JPH09124344A - Production of water repellent light transmitting material - Google Patents

Production of water repellent light transmitting material

Info

Publication number
JPH09124344A
JPH09124344A JP7285948A JP28594895A JPH09124344A JP H09124344 A JPH09124344 A JP H09124344A JP 7285948 A JP7285948 A JP 7285948A JP 28594895 A JP28594895 A JP 28594895A JP H09124344 A JPH09124344 A JP H09124344A
Authority
JP
Japan
Prior art keywords
light transmitting
water
adsorbed
glow discharge
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7285948A
Other languages
Japanese (ja)
Inventor
Yoshikazu Takahashi
善和 高橋
Masaaki Kakimoto
雅明 柿本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP7285948A priority Critical patent/JPH09124344A/en
Publication of JPH09124344A publication Critical patent/JPH09124344A/en
Pending legal-status Critical Current

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  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing a light transmitting material having a thin water repellent film hardly sticking flaws. SOLUTION: A molecule having hydrophobic groups is adsorbed on a surface of a light transmitting substrate A of a plate glass or a synthetic resin plate. The molecule adsorbed is preferably a silicone compound having methyl or ethyl groups such as tetramethylcyclotetrasiloxane, octamethylcyclotetrasiloxane or heptamethyltrisloxane. The ion bombardment of the light transmitting substrate A with argon is carried out in a glow discharge in a vacuum vessel 1 and the glow discharge is then stopped to introduce a gas of a silicone compound 3 having the hydrophobic groups into the vacuum vessel 1. Thereby, an adsorbed layer of the silicone compound 3 is formed on the surface of the light transmitting substrate A.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、自動車、電車、船
舶等の乗物の窓材として、或いは建築物の窓材や眼鏡用
レンズとして使用されるガラスもしくは合成樹脂の透光
材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent material of glass or synthetic resin used as a window material for vehicles such as automobiles, trains, and ships, or as a window material for buildings and a lens for eyeglasses.

【0002】[0002]

【従来の技術】従来、この種の透光材が親水性で降雨、
霧などで表面に水滴が付着し、視界を悪くするので、透
光材の表面にワックスを塗布して撥水性をもたせること
が行われている。
2. Description of the Related Art Conventionally, this type of translucent material is hydrophilic and rains,
Since water drops adhere to the surface due to fog and the like and the visibility is deteriorated, wax is applied to the surface of the translucent material to make it water repellent.

【0003】[0003]

【発明が解決しようとする課題】ワックスの塗布ではそ
の塗膜の透光材への密着性が悪く、撥水効果の持続性が
ない欠点がある。この欠点を解決するために、透光材表
面にフッ素のモノマーガスのプラズマ重合により撥水性
の薄膜を形成する方法を考えたが、プラズマ重合膜は厚
くしかも傷が付着し易く、反射防止膜を有する眼鏡用レ
ンズなどでは、該薄膜を反射防止膜に重ねることで全体
の膜厚が厚くなり、そのため光学定数が変化し、反射防
止効果がなくなる不都合を生じた。
When wax is applied, the adhesion of the coating film to the light-transmitting material is poor, and the water-repellent effect is not sustained. In order to solve this drawback, we considered a method of forming a water-repellent thin film on the surface of the translucent material by plasma polymerization of a monomer gas of fluorine, but the plasma polymerization film is thick and easily scratched. In the spectacle lens and the like that it has, the entire film thickness is increased by superimposing the thin film on the antireflection film, so that the optical constant is changed and the antireflection effect is lost.

【0004】本発明は、薄く傷の付着しにくい撥水性の
薄膜を備えた透光材を製造する方法を提供することを目
的とするものである。
An object of the present invention is to provide a method for producing a light-transmitting material having a thin water-repellent thin film which is hard to be scratched.

【0005】[0005]

【課題を解決するための手段】本発明では、板ガラス又
は合成樹脂板の透光基材の表面上に、疎水基を有する分
子を真空中で吸着させることにより、上記の目的を達成
するようにした。該吸着される分子には、テトラメチル
シクロテトラシロキサン、オクタメチルシクロテトラシ
ロキサン、ヘプタメチルトリシロキサンなどのメチル基
やエチル基の疎水基を有するシリコン化合物が使用さ
れ、該透光基材を真空槽内のグロー放電中に於いてアル
ゴンのイオンボンバードをしたのち、該グロー放電を止
めて該真空槽内へ疎水基を持つシリコン化合物のガスを
導入し、該シリコン化合物の吸着層を該透光基材の表面
上に形成することが好ましい。
In the present invention, a molecule having a hydrophobic group is adsorbed in vacuum on the surface of a transparent substrate of a plate glass or a synthetic resin plate to achieve the above object. did. A silicon compound having a hydrophobic group such as a methyl group or an ethyl group such as tetramethylcyclotetrasiloxane, octamethylcyclotetrasiloxane, or heptamethyltrisiloxane is used as the molecule to be adsorbed. After ion bombardment of argon in the glow discharge in the inside, the glow discharge is stopped and a gas of a silicon compound having a hydrophobic group is introduced into the vacuum chamber, and an adsorption layer of the silicon compound is passed through the transparent layer. It is preferably formed on the surface of the material.

【0006】[0006]

【発明の実施の形態】本発明に於ける透光基材として
は、透明、半透明等の板ガラスや眼鏡用レンズ或いは合
成樹脂板が使用され、該透光基材を図1に示した真空装
置に収めて該透光基材の表面上に疎水基を有する分子が
吸着される。該真空装置は、真空ポンプ9に連なる真空
排気口2と、疎水基を持つシリコン化合物3を収容した
容器4にバルブ5を介して連なるシリコン化合物導入管
12及びバルブ7を介してアルゴンガス源に連なるアル
ゴンガス導入管8を備えた真空槽1内に、高周波電源6
に接続された電極板10とこれに対向した対向電極11
を設けた構成を有する。
BEST MODE FOR CARRYING OUT THE INVENTION As the translucent base material in the present invention, transparent or translucent plate glass, spectacle lens or synthetic resin plate is used, and the translucent base material is vacuumed as shown in FIG. Molecules having a hydrophobic group are adsorbed on the surface of the light-transmitting base material in a device. The vacuum device includes a vacuum exhaust port 2 connected to a vacuum pump 9, a silicon compound introduction pipe 12 connected to a container 4 containing a silicon compound 3 having a hydrophobic group via a valve 5 and an argon gas source via a valve 7. A high-frequency power source 6 is placed in a vacuum chamber 1 equipped with a continuous argon gas introduction pipe 8.
The electrode plate 10 connected to the
Is provided.

【0007】該電極板10上に板ガラスや合成樹脂板或
いは眼鏡用レンズ等の透光基材Aを載せ、該真空槽1内
を真空排気口2からの排気により例えば10-2Pa以下
にまで排気し、バルブ7を調節してアルゴンガスを導入
し、該真空槽1内を1Paとする。この状態で高周波電
源6から例えば13.56MHzの高周波を印加すると、電
極10、11間にグロー放電が発生し、アルゴンガスの
電離により生じたイオンが該透光基材Aの表面をイオン
ボンバードして清浄化する。該グロー放電を例えば約6
0秒続けてその表面を清浄化したのち電極への高周波の
印加を止め、バルブ7を閉じると同時に真空排気を停止
し、バルブ5を開いて疎水基を持つシリコン化合物3の
ガス、例えばテトラメチルシクロテトラシロキサンガス
を該真空槽1内に200Paになるまで導入する。約2
00Paを例えば10秒程度の短時間維持することによ
り、該透光基材Aの清浄な表面が該化合物3を吸着して
吸着層となる。
A transparent substrate A such as a glass plate, a synthetic resin plate, or a lens for eyeglasses is placed on the electrode plate 10, and the inside of the vacuum chamber 1 is exhausted from the vacuum exhaust port 2 to, for example, 10 -2 Pa or less. The inside of the vacuum chamber 1 is evacuated, the valve 7 is adjusted, and argon gas is introduced to bring the inside of the vacuum chamber 1 to 1 Pa. When a high frequency of 13.56 MHz, for example, is applied from the high frequency power source 6 in this state, a glow discharge is generated between the electrodes 10 and 11, and the ions generated by the ionization of the argon gas ion bombard the surface of the transparent base material A. To clean. The glow discharge is, for example, about 6
After the surface is continuously cleaned for 0 seconds, the application of high frequency to the electrode is stopped, the valve 7 is closed and the vacuum exhaust is stopped at the same time, and the valve 5 is opened to open the gas of the silicon compound 3 having a hydrophobic group, for example, tetramethyl. Cyclotetrasiloxane gas is introduced into the vacuum chamber 1 until the pressure reaches 200 Pa. About 2
By maintaining 00 Pa for a short time of, for example, about 10 seconds, the clean surface of the light-transmissive substrate A adsorbs the compound 3 to form an adsorption layer.

【0008】該吸着層の厚さは10Å程度の分子オーダ
ーの厚さしかなく、その表面に対する水の接触角は11
4°程度であった。また、該吸着層が透光基材Aの表面
に接する部分は、図2に示すように、板ガラス等の該基
材Aに対して密着性の良い−Si−O−Si−O−の主鎖
で構成されており、メチル基が表面外方へ出る構造とな
っているため、充分な撥水性を持つようになる。該吸着
層が極めて薄いため、例えば眼鏡用レンズの反射防止膜
上に重ねて成膜しても全体の膜厚が殆ど変わらないか
ら、光学定数も殆ど変化せず反射防止効果が損なわれな
い。該吸着層はイオンボンバード処理した透光基材Aの
表面に吸着させるため、極めて強固に付着し、薄く密着
性が良好で撥水性効果を長期間維持できる。
The thickness of the adsorption layer is only about 10Å in the molecular order, and the contact angle of water with the surface is 11
It was about 4 °. Further, as shown in FIG. 2, the part where the adsorption layer is in contact with the surface of the translucent base material A is mainly made of -Si-O-Si-O- which has good adhesion to the base material A such as plate glass. Since it is composed of chains and has a structure in which the methyl group is exposed to the outside of the surface, it has sufficient water repellency. Since the adsorption layer is extremely thin, the entire film thickness is hardly changed even if the film is laminated on the antireflection film of the spectacle lens, so that the optical constant is hardly changed and the antireflection effect is not impaired. Since the adsorption layer is adsorbed on the surface of the light-transmissive substrate A that has been subjected to ion bombardment, it adheres extremely strongly, is thin and has good adhesiveness, and can maintain the water-repellent effect for a long time.

【0009】疎水基を持つシリコン化合物3としては、
上記テトラメチルシクロテトラシロキサン以外にオクタ
メチルシクロテトラシロキサンやヘプタメチルトリシロ
キサンなどのメチル基又はエチル基を有するシリコン化
合物のガスを使用できる。板ガラス表面上にテトラメチ
ルシクロテトラシロキサンガスの吸着層を形成したとき
の水に対する接触角は114°、オクタメチルシクロテ
トラシロキサンガスの吸着層を形成したときの接触角は
113°、ヘプタメチルトリシロキサンガスの吸着層を
形成したときの接触角は117°であった。
As the silicon compound 3 having a hydrophobic group,
In addition to the above tetramethylcyclotetrasiloxane, a silicon compound gas having a methyl group or an ethyl group such as octamethylcyclotetrasiloxane or heptamethyltrisiloxane can be used. The contact angle of water when the adsorption layer of tetramethylcyclotetrasiloxane gas was formed on the surface of the plate glass was 114 °, the contact angle when the adsorption layer of octamethylcyclotetrasiloxane gas was formed was 113 °, and heptamethyltrisiloxane. The contact angle when the gas adsorption layer was formed was 117 °.

【0010】[0010]

【実施例】図1に示す装置の電極板10に厚さ3mmの板
ガラスの透光基材Aを載せ、該真空槽1内を10-2Pa
に排気したのちアルゴンガス導入管8から1Paになる
までアルゴンガスを導入し、電源6から電極板10及び
対向電極11に13.56MHzの高周波を印加して該透光
基材Aの表面をイオンボンバードにより清浄化すべくグ
ロー放電を60秒間発生させた。このあと容器4内に用
意したテトラメチルシクロテトラシロキサンのガスを真
空槽1内が200Paになるまで導入してその状態を1
0秒間継続し、該透光基材Aの表面にテトラメチルシク
ロテトラシロキサンの吸着層を形成させた。該透光基材
Aを真空槽1から取り出し、その表面の水の接触角を調
べたところ114°であった。また、その吸着層の厚さ
は10Åで基材に対する密着性を高温高湿度暴露試験法
(60℃,95%相対湿度に1ヶ月放置)により調べた
ところ接触角の変化は見られず、密着性は良好であっ
た。
EXAMPLE A transparent glass substrate A having a thickness of 3 mm was placed on an electrode plate 10 of the apparatus shown in FIG. 1, and the inside of the vacuum chamber 1 was set to 10 −2 Pa.
Argon gas is introduced from the argon gas introduction pipe 8 to 1 Pa, and a high frequency of 13.56 MHz is applied to the electrode plate 10 and the counter electrode 11 from the power source 6 by applying argon gas to the surface of the translucent substrate A by ion bombardment. A glow discharge was generated for 60 seconds in order to clean it. After that, the prepared tetramethylcyclotetrasiloxane gas was introduced into the container 4 until the inside of the vacuum chamber 1 reached 200 Pa, and the state was adjusted to 1
This was continued for 0 seconds to form an adsorption layer of tetramethylcyclotetrasiloxane on the surface of the translucent substrate A. The transparent base material A was taken out of the vacuum chamber 1, and the contact angle of water on the surface thereof was examined and found to be 114 °. The thickness of the adsorption layer was 10Å and the adhesion to the substrate was examined by the high temperature and high humidity exposure test method (60 ° C, 95% relative humidity for 1 month). The sex was good.

【0011】[0011]

【発明の効果】以上のように本発明によるときは、板ガ
ラス又は合成樹脂板の透光基材の表面上に、疎水基を有
する分子を真空中で吸着させたので、光学定数を変化さ
せない程薄く密着性の良い疎水基を有する分子の吸着層
を形成することができ、撥水性と耐久性が良く、反射防
止膜上に吸着させて反射防止機能を損なわずに撥水効果
を持たせることができる等の効果がある。
As described above, according to the present invention, molecules having a hydrophobic group are adsorbed in vacuum on the surface of a light-transmissive base material of a plate glass or a synthetic resin plate , so that the optical constant is not changed. It is possible to form a thin adsorption layer for molecules with hydrophobic groups, which has good water repellency and durability, and is adsorbed on the antireflection film to have a water repellent effect without impairing the antireflection function. It has the effect of being able to

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例の説明図FIG. 1 is an explanatory diagram of an embodiment of the present invention.

【図2】透光基材表面の吸着状態の説明図FIG. 2 is an explanatory diagram of a suction state on the surface of the transparent substrate.

【符号の説明】[Explanation of symbols]

A 透光基材、1 真空槽、3 疎水基を持つシリコン
化合物、6 高周波電源、10 電極板、
A translucent substrate, 1 vacuum chamber, 3 silicon compound having hydrophobic group, 6 high frequency power supply, 10 electrode plate,

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】板ガラス又は合成樹脂板の透光基材の表面
上に、疎水基を有する分子を真空中で吸着させることを
特徴とする撥水性透光材の製造方法。
1. A method for producing a water-repellent light-transmitting material, which comprises adsorbing a molecule having a hydrophobic group on a surface of a light-transmitting base material of a plate glass or a synthetic resin plate in a vacuum.
【請求項2】上記吸着される分子が、テトラメチルシク
ロテトラシロキサン、オクタメチルシクロテトラシロキ
サン、ヘプタメチルトリシロキサンなどのメチル基また
はエチル基を有するシリコン化合物であることを特徴と
する請求項1に記載の撥水性透光材の製造方法。
2. The molecule to be adsorbed is a silicon compound having a methyl group or an ethyl group, such as tetramethylcyclotetrasiloxane, octamethylcyclotetrasiloxane, or heptamethyltrisiloxane. A method for producing the water-repellent translucent material described.
【請求項3】板ガラス又は合成樹脂板の透光基材を真空
槽内のグロー放電中に於いてアルゴンのイオンボンバー
ドをしたのち、該グロー放電を止めて該真空槽内へ疎水
基を持つシリコン化合物のガスを導入し、該シリコン化
合物の吸着層を該透光基材の表面上に形成することを特
徴とする撥水性透光材の製造方法。
3. A transparent substrate made of a plate glass or a synthetic resin plate is subjected to argon ion bombardment during glow discharge in a vacuum chamber, then the glow discharge is stopped, and silicon having a hydrophobic group in the vacuum chamber. A method for producing a water-repellent light-transmitting material, comprising introducing a compound gas and forming an adsorption layer of the silicon compound on the surface of the light-transmitting substrate.
JP7285948A 1995-11-02 1995-11-02 Production of water repellent light transmitting material Pending JPH09124344A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7285948A JPH09124344A (en) 1995-11-02 1995-11-02 Production of water repellent light transmitting material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7285948A JPH09124344A (en) 1995-11-02 1995-11-02 Production of water repellent light transmitting material

Publications (1)

Publication Number Publication Date
JPH09124344A true JPH09124344A (en) 1997-05-13

Family

ID=17698046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7285948A Pending JPH09124344A (en) 1995-11-02 1995-11-02 Production of water repellent light transmitting material

Country Status (1)

Country Link
JP (1) JPH09124344A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107074641A (en) * 2014-10-24 2017-08-18 旭硝子欧洲玻璃公司 The glass substrate of ion injection method and ion implanting

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107074641A (en) * 2014-10-24 2017-08-18 旭硝子欧洲玻璃公司 The glass substrate of ion injection method and ion implanting
CN107074641B (en) * 2014-10-24 2020-08-07 旭硝子欧洲玻璃公司 Ion implantation method and ion implanted glass substrate

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