JPH0862621A - Inclined complex dielectric constant type spatial optical modulation element - Google Patents

Abstract

PURPOSE: To attain the higher fineness of images without increasing the.sizes of a projection type display and the image processor itself and without increasing the cost of manufacture by greatly improving the resolution of the element and displaying the high-fineness images without increasing the sizes of the element itself and respective optical systems. CONSTITUTION: This spatial optical modulation element is formed by laminating a first transparent electrode 3, a photoconductive layer 4, a light absorption layer 5, a multilayered dielectric film mirror 6, an optical modulation layer 7 and a second transparent electrode 8. The complex dielectric constants of the respective layers are so set that the absolute value of the complex dielectric constant of the layer nearer the optical modulation layer 7 of the two adjacent layers having the refractive indices different from each other among the respective layers constituting the multilayered dielectric film mirror 6 existing between the photoconductive layer 4 and the optical modulation layer 7 of the element described above does not attain the absolute value larger than the absolute value of the complex dielecteric constant of the layer nearer the photoconductive layer 4.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spatial light modulator having a first transparent electrode, a photoconductive layer, a light absorption layer, a dielectric multilayer mirror, a light modulation layer and a second transparent electrode, or a first transparent electrode. A spatial light modulation element in which a photoconductive layer, a dielectric multilayer mirror, a light modulation layer and a second transparent electrode are laminated, or a first
It has a transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulation layer and a second transparent electrode, and at least two or more transparent layers (or, between the photoconductive layer and the second transparent electrode). , A spatial light modulator having an opaque layer),
In particular, among the layers which are constituent elements of the dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer, the two adjacent layers having different refractive indexes and light modulation Set the complex permittivity of each layer that constitutes the dielectric multilayer mirror so that the absolute value of the complex permittivity closer to the layer does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer. Thereby, two-dimensional information such as an image or a data pattern that is incident in the form of writing light is captured, and the inclined complex dielectric constant type spatial light that highly accurately displays the two-dimensional information based on the incident reading light. It relates to a modulation element.

SUMMARY OF THE INVENTION The present invention relates to a spatial light modulation element in which a first transparent electrode, a photoconductive layer, a light absorption layer, a dielectric multilayer film mirror, a light modulation layer and a second transparent electrode are laminated, or a first light modulation layer.
A spatial light modulation element in which a transparent electrode, a photoconductive layer, a dielectric multilayer film mirror, a light modulation layer and a second transparent electrode are laminated, or a first transparent electrode, a photoconductive layer, a dielectric multilayer film mirror, a light modulation layer and a first transparent electrode. The present invention relates to a spatial light modulator having two transparent electrodes and having at least two or more transparent layers (or opaque layers) between the photoconductive layer and the second transparent electrode. Of the two layers that are constituent elements of the dielectric multilayer mirror that is inserted between the layer and the light modulation layer, the two adjacent layers that have different refractive indices and are closer to the light modulation layer By setting the complex permittivity of each layer constituting the dielectric multilayer mirror so that the absolute value of the complex permittivity of does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer, To be able to display images with resolution It is intended.

[0003]

2. Description of the Related Art As a spatial light modulator that captures two-dimensional information such as an image or a data pattern that is incident in the form of writing light and that displays the two-dimensional information with high precision based on the incident readout light. , Conventionally, US Patent N
o. No. 4127322 device and reference (Rodony D. Ste
rling, Robert D. Te Kolste, Joseph M. Haggerty, Thom
asC.Borah and William P. Bleha: “Video-rate liquid
-crystal light-valve using an amorphous silicon ph
otoconductor "SID 90 Digest pp.327-329 (1990)) is known.

As shown in FIG. 11, the spatial light modulator shown in the patent specification and the document is a fiber plate substrate 101, a first transparent electrode 102, and a photoconductive layer 103.
A light absorption layer 104, a dielectric multilayer mirror 105,
The first alignment layer 106, the nematic liquid crystal layer 107, the second
Alignment layer 108, second transparent electrode 109, quartz substrate 11
0 is an element formed by sequentially and closely adhering to each other, and light is emitted to the fiber plate substrate 101 side in a state where an AC voltage is applied between the first transparent electrode 102 and the second transparent electrode 109 by the AC power supply 111. When the writing light 112 containing information is made incident, the resistance value of the photoconductive layer 103 is changed and the optical information is two-dimensionally written in the nematic liquid crystal layer 107 sealed by the sealing layer 113.
The information written in the nematic liquid crystal layer 107 is read by the read light 114 incident on the side and emitted as display light 115.

[0005]

However, the above-described conventional spatial light modulator has the following problems.

That is, although the photoconductive layer 103, the light absorption layer 104, the dielectric multilayer mirror 105, and the nematic liquid crystal layer 107 are all thin films, the resolution of the spatial light modulator is low.

[0007] For example, in the above document, FIG.
As shown in FIG. 1, a set of black and white gratings is written as light information in a 1 mm width on the photoconductive layer 103 constituting the spatial light modulator, and the first alignment layer 106, the nematic liquid crystal layer 107, and the second The maximum value of the number of lattices that can be read from the nematic liquid crystal layer 107 of the liquid crystal light modulation layer 116 configured by the alignment layer 108 is defined as the limit resolution, and when this is expressed as lp (line pairs) / mm, the limit resolution is defined. It is difficult to set the value to about 30 lp / mm or more.
Therefore, there is a problem that a high-definition image cannot be displayed unless a large spatial light modulator having a diagonal length of 2 inches or more is used.

Further, as the size of the spatial light modulator is increased, the size of the optical system for writing an image on the spatial light modulator and the size of the optical system for reading an image from the spatial light modulator also increase. There is a problem that the projection type display using the modulation element and the entire image processing apparatus are increased in size and the manufacturing cost is increased.

In view of the above circumstances, the present invention can significantly improve the resolution of the element itself and display a high-definition image without increasing the size of the element itself or each optical system. With the object of providing an inclined complex dielectric constant type spatial light modulator capable of achieving high definition of an image without increasing the size of the display or the image processing apparatus itself and increasing the manufacturing cost. There is.

[0010]

To achieve the above object, the present invention provides a tilted complex dielectric constant type spatial light modulator according to claim 1, wherein a first transparent electrode, a photoconductive layer, a light absorbing layer, It is formed by laminating a dielectric multilayer mirror, a light modulation layer and a second transparent electrode, and from the side of the first transparent electrode while repeatedly applying a voltage between the first transparent electrode and the second transparent electrode. Based on the incident writing light, the impedance of the photoconductive layer is changed to change the state of the light modulation layer, and the reading light incident from the second transparent electrode side is two-dimensionally changed by the light modulation layer. In a spatial light modulation element that is reflected by a dielectric multilayer mirror and emitted from the side of the second transparent electrode while modulating, a dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer. Each layer that is a component Of the two adjacent layers having different refractive indices, the absolute value of the complex permittivity closer to the light modulation layer does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer. As described above, the complex dielectric constant of each layer constituting the dielectric multilayer film mirror is set.

In the inclined complex dielectric constant type spatial light modulator of claim 2, the first transparent electrode, the photoconductive layer, the dielectric multilayer mirror, the light modulating layer and the second transparent electrode are laminated. While applying a voltage repeatedly between the first transparent electrode and the second transparent electrode, the impedance of the photoconductive layer is changed based on the writing light incident from the first transparent electrode side, and the light is changed. The state of the modulation layer is changed so that the read light incident from the second transparent electrode side is two-dimensionally modulated by the light modulation layer and is reflected by the dielectric multilayer mirror to be read from the second transparent electrode side. In the spatial light modulation element for emitting light, among the layers which are constituent elements of the dielectric multilayer film mirror inserted between the photoconductive layer and the light modulation layer, they have different refractive indexes and are adjacent to each other. Two layers Set the complex permittivity of each layer constituting the dielectric multilayer film mirror so that the absolute value of the complex permittivity closer to the light modulation layer does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer. It is characterized by setting.

Further, in the inclined complex dielectric constant type spatial light modulator according to claim 3, there is provided a first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulation layer and a second transparent electrode, and the photoconductive layer is provided. At least 1 layer between the layer and the second transparent electrode.
One or more transparent layers or opaque layers are provided, and the writing light incident from the first transparent electrode side is applied while repeatedly applying a voltage between the first transparent electrode and the second transparent electrode. Then, the impedance of the photoconductive layer is changed to change the state of the light modulation layer, and the read light incident from the second transparent electrode side is changed by the light modulation layer.
In a spatial light modulator that dimensionally modulates and emits,
Of the layers constituting the dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer, two adjacent light modulation layers having different refractive indexes from each other. So that the absolute value of the complex permittivity closer to is not larger than the absolute value of the complex permittivity closer to the photoconductive layer,
The feature is that the complex permittivity of each layer constituting the dielectric multilayer film mirror is set.

According to a fourth aspect, in the tilted complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, as the light modulating layer, a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, It is characterized in that one or more liquid crystals selected from the group consisting of a mixture of these nematic liquid crystals, cholesteric liquid crystals, and smectic liquid crystals are used.

According to a fifth aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, as the light modulating layer, a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, The nematic liquid crystal, the cholesteric liquid crystal, and the smectic liquid crystal, which are equivalent to the ordinary refractive index, the extraordinary light refractive index, or the refractive index when the liquid crystal is randomly aligned, of one or more liquid crystals One of a liquid crystal / resin composite in which the liquid crystal is dispersed in a resin having a refractive index, or a liquid crystal / resin composite in which the resin is dispersed in the liquid crystal is used.

According to a sixth aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first, second and _third aspects, the light modulating layer is LiNbO ₃ , LiTa.
O ₃ , KDP, DKDP, ADP, KTP, KNb
O ₃ , Sr _x Ba _1-x Nb ₂ O ₆ , GaAs, InP,
It is characterized by using one or more electro-optic crystals selected from the group consisting of GaP crystals.

According to a seventh aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, the photoconductive layer is made of silicon, germanium or carbon. It is characterized by using an amorphous film made of any one or more elements of the group.

Further, in claim 8, in the inclined complex dielectric constant type spatial light modulator according to any one of claims 1, 2 and 3, the photoconductive layer is an amorphous silicon film or a hydrogenated amorphous silicon film. , Amorphous silicon carbide film, hydrogenated amorphous silicon carbide film, amorphous selenium film, amorphous SeAs
It is characterized by using at least one film selected from the group consisting of a film, an amorphous ZnS film, an amorphous CdS film, and an amorphous CdSe film.

According to a ninth aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, as the photoconductive layer, a GaAs crystal, a GaP crystal, and a Bi ₁₂ SiO. ₂₀ crystals, one or more crystals selected from the group consisting of Bi ₁₂ GeO ₂₀ crystals are used.

Further, in the tenth aspect, the first, second, and third aspects are provided.
In the inclined complex dielectric constant type spatial light modulator according to any one of the above, as the photoconductive layer, a phthalocyanine pigment, an azo pigment, a polycyclic quinone pigment, a perylene pigment,
Perinone pigments, anthraquinone pigments, indigo pigments, thioindigo pigments, dioxazine pigments, azo lake pigments, thiapyrylium pigments, quinacridone pigments, cyanine pigments, pyrrole pigments, porphyrin pigments, anthanton pigments, squarylium pigments. , Azurenium dye, ZnO, TiO, CdS or CdSe
It is characterized by using a material in which is dispersed in a resin.

Further, in claim 11, in the inclined complex dielectric constant type spatial light modulator according to any one of claims 1 and 3, the light absorbing layer is a CdTe film, a diamond-like carbon film, silicon and carbon. It is characterized by using one or more films selected from the group consisting of an amorphous film consisting essentially of and germanium.

According to a twelfth aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first and third aspects, the light absorption layer is made of an inorganic pigment, an organic pigment, carbon or a dye. It is characterized by using a resin composite in which one or more materials selected from the group described above are dispersed in a resin.

In the thirteenth aspect, the first, second, and third aspects are provided.
In the tilted complex dielectric constant type spatial light modulator according to any one of the items 1 to 3,
₂ film, TiO ₂ film, HfO ₂ film, Ta ₂ O ₅ film, ZnS
Film, Al ₂ O ₃ film, Na ₂ AlF ₆ film, MgF ₂ film, L
aF ₃ film, GdF ₃ film, SmF ₃ film, CeF ₃ film, Zr
It is characterized by using a multilayer film in which two or more films selected from the group consisting of an O ₂ film and a CeO ₂ film are laminated.

[0023]

In the above structure, in the inclined complex dielectric constant type spatial light modulator of claim 1, the first transparent electrode, the photoconductive layer,
It is formed by laminating a light absorption layer, a dielectric multilayer mirror, a light modulation layer and a second transparent electrode, and while applying a voltage repeatedly between the first transparent electrode and the second transparent electrode, the first transparent electrode is formed. Based on the write light incident from the transparent electrode side, the impedance of the photoconductive layer is changed to change the state of the light modulation layer, and the read light incident from the second transparent electrode side is changed by the light modulation layer. In a spatial light modulator that reflects two-dimensionally by a dielectric multilayer film mirror and emits from the side of the second transparent electrode, a dielectric material inserted between the photoconductive layer and the light modulation layer. Of the layers that are the constituent elements of the multilayer mirror, the two adjacent layers that have different refractive indices and the absolute value of the complex dielectric constant of the one that is closer to the light modulation layer is the one that is closer to the photoconductive layer. Is the absolute value of the complex permittivity of Also, by setting the complex permittivity of each layer constituting the dielectric multilayer film mirror so that it does not become large, the resolution of the element itself is significantly improved, without increasing the size of the element itself or each optical system. A high-definition image is displayed, whereby a high-definition image is achieved without increasing the size of the projection display or the image processing apparatus itself and increasing the manufacturing cost.

In the inclined complex dielectric constant type spatial light modulator of claim 2, the first transparent electrode, the photoconductive layer, the dielectric multilayer mirror, the light modulating layer and the second transparent electrode are laminated. While applying a voltage repeatedly between the first transparent electrode and the second transparent electrode, the impedance of the photoconductive layer is changed based on the writing light incident from the first transparent electrode side, and the light is changed. The state of the modulation layer is changed so that the read light incident from the second transparent electrode side is two-dimensionally modulated by the light modulation layer and is reflected by the dielectric multilayer mirror to be read from the second transparent electrode side. In the spatial light modulation element for emitting light, among the layers which are constituent elements of the dielectric multilayer film mirror inserted between the photoconductive layer and the light modulation layer, they have different refractive indexes and are adjacent to each other. Two layers Set the complex permittivity of each layer constituting the dielectric multilayer film mirror so that the absolute value of the complex permittivity closer to the light modulation layer does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer. By setting it, the resolution of the element itself is significantly improved, and a high-definition image is displayed without increasing the size of the element itself or each optical system, thereby enlarging the projection type display or the image processing apparatus itself. And high definition of an image is achieved without increasing the manufacturing cost.

The inclined complex dielectric constant type spatial light modulator of claim 3 has a first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulation layer and a second transparent electrode, and the photoconductive layer is provided. At least two or more transparent layers or opaque layers are provided between the layer and the second transparent electrode.
While repeatedly applying a voltage between the transparent electrode and the second transparent electrode, the impedance of the photoconductive layer is changed based on the writing light incident from the first transparent electrode side to change the state of the light modulation layer. In the spatial light modulator in which the light modulating layer two-dimensionally modulates the read light incident from the second transparent electrode side and emits the read light, in the space between the photoconductive layer and the light modulating layer. Of the layers that are the constituent elements of the inserted dielectric multilayer mirror, the absolute values of the complex permittivities of the two adjacent layers that have different refractive indices and are closer to the light modulation layer are By setting the complex permittivity of each layer constituting the dielectric multilayer film mirror so that it does not become larger than the absolute value of the complex permittivity closer to the conductive layer, the resolution of the element itself is significantly improved,
High-definition images are displayed without increasing the size of the element itself or each optical system, thereby increasing the definition of images without increasing the size of the projection display or the image processing device itself and increasing the manufacturing cost. To achieve.

According to a fourth aspect, in the tilted complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, as the light modulating layer, a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, By selecting and using one or more liquid crystals selected from the group consisting of a mixture of these nematic liquid crystals, cholesteric liquid crystals, and smectic liquid crystals, each element constituting the element is specified,
The effects shown in claims 1, 2 and 3 can be obtained by existing materials.

According to a fifth aspect, in the tilted complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, as the light modulating layer, a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, The nematic liquid crystal, the cholesteric liquid crystal, and the smectic liquid crystal, which are equivalent to the ordinary refractive index, the extraordinary light refractive index, or the refractive index when the liquid crystal is randomly aligned, of one or more liquid crystals Each element constituting an element by using one of a liquid crystal / resin composite in which the liquid crystal is dispersed in a resin having a refractive index, or a liquid crystal / resin composite in which the resin is dispersed in the liquid crystal Is specified, and the effects shown in claims 1, 2 and 3 are obtained depending on the existing material.

According to a sixth aspect of the present invention, in the inclined complex dielectric constant type spatial light modulator according to any one of the first, second and _third aspects, LiNbO ₃ , LiTa is used as the light modulating layer.
O ₃ , KDP, DKDP, ADP, KTP, KNb
O ₃ , Sr _x Ba _1-x Nb ₂ O ₆ , GaAs, InP,
A method according to claim 1, wherein each element constituting the device is specified by using one or more electro-optic crystals selected from the group consisting of GaP crystals, and the existing material is used.
The effect shown in 3 is obtained.

According to a seventh aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, the photoconductive layer is made of silicon, germanium or carbon. The use of an amorphous film composed of any one or more elements of the group to specify each element constituting the element, and to use the existing material to claim 1.
The effects shown in 2 and 3 are obtained.

Further, in the eighth aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, the photoconductive layer is an amorphous silicon film or a hydrogenated amorphous silicon film. , Amorphous silicon carbide film, hydrogenated amorphous silicon carbide film, amorphous selenium film, amorphous SeAs
A film, an amorphous ZnS film, an amorphous CdS film, or an amorphous CdSe film is used to identify each element constituting the element by using one or more films, and the present invention may be applied according to claim 1. The effect shown in 3 is obtained.

According to a ninth aspect, in the gradient complex dielectric constant type spatial light modulator according to any one of the first, second and third aspects, as the photoconductive layer, a GaAs crystal, a GaP crystal, and a Bi ₁₂ SiO. By using one or more crystals selected from the group consisting of ₂₀ crystal and Bi ₁₂ GeO ₂₀ crystal, each element constituting the element is specified, and the present invention shows the present invention according to claims 1, 2 and 3. Get the effect.

In the tenth aspect, the first, second, and third aspects are provided.
In the inclined complex dielectric constant type spatial light modulator according to any one of the above, as the photoconductive layer, a phthalocyanine pigment, an azo pigment, a polycyclic quinone pigment, a perylene pigment,
Perinone pigments, anthraquinone pigments, indigo pigments, thioindigo pigments, dioxazine pigments, azo lake pigments, thiapyrylium pigments, quinacridone pigments, cyanine pigments, pyrrole pigments, porphyrin pigments, anthanton pigments, squarylium pigments. , Azurenium dye, ZnO, TiO, CdS or CdSe
By using a material in which is dispersed in a resin, each element constituting the element is specified, and the effects shown in claims 1, 2 and 3 are obtained depending on the existing material.

In the eleventh aspect, in the tilted complex dielectric constant type spatial light modulator according to any one of the first and third aspects, the light absorbing layer is a CdTe film, a diamond-like carbon film, silicon and carbon. The elements constituting the element are specified by using one or more films selected from the group consisting of an amorphous film substantially composed of and germanium. The effect shown in is obtained.

According to a twelfth aspect, in the inclined complex dielectric constant type spatial light modulator according to any one of the first and third aspects, the light absorption layer is made of an inorganic pigment, an organic pigment, carbon or a dye. By using a resin composite in which one or more materials selected from the group described above are dispersed in a resin, each element constituting the element is specified, and the effects shown in claims 1 and 3 are obtained depending on the existing materials. obtain.

In the thirteenth aspect, the first, second, and third aspects are provided.
In the tilted complex dielectric constant type spatial light modulator according to any one of the items 1 to 3,
₂ film, TiO ₂ film, HfO ₂ film, Ta ₂ O ₅ film, ZnS
Film, Al ₂ O ₃ film, Na ₂ AlF ₆ film, MgF ₂ film, L
aF ₃ film, GdF ₃ film, SmF ₃ film, CeF ₃ film, Zr
By using a multilayer film in which two or more films selected from the group consisting of O ₂ film and CeO ₂ film are laminated,
Each element constituting the element is specified, and the effects shown in claims 1, 2 and 3 are obtained depending on the existing material.

[0036]

【Example】

<< Description of Basic Principle >> First, the reason why the resolution of the conventionally known spatial light modulation element is low is considered, and the reason is that it is inserted between the photoconductive layer 103 and the liquid crystal light modulation layer 116. Of the layers that are constituent elements of the dielectric multilayer mirror 105, the absolute values of the complex permittivities of the two adjacent layers having different refractive indexes and closer to the liquid crystal light modulation layer 116 are the optical values. It was concluded that the complex permittivity of each layer constituting the dielectric multilayer film mirror 105 is not set so as not to be larger than the absolute value of the complex permittivity closer to the conductive layer 103.

That is, US Pat. 4127322
In the specification of the issue, the dielectric content of the spatial light modulator described in the specification is described from line 30 to line 35 of page 9 and line 15 to line 20 of page 9. It is specified that the body multilayer film mirror 105 is composed of a TiO ₂ thin film and a SiO ₂ thin film and has a thickness of 1.54 μm and a sheet resistance of 10 ¹⁰ Ω / □ or more. In other words, the dielectric multilayer mirror 105 is
It can be expressed as having a specific resistance of 1.54 × 10 ⁶ Ωcm or more.

However, in general, since the spatial light modulation element using liquid crystal for the liquid crystal light modulation layer 116 is driven by an AC voltage, the sheet resistance or the specific resistance of the dielectric multilayer film mirror 105 constituting the spatial light modulation element. The device design method of the patent specification, in which only the electrical parameter is used, is obviously wrong.

Therefore, in designing a spatial light modulator driven by an AC voltage, the dielectric constant of the dielectric multilayer film mirror 105, the permittivity, and the complex permittivity including the frequency of the drive voltage are used as electrical parameters for the dielectric constant. Body multilayer mirror 10
It is necessary to properly determine the electrical characteristics of each layer that constitutes No. 5. In particular, in order to design a high resolution spatial light modulation element, the photoconductive layer 103 and the liquid crystal light modulation layer 116 are used.
Among the layers that are constituent elements of the dielectric multilayer mirror 105 that is inserted between and, the two adjacent layers that have different refractive indexes and that are closer to the liquid crystal light modulation layer 116 have a complex dielectric constant. The absolute value of the refractive index should not be larger than the absolute value of the complex dielectric constant closer to the photoconductive layer 103.
The complex permittivity of each layer forming the dielectric multilayer film mirror 105 must be set.

In the following, US Pat. 4127322
Using the example of the spatial light modulation element described in No. 5, the absolute value of the complex permittivity of two types of dielectric thin films having different refractive indexes among the layers forming the dielectric multilayer mirror 105 is obtained. The reason why the spatial light modulator described above has a low resolution will be clarified numerically.

First, US Pat. No. 4127322, the dielectric multilayer mirror 105 of the spatial light modulator.
The relative permittivity of the TiO ₂ thin film and the relative permittivity of the SiO ₂ thin film constituting the above are calculated. The relative permittivity of these materials is
US Patent No. Although not described in the specification of No. 4127322, it generally has the values shown in Table 1.
However, in Table 1, the relative permittivity (ε _e ) of the TiO ₂ single crystal in the C-axis direction, the relative permittivity (ε _o ) in the direction perpendicular to the C-axis, and the relative permittivity (ε _{c of the} fused quartz) are shown. ) Is described. These numerical values are generally well known, although there are some differences depending on the literature.

[0042]

[Table 1] Then, SiO ₂ forming the dielectric multilayer mirror 105
The relative permittivity (ε _S ) of the film is almost equivalent to the relative permittivity and refractive index of fused quartz, and is given by ε _S ≈ε _c = 4.1 (1).

On the other hand, since the TiO ₂ film forming the dielectric multilayer mirror 105 is considered to have polycrystallinity, its relative dielectric constant ε _T is ε _T = (2ε _o + ε _e ) / 3 (( 2) It does not matter as. From these values and the values shown in Table 1, the relative permittivity ε _T of the TiO ₂ film is ε _T = 148.9 (3).

Then, the specific resistance of the TiO ₂ film and the specific resistance of the SiO ₂ film forming the dielectric multilayer mirror 105 are
Let ρ _T and ρ _S , respectively, and let the angular frequency of the AC voltage that drives the spatial light modulator be ω, then the complex permittivity ε _ZT of the TiO ₂ film and the complex permittivity ε _ZS of the SiO ₂ film are respectively ε _ZT = Ε _V ε _T + (jωρ _T ) ⁻¹ (4) ε _ZS = ε _V ε _S + (jωρ _S ) ⁻¹ (5) Where ε _V is the permittivity in vacuum and j is j
It is an imaginary unit represented by ² = -1. This allows Ti
The absolute values of the complex permittivity ε _ZT of the O ₂ film and the complex permittivity ε _ZS of the SiO ₂ film are | ε _ZT | and | ε _ZS |, respectively.

[Equation 1] | ε _ZT | = {(ε _V ε _T ) ² + (ωρ _T ) ⁻² } ^0.5 (6) | ε _ZS │ = {(ε _V ε _S ) ² + (ωρ _S ) ⁻² } ^0.5 becomes (7). Here, by dividing both sides of the equations (6) and (7) by the vacuum permittivity ε _V , the absolute values of the complex relative permittivity are defined as | ε _ZCT | and | ε _ZCS | The absolute values of relative permittivity | ε _ZCT | and | ε _ZCS | are | ε _ZCT | = | ε _ZT | / ε _V ... (8) | ε _ZCS | = | ε _ZS | / ε _V … (9) ) Is given by.

If the above equations (1) to (9) are used, US Pat. T constituting the dielectric multilayer mirror 105 of the spatial light modulator described in Japanese Patent No. 4127322.
The absolute value of the complex relative permittivity of the iO ₂ film | ε _ZCT |
The absolute value of the complex relative permittivity | ε _ZCS | of the _two films can be easily derived.

As an example, TiO having the characteristics shown in Table 1
The absolute value of the complex relative permittivity of ₂ film | epsilon _{ZC T} | and the absolute value of the complex relative permittivity of the SiO ₂ film | epsilon _ZCS | and seek. However, _both the specific resistance ρ _T of the TiO ₂ film and the specific resistance ρ _S of the SiO ₂ film belong to the range of 10 ⁷ to 10 ¹¹ Ωcm. These numerical values are shown in Table 1
o. The conditions of the dielectric multilayer film mirror 105 of the spatial light modulator described in No. 4127322 are sufficiently satisfied.

Further, here, the frequency f of the AC voltage for driving the spatial light modulator is set to 10 to 10 ⁴ Hz, and T
By substituting the numerical values of the specific resistance ρ _T of the iO ₂ film and the specific resistance ρ _S of the SiO ₂ film and the values shown in Table 1 into the formulas (1) to (9), the components of the dielectric multilayer film mirror 105 are calculated. There is Si
O ₂ film absolute value of the complex relative permittivity of | epsilon _ZCS | a, TiO ₂
When the complex relative dielectric constant | ε _ZCT | of the film was calculated, the values shown in Tables 2 and 3 could be obtained.

[0048]

[Table 2]

[Table 3] Table 2 shows the specific resistance ρ _T and frequency f of the TiO ₂ film.
Absolute value of the complex relative permittivity of the TiO ₂ film according to the change of
epsilon _ZCT | indicates vary from 17,993 to 148.87, also Table 3 in accordance with a change in the resistivity [rho _S and the frequency f of the SiO ₂ film, the absolute value of the complex relative permittivity of the SiO ₂ film | epsilon _ZCS It is shown that | changes from 17993 to 4.1.

Here, comparing the contents of Table 2 with the contents of Table 3, the specific resistance ρ _T of the TiO ₂ film and the specific resistance ρ _S of the SiO ₂ film are ρ _T = ρ _S = 10 ⁷ Ωcm. And, except when the frequency f is f = 10 Hz, the TiO ₂ film and SiO
_It can be seen that the _two films have different complex relative permittivities.

By the way, as is well known, 2N
The dielectric multilayer mirror 105 composed of +1 (N is a positive integer larger than 1) multilayer film has a high refractive index thin film of N + 1 layers (in the spatial light modulator described in US Pat. No. 4,127,322, TiO.sub.2). ₂ films correspond to this) and N
The low-refractive-index thin films of layers (the SiO ₂ film corresponds to this in the spatial light modulator described in US Pat. No. 4,127,322) are alternately stacked.

That is, US Pat. In the conventional method including the spatial light modulator described in No. 4127322,
When manufacturing the dielectric multilayer film mirror 105, the N + 1 layer T
Since the iO ₂ film is manufactured under the same film forming conditions, any TiO ₂ film forming the dielectric multilayer mirror 105 has substantially the same electrical characteristics. In other words, each TiO
_{The two} films have almost the same specific resistance and dielectric constant (or almost the same complex relative dielectric constant).

Similarly, even in the N-layer SiO ₂ film forming the dielectric multilayer mirror 105, each layer has substantially the same electrical characteristics, that is, the N-layer SiO ₂ film has almost the same specific resistance and dielectric constant ( Alternatively, it has a complex relative permittivity).

To summarize the above description, in the dielectric multilayer mirror 105, the two types of layers which are the constituent elements and have different refractive indices have different complex permittivities, and these two layers have different complex permittivities.
Due to the alternating layers of different types, US Pat.
No. 4,127,322, the dielectric multilayer mirror 105 of the spatial light modulation element described above, and all conventional dielectric multilayer mirrors have periodicity in the thickness direction. It is considered that this is a cause of significant deterioration in the resolution of the light modulation element.

That is, the absolute value of the complex relative permittivity is determined from the layer having a small absolute value of the complex relative permittivity (the SiO ₂ film corresponds to this in the spatial light modulator described in US Pat. No. 4127322). Large layer (US Pat. No. 412
In the spatial light modulator described in No. 7322, TiO ₂
When the electric lines of force move toward (the membrane corresponds to this),
At the boundary between the layer having a small absolute value of the complex relative permittivity and the layer having a large absolute value of the complex relative permittivity, the power line is refracted and spreads in a direction orthogonal to the thickness direction of the dielectric multilayer mirror 105. However, the resolution of the spatial light modulator decreases.

In general, the dielectric constant of the high refractive index layer is larger than that of the low refractive index layer, so that US Pat. 4127
In the conventional spatial light modulators as well as the spatial light modulator described in No. 322, due to the periodicity of the complex permittivity of each layer constituting the dielectric multilayer mirror 105 that is a constituent element of the element, The resolution of the device is greatly reduced.

As is clear from the above description, the spatial light modulator which determines only the specific resistance of the dielectric multilayer mirror 105 inserted between the photoconductive layer 103 and the second transparent electrode 109 (US In the spatial light modulator described in Japanese Patent No. 4127322), the above mismatch is established not only in the cases shown in Tables 2 and 3 but also in many cases, and the resolution of the spatial light modulator is Will be significantly reduced.

Therefore, in the inclined complex dielectric constant type spatial light modulator according to the present invention, it serves as a constituent element of the dielectric multilayer film mirror 105 inserted between the photoconductive layer 103 and the liquid crystal light modulation layer 116. Of the two adjacent layers having different refractive indices from each other, the liquid crystal light modulation layer 116.
The complex permittivity of each layer constituting the dielectric multilayer film mirror 105 is set so that the absolute value of the complex permittivity closer to the photoconductive layer 103 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 103. By doing so, the basic principle is to increase the resolution of the spatial light modulator.

<< Description of First Embodiment >> FIG. 1 is a structural diagram showing a first embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention based on the above-mentioned basic principle.

<Explanation of Overall Structure of First Embodiment> The inclined complex dielectric constant type spatial light modulator 1 shown in this figure has a first transparent substrate 2, a first transparent electrode 3, a photoconductive layer 4 and Light absorption layer 5
A dielectric multilayer film mirror 6, a light modulation layer 7, a second transparent electrode 8, a first antireflection film 9, a second transparent substrate 10,
This is an element formed by sequentially and closely stacking a second antireflection film 11 on the first transparent electrode 2 and the second transparent electrode 8 by an alternating current power supply 12 and applying the alternating voltage to the first transparent electrode 2.
By making the writing light 13 incident on the transparent substrate 2 side,
By changing the resistance value of the photoconductive layer 4 to write two-dimensionally optical information in the light modulation layer 7 and causing the read light 14 to enter the second antireflection film 11 side, the light information is written in the light modulation layer 7. The displayed information is read out and emitted as display light 15 to the outside.

<Description of AC Power Supply 12> The AC power supply 12
Is an AC voltage having a voltage value equal to or higher than a preset predetermined voltage value, that is, the long axis of liquid crystal molecules in the liquid crystal / resin composite body 19 (see FIGS. 2, 3, and 4) forming the light modulation layer 7. An AC voltage value having an effective value larger than the effective value of the AC voltage required to match the direction of the applied electric field, for example, 10 to
An alternating voltage having a voltage value of about 200 V is generated and applied to the first transparent electrode 3 and the second transparent electrode 8.

<Description of First Transparent Substrate 2> The first transparent substrate 2
The transparent substrate 2 is the inclined complex dielectric constant type spatial light modulator 1
Is formed of a flat glass substrate or the like serving as the substrate, and the first surface is provided between the one surface and the one surface of the photoconductive layer 4.
The transparent electrode 3 is inserted.

<Description of First Transparent Electrode 3> First Transparent Electrode 3
Is an ITO transparent electrode film having a thickness of 0.05 μm formed between one surface of the photoconductive layer 4 and one surface of the first transparent substrate 2 by adding, for example, 5% Sn to In ₂ O _3. Yes, a voltage is applied to the photoconductive layer 4 based on the AC voltage supplied from the AC power supply 12.

<Description of Photoconductive Layer 4> The photoconductive layer 4 is made of silicon.
Amorphous film consisting of one or more elements selected from the group consisting of germanium and carbon, amorphous silicon film, hydrogenated amorphous silicon film, amorphous silicon carbide film, hydrogenated amorphous silicon carbide film, etc. It is made of a material whose impedance changes significantly, and the light absorption layer 5 is laminated on one surface thereof.

Further, as the photoconductive layer 4, in addition to the above-mentioned materials, for example, an amorphous selenium film or amorphous S is used.
eAs film, amorphous ZnS film, amorphous CdS
A film or an amorphous CdSe film can also be used. Further, as the photoconductive layer 4, a GaAs crystal,
GaP crystal, Bi ₁₂ SiO ₂₀ crystal, or Bi ₁₂ Ge
Crystals such as O ₂₀ crystals whose impedance changes significantly by light irradiation are also suitable.

In addition, as the photoconductive layer 4, it is also possible to use a dispersion type photoconductive film in which particles of a photoconductive substance are dispersed in a resin. In this case, as the photoconductive material used for the dispersion type photoconductive film, a phthalocyanine pigment, an azo pigment, a polycyclic quinone pigment, a perylene pigment, a perinone pigment, an anthraquinone pigment, an indigo pigment, a thioindigo pigment, Dioxazine pigments, azo lake pigments,
Thiapyrylium pigments, quinacridone pigments, cyanine pigments, pyrrole pigments, porphyrin pigments, antanton pigments, squarylium pigments, azurenium pigments,
ZnO, TiO, CdS, CdSe, or the like can be used.

<Description of Light Absorption Layer 5> The light absorption layer 5 is made of CdT.
e film, diamond-like carbon film, one or more films selected from the group consisting of an amorphous film substantially composed of silicon, carbon and germanium, or composed of an inorganic pigment, an organic pigment, carbon or a dye It is composed of a resin composite or the like in which one or more materials selected from the group 1) are dispersed in a resin, and even if the writing light 13 and the reading light 14 are absorbed, the change in the specific resistance thereof is small, and It is made of a material that particularly strongly absorbs the readout light 14, and the dielectric multilayer mirror 6 is laminated on one surface thereof.

<Description of Dielectric Multilayer Film Mirror 6> The dielectric multilayer film mirror 6 includes a SiO ₂ film, a TiO ₂ film, a HfO ₂ film,
Ta ₂ O ₅ film, ZnS film, Al ₂ O ₃ film, Na ₂ AlF
₆ film, MgF ₂ film, LaF ₃ film, GdF ₃ film, SmF ₃
The film is composed of a multilayer film in which two or more films selected from the group consisting of a film, a CeF ₃ film, a ZrO ₂ film and a CeO ₂ film are laminated, and the light modulation layer 7 is laminated on one surface thereof.

In the inclined complex dielectric constant type spatial light modulator 1 of the first embodiment, the photoconductive layer among the layers inserted between the photoconductive layer 4 and the second transparent electrode 8. 4 and the light modulation layer 7 among the layers that are the constituent elements of the dielectric multilayer mirror 6 inserted between the light modulation layer 7 and the light modulation layer 7 that are adjacent to each other. The complex permittivity of each layer constituting the dielectric multilayer film mirror 6 is set so that the absolute value of the complex permittivity closer to the photoconductive layer 4 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4. Has been done.

<Description of Light Modulating Layer 7> As shown in FIG. 2, the light modulating layer 7 is composed of one or more liquid crystals 17 selected from the group consisting of nematic liquid crystals, cholesteric liquid crystals, smectic liquid crystals, and mixtures of these liquid crystals. And the ordinary or extraordinary refractive index of the liquid crystal 17 or the liquid crystal 17
Liquid crystal / resin composite 19 having a refractive index equivalent to any of the refractive indices when randomly aligned, and a transparent resin 18 in which the liquid crystal 17 is dispersed, or FIG.
As shown in FIG. 3, a liquid crystal / resin composite body 19 in which the transparent resin 18 is dispersed in the liquid crystal 17 is provided. Writing light 13 is incident from the first transparent substrate 2 side, and this is transmitted through the first transparent electrode 3. When incident on the photoconductive layer 4 and the impedance of the photoconductive layer 4 changes to change the electric field applied to the light modulation layer 7, the refractive index of the liquid crystal 17 changes. Then, when the reading light 14 is incident from the second antireflection film 11 side and is transmitted through the second transparent substrate 10, the first antireflection film 9, and the second transparent electrode 8, the reading light 14 has a refractive index of the liquid crystal 17. Accordingly, the light is two-dimensionally modulated, and then the transmitted light is reflected by the dielectric multilayer film mirror 6 and emitted as the display light 15.

In this case, the liquid crystal / resin composite 19 is a liquid crystal / resin composite in which the refractive index of the transparent resin 18 and the ordinary or extraordinary refractive index of the liquid crystal 17, which is a component thereof, are substantially the same. When it is 19, the liquid crystal / resin composite 1
When the electric field is not applied to the liquid crystal 9, the refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are different from each other. Therefore, when the reading light 14 is incident on the liquid crystal / resin composite 19, this is the liquid crystal / resin composite. When the liquid crystal is scattered in the body 19 and a sufficiently large electric field is applied to the liquid crystal / resin composite body 19, the refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are substantially the same. When the reading light 14 is incident on the resin composite body 19, it is transmitted without being scattered by the liquid crystal / resin composite body 19.

Further, in the liquid crystal / resin composite 19, the refractive index when the liquid crystal 17 which is a constituent element thereof is randomly aligned and the refractive index of the transparent resin 18 are substantially the same.
In the case of the resin composite 19, the liquid crystal / resin composite 19
When no electric field is applied to the
Since the refractive index of the transparent resin 18 is the same as that of the transparent resin 18, when the read light 14 is incident on the liquid crystal / resin composite 19, this is transmitted as it is, and a sufficiently large electric field is applied to the liquid crystal / resin composite 19. LCD 17
Therefore, when the writing light 14 is incident on the liquid crystal / resin composite 19, the writing light 14 is scattered by the liquid crystal / resin composite 19.

As described above, both liquid crystal / resin composites 19 can be used in the first embodiment.
However, in each of the liquid crystal / resin composites 19, like the former liquid crystal / resin composite 19, the ordinary or extraordinary refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are substantially the same. It is preferable to use the type that has. This is a liquid crystal of a type in which the refractive index when the liquid crystal 17 is randomly aligned and the refractive index of the transparent resin 18 are substantially the same.
This is because, in the resin composite body 19, when each portion of the entire surface of the liquid crystal / resin composite body 19 is viewed macroscopically, the random state of the liquid crystal 17 is different for each portion, and it appears that there is unevenness in the light transmitting state. . On the other hand, in the liquid crystal / resin composite 19 of the type in which the ordinary or extraordinary refractive index of the liquid crystal 17 and the transparent resin 18 are the same, the electric field is applied to the liquid crystal molecules in a certain direction. Since the light is transmitted in the state of being arranged in the above arrangement, light is transmitted almost uniformly even if the alignment is biased at the time of random alignment. In addition, in a state in which no electric field is applied, the molecules of the liquid crystal 17 are substantially aligned with those when the molecules of the liquid crystal 17 are arranged on the wall surface of the transparent resin 18 and are randomly oriented. This state is a light-scattering state, and unlike the light-transmitting state, even if the refractive index is slightly deviated, it is inconspicuous. Therefore, in the spatial light modulation element using the liquid crystal / resin composite body 19 of this type as the light modulation layer 7, unevenness is hardly recognized.

Among these, the liquid crystal / resin composite 19 of the type in which the ordinary refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are substantially the same is most preferable in terms of performance.

The liquid crystal / resin composite 19 is mixed with the liquid crystal 17 and the material forming the transparent resin 18 to form a solution or latex, which is then photo-cured, heat-cured, or solvent-removed. By curing, reaction curing, etc.,
The transparent resin 18 and the liquid crystal 17 are separated, and the liquid crystal 17 is dispersed in the transparent resin 18 in the form of particles as shown in FIG. 2, or the liquid crystal 1 is dispersed in the transparent resin 18 as shown in FIG.
It is manufactured by making 7 dispersed in a continuous state, or by making transparent resin 18 dispersed in the liquid crystal 17 as shown in FIG.

In this case, since the photocurable or thermosetting type transparent resin 18 can be cured in a closed system,
It is preferable to use this type of transparent resin 18 in manufacturing the device. In particular, the photo-curing type transparent resin 18 can be cured in a short time, and once cured, it is not easily affected by heat, so that it is preferable to use it.

As a specific manufacturing method, as in the conventional twisted nematic liquid crystal, a cell is formed by using a sealing material, and an uncured nematic liquid crystal that becomes the liquid crystal 17 from the injection port and a resin precursor that becomes the transparent resin 18 are formed. The body (the state before the resin is cured, which is used here as a generic term for the state of, for example, a monomer or an oligomer) can be encapsulated and then cured.

Further, in the case of the liquid crystal / resin composite body 19 of the present invention, the first transparent electrode 3, the photoconductive layer 4, the light absorption layer 5 and the dielectric material are formed on the first transparent substrate 2 without using a sealing material. The multilayer film mirror 6 is superposed and adhered, a mixture of the uncured resin precursor and the liquid crystal 17 is applied thereon, and the second transparent electrode 8, the first antireflection film 9, the second transparent substrate 10, Second
After laminating the antireflection film 11, the resin precursor may be cured by light irradiation or the like to form the inclined complex dielectric constant type spatial light modulator 1 having the liquid crystal / resin composite 19. Of course, after that, a sealing material may be applied to the periphery.
According to this manufacturing method, the mixture of the uncured liquid crystal 17 and the resin precursor may be simply supplied by roll coating, spin coating, printing, coating with a dispenser, or the like, and the injection process is simple, It is possible to significantly improve the sex.

Further, in the mixture of the uncured resin precursor and the liquid crystal 17, spacers such as ceramic particles for controlling the substrate gap, plastic particles, glass particles, spacers such as glass fibers, pigments, dyes, viscosity modifiers, In addition, additives that do not adversely affect the performance of the present invention may be added.

<Explanation of Second Transparent Substrate 10> Further, the second transparent substrate 10 is the tilted complex dielectric constant type spatial light modulator 1.
The first antireflection film 9 is laminated on one surface and the second antireflection film 11 is laminated on the other surface.

<Description of Second Antireflection Film 11> The second antireflection film 11 is a SiO ₂ film, a TiO ₂ film, a HfO ₂ film, Ta.
₂ O ₅ film, ZnS film, Na ₂ AlF ₆ film, MgF ₂ film,
It is composed of a multilayer film in which one or more films selected from the group consisting of a CeF ₃ film, a ZrO ₂ film and a CeO ₂ film are laminated.

<Description of First Antireflection Film 9> The first antireflection film 9 is a SiO ₂ film, a TiO ₂ film, a HfO ₂ film, or a T film.
a ₂ O ₅ film, ZnS film, Na ₂ AlF ₆ film, MgF
_It is composed of a multi-layered film in which one or more films selected from the group consisting of _two films, CeF ₃ film, ZrO ₂ film, and CeO ₂ film are laminated, and the second transparent electrode 8 is laminated on one surface thereof.

<Description of Second Transparent Electrode 8> Second Transparent Electrode 8
Is 5% on the first antireflection film 9, for example, In ₂ O _3.
Is an ITO transparent electrode film having a thickness of 0.05 μm formed by adding Sn, and an electric field is applied to the light modulation layer 7 based on an AC voltage supplied from the AC power supply 12.

As described above, in the first embodiment,
Among the layers inserted between the photoconductive layer 4 and the second transparent electrode 8, the components of the dielectric multilayer mirror 6 inserted between the photoconductive layer 4 and the light modulation layer 7 The absolute value of the complex permittivity of the two adjacent layers having different refractive indexes from each other, which is closer to the light modulation layer 7, is the complex permittivity of the one closer to the photoconductive layer 4. Since the complex permittivity of each layer constituting the dielectric multilayer film mirror 6 is set so as not to be larger than the absolute value, the resolution of the element itself is significantly improved, and the element itself and each optical system are improved. It is possible to display a high-definition image without increasing the size, and thereby without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost.
Higher definition of an image can be achieved.

In the first embodiment, the first,
Although the second antireflection films 9 and 11 are used,
One of the first and second antireflection films 9 and 11,
Alternatively, even if both are deleted, the same effect as in the first embodiment can be obtained.

In the first embodiment, the first antireflection film 9 is arranged between the second transparent electrode 8 and the second transparent substrate 10. First
Even if the antireflection film 9 is replaced and the second transparent electrode 8 is disposed between the first antireflection film 9 and the second transparent substrate 10, the same effect can be obtained.

<< Explanation of Second Embodiment >> FIG. 5 is a sectional view showing a second embodiment of the inclined complex dielectric constant type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are designated by the same reference numerals.

<Description of Overall Configuration of Second Embodiment> The gradient complex dielectric constant type spatial light modulator 1 shown in this figure differs from the element shown in FIG. 1 in that the gradient complex dielectric constant type shown in FIG. The light absorption layer 5 is removed from the spatial light modulator 1 and the first transparent substrate 2
A first transparent electrode 3, a photoconductive layer 4, a dielectric multilayer mirror 6, a light modulation layer 7, a second transparent electrode 8, a first antireflection film 9, and a second transparent substrate 10. , Second antireflection film 11
It is formed by sequentially and closely adhering and.

Then, while the AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power source 12, the writing light 13 is made incident on the first transparent substrate 2 side to thereby generate light. By changing the resistance value of the conductive layer 4, the light modulation layer 7
Information is written in the light modulating layer 7 by reading two-dimensionally the optical information into the second light-reflecting film 11 and causing the reading light 14 to enter the second antireflection film 11 side.
5 is emitted to the outside.

In this case, in the tilted complex dielectric constant type spatial light modulator 1 of the second embodiment, the photoconductive layer is inserted between the photoconductive layer 4 and the second transparent electrode 8. Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulation layer 7, two adjacent light modulation layers having different refractive indexes from each other 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4, the complex permittivity of each layer constituting the dielectric multilayer film mirror 6 is Is set.

Even in this case, similarly to the first embodiment described above, the resolution of the element itself is greatly improved, and a high-definition image can be displayed without increasing the size of the element itself or each optical system. As a result, it is possible to achieve high-definition images without increasing the size of the projection type display or the image processing apparatus itself and without increasing the manufacturing cost.

Further, in the second embodiment, the first,
Although the second antireflection films 9 and 11 are used,
One of the first and second antireflection films 9 and 11,
Alternatively, even if both are deleted, the same effect as that of the second embodiment can be obtained.

Further, in the second embodiment, the second transparent electrode 8 is inserted between the light modulation layer 7 and the first antireflection film 9, but the first antireflection film 9 and the first antireflection film 9 are provided. The same effect can be obtained by replacing the two transparent electrodes 8 and inserting the first antireflection film 9 between the light modulation layer 7 and the second transparent electrode 8.

<< Explanation of Third Embodiment >> FIG. 6 is a sectional view showing a third embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are designated by the same reference numerals.

<Explanation of Overall Structure of Third Embodiment> The tilted complex dielectric constant type spatial light modulation element 1 shown in this figure is different from the element shown in FIG. 1 in that a nematic liquid crystal, cholesteric is used as the light modulation layer 7. 1 selected from the group consisting of liquid crystals, smectic liquid crystals and mixtures of these nematic liquid crystals, cholesteric liquid crystals, smectic liquid crystals
One or more liquid crystals are used, and the dielectric multilayer film mirror 6 is used.
And a light modulation layer 7, a first alignment layer 20 for aligning liquid crystal molecules is provided, and the light modulation layer 7 and the second transparent electrode 8 are further provided.
A second alignment layer 21 for aligning liquid crystal molecules is provided between the first transparent substrate 2, the first transparent electrode 3, the photoconductive layer 4, the light absorption layer 5, and the dielectric multilayer film mirror. 6, the first alignment layer 20, the light modulation layer 7, the second alignment layer 21, the second transparent electrode 8, the first antireflection film 9, and the second transparent substrate 1
0 and the second antireflection film 11 are formed by sequentially adhering and laminating.

Then, while the AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power source 12, the writing light 13 is made incident on the first transparent substrate 2 side to thereby generate light. By changing the resistance value of the conductive layer 4, the light modulation layer 7
Information is written in the light modulating layer 7 by reading two-dimensionally the optical information into the second light-reflecting film 11 and causing the reading light 14 to enter the second antireflection film 11 side.
5 is emitted to the outside.

In this case, in the tilted complex dielectric constant type spatial light modulator 1 of the third embodiment, the photoconductive layer 4 is inserted between the photoconductive layer 4 and the second transparent electrode 8. Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulation layer 7, two adjacent light modulation layers having different refractive indexes from each other 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4, the complex permittivity of each layer constituting the dielectric multilayer film mirror 6 is Is set.

Even in this case, similarly to the first embodiment described above, the resolution of the element itself is greatly improved, and a high-definition image is displayed without increasing the size of the element itself or each optical system. As a result, it is possible to achieve high-definition images without increasing the size of the projection type display or the image processing apparatus itself and without increasing the manufacturing cost.

Further, in the third embodiment, the first,
Although the second antireflection films 9 and 11 are used,
One of the first and second antireflection films 9 and 11,
Alternatively, even if both are deleted, the same effect as that of the third embodiment can be obtained.

Also, in the third embodiment, the second transparent electrode 8 is inserted between the light modulation layer 7 and the first antireflection film 9, but the first antireflection film 9 and The same effect can be obtained by replacing the two transparent electrodes 8 and inserting the first antireflection film 9 between the light modulation layer 7 and the second transparent electrode 8.

<< Explanation of Fourth Embodiment >> FIG. 7 is a sectional view showing a fourth embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are designated by the same reference numerals.

<Explanation of Overall Configuration of Fourth Embodiment> The gradient complex dielectric constant type spatial light modulator 1 shown in this figure differs from the element shown in FIG. 1 in that the gradient complex dielectric constant type shown in FIG. From the spatial light modulator 1 to the first antireflection film 9 and the second transparent substrate 1
0 and the second antireflection film 11 are removed, and as the light modulation layer 7, LiNbO ₃ , LiTaO ₃ , KDP, DK
DP, ADP, KTP, KNbO ₃ , Sr _x Ba _1-x N
One or more electro-optic crystals selected from the group consisting of b ₂ O ₆ , GaAs, InP, and GaP crystals are used, and the antireflection film 22 is provided between the light modulation layer 7 and the second transparent electrode 8. To insert the first transparent substrate 2, the first transparent electrode 3, the photoconductive layer 4, the light absorption layer 5, the dielectric multilayer mirror 6, the light modulation layer 7, and the antireflection film 22. , Second
That is, the transparent electrode 8 and the transparent electrode 8 are sequentially formed in close contact with each other.

Then, while the AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power supply 12, the writing light 13 is made incident on the first transparent substrate 2 side to thereby generate light. By changing the resistance value of the conductive layer 4, the light modulation layer 7
The information written in the light modulation layer 7 is read out by writing the optical information two-dimensionally to the second transparent electrode 8 and making the reading light 14 incident on the second transparent electrode 8 side, and the information is emitted to the outside as the display light 15. .

In this case, in the inclined complex dielectric constant type spatial light modulator 1 of the fourth embodiment, the photoconductive layer is inserted between the photoconductive layer 4 and the second transparent electrode 8. Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulation layer 7, two adjacent light modulation layers having different refractive indexes from each other 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4, the complex permittivity of each layer constituting the dielectric multilayer film mirror 6 is Is set.

Even in this case, similarly to the first embodiment described above, the resolution of the element itself is significantly improved, and a high-definition image can be displayed without increasing the size of the element itself or each optical system. As a result, it is possible to achieve high-definition images without increasing the size of the projection type display or the image processing apparatus itself and without increasing the manufacturing cost.

In the fourth embodiment, the AC power source 12 is used to apply the AC voltage to the first transparent electrode 3 and the second transparent electrode 8, but the AC power source 12 is used.
Instead of using the DC power supply, the first transparent electrode 3 and the second transparent electrode 3
A DC voltage may be applied to the transparent electrode 8.

<< Description of Fifth Embodiment >> FIG. 8 is a sectional view showing a fifth embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention. In this figure, the same parts as those in FIG. 1 are designated by the same reference numerals.

<Description of Overall Configuration of Fifth Embodiment> The gradient complex dielectric constant type spatial light modulator 1 shown in this figure differs from the element shown in FIG. 1 in that the gradient complex permittivity type shown in FIG. The first antireflection film 9 is removed from the spatial light modulator 1, the antireflection film 23 is inserted between the second transparent electrode 8 and the light modulation layer 7, and the second transparent electrode 8, the second transparent substrate 10 and Second
The shape of the antireflection film 11 is enlarged, and further, as the light modulation layer 7, LiNbO ₃ , LiTaO ₃ , KDP, DKDP,
ADP, KTP, KNbO ₃ , Sr _x Ba _1-x Nb ₂ O
₆ , one or more electro-optic crystals selected from the group consisting of GaAs, InP, and GaP crystals are used, and these first transparent substrate 2, first transparent electrode 3, and photoconductive layer 4 are used.
A light absorption layer 5, a dielectric multilayer film mirror 6, a light modulation layer 7, an antireflection film 23, a second transparent electrode 8, a second transparent substrate 10, and a second antireflection film 11. That is, they are formed by sequentially and closely laminating.

Then, while the AC voltage is applied between the first transparent electrode 3 and the second transparent electrode 8 by the AC power source 12, the writing light 13 is made incident on the first transparent substrate 2 side to thereby generate light. By changing the resistance value of the conductive layer 4, the light modulation layer 7
Information is written in the light modulating layer 7 by reading two-dimensionally the optical information into the second light-reflecting film 11 and causing the reading light 14 to enter the second antireflection film 11 side.
5 is emitted to the outside.

In this case, in the tilted complex dielectric constant type spatial light modulator 1 of the fifth embodiment, the photoconductive layer is inserted between the photoconductive layer 4 and the second transparent electrode 8. Of the layers constituting the dielectric multilayer mirror 6 inserted between the layer 4 and the light modulation layer 7, two adjacent light modulation layers having different refractive indexes from each other 7 so that the absolute value of the complex permittivity closer to 7 does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4, the complex permittivity of each layer constituting the dielectric multilayer film mirror 6 is Is set.

Even in this case, similarly to the first embodiment described above, the resolution of the element itself is greatly improved, and a high-definition image is displayed without increasing the size of the element itself or each optical system. As a result, it is possible to achieve high-definition images without increasing the size of the projection type display or the image processing apparatus itself and without increasing the manufacturing cost.

In the fifth embodiment, the antireflection film 23 and the second antireflection film 11 are used, but the antireflection film 23 and the second antireflection film 11 are used.
Even if you delete one or both of the
The same effect as that of the embodiment can be obtained.

Further, in the fifth embodiment, the antireflection film 23 is inserted between the light modulation layer 7 and the second transparent electrode 8, but the antireflection film 23 and the second transparent electrode 8 are inserted. The same effect can be obtained by replacing the and by inserting the second transparent electrode 8 between the light modulation layer 7 and the antireflection film 23.

<< Operation of Inclined Complex Permittivity-Type Spatial Light Modulating Element >> Next, the ordinary light refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are substantially the same, and the liquid crystal / resin composite having the configuration of FIG. The operation of the inclined complex dielectric constant type spatial light modulator of the present invention will be described by taking the inclined complex dielectric constant type spatial light modulator 1 of FIG. 1 in which the body 19 is the light modulation layer 7.

First, when there is no writing light 13, most of the voltage applied to the inclined complex dielectric constant type spatial light modulation element 1 is applied to the photoconductive layer 4, and the liquid crystal which is the light modulation layer 7
Since the voltage applied to the resin composite 19 is small, the molecules of the liquid crystal 17 are oriented in various directions depending on the irregular wall surface of the transparent resin 18.

At this time, since the liquid crystal 17 has a refractive index different from that of the transparent resin 18 surrounding the liquid crystal 17, when the reading light 14 is incident, this is the liquid crystal / resin composite 1.
Scattered in 9.

Next, when the writing light 13 is incident on the side of the photoconductive layer 4, the impedance of the photoconductive layer 4 decreases according to the intensity of the writing light 13, and the voltage applied to the liquid crystal / resin composite 19 increases. To do. When the intensity of the writing light 13 is sufficiently high, the long axes of the liquid crystal molecules are oriented in the direction of applying the electric field, so that the reading light 14 incident almost perpendicularly to the liquid crystal / resin composite 19 is contained in the liquid crystal 17. Thus, a refractive index almost the same as the ordinary refractive index of the liquid crystal 17 is given. At this time,
Since the ordinary light refractive index of the liquid crystal 17 and the refractive index of the transparent resin 18 are extremely close to each other, the reading light 14 is not scattered and the liquid crystal
After going straight through the resin composite 19 and being reflected by the dielectric multilayer film mirror 6, after going straight through the liquid crystal / resin composite 19 again,
Second transparent electrode 8, first antireflection film 9, second transparent substrate 1
0, the light passes through the second antireflection film 11 and is emitted to the outside of the inclined complex dielectric constant type spatial light modulator 1.

<< Example of Use of Inclined Complex Permittivity-Type Spatial Light Modulator >> As described above, the inclined complex dielectric constant-type spatial light modulator 1 according to the present invention changes the read light 14 according to the intensity of the write light 13. Since the light is scattered or goes straight, the inclined complex dielectric constant spatial light modulator 1, the lens 25, and the aperture 26 are combined as shown in FIG.
If the scattered light is blocked by the aperture 26, the writing light 13 including the image or the two-dimensional pattern to be wavelength-converted is incident on one surface side of the inclined complex dielectric constant type spatial light modulator 1 while the writing light 13 A read light 14 having a wavelength different from the wavelength is incident on the other surface side of the inclined complex dielectric constant type spatial light modulator 1 to read an image or a two-dimensional data pattern included in the write light 13. It can be converted to the wavelength of the light 14 and displayed with a high contrast ratio.

<< Prototype Example of Inclined Complex Permittivity-Type Spatial Light Modulator >> Next, as the photoconductive layer 4, a Bi film having a thickness of 0.25 mm was used.
_The thickness of the light absorption layer 5 is 1.3 using a ₁₂ SiO ₂₀ crystal plate.
A diamond-like carbon film having a thickness of 1.3 μm is used as the dielectric multilayer film mirror 6, and a multilayer film having a thickness of 1.3 μm in which 17 layers of TiO ₂ films and SiO ₂ films are alternately laminated is used. As the liquid crystal / resin composite 19 having the properties shown in Table 4, a nematic liquid crystal having the properties shown in Table 4 and a transparent resin precursor having the properties shown in Table 5 are mixed in a weight ratio of 1: 1 to form a composite film having a thickness of 10 μm. As the transparent electrode 3 and the second transparent electrode 8, a thickness of 0.05 μm in which 5% Sn is added to In ₂ O ₃
m ITO transparent electrode film, and further the first antireflection film 9
The MgF ₂ film is used as, C as a second anti-reflection film 11
A method of manufacturing the inclined complex dielectric constant spatial light modulator 1 using the eF ₃ film, the ZrO ₂ film, and the MgF ₂ film will be described in detail as an example.

[0119]

[Table 4]

[Table 5] First, a wafer having an appropriate thickness was cut out from a Bi ₁₂ SiO ₂₀ crystal, and this was optically polished to a thickness of 0.25 mm to form a photoconductive layer 4. The first transparent electrode 3 is formed by depositing an ITO transparent electrode having a thickness of 0.05 μm.

Next, plasma C using methane gas as a raw material
The thickness of the other surface of the Bi ₁₂ SiO ₂₀ crystal was measured by the VD method.
A diamond-like carbon film having a thickness of 3 μm is formed and used as the light absorption layer 5. The diamond-like carbon film obtained at this time is 0.0 with respect to light having a wavelength of 450 nm.
It shows a transmittance of 2% and its specific resistance is 2.2 × 10.
It was ⁸ Ωcm.

Next, by using the ion beam assist (IAD) method, Ti is deposited on the diamond-like carbon film.
17 layers of O ₂ films and SiO ₂ films are alternately laminated to form a dielectric multilayer mirror 6 having a thickness of 1.3 μm. In this case, the IAD method is a film forming method of irradiating a substrate on which a vapor-deposited film is formed with low-energy oxygen ions during electron beam evaporation, and forms a thin film having a high refractive index and a low light absorption property at a low temperature. be able to. Then, while the dielectric multi-layered film mirror 6 is being formed, the energy of the oxygen ion beam with which the substrate is irradiated is changed to control the specific resistance of the dielectric multi-layered film mirror 6 to obtain a desired value. Value.

As a result, in the layer of TiO ₂ film and the layer of SiO ₂ film which compose the dielectric multilayer mirror 6, the layer close to the light modulation layer 7 in absolute value of complex permittivity is close to the photoconductive layer 4. The specific resistance of each layer is controlled so as not to become larger than the absolute value of the complex dielectric constant of.

The dielectric multi-layered film mirror 6 obtained by the above-described method has a wavelength of 9 to 9 nm with respect to light having a wavelength of 500 to 590 nm.
It exhibits a high reflectance of 8% or more, and the frequency f of the driving voltage of the inclined complex dielectric constant type spatial light modulator 1 is 100 Hz.
At that time, it had the specific resistances shown in Tables 6 and 7 and the absolute values of the complex relative permittivity | ε _ZCT | and | ε _ZCS |. However, | ε _ZCT | is the absolute value of the TiO ₂ film forming the dielectric multilayer mirror 6, and | ε _ZCS | is the absolute value of the SiO ₂ film forming the dielectric multilayer mirror 6. The layer number is a number assigned to the 9-layer TiO ₂ film and the 8-layer SiO ₂ film, which are the constituent elements of the dielectric multilayer mirror 6, and is a liquid crystal / resin composite that constitutes the light modulation layer 7. the TiO ₂ film in contact with the 19 first layer, the SiO ₂ film in contact with the TiO ₂ film second layer, a TiO ₂ film in contact with the SiO ₂ film and so third layer further odd number TiO ₂ film And the SiO ₂ films are even numbered.

[0124]

[Table 6]

[Table 7] As shown in Tables 6 and 7, in the TiO ₂ film and the SiO ₂ film forming the dielectric multilayer film mirror 6, the larger the number attached to each layer, the larger the absolute value of the complex relative dielectric constant. In the layer inserted between the photoconductive layer 4 and the second transparent electrode 8 of the inclined complex dielectric constant type spatial light modulator 1 according to the present invention, the photoconductive layer 4 and the light modulating layer 7 are included. Among the layers that are constituent elements of the dielectric multilayer mirror 6 inserted between and, the two adjacent layers having different refractive indices and the complex permittivity closer to the light modulation layer 7 The complex permittivity of each layer constituting the dielectric multilayer film mirror 6 is set so that the absolute value of does not become larger than the absolute value of the complex permittivity closer to the photoconductive layer 4. " There is.

Then, a MgF ₂ film is formed on the side of the glass substrate to be the second transparent substrate 10 on which the light modulation layer 7 is laminated by an electron beam evaporation method to form a first antireflection film 9. , A CeF ₃ film, a ZrO ₂ film, and M on the other surface of the glass substrate by an electron beam evaporation method.
After forming a gF ₂ film and using it as the second antireflection film 11, 5% S in In ₂ O ₃ is formed on the first antireflection film 9.
An ITO layer having a thickness of 0.05 μm formed by adding n is formed and used as the second transparent electrode 8.

Next, a nematic liquid crystal having the characteristics shown in Table 4 and a transparent resin precursor having the characteristics shown in Table 5 were mixed in a weight ratio of 1: 1 and spacer balls having a diameter of 10 μm were added in an appropriate amount. A glass substrate (second transparent substrate 10) in which this mixed liquid is laminated with the dielectric multilayer film mirror 6, the first antireflection film 9, the second transparent electrode 8 and the second antireflection film 11 are laminated.
It is sandwiched between and a wavelength of 365nm, light intensity 20mW / c
Irradiated with m ² of ultraviolet rays, the thickness is 10 μm, and the specific resistance is 2 × 10.
A liquid crystal / resin composite 19 (light modulation layer 7) having a thickness of ¹⁰ Ωcm was formed to fabricate a tilted complex dielectric constant type spatial light modulation element 1.

<< Example of Image Characteristics of Inclined Complex Permittivity-Type Spatial Light Modulator >> The performance of the inclined complex dielectric constant-type spatial light modulator 1 according to the present invention produced by the above-described process and the conventional spatial light In order to compare the performance of the modulator, three spatial light modulators each were manufactured, and the performance of the inclined complex dielectric constant type spatial light modulator 1 according to the present invention and the conventional spatial light modulator were compared. The performance was evaluated.

The first group includes In ₂ O as the first transparent electrode 3.
An ITO film having a thickness of 0.05 μm in which 5% Sn is added to ₃ is used, and a Bi ₁₂ S film having a thickness of 0.25 mm is used as the photoconductive layer 4.
A light absorbing layer 5 having a thickness of 1.3 μm is formed using an iO ₂₀ crystal plate.
m, a diamond-like carbon film having a specific resistance of 2.2 × 10 ⁸ Ωcm, and IAD as the dielectric multilayer film mirror 6.
A nematic layer shown in Table 4 is used as a liquid crystal / resin composite 19 for the light modulation layer 7 by using a multilayer film having a thickness of 1.3 μm in which 17 layers of TiO ₂ films and SiO ₂ films produced by the method are alternately stacked. A liquid crystal / resin composite film having a thickness of 10 μm in which liquid crystal and the transparent resin precursor shown in Table 5 were mixed at a weight ratio of 1: 1 was used, and 5% Sn was added to In ₂ O ₃ as the second transparent electrode 8. Using the added ITO film with a thickness of 0.05 μm,
A space to be the gradient complex dielectric constant type spatial light modulator 1 according to the present invention, which uses the MgF ₂ film as the antireflection film 9 and the CeF ₃ film, the ZrO ₂ film and the MgF ₂ film as the second antireflection film 11. It is an optical modulator. In this case, this first
Each spatial light modulation element belonging to the group has the same configuration except that the specific resistance of the dielectric multilayer film mirror 6 is different for each element.

Then, the first, second, and
The nine layers of TiO ₂ film and the eight layers of SiO ₂ film forming the dielectric multilayer film mirror 6 of the third spatial light modulation element are as shown in Tables 6, 7, 8, 9 and 10, 11, respectively. , Various specific resistances and absolute values of complex relative permittivity ｜ ε _ZCT ｜ 、 ｜ ε
_ZCS | (value of f = 100 Hz) and. Where | ε _ZCT | is the absolute value of the complex relative permittivity of the TiO ₂ film (the layer having an odd number), and | ε _ZCS | is the absolute value of the complex relative permittivity of the SiO ₂ film (the layer having an even number). It is a value.

[0130]

[Table 8]

[Table 9]

[Table 10]

[Table 11] As is clear from these Tables 6, 7, 8, 9 and 10, 11, the spatial light modulator that is the inclined complex dielectric constant type spatial light modulator 1 according to the present invention has the light modulation layer 7. The TiO ₂ film closest to the liquid crystal / resin composite layer has the smallest absolute value of complex relative permittivity | ε _ZCT |, and the TiO ₂ film closest to the photoconductive layer 4 has the largest absolute value of complex relative permittivity. Manufactured to have | ε _ZCT |.

On the other hand, the spatial light modulators belonging to the second group are different from the spatial light modulators belonging to the first group only in the conventional spatial light modulators in which the electric characteristics of the dielectric multilayer film mirror 6 are different. Is.

[0132] That is, first belonging to the second group, the second, third spatial light dielectric multilayer TiO ₂ film of nine layers constituting the membrane mirror 6 and 8 layer SiO ₂ film of the modulation element, layer number The dielectric multilayer mirror 6 composed of these thin films has a specific resistance ρ _M as shown in Table 12.

[0133]

[Table 12] Then, these spatial light modulators were installed in the optical system 30 shown in FIG. 10 and the image characteristics thereof were measured.

In this optical system 30, the xenon lamp 31 is used.
The writing light source 33 composed of the reflecting mirror 32 and the writing light 13 generates the writing light 13, and the ultraviolet cut filter 34,
The writing light 1 is converted by the infrared cut filter 35 and the color filter 36 having a transmission band of 400 to 500 nm.
3 is converted into blue light, and the blue light is converted into parallel light rays by the lens 37, which is then irradiated on the resolution evaluation pattern 38, and the writing light transmitted through the resolution evaluation pattern 38 by the lens 39 (image (Including blue light) 13, voltage value of 80V (effective value) and 300H
An image is formed on the spatial light modulator for measurement to which a rectangular wave voltage (AC voltage) having a z repetition frequency is applied.

At this time, when the USAF1951 resolution chart is used as the resolution evaluation pattern 38 and an image is formed at the position of the spatial light modulator through the lens 39, 1
It was possible to recognize up to 00 lp / mm.

On the other hand, the xenon lamp 45 and the reflecting mirror 4
The reading light source 47 configured by 6 generates the reading light 14, and the reading light 14 is converted into green light by the ultraviolet cut filter 48, the infrared cut filter 49, and the color filter 50 having a transmission band of 500 to 590 nm. After the green light is condensed by the lens 51 and the optical path is changed by the reflecting mirror 52, the read light (green light) is emitted to the spatial light modulator by the lens 53.

Then, the lens 53 takes in the display light 15 from the spatial light modulator, and while condensing it, the aperture 54 cuts off the scattered light contained in the display light 15 to make a contrast of the display image. After the ratio is improved, it is enlarged and projected on the screen 56 by the lens 55 to have a diagonal length of 2 m.

When the resolution of each spatial light modulation element belonging to the first group and the resolution of each spatial light modulation element belonging to the second group were measured by the procedure described above, each spatial light modulation element of the first group was measured. Regarding the above, the resolution characteristics shown in Table 13 could be obtained, and the resolution characteristics shown in Table 12 could be obtained for each spatial light modulator of the second group.

[0139]

[Table 13] As is clear from Table 12 and Table 13, among the layers constituting the dielectric multilayer mirror 6 inserted between the photoconductive layer 4 and the light modulation layer 7, the refractive indexes different from each other. Light modulation layer 7 having two adjacent layers
, So that the absolute value of the complex permittivity closer to is not larger than the absolute value of the complex permittivity closer to the photoconductive layer 4,
The inclined complex dielectric constant type spatial light modulator 1 according to the present invention in which the complex dielectric constants of the respective layers forming the dielectric multilayer film mirror 6 are set exhibits high resolution, but complex relative dielectric constants other than this setting are shown. In the conventional spatial light modulator including the dielectric layer film mirror 6 having the absolute value of, the resolution is low.

[0140]

As described above, according to the present invention, in the first, second and third aspects, the resolution of the element itself is significantly improved, and the element itself and each optical system are increased in size without increasing in size. A high-definition image can be displayed, whereby a high-definition image can be achieved without increasing the size of the projection display or the image processing apparatus itself and without increasing the manufacturing cost. Further, in claims 4 to 13, the effects shown in claims 1, 2, and 3 can be obtained by the existing material by specifying each element constituting the element.

[Brief description of drawings]

FIG. 1 is a structural diagram showing a first embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention.

2 is a cross-sectional view showing an example of a liquid crystal / resin composite constituting the light modulation layer shown in FIG.

FIG. 3 is a cross-sectional view showing another example of a liquid crystal / resin composite which constitutes the light modulation layer shown in FIG.

FIG. 4 is a cross-sectional view showing another example of a liquid crystal / resin composite forming the light modulation layer shown in FIG.

FIG. 5 is a sectional view showing a second embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention.

FIG. 6 is a sectional view showing a third embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention.

FIG. 7 is a sectional view showing a fourth embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention.

FIG. 8 is a sectional view showing a fifth embodiment of a tilted complex dielectric constant type spatial light modulator according to the present invention.

FIG. 9 is a configuration diagram showing an example of use of the inclined complex dielectric constant type spatial light modulator according to the present invention.

FIG. 10 is a configuration diagram showing an optical system when measuring image characteristics of a spatial light modulation element having a plurality of absolute values of complex relative dielectric constants including a tilted complex dielectric constant type spatial light modulation element according to the present invention. .

FIG. 11 is a cross-sectional view showing an example of a conventionally known spatial light modulator.

[Explanation of symbols]

 1 Inclined Complex Permittivity-Type Spatial Light Modulator 2 First Transparent Substrate 3 First Transparent Electrode 4 Photoconductive Layer 5 Light Absorption Layer 6 Dielectric Multilayer Mirror 7 Light Modulation Layer 8 Second Transparent Electrode 9 First Antireflection Film 10 Second Transparent Substrate 11 Second Antireflection Film 12 AC Power Supply 13 Writing Light 14 Reading Light 15 Display Light 17 Liquid Crystal 18 Transparent Resin 19 Liquid Crystal / Resin Composite

Claims (13)

[Claims] 1. A first transparent electrode, a photoconductive layer, a light absorption layer, a dielectric multi-layer film mirror, a light modulation layer and a second transparent electrode, which are formed by laminating the first transparent electrode and the second transparent electrode. While repeatedly applying a voltage between the first transparent electrode and the second transparent electrode, the impedance of the photoconductive layer is changed to change the state of the light modulation layer based on the writing light incident from the first transparent electrode side. In the spatial light modulator in which the read light incident from the electrode side is two-dimensionally modulated by the light modulating layer and is reflected by the dielectric multilayer film mirror and emitted from the second transparent electrode side, the photoconductive layer Of the two layers that are adjacent to the light modulation layer and have different refractive indexes from each other, which are the constituent elements of the dielectric multilayer mirror that is inserted between the light modulation layer and the light modulation layer. The absolute value of complex permittivity is Than the absolute value of the closer complex permittivity of the conductive layer, so as not to increase,
A tilted complex dielectric constant type spatial light modulator which sets a complex dielectric constant of each layer constituting a dielectric multilayer film mirror. 2. A first transparent electrode, a photoconductive layer, a dielectric multi-layer film mirror, a light modulation layer and a second transparent electrode, which are formed by laminating, and between the first transparent electrode and the second transparent electrode. While applying a voltage repeatedly, the impedance of the photoconductive layer is changed based on the writing light incident from the first transparent electrode side to change the state of the light modulation layer, and the light is incident from the second transparent electrode side. In the spatial light modulator in which the read light thus read is two-dimensionally modulated by the light modulation layer and reflected by the dielectric multilayer mirror and emitted from the second transparent electrode side, the photoconductive layer and the light modulation layer are provided. Of the layers that are the constituent elements of the dielectric multilayer film mirror that is inserted between the two layers, the two adjacent layers having different refractive indexes and the complex dielectric constants of the two layers that are closer to the light modulation layer Absolute value in the photoconductive layer Than the absolute value of the stomach the way the complex dielectric constant of, so as not to become larger,
A tilted complex dielectric constant type spatial light modulator which sets a complex dielectric constant of each layer constituting a dielectric multilayer film mirror. 3. A first transparent electrode, a photoconductive layer, a dielectric multilayer mirror, a light modulation layer and a second transparent electrode, and at least two are provided between the photoconductive layer and the second transparent electrode. Based on the writing light incident from the first transparent electrode side, the transparent layer or the opaque layer described above is provided, and the voltage is repeatedly applied between the first transparent electrode and the second transparent electrode. Spatial light that changes the impedance of the photoconductive layer to change the state of the light modulation layer, two-dimensionally modulates the read light incident from the second transparent electrode side by the light modulation layer, and emits the read light. In the modulation element, of the layers that are constituent elements of the dielectric multilayer mirror inserted between the photoconductive layer and the light modulation layer, two layers that have different refractive indexes and are adjacent to each other , Complex dielectric closer to the light modulation layer Absolute value of, than the absolute value of the complex dielectric constant which is closer to the photoconductive layer, so as not to increase,
A tilted complex dielectric constant type spatial light modulator which sets a complex dielectric constant of each layer constituting a dielectric multilayer film mirror. 4. The tilted complex dielectric constant type spatial light modulator according to claim 1, wherein the light modulation layer is a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, these nematic liquid crystals, cholesteric liquid crystal. A tilted complex dielectric constant type spatial light modulator, characterized in that one or more liquid crystals selected from the group consisting of a mixture of liquid crystals and smectic liquid crystals are selected and used. 5. The tilted complex dielectric constant type spatial light modulator according to claim 1, wherein the light modulation layer is a nematic liquid crystal, a cholesteric liquid crystal, a smectic liquid crystal, these nematic liquid crystals, cholesteric liquid crystal. A resin having a refractive index equivalent to any one of ordinary liquid crystal refractive index, extraordinary light refractive index, and refractive index when the liquid crystal is randomly aligned, of any one or more liquid crystal of a group formed by a mixture of liquid crystal and smectic liquid crystal. One of a liquid crystal / resin composite in which the liquid crystal is dispersed therein, or a liquid crystal / resin composite in which the resin is dispersed in the liquid crystal is used. Modulation element. 6. The tilted complex dielectric constant type spatial light modulator according to claim 1, wherein the light modulation layer is LiNbO ₃ , LiTaO ₃ , or K.
DP, DKDP, ADP, KTP, KNbO ₃ , Sr _x
A tilted complex dielectric constant spatial light modulator characterized by using one or more electro-optic crystals selected from the group consisting of Ba _1-x Nb ₂ O ₆ , GaAs, InP, and GaP crystals. 7. The gradient complex dielectric constant type spatial light modulator according to claim 1, 2, or 3, wherein the photoconductive layer is made of silicon, germanium, or carbon. A tilted complex dielectric constant type spatial light modulator characterized by using an amorphous film composed of three or more elements. 8. The graded complex dielectric constant type spatial light modulator according to claim 1, wherein the photoconductive layer is an amorphous silicon film, a hydrogenated amorphous silicon film, or an amorphous silicon carbide. A film, a hydrogenated amorphous silicon carbide film, an amorphous selenium film, an amorphous SeAs film, an amorphous ZnS film, an amorphous CdS film, or an amorphous CdSe film is used, and at least one film is used. Inclined complex permittivity spatial light modulator. 9. The tilted complex dielectric constant type spatial light modulator according to claim 1, wherein the photoconductive layer is a GaAs crystal, a GaP crystal, or a Bi.
A tilted complex dielectric constant type spatial light modulator comprising one or more crystals selected from the group consisting of ₁₂ SiO ₂₀ crystals and Bi ₁₂ GeO ₂₀ crystals. 10. The inclined complex dielectric constant type spatial light modulator according to claim 1, wherein the photoconductive layer is a phthalocyanine pigment, an azo pigment, a polycyclic quinone pigment, Perylene pigments, perinone pigments, anthraquinone pigments, indigo pigments, thioindigo pigments, dioxazine pigments, azo lake pigments,
Thiapyrylium pigments, quinacridone pigments, cyanine pigments, pyrrole pigments, porphyrin pigments, antanton pigments, squarylium pigments, azurenium pigments,
A tilted complex dielectric constant spatial light modulator characterized by using a material in which ZnO, TiO, CdS or CdSe is dispersed in a resin. 11. The gradient complex dielectric constant type spatial light modulator according to claim 1, wherein the light absorption layer is substantially composed of a CdTe film, a diamond-like carbon film, silicon, carbon and germanium. An inclined complex dielectric constant type spatial light modulator comprising one or more films selected from the group consisting of amorphous films that are configured in a similar manner. 12. The tilted complex dielectric constant type spatial light modulator according to claim 1, wherein the light absorption layer is an inorganic pigment, an organic pigment, carbon,
A graded complex dielectric constant spatial light modulator comprising a resin composite in which one or more materials selected from the group consisting of dyes are dispersed in a resin. 13. The tilted complex dielectric constant type spatial light modulator according to claim 1, wherein the dielectric multilayer mirror is a SiO ₂ film or a TiO ₂ film.
Film, HfO ₂ film, Ta ₂ O ₅ film, ZnS film, Al ₂ O ₃
Film, Na ₂ AlF ₆ film, MgF ₂ film, LaF ₃ film, Gd
F ₃ film, SmF ₃ film, CeF ₃ film, ZrO ₂ film, CeO
Using a multilayer film formed by laminating two or more films selected from the group constituted by ₂ film, inclined complex dielectric constant spatial light modulator, characterized in that.