JPH09124345A - Production of both glass substrate for magnetic disk and magnetic disk - Google Patents

Production of both glass substrate for magnetic disk and magnetic disk

Info

Publication number
JPH09124345A
JPH09124345A JP30682395A JP30682395A JPH09124345A JP H09124345 A JPH09124345 A JP H09124345A JP 30682395 A JP30682395 A JP 30682395A JP 30682395 A JP30682395 A JP 30682395A JP H09124345 A JPH09124345 A JP H09124345A
Authority
JP
Japan
Prior art keywords
glass substrate
magnetic disk
substrate
chemical strengthening
molten salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP30682395A
Other languages
Japanese (ja)
Other versions
JP2998949B2 (en
Inventor
Takeshi Kojima
毅 小嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP30682395A priority Critical patent/JP2998949B2/en
Priority to US08/579,319 priority patent/US5654057A/en
Priority to SG1995002358A priority patent/SG49584A1/en
Priority to US08/736,476 priority patent/US5681609A/en
Priority to US08/736,475 priority patent/US5725625A/en
Publication of JPH09124345A publication Critical patent/JPH09124345A/en
Priority to US08/905,640 priority patent/US5916656A/en
Application granted granted Critical
Publication of JP2998949B2 publication Critical patent/JP2998949B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Surface Treatment Of Glass (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a high flatness by dipping a glass substrate in a chemical strengthening solution, chemically strengthening the substrate, then pulling up the resultant glass substrate, cooling the pulled up substrate to a higher temperature than a crystallizing temperature of a molten salt, subsequently quenching the substrate at a specific rate and then washing the substrate surface. SOLUTION: A disklike glass substrate such as an aluminosilicate is preheated at about 200-350 deg.C and then dipped in a chemical strengthening solution prepared by heating a mixture, etc., of KNO3 /NaNO3 at 300-650 deg.C for about 1-20hr and the ion exchange of the substrate surface is then carried out to chemically strengthen the glass substrate. The strengthened glass substrate is then pulled up from the chemical strengthening solution and annealed to 300-350 deg.C which is higher than the crystallizing starting temperature of a molten salt at about 2-100 deg.C/min rate. The annealed substrate is further brought into contact with a refrigerant at 100-0 deg.C for 10-60min and quenched at 1600-400 deg.C/min rate for preventing the crystallization of the deposited molten salt. The quenched substrate is subsequently dipped and washed in a strong acid such as sulfuric acid warmed at about 40 deg.C, then washed with water to afford the chemically strengthened glass substrate. A ground layer, a magnetic layer, a protecting layer and a lubricating layer are successively laminated to the prepared glass substrate to produce a magnetic disk.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ハードディスクなどに
用いられる磁気ディスク用ガラス基板の製造方法及び磁
気ディスクの製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a glass substrate for a magnetic disk used for a hard disk and a method for manufacturing a magnetic disk.

【0002】[0002]

【従来の技術】磁気ディスク用ガラス基板としては、ア
ルミニウム基板が多く用いられていたが、磁気ディスク
の小型化、薄板化や磁気ヘッドの低浮上化の要請に伴
い、アルミニウム基板に比べ小型化、薄板化が容易で平
坦度が高く磁気ヘッドの低浮上化が容易であるため、ガ
ラス基板を用いる割合も増えてきている。
2. Description of the Related Art An aluminum substrate has been widely used as a glass substrate for a magnetic disk, but with the demand for downsizing the magnetic disk, thinning the plate, and lowering the flying height of the magnetic head, the size of the aluminum substrate is smaller than that of the aluminum substrate. Since it is easy to make a thin plate, the flatness is high, and the flying height of the magnetic head is easily made low, the ratio of using a glass substrate is increasing.

【0003】このように、ガラス基板を磁気ディスク用
基板として用いる場合には、耐衝撃性や対振動性を向上
させ衝撃や振動によって基板が破損するのを防止する目
的で、ガラス基板の表面に低温イオン交換法による化学
強化処理を施すのが一般的である。
As described above, when the glass substrate is used as a magnetic disk substrate, the surface of the glass substrate is coated on the surface of the glass substrate for the purpose of improving impact resistance and vibration resistance and preventing the substrate from being damaged by impact or vibration. It is common to carry out a chemical strengthening treatment by a low temperature ion exchange method.

【0004】この種の化学強化ガラス基板を用いた磁気
ディスクの製造方法としては、例えば、特開平5−32
431号公報に記載の方法が広く知られている。この公
報に記載された方法は、ガラス基板を400℃に加熱し
た硝酸カリウムと硝酸ナトリウムの混合液に浸漬して化
学強化し、この化学強化ガラス基板上に下地層と磁性層
を形成したものである。
As a method for manufacturing a magnetic disk using this type of chemically strengthened glass substrate, for example, Japanese Patent Laid-Open No. 5-32
The method described in Japanese Patent No. 431 is widely known. The method described in this publication is one in which a glass substrate is immersed in a mixed solution of potassium nitrate and sodium nitrate heated to 400 ° C. to be chemically strengthened, and an underlayer and a magnetic layer are formed on this chemically strengthened glass substrate. .

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上述し
た従来の方法のように、化学強化溶液からガラス基板を
引き上げ、洗浄後、このガラス基板上に下地層と磁性層
を形成して製造した磁気ディスクは、たびたび、磁気デ
ィスク表面に異常突起物が発生するという問題がある。
このように、磁気ディスク表面に異常突起物が発生する
と、磁気ヘッドとのヘッドクラッシュの原因となり、製
品として使用できなくなる。
However, as in the above-mentioned conventional method, a magnetic disk manufactured by pulling up a glass substrate from a chemical strengthening solution, washing it, and then forming an underlayer and a magnetic layer on the glass substrate. However, there is a problem that abnormal protrusions often occur on the surface of the magnetic disk.
In this way, if an abnormal protrusion is generated on the surface of the magnetic disk, it causes a head crash with the magnetic head and cannot be used as a product.

【0006】本発明は上記問題点にかんがみてなされた
ものであり、異常突起物のない磁気ディスク用ガラス基
板の製造方法及び磁気ディスクの製造方法の提供を目的
とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a method of manufacturing a glass substrate for a magnetic disk without abnormal projections and a method of manufacturing a magnetic disk.

【0007】本発明者は、磁気ディスク表面に異常突起
物が発生する原因を究明したところ、化学強化溶液から
引き上げられたガラス基板上に、析出溶融塩(例えば、
KCl等)が強固に付着し、洗浄によってもこの析出溶
融塩を除去できず、この析出溶融塩が異物となり、磁気
ディスク表面の異常突起物の原因となっていることを突
き止めた。そして、この知見にもとづきさらに研究を進
めた結果、析出溶融塩の基板への付着状態が、化学強化
後の冷却の過程によって異なることを見出した。詳しく
は、自然放熱のようにゆっくり冷却したときは析出溶融
塩が基板に強固に付着するが、急冷した析出溶融塩は脆
弱であり洗浄によって容易に除去できることを見出し本
発明を完成するに至った。
The present inventor has investigated the cause of the generation of abnormal protrusions on the surface of the magnetic disk. As a result, a molten salt (for example, a precipitated molten salt) is deposited on the glass substrate pulled from the chemically strengthening solution.
It was found out that the deposited molten salt could not be removed even by washing, and the deposited molten salt became a foreign substance, causing abnormal protrusions on the magnetic disk surface. As a result of further research based on this finding, it was found that the deposition state of the molten salt deposited on the substrate differs depending on the cooling process after the chemical strengthening. Specifically, when the molten salt is slowly adhered to the substrate when slowly cooled like natural heat radiation, the rapidly molten precipitated molten salt is fragile and can be easily removed by washing, and the present invention has been completed. .

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
に本発明の磁気ディスク用ガラス基板の製造方法は、加
熱した化学強化溶液にガラス基板を浸漬し、ガラス基板
表層のイオンを化学強化溶液中のイオンでイオン交換し
てガラス基板を化学強化する工程と、化学強化溶液から
ガラス基板を引き上げ所定温度(溶融塩の結晶化が始ま
る温度より高い温度)まで徐冷する工程と、ガラス基板
表面に析出する溶融塩の結晶化を阻止する速度でガラス
基板を急冷する工程と、ガラス基板表面を洗浄する工程
とを含む構成としてある。
In order to achieve the above object, a method of manufacturing a glass substrate for a magnetic disk according to the present invention comprises immersing a glass substrate in a heated chemical strengthening solution to remove ions in the surface layer of the glass substrate from the chemical strengthening solution. The step of chemically strengthening the glass substrate by ion exchange with the ions inside, the step of slowly pulling up the glass substrate from the chemical strengthening solution to a predetermined temperature (a temperature higher than the temperature at which the crystallization of the molten salt begins), and the glass substrate surface It is configured to include a step of rapidly cooling the glass substrate at a rate that prevents crystallization of the molten salt deposited on the glass substrate and a step of cleaning the surface of the glass substrate.

【0009】また、本発明の磁気ディスク用ガラス基板
の製造方法は、上記磁気ディスク用ガラス基板の製造方
法において、ガラス基板を急冷する速度が、1600℃
/分〜400℃/分である構成、化学強化溶液を350
℃〜650℃に加熱して化学強化し、ガラス基板を引き
上げ300〜350℃まで徐冷し、100℃〜0℃の冷
媒に接触させてガラス基板を急冷する構成、ガラス基板
を冷媒に接触させる時間が、10分〜60分である構
成、あるいは、化学強化工程において、ガラス基板を端
面で保持して化学強化を行う構成としてある。
The method for manufacturing a glass substrate for a magnetic disk according to the present invention is the same as the method for manufacturing a glass substrate for a magnetic disk, wherein the glass substrate is rapidly cooled at 1600 ° C.
/ Min to 400 ° C / min, chemical strengthening solution 350
C. to 650.degree. C. to chemically strengthen it, pull up the glass substrate, gradually cool it to 300 to 350.degree. C., contact it with a refrigerant of 100.degree. C. to 0.degree. C. to quench it, and bring the glass substrate into contact with the refrigerant. The time is 10 minutes to 60 minutes, or in the chemical strengthening step, the glass substrate is held by the end face to perform the chemical strengthening.

【0010】さらに、本発明の磁気ディスクの製造方法
は、上記磁気ディスク用ガラス基板の製造方法を用いて
得られた磁気ディスク用ガラス基板上に、少なくとも磁
性層を形成した構成としてある。
Furthermore, the method for producing a magnetic disk of the present invention has a structure in which at least a magnetic layer is formed on a glass substrate for a magnetic disk obtained by using the above method for producing a glass substrate for a magnetic disk.

【0011】[0011]

【作用】本発明では、化学強化溶液から引き上げられた
ガラス基板上を急冷することにより、ガラス基板に付着
する析出溶融塩を脆弱にすることができ、洗浄によって
析出溶融塩を容易に除去できる。したがって、異常突起
物のない磁気ディスク用ガラス基板を製造できる。
In the present invention, the molten molten salt adhering to the glass substrate can be weakened by rapidly cooling the glass substrate pulled up from the chemical strengthening solution, and the molten molten salt can be easily removed by washing. Therefore, it is possible to manufacture a glass substrate for a magnetic disk without abnormal protrusions.

【0012】また、ガラス基板を、その端面で保持する
保持手段に収納して化学強化溶液に浸漬したとき、ガラ
ス基板端面と保持部材間に発生する析出溶融塩も脆弱に
なるので、ガラス基板を保持部材から取り出すときにガ
ラス基板端面の破損を防止できる。
Further, when the glass substrate is housed in a holding means for holding it at its end face and immersed in the chemical strengthening solution, the precipitated molten salt generated between the end face of the glass substrate and the holding member also becomes fragile. It is possible to prevent damage to the end surface of the glass substrate when taking it out from the holding member.

【0013】さらに、化学強化したガラス基板は、表面
に圧縮応力が発生し内部に引っ張り応力が発生している
ので、表面に微細なキズがあると、急冷によって破損す
るので、不良品を容易に識別できる。
Further, the chemically strengthened glass substrate has compressive stress on the surface and tensile stress on the inside. Therefore, if there are fine scratches on the surface, the glass substrate will be damaged by rapid cooling. Can be identified.

【0014】また、本発明の磁気ディスクの製造方法に
よれば、表面に異常突起物や微細なキズのない磁気ディ
スク用ガラス基板を使用しているので、異常突起物や微
細なキズに起因する欠陥の少ない高品質の磁気ディスク
を高歩留まりで製造できる。
Further, according to the method for manufacturing a magnetic disk of the present invention, since the glass substrate for a magnetic disk having no abnormal protrusions or fine scratches on the surface is used, it is caused by the abnormal protrusions or fine scratches. High-quality magnetic disks with few defects can be manufactured with high yield.

【0015】以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

【0016】本発明の磁気ディスク用ガラス基板の製造
方法においては、まず、加熱した化学強化溶液にガラス
基板を浸漬し、ガラス基板表層のイオンを化学強化溶液
中のイオンでイオン交換してガラス基板を化学強化す
る。
In the method for producing a glass substrate for a magnetic disk of the present invention, first, the glass substrate is immersed in a heated chemical strengthening solution, and the ions in the surface layer of the glass substrate are ion-exchanged with the ions in the chemical strengthening solution to make the glass substrate. To strengthen chemically.

【0017】ここで、イオン交換法としては、低温型イ
オン交換法、高温型イオン交換法、表面結晶化法、ガラ
ス表面の脱アルカリ法などが知られているが、ガラス転
移点の観点から、低温型イオン交換法を用いることが好
ましい。
Here, as the ion exchange method, a low temperature type ion exchange method, a high temperature type ion exchange method, a surface crystallization method, a dealkalization method of the glass surface and the like are known, but from the viewpoint of the glass transition point, It is preferable to use a low temperature type ion exchange method.

【0018】低温型イオン交換法は、ガラスの転移温度
Tg以下の温度域で、ガラス中のアルカリイオンを、そ
れよりもイオン半径の大きいアルカリイオンと置換し、
イオン交換部の容積増加によってガラス表層に強い圧縮
応力を発生させてガラス表面を強化する方法である。
In the low temperature type ion exchange method, alkali ions in the glass are replaced with alkali ions having a larger ionic radius than that in a temperature range below the glass transition temperature Tg.
This is a method in which a strong compressive stress is generated in the glass surface layer by increasing the volume of the ion exchange section, thereby strengthening the glass surface.

【0019】化学強化溶液としては、硝酸カリウム(K
NO3)、硝酸ナトリウム(NaNO3)、炭酸カリウム
(K2CO3)などの溶融塩や、これらの塩を混合したも
の(KNO3+NaNO3、KNO3+K2CO3など)の
溶融塩、あるいは、これらの塩にCu、Ag、Rb、C
sなどのイオンの塩を混合したものの溶融塩等が挙げら
れる。なお、化学強化溶液は、溶融塩でなく上記塩の溶
液であってもよい。
As the chemical strengthening solution, potassium nitrate (K
Molten salts such as NO 3 ), sodium nitrate (NaNO 3 ) and potassium carbonate (K 2 CO 3 ), and molten salts of a mixture of these salts (KNO 3 + NaNO 3 , KNO 3 + K 2 CO 3 ); Alternatively, Cu, Ag, Rb, C
Examples thereof include a molten salt of a mixture of salts of ions such as s. Note that the chemical strengthening solution may be a solution of the above salt instead of the molten salt.

【0020】加熱温度は、ガラス転移点の観点から、3
50℃〜650℃、特に、350℃〜480℃、さらに
は、350℃〜450℃であることが好ましい。
The heating temperature is set at 3 from the viewpoint of the glass transition point.
It is preferably 50 ° C to 650 ° C, particularly 350 ° C to 480 ° C, and further preferably 350 ° C to 450 ° C.

【0021】浸漬時間は、抗折強度と応力歪層の観点か
ら、1時間〜20時間程度とすることが好ましい。
The immersion time is preferably about 1 to 20 hours from the viewpoint of bending strength and stress strain layer.

【0022】ガラス基板表層に形成する圧縮応力層の厚
さは、耐衝撃性や耐振動性を高めるという観点から、6
0〜300μm程度とすることが好ましい。
The thickness of the compressive stress layer formed on the surface layer of the glass substrate is set at 6 from the viewpoint of improving the shock resistance and vibration resistance.
The thickness is preferably about 0 to 300 μm.

【0023】ガラス基板を溶融塩に浸漬する前に、割れ
防止の目的ため、ガラス基板を200〜350℃に予熱
しておくことが好ましい。
Before immersing the glass substrate in the molten salt, it is preferable to preheat the glass substrate to 200 to 350 ° C. for the purpose of preventing cracking.

【0024】化学強化工程においては、ガラス基板を端
面で保持して化学強化を行うことが好ましい。これは、
ガラス基板の表面全体を化学強化するためである。
In the chemical strengthening step, it is preferable to hold the glass substrate at the end face to carry out the chemical strengthening. this is,
This is for chemically strengthening the entire surface of the glass substrate.

【0025】本発明では、上記化学強化の後、化学強化
溶液からガラス基板を引き上げ所定温度(溶融塩の結晶
化が始まる温度より高い温度)まで徐冷する。
In the present invention, after the chemical strengthening, the glass substrate is pulled out from the chemical strengthening solution and gradually cooled to a predetermined temperature (a temperature higher than the temperature at which the crystallization of the molten salt starts).

【0026】徐冷における下限の温度は、用いる化学強
化溶液の種類(析出する溶融塩の種類)に応じて異なる
ため一概には言えないが、溶融塩の結晶化が始まる温度
より高い温度まで徐冷を行うことが好ましい。
The lower limit temperature in gradual cooling cannot be generally stated because it depends on the type of chemical strengthening solution used (type of molten salt to be precipitated), but it is controlled to a temperature higher than the temperature at which crystallization of molten salt begins. It is preferable to perform cooling.

【0027】ガラス基板を徐冷する速度は、2℃/分〜
100℃/分、特に、5℃/分〜60℃/分、さらに
は、10℃/分〜50℃/分であることが好ましい。
The glass substrate is slowly cooled at a rate of 2 ° C./min.
100 ° C./min, particularly 5 ° C./min to 60 ° C./min, and more preferably 10 ° C./min to 50 ° C./min.

【0028】本発明では、上記徐冷の後、ガラス基板表
面に析出する溶融塩の結晶化を阻止する速度でガラス基
板を急冷する。
In the present invention, after the slow cooling, the glass substrate is rapidly cooled at a rate that prevents the crystallization of the molten salt deposited on the surface of the glass substrate.

【0029】ガラス基板を急冷する速度は、1600℃
/分〜200℃/分、特に、1200℃/分〜300℃
/分、さらには、800℃/分〜400℃/分であるこ
とが好ましい。
The rate of quenching the glass substrate is 1600 ° C.
/ Min-200 ° C / min, especially 1200 ° C / min-300 ° C
/ Min, more preferably 800 ° C / min to 400 ° C / min.

【0030】ガラス基板の急冷は、ヒートショックの観
点から、100℃〜0℃の冷媒に接触させて行うことが
好ましい。
From the viewpoint of heat shock, it is preferable to quench the glass substrate by bringing it into contact with a refrigerant at 100 ° C. to 0 ° C.

【0031】ガラス基板を冷媒に接触させる時間は、洗
浄性の観点から、10分〜60分程度であることが好ま
しい。
From the viewpoint of cleanability, the time for contacting the glass substrate with the cooling medium is preferably about 10 to 60 minutes.

【0032】冷媒としては、水、温水、溶液、液体窒素
などの液体冷媒、窒素ガス、水蒸気、冷却空気などの気
体冷媒のほか、エアの吹き付けなどが挙げられる。
Examples of the refrigerant include water, hot water, a solution, a liquid refrigerant such as liquid nitrogen, a gas refrigerant such as nitrogen gas, water vapor, and cooling air, as well as air blowing.

【0033】本発明では、上記急冷の後、ガラス基板表
面を洗浄して、ガラス基板に付着した析出溶融塩を除去
する。
In the present invention, after the rapid cooling, the surface of the glass substrate is washed to remove the precipitated molten salt attached to the glass substrate.

【0034】洗浄方法は、析出溶融塩の除去に適した方
法であれば特に制限されない。洗浄方法としては、例え
ば、加熱した硫酸、リン酸、硝酸、フッ酸、塩酸などの
酸や、これらの酸の混酸、あるいはこれらの酸にこれら
の酸の塩を加えたもの等にガラス基板を浸漬して洗浄を
行う方法等が挙げられる。この場合、超音波を印可しつ
つ洗浄を行っても良い。また、酸洗浄の後に、市販の洗
浄剤(中性洗剤、界面活性剤、アルカリ性洗浄剤など)
による洗浄、スクラブ洗浄、純水洗浄、溶剤洗浄、溶剤
乾燥等の公知の洗浄処理を行っても良い。また、各洗浄
では、加熱や超音波印可を行ってもよい。
The washing method is not particularly limited as long as it is a method suitable for removing the precipitated molten salt. As the cleaning method, for example, a glass substrate is added to an acid such as heated sulfuric acid, phosphoric acid, nitric acid, hydrofluoric acid, hydrochloric acid, a mixed acid of these acids, or a mixture of these acids with a salt of these acids. Examples include a method of immersing and cleaning. In this case, cleaning may be performed while applying ultrasonic waves. In addition, after acid cleaning, commercially available cleaning agents (neutral detergents, surfactants, alkaline cleaning agents, etc.)
Known cleaning treatments such as cleaning with, scrub cleaning, pure water cleaning, solvent cleaning, and solvent drying may be performed. Moreover, in each cleaning, heating or ultrasonic application may be performed.

【0035】ガラス基板としては、イオン交換可能なガ
ラス基板であれば特に制限されない。また、ガラス基板
のサイズ、厚さ等は特に制限されない。
The glass substrate is not particularly limited as long as it is an ion-exchangeable glass substrate. Further, the size, thickness, etc. of the glass substrate are not particularly limited.

【0036】ガラス基板の材質としては、例えば、アル
ミノシリケートガラス、ソーダライムガラス、ソーダア
ルミノケイ酸ガラスなどのナトリウムイオン(Na+
やリチウムイオン(Li+)などのイオン交換可能なイ
オンを含有した多成分系ガラスなどが挙げられる。な
お、アルミノシリケートガラスは、化学強化後の強度が
高く、圧縮応力層も深く、耐衝撃性や耐振動性に優れる
ため特に好ましい。
The material of the glass substrate is, for example, sodium ion (Na + ) such as aluminosilicate glass, soda lime glass, soda aluminosilicate glass.
And a multi-component glass containing ion-exchangeable ions such as lithium ion (Li + ) and the like. Aluminosilicate glass is particularly preferable because it has high strength after chemical strengthening, a deep compressive stress layer, and excellent shock resistance and vibration resistance.

【0037】アルミノシリケートガラスとしては、Si
2:62〜75重量%、Al23:5〜15重量%、
Li2O:4〜10重量%、Na2O:4〜12重量%、
ZrO2:5.5〜15重量%を主成分として含有する
とともに、Na2O/ZrO2の重量比が0.5〜2.
0、Al23/ZrO2の重量比が0.4〜2.5であ
る化学強化用ガラス等が好ましい。このようなアルミノ
シリケートガラスは、化学強化することによって、耐熱
性に優れ、高温環境下であってもNaの析出がないとと
もに平坦性を維持し、ヌープ硬度にも優れる。
As the aluminosilicate glass, Si is used.
O 2 : 62 to 75% by weight, Al 2 O 3 : 5 to 15% by weight,
Li 2 O: 4 to 10% by weight, Na 2 O: 4 to 12% by weight,
ZrO 2: 5.5 to 15 with containing by weight% as the main component, the weight ratio of Na 2 O / ZrO 2 is 0.5 to 2.
0, and a glass for chemical strengthening in which the weight ratio of Al 2 O 3 / ZrO 2 is 0.4 to 2.5 is preferable. By chemically strengthening such an aluminosilicate glass, it has excellent heat resistance, does not precipitate Na even in a high temperature environment, maintains flatness, and has excellent Knoop hardness.

【0038】上記本発明の磁気ディスク用ガラス基板の
製造方法は、光磁気ディスク用のガラス基板や、異常突
起物や微細なキズを嫌う光ディスクなどの電子光学用デ
ィスク基板の端面処理方法としても利用できる。
The method for manufacturing a glass substrate for a magnetic disk according to the present invention is also used as a method for treating an end surface of a glass substrate for a magneto-optical disk or an electro-optical disk substrate such as an optical disk which does not like abnormal protrusions or fine scratches. it can.

【0039】次に、本発明の磁気ディスクの製造方法に
ついて説明する。
Next, a method of manufacturing the magnetic disk of the present invention will be described.

【0040】本発明の磁気ディスクの製造方法では、上
述した磁気ディスク用ガラス基板の製造方法を用いて得
られた磁気ディスク用ガラス基板上に、少なくとも磁性
層を形成する。
In the method for producing a magnetic disk of the present invention, at least a magnetic layer is formed on the glass substrate for a magnetic disk obtained by using the method for producing a glass substrate for a magnetic disk described above.

【0041】本発明では、表面に異常突起物や微細なキ
ズのないガラス基板を使用しているので、磁気ディスク
としても高品質である。すなわち、従来に比べはるかに
表面状態の良いガラス基板を使用することによって、磁
気ディスクとした場合に異常突起物に起因するベッドク
ラッシュを起こすことがなく、磁性層等の膜にキズに起
因する欠陥が発生しエラーの原因になるということもな
い。
In the present invention, a glass substrate having no abnormal protrusions or fine scratches on its surface is used, so that it is of high quality as a magnetic disk. In other words, by using a glass substrate with a much better surface condition than before, bed crashes due to abnormal protrusions do not occur in the case of magnetic disks, and defects due to scratches on the magnetic layer etc. It does not cause an error.

【0042】磁気記録媒体は、通常、磁気ディスク用ガ
ラス基板上に、下地層、磁性層、保護層、潤滑層を順次
積層して製造する。
A magnetic recording medium is usually manufactured by sequentially laminating an underlayer, a magnetic layer, a protective layer and a lubricating layer on a glass substrate for a magnetic disk.

【0043】磁気記録媒体における、下地層としては、
例えば、Cr、Mo、Ta、Ti、W、Alなどの非磁
性薄膜が挙げられ、Al/Cr/CrMo、Al/Cr
/Cr等の多層下地層としもよい。
As the underlayer in the magnetic recording medium,
For example, non-magnetic thin films such as Cr, Mo, Ta, Ti, W, and Al can be mentioned. Al / Cr / CrMo, Al / Cr
A multi-layered underlayer such as / Cr may be used.

【0044】磁性層としては、例えば、Coを主成分と
するCoPtCrやCoNiCrTaなどの磁性薄膜が
挙げられ、磁性層を非磁性膜で分割してノイズの低減を
図ったCoPtCr/CrMo/CoPtCr等の多層
構成としもよい。なお、磁性層は、水平磁気記録、垂直
磁気記録のいずれの磁性層でもよい。
As the magnetic layer, for example, a magnetic thin film containing Co as a main component such as CoPtCr or CoNiCrTa can be used. CoPtCr / CrMo / CoPtCr or the like, which is obtained by dividing the magnetic layer with a nonmagnetic film to reduce noise. It may have a multilayer structure. The magnetic layer may be either a horizontal magnetic recording layer or a vertical magnetic recording layer.

【0045】保護層としては、例えば、Cr膜、Cr合
金膜、炭素膜、ジルコニア膜、シリカ膜等が挙げられ
る。これらの保護膜は、下地層、磁性層等とともにイン
ライン型スパッタ装置で連続して形成できる。また、こ
れらの保護膜は、単層としてもよく、あるいは、同一又
は異種の膜からなる多層構成としてもよい。上記保護層
上にはさらに他の保護層を形成してもよい。例えば、上
記保護層上にテトラアルコキシランをアルコール系の溶
媒で希釈して塗布し、さらに焼成して酸化ケイ素(Si
2)膜を形成してもよい。
Examples of the protective layer include a Cr film, a Cr alloy film, a carbon film, a zirconia film, and a silica film. These protective films can be continuously formed with an underlayer, a magnetic layer, and the like by an in-line type sputtering apparatus. Further, these protective films may have a single-layer structure or a multi-layer structure composed of the same or different films. Another protective layer may be further formed on the protective layer. For example, tetraalkoxylane is diluted with an alcohol-based solvent and applied on the protective layer, followed by firing to obtain silicon oxide (Si
An O 2 ) film may be formed.

【0046】潤滑層は、例えば、液体潤滑剤であるパー
フロロポリエーテル(PFPE)をフレオン系などの溶
媒で希釈し、媒体表面にディッピング法、スピンコート
法、スプレイ法によって塗布し、必要に応じ加熱処理を
行って形成する。
The lubricating layer is prepared by diluting perfluoropolyether (PFPE), which is a liquid lubricant, with a solvent such as Freon, and applying it to the surface of the medium by a dipping method, a spin coating method or a spraying method, and if necessary. It is formed by heat treatment.

【0047】[0047]

【実施例】以下、実施例にもとづき本発明をさらに具体
的に説明する。
EXAMPLES The present invention will be described below more specifically based on examples.

【0048】実施例1 Example 1

【0049】磁気ディスク用ガラス基板の製造方法は、
大別すると(1)研削、研磨工程、(2)化学強化工
程、(3)冷却工程、(4)洗浄工程に分けられる。(1)研削、研磨工程 まず、ダウンドロー法によってアルミノシリケイトガラ
スからなるシートガラスを形成する。アルミノシリケイ
トガラスとしては、SiO2:63重量%、Al23
14重量%、Li2O:6重量%、Na2O:10重量
%、ZrO2:7重量%を主成分として含有する化学強
化用ガラスを使用した。
The manufacturing method of the glass substrate for magnetic disk is as follows.
It is roughly divided into (1) grinding and polishing steps, (2) chemical strengthening step, (3) cooling step, and (4) cleaning step. (1) Grinding and polishing steps First, a sheet glass made of aluminosilicate glass is formed by a downdraw method. As the aluminosilicate glass, SiO 2 : 63% by weight, Al 2 O 3 :
A glass for chemical strengthening containing 14% by weight, Li 2 O: 6% by weight, Na 2 O: 10% by weight and ZrO 2 : 7% by weight as main components was used.

【0050】次いで、研削砥石を使ってシートガラスか
ら円盤状にガラスを切り出す。次に、砂かけによって表
面と裏面を研削する。そして円盤状にガラス基板の中央
部を穿孔し、砥石で穿孔された内周面と外周面を研磨し
て外径寸法及び内径寸法を定めるとともに、内周面と外
周面の面取りを行う。そして、研磨工程の最後として表
面及び裏面に精密研磨を施して仕上げる。このようにし
て円盤状ガラス基板を得た。
Then, the glass is cut out from the sheet glass into a disk shape by using a grinding wheel. Next, the front surface and the back surface are ground by sanding. Then, the center portion of the glass substrate is perforated in a disk shape, and the inner and outer peripheral surfaces perforated with a grindstone are polished to determine the outer and inner diameter dimensions, and the inner and outer peripheral surfaces are chamfered. Then, as the last of the polishing process, the front and back surfaces are subjected to precision polishing to finish. Thus, a disk-shaped glass substrate was obtained.

【0051】(2)化学強化工程 次に、上記研削、研磨工程を終えたガラス基板を洗浄
後、化学強化を施した。化学強化は、硝酸カリウム(6
0%)と硝酸ナトリウム(40%)を混合した化学強化
溶液を用意し、この化学強化溶液を400℃に加熱し、
300℃に予熱された洗浄済みのガラス基板を約3時間
浸漬して行った。この浸漬の際に、ガラス基板の表面全
体が化学強化されるようにするため、複数のガラス基板
が端面で保持されるようにホルダーに収納した状態で行
った。
(2) Chemical Strengthening Step Next, the glass substrate that has undergone the grinding and polishing steps is washed and then chemically strengthened. Chemical strengthening is performed using potassium nitrate (6
0%) and sodium nitrate (40%) are mixed to prepare a chemical strengthening solution, which is heated to 400 ° C.
It was performed by immersing the cleaned glass substrate preheated to 300 ° C. for about 3 hours. In this immersion, in order to chemically strengthen the entire surface of the glass substrate, the immersion was performed in a state where a plurality of glass substrates were housed in a holder so as to be held at end faces.

【0052】このように、化学強化溶液に浸漬処理する
ことによって、ガラス基板表層のリチウムイオン、ナト
リウムイオンは、化学強化溶液中のナトリウムイオン、
カリウムイオンにそれぞれ置換されガラス基板は強化さ
れる。ガラス基板の表層に形成された圧縮応力層の厚さ
は、約100〜200μmであった。
As described above, the lithium ion and the sodium ion on the surface layer of the glass substrate are converted into the sodium ion in the chemical strengthening solution by the immersion treatment in the chemical strengthening solution.
The glass substrate is strengthened by being replaced with potassium ions. The thickness of the compressive stress layer formed on the surface layer of the glass substrate was about 100 to 200 μm.

【0053】(3)冷却工程 上記化学強化を終えたガラス基板を、第一、第二徐冷室
で順次徐冷する。まず、化学強化溶液からガラス基板を
引き上げ、300℃に加熱されている第一徐冷室に移送
し、この中で約10分間保持して300℃にガラス基板
を徐冷する。次いで、第一徐冷室から200℃に加熱さ
れている第二徐冷室にガラス基板を移送し、300℃か
ら200℃までガラス基板を徐冷する。このように二段
階に分けて徐冷することにより、熱歪みによるダメージ
からガラス基板を解放できる。次に、上記徐冷を終えた
ガラス基板を、20℃の水槽に浸漬して急冷し約20分
間維持した。
(3) Cooling Step The glass substrate that has undergone the chemical strengthening is gradually cooled in the first and second annealing chambers. First, the glass substrate is pulled up from the chemical strengthening solution, transferred to a first annealing chamber heated to 300 ° C., and kept in this for about 10 minutes to gradually cool the glass substrate to 300 ° C. Then, the glass substrate is transferred from the first slow cooling chamber to the second slow cooling chamber heated to 200 ° C., and the glass substrate is gradually cooled from 300 ° C. to 200 ° C. By gradually cooling in two stages in this way, the glass substrate can be released from damage due to thermal strain. Next, the glass substrate that had been gradually cooled was immersed in a water bath at 20 ° C. to be rapidly cooled and maintained for about 20 minutes.

【0054】(4)洗浄工程 上記冷却工程を終えたガラス基板を、約40℃に加熱し
た硫酸に浸漬し、超音波をかけながら洗浄を行った。
(4) Washing Step The glass substrate that had been subjected to the cooling step was immersed in sulfuric acid heated to about 40 ° C. and washed while applying ultrasonic waves.

【0055】以上の工程を経て製造された磁気ディスク
用ガラス基板の表面を、ハロゲンランプで15万ルクス
で照らして、目視検査したところ、問題となるような異
物は認められなかった。
When the surface of the glass substrate for a magnetic disk manufactured through the above steps was illuminated with a halogen lamp at 150,000 lux and visually inspected, no foreign matter causing a problem was found.

【0056】(5)磁気ディスク製造工程 上述した工程を経て得られた磁気ディスク用ガラス基板
の両面に、インライン式のスパッタリング装置を用い
て、Cr下地層、CrMo下地層、CoPtCr磁性
層、C保護層を順次成膜して磁気ディスクを得た。
(5) Magnetic Disk Manufacturing Step A Cr underlayer, a CrMo underlayer, a CoPtCr magnetic layer, and a C protective layer are formed on both surfaces of the glass substrate for a magnetic disk obtained through the above-mentioned steps by using an in-line type sputtering device. The layers were sequentially deposited to obtain a magnetic disk.

【0057】得られた磁気ディスクについてグライドテ
ストを実施したところ、ヒット(ヘッドが磁気ディスク
表面の突起にかすること)やクラッシュ(ヘッドが磁気
ディスク表面の突起に衝突すること)は認められなかっ
た。また、磁性層等の膜に欠陥が発生していないことも
確認できた。
A glide test was carried out on the obtained magnetic disk. No hits (the head scratched the projections on the magnetic disk surface) or crashes (the head collided with the projections on the magnetic disk surface) were not observed. . It was also confirmed that no defect occurred in the film such as the magnetic layer.

【0058】実施例2〜3 アルミノシリケートガラスの代わりにソーダライムガラ
ス(実施例2)、ソーダアルミノケイ酸ガラス(実施例
3)を用いたこと以外は実施例1と同様にして、磁気デ
ィスク用ガラス基板及び磁気ディスクを得た。
[0058] soda-lime glass in place of Examples 2-3 aluminosilicate glass (Example 2), except for the use of soda aluminosilicate glass (Example 3) in the same manner as in Example 1, a glass for a magnetic disk A substrate and a magnetic disk were obtained.

【0059】その結果、アルミノシリケートガラスに比
べ圧縮応力層の深さは浅いが、実用上問題はなかった。
As a result, the depth of the compressive stress layer was shallower than that of aluminosilicate glass, but there was no problem in practical use.

【0060】実施例4 実施例1で得られた磁気ディスク用ガラス基板の両面
に、Al(膜厚50オングストローム)/Cr(100
0オングストローム)/CrMo(100オングストロ
ーム)からなる下地層、CoPtCr(120オングス
トローム)/CrMo(50オングストローム)/Co
PtCr(120オングストローム)からなる磁性層、
Cr(50オングストローム)保護層をインライン型ス
パッタ装置で形成した。
Example 4 Al (film thickness 50 Å) / Cr (100) was formed on both surfaces of the magnetic disk glass substrate obtained in Example 1.
0 angstrom) / CrMo (100 angstrom) underlayer, CoPtCr (120 angstrom) / CrMo (50 angstrom) / Co
A magnetic layer made of PtCr (120 Å),
A Cr (50 Å) protective layer was formed by an in-line type sputtering apparatus.

【0061】上記基板を、シリカ微粒子(粒経100オ
ングストローム)を分散した有機ケイ素化合物溶液(水
とIPAとテトラエトキシシランとの混合液)に浸し、
焼成することによってSiO2からなる保護層を形成
し、さらに、この保護層上をパーフロロポリエーテルか
らなる潤滑剤でディップ処理して潤滑層を形成して、M
Rヘッド用磁気ディスクを得た。
The above substrate was dipped in an organic silicon compound solution (mixture of water, IPA and tetraethoxysilane) in which fine silica particles (grain size 100 Å) were dispersed,
A protective layer made of SiO 2 is formed by firing, and a dip treatment is performed on the protective layer with a lubricant made of perfluoropolyether to form a lubricating layer.
A magnetic disk for an R head was obtained.

【0062】得られた磁気ディスクについてグライドテ
ストを実施したところ、ヒットやクラッシュは認められ
なかった。また、磁性層等の膜に欠陥が発生していない
ことも確認できた。
When a glide test was conducted on the obtained magnetic disk, no hits or crashes were observed. It was also confirmed that no defect occurred in the film such as the magnetic layer.

【0063】実施例5 下地層をAl/Cr/Crとし、磁性層をCoNiCr
Taとしたこと以外は実施例4と同様にして薄膜ヘッド
用磁気ディスクを得た。
EXAMPLE 5 Al / Cr / Cr was used as the underlayer and CoNiCr was used as the magnetic layer.
A magnetic disk for a thin film head was obtained in the same manner as in Example 4 except that Ta was used.

【0064】上記磁気ディスクについて実施例4と同様
のことが確認された。
It was confirmed that the magnetic disk was the same as in Example 4.

【0065】実施例6 化学強化溶液を500℃に加熱し、350℃に予熱した
ガラス基板を化学強化したこと以外は実施例1と同様に
して薄膜ヘッド用磁気ディスクを得た。
Example 6 A magnetic disk for a thin film head was obtained in the same manner as in Example 1 except that the chemical strengthening solution was heated to 500 ° C. and the glass substrate preheated to 350 ° C. was chemically strengthened.

【0066】上記磁気ディスクについて実施例1と同様
のことが確認された。
It was confirmed that the magnetic disk was the same as in Example 1.

【0067】比較例1 急冷を行わず、徐冷を終えたガラス基板を自然冷却した
こと以外は実施例1と同様にして、磁気ディスク用ガラ
ス基板及び磁気ディスクを得た。
Comparative Example 1 A glass substrate for a magnetic disk and a magnetic disk were obtained in the same manner as in Example 1 except that the glass substrate that had been gradually cooled was naturally cooled without quenching.

【0068】磁気ディスク用ガラス基板の表面を、実施
例1と同様に目視検査したところ、100〜10個程度
の異物が認められた。また、得られた磁気ディスクにつ
いてグライドテストを実施したところ、ヒットやクラッ
シュがテスト枚数のうちの20%程度認められた。
When the surface of the glass substrate for a magnetic disk was visually inspected in the same manner as in Example 1, about 100 to 10 foreign substances were found. Further, when a glide test was performed on the obtained magnetic disk, hits and crashes were recognized in about 20% of the number of tested sheets.

【0069】以上好ましい実施例をあげて本発明を説明
したが、本発明は必ずしも上記実施例に限定されるもの
ではない。
Although the present invention has been described with reference to the preferred embodiment, the present invention is not necessarily limited to the above embodiment.

【0070】例えば、洗浄工程において、中性洗剤の代
わりに、市販の界面活性剤や洗浄剤(アルカリタイプの
ものを含む)を用いることもできる。
For example, in the washing step, a commercially available surfactant or detergent (including alkali type) may be used instead of the neutral detergent.

【0071】また、研磨剤として、酸化セリウム(Ce
2)、コロイダルシリカ(SiO2)、アルミナ(γ−
Al23)、べんがら(Fe23)、酸化クロム(Cr
23)、酸化ジルコニウム(ZrO2)、酸化チタン
(TiO2)などを使用することもできる。また、軟質
ポリシャとしては、スウェード、ベロアを素材とするも
のが、硬質ポリシャとしては、硬質ベロア、ウレタン発
砲、ピッチ含浸スウェード等を使用することもできる。
Further, as a polishing agent, cerium oxide (Ce
O 2 ), colloidal silica (SiO 2 ), alumina (γ-
Al 2 O 3 ), bran (Fe 2 O 3 ), chromium oxide (Cr
2 O 3 ), zirconium oxide (ZrO 2 ), titanium oxide (TiO 2 ) and the like can also be used. The soft polisher may be made of suede or velour, and the hard polisher may be hard velor, urethane foam, pitch-impregnated suede or the like.

【0072】[0072]

【発明の効果】以上説明したように本発明の磁気ディス
ク用ガラス基板の製造方法によれば、ガラス基板に付着
する析出溶融塩を洗浄によって容易に除去できるので、
異常突起物のない高い平坦性を有する磁気ディスク用ガ
ラス基板を製造できる。
As described above, according to the method of manufacturing a glass substrate for a magnetic disk of the present invention, the molten salt deposited on the glass substrate can be easily removed by washing,
It is possible to manufacture a glass substrate for a magnetic disk having high flatness without abnormal protrusions.

【0073】また、ガラス基板端面と保持部材間に発生
する析出溶融塩も脆弱になるので、ガラス基板を保持部
材から取り出すときにガラス基板端面の破損を防止でき
る。
Further, since the molten salt precipitated between the end surface of the glass substrate and the holding member also becomes brittle, damage to the end surface of the glass substrate can be prevented when the glass substrate is taken out from the holding member.

【0074】さらに、表面に微細なキズがあると急冷に
よって破損するので、不良品を容易に識別できる。
Further, if there are fine scratches on the surface, they will be damaged by rapid cooling, so that defective products can be easily identified.

【0075】また、本発明の磁気ディスクの製造方法に
よれば、表面に異常突起物や微細なキズのない磁気ディ
スク用ガラス基板を使用しているので、異常突起物や微
細なキズに起因する欠陥の少ない高品質の磁気ディスク
を高歩留まりで製造できる。
Further, according to the method of manufacturing a magnetic disk of the present invention, since the glass substrate for a magnetic disk having no abnormal protrusions or fine scratches on the surface is used, it is caused by the abnormal protrusions or fine scratches. High-quality magnetic disks with few defects can be manufactured with high yield.

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 加熱した化学強化溶液にガラス基板を浸
漬し、ガラス基板表層のイオンを化学強化溶液中のイオ
ンでイオン交換してガラス基板を化学強化する工程と、 化学強化溶液からガラス基板を引き上げ溶融塩の結晶化
が始まる温度より高い温度まで徐冷する工程と、 ガラス基板表面に析出する溶融塩の結晶化を阻止する速
度でガラス基板を急冷する工程と、 ガラス基板表面を洗浄する工程とを含むことを特徴とす
る磁気ディスク用ガラス基板の製造方法。
1. A step of immersing a glass substrate in a heated chemical strengthening solution to ion-exchange the ions in the surface layer of the glass substrate with ions in the chemical strengthening solution to chemically strengthen the glass substrate, and a step of removing the glass substrate from the chemical strengthening solution. A step of gradually cooling the molten salt to a temperature higher than the temperature at which crystallization of the molten salt begins, a step of rapidly cooling the glass substrate at a rate that prevents crystallization of the molten salt that precipitates on the glass substrate surface, and a step of cleaning the glass substrate surface A method of manufacturing a glass substrate for a magnetic disk, comprising:
【請求項2】 ガラス基板を急冷する速度が、1600
℃/分〜400℃/分であることを特徴とする請求項1
記載の磁気ディスク用ガラス基板の製造方法。
2. A glass substrate is rapidly cooled at a rate of 1600.
C./min. To 400.degree. C./min.
A method for manufacturing a glass substrate for a magnetic disk as described above.
【請求項3】 化学強化溶液を350℃〜650℃に加
熱して化学強化し、ガラス基板を引き上げ300〜35
0℃まで徐冷し、100℃〜0℃の冷媒に接触させてガ
ラス基板を急冷することを特徴とする請求項1又は2記
載の磁気ディスク用ガラス基板の製造方法。
3. The chemical strengthening solution is heated to 350 ° C. to 650 ° C. for chemical strengthening, and the glass substrate is pulled up to 300 to 35.
The method for producing a glass substrate for a magnetic disk according to claim 1 or 2, wherein the glass substrate is gradually cooled to 0 ° C and brought into contact with a refrigerant at 100 ° C to 0 ° C to rapidly cool the glass substrate.
【請求項4】 ガラス基板を冷媒に接触させる時間が、
10分〜60分であることを特徴とする請求項1〜3の
いずれか一項に記載の磁気ディスク用ガラス基板の製造
方法。
4. The time for contacting the glass substrate with the refrigerant is
It is 10 minutes-60 minutes, The manufacturing method of the glass substrate for magnetic discs of any one of Claims 1-3 characterized by the above-mentioned.
【請求項5】 化学強化工程において、ガラス基板を端
面で保持して化学強化を行うことを特徴とする請求項1
〜4のいずれか一項に記載の磁気ディスク用ガラス基板
の製造方法。
5. The chemical strengthening step is characterized in that the glass substrate is held at the end face to carry out the chemical strengthening.
5. The method for manufacturing a glass substrate for a magnetic disk according to any one of items 4 to 4.
【請求項6】 請求項1〜5のいずれか一項に記載の磁
気ディスク用ガラス基板の製造方法を用いて得られた磁
気ディスク用ガラス基板上に、少なくとも磁性層を形成
したことを特徴とする磁気ディスクの製造方法。
6. At least a magnetic layer is formed on a glass substrate for a magnetic disk obtained by using the method for manufacturing a glass substrate for a magnetic disk according to any one of claims 1 to 5. Method for manufacturing magnetic disk.
JP30682395A 1994-12-28 1995-10-31 Method of manufacturing glass substrate for magnetic disk and method of manufacturing magnetic disk Expired - Lifetime JP2998949B2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP30682395A JP2998949B2 (en) 1995-10-31 1995-10-31 Method of manufacturing glass substrate for magnetic disk and method of manufacturing magnetic disk
US08/579,319 US5654057A (en) 1994-12-28 1995-12-27 Sheet glass flattening method, method of manufacturing glass substrate for an information recording disk using flattened glass, method of manufacturing a magnetic recording disk using glass substrate, and magnetic recording medium
SG1995002358A SG49584A1 (en) 1994-12-28 1995-12-27 Plate glass flattening method method of manufacturing an information recording glass substrate using flattened glass method of manufacturing a magnetic
US08/736,476 US5681609A (en) 1994-12-28 1996-10-24 Method of manufacturing a magnetic recording disk
US08/736,475 US5725625A (en) 1994-12-28 1996-10-24 Method of manufacturing a magnetic recording disk using glass substrate
US08/905,640 US5916656A (en) 1994-12-28 1997-08-04 Sheet glass flattening method, method of manufacturing an information recording glass substrate using flattened glass, method of manufacturing a magnetic disk using glass substrate, and magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30682395A JP2998949B2 (en) 1995-10-31 1995-10-31 Method of manufacturing glass substrate for magnetic disk and method of manufacturing magnetic disk

Publications (2)

Publication Number Publication Date
JPH09124345A true JPH09124345A (en) 1997-05-13
JP2998949B2 JP2998949B2 (en) 2000-01-17

Family

ID=17961694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30682395A Expired - Lifetime JP2998949B2 (en) 1994-12-28 1995-10-31 Method of manufacturing glass substrate for magnetic disk and method of manufacturing magnetic disk

Country Status (1)

Country Link
JP (1) JP2998949B2 (en)

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Publication number Priority date Publication date Assignee Title
SG84584A1 (en) * 1999-03-31 2001-11-20 Hoya Corp Method of manufacturing glass substrate for use in information recording medium, and method of manufacturing information recording medium
KR100532159B1 (en) * 2000-05-26 2005-11-30 미츠이 긴조쿠 고교 가부시키가이샤 Method for the production of glass substrates for magnetic recording mediums
JP2007284338A (en) * 2006-03-24 2007-11-01 Hoya Corp Method for producing magnetic disk glass substrate and method for producing magnetic disk
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JP2010138025A (en) * 2008-12-11 2010-06-24 Ishizuka Glass Co Ltd Method for producing antibacterial tempered glass
JP2015003857A (en) * 2013-05-24 2015-01-08 日本電気硝子株式会社 Method for producing strengthened glass plates
JP2016216330A (en) * 2015-05-26 2016-12-22 旭硝子株式会社 Method for producing chemical strengthened glass
CN111875264A (en) * 2020-08-13 2020-11-03 东莞市晶博光电股份有限公司 Cover plate glass strengthening process
CN113816619A (en) * 2021-10-15 2021-12-21 科立视材料科技有限公司 Antibacterial tempered glass and preparation method thereof
WO2023060840A1 (en) * 2021-10-15 2023-04-20 科立视材料科技有限公司 Antibacterial tempered glass and preparation method therefor

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