JPH0881439A - Azetidinone compound and its production - Google Patents

Azetidinone compound and its production

Info

Publication number
JPH0881439A
JPH0881439A JP7018417A JP1841795A JPH0881439A JP H0881439 A JPH0881439 A JP H0881439A JP 7018417 A JP7018417 A JP 7018417A JP 1841795 A JP1841795 A JP 1841795A JP H0881439 A JPH0881439 A JP H0881439A
Authority
JP
Japan
Prior art keywords
group
formula
compound
alkyl group
substituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7018417A
Other languages
Japanese (ja)
Other versions
JP3787819B2 (en
Inventor
Nobuo Matsui
宣夫 松井
Tsutomu Inoue
勉 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Soda Co Ltd
Original Assignee
Nippon Soda Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Soda Co Ltd filed Critical Nippon Soda Co Ltd
Priority to JP01841795A priority Critical patent/JP3787819B2/en
Publication of JPH0881439A publication Critical patent/JPH0881439A/en
Application granted granted Critical
Publication of JP3787819B2 publication Critical patent/JP3787819B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Abstract

PURPOSE: To obtain an azetidinone compound using a not expensive raw material useful as an intermediate of a compound having an antimicrobial activity with easy handling and operation by reacting individually specific azetidinone derivative and an imide compound in the presence of a specific metallic compound and a base. CONSTITUTION: This aimed compound expressed by formula I (R is H or a removable protecting group; R<1> is a (protected) OH or a (substituted) alkyl; R<2> is a (substituted) alkyl; R<3> and R<4> are each a (substituted) alkyl or a (substituted) aryl; X is O or S) (e.g. N- (R)-2-[(3S,4R)-3-[(R)-1-t- butyldimethylsilyloxyethyl]-2-oxoazetidin-4-yl]propionyl}-o-chloro-N-i sopropyl- benzamide) is obtained by reacting an azetidinone derivative expressed by formula II and an imide compound of formula III in the presence of a compound of formula IV (M is a metal atom; Hal is a halogen; R is a lower alkyl, etc.; (n) and (m) are each 0 or 1-5; (n+m) is valence of M) and a base.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はカルバペネム系化合物の
有用な合成中間体であるアゼチジノン化合物およびその
製法、利用に関する。
TECHNICAL FIELD The present invention relates to an azetidinone compound which is a useful synthetic intermediate for a carbapenem compound, a process for producing the same, and use thereof.

【0002】[0002]

【従来の技術】カルバペネム系化合物の合成中間体とし
て一般式〔V′〕
2. Description of the Related Art As a synthetic intermediate for carbapenem compounds, a compound of the general formula [V ']

【0003】[0003]

【化8】 Embedded image

【0004】(式中、rは水素原子または容易に除去で
きる保護基を、r1 は保護されていてもよい水酸基もし
くはハロゲン原子で置換されていてもよいアルキル基
を、r2は置換されていてもよいアルキル基を示す。)
で表されるカルボン酸誘導体が重要で、その製造法がい
くつか提案されている。その中で特開昭62−2527
86号に一般式〔VI〕
(In the formula, r is a hydrogen atom or a protecting group which can be easily removed, r 1 is a hydroxyl group which may be protected or an alkyl group which may be substituted with a halogen atom, and r 2 is substituted. Represents an optionally substituted alkyl group.)
The carboxylic acid derivative represented by is important, and several production methods thereof have been proposed. Among them, JP-A-62-2527
General formula [VI] for No. 86

【0005】[0005]

【化9】 [Chemical 9]

【0006】(式中、r1 及びr2 は前記と同じ意味
を、rは水素原子または容易に除去できるNの保護基を
示し、r5 は置換基を有していてもよい隣接する2個の
炭素原子と一緒になって形成する芳香族基を、X′は酸
素原子、硫黄原子、SO、SO2又はNr6 (r6 は水
素原子、アルキル基またはフェニル基を示す。)を、
Y′は酸素原子、硫黄原子、又はNr7 (r7 は水素原
子、アルキル基またはフェニル基を示す。)を示す。〕
で表される4−置換アゼチジノンが容易に加水分解され
て一般式〔V′〕で表されるカルボン酸誘導体になるこ
とが記載されている。
(In the formula, r 1 and r 2 have the same meanings as described above, r represents a hydrogen atom or a protecting group for N which can be easily removed, and r 5 is adjacent to an optionally substituted 2 X'is an oxygen atom, a sulfur atom, SO, SO 2 or Nr 6 (r 6 is a hydrogen atom, an alkyl group or a phenyl group).
Y'represents an oxygen atom, a sulfur atom, or Nr 7 (r 7 represents a hydrogen atom, an alkyl group or a phenyl group). ]
It is described that the 4-substituted azetidinone represented by the formula (4) is easily hydrolyzed to a carboxylic acid derivative represented by the general formula [V '].

【0007】また、Tetrahedron Let
t.Vol.27 5687〜5690(1986)に
一般式〔VII 〕
[0007] In addition, Tetrahedron Let
t. Vol. 27 5687-5690 (1986) in general formula [VII]

【0008】[0008]

【化10】 (式中、X′は前記と同じ意味を示し、r8 およびr9
はそれぞれ水素原子又はメチル基を示す。)で表される
化合物が示されている。
[Chemical 10] (In the formula, X ′ has the same meaning as described above, and r 8 and r 9
Each represents a hydrogen atom or a methyl group. ) Is shown.

【0009】しかし、これらの一般式〔VI〕及び〔VII
〕で表される4−置換アゼチジノン誘導体は高価なボ
ロントリフレートあるいはスズトリフレートを使用して
製造しており工業的に適していない。
However, these general formulas [VI] and [VII]
] The 4-substituted azetidinone derivative represented by the above formula is not industrially suitable because it is produced using expensive boron triflate or tin triflate.

【0010】また、WO 93/13064(PCT/
JP92/01698)にこれらの欠点を改良する方法
として、一般式〔II′〕
In addition, WO 93/13064 (PCT /
JP92 / 01698), a general formula [II ']

【0011】[0011]

【化11】 (式中、r′は水素原子または容易に除去できる保護基
を、r′1 は保護されていてもよい水酸基もしくはハロ
ゲン原子で置換されていてもよいアルキル基を、z′は
脱離基を示す)で表されるアゼチジノン誘導体と一般式
〔III ′〕
[Chemical 11] (In the formula, r ′ represents a hydrogen atom or a protecting group which can be easily removed, r ′ 1 represents a hydroxyl group which may be protected or an alkyl group which may be substituted with a halogen atom, and z ′ represents a leaving group. ) And an azetidinone derivative represented by the general formula [III ′]

【化12】 (式中、r′2 は水素原子、アルキル基を、r′3 はア
ルキル基、トリアルキルシリル基、アルキル基・アルコ
キシ基・ニトロ基もしくはハロゲン原子で置換されてい
てもよいフェニル基、シクロアルキル基、ナフチル基、
アントラセニル基、フルオレニル基、ベンズチアゾリル
基、ナフタリミジル基を、r′4 は電子吸引基を表すか
あるいはr′3 とr′4 が一緒になって環を形成す
る。)で表される化合物とを一般式〔IV′〕 Ti(Cl)n(Or′5 )m 〔IV′〕 (式中、r′5 は低級アルキル基を示し、0≦n≦4、
0≦m≦4かつn+m=4である。)で表される化合物
及び塩基の存在下で反応させ、一般式〔I′〕
[Chemical 12] (Wherein, r '2 is a hydrogen atom, an alkyl group, r' 3 is an alkyl group, trialkylsilyl group, an alkyl group, an alkoxy group, a nitro group or an optionally substituted phenyl group with a halogen atom, a cycloalkyl Group, naphthyl group,
Anthracenyl group, a fluorenyl group, a benzothiazolyl group, a naphthalimidyl group, r '4 is or r represents an electron withdrawing group' to form a ring 3 and r '4 together. ) Is a compound represented by the general formula [IV ′] Ti (Cl) n (Or ′ 5 ) m [IV ′] (in the formula, r ′ 5 represents a lower alkyl group, 0 ≦ n ≦ 4,
0 ≦ m ≦ 4 and n + m = 4. ) In the presence of a compound represented by the formula) and a base, the compound of the general formula [I ′]

【化13】 (式中、r′は水素原子または容易に除去できる保護基
を、r′1 は保護されていてもよい水酸基もしくはハロ
ゲン原子で置換されていてもよいアルキル基を、r′2
は水素原子、アルキル基を、r′3 はアルキル基、トリ
アルキルシリル基、アルキル基・アルコキシ基・ニトロ
基もしくはハロゲン原子で置換されていてもよいフェニ
ル基、シクロアルキル基、ナフチル基、アントラセニル
基、フルオレニル基、ベンズチアゾリル基、ナフタリミ
ジル基を、r′4 は電子吸引基を表すかあるいはr′3
とr′4 が一緒になって環を形成する。)で表される化
合物の製造方法が示されている。
[Chemical 13] (In the formula, r ′ represents a hydrogen atom or a protecting group which can be easily removed, r ′ 1 represents a hydroxyl group which may be protected or an alkyl group which may be substituted with a halogen atom, r ′ 2
Is a hydrogen atom or an alkyl group, and r ′ 3 is an alkyl group, a trialkylsilyl group, an alkyl group, an alkoxy group, a nitro group or a phenyl group which may be substituted with a halogen atom, a cycloalkyl group, a naphthyl group, an anthracenyl group. , Fluorenyl group, benzthiazolyl group, naphthalimidyl group, r ′ 4 represents an electron withdrawing group or r ′ 3
And r '4 are taken together to form a ring. ) Is shown.

【0012】その中で式1Equation 1

【化14】 において、プロピオニル部2位の炭素の絶対配置がSで
ある化合物(C)が主生成物として得られたことが記載
されている。
Embedded image Describes that the compound (C) in which the absolute configuration of the carbon at the 2-position of the propionyl moiety is S was obtained as the main product.

【0013】[0013]

【発明が解決しようとする課題】本発明は抗菌剤として
有用な1β−メチルカルバペネム系化合物の中間体を提
供するものである。
The present invention provides intermediates of 1β-methylcarbapenem compounds useful as antibacterial agents.

【0014】[0014]

【課題を解決するための手段】本発明者らは、式1中の
化合物(B)に着目し、ベンゼン環部は無置換体だけし
か実施されていないことから、置換基の導入、アルキル
基への変換を鋭意検討した結果、置換ベンゼン化合物、
アルキル化合物よりプロピオニル部2位の炭素の絶対配
置がRである化合物を主生成物として得られることを見
いだし、本発明を完成するに至った。
Means for Solving the Problems The present inventors have focused on the compound (B) in the formula 1, and since only the non-substituted benzene ring part has been implemented, introduction of a substituent, alkyl group As a result of diligent study of conversion into a substituted benzene compound,
It was found that a compound in which the absolute configuration of the carbon at the 2-position of the propionyl moiety is R is obtained as the main product from an alkyl compound, and the present invention has been completed.

【0015】即ち、本発明は一般式〔I〕That is, the present invention has the general formula [I]

【化15】 (式中、Rは水素原子または容易に除去できる保護基
を、R1 は保護されていてもよい水酸基もしくはハロゲ
ン原子で置換されていてもよいアルキル基を、R2は置
換されていてもよいアルキル基を、R3 、R4 は同一も
しくは相異なって、置換されていてもよいアルキル基ま
たは置換アリール基を示し、Xは酸素原子または硫黄原
子を示す。ただしR3 がイソプロピルでかつR4 が無置
換フェニル基でかつXが酸素原子の場合を除く)で表さ
れるアゼチジノン化合物、その製造方法およびその利用
方法に関する。
[Chemical 15] (In the formula, R is a hydrogen atom or a protecting group which can be easily removed, R 1 is an optionally protected hydroxyl group or an alkyl group which may be substituted with a halogen atom, and R 2 is optionally substituted. An alkyl group, R 3 and R 4 are the same or different and each represents an optionally substituted alkyl group or a substituted aryl group, X is an oxygen atom or a sulfur atom, provided that R 3 is isopropyl and R 4 Is an unsubstituted phenyl group and X is an oxygen atom), a method for producing the same, and a method for using the same.

【0016】Nの保護基Rは一般にNを保護するために
用いられている保護基が使用できる。その具体例として
は、トリメチルシリル、トリエチルシリル、t−ブチル
ジメチルシリル、トリイソプロピルシリル、ジメチルヘ
キシルシリル、t−ブチルジフェニルシリル、ジメチル
クミルシリル等のトリ置換シリル基、置換されていても
よいベンジル基(置換基としてはニトロ基、低級アルコ
キシ基等が挙げられる。)、低級アルコキシカルボニル
基、ハロゲノ低級アルコキシカルボニル基、置換されて
いてもよいベンジルオキシカルボニル基(置換基として
はニトロ基、低級アルコキシ基等が挙げられる。)、ア
セチル基、ベンゾイル基等のアシル基等が例示される。
As the protecting group R for N, a protecting group generally used for protecting N can be used. Specific examples thereof include trisubstituted silyl groups such as trimethylsilyl, triethylsilyl, t-butyldimethylsilyl, triisopropylsilyl, dimethylhexylsilyl, t-butyldiphenylsilyl, dimethylcumylsilyl, and optionally substituted benzyl groups. (Examples of the substituent include a nitro group and a lower alkoxy group.), A lower alkoxycarbonyl group, a halogeno lower alkoxycarbonyl group, and an optionally substituted benzyloxycarbonyl group (the substituents are a nitro group and a lower alkoxy group. And the like), and an acyl group such as an acetyl group and a benzoyl group.

【0017】R1 における水酸基の保護基としては一般
に水酸基を保護するのに用いられている保護基が使用で
きる。その具体例としては、トリメチルシリル、トリエ
チルシリル、t−ブチルジメチルシリル、トリイソプロ
ピルシリル、ジメチルヘキシルシリル、t−ブチルジフ
ェニルシリル、ジメチルクミルシリル等のトリ置換シリ
ル基、置換されていてもよいベンジル基(置換基として
はニトロ基、低級アルコキシ基等が挙げられる。)、低
級アルコキシカルボニル基、ハロゲノ低級アルコキシカ
ルボニル基、置換されていてもよいベンジルオキシカル
ボニル基(置換基としてはニトロ基、低級アルコキシ基
等が挙げられる。)、アセチル基、ベンゾイル基等のア
シル基、トリフェニルメチル基、テトラヒドロピラニル
基等が例示される。
As the hydroxyl-protecting group for R 1 , a protecting group generally used for protecting a hydroxyl group can be used. Specific examples thereof include trisubstituted silyl groups such as trimethylsilyl, triethylsilyl, t-butyldimethylsilyl, triisopropylsilyl, dimethylhexylsilyl, t-butyldiphenylsilyl, dimethylcumylsilyl, and optionally substituted benzyl groups. (Examples of the substituent include a nitro group and a lower alkoxy group.), A lower alkoxycarbonyl group, a halogeno lower alkoxycarbonyl group, and an optionally substituted benzyloxycarbonyl group (the substituents are a nitro group and a lower alkoxy group. And the like), an acetyl group, an acyl group such as a benzoyl group, a triphenylmethyl group, a tetrahydropyranyl group, and the like.

【0018】R2 のアルキル基としては、メチル、エチ
ル、プロピル、イソプロピル、ブチル等の炭素数1から
5までの低級アルキル基を、またその置換基としては、
低級アルコキシ基、ハロゲン原子等が挙げられる。
The alkyl group of R 2 is a lower alkyl group having 1 to 5 carbon atoms such as methyl, ethyl, propyl, isopropyl and butyl, and the substituent thereof is
Examples include lower alkoxy groups and halogen atoms.

【0019】R3 、R4 のアルキル基としては、メチ
ル、エチル、プロピル、イソプロピル、ブチル、ペンチ
ル、ヘキシル等の炭素数1から12の低級アルキル基
を、中でもR3 のアルキル基として好ましくは、イソプ
ロピル、t−ブチル、イソブチル、s−ブチル、ネオペ
ンチル、シクロヘキシル等の分岐もしくは環状のアルキ
ル基が、またその置換基としては、フェニル基、低級ア
ルコキシ基、ハロゲン原子等が挙げられる。
As the alkyl group for R 3 and R 4 , a lower alkyl group having 1 to 12 carbon atoms such as methyl, ethyl, propyl, isopropyl, butyl, pentyl and hexyl is preferable, and among them, the alkyl group for R 3 is preferably A branched or cyclic alkyl group such as isopropyl, t-butyl, isobutyl, s-butyl, neopentyl, cyclohexyl and the like, and a substituent thereof include a phenyl group, a lower alkoxy group, a halogen atom and the like.

【0020】R3 、R4 のアリール基としては、フェニ
ル基、ナフチル基、アントラセニル基等が挙げられる。
またその置換基としては、例えばフッ素、塩素、臭素等
のハロゲン原子、メチル、エチル、プロピル、イソプロ
ピル、ブチル、イソブチル、s−ブチル、t−ブチル等
の低級アルキル基、メトキシ、エトキシ、プロポキシ等
の低級アルコキシ基、フェニル基、アルキルチオ基、置
換アミノ基、ニトロ基、シアノ基等が例示される。
Examples of the aryl group of R 3 and R 4 include a phenyl group, a naphthyl group and an anthracenyl group.
Examples of the substituent include halogen atoms such as fluorine, chlorine and bromine, lower alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, s-butyl and t-butyl, methoxy, ethoxy and propoxy. Examples include lower alkoxy groups, phenyl groups, alkylthio groups, substituted amino groups, nitro groups, cyano groups and the like.

【0021】Zの脱離基としては、直鎖、分岐または環
状のアルカノイルオキシ、単環または双環のヘテロ原子
を有してもよいアロイルオキシ、アリールアルカノイル
オキシ、アルキルスルホニルオキシ、アリールスルホニ
ルオキシ、カルバモイルオキシ、アルコキシカルボキ
シ、アラルコキシカルボキシ、アルコキシアルカノイル
オキシ等のアシルオキシ基、アルカノイルチオ、アロイ
ルチオ等のアシルチオ基、アルキルスルフィニル、アリ
ールスルフィニル等のスルフィニル基、アルキルスルホ
ニル、アリールスルホニル等のスルホニル基、フッ素、
塩素、臭素等のハロゲン原子等が例示できる。
The leaving group for Z is linear, branched or cyclic alkanoyloxy, aroyloxy optionally having a monocyclic or bicyclic heteroatom, arylalkanoyloxy, alkylsulfonyloxy, arylsulfonyloxy, carbamoyl. Oxy, alkoxycarboxy, aralkoxycarboxy, acyloxy groups such as alkoxyalkanoyloxy, alkanoylthio, acylthio groups such as aroylthio, alkylsulfinyl, sulfinyl groups such as arylsulfinyl, alkylsulfonyl, sulfonyl groups such as arylsulfonyl, fluorine,
Examples thereof include halogen atoms such as chlorine and bromine.

【0022】塩基としては第2、第3級アミン類及びピ
リジン類が挙げられ、例えばジメチルアミン、ジエチル
アミン、ジイソプロピルアミン、ジシクロヘキシルアミ
ン等のアルキルアミン類、N−メチルアニリン等のアル
キルアニリン類、ピペリジン、ピロリジン、2,2,
6,6−テトラメチルピペリジン、モルホリン、ピペラ
ジン等の複素環状アミン類等の2級アミン、ジイソプロ
ピルエチルアミン、ジイソプロピルメチルアミン、トリ
エチルアミン等のアルキルアミン類、N,N−ジメチル
アニリン等のジアルキルアニリン類、1−エチルピペリ
ジン、1−メチルモルホリン、1−エチルピロリジン、
1,4−ジアザビシクロ〔2,2,2〕オクタン、1,
8−ジアザビシクロ〔5,4,0〕−7−ウンデセン等
の複素環状のアミン類もしくはN,N,N′,N′−テ
トラメチルエチレンジアミン等のジアミン類等の第3級
アミン、α、βまたはγ−ピコリン、1,2−、2,4
−、2,5−、2,6−、3,4−、3,5−ルチジ
ン、2,4,6−コリジン等のアルキルピリジン、ジメ
チルアミノピリジンのようなジアルキルピリジン、キノ
リンのような縮合複素環化されたピリジン等のピリジン
類等が例示できる。
Examples of the base include secondary and tertiary amines and pyridines. Examples thereof include alkylamines such as dimethylamine, diethylamine, diisopropylamine and dicyclohexylamine, alkylanilines such as N-methylaniline, piperidine, and the like. Pyrrolidine, 2,2
Secondary amines such as heterocyclic amines such as 6,6-tetramethylpiperidine, morpholine and piperazine, alkylamines such as diisopropylethylamine, diisopropylmethylamine and triethylamine, dialkylanilines such as N, N-dimethylaniline, 1 -Ethylpiperidine, 1-methylmorpholine, 1-ethylpyrrolidine,
1,4-diazabicyclo [2,2,2] octane, 1,
Heterocyclic amines such as 8-diazabicyclo [5,4,0] -7-undecene or tertiary amines such as diamines such as N, N, N ', N'-tetramethylethylenediamine, α, β or γ-picoline, 1,2-, 2,4
-, 2,5-, 2,6-, 3,4-, 3,5-lutidine, alkyl pyridines such as 2,4,6-collidine, dialkyl pyridines such as dimethylaminopyridine, condensed heterocycles such as quinoline Examples thereof include pyridines such as cyclized pyridine.

【0023】一般式〔I〕で表される化合物の製造にお
いて、反応は塩化メチレン、クロロホルム等の塩素系溶
媒、クロルベンゼン、トルエン等の芳香族系溶媒、アセ
トニトリル等の極性溶媒等の有機溶媒、或いはこれらの
混合溶媒中、一般式〔III 〕で表されるイミド化合物と
一般式〔IV〕で表される金属化合物及びアミン、アニリ
ンまたはピリジン類等でエノレートを生成させ、このエ
ノレートと一般式〔II〕で表されるアゼチジノン誘導体
とを反応させる。本反応はエノレートの生成及びエノレ
ートとアゼチジノン誘導体との反応とも−50℃〜10
0℃、とりわけ−20℃〜50℃で行うのが好ましい。
In the production of the compound represented by the general formula [I], the reaction is a chlorine-based solvent such as methylene chloride or chloroform, an aromatic solvent such as chlorobenzene or toluene, an organic solvent such as a polar solvent such as acetonitrile, Alternatively, in these mixed solvents, an enolate is formed with an imide compound represented by the general formula [III] and a metal compound represented by the general formula [IV] and an amine, aniline or pyridine, and the enolate and the general formula [ II] is reacted with the azetidinone derivative. This reaction is carried out at -50 ° C. to 10 ° C. for both formation of enolate and reaction of enolate with azetidinone derivative
It is preferably carried out at 0 ° C., especially −20 ° C. to 50 ° C.

【0024】一般式〔III 〕で表されるイミド化合物、
一般式〔IV〕で表される金属化合物及び塩基の使用量
は、一般式〔II〕で表されるアゼチジノン誘導体1モル
に対し、それぞれ1〜4モルが適当である。
An imide compound represented by the general formula [III],
The amount of the metal compound represented by the general formula [IV] and the base used is appropriately 1 to 4 mol per 1 mol of the azetidinone derivative represented by the general formula [II].

【0025】また、一般式〔I〕で表される化合物は加
水分解することにより、一般式〔V〕で表されるカルボ
ン酸誘導体へ変換することが出来る。
The compound represented by the general formula [I] can be converted into the carboxylic acid derivative represented by the general formula [V] by hydrolysis.

【0026】[0026]

【化16】 Embedded image

【0027】本加水分解反応は、通常の方法により実施
できるが、例えば適当な溶媒中、水酸化ナトリウム、水
酸化カリウム、水酸化リチウム等のアルカリ金属水酸化
物を、過酸化水素の存在下または非存在下に用いること
により実施される。溶媒としては例えばメタノール、エ
タノール等のアルコール類、アセトン、テトラヒドロフ
ラン、ジオキサン、ジメチルホルムアミド等の有機溶媒
と水の混合溶媒が使用される。アルカリ金属水酸化物の
使用量は一般式〔I〕で表される化合物1モルに対し、
1〜8モル、好ましくは2〜4モルであり、過酸化水素
を使用する場合、その使用量は1〜8モル、とりわけ2
〜4モルが好ましい。また、反応温度は−10〜80
℃、とりわけ0〜40℃が好ましい。反応終了後は通常
の後処理をすることにより、目的物を得ることが出来
る。
This hydrolysis reaction can be carried out by a conventional method. For example, alkali metal hydroxides such as sodium hydroxide, potassium hydroxide and lithium hydroxide in a suitable solvent in the presence of hydrogen peroxide or It is carried out by using in the absence. As the solvent, for example, alcohols such as methanol and ethanol, an organic solvent such as acetone, tetrahydrofuran, dioxane and dimethylformamide, and a mixed solvent of water are used. The amount of the alkali metal hydroxide used is 1 mol of the compound represented by the general formula [I].
1 to 8 mol, preferably 2 to 4 mol. When hydrogen peroxide is used, the amount used is 1 to 8 mol, especially 2
-4 mol is preferred. The reaction temperature is -10 to 80.
° C, especially 0-40 ° C is preferred. After the completion of the reaction, the target product can be obtained by performing usual post-treatment.

【0028】なお、一般式〔III 〕で表される化合物
は、例えば一般式
The compound represented by the general formula [III] is, for example, a compound represented by the general formula

【化17】 (式中、R3 、R4 は同一又は相異なって、置換されて
いてもよいアルキル基又は置換されていてもよいアリー
ル基を示し、Xは酸素原子または硫黄原子を示す。)で
表される化合物と一般式
[Chemical 17] (In the formula, R 3 and R 4 are the same or different and each represents an optionally substituted alkyl group or an optionally substituted aryl group, and X represents an oxygen atom or a sulfur atom). Compounds and general formula

【化18】 (式中、R2 は置換されていてもよいアルキル基を示
し、Yはクロル、ブロム等のハロゲン原子を示す。)で
表される化合物とを反応させるか或いは一般式
[Chemical 18] (In the formula, R 2 represents an optionally substituted alkyl group, and Y represents a halogen atom such as chlorine or bromine.) Or a compound represented by the general formula

【化19】 (式中、R2 、R3 は前記と同じ意味を示す。)と一般
[Chemical 19] (Wherein R 2 and R 3 have the same meanings as described above) and the general formula

【化20】 (式中、R4 、Xは前記と同じ意味を示し、Zはクロ
ル、ブロム等のハロゲン原子を示す。)で表される化合
物とを適当な溶媒中(例えば、塩化メチレン等のハロゲ
ン系溶媒、酢酸エチル等のエステル系溶媒、トルエン等
の炭化水素系溶媒、テトラヒドロフラン等のエーテル系
溶媒、アセトニトリル、ジメチルホルムアミド等)、脱
酸剤(例えばトリエチルアミン、ピリジン等の有機塩基
化合物、水素化ナトリウム、t−ブトキシドカリウム、
水酸化ナトリウム、炭酸カリウム等)の存在下に−50
℃〜溶媒の沸点温度、好ましくは−20℃〜90℃で反
応させることにより製造できる。
Embedded image (Wherein R 4 and X have the same meanings as described above, and Z represents a halogen atom such as chlorine and bromine) in a suitable solvent (for example, a halogen-based solvent such as methylene chloride). , An ester solvent such as ethyl acetate, a hydrocarbon solvent such as toluene, an ether solvent such as tetrahydrofuran, acetonitrile, dimethylformamide and the like), a deoxidizing agent (for example, an organic base compound such as triethylamine and pyridine, sodium hydride, t -Potassium butoxide,
-50 in the presence of sodium hydroxide, potassium carbonate, etc.)
It can be produced by reacting at a temperature of from ℃ to the boiling point of the solvent, preferably from -20 to 90 ° C.

【0029】[0029]

【実施例】次に実施例を挙げ本発明をさらに詳細に説明
する。 実施例1 N−{(R)−2−〔(3S,4R)−3−[(R)−
1−t−ブチルジメチルシリロキシエチル]−2−オキ
ソアゼチジン−4−イル〕プロピオニル}−o−クロロ
−N−イソプロピルベンズアミド
EXAMPLES Next, the present invention will be described in more detail by way of examples. Example 1 N-{(R) -2-[(3S, 4R) -3-[(R)-
1-t-Butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionyl} -o-chloro-N-isopropylbenzamide

【化21】 o−クロロ−N−イソプロピル−N−プロピオニルベン
ズアミド8.12gの塩化メチレン80mlの溶液に四
塩化チタン6.45gを0℃にて滴下した。次に同温度
で、ジイソプロピルエチルアミン4.14gを滴下した
のち、(3R,4R)−4−アセトキシ−3−〔(R)
−1−t−ブチルジメチルシリロキシエチル〕アゼチジ
ン−2−オン5.75gを10℃にて加えた。反応混合
物を20〜25℃で1.5時間攪拌したのち、冷水にあ
け、塩化メチレン層を水洗した。塩化メチレン層を無水
硫酸マグネシウムで乾燥し、塩化メチレンを留去した。
残渣にn−ヘキサンを加え析出した結晶を濾取し、酢酸
エチル−n−ヘキサンより再結晶して白色結晶7.43
gを得た。 m.p. 146〜148℃
[Chemical 21] 6.45 g of titanium tetrachloride was added dropwise to a solution of 8.12 g of o-chloro-N-isopropyl-N-propionylbenzamide in 80 ml of methylene chloride at 0 ° C. Next, 4.14 g of diisopropylethylamine was added dropwise at the same temperature, and then (3R, 4R) -4-acetoxy-3-[(R)
5.75 g of -1-t-butyldimethylsilyloxyethyl] azetidin-2-one was added at 10 ° C. The reaction mixture was stirred at 20 to 25 ° C for 1.5 hr, poured into cold water, and the methylene chloride layer was washed with water. The methylene chloride layer was dried over anhydrous magnesium sulfate, and methylene chloride was distilled off.
Crystals precipitated by adding n-hexane to the residue were collected by filtration and recrystallized from ethyl acetate-n-hexane to give white crystals 7.43.
g was obtained. m. p. 146-148 ° C

【0030】実施例2 N−{(R)−2−〔(3S,4R)−3−[(R)−
1−t−ブチルジメチルシリロキシエチル]−2−オキ
ソアゼチジン−4−イル〕プロピオニル}−N−シクロ
ヘキシル−p−メチルベンズアミド
Example 2 N-{(R) -2-[(3S, 4R) -3-[(R)-
1-t-Butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionyl} -N-cyclohexyl-p-methylbenzamide

【化22】 N−シクロヘキシル−p−メチル−N−プロピオニルベ
ンズアミド6.40gの塩化メチレン60mlの溶液に
四塩化チタン4.72gを0℃にて滴下した。次に同温
度で、トリエチルアミン2.37gを滴下したのち、
(3R,4R)−4−アセトキシ−3−〔(R)−1−
t−ブチルジメチルシリロキシエチル〕アゼチジン−2
−オン4.20gを10℃にて加えた。反応混合物を2
0〜25℃で1.5時間攪拌したのち、冷水にあけ、塩
化メチレン層を水洗した。塩化メチレン層を無水硫酸マ
グネシウムで乾燥し、塩化メチレンを留去した。残渣に
n−ヘキサンを加え析出した結晶を濾取し、酢酸エチル
−n−ヘキサンより再結晶して白色結晶を3.50gを
得た。母液を集めて濃縮し、残渣をシリカゲルカラムク
ロマトにより精製してさらに1.6gを得た。m.p.
158〜161℃
[Chemical formula 22] 4.72 g of titanium tetrachloride was added dropwise at 0 ° C. to a solution of 6.40 g of N-cyclohexyl-p-methyl-N-propionylbenzamide in 60 ml of methylene chloride. Next, after adding 2.37 g of triethylamine dropwise at the same temperature,
(3R, 4R) -4-acetoxy-3-[(R) -1-
t-Butyldimethylsilyloxyethyl] azetidine-2
4.20 g of ONE was added at 10 ° C. 2 reaction mixtures
After stirring at 0 to 25 ° C for 1.5 hours, the mixture was poured into cold water and the methylene chloride layer was washed with water. The methylene chloride layer was dried over anhydrous magnesium sulfate, and methylene chloride was distilled off. Crystals precipitated by adding n-hexane to the residue were collected by filtration and recrystallized from ethyl acetate-n-hexane to obtain 3.50 g of white crystals. The mother liquor was collected and concentrated, and the residue was purified by silica gel column chromatography to obtain another 1.6 g. m. p.
158-161 ° C

【0031】実施例3〜10 対応するN−プロピオニルベンズアミド化合物と(3
R,4R)−4−アセトキシ−3−〔(R)−1−t−
ブチルジメチルシリロキシエチル〕アゼチジン−2−オ
ンとを実施例1、2と同様に処理して、下記表−1に記
載の化合物が得られた。
Examples 3-10 Corresponding N-propionylbenzamide compounds and (3
R, 4R) -4-acetoxy-3-[(R) -1-t-
Butyldimethylsilyloxyethyl] azetidin-2-one was treated in the same manner as in Examples 1 and 2 to obtain the compounds shown in Table 1 below.

【0032】[0032]

【化23】 [Chemical formula 23]

【0033】 実施例4の化合物の 1H NMRデータ(CDCl3
δ(ppm):7.(2H;d),7.5(2H;
d),6.3(1H;brs),4.5(1H;m),
4.1(1H;m),3.8(1H;m),2.9(1
H,m),2.7(1H;m),1.4(6H;d),
1.1(3H;d),1.0(3H;d),0.9(9
H;s),0.1(3H;s),0.0(3H;s)
[0033] 1 H NMR data (CDCl 3 ) of the compound of Example 4
δ (ppm): 7. (2H; d), 7.5 (2H;
d), 6.3 (1H; brs), 4.5 (1H; m),
4.1 (1H; m), 3.8 (1H; m), 2.9 (1
H, m), 2.7 (1H; m), 1.4 (6H; d),
1.1 (3H; d), 1.0 (3H; d), 0.9 (9
H; s), 0.1 (3H; s), 0.0 (3H; s)

【0034】実施例11 N−{(R)−2−〔(3S,4R)−3−[(R)−
1−t−ブチルジメチルシリロキシエチル]−2−オキ
ソアゼチジン−4−イル〕プロピオニル}−N−イソプ
ロピル−o−メトキシベンズアミド
Example 11 N-{(R) -2-[(3S, 4R) -3-[(R)-
1-t-Butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionyl} -N-isopropyl-o-methoxybenzamide

【化24】 N−イソプロピル−o−メトキシ−N−プロピオニルベ
ンズアミド4.30gの塩化メチレン40mlの溶液に
四塩化ジルコニウム4.01gを0℃にて滴下した。次
に同温度で、ジイソプロピルエチルアミン2.22gを
滴下したのち、(3R,4R)−4−アセトキシ−3−
〔(R)−1−t−ブチルジメチルシリロキシエチル〕
アゼチジン−2−オン3.10gを10℃にて加えた。
反応混合物を20〜25℃で1.5時間攪拌したのち、
冷水にあけ、塩化メチレン層を水洗した。塩化メチレン
層を無水硫酸マグネシウムで乾燥し、塩化メチレンを留
去した。残渣にn−ヘキサンを加え析出した結晶を濾取
し、酢酸エチル−n−ヘキサンより再結晶して白色結晶
2.50gを得た。
[Chemical formula 24] To a solution of 4.30 g of N-isopropyl-o-methoxy-N-propionylbenzamide in 40 ml of methylene chloride, 4.01 g of zirconium tetrachloride was added dropwise at 0 ° C. Next, after adding 2.22 g of diisopropylethylamine at the same temperature, (3R, 4R) -4-acetoxy-3-
[(R) -1-t-butyldimethylsilyloxyethyl]
3.10 g of azetidin-2-one was added at 10 ° C.
After stirring the reaction mixture at 20-25 ° C. for 1.5 hours,
It was poured into cold water and the methylene chloride layer was washed with water. The methylene chloride layer was dried over anhydrous magnesium sulfate, and methylene chloride was distilled off. Crystals precipitated by adding n-hexane to the residue were collected by filtration and recrystallized from ethyl acetate-n-hexane to obtain 2.50 g of white crystals.

【0035】実施例12 N−{(R)−2−〔(3S,4R)−3−[(R)−
1−t−ブチルジメチルシリロキシエチル]−2−オキ
ソアゼチジン−4−イル〕プロピオニル}−N−イソプ
ロピル−プロピオンアミド
Example 12 N-{(R) -2-[(3S, 4R) -3-[(R)-
1-t-Butyldimethylsiloxyethyl] -2-oxoazetidin-4-yl] propionyl} -N-isopropyl-propionamide

【化25】 N−イソプロピル−N−プロピオニルプロピオンアミド
3.4gの塩化メチレン50mlの溶液に四塩化チタン
4.1gを5℃にて滴下した。次に同温度で、ジイソプ
ロピルエチルアミン2.5gを滴下したのち、(3R,
4R)−4−アセトキシ−3−〔(R)−1−t−ブチ
ルジメチルシリロキシエチル〕アゼチジン−2−オン
3.8gを10℃にて加えた。反応混合物を20〜25
℃で1.5時間攪拌したのち、冷水にあけ、塩化メチレ
ン層を水洗した。塩化メチレン層を無水硫酸マグネシウ
ムで乾燥し、塩化メチレンを留去した。残渣にn−ヘキ
サンを加え析出した結晶を濾取し、酢酸エチル−n−ヘ
キサンより再結晶して白色結晶2.8gを得た。 m.p.91〜92℃
[Chemical 25] To a solution of 3.4 g of N-isopropyl-N-propionylpropionamide in 50 ml of methylene chloride, 4.1 g of titanium tetrachloride was added dropwise at 5 ° C. Next, 2.5 g of diisopropylethylamine was added dropwise at the same temperature, and then (3R,
3.8 g of 4R) -4-acetoxy-3-[(R) -1-t-butyldimethylsilyloxyethyl] azetidin-2-one were added at 10 ° C. 20-25 reaction mixture
After stirring at ℃ for 1.5 hours, it was poured into cold water and the methylene chloride layer was washed with water. The methylene chloride layer was dried over anhydrous magnesium sulfate, and methylene chloride was distilled off. Crystals precipitated by adding n-hexane to the residue were collected by filtration and recrystallized from ethyl acetate-n-hexane to obtain 2.8 g of white crystals. m. p. 91-92 ° C

【0036】実施例13 (R)−2−〔(3S,4S)−3−[(R)−1−t
−ブチルジメチルシリロキシエチル]−2−オキソアゼ
チジン−4−イル〕プロピオン酸
Example 13 (R) -2-[(3S, 4S) -3-[(R) -1-t
-Butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionic acid

【化26】 実施例1の化合物、N−{(R)−2−〔(3S,4
R)−3−[(R)−1−t−ブチルジメチルシリロキ
シエチル]−2−オキソアゼチジン−4−イル〕プロピ
オニル}−o−クロロ−N−イソプロピルベンズアミド
0.48gの水メタノール混合溶媒(2:1、10m
l)の懸濁液に30%過酸化水素水0.3gを室温にて
加えた。ついで同温度で28%水酸化ナトリウム水溶液
0.29gを滴下し、さらに1時間攪拌した。反応終了
後、水10mlを添加し、塩化メチレンで洗浄したの
ち、水層を35%塩酸水溶液を加えて酸析した。析出し
た結晶を濾取し、水洗後良く乾燥して白色結晶0.25
gを得た。NMR,1Rスペクトル、HPLCより目的
の(R)−2−〔(3S,4S)−3−[(R)−1−
t−ブチルジメチルシリロキシエチル]−2−オキソア
ゼチジン−4−イル〕プロピオン酸であることを確認し
た。
[Chemical formula 26] The compound of Example 1, N-{(R) -2-[(3S, 4
R) -3-[(R) -1-t-butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionyl} -o-chloro-N-isopropylbenzamide 0.48 g in water / methanol mixed solvent (2 : 1, 10m
0.3 g of 30% hydrogen peroxide solution was added to the suspension of 1) at room temperature. Then, 0.29 g of 28% aqueous sodium hydroxide solution was added dropwise at the same temperature, and the mixture was further stirred for 1 hour. After completion of the reaction, 10 ml of water was added and washed with methylene chloride, and then the aqueous layer was acidified by adding a 35% hydrochloric acid aqueous solution. Precipitated crystals were collected by filtration, washed with water and dried well to give white crystals 0.25
g was obtained. Target (R) -2-[(3S, 4S) -3-[(R) -1-] from NMR, 1R spectrum and HPLC
It was confirmed to be t-butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionic acid.

【0037】実施例14 N−{(R)−2−[(3S,4R)−3−[(R)−
1−t−ブチルジメチルシリロキシエチル]−2−オキ
ソアゼチジン−4−イル]プロピオニル}−2,6−ジ
クロロ−N−イソプロピルベンズアミド
Example 14 N-{(R) -2-[(3S, 4R) -3-[(R)-
1-t-butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionyl} -2,6-dichloro-N-isopropylbenzamide

【化27】 2,6−ジクロロ−N−イソプロピル−N−プロピオニ
ルベンズアミド9.22gの塩化メチレン130mlの
溶液に四塩化チタン6.07gの塩化メチレン5mlの
溶液を0〜5℃にて滴下し、次に同温度でジイソプロピ
ルエチルアミン4.14gの塩化メチレン5mlの溶液
を滴下した。20℃に昇温し、(3R,4R)−4−ア
セトキシ−3−[(R)−1−t−ブチルジメチルシリ
ロキシエチル]アゼチジン−2−オン4.60gを加え
た。反応混合物を25〜30℃で2時間撹拌したのち、
冷水にあけ、塩化メチレン層を水洗し無水硫酸マグネシ
ウムで乾燥後塩化メチレンを減圧留去した。残渣にn−
ヘキサンを加えて、結晶を濾取し、トルエンより再結晶
して白色結晶6.3gを得た。 m.p. 188〜192℃
[Chemical 27] To a solution of 9,22 g of 2,6-dichloro-N-isopropyl-N-propionylbenzamide in 130 ml of methylene chloride, a solution of 6.07 g of titanium tetrachloride in 5 ml of methylene chloride was added dropwise at 0 to 5 ° C, and then at the same temperature. Then, a solution of 4.14 g of diisopropylethylamine in 5 ml of methylene chloride was added dropwise. The temperature was raised to 20 ° C, and 4.60 g of (3R, 4R) -4-acetoxy-3-[(R) -1-t-butyldimethylsilyloxyethyl] azetidin-2-one was added. After stirring the reaction mixture at 25-30 ° C. for 2 hours,
The mixture was poured into cold water, the methylene chloride layer was washed with water, dried over anhydrous magnesium sulfate, and methylene chloride was distilled off under reduced pressure. N- in the residue
Hexane was added, the crystals were collected by filtration, and recrystallized from toluene to obtain 6.3 g of white crystals. m. p. 188-192 ° C

【0038】実施例15 N−{(R)−2−[(3S,4R)−3−[(R)−
1−t−ブチルジメチルシリロキシエチル]−2−オキ
ソアゼチジン−4−イル]プロピオニル}−o−クロロ
−N−シクロヘキシルベンズアミド
Example 15 N-{(R) -2-[(3S, 4R) -3-[(R)-
1-t-Butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionyl} -o-chloro-N-cyclohexylbenzamide

【化28】 o−クロロ−N−シクロヘキシル−N−プロピオニルベ
ンズアミド8.0gの塩化メチレン70mlの溶液に四
塩化チタン5.24gを0〜5℃にて滴下し、次に同温
度でジイソプロピルエチルアミン3.24gを滴下し
た。25℃に昇温し、(3R,4R)−4−アセトキシ
−3−[(R)−1−t−ブチルジメチルシリロキシエ
チル]アゼチジン−2−オン4.97gを加えた。反応
混合物を28〜32℃で0.5時間撹拌したのち、冷水
にあけ、塩化メチレン層を水洗し無水硫酸マグネシウム
で乾燥後塩化メチレンを減圧留去した。残渣にn−ヘキ
サンを加えて、結晶を濾取し、トルエン−n−ヘキサン
より再結晶して白色結晶5.3gを得た。 m.p. 136〜137℃
[Chemical 28] To a solution of o-chloro-N-cyclohexyl-N-propionylbenzamide (8.0 g) in methylene chloride (70 ml), titanium tetrachloride (5.24 g) was added dropwise at 0 to 5 ° C, and then diisopropylethylamine (3.24 g) was added dropwise at the same temperature. did. The temperature was raised to 25 ° C., and 4.97 g of (3R, 4R) -4-acetoxy-3-[(R) -1-t-butyldimethylsilyloxyethyl] azetidin-2-one was added. The reaction mixture was stirred at 28 to 32 ° C for 0.5 hr, poured into cold water, the methylene chloride layer was washed with water and dried over anhydrous magnesium sulfate, and methylene chloride was distilled off under reduced pressure. N-Hexane was added to the residue, and the crystals were collected by filtration and recrystallized from toluene-n-hexane to obtain 5.3 g of white crystals. m. p. 136-137 ° C

【0039】実施例16 N−{(R)−2−[(3S,4R)−3−[(R)−
1−t−ブチルジメチルシリロキシエチル]−2−オキ
ソアゼチジン−4−イル]プロピオニル}−p−クロロ
−N−シクロヘキシルベンズアミド
Example 16 N-{(R) -2-[(3S, 4R) -3-[(R)-
1-t-Butyldimethylsilyloxyethyl] -2-oxoazetidin-4-yl] propionyl} -p-chloro-N-cyclohexylbenzamide

【化29】 p−クロロ−N−シクロヘキシル−N−プロピオニルベ
ンズアミド17.6gの塩化メチレン120mlの溶液
に四塩化チタン12.1gを0〜5℃にて滴下し、次に
同温度でジイソプロピルエチルアミン7.5gを滴下し
た。25℃に昇温し、(3R,4R)−4−アセトキシ
−3−[(R)−1−t−ブチルジメチルシリロキシエ
チル]アゼチジン−2−オン11.5gを加えた。反応
混合物を28〜32℃で0.5時間撹拌したのち、冷水
にあけ、塩化メチレン層を水洗し無水硫酸マグネシウム
で乾燥後塩化メチレンを減圧留去した。残渣にn−ヘキ
サンを加えて、結晶を濾取し、トルエン−n−ヘキサン
より再結晶して白色結晶9.8gを得た。 m.p. 148〜150℃
[Chemical 29] To a solution of 17.6 g of p-chloro-N-cyclohexyl-N-propionylbenzamide in 120 ml of methylene chloride, 12.1 g of titanium tetrachloride was added dropwise at 0 to 5 ° C, and then 7.5 g of diisopropylethylamine was added at the same temperature. did. The temperature was raised to 25 ° C., and 11.5 g of (3R, 4R) -4-acetoxy-3-[(R) -1-t-butyldimethylsilyloxyethyl] azetidin-2-one was added. The reaction mixture was stirred at 28 to 32 ° C for 0.5 hr, poured into cold water, the methylene chloride layer was washed with water and dried over anhydrous magnesium sulfate, and methylene chloride was distilled off under reduced pressure. N-Hexane was added to the residue, and the crystals were collected by filtration and recrystallized from toluene-n-hexane to obtain 9.8 g of white crystals. m. p. 148-150 ° C

【0040】参考例1 o−クロロ−N−イソプロピル−N−プロピオニルベン
ズアミド
Reference Example 1 o-chloro-N-isopropyl-N-propionylbenzamide

【化30】 o−クロロ−N−イソプロピルベンズアミド10.0g
をトルエン100mlに加え、次いでプロピオニルクロ
リド6.1gを加えた。混合物を70℃に加温し、トリ
エチルアミン6.66gを同温度で滴下した。更に同温
度で2時間撹拌し、反応が終了したことを確かめたのち
室温迄冷却した。反応混合物に水を加え洗浄後、トルエ
ンを減圧下に留去し、残渣をシリカゲルカラムクロマト
グラフィーにより精製して無色油状物12.58gを得
た。1 HNMR(CDCl3 ;δppm):1.07(3
H,t),1.41(6H,d),2.52(2H,
q),4.23(1H,m),7.33〜7.45(4
H,m)
[Chemical 30] 10.0 g of o-chloro-N-isopropylbenzamide
Was added to 100 ml of toluene, and then 6.1 g of propionyl chloride was added. The mixture was heated to 70 ° C., and 6.66 g of triethylamine was added dropwise at the same temperature. The mixture was further stirred at the same temperature for 2 hours, and after confirming the completion of the reaction, it was cooled to room temperature. After water was added to the reaction mixture for washing, toluene was distilled off under reduced pressure, and the residue was purified by silica gel column chromatography to obtain 12.58 g of a colorless oily substance. 1 HNMR (CDCl 3 ; δppm): 1.07 (3
H, t), 1.41 (6H, d), 2.52 (2H,
q), 4.23 (1H, m), 7.33 to 7.45 (4
H, m)

【0041】[0041]

【発明の効果】本発明の化合物は、抗菌活性を有する1
β−メチルカルバペネム化合物製造の中間体として有用
であり、更に1β−メチルカルバペネム化合物の汎用中
間体である(R)−2−〔(3S,4S)−3−
[(R)−1−t−ブチルジメチルシリロキシエチル]
−2−オキソアゼチジン−4−イル〕プロピオン酸へ容
易に変換できる。また、本発明化合物の製造は安価な原
料でしかも取扱い、操作が容易であることから、工業的
製法として有利である。
The compound of the present invention has antibacterial activity.
(R) -2-[(3S, 4S) -3-, which is useful as an intermediate for the production of β-methylcarbapenem compounds and is a general-purpose intermediate for 1β-methylcarbapenem compounds.
[(R) -1-t-Butyldimethylsilyloxyethyl]
It can be easily converted to 2-oxoazetidin-4-yl] propionic acid. Further, the production of the compound of the present invention is an inexpensive raw material and is easy to handle and operate, which is advantageous as an industrial production method.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】 式〔I〕 【化1】 (式中、Rは水素原子または容易に除去できる保護基
を、R1 は保護されていてもよい水酸基もしくはハロゲ
ン原子で置換されていてもよいアルキル基を、R2は置
換されていてもよいアルキル基を、R3 、R4 は同一又
は相異なって、置換されていてもよいアルキル基または
置換されていてもよいアリール基を示し、Xは酸素原子
または硫黄原子を示す。ただしR3 がイソプロピルでか
つR4 が無置換フェニル基でかつXが酸素原子の場合を
除く。)で表されるアゼチジノン化合物。
1. A compound represented by the formula [I]: (In the formula, R is a hydrogen atom or a protecting group which can be easily removed, R 1 is an optionally protected hydroxyl group or an alkyl group which may be substituted with a halogen atom, and R 2 is optionally substituted. The alkyl group, R 3 and R 4 are the same or different and each represents an optionally substituted alkyl group or an optionally substituted aryl group, and X represents an oxygen atom or a sulfur atom, provided that R 3 is An azetidinone compound represented by isopropyl, R 4 is an unsubstituted phenyl group and X is an oxygen atom.).
【請求項2】 式〔II〕 【化2】 (式中、Rは水素原子または容易に除去できる保護基
を、R1 は保護されていてもよい水酸基もしくはハロゲ
ン原子で置換されていてもよいアルキル基を、Zは脱離
基を示す)で表されるアゼチジノン誘導体と一般式〔II
I 〕 【化3】 (式中、R2 は置換されていてもよいアルキル基を、R
3 、R4 は同一又は相異なって、置換されていてもよい
アルキル基または置換されていてもよいアリール基を示
し、Xは酸素原子または硫黄原子を示す。ただしR3
イソプロピルでかつR4 が無置換フェニル基でかつXが
酸素原子の場合を除く。)で表されるイミド化合物とを
一般式 M(Hal)n(R5 )m 〔IV〕 (式中、Mは金属原子を、Halはハロゲン原子を、R
5 は低級アルキル基、低級アルコキシ基、フェノキシ
基、置換フェノキシ基、またはシクロペンタジエニル基
を、n及びmはそれぞれ0,1,2,3,4または5で
かつ、n+mはMの原子価を示す。)で表される化合物
及び塩基の存在下で反応させることを特徴とする一般式
〔I〕 【化4】 (式中、R、R1 、R2 、R3 、R4 、Xは前記と同
じ。)で表されるアゼチジノン化合物の製造方法。
2. A formula [II]: (Wherein R represents a hydrogen atom or a protecting group that can be easily removed, R 1 represents a hydroxyl group which may be protected or an alkyl group which may be substituted with a halogen atom, and Z represents a leaving group). Azetidinone derivatives represented by the general formula [II
I] [Chemical 3] (In the formula, R 2 represents an alkyl group which may be substituted,
3 , R 4 are the same or different and each represents an optionally substituted alkyl group or an optionally substituted aryl group, and X represents an oxygen atom or a sulfur atom. However, the case where R 3 is isopropyl, R 4 is an unsubstituted phenyl group, and X is an oxygen atom is excluded. ) And an imide compound represented by the general formula M (Hal) n (R 5 ) m [IV] (wherein M is a metal atom, Hal is a halogen atom, R
5 is a lower alkyl group, a lower alkoxy group, a phenoxy group, a substituted phenoxy group, or a cyclopentadienyl group, n and m are 0, 1, 2, 3, 4 or 5, and n + m is a valence of M Indicates. ) The compound represented by the general formula [I] (In the formula, R, R 1 , R 2 , R 3 , R 4 and X are the same as the above.) A method for producing an azetidinone compound.
【請求項3】 MがTi又はZrであり、m+nが4で
ある請求項2の製造方法。
3. The method according to claim 2, wherein M is Ti or Zr and m + n is 4.
【請求項4】 MがAlであり、m+nが3である請求
項2の製造方法。
4. The method according to claim 2, wherein M is Al and m + n is 3.
【請求項5】 一般式〔I〕 【化5】 (式中、R、R1 、R2 、R3 、R4 、Xは前記と同じ
意味を示す。)で表されるアゼチジノン化合物を加水分
解することを特徴とする一般式〔V〕 【化6】 (式中、R、R1 、R2 は前記と同じ意味を示す。)で
表される化合物の製造方法。
5. A compound represented by the general formula [I]: (Wherein R, R 1 , R 2 , R 3 , R 4 and X have the same meanings as described above) and hydrolyze an azetidinone compound represented by the general formula [V] 6] (In the formula, R, R 1 and R 2 have the same meanings as described above.) A method for producing a compound represented by the formula.
【請求項6】 R4 がハロゲン原子、低級アルキル基、
低級アルコキシ基、ニトロ基及びアリール基から選ばれ
る1〜5個の基により置換されたベンゼン環である請求
項1及び2に記載の化合物及びその製造方法。
6. R 4 is a halogen atom, a lower alkyl group,
The compound according to claim 1 or 2, which is a benzene ring substituted with 1 to 5 groups selected from a lower alkoxy group, a nitro group and an aryl group, and a method for producing the same.
【請求項7】 R3 が、イソプロピル、t−ブチル、シ
クロヘキシル、ネオペンチル、イソブチル、s−ブチル
から選ばれる分岐もしくは環状のアルキル基またはベン
ジル基である請求項1及び2に記載の化合物及びその製
造方法。
7. The compound according to claim 1, wherein R 3 is a branched or cyclic alkyl group selected from isopropyl, t-butyl, cyclohexyl, neopentyl, isobutyl, s-butyl or a benzyl group and its production. Method.
【請求項8】 Xが酸素である請求項1及び2に記載の
化合物及びその製造方法。
8. The compound according to claim 1 or 2, wherein X is oxygen, and the process for producing the same.
【請求項9】 一般式〔II〕の化合物が、 【化7】 (式中、Aは水素原子または水酸基の保護基を、Zは前
記と同じ意味を示す)である請求項1及び2に記載の化
合物及びその製造方法。
9. A compound of the general formula [II] is represented by: (Wherein A represents a hydrogen atom or a hydroxyl-protecting group, and Z represents the same meaning as described above), and the compound and the method for producing the same.
JP01841795A 1994-07-14 1995-01-10 Azetidinone compound and method for producing the same Expired - Lifetime JP3787819B2 (en)

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6365564B1 (en) * 1996-10-15 2002-04-02 The Procter & Gamble Co. Asymmetrical imide bleach activators and compositions employing the same
WO2003080571A1 (en) * 2002-03-25 2003-10-02 Takasago International Corporation Process for producing azetidinone compounds
WO2011048583A1 (en) 2009-10-23 2011-04-28 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
US8841444B2 (en) 2008-07-30 2014-09-23 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
DE102009004764B4 (en) 2008-02-01 2018-05-03 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009005747B4 (en) 2008-02-15 2018-05-03 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009006322B4 (en) 2008-02-01 2018-05-17 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102017010159A1 (en) 2016-11-21 2018-05-24 Merck Patent Gmbh Compounds for homeotropic alignment of liquid-crystalline media
DE102009010578B4 (en) 2008-03-11 2018-12-20 Merck Patent Gmbh Liquid-crystalline medium and liquid-crystal display
DE102008046379B4 (en) 2007-10-05 2018-12-20 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009010580B4 (en) 2008-03-11 2019-02-28 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid crystal display
DE102009006272B4 (en) 2008-02-18 2019-02-28 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102019000286A1 (en) 2018-02-05 2019-08-08 Merck Patent Gmbh Compounds for homeotropic alignment of liquid-crystalline media

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6365564B1 (en) * 1996-10-15 2002-04-02 The Procter & Gamble Co. Asymmetrical imide bleach activators and compositions employing the same
WO2003080571A1 (en) * 2002-03-25 2003-10-02 Takasago International Corporation Process for producing azetidinone compounds
DE102008046379B4 (en) 2007-10-05 2018-12-20 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009006322B4 (en) 2008-02-01 2018-05-17 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009004764B4 (en) 2008-02-01 2018-05-03 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009005747B4 (en) 2008-02-15 2018-05-03 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009006272B4 (en) 2008-02-18 2019-02-28 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid-crystal display
DE102009010578B4 (en) 2008-03-11 2018-12-20 Merck Patent Gmbh Liquid-crystalline medium and liquid-crystal display
DE102009010580B4 (en) 2008-03-11 2019-02-28 Merck Patent Gmbh Liquid-crystalline medium and its use in a liquid crystal display
US8841444B2 (en) 2008-07-30 2014-09-23 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
WO2011048583A1 (en) 2009-10-23 2011-04-28 Ranbaxy Laboratories Limited Process for the preparation of carbapenem compounds
DE102017010159A1 (en) 2016-11-21 2018-05-24 Merck Patent Gmbh Compounds for homeotropic alignment of liquid-crystalline media
DE102019000286A1 (en) 2018-02-05 2019-08-08 Merck Patent Gmbh Compounds for homeotropic alignment of liquid-crystalline media

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