JPH085824A - Production of color filter - Google Patents

Abstract

PURPOSE:To provide a production method of a color filter having good smoothness in which reflection of light from a light-shielding part is small. CONSTITUTION:A dyeable transparent resin layer 2 is formed on a transparent substrate 1. A photoresist layer 3 is formed on the transparent resin layer 2 and selectively exposed to light and developed to form a resist pattern 3' on the area corresponding to the part between pixels. Then the transparent resin layer 2 only in the area 2a corresponding to the pixel part is treated to prevent dyeing with using the resist pattern 3' as a mask. Then the resist pattern 3' is removed and the transparent resin layer 2 in the area 2b corresponding to the part between pixels where the dye-preventing treatment is not applied is dyed into black to obtain a light-shielding part. Then transparent color layers 4R, 4G, 4B of three colors are formed to form the pattern in the area corresponding to the pixel part.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent coloring layer provided in a pattern on a pixel portion on a transparent substrate for coloring transmitted light of the pixel portion for each color, and a gap between each pixel on the transparent substrate. The present invention relates to a method for manufacturing a color filter including a light-shielding portion that is provided in a pattern in a portion (inter-pixel portion) and blocks light transmission from this portion. In particular, light reflection from the light-shielding portion is small and smoothness is good. The present invention relates to a method for manufacturing a color filter.

[0002]

2. Description of the Related Art In a liquid crystal display device, a liquid crystal material is sealed between a front substrate and a rear substrate, and a voltage is applied to a transparent electrode provided on each of the front substrate and the rear substrate to drive the liquid crystal substance. It is a display device that displays a screen by controlling transmission / non-transmission of light rays. When performing color display with this liquid crystal display device, a color filter for coloring the transmitted light into each color is applied as the front substrate or the rear substrate.

This type of color filter generally has a structure as shown in FIG. That is, in FIG. 3, reference numeral 10 denotes a transparent substrate such as a glass substrate, and a transparent colored layer 12 is provided in a pattern on pixel portions on the transparent substrate 10. The transparent colored layer 12 is for coloring the transmitted light transmitted through the pixel portion for each color, and is generally the three primary colors of light: red, green and blue (depending on the purpose, red, green and blue may be complementary colors). ) Three colored transparent layers 12R, 12G, and 12B are provided for each pixel.

Further, since the transmitted light from the gap between pixels (inter-pixel portion) becomes ambient light and reduces the contrast of the screen, a light-shielding portion 11 for blocking ambient light is provided in the inter-pixel portion. Has been. Then, the transparent colored layer 1
In order to ensure the positional accuracy of 2R, 12G, 12B and the light shielding portion 11, the transparent colored layers 12R, 12G, 12B are formed wider than the pixels.
In the boundary portion between the G and 12B and the light shielding portion 11, both are configured to overlap each other.

When the color filter is applied to the front substrate or the rear substrate of the liquid crystal display device,
In order to make the gap between the front substrate and the rear substrate uniform over the entire surface and stabilize the driving of the liquid crystal material, the transparent resin layer 13 is provided on the entire surface of the transparent colored layer 12 to smooth the surface. .

[0006]

By the way, in this type of color filter, a thin film of vacuum-deposited metallic chromium, a resin in which a black pigment is dispersed, or the like is used as the light-shielding portion 11. Among these, the metal chrome thin film is excellent as the light-shielding portion in that it has excellent light-shielding properties, but since it is formed by the vacuum deposition method, the manufacturing cost is high and the light reflectance is as high as 50 to 60%. Therefore, there is a problem in that the display screen produces reflected light, which rather lowers the contrast. Although a thin film having a two-layer structure of chromium oxide / metal chromium has been developed to reduce the reflectance, the reflectance is at most 10 even if the manufacturing process is increased and a chromium oxide thin film is added.
It only reduced it to%.

On the other hand, the resin in which the black pigment is dispersed is excellent in that the manufacturing cost is low and the light reflectance is small, but the film thickness is 1.2 in order to improve the light shielding property.
It was necessary to set it to μm or more. Therefore, the light shielding unit 1
1 and the transparent colored layers 12R, 12G, and 12B overlap each other, the total film thickness becomes large to form a protrusion,
A convex portion 14 (see FIG. 3) based on the above-mentioned protrusion is also formed on the surface of the transparent resin layer 13 provided thereon. In addition, the height of the convex portion 14 may reach about 0.8 μm, and as a result, the gap between the front substrate and the rear substrate becomes non-uniform, and the liquid crystal material cannot be stably driven. Was.

The present invention has been made in view of the above conventional problems, and an object of the present invention is to provide a method of manufacturing a color filter having a small light reflection from a light shielding portion and a good smoothness. To do.

[0009]

In order to achieve the above object, the present invention provides a transparent colored layer which is provided in a pattern on a pixel portion of a transparent substrate and colors transmitted light of the pixel portion for each color. A method for producing a color filter, comprising: a transparent portion, which is provided in a pattern between gaps between pixels on a transparent substrate (inter-pixel portion) and has a light-shielding portion that blocks light transmission from this portion, wherein the transparent substrate is dyeable. A transparent resin layer is formed, a photoresist layer is formed on the transparent resin layer at a portion corresponding to the inter-pixel portion, and then only the portion corresponding to the pixel portion of the transparent resin layer is formed using the photoresist layer as a mask. Is subjected to a stain-proofing treatment, and then the photoresist layer is peeled off. Then, a portion of the transparent resin layer corresponding to an inter-pixel portion not subjected to the stain-proofing treatment is dyed black to form the light-shielding portion, and then the pixel is formed. Part It is characterized in that the portions corresponding to forming the transparent colored layer in a pattern.

Further, according to the present invention, a transparent colored layer which is provided in a pattern on a pixel portion on a transparent substrate and colors transmitted light of the pixel portion for each color, and a gap portion between each pixel on the transparent substrate ( In a method for manufacturing a color filter provided with a pattern in an inter-pixel portion) and a light-shielding portion that blocks light transmission from this portion, the transparent colored layer is formed in a pattern in the pixel portion on the transparent substrate, Then, a dyeable transparent resin layer is formed on the entire surface including the transparent colored layer, a photoresist layer is formed on a portion of the transparent resin layer corresponding to the inter-pixel portion, and then the photoresist layer is used as a mask. Only the portion corresponding to the pixel portion of the transparent resin layer is subjected to a stain-proofing treatment, and then the photoresist layer is peeled off, and then the portion corresponding to the portion of the transparent resin layer not subjected to the stain-proofing treatment between pixels is blackened. It is characterized by forming the light shielding unit and a color.

[0011]

According to the present invention, a dyeable transparent resin layer is formed on the entire surface of the transparent substrate or on the entire surface of the transparent substrate including the transparent colored layer, and the portion corresponding to the inter-pixel portion on the transparent resin layer is formed. Only the portion corresponding to the pixel portion of the transparent resin layer is subjected to the stain-proofing treatment by using the photoresist layer formed on the mask as a mask, and then the portion corresponding to the non-contamination-treated portion of the transparent resin layer which is not subjected to the stain-proofing treatment is black. The light-shielding portion is formed by dyeing. That is, a pattern of a smooth light-shielding portion is formed on the transparent substrate or on the transparent colored layer on the transparent substrate, and the transparent colored layer is formed in the opening (pixel portion). Therefore, the light reflection from the light-shielding portion can be significantly reduced as compared with the conventional color filter in which the light-shielding portion is made of a chromium thin film. Moreover,
Since there is no step between the light-shielding portion and the pixel portion, even if a transparent colored layer is formed on the pixel portion, the surface has high smoothness, and as a result, a high quality color filter can be obtained.

Further, since only the portion corresponding to the pixel portion of the transparent resin layer is subjected to the dye-proof treatment in advance, there is no bleeding even if the portion corresponding to the inter-pixel portion of the transparent resin layer is strongly dyed with black. Moreover, a good pattern of the light-shielding portion having a high light-shielding density is formed, and as a result, a high-quality color filter can be obtained.

[0013]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below with reference to the accompanying drawings.

FIG. 1 is a sectional view showing a manufacturing process of a color filter according to an embodiment of the present invention.

Reference numeral 1 is a transparent substrate such as a glass substrate. First, a transparent and easily dyeable transparent resin material such as acrylic resin, gelatin, casein, polyvinyl alcohol (PVA) is spin-coated on the transparent substrate 1. Is uniformly applied and dried to form the transparent resin layer 2 (see FIG. 1A). The transparent resin contains a light irradiation or thermosetting agent, and the applied transparent resin layer 2 is cured by light irradiation or heating. The thickness of the transparent resin layer 2 varies depending on the dyeability of the material and the required light-shielding density, but is generally 1 to
About 2 μm is suitable.

Next, a positive photoresist (for example, OFP manufactured by Tokyo Ohka Kogyo Co., Ltd .: OFP) is formed on the transparent resin layer 2.
R etc.) is uniformly applied by a spin coater and dried to form a photoresist layer 3 having a thickness of about 1 μm (see FIG. 1B). A positive type photoresist is considered to be particularly preferable because it can be easily peeled later. However, a negative type photoresist can be used as long as it can be peeled. Therefore, the photoresist used in the present invention is a positive type. Whether it is a negative type or a negative type is not particularly limited.

Next, by mask exposure, the portions corresponding to the pixel portions of the positive photoresist layer 3 are selectively exposed (in the case of a negative photoresist layer, the portions corresponding to the inter-pixel portions are selectively exposed. By exposing) and developing with a predetermined developing solution, a resist pattern 3 ′ from which the photoresist in the portion corresponding to the pixel portion is removed is formed (see FIG. 1C).

Next, the transparent substrate 1 having the transparent resin layer 2 and the resist pattern 3'formed thereon is dipped in a tannic acid solution at 70 ° C. for 1 minute, and then dipped in a tartar solution at 70 ° C. for 1 minute. By doing so, the resist pattern 3 '
Using the mask as a mask, only the portion 2a corresponding to the pixel portion of the transparent resin layer 2 is subjected to the stain-proofing treatment (see FIG. 1D).

Next, after the transparent substrate 1 is immersed in an organic solvent such as methyl ethyl ketone to remove the resist pattern 3 '(see FIG. 1 (e)), the transparent resin layer 2 is subjected to a stain-proofing treatment. A light-shielding portion is formed by dyeing a portion 2b corresponding to a non-pixel portion which is not covered with black with black (see FIG. 1 (f)). As the black dye for dyeing the portion 2b corresponding to the inter-pixel portion of the transparent resin layer 2 in black, for example, Diacild Milling Bl
ack GL (manufactured by Mitsubishi Kasei Co., Ltd.) or the like is used for dyeing by dipping in a 1% solution containing 0.5% acetic acid at 65 ° C. for 5 minutes. Portion 2 corresponding to the pixel portion of transparent resin layer 2
Since a is subjected to the stain-proofing treatment as described above, even if the portion 2b corresponding to the inter-pixel portion is dyed a little excessively, it does not bleed, and a good light-shielding pattern having a high light-shielding density can be obtained.

After dyeing, the dye is fixed by immersing it in a tannic acid solution at 70 ° C. for 1 minute, and then by immersing it in a tartar solution at 70 ° C. for 1 minute to fix the dye. After the fixing / fixing treatment, heat treatment is performed at about 200 ° C. for 1 hour.

Next, as shown in FIG. 1 (g), a transparent colored layer 4, specifically, for example, red, green and blue is formed on a portion corresponding to a pixel portion on the transparent substrate 1 on which the light shielding portion is formed. The three colored transparent colored layers 4R, 4G, and 4B are formed. The three-color transparent colored layers 4R, 4G, 4B can be formed in the following manner by, for example, a dyeing method.

That is, first, a photosensitive resin coating in which gelatin is sensitized to gelatin is uniformly applied on the entire surface of the transparent substrate 1 on which the light shielding portion is formed by a spin coater and dried to form a gelatin photosensitive film. The red pattern of the first color is exposed and developed by the mask exposure method. After development, the remaining patterned gelatin film is dyed with a red dye solution, then washed with water, the dye is fixed with an aqueous tannic acid solution, and then the dye is fixed with an aqueous tartar solution. A red transparent colored layer 4R is formed. As the material of the photosensitive resin, low molecular weight gelatin, glue, casein, polyvinyl alcohol, synthetic polyacrylamide resin, etc. can be used in addition to gelatin.

Next, the same steps as above are repeated for the second green color and the third blue color,
A green transparent colored layer 4G and a blue transparent colored layer 4B are sequentially formed to produce a color filter as shown in FIG. 1 (g).

In addition to the above dyeing method, the transparent colored layer may be formed by applying a photosensitive resin in which a color pigment is dispersed to the entire surface, exposing it in a pixel pattern and developing it. Yes (pigment dispersion method). An acrylic resin or the like can be used as the photosensitive resin.

It is also possible to form a pattern by printing a printing ink in which a color pigment is dispersed on the above-mentioned pixel portion (printing method).

An unillustrated overcoat layer and transparent electrode layer can be further formed on the entire surface including the transparent colored layer 4 thus formed.

A thermosetting acrylic resin or the like can be used as the overcoat layer.

The transparent electrode layer is composed of, for example, indium oxide (93% by weight) and tin oxide (7% by weight).
It can be formed by forming a transparent conductive film of TO by a vacuum deposition method, a sputtering method, or the like.

FIG. 2 is a sectional view showing a manufacturing process according to another embodiment of the present invention. The same parts as those in FIG. 1 are designated by the same reference numerals.

In the above-mentioned embodiment, the smooth light-shielding portion was formed on the transparent substrate, and the transparent colored layer was formed thereon. In this embodiment, the transparent colored layer was formed on the transparent substrate, and the smooth colored layer was formed thereon. A light shielding part is formed.

That is, first, as shown in FIG. 2A, the transparent colored layer 4 of three colors is formed on the transparent substrate 1 by the above-described method.
R, 4G and 4B are formed.

Next, the dyeable transparent resin layer 2 is formed on the entire surface including the transparent colored layers 4R, 4G and 4B (FIG. 2).
(B)).

Next, a photoresist layer 3 similar to the one described above is formed on the transparent resin layer 2, and the photoresist layer 3 is selectively exposed by mask exposure and developed to develop a photo of a portion corresponding to a pixel portion. A resist pattern 3'with the resist removed is formed (see FIGS. 2C and 2D).

Next, the transparent substrate 1 on which the transparent colored layer 4, the transparent resin layer 2 and the resist pattern 3'are formed,
In the same manner as described above, the tannic acid solution and then the tartar solution are respectively dipped to carry out the stain-proofing treatment only on the portions 2a corresponding to the pixel portions of the transparent resin layer 2 using the resist pattern 3 ′ as a mask. Perform (see FIG. 2 (e)).

Next, after the resist pattern 3'is peeled off and removed, a portion 2b of the transparent resin layer 2 corresponding to an inter-pixel portion which has not been subjected to a stain-proof treatment is dyed black to form a light-shielding portion. (See FIGS. 2 (f) and 2 (g)). This dyeing method is exactly the same as that in the above-mentioned embodiment.

After dyeing, the dye is fixed and fixed, and then heat treated.

In this way, a color filter as shown in FIG. 2 (g) is completed. In addition, as described above, an overcoat layer and a transparent electrode layer (not shown) can be formed thereon.

[0038]

As described above in detail, according to the present invention, a dyeable transparent resin layer is formed on the entire surface of the transparent substrate or on the entire surface of the transparent substrate including the transparent colored layer, and the transparent resin layer is formed. Only the portion corresponding to the pixel portion of the transparent resin layer is subjected to a stain-proofing treatment using the photoresist layer formed in the portion corresponding to the inter-pixel portion on the resin layer as a mask, and then the transparent resin layer is subjected to the stain-proofing treatment. Since the light-shielding portion is formed by dyeing a portion corresponding to a non-pixel portion which is not colored black, a smooth light-shielding portion pattern is formed on the transparent substrate or on the transparent colored layer on the transparent substrate. A transparent colored layer is formed in the opening (pixel portion). Therefore, as compared with the conventional color filter in which the light-shielding portion is made of a chromium thin film, light reflection from the light-shielding portion can be significantly reduced, and there is no step between the light-shielding portion and the pixel portion. Even if a transparent colored layer is formed on the surface, the smoothness of the surface is high, and as a result, a high quality color filter can be obtained, which is an excellent effect.

Further, according to the present invention, since only the portion corresponding to the pixel portion of the transparent resin layer is subjected to the dye-proof treatment in advance, the portion corresponding to the inter-pixel portion of the transparent resin layer is strongly dyed black. Even if there is no bleeding, a good pattern of the light-shielding portion with high light-shielding density is formed, and as a result,
It also has an excellent effect of obtaining a high quality color filter.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing a manufacturing process of a color filter according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view showing a manufacturing process of a color filter according to another embodiment of the present invention.

FIG. 3 is a cross-sectional view of a conventional color filter.

[Explanation of symbols]

 1 Transparent Substrate 2 Dyeable Transparent Resin Layer 2a Pixel Part 2b Inter-Pixel Part (Light Shielding Part) 3 Photoresist Layer 3'Resist Pattern 4 Transparent Colored Layer 4R Red Transparent Colored Layer 4G Green Transparent Colored Layer 4B Blue Transparent Colored Layer 10 Transparent substrate 11 Light-shielding portion 12 Transparent colored layer 13 Transparent resin layer 14 Convex portion

Claims (2)

[Claims] 1. A transparent colored layer provided in a pattern on a pixel portion on a transparent substrate for coloring transmitted light of the pixel portion for each color, and a gap portion (inter-pixel portion) between each pixel on the transparent substrate. In a method for manufacturing a color filter, which is provided in a pattern with a light-shielding portion which blocks light transmission from this portion, a dyeable transparent resin layer is formed on the transparent substrate, and the dyeable transparent resin layer is formed on the transparent resin layer. After forming a photoresist layer on the portion corresponding to the inter-pixel portion, then using the photoresist layer as a mask, only the portion corresponding to the pixel portion of the transparent resin layer is subjected to a stain-proofing treatment, and then after peeling off the photoresist layer , The portion of the transparent resin layer corresponding to an inter-pixel portion that is not subjected to a dye-proof treatment is dyed black to form the light-shielding portion, and then the transparent colored layer is formed in a pattern on the portion corresponding to the pixel portion. You A method for producing a color filter, comprising: 2. A transparent coloring layer which is provided in a pattern on a pixel portion on a transparent substrate and which colors transmitted light of this pixel portion for each color, and a gap (inter-pixel portion) between each pixel on the transparent substrate. In the method for producing a color filter, which comprises a light-shielding portion which is provided in a pattern in a pattern and which blocks light transmission from this portion, the transparent colored layer is formed in a pattern in a pixel portion on the transparent substrate, and the transparent coloring is then performed. A dyeable transparent resin layer is formed on the entire surface including the layer, and a photoresist layer is formed on a portion of the transparent resin layer corresponding to the inter-pixel portion,
Then, using the photoresist layer as a mask, only the portion corresponding to the pixel portion of the transparent resin layer is subjected to a stain-proof treatment, and then the photoresist layer is peeled off, and then the transparent resin layer is not subjected to the stain-proof treatment. A method for manufacturing a color filter, which comprises forming a light shielding portion by dyeing a portion corresponding to a portion in black.