確保することが可
能である。
By doing so, even when the vacuum chamber is frequently moved up and down with the lance inserted in the vacuum chamber, the core between the lance of the lance device and the lance hole of the canopy of the vacuum chamber is set. The misalignment problem is remarkably improved to reduce the alignment work load, and the relative vertical movement frequency between the lance and the lance hole is reduced to reduce the wear of the sealing device and the lance, and the sealing performance is reliably maintained. Therefore, it is possible to stably secure a high degree of vacuum in the vacuum chamber. Therefore, it is possible to significantly reduce the auxiliary work time, improve the productivity of the vacuum degassing operation, reduce the equipment cost, and stably secure the vacuum degassing operation with a high degree of vacuum.

【0026】また、真空槽1はフランジ26を介して天
蓋部1oと損耗しやすい下部槽1uに分割可能にして、
天蓋部1oを吊り装置(図示省略)を介して支持架台2
に固定し、下部槽1uを天蓋部1oに着脱可能な構造に
しているので、真空槽1の交換に際しては下部槽1uの
みの交換でよく、ランス装置10のランス8と真空槽1
の天蓋部1oのランス孔13間の位置合わせを省略する
ことができるので、交換作業負担を大幅に軽減すること
ができ、真空脱ガス操業の生産性をさらに向上させるこ
とができる。
Further, the vacuum chamber 1 can be divided into a canopy portion 1o and a lower chamber 1u which is easily worn through a flange 26,
The support base 2 is mounted on the canopy 1o via a suspension device (not shown).
Since the lower tank 1u is attached to and detached from the canopy portion 1o, only the lower tank 1u needs to be replaced when replacing the vacuum tank 1, and the lance 8 of the lance device 10 and the vacuum tank 1 are replaced.
Since the alignment between the lance holes 13 of the canopy portion 1o can be omitted, the replacement work load can be significantly reduced, and the productivity of the vacuum degassing operation can be further improved.

【0027】ランス装置10は、処理開始および終了、
更に処理中真空度の変化に応じて槽高さが変えられる真
空槽の昇降に追従させねばならないし、また、真空度に
よる湯面位置変動に対して、ランス昇降−湯面間距離を
一定に保つため、ランス高さ位置を常に変化させる必要
がある。
The lance device 10 starts and ends the process,
In addition, the height of the vacuum tank must be changed according to the change in vacuum during processing. In order to keep it, it is necessary to constantly change the lance height position.

【0028】ここで、もしも、ランス装置10を、図3
に示すように、真空槽1の支持架台2と一体化されてい
ない、例えば建屋11によって固定された柱12に取り
付けた場合には、真空槽1の昇降とランス装置10の昇
降は別々の機構によって制御することになる。これらの
昇降制御は、極めて複雑で、制御が困難であるばかり
か、真空脱ガス中にランス8を頻繁に昇降させると、ラ
ンス8とランス孔13との隙間のシール性が著しく悪化
し真空槽1内の真空度が低下し安定操業が困難になる。
If the lance device 10 is shown in FIG.
As shown in FIG. 4, when the vacuum tank 1 is mounted on a column 12 that is not integrated with the support frame 2 of the vacuum tank 1 and is fixed by a building 11, for example, the lifting and lowering of the vacuum tank 1 and the lifting and lowering of the lance device 10 are separate mechanisms. Will be controlled by. These raising and lowering controls are extremely complicated and difficult to control, and when the lance 8 is raised and lowered frequently during vacuum degassing, the sealing property of the gap between the lance 8 and the lance hole 13 is significantly deteriorated and the vacuum chamber is evacuated. The degree of vacuum in 1 decreases and stable operation becomes difficult.

【0029】しかし、本発明においては、ランス装置1
0と真空槽1の位置関係を固定して、ランス8の位置と
真空槽1の天蓋部1oおよびシール装置14のランス孔
13の中心位置を常に一致させた状態にして、真空槽1
とランス装置10を同期昇降させることができるので、
このような懸念は解消される。
However, in the present invention, the lance device 1
0 and the vacuum chamber 1 are fixed in position so that the position of the lance 8 and the central positions of the canopy portion 1o of the vacuum chamber 1 and the lance hole 13 of the sealing device 14 are always aligned with each other.
Since the lance device 10 and the lance device 10 can be simultaneously moved up and down,
Such concerns are resolved.

【0030】(実施例2)図2は、本発明を適用して真
空槽内に酸素あるいは燃料ガス等を吹き込むランス装置
を設置した、槽昇降方式の真空脱ガス設備の他の例を概
念的に示したものである。
(Embodiment 2) FIG. 2 is a conceptual diagram of another example of a vacuum evacuation equipment of a tank elevating system in which a lance device for blowing oxygen or fuel gas into the vacuum tank is installed by applying the present invention. It is shown in.

【0031】ここに示される真空脱ガス設備において
は、操業中に取鍋6の位置を固定し、この取鍋6に収容
されている溶鋼5中に真空槽1の下部を浸漬させ、溶鋼
を取鍋と真空槽の下部間で流動させながら真空脱ガスを
行うように構成されており、ここでは、真空槽1を油圧
シリンダー(昇降装置)17により支持台15の支軸1
6を支点として回動昇降する支持架台2に固定し、油圧
シリンダー17により支持台15の支軸16を介して昇
降させるようにした、レバータイプ昇降式による槽昇降
方式の真空脱ガス設備が採用されている。
In the vacuum degassing equipment shown here, the position of the ladle 6 is fixed during the operation, and the lower part of the vacuum tank 1 is immersed in the molten steel 5 contained in the ladle 6 to melt the molten steel. The vacuum degassing is performed while flowing between the ladle and the lower part of the vacuum tank. Here, the vacuum tank 1 is supported by a hydraulic cylinder (elevating device) 17 on the support shaft 1 of the support base 15.
A vacuum degassing equipment of a lever-type lifting type is used, which is fixed to a support base 2 which is rotated and raised and lowered about 6 as a fulcrum, and is raised and lowered by a hydraulic cylinder 17 via a support shaft 16 of the support stand 15. Has been done.

【0032】この槽昇降方式の真空脱ガス設備において
は、真空槽1内に酸素、燃料ガス、粉体等を吹き込むラ
ンス装置10を設置するため、真空槽1を支持する支持
架台2に門型の支持架構22を配設し、この支持架構に
支柱23を立設して、この支柱にランス装置10を設置
している。このランス装置10のランス昇降装置9に
は、酸素、燃料ガス、粉体等の供給源(図示省略)に供
給ホース24を介して接続されたランス8が、真空槽1
の天蓋部1oおよびシール装置14のランス孔13に挿
通されて昇降可能に装着されている。
In the vacuum degassing equipment of this tank raising / lowering system, since the lance device 10 for blowing oxygen, fuel gas, powder, etc. is installed in the vacuum tank 1, the support frame 2 supporting the vacuum tank 1 is gate-shaped. The support frame 22 is disposed, the column 23 is erected on the support frame, and the lance device 10 is installed on the column. In the lance lifting device 9 of the lance device 10, a lance 8 connected to a supply source (not shown) of oxygen, fuel gas, powder or the like via a supply hose 24 is provided.
The canopy portion 1o and the lance hole 13 of the sealing device 14 are inserted so as to be vertically movable.

【0033】真空脱ガス操業に際しては、油圧シリンダ
ー17により支持台15の支軸16を支点にして支持架
台2を回動上昇させて、真空槽1を、その下方に搬入さ
れる取鍋6に干渉しない位置に退避させるとともに、ラ
ンス昇降装置10によりランス8の位置を調整する。
In the vacuum degassing operation, the support stand 2 is pivotally raised by the hydraulic cylinder 17 with the support shaft 16 of the support stand 15 serving as a fulcrum, and the vacuum chamber 1 is placed on the ladle 6 carried below. The lance 8 is adjusted by the lance lifting device 10 while retracting to a position where it does not interfere.

【0034】そして、取鍋6を真空槽下方の操業位置に
搬入した後、油圧シリンダー17により支持台15の支
軸16を支点にして、カウンターウエイト18を介して
支持架台2を回動下降させて、支持架台を介して真空槽
1を下降させ、下部槽1uの下部を取鍋6内に収容の溶
鋼5中に所定深さ浸漬するとともに、ランス昇降装置9
によりランス8の先端位置を真空度調整された真空槽1
内に吸い上げられ循環する溶鋼5の湯面上の所定位置に
位置決めする。
Then, after the ladle 6 is carried into the operating position below the vacuum chamber, the support frame 2 is rotated and lowered by the hydraulic cylinder 17 with the support shaft 16 of the support base 15 as the fulcrum, through the counterweight 18. Then, the vacuum chamber 1 is lowered through the support frame, the lower part of the lower chamber 1u is immersed in the molten steel 5 accommodated in the ladle 6 to a predetermined depth, and the lance lifting device 9
Vacuum chamber 1 with the tip position of the lance 8 adjusted by the vacuum degree
The molten steel 5 sucked up and circulated therein is positioned at a predetermined position on the molten metal surface.

【0035】酸素、燃料ガス、粉体等は、必要なタイミ
ングでその供給源から供給ホース24を介してランス8
に導き、真空槽1内を循環する溶鋼5中に適量吹き込ん
で真空脱ガス操業を実施するようにしている。
Oxygen, fuel gas, powder, etc. are supplied from the supply source via the supply hose 24 at the required timing to the lance 8.
Then, an appropriate amount is blown into the molten steel 5 circulating in the vacuum chamber 1 to carry out the vacuum degassing operation.

【0036】この実施例においては、レバータイプ昇降
式による槽昇降方式の真空脱ガス設備において、真空槽
1を支持する支持架台2に門型の支持架構22を配設
し、この支持架構に支柱23を立設して、この支柱にラ
ンス昇降装置10を設置したことを特徴としている。
In this embodiment, in the vacuum degassing equipment of the chamber elevating type by lever type elevating type, a gate type supporting frame 22 is arranged on the supporting frame 2 for supporting the vacuum chamber 1, and a supporting column is provided on this supporting frame. 23 is provided upright and the lance lifting device 10 is installed on this column.

【0037】すなわち、ランス装置10を、真空槽1を
固定した支持架台2に配設した支持架構22に配設する
ことにより、ランス装置10と真空槽1の位置関係を固
定して、ランス8と真空槽1の天蓋部1oのランス孔1
3の中心位置を常に一致させた状態にして、真空槽1と
ランス装置10を同期昇降させることができ、真空槽が
定位置になる前にもランスを真空槽内に挿入できる。
That is, by disposing the lance device 10 on the support frame 22 provided on the support frame 2 to which the vacuum chamber 1 is fixed, the positional relationship between the lance device 10 and the vacuum chamber 1 is fixed, and the lance 8 is fixed. And lance hole 1 on the canopy 1o of the vacuum chamber 1
The vacuum chamber 1 and the lance device 10 can be moved up and down synchronously with the central position of the vacuum chamber 3 always aligned, and the lance can be inserted into the vacuum chamber even before the vacuum chamber is in the fixed position.

【0038】このようにすることにより、ランス装置1
0のランス8と真空槽1の天蓋部1oおよびシール装置
14のランス孔13間の位置ずれの問題を著しく改善し
位置合わせ作業負担を軽減するとともに、ランス8の昇
降頻度を減少してシール装置14の損耗を軽減し、シー
ル性を確実に維持して真空槽1の真空度を安定確保する
ことが可能である。したがって、真空脱ガス操業の生産
性を向上させるとともに、設備コストを低減させ、真空
脱ガス操業を安定確保することが可能である。
By doing so, the lance device 1
0, the canopy portion 1o of the vacuum chamber 1 and the lance hole 13 of the sealing device 14 are remarkably solved to reduce the positional alignment work load, and the frequency of lifting and lowering the lance 8 is reduced to reduce the sealing device. It is possible to reduce the wear of 14 and reliably maintain the sealing property, and to stably secure the vacuum degree of the vacuum chamber 1. Therefore, it is possible to improve the productivity of the vacuum degassing operation, reduce the equipment cost, and stably secure the vacuum degassing operation.

【0039】また、真空槽1は、フランジ26を介して
天蓋部1oと損耗しやすい下部槽1uに分割可能にし
て、天蓋部1oを支持架台2に固定し、下部槽1uを天
蓋部1oに着脱可能な構造にしているので、真空槽1の
交換に際しては下部槽1uのみの交換でよく、ランス装
置10のランス8と真空槽1の天蓋部1oのランス孔1
3間の位置合わせを省略することができるので、交換作
業負担を大幅に軽減することができ、真空脱ガス操業の
生産性をさらに向上させることができる。
Further, the vacuum chamber 1 can be divided into a canopy portion 1o and a lower chamber 1u which is easily worn through a flange 26, the canopy portion 1o is fixed to a support base 2, and the lower chamber 1u is fixed to the canopy portion 1o. Since the structure is detachable, only the lower tank 1u needs to be replaced when replacing the vacuum chamber 1, and the lance 8 of the lance device 10 and the lance hole 1 of the canopy 1o of the vacuum chamber 1 are replaced.
Since the alignment between the three can be omitted, the replacement work load can be significantly reduced, and the productivity of the vacuum degassing operation can be further improved.

【0040】ランス装置10は、処理開始および終了、
更に処理中真空度の変化に応じて槽高さが変えられる真
空槽1の昇降に追従させねばならないし、また、真空度
による湯面位置変動に対して、ランス昇降−湯面間距離
を一定に保つため、ランス8の高さ位置を常に変化させ
る必要がある。
The lance device 10 starts and ends the process,
Furthermore, the height of the vacuum tank 1 whose height can be changed according to the change of the vacuum degree during processing must be followed up and down, and the distance between the lance up and down-the melt surface is constant against the fluctuation of the melt surface position due to the vacuum degree. In order to maintain the above, it is necessary to constantly change the height position of the lance 8.

【0041】ここで、もしも、ランス装置10を、真空
槽1の支持架台2と一体化されていない、例えば建屋架
構によって固定された柱に取り付けた場合には、真空槽
1の昇降とランス装置10の昇降は別々の機構によって
制御することになる。この場合、真空槽1の昇降軌跡は
円弧状であるため、ランスの昇降制御は極めて複雑で困
難であるばかりか、真空脱ガス中にランスを頻繁に昇降
させると、ランスとランス孔との隙間のシール性が著し
く悪化し真空槽内の真空度が低下し安定操業が不能にな
ってしまう。
Here, if the lance device 10 is attached to a pillar which is not integrated with the support frame 2 of the vacuum chamber 1, for example, a column fixed by a building frame, the vacuum chamber 1 is lifted and the lance device is moved. The raising and lowering of 10 will be controlled by separate mechanisms. In this case, since the ascending / descending trajectory of the vacuum chamber 1 is arcuate, the elevating control of the lance is extremely complicated and difficult, and if the lance is raised / lowered frequently during vacuum degassing, the gap between the lance and the lance hole is increased. The sealing performance of the above is significantly deteriorated, the degree of vacuum in the vacuum chamber is lowered, and stable operation becomes impossible.

【0042】しかし、本発明においては、ランス装置1
0と真空槽の位置関係を固定して、ランス8と真空槽1
の天蓋部およびシール装置14のランス孔13の中心位
置を常に一致させた状態にして、真空槽とランス装置を
同期昇降させることができるので、このような懸念は解
消される。
However, in the present invention, the lance device 1
0 and the position of the vacuum chamber are fixed, the lance 8 and the vacuum chamber 1
Since the center position of the canopy portion and the central position of the lance hole 13 of the sealing device 14 are always aligned with each other, the vacuum chamber and the lance device can be moved up and down in synchronism with each other.

【0043】本発明による槽昇降方式の真空脱ガス設備
において、操業中に起こる真空槽内の溶鋼湯面位置変動
に対応して支障なく脱ガス処理を行うには次の2つの制
御方法がある。その一つは、ランスギャップ一定制御で
あり、もう一つは、浸漬管深さ一定制御である。前者
は、ランスからのガスジェットが溶鋼湯面上にある適正
な圧力で吹き付けられるように制御するものであり、後
者は浸漬管が溶鋼内に適正な距離だけ浸漬されるように
制御するものである。
In the vacuum evacuation equipment of the tank elevating type according to the present invention, there are the following two control methods for carrying out the degassing process without trouble in response to the fluctuation of the molten steel molten metal surface position in the vacuum tank which occurs during operation. . One is constant lance gap control, and the other is constant immersion tube depth control. The former is for controlling the gas jet from the lance so that it is sprayed at the proper pressure on the surface of the molten steel, and the latter is for controlling the dipping pipe to be immersed in the molten steel for a proper distance. is there.

【0044】ランスギャップ一定制御において、送酸速
度を一定とした場合、ランスギャップが小さい程脱炭酸
素効率が上昇する。一方、ランスギャップが小さ過ぎる
と溶鋼スプラッシュが激しくなり、ランス、真空槽内
壁、天蓋への地金付着が増大し、ランスノズルの溶損、
寿命低下、水漏れ等の重大な事故につながる。そのた
め、操業性、設備保全性等を加味した最適のランスギャ
ップがあり、これを満足するようにランスギャップを一
定に制御することが重要である。ただし、送酸速度が変
化した場合にはそれに伴ってランスギャップを変更する
こともあり、また、脱ガス処理中の途中で必要に応じて
ランスギャップを意図的に変化させることもある。
In the constant lance gap control, the decarboxylation efficiency increases as the lance gap decreases when the rate of oxygen transfer is constant. On the other hand, if the lance gap is too small, the molten steel splash will become violent, and the adhesion of the metal to the lance, the inner wall of the vacuum chamber, and the canopy will increase, causing the lance nozzle to melt,
It will lead to serious accidents such as shortened life and water leakage. Therefore, there is an optimum lance gap that takes into consideration operability, facility maintainability, etc., and it is important to control the lance gap so as to satisfy it. However, when the acid transfer rate is changed, the lance gap may be changed accordingly, and the lance gap may be intentionally changed as needed during the degassing process.

【0045】同様に、浸漬管深さ一定制御において、浸
漬管は溶鋼中に浸漬された状態で真空下で溶鋼を吸い上
げ、鍋内の大気に晒された湯面と真空槽内の真空状態に
ある湯面との仕切り壁の役割を果たす。ここで、何らか
の湯面変動によって浸漬管の下端から大気が侵入するこ
とがあると地金が吹き上げ重大な事故につながる。その
ため、仕切り壁として出来るだけ大きく浸漬深さをとる
ことが好ましい。一方、浸漬管の深さが大き過ぎると溶
鋼の鍋内攪拌が阻害され、真空槽内溶鋼と真空槽外の鍋
内溶鋼の混合性が悪化する。従って、操業上必要最小限
の浸漬深さに浸漬管位置を制御する必要があり、浸漬管
の浸漬深さ一定制御が行われる。
Similarly, in the constant control of the depth of the immersion pipe, the immersion pipe sucks the molten steel under a vacuum while being immersed in the molten steel, and the molten metal is exposed to the atmosphere in the pot and the vacuum state in the vacuum tank is obtained. It acts as a partition wall from a certain bath surface. Here, if the atmosphere sometimes invades from the lower end of the dip pipe due to some fluctuation of the molten metal level, the metal will be blown up, leading to a serious accident. Therefore, it is preferable that the partition wall has a maximum immersion depth. On the other hand, if the depth of the dip pipe is too large, the stirring of molten steel in the pot is hindered, and the mixing property of the molten steel in the vacuum tank and the molten steel in the pan outside the vacuum tank deteriorates. Therefore, it is necessary to control the immersion pipe position to the minimum immersion depth required for operation, and constant immersion depth control of the immersion pipe is performed.

【0046】本発明による槽昇降方式の真空脱ガス設備
において、操業初期160Torrの真空度でランスで吹酸
しながら脱ガス処理を行い、この状態から真空度を70
Torrとして操業した場合に、ランスと真空槽内溶鋼湯面
間でランスギャップ一定制御を行う場合の操業例を以下
に説明する。
In the vacuum degassing equipment of the tank elevating system according to the present invention, degassing treatment is carried out while spraying lance with a lance at a vacuum degree of 160 Torr at the initial stage of operation, and the vacuum degree is raised to 70% from this state.
The following is an example of an operation in which the lance gap is controlled to be constant between the lance and the molten steel surface in the vacuum tank when operated as a Torr.

【0047】初期条件として、ランスギャップが250
0mm、真空槽内と鍋内の溶鋼湯面差1200mm、浸漬深
さ300mm、真空槽内溶鋼湯面と鍋内の溶鋼溶鋼湯面の
面積比1:2を設定した。真空槽内の真空度変化によ
り、鍋内溶鋼は真空槽内に吸い上げられ、真空槽内溶鋼
と鍋内溶鋼の湯面差が1200mmから1380mmに増加
する。真空槽内溶鋼湯面の面積と鍋内溶鋼湯面の面積の
比が1:2であるので、真空槽内溶鋼湯面は120mm上
昇し、鍋内溶鋼湯面は60mm降下する。この時の浸漬管
の浸漬深さは60mm減少し、ランスギャップは120mm
減少する。従って、これを修正するためには、先ず真空
槽を下降させて浸漬管の浸漬深さを元に戻す操作を行
う。これは、真空槽を60mm下降させることにより浸漬
管の浸漬深さは300mmに戻ることになる。一方、ラン
スは、真空槽の昇降架台上に設置されているため、真空
槽下降と同時にランスも60mm下がることになる。その
ため、ランスギャップは、当初より180mm減少したこ
とになるので、次にランスを180mm上昇させランスギ
ャップを2500mmに戻して操業を継続する。
As an initial condition, the lance gap is 250
0 mm, the difference in molten steel level between the inside of the vacuum tank and the pan was 1200 mm, the immersion depth was 300 mm, and the area ratio of the molten steel level inside the vacuum tank and the molten steel level inside the pan was 1: 2. Due to the change in the degree of vacuum in the vacuum tank, the molten steel in the pan is sucked up into the vacuum tank, and the difference between the molten steel in the vacuum tank and the molten steel in the pan increases from 1200 mm to 1380 mm. Since the ratio of the molten steel level in the vacuum tank to the molten steel level in the pan is 1: 2, the molten steel level in the vacuum chamber rises 120 mm and the molten steel level in the pot drops 60 mm. At this time, the immersion depth of the immersion pipe is reduced by 60 mm and the lance gap is 120 mm.
Decrease. Therefore, in order to correct this, first, the operation of lowering the vacuum chamber to restore the immersion depth of the immersion tube is performed. This means that the dip depth of the dip tube will return to 300 mm by lowering the vacuum chamber by 60 mm. On the other hand, since the lance is installed on the elevating platform of the vacuum chamber, the lance is lowered by 60 mm when the vacuum chamber is lowered. Therefore, the lance gap has decreased by 180 mm from the beginning, so the lance is raised 180 mm and the lance gap is returned to 2500 mm to continue the operation.

【0048】これらの操作を速やかにコンピューター制
御で行うことにより、真空度変化に追随して湯面変動量
に対して鍋内溶鋼への浸漬管の浸漬深さを一定にしつ
つ、ランスギャップを一定に保持することが可能とな
る。
By performing these operations promptly by computer control, the lance gap is kept constant while keeping the immersion depth of the immersion pipe in the molten steel in the pan constant with the change in the degree of vacuum in accordance with the change in the degree of vacuum. Can be held at.

【0049】また、本発明においてはランスを真空槽昇
降式の真空槽と同期昇降させることがあるため、従来の
鍋昇降式に比べて真空槽のランス孔におけるランスとの
気密性をより厳格に行う必要がある。その一例として、
例えば、ランス孔周囲にリング状の耐火性ゴムチューブ
等を取り付け、このチューブを加圧、抜圧することでよ
り高い気密性が得られている。すなわち、前記チューブ
を加圧状態としてランスに密着することによりシールさ
れ、またランスを動かすときは抜圧してチューブとラン
スの密着状態を開放する。また、更に、ランス装置を真
空脱ガス設備の支持架台に配設した上で前記シール方法
を採用することにより、ランス孔のシール性は大幅に向
上する。
Further, in the present invention, the lance may be moved up and down in synchronism with the vacuum chamber lifting type vacuum chamber, so that the airtightness of the lance in the lance hole of the vacuum chamber is more strict than that of the conventional pot lifting system. There is a need to do. As an example,
For example, a ring-shaped fire-resistant rubber tube or the like is attached around the lance hole, and the tube is pressurized and released to obtain higher airtightness. That is, the tube is sealed by being brought into close contact with the lance in a pressurized state, and when moving the lance, the pressure is released to release the close contact state between the tube and the lance. Further, by further disposing the lance device on the support frame of the vacuum degassing equipment and adopting the sealing method, the sealing property of the lance hole is significantly improved.

【0050】ここで、ランスが昇降架台上に設置されて
いる場合におけるランスギャップ一定制御に基づくシー
ル装置の作動フローの例を以下に示す。 真空度変化→真空槽昇降→シールチューブ抜圧→ランス
昇降→シールチューブ加圧
Here, an example of the operation flow of the sealing device based on the constant lance gap control when the lance is installed on the lifting platform is shown below. Vacuum level change → Vacuum chamber up / down → Seal tube removal pressure → Lance up / down → Seal tube pressurization

【0051】なお、本発明は、図6に示すようなウイン
チ昇降方式による槽昇降方式の真空脱ガス設備に容易に
も適用可能であり、支持架台2に支柱(あるいは支持枠
等)を配設し、ここにランス装置を配設することによっ
て、実施例1および実施例2の場合と同様の効果を得る
ことが可能である。
The present invention can be easily applied to a vacuum degassing equipment of a tank raising / lowering system by a winch raising / lowering system as shown in FIG. 6, and a support (or a supporting frame or the like) is provided on the support base 2. However, by disposing the lance device here, it is possible to obtain the same effect as in the first and second embodiments.

【0052】また、実施例1および実施例2では、ラン
ス装置の配置位置は、真空槽上部から鉛直方向に昇降す
るようになっているが、この他に設備上のローカル条件
として、ランスを真空槽上部から斜めに真空槽内に挿入
したり、真空槽上部の側壁面から斜めに挿入する等請求
項を満足する範囲で変更可能である。
Further, in the first and second embodiments, the position of the lance device is arranged so as to move vertically from the upper part of the vacuum chamber. It can be changed within the range satisfying the claims such that it is inserted obliquely from the upper part of the chamber into the vacuum chamber or obliquely inserted from the side wall surface of the upper part of the vacuum chamber.

【0053】さらに、本発明は上記実施例1および実施
例2に限定されるものではなく、真空槽の構造およびそ
の支持構造、ランス装置およびその支持構造、昇降構
造、交換構造等については、工場レイアウト、処理内
容、設備形式、昇降方式、真空槽および取鍋交換方式、
操業方式等の条件に応じて、請求項を満足する範囲にお
いて、その構成条件は変更されるものである。
Furthermore, the present invention is not limited to the above-mentioned first and second embodiments, and the structure of the vacuum chamber and its supporting structure, the lance device and its supporting structure, the elevating structure, the exchanging structure, etc. Layout, processing content, equipment type, lifting method, vacuum tank and ladle replacement method,
The constituent conditions are changed within the scope of satisfying the claims according to the conditions such as the operation system.

【0054】(操業例)図1および図2に示した本発明
の槽昇降方式の真空脱ガス設備と、図3に示した従来の
取鍋昇降方式の真空脱ガス設備について、キルド鋼を処
理対象として真空脱ガス操業を実施した。その結果、従
来例の場合においては、到達真空度は0.8〜1.6To
rrの範囲であったのに対して、本発明の場合において
は、到達真空度は0.5〜0.1Torrと高い優れた値を
示し、脱ガス性能にもよい影響を及ぼした。
(Operation example) Killed steel is treated in the vacuum degassing equipment of the tank raising / lowering method of the present invention shown in FIGS. 1 and 2 and the conventional vacuum degassing equipment of the ladle raising / lowering method shown in FIG. Vacuum degassing operation was carried out as a target. As a result, in the case of the conventional example, the ultimate vacuum is 0.8 to 1.6 To.
While it was in the range of rr, in the case of the present invention, the ultimate vacuum showed a high value of 0.5 to 0.1 Torr, which was a good influence on the degassing performance.

【0055】また、シール装置の寿命を、真空脱ガス操
業を連続して実施し真空槽での到達真空度が許容範囲を
下回った時のヒート数をもって表した場合、従来例の場
合においては、シール装置の寿命は130ヒート前後で
あったのに対し、本発明の場合においては、シール装置
の寿命は、320ヒート前後であり、シール装置のメン
テナンス費用の削減にも貢献できた。
Further, when the life of the sealing device is expressed by the number of heat when the ultimate vacuum degree in the vacuum chamber falls below the allowable range by continuously performing the vacuum degassing operation, in the case of the conventional example, While the life of the sealing device was around 130 heats, in the case of the present invention, the life of the sealing device was around 320 heats, which also contributed to the reduction of the maintenance cost of the sealing device.

【0056】本発明の場合において上記のような好結果
が得られたのは、ランス孔とランスとの芯が常に一致し
ているためシール装置に無理な力がかからなかったた
め、ランス孔の損耗が抑制され、シール性を長時間確保
できたことによるものである。さらに、真空槽の天蓋部
およびシール装置のランス孔と、ランス装置のランスと
の位置合わせ時間は、従来例の場合においては、1.5
時間を要したが、本発明の場合においては、真空槽の天
蓋部を含む上部槽は、支持架台で支持した状態にして、
下部槽のみを交換したので、真空槽の天蓋部およびシー
ル装置のランス孔と、ランス装置のランスとの位置合わ
せは殆ど必要がなかった。
In the case of the present invention, the good results as described above were obtained because the lance hole and the lance are always aligned with each other and no unreasonable force was applied to the sealing device. This is because the wear was suppressed and the sealing property was secured for a long time. Further, the alignment time between the lance hole of the vacuum chamber and the lance hole of the sealing device and the lance of the lance device is 1.5 in the case of the conventional example.
Although it took time, in the case of the present invention, the upper tank including the canopy portion of the vacuum tank is supported by the support frame,
Since only the lower tank was replaced, it was almost unnecessary to align the lance hole of the vacuum tank with the lance hole of the sealing device and the lance of the lance device.

【0057】[0057]

【発明の効果】本発明の槽昇降方式の真空脱ガス処理設
備においては、真空槽内に酸素、燃料ガス粉体等を吹き
込むためのランス装置(ランスおよびその昇降装置)
を、真空槽と同時昇降させるようにしたので、ランス装
置のランスと真空槽の天蓋部のランス孔間の位置ずれ、
シール装置の損耗等の問題を著しく改善することがで
き、シール装置の損耗を軽減してシール性を確実化し、
真空槽の真空度を十分に確保することが可能である。
EFFECTS OF THE INVENTION In the vacuum evacuation treatment equipment of the tank elevating system of the present invention, a lance device (lance and its elevating device) for blowing oxygen, fuel gas powder and the like into the vacuum tank.
Since it was moved up and down at the same time as the vacuum chamber, the positional deviation between the lance of the lance device and the lance hole of the canopy of the vacuum chamber,
Problems such as wear of the seal device can be remarkably improved, wear of the seal device is reduced, and sealing performance is ensured.
It is possible to secure a sufficient degree of vacuum in the vacuum chamber.

【0058】その結果、従来、ランス装置のランスと真
空槽の天蓋部のランス孔間の芯ズレ、あるいはシール装
置の損耗が問題になり真空槽内に酸素、粉体あるいは燃
料ガス等を吹き込む操業が困難であった槽昇降方式の真
空脱ガス処理設備においても、本発明のランス装置を用
いることによって可能となり、さらに、溶鋼に真空槽下
部を浸漬させる前から処理完了後までの何時でもランス
の真空槽内への出し入れが可能になり、操業効率に優れ
た真空脱ガス操業を実現することが可能である。また、
ランス装置のランスと真空槽の天蓋部のランス孔間のシ
ール装置の寿命を延長し設備の保全性を改善し、設備コ
ストの低減とともに、真空脱ガス操業の生産性を向上さ
せることが可能である。
As a result, conventionally, there has been a problem of misalignment between the lance of the lance device and the lance hole of the canopy portion of the vacuum chamber, or the wear of the sealing device, and the operation of blowing oxygen, powder or fuel gas into the vacuum chamber. It is possible to use the lance device of the present invention even in the vacuum degassing treatment equipment of the tank elevating system, which was difficult to do, and further, at any time from before the lower part of the vacuum tank is immersed in the molten steel until after the treatment is completed. It is possible to put it in and out of the vacuum tank, and it is possible to realize a vacuum degassing operation with excellent operation efficiency. Also,
It is possible to extend the life of the sealing device between the lance of the lance device and the lance hole of the canopy of the vacuum chamber, improve the maintainability of the equipment, reduce the equipment cost, and improve the productivity of the vacuum degassing operation. is there.

【0059】なお、真空槽を、天蓋部と損耗しやすい下
部槽に分割可能にして、天蓋部を支持架台に固定し、下
部槽を天蓋部に着脱可能な構造にすれば、真空槽の交換
に際しては下部槽のみの交換でよく、ランス装置のラン
スと真空槽の天蓋部のランス孔間の位置合わせを省略が
できるので、交換作業負担をさらに軽減することがで
き、真空脱ガス操業の生産性をさらに向上させることが
可能である。
If the vacuum tank can be divided into a canopy portion and a lower tank that is easily worn, the canopy portion is fixed to the support frame, and the lower tank is detachable from the canopy portion, the vacuum tank can be replaced. In this case, only the lower tank needs to be replaced, and the alignment between the lance of the lance device and the lance hole of the canopy of the vacuum tank can be omitted, so the replacement work load can be further reduced and the production of the vacuum degassing operation can be reduced. It is possible to further improve the property.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例における槽昇降式の真空脱ガス
設備例の側断面概念説明図。
FIG. 1 is a side cross-sectional conceptual explanatory diagram of an example of a tank elevating type vacuum degassing equipment in an embodiment of the present invention.

【図2】本発明の他の実施例における槽昇降式の真空脱
ガス設備例の側断面概念説明図。
FIG. 2 is a side cross-sectional conceptual explanatory view of an example of a tank elevating type vacuum degassing equipment in another embodiment of the present invention.

【図3】公知の槽固定方式(取鍋昇降方式)の真空脱ガ
ス設備例の側断面概念説明図。
FIG. 3 is a side cross-sectional conceptual explanatory view of an example of a well-known tank fixing system (ladle lifting system) vacuum degassing equipment.

【図4】公知のレバータイプ式による槽昇降方式の真空
脱ガス設備例の側断面概念説明図。
FIG. 4 is a side cross-sectional conceptual explanatory diagram of an example of a vacuum degassing equipment of a well-known lever type tank elevating system.

【図5】公知の4本柱シリンダー式による槽昇降方式の
真空脱ガス設備例の側断面概念説明図。
FIG. 5 is a side cross-sectional conceptual explanatory view of an example of a well-known vacuum column degassing equipment of a 4-column cylinder type, which is used for raising and lowering a tank.

【図6】公知のウインチ昇降式による槽昇降方式の真空
脱ガス設備例の側断面概念説明図。
FIG. 6 is a side cross-sectional conceptual explanatory view of an example of a well-known winch elevating and elevating tank elevating and lowering vacuum degassing facility.

【符号の説明】[Explanation of symbols]

1 真空槽 1o 天蓋部 1u 下部 2 支持架台 3 昇降装置 4 昇降台 5 溶鋼 6 取鍋 7 浸漬管 8 ランス 9 ランス昇降装置 10 ランス装置 11 建屋 12 柱 13 ランス孔 14 シール装置 15 支持台 16 支軸 17 昇降装置 18 カウンターウエイト 19 支持柱 20 ウインチ 21 チェーン 22 支持架構 23 支柱 24 供給ホース 25 排ガスダクト 26 フランジ cb 円弧状昇降軌跡 DESCRIPTION OF SYMBOLS 1 Vacuum tank 1o Canopy part 1u Lower part 2 Support stand 3 Lifting device 4 Lifting table 5 Molten steel 6 Ladle 7 Immersion pipe 8 Lance 9 Lance lifting device 10 Lance device 11 Building 12 Pillar 13 Lance hole 14 Sealing device 15 Support stand 16 Support shaft 17 Lifting device 18 Counterweight 19 Supporting column 20 Winch 21 Chain 22 Supporting frame 23 Supporting column 24 Supply hose 25 Exhaust gas duct 26 Flange cb Arc-shaped lifting trajectory

───────────────────────────────────────────────────── フロントページの続き (72)発明者 谷石 彦文 福岡県北九州市戸畑区大字中原46−59 新 日本製鐵株式会社機械・プラント事業部内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hikofumi Taniishi 46-59 Nakahara, Tobata-ku, Kitakyushu City, Fukuoka Prefecture Nippon Steel Corporation Machinery & Plant Division

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 槽昇降方式の真空脱ガス設備において、
真空槽に酸素、燃料ガス、粉体等を吹き込むためのラン
スを昇降自在に支持したランス装置を、前記槽昇降方式
の真空脱ガス設備に直接配設したことを特徴とする槽昇
降方式の真空脱ガス設備。
1. In a vacuum degassing equipment of a tank elevating type,
A vacuum for a tank raising / lowering method, characterized in that a lance device supporting a lance for injecting oxygen, fuel gas, powder, etc. into a vacuum tank so as to be able to move up and down is directly disposed in the vacuum degassing equipment for the tank raising / lowering method. Degassing equipment.
【請求項2】 槽昇降方式の真空脱ガス設備において、
下部を取鍋に収容した溶湯中に浸漬する真空槽を支持し
昇降装置により昇降する支持架台上に、支持架構を配設
し、この支持架構に、真空槽に酸素、燃料ガス、粉体等
を吹き込むためのランスを昇降自在に支持したランス装
置を配設し、このランス装置を真空槽と同時昇降させる
ようにしたことを特徴とする槽昇降方式の真空脱ガス処
理設備。
2. In a vacuum degassing equipment of a tank elevating type,
The lower part supports the vacuum tank immersed in the molten metal contained in the ladle, and the supporting frame is arranged on the supporting frame that is moved up and down by the lifting device. Oxygen, fuel gas, powder, etc. are placed in the vacuum tank on this supporting frame. A vacuum degassing treatment facility of a tank raising and lowering system, in which a lance device supporting a lance for blowing air is provided so that the lance device can be raised and lowered simultaneously with the vacuum chamber.
【請求項3】 真空槽を、支持架台に固定する天蓋部と
下部槽とに分割し、天蓋部を支持架台に固定し、下部を
天蓋部に対して着脱可能にしたことを特徴とする請求項
1記載の槽昇降方式の真空脱ガス処理設備。
3. The vacuum chamber is divided into a canopy portion fixed to a support frame and a lower chamber, the canopy part is fixed to the support frame, and the lower part is made attachable to and detachable from the canopy part. Item 1. A vacuum degassing treatment facility of the vessel lifting type according to Item 1.
【請求項4】 前記真空脱ガス設備がRH式真空脱ガス
設備であることを特徴とする請求項1〜3のいずれか1
項記載の槽昇降方式の真空脱ガス設備。
4. The vacuum degassing equipment is an RH type vacuum degassing equipment.
The vacuum degassing equipment of the tank lifting method described in the item.
JP25410896A 1995-09-29 1996-09-26 Vacuum degassing equipment of vessel lifting system Withdrawn JPH09157730A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP25410896A JPH09157730A (en) 1995-09-29 1996-09-26 Vacuum degassing equipment of vessel lifting system
PCT/JP1996/002831 WO1997012067A1 (en) 1995-09-29 1996-09-27 Tank lifting type vacuum degassing equipment

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP25213295 1995-09-29
JP7-252132 1995-09-29
JP25410896A JPH09157730A (en) 1995-09-29 1996-09-26 Vacuum degassing equipment of vessel lifting system

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JPH09157730A true JPH09157730A (en) 1997-06-17

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JP25410896A Withdrawn JPH09157730A (en) 1995-09-29 1996-09-26 Vacuum degassing equipment of vessel lifting system

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077264A1 (en) * 1999-06-16 2000-12-21 Nippon Steel Corporation Refining method and refining apparatus of molten steel
JP2008019469A (en) * 2006-07-12 2008-01-31 Nippon Steel Corp Device for gripping immersion tube

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281002A (en) * 1975-12-29 1977-07-07 Nippon Steel Corp Repairing method of inner lining in rh vacuum degassing equipment
JPS59190312A (en) * 1983-04-13 1984-10-29 Nippon Steel Corp Refining device
JPH0737644B2 (en) * 1990-01-31 1995-04-26 川崎製鉄株式会社 Vacuum degassing device Splashing prevention method in exhaust gas duct
JPH03274218A (en) * 1990-03-26 1991-12-05 Sumitomo Metal Ind Ltd Multiple purpose three-ply pipe lance
JP2688310B2 (en) * 1992-08-26 1997-12-10 新日本製鐵株式会社 Vacuum degasser

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077264A1 (en) * 1999-06-16 2000-12-21 Nippon Steel Corporation Refining method and refining apparatus of molten steel
US6432164B1 (en) 1999-06-16 2002-08-13 Nippon Steel Corporation Method for refining molten steel and apparatus therefor
JP2008019469A (en) * 2006-07-12 2008-01-31 Nippon Steel Corp Device for gripping immersion tube

Also Published As

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