JPH09125254A - Titanium-aluminum alloy parts and production thereof - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide TiAl alloy parts, having a uniform high temp. oxidation resisting film on the whole surface even in the case of complicated shape and excellent in oxidation resistance, and a method for producing them. SOLUTION: The surface of a base material, composed of TiAl intermetallic compound, is coated with an oxide sol solution consisting of the oxide of any metallic element among tungsten, niobium, and tantalum, followed by vacuum heating in a vacuum atmosphere. TiAl alloy parts 10, obtained in the case where the tungsten is used as the metal, has a high temp. oxidation resisting film 12 on the surface of a base material 11. The high temp. oxidation resisting film 12 is constituted of a first layer 121 composed of WO3 .TiO2 .Al2 O3 , a second layer 122 composed of TiO2 .Al2 O3 , and a third layer 123 composed of Al2 O3 . Metallic W is dispersed in respective layers 121, 122, and 123.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to TiAl excellent in high temperature oxidation resistance.
TECHNICAL FIELD The present invention relates to a system alloy component and a method for manufacturing the same.

[0002]

2. Description of the Related Art TiAl-based intermetallic compounds have the excellent characteristics that they are lighter in weight than Ti alone and have very high high-temperature strength. Therefore, TiAl-based alloy parts mainly composed of TiAl-based intermetallic compounds are expected to be applied to parts requiring light weight and high strength such as jet engine parts and turbocharger parts for automobile engines. However, the TiAl-based intermetallic compound has a problem that the oxidation resistance rapidly deteriorates at a high temperature of 800 ° C. or higher.

It is considered that the reason for the deterioration of the high temperature oxidation resistance is that the diffusion of Ti to the surface becomes severe under high temperature. That is, the TiAl-based intermetallic compound is rapidly oxidized at 800 ° C. or higher in the atmosphere, and TiO ₂
Grow preferentially. As a result, the TiO ₂ layer, the Al ₂
An oxide scale consisting of _three layers of O ₃ layer and TiO ₂ · Al ₂ O ₃ layer is formed.

At the initial stage of oxidation, the second
Oxidation resistance is secured by the Al ₂ O ₃ layer of the layer. This is because Al ₂ O ₃ is continuously formed in the initial stage of oxidation, so that the Al ₂ O ₃ layer causes diffusion of Ti from the base material to the surface and O () from the surface to the base material. It is considered that this is because diffusion of oxygen) is suppressed. However, when the oxidation further progresses, the diffusion of Ti progresses,
The continuity of the _second Al ₂ O ₃ layer is lost. Therefore, the effect of suppressing diffusion of Ti and O by the Al ₂ O ₃ layer is impaired, and the oxidation resistance of the TiAl-based intermetallic compound decreases.

On the other hand, the following method has been proposed as a method for improving the high temperature oxidation resistance. First, the first method is TiAl disclosed in Japanese Examined Patent Publication No. 4-63148.
This is a method of forming an oxidation resistant film made of Al ₂ O ₃ on the surface of the intermetallic compound. In this method, by heating in a low oxygen atmosphere, Al is selectively oxidized on the surface of the TiAl-based intermetallic compound to form an Al ₂ O ₃ layer, which is used as an oxidation resistant film to improve high temperature oxidation resistance. It is an improvement.

The second method is at least one of Mo and W having a thickness of 0.5 μm or more on the surface of a TiAl-based intermetallic compound disclosed in Japanese Patent Laid-Open No. 5-78817.
This is a method of forming a concentrated layer of seeds. This method is
TiAl- having oxidation resistance on the surface of l-type intermetallic compound
A (W, Mo) alloy layer is formed to improve the oxidation resistance. As means for forming this concentrated layer, a method by sputtering and diffusion treatment, a method by powder pack treatment, and a method by powder pack treatment and diffusion treatment are shown.

[0007]

However, the above conventional methods for improving oxidation resistance have the following problems. First, in the first method, Al formed on the surface of the base material
The denseness of the ₂ O ₃ layer is insufficient, and diffusion of Ti to the surface cannot be sufficiently suppressed. Therefore, the adhesion between the base material and the Al ₂ O ₃ layer and the long-term stability of the Al ₂ O ₃ layer are poor.

In the second method, W or the like is deposited on the surface of the TiAl-based intermetallic compound by sputtering or powder pack treatment. Therefore, it is difficult to attach W etc. to the surface of a complicated shape or a large shape, and W
It is difficult to uniformly form a concentrated layer such as. Therefore, when the component has a complicated shape or a large shape, a portion having low oxidation resistance remains partially.

The present invention has been made in view of the above-mentioned problems of the related art. Even if the shape is complicated or large,
It is an object of the present invention to provide a TiAl-based alloy component having a uniform high-temperature oxidation resistant film on the entire surface thereof and excellent in oxidation resistance, and a manufacturing method thereof.

[0010]

The invention according to claim 1 is tungsten,
An oxide sol solution composed of an oxide of the above metal element prepared by using a metal compound containing a metal element of either niobium or tantalum and a solvent as a starting material is prepared, and the oxide sol solution is mixed with a TiAl-based intermetallic compound. A method for producing a TiAl-based alloy component, characterized in that a high temperature oxidation resistant film is formed on the surface of the base material by coating the surface of the base material made of a compound and then performing vacuum heating in a vacuum atmosphere. is there.

What is most noticeable in the present invention is to utilize the sol-gel method using the above oxide sol solution. Then, the above vacuum heating is performed.

[0012] The oxide sol solution by a sol-gel method, WO ₃ (tungsten oxide), one of the film of Nb ₂ O ₅ (niobium oxide) or Ta ₂ 0 ₅ (tantalum oxide) on the surface of the base material It is a sol solution for forming.
The oxide sol solution is prepared by using the above metal compound and a solvent as starting materials. Specifically, the metal compound of the above-mentioned tungsten, niobium, or tantalum is mixed in a solvent such as alcohol and is dissolved by stirring. Further, as the above-mentioned solvent, for example, alcohol, water, a mixed solution of alcohol and water, toluene, xylene, or the like can be used depending on the kind of the metal compound. preferable.

Next, the operation of the manufacturing method of the present invention will be described. In the manufacturing method of the present invention, the surface of the base material is coated with the oxide sol solution by using the sol-gel method. Therefore, even if the base material has a complicated shape or a large shape, a uniform oxide film can be formed on the entire surface of the base material.

After forming the oxide film on the surface of the base material, the vacuum heating is performed. Therefore, diffusion of either W, Nb, or Ta in the oxide film and Ti in the base material occurs. On the other hand, the surface of the base material is oxidized by O (oxygen) in the oxide film and a trace amount of O remaining in the vacuum atmosphere. As a result, a high temperature oxidation resistant film composed of three layers is formed on the surface of the base material.

The high temperature oxidation resistant coating is WO_Three ・ TiO_Two ・
Al_Two O_Three , Ta_TwoO_Five・ TiO_Two・ Al_Two O_Three Or T
a_TwoO_Five・ TiO_Two ・ Al_Two O_Three Which consists of either
Surface first layer and TiO_Two ・ Al_Two O_Three Second layer consisting of
And Al_Two O_Three And a third layer composed of layers.
Each layer is made of metal W, metal Nb, or metal Ta.
Someone is dispersed. That is, the first layer is WO_Three ・ Ti
O_Two ・ Al_Two O_Three In the case of, the metal W is Nb_Two O_Five・ T
iO_Two ・ Al_Two O_Three In the case of, the metal Nb is Ta _TwoO_Five
・ TiO_Two ・ Al_Two O_Three In the case of, metal Ta is
It is dispersed in each layer.

Next, according to the second aspect of the present invention, depending on the kind of the metal compound used as a starting material of the oxide sol solution, a coating film (WO ₃ film) is formed after the coating and before the vacuum heating. , Nb ₂ O ₅ film or Ta ₂ O ₅ film) must be heated to crystallize.

The heating temperature in this case is preferably 400 ° C. or higher. As a result, the WO ₃ on the entire surface of the base metal is
Either the coating, the Nb ₂ O ₅ coating or the Ta ₂ O ₅ coating can be crystallized uniformly. The heating temperature is 40
When the temperature is lower than 0 ° C, the above-mentioned film exists in an amorphous state containing a small amount of water on the TiAl surface, the oxidation of TiAl is promoted during vacuum heating, and the third film in the high-temperature oxidation-resistant film described later is formed. There is a problem that the denseness of the Al ₂ O ₃ layer located in the layer is lowered.

Next, as in the invention of claim 3, the metal compound containing tungsten is selected from tungsten-based metal alkoxides, tungsten-based metal acetylacetonates, tungsten-based chlorides, and tungstic acid compounds. More than one compound can be used. Specifically, as the tungsten-based metal alkoxide, W (OC ₂ H ₅ ) ₆ , W (OC ₃ H ₇ ) ₆ , W
(OC ₄ H ₉ ) ₆ , W (OC ₂ H ₅ ) ₅ , W (OC ₃ H
₇ ) There are ₅ etc. As the tungsten metal acetylacetonate, W (O ₂ C ₅ H ₇ ) ₆ , W (O ₂ C ₅ H)
₇ ) There are ₅ etc. As tungsten-based chloride, WC
1 ₆ , WCl ₅ , WOCl _{4 and the} like. Examples of the tungstic acid compound include H ₂ WO ₄ , Na ₂ WO ₄ , and Na ₂ W.
There are O ₄ · 2H ₂ O etc.

As the metal compound containing niobium, one or more compounds selected from niobium metal alkoxides, niobium metal acetylacetonates, and niobium chlorides may be used. Can be used. Specifically, as niobium-based metal alkoxides, Nb (OCH ₃ ) ₅ , Nb (OC ₂ H ₅ ) ₅ , Nb
(OC ₃ H ₇ ) ₅ etc. As the niobium-based metal acetylacetonate, there is Nb (O ₂ C ₅ H ₇ ) ₅ or the like. Further, as niobium chlorides, NbCl ₅ , NbO
Cl _{3 and the} like.

As the tantalum-containing metal compound according to the invention of claim 5, one or more compounds selected from tantalum-based metal alkoxides, tantalum-based metal acetylacetonates, and tantalum-based chlorides are used. Can be used. Specifically, as tantalum-based metal alkoxides, Ta (OCH ₃ ) ₅ , Ta (OC
₂ H ₅ ) ₅ , Ta (OC ₃ H ₇ ) _{5 and the} like. Further, as the tantalum-based metal acetylacetonate, Ta (O ₂
C ₅ H ₇ ) ₅ etc. The tantalum chlorides include TaCl ₅ , TaOCl _{3 and the} like.

Further, as in the invention of claim 6, it is preferable that the oxide sol solution contains a chelating agent which forms a complex with the metal compound. As a result, the oxide sol solution can be stabilized. Examples of the chelating agent include acetylacetone, diethanolamine and triethanolamine.

Next, the above-mentioned coating can be performed by the so-called dip method, spin method, spray method, etc. using the sol-gel method.

Further, it is preferable that the vacuum heating is performed at a vacuum degree of 1.3 Pa to 1.3 × 10 ⁻⁵ Pa and a temperature of 800 to 1100 ° C. As a result, the high temperature oxidation resistant film can be uniformly formed on the surface of the base material.

When the degree of vacuum exceeds 1.3 Pa, there is a problem that the denseness of the Al ₂ O ₃ layer located in the third layer in the high temperature oxidation resistant coating is lowered, and 1.3 × 10
If it is less than ^-5 Pa, there is a problem that Al in the TiAl base material is evaporated. Further, if the temperature is lower than 800 ° C, it takes a long time to form a high temperature oxidation resistant film, resulting in poor productivity, whereas if it exceeds 1100 ° C, Al in the TiAl base material is evaporated. There is a problem of doing.

Next, as the TiAl-based alloy parts manufactured by the above-described manufacturing method according to the invention of claim 8, there are the following. That is, a TiAl-based alloy component comprising a base material made of a TiAl-based intermetallic compound and a high-temperature oxidation-resistant coating formed on the surface thereof, wherein the high-temperature oxidation-resistant coating is WO ₃ · TiO ₂ · Al ₂ O. ₃ , Nb ₂ O ₅ · Ti
O ₂ · Al ₂ O ₃ or Ta ₂ O ₅ · TiO ₂ · Al ₂ O
_A first layer which is located on the outermost surface of any one of ₃ and a second layer of TiO ₂ · Al ₂ O ₃ which is located below the first layer.
Layer and Al ₂ O ₃ located between the second layer and the base material
And a metal W corresponding to the first layer are dispersed in each of the layers forming the high temperature oxidation resistant film. There is a TiAl-based alloy part characterized by the above.

What is most noticeable in the TiAl-based alloy component of the present invention is that the above-mentioned specific 3
It is to have a high temperature oxidation resistant film composed of layers.

Next, the operation of the TiAl alloy component of the present invention will be described. The TiAl-based alloy component of the present invention has the high temperature oxidation resistant film. The first layer located on the outermost surface of the high temperature oxidation resistant film is WO ₃ .Ti.
O ₂ · Al ₂ O ₃ , Nb ₂ O ₅ · TiO ₂ · Al ₂ O ₃
Or Ta ₂ O ₅ · TiO ₂ · Al ₂ O ₃ and corresponding metal W, metal Nb or metal Ta is dispersed. Therefore, the first layer is
O diffusion from the outer surface to the base metal, and T from the base metal to the surface
Suppress the diffusion of i.

Further, in the second layer and the third layer, any one of metal W, metal Nb, and metal Ta is dispersed in the oxide layer. Therefore, the second layer and the third layer are densified and further suppress the diffusion of O and Ti as described above. Therefore, the oxidation of the TiAl-based intermetallic compound can be suppressed, and the high temperature oxidation resistance of the TiAl-based alloy component can be significantly improved.

Next, according to the invention of claim 9, the high temperature oxidation resistant film has a thickness of 5.0 μm or less, and the first layer has a thickness of 0.001 to 0.2 μm. The thickness of the third layer is preferably 0.1 to 5.0 μm. When the thickness of the high temperature oxidation resistant film exceeds 5.0 μm,
There is a problem that the adhesion between the high temperature oxidation resistant film and the base material is reduced.

The thickness of the first layer is 0.001 μm.
If less than 0.2 μm, there is a problem that the effect of suppressing the diffusion of Ti from the base material to the surface decreases, while 0.2 μm
If it exceeds, there is a problem that the adhesiveness of the first layer decreases. In addition, when the thickness of the third layer is less than 0.1 μm, there is a problem that the effect of suppressing the diffusion of O and Ti is reduced, while when it exceeds 5.0 μm, high temperature oxidation resistance is present. There is a problem that the adhesion of the film is reduced.

[0031]

BEST MODE FOR CARRYING OUT THE INVENTION

Embodiment 1 A TiAl-based alloy component and a method for manufacturing the same according to an embodiment of the present invention will be described with reference to FIG. Ti in this example
The Al-based alloy component is a turbocharger rotor for an automobile engine. The TiAl-based alloy component 10 is shown in FIG.
As shown in Fig. 1, a base material 1 made of TiAl-based intermetallic compound
1 and a high temperature oxidation resistant film 12 formed on the surface thereof.

As shown in FIG. 1, the high-temperature oxidation-resistant film 12 is formed on the outermost surface of WO ₃ TiO ₂ Al ₂ O _3.
Al ₂ O ₃ which is located between the first layer 121 made more, a second layer 122 made of TiO ₂ · Al ₂ O _3, located below the first layer 121, second layer 122 and the base material 11 And a third layer 123 of. Further, in each of the layers 121, 122, 123 constituting the high temperature oxidation resistant film 12,
Each metal W is dispersed.

Further, as shown in FIG. 1, the thickness H of the high temperature oxidation resistant film 12 is 5.0 μm or less. Also, the first layer 1
The thickness H1 of 21 is 0.001 to 0.2 μm, and the thickness H3 of the third layer is 0.1 to 5.0 μm.

Next, in manufacturing the above TiAl-based alloy component 10, a WO ₃ sol solution prepared by using a tungsten compound and a solvent as starting materials as described below is used as Ti.
The surface of a base material made of an Al-based intermetallic compound was coated, and then vacuum heating was performed in a vacuum atmosphere.
In this example, heating for crystallizing the coated film was performed after the coating and before the vacuum heating.

The manufacturing method will be described in detail below. First, 4 g of hexaethoxytungsten W (OC ₂ H ₅ ) ₆ as a tungsten compound, 45.0 g of 1-butanol as a solvent, and 1.0 g of acetylacetone as a chelating agent are mixed and stirred for 10 minutes. Then, this solution was refluxed at a temperature of 117 ° C. for 2 hours and then cooled, and WO ₃
Use a sol solution.

Next, TiA previously washed with acetone
The WO ₃ sol solution is coated on the base material of the 1-based alloy part by dip coating. The dip coating pulling rate is 60 mm / min. After coating, heating is performed at a temperature of 500 ° C. for 30 minutes to obtain a WO ₃ film on the surface of the base material.

Next, vacuum heating is performed at a vacuum degree of 6.7 × 10 ^-2 Pa and a temperature of 1000 ° C. for 24 hours. As a result, the TiAl-based alloy component 10 is obtained.

Next, the function and effect of this example will be described. In the manufacturing method of this example, the above-mentioned WO
₃ The surface of the base material 11 is coated with the sol solution. Therefore, even if the base material 11 has a complicated shape like the turbocharger rotor of this example, a uniform WO ₃ film can be formed on the entire surface of the base material 11.

After forming the WO ₃ film on the surface of the base material 11, the vacuum heating is performed. Therefore, the above WO
₃ Diffusion of W in the film and Ti in the base material 11 occurs. On the other hand, the surface of the base material 11 is oxidized by O (oxygen) in the WO ₃ film and a trace amount of O remaining in the vacuum atmosphere. As a result, as shown in FIG.
A high temperature oxidation resistant film 12 composed of two layers is formed.

The high temperature oxidation resistant film 12 is, as described above,
A first layer 121 made of WO ₃ · TiO ₂ · Al ₂ O ₃ located on the outermost surface, and TiO located below the first layer 121.
_Second layer 122 made of ₂ · Al ₂ O ₃ and second layer 122
And a third layer 123 made of Al ₂ O ₃ located between the base material 11 and the base material 11, and the metal W is dispersed in each layer.

Next, the TiA obtained by the above manufacturing method
The l-based alloy component 10 exhibits excellent high temperature oxidation resistance as described below. That is, the TiAl-based alloy component 10 of this example has the high temperature oxidation resistant film 12. And high temperature oxidation resistant film 1
The first layer 121 located on the outermost surface of No. 2 is WO ₃ · TiO
_It is composed of ₂ · Al ₂ O ₃ and has metal W dispersed therein. Therefore, the first layer 121 suppresses the diffusion of O from the outer surface to the base material 11 and the diffusion of Ti from the base material 11 to the surface.

Further, the second layer 122 and the third layer 123
The metal W is dispersed in the oxide layer. Therefore, the second layer 122 and the third layer 123 are densified and further suppress the diffusion of O and Ti as described above. Therefore, the oxidation of the TiAl-based intermetallic compound can be suppressed, and the high temperature oxidation resistance of the TiAl-based alloy component 10 can be significantly improved.

Embodiment 2 In this embodiment, as shown in FIG. 2, a high temperature continuous oxidation test of the TiAl-based alloy part 10 obtained in Embodiment 1 was carried out. In the test, the temperature was heated to 900 ° C. in the atmosphere, and the increase in oxidation (g / m ² ) with respect to the heating and holding time was measured.

For comparison, the following three kinds of comparative products were prepared and the above high temperature continuous oxidation test was carried out. As the comparative product 1, a component which was a TiAl-based intermetallic compound and was not subjected to any surface treatment was used.

As the comparative product 2, TiA of the first embodiment is used.
A WO ₃ film was formed on the surface of the base material by the sol-gel method by the same procedure as that of the 1-based alloy component 10, but the component which was not subjected to the vacuum heat treatment was used. As Comparative product 3, Ti
The surface of the Al-based alloy component was not subjected to any treatment for forming a WO ₃ film as in the first embodiment, and only the vacuum heat treatment was performed under the same conditions as in the first embodiment.

The test results are shown in FIG. Figure 2 shows 9 on the horizontal axis.
The heating and holding time at 00 ° C. was taken, and the ordinate shows the amount of oxidation increased compared to before heating. A solid line E indicates the TiAl-based alloy component 10 manufactured in the first embodiment, a broken line C1 is the comparative product 1, a broken line C2 is the comparative product 2, and a broken line 3 is the comparative product 3.
Is shown.

As is known from FIG. 2, the conventional TiAl-based alloy component of Comparative Product 1 not subjected to the surface treatment showed a rapid increase in the amount of oxidation until about 50 hours, and thereafter the oxidation proceeded at a high rate. Further, in Comparative Products 2 and 3, the rate of increase in the amount of increased oxidation was smaller than that of Comparative Product 1, but the oxidation proceeded at a high rate. On the other hand, TiAl of this example
It was found that the system alloy part 10 slightly oxidized until about 50 hours, but thereafter the oxidation did not substantially progress, and showed very good high temperature oxidation resistance.

Embodiment 3 In this embodiment, as shown in FIG. 3, a high temperature oxidation resistant coating 22 different from that of Embodiment 1 is formed on the surface of a turbocharger rotor made of a base material 11 of TiAl intermetallic compound. did.

That is, the high temperature oxidation resistant film 22 in this example.
Is the Nb ₂ O ₅ · located on the outermost surface as shown in FIG.
The first layer 221 made of TiO ₂ .Al ₂ O ₃ and the second layer 22 made of Ti ₂ O ₂ .Al ₂ O ₃ located below the first layer 221.
2 and A formed between the second layer 222 and the matrix 11
and a third layer 223 of l ₂ O ₃ . Then, the metal Nb is dispersed in each of the first to third layers 221, 222, and 223.

In producing this TiAl alloy part, a niobium oxide sol solution prepared by using a niobium compound is used instead of the tungsten compound in the first embodiment. That is, first, 10.8 g of pentaethoxyniobium Nb (OC ₂ H ₂ ) ₅ as a niobium compound and 3.6 g of diethanolamine as a chelating agent were prepared.
After mixing these, stir for 1 hour. As a result, a niobium oxide sol solution is obtained.

Next, TiA previously washed with acetone
The base material of the l-based alloy component is coated with the niobium oxide sol solution by the dip method. The pulling rate of the base material after dipping was 3 mm / sec. Next, the coated base material is heated at a temperature of 500 ° C. for 30 minutes to form a niobium oxide film on the surface of the base material.

Next, the base material having the niobium oxide film is vacuum heated at a vacuum degree of 1.3 × 10 ^-4 Pa and a temperature of 1000 ° C. for 24 hours. Regarding other conditions, etc., Embodiment 1
Is the same as As a result, the TiAl-based alloy component 20 having the high temperature oxidation resistant coating 22 is obtained.

TiAl-based alloy part 2 obtained by this example
The high temperature oxidation resistant coating 22 is formed very uniformly on the surface of No. 0. Therefore, similar to the high temperature oxidation resistant coating 12 in the first embodiment, the high temperature oxidation resistance of the TiAl-based alloy component can be greatly improved. In addition, the same effects as those of the first embodiment can be obtained.

Fourth Embodiment In this example, as shown in FIG. 4, a high temperature continuous oxidation test was performed on the TiAl-based alloy component 20 obtained in the third embodiment. Regarding the test conditions, etc., Embodiment 2
Same as.

Also in this example, the following three types of comparative products were prepared for comparison, and these were similarly tested. The comparative product 4 is the same as the comparative product 1 in the second embodiment, and is a component which is a TiAl-based intermetallic compound and is not subjected to any surface treatment.

Comparative product 5 is a component in which a niobium oxide film was formed on the surface of the base material similarly to the third embodiment, but the vacuum heat treatment was not performed. Comparative product 6 is a component which was subjected to only vacuum heat treatment under the same conditions as in Embodiment 3 without any film forming treatment on the surface of the base material.

The test results are shown in FIG. The vertical axis and the horizontal axis in FIG. 4 are the same as those in FIG.
Shown by C6. As can be seen from FIG. 4, the product of the present invention having the above-mentioned high temperature oxidation resistant coating 22 exhibits very high temperature oxidation resistance.

In each of the above examples, the tungsten oxide sol solution or the niobium oxide sol solution was used as the oxide sol solution for forming the high temperature oxidation resistant film. Even when it is replaced, the same effect as above can be obtained.

[0059]

As described above, according to the present invention, a TiAl-based alloy component having a uniform high-temperature oxidation resistant film on the entire surface and excellent in oxidation resistance even if it has a complicated shape or a large shape. And a manufacturing method thereof.

[Brief description of the drawings]

FIG. 1 is an explanatory view showing a cross-sectional view of a TiAl-based alloy component according to a first embodiment.

FIG. 2 is an explanatory diagram showing a relationship between a heating holding time and an oxidation amount increase in Embodiment 2.

FIG. 3 is an explanatory view showing a cross section of a TiAl-based alloy component of Embodiment 3;

FIG. 4 is an explanatory view showing a relationship between a heating holding time and an oxidation amount increase in Embodiment 4.

[Explanation of symbols]

10, 20. . . TiAl-based alloy parts, 11. . . Base material, 12, 22. . . High temperature oxidation resistant film, 121. . . 1. First layer (layer in which metal W is dispersed in WO ₃ · TiO ₂ · Al ₂ O ₃ layer), 122. . . The second layer (metal W in the TiO ₂ · Al ₂ O ₃ layer)
Dispersed layer), 123. . . Third layer (layer in which metal W is dispersed in Al ₂ O ₃ layer), 221. . . The first layer _{(Nb 2 0 5 · TiO 2} · Al 2 O
_A layer in which metal Nb is dispersed in _three layers), 222. . . The second layer (the TiO ₂ · Al ₂ O ₃ layer has metal N
b, dispersed layer), 223. . . Third layer (layer in which metal Nb is dispersed in Al ₂ O ₃ layer),

Claims (9)

[Claims] 1. An oxide sol solution comprising an oxide of a metal element prepared by using a metal compound containing a metal element of any one of tungsten, niobium and tantalum and a solvent as a starting material, and preparing the oxide sol. A TiAl characterized in that a high temperature oxidation resistant film is formed on the surface of the base material by coating the surface of the base material made of a TiAl-based intermetallic compound with the solution and then performing vacuum heating in a vacuum atmosphere. For manufacturing alloy-based alloy parts. 2. The method for manufacturing a TiAl-based alloy component according to claim 1, wherein heating for crystallizing the coated film is performed after the coating and before the vacuum heating. 3. The metal compound according to claim 1, wherein the metal compound containing tungsten is a tungsten metal alkoxide, a tungsten metal acetylacetonate,
TiA, which is one or more compounds selected from tungsten-based chlorides and tungstic acid compounds
Method for manufacturing l-based alloy component. 4. The niobium-containing metal compound according to claim 1, wherein the niobium-containing metal compound is one or more compounds selected from niobium metal alkoxides, niobium metal acetylacetonates, and niobium chlorides. Characteristic T
Method for manufacturing iAl-based alloy component. 5. The tantalum-containing metal compound according to claim 1 or 2, wherein the tantalum-containing metal compound is one or more compounds selected from tantalum-based metal alkoxides, tantalum-based metal acetylacetonates, and tantalum-based chlorides. A method for manufacturing a characteristic TiAl-based alloy component. 6. The method according to any one of claims 1 to 5,
A chelating agent that forms a complex with the above metal compound is added to the above oxide sol solution.
Method for manufacturing l-based alloy component. 7. The method according to any one of claims 1 to 6,
The above-mentioned vacuum heating is performed at a vacuum degree of 1.3 Pa to 1.3 × 10 ⁻⁵ P
a, T which is performed at a temperature of 800 to 1100 ° C
Method for manufacturing iAl-based alloy component. 8. A T containing a base material made of a TiAl-based intermetallic compound and a high temperature oxidation resistant film formed on the surface of the base material.
In the case of iAl alloy parts, the high temperature oxidation resistant film is W
O ₃ · TiO ₂ · Al ₂ O ₃ , Nb ₂ O ₅ · TiO ₂ ·
A first layer located either become more outermost surface of the Al ₂ O ₃ or _{Ta 2 O 5 · TiO 2 ·} Al 2 O 3, made of TiO ₂ · Al ₂ O _3, located below the first layer The second layer,
It is composed of a second layer and a third layer of Al ₂ O ₃ located between the base material, and each of the layers constituting the high temperature oxidation-resistant coating is the same as the first layer. A TiAl-based alloy component in which any of the corresponding metal W, metal Nb, or metal Ta is dispersed. 9. The high temperature oxidation resistant film according to claim 8, wherein the thickness of the high temperature oxidation resistant film is 5.0 μm or less, and the thickness of the first layer is 0.001 to 0.2 μm. Sa is 0.
A TiAl-based alloy component having a thickness of 1 to 5.0 μm.