JPH088534A - Manufacture of multilayer printed wiring board - Google Patents

Manufacture of multilayer printed wiring board

Info

Publication number
JPH088534A
JPH088534A JP14191094A JP14191094A JPH088534A JP H088534 A JPH088534 A JP H088534A JP 14191094 A JP14191094 A JP 14191094A JP 14191094 A JP14191094 A JP 14191094A JP H088534 A JPH088534 A JP H088534A
Authority
JP
Japan
Prior art keywords
via hole
film
adhesive
cured
bonding agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14191094A
Other languages
Japanese (ja)
Inventor
Chiyuu Hayai
宙 早井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP14191094A priority Critical patent/JPH088534A/en
Publication of JPH088534A publication Critical patent/JPH088534A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable a multilayer printed wiring board to be enhanced in density and lessened in cost by a method wherein thermosetting additive bonding agent film is laminated on a photosetting resin surface and cured by heating. CONSTITUTION:Photosetting resin 4 is applied onto both sides or one side of an inner layer circuit board whose surface is roughened, exposed to light, and developed for the formation of a surface viahole 5. Then, a cured photosetting resin layer is polished and turned smooth. In succession, a thermosetting additive bonding agent film 6 is roll-laminated thereon at, normal pressures and cured by heating. At this point, as a space is present inside a previously formed viahole, air is expanded in a thermal treatment, whereby the additive bonding agent, film 6 is lifted and heaved up to burst out. The surface of the bonding agent layer is mechanical polished and turned smooth, and the heaved part of the film 6 is removed concurrently to make a viahole 8 disclosed again. Lastly, the cured surface of the additive bonding agent layer is finely roughened by chemicals, then a plating resist 9 is applied thereon, and the inner circuit board is subjected to electroless plating.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液状の光硬化型樹脂と
熱硬化型アディティブ接着剤フィルムを用いた多層プリ
ント配線板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer printed wiring board using a liquid photocurable resin and a thermosetting additive adhesive film.

【0002】[0002]

【従来の技術】近年、高精度パソコンや携帯電話が普及
し、高機能化と小型化が進められている。それに伴い、
使用される多層プリント配線板も高密度化、小型化、軽
量化のために、回路パターンのファイン化、表面ビアホ
ールの小径化が要求されていると同時に、低コスト化も
図っていく必要に迫られている。
2. Description of the Related Art In recent years, high-precision personal computers and mobile phones have become widespread, and have been advanced in functionality and size. with this,
The multilayer printed wiring boards used are required to have finer circuit patterns and smaller surface via holes in order to achieve higher density, smaller size, and lighter weight, and at the same time, it is necessary to reduce costs. Has been.

【0003】これまでの多層プリント配線板の製造方法
としては、まずエッチングにより両面銅張板に回路を形
成し、回路表面を粗化し、その上にガラスクロス基材に
エポキシ樹脂を含浸して半硬化させたプリプレグシート
を1枚以上重ね、更にその上に銅箔又は片面銅張板を積
層し、加熱プレスにて加熱一体化する工程であった。こ
の方法では、まずパターンのファイン化に限界があり、
従来のように銅箔回路に不要な部分をエッチングにより
除去するサブトラクティブ法では、エッチングドライフ
ィルムの現像と、銅箔のエッチングと2回のイメージン
グを行わなければならず、現像精度と銅箔のサイドエッ
チングにより、50μm以下の細線ラインを量産するこ
とは難しい。
As a conventional method for manufacturing a multilayer printed wiring board, a circuit is formed on a double-sided copper-clad board by etching, the surface of the circuit is roughened, and a glass cloth base material is impregnated with an epoxy resin. This was a step of stacking one or more cured prepreg sheets, further laminating a copper foil or a single-sided copper clad plate thereon, and heating and integrating them with a heating press. In this method, there is a limit to the fineness of the pattern,
In the conventional subtractive method for removing unnecessary portions of a copper foil circuit by etching, it is necessary to develop an etching dry film, etch the copper foil, and perform imaging twice. It is difficult to mass-produce a fine line of 50 μm or less by side etching.

【0004】また、表面ビアホールはメカニカルドリル
で加工すると、直径約300μmのホール加工が限界で
あり、それ以下になると穴位置精度、ドリル寿命などの
問題がでてくる。エキシマレーザーや炭酸ガスレーザー
で加工すると、約50μmの穴明けは可能となるが、絶
縁層にガラスクロスがない場合に限られ、いずれにせ
よ、貫通スルーホールのように重ね加工ができないた
め、工数が増大する。また、従来の工程では、プリプレ
グシートをつくるためガラスクロス基材にエポキシ樹脂
を含浸して一度半硬化させなければならず、またプレス
にて加熱加圧成形を行うため、膨大な設備と長い時間が
必要であった。
Further, when the surface via hole is machined by a mechanical drill, the hole machining of a diameter of about 300 μm is the limit, and if it is less than that, problems such as hole position accuracy and drill life will occur. When processed with an excimer laser or carbon dioxide laser, it is possible to make holes of about 50 μm, but only when there is no glass cloth in the insulating layer. Will increase. Further, in the conventional process, the glass cloth base material must be impregnated with epoxy resin and semi-cured once in order to make a prepreg sheet, and since heat and pressure molding is performed by a press, a huge amount of equipment and a long time are required. Was needed.

【0005】[0005]

【発明が解決しようとする課題】従来のように、ガラス
クロス基材にエポキシ樹脂を含浸してプリプレグを作成
し、プレスによって加熱加圧硬化を行い、メカニカルド
リルにて表面ビアホールを形成する方法では、ガラスク
ロスを使用するために、高コストであることや、極薄化
できない問題、サブトラクティブ法でパターンを作成
し、メカニカルドリルで表面ビアホールを形成するた
め、ファイン化できない問題などがある。
According to the conventional method of forming a prepreg by impregnating a glass cloth base material with an epoxy resin, heating and pressurizing by a press, and forming a surface via hole by a mechanical drill. Since the glass cloth is used, there is a problem that it is expensive and that it cannot be made extremely thin, and that a pattern is created by the subtractive method and a surface via hole is formed by a mechanical drill, so that it cannot be made fine.

【0006】本発明はこれらの問題を解決するために種
々検討の結果なされたもので、その目的とするところ
は、極薄化、ファイン化、高密度化し、同時に低コスト
化を達成した多層プリント配線板の製造方法を提供する
ことにある。
The present invention has been made as a result of various studies in order to solve these problems. The object of the present invention is to provide a multilayer print which achieves ultra-thinness, fineness, high density and at the same time low cost. It is to provide a method for manufacturing a wiring board.

【0007】[0007]

【課題を解決するための手段】本発明は、下記の工程か
らなる多層プリント配線板の製造方法、 (1)表面粗化された内層回路基板の両面又は片面に、
光硬化型樹脂を塗布し、露光・現像により表面ビアホー
ルを形成する工程、(2)該樹脂表面を平滑化研磨し、
その上に熱硬化型アディティブ接着剤フィルムを常圧に
てラミネートし、加熱硬化する工程、(3)表面ビアホ
ール上の隆起した接着剤樹脂部分とそれ以外の接着剤樹
脂部分を合わせて研磨し、表面平滑化および再度表面ビ
アホールを形成する工程、(4)アディティブ接着剤表
面を化学的に微細粗化し、無電解めっきする工程、及
び、下記の工程からなる多層プリント配線板の製造方
法、に関する。(A)両面銅張板をエッチングし、内層
回路を形成する工程、(B)内層回路表面を粗化する工
程、(C)内層回路基板の両面又は片面に、液状の光硬
化型樹脂を塗布し、露光・現像により表面ビアホールを
形成する工程、(D)硬化した該樹脂表面を平滑化研磨
し、その上に熱硬化型アディティブ接着剤フィルムを常
圧にてラミネートし、加熱硬化する工程、(E)表面ビ
アホール上の隆起した接着剤樹脂部分とそれ以外の接着
剤樹脂部分を合わせて研磨し、表面平滑化および再度表
面ビアホールを形成する工程、(F)アディティブ接着
剤表面を化学的に微細粗化し、めっきレジストを施した
後、無電解めっきする工程、
The present invention provides a method for producing a multilayer printed wiring board comprising the following steps: (1) On both sides or one side of a surface-roughened inner layer circuit board,
A step of applying a photocurable resin and forming a surface via hole by exposure and development, (2) smoothing and polishing the surface of the resin,
A step of laminating a thermosetting additive adhesive film thereon under normal pressure and heating and curing, (3) polishing the adhesive resin portion raised on the surface via hole and the other adhesive resin portion together, and polishing. The present invention relates to a step of surface smoothing and forming a surface via hole again, (4) a step of chemically finely roughening the surface of an additive adhesive and electroless plating, and a method for manufacturing a multilayer printed wiring board comprising the following steps. (A) A step of etching a double-sided copper clad board to form an inner layer circuit, (B) a step of roughening the inner layer circuit surface, (C) applying a liquid photocurable resin to both sides or one side of the inner layer circuit board Then, a step of forming a surface via hole by exposure and development, a step of (D) smoothing and polishing the cured resin surface, laminating a thermosetting additive adhesive film thereon under atmospheric pressure, and heat curing. (E) A step of polishing the adhesive resin portion on the surface via hole and the adhesive resin portion other than the raised portion together to smooth the surface and form the surface via hole again, (F) the additive adhesive surface is chemically Step of electroless plating after finely roughening and applying plating resist,

【0008】以下、本発明を図面に基づいて詳細に説明
する。まず従来と同じく、パターニングされた内層回路
基板(1)の回路銅箔(2)の表面を薬品により処理
し、粗化を行う(A,B)。(3)は粗化された内層回
路表面を表す。この場合予め粗化された銅箔を使用して
ある内層回路基板を用いてもよい。次にその表面に、ア
ンダーコート材として光硬化型樹脂(4)をスクリーン
印刷、カーテンコーター、ローラーコーターなどを使用
して塗布する。続いて、熱処理により指触乾燥してから
ネガフィルムを密着させるか、または指触乾燥しないま
ま、非接触によりネガフィルムを設置し、紫外線を照射
し、その後有機溶剤またはアルカリ水溶液により現像
し、表面フォトビアホール(5)を形成する(C)。
The present invention will be described below in detail with reference to the drawings. First, as in the conventional method, the surface of the circuit copper foil (2) of the patterned inner layer circuit board (1) is treated with a chemical to roughen (A, B). (3) represents the roughened inner layer circuit surface. In this case, an inner layer circuit board using a copper foil that has been roughened in advance may be used. Next, a photocurable resin (4) as an undercoat material is applied to the surface by screen printing, a curtain coater, a roller coater or the like. Subsequently, the negative film is brought into close contact with the film by heat-drying by heat treatment, or the negative film is placed by non-contact without touch-drying, irradiated with ultraviolet rays, and then developed with an organic solvent or an alkaline aqueous solution, A photo via hole (5) is formed (C).

【0009】次に、硬化した光硬化性樹脂層を機械的に
研磨し、表面平滑化する。この目的は、次にラミネート
する熱硬化型アディティブ接着剤フィルムとの間に不要
なボイドを残さないためであり、同時に両樹脂の密着性
を高めるためのものである。続いて、熱硬化型アディテ
ィブ接着剤フィルム(6)を常圧でロールラミネート
し、加熱処理し硬化させる。この時、あらかじめ形成し
たビアホール内には空間が存在するため、加熱処理によ
り空気が膨張し、その結果フィルムが上部に持ち上げら
れ、隆起し破裂する(D)。(7)は隆起し破壊したビ
アホール上のフィルムを示す。
Next, the cured photocurable resin layer is mechanically polished to smooth the surface. The purpose is to prevent unnecessary voids from being left between the thermosetting additive adhesive film to be laminated next, and at the same time to improve the adhesiveness between the two resins. Subsequently, the thermosetting additive adhesive film (6) is roll-laminated under normal pressure and heat-treated to cure. At this time, since there is a space in the via hole formed in advance, the air is expanded by the heat treatment, and as a result, the film is lifted to the upper part and raised and burst (D). (7) shows the film on the raised and destroyed via hole.

【0010】接着剤層を機械的に表面研磨し、表面平滑
化と同時に隆起部分を取り除き、再び表面ビアホール
(8)を出現させる。最後に化学薬品により硬化したア
ディティブ接着剤表面を微細に粗化したのちに、めっき
レジスト(9)を施し、無電解めっきを行う(F)。
(10)はめっき回路を示す。
The surface of the adhesive layer is mechanically polished to smooth the surface and simultaneously remove the raised portion, and the surface via hole (8) is again exposed. Finally, after finely roughening the surface of the additive adhesive that has been cured by a chemical, a plating resist (9) is applied and electroless plating is performed (F).
(10) shows a plated circuit.

【0011】本発明においてアンダーコート剤として用
いられる光硬化型樹脂は、耐めっき液性に優れ、アルカ
リ水溶液もしくは有機溶剤により現像可能なものであ
り、例えばノボラック型エポキシアクリレートやウレタ
ンアクリレートを主成分とし、必要に応じてビスフェノ
ールA型エポキシ樹脂、ビスフェノールF型エポキシ樹
脂、ノボラック型エポキシ樹脂などの熱硬化型樹脂とエ
ポキシ硬化剤を配合したものである。その他、光開始
剤、無機フィラー、消泡剤、レベリング剤、カップリン
グ剤などを必要に応じて添加してもよい。特願平6−4
0842号明細書に示される、アルカリ水溶液現像が可
能で、しかも耐溶剤性及び耐めっき液性に優れた組成物
が特に好ましい。
The photocurable resin used as an undercoating agent in the present invention has excellent resistance to plating solutions and can be developed with an aqueous alkaline solution or an organic solvent. For example, it contains novolac type epoxy acrylate or urethane acrylate as a main component. If necessary, a thermosetting resin such as a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, or a novolac type epoxy resin is mixed with an epoxy curing agent. In addition, a photoinitiator, an inorganic filler, an antifoaming agent, a leveling agent, a coupling agent, etc. may be added as necessary. Japanese Patent Application 6-4
A composition which is capable of being developed with an alkaline aqueous solution and which is excellent in solvent resistance and plating solution resistance is particularly preferable, as described in No. 0842.

【0012】次に、熱硬化型アディティブ接着剤の種類
としては挙げられるが、例えば特公昭63−10752
号公報、特開昭63−297571号公報、特開昭64
−47095公報、特開平3−18096号公報などの
ように、接着剤層を酸化剤により粗化するものが挙げら
れ、その内容はアクリロニトリルブタジエンゴム等のゴ
ム成分を含み、酸化剤としてクロム−硫酸水溶液でゴム
成分を溶出し、接着剤表面を粗化するものである。
Next, the types of the heat-curing additive adhesives can be mentioned, for example, Japanese Patent Publication No. 63-10752.
JP-A-63-297571, JP-A-64
As disclosed in JP-A-47095 and JP-A-3-18096, those in which the adhesive layer is roughened with an oxidizing agent are included, and the content thereof includes a rubber component such as acrylonitrile butadiene rubber and chromium-sulfuric acid as an oxidizing agent. The rubber component is eluted with an aqueous solution to roughen the adhesive surface.

【0013】また、エポキシ樹脂、フェノール樹脂、メ
ラミン樹脂等の耐熱性に優れた樹脂マトリクス中に、シ
リカや炭酸カルシウム等の無機質微粉末を分散させて接
着剤とし、該無機質微粉末を特定の薬品にて選択的に溶
出させることにより、接着剤層の粗化を行う方法や特開
平1−29479号公報に記載されているように、エポ
キシ樹脂マトリクス中に酸化剤に対する溶解性の異なる
硬化したエポキシ樹脂微粉末を分散させ、酸化剤によっ
て該エポキシ樹脂微粉末を選択的に溶出する方法等があ
る。
Further, an inorganic fine powder such as silica or calcium carbonate is dispersed as an adhesive in a resin matrix having excellent heat resistance such as an epoxy resin, a phenol resin or a melamine resin, and the inorganic fine powder is used as a specific chemical. As described in JP-A-1-29479 and a method for roughening the adhesive layer by selectively eluting the cured epoxy with a cured epoxy having different solubilities with respect to an oxidizing agent in an epoxy resin matrix. There is a method in which resin fine powder is dispersed and the epoxy resin fine powder is selectively eluted with an oxidizing agent.

【0014】本発明において用いられる熱硬化型アディ
ティブ接着剤フィルムとしては、上記いずれかのものを
フィルム化したものが使用できるが、作業環境および安
全衛生面での問題が大きいクロム−硫酸水溶液の様な強
力な酸化剤を使用せずとも、過マンガン酸塩による粗化
が可能であり、同時にフィルム化が容易な特願平5−3
04291号明細書記載の熱硬化型アディティブ接着剤
が特に好ましい。
As the thermosetting type additive adhesive film used in the present invention, a film obtained by filmizing any one of the above can be used, but like a chromium-sulfuric acid aqueous solution, which has great problems in working environment and safety and hygiene. It is possible to roughen with permanganate without using a strong oxidizing agent, and at the same time, it is easy to form a film.
The thermosetting additive adhesive described in 04291 is particularly preferable.

【0015】[0015]

【作用】本発明においては、前記の液状の光硬化型樹脂
と熱硬化型アディティブ接着剤フィルムを用いて多層化
を行うため、ガラスクロスを使用せず、かつプレスを行
わないことから材料面および工数面において低コストで
あり、また現像可能な光硬化型樹脂アンダーコート剤と
熱硬化型アディティブ接着剤フィルムを組み合わせるこ
とにより、表面ビアホールの形成とアディティブめっき
が可能となり、ファインパターンを形成することができ
るようになる。
In the present invention, since the liquid photo-curable resin and the thermosetting additive adhesive film are used to form a multilayer structure, no glass cloth is used and no pressing is performed. It is low cost in terms of man-hours, and by combining a developable photocurable resin undercoating agent and a thermosetting additive adhesive film, it becomes possible to form surface via holes and additive plating, and to form fine patterns. become able to.

【0016】[0016]

【実施例】以下に実施例を用いて本発明を説明する。有
機ポリイソシアネート(住友バイエルウレタン製:スミ
ジュール44V10)540g(イソシアネート4当
量)を2lのフラスコ中に投入し、トリエチルアミン1
gを添加し、60℃に加温した。その中へアクリル酸−
2−ヒドロキシエチル232g(2モル)を30分間で
滴下した後、60℃で3時間撹拌反応させて、イソシア
ネート基含有ウレタンアクリレートを合成した。
EXAMPLES The present invention will be described below with reference to examples. 540g (4 equivalents of isocyanate) of organic polyisocyanate (Sumitomo Bayer Urethane: Sumidule 44V10) was put into a 2L flask, and triethylamine 1 was added.
g was added and warmed to 60 ° C. Acrylic acid into it
After 232 g (2 mol) of 2-hydroxyethyl was added dropwise over 30 minutes, the mixture was stirred and reacted at 60 ° C. for 3 hours to synthesize an isocyanate group-containing urethane acrylate.

【0017】次に、2lのフラスコ中にビスフェノール
A型エポキシ樹脂(油化シェルエポキシ製:エピコート
828)760g(4当量)と重合禁止剤としてメトキ
シフェノール1gを加えた後、アクリル酸288g(4
モル)、ベンジルジメチルアミン1g添加して100℃
6時間撹拌反応させた。その後、無水コハク酸160g
(1.6モル)を加え、80℃で3時間撹拌反応させ、
カルボキシル基含有エポキシアクリレートを合成した。
このイソシアネート基含有ウレタンアクリレート25g
と、カルボキシル基含有エポキシアクリレート50g
と、メタクリル酸グリシジル12gとを混合し、光開始
剤として1−ヒドロキシシクロヘキシルフェニルケトン
(チバガイギー製:イルガキュア184)4.5gを添
加して、液状の光硬化型樹脂とした。
Next, after adding 760 g (4 equivalents) of bisphenol A type epoxy resin (made by Yuka Shell Epoxy: Epicoat 828) and 1 g of methoxyphenol as a polymerization inhibitor into a 2 l flask, 288 g of acrylic acid (4 g
Mol), 1 g of benzyldimethylamine was added, and the temperature was 100 ° C.
The reaction was stirred for 6 hours. Then 160g of succinic anhydride
(1.6 mol) was added, and the mixture was reacted with stirring at 80 ° C. for 3 hours,
A carboxyl group-containing epoxy acrylate was synthesized.
25 g of this isocyanate group-containing urethane acrylate
And carboxyl group-containing epoxy acrylate 50g
And 12 g of glycidyl methacrylate were mixed, and 4.5 g of 1-hydroxycyclohexyl phenyl ketone (manufactured by Ciba-Geigy: Irgacure 184) was added as a photoinitiator to obtain a liquid photocurable resin.

【0018】次に、ビスフェノールF型エポキシ樹脂
(大日本インキ製:エピクロン830、エポキシ当量1
75)100重量部とビスフェノールA型エポキシ樹脂
(エポキシ当量6400、重量平均分子量30000)
50重量部をメチルエチルケトン200重量部に撹拌し
ながら溶解した。この溶液に、硬化剤としてマイクロカ
プセル化イミダゾール15重量部とシランカップリング
剤(日本ユニカー製:A−187)3重量部を添加して
熱硬化型アディティブ接着剤ワニスを作製した。キャリ
アーフィルムとして片面離型処理をした厚み100μm
のポリエチレンテレフタレートフィルムを使用し、これ
に乾燥後の厚みが30μmとなるように前記接着剤ワニ
スをローラーコーターにて塗布、乾燥し、熱硬化型アデ
ィティブ接着剤フィルムとした。
Next, bisphenol F type epoxy resin (manufactured by Dainippon Ink Co., Ltd .: Epicron 830, epoxy equivalent 1
75) 100 parts by weight of bisphenol A type epoxy resin (epoxy equivalent 6400, weight average molecular weight 30,000)
50 parts by weight were dissolved in 200 parts by weight of methyl ethyl ketone with stirring. To this solution, 15 parts by weight of microencapsulated imidazole and 3 parts by weight of a silane coupling agent (manufactured by Nippon Unicar: A-187) were added as a curing agent to prepare a thermosetting additive adhesive varnish. 100 μm thickness with one-side release treatment as carrier film
The above polyethylene terephthalate film was used, and the above adhesive varnish was applied to this with a roller coater so that the thickness after drying was 30 μm, and dried to obtain a thermosetting additive adhesive film.

【0019】基材厚0.1mm、銅箔厚35μmのガラ
スエポキシ両面銅張積層板をパターン加工し内層回路板
を作成した。次いで、亜塩素酸ナトリウム31g/l、
水酸化ナトリウム15g/l、りん酸ナトリウム12g
/lからなるアルカリ水溶液で95℃2分間処理し回路
表面を粗化し、その上に上記作製した液状の光硬化型樹
脂をカーテンコーターにより70μm塗布し、80℃で
10分間熱処理し指触乾燥を行った。続いて所定のパタ
ーンを載置して、高圧水銀灯露光装置を用い照射量30
0mJ/cm2 で露光し、次いで炭酸ナトリウム水溶液
により2Kg/cm2 のスプレー圧で現像し、表面ビア
ホールを形成した。
A glass epoxy double-sided copper clad laminate having a substrate thickness of 0.1 mm and a copper foil thickness of 35 μm was patterned to form an inner layer circuit board. Then, sodium chlorite 31g / l,
Sodium hydroxide 15g / l, sodium phosphate 12g
/ L in an alkaline aqueous solution at 95 ° C for 2 minutes to roughen the circuit surface, and the liquid photocurable resin prepared above is applied thereon by a curtain coater to a thickness of 70 µm and heat-treated at 80 ° C for 10 minutes to dry by touch. went. Subsequently, a predetermined pattern is placed, and a high-pressure mercury lamp exposure device is used to irradiate 30
Exposed with 0 mJ / cm 2, then developed at a spray pressure of 2Kg / cm 2 by aqueous sodium carbonate solution, to form a surface via hole.

【0020】硬化した光硬化型樹脂面をベルトサンダー
で研磨して平滑化した後、その上に上記熱硬化型アディ
ティブ接着剤フィルムを常圧にてラミネートし、キャリ
アーフィルムを剥離後180℃、20分間加熱硬化させ
た後、得られた多層プリント配線板用基板にめっきスル
ーホール用の穴あけを行った。その後、加熱硬化時に発
生した表面ビアホール上のアディティブ接着剤隆起部分
とそれ以外の接着剤樹脂部分とを併せてベルトサンダー
で研磨し、表面平滑化とともに、再び表面ビアホールを
出現させた。
The surface of the cured photocurable resin is smoothed by polishing with a belt sander, the thermosetting additive adhesive film is laminated thereon under normal pressure, and the carrier film is peeled off at 180 ° C. and 20 ° C. After heat-curing for a minute, the resulting multilayer printed wiring board substrate was perforated for plating through holes. After that, the adhesive adhesive raised portion on the surface via hole generated during heat curing and the other adhesive resin portion were combined and polished with a belt sander to make the surface smooth and to make the surface via hole appear again.

【0021】続いて、80℃のアルカリ水溶液中に10
分間浸漬し、接着剤層の脱脂及び膨潤処理を行った後、
70℃の過マンガン酸カリウムのアルカリ水溶液で10
分間粗化し、十分に水洗した後、50℃の硫酸ヒドロキ
シルアミン水溶液に10分間浸漬し、接着剤層に残留し
た過マンガン酸塩を中和除去した。次に、75℃のアル
カリ脱脂処理液に5分間浸漬後、十分に洗浄を行い、パ
ラジウム−錫塩コロイド触媒溶液に5分間浸漬した。水
洗後、室温の触媒活性化浴に8分間浸漬し、過剰なパラ
ジウム−錫塩コロイド粒子から過剰な錫塩を除去した。
続いて、公知の方法により所望のめっき回路及びスルー
ホール形成用のめっきレジストを形成した。
Then, 10 times in an alkaline aqueous solution at 80.degree.
After soaking for a minute, after degreasing and swelling the adhesive layer,
10 with an aqueous alkaline solution of potassium permanganate at 70 ° C
After roughening for a minute and washing thoroughly with water, it was immersed in a hydroxylamine sulfate aqueous solution at 50 ° C. for 10 minutes to neutralize and remove the permanganate remaining in the adhesive layer. Next, after being immersed in an alkaline degreasing solution at 75 ° C. for 5 minutes, it was thoroughly washed and immersed in a palladium-tin salt colloid catalyst solution for 5 minutes. After washing with water, the catalyst was immersed in a catalyst activation bath at room temperature for 8 minutes to remove excess tin salt from excess palladium-tin salt colloidal particles.
Subsequently, a desired plating circuit and a plating resist for forming a through hole were formed by a known method.

【0022】その後、70℃の無電解銅めっき液に10
時間浸漬し、多層プリント配線板用基板全面に約20μ
mの無電解めっき皮膜を形成し、アディティブ法多層プ
リント配線板を作製した。
Then, the electroless copper plating solution at 70 ° C. was used for 10 times.
Immerse for 20 hours, and apply about 20μ to the entire surface of the substrate for multilayer printed wiring board
m electroless plating film was formed to produce an additive method multilayer printed wiring board.

【0023】[0023]

【発明の効果】本発明の方法は、多層化の際にガラスク
ロスを使用せず、プレスを行わないため、低コストで多
層プリント配線板を製造することが可能であり、しかも
表面ビアホールの形成とアディティブめっきによる回路
形成により、高密度ファインパターンを有する多層プリ
ント配線板の製造に好適である。
According to the method of the present invention, since no glass cloth is used and no pressing is performed when forming a multi-layer structure, it is possible to manufacture a multi-layer printed wiring board at low cost, and moreover, a surface via hole is formed. It is suitable for manufacturing a multilayer printed wiring board having a high-density fine pattern by forming a circuit by additive plating.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の多層プリント配線板の製造方法を示す
工程の概略断面図 1 内層回路基板 2 回路銅箔 3 粗化された回路表面 4 光硬化型樹脂層 5 表面フォトビアホール 6 熱硬化型アディティブ接着剤フィルム 7 隆起し破壊したフィルム 8 表面ビアホール 9 めっきレジスト 10 めっき回路
FIG. 1 is a schematic cross-sectional view of steps showing a method for manufacturing a multilayer printed wiring board according to the present invention: 1 inner layer circuit board 2 circuit copper foil 3 roughened circuit surface 4 photocurable resin layer 5 surface photovia hole 6 thermosetting type Additive adhesive film 7 Raised and destroyed film 8 Surface via hole 9 Plating resist 10 Plating circuit

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H05K 3/28 F ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical indication H05K 3/28 F

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 下記の工程からなる多層プリント配線板
の製造方法。 (1)表面粗化された内層回路基板の両面又は片面に、
光硬化型樹脂を塗布し、露光・現像により表面ビアホー
ルを形成する工程、(2)該樹脂表面を平滑化研磨し、
その上に熱硬化型アディティブ接着剤フィルムを常圧に
てラミネートし、加熱硬化する工程、(3)表面ビアホ
ール上の隆起した接着剤樹脂部分とそれ以外の接着剤樹
脂部分を合わせて研磨し、表面平滑化および再度表面ビ
アホールを形成する工程、(4)アディティブ接着剤表
面を化学的に粗化し、無電解めっきする工程、
1. A method for manufacturing a multilayer printed wiring board comprising the following steps. (1) On both sides or one side of the surface-roughened inner layer circuit board,
A step of applying a photocurable resin and forming a surface via hole by exposure and development, (2) smoothing and polishing the surface of the resin,
A step of laminating a thermosetting additive adhesive film thereon under normal pressure and heating and curing, (3) polishing the adhesive resin portion raised on the surface via hole and the other adhesive resin portion together, and polishing. A step of smoothing the surface and forming a surface via hole again, (4) a step of chemically roughening the surface of the additive adhesive and performing electroless plating,
【請求項2】 下記の工程からなる多層プリント配線板
の製造方法。 (A)両面銅張板をエッチングし、内層回路を形成する
工程、(B)内層回路表面を粗化する工程、(C)内層
回路基板の両面又は片面に、液状の光硬化型樹脂を塗布
し、露光・現像により表面ビアホールを形成する工程、
(D)硬化した該樹脂表面を平滑化研磨し、その上に熱
硬化型アディティブ接着剤フィルムを常圧にてラミネー
トし、加熱硬化する工程、(E)表面ビアホール上の隆
起した接着剤樹脂部分とそれ以外の接着剤樹脂部分を合
わせて研磨し、表面平滑化および再度表面ビアホールを
形成する工程、(F)アディティブ接着剤表面を化学的
に微細粗化し、めっきレジストを施した後、無電解めっ
きする工程、
2. A method for manufacturing a multilayer printed wiring board, which comprises the following steps. (A) A step of etching a double-sided copper clad board to form an inner layer circuit, (B) a step of roughening the inner layer circuit surface, (C) applying a liquid photocurable resin to both sides or one side of the inner layer circuit board Then, the step of forming a surface via hole by exposure and development,
(D) A step of smoothing and polishing the surface of the cured resin, laminating a thermosetting additive adhesive film thereon under normal pressure, and heat curing, (E) a raised adhesive resin portion on the surface via hole And a step of polishing the other resin portion of the adhesive together to smooth the surface and form a surface via hole again, (F) after chemically roughening the surface of the additive adhesive and applying a plating resist, electroless Plating process,
JP14191094A 1994-06-23 1994-06-23 Manufacture of multilayer printed wiring board Pending JPH088534A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14191094A JPH088534A (en) 1994-06-23 1994-06-23 Manufacture of multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14191094A JPH088534A (en) 1994-06-23 1994-06-23 Manufacture of multilayer printed wiring board

Publications (1)

Publication Number Publication Date
JPH088534A true JPH088534A (en) 1996-01-12

Family

ID=15303011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14191094A Pending JPH088534A (en) 1994-06-23 1994-06-23 Manufacture of multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JPH088534A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5131635A (en) * 1990-05-29 1992-07-21 Magneco/Metrel, Inc. Impact pad with rising flow surface
US5133535A (en) * 1990-05-29 1992-07-28 Magneco/Metrel, Inc. Impact pad with horizontal flow guides
US5188796A (en) * 1990-05-29 1993-02-23 Magneco/Metrel, Inc. Tundish impact pad
JP2008016774A (en) * 2006-07-10 2008-01-24 Mitsubishi Paper Mills Ltd Method of manufacturing circuit board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5131635A (en) * 1990-05-29 1992-07-21 Magneco/Metrel, Inc. Impact pad with rising flow surface
US5133535A (en) * 1990-05-29 1992-07-28 Magneco/Metrel, Inc. Impact pad with horizontal flow guides
US5188796A (en) * 1990-05-29 1993-02-23 Magneco/Metrel, Inc. Tundish impact pad
JP2008016774A (en) * 2006-07-10 2008-01-24 Mitsubishi Paper Mills Ltd Method of manufacturing circuit board

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