JPH0895045A - Processing method for liquid crystal oriented film - Google Patents

Processing method for liquid crystal oriented film

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Publication number
JPH0895045A
JPH0895045A JP23162694A JP23162694A JPH0895045A JP H0895045 A JPH0895045 A JP H0895045A JP 23162694 A JP23162694 A JP 23162694A JP 23162694 A JP23162694 A JP 23162694A JP H0895045 A JPH0895045 A JP H0895045A
Authority
JP
Japan
Prior art keywords
liquid crystal
phase grating
alignment film
crystal alignment
oriented film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23162694A
Other languages
Japanese (ja)
Other versions
JP3561970B2 (en
Inventor
Atsushi Amako
淳 尼子
Tomio Sonehara
富雄 曽根原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP23162694A priority Critical patent/JP3561970B2/en
Publication of JPH0895045A publication Critical patent/JPH0895045A/en
Application granted granted Critical
Publication of JP3561970B2 publication Critical patent/JP3561970B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE: To provide a liquid crystal oriented film having an excellent liquid crystal orientation characteristic by means of simple constitution by arranging a liquid crystal oriented film in the position in which plural diffraction wavefronts from a phase grating arranged on an optical path of a laser beam overlap with each other and forming a fine surface rugged structure on the liquid crystal oriented film according to an interference light intensity distribution formed by the plural diffraction wavefronts. CONSTITUTION: A repeating frequency of a laser oscillator 101 is controlled by means of a pulse driver 102. An outgoing beam 103 is expanded to a parallel pencil of rays by means of an expander coillimator 104 so as to be incident on a phase grating 106. The phase grating 106 generates two diffraction wavefronts having approximately equal amplitudes from one incident wavefront. Two diffraction wavefronts passing through the phase grating 106 interfere with each other, and interference fringes 110 are formed on the surface of an oriented film 107 held on a movable stage 109. According to the interference fringes 110, a cyclic rugged structure whose cycle is approximately equal to a cycle of the interference fringes 110 can be provided on the surface of the orientated film 107.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、レーザを用いた液晶配
向膜の処理方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for treating a liquid crystal alignment film using a laser.

【0002】[0002]

【従来の技術】レーザ照射により液晶配向膜の表面に微
細な凹凸構造を形成し、この凹凸構造が与える配向力を
利用して液晶分子を配向させる方法がいくつか提案され
ている。
2. Description of the Related Art Several methods have been proposed in which a fine concavo-convex structure is formed on the surface of a liquid crystal alignment film by laser irradiation and the liquid crystal molecules are aligned by utilizing the alignment force provided by the concavo-convex structure.

【0003】例えば、特開昭54-50350には、スリットマ
スクを用いる方法が開示されている。レーザー発振器か
らのビームを平行光束に拡大し、スリットマスクを通過
させる。得られたスリット状のビームを配向膜へ照射す
る。配向膜を載せたステージをスリットと直交する方向
へ移動することにより配向膜に複数の加工傷を形成し、
この加工傷を利用して、液晶分子を配向させるのであ
る。
For example, JP-A-54-50350 discloses a method using a slit mask. The beam from the laser oscillator is expanded into a parallel beam and passed through the slit mask. The alignment film is irradiated with the obtained slit-shaped beam. A plurality of processing scratches are formed on the alignment film by moving the stage on which the alignment film is placed in the direction orthogonal to the slits.
The processing scratches are used to align the liquid crystal molecules.

【0004】また、特開昭60-217339には、二光束干渉
露光を利用する方法が開示されている。レーザー発振器
からのビームを平行光束に拡大し、この光束をふたつに
分割した後に、ふたつの波面が干渉する場所に配向膜を
配置する。こうして、前記ふたつの波面の干渉光強度分
布により、配向膜の表面に周期的な凹凸が形成される。
Further, Japanese Patent Application Laid-Open No. 60-217339 discloses a method utilizing two-beam interference exposure. The beam from the laser oscillator is expanded into a parallel light beam, the light beam is divided into two, and then an alignment film is arranged at a position where the two wavefronts interfere with each other. In this way, periodic unevenness is formed on the surface of the alignment film by the interference light intensity distribution of the two wavefronts.

【0005】さらに、特開平2-309321には、ラインアン
ドスペース状の振幅マスクを用いる方法が提案されてい
る。紫外線レーザを前記マスクを介して基板上の液晶配
向膜に照射する。紫外線レーザーが配向膜の表面に縞状
に照射され、化学反応を利用して配向膜表面に凹凸が形
成される。
Further, Japanese Patent Laid-Open No. 2-309321 proposes a method using a line-and-space amplitude mask. The liquid crystal alignment film on the substrate is irradiated with an ultraviolet laser through the mask. The surface of the alignment film is irradiated with an ultraviolet laser in a striped pattern, and irregularities are formed on the surface of the alignment film by utilizing a chemical reaction.

【0006】[0006]

【発明が解決しようとする課題】しかし、スリット状の
ビームを用いる方法には、配向膜を載せたステージをサ
ブミクロンの精度で移動しなければならないという困難
がある。なぜならば、液晶分子を配向させるには線幅〜
1.0μm程度の細かい凹凸構造が望ましく、〜1.0μm幅
のスリット状のビームを〜100mm以上移動させ、液晶パ
ネルの表示エリアに等しい面積を処理しなければならな
いからである。
However, the method using the slit-shaped beam has a difficulty in that the stage on which the alignment film is mounted must be moved with submicron accuracy. Because, to align the liquid crystal molecules, the line width ~
This is because a fine concavo-convex structure of about 1.0 μm is desirable, and it is necessary to move a slit-shaped beam having a width of up to 1.0 μm by 100 mm or more to process an area equal to the display area of the liquid crystal panel.

【0007】干渉露光を利用する方法ならば、広い面積
にわたって一度の露光で、周期が〜1.0μm以下の細か
い干渉光強度分布を形成することが可能である。しか
し、一般には、光路における空気のゆらぎや振動によ
り、配向膜上の干渉縞が動き、干渉縞のコントラストが
低下する。このような場合には、液晶分子を配向させる
に充分な表面弾性エネルギーを与える凹凸構造が形成さ
れないので、液晶パネルの表示品位が著しく低下する。
なお、前記の外乱を排除するには、高価な防振設備が必
要になる。
If the method utilizing interference exposure is used, it is possible to form a fine interference light intensity distribution having a period of up to 1.0 μm by a single exposure over a wide area. However, in general, fluctuations and vibrations of air in the optical path move the interference fringes on the alignment film, and the contrast of the interference fringes is reduced. In such a case, since the concavo-convex structure that gives the surface elastic energy sufficient to align the liquid crystal molecules is not formed, the display quality of the liquid crystal panel is significantly deteriorated.
In order to eliminate the above disturbance, expensive vibration damping equipment is required.

【0008】また、ラインアンドスペース状の振幅マス
クを用いる方法には、光の利用効率が半分以下に低下す
るという問題がある。ラインアンドスペース状のマスク
では、光が透過する部分と透過しない部分の面積比率が
ほぼ1:1だからである。この方法では、光利用効率の低
さを補うために大出力レーザが欠かせないので、冷却等
の付帯設備が大がかりになり、液晶配向膜の処理コスト
が高くついてしまう。
Further, the method using the line-and-space amplitude mask has a problem that the light utilization efficiency is reduced to less than half. This is because the line-and-space mask has an area ratio of about 1: 1 between a portion that transmits light and a portion that does not transmit light. In this method, a high-power laser is indispensable for compensating for the low light utilization efficiency, so that additional equipment such as cooling becomes large, and the processing cost of the liquid crystal alignment film becomes high.

【0009】本発明の目的は上記の問題を解決し、レー
ザーを用いた簡便な構成により、液晶配向特性に優れ
た、液晶配向膜の処理方法を提供することにある。
An object of the present invention is to solve the above-mentioned problems and to provide a method for treating a liquid crystal alignment film, which has a simple structure using a laser and is excellent in liquid crystal alignment characteristics.

【0010】[0010]

【課題を解決するための手段】本発明の第1の液晶配向
膜の処理方法は、レーザを照射して液晶配向膜を処理す
る方法に関し、レーザ発振器から出射されたレーザビー
ムの光路上に配置された位相格子を備え、前記位相格子
からの複数の回折波面が重なる位置に液晶配向膜を配置
し、前記複数の回折波面がつくる干渉光強度分布によ
り、微細な表面凹凸構造を前記液晶配向膜上に形成する
ことを特徴とする。
A first method for treating a liquid crystal alignment film according to the present invention relates to a method for treating a liquid crystal alignment film by irradiating a laser, which is arranged on an optical path of a laser beam emitted from a laser oscillator. Liquid crystal alignment film is disposed at a position where a plurality of diffracted wavefronts from the phase grating overlap each other, and a fine surface uneven structure is formed on the liquid crystal alignment film by the interference light intensity distribution created by the plurality of diffracted wavefronts. It is characterized in that it is formed on the top.

【0011】本発明の第2の液晶配向膜の処理方法は、
前記第1の液晶配向膜の処理方法において、前記位相格
子は表面凹凸型2値位相格子であることを特徴とする。
The second method for treating a liquid crystal alignment film of the present invention comprises:
In the first method for processing a liquid crystal alignment film, the phase grating is a surface-roughened binary phase grating.

【0012】本発明の第3の液晶配向膜の処理方法は、
前記第1の液晶配向膜の処理方法において、前記位相格
子は位相分布が異なる複数の領域を有することを特徴と
する。 本発明の第4の液晶配向膜の処理方法は、前記
第1の液晶配向膜の処理方法において、前記位相格子の
前に、位相格子の溝方向と平行な偏光方位を有する、ひ
とつまたは複数の領域から成る偏光板を配置することを
特徴とする請求項1に記載の液晶配向膜の処理方法。
The third method for treating a liquid crystal alignment film of the present invention comprises:
In the first method of processing a liquid crystal alignment film, the phase grating has a plurality of regions having different phase distributions. A fourth method for treating a liquid crystal alignment film according to the present invention is the method for treating a first liquid crystal alignment film, wherein one or a plurality of polarization directions parallel to a groove direction of the phase grating are provided in front of the phase grating. The method for treating a liquid crystal alignment film according to claim 1, wherein a polarizing plate composed of a region is arranged.

【0013】[0013]

【実施例】【Example】

(実施例1)図1に、本発明にしたがい液晶配向膜を処
理するための構成を示す。レーザ発振機器101はパル
ス発振が可能な短波長レーザ(波長0.1〜0.5μm)であ
り、直線偏光のTEM00モードを出射する。レーザ発振
器の繰り返し周波数は、パルスドライバ102によって
制御される。出射ビーム103は、エクスパンダコリメ
ータ104で平行光束に拡大され、この後に、位相格子
106へ入射する。位相格子106は、ひとつの入射波
面から、振幅がほぼ等しいふたつの回折波面を発生させ
る。位相格子106を通過したふたつの回折波面は干渉
し、可動ステージ109の上に保持された配向膜107
の表面に干渉縞110を形成する。この干渉縞により、
表面配向膜表面に、干渉縞の周期にほぼ等しい周期的な
凹凸構造が得られる。なお、本構成においては、凹凸面
が配向膜に向かうように位相格子を配置した。図中、1
05は光路折り曲げミラー、108は電極基板である。
(Embodiment 1) FIG. 1 shows a structure for treating a liquid crystal alignment film according to the present invention. The laser oscillating device 101 is a short wavelength laser (wavelength 0.1 to 0.5 μm) capable of pulse oscillation, and emits linearly polarized TEM 00 mode. The repetition frequency of the laser oscillator is controlled by the pulse driver 102. The outgoing beam 103 is expanded into a parallel light beam by the expander collimator 104, and then enters the phase grating 106. The phase grating 106 generates two diffracted wavefronts having substantially the same amplitude from one incident wavefront. The two diffracted wavefronts that have passed through the phase grating 106 interfere with each other and the alignment film 107 held on the movable stage 109.
Interference fringes 110 are formed on the surface of the. By this interference fringe,
On the surface of the surface alignment film, a periodic concavo-convex structure approximately equal to the period of interference fringes can be obtained. In this configuration, the phase grating is arranged so that the uneven surface faces the alignment film. In the figure, 1
Reference numeral 05 is an optical path bending mirror, and reference numeral 108 is an electrode substrate.

【0014】レーザ波長に対して透明な材料で位相格子
を作製することにより、高い光利用効率が得られる。ま
た、位相格子106から配向膜面までの距離は、両者が
接触しない程度に、いくらでも縮めることができる。例
えば、〜0.1■以下に設定できる。したがって、空気ゆ
らぎや振動等の外乱の影響を受けにくく、コントラスト
比の高い干渉光強度分布を安定に配向膜面上に形成する
ことができる。
By making the phase grating with a material transparent to the laser wavelength, high light utilization efficiency can be obtained. Further, the distance from the phase grating 106 to the alignment film surface can be reduced as long as the two do not come into contact with each other. For example, it can be set to ~ 0.1 ■ or less. Therefore, the interference light intensity distribution having a high contrast ratio can be stably formed on the alignment film surface without being easily affected by disturbances such as air fluctuations and vibrations.

【0015】位相格子へ入射する直線偏光の方位は、位
相格子の溝と平行であることが望ましい。角度がつくと
ともに、干渉縞のコントラストは低下する。この性質を
積極的に利用して、液晶配向膜上に形成する凹凸の形状
を制御することも可能である。 位相格子106の大き
さとしては、100×100mm2くらいまでは作製できる。し
たがって、液晶パネルの配向膜の大きさに合わせて、可
動ステージ109を移動することなく配向処理すること
もできるし、また、可動ステージ109を移動させるこ
とにより広い面積にわたって配向処理を行うこともでき
る。
The direction of the linearly polarized light incident on the phase grating is preferably parallel to the groove of the phase grating. As the angle increases, the contrast of the interference fringes decreases. It is also possible to positively utilize this property to control the shape of the unevenness formed on the liquid crystal alignment film. The size of the phase grating 106 can be made up to about 100 × 100 mm 2 . Therefore, according to the size of the alignment film of the liquid crystal panel, the alignment process can be performed without moving the movable stage 109, and the alignment process can be performed over a wide area by moving the movable stage 109. .

【0016】本実施例の位相格子は、1次元の表面凹凸
型2値位相格子である。この位相格子の位相分布は、1
周期の半分が位相値0radであり、もう半分が位相値πra
dである。そして、この位相格子が与える±1次の透過
回折波面の間の干渉により、配向膜上に干渉縞を形成す
る。配向特性の優れた配向処理を行うには、干渉縞のコ
ントラストを高めることが必須である。このためには、
高次の回折波面を除く必要があり、位相格子の周期pと
レーザー波長λの関係が次式を満足するように定めた。
The phase grating of this embodiment is a one-dimensional surface-roughened binary phase grating. The phase distribution of this phase grating is 1
Half of the period has a phase value of 0 rad and the other half has a phase value of πra
d. Then, interference fringes are formed on the alignment film by the interference between the ± 1st-order transmission diffraction wavefronts given by this phase grating. In order to perform an alignment treatment with excellent alignment characteristics, it is essential to increase the contrast of interference fringes. To do this,
It is necessary to exclude the high-order diffracted wavefront, and the relation between the period p of the phase grating and the laser wavelength λ is set to satisfy the following equation.

【0017】mλ/p≧1 ・・・・(1) ただし、mは回折次数であり、3よりも大きな奇数であ
る。例えば、λ=0.50μmとすると、p≦1.5μmとな
る。
Mλ / p ≧ 1 (1) where m is a diffraction order, which is an odd number larger than 3. For example, if λ = 0.50 μm, then p ≦ 1.5 μm.

【0018】本実施例では、マスク露光とイオンエッチ
ングにより、石英基板上に位相格子を作製した。位相格
子の周期はp=1.5μmである。位相格子の回折特性
は、光利用効率が80%であり、±1次の回折波の振幅比
はほぼ1:1である。図2に、位相格子の斜視図を示し
た。
In this example, a phase grating was formed on a quartz substrate by mask exposure and ion etching. The period of the phase grating is p = 1.5 μm. Regarding the diffraction characteristics of the phase grating, the light utilization efficiency is 80%, and the amplitude ratio of the ± 1st-order diffracted waves is approximately 1: 1. FIG. 2 shows a perspective view of the phase grating.

【0019】±1次の回折波面の間の干渉により得られ
る干渉縞の周期dは、次式で与えられる。
The period d of the interference fringes obtained by the interference between the ± 1st-order diffracted wavefronts is given by the following equation.

【0020】 d=λ/(2sinθ)=λ/(2λ/p)=p/2 ・・・・(2) ここで、θは格子基板の法線に対する回折波の出射角度
である。(2)式から、位相格子の周期がp=1.5μm
の時、配向膜上に形成される干渉縞の周期はd=0.75μ
mとなる。この干渉縞により、図4に示すように、配向
膜の表面に、0.75μm周期の微細細な凹凸構造を形成す
ることができた。図4において、201は基板、202
は透明電極、203は液晶配向膜、204は凹凸構造で
ある。
D = λ / (2sin θ) = λ / (2λ / p) = p / 2 (2) where θ is the outgoing angle of the diffracted wave with respect to the normal line of the grating substrate. From the formula (2), the period of the phase grating is p = 1.5 μm
, The period of the interference fringes formed on the alignment film is d = 0.75μ
m. As a result of this interference fringe, as shown in FIG. 4, a fine fine concavo-convex structure with a period of 0.75 μm could be formed on the surface of the alignment film. In FIG. 4, 201 is a substrate and 202
Is a transparent electrode, 203 is a liquid crystal alignment film, and 204 is an uneven structure.

【0021】液晶パネルの表示品質を高める手段とし
て、液晶パネルの表示エリアを複数のサブエリアに分割
し、それぞれのサブエリアで配向方向を違えることが有
効である。このような要求に対しても、本発明によれ
ば、凹凸の並びの方向が異なる複数の領域を有する2次
元位相格子を用いることにより対応できる。図3(a)
に、凹凸の並びの方向が中央と周辺で異なる位相格子の
平面図を示す。図中の矢印は、位相格子の溝の方向を表
す。
As a means for improving the display quality of the liquid crystal panel, it is effective to divide the display area of the liquid crystal panel into a plurality of sub-areas and make the alignment directions different in each sub-area. According to the present invention, such a demand can be met by using a two-dimensional phase grating having a plurality of regions in which the directions of the concavo-convex arrangement are different. FIG. 3 (a)
FIG. 3 shows a plan view of a phase grating in which the direction of the arrangement of the unevenness differs between the center and the periphery. The arrow in the figure indicates the direction of the groove of the phase grating.

【0022】また、ひとつの画素の中を複数の領域に分
割し、それぞれの領域で配向方向を違えることが有効な
場合もある。例えば、上下に分割する、左右に分割す
る、という具合である。このような要求に対しても、位
相格子を作製する際に、凹凸の並びの方向を違えるだけ
で容易に対応できる。図3(b)に、画素サイズに等し
い領域の中で、凹凸の並びの方向が上下で異なる位相格
子の平面図を示す。図中、phは水平方向の画素ピッチ
に等しい長さを、pvは垂直方向の画素ピッチに等しい
長さを表す。図中の矢印は、位相格子の溝の方向を表
す。この他にも、液晶の種類、表示モード等に配慮した
様々な分割形態が容易に想定されるが、それらに対して
も、位相格子を作製する際の凹凸の並びの方向を違える
だけで対応できる。
In some cases, it is effective to divide one pixel into a plurality of regions and to make the orientation directions different in each region. For example, it is divided vertically and horizontally. Such a requirement can be easily met by simply changing the direction of arrangement of the concavities and convexities when manufacturing the phase grating. FIG. 3B shows a plan view of a phase grating in which the arrangement direction of the unevenness is different in the upper and lower directions in the area having the same pixel size. In the figure, ph represents a length equal to the pixel pitch in the horizontal direction, and pv represents a length equal to the pixel pitch in the vertical direction. The arrow in the figure indicates the direction of the groove of the phase grating. In addition to this, it is possible to easily assume various division forms that take into consideration the type of liquid crystal, display mode, etc., but to cope with these, simply change the direction of the concavo-convex array when making the phase grating. it can.

【0023】なお、図3に示すような位相格子を用いる
場合には、位相格子の直前に、位相格子の溝方向と平行
な偏光方位を有する複数の領域から成る偏光板を配置す
ることが望ましい。そして、偏光板に入射する光が円偏
光となるように、偏光板の前に波長板を配置する。
When using a phase grating as shown in FIG. 3, it is desirable to dispose a polarizing plate composed of a plurality of regions having a polarization direction parallel to the groove direction of the phase grating immediately before the phase grating. . Then, a wave plate is arranged in front of the polarizing plate so that the light incident on the polarizing plate becomes circularly polarized light.

【0024】本実施例の液晶配向膜の処理方法によれ
ば、きわめて短時間に、配向膜に損傷を与えることな
く、均質な配向特性を有する配向膜を提供することがで
きる。さらに、位相格子を複数の領域に分割し、それぞ
れに異なった位相分布を与えることにより、表示エリア
の中で、あるいは、画素の中で、液晶分子の配向方向を
違えることができる。こうすることにより、液晶パネル
の表示品質を大きく向上させることが可能となった。
According to the method for treating a liquid crystal alignment film of this embodiment, it is possible to provide an alignment film having a uniform alignment characteristic in a very short time without damaging the alignment film. Further, by dividing the phase grating into a plurality of regions and giving different phase distributions to the respective regions, it is possible to change the alignment direction of the liquid crystal molecules in the display area or in the pixel. By doing so, it has become possible to greatly improve the display quality of the liquid crystal panel.

【0025】[0025]

【発明の効果】本発明によれば、レーザーを位相格子に
照射する簡便な構成により、精密かつ高速な配向処理が
可能になる。
According to the present invention, precise and high-speed alignment processing can be performed by a simple structure in which a phase grating is irradiated with a laser.

【0026】(1)位相格子を用いるため、光利用効率
が高い。したがって、従来よりも低い出力のレーザ発振
器を使用でき、装置の規模を小さくできるとともに、処
理コストを抑えることが可能になる。
(1) Since the phase grating is used, the light utilization efficiency is high. Therefore, it is possible to use a laser oscillator having a lower output than the conventional one, and it is possible to reduce the scale of the apparatus and reduce the processing cost.

【0027】(2)位相格子が与えるふたつの回折波面
の間の干渉を利用し、加えて、位相格子から配向膜面ま
での距離が短いので、空気ゆらぎや振動等の外乱の影響
を受けにくい。したがって、コントラスト比の高い干渉
光強度分布を安定に配向膜面上に形成し、充分な配向力
を与える凹凸構造を実現することが可能である。
(2) The interference between the two diffracted wavefronts provided by the phase grating is utilized, and the distance from the phase grating to the alignment film surface is short, so that it is less susceptible to disturbances such as air fluctuations and vibrations. . Therefore, it is possible to stably form an interference light intensity distribution having a high contrast ratio on the alignment film surface and realize a concavo-convex structure that gives a sufficient alignment force.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明にしたがい液晶配向膜を処理する構成を
示す図である。
FIG. 1 is a diagram showing a configuration for processing a liquid crystal alignment film according to the present invention.

【図2】位相格子の斜視図である。FIG. 2 is a perspective view of a phase grating.

【図3】(a)複数の領域を有する位相格子の平面図で
ある。 (b)複数の領域を有する別の位相格子の平面図であ
る。
FIG. 3A is a plan view of a phase grating having a plurality of regions. (B) It is a top view of another phase grating which has a plurality of fields.

【図4】処理後の配向膜表面の形状を示す断面図であ
る。
FIG. 4 is a cross-sectional view showing the shape of the alignment film surface after the treatment.

【符号の説明】[Explanation of symbols]

101 レーザ発振機 102 パルスドライバ 103 レーザビーム 104 エクスパンダコリメータ 105 光路折り曲げミラー 106 位相格子 107 配向膜 108 電極基板 109 可動ステージ 110 干渉縞 201 基板 202 透明電極 203 液晶配向膜 204 表面凹凸構造 101 Laser oscillator 102 Pulse driver 103 Laser beam 104 Expander collimator 105 Optical path bending mirror 106 Phase grating 107 Alignment film 108 Electrode substrate 109 Movable stage 110 Interference fringes 201 Substrate 202 Transparent electrode 203 Liquid crystal alignment film 204 Surface uneven structure

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】レーザを照射して液晶配向膜を処理する方
法に関し、レーザ発振器から出射されたレーザビームの
光路上に配置された位相格子を備え、前記位相格子から
の複数の回折波面が重なる位置に液晶配向膜を配置し、
前記複数の回折波面がつくる干渉光強度分布により、微
細な表面凹凸構造を前記液晶配向膜上に形成することを
特徴とする液晶配向膜の処理方法。
1. A method for treating a liquid crystal alignment film by irradiating a laser, comprising a phase grating arranged on an optical path of a laser beam emitted from a laser oscillator, and a plurality of diffracted wavefronts from the phase grating are overlapped with each other. Place the liquid crystal alignment film at the position,
A method for treating a liquid crystal alignment film, wherein a fine surface uneven structure is formed on the liquid crystal alignment film by an interference light intensity distribution formed by the plurality of diffracted wavefronts.
【請求項2】前記位相格子は表面凹凸型2値位相格子で
あることを特徴とする請求項1に記載の液晶配向膜の処
理方法。
2. The method for treating a liquid crystal alignment film according to claim 1, wherein the phase grating is a surface uneven type binary phase grating.
【請求項3】前記位相格子は位相分布が異なる複数の領
域を有することを特徴とする請求項1に記載の液晶配向
膜の処理方法。
3. The method for treating a liquid crystal alignment film according to claim 1, wherein the phase grating has a plurality of regions having different phase distributions.
【請求項4】前記位相格子の前に、位相格子の溝方向と
平行な偏光方位を有する、ひとつまたは複数の領域から
成る偏光板を配置することを特徴とする請求項1に記載
の液晶配向膜の処理方法。
4. The liquid crystal alignment according to claim 1, wherein a polarizing plate composed of one or a plurality of regions having a polarization direction parallel to the groove direction of the phase grating is arranged in front of the phase grating. Membrane treatment method.
JP23162694A 1994-09-27 1994-09-27 Processing method of liquid crystal alignment film Expired - Lifetime JP3561970B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23162694A JP3561970B2 (en) 1994-09-27 1994-09-27 Processing method of liquid crystal alignment film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23162694A JP3561970B2 (en) 1994-09-27 1994-09-27 Processing method of liquid crystal alignment film

Publications (2)

Publication Number Publication Date
JPH0895045A true JPH0895045A (en) 1996-04-12
JP3561970B2 JP3561970B2 (en) 2004-09-08

Family

ID=16926461

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3561970B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006113180A (en) * 2004-10-13 2006-04-27 Hitachi Displays Ltd Polarized light irradiation method for photo orientation and apparatus therefor
US7196758B2 (en) * 2003-12-30 2007-03-27 3M Innovative Properties Company Method of alignment of liquid crystals comprising exposing an alignment material to an interference pattern
US7894029B2 (en) 2004-04-12 2011-02-22 Hitachi Displays, Ltd. Apparatus for optically arranging surface of alignment film and method for manufacturing liquid crystal display device using the same
CN113406827A (en) * 2013-08-19 2021-09-17 罗利克有限公司 Photo-alignable object
CN117647918A (en) * 2024-01-29 2024-03-05 南京平行视界技术有限公司 Exposure device for preparing liquid crystal diffraction element

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7196758B2 (en) * 2003-12-30 2007-03-27 3M Innovative Properties Company Method of alignment of liquid crystals comprising exposing an alignment material to an interference pattern
US7894029B2 (en) 2004-04-12 2011-02-22 Hitachi Displays, Ltd. Apparatus for optically arranging surface of alignment film and method for manufacturing liquid crystal display device using the same
JP2006113180A (en) * 2004-10-13 2006-04-27 Hitachi Displays Ltd Polarized light irradiation method for photo orientation and apparatus therefor
CN113406827A (en) * 2013-08-19 2021-09-17 罗利克有限公司 Photo-alignable object
CN117647918A (en) * 2024-01-29 2024-03-05 南京平行视界技术有限公司 Exposure device for preparing liquid crystal diffraction element
CN117647918B (en) * 2024-01-29 2024-04-16 南京平行视界技术有限公司 Exposure device for preparing liquid crystal diffraction element

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