JPH086028A - Liquid crystal display device - Google Patents

Abstract

PURPOSE:To realize safe divided orientation and to eliminate deterioration of display performance, such as after-images by setting the pretilt angle in liquid crystal sections where spray type deformation takes place larger than the pretilt angle in the liquid crystal sections where deformation exclusive thereof takes place. CONSTITUTION:An oriented film 4 is formed by applying a polyimide on a glass substrate 1 formed with a tin oxide (ITS) film 23 and baking the coating. The oriented film 4 is partly protected by using a resist after first time of rubbing and is subjected to second time of rubbing and thereafter, the resist is peeled. At this time, a difference in the pretilt angle arises in the part coated with the resist and the part not coated with the resist. The pretilt angle near the substrate 1 subjected to a divided orientation treatment in the regions 5 where the spray type deformation associated with instability in terms of energy takes place among the liquid crystal sections varying in the orientation state is designed to be larger than the pretilt angle near the substrate in the regions 6 where the deformation exclusive of the spray type takes place by using the difference of the pretilt angles.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly to a liquid crystal display device having a plurality of regions on a substrate to obtain a wide-field display.

[0002]

2. Description of the Related Art A liquid crystal display element provided with a plurality of regions for the purpose of widening the viewing angle is disclosed in JP-A-57-18673.
5, JP-A-60-212142, JP-A-6
3-106624, JP-A-64-88520, JP-A-1-245223, and JP-A-5-203.
951 and the like. The gist is to divide one pixel into a plurality of regions and to define the alignment directions of the liquid crystal in different regions so as to complement each other in visual dependency. As a method of defining the alignment direction of the liquid crystal, there is a method of oblique vapor deposition of a silicon oxide film, a method of rubbing a thin film of a polyimide resin, and a method of rubbing a polyimide thin film is widely used because of the simplicity of the process. The polyimide resin used here is, for example, JP-A-61-479.
32, JP-A 61-174725, and SE-731 manufactured by Nissan Kagaku Co., Ltd.
There are AL1051 made by Japan Synthetic Rubber and the like.

In order to divide one pixel into a plurality of regions, it is necessary to change the rubbing direction within one pixel. A specific method for doing so is Japanese Patent Laid-Open No. Sho 60.
These are described in, for example, Japanese Patent Publication No. 211422 and Japanese Patent Application Laid-Open No. 5-203951. For example, JP-A-60-2114
In Japanese Patent Application Publication No. 22, the operation of protecting a part of the pixel with a photoresist layer after the first rubbing, performing the second rubbing, and peeling off the photoresist layer is repeated. Is divided into a plurality of regions. Further, in JP-A-5-173137 and JP-A-5-203951, one substrate is subjected to a division alignment treatment, and the other substrate is subjected to a uniform alignment treatment over the entire surface to perform a division alignment treatment. By making the pretilt angle of the other substrate almost equal to or more than the pretilt angle of the substrate subjected to uniform alignment treatment over the entire surface, the alignment of the liquid crystal layer in the substrate subjected to the divided alignment treatment is dominant. Therefore, it is described that the divisional alignment can be performed with a small number of steps.

[0004]

However, in the case of dividing orientation by such a method, if a cell is produced without paying attention to the combination of rubbing directions, one region becomes dominant and good dividing orientation is obtained. There was a problem that could not be obtained.

[0005] Even when the divided orientation is obtained, a disclination line is generated at the boundary between the divided orientations. In particular, when a voltage for driving the liquid crystal is applied, the disclination line moves. It was observed. This movement of the disclination line was observed as an afterimage, deteriorating the performance of the display element.

An object of the present invention is to provide a liquid crystal display device having a wide field of view, which realizes stable divisional alignment and eliminates a phenomenon such as an afterimage that deteriorates the display performance.

[0007]

According to the present invention, the pretilt angle in the vicinity of the substrate subjected to the split alignment treatment in the split liquid crystal section which undergoes a splay-type deformation which is more energetically unstable among the divided liquid crystal sections, A liquid crystal section having a smaller pretilt angle and having a smaller pretilt angle is located on the active element side where the electric field between the electrodes on the same substrate is weaker than the pretilt angle of the liquid crystal section that undergoes other deformation.

[0008]

When the split orientation is realized, the method disclosed in JP-A-60-2114 is used.
As disclosed in Japanese Unexamined Patent Application Publication No. 22-22, and Japanese Patent Application Laid-Open No. 5-203951, a PR process using a resist is used. 1
After the rubbing for the second time, a part of the alignment film is protected with a resist, and after rubbing for the second time, the resist is stripped with a stripping solution. At this time, usually, a difference occurs in the pretilt angle between the portion covered with the resist and the portion not covered with the resist. Utilizing this difference in pretilt angle, the pretilt angle in the vicinity of the substrate subjected to the split alignment treatment in the splay-type deformation region where the energies become unstable among the liquid crystal sections having different alignment states is changed to the splay type. It can be designed to be larger than the pretilt angle near the substrate in a region where deformation other than deformation occurs.

For example, if one pixel is divided into two regions by rubbing in which directions differ by 180 ° to constitute a liquid crystal display element utilizing the twisted nematic (TN) effect, these two regions are energetically stable. There is a region where the normal TN deformation is performed and a region where the spray type TN deformation is unstable in terms of energy. At this time, it is possible to freely design which region has a larger pretilt angle depending on a combination of rubbing directions when cells are assembled. Therefore, if the pretilt angle in the vicinity of the substrate 1 that has been subjected to the split orientation processing is made larger in the region where the splay-type TN deformation that is unstable in terms of energy is performed, than in the region where the normal TN deformation is performed, the division is performed. Increases the stability of
The disclination lines are stronger and will be fixed at the boundaries of the split orientation process. In contrast, the usual T
If the pretilt angle near the substrate in the area where the N deformation is performed is larger than the pretilt angle in the area where the splay type TN deformation is performed, the disclination line is not sufficiently fixed, and the actual drive is performed. When this is done, the disclination line moves due to the influence of the horizontal electric field, which adversely affects the display. Also, many segments cannot be split orientation. Further, since the liquid crystal section having a small pretilt angle is susceptible to the lateral electric field, the width between the scanning electrode line and the pixel electrode is wide and the lateral electric field, that is, the electric field between the electrodes on the same substrate is weak. Next, a liquid crystal section having a small pretilt angle is positioned. With this structure, the divided orientation exists more stably.

Here, for the sake of explanation, an example in which the image is divided into two regions has been described, but the same can be said even if the number of regions is increased. Although the difference in pretilt angle between the portion covered with the resist on the alignment film and the portion not covered with the resist is used, different types of alignment films may be used.
Further, in the above example, rubbing of the polyimide alignment film was used to obtain different pretilt angles, but silicon oxide (SiO, SiO _x , Si) partially covered with resist was used.
An oblique vapor deposition method of an inorganic material such as O ₂ ) may be used.

Further, in the above description, only the pretilt angle in the vicinity of the substrate which has been subjected to the division alignment treatment has been described. The pretilt angle in the vicinity of the substrate that has been subjected to uniform alignment treatment over the entire surface is
Although not particularly specified, from the viewpoint of stability, it is preferable that the pre-tilt angle is smaller than at least the larger pre-tilt angle near the substrate subjected to the split alignment treatment.

[0012]

EXAMPLES The present invention will be described in detail below with reference to examples.

Embodiment 1 FIG. 2 shows an outline of a split orientation process. After washing the glass substrate on which tin oxide (ITO) was formed, polyimide (K-100 manufactured by Toray Industries, Inc.) that gives a high pretilt angle was spin-coated and baked at 200 ° C. for 1 hour. After performing the first rubbing using the rubbing apparatus (Fig. 2 (a)), a resist (manufactured by Tokyo Ohka Kogyo Co., Ltd.)
(Trade name: OFPR-800C) was spin-coated to a thickness of 1 μm and baked at 85 ° C. for 30 minutes (FIG. 2 (b)).
Figure). Using a 500 μm square checkered mask, exposure and development were performed, rinsed with pure water, and then dried at 75 ° C. for 20 minutes. When the pattern was observed using an optical microscope, a resist pattern of 500 μm square was formed in a checkered pattern (FIG. 2C).

Next, rubbing was performed using a rubbing device in a direction opposite to the first rubbing (FIG. 2D).
To remove the resist, the substrate was treated with ethyl lactate for 2 minutes, rinsed with pure water, and dried at 110 ° C. for 30 minutes to obtain a main substrate (FIG. 2E).

After cleaning a glass substrate on which ITO was formed as a counter substrate, a polyimide (AL-1051, manufactured by Japan Synthetic Rubber Co., Ltd.) which gives a low pretilt angle was spin-coated to give 20.
It was baked at 0 ° C. for 1 hour.

The two substrates thus produced were bonded to each other with an adhesive via a spherical spacer so that the gap was 6 μm and the rubbing directions were perpendicular to each other. A normal nematic liquid crystal in which the left chiral material was dissolved was injected into this cell, and the injection port was sealed. At this time, the orientation of the portion where the resist remains after the resist patterning becomes the splay type TN orientation, and the orientation of the portion where the resist does not remain is the normal T orientation.
A rubbing direction was adjusted so as to be N-aligned to prepare a cell.

[0017] A ± 3 V cycle of 16.7 msec is applied to the fabricated cell.
A rectangular wave of c was applied and the alignment state of the liquid crystal was observed with a polarization microscope. As a result, good split orientation was confirmed.

Next, the pretilt angles of the portion where the resist of polyimide (K-100) giving a high pretilt angle was left and the portion where the resist was not left were set so as to be exactly the same conditions as in the case where the above TN cell was manufactured. Next, an anti-parallel cell was prepared under each condition, and the measurement was performed by a crystal rotation method. As a result, the pretilt angle of the part where the resist remained was 5.5 °, and the pretilt angle of the part where the resist did not remain was 1 °. In addition, polyimide (AL-105) which gives a low pretilt angle
The pretilt angle of 1) was measured under the same conditions as those for forming the TN cell, by preparing an anti-parallel cell and using the crystal rotation method. As a result, the pretilt angle was determined to be 1 °.

(Comparative Example 1) In the same manner as in Example 1, only the rubbing direction on the counter substrate side was reversed, and the orientation of the portion where the resist remained after resist patterning became the normal TN orientation. A cell was prepared so that the rubbing direction was aligned so that the orientation of the portion where the particles did not remain was the splay type TN orientation. ± 3 on the fabricated cell
A rectangular wave having a V period of 16.7 msec was applied, and the alignment state of the liquid crystal was observed with a polarizing microscope. As a result, regions having a divided orientation were formed, but one region was narrowed, and good divided orientation could not be achieved.

Example 2 An experiment was performed in exactly the same manner as in Example 1, except that only the alignment film providing a low pretilt angle on the opposite side was changed to RN-1006 manufactured by Nissan Chemical Industries, Ltd. As a result, good split orientation was confirmed. In addition, this RN-
The pretilt angle of 1006 was determined to be 3 ° when an antiparallel cell was prepared by the same method as in Example 1 and measured by the crystal rotation method.

(Comparative Example 2) In the same manner as in Example 2, only the rubbing direction on the counter substrate side was reversed, and the orientation of the portion where the resist remained after resist patterning became the normal TN orientation. A cell was prepared so that the rubbing direction was aligned so that the orientation of the portion where the particles did not remain was the splay type TN orientation. ± 3 on the fabricated cell
A rectangular wave having a V period of 16.7 msec was applied, and the alignment state of the liquid crystal was observed with a polarizing microscope. As a result, a region with split orientation was formed, but the domain collapsed with the passage of time, and stable split orientation was not possible.

Example 3 An experiment was conducted in the same manner as in Example 1, except that the alignment film giving a high pretilt angle and the firing temperature thereof were changed to RN-715 manufactured by Nissan Chemical Co., Ltd. and 250 ° C. As a result, good split orientation was confirmed. Incidentally, the pretilt angle of this RN-715 was measured by the crystal rotation method in exactly the same manner as in Example 1. As a result, the pretilt angle of the portion where the resist remained was 12 °, and the pretilt angle of the portion where the resist remained was 9 °.

Example 4 An experiment was conducted in exactly the same manner as in Example 1, except that only the alignment film giving a high pretilt angle and the firing temperature were changed to 250 ° C. with LC-102 manufactured by Hitachi Chemical Co., Ltd. As a result, good split orientation was confirmed. In addition, the pretilt angle of this LC-102 was measured by the crystal rotation method in exactly the same manner as in Example 1. As a result, the pretilt angle of the portion where the resist remained was 3 °, and the pretilt angle of the portion where the resist did not remain was 2 °.

(Embodiment 5) In the same manner as in Embodiment 1, an alignment film giving a high pretilt angle (LC-20 manufactured by Hitachi Chemical Co., Ltd.)
When the baking temperature was changed to 01) and the baking temperature was set to 250 ° C., the pretilt angles of the portion where the resist remained and the portion where the resist did not remain were measured. As a result, the pretilt angle of the portion where the resist remained was determined to be 5 °, and the pretilt angle of the portion where the resist did not remain was determined to be 6 °.

In the same manner as in Example 1, the alignment film giving a high pretilt angle and the firing temperature thereof were LC-20 manufactured by Hitachi Chemical.
01 and 250 ° C, and change the rubbing direction,
The rubbing direction was adjusted to form a cell such that the orientation of the portion where the resist remained after the resist patterning became the normal TN orientation, and the orientation of the portion where the resist did not remain became the spray type TN orientation. ±
A rectangular wave having a 3V cycle of 16.7 msec was applied, and the alignment state of the liquid crystal was observed with a polarization microscope. As a result, good split orientation was confirmed.

Example 6 Next, the combination of the above-mentioned alignment films was applied to a TFT substrate and a color filter substrate.

The TFT substrate is the same as a normal TFT substrate except that a light-shielding film having a width of 12 μm for shielding disclination is provided at the center of a pixel. TFT
A polyimide alignment film (K- that gives a high pretilt angle to the substrate
100) was applied with an alignment film (AL-1051) that gives a low pretilt angle to the color filter side. In the same manner as in Example 1, a division alignment process was performed so that the division boundary was located at the center of the pixel, and a cell was produced. At this time, the rubbing direction was adjusted so that the orientation of the portion where the resist remained after the resist patterning became the splay-type TN orientation and the orientation of the portion where the resist did not remain became the normal TN orientation, and a panel was produced. When the panel thus formed was driven, no phenomenon such as an afterimage was observed. Further, when the panel was observed using a magnifying glass, no disclination was observed, and it was found that the panel was hidden within the range of the light-shielding film.

(Comparative Example 3) In exactly the same manner as in Example 6, only the rubbing direction was changed, and the orientation of the portion where the resist remained was the normal TN orientation, and the orientation of the portion where the resist did not remain changed to the normal TN orientation. A rubbing direction was adjusted so that a splay-type TN orientation was obtained to produce a panel. When the panel thus produced was driven, a phenomenon such as an afterimage caused by disclination was observed, and it was found that the display performance was deteriorated.

(Example 7) In exactly the same manner as in Example 6, only the orientation film providing a high pretilt angle and the firing temperature
Exactly the same experiment was performed, changing to N-715 and 250 ° C. As a result, no phenomenon such as an afterimage was observed.

(Comparative Example 4) In exactly the same manner as in Example 7, only the rubbing direction was changed, and the orientation of the portion where the resist remained was the normal TN orientation, and the orientation of the portion where the resist was not remained was changed. A rubbing direction was adjusted so that a splay-type TN orientation was obtained to produce a panel. When the panel thus produced was driven, a phenomenon such as an afterimage caused by disclination was observed, and it was found that the display performance was deteriorated.

(Embodiment 8) In exactly the same manner as in Embodiment 6, the orientation film for providing a high pretilt angle and the firing temperature were set to LC
-2001, changed to 250 ° C., and changed the rubbing direction so that the orientation of the portion where the resist remained was the spray type TN orientation, and the orientation of the portion where the resist was not remained was the normal TN orientation. The rubbing direction was adjusted to prepare a panel, and the same experiment was performed. As a result, no phenomenon such as an afterimage was observed.

(Comparative Example 5) In the same manner as in Example 8, only the rubbing direction was changed, and the orientation of the portion where the resist remained was the normal TN orientation, and the orientation of the portion where the resist did not remain was changed. A panel was prepared so that the rubbing directions were aligned so as to have a splay type TN orientation. When the panel thus produced was driven, a phenomenon such as an afterimage caused by disclination was observed, and it was found that the display performance was deteriorated.

Examples and comparative examples in which the electric field and the liquid crystal orientation in the substrate with the thin film transistor array are examined are described below.

(Embodiment 9) FIG. 4 shows a schematic view of mask positions during exposure. Further, FIG. 3 shows a schematic view of the thin film transistor array used in this example. In this embodiment, a thin film transistor 14 made of amorphous silicon is used as an active element, and the size of one unit pixel is 300 mm vertically.
μm and 100 μm in width. The scanning electrode lines 15 and the signal electrode lines 16 are made of chromium (Cr) formed by a sputtering method.
Was used to set the line width to 10 μm. In addition, a width of 1 is used to block the disclination in the center of the pixel using chromium.
A 2 μm light-shielding film 11 was provided. Silicon nitride (SiNx) was used for the gate insulating film. The pixel electrode 13 was formed by a sputtering method using indium tin oxide (ITO) which is a transparent electrode. The glass substrate on which the thin film transistors 14 were formed in an array in this manner was used as the first substrate 17.
Further, a transparent electrode 19 made of ITO is formed on the second substrate 18 on the opposite side, color filters 12 are further formed in an array by a dyeing method, and a protective layer made of silica is provided on the upper surface thereof. .

After cleaning the first substrate, a split orientation treatment was performed in the same manner as in Example 1. However, in the exposure / development, a 150 μm wide stripe mask was used, and the mask was exposed and developed from the light shielding portion 11 to the scanning electrode line as shown in FIG. At the mask position in FIG.
As will be shown later on the measurement data of the pretilt angle, the pretilt angle of the portion where the resist remains after being masked is higher than the pretilt angle of the portion where the resist does not remain because the mask is not masked.

After washing the second substrate having the color filter formed thereon, a polyimide (AL-1051, manufactured by Japan Synthetic Rubber Co., Ltd.) which gives a low pretilt angle was spin-coated in the same manner as in Example 1, and the coating was performed at 200 ° C. for 1 hour. Burned for hours.

The two substrates thus produced were bonded together with an adhesive through a spacer made of spherical silica particles so that the gap was 5.5 μm and the rubbing directions were perpendicular to each other. A panel was prepared.
A nematic liquid crystal having a normal positive dielectric anisotropy in which the left chiral material was dissolved was injected into this cell, and the injection port was sealed. At this time, the first substrate and the second substrate are arranged so that the orientation of the portion where the resist remains after the resist patterning becomes the splay type TN orientation and the orientation of the portion where the resist does not remain becomes the normal TN orientation. A rubbing direction was adjusted to produce a liquid crystal display device. When the manufactured liquid crystal display device was driven, a favorable display without a phenomenon such as image sticking was obtained. Furthermore, when observed using a microscope, no disclination was observed in transmitted light observation, while on the other hand, reflected light observation revealed that the disclination was fixed within the range of the light shielding portion. Was.

FIG. 5 is a schematic view of the liquid crystal alignment on the substrate surface at this time as a cross-sectional view taken along the line CC 'in FIG.

(Comparative Example 6) In the same manner as in Example 9, only the rubbing direction of the second substrate on the color filter side was reversed, and after the resist patterning, the orientation of the portion where the resist remained was normal. A liquid crystal display device was produced by aligning the rubbing directions so that the TN alignment was obtained and the alignment of the portion where no resist remained was the spray type TN alignment. When the manufactured liquid crystal display device was driven, many phenomena such as burn-in occurred. When observing the alignment state of the liquid crystal with a microscope, there were some pixels in which divided and aligned regions were formed, but in many pixels one region was narrowed, or the pixels were not divided at all and the disclination was also predetermined. I couldn't control the position. FIG. 6 shows a schematic diagram of the liquid crystal alignment on the substrate surface at this time. Unlike FIG. 5 of Example 9, the pretilt angle on the divided alignment treated substrate in the liquid crystal section undergoing splay type deformation is lower than the pretilt angle in the section subject to other deformation.

(Comparative Example 7) The same method as that of Example 9 was adopted, except that the mask position on the first substrate was reversed as shown in FIG. 7, and the rubbing direction on the color filter side was also reversed. An example in a liquid crystal display device will be described. In the configuration of this comparative example, as shown in FIG. 8, the orientation of the portion where the resist remained after the resist patterning became the splay type TN orientation, and the orientation of the portion where the resist did not remain was the normal T orientation.
Although the liquid crystal becomes N-oriented, the liquid crystal section having the lower pretilt angle is located in the direction where the lateral electric field is stronger. When the manufactured liquid crystal display device was driven, phenomena such as burn-in occurred. Observation of the orientation direction of the liquid crystal with a microscope revealed that a divided and oriented region was formed, but the disclination could not be controlled to a predetermined position, and it was protruding from the light shielding portion.

Example 10 An experiment was conducted in exactly the same manner as in Example 9 except that only the alignment film giving a low pretilt angle on the opposite side was changed to RN-1006 manufactured by Nissan Chemical Industries, Ltd. As a result, a good display without a phenomenon such as image sticking was obtained.

(Comparative Example 8) In exactly the same manner as in Example 10, only the rubbing direction on the counter substrate side was reversed, and the orientation of the portion where the resist remained after resist patterning became the normal TN orientation. The rubbing direction was adjusted so that the orientation of the portion where no was left was the spray type TN orientation, to produce a liquid crystal display device. When the produced liquid crystal display device was driven, many burn-in images were observed. As a result of observing the alignment state of the liquid crystal with a microscope, regions with divided alignment were formed, but the domains collapsed over time, and stable divided alignment could not be achieved.

Example 11 An experiment was carried out in exactly the same manner as in Example 9 except that only the alignment film giving a high pretilt angle and its baking temperature were changed to 250 ° C. with RN-715 manufactured by Nissan Chemical Industries, Ltd. As a result, a good display without a phenomenon such as image sticking was obtained.

Example 12 An experiment was performed in exactly the same manner as in Example 9 except that only the alignment film giving a high pretilt angle and the firing temperature were changed to 250 ° C. with LC-102 manufactured by Hitachi Chemical Co., Ltd. As a result, a good display without a phenomenon such as image sticking was obtained.

(Embodiment 13) In the same manner as in Embodiment 9,
Alignment film giving high pretilt angle (LC-2 manufactured by Hitachi Chemical Co., Ltd.
001), the baking temperature was changed to 250 ° C., and the rubbing direction was changed so that the orientation of the portion where the resist remained after the resist patterning became the normal TN orientation, and the orientation of the portion where the resist did not remain changed to the normal TN orientation. Spray type TN
A rubbing direction was adjusted so that the liquid crystal display device was aligned. When the manufactured liquid crystal display device was driven, good display without image sticking was confirmed.

Example 14 An experiment was conducted on a structure in which the pixel on the substrate on the side of the thin film transistor had a storage capacitance with the same configuration as in Example 9 except for the alignment film and the rubbing direction.
The structure of the thin film transistor array used is shown in FIG.
FIG. 10 shows a mask position at the time of exposure / development, and FIG. 11 shows a schematic view of liquid crystal alignment. Even in the structure having the storage capacitor portion as described above, good display was obtained in the manufactured liquid crystal display device.

[0047]

As described above, the pretilt angle in the vicinity of the substrate subjected to the split orientation treatment in the splay type TN deformation region is made larger than the pretilt angle in the vicinity of the substrate in the normal TN deformation region. It can be seen that a stable split orientation can be obtained. Furthermore, it can be seen that stable division alignment can be obtained by positioning the liquid crystal section having a small pretilt angle on the side of the active element where the lateral electric field is weak. Therefore, according to the present invention, stable split alignment can be obtained even when split alignment treatment is performed by a method with a small number of steps in order to manufacture a liquid crystal display element having a wide viewing angle.

[Brief description of drawings]

FIG. 1 is a conceptual diagram illustrating a configuration of a liquid crystal display device of the present invention.

FIGS. 2A and 2B are cross-sectional views showing a process of split orientation, in which (a) first rubbing, (b) photoresist coating, (c) photoresist exposure and development, (d) second (reverse) rubbing, (E) is a diagram showing photoresist stripping.

FIG. 3 is a plan view showing a thin film transistor array according to the embodiment of the present invention.

FIG. 4 is a schematic diagram showing a mask position at the time of division alignment in an embodiment of the present invention.

FIG. 5 is a cross-sectional view taken along the line CC ′ of FIG. 4 showing a schematic view of the liquid crystal alignment in the example of the present invention.

FIG. 6 is a cross-sectional view showing a schematic view of liquid crystal alignment in a comparative example of the present invention.

FIG. 7 is a schematic diagram showing a mask position at the time of division alignment in a comparative example of the present invention.

FIG. 8 is a cross-sectional view showing a schematic view of liquid crystal alignment in a comparative example of the present invention.

FIG. 9 is a plan view showing a thin film transistor array having a storage capacitor according to an embodiment of the present invention.

FIG. 10 is a schematic diagram showing mask positions at the time of division alignment in the example of the present invention.

FIG. 11 is a cross-sectional view taken along the line DD ′ of FIG. 10 showing a schematic view of the liquid crystal alignment in the example of the present invention.

[Explanation of symbols]

 1 Substrate subjected to orientation treatment 2 Glass substrate on the opposite side 3 Active element 4 Polyimide orientation film 5 Area subject to splay type deformation 6 Area subject to deformation other than splay type 7 Photoresist 8 Storage capacitor portion 9, 10 Alignment film 11 Division Light-shielding part at boundary 12 Color filter 13 Pixel electrode 14 Thin film transistor 15 Scan electrode line 16 Signal electrode line 17 First substrate 18 Second substrate 19, 20 Transparent electrode 21, 22 Glass substrate 23 ITO film

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Setsuo Kaneko 5-7-1 Shiba, Minato-ku, Tokyo NEC Corporation

Claims (4)

[Claims] 1. One of a pair of electrodes constituting one pixel is subjected to different alignment treatments to divide into two parts, and the other substrate is subjected to a certain alignment treatment to be divided. In a liquid crystal display device having a liquid crystal section with a different alignment state in each part, the pretilt angle in the vicinity of the substrate subjected to the split alignment process is in the liquid crystal section undergoing splay type deformation, and in the liquid crystal section undergoing other deformation, A liquid crystal display device, characterized in that the liquid crystal display device is designed to be larger than the pretilt angle. 2. The liquid crystal display device according to claim 1, wherein a liquid crystal section having a small pretilt angle on the substrate subjected to the division alignment treatment is present on the active element side of the pixel. 3. A liquid crystal display device according to claim 1, wherein one liquid crystal section has a twisted nematic orientation, and the other liquid crystal section has a splayed twisted nematic orientation. 4. A light-shielding film is provided on a boundary of divided orientations of a substrate subjected to divided orientation treatment.
The liquid crystal display device according to item 1.