JPH09141085A - Cylindrical thin film reaction device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To inexpensively and efficiently mix two or more kinds of raw materials by providing a raw material supply port capable of supplying two or more kinds of the raw materials and attaching a mixing accelerating member to the inside wall part. SOLUTION: A falling type cylindrical thin film reaction device has a cylindrical reaction tube 1 and the reaction tube 1 is provided with a jacket for supplying a cooling water. A liquid A is supplied to a supply means 3 by a metering pump, is stored step by step in the inside, overflows from an inlet port 3 to flow down in the reaction tube 1. At this time, the liquid A forms a thin film by supplying a gas from a gas supply port 2. A liquid B is also supplied to a liquid supply means 4 by a pump and overflows from an inlet port 4 to form a thin film. After that, the liquid A and B are subjected to dividing, confluent, transferring and shearing action to be mixed with each other and the mixture is separated from the gas by a cyclone 6 and recovered.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a cylindrical thin film reactor for mixing two or more raw materials.

More specifically, the present invention relates to a cylindrical thin film reactor which is a static fluid mixer (motionless mixer) and which mixes two or more kinds of raw materials while flowing them in a thin film form.

[0003]

2. Description of the Related Art In many chemical reactions involving the mixing of two or more raw materials, the mixing step is often an important requirement. For example, a reaction that proceeds well on a small scale may have a poor mixing efficiency of a stirrer or a mixer when a scale-up occurs, and a side reaction or coloring may occur. For this reason, in the case of industrialization,
Various reactors are used.

In the reaction of two or more kinds of raw materials, conventionally, a thin film type simple cylindrical thin film type cylindrical reactor as shown in FIG. 2 is used, and this cylinder (FIG. 2) is used. In the method of reacting two or more kinds of raw materials, the mixing in the vertical direction is good, but the mixing in the horizontal direction is not sufficient, and there is a problem. In addition, since two or more kinds of raw materials are gradually mixed, there is a problem that side reactions and coloring proceed. Further, a method of rotating the wiper is also used to improve the mixing in the lateral direction (eg Smith type), but there is a problem that power is used and the structure becomes complicated.

Therefore, there has been a strong demand for the development of a reaction apparatus which mixes two or more kinds of raw materials inexpensively and quickly and efficiently.

An object of the present invention is to provide a cylindrical thin film reactor capable of efficiently mixing two or more kinds of raw materials at low cost.

[0007]

As a result of intensive studies to solve the above-mentioned problems, the present inventors have paid attention to a cylindrical thin-film reactor having a specific structure and completed the present invention.

That is, the present invention provides a cylindrical thin film reactor having a raw material supply port capable of supplying two or more kinds of raw materials and a mixing promoting member attached to the inner wall portion. The device of the present invention may further have a gas supply port for supplying gas. It is preferable that the raw material supply port is provided with at least one raw material supply port at the end of the cylinder and at least one raw material supply port at the side wall part in the middle of the cylinder in the axial direction. It is preferable that at least one mixing promoting member is provided below the raw material supply port provided in the side wall portion, that is, in the direction in which the raw material flows. The mixing promoting member is preferably a ring, a blade, a protrusion, or a groove. A liquid is usually used as the two or more raw materials.

Hereinafter, the present invention will be described in detail. In the present invention, it is preferable to use a gas to form the thin film, but the thin film may be formed by gravity without using the gas. The gas used in the present invention is not particularly limited as long as a thin film can be formed, and examples thereof include inexpensive and easy-to-handle gas such as N ₂ or air, chlorofluorocarbon, and steam. These gases are supplied from a gas supply port described later. Further, the gas used in the present invention may be one in which two or more kinds of raw materials are formed into a thin film and react with one or more kinds of the two or more kinds of raw materials.

The type of the cylindrical thin film reactor is a falling type (Falling Film Reactor = FFR) or a rising type (Climbi).
ng Film Reactor (CFR) equipment can be used. Further, this may be a single tube type (single) or a multiple tube type (multi).

The cylindrical thin film reactor may be equipped with a jacket. In the case of a cylindrical thin film reactor equipped with a jacket, the heat of mixing is removed by controlling the jacket temperature when the heat of mixing is large. , Side reactions are suppressed and high quality reactants are obtained.

The cylindrical thin film reactor is provided with a raw material supply port so that at least two kinds of raw materials can be supplied. Further, it is preferable to provide at least one raw material supply port at the end of the cylinder and at least one raw material supply port at the side wall part of the cylinder in the axial direction. Regarding the position of the raw material supply port of the side wall portion, in order to improve the mixing efficiency, the distance from the end of the cylinder in the axial direction is preferably smaller than 3/5 of the total length of the cylinder.

The position of the gas supply port used in the present invention is
There is no particular limitation as long as the raw material becomes a thin film by supplying gas.

The raw materials used in the present invention include liquids and powders. The liquid is preferably room temperature,
A liquid at normal pressure is used, but a solid at room temperature and pressure, or a liquid at a temperature higher than the melting point may be used. As the powder, a powdery one at room temperature and normal pressure is used, but a powdery one obtained by crushing a lumpy powder at room temperature and normal pressure may be used.

As a combination of two or more kinds of raw materials, liquid-liquid and liquid-powder are preferable, and liquid-liquid is particularly preferable.

As a method of supplying the raw materials when the two or more kinds of raw materials are liquids, for example, the liquid A and the liquid B may be supplied from the raw material supply port at the end of the cylinder, or the raw material supply port at the end of the cylinder. The liquid A may be supplied from the above, and the liquid B may be supplied from the raw material supply port of the side wall. Furthermore, liquid A from the raw material supply port at the end of the cylinder,
The liquid B may be supplied and the liquid C may be supplied from the raw material supply port on the side wall.

Similarly, as a method of supplying the raw material when powder is used as the raw material, for example, the liquid A and the powder B may be supplied from the raw material supply port at the end of the cylinder, or the raw material may be supplied at the end of the cylinder. The liquid A may be supplied from the mouth and the powder B may be supplied from the raw material supply port of the side wall. Further, the liquid A and the powder B may be supplied from the raw material supply port at the end of the cylinder, and the powder C may be supplied from the raw material supply port at the side wall.

Further, it is preferable that a cyclone is provided at the outlet of the cylindrical thin film reactor, where a gas and a mixture are separated. The cylindrical thin-film reactor is usually arranged vertically to mix two or more raw materials, but it may be arranged to be inclined if necessary.

The diameter and length of the cylindrical thin film reactor used in the present invention are preferably 5 to 150 mm in diameter and 0.3 to 15 m in the case of a cylindrical flow-down type thin film reactor. If the diameter exceeds 150 mm, the equipment becomes large and heat removal becomes difficult, which is not preferable. Diameter less than 5mm, length
If it is less than 0.3 m, it is not preferable in terms of production efficiency. Further, if the length exceeds 15 m, the equipment becomes large, which is not preferable. The number of cylindrical thin film reactors may be appropriately determined in consideration of the production amount.

The linear velocity of the gas for forming a thin film is not particularly limited, but in consideration of the production amount of the mixture and the thin film forming state of the raw materials, the superficial velocity in the cylindrical thin film reactor is 2
-80 m / s is preferable. The feed rate of the raw material is not particularly limited, but in consideration of the production amount and the thin film forming state of the raw material, per cylinder side of the cylindrical thin film reactor (per 1 m of the circumference based on the inner diameter of the cylindrical thin film reactor) 0.1 to 3000 kg / m · h is preferable.

In the present invention, a ring provided on the inner wall of the cylinder,
The mixing efficiency is increased by the mixing promoting member such as the blade body, the protrusion, or the groove. The mounting position of the mixing promoting member is below the raw material supply port of the cylindrical thin film reactor, that is, in the flowing direction of the raw material. Considering the mixing efficiency, the distance from the end of the cylinder in the axial direction is 2 cylinder lengths. It is preferably less than / 3. Further, in order to efficiently mix the raw materials, it is preferable that the raw material supply port and the mixing promotion member be as close as possible.

Examples of the mixing promoting member used in the present invention include a ring (FIG. 3), a blade body (FIG. 4), a protrusion (FIG. 5, 6 or 7) or a groove (FIG. 8). To be

A ring (eg, FIG. 3) is used as a mixing promoting member.
(1) is adopted, the formation position and number of the rings are not particularly limited as long as two or more kinds of raw materials can be sufficiently mixed. The size of the ring is not particularly limited as long as two or more types of raw materials can be sufficiently mixed, but assuming that the diameter of the cylindrical thin film reactor is D, the cross-sectional diameter of the ring is 0.001.
D to 0.25D is preferable. If it is less than 0.001D, the raw materials cannot be sufficiently mixed, and if it exceeds 0.25D, the resistance to the flow of the raw material increases, which is not preferable.

As a mixing promoting member, a blade body (see, for example, FIG.
(1) is adopted, the formation position and number of the blades are not particularly limited as long as two or more kinds of raw materials can be sufficiently mixed. The blade body may be either twisted to the right (clockwise) or twisted to the left (counterclockwise), and is preferably installed in a spiral shape (FIG. 4). The twist angle of the blade is 2
It can be set arbitrarily depending on the viscosity of one or more raw materials and the feed flow rate.

As a mixing promoting member, a protrusion (eg, FIG.
7) to 7) are adopted, the arrangement position, the number, and the arrangement direction of the protrusions are not particularly limited as long as two or more kinds of raw materials can be sufficiently mixed. The size of the protrusion is not particularly limited as long as two or more raw materials can be sufficiently mixed, but when the diameter of the cylindrical thin film reactor is D, the length of one side of the protrusion is 0.001D to 0.25D, and the thickness is Is 0.001D to 0.25D
Is preferred. If the length and thickness of one side are less than 0.001D, the raw materials cannot be sufficiently mixed, and if it exceeds 0.25D, the resistance to the flow of the raw material increases, which is not preferable. The shape of the protrusion is not limited to a square cross section, but may be a circle or a rhombus as long as two or more raw materials can be mixed. The protrusions may be arranged in a ring shape with a space therebetween, or may be arranged in a spiral shape.

When a groove (for example, as shown in FIG. 8) is used as the mixing promoting member, the excavation shape of the groove is not particularly limited as long as two or more raw materials can be sufficiently mixed, but the cross section is not limited. Examples include a semicircle and a triangle. The groove is
The inner wall of the cylindrical thin film reactor is preferably drilled in a spiral shape. The width, depth, and number of grooves are not particularly limited as long as two or more kinds of raw materials can be sufficiently mixed.

Further, the ring, the blade and the protrusion may be formed of a porous body or a porous body. Further, a mesh-shaped porous auxiliary body may be provided on the inner wall portion of the cylindrical thin film reactor and the surface of the mixing promoting member such as the ring, the blade body or the projection.

[0028]

According to the present invention, two or more kinds of raw materials supplied from the raw material supply port are divided and joined by the mixing promoting member attached to the inner wall of the cylinder of the cylindrical thin film reactor of the present invention. It undergoes transition, shearing action and is mixed with high efficiency.

Since the cylindrical thin film reactor of the present invention has a structure in which the mixing promoting member is provided in the cylinder, the reactor can be manufactured easily and at low cost. By mixing in such a cylindrical thin film reactor, the mixing efficiency is good, and when the reaction is performed, side reactions are suppressed and a high quality reactant can be obtained.

Thus, by using the cylindrical thin film reactor of the present invention having the supply ports for two or more raw materials and the mixing promoting member attached to the inner wall portion, two or more raw materials are mixed in a thin film form, These two or more raw materials can be efficiently mixed at low cost.

[0031]

FIG. 1 is a schematic cross-sectional view of a flow-down type cylindrical thin film reactor (single tube type) used in the present invention, and FIG. 2 shows a conventional flow-down type cylindrical thin film reactor of the present invention. 3 is a schematic cross-sectional view of an essential part showing a portion corresponding to a portion where a mixing promoting member is formed. 3 to 8 are schematic cross-sectional views of a main part of a portion where a mixing promoting member is formed in the flow-down type cylindrical thin film reactor of FIG. In FIG. 1, 1 is a cylindrical reaction tube, and the cylindrical reaction tube is equipped with a jacket (not shown) for supplying cooling water. In FIG. 1, 2 is a gas supply port, 3 is a liquid A supply unit, 4 is a liquid B supply unit, 5 is a ring that is a mixing promoting member, and 6 is a cyclone.

The raw material A (liquid) is supplied to the supply means 3 in a liquid form by a metering pump (not shown), gradually accumulates in the supply means 3 and overflows from the injection port 3'and propagates along the wall surface into a cylinder, that is, a cylinder. It flows down in the shaped reaction tube 1. At this time, gas is supplied from the gas supply port 2, and the gas makes the liquid flowing down the wall surface into a thin film.

Similarly to the raw material A (liquid), the raw material B (liquid) is also supplied to the liquid supply means 4 by a pump, accumulates therein, and then overflows from the injection port 4'and travels along the wall surface to be thinned. .

After that, by the ring of the mixing promoting member 5,
The liquid B and the liquid A are subjected to division, merging, transition and shearing action, and are mixed with high efficiency. The mixture of the raw material A (liquid) and the raw material B (liquid) is separated from the gas by the cyclone 6 and then recovered.

In this embodiment, a ring is used as the mixing promoting member 5, but in addition to this, a blade body 5a as shown in FIG. 4 and various shapes as shown in FIGS. The protrusions (5b to d) or the groove 5e as shown in FIG. 8 can be adopted.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view showing an example of a cylindrical thin film reactor used in the present invention.

FIG. 2 is a schematic cross-sectional view of a main part of a conventional cylindrical thin film reactor. (A) is a schematic sectional view, (B) is a schematic perspective view, and (C) is a schematic plan view.

FIG. 3 shows a cylindrical thin film reactor shown in an example of the present invention,
It is a principal part sectional schematic view which shows a mixing promotion member. (A) is a schematic sectional view, (B) is a schematic perspective view, and (C) is a schematic plan view.

FIG. 4 shows a cylindrical thin film reactor according to an embodiment of the present invention,
It is a principal part sectional schematic view which shows another mixing promotion member. (A) is a schematic sectional view, (B) is a schematic perspective view, and (C) is a schematic plan view.

FIG. 5 shows a cylindrical thin film reactor according to an embodiment of the present invention,
It is a principal part sectional schematic view which shows another mixing promotion member. (A) is a schematic sectional view, (B) is a schematic perspective view, and (C) is a schematic plan view.

FIG. 6 shows a cylindrical thin film reactor according to an embodiment of the present invention,
It is a principal part sectional schematic view which shows another mixing promotion member. (A) is a schematic sectional view, (B) is a schematic perspective view, and (C) is a schematic plan view.

FIG. 7 shows a cylindrical thin film reactor according to an embodiment of the present invention,
It is a principal part sectional schematic view which shows another mixing promotion member. (A) is a schematic sectional view, (B) is a schematic perspective view, and (C) is a schematic plan view.

FIG. 8 shows a cylindrical thin-film reactor according to an embodiment of the present invention,
It is a principal part sectional schematic view which shows another mixing promotion member. (A) is a schematic sectional view, (B) is a schematic perspective view, and (C) is a schematic plan view.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Cylindrical reaction tube 2 Gas supply port 3 Raw material A supply means 3'Raw material A injection port 4 Raw material B supply means 4'Raw material B injection port 5 Mixing promotion member (ring) 5a Same as above (vane body) 5b Same as above (projection) 5c Same as above (projection) 5d Same as above (projection) 5e Same as above (groove) 6 Cyclone

Claims (6)

[Claims] 1. A cylindrical thin film reactor having a raw material supply port capable of supplying two or more raw materials and a mixing promoting member attached to an inner wall portion. 2. The cylindrical thin film reactor according to claim 1, further comprising a gas supply port for supplying a gas. 3. The cylindrical thin film reactor according to claim 1 or 2, wherein at least one raw material supply port is provided at the end of the cylinder, and at least one raw material supply port is provided at the side wall part of the cylinder in the axial direction. . 4. The cylindrical thin film reactor according to claim 3, wherein at least one mixing promoting member is attached below the raw material supply port provided in the side wall portion. 5. The cylindrical thin film reactor according to claim 1, wherein the mixing promoting member is a ring, a blade, a protrusion, or a groove. 6. The cylindrical thin film reactor according to claim 1, wherein the raw material supply port is a liquid supply port.