JPH0875584A - Differential pressure measuring instrument - Google Patents
Differential pressure measuring instrumentInfo
- Publication number
- JPH0875584A JPH0875584A JP21571294A JP21571294A JPH0875584A JP H0875584 A JPH0875584 A JP H0875584A JP 21571294 A JP21571294 A JP 21571294A JP 21571294 A JP21571294 A JP 21571294A JP H0875584 A JPH0875584 A JP H0875584A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- pressure side
- low
- valve
- path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Measuring Fluid Pressure (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、コストが削減でき、計
装の信頼性が向上し得る差圧測定装置に関するものであ
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a differential pressure measuring device capable of reducing cost and improving reliability of instrumentation.
【0002】[0002]
【従来の技術】図2は従来より一般に使用されている従
来例の構成説明図で、例えば、特開昭59―56137
号の第1図に示されている。図において、ハウジング1
の両側にフランジ2、フランジ3が嵌合い組み立てられ
溶接等によって固定されており、両フランジ2,3には
測定せんとする圧力PHの高圧流体の導入口5、圧力PL
の低圧流体の導入口4が設けられている。2. Description of the Related Art FIG. 2 is an explanatory view of the configuration of a conventional example which has been generally used, for example, Japanese Patent Laid-Open No. 59-56137.
It is shown in FIG. In the figure, the housing 1
Flanges 2 and 3 are fitted and assembled on both sides of and are fixed by welding or the like. Both flanges 2 and 3 are provided with a high-pressure fluid inlet 5 of pressure P H to be measured and pressure P L.
The low-pressure fluid inlet 4 is provided.
【0003】ハウジング1内に圧力測定室6が形成され
ており、この圧力測定室6内にセンタダイアフラム7と
シリコンダイアフラム8が設けられている。シリコンダ
イアフラム8は、単結晶のシリコン基板81に凹部82
を形成して形成される。A pressure measuring chamber 6 is formed in the housing 1, and a center diaphragm 7 and a silicon diaphragm 8 are provided in the pressure measuring chamber 6. The silicon diaphragm 8 has a recess 82 in a single crystal silicon substrate 81.
Is formed.
【0004】センタダイアフラム7とシリコンダイアフ
ラム8はそれぞれ別個に圧力測定室6の壁に固定されて
おり、センタダイアフラム7とシリコンダイアフラム8
の両者でもって圧力測定室6を2分している。センタダ
イアフラム7と対向する圧力測定室6の壁には、バック
プレ―ト6A,6Bが形成されている。センタダイアフ
ラム7は周縁部をハウジング1に溶接されている。The center diaphragm 7 and the silicon diaphragm 8 are separately fixed to the wall of the pressure measuring chamber 6, and the center diaphragm 7 and the silicon diaphragm 8 are separately fixed.
The pressure measuring chamber 6 is divided into two parts by both. Back plates 6A and 6B are formed on the wall of the pressure measuring chamber 6 facing the center diaphragm 7. The center diaphragm 7 has a peripheral edge portion welded to the housing 1.
【0005】シリコン基板81の一方の面にボロン等の
不純物を選択拡散して4っのストレンゲ―ジ91を形成
する。4っのストレインゲ―ジ91は、シリコンダイア
フラム8が差圧ΔPを受けてたわむ時、2つが引張り、
2つが圧縮を受けるようになっており、これらがホイ―
トストン・ブリッジ回路に接続され、抵抗変化が差圧Δ
Pの変化として検出される。Impurities such as boron are selectively diffused on one surface of the silicon substrate 81 to form four strain gauges 91. The four strain gages 91 are pulled when the silicon diaphragm 8 bends under the pressure difference ΔP,
Two are to be compressed and these are
Connected to Toston bridge circuit, resistance change is differential pressure Δ
It is detected as a change in P.
【0006】92は、ストレインゲ―ジ91に一端が取
付けられたリ―ドである。93は、リ―ド92の他端が
接続されたハ―メチック端子である。94は、ストレイ
ンゲ―ジ91の近くに設けられた温度センサである(図
示せず)。支持体9は、ハ―メチック端子を備えてお
り、支持体9の圧力測定室6側端面に低融点ガラス接続
等の方法でシリコンダイアフラム8が接着固定されてい
る。Reference numeral 92 is a lead whose one end is attached to the strain gauge 91. 93 is a hermetic terminal to which the other end of the lead 92 is connected. A temperature sensor 94 is provided near the strain gauge 91 (not shown). The support 9 is provided with a hermetic terminal, and the silicon diaphragm 8 is adhesively fixed to the end surface of the support 9 on the pressure measurement chamber 6 side by a method such as low-melting glass connection.
【0007】ハウジング1とフランジ2、およびフラン
ジ3との間に、圧力導入室10,11が形成されてい
る。この圧力導入室10,11内に第1,第2シールダ
イアフラム13,12を設け、このシールダイアフラム
12,13と対向するハウジング1の壁10A,11A
にシールダイアフラム12,13と類似の形状のバック
プレ―トが形成されている。Pressure introducing chambers 10 and 11 are formed between the housing 1 and the flange 2 and the flange 3. First and second seal diaphragms 13 and 12 are provided in the pressure introducing chambers 10 and 11, and walls 10A and 11A of the housing 1 facing the seal diaphragms 12 and 13 are provided.
A back plate having a shape similar to that of the seal diaphragms 12 and 13 is formed on the.
【0008】シールダイアフラム12,13とバックプ
レ―ト10A,11Aとで形成される空間と、圧力測定
室6は、連通孔14,15を介して導通している。そし
て、シールダイアフラム12,13間にシリコンオイル
等の封入液101,102が満たされ、この封入液が連
通孔16,17を介してシリコンダイアフラム8の上下
面にまで至っている、封入液101,102はセンタダ
イアフラム7とシリコンダイアフラム8とによって2分
されているが、その量が、ほぼ均等になるように配慮さ
れている。The space formed by the seal diaphragms 12 and 13 and the back plates 10A and 11A and the pressure measuring chamber 6 are in communication with each other through communication holes 14 and 15. Filling liquids 101 and 102 such as silicon oil are filled between the seal diaphragms 12 and 13, and the filling liquids reach the upper and lower surfaces of the silicon diaphragm 8 through the communication holes 16 and 17. It is divided into two by the center diaphragm 7 and the silicon diaphragm 8, and it is taken into consideration that the amounts are almost equal.
【0009】以上の構成において、高圧側から圧力が作
用した場合、シールダイアフラム13に作用する圧力が
封入液102によってシリコンダイアフラム8に伝達さ
れる。一方、低圧側から圧力が作用した場合、シールダ
イアフラム12に作用する圧力が封入液101によって
シリコンダイアフラム8に伝達される。In the above structure, when pressure is applied from the high pressure side, the pressure acting on the seal diaphragm 13 is transmitted to the silicon diaphragm 8 by the enclosed liquid 102. On the other hand, when pressure acts from the low pressure side, the pressure acting on the seal diaphragm 12 is transmitted to the silicon diaphragm 8 by the enclosed liquid 101.
【0010】この結果、高圧側と低圧側との圧力差に応
じてシリコンダイアフラム8が歪み、この歪み量がスト
レインゲ―ジ91に因って電気的に取出され、差圧の測
定が行なわれる。As a result, the silicon diaphragm 8 is distorted according to the pressure difference between the high pressure side and the low pressure side, and the strain amount is electrically taken out by the strain gauge 91, and the differential pressure is measured. .
【0011】[0011]
【発明が解決しようとする課題】しかしながら、この様
な装置においては、測定圧の高圧側圧力と低圧側圧力の
圧力差を測定するのであるから、ゼロ点のチェックは必
ず必要である。通常、ゼロ点チェックを行うためには、
図3に示す如く、高圧側配管と低圧側配管にストップ弁
21、その間に均圧弁22を設けるか、図4に示す如
く、これらが一体になった三岐弁23を接続し、これを
操作してゼロ点のチェックを行っている。However, in such an apparatus, since the pressure difference between the high pressure side pressure and the low pressure side pressure of the measurement pressure is measured, the zero point check is always necessary. Normally, in order to check the zero point,
As shown in FIG. 3, a stop valve 21 is provided in the high pressure side pipe and the low pressure side pipe, and a pressure equalizing valve 22 is provided therebetween, or as shown in FIG. 4, a three-way valve 23 in which these are integrated is connected and operated. I am checking the zero point.
【0012】しかし、ストップ弁21と均圧弁22、或
いは、3岐弁23は計装コストを増大させる。また、ス
トップ弁21と均圧弁22や三岐弁23の継ぎ手部分か
らは測定流体の漏れが生じ易く、測定流体が腐食性、可
燃性、有毒性流体の場合は大事故にも繋がりかねない。However, the stop valve 21 and the pressure equalizing valve 22 or the three-way valve 23 increase the instrumentation cost. In addition, leakage of the measurement fluid easily occurs from the joint portion of the stop valve 21, the pressure equalizing valve 22 and the three-way valve 23, and if the measurement fluid is corrosive, flammable, or toxic fluid, it may lead to a major accident.
【0013】本発明は、この問題点を、解決するもので
ある。本発明の目的は、コストが削減でき、計装の信頼
性が向上し得る差圧測定装置を提供するにある。The present invention solves this problem. An object of the present invention is to provide a differential pressure measuring device which can reduce the cost and improve the reliability of instrumentation.
【0014】[0014]
【課題を解決するための手段】この目的を達成するため
に、本発明は、本体ハウジングの両側面にそれぞれ高圧
側圧力導入室と低圧側圧力導入室とが設けられた差圧測
定装置において、前記本体ハウジングに設けられ一端が
前記高圧側圧力導入室に開口する高圧側均圧通路と、前
記本体ハウジングに設けられ一端が前記低圧側圧力導入
室に開口する低圧側均圧通路と、前記本体ハウジングに
設けられ該低圧側均圧通路の他端と前記高圧側均圧通路
の他端とを連通し一端が弁座を構成する連通孔と、前記
本体ハウジングに設けられ前記弁座を開閉する仕切り弁
と、前記高圧側圧力導入室に一端が接続された高圧側導
圧管と、前記低圧側圧力導入室に一端が接続された低圧
側導圧管と、前記高圧側導圧管の途中に設けられた高圧
側ストップ弁と、前記低圧側導圧管の途中に設けられた
低圧側ストップ弁とを具備したことを特徴とする差圧測
定装置を構成したものである。In order to achieve this object, the present invention provides a differential pressure measuring device in which a high pressure side pressure introducing chamber and a low pressure side pressure introducing chamber are provided on both side surfaces of a main body housing, respectively. A high pressure side pressure equalizing passage which is provided in the main body housing and has one end opening to the high pressure side pressure introducing chamber; a low pressure side equalizing passage which is provided in the main body housing and whose one end opens to the low pressure side pressure introducing chamber; A communication hole, which is provided in the housing, communicates the other end of the low-pressure side equalizing passage and the other end of the high-pressure side equalizing passage, and one end of which constitutes a valve seat, and the main body housing which opens and closes the valve seat. A gate valve, a high-pressure side pressure guiding pipe whose one end is connected to the high-pressure side pressure introducing chamber, a low-pressure side pressure guiding pipe whose one end is connected to the low-pressure side pressure introducing chamber, and a high-pressure side pressure guiding pipe provided in the middle thereof. High pressure stop valve, It is obtained by constituting the differential pressure measuring device, characterized in that serial equipped with a low pressure side impulse line of the low pressure side stop valve provided in the middle.
【0015】[0015]
【作用】以上の構成において、高圧側から圧力が作用し
た場合、シールダイアフラムに作用する圧力が封入液に
よってシリコンダイアフラムに伝達される。一方、低圧
側から圧力が作用した場合、シールダイアフラムに作用
する圧力が封入液によってシリコンダイアフラムに伝達
される。In the above construction, when pressure is applied from the high pressure side, the pressure acting on the seal diaphragm is transmitted to the silicon diaphragm by the enclosed liquid. On the other hand, when pressure acts from the low pressure side, the pressure acting on the seal diaphragm is transmitted to the silicon diaphragm by the enclosed liquid.
【0016】従って、高圧側と低圧側との圧力差に応じ
てシリコンダイアフラムが歪み、この歪み量がストレイ
ンゲ―ジに因って電気的に取出され、差圧の測定が行な
われる。Therefore, the silicon diaphragm is distorted according to the pressure difference between the high pressure side and the low pressure side, and the strain amount is electrically taken out by the strain gauge, and the differential pressure is measured.
【0017】次に、ゼロ点チェック時においては。差圧
測定装置のゼロ点をチェックするため、シールダイアフ
ラムに加わる圧力を同じにする。通常、仕切弁は閉状態
で、高圧側均圧通路と低圧側均圧通路とは導通状態では
ない。Next, at the time of zero point check. To check the zero point of the differential pressure measuring device, apply the same pressure to the seal diaphragm. Normally, the sluice valve is closed, and the high-pressure side equalizing passage and the low-pressure side equalizing passage are not in conduction.
【0018】まず、仕切り弁を緩め高圧側均圧通路と低
圧側均圧通路とを導通状態にする。次に低圧側ストップ
弁を閉めて、シールダイアフラムに加わる圧力の均圧状
態を実現するか、または低圧側ストップ弁と高圧側スト
ップ弁とを閉めて、シールダイアフラムに加わる圧力の
均圧状態を実現する。その後、ゼロ点チェックを行う以
下、実施例に基づき詳細に説明する。First, the sluice valve is loosened so that the high-pressure side equalizing passage and the low-pressure side equalizing passage are brought into conduction. Next, close the low-pressure stop valve to achieve a pressure equalization state for the seal diaphragm, or close the low-pressure stop valve and high-pressure side stop valve to achieve a pressure equalization state for the seal diaphragm. To do. After that, a zero point check is performed. Hereinafter, detailed description will be given based on an embodiment.
【0019】[0019]
【実施例】図1は本発明の一実施例の要部構成説明図で
ある。図において、図2と同一記号の構成は同一機能を
表わす。以下、図2と相違部分のみ説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an explanatory view of the essential structure of an embodiment of the present invention. In the figure, the same symbols as those in FIG. 2 represent the same functions. Only parts different from FIG. 2 will be described below.
【0020】31は、本体ハウジング1に設けられ、一
端が高圧側圧力導入室11に開口する高圧側均圧通路で
ある。32は、本体ハウジング1に設けられ、一端が低
圧側圧力導入室10に開口する低圧側均圧通路である。Reference numeral 31 is a high pressure side pressure equalizing passage which is provided in the main body housing 1 and has one end opened to the high pressure side pressure introducing chamber 11. Reference numeral 32 denotes a low pressure side pressure equalizing passage which is provided in the main body housing 1 and has one end opening to the low pressure side pressure introducing chamber 10.
【0021】33は、本体ハウジング1に設けられ、低
圧側均圧通路32の他端と高圧側均圧通路31の他端と
を連通し、一端が弁座34を構成する連通孔である。3
5は、本体ハウジング1に設けられ、弁座34を開閉す
る仕切り弁である。Reference numeral 33 is a communication hole which is provided in the main body housing 1 and which communicates the other end of the low pressure side pressure equalizing passage 32 and the other end of the high pressure side equalizing passage 31 with one end constituting a valve seat 34. Three
Reference numeral 5 is a sluice valve that is provided in the main body housing 1 and that opens and closes the valve seat 34.
【0022】36は、高圧側圧力導入室11に一端が接
続された高圧側導圧管である。37は、低圧側圧力導入
室10に一端が接続された低圧側導圧管である。38
は、高圧側導圧管36の途中に設けられた高圧側ストッ
プ弁である。39は、低圧側導圧管37の途中に設けら
れた低圧側ストップ弁である。Reference numeral 36 is a high pressure side pressure guiding tube having one end connected to the high pressure side pressure introducing chamber 11. Reference numeral 37 is a low pressure side pressure guiding tube having one end connected to the low pressure side pressure introducing chamber 10. 38
Is a high-pressure side stop valve provided in the middle of the high-pressure side pressure guiding pipe 36. Reference numeral 39 is a low pressure side stop valve provided in the middle of the low pressure side pressure guiding pipe 37.
【0023】以上の構成において、高圧側から圧力が作
用した場合、シールダイアフラム13に作用する圧力が
封入液102によってシリコンダイアフラム8に伝達さ
れる。In the above structure, when pressure is applied from the high pressure side, the pressure acting on the seal diaphragm 13 is transmitted to the silicon diaphragm 8 by the enclosed liquid 102.
【0024】一方、低圧側から圧力が作用した場合、シ
ールダイアフラム12に作用する圧力が封入液101に
よってシリコンダイアフラム8に伝達される。従って、
高圧側と低圧側との圧力差に応じてシリコンダイアフラ
ム8が歪み、この歪み量がストレインゲ―ジ91に因っ
て電気的に取出され、差圧の測定が行なわれる。On the other hand, when the pressure acts from the low pressure side, the pressure acting on the seal diaphragm 12 is transmitted to the silicon diaphragm 8 by the enclosed liquid 101. Therefore,
The silicon diaphragm 8 is distorted according to the pressure difference between the high pressure side and the low pressure side, and the strain amount is electrically taken out by the strain gauge 91, and the differential pressure is measured.
【0025】次に、ゼロ点チェック時においては。差圧
測定装置のゼロ点をチェックするため、シールダイアフ
ラム12,13に加わる圧力を同じにする。通常、仕切
弁35は閉状態で、高圧側均圧通路31と低圧側均圧通
路32とは導通状態ではない。Next, at the time of zero point check. In order to check the zero point of the differential pressure measuring device, the pressure applied to the seal diaphragms 12 and 13 is made the same. Normally, the sluice valve 35 is closed, and the high pressure side pressure equalizing passage 31 and the low pressure side pressure equalizing passage 32 are not in a conductive state.
【0026】まず、仕切り弁35を緩め、高圧側均圧通
路31と低圧側均圧通路32とを導通状態にする。次に
低圧側ストップ弁38を閉めて、シールダイアフラム1
2,13に加わる圧力の均圧状態を実現するか、または
低圧側ストップ弁39と高圧側ストップ弁38とを閉め
て、シールダイアフラム12,13に加わる圧力の均圧
状態を実現する。その後、ゼロ点チェックを行う。First, the sluice valve 35 is loosened so that the high pressure side pressure equalizing passage 31 and the low pressure side pressure equalizing passage 32 are brought into conduction. Next, the low-pressure stop valve 38 is closed, and the seal diaphragm 1
The pressure applied to the pressure diaphragms 2 and 13 is equalized, or the low-pressure stop valve 39 and the high-pressure stop valve 38 are closed to equalize the pressure applied to the seal diaphragms 12 and 13. After that, a zero point check is performed.
【0027】この結果、本発明によれば、均圧機構を伝
送器内に内蔵したことにより、三岐弁等を配管に取り付
ける必要が無く、従って三岐弁等のコストが削減でき、
また、配管接続部の減少により測定液の漏れ箇所の減少
が実現でき、計装の信頼性向上につながる。As a result, according to the present invention, since the pressure equalizing mechanism is built in the transmitter, it is not necessary to attach a three-way valve or the like to the pipe, and therefore the cost of the three-way valve or the like can be reduced.
In addition, the number of piping connections can be reduced to reduce the number of points where the measured solution leaks, leading to improved instrumentation reliability.
【0028】[0028]
【発明の効果】以上説明したように、本発明は、本体ハ
ウジングの両側面にそれぞれ高圧側圧力導入室と低圧側
圧力導入室とが設けられた差圧測定装置において、前記
本体ハウジングに設けられ一端が前記高圧側圧力導入室
に開口する高圧側均圧通路と、前記本体ハウジングに設
けられ一端が前記低圧側圧力導入室に開口する低圧側均
圧通路と、前記本体ハウジングに設けられ該低圧側均圧
通路の他端と前記高圧側均圧通路の他端とを連通し一端
が弁座を構成する連通孔と、前記本体ハウジングに設け
られ前記弁座を開閉する仕切り弁と、前記高圧側圧力導
入室に一端が接続された高圧側導圧管と、前記低圧側圧
力導入室に一端が接続された低圧側導圧管と、前記高圧
側導圧管の途中に設けられた高圧側ストップ弁と、前記
低圧側導圧管の途中に設けられた低圧側ストップ弁とを
具備したことを特徴とする差圧測定装置を構成した。As described above, the present invention is provided in the main body housing in the differential pressure measuring device in which the high pressure side pressure introducing chamber and the low pressure side pressure introducing chamber are provided on both side surfaces of the main body housing. A high pressure side pressure equalizing passage having one end opening to the high pressure side pressure introducing chamber; a low pressure side pressure equalizing passage having one end opening to the low pressure side pressure introducing chamber; A communication hole that communicates the other end of the side pressure equalizing passage with the other end of the high pressure side pressure equalizing passage, one end of which forms a valve seat; a sluice valve that is provided in the main body housing to open and close the valve seat; A high pressure side pressure guiding pipe whose one end is connected to the side pressure introducing chamber, a low pressure side pressure guiding pipe whose one end is connected to the low pressure side pressure introducing chamber, and a high pressure side stop valve provided in the middle of the high pressure side pressure guiding pipe. , The way of the low-pressure side impulse pipe It was equipped with a low pressure side stop valve provided to constitute a differential pressure measuring device, characterized in the.
【0029】この結果、本発明によれば、均圧機構を伝
送器内に内蔵したことにより、三岐弁等を配管に取り付
ける必要が無く、従って三岐弁等のコストが削減でき、
また、配管接続部の減少により測定液の漏れ箇所の減少
が実現でき、計装の信頼性向上につながる。As a result, according to the present invention, since the pressure equalizing mechanism is built in the transmitter, it is not necessary to attach a three-way valve or the like to the pipe, and therefore the cost of the three-way valve or the like can be reduced.
In addition, the number of piping connections can be reduced to reduce the number of points where the measured solution leaks, leading to improved instrumentation reliability.
【0030】従って、本発明によれば、コストが削減で
き、計装の信頼性が向上し得る差圧測定装置を実現する
ことが出来る。Therefore, according to the present invention, it is possible to realize the differential pressure measuring device which can reduce the cost and improve the reliability of the instrumentation.
【図1】本発明の一実施例の要部構成説明図である。FIG. 1 is an explanatory diagram of a main part configuration of an embodiment of the present invention.
【図2】従来より一般に使用されている従来例の構成説
明図である。FIG. 2 is an explanatory diagram of a configuration of a conventional example that is generally used in the past.
【図3】図2の要部詳細説明図である。FIG. 3 is a detailed explanatory diagram of a main part of FIG.
【図4】図2の要部詳細説明図である。FIG. 4 is a detailed explanatory diagram of a main part of FIG.
1…ハウジング 2…フランジ 3…フランジ 4…導入口 5…導入口 6…圧力測定室 6A…バックプレ―ト 6B…バックプレ―ト 7…センターダイアフラム 8…シリコンダイアフラム 9…支持体 10…圧力導入室 10A…バックプレ―ト 11…圧力導入室 11A…バックプレ―ト 12…シールダイアフラム 13…シールダイアフラム 14…連通孔 15…連通孔 16…連通孔 17…連通孔 21…ストップ弁 22…均圧弁 23…三岐弁 31…高圧側均圧通路 32…低圧側均圧通路 33…連通孔 34…弁座 35…仕切り弁 36…高圧側導圧管 37…低圧側導圧管 38…高圧側ストップ弁 39…低圧側ストップ弁 81…シリコン基板 82…凹部 91…ストレインゲ―ジ 92…リード 93…ハーメチック端子 101…封入液 102…封入液 1 ... Housing 2 ... Flange 3 ... Flange 4 ... Inlet port 5 ... Inlet port 6 ... Pressure measuring chamber 6A ... Back plate 6B ... Back plate 7 ... Center diaphragm 8 ... Silicon diaphragm 9 ... Support 10 ... Pressure introduction Chamber 10A ... Back plate 11 ... Pressure introducing chamber 11A ... Back plate 12 ... Seal diaphragm 13 ... Seal diaphragm 14 ... Communication hole 15 ... Communication hole 16 ... Communication hole 17 ... Communication hole 21 ... Stop valve 22 ... Pressure equalizing valve 23 ... Three-way valve 31 ... High pressure side pressure equalizing passage 32 ... Low pressure side pressure equalizing passage 33 ... Communication hole 34 ... Valve seat 35 ... Partition valve 36 ... High pressure side pressure guiding pipe 37 ... Low pressure side pressure guiding pipe 38 ... High pressure side stop valve 39 ... Low-pressure stop valve 81 ... Silicon substrate 82 ... Recessed portion 91 ... Strain gauge 92 ... Lead 93 ... Hermetic terminal 101 ... Filled liquid 10 ... sealed liquid
───────────────────────────────────────────────────── フロントページの続き (72)発明者 兼平 敦子 東京都武蔵野市中町2丁目9番32号 横河 電機株式会社内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Atsuko Kanehira 2-9-32 Nakamachi, Musashino City, Tokyo Yokogawa Electric Co., Ltd.
Claims (1)
圧力導入室と低圧側圧力導入室とが設けられた差圧測定
装置において、 前記本体ハウジングに設けられ一端が前記高圧側圧力導
入室に開口する高圧側均圧通路と、 前記本体ハウジングに設けられ一端が前記低圧側圧力導
入室に開口する低圧側均圧通路と、 前記本体ハウジングに設けられ該低圧側均圧通路の他端
と前記高圧側均圧通路の他端とを連通し一端が弁座を構
成する連通孔と、 前記本体ハウジングに設けられ前記弁座を開閉する仕切
り弁と、 前記高圧側圧力導入室に一端が接続された高圧側導圧管
と、 前記低圧側圧力導入室に一端が接続された低圧側導圧管
と、 前記高圧側導圧管の途中に設けられた高圧側ストップ弁
と、 前記低圧側導圧管の途中に設けられた低圧側ストップ弁
とを具備したことを特徴とする差圧測定装置。1. A differential pressure measuring device in which a high-pressure side pressure introducing chamber and a low-pressure side pressure introducing chamber are provided on both sides of a main body housing, wherein one end of the main body housing is opened to the high pressure side pressure introducing chamber. A high-pressure side equalizing passage, a low-pressure side equalizing passage that is provided in the main body housing and has one end opening to the low-pressure side pressure introducing chamber, and another end of the low-pressure side equalizing passage that is provided in the main body housing and the high pressure. A communication hole that communicates with the other end of the side pressure-equalizing passage and one end of which forms a valve seat, a sluice valve that is provided in the main body housing to open and close the valve seat, and one end of which is connected to the high-pressure side pressure introduction chamber A high-pressure side pressure guiding pipe, a low-pressure side pressure guiding pipe whose one end is connected to the low-pressure side pressure introducing chamber, a high-pressure side stop valve provided in the middle of the high-pressure side pressure guiding pipe, and a middle of the low-pressure side pressure guiding pipe. Low pressure side Differential pressure measuring device, characterized by comprising a valve.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21571294A JPH0875584A (en) | 1994-09-09 | 1994-09-09 | Differential pressure measuring instrument |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21571294A JPH0875584A (en) | 1994-09-09 | 1994-09-09 | Differential pressure measuring instrument |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0875584A true JPH0875584A (en) | 1996-03-22 |
Family
ID=16676924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21571294A Pending JPH0875584A (en) | 1994-09-09 | 1994-09-09 | Differential pressure measuring instrument |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0875584A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100547575B1 (en) * | 1998-12-22 | 2006-04-14 | 두산인프라코어 주식회사 | Differential pressure generator |
-
1994
- 1994-09-09 JP JP21571294A patent/JPH0875584A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100547575B1 (en) * | 1998-12-22 | 2006-04-14 | 두산인프라코어 주식회사 | Differential pressure generator |
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