JPH0863792A - Optical disk and its production - Google Patents

Optical disk and its production

Info

Publication number
JPH0863792A
JPH0863792A JP6195112A JP19511294A JPH0863792A JP H0863792 A JPH0863792 A JP H0863792A JP 6195112 A JP6195112 A JP 6195112A JP 19511294 A JP19511294 A JP 19511294A JP H0863792 A JPH0863792 A JP H0863792A
Authority
JP
Japan
Prior art keywords
adhesive
substrate
film
substrates
recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6195112A
Other languages
Japanese (ja)
Inventor
Hiroaki Miwa
広明 三輪
Ryoichi Sudo
亮一 須藤
Tetsuo Tajima
哲夫 田嶋
Hitoshi Kosho
均 古性
Toshiaki Yasui
俊明 泰井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Maxell Holdings Ltd
Original Assignee
Hitachi Ltd
Hitachi Maxell Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Maxell Ltd filed Critical Hitachi Ltd
Priority to JP6195112A priority Critical patent/JPH0863792A/en
Publication of JPH0863792A publication Critical patent/JPH0863792A/en
Pending legal-status Critical Current

Links

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  • Manufacturing Optical Record Carriers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

PURPOSE: To obtain an optical disk having high accuracy and excellent reliability by providing this optical disk with a sectional structure formed by sticking a pair of transparent substrates formed with at least one layer of recording films on information pattern layers with adhesives. CONSTITUTION: This disk has a disk shape bored with a hole 34 at its center. The optical disk is arranged in the spacing between a pair of the substrates facing each other and consists of the cured matter of the two-part curing type silicone adhesives. The substrates 3 have the transparent replica substrates 1 and metallic films (recording films) 2 for recording and are disposed to face each other in such a manner that the recording films 2 exist on the inner side. The substrates 1 are medium to allow transmission of lasers for recording and reproducing. Glass, polyolefin, etc., which are optically isotropic and have optical distortions of, for example, <=50nm are used for this purpose. The recording films 2 correspond to a light spot diameter of, for example, 0.6 to 1μm. As a result, the optical disk having the high accuracy and the excellent reliability is formed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,音声,画像,情報など
の保存,記録,再生をするのに好適な光ディスク及びそ
の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical disk suitable for storing, recording and reproducing voice, image, information and the like, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】光ディスクは、サーボトラック用などの
溝状又は穴状の凹凸を有するガラス、透明プラスチック
などの透明レプリカ基板上に記録用金属膜を形成し、該
透明レプリカ基板を、該記録用金属膜が内側になるよう
に、一定間隙で対向させ、接着剤を用いて貼り合わせる
ことにより形成されている。
2. Description of the Related Art An optical disc has a recording metal film formed on a transparent replica substrate such as glass or transparent plastic having groove-shaped or hole-shaped irregularities for servo tracks, and the transparent replica substrate is used for recording. They are formed by facing each other with a constant gap so that the metal film is on the inside, and pasted together with an adhesive.

【0003】従来の光ディスク製造方法では、ホットメ
ルト接着剤や、化学反応型接着剤が、透明レプリカ基板
の接着に用いられている。ホットメルト系接着剤は、製
造作業性の簡素化、低コスト化などの点で優れており、
特開昭63−67238号公報では、熱可塑性のホット
メルト系接着剤が用いられている。
In the conventional optical disk manufacturing method, a hot melt adhesive or a chemically reactive adhesive is used for bonding a transparent replica substrate. Hot melt adhesives are excellent in terms of simplification of manufacturing workability and cost reduction,
In JP-A-63-67238, a thermoplastic hot melt adhesive is used.

【0004】また、化学反応型接着剤は、ディスクの変
形を抑える効果があり、1液性嫌気性硬化型接着剤(特
開昭61−151853号公報に記載されている)、2
液性非混合型接着剤(特開昭61−50231号公報に
記載されている)、および、1液性湿気硬化型粘着接着
剤(高分子24巻2月号(1993)111pに記載さ
れている)が使用されていた。
Further, the chemical reaction type adhesive has an effect of suppressing the deformation of the disk and has a one-component anaerobic curing type adhesive (described in JP-A-61-151853).
Liquid non-mixing type adhesive (described in Japanese Patent Laid-Open No. 61-50231) and one-component moisture-curing adhesive (described in Polymer 24, February issue (1993) 111p). Was used.

【0005】近年、光ディスクについて、記録する情報
量の増大や処理速度の高速化などの要求が近年急速に高
まりつつある。これらの要求を満足するためには、記憶
容量を増大し、かつ高速でディスクを回転する必要があ
る。
In recent years, demands for increasing the amount of information to be recorded and increasing the processing speed of optical discs are rapidly increasing in recent years. In order to meet these requirements, it is necessary to increase the storage capacity and rotate the disk at high speed.

【0006】[0006]

【発明が解決しようとする課題】しかし、上記接着剤
は、下記のような問題点を有していた。熱可塑性のホッ
トメルト系接着剤は、接着剤塗布時の熱や貼り合せ時の
圧力による欠陥、又は高速回転時の塑性、弾性変形、保
管時の経時的変化による変形や剥がれの何れかが生じて
しまう。
However, the above-mentioned adhesive has the following problems. Thermoplastic hot-melt adhesives have defects due to heat during adhesive application or pressure during bonding, or plasticity or elastic deformation during high-speed rotation, or deformation or peeling due to aging during storage. Will end up.

【0007】また、1液性嫌気性硬化型接着剤は、その
硬化時間が秒単位と短く、かつ、常圧下で貼り合わせ硬
化させる。このため、気泡が混入し易く、また、混入し
た気泡が抜けにくく、気泡を混入したまま硬化してしま
うことになる。さらに、硬化して得られる硬化物が固い
ため、気泡を十分に吸収緩和できず、ディスク平坦性不
良が発生したり、気泡部分の未硬化物が記録層を腐食さ
せるなどの欠陥をもたらす。
The one-component anaerobic curable adhesive has a short curing time of seconds and is bonded and cured under normal pressure. For this reason, bubbles are easily mixed, and the mixed bubbles are hard to come off, and the mixture is cured with the bubbles mixed therein. Further, since the cured product obtained by curing is hard, the bubbles cannot be sufficiently absorbed and relaxed, resulting in defects such as poor disk flatness and the uncured product in the bubble portion corroding the recording layer.

【0008】2液性非混合型接着剤を用いる場合、2液
を別々に数十μm膜厚で順次塗布し、圧力をかけること
により、基板を貼り合わせる。このような接着方法を採
る場合、貼り合わせ時の圧力により硬化むらが生じるこ
ととなる。これは、上記接着剤の塗膜が不均一になるこ
とが原因である。このような硬化むらは、記録層にシワ
を発生させ、記録再生不良の原因になる。
When a two-liquid non-mixing type adhesive is used, the two liquids are sequentially applied separately in a film thickness of several tens of μm, and pressure is applied to bond the substrates. When such a bonding method is adopted, unevenness in curing will occur due to the pressure at the time of bonding. This is because the coating film of the adhesive becomes non-uniform. Such uneven curing causes wrinkles in the recording layer, which causes defective recording and reproduction.

【0009】1液性湿気硬化型接着剤は、周囲の湿気に
より反応が開始され、接着剤表面を粘着性にするもので
ある。該接着剤を用いる場合、該接着剤を基板に塗布
後、粘着性が失われる前に貼り合わせる。1液性湿気硬
化型接着剤は、周囲の湿気で反応させるものであるた
め、硬化の制御が困難で作業性が悪い。さらに、貼り合
わせ後の接着剤の硬化速度が極めて遅いため、ディスク
の変形の原因となる。
The one-component moisture-curable adhesive is one in which a reaction is initiated by the surrounding moisture to make the adhesive surface tacky. When the adhesive is used, the adhesive is applied to the substrate and then adhered before the tackiness is lost. Since the one-component moisture-curable adhesive reacts with ambient moisture, it is difficult to control the curing and the workability is poor. Further, the curing speed of the adhesive after bonding is extremely slow, which causes deformation of the disk.

【0010】以上のように、熱可塑性のホットメルト系
接着剤を用いる場合は、光ディスク製造時に欠陥が生じ
てしまうことがある。さらに、光ディスクの使用時に、
高速アクセスおよび高速回転による変形が生じてしまう
ことがある。また、光ディスクの保管時に、経時変化に
よる変形や剥がれが生じてしまうことがある。また、1
液性嫌気硬化型接着剤、2液非混合型接着剤、または、
1液性湿気硬化型粘着接着剤を用いる場合は、使用時、
保管時は問題とならないが、光ディスクの製造時に不良
が発生するとゆう問題がある。
As described above, when a thermoplastic hot melt adhesive is used, defects may occur during the manufacture of optical disks. Furthermore, when using the optical disc,
Deformation may occur due to high-speed access and high-speed rotation. Further, when the optical disc is stored, it may be deformed or peeled off due to aging. Also, 1
Liquid anaerobic curable adhesive, 2-liquid non-mixing adhesive, or
When using a one-part moisture-curing adhesive,
Although there is no problem during storage, there is a problem that defects will occur during the manufacture of optical discs.

【0011】そこで本発明は、光ディスク製造時の欠陥
と、光ディスクの保管時の経時変化による変形および剥
がれとを低減した、光ディスク及びその製造方法を提供
することを目的とする。
Therefore, an object of the present invention is to provide an optical disk and a method for manufacturing the optical disk, in which defects during manufacturing of the optical disk and deformation and peeling due to aging during storage of the optical disk are reduced.

【0012】[0012]

【課題を解決するための手段】上記目的を達成するため
に、本発明では、一対の対向する基板と、接着層を有
し、該基板の少なくとも一方は記録膜を有し、上記接着
層は、上記一対の対向する基板の間隙に配置される光デ
ィスクにおいて、上記接着層は、2液性硬化型シリコー
ン樹脂を含有することを特徴とする光ディスクを提供す
る。なお、上記接着層は、その粘度が10〜700ポイ
ズであることが望ましく、また、硬化後の樹脂の硬度
は、20〜80(JIS A)であることが望ましい。
In order to achieve the above object, the present invention has a pair of opposing substrates and an adhesive layer, at least one of which has a recording film, and the adhesive layer is In the optical disc disposed in the gap between the pair of opposed substrates, the adhesive layer contains a two-component curable silicone resin. The adhesive layer preferably has a viscosity of 10 to 700 poise, and the cured resin preferably has a hardness of 20 to 80 (JIS A).

【0013】また、本発明では、少なくとも一方に記録
層を形成した2枚の透明基板に、接着剤を塗布して接着
層を形成する接着剤塗布工程と、該接着層が内側になる
ように上記2枚の透明基板を対向させて加圧し接着する
接着工程とを有する光ディスク製造方法において、上記
接着剤は、2液性硬化型シリコーン接着剤を含有するこ
とを特徴とする光ディスク製造方法を提供する。前記接
着剤は、粘度が10〜700ポイズであり、硬化後の硬
度は、20〜80(JIS A)であることが望まし
い。また、前記接着工程の加圧が、0.4〜0.8kg
/cm2であることが望ましい。さらに、前記接着工程
は、1〜20Torrの減圧雰囲気で行なうことが望ま
しい。
Further, in the present invention, an adhesive application step of applying an adhesive to two transparent substrates having a recording layer formed on at least one side to form an adhesive layer, and the adhesive layer is placed inside. A method of manufacturing an optical disk, comprising a step of adhering the two transparent substrates so as to face each other and pressurizing and adhering them, wherein the adhesive contains a two-component curable silicone adhesive. To do. It is desirable that the adhesive has a viscosity of 10 to 700 poise and a hardness after curing of 20 to 80 (JIS A). In addition, the pressure applied in the bonding step is 0.4 to 0.8 kg.
/ Cm2 is desirable. Furthermore, it is desirable that the bonding step be performed in a reduced pressure atmosphere of 1 to 20 Torr.

【0014】[0014]

【作用】本発明によれば、光ディスクを作製する際、基
板の接着に、粘度が10〜700ポイズ、硬化後の硬度
が20〜80(JIS A)の2液混合型シリコーン接
着剤を用いる。このようにすれば、接着層が均一に硬化
し、未硬化物による記録膜の腐食を無くすことができ
る。
According to the present invention, when an optical disk is manufactured, a two-component mixed type silicone adhesive having a viscosity of 10 to 700 poise and a hardness after curing of 20 to 80 (JIS A) is used for adhering a substrate. By doing so, the adhesive layer is uniformly hardened and corrosion of the recording film due to the uncured material can be eliminated.

【0015】接着剤は、貼り合わせ後に均一に反応が完
了し硬化することが望ましい。これは、不均一な反応に
よる未硬化物の残留を避けるためである。接着層が不均
一に反応し未硬化物が残留すると、未硬化物により記録
膜の腐食が生じたりする。1液性湿気硬化型接着剤のよ
うに、外気の湿気で反応硬化するものは、基板の内周や
外周は外気と接しているため反応が比較的速く硬化する
が、湿気が入りにくい中周部は反応が遅く硬化が不十分
になり未硬化物が残留してしまう。そこで、本発明で
は、硬化剤を用いた2液性の接着剤を用いる。また、上
記接着剤の粘度は、基板上に接着層を塗布むらがなく均
一に形成でき、貼り合わせた際の接着剤の不均一な流動
を無くし基板の凹凸発生を防止でき、かつ、粘着効果に
より貼り合わせ後の硬化までの基板のずれを少なくでき
る。さらに、上記硬化後の硬度は、接着層に混入した気
泡や反応むらによる歪を吸収緩和し、基板の凹凸の発生
を防止できる。
It is desirable that the adhesive be cured after completion of the reaction evenly after the bonding. This is to avoid residual uncured material due to non-uniform reaction. If the adhesive layer reacts nonuniformly and the uncured material remains, the uncured material causes corrosion of the recording film. One-component moisture-curable adhesives that react and cure with the humidity of the outside air will cure relatively quickly because the inner and outer peripheries of the substrate are in contact with the outside air, but the middle circumference will not easily get moisture. The reaction of the parts is slow and the curing is insufficient, and the uncured product remains. Therefore, in the present invention, a two-component adhesive agent using a curing agent is used. In addition, the viscosity of the adhesive is such that the adhesive layer can be uniformly formed on the substrate without uneven coating, uneven flow of the adhesive at the time of bonding can be eliminated, and unevenness of the substrate can be prevented, and the adhesive effect As a result, it is possible to reduce the displacement of the substrate before the curing after the bonding. Further, the hardness after curing absorbs and relaxes strains due to bubbles mixed in the adhesive layer and uneven reaction, and thus it is possible to prevent unevenness of the substrate from occurring.

【0016】貼り合わせ時の基板に加圧する圧力は、
0.4〜0.8kg/cm2にすることが望ましい。圧
力不足による基板の密着不良や高圧による接着剤の流動
を無くすことができる。
The pressure applied to the substrates at the time of bonding is
It is desirable to set it to 0.4 to 0.8 kg / cm 2. It is possible to eliminate poor adhesion of the substrate due to insufficient pressure and flow of the adhesive due to high pressure.

【0017】貼り合わせ工程を減圧雰囲気にすることが
望ましい。これは、接着層への気泡の混入と、未硬化物
の発生を防止し、さらに、一旦混入した気泡の放出を促
進するためである。大気圧雰囲気では、混入した気泡に
より記録膜に凹凸を生じさせるとゆう悪影響をおよぼ
す。
It is desirable that the bonding step is performed in a reduced pressure atmosphere. This is to prevent air bubbles from being mixed into the adhesive layer and to prevent uncured substances from being generated, and further to promote the release of air bubbles once mixed. In an atmospheric pressure atmosphere, the inclusion of air bubbles has a bad influence on the recording film.

【0018】次に、本発明の光ディスクに用いた2液性
硬化型シリコーン接着剤について詳細に説明する。2液
性硬化型シリコーン接着剤は主剤と硬化剤とからなり、
塗布前に混合し、2液が反応硬化するものであり、熱可
塑性のホットメルト系接着剤に比較し、接着力、耐熱
性、機械的強度の面で優れ、光ディスクの接着剤に用い
た場合、耐熱性が優れているため様々な環境に適し、機
械的強度が優れ、特に、記録膜への悪影響が少なく腐食
させることがない極めて信頼性の高い光ディスクを得る
ことができる。
Next, the two-part curable silicone adhesive used for the optical disk of the present invention will be described in detail. The two-component curing type silicone adhesive is composed of a main agent and a curing agent,
When used as an adhesive for optical disks, it mixes before application and the two liquids react and cure, and are superior in adhesive strength, heat resistance, and mechanical strength compared to thermoplastic hot-melt adhesives. Since it has excellent heat resistance, it is suitable for various environments, has excellent mechanical strength, and in particular, it is possible to obtain an extremely reliable optical disk that has little adverse effect on the recording film and does not corrode.

【0019】2液性の成分の組合せは、主剤にベースポ
リマと架橋剤、硬化剤に硬化触媒、主剤にベースポリ
マ、硬化剤に架橋剤と硬化触媒、主剤にベースポリマと
硬化触媒、硬化剤に架橋剤、以上の3種類がある。
The combination of the two-component components includes a base polymer and a cross-linking agent as main components, a curing catalyst as a curing agent, a base polymer as a main component, a crosslinking agent and a curing catalyst as a curing agent, a base polymer and a curing catalyst as a main component, and a curing agent. There are three types of crosslinking agents.

【0020】上記2液性硬化型シリコーン接着剤の構成
は、末端に官能基をもったジオルガノポリシロキサンを
ベースポリマとし、ベースポリマを3次元架橋させる3
官能以上のシランまたはシロキサンなどの架橋剤、ベー
スポリマと架橋剤を反応させる硬化触媒を分けて2液化
して用いる。尚、これらに、充填剤やその他の添加剤を
好敵に配合して用いても良い。上記ベースポリマを例示
すると、末端ヒドロキシ変性メチルポリシロキサン、末
端ヒドロキシ変性フェニルポリシロキサン、末端ビニル
基変性メチルポリシロキサン、末端ビニル基変性フェニ
ルポリシロキサン、末端水素化メチルポリシロキサン、
末端水素化フェニルポリシロキサンなどがある。
In the constitution of the above-mentioned two-component curable silicone adhesive, the base polymer is a diorganopolysiloxane having a functional group at the terminal, and the base polymer is three-dimensionally crosslinked.
A cross-linking agent such as silane or siloxane having a functionality or more, and a curing catalyst for reacting the base polymer with the cross-linking agent are separately liquefied and used. In addition, you may mix | blend these with a filler and other additives, and may use them. Examples of the above-mentioned base polymer include terminal hydroxy-modified methyl polysiloxane, terminal hydroxy-modified phenyl polysiloxane, terminal vinyl group-modified methyl polysiloxane, terminal vinyl group-modified phenyl polysiloxane, terminal hydrogenated methyl polysiloxane,
Examples include hydrogenated phenyl polysiloxane.

【0021】また、上記架橋剤について例示すると、テ
トラメトキシシラン、テトラエトキシシラン、ビニルト
リメトキシシラン、ビニルトリエトキシシラン、ジメチ
ルアミノトリメトキシシラン、ジメチルアミノトリエト
キシシランなどがある。
Examples of the cross-linking agent include tetramethoxysilane, tetraethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, dimethylaminotrimethoxysilane and dimethylaminotriethoxysilane.

【0022】また、上記硬化触媒について例示すると、
脱アルコール反応をのためのスズ化合物、脱水素反応の
為の白金化合物、スズ化合物、付加反応のための白金化
合物などがある。
Further, exemplifying the above-mentioned curing catalyst,
There are tin compounds for dealcoholization reaction, platinum compounds for dehydrogenation reaction, tin compounds, and platinum compounds for addition reaction.

【0023】[0023]

【実施例】以下に本発明の実施例を、図面を引用して説
明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0024】図1に本発明の光ディスクの模式図を示
す。なお、光ディスクは、中央に孔34の開いた円盤型
をしている、内部構造を見やすくするため、一部破断、
一部断面図として示した。また、この図1のAB間の断
面図を図2に示す。以下の各実施例の光ディスクは、一
対の対向する基板3の間隙に配置され、2液性硬化型シ
リコーン接着剤の硬化物からなる。上記基板3は、透明
レプリカ基板1と、記録用金属膜(記録膜)2とを有
し、記録膜2が内側になるように、対向している。な
お、以下の各実施例では、2枚の、同じように凹凸と記
録膜とを有する基板3を貼り合わせて、両面に情報を記
録できる光ディスクを作製しているが、一方の基板は、
凹凸や記録膜2を有さなくてもよい。この場合、片面に
のみ記録できる。
FIG. 1 shows a schematic diagram of the optical disk of the present invention. The optical disk has a disk shape with a hole 34 in the center.
It is shown as a partial sectional view. 2 is a sectional view taken along the line AB in FIG. The optical disks of the following examples are arranged in the gap between a pair of opposing substrates 3 and are made of a cured product of a two-component curable silicone adhesive. The substrate 3 has a transparent replica substrate 1 and a recording metal film (recording film) 2 and faces each other with the recording film 2 inside. In each of the following examples, two substrates 3 having the same unevenness and recording film are bonded to each other to manufacture an optical disc capable of recording information on both sides. However, one substrate is
It is not necessary to have the unevenness or the recording film 2. In this case, data can be recorded on only one side.

【0025】透明レプリカ基板1は、記録再生の為のレ
ーザが透過する媒体である。このため、光学的に等方性
で、光学特性の目安となる光学歪が50nm以下の特性
を有している必要がある。特に種類は限定されないが、
例示すると、ガラス基板、ポリメチルメタクリレート基
板、ポリカーボネート基板、ポリオレフィン基板、熱又
は光硬化樹脂基板などがある。記録膜2は、0.6〜1
μm程度の光スポット径に対応し、相変化や光磁気など
のように記録膜の形状が変化しない、記録ドメインを形
成するものであればよく、特に種類は限定されない。例
示すると、テルル酸化膜(TeOx)、SbSe/BiT
e積層膜、希土類−遷移金属アモルファス合金、TbF
eCo系酸化膜、GdTbFe系酸化膜、DyFeCo
系酸化膜、TbDyFeCo系酸化膜、ガ−ネット系酸
化膜、Pt/Co積層材料、GeSbTe、InSeT
eCo、InSbTe、In−Sb系合金などである。
The transparent replica substrate 1 is a medium through which a laser for recording / reproducing is transmitted. For this reason, it is necessary to have characteristics such that it is optically isotropic and has an optical strain of 50 nm or less, which is a measure of optical characteristics. The type is not particularly limited,
For example, a glass substrate, a polymethylmethacrylate substrate, a polycarbonate substrate, a polyolefin substrate, a heat or light curing resin substrate, or the like can be given. The recording film 2 is 0.6 to 1
The type is not particularly limited as long as it corresponds to an optical spot diameter of about μm and does not change the shape of the recording film such as phase change or magneto-optical property and forms a recording domain. For example, tellurium oxide film (TeOx), SbSe / BiT
e Laminated film, rare earth-transition metal amorphous alloy, TbF
eCo-based oxide film, GdTbFe-based oxide film, DyFeCo
System oxide film, TbDyFeCo system oxide film, garnet system oxide film, Pt / Co laminated material, GeSbTe, InSeT
Examples include eCo, InSbTe, and In-Sb alloys.

【0026】以下の実施例では、東レ・シリコーン
(株)製の2液性硬化型シリコーン接着剤を用いた。実
施例1〜10における、各接着剤の特性を(表1)に示
す。
In the following examples, a two-component curable silicone adhesive manufactured by Toray Silicone Co., Ltd. was used. The characteristics of each adhesive in Examples 1 to 10 are shown in (Table 1).

【0027】[0027]

【表1】 [Table 1]

【0028】以下に記載した各実施例では、光ディスク
を製造するためにスタンパを使用している。なお、スタ
ンパは、情報パターンに相当する凹凸形状が形成され、
この凹凸表面が、離型性に優れる複写の型であれば特に
種類は限定しない。例えば、電鋳スタンパ、樹脂スタン
パ、ガラススタンパ等のいずれを用いてもよい。各実施
例で使用したスタンパは、図3の外径300mm光ディ
スク用及び図4の外径130mm光ディスク用を(a)
〜(f)の製造方法に従って作製した。
In each of the embodiments described below, a stamper is used to manufacture an optical disc. In addition, the stamper has an uneven shape corresponding to the information pattern,
The type of the uneven surface is not particularly limited as long as it is a copy type having excellent releasability. For example, any of an electroformed stamper, a resin stamper, a glass stamper, etc. may be used. The stamper used in each example is for the optical disc having an outer diameter of 300 mm shown in FIG. 3 and the optical disc having an outer diameter of 130 mm shown in FIG. 4 (a).
It manufactured according to the manufacturing method of- (f).

【0029】外径300mm光ディスク用のスタンパ
は、両面が研磨されたガラス円盤17(外径:350m
m,内径:10mm,厚さ:10mm)を用意する
(a)。次に、ガラス円盤17の研磨された一方にポジ
型フォトレジストをスピン塗布し、0.14μmの膜厚
を有するフォトレジスト膜16を形成する(b)。つい
で、記録機より、該フォトレジスト膜16にArレーザ
(波長:458nm)を用いて情報信号を書き込み、フ
ォトレジスト膜現像して、情報信号を表すグルーブやピ
ットの凹凸を形成する(c)。なお、本実施例で作製さ
れる光ディスクにおいては、上記凹凸は、番地など、記
録膜に記録された情報を読み取るための補助情報を表し
ている。以上のようにして凹凸の形成されたされたフォ
トレジスト膜16に、真空蒸着法により40nmの膜厚
を有するNi膜5を形成する(d)。さらに、Ni膜5
を電極として、電解メッキ法により300μmの膜厚を
有するNi電鋳膜6を形成し(e)、ガラス円盤17と
Ni膜5の間を剥離して、Ni製スタンパ7を作成した
(f)。
The stamper for an optical disc having an outer diameter of 300 mm is a glass disk 17 having both sides polished (outer diameter: 350 m).
m, inner diameter: 10 mm, thickness: 10 mm) is prepared (a). Next, a positive type photoresist is spin-coated on the polished one side of the glass disk 17 to form a photoresist film 16 having a film thickness of 0.14 μm (b). Then, an information signal is written from the recording device to the photoresist film 16 by using an Ar laser (wavelength: 458 nm), and the photoresist film is developed to form irregularities of grooves or pits representing the information signal (c). In the optical disc manufactured in this example, the irregularities represent auxiliary information for reading information recorded on the recording film, such as an address. The Ni film 5 having a thickness of 40 nm is formed on the photoresist film 16 having the irregularities formed as described above by a vacuum vapor deposition method (d). Furthermore, the Ni film 5
Ni as an electrode, an Ni electroformed film 6 having a thickness of 300 μm was formed by an electrolytic plating method (e), and the glass disk 17 and the Ni film 5 were peeled off to form a Ni stamper 7 (f). .

【0030】外径130mm光ディスク用のスタンパ
は、両面が研磨されたガラス円盤17(外径:200m
m,内径:5mm,厚さ:10mm)を用意する
(a)。次に、ガラス円盤17の研磨された一方にポジ
型フォトレジストをスピン塗布し、0.14μmの膜厚
を有するフォトレジスト膜16を形成する(b)。つい
で、記録機より、該フォトレジスト膜16にArレーザ
(波長:458nm)を用いて情報信号を書き込み、フ
ォトレジスト膜現像して、情報信号を表すグルーブやピ
ットの凹凸を形成する(c)。なお、本実施例で作製さ
れる光ディスクにおいては、上記凹凸は、番地など、記
録膜に記録された情報を読み取るための補助情報を表し
ている。以上のようにして凹凸の形成されたされたフォ
トレジスト膜16に、真空蒸着法により40nmの膜厚
を有するNi膜5を形成する(d)。さらに、Ni膜5
を電極として、電解メッキ法により300μmの膜厚を
有するNi電鋳膜6を形成し(e)、ガラス円盤17と
Ni膜5の間を剥離して、Ni製スタンパ7を作成した
(f)。
The stamper for an optical disc having an outer diameter of 130 mm is a glass disk 17 having both sides polished (outer diameter: 200 m).
m, inner diameter: 5 mm, thickness: 10 mm) is prepared (a). Next, a positive type photoresist is spin-coated on the polished one side of the glass disk 17 to form a photoresist film 16 having a film thickness of 0.14 μm (b). Then, an information signal is written from the recording device to the photoresist film 16 by using an Ar laser (wavelength: 458 nm), and the photoresist film is developed to form irregularities of grooves or pits representing the information signal (c). In the optical disc manufactured in this example, the irregularities represent auxiliary information for reading information recorded on the recording film, such as an address. The Ni film 5 having a thickness of 40 nm is formed on the photoresist film 16 having the irregularities formed as described above by a vacuum vapor deposition method (d). Furthermore, the Ni film 5
Ni as an electrode, an Ni electroformed film 6 having a thickness of 300 μm was formed by an electrolytic plating method (e), and the glass disk 17 and the Ni film 5 were peeled off to form a Ni stamper 7 (f). .

【0031】(実施例1〜2)接着剤として、表1の実
施例1〜2の欄に記載した接着剤を用い、次のようにし
て光ディスクを製造した。製造方法を、図5に示す。本
実施例では、ポリカーボネート樹脂性のレプリカ基板1
を調整し、記録膜2として、SiNエンハンス膜12、
TbFeCo磁性膜13、AlN反射膜14、および、
SiN保護膜15の4層の膜をレプリカ基板1上に形成
し、上記接着剤を用いて接着して、光ディスクを得た。
(Examples 1 and 2) As the adhesive, the adhesives described in the columns of Examples 1 and 2 in Table 1 were used to manufacture optical disks as follows. The manufacturing method is shown in FIG. In this embodiment, a polycarbonate resin replica substrate 1 is used.
By adjusting the SiN enhance film 12 as the recording film 2,
TbFeCo magnetic film 13, AlN reflective film 14, and
Four layers of the SiN protective film 15 were formed on the replica substrate 1 and adhered using the above adhesive to obtain an optical disc.

【0032】まず、130mm用Ni製スタンパ7を用
意する(a)。スタンパ7を、注入孔を有する成形型8
に取付け、成形型8内の間隙9にポリカーボネート樹脂
10(分子量:約15000)を加熱溶融させて注入す
る(b)。なお、上記間隙9は、外径が130mm、厚
さが1.2mmの円盤型をしており、中心に15mmの
内径の中心孔を有する(すなわち、成形型8は、中心部
に外径15mmの円柱形の突起部(図示せず)を有し、
スタンパ7と成形型8とを外せば、スタンパ7のグルー
ブやピットの凹凸が転写された、ポリカーボネート樹脂
製のレプリカ基板1(外径:130mm,中心孔径:1
5mm,厚さ:1.2mm)を得ることができる
(c)。
First, a 130 mm Ni stamper 7 is prepared (a). The stamper 7 is replaced with a molding die 8 having an injection hole.
Then, the polycarbonate resin 10 (molecular weight: about 15000) is heated and melted and injected into the gap 9 in the molding die 8 (b). The gap 9 has a disk shape with an outer diameter of 130 mm and a thickness of 1.2 mm, and has a central hole with an inner diameter of 15 mm at the center (that is, the molding die 8 has an outer diameter of 15 mm at the center). Has a cylindrical protrusion (not shown) of
By removing the stamper 7 and the molding die 8, the replica substrate 1 made of a polycarbonate resin (outer diameter: 130 mm, center hole diameter: 1) on which the grooves and pits of the stamper 7 are transferred
5 mm, thickness: 1.2 mm) can be obtained (c).

【0033】ついで、得られたレプリカ基板1の凹凸が
転写された面(情報パターン面)に、SiNエンハンス
膜12(厚さ:30nm),TbFeCo磁性膜13
(厚さ:30nm),AlN反射膜14(厚さ:30n
m),SiN保護膜15(厚さ:30nm)をスパッタ
法により順次成膜して、記録膜2とし、基板3を得た
(d)。
Then, on the surface (information pattern surface) on which the unevenness of the obtained replica substrate 1 is transferred, the SiN enhance film 12 (thickness: 30 nm) and the TbFeCo magnetic film 13 are formed.
(Thickness: 30 nm), AlN reflective film 14 (thickness: 30 n
m) and the SiN protective film 15 (thickness: 30 nm) were sequentially formed by the sputtering method to form the recording film 2 and the substrate 3 was obtained (d).

【0034】以上のようにして作製した基板3の記録膜
上に、表1の実施例1〜3の2液性硬化型シリコーン接
着剤の主剤と硬化剤を混合した接着剤をスピンコート法
により塗布し、30μmの厚さを有する接着層4を形成
した(e)。更にこの工程を繰返し、接着層4を形成し
た基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive obtained by mixing the main component of the two-component curable silicone adhesive of Examples 1 to 3 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0035】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0036】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た。
Thereafter, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2.

【0037】(実施例3)接着剤として、表1の実施例
3の欄に記載した接着剤を用い、次のようにして光ディ
スクを製造した。製造方法を、図6に示す。本実施例で
は、ポリカーボネート樹脂性のレプリカ基板1を調整
し、記録膜2として、SiNエンハンス膜12、TbF
eCo磁性膜13、AlN反射膜14、および、SiN
保護膜15の4層の膜をレプリカ基板1上に形成し、上
記接着剤を用いて接着して、光ディスクを得た。
(Example 3) An optical disk was manufactured as follows by using the adhesive described in the column of Example 3 in Table 1 as the adhesive. The manufacturing method is shown in FIG. In this embodiment, the replica substrate 1 made of a polycarbonate resin is prepared, and the recording film 2 includes the SiN enhance film 12 and TbF.
eCo magnetic film 13, AlN reflective film 14, and SiN
Four layers of the protective film 15 were formed on the replica substrate 1 and adhered using the above adhesive to obtain an optical disc.

【0038】まず、300mm用Ni製スタンパ7を用
意する(a)。スタンパ7を、注入孔を有する成形型8
に取付け、成形型8内の間隙9にポリカーボネート樹脂
10(分子量:約15000)を加熱溶融させて注入す
る(b)。なお、上記間隙9は、外径が300mm、厚
さが1.2mmの円盤型をしており、中心に35mmの
内径の中心孔を有する(すなわち、成形型8は、中心部
に外径35mmの円柱形の突起部(図示せず)を有し、
スタンパ7と成形型8とを外せば、スタンパ7のグルー
ブやピットの凹凸が転写された、ポリカーボネート樹脂
製のレプリカ基板1(外径:300mm,中心孔径:3
5mm,厚さ:1.2mm)を得ることができる
(c)。
First, a 300 mm Ni stamper 7 is prepared (a). The stamper 7 is replaced with a molding die 8 having an injection hole.
Then, the polycarbonate resin 10 (molecular weight: about 15000) is heated and melted and injected into the gap 9 in the molding die 8 (b). The gap 9 has a disk shape with an outer diameter of 300 mm and a thickness of 1.2 mm, and has a central hole with an inner diameter of 35 mm at the center (that is, the molding die 8 has an outer diameter of 35 mm at the center). Has a cylindrical protrusion (not shown) of
If the stamper 7 and the molding die 8 are removed, the replica substrate 1 made of a polycarbonate resin (outer diameter: 300 mm, center hole diameter: 3) on which the grooves and pits of the stamper 7 are transferred.
5 mm, thickness: 1.2 mm) can be obtained (c).

【0039】ついで、得られたレプリカ基板1の凹凸が
転写された面(情報パターン面)に、SiNエンハンス
膜12(厚さ:30nm),TbFeCo磁性膜13
(厚さ:30nm),AlN反射膜14(厚さ:30n
m),SiN保護膜15(厚さ:30nm)をスパッタ
法により順次成膜して、記録膜2とし、基板3を得た
(d)。
Then, on the surface (information pattern surface) on which the unevenness of the obtained replica substrate 1 is transferred, a SiN enhance film 12 (thickness: 30 nm) and a TbFeCo magnetic film 13 are formed.
(Thickness: 30 nm), AlN reflective film 14 (thickness: 30 n
m) and the SiN protective film 15 (thickness: 30 nm) were sequentially formed by the sputtering method to form the recording film 2 and the substrate 3 was obtained (d).

【0040】以上のようにして作製した基板3の記録膜
上に、表1の実施例1〜3の2液性硬化型シリコーン接
着剤の主剤と硬化剤を混合した接着剤をスピンコート法
により塗布し、30μmの厚さを有する接着層4を形成
した(e)。更にこの工程を繰返し、接着層4を形成し
た基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive obtained by mixing the main component of the two-component curable silicone adhesive of Examples 1 to 3 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0041】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside, and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0042】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た。
Then, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2.

【0043】(実施例4〜5)接着剤として、表1の実
施例4〜5の欄に記載した接着剤を用い、次のようにし
て光ディスクを製造した。製造方法を、図7に示す。本
実施例では、紫外線硬化樹脂とプラスチック板とからな
るレプリカ基板1を調整し、記録膜2として、GeSb
Te記録膜25,SbBi反射膜26,SiN保護膜2
7の3層の膜をレプリカ基板1上に形成し、上記接着剤
を用いて接着して、光ディスクを得た。
(Examples 4 to 5) As the adhesive, the adhesives described in the columns of Examples 4 to 5 in Table 1 were used to manufacture optical disks as follows. The manufacturing method is shown in FIG. In this embodiment, a replica substrate 1 made of an ultraviolet curable resin and a plastic plate is prepared, and the recording film 2 is made of GeSb.
Te recording film 25, SbBi reflective film 26, SiN protective film 2
A three-layer film of No. 7 was formed on the replica substrate 1 and adhered using the above adhesive to obtain an optical disc.

【0044】まず、130mm用Ni製スタンパ7を用
意する(a)。該スタンパ7凹凸面に、紫外線硬化樹脂
22(粘度:200cp)を滴下し、プラスチック板2
3(外形:130mm,内径:15mm,厚さ:1.1
mm)で、紫外線硬化性樹脂22の膜厚が80μmにな
るように押し広げる。つぎに、紫外線照射装置20によ
り、プラスチック板側より、30秒、100mW/cm
2の強さの紫外線を照射し、前記紫外線硬化性樹脂22
を硬化させる(b)。スタンパ7と紫外線硬化性樹脂2
2との間を剥離させれば、スタンパ7のグルーブやピッ
トの凹凸が転写されたレプリカ基板1が得られる
(c)。
First, a 130 mm Ni stamper 7 is prepared (a). An ultraviolet curable resin 22 (viscosity: 200 cp) is dropped on the uneven surface of the stamper 7 to form a plastic plate 2
3 (outer diameter: 130 mm, inner diameter: 15 mm, thickness: 1.1
mm), the UV curable resin 22 is spread so as to have a thickness of 80 μm. Next, using the ultraviolet irradiation device 20, from the plastic plate side, 30 seconds, 100 mW / cm
The ultraviolet curable resin 22 is irradiated with ultraviolet rays of intensity 2
Is cured (b). Stamper 7 and UV curable resin 2
When the gap between the two is peeled off, the replica substrate 1 in which the grooves and pits of the stamper 7 are transferred is obtained (c).

【0045】上記レプリカ基板1の情報パターン面に、
GeSbTe記録膜25(厚さ:30nm),SbBi
反射膜26(厚さ:20nm),SiN保護膜27(厚
さ:30nm)をスパッタ法により順次成膜し、レプリ
カ基板1上に記録膜28が形成された、基板3を作製し
た(d)。
On the information pattern surface of the replica substrate 1,
GeSbTe recording film 25 (thickness: 30 nm), SbBi
A reflective film 26 (thickness: 20 nm) and a SiN protective film 27 (thickness: 30 nm) were sequentially formed by a sputtering method to prepare a substrate 3 having a recording film 28 formed on the replica substrate 1 (d). .

【0046】以上のようにして作製した基板3の記録膜
上に、表1の実施例4〜6の2液性硬化型シリコーン接
着剤の主剤と硬化剤を混合した接着剤をスピンコート法
により塗布し、30μmの厚さを有する接着層4を形成
した(e)。更にこの工程を繰返し、接着層4を形成し
た基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive obtained by mixing the main component of the two-component curable silicone adhesive of Examples 4 to 6 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0047】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0048】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た
(i)。
Then, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2 (i).

【0049】(実施例6)接着剤として、表1の実施例
6の欄に記載した接着剤を用い、次のようにして光ディ
スクを製造した。製造方法を、図8に示す。本実施例で
は、紫外線硬化樹脂とプラスチック板とからなるレプリ
カ基板1を調整し、記録膜2として、GeSbTe記録
膜25,SbBi反射膜26,SiN保護膜27の3層
の膜をレプリカ基板1上に形成し、上記接着剤を用いて
接着して、光ディスクを得た。
(Example 6) An optical disk was manufactured as follows by using the adhesive described in the column of Example 6 in Table 1 as the adhesive. The manufacturing method is shown in FIG. In this embodiment, a replica substrate 1 made of an ultraviolet curable resin and a plastic plate is prepared, and as the recording film 2, three layers of a GeSbTe recording film 25, an SbBi reflective film 26, and a SiN protective film 27 are formed on the replica substrate 1. Then, the optical disc was obtained by bonding with the above adhesive.

【0050】まず、300mm用Ni製スタンパ7を用
意する(a)。該スタンパ7凹凸面に、紫外線硬化樹脂
22(粘度:200cp)を滴下し、プラスチック板2
3(外形:300mm,内径:35mm,厚さ:1.1
mm)で、紫外線硬化性樹脂22の膜厚が80μmにな
るように押し広げる。つぎに、紫外線照射装置20によ
り、プラスチック板側より、30秒、100mW/cm
2の強さの紫外線を照射し、前記紫外線硬化性樹脂22
を硬化させる(b)。スタンパ7と紫外線硬化性樹脂2
2との間を剥離させれば、スタンパ7のグルーブやピッ
トの凹凸が転写されたレプリカ基板1が得られる
(c)。
First, a 300 mm Ni stamper 7 is prepared (a). An ultraviolet curable resin 22 (viscosity: 200 cp) is dropped on the uneven surface of the stamper 7 to form a plastic plate 2
3 (outer diameter: 300 mm, inner diameter: 35 mm, thickness: 1.1
mm), the UV curable resin 22 is spread so as to have a thickness of 80 μm. Next, using the ultraviolet irradiation device 20, from the plastic plate side, 30 seconds, 100 mW / cm
The ultraviolet curable resin 22 is irradiated with ultraviolet rays of intensity 2
Is cured (b). Stamper 7 and UV curable resin 2
When the gap between the two is peeled off, the replica substrate 1 in which the grooves and pits of the stamper 7 are transferred is obtained (c).

【0051】上記レプリカ基板1の情報パターン面に、
GeSbTe記録膜25(厚さ:30nm),SbBi
反射膜26(厚さ:20nm),SiN保護膜27(厚
さ:30nm)をスパッタ法により順次成膜し、レプリ
カ基板1上に記録膜28が形成された、基板3を作製し
た(d)。
On the information pattern surface of the replica substrate 1,
GeSbTe recording film 25 (thickness: 30 nm), SbBi
A reflective film 26 (thickness: 20 nm) and a SiN protective film 27 (thickness: 30 nm) were sequentially formed by a sputtering method to prepare a substrate 3 having a recording film 28 formed on the replica substrate 1 (d). .

【0052】以上のようにして作製した基板3の記録膜
上に、表1の実施例4〜6の2液性硬化型シリコーン接
着剤の主剤と硬化剤を混合した接着剤をスピンコート法
により塗布し、30μmの厚さを有する接着層4を形成
した(e)。更にこの工程を繰返し、接着層4を形成し
た基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive obtained by mixing the main component of the two-component curable silicone adhesive of Examples 4 to 6 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0053】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside, and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0054】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た
(i)。
Thereafter, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2 (i).

【0055】(実施例7)接着剤として、表1の実施例
7の欄に記載した接着剤を用い、次のようにして光ディ
スクを製造した。製造方法を、図9に示す。本実施例で
は、ポリカーボネート樹脂性のレプリカ基板1を調整
し、記録膜2として、GeSbTe記録膜25,SbB
i反射膜26,SiN保護膜27の3層の膜をレプリカ
基板1上に形成し、上記接着剤を用いて接着して、光デ
ィスクを得た。
(Example 7) An optical disk was manufactured as follows by using the adhesive described in the column of Example 7 in Table 1 as the adhesive. The manufacturing method is shown in FIG. In this embodiment, the polycarbonate resin replica substrate 1 is adjusted so that the recording film 2 is formed of GeSbTe recording films 25 and SbB.
An i-reflective film 26 and a SiN protective film 27 having three layers were formed on the replica substrate 1 and adhered using the above adhesive to obtain an optical disc.

【0056】まず、130mm用Ni製スタンパ7を用
意する(a)。スタンパ7を、注入孔を有する成形型8
に取付け、成形型8内の間隙9にポリカーボネート樹脂
10(分子量:約15000)を加熱溶融させて注入す
る(b)。なお、上記間隙9は、外径が130mm、厚
さが1.2mmの円盤型をしており、中心に15mmの
内径の中心孔を有する(すなわち、成形型8は、中心部
に外径15mmの円柱形の突起部(図示せず)を有し、
スタンパ7と成形型8とを外せば、スタンパ7のグルー
ブやピットの凹凸が転写された、ポリカーボネート樹脂
製のレプリカ基板1(外径:130mm,中心孔径:1
5mm,厚さ:1.2mm)を得ることができる
(c)。
First, a 130 mm Ni stamper 7 is prepared (a). The stamper 7 is replaced with a molding die 8 having an injection hole.
Then, the polycarbonate resin 10 (molecular weight: about 15000) is heated and melted and injected into the gap 9 in the molding die 8 (b). The gap 9 has a disk shape with an outer diameter of 130 mm and a thickness of 1.2 mm, and has a central hole with an inner diameter of 15 mm at the center (that is, the molding die 8 has an outer diameter of 15 mm at the center). Has a cylindrical protrusion (not shown) of
By removing the stamper 7 and the molding die 8, the replica substrate 1 made of a polycarbonate resin (outer diameter: 130 mm, center hole diameter: 1) on which the grooves and pits of the stamper 7 are transferred
5 mm, thickness: 1.2 mm) can be obtained (c).

【0057】上記レプリカ基板1の情報パターン面に、
GeSbTe記録膜25(厚さ:30nm),SbBi
反射膜26(厚さ:20nm),SiN保護膜27(厚
さ:30nm)をスパッタ法により順次成膜して、記録
膜2とし、基板3を得た(d)。
On the information pattern surface of the replica substrate 1,
GeSbTe recording film 25 (thickness: 30 nm), SbBi
A reflective film 26 (thickness: 20 nm) and a SiN protective film 27 (thickness: 30 nm) were sequentially formed by a sputtering method to form a recording film 2 and a substrate 3 was obtained (d).

【0058】以上のようにして作製した基板3の記録膜
上に、表1の実施例7、8の2液性硬化型シリコーン接
着剤の主剤と硬化剤を混合した接着剤をスピンコート法
により塗布し、30μmの厚さを有する接着層4を形成
した(e)。更にこの工程を繰返し、接着層4を形成し
た基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive obtained by mixing the main component of the two-component curable silicone adhesive of Examples 7 and 8 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0059】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside, and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0060】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た。
Thereafter, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2.

【0061】(実施例8)接着剤として、表1の実施例
8の欄に記載した接着剤を用い、次のようにして光ディ
スクを製造した。製造方法を、図10に示す。本実施例
では、ポリカーボネート樹脂性のレプリカ基板1を調整
し、記録膜2として、GeSbTe記録膜25,SbB
i反射膜26,SiN保護膜27の3層の膜をレプリカ
基板1上に形成し、上記接着剤を用いて接着して、光デ
ィスクを得た。
Example 8 An optical disk was manufactured as follows by using the adhesive described in the column of Example 8 in Table 1 as the adhesive. The manufacturing method is shown in FIG. In this embodiment, the polycarbonate resin replica substrate 1 is adjusted so that the recording film 2 is formed of GeSbTe recording films 25 and SbB.
An i-reflective film 26 and a SiN protective film 27 having three layers were formed on the replica substrate 1 and adhered using the above adhesive to obtain an optical disc.

【0062】まず、300mm用Ni製スタンパ7を用
意する(a)。スタンパ7を、注入孔を有する成形型8
に取付け、成形型8内の間隙9にポリカーボネート樹脂
10(分子量:約15000)を加熱溶融させて注入す
る(b)。なお、上記間隙9は、外径が300mm、厚
さが1.2mmの円盤型をしており、中心に35mmの
内径の中心孔を有する(すなわち、成形型8は、中心部
に外径35mmの円柱形の突起部(図示せず)を有し、
スタンパ7と成形型8とを外せば、スタンパ7のグルー
ブやピットの凹凸が転写された、ポリカーボネート樹脂
製のレプリカ基板1(外径:300mm,中心孔径:3
5mm,厚さ:1.2mm)を得ることができる
(c)。
First, a 300 mm Ni stamper 7 is prepared (a). The stamper 7 is replaced with a molding die 8 having an injection hole.
Then, the polycarbonate resin 10 (molecular weight: about 15000) is heated and melted and injected into the gap 9 in the molding die 8 (b). The gap 9 has a disk shape with an outer diameter of 300 mm and a thickness of 1.2 mm, and has a central hole with an inner diameter of 35 mm at the center (that is, the molding die 8 has an outer diameter of 35 mm at the center). Has a cylindrical protrusion (not shown) of
If the stamper 7 and the molding die 8 are removed, the replica substrate 1 made of a polycarbonate resin (outer diameter: 300 mm, center hole diameter: 3) on which the grooves and pits of the stamper 7 are transferred.
5 mm, thickness: 1.2 mm) can be obtained (c).

【0063】上記レプリカ基板1の情報パターン面に、
GeSbTe記録膜25(厚さ:30nm),SbBi
反射膜26(厚さ:20nm),SiN保護膜27(厚
さ:30nm)をスパッタ法により順次成膜して、記録
膜2とし、基板3を得た(d)。
On the information pattern surface of the replica substrate 1,
GeSbTe recording film 25 (thickness: 30 nm), SbBi
A reflective film 26 (thickness: 20 nm) and a SiN protective film 27 (thickness: 30 nm) were sequentially formed by a sputtering method to form a recording film 2 and a substrate 3 was obtained (d).

【0064】以上のようにして作製した基板3の記録膜
上に、表1の実施例7、8の2液性硬化型シリコーン接
着剤の主剤と硬化剤を混合した接着剤をスピンコート法
により塗布し、30μmの厚さを有する接着層4を形成
した(e)。更にこの工程を繰返し、接着層4を形成し
た基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive obtained by mixing the main component of the two-component curable silicone adhesives of Examples 7 and 8 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0065】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside, and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0066】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た。
Thereafter, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2.

【0067】(実施例9)接着剤として、表1の実施例
9の欄に記載した接着剤を用い、次のようにして光ディ
スクを製造した。製造方法を、図11に示す。本実施例
では、紫外線硬化樹脂とプラスチック板とからなるレプ
リカ基板1を調整し、記録膜2として、SiNエンハン
ス膜12、TbFeCo磁性膜13、AlN反射膜1
4、および、SiN保護膜15の4層の膜をレプリカ基
板1上に形成し、上記接着剤を用いて接着して、光ディ
スクを得た。
(Example 9) An optical disk was manufactured as follows using the adhesive described in the column of Example 9 in Table 1 as the adhesive. The manufacturing method is shown in FIG. In this embodiment, a replica substrate 1 made of an ultraviolet curable resin and a plastic plate is prepared, and as the recording film 2, a SiN enhance film 12, a TbFeCo magnetic film 13, an AlN reflective film 1 are used.
4 and 4 layers of SiN protective film 15 were formed on replica substrate 1 and adhered using the above-mentioned adhesive to obtain an optical disc.

【0068】まず、130mm用Ni製スタンパ7を用
意する(a)。該スタンパ7凹凸面に、紫外線硬化樹脂
22(粘度:200cp)を滴下し、プラスチック板2
3(外形:130mm,内径:15mm,厚さ:1.1
mm)で、紫外線硬化性樹脂22の膜厚が80μmにな
るように押し広げる。つぎに、紫外線照射装置20によ
り、プラスチック板側より、30秒、100mW/cm
2の強さの紫外線を照射し、前記紫外線硬化性樹脂22
を硬化させる(b)。スタンパ7と紫外線硬化性樹脂2
2との間を剥離させれば、スタンパ7のグルーブやピッ
トの凹凸が転写されたレプリカ基板1が得られる
(c)。
First, a Ni stamper 7 for 130 mm is prepared (a). An ultraviolet curable resin 22 (viscosity: 200 cp) is dropped on the uneven surface of the stamper 7 to form a plastic plate 2
3 (outer diameter: 130 mm, inner diameter: 15 mm, thickness: 1.1
mm), the UV curable resin 22 is spread so as to have a thickness of 80 μm. Next, using the ultraviolet irradiation device 20, from the plastic plate side, 30 seconds, 100 mW / cm
The ultraviolet curable resin 22 is irradiated with ultraviolet rays of intensity 2
Is cured (b). Stamper 7 and UV curable resin 2
When the gap between the two is peeled off, the replica substrate 1 in which the grooves and pits of the stamper 7 are transferred is obtained (c).

【0069】上記レプリカ基板1の情報パターン面に、
SiNエンハンス膜12(厚さ:30nm),TbFe
Co磁性膜13(厚さ:30nm),AlN反射膜14
(厚さ:30nm),SiN保護膜15(厚さ:30n
m)をスパッタ法により順次成膜し、レプリカ基板1上
に記録膜28が形成された、基板3を作製した(d)。
On the information pattern surface of the replica substrate 1,
SiN enhance film 12 (thickness: 30 nm), TbFe
Co magnetic film 13 (thickness: 30 nm), AlN reflective film 14
(Thickness: 30 nm), SiN protective film 15 (thickness: 30 n
Substrate 3 in which the recording film 28 was formed on the replica substrate 1 was manufactured (d).

【0070】以上のようにして作製した基板3の記録膜
上に、表1の実施例9,10の2液性硬化型シリコーン
接着剤の主剤と硬化剤を混合した接着剤をスピンコート
法により塗布し、30μmの厚さを有する接着層4を形
成した(e)。更にこの工程を繰返し、接着層4を形成
した基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive prepared by mixing the main component of the two-component curable silicone adhesive of Examples 9 and 10 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0071】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside, and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0072】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た
(i)。
Thereafter, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2 (i).

【0073】(実施例10)接着剤として、表1の実施
例10の欄に記載した接着剤を用い、次のようにして光
ディスクを製造した。製造方法を、図12に示す。本実
施例では、紫外線硬化樹脂とプラスチック板とからなる
レプリカ基板1を調整し、記録膜2として、SiNエン
ハンス膜12、TbFeCo磁性膜13、AlN反射膜
14、および、SiN保護膜15の4層の膜をレプリカ
基板1上に形成し、上記接着剤を用いて接着して、光デ
ィスクを得た。
Example 10 An optical disk was manufactured as follows, using the adhesive described in the column of Example 10 in Table 1 as the adhesive. The manufacturing method is shown in FIG. In this example, a replica substrate 1 made of an ultraviolet curable resin and a plastic plate was prepared, and four layers of a recording film 2, a SiN enhance film 12, a TbFeCo magnetic film 13, an AlN reflective film 14, and a SiN protective film 15 were prepared. Was formed on the replica substrate 1 and adhered using the above adhesive to obtain an optical disc.

【0074】まず、300mm用Ni製スタンパ7を用
意する(a)。該スタンパ7凹凸面に、紫外線硬化樹脂
22(粘度:200cp)を滴下し、プラスチック板2
3(外形:300mm,内径:35mm,厚さ:1.1
mm)で、紫外線硬化性樹脂22の膜厚が80μmにな
るように押し広げる。つぎに、紫外線照射装置20によ
り、プラスチック板側より、30秒、100mW/cm
2の強さの紫外線を照射し、前記紫外線硬化性樹脂22
を硬化させる(b)。スタンパ7と紫外線硬化性樹脂2
2との間を剥離させれば、スタンパ7のグルーブやピッ
トの凹凸が転写されたレプリカ基板1が得られる
(c)。
First, a 300 mm Ni stamper 7 is prepared (a). An ultraviolet curable resin 22 (viscosity: 200 cp) is dropped on the uneven surface of the stamper 7 to form a plastic plate 2
3 (outer diameter: 300 mm, inner diameter: 35 mm, thickness: 1.1
mm), the UV curable resin 22 is spread so as to have a thickness of 80 μm. Next, using the ultraviolet irradiation device 20, from the plastic plate side, 30 seconds, 100 mW / cm
The ultraviolet curable resin 22 is irradiated with ultraviolet rays of intensity 2
Is cured (b). Stamper 7 and UV curable resin 2
When the gap between the two is peeled off, the replica substrate 1 in which the grooves and pits of the stamper 7 are transferred is obtained (c).

【0075】上記レプリカ基板1の情報パターン面に、
SiNエンハンス膜12(厚さ:30nm),TbFe
Co磁性膜13(厚さ:30nm),AlN反射膜14
(厚さ:30nm),SiN保護膜15(厚さ:30n
m)をスパッタ法により順次成膜し、レプリカ基板1上
に記録膜28が形成された、基板3を作製した(d)。
On the information pattern surface of the replica substrate 1,
SiN enhance film 12 (thickness: 30 nm), TbFe
Co magnetic film 13 (thickness: 30 nm), AlN reflective film 14
(Thickness: 30 nm), SiN protective film 15 (thickness: 30 n
Substrate 3 in which the recording film 28 was formed on the replica substrate 1 was manufactured (d).

【0076】以上のようにして作製した基板3の記録膜
上に、表1の実施例9,10の2液性硬化型シリコーン
接着剤の主剤と硬化剤を混合した接着剤をスピンコート
法により塗布し、30μmの厚さを有する接着層4を形
成した(e)。更にこの工程を繰返し、接着層4を形成
した基板3をもう1枚作製した。
On the recording film of the substrate 3 produced as described above, an adhesive obtained by mixing the main component of the two-component curable silicone adhesive of Examples 9 and 10 in Table 1 and the curing agent was applied by spin coating. It was applied to form an adhesive layer 4 having a thickness of 30 μm (e). Further, this step was repeated to produce another substrate 3 having the adhesive layer 4 formed thereon.

【0077】つぎに、上記基板3を、密閉容器21内
に、接着層4を内側にして、基板3間の間隙35が5m
mになるように対向させ、該密閉容器21内を、減圧雰
囲気にするために1Torrに減圧する(f)。
Next, the substrate 3 is placed in the closed container 21 with the adhesive layer 4 inside, and the gap 35 between the substrates 3 is 5 m.
The pressure inside the closed container 21 is reduced to 1 Torr in order to create a reduced pressure atmosphere (f).

【0078】その後、2枚の基板3の接着層を接触さ
せ、5秒間、0.4kg/cm2の圧力をかけて貼り合
わせた(g)。最後に、容器21内より取り出し、2枚
の基板3と接着層2とを有する光ディスクを得た
(i)。
Thereafter, the adhesive layers of the two substrates 3 were brought into contact with each other, and a pressure of 0.4 kg / cm 2 was applied for 5 seconds to bond them (g). Finally, it was taken out from the container 21 to obtain an optical disc having two substrates 3 and an adhesive layer 2 (i).

【0079】比較例1,2 本比較例では、表1の比較例1,2の接着剤を用いて、
実施例3と同様な光ディスク製造方法により光ディスク
を作成した。
Comparative Examples 1 and 2 In this Comparative Example, the adhesives of Comparative Examples 1 and 2 in Table 1 were used,
An optical disc was produced by the same optical disc manufacturing method as in Example 3.

【0080】比較例3,4 本比較例では、表1の比較例3,4の接着剤を用いて、
実施例6と同様な光ディスク製造方法により光ディスク
を作成した。
Comparative Examples 3 and 4 In this Comparative Example, using the adhesives of Comparative Examples 3 and 4 in Table 1,
An optical disc was prepared by the same optical disc manufacturing method as in Example 6.

【0081】比較例5,6 本比較例では、表1の比較例5と表2の比較例6の接着
剤を用いて、実施例8と同様な光ディスク製造方法によ
り光ディスクを作成した。
Comparative Examples 5 and 6 In this comparative example, an optical disk was produced by the same optical disk manufacturing method as in Example 8 using the adhesives of Comparative Example 5 of Table 1 and Comparative Example 6 of Table 2.

【0082】[0082]

【表2】 [Table 2]

【0083】比較例7 本比較例では、表2の比較例7の接着剤を用いて、実施
例10と同様な光ディスク製造方法により光ディスクを
作成した。
Comparative Example 7 In this comparative example, an optical disk was prepared by using the adhesive of Comparative Example 7 in Table 2 and by the same optical disk manufacturing method as in Example 10.

【0084】比較例8 本比較例では、表3の比較例8のホットメルト接着剤を
用い、実施例3の
Comparative Example 8 In this comparative example, the hot melt adhesive of Comparative Example 8 in Table 3 was used, and

【0085】[0085]

【表3】 [Table 3]

【0086】図6i−1で得られた記録膜が形成された
レプリカ基板2枚を用意し、2枚のレプリカ基板の記録
膜面にホットメルトコータによりホットメルト接着剤を
膜厚30μmになるように塗布し、接着剤塗布面を向い
合わせにして、2kg/cm2の荷重で貼り合わせた比
較例9の光ディスクと20kg/cm2の荷重で貼り合
わせた比較例10の光ディスクを作成した。
Two replica substrates having the recording film obtained in FIG. 6i-1 were prepared, and hot-melt adhesive was applied to the recording film surfaces of the two replica substrates with a hot-melt coater to a film thickness of 30 μm. applied to, in the alignment facing adhesive coated surface to prepare a disc of Comparative example 10 was laminated with a load of an optical disc and 20 kg / cm 2 of Comparative example 9 was laminated with a load of 2 kg / cm 2.

【0087】比較例9 本比較例では、表3の比較例9の1液性嫌気硬化型接着
剤を用い、実施例3の図6i−1で得られた記録膜が形
成されたレプリカ基板2枚を用意し、2枚のレプリカ基
板の一方の記録膜面に1液性嫌気硬化型接着剤をスピン
塗布し、2枚のレプリカ基板を20mTorrの減圧下
で貼り合わせ光ディスクを作成した。
Comparative Example 9 In this comparative example, the one-component anaerobic curable adhesive of Comparative Example 9 in Table 3 was used, and the replica substrate 2 having the recording film obtained in FIG. One sheet was prepared, one recording liquid surface of one of the two replica substrates was spin-coated with a one-component anaerobic curable adhesive, and the two replica substrates were bonded together under a reduced pressure of 20 mTorr to form an optical disc.

【0088】比較例10 本比較例では、表3の比較例10の2液非混合接着剤を
用い、実施例3の図6i−1で得られた記録膜が形成さ
れたレプリカ基板2枚を用意し、2枚のレプリカ基板の
一方の記録膜面に2液非混合接着剤のA剤を、もう一方
のレプリカ基板の記録面にB剤をそれぞれスピン塗布
し、2枚のレプリカ基板を20mTorrの減圧下で貼
り合わせ光ディスクを作成した。
Comparative Example 10 In this comparative example, the two-liquid non-mixing adhesive of Comparative Example 10 in Table 3 was used, and two replica substrates having the recording film obtained in FIG. 6i-1 of Example 3 were formed. Prepare and spin-coat one recording film surface of the two replica substrates with the two-liquid non-mixed adhesive agent A and the other replica substrate with the coating agent B, respectively, and apply two replica substrates at 20 mTorr. A bonded optical disc was prepared under reduced pressure.

【0089】(各実施例の効果)以上、種々の接着剤を
用いて貼り合わせた実施例1〜10及び比較例1〜10
の光ディスクについて、貼り合わせ後の凹凸欠陥の発生
状況と対応する上下振れ加速度、ディスクの変形状態と
対応する傾き角、80℃/1h放置後の基板ずれ量,
貼り合わせ直後の基板ずれの有無(目視観察),貼り
合わせ後(製造時)と加熱処理後の(使用,保管時)の
ディスク表面の凹凸欠陥や反り等の不良の有無(目視観
察)ついて検討した。実施例1〜10についての測定結
果を(表4)に示し、比較例1〜10についての測定結
果を(表5)に示す。
(Effects of Each Example) As described above, Examples 1 to 10 and Comparative Examples 1 to 10 bonded by using various adhesives.
For the optical disc of No. 3, the vertical deflection acceleration corresponding to the occurrence state of uneven defects after bonding, the tilt angle corresponding to the deformed state of the disc, the amount of substrate displacement after leaving at 80 ° C./1 h,
Examine the presence or absence of substrate misalignment immediately after bonding (visual observation) and the presence or absence of defects such as irregularities and warpage on the disk surface after bonding (during manufacturing) and after heat treatment (during use and storage) (visual observation) did. The measurement results of Examples 1 to 10 are shown in (Table 4), and the measurement results of Comparative Examples 1 to 10 are shown in (Table 5).

【0090】尚、これらの特性の測定は、次のようにし
て行なった。機械特性(上下振れ加速度および傾き角)
は、光ディス機械特性測定装置(レーザ波長:780n
m,測定回転数:2400rpm,測定位置:300m
mディスクの場合φ290mm,130mmディスクの
場合φ120mm)により測定した。ずれ量は、ディス
ク片(膜厚:30μm、接着面積:6cm2)に500
gの剪断荷重を加えたときの変位量を測定した。目視観
察による貼り合わせ直後の基板ずれは基板中心あるいは
外周を支持した時の基板ずれの有無を判別した。目視観
察による不良の有無は、被照射物に光を当てその反射光
を拡大投影する装置(シャドウグラフ)により判別し
た。例えば、光ディスクの表面に凹凸や反りが生じてい
る場合、投影物に光の明暗や投影の大きさが異なって拡
大投影される。
The measurement of these characteristics was carried out as follows. Mechanical characteristics (vertical deflection acceleration and tilt angle)
Is an optical disc mechanical characteristic measuring device (laser wavelength: 780n
m, measurement rotation speed: 2400 rpm, measurement position: 300 m
In the case of an m disc, the measurement was performed with φ290 mm, and with a 130 mm disc, φ120 mm). The amount of deviation is 500 for a disk piece (film thickness: 30 μm, adhesion area: 6 cm 2 ).
The amount of displacement when a shear load of g was applied was measured. As for the displacement of the substrate immediately after bonding by visual observation, the presence or absence of the displacement of the substrate when supporting the center or the outer periphery of the substrate was determined. The presence or absence of defects by visual observation was determined by a device (shadow graph) that applies light to the object to be irradiated and magnifies and projects the reflected light. For example, when the surface of the optical disc is uneven or warped, the light and darkness of the light and the size of the projection are differently projected on the projection object.

【0091】[0091]

【表4】 [Table 4]

【0092】[0092]

【表5】 [Table 5]

【0093】表4,5の結果より、実施例1〜10のデ
ィスクは、上下振れ加速度(目標:≦2G),傾き角
(≦5mrad)及びずれ量(≦20μm)を満たして
いることが判明し、更に貼り合わせ直後の基板ずれ,製
造時又は加熱放置の欠陥の発生が見られなかった。一
方、比較例1,3,7は、上下振れ加速度が目標を満た
してなくかつ製造時および加熱による欠陥の発生が見ら
れた。比較例2,4は、傾き角の目標を満たしてなくか
つ貼り合わせ直後の基板ずれと加熱による欠陥の発生が
見られた。比較例5は、上下振れ加速度の目標を満たし
てなくかつ貼り合わせ直後の基板ずれ,製造時および加
熱による欠陥の発生が見られた。比較例6は、傾き角と
加熱によるずれ量が目標を満たしてなくかつ貼り合わせ
直後の基板ずれと加熱による欠陥の発生が見られた。比
較例8は、いずれの目標も満たしてなくかつ製造時およ
び加熱による欠陥の発生が見られた。比較例10は、上
下振れ加速度および傾き角の目標を満たしてなくかつ貼
り合わせ直後の基板ずれ,加熱による欠陥の発生が見ら
れた。
From the results of Tables 4 and 5, it was found that the disks of Examples 1 to 10 satisfied the vertical deflection acceleration (target: ≤2G), the tilt angle (≤5mrad) and the shift amount (≤20µm). Furthermore, no substrate displacement immediately after bonding and no defects during manufacturing or heating were observed. On the other hand, in Comparative Examples 1, 3, and 7, the vertical shake acceleration did not satisfy the target, and defects were found during manufacturing and due to heating. In Comparative Examples 2 and 4, the target of the tilt angle was not satisfied, and the displacement of the substrate immediately after bonding and the occurrence of defects due to heating were observed. In Comparative Example 5, it was found that the vertical deviation acceleration target was not satisfied and the substrate was misaligned immediately after bonding, and defects were generated during manufacturing and due to heating. In Comparative Example 6, the inclination angle and the amount of deviation due to heating did not meet the target, and the occurrence of defects due to substrate deviation and heating immediately after bonding was observed. In Comparative Example 8, none of the targets was met, and defects were found during production and due to heating. In Comparative Example 10, it was found that the targets of the vertical deflection acceleration and the tilt angle were not satisfied, the substrate was displaced immediately after the bonding, and defects were generated due to heating.

【0094】以上の結果から、接着剤粘度と貼り合わせ
直後の基板ずれ,接着剤硬化後の硬度と上下振れ加速
度、傾き角、基板ずれ量に相関性が見られる。貼り合わ
せ直後に基板ずれが発生しているディスクは接着剤粘度
が10ポアズに満たない粘度が低い接着剤で貼り合わせ
た場合に発生している。又、700ポアズ以上では接着
剤の不均一な塗布面により上下振れ加速度が大きくな
る。また、傾き角、基板ずれ量が目標を満たしていない
ものは接着剤硬化後の硬度が20以下であり、上下振れ
加速度の目標を満たしていないものは接着剤硬化後の硬
度が80以上であることが判った。
From the above results, there is a correlation between the viscosity of the adhesive and the displacement of the substrate immediately after the bonding, the hardness after curing of the adhesive, the vertical deflection acceleration, the tilt angle, and the amount of displacement of the substrate. The disc in which the substrate is displaced immediately after the bonding is generated when the bonding is performed with an adhesive having a low viscosity of the adhesive less than 10 poise. On the other hand, at 700 poises or more, the vertical deflection acceleration becomes large due to the uneven application surface of the adhesive. Further, when the tilt angle and the amount of displacement of the substrate do not satisfy the target, the hardness after curing the adhesive is 20 or less, and when the tilt deflection and the amount of displacement of the substrate do not satisfy the target of the vertical deflection acceleration, the hardness after curing the adhesive is 80 or more. I knew that.

【0095】更に、実施例1〜10の光ディスクについ
て記録再生装置(680nmのレーザを光源として開口
数0.55,焦点深度約2μmの集光レンズを用いた光
ヘッド)によりディスク回転数2400rpmで記録再
生を行った結果、記録再生不良が発生しなかった。
Further, with respect to the optical discs of Examples 1 to 10, recording was performed at a disc rotation speed of 2400 rpm by a recording / reproducing device (optical head using a laser of 680 nm as a light source and a numerical aperture of 0.55 and a focusing lens of about 2 μm). As a result of the reproduction, no recording / reproduction failure occurred.

【0096】このことより本発明の接着剤で貼り合わせ
た光ディスクは、平坦性に優れ加熱雰囲気でも凹凸や変
形の少ない高精度なものである。
From the above, the optical disk bonded with the adhesive of the present invention is excellent in flatness and highly accurate with little unevenness or deformation even in a heating atmosphere.

【0097】[0097]

【表6】 [Table 6]

【0098】[0098]

【発明の効果】本発明によれば、高速アクセス、高速回
転による変形、かつ保管時の経時変化による変形や剥が
れを低減し、高精度かつ高信頼性の優れた光ディスク及
びその製造方法を実現することができる。
According to the present invention, it is possible to realize an optical disc having high precision and high reliability by reducing high-speed access, deformation due to high-speed rotation, deformation and peeling due to aging during storage, and a manufacturing method thereof. be able to.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光ディスク模式図である。FIG. 1 is a schematic diagram of an optical disc of the present invention.

【図2】本発明の光ディスク断面図である。FIG. 2 is a sectional view of an optical disc of the present invention.

【図3】本発明のスタンパの製造工程図である。FIG. 3 is a manufacturing process diagram of the stamper of the present invention.

【図4】本発明のスタンパの製造工程図である。FIG. 4 is a manufacturing process diagram of the stamper of the present invention.

【図5】本発明の光ディスク製造工程図である。FIG. 5 is a process drawing of an optical disc manufacturing method of the present invention.

【図6】本発明の光ディスク製造工程図である。FIG. 6 is a process drawing of an optical disc manufacturing method of the present invention.

【図7】本発明の光ディスク製造工程図である。FIG. 7 is a process drawing of an optical disc manufacturing method of the present invention.

【図8】本発明の光ディスク製造工程図である。FIG. 8 is a process drawing of an optical disc manufacturing method of the present invention.

【図9】本発明の光ディスク製造工程図である。FIG. 9 is a process drawing of an optical disc manufacturing method of the present invention.

【図10】本発明の光ディスク製造工程図である。FIG. 10 is a process drawing of an optical disc manufacturing method of the present invention.

【図11】本発明の光ディスク製造工程図である。FIG. 11 is a process drawing of an optical disc manufacturing method of the present invention.

【図12】本発明の光ディスク製造工程図である。FIG. 12 is a process drawing of an optical disc manufacturing method of the present invention.

【符号の説明】[Explanation of symbols]

1…レプリカ基板、2…記録用金属膜、3…基板 4…接着層、5…Ni膜、6…Ni電鋳膜、7…スタン
パ、8…成形型、9…成形型内間隙、10…ポリカーボ
ネート樹脂、12…SiNエンハンス膜、13…TbF
eCo磁性膜、14…AlN反射膜、15…SiN保護
膜、16フォトレジスト膜、17…ガラス円盤、18…
減圧、20…紫外線照射装置、21…密閉容器、22…
紫外線硬化性樹脂、23…プラスチック板、24…レプ
リカ基板、25…GeSbTe記録膜、26…SbBi
反射膜、27…SiN保護膜、34…光ディスク中央の
孔、35…基板間隙、
DESCRIPTION OF SYMBOLS 1 ... Replica substrate, 2 ... Recording metal film, 3 ... Substrate 4 ... Adhesive layer, 5 ... Ni film, 6 ... Ni electroformed film, 7 ... Stamper, 8 ... Mold, 9 ... Mold internal gap, 10 ... Polycarbonate resin, 12 ... SiN enhance film, 13 ... TbF
eCo magnetic film, 14 ... AlN reflective film, 15 ... SiN protective film, 16 photoresist film, 17 ... Glass disk, 18 ...
Decompression, 20 ... UV irradiation device, 21 ... Closed container, 22 ...
UV curable resin, 23 ... Plastic plate, 24 ... Replica substrate, 25 ... GeSbTe recording film, 26 ... SbBi
Reflective film, 27 ... SiN protective film, 34 ... Hole at center of optical disc, 35 ... Substrate gap,

───────────────────────────────────────────────────── フロントページの続き (72)発明者 田嶋 哲夫 神奈川県横浜市戸塚区吉田町292番地株式 会社日立製作所生産技術研究所内 (72)発明者 古性 均 大阪府茨木市丑寅一丁目1番88号日立マク セル株式会社内 (72)発明者 泰井 俊明 大阪府茨木市丑寅一丁目1番88号日立マク セル株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Tetsuo Tajima 292 Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa, Ltd. Within the Institute of Industrial Science, Hitachi, Ltd. Issue Hitachi Maxell Co., Ltd. (72) Inventor Toshiaki Yasui 1-88, Tora, Ibaraki, Osaka Prefecture

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】一対の対向する基板と、接着層を有し、該
基板の少なくとも一方は記録膜を有し、上記接着層は、
上記一対の対向する基板の間隙に配置される光ディスク
において、 上記接着層は、2液性硬化型シリコーン樹脂を含有する
ことを特徴とする光ディスク。
1. A pair of opposing substrates and an adhesive layer, at least one of the substrates having a recording film, the adhesive layer comprising:
The optical disc arranged in the gap between the pair of opposed substrates, wherein the adhesive layer contains a two-component curable silicone resin.
【請求項2】請求項1において、 前記接着層の粘度は、10〜700ポイズであることを
特徴とする光ディスク。
2. The optical disc according to claim 1, wherein the adhesive layer has a viscosity of 10 to 700 poises.
【請求項3】請求項1において、 前記接着層の硬度は、20〜80(JIS A)である
ことを特徴とする光ディスク。
3. The optical disc according to claim 1, wherein the adhesive layer has a hardness of 20 to 80 (JIS A).
【請求項4】少なくとも一方に記録層を形成した2枚の
透明基板に、接着剤を塗布して接着層を形成する接着剤
塗布工程と、該接着層が内側になるように上記2枚の透
明基板を対向させて加圧し接着する工程とを有する光デ
ィスク製造方法において、 上記接着剤は、2液性硬化型シリコーン接着剤を含有す
ることを特徴とする光ディスク製造方法。
4. An adhesive application step of applying an adhesive to two transparent substrates having a recording layer formed on at least one side to form an adhesive layer, and the above two sheets so that the adhesive layer is on the inner side. A method of manufacturing an optical disk, comprising a step of facing a transparent substrate and applying pressure to bond the transparent substrate, wherein the adhesive contains a two-component curable silicone adhesive.
【請求項5】請求項4において、 前記接着剤の粘度は、10〜700ポイズであることを
特徴とする光ディスク製造方法。
5. The optical disc manufacturing method according to claim 4, wherein the adhesive has a viscosity of 10 to 700 poises.
【請求項6】請求項4において、 前記接着剤の硬化後の硬度は、20〜80(JIS
A)であることを特徴とする光ディスク製造方法。
6. The hardness according to claim 4, wherein the hardness of the adhesive after curing is 20 to 80 (JIS.
A method for manufacturing an optical disk, characterized in that the method is A).
【請求項7】請求項4において、 前記加圧が、0.4〜0.8kg/cm2であることを
特徴とする光ディスク製造方法。
7. The optical disk manufacturing method according to claim 4, wherein the pressure is 0.4 to 0.8 kg / cm 2.
【請求項8】請求項4において、 前記接着工程は、減圧雰囲気で行なわれ、 上記減圧雰囲気が、1〜20Torrであることを特徴
とする光ディスク製造方法。
8. The optical disc manufacturing method according to claim 4, wherein the bonding step is performed in a reduced pressure atmosphere, and the reduced pressure atmosphere is 1 to 20 Torr.
JP6195112A 1994-08-19 1994-08-19 Optical disk and its production Pending JPH0863792A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6195112A JPH0863792A (en) 1994-08-19 1994-08-19 Optical disk and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6195112A JPH0863792A (en) 1994-08-19 1994-08-19 Optical disk and its production

Publications (1)

Publication Number Publication Date
JPH0863792A true JPH0863792A (en) 1996-03-08

Family

ID=16335701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6195112A Pending JPH0863792A (en) 1994-08-19 1994-08-19 Optical disk and its production

Country Status (1)

Country Link
JP (1) JPH0863792A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0797194A2 (en) * 1996-03-21 1997-09-24 Kabushiki Kaisha Toshiba Double-layered information recording medium having information recording layers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0797194A2 (en) * 1996-03-21 1997-09-24 Kabushiki Kaisha Toshiba Double-layered information recording medium having information recording layers
EP0797194A3 (en) * 1996-03-21 2000-12-13 Kabushiki Kaisha Toshiba Double-layered information recording medium having information recording layers

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