JPH09126968A - Method for preparing sample for transmission-type electronic microscope - Google Patents

Method for preparing sample for transmission-type electronic microscope

Info

Publication number
JPH09126968A
JPH09126968A JP30364295A JP30364295A JPH09126968A JP H09126968 A JPH09126968 A JP H09126968A JP 30364295 A JP30364295 A JP 30364295A JP 30364295 A JP30364295 A JP 30364295A JP H09126968 A JPH09126968 A JP H09126968A
Authority
JP
Japan
Prior art keywords
sample
groove
etching
electron microscope
transmission electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30364295A
Other languages
Japanese (ja)
Other versions
JP2743891B2 (en
Inventor
Hiroshi Kimura
央 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP30364295A priority Critical patent/JP2743891B2/en
Publication of JPH09126968A publication Critical patent/JPH09126968A/en
Application granted granted Critical
Publication of JP2743891B2 publication Critical patent/JP2743891B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a method for preparing a flat and thin sample for a transmissiontype electronic microscope over a wide range. SOLUTION: A recess 11 is formed at a part for observing a test piece 10 (Process 101), a groove 12 which is approximately 10μm deep is formed at a specific part on the bottom surface of the formed recessed 12 using focusing beams, and water 13 is poured into the recess 11 (Process 102). Then, the lower surface of the test piece 10 is dipped into an etching liquid, the water 13 flowing out of the bottom surface of the groove 12 is mixed with an etching liquid at the same time when the inside surrounded by the groove 12 is separated when etching due to an etching liquid reaches a surface a-a' of the test piece 10 for diluting the etching liquid, thus stopping the progress of etching and obtaining a thinned test piece 14 (Process 103).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、透過型電子顕微鏡
用試料の作製方法に関し、特に広範囲にわたって平坦か
つ薄い透過型電子顕微鏡用試料の作製方法に関する。
The present invention relates to a method for preparing a sample for a transmission electron microscope, and more particularly to a method for preparing a flat and thin sample for a transmission electron microscope over a wide range.

【0002】[0002]

【従来の技術】透過型電子顕微鏡は、高電圧下で加速し
た電子を結晶材料中に透過させ、結晶材料中での電子の
散乱による回折波を像として観察するものである。透過
型電子顕微鏡を用いて半導体、金属等の構造、表面形態
あるいは欠陥等を高い分解能で観察できるようにするた
めには、試料としての結晶材料を極めて薄くしなければ
ならない。
2. Description of the Related Art In a transmission electron microscope, electrons accelerated under a high voltage are transmitted through a crystal material, and a diffraction wave caused by scattering of electrons in the crystal material is observed as an image. In order to be able to observe the structure, surface morphology, defects and the like of semiconductors and metals with a high resolution using a transmission electron microscope, the crystalline material as a sample must be extremely thin.

【0003】図3は、従来の透過型電子顕微鏡用試料の
作製方法を説明するための斜視図である。
FIG. 3 is a perspective view for explaining a conventional method for manufacturing a sample for a transmission electron microscope.

【0004】図3に示すように、従来の透過型電子顕微
鏡用試料の作製方法においては、まず、ダイヤモンドカ
ッタ等を用いて3μmφ(直径)×1μm(厚さ)程度
の大きさに切断した試料片30を機械研磨面31方向か
ら機械研磨することによって厚さが約100μmとなる
ように薄片化する(工程301)。
As shown in FIG. 3, in a conventional method for preparing a sample for a transmission electron microscope, first, a sample cut into a size of about 3 μmφ (diameter) × 1 μm (thickness) using a diamond cutter or the like. The piece 30 is mechanically polished from the direction of the mechanically polished surface 31 to be thinned to a thickness of about 100 μm (step 301).

【0005】続いて、ボウル研磨によって観察箇所の近
傍の部分のみを厚さが約10〜20μmとなるまで薄く
した後(工程302)、さらにイオンミリング装置を用
いて観察箇所32を数千オングストロームまで薄くして
透過型電子顕微鏡用試料を作製する(工程303)。
Subsequently, only the portion near the observation point is reduced to a thickness of about 10 to 20 μm by bowl polishing (step 302), and the observation point 32 is further reduced to several thousand angstroms using an ion milling device. The sample is made thinner for a transmission electron microscope (step 303).

【0006】[0006]

【発明が解決しようとする課題】しかしながら、前記従
来の方法で作製した透過型電子顕微鏡用試料では、機械
的な研磨によって試料全体を平坦かつ厚さが10〜20
μmとなるまで薄片化することが困難であるため、試料
の観察箇所の近傍以外の部分が厚くなってしまい、観察
可能な範囲が限定されるという問題がある。
However, in a transmission electron microscope sample manufactured by the above-mentioned conventional method, the entire sample is flattened and has a thickness of 10 to 20 by mechanical polishing.
Since it is difficult to reduce the thickness of the sample to a thickness of μm, a portion other than the vicinity of the observation point of the sample becomes thick, and there is a problem that the observable range is limited.

【0007】従って、本発明は前記問題点に鑑みてなさ
れたものであり、広範囲にわたって平坦かつ薄い透過型
電子顕微鏡用試料の作製方法を提供することを目的とす
る。
Accordingly, the present invention has been made in view of the above problems, and has as its object to provide a method for manufacturing a flat and thin sample for a transmission electron microscope over a wide range.

【0008】[0008]

【課題を解決するための手段】前記目的を達成するた
め、本発明は、試料の観察箇所の周囲にフォーカスされ
た集束ビームを用いて溝を形成すると共に、該溝が形成
された箇所を底面に含むくぼみを形成し、該くぼみにエ
ッチングを抑制する液体を注入した後に、前記溝が形成
された前記試料の端面と反対の端面をウェットエッチン
グして、広範囲にわたって平坦かつ薄い試料を得ること
を特徴とする透過型電子顕微鏡用試料の作製方法を提供
する。
In order to achieve the above object, the present invention provides a method of forming a groove using a focused beam focused around an observation point of a sample, and forming a groove at the position where the groove is formed on a bottom surface. After forming a dent including in the dent and injecting a liquid for suppressing etching into the dent, wet etching is performed on the end surface opposite to the end surface of the sample in which the groove is formed to obtain a flat and thin sample over a wide range. A method for producing a transmission electron microscope sample, which is a feature of the present invention, is provided.

【0009】また、本発明は、試料の観察箇所の周囲に
フォーカスされた集束ビームを用いて溝を形成すると共
に、該溝が形成された箇所を底面に含むくぼみを形成
し、該くぼみにエッチングを抑制する液体を注入した後
に、エッチングに侵されない基板によって前記くぼみを
密閉した上で前記試料をウェットエッチングして、広範
囲にわたって平坦かつ薄い試料を得ることを特徴とする
透過型電子顕微鏡用試料の作製方法を提供する。
The present invention also provides a method of forming a groove using a focused beam focused around an observation position of a sample, forming a depression including the position where the groove is formed on the bottom surface, and etching the depression. After injecting a liquid that suppresses the etching, the recess is sealed by a substrate that is not attacked by etching, and the sample is wet-etched to obtain a flat and thin sample over a wide range. A method of making is provided.

【0010】さらに、本発明は、試料の観察箇所の周囲
に所定の深さを有する溝を形成し、該溝が形成された前
記試料の端面と反対の端面をエッチング液を用いてエッ
チングし、前記溝の底面の位置までエッチングがなされ
たときに、前記溝を介してエッチングを抑制する液体が
前記エッチング液に混合されるようにしたことを特徴と
する透過型電子顕微鏡用試料の作製方法を提供する。
Further, according to the present invention, a groove having a predetermined depth is formed around an observation point of a sample, and an end surface opposite to the end surface of the sample in which the groove is formed is etched using an etching solution. A method for producing a sample for a transmission electron microscope, characterized in that, when etching is performed up to the position of the bottom surface of the groove, a liquid that suppresses etching through the groove is mixed with the etching liquid. provide.

【0011】本発明の透過型電子顕微鏡用試料の作製方
法によれば、例えば、ダイヤモンドカッタ等で切断した
試料にくぼみを形成すると共に、形成されたくぼみの底
面にフォーカスされた集束ビームを用いて観察箇所を囲
むように深さが約10〜20μmの溝を形成する。な
お、くぼみには、エッチングを抑制する液体、例えば水
を注入しておく。
According to the method for manufacturing a sample for a transmission electron microscope of the present invention, for example, a recess is formed in a sample cut with a diamond cutter or the like, and a focused beam focused on the bottom surface of the formed recess is used. A groove having a depth of about 10 to 20 μm is formed so as to surround the observation point. A liquid that suppresses etching, for example, water is injected into the depression.

【0012】その後、くぼみが形成された試料の端面と
反対の端面をエッチング液に浸し、エッチングが溝の底
面まで達したときに、溝に囲まれた内側の部分が試料か
ら分離するのと同時に、くぼみに注入されている液体が
溝の底面を介して流出する。流出した液体はエッチング
液と混合されてエッチングの進行を停止させるため、最
終的に、広範囲にわたって平坦かつ厚さが約10〜20
μmの薄片化試料片を得ることができる。
Thereafter, the end surface opposite to the end surface of the sample in which the depression is formed is immersed in an etching solution, and when the etching reaches the bottom surface of the groove, the inner portion surrounded by the groove is separated from the sample at the same time. The liquid injected into the recess flows out through the bottom of the groove. The effluent liquid is mixed with the etching solution to stop the progress of the etching, so that it is finally flat and has a thickness of about 10 to 20 over a wide range.
A μm thinned sample piece can be obtained.

【0013】なお、以上のようにして得られた薄片化試
料片は、必要に応じてさらにイオンミリング装置等を用
いて数千オングストロームの厚さになるまで薄くするこ
とができる。
The thinned sample obtained as described above can be further thinned to a thickness of several thousand angstroms using an ion milling device or the like, if necessary.

【0014】[0014]

【発明の実施の形態】以下、本発明の実施の形態につい
て図面を参照して詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

【0015】[0015]

【実施形態1】まず、本発明の第1の実施形態に係る透
過型電子顕微鏡用試料の作製方法を説明する。
Embodiment 1 First, a method for manufacturing a sample for a transmission electron microscope according to a first embodiment of the present invention will be described.

【0016】図1は、本発明の第1の実施形態に係る透
過型電子顕微鏡用試料の作製方法を説明するための斜視
図及び断面図である。
FIG. 1 is a perspective view and a sectional view for explaining a method for manufacturing a sample for a transmission electron microscope according to the first embodiment of the present invention.

【0017】図1に示すように、まず、シリコン(S
i)基板上のデバイス(試料片10)において、観察し
たい箇所の周囲をワックスでマスクし、これをウェット
エッチングすることによって、くぼみ11を形成する
(工程101)。なお、くぼみ11は、フォーカスされ
たイオンビームを用いても形成することができる。
As shown in FIG. 1, first, silicon (S
i) In a device (sample piece 10) on a substrate, the periphery of a portion to be observed is masked with wax, and this is wet-etched to form a depression 11 (step 101). The depression 11 can also be formed by using a focused ion beam.

【0018】次に、集束イオンビームを用いて、くぼみ
11の底面の所定の箇所に深さが約10μmの溝12を
形成した後、くぼみ11に水13を注入する(工程10
2)。溝12は、最終的に得られる薄片化試料片14の
大きさに合わせて、例えば上方からみて矩形等の形状に
なるように形成する。形成する箇所は、図1に示したよ
うに、くぼみ11の底面の外周に沿うような箇所にする
他、くぼみ11の底面内の任意の箇所とすることができ
る。
Next, using a focused ion beam, a groove 12 having a depth of about 10 μm is formed at a predetermined position on the bottom surface of the depression 11, and water 13 is injected into the depression 11 (step 10).
2). The groove 12 is formed so as to have a rectangular shape or the like when viewed from above, for example, according to the size of the finally obtained thinned sample piece 14. As shown in FIG. 1, the portion to be formed may be a portion along the outer periphery of the bottom surface of the recess 11 or may be any portion within the bottom surface of the recess 11.

【0019】その後、試料片10の下面をふっ酸と硝酸
との混合液(以下「エッチング液」という)に浸す。な
お、ふっ酸と硝酸との混合比は1:80とする。
Thereafter, the lower surface of the sample 10 is immersed in a mixed solution of hydrofluoric acid and nitric acid (hereinafter referred to as "etching solution"). The mixing ratio between hydrofluoric acid and nitric acid is 1:80.

【0020】エッチング液によるエッチングが、試料片
10のa−a′面に達したときに、溝12の内側の部分
が試料片10から分離するのと同時に、溝12の底面か
ら流出した水13がエッチング液と混合してエッチング
液を希釈するため、エッチングの進行が停止されて薄片
化試料片14が得られる(工程103)。
When the etching with the etchant reaches the a-a 'plane of the sample piece 10, the water 13 flowing out from the bottom face of the groove 12 is simultaneously separated from the inside of the groove 12 from the sample piece 10. Is mixed with the etching solution to dilute the etching solution, so that the progress of the etching is stopped and the sliced sample piece 14 is obtained (step 103).

【0021】薄片化試料片14をエッチング液の中から
メッシュ等ですくい取ることにより、最終的に、広範囲
にわたって平坦かつ厚さが約10μmの薄片化試料片を
得ることができる。
By skimming the thinned sample piece 14 out of the etching solution with a mesh or the like, a flat thinned sample piece having a thickness of about 10 μm can be finally obtained over a wide range.

【0022】なお、得られた厚さ約10μmの薄片化試
料片14をイオンミリング装置を用いてさらに薄片化し
たところ、従来の方法で作製した試料よりも広範囲にわ
たって透過型電子顕微鏡像を観察することができた。
When the obtained thinned sample piece 14 having a thickness of about 10 μm is further thinned using an ion milling apparatus, a transmission electron microscope image is observed over a wider area than the sample manufactured by the conventional method. I was able to.

【0023】[0023]

【実施形態2】次に、本発明の第2の実施形態に係る透
過型電子顕微鏡用試料の作製方法を説明する。
Embodiment 2 Next, a method for manufacturing a sample for a transmission electron microscope according to a second embodiment of the present invention will be described.

【0024】図2は、本発明の第2の実施形態に係る透
過型電子顕微鏡用試料の作製方法を説明するための斜視
図及び断面図である。
FIG. 2 is a perspective view and a sectional view for explaining a method for manufacturing a sample for a transmission electron microscope according to a second embodiment of the present invention.

【0025】図2に示すように、まず、シリコン(S
i)基板上のデバイス(試料片20)において、観察し
たい箇所の近傍に集束イオンビームを用いて、深さが約
10μmの溝21を形成する(工程201)。溝21
は、最終的に得られる薄片化試料片26の大きさに合わ
せて、例えば上方からみて矩形等の形状になるように形
成する。
As shown in FIG. 2, first, silicon (S
i) In a device (sample piece 20) on a substrate, a groove 21 having a depth of about 10 μm is formed near a point to be observed using a focused ion beam (step 201). Groove 21
Is formed, for example, in a rectangular shape when viewed from above, in accordance with the size of the sliced sample piece 26 finally obtained.

【0026】次に、溝21が形成された箇所の周囲をセ
ラミック板23で囲むことによってくぼみ22を形成し
(工程202)、さらにセラミック基板24をセラミッ
ク板23の上面にワックスで固定する。なお、試料片2
0とセラミック基板24とのすき間には水25を満たし
ておく(工程203)。
Next, a recess 22 is formed by surrounding the area where the groove 21 is formed with a ceramic plate 23 (step 202), and the ceramic substrate 24 is fixed to the upper surface of the ceramic plate 23 with wax. Sample piece 2
Water 25 is filled in the gap between the substrate 0 and the ceramic substrate 24 (step 203).

【0027】その後、試料片20の全体をふっ酸と硝酸
との混合液(以下「エッチング液」という)に浸漬する
ようにする。なお、ふっ酸と硝酸との混合比は1:80
とする。
Thereafter, the entire sample piece 20 is immersed in a mixed solution of hydrofluoric acid and nitric acid (hereinafter referred to as "etching solution"). The mixing ratio between hydrofluoric acid and nitric acid is 1:80.
And

【0028】エッチング液によるエッチングが、試料片
20のb−b′面に達したときに、溝21の内側の部分
が試料片20から分離するのと同時に、溝21の底面か
ら流出した水25がエッチング液と混合してエッチング
液を希釈するため、エッチングの進行が停止されて薄片
化試料片26が得られる(工程204)。
When the etching with the etchant reaches the bb 'plane of the sample piece 20, the inner portion of the groove 21 separates from the sample piece 20 and the water 25 flowing out of the bottom face of the groove 21 at the same time. Is mixed with the etching solution to dilute the etching solution, so that the progress of the etching is stopped and the sliced sample piece 26 is obtained (step 204).

【0029】薄片化試料片26をエッチング液の中から
メッシュ等ですくい取ることにより、最終的に、広範囲
にわたって平坦かつ厚さが約10μmの薄片化試料片を
得ることができる。
By skimming the thinned sample piece 26 out of the etching solution with a mesh or the like, finally, a flat thinned sample piece having a thickness of about 10 μm can be obtained over a wide range.

【0030】なお、得られた厚さ約10μmの薄片化試
料片26をイオンミリング装置を用いてさらに薄片化し
たところ、従来の方法で作製した試料よりも広範囲にわ
たって透過型電子顕微鏡像を観察することができた。
When the obtained thinned sample piece 26 having a thickness of about 10 μm was further thinned using an ion milling apparatus, a transmission electron microscope image was observed over a wider area than the sample manufactured by the conventional method. I was able to.

【0031】以上、本発明の実施の形態をいくつか説明
したが、本発明はこれらの実施の形態に限定されるもの
ではなく、本発明の原理に準ずる各種の実施の形態を含
む。
Although several embodiments of the present invention have been described above, the present invention is not limited to these embodiments, but includes various embodiments according to the principles of the present invention.

【0032】例えば、観察箇所の周囲に溝12、21を
形成する集束ビームとして、イオンビーム以外にレーザ
ビームを用いることができる。
For example, a laser beam other than an ion beam can be used as a focused beam for forming the grooves 12 and 21 around the observation point.

【0033】また、くぼみ11、22に注入する液体
は、水以外にも酸性のエッチング液を中和するアルカリ
性の液体を用いることができる。
As the liquid to be injected into the depressions 11 and 22, an alkaline liquid that neutralizes an acidic etching liquid can be used in addition to water.

【0034】[0034]

【発明の効果】以上説明したように、本発明の透過型電
子顕微鏡用試料の作製方法によれば、イオンミリングを
行う前に広範囲にわたって平坦かつ薄い試料を得ること
ができるため、従来の方法で作製した試料よりも広い観
察範囲を有する透過型電子顕微鏡用試料を作製すること
ができる。
As described above, according to the method for preparing a sample for a transmission electron microscope of the present invention, a flat and thin sample can be obtained over a wide range before performing ion milling. A sample for a transmission electron microscope having a wider observation range than the manufactured sample can be manufactured.

【0035】また、本発明の透過型電子顕微鏡用試料の
作製方法によれば、フォーカスされた集束ビームを用い
て微小部分を容易に特定することができるため、従来の
方法では特定できなかった微小部分も観察可能とする透
過型電子顕微鏡用試料を作製することができる。
Further, according to the method for manufacturing a sample for a transmission electron microscope of the present invention, a minute portion can be easily specified by using a focused beam, and thus a minute portion which cannot be specified by a conventional method. A sample for a transmission electron microscope in which a part can be observed can be manufactured.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の第1の実施形態に係る透過型電子顕微
鏡用試料の作製方法を説明するための斜視図及び断面図
である。
FIGS. 1A and 1B are a perspective view and a cross-sectional view illustrating a method for manufacturing a sample for a transmission electron microscope according to a first embodiment of the present invention.

【図2】本発明の第2の実施形態に係る透過型電子顕微
鏡用試料の作製方法を説明するための斜視図及び断面図
である。
2A and 2B are a perspective view and a cross-sectional view for explaining a method for manufacturing a sample for a transmission electron microscope according to a second embodiment of the present invention.

【図3】従来の透過型電子顕微鏡用試料の作製方法を説
明するための斜視図である。
FIG. 3 is a perspective view for explaining a conventional method for manufacturing a sample for a transmission electron microscope.

【符号の説明】[Explanation of symbols]

10、20、30 試料片 11、22 くぼみ 12、21 溝 13、25 水 14、26 薄片化試料片 23 セラミック板 24 セラミック基板 31 機械研磨面 32 観察箇所 10, 20, 30 Sample piece 11, 22 Recess 12, 21, Groove 13, 25 Water 14, 26 Thinned sample piece 23 Ceramic plate 24 Ceramic substrate 31 Mechanically polished surface 32 Observation point

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】試料の観察箇所の周囲にフォーカスされた
集束ビームを用いて溝を形成すると共に、該溝が形成さ
れた箇所を底面に含むくぼみを形成し、該くぼみにエッ
チングを抑制する液体を注入した後に、前記溝が形成さ
れた前記試料の端面と反対の端面をウェットエッチング
して、広範囲にわたって平坦かつ薄い試料を得ることを
特徴とする透過型電子顕微鏡用試料の作製方法。
1. A liquid which forms a groove using a focused beam focused around an observation point of a sample, forms a recess including a portion where the groove is formed on a bottom surface, and suppresses etching in the recess. And then performing wet etching on an end surface of the sample on which the groove is formed, opposite to the end surface of the sample, to obtain a flat and thin sample over a wide range, the method for manufacturing a sample for a transmission electron microscope.
【請求項2】前記エッチングを抑制する液体として水を
用いることを特徴とする請求項1記載の透過型電子顕微
鏡用試料の作製方法。
2. The method for producing a sample for a transmission electron microscope according to claim 1, wherein water is used as the liquid for suppressing the etching.
【請求項3】試料の観察箇所の周囲にフォーカスされた
集束ビームを用いて溝を形成すると共に、該溝が形成さ
れた箇所を底面に含むくぼみを形成し、該くぼみにエッ
チングを抑制する液体を注入した後に、エッチングに侵
されない基板によって前記くぼみを密閉した上で前記試
料をウェットエッチングして、広範囲にわたって平坦か
つ薄い試料を得ることを特徴とする透過型電子顕微鏡用
試料の作製方法。
3. A liquid which forms a groove by using a focused beam focused around an observation position of a sample, forms a recess including a portion on which the groove is formed on a bottom surface, and suppresses etching in the recess. A method for preparing a sample for a transmission electron microscope, wherein the sample is wet-etched after sealing the dent with a substrate that is not affected by etching after the injection of the sample, thereby obtaining a flat and thin sample over a wide range.
【請求項4】前記エッチングを抑制する液体として水を
用いることを特徴とする請求項3記載の透過型電子顕微
鏡用試料の作製方法。
4. The method for producing a sample for a transmission electron microscope according to claim 3, wherein water is used as the liquid for suppressing the etching.
【請求項5】試料の観察箇所の周囲に所定の深さを有す
る溝を形成し、該溝が形成された前記試料の端面と反対
の端面をエッチング液を用いてエッチングし、前記溝の
底面の位置までエッチングがなされたときに、前記溝を
介してエッチングを抑制する液体が前記エッチング液に
混合されるようにしたことを特徴とする透過型電子顕微
鏡用試料の作製方法。
5. A groove having a predetermined depth is formed around an observation point of a sample, and an end surface opposite to the end surface of the sample in which the groove is formed is etched using an etching solution, and a bottom surface of the groove is formed. A method of manufacturing a sample for a transmission electron microscope, wherein a liquid that suppresses etching through the groove is mixed with the etching liquid when the etching is performed up to the position.
JP30364295A 1995-10-27 1995-10-27 Preparation method for transmission electron microscope sample Expired - Lifetime JP2743891B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30364295A JP2743891B2 (en) 1995-10-27 1995-10-27 Preparation method for transmission electron microscope sample

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30364295A JP2743891B2 (en) 1995-10-27 1995-10-27 Preparation method for transmission electron microscope sample

Publications (2)

Publication Number Publication Date
JPH09126968A true JPH09126968A (en) 1997-05-16
JP2743891B2 JP2743891B2 (en) 1998-04-22

Family

ID=17923462

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30364295A Expired - Lifetime JP2743891B2 (en) 1995-10-27 1995-10-27 Preparation method for transmission electron microscope sample

Country Status (1)

Country Link
JP (1) JP2743891B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013047691A (en) * 2005-02-23 2013-03-07 Fei Co Repetitive circumferential cutting for making sample

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013047691A (en) * 2005-02-23 2013-03-07 Fei Co Repetitive circumferential cutting for making sample

Also Published As

Publication number Publication date
JP2743891B2 (en) 1998-04-22

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