JPH086264A - Method for removing photosensitive material layer from photosensitive body - Google Patents

Abstract

PURPOSE:To provide the method for removing only the photosensitive material layer without deteriorating the accuracy and roundness of the outer circumference of the core of the photosensitive body and superior in an environmental side and safety side by immersing the photosensitive body in a specified removing agent. CONSTITUTION:Only the photosensitive material layer is removed from the photosensitive body 5 by immersing the photosensitive body 5 in the specified removing agent 7 of oil drop in water dispersion type comprising water and an organic compound capable of swelling or dissolving a resin for forming the photosensitive material layer in an amount of 5-40 weight % of the total dispersion. This organic compound has at least one polar group, such as hydroxyl, ether, carbonyl, ester, carboxylic, or amido group, in the molecule, and it has a boiling point of, preferably, >=100 deg.C under normal pressure, and it can be embodied by isopropyl alcohol, diethylene glycol, and the like.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing only a photosensitive material layer from a photosensitive material having a photosensitive material layer formed on the surface of a photosensitive material supporting substrate, which is mainly used in copying machines, laser printers, facsimiles and the like. .

[0002]

2. Description of the Related Art A photoreceptor having a photosensitive material layer formed on the surface of a photosensitive material supporting base material, which is mainly used in copying machines, laser printers, facsimiles, etc. (almost drum-shaped, but also plate-shaped) ), Some of the base material is formed of polyester or polycarbonate,
Generally, selenium alloy, cadmium sulfide,
Inorganic photosensitive material selected from the group of amorphous silicon or OPC (Organic Photo Conductor)
The organic photosensitive material referred to as 0.1-1,000 μm
It is fixed as a layer with a thickness of.

As a method for fixing a photosensitive material, in the case of a metal or ceramic type photosensitive material, a method by thermal spraying or vapor deposition is also adopted, but in many cases including an organic photosensitive material, acrylic resin, polycarbonate resin, polyvinyl are used. The coating method uses a resin such as brachiral, polyacrylate, polyacrylamide, polyester, polyamide, cellulosic resin, casein, or polyvinyl alcohol as a binder.

In the production of the above-mentioned photoreceptor, defective products due to the photosensitive material and the coating are produced at a certain ratio, and when good products are used for a certain period, the surface of the photosensitive material layer is abraded. Since the scratches, stains, and the function of the photosensitive material itself are deteriorated, they are replaced with new ones and collected. It is preferable to reuse the collected defective products and deteriorated products in consideration of resource saving and cost.

Therefore, various methods have been proposed for recovering the metal such as aluminum forming the substrate by removing only the photosensitive material layer from these defective and deteriorated products. That is, as a method of removing the inorganic photosensitive material layer, for example, a method of grinding the photosensitive material layer with an abrasive (Japanese Patent Application Laid-Open No. 56-82868), a high-pressure water jet is applied to the photosensitive material layer, Method of grinding photosensitive material layer
No. 218125), a method of dissolving the photosensitive material layer with a mineral acid (Japanese Patent Laid-Open No. 58-1741212), and a method of grinding the photosensitive material layer by buffing (Japanese Patent Laid-Open No. 1-6).
2650), a method of removing the photosensitive material layer by mechanical friction with a weakly alkaline or neutral surfactant aqueous solution (JP-A-2-178671), and the like.

On the other hand, as a method for removing the organic photosensitive material layer (OPC), for example, a method of dissolving the photosensitive material layer with a solvent (Japanese Patent Laid-Open No. 4-145444) has been proposed. Further, as a method of removing any photosensitive material layer, a method of cooling the photosensitive material layer by accelerating injection of fine ice particles and at the same time removing the photosensitive material layer by impacting it (Japanese Patent Laid-Open No. 3-337734). Gazette) has been proposed.

[0007]

[Problems to be Solved by the Invention]
Both methods had the following problems. That is, in each of the methods ,,,,, since a physical impact is applied to the surface of the photoconductor when removing the photosensitive material layer, not only the photosensitive material layer can be removed but also the surface of the base material is damaged. Therefore, even if only the base material can be collected, the accuracy or roundness of the outer surface of the base material is deteriorated, and the base material cannot be reused as it is. Therefore, the recovered base material must be once crushed and reused.

On the other hand, in the methods 1 and 2, since the photosensitive material forming the photosensitive material layer or the photosensitive material component such as the binder is dissolved in the mineral acid or the solvent, there is no durability of the mineral acid or the solvent. Moreover, it is necessary to treat the waste liquid of the mineral acid and the solvent in which the photosensitive material components are dissolved. Therefore, there are problems in the cost of mineral acids and solvents, and the cost of treating waste liquid. Moreover,
Since the method of (1) uses a harmful volatile solvent, there is a safety problem.

In view of the above problems, the method for removing the photosensitive material layer of the photoconductor according to the present invention is excellent in terms of environment and safety, and the accuracy and roundness of the outer surface of the base material of the photoconductor are excellent. It is an object of the present invention to provide a method for removing a photosensitive material layer from a photoreceptor, which can remove only the photosensitive material layer without deteriorating the temperature.

[0010]

In order to achieve such an object, a method of removing a photosensitive material layer of a photosensitive member according to the present invention is to remove only the photosensitive material layer from the photosensitive member and remove the photosensitive material layer of the photosensitive member. In the removing method, the photoreceptor is treated with the following removing agents A to H.
It was immersed in at least one remover selected from the group consisting of

Remover A: Oil-in-water (O / W) dispersion-type remover comprising an organic compound (a) capable of swelling or dissolving a resin forming a photoreceptor layer and water. Remover B ... Oil-in-water (O / W) dispersion-type remover comprising an organic compound (a) capable of swelling or dissolving a resin forming a photoreceptor layer, a surfactant and water.

Remover C: at least one selected from the group consisting of an organic compound (a) capable of swelling or dissolving the resin forming the photoreceptor layer, water, glycol ethers, pyrrolidone derivatives and alcohols. Oil-in-water (O / W) dispersion type removing agent consisting of an auxiliary agent. Remover D: at least one selected from the group consisting of an organic compound (a) capable of swelling or dissolving a resin forming a photoreceptor layer, a surfactant, water, glycol ethers, pyrrolidone derivatives and alcohols Oil-in-water (O / W) dispersion-type remover consisting of

Remover E: A soluble remover comprising an organic compound (b) capable of swelling or dissolving the resin forming the photoreceptor layer and water. Remover F ... A soluble remover comprising an organic compound (b) capable of swelling or dissolving a resin forming a photoreceptor layer, a surfactant and water. Remover G: an organic compound (b) capable of swelling or dissolving the resin forming the photoreceptor layer, water, and at least one auxiliary selected from the group consisting of glycol ethers, pyrrolidone derivatives and alcohols Dissolving type remover consisting of.

Remover H: selected from the group consisting of an organic compound (b) capable of swelling or dissolving the resin forming the photoreceptor layer, a surfactant, water, glycol ethers, pyrrolidone derivatives and alcohols. A dissolution-type removal agent comprising at least one auxiliary agent. Further, in the above-mentioned constitution, the removing agents E to H as the soluble type removing agents are not limited to the case where water is a solvent and the organic compound (b) is a solute, but the case where the organic compound (b) is a solvent and water is a solute. Also includes.

The organic compound (a) contains at least one polar group selected from the group consisting of hydroxyl group, ether group, carbonyl group, ester group, carboxyl group and amide group in the molecule, Boiling point under pressure is 100
Those having a temperature of at least ° C are preferred. Examples of the organic compound (a) satisfying this condition include alcohols such as isopropyl alcohol, diethylene glycol, triethylene glycol 2-ethylhexanol, n-decyl alcohol and benzyl alcohol; octyl phenyl ether, methyl cellosolve, butyl cellosolve and the like. Ethers;
Esters of benzyl acetate, n-butyl propionate, butyl stearate, butyl benzoate, dibutyl adipate, diethyl malonate, dimethyl phthalate, dimethyl succinate, dimethyl adipate, dimethyl glutarate; methyl isobutyl ketone, diisobutyl Ketones, ketones such as cyclohexanone; 2-ethylhexanoic acid,
Examples thereof include carboxylic acids such as oleic acid.

The amount of the organic compound (a) blended is preferably about 5 to 40% by weight of the total dispersant. Examples of the organic compound (b) include water-soluble organic compounds such as N-methyl-2-pyrrolidone, isopropyl alcohol, diethylene glycol, triethylene glycol 2-ethylhexanol, n-decyl alcohol, and benzyl alcohol.

The amount of the organic compound (b) compounded is preferably about 60 to 90% by weight of the total dispersant. As the surfactant, higher fatty acid alkali metal salt, higher alcohol sulfate ester activator; higher alcohol alkyl ether type, alkyl phenyl ether type, or alkylene oxide addition type thereof, higher alcohol alkyl ester type, or these Nonionic surfactants such as alkylene oxide addition type and higher fatty acid alkylene oxide addition type; selected from higher aliphatic amine or aromatic amine quaternary ammonium salt type or amine salt type cationic surfactants, etc. Any one or a mixture of two or more kinds other than the combined use of one kind of anionic surfactant and cationic surfactant can be used.

Examples of glycol ethers include polyoxyethylene alkylphenyl ether, polyoxyalkylene monoalkyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether and ethylene glycol monobutyl ether. As the pyrrolidone derivative, N-methyl-2
-Pyrrolidone and the like.

Examples of alcohols include 3-methyl-3-methoxybutanol and isopropyl alcohol. In addition, the blending amount of the surfactant is 5 to 2 of the whole dispersant.
It is preferably about 5% by weight, particularly preferably 10% by weight or less. Also, while the photoconductor is immersed in the remover, the remover is agitated to give a wave to the remover, the photoconductor in the remover is vibrated, or the remover is subjected to ultrasonic vibration. It is preferable.

Further, after the photosensitive member is immersed in the removing agent or after being immersed and removed from the removing agent, mechanical abrasion is performed on the photosensitive material layer of the photosensitive member with a soft removing member that does not damage the photosensitive member itself. , A member that is mechanically rubbed on the photosensitive material layer of the photoreceptor with a removing member that is softer than the photoreceptor itself, and has a hardness that does not damage the photoreceptor, is stable to the remover, and removes the synthetic resin particles of the pea grain or smaller It is preferable that the photosensitive material layer is removed by continuously or intermittently colliding the synthetic resin particles with the photosensitive material layer.

Further, as a photoreceptor for forming a photosensitive material layer which can be removed by the method of the present invention, an organic compound photoreceptor (Organi)
c Photo Conductor), as well as selenium compound photoconductors and cadmium sulfide photoconductors.

[0022]

According to the above construction, in the photoconductor immersed in the removing agent, the binder forming the photoconductive material layer or the photoconductive material itself swells. Then, when the removing liquid or the photosensitive member is vibrated, the photosensitive material layer is separated from the base material by the vibration. Also,
Peeling off more efficiently by applying physical impact.

Further, the components of the peeled photosensitive material layer are mixed in the removing agent but do not dissolve, so if filtered,
The remover and the constituents of the photosensitive material layer can be easily separated. That is, it is considered that water acting as a solvent or a dispersion medium with respect to the organic compound suppresses the solubility of the organic compound, and the swelling causes the photosensitive material layer to peel off. Further, in the case of a photoreceptor to which an inorganic photosensitive material such as selenium is fixed, since the photosensitive material layer is porous, the remover is impregnated between the photosensitive material layer and the base material to form the photosensitive material layer. It is thought to be peeled from the back side.

[0024]

EXAMPLES The present invention will be described in detail below with reference to its examples. (Example 1) The following photoconductors, which had been collected after the end of their useful life, were subjected to the immersion temperature as shown in Table 1 below, and the following removers A-1 to A-7, B-1 to B-7, C were used. -1 to C-8,
D-1 to D-7, E-1 to E-3, F-1 to F-3, G
-1 and G-2, respectively, for each immersion time shown in Table 1, ultrasonic cleaning, rotation of the photoreceptor (drum), and stirring of the liquid were performed as shown in Table 1. After that, the photosensitive material layer was rubbed with a felt softer than the base material to remove the photosensitive material layer from the base material. The peeling state of the photosensitive material layer at that time was examined, and the results are shown in Tables 1 to 13.

Photoreceptor A 30φ photoconductor in which an organic photosensitive material layer using polycarbonate as a binder is provided on the surface of a base material made by Canon Inc., which is an aluminum tube surface coated with an epoxy resin. Photoreceptor A 120φ photoreceptor having a selenium layer as a photosensitive material layer on the surface of an aluminum tube manufactured by Toray Industries, Inc.

Remover A-1 Dimethyl succinate: 50 wt% Water: 50 wt% Remover A-2 Dibasic carboxylic acid diester (Dimethyl adipate 17%, Dimethyl glutarate 66%, Amber Dimethyl acid 17%) ··· 20 wt% water ··· 80 wt% Remover A-3 dibasic carboxylic acid diester (dimethyl adipate 17%, dimethyl glutarate 66%, dimethyl succinate 17%)・ ・ ・ 40 wt% water ・ ・ ・ 60 wt% remover A-4 benzyl alcohol ・ ・ ・ 70 wt% water ・ ・ ・ 30 wt% remover A-5 propylene carbonate ・ ・ ・ 85 wt% water ・ ・ ・15 wt% remover A-6 methyl ethyl ketone ... 40 wt% water ... 60 wt% remover A-7 Toluene ... 40 wt% water ... 60 wt% remover B-1 dibasic carboxylic acid The Stell (Dimethyl adipate 17%, Dimethyl glutarate 66%, Dimethyl succinate 17%) ・ ・ ・ ・ 15wt% Oleic acid butyl ester sulfate sodium salt ・ ・ ・ ・ ・ ・ 10wt% Oleic acid diethanolamide ・ ・ ・ ・ 7wt % Water ・ ・ ・ 68wt% Remover B-2 Dibasic carboxylic acid diester (Dimethyl adipate 17%, Dimethyl glutarate 66%, Dimethyl succinate 17%) ・ ・ ・ 8wt% Oleic acid butyl ester sulfuric acid Sodium chloride ・ ・ ・ 8 wt% Oleic acid diethanolamide ・ ・ ・ 4 wt% Polyoxyethylene alkylphenyl ether ・ ・ ・ 2 wt% Water ・ ・ ・ 78 wt% Remover B-3 Dibasic carboxylic acid diester ( Dimethyl adipate 17%, Dimethyl glutarate 66%, Dimethyl succinate 17%) ... 40 wt% Oleic acid butyl ester sulfate sodium salt ・ ・ ・ ・ ・ ・ 15wt% Oleic acid diethanolamide ・ ・ ・ ・ ・ ・ 2wt% Polyoxyethylene alkylphenyl ether ・ ・ ・ ・ ・ ・ 3wt% Polyoxyalkylene monoalkyl ether ・ ・ ・ ・ ・ ・ 4wt% Water: 36 wt% Remover B-4 benzyl alcohol: 20 wt% Oleic acid butyl ester sulfate sodium salt: 7 wt% Oleic acid diethanolamide: 7 wt% Water: 66 wt % Remover B-5 Propylene carbonate ・ ・ ・ ・ 20wt% Oleic acid butyl ester sulfate sodium salt ・ ・ ・ ・ 10wt% Oleic acid diethanolamide ・ ・ ・ ・ 5wt% Polyoxyethylene alkyl phenyl ether ・ ・ ・ ・ 2wt% water · · · · 63 wt% removal agent B-6 methyl ethyl ketone · · · 40 wt% oleic acid diethanolamide · · · · 10 wt% oleic acid butyl ester sulfated product sodium salt · · · · 5 wt% water · · · · 45 wt% removal agent B-7 Toluene · · · · 30 wt% oleic acid Diethanolamide: 10 wt% Oleic acid butyl ester sulfate sodium salt: 5 wt% Polyoxyalkylene monoalkyl ether: 3 wt% Water: 52 wt% Remover C-1 dibasic carvone Acid diester (Dimethyl adipate 17%, Dimethyl glutarate 66%, Dimethyl succinate 17%) ・ ・ ・ ・ 15wt% 3 Methyl-3methoxybutanol ・ ・ ・ ・ 20wt% Water ・ ・ ・ ・ 65wt% Remover C -2 dibasic carboxylic acid diester (dimethyl adipate 17% glutaric acid di-methyl 66%, dimethyl succinate 17 ) · · · · 8 wt% 3-methyl-3-methoxybutanol · · · · 12 wt% N-methyl-2-pyrrolidone · · · · 10 wt% water · · · · 70 wt% removal agent C-3 dibasic carboxylic acid diester (Dimethyl adipate 17%, Dimethyl glutarate 66%, Dimethyl succinate 17%) ・ ・ ・ 40 wt% Triethylene glycol dimethyl ether ・ ・ ・ 7 wt% Isopropyl alcohol ・ ・ ・ 3 wt% 3 Methyl-3methoxybutanol・ ・ ・ 25wt% water ・ ・ ・ 25wt% remover C-4 N methyl 2pyrrolidone ・ ・ ・ 60wt% dibasic carboxylic acid diester (dimethyl adipate 17%, dimethyl glutarate 66%, dimethyl succinate) 17%) ···· 30wt% water · · · · 10 wt% removal agent C-5 benzyl alcohol · · · · 30 wt% 3-methyl-3 Butoxy butanol · · · · 20 wt% N-methyl-2-pyrrolidone · · · · 10 wt% water · · · · 40 wt% removal agent C-6 propylene carbonate · · · · 40 wt% 3-methyl-3-methoxybutanol · · · · 25 wt % Water ・ ・ ・ 35 wt% Remover C-7 Methyl ethyl ketone ・ ・ ・ ・ ・ ・ 30 wt% 3 Methyl-3methoxybutanol ・ ・ ・ ・ ・ ・ 20 wt% Isopropyl alcohol ・ ・ ・ ・ ・ ・ 5 wt% Water ・ ・ ・ 45 wt% Remover C -8 Toluene --- 20 wt% 3-methyl-3-methoxybutanol --- 15 wt% N-methyl-2pyrrolidone --- 10 wt% water --- 52 wt% Remover D-1 dibasic carboxylic acid diester (Dimethyl adipate 17%, Dimethyl glutarate 66%, Dimethyl succinate 17%) ... 15 wt% 3 Methyl-3methoxybutanol ... 15 wt% oleic acid butyl ester sulfated product sodium salt · · · · 9 wt% polyoxyethylene alkyl phenyl ether · · · · 2.5 wt% polyoxyalkylene monoalkyl ether · · · · 2.5 wt% water · · · · 56 wt% removal Agent D-2 Dibasic carboxylic acid diester (Dimethyl adipate 17%, Dimethyl glutarate 66%, Dimethyl succinate 17%) ··· 8 wt% 3 Methyl-3methoxybutanol ··· 10 wt% Oleic acid Butyl ester sulfate sodium salt ・ ・ ・ 5wt% Polyoxyethylene alkylphenyl ether ・ ・ ・ 1.5wt% Polyoxyalkylene monoalkyl ether ・ ・ ・ 1wt% Water ・ ・ ・ 74.5wt% Remover D-3 Dibasic carboxylic acid diester (dimethyl adipate 17%, dimethyl glutarate 66%, amber Dimethyl acid 17%) ··· 37 wt% triethylene glycol dimethyl ether ··· 8 wt% 3 methyl-3methoxybutanol ··· 18 wt% oleic acid butyl ester sulfate sodium salt ··· 9 wt% diethanolaminic oleate Dew 1.5wt% Water 26.5wt% Remover D-4 benzyl alcohol 30wt% 3Methyl-3methoxybutanol 20wt% N methyl - 2pyrrolidone 5wt% Oleic acid Diethanolamide: 7 wt% Water: 38 wt% Remover D-5 Propylene carbonate: 20 wt% 3-Methyl - 3methoxybutanol: 20 wt% Oleic acid diethanolamide: 5 wt% water · · · · 55 wt% removal agent D-6 methyl ethyl ketone · · · · 25 wt% 3-methyl-3 Metokishibu Nole: 15 wt% N-methyl-2pyrrolidone: 5 wt% Oleic acid butyl ester sulfate sodium salt :: 5 wt% Polyoxyethylene alkylphenyl ether :: 2 wt% Polyoxyalkylene monoalkyl ether・ ・ ・ ・ 2wt% water ・ ・ ・ ・ 46wt% Remover D-7 Toluene ・ ・ ・ ・ 20wt% 3Methyl-3methoxybutanol ・ ・ ・ ・ 20wt% Oleic acid diethanolamide ・ ・ ・ ・ 10wt% water ・ ・・ ・ 50wt% remover E-1 N-methyl-2-pyrrolidone ・ ・ ・ ・ 80wt% water ・ ・ ・ ・ 20wt% remover E-2 triethylene glycol dimethyl ether ・ ・ ・ ・ 70wt% water ・ ・ ・ ・ 30wt% remover E-3 3-methyl-3 glycol dimethyl ether · · · · 70 wt% water · · · · 30 wt% removal agent F-1 N-methyl-2-pyrrolidone · · · · 75 wt% oleic acid diethanolamide · · · · 3 wt% water · · · · 22 wt% removal agent F-2 triethylene glycol dimethyl ether · · · · 70 wt% oleic acid diethanolamide · · · · 5 wt% water,・ ・ ・ 25 wt% scavenger F-3 3 Methyl-3methoxybutanol ・ ・ ・ 80 wt% Oleic acid diethanolamide ・ ・ ・ 3 wt% water ・ ・ ・ 17 wt% Scavenger G-1 N methyl-2pyrrolidone ・・ ・ ・ 70 wt% triethylene glycol dimethyl ether ・ ・ ・ 10 wt% water ・ ・ ・ 20 wt% Remover G-2 triethylene glycol dimethyl ether ・ ・ ・ 70 wt% 3-methyl-3methoxybutanol ・ ・ ・ 10 wt% water・ ・ ・ ・ 20 wt%

[0027]

[Table 1]

[0028]

[Table 2]

[0029]

[Table 3]

[0030]

[Table 4]

[0031]

[Table 5]

[0032]

[Table 6]

[0033]

[Table 7]

[0034]

[Table 8]

[0035]

[Table 9]

[0036]

[Table 10]

[0037]

[Table 11]

[0038]

[Table 12]

[0039]

[Table 13] In the above example, the regenerated base material obtained has no scratch on the surface,
It was no different from the new one.

For the base material from which the photosensitive material layer was removed by immersing it in the removing solution of B-1 at 30 ° C. for 60 minutes, the surface was rinsed and sufficiently dried, and then the same photosensitive material as the new base material was used. When it was placed on the layer forming line and the photosensitive material layer was fixed again on the surface, it could be used as a photoreceptor without changing from a new one. (Example 2) When the photosensitive material layers of the following photoconductors were removed by using the above-mentioned removing agent B-1, the photoconductors of, were exposed to ultrasonic vibration in the removing agent at 60 ° C. When the body was immersed for a predetermined time and the surface of the photoreceptor was rubbed with felt, the photosensitive material layer was peeled off to the surface of the base material within 10 minutes of immersion. With respect to the photoconductor of No. 1, the epoxy resin surface was peeled off in the same manner as described above. On the other hand, with regard to the photoreceptors of ,,,, when the photoreceptor is immersed in a remover at 60 ° C for 10 minutes, the outer layer is peeled off by hand, and then ultrasonic vibration is applied to the remover at 60 ° C. When the photoconductor was dipped for 10 minutes, the inner layer was completely peeled off.

The outer layer using polycarbonate as a photoreceptor Minolta Camera Co. inner layer using a polyacetal aluminum tube surface as a binder (CG layer) and a binder (C
A photoreceptor provided with an organic photosensitive material layer composed of two layers (T layer). Photoconductor A photoconductor in which an organic photosensitive material layer consisting of two layers of an inner layer (binder resin unknown) and an outer layer (thickness 50 to 100 μm) using polycarbonate as a binder is provided on the surface of an aluminum tube manufactured by Ricoh Company.

Photoreceptor A photoreceptor provided with two layers of an organic photosensitive material layer, an inner layer (binder resin unknown) and an outer layer (thickness 150 to 200 μm) using polycarbonate as a binder, on the surface of an aluminum tube manufactured by Ricoh Company. Photoconductor A 60φ photoconductor in which an organic photosensitive material layer using polycarbonate as a binder is provided on the surface of an aluminum tube manufactured by Mita Kogyo Co., Ltd.

Photoreceptor : An inner layer (CG layer) using polyacetal as a binder and an outer layer (CT layer) using polycarbonate as a binder on the surface of an aluminum tube manufactured by Mita Kogyo Co., Ltd.
A 60-φ photosensitive member provided with an organic photosensitive material layer composed of two layers. Photosensitive member A 60φ photosensitive member in which an organic photosensitive material layer using polycarbonate as a binder is provided on the surface of a substrate made by Canon Inc., which is an aluminum tube surface coated with an epoxy resin.

[0044] 30φ provided an organic photosensitive material layer composed of two layers of an inner layer using an acrylic resin as a binder to an aluminum tube surface made of the photosensitive member by Toray Industries, Inc. (CG layer) and an outer layer (CT layer) using polycarbonate as a binder Photoconductor. (Example 3) Polyester, polyamide (nylon), and acrylic resin used as binders, each coated on an aluminum plate, were immersed in a remover at 60 ° C for a predetermined time. It was peeled off neatly within 10 minutes.
On the other hand, polyester was softened by immersion for 10 minutes, but did not peel unless peeled by hand.

Next, the removing device which can be used in the method for removing the photosensitive material layer from the photoreceptor according to the present invention will be described in detail.
FIG. 1 shows an example of a photosensitive material layer removing device. As shown in the figure, the removing device 1 includes a removing agent tank 2, a first rinse tank 3, a second rinse tank 4, and a photoconductor 5 to be treated.
A transporting device 6 for sequentially immersing the above into each tank 2, 3, 4 is provided.

The removing agent tank 2 is filled with the removing agent 7 and has an ultrasonic wave transmitting device 21 at the bottom.
The removing agent 7 is circulated through the circulation passage 21 by the circulation pump 71, and is filtered by the filter 23 provided in the middle of the circulation passage 21.

The first rinse tank 3 is filled with water, and a bubbling means 31 is provided at the bottom of the tank to supply air into the tank as air bubbles. Although the conveying device 6 is shown only on one side in the drawing, two endless chains are arranged in parallel, and the shaft 51 of the photoconductor 5 is respectively received by the endless chains and the removing agent tank 2 and the first rinsing tank 3 are received. The photoconductor 5 is sequentially dipped in the second rinse tank 4.

FIG. 2 shows an embodiment of the photosensitive material layer removing device. As shown in FIG.
Is provided with a removing agent tank 81 capable of accommodating the
An ultrasonic wave transmission device 21 is provided so as to surround the photoconductor 5 housed in the inner wall surface of the first photoconductor 1.

[0049]

Since the method for removing a photosensitive material layer from a photosensitive member according to the present invention is configured as described above, the photosensitive material layer fixed to the surface of the base material of the photosensitive member can be prevented from damaging the surface of the base material. Can be removed. Therefore, even if the base material from which the photosensitive material layer has been removed is not subjected to any processing, a new photosensitive material layer can be fixed to the surface and reused like a new base material.

Moreover, since the removing agent does not dissolve the photosensitive material layer but only causes it to swell, the debris of the photosensitive material layer mixed in the removing agent can be easily removed by filtering, and the removing agent can be removed. Can be used many times without deteriorating.

[Brief description of drawings]

FIG. 1 is an explanatory view schematically showing an embodiment of a removing device used for carrying out a method for removing a photosensitive material layer from a photoreceptor according to the present invention.

FIG. 2 is an explanatory view showing an embodiment of a removing device used for carrying out the method for removing a photosensitive material layer from a photoreceptor according to the present invention.

[Explanation of symbols]

 5 Photoreceptor 7 Remover

Claims (1)

[Claims] 1. A method for removing a photosensitive material layer of a photosensitive member, comprising removing only the photosensitive material layer from the photosensitive member, wherein the photosensitive material is in at least one removing agent selected from the group consisting of the following removing agents A to H. A method for removing a photosensitive material layer of a photoreceptor, which comprises immersing the photosensitive material layer in the photosensitive material layer. Remover A ... Oil-in-water (O) composed of an organic compound (a) capable of swelling or dissolving the resin forming the photoreceptor layer and water.
/ W) Dispersion type remover. Remover B ... Oil-in-water (O / W) dispersion-type remover comprising an organic compound (a) capable of swelling or dissolving a resin forming a photoreceptor layer, a surfactant and water. Remover C: an organic compound (a) capable of swelling or dissolving the resin forming the photoreceptor layer, water, and at least one auxiliary selected from the group consisting of glycol ethers, pyrrolidone derivatives and alcohols An oil-in-water (O / W) dispersion-type remover consisting of Remover D: at least one selected from the group consisting of an organic compound (a) capable of swelling or dissolving a resin forming a photoreceptor layer, a surfactant, water, glycol ethers, pyrrolidone derivatives and alcohols Oil-in-water (O / W) dispersion-type remover consisting of Remover E ... A soluble remover comprising an organic compound (b) capable of swelling or dissolving the resin forming the photoreceptor layer and water. Remover F ... A soluble remover comprising an organic compound (b) capable of swelling or dissolving a resin forming a photoreceptor layer, a surfactant and water. Remover G: an organic compound (b) capable of swelling or dissolving the resin forming the photoreceptor layer, water, and at least one auxiliary selected from the group consisting of glycol ethers, pyrrolidone derivatives and alcohols Dissolving type remover consisting of. Remover H: at least one selected from the group consisting of an organic compound (b) capable of swelling or dissolving a resin forming a photoreceptor layer, a surfactant, water, glycol ethers, pyrrolidone derivatives and alcohols Dissolving type remover consisting of the auxiliary agent of.