JPH09153206A - Thin film magnetic head - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the reproducing output by enhancing the intensity of a signal magnetic field entering the effective magnetic sensitive part of a magnetoresistive element. SOLUTION: This head has an MR element disposed in such a manner that its longitudinal direction is almost perpendicular to the travelling direction of a magnetic recording medium 20, a front electrode 10 and a rear electrode 8 disposed on both edges in the longitudinal direction of the MR element 5, and an upper magnetic layer 11 and a lower magnetic layer 3 which hold the MR element 5, the front electrode 10 and the rear electrode 8. The area (a) of the MR element 5 between the front electrode 10 and the rear electrode 8 is the effective magnetic sensitive part. The thickness of the area (b) where the front electrode 10 is formed is larger than the thickness of the effective magnetic sensitive part.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoresistive effect type thin film magnetic head suitable for a hard disk thin film magnetic head or the like and detecting a reproduction signal by the magnetoresistive effect.

[0002]

2. Description of the Related Art In recent years, in a magnetic recording thin film magnetic head such as a hard disk thin film magnetic head, further high density recording is required in order to increase the capacity, and it is a magnetic head suitable for a narrow track. Magnetoresistive thin film magnetic heads (hereinafter referred to as MR heads) have been adopted.

As shown in FIG. 33, this MR head includes a so-called vertical MR head 50 in which a sense current flows in a direction orthogonal to the traveling direction of the magnetic recording medium 70. The vertical MR head 50 includes a lower magnetic layer 52 and an insulating layer 53 which are sequentially stacked on a non-magnetic substrate 51, an MR element 54 provided on the insulating layer 53, and a rear end portion of the MR element 54. The rear end electrode 57 connected to 54B and the MR element 5
Bias conductor 56 provided on top of the insulating layer 55 via the insulating layer 55.
And the insulating layer 5 on the rear end electrode 57 and the bias conductor 56.
A front end electrode 59 connected to the front end portion 54A of the MR element 54, and an upper magnetic layer 60 and a protective layer 61 sequentially stacked on the front end electrode 59.

The vertical MR head 50 supplies a sense current from the front end electrode 59 and the rear end electrode 57 to the MR element 54, whereby the resistance of the MR element 54 due to the signal magnetic field from the magnetic recording medium 70. A change is detected and a reproduction output is obtained based on this resistance change. At this time, the MR element 54 has a region a between the front end electrode 59 and the rear end electrode 57.
Is an effective magnetic sensitive portion, and the other region b excluding the effective magnetic sensitive portion is a non-magnetic sensitive portion that interferes with the magnetoresistive effect. The non-magnetic sensitive portion of the front end portion 5C is a gap depth portion. A front end portion 54A connected to the front end electrode 59 and a rear end portion 54B connected to the rear end electrode 57 serve as a demagnetizing portion that obstructs the magnetoresistive effect. There is. Such a vertical MR head 50
Has a characteristic that the reproduction output does not depend on the medium speed and a high reproducing power can be obtained even if the medium speed is low.

The function of the MR element 54 in the vertical MR head 50 will be described below. The MR element 54 produces a magnetoresistive effect by changing its electric resistance value according to the magnetic flux intensity (magnetic flux amount) of the input magnetic recording medium 70. The vertical MR head 50 detects a voltage change between the front end electrode 10 and the rear end electrode 8 that occurs according to the amount of change in the electric resistance value of the MR element 54. Therefore, the vertical M
The R head 50 obtains a reproduction output by using this voltage change as a voltage signal.

In the vertical MR head 50 described above, since the MR element 54 is sandwiched between the upper magnetic layer 60 and the lower magnetic layer 52, the resolution is improved, and the upper magnetic layer 60, The S / N of the reproduction output and the recording density are improved as compared with the case without the lower magnetic layer 52.
Further, the vertical MR head 50 has excellent off-track characteristics as compared with the horizontal MR head 50.
The head 50 is becoming the mainstream.

[0007]

In the conventional vertical MR head 50 described above, the effective magnetic sensing portion is located deeper than the gap depth portion, unlike the horizontal MR head 50. Therefore, in the conventional vertical MR head 50, magnetic saturation occurs in the gap depth portion, and the input of the signal magnetic field from the magnetic recording medium 70 to the effective magnetic sensitive portion is hindered, and the magnetic field is input to the effective magnetic sensitive portion. However, there is a problem that the strength of the signal magnetic field is reduced. And the conventional vertical MR
It becomes difficult for the head 50 to improve the reproduction output, and this point is a great obstacle to the improvement of the recording density due to the narrowing of the gap, the thinning of the MR film, and the like.

Therefore, the present invention provides a thin magnetic head which prevents magnetic saturation and increases the strength of the signal magnetic field input to the effective magnetic sensitive portion of the magnetoresistive effect element to improve the reproduction output. It was proposed for that purpose.

[0009]

A thin film magnetic head according to the present invention, which has achieved this object, has a magnetoresistive effect element provided so that its longitudinal direction is substantially perpendicular to the running direction of a magnetic recording medium, and a magnetic resistance effect element. The resistance effect element includes a front end electrode and a rear end electrode provided at both ends in the longitudinal direction, and an upper magnetic layer and a lower magnetic layer sandwiching the magnetoresistive effect element, the front end electrode and the rear end electrode. In the magnetoresistive effect element, the region sandwiched by the front end electrode and the rear end electrode is an effective magnetic sensing part, and the region where the front end electrode is provided, that is, the thickness dimension of the gap depth part which is the non-sensitive part is It is made larger than the thickness of the effective magnetic sensing part.

According to the thin-film magnetic head of the present invention having the above-mentioned structure, the front end of the magnetoresistive effect element is supplied by supplying the sense current from the front end electrode and the rear end electrode to the magnetoresistive effect element. The signal magnetic field from the magnetic recording medium is input to the effective magnetic sensing section without causing magnetic saturation in the area where the electrodes are provided and without being disturbed. The thin-film magnetic head detects the resistance change of the magnetoresistive effect element due to the signal magnetic field from the magnetic recording medium by the front end electrode and the rear end electrode,
A reproduction output is obtained based on this resistance change.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, specific embodiments of the present invention will be described in detail with reference to FIGS. 1 to 25. MR head 1 shown as an embodiment of the present invention
As shown in FIG. 1, the non-magnetic substrate 2, the lower magnetic layer 3 laminated on the non-magnetic substrate 2, and the lower magnetic layer 3 are
It comprises a lower insulating layer 4 laminated on top and an MR element 5 provided on this lower insulating layer 4. Also, the MR head 1 includes an intermediate insulating layer 6 laminated on a region a of the MR element 5 excluding the front end portion 5C and the rear end portion 5D, a bias conductor 7 provided on the intermediate insulating layer 6, and an MR A rear end electrode 8 connected to the rear end portion 5D of the element 5 and provided over the rear end portion 5D of the MR element 5 and the lower insulating layer 4, and is laminated on the bias conductor 7 and the rear end electrode 8. And an upper insulating layer 9. Further, the MR head 1 is connected to the front end portion 5C of the MR element 5 and is provided on the front end portion 5C of the MR element 5 and over the upper insulating layer 9, and is laminated on the front end electrode 10. The upper magnetic layer 11 and the protective layer 12 laminated on the upper magnetic layer 11.

The nonmagnetic substrate 2 is made of ceramics, glass or the like. The protective layer 12 is made of non-magnetic and non-conductive Al ₂ O ₃ or SiO ₂ .

The lower magnetic layer 3 and the upper magnetic layer 11 are made of Fe.
A magnetic shield magnetic film made of a magnetic material such as -Al-Si and Ni-Fe. Lower magnetic layer 3 and upper magnetic layer 1
1 draws in a magnetic field of the signal magnetic field from the magnetic recording medium 20 other than the reproduction target, and causes the MR element 5 to draw only the reproduction target magnetic field. The upper insulating layer 9, the intermediate insulating layer 6, and the lower insulating layer 4 are formed of Al ₂ O ₃ , SiO _2, or the like. In the lower magnetic layer 3, a groove portion 13 is formed at a position corresponding to an effective magnetic sensing portion of the MR element 5 described later, and a nonmagnetic material 14 having excellent thermal conductivity is embedded in the groove portion 13. As the non-magnetic material 14, Al ₂ O _{3 is used.}
It is preferable to use a non-magnetic metal such as Ti, Ta or Ta, and it is also preferable to use a non-metal as long as the non-magnetic material 14 has excellent thermal conductivity.

The MR element 5 comprises Fe-Al-Si and Ni-
It is made of a magnetic material such as Fe. MR element 5
Are arranged such that the longitudinal direction is perpendicular to the surface facing the magnetic recording medium 20, that is, the running surface of the magnetic recording medium 20. One end face of the MR element 5 is the magnetic recording medium 20.
It is said to be exposed on the running surface.

The front end electrode 10 and the rear end electrode 8 are formed of a non-magnetic metal such as Cu. The front end electrode 10 and the rear end electrode 8 are a pair of electrodes electrically connected to both ends 5C and 5D of the MR element 5, respectively, and sandwich the MR element 5. A sense current is supplied between the front end electrode 10 and the rear end electrode 8 along the longitudinal direction of the MR element 5. The resistance change of the MR element 5 due to the signal magnetic field from the magnetic recording medium 20 is detected as a voltage change between the front end electrode 10 and the rear end electrode 8.

In the MR element 5, a region a between a front end portion 5C connected to the front end electrode 10 and a rear end portion 5D connected to the rear end electrode 8 serves as an effective magnetic sensing portion which produces a magnetoresistive effect. There is. In the MR element 5, the region b other than the effective magnetic sensitive portion, that is, the front end portion 5C connected to the front end electrode 10 and the rear end portion 5D connected to the rear end electrode 8 prevent the magnetoresistive effect. It is a non-magnetic portion, and the non-magnetic portion of the front end portion 5C is a gap depth portion. The gap depth portion of the MR element 5 has a thickness dimension c that is about twice as large as the thickness dimension d of the effective magnetic sensing portion. The gap depth portion of the MR element 5 may have a two-layer structure because it has a thickness dimension c that is approximately twice as large as the thickness dimension d of the effective magnetic sensing portion.

The bias conductor 7 receives the change in resistance of the MR element 5 between the front end electrode 10 and the rear end electrode 8 when it is detected.
A current is passed and a predetermined bias magnetic field is applied to the MR element 5. Therefore, in the MR element 5, the resistance change is easily detected by the bias conductor 7, and the MR element 5 is detected by the front end electrode 10 and the rear end electrode 8 in a state where a higher magnetoresistive effect is generated.

The MR head 1 of the embodiment configured as described above supplies a sense current to the MR element 5 from the front end electrode 10 and the rear end electrode 8. MR head 1 is an MR
The signal magnetic field from the magnetic recording medium 20 is input to the effective magnetic sensing section without being disturbed by the magnetic saturation at the front end portion 5C which is the gap depth portion of the element 5.

In the MR head 1, when a signal magnetic field from the magnetic recording medium 20 is input to the MR element 5, the direction of magnetization of the MR element 5 is reversed by the signal magnetic field, and a sense current flowing inside the MR element 5 is generated. It has an angle corresponding to the magnetic amount with respect to the direction. Therefore, the MR head 1
2, the electric resistance value of the MR element 5 changes, and as shown in FIG. 2, the external magnetic field dependence of the electric resistance value R is represented by a curve.

When the MR element 5 is driven, first, a bias magnetic field Hb is applied in advance to a position of an operating point P which is excellent in linearity with respect to an external magnetic field and has the largest change in electric resistance R. At this time, in the MR element 5, when the signal magnetic field ΔHs is input from the magnetic recording medium 20, the signal magnetic field ΔHs is converted into a resistance change ΔRs. This resistance change ΔRs can be extracted as an output voltage ΔVs based on Ohm's law: ΔVs = ΔRs × Is if a predetermined sense current Is is passed through the MR element 5.

The MR head 1 detects a voltage change between the front end electrode 10 and the rear end electrode 8 which occurs according to the amount of change in the electric resistance value of the MR element 5. Therefore, the MR head 1
Produces a reproduction output by using this voltage change as a voltage signal.

According to the MR head 1 of the above-described embodiment, the thickness dimension c of the gap depth portion of the MR element 5 is made larger than the thickness dimension d of the effective magnetic sensitive portion, so that magnetic saturation is prevented. As a result, the strength of the signal magnetic field input to the effective magnetic sensing section of the MR element 5 is increased. Therefore, in the MR head 1, the input sensitivity of the signal magnetic field from the magnetic recording medium 20 is improved, and the reproduction output is improved.

The first to fourth manufacturing methods of the MR head 1 of the above-described embodiment will be described in detail. In the first manufacturing method for manufacturing the MR head 1, first, as shown in FIG. 3, the lower magnetic layer 3 is laminated on the non-magnetic substrate 2. After that, a photoresist is applied to the surface of the lower magnetic layer 3 and a resist mask having a predetermined shape is formed by photolithography. Then, the lower magnetic layer 3 is etched in accordance with the pattern formed on the resist mask to form the groove portion 13 at a position corresponding to the effective magnetic sensitive portion of the MR element 5. After that, the non-magnetic material 14 is filled and formed in the groove 13 by a vacuum thin film forming technique such as a sputtering method.

Next, the lower magnetic layer 3 and the non-magnetic material 14 are formed.
The lower insulating layer 4 is laminated on top. Here, the lower insulating layer 4
Electrically insulates the lower part of the MR element 5 to be arranged in a later step and forms a magnetic gap under the MR element 5. Then, as shown in FIG. 4, the first MR element 5A is provided on the lower insulating layer 4.

Next, as shown in FIG. 5, a resist 18 is applied to the surface of the first MR element 5A, and a groove portion 19 is formed in the resist 18 by a photolithography technique.
Then, as shown in FIG. 6, the second MR element 5B is filled and formed on the surface of the resist 18 by a vacuum thin film forming technique such as a sputtering method. After that, as shown in FIG. 7, the resist 18 and the second MR element 5B are formed by the lift-off method.
Is etched.

Then, as shown in FIG. 8, an intermediate insulating layer 6 is laminated on the MR element 5, and as shown in FIG. 9, the intermediate insulating layer 6 on the front end portion 5C of the MR element 5 is etched to form an MR.
A groove 15 is provided to expose the front end 5C of the element 5. Further, as shown in FIG. 10, the intermediate insulating layer 6 and the MR element 5 are
Is etched.

Next, as shown in FIG. 11, the intermediate insulating layer 6
Is etched to form a connection hole 16 through which the rear end 5D of the MR element 5 is exposed. Then, as shown in FIG. 12, the rear end electrode 8 is formed on the intermediate insulating layer 6 and the lower insulating layer 4 so as to be connected to the rear end portion 5D of the MR element 5 through the connection hole 16.
Is provided. Further, the bias conductor 7 is provided on the intermediate insulating layer 6.

Next, as shown in FIG. 13, an upper insulating layer 9 is laminated on the rear end electrode 8 and the bias conductor 7, and as shown in FIG. 14, the upper insulating layer 9 and the intermediate insulating layer 6 are stacked.
Is etched to form a connection hole 17 through which the front end portion 5C of the MR element 5 is exposed. Thereafter, as shown in FIG. 15, a front end electrode 10 is provided on the upper insulating layer 9 so as to be connected to the front end portion 5C of the MR element 5 through the connection hole 17.

Next, as shown in FIG. 16, an upper magnetic layer 11 is laminated on the front end electrode 10, and the upper magnetic layer 11 is formed.
The protective layer 12 is laminated on top. After the above steps, the MR head 1 is completed by cutting into a predetermined shape.
The MR head 1 is a read-only magnetic head, but an inductive head for recording may be further stacked in order to serve as a read / write magnetic head.

In the second manufacturing method for manufacturing the MR head 1, first, as in the first manufacturing method, as shown in FIGS. 2 to 4, the lower magnetic layer 3 and the non-magnetic layer 3 are formed on the non-magnetic substrate 2. The magnetic material 14 and the lower insulating layer 4 are sequentially laminated, and the first MR element 5A is provided on the lower insulating layer 4. Then, as shown in FIG. 17, the intermediate insulating layer 6 is laminated on the first MR element 5A.

Next, as shown in FIG. 18, the intermediate insulating layer 6
Is etched to form a groove portion 15 in which the front end portion 5C of the first MR element 5A is exposed. Then, the first MR element 5A
Of the second M on the exposed front end portion 5C and on the intermediate insulating layer 6 of
The R element 5B is provided, and as shown in FIG.
The upper second MR element 5B is etched.

Next, as in the first manufacturing method, as shown in FIGS. 10 to 16, the rear end electrode 8 and the bias conductor 7 are formed.
Is provided, the upper insulating layer 9 is laminated, the front end electrode 10 is provided,
The upper magnetic layer 11 and the protective layer 12 are laminated. After the above steps, the MR head 1 is completed by cutting into a predetermined shape. The MR head 1 is a read-only magnetic head, but an inductive head for recording may be further stacked in order to serve as a read / write magnetic head.

In the third manufacturing method for manufacturing the MR head 1, first, as in the second manufacturing method, as shown in FIG. 17, the lower magnetic layer 3 and the nonmagnetic material 14 are formed on the nonmagnetic substrate 2. ,
The lower insulating layer 4 is sequentially laminated, the first MR element 5A is provided, and the intermediate insulating layer 6 is laminated.

Next, as shown in FIG. 20, the intermediate insulating layer 6 and the first MR element 5A are etched, and as shown in FIG. 21, the intermediate insulating layer 6 is etched to form the first MR element 5A.
The groove 15 is formed so that the front end 5C of the MR element 5A is exposed. Then, as shown in FIG. 22, the first MR element 5A
Of the second M on the exposed front end portion 5C and on the intermediate insulating layer 6 of
The R element 5B is provided, and as shown in FIG.
The upper second MR element 5B is etched.

Next, as in the first manufacturing method, as shown in FIGS. 11 to 16, the rear end electrode 8 and the bias conductor 7 are formed.
Is provided, the upper insulating layer 9 is laminated, the front end electrode 10 is provided,
The upper magnetic layer 11 and the protective layer 12 are laminated. After the above steps, the MR head 1 is completed by cutting into a predetermined shape. The MR head 1 is a read-only magnetic head, but an inductive head for recording may be further stacked in order to serve as a read / write magnetic head.

In the fourth manufacturing method for manufacturing the MR head 1, first, as in the first manufacturing method, as shown in FIG. 3, the lower magnetic layer 3 and the nonmagnetic material 14 are formed on the nonmagnetic substrate 2. , The lower insulating layer 4 is sequentially laminated. Next, as shown in FIG. 25, the MR element 5 is provided on the lower insulating layer 4, and as shown in FIG. 26, about half the thickness of the MR element 5 except for the front end portion 5C. Etching degree.

Next, as in the first manufacturing method, as shown in FIGS. 8 to 16, the intermediate insulating layer 6 is laminated, the rear end electrode 8 and the bias conductor 7 are provided, and the upper insulating layer 9 is laminated. Then
The front electrode 10 is provided, and the upper magnetic layer 11 and the protective layer 12 are laminated. After the above steps, the MR head 1 is completed by cutting into a predetermined shape. The MR head 1 is a read-only magnetic head, but an inductive head for recording may be further stacked in order to serve as a read / write magnetic head.

An MR head 30 shown as another embodiment of the present invention has a basic structure similar to that of the MR head 1 of the embodiment, as shown in FIGS. 26 to 32. The same members and the same components as those of the form MR head 1 are designated by the same reference numerals and the description thereof is omitted.

In the MR element 5, as shown in FIG. 26, the gap depth portion has a thickness dimension c substantially equal to the thickness dimension d of the effective magnetic sensitive portion. The front end electrode 10 is made of Fe-Al-
It is made of a magnetic metal such as Si or Ni-Fe.
In addition, Ti is formed between the front electrode 10 and the upper magnetic layer 11.
Alternatively, a metal gap 31 made of a non-magnetic metal such as Ta is provided.

According to the MR head 30 of another embodiment described above, since the front end electrode 10 made of magnetic metal is provided on the gap depth portion of the MR element 5, magnetic saturation is prevented and the MR element 5 is prevented. It is possible to increase the strength of the signal magnetic field input to the effective magnetic sensing unit. Therefore, in the MR head 30, the input sensitivity of the signal magnetic field from the magnetic recording medium 20 is improved, and the reproduction output is improved.

A method of manufacturing the MR head 30 of the other embodiment described above will be described in detail. The MR head 30
First, as in the third manufacturing method of the MR head 1, as shown in FIGS. 20 and 21, the lower magnetic layer 3, the nonmagnetic material 14, and the lower insulating layer are formed on the nonmagnetic substrate 2. The layers 4 are sequentially laminated, the MR element 5 is provided, the intermediate insulating layer 6 is laminated, and the groove portion 15 exposing the front end portion 5C of the MR element 5 is provided in the intermediate insulating layer 6.

Next, as shown in FIG. 27, the intermediate insulating layer 6
Is etched to form a connection hole 16 through which the rear end 5D of the MR element 5 is exposed. Then, as shown in FIG. 28, the rear end electrode 8 is formed on the intermediate insulating layer 6 and the lower insulating layer 4 so as to be connected to the rear end portion 5D of the MR element 5 through the connection hole 16.
Is provided. Further, the bias conductor 7 is provided on the intermediate insulating layer 6.

Next, as shown in FIG. 29, an upper insulating layer 9 is laminated on the rear end electrode 8 and the bias conductor 7, and as shown in FIG. 30, the upper insulating layer 9 and the intermediate insulating layer 6 are stacked.
Is etched to form a connection hole 17 through which the front end portion 5C of the MR element 5 is exposed. Thereafter, as shown in FIG. 31, a front end electrode 10 is provided on the upper insulating layer 9 so as to be connected to the front end portion 5C of the MR element 5 through the connection hole 17.

Next, as shown in FIG. 32, a metal gap 31 is provided on the front end electrode 10, and the metal gap 3 is formed.
An upper magnetic layer 11 and a protective layer 12 are sequentially stacked on the first layer 1. After the above steps, by cutting into a predetermined shape, M
The R head 1 is completed. The MR head 1 is a read-only magnetic head, but an inductive head for recording may be further stacked in order to serve as a read / write magnetic head.

[0045]

As described above, according to the thin film magnetic head of the present invention, the thickness of the region where the front end electrode of the magnetoresistive effect element is provided is made larger than the thickness of the effective magnetic sensitive portion. As a result, magnetic saturation is prevented, and the strength of the signal magnetic field input to the effective magnetic sensing section of the magnetoresistive effect element is increased. Therefore, in the thin-film magnetic head, the input sensitivity of the signal magnetic field from the magnetic recording medium is improved, and the reproduction output is improved.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of essential parts showing an MR head according to an embodiment of the present invention.

FIG. 2 is a characteristic diagram showing an MR characteristic of the conventional MR element.

FIG. 3 is a cross-sectional view of essential parts of the MR head showing a state in which a lower magnetic layer, a non-magnetic material and a lower insulating layer are laminated on a non-magnetic substrate in the first manufacturing method.

FIG. 4 is a cross-sectional view of an essential part of the MR head showing a state where an MR element is provided on a lower insulating layer.

FIG. 5 is a cross-sectional view of essential parts of the MR head, showing a state in which a resist is applied on the first MR element.

FIG. 6 is a cross-sectional view of essential parts of the MR head, showing a state in which a second MR element is provided on the first MR element.

FIG. 7 is a cross-sectional view of essential parts of the MR head, showing a state in which a second MR element is etched.

FIG. 8 is a cross-sectional view of essential parts of the MR head, showing a state in which an intermediate insulating layer is laminated on the MR element.

FIG. 9 is a cross-sectional view of an essential part of the MR head, showing a state in which a connection hole exposing the front end of the MR element is provided.

FIG. 10 is a sectional view of an essential part of the MR head, showing a state where the intermediate insulating layer and the MR element are etched.

FIG. 11 is a cross-sectional view of an essential part of the MR head, showing a state in which a connection hole exposing the rear end of the MR element is provided by etching the intermediate insulating layer.

FIG. 12 is a cross-sectional view of essential parts of the MR head, showing a state in which a rear end electrode is provided on the intermediate insulating layer and the lower insulating layer, and a bias conductor is provided on the intermediate insulating layer.

FIG. 13 is a cross-sectional view of essential parts of the MR head, showing a state in which an upper insulating layer is laminated on the rear end electrode and the bias conductor.

FIG. 14 is a cross-sectional view of essential parts of the MR head, showing a state in which an upper insulating layer and an intermediate insulating layer are etched to form a connection hole exposing the front end of the MR element.

FIG. 15 is a cross-sectional view of an essential part of the MR head showing a state in which a front end electrode is provided on the upper insulating layer.

FIG. 16 is a cross-sectional view of essential parts of the MR head, showing a state in which an upper magnetic layer and a protective layer are laminated on the front end electrode.

FIG. 17 is a cross-sectional view of essential parts of the MR head, showing a state in which a first MR element is provided on a lower insulating layer and an intermediate insulating layer is laminated in the second manufacturing method.

FIG. 18 is a cross-sectional view of essential parts of the MR head, showing a state in which a groove portion exposing the front end portion of the first MR element is provided and a second MR element is provided on the front end portion of the first MR element. .

FIG. 19 is a cross-sectional view of essential parts of the MR head, showing a state in which the second MR element is etched.

FIG. 20 is a fragmentary cross-sectional view of the MR element showing a state where the intermediate insulating layer and the first MR element are etched in the third manufacturing method.

FIG. 21 is a cross-sectional view of essential parts of the MR head, showing a state in which a groove portion exposing the front end portion of the first MR element is provided.

FIG. 22 is a cross-sectional view of essential parts of the MR head, showing a state in which a second MR element is provided on the front end of the first MR element.

FIG. 23 is a cross-sectional view of essential parts of the MR head, showing a state in which the second MR element is etched.

FIG. 24 is a plan view of the fourth manufacturing method, in which M is formed on the lower insulating layer
FIG. 6 is a cross-sectional view of a main part of the MR head showing a state where an R element is provided.

FIG. 25 is the above M showing a state in which the MR element is etched.
It is a principal part sectional view of an R head.

FIG. 26 is a cross-sectional view of essential parts showing an MR head according to another embodiment of the invention.

FIG. 27 is a cross-sectional view of essential parts of the MR head, showing a state in which a connection hole exposing the rear end of the MR element is provided by etching the intermediate insulating layer.

FIG. 28 is a cross-sectional view of essential parts of the MR head, showing a state in which a rear end electrode is provided on the intermediate insulating layer and the lower insulating layer, and a bias conductor is provided on the intermediate insulating layer.

FIG. 29 is a cross-sectional view of essential parts of the MR head, showing a state in which an upper insulating layer is laminated on the rear end electrode and the bias conductor.

FIG. 30 is a cross-sectional view of an essential part of the MR head, showing a state where the upper insulating layer and the intermediate insulating layer are etched to form a connection hole exposing the front end of the MR element.

FIG. 31 is a cross-sectional view of essential parts of the MR head, showing a state in which a front end electrode is provided on the upper insulating layer.

FIG. 32 is a cross-sectional view of essential parts of the MR head, showing a state in which a metal gap, an upper magnetic layer, and a protective layer are stacked on the front end electrode.

FIG. 33 is a cross-sectional view of essential parts showing a conventional MR element.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 MR head 3 Lower magnetic layer 5 MR element 8 Rear end electrode 10 Front end electrode 11 Upper magnetic layer 20 Magnetic recording medium a Region sandwiched by front end electrode and rear end electrode of MR element b Front end electrode of MR element is provided Area

Claims (2)

[Claims] 1. A magnetoresistive effect element provided so that its longitudinal direction is substantially orthogonal to a running direction of a magnetic recording medium, and front end electrodes and rear ends provided at both longitudinal ends of the magnetoresistive effect element. An electrode, a magnetoresistive effect element, and an upper magnetic layer and a lower magnetic layer that sandwich the front end electrode and the rear end electrode, respectively.The magnetoresistive effect element has an effective region sandwiched by the front end electrode and the rear end electrode. A thin-film magnetic head, characterized in that the thickness of the region where the front end electrode is provided is set to be larger than the thickness of the effective magnetic sensing part. 2. The magnetoresistive effect element is characterized in that the region where the front end electrode is provided has a two-layer structure.
2. The thin-film magnetic head according to 1.