JPH0844077A - Method for processing photosensitive planographic printing plate, device therefor and its cleaning agent - Google Patents

Abstract

PURPOSE:To provide a method for processing a photosensitive planographic printing plate, the device therefor and its cleaning agent by which a waste cleaning soln. is substantially eliminated, and a precipitate is not formed in a processing soln. CONSTITUTION:Plural cleaning tanks 30 of multistage countercurrent system are used to clean a photosensitive planographic printing plate. A cleaning soln. added with a chelating agent is supplied from the rear cleaning tank among the tanks 30 in the traveling direction of the printing plate, the cleaning soln. in the front cleaning tank in the traveling direction of the printing plate is supplied as dilution water or dissolving water to the developing stage to be replenished with concd. developer prior to the cleaning stage. The printing plate is processed in this way.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for processing a photosensitive lithographic printing plate which substantially eliminates waste cleaning liquid and suppresses the generation of precipitates in the processing liquid, and a cleaning agent therefor.

[0002]

2. Description of the Related Art Conventionally, for obtaining a printing plate precursor from a photosensitive lithographic printing plate, the photosensitive lithographic printing plate is imagewise exposed, then developed with a developing solution, washed with water, and then a rinse solution containing a surfactant and the like. It is generally known that the method of treating with a plate surface protective agent. The related art and its problems will be described below.

First, in the processing of the photosensitive lithographic printing plate,
As a method to prevent the occurrence of precipitates in the tank inside the device, it is possible to use a chelating agent in the developer to prevent the occurrence of hydroxide precipitates due to calcium, magnesium ions, etc. entering from water. Are known. A commercially available developer contains a chelating agent. When the photosensitive lithographic printing plate continues to be processed and the developer replenisher continues to be replenished, if a precipitate accumulates at the bottom of the tank, the precipitate is washed out and replaced with a new solution on a regular basis. There is.

However, even if the chelating agent is contained in the developing solution, the precipitate is accumulated when it is used for a long time, the precipitate is washed away, and the maintenance of the processing apparatus is troublesome such as replacement with a new solution.

Further, as a dissolving water or a diluting water in the developing step, there is a technique utilizing an overflow solution in a multi-step counter-current washing step as a next step, as disclosed in Japanese Patent Laid-Open Nos. 55-25027 and 63. -167366 publication.

However, comparing the case where water (tap water) is used as the diluting water and the case where the overflow liquid is used as the diluting water, it has been found that the latter case has more sediment accumulation. .

If the washing process is a multi-stage countercurrent system,
A technique has been disclosed in which cleaning can be performed with a small amount of cleaning liquid, and the cleaning waste liquid is reused by using the cleaning waste liquid as dilution water or dissolution water for the developing liquid. For example, the washing step is a multi-step countercurrent method, and the washing is performed so that the pH of the washing tank is from 10.5 to 12.5 (JP-A-63-172269), and the rinse step after the developing step is multi-step. As a countercurrent system, there is a method in which a plurality of tanks are provided and the first rinse tank has a pH of 10 to 13, and the final rinse tank has a rinse solution of pH 3 to 9 supplied from the rear (JP-A-63-172270).

However, if the washing process is a multi-stage countercurrent method, the washing efficiency is improved and the washing water does not need to be scooped, but the washing water is likely to accumulate. In particular, when the processing amount of the photosensitive lithographic printing plate is small, the processing liquid is retained for a long period of time. On the other hand, it was found that when the components eluted from the photosensitive lithographic printing plate mixed in the wash water were retained, a precipitate was generated. Also,
It was found that there is no problem in the finishing performance of the photosensitive lithographic printing plate on the same day, but the finishing sensitivity of the photosensitive lithographic printing plate varies even in a short period of time.

[0009]

SUMMARY OF THE INVENTION The present invention has been made to solve at least one of the above problems, and the main object of the present invention is to substantially eliminate the cleaning waste liquid and to prevent the precipitation of the treatment liquid. It is an object of the present invention to provide a method for treating a photosensitive lithographic printing plate which suppresses the generation of a toner, a treatment apparatus and a cleaning agent therefor.

[0010]

The above object can be achieved by the following means. That is, (1) the washing step of the photosensitive lithographic printing plate is a multi-stage countercurrent type washing bath, and a washing liquid containing a chelating agent is washed backward in the conveying direction of the photosensitive lithographic printing plates in the washing baths. Supplied from the tank as a dilution water or dissolved water to the developing step of supplying the concentrated developing replenisher solution in the front step of the cleaning step with the cleaning solution of the front cleaning tank in front of the conveying direction of the photosensitive lithographic printing plate. A method for treating a photosensitive lithographic printing plate, which comprises treating the photosensitive lithographic printing plate.

(2) The washing step of the photosensitive lithographic printing plate is performed by using a multi-stage countercurrent type washing tank, and the water used as the washing liquid for the photosensitive lithographic printing plate is treated with a cation exchange resin and an anion exchange resin in advance. , Treated with an electrodialyzer divided by cation exchange membranes and anion exchange membranes alternately and treated with at least one of reverse osmosis membranes to make pure water, and to wash the cleaning liquid in the front washing tank in front of the plurality of washing tanks. A method for treating a photosensitive lithographic printing plate, which comprises treating the photosensitive lithographic printing plate by supplying it as dilution water or dissolved water in a developing process of supplying a concentrated developing replenisher solution in a step prior to the washing step. .

(3) As the evaporation correction of the developing solution in the developing step of the photosensitive lithographic printing plate, at least one cleaning water in a plurality of cleaning tanks in the cleaning step is supplied and corrected ( The method for processing a photosensitive lithographic printing plate as described in 1) or (2).

(4) After developing the photosensitive lithographic printing plate with an alkaline developing solution, the photosensitive lithographic printing plate is treated in a washing step of a plurality of washing tanks supplied with an alkaline washing replenishing solution in a subsequent step to treat the photosensitive lithographic printing plate. A method for treating a photosensitive lithographic printing plate characterized by the above.

(5) A cleaning replenisher is supplied to a rear cleaning tank behind the photosensitive lithographic printing plates in the plurality of cleaning tanks, and an overflow solution of the cleaning solution is sequentially supplied in the photosensitive lithographic printing plate transfer direction. On the other hand, the method for treating a photosensitive lithographic printing plate as described in (4) is characterized in that the treatment is performed in a washing tank in front of the lithographic printing plate.

(6) When the replenishing solution for each step of the rinsing step or the desensitizing step after the washing step of the photosensitive lithographic printing plate is mixed with the alkaline washing replenishing solution in the same amount. The method for treating a photosensitive lithographic printing plate as described in (4) or (5), which has an acidic buffer having a pH of 6.0 or less.

(7) When the developing solution in the alkaline developing step is completely renewed with a new developing solution, the washing solution in the washing step is replaced with water at the same time to process the photosensitive lithographic printing plate. The method for processing a photosensitive lithographic printing plate according to any one of (4) to (6).

(8) The cleaning replenisher used in the cleaning step of the processing apparatus for processing the photosensitive lithographic printing plate has a pH of 9 to 14, and the additive concentration is an aqueous solution having a concentration of 0.01 to 30 g / liter. A cleaning agent for a photosensitive lithographic printing plate, which is characterized in that

(9) The cleaning agent for a photosensitive lithographic printing plate as described in (8), characterized in that the additive contains a chelating agent.

(10) In a photosensitive lithographic printing plate processing apparatus using a multi-stage countercurrent type washing tank as a washing step after the developing step, the washing liquid temperature is adjusted in at least one of the washing tanks. A photosensitive lithographic printing plate processing apparatus comprising a cleaning liquid temperature control means.

(11) In a photosensitive lithographic printing plate processing apparatus using a multi-stage countercurrent type washing tank as a washing step after the developing step, the washing liquid temperature is adjusted in at least one of the washing tanks. A processing apparatus for a photosensitive lithographic printing plate, comprising: a cleaning liquid temperature adjusting means; and a filter filtering means for filtering the cleaning liquid.

(12) In a photosensitive lithographic printing plate processing apparatus having a multi-stage countercurrent type washing tank as a washing step after the developing step, with respect to the conveying direction of the photosensitive lithographic printing plate in the washing step. Cleaning liquid replenishing means for replenishing the rear cleaning tank with cleaning liquid, liquid level detecting means for detecting the liquid level of the cleaning liquid in the front cleaning tank in the cleaning step, and forced discharging means for forcibly discharging the cleaning liquid in the front cleaning tank. And a photosensitive lithographic printing plate processing apparatus.

(13) A photosensitive lithographic printing plate is prepared by providing a cleaning process after the developing process to adjust the temperature of the cleaning liquid in the cleaning process for treating the photosensitive lithographic printing plate within the range of 30 ° C to 50 ° C. A method for treating a photosensitive lithographic printing plate, characterized in that the treatment is carried out.

(14) A photosensitive lithographic printing plate is prepared by providing a cleaning step after the developing step, and adjusting the liquid temperature of the cleaning liquid in the cleaning step for treating the photosensitive lithographic printing plate within the range of 1 ° C to 20 ° C. A method for treating a photosensitive lithographic printing plate, comprising:

Here, the photosensitive lithographic printing plate means a lithographic printing plate having photosensitivity, and the photosensitive layer whose solubility is changed by light irradiation is an aluminum plate, a zinc plate, an iron plate, a paper plate,
It is applied on a substrate such as a plastic plate in an amount of about 5 to 0.1 g / m ² , and is also called a PS plate.

Further, the multi-stage countercurrent system means that the processing tank (particularly the cleaning tank) is divided into a plurality of tanks, and the processing tank is located at the rear of the conveying direction (proceeding direction) for processing the photosensitive lithographic printing plate by the processing apparatus. The processing solution is supplied to the first processing tank, the overflow solution is placed in the front processing tank, and the overflow solution in the processing tank is placed in the previous processing tank. Similarly, it is a system in which the processing liquid is flown, in other words, a system in which the direction in which the processing liquid is conveyed for processing the photosensitive lithographic printing plate and the direction in which the processing liquid overflows and flows in each processing tank are opposite directions. The overflow liquid from the frontmost treatment tank is drained, and the treatment liquid is preferably supplied from the last treatment tank. Further, the overflow liquid may be sent by a pump or the like when the liquid in each processing tank reaches a predetermined amount or more.

The finisher process is a finishing process such as a rinsing process or a desensitizing process.

The pure water has a conductivity of preferably 5 μS · cm or less, more preferably 2 μS · cm or less.

The electrodialysis treatment means that the anode and the cathode are alternately partitioned by a cation exchange membrane and an anion exchange membrane and electrolyzed to separate into demineralized water and concentrated salt water. Use only demineralized water. The ion exchange membrane is NEOSEPTA manufactured by Tokuyama Soda Co., Ltd., SELEMION manufactured by Asahi Kasei Co., Ltd., Asahi Kasei
ACIPLEX Co., Ltd., DuPont NAFIRON, Tosoh Co., Ltd. TROS
FLEX and the like are commercially available, and as the electrodialysis treatment device, one commercially available from the above manufacturer can be used.

Further, the treatment with the cation exchange resin and the anion exchange resin is a multi-bed system or a mixed-bed system in which columns (resins and the like) are separately provided for the treatment. The treatment with the ion exchange resin of the present invention is the same as the generally known pure water production method. Also,
The cation exchange resin is a three-dimensional structure having a sulfonic acid group or a carboxylic acid group as a substituent as a substituent, and the three-dimensional structure includes styrene and divinylbenzene copolymer, acrylic acid, or methacrylic acid and divinylbenzene copolymer. A polymer is typical. The anion exchange resin is a three-dimensional structure having 1 to 3 amine groups and quaternary ammonium groups as substituents as a substituent, and the three-dimensional structure is styrene / divinylbenzene copolymer, acrylic acid, or methacrylic acid. A typical example is divinylbenzene copolymer. The method of use is described, for example, in Ion Exchange Resin Manuals [1] and [2] issued by Mitsubishi Kasei. As the ion exchange resin, those commercially available as DIAION manufactured by Mitsubishi Kasei Co., Ltd., Amberlite manufactured by Rohm and Haas Co., and UNICEREX manufactured by Unitika Ltd. can be used.

The reverse osmosis membrane treatment is a treatment by a membrane separation technique in which only water is filtered by applying water pressure to a porous membrane having pores of 0.1 to 1.0 nm and a salt does not pass, and the membrane module is spiral. Type, hollow type, tubular type,
There is a flat type.

The membrane material is a cross-linked wholly aromatic polyamide type, a linear wholly aromatic polyamide type, a cross-linked acrylic-alkyl polyamide / polyurea type, a cross-linked polypiperazine amide type,
Cellulose acetate type, cellulose triacetate type, cross-linked polyether type, polyacrylonitrile type, polybenzimidazole type, sulfonated polysulfone type, Toray Co., Ltd.,
Nippon Denko Co., Ltd., DuPont, Toyobo Co., Ltd., Sumitomo Chemical
Materials or commercially available reverse osmosis membrane modules from Teijin Limited or the like can be used.

The chelating agent is preferably a chelating agent having a pH value of 13.0 to 14.0 and having a stability capable of sequestering calcium ions and magnesium ions, and having an ability not to generate calcium hydroxide and magnesium hydroxide. Examples of preferred chelating agents include ethylenediaminetetraacetic acid, dieletylentriaminepentaacetic acid, aminocarboxylic acid type chelating agents such as diaminopropanoltetraacetic acid, ethylenediaminetetrakis-methylenesulfonic acid, nitrilotris-
It is an aminophosphonic acid type chelating agent such as methylenephosphonic acid. Another preferred chelating agent is pH 11
There is a chelating agent capable of sequestering aluminum ions at -13 and does not produce aluminum hydroxide, and preferable examples of the chelating agent are catechol-3,5-disulfonic acid and sulfosalicylic acid.

It is most preferable to use a chelating agent which sequesters calcium ions and magnesium ions and a chelating agent which sequesters aluminum ions together.
There is no problem in supplying the chelating agent as a salt of a cation such as an alkali metal ion or ammonia.

The replenishing means is preferably a metering pump such as a bellows pump, and it is preferable to separately supply water and a concentrated detergent. In this case, the evaporation correction only supplies water.

Further, a fixed pump such as a bellows pump is preferably used as the means for forcibly discharging the cleaning liquid, and it is usually introduced into a waste liquid tank, but it can also be introduced into a developer tank and used as dissolved water for development.

The cleaning liquid temperature adjusting means is provided with a temperature detecting sensor in the liquid, and heating means such as a heater and / or cooling means such as a cooler (heat pump using refrigerant, electronic cooler, etc.) in the liquid. The heating or cooling means is controlled by the detected temperature.

Further, as the filter filtration means, it is preferable to use a nonwoven fabric, a sintered filter, a sponge, a lock material (random fiber aggregate), a net or a cotton-like material as the filter material, and the material is preferably an alkali resistant plastic material. ,
The shape is preferably a plate or a cylinder. The installation is carried out in the treatment tank or on the liquid surface with the liquid flow of the liquid circulation system or the circulation piping system, or P
When the S plate is transported in the air and the liquid is supplied to the PS plate, PS
It is possible to install a filter at a position where the liquid drops from the plate or on the PS plate so that the liquid that has passed through the filter drops to the PS plate.

Further, a developing solution, a developing method, a rinse treatment,
The desensitizing treatment will be described below.

The developing solution used for the treatment of such a PS plate may be variously changed depending on the kind of the photosensitive composition used for the PS plate, but preferably the developing solution is at least one of an alkali agent and an organic solvent. It contains one.

Examples of alkali agents include silicates such as sodium silicate, potassium silicate, lithium silicate and sodium metasilicate, as well as sodium hydroxide, potassium hydroxide, lithium hydroxide, ammonium hydroxide and tertiary phosphoric acid. Inorganic alkalis such as sodium, dibasic sodium phosphate, tribasic potassium phosphate, dibasic potassium phosphate, tribasic ammonium phosphate, dibasic ammonium phosphate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc. Agent, mono, di, or triethanolamine, mono, di, or trimethylamine, mono, di, or diisopropylamine, n-butylamine, mono,
Examples thereof include organic amine compounds such as di- or triisopropanolamine, ethyleneimine, and ethylenediimine, and silicates are preferable. The amount of silicate in the developer is generally about 1-10 based on the total weight of the developer.
More preferably 1 to 8% by weight, most preferably 2% by weight.
~ 6% by weight.

The PS plate used in the present invention has a photosensitive layer whose solubility is changed by irradiation with light of 5 to 0.1 g / m ² on a substrate such as an aluminum plate, a zinc plate, an iron plate, a paper plate and a plastic plate.
It has been applied. Examples of the photosensitive layer include a photosensitive layer composed of (1) diazonium salt compound, (2) orthoquinonediazide compound, (3) azide compound, (4) photopolymer compound and (5) photopolymerizable compound.

As a developer for the PS plate having the photosensitive layer of the above (1), there are disclosed JP-A-51-77401, JP-A-51-80228, JP-A-53-44202 and JP-A-55-52054. No. 3-38647
JP-A-3-41454, JP-A-57-192952, JP-A-2-25
As disclosed in each of the 6053 publications, wired solvents having low solubility in water, alkali agents, anionic surfactants (aromatic sulfonic acid, dialkylsulfosuccinate, naphthalenealkylsulfonate, naphthol ethylene oxide) A weakly alkaline aqueous solution containing a sulfuric acid ester salt of an adduct, a branched alkyl sulfuric acid ester salt, etc.), a reducing compound such as an alkali metal sulfite, if necessary, and water is preferable.

Further, as a developing solution for the PS plate having the photosensitive layer of the above (2), there are disclosed in JP-A-54-62004 and JP-A-55-22759.
An aqueous solution of sodium silicate or potassium silicate as described in JP-A No. 55-115045 and JP-A No. 57-54938 is preferably used. The pH value is generally in the range of 10 to 14, and pH is 12.5 to 13.5 for the negative type only.
10 to 11, and pH of 12.5 to 13.3 is common for both negative and positive.

As a method of developing a PS plate imagewise exposed with a developing solution, various conventionally known methods can be used. Specifically, a method of immersing the image-exposed PS plate in a developer, a method of ejecting the developer from a large number of nozzles onto the photosensitive layer of the PS plate, a PS plate wetted with the developer is used. The method of wiping the photosensitive layer of, the method of roller-coating the developing solution on the surface of the photosensitive layer of the PS plate, and the like. Further, after the developing solution is applied to the photosensitive layer of the PS plate in this manner, the surface of the photosensitive layer can be lightly rubbed with a brush or the like. The developing conditions can be appropriately selected according to the developing method. As an example, in the developing method by immersion, for example, a method of immersing in a developing solution at about 10 to 35 ° C. for about 5 to 80 seconds is selected.

Further, as described above, the lithographic printing plate obtained by subjecting the PS plate to imagewise exposure and development and then washing with an alkali is treated with a rinse liquid containing a surfactant or a desensitizing treatment liquid. Examples of the surfactant contained in such a rinse liquid include polyoxyethylene alkyl ethers, polyoxyethylene alkylphenyl ethers, polyoxyethylene polystyryl phenyl ethers, polyoxyethylene phenyl ethers, and polyoxyethylene polyoxy. Propylene alkyl ether, glycerin fatty acid partial ester, sorbitan fatty acid partial ester, pentaerythritol fatty acid partial ester, propylene glycol monofatty acid ester, sucrose fatty acid partial ester, polyoxyethylene sorbitan fatty acid partial ester, polyoxyethylene sorbitol fatty acid partial ester , Polyethylene glycol fatty acid esters, polyglycerin fatty acid partial esters, polyoxyethylenated castor oil, polyoxy Nonionic surfactants such as ethylene glycol partial aliphatic esters, fatty acid diethanolamides, N, N-bis-2-hydroxyalkylamines, polyoxyethylenealkylamines, triethanolamine fatty acid esters, trialkylamineoxy , Fatty acid salts, abiethylene acid salts, hydroxyalkanesulfonic acid salts, alkanesulfonic acid salts, dialkylsulfosuccinic acid ester salts, linear alkylbenzenesulfonic acid salts, branched chain alkylbenzenesulfonic acid salts, alkylnaphthalenesulfonic acid salts, alkylphenoxypolyoxy Ethylene propyl sulfonates, polyoxyethylene alkyl sulfophenyl ether salts, N-methyl-N-oleyl taurine sodium salt, N
-Alkylsulfosuccinic acid monoamide disodium salts, petroleum sulfonates, sulfated castor oil, sulfated cattle leg oil, sulfate ester salts of fatty acid alkyl esters, alkyl sulfate ester salts, polyoxyethylene alkyl ether sulfate ester salts, fatty acid monoglyceride sulfate Ester salts, polyoxyethylene alkyl phenyl ether sulfate ester salts, polyoxyethylene styryl phenyl ether salt ester salts, alkyl phosphate ester salts, polyoxyethylene alkyl ether phosphate esters, polyoxyethylene alkyl phenyl ether phosphate ester salts, Styrene-maleic anhydride copolymer partially saponified products, olefin-maleic anhydride copolymer partially saponified products, naphthalene sulfonate formalin condensates, etc. Nonionic surfactants, alkylamine salts, quaternary ammonium salts, polyoxyethylene alkylamine salts, cationic surfactants such as polyethylene polyamine derivatives, carboxypetanes, aminocarboxylic acids, sulfopetines, aminosulfates , Amphoteric surfactants such as imidazolines. Among the above-mentioned surfactants, those with polyoxyethylene can be read as polyoxyalkylenes such as polyoxymethylene, polyoxypropylene, and polyoxybutylene, and those surfactants are also included, The same applies to the following description.

The above-mentioned surfactants can be used alone or in combination of two or more, and the amount of about 0.
001% to about 10%, more preferably 0.01%
Used in the range of 5 to 5% by weight.

The rinse solution in the present invention, that is, the pH of the aqueous solution containing a surfactant is preferably 1 to 12. In order to adjust the pH of the aqueous solution, it is preferable to add one or both of an acid and a water-soluble salt as a buffer. Thereby, when the aqueous solution is applied to the lithographic printing plate, the developer components remaining on the plate are neutralized, and the non-image area becomes more hydrophilic. Details of the buffering agent are described in, for example, “Chemical Handbook Basic Edition II”, edited by The Chemical Society of Japan, 5th edition, February 20, 1972, published by Maruzen Co., Ltd., pages 1312 to 1320, and these are applied as they are. be able to. Suitable acids and water-soluble salts include inorganic acids such as molybdic acid, boric acid, nitric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, acetic acid, oxalic acid, tartaric acid, benzoic acid, succinic acid, citric acid, malic acid, lactic acid, Examples thereof include water-soluble organic acids such as p-toluenesulfonic acid and salts thereof. More preferred salts are water-soluble alkali metal salts and ammonium salts, particularly preferred are molybdates such as ammonium molybdate, phosphates such as sodium phosphate, potassium tetrapolyphosphate, polyphosphates such as sodium trimetaphosphate, Sodium oxalate and other oxalates, potassium tartrate and other tartrate salts, sodium succinate and other succinates, ammonium citrate and other succinates. These acids and water-soluble salts can be used alone or in combination of two or more.

Further, the rinsing solution in the present invention further comprises an antiseptic such as sorbic acid and ethyl p-oxybenzoate, an antifungal agent, propyl gallate, 2,6-di-t-butyl-4-ethylphenol, An antioxidant such as 2,6-di-t-butyl-4-methylphenol may be included. Preservatives, antifungal agents, and antioxidants as these preservatives can be added in small amounts to prevent deterioration and the like due to storage of the aqueous solution, but the preferable addition amount is 0.001 to 5% by weight. is there.

The rinse liquid of the present invention preferably contains a lipophilic substance. This allows
Not only the image area of the lithographic printing plate becomes more oil-sensitive and development ink buildup becomes easier, but when the plate surface protective agent treatment is carried out after the treatment with the aqueous solution, the image area The decrease can be strongly suppressed. Preferred lipophilic substances include, for example, organic carboxylic acids having 5 to 25 carbon atoms such as oleic acid, lauric acid, valeric acid, nonyl acid, capric acid, myristyrene acid, palmitic acid, and castor oil. These lipophilic substances can be used alone or in combination of two or more. The lipophilic substance contained in the rinse liquid of the present invention is in the range of 0.005% by weight to about 10% by weight, more preferably 0.05 to 5% by weight, based on the total weight of the lipophilic substance.

The treatment method with the rinse liquid is the same as the washing method, that is, the dipping method, the roller coating method,
Various methods such as spraying from a number of nozzles and spraying onto a lithographic printing plate or roller are possible, but by repeatedly using the rinse liquid, it is possible to greatly reduce the amount of rinse liquid used per PS plate to be plate-making processed. Becomes

The replenishment of the rinse liquid is performed in the same manner as the replenishment of the washing water.
Depending on the processing amount of the S plate, preferably the processing area, P
It is preferably carried out in the range of 1 to 400 cc for 1 m ^{2 of} S plate.

The desensitizing treatment contains a polymer compound, a lipophilic substance, a surfactant and water.

The natural polymer is obtained from starches such as citrus starch, potato starch, tapioca starch, wheat starch and corn starch, and algae such as carrageenan, laminaran, sea soup mannan, fungus, Irish moss, agar and sodium alginate. Stuffed Mallow, mannan, quince seed, pectin, tragacanth gum, karaya gum, xanthine gum,
Guar Bingham, Locust Bingham, Gum Arabic,
Examples include plant mucilages such as carob gum and benzoin gum, homopolysaccharides such as dextran, glucan and levan, and microbial mucilages such as heteropolysaccharides such as succinoglucan and xanthan gum, and proteins such as glue, gelatin, casein and collagen. . Semi-natural products (semi-synthetic products) include propylene glycol alginate, viscose, methyl cellulose, ethyl cellulose, methyl ethyl cellulose, hydroxyethyl cellulose, carboxymethyl cellulose, hydroxypropyl cellulose, hydroxypropyl methyl cellulose, hydroxypropyl ethyl cellulose and hydroxypropyl methyl cellulose phthalate. And the like, as well as processed starch and the like. Processed starch includes roasted starch such as white dextrin, yellow dextrin and British gum, enzyme-modified dextrin such as enzyme dextrin and Schardinger dextrin, acid-decomposed starch such as solubilized starch, oxidized starch such as dialdehyde starch, and modified starch. Alpha starch such as alpha starch and non-denatured alpha starch, starch phosphate, fatty starch, starch sulfate, starch acetate, starch xanthate and carbamate starch, carboxyalkyl starch, hydroxyalkyl starch,
Crosslinked starch such as etherified starch such as sulfoalkyl starch, cyanoethyl starch, allyl starch, benzyl starch, carbamylethyl starch and dialkylamino starch, methylol crosslinked starch, hydroxyalkyl crosslinked starch, phosphoric acid crosslinked starch and dicarboxylic acid crosslinked starch. , Starch polyacrylamide copolymer, starch polyacrylic acid copolymer,
Starch Polyvinyl Acetate Copolymer, Starch Polyacrylonitrile Copolymer, Cationic Starch Polyacrylic Ester Copolymer, Cationic Starch Vinyl Polymer Copolymer, Starch Polystyrene Maleic Acid Copolymer and Starch Polyethylene Oxide Copolymer Starch graft copolymers and the like. The synthetic products include polyvinyl alcohol other partially fucetalized polyvinyl alcohol, allyl-modified polyvinyl alcohol, modified polyvinyl alcohol such as polyvinyl methyl ether, polyvinyl ethyl ether and polyvinyl isobutyl ether, sodium polyacrylate, partially saponified polyacrylate ester, poly Acrylic ester copolymer partially saponified product, polyacrylic acid derivative and polymethacrylic acid derivative such as polymethacrylic acid salt and polyacrylic amide, polyethylene glycol, polyethylene oxide, polyvinylpyrrolidone, copolymer of vinylpyrrolidone and vinylacetate, Examples thereof include carboxyvinyl polymer, styrene-maleic acid copolymer, and styrene-crotonic acid copolymer. Of these, those obtained from algae, vegetable mucilages, fibrin derivatives, processed starch, propylene glycol alginate and synthetic products are preferably used because they have good film forming properties on printing plates. Examples of the lipophilic substance include a plasticizer, a fatty acid, a fatty oil, a monohydric alcohol, a wax, and a lipophilic resin used as a vehicle for a lithographic printing ink. Preferable lipophilic resin is novolac type phenol resin such as phenol formaldehyde resin, cresol formaldehyde resin, t-butylphenol formaldehyde resin, xylene resin obtained by condensing phenol and xylene with formaldehyde, resin obtained by condensing phenol and mesitylene with formaldehyde. , Polyhydroxystyrene, brominated polyhydroxystyrene, cashew resin, partial esterification product of copolymer of styrene and maleic anhydride, melamine resin, alkyd resin, polyester resin, epoxy resin, rosin, hydrogenated rosin and rosin ester, etc. Examples include petroleum resins such as modified rosin and gilsonite.

Preferred plasticizers are phthalic acid diesters such as dibutyl phthalate, di-n-octyl phthalate, di- (2-ethylhexyl) phthalate, dinonyl phthalate, didecyl phthalate, dilauryl phthalate, butyl benzyl phthalate, Aliphatic dibasic acid esters such as dioctyl azelate, dioctyl adipate, dibutyl glycol adipate, dibutyl sebacate, di- (2-ethylhexyl) sebacate, dioctyl sebacate, trischloroethyl phosphate, for example epoxidized soybean oil And epoxidized triglycerides such as tricresyl phosphate and trioctyl phosphate, and benzoic acid esters such as benzyl benzoate. Preferred fatty acids include caproic acid, enanthic acid, caprylic acid, belargonic acid, capric acid, undecyl acid,
Lauric acid, tridecyl acid, myristic acid, pentadecyl acid, palmitic acid, hebutadecyl acid, stearic acid,
Nonadecanoic acid, arachidic acid, behenic acid, lignoceric acid, cerotic acid, hebutacosanoic acid, montanic acid, melissic acid, laxeric acid, saturated fatty acids such as isovaleric acid and acrylic acid, crotonic acid, isocrotonic acid, undecylenic acid,
Oleic acid, elaidic acid, cetoleic acid, erucic acid,
Brassic acid, sorbic acid, linoleic acid, linolenic acid,
There are unsaturated fatty acids such as arachidonic acid, propiolic acid, stearolic acid, sardine acid, daryl acid and licanoic acid.
Monohydric alcohols are classified into aliphatic saturated monohydric alcohols, alicyclic unsaturated monohydric alcohols, aromatic acid alcohols, alicyclic alcohols, heterocyclic alcohols and the like. The monohydric alcohol may have a substituent, and examples of the substituent include a halogen atom such as chlorine and bromine, an alkoxy group such as methoxy and propoxy, and an aryloxy group such as phenoxy.

The desensitizing treatment used in the present invention may be an emulsion type gum solution, a suspension type gum solution, a non-emulsion type non-suspension type gum solution, etc., depending on the surfactant, lipophilic substance, etc. to be contained. Although it can be produced as described above, the emulsion type gum solution and the suspension type gum solution are preferably used because of their high ability to prevent the deterioration of the oil sensitivity of the image area of the lithographic printing plate. Further, the emulsion type gum liquid is preferable because it can strongly suppress the generation of suspensions and generate less insoluble matter in the plate-making method according to the present invention. Further, the compounds described in the above rinse solution can be added to the desensitizing solution.

Desensitizing treatment (also called gum treatment)
There are various methods such as a dipping method similar to the cleaning method, a method of applying with a roller, a method of spraying from a number of nozzles and spraying on a PS plate or a roller, but by repeatedly using the gum solution. , P for plate making
It is possible to greatly reduce the amount of gum solution used per S plate. The amount used in the processing method of supplying the plate surface protective agent onto the lithographic printing plate is preferably 0.1 l / min or more and 40 l / min or less. More preferably, it is 3 to 20 l / min. Also,
The method of treating with high stirring on the lithographic printing plate, such as the method of spraying from a large number of nozzles, is that the residue remaining on the lithographic printing plate can be washed with a gum solution, and further, the gum solution Is more preferable because it can be made uniform.
The replenishment of the gum solution is carried out in the same manner as the replenishment of the rinse solution according to the treatment amount of the PS plate, preferably the treated area, and preferably in the range of 1 to 400 cc per 1 m ^{2 of} the PS plate.

[0057]

Next, the operation configured as above will be described.

According to a first aspect of the present invention, the washing step of the photosensitive lithographic printing plate is a multi-stage countercurrent type washing tank, and a washing liquid containing a chelating agent is added to the backward direction with respect to the conveying direction of the photosensitive lithographic printing plate in the washing tanks. From the rear washing tank of the photosensitive lithographic printing plate in the conveying direction of the photosensitive lithographic printing plate in the front direction, and supplied as a dilution water or a dissolved water to the developing step of supplying a concentrated developing replenisher to the photosensitive lithographic printing plate. As a result of the method of processing a photosensitive lithographic printing plate for processing a plate, as a result, it is possible to substantially eliminate the cleaning waste liquid and to suppress the generation of precipitates.

According to a second aspect of the present invention, the washing step of the photosensitive lithographic printing plate is performed by using a multi-stage countercurrent type washing tank, and the water used for the washing liquid for the photosensitive lithographic printing plate is preliminarily charged with a cation exchange resin and an anion. At least one of treatment with an exchange resin, treatment with an electrodialyzer divided by cation exchange membranes and anion exchange membranes, and treatment with a reverse osmosis membrane was used as pure water, and a front washing tank in front of multiple washing tanks was used. Supply the cleaning solution as a dilution water or a dissolution water to the developing step of supplying a concentrated developing replenisher,
A method for treating a photosensitive lithographic printing plate, which is a method for treating a photosensitive lithographic printing plate, and as a result, there is no waste liquid of washing water, and the precipitation can be further suppressed.

The third aspect of the present invention is that, as the evaporation correction of the developing solution in the developing step of the photosensitive lithographic printing plate, at least one cleaning water in a plurality of cleaning tanks in the cleaning step is supplied and corrected. Alternatively, with the method for processing a photosensitive lithographic printing plate described in 2, as a result, it is possible to suppress a precipitate without a cleaning waste liquid.

According to a fourth aspect of the present invention, the photosensitive lithographic printing plate is processed by developing the photosensitive lithographic printing plate with an alkaline developing solution and then washing in a washing step of a plurality of washing tanks supplied with an alkaline washing replenishing solution. It is a method of processing a photosensitive lithographic printing plate. The plurality of cleaning tanks is 2 or more, and preferably 3 to 6 tanks. As the cleaning method, an immersion method and a method of applying a cleaning liquid by air transportation are preferable. In addition, it is preferable to provide a squeeze to reduce the amount of liquid coming out.
As a result, the cleaning is effectively performed, and even if the cleaning liquid remains due to the small amount of supplementary water, the precipitate can be suppressed.

According to a fifth aspect of the present invention, a cleaning replenisher is supplied to a cleaning tank behind the photosensitive lithographic printing plates in a plurality of cleaning tanks, and the overflow solution of the cleaning liquid is sequentially transferred to the photosensitive lithographic printing plates. The method for treating a photosensitive lithographic printing plate according to claim 4, wherein the cleaning solution is poured into a cleaning tank in front of the direction, and as a result, a waste solution of the cleaning solution is eliminated, and a multi-stage countercurrent method easily causes a precipitate due to a decrease in the cleaning solution. It is possible to prevent the occurrence of the above and suppress the precipitate even if the cleaning liquid remains.

According to a sixth aspect of the present invention, each processing replenisher in the rinsing step or the desensitizing step after the washing step of the photosensitive lithographic printing plate is mixed in the same amount as the alkaline washing replenisher. The method for treating a photosensitive lithographic printing plate according to claim 4 or 5, wherein an acidic buffer having a pH of 6.0 or less is sometimes provided so that the alkaline component in the washing solution is still acidic. As a result, the finishing quality of the photosensitive lithographic printing plate becomes good for a long period of time.

According to a seventh aspect of the invention, when the alkaline developing solution is completely renewed with a new developing solution, the washing solution in the washing step is simultaneously replaced with water to process the photosensitive lithographic printing plate. The method for treating a photosensitive lithographic printing plate as described in any one of 6 above. By replacing all the cleaning liquid with water, there is no effect on the developing property when the cleaning step is water, but the developing property can be provided by making it alkaline. That is, by increasing the activity of the developing solution at the start and decreasing the developing property of the developing solution by continuous processing, the cleaning step is made alkaline by supplying an alkaline cleaning replenisher to make up for the lack of development. Enables speeding up as a whole. As a result, high activity can be stably maintained with a small amount of developing replenisher.

According to claim 8, the cleaning agent in the cleaning step is a cleaning solution in which the cleaning replenisher has a pH in the range of 9 to 14, and the concentration of the additive is an aqueous solution in the range of 0.01 to 30 g / liter. The range is preferably pH 10 to 14, more preferably 11 to 13.5. The cleaning liquid component is preferably a compound for exhibiting alkalinity, such as sodium hydroxide, potassium hydroxide, alkali metal hydroxides of lithium hydroxide, carbonic acid, alkali metal salts of phosphoric acid, monoethanolamine, diethanolamine, triethanolamine. And the use of organic alkaline agents such as tetraalkylammonium hydroxide. Further, organic solvents, surfactants, sulfites and the like used in the developing solution and rinsing solution are preferable. The amount of addition to the above compound is preferably 0.01 to 30 g / liter with respect to water. This is because when added in a large amount, it causes performance defects in the finisher process of the next process.
This is because the alkalinity cannot be maintained if the added amount is small. As a result, the PS plate can be sufficiently washed and the precipitate is small.

A ninth aspect of the present invention is the cleaning agent for a photosensitive lithographic printing plate according to the eighth aspect, wherein a chelating agent is added as an additive to the cleaning liquid. As a result, the precipitate can be suppressed.

According to a tenth aspect of the invention, after the photosensitive lithographic printing plate is processed in the developing step, the washing step is performed in a multi-stage countercurrent system with a plurality of washing tanks, and the washing solution temperature is adjusted to at least one of the plurality of washing tanks by the washing solution temperature adjusting means. Is set to a predetermined temperature, and in particular, a processing apparatus in which the liquid temperature of the front processing tank having a high developability by a multi-stage countercurrent system is set to a predetermined temperature, and as a result, variations in finish sensitivity of the photosensitive lithographic printing plate are eliminated.

According to claim 11, after the photosensitive lithographic printing plate is processed in the developing step, the washing step is performed in a multi-stage countercurrent system with a plurality of washing tanks, and further, at least one of the plurality of washing tanks is provided with a washing liquid temperature adjusting means. The cleaning liquid temperature is set to a predetermined temperature, particularly the liquid temperature of the front processing tank having high developability by a multi-stage countercurrent system is set to a predetermined temperature, and further, in a processing device in which the cleaning liquid is filtered by a filter filtering means to remove precipitates, As a result, there is no variation in the finish sensitivity of the photosensitive lithographic printing plate, and it is possible to prevent the PS plate from being contaminated and scratched by a precipitate that tends to be generated particularly when a small amount of the PS plate is processed.

According to a twelfth aspect of the present invention, the photosensitive lithographic printing plate is processed in the developing step, and the washing step is a multi-stage counter-current type washing tank, and the liquid surface detecting means is used to wash forward the shortage due to evaporation of the liquid. The liquid level in the tank is detected, and the cleaning liquid replenishing means replenishes the rear cleaning tank with the cleaning liquid based on the detection information.
Forced discharge means forcibly discharges the cleaning liquid added by replenishing the cleaning liquid in the front cleaning tank, so that the density of each tank is maintained at the specified level regardless of whether the photosensitive planographic printing plate is processed in a small amount or a large amount. This is a printing plate processing device. As a result, variations in the finish sensitivity of the PS plate can be reduced, and fluctuations can be reduced particularly during high-volume processing and low-volume processing.

According to a thirteenth aspect, after the photosensitive lithographic printing plate is processed in the developing step, the temperature of the cleaning liquid is adjusted in the range of 30 ° C. to 50 ° C. to improve the cleaning efficiency, and the photosensitive processable film can be processed rapidly. This is a method of processing a lithographic printing plate. In particular, if the cleaning solution in the cleaning process is made developable with an alkaline component, etc., it can be processed quickly in combination with the cleaning effect due to high temperature while covering the insufficient development in the developing process, and as a result, the photosensitive lithographic printing plate can be quickly processed. Processing becomes possible.

Further, in claim 14, after treating a small amount of the photosensitive lithographic printing plate in the developing step, the liquid temperature of the washing liquid is adjusted to a range from 1 ° C. to 20 ° C., which is a temperature at which precipitation is unlikely to occur,
A method for treating a photosensitive lithographic printing plate in which the plate is washed and treated in a washing step, and as a result, it is possible to suppress the generation of precipitates, particularly when a small amount of the PS plate is treated. In addition, if the processing device can be temperature-controlled, as described in claim 13,
It is also possible to rapidly process a large amount of PS plate at high temperature.

[0072]

An embodiment of the present invention will be described with reference to the drawings.

[Example 1] (Example 1-1) First, examples according to claims 1 and 3 will be described.

FIG. 1 is a schematic block diagram of a photosensitive lithographic printing plate processing apparatus. As shown in the drawing, the processing apparatus is casing with a casing 10, and the exposed photosensitive lithographic printing plate is inserted from the left side along the conveyance path 94 in the drawing, and the developing, cleaning, finisher, and drying steps are performed. After that, it is discharged from the right side of the figure. The carrying roller 60 carries the photosensitive lithographic printing plate to the developing step. The developing tank 20 is a tank containing a developing solution, and is provided with conveying rollers 61, 62, 63 for conveying the photosensitive lithographic printing plate. The brush roller 68 is adapted to brush the surface of the photosensitive lithographic printing plate. In the developing tank, the concentrated replenisher is supplied from the developer replenisher tank 21 by the pump 22. Further, the developer 25 is sucked by the pump 23 and circulated from the nozzle 24. Further, a cleaning solution, which will be described later, is replenished to the developing solution by the bellows pump 34.

Next, in the cleaning process, there are a plurality of cleaning tanks,
It has a multi-stage countercurrent system. From the side closer to the developing process, there are cleaning tanks 30a, 30b, 30c, 30d. In addition, a squeeze 96 is provided above each tank to wipe off the surface of the photosensitive lithographic printing plate. Further, a cleaning replenishing means 33 is provided to supply a cleaning replenisher. Furthermore, the front washing tank 30a is a pump
The cleaning liquid is sucked in by 93a and is sprayed from both sides of the photosensitive lithographic printing plate from a nozzle. In addition, three A symbols in the figure mean that they are connected to each other. Similarly, pumps 93b, 93c, 93d are provided. In the figure, B,
The symbols C and D have the same meanings as the symbol A. further,
The cleaning replenisher tank 36 pumps the solution containing the chelating agent.
Due to 35, the water 38 is replenished in the cleaning tank by the pump 92, and the generation of precipitates can be suppressed. The replenishment control unit 37 controls. In addition, the overflow of the last cleaning tank 30a is made to flow into the developing process to substantially eliminate the cleaning waste liquid. Next, in the finisher tank 72, rinsing processing is performed, and the transport roller 64 transports the photosensitive lithographic printing plate to dry. The pump 76 sucks the rinse liquid and sprays it from the nozzle 77 onto the photosensitive lithographic printing plate. Furthermore, a replenisher is supplied from a pump 75 from the finish replenisher tank 74.

Further, in the drying step, the photosensitive lithographic printing plate is dried and discharged by the carrying roller 65. For refinishing, the PS plate is conveyed along the conveying path 95 by the conveying rollers 67, refinished, and sent to the drying chamber by the conveying rollers 66. Further, the finisher process may be a rinsing process or a desensitizing process.

(Embodiment 1-2) Next, an embodiment according to claims 2 and 3 will be described.

FIG. 2 is a schematic block diagram of a photosensitive lithographic printing plate processing apparatus. The exposed photosensitive lithographic printing plate is inserted from the left side in the figure, is developed, washed, finished, and dried, and is discharged from the right side in the figure. The carrying roller 60 carries the photosensitive lithographic printing plate to the developing step. The developing tank 20 is a developing tank, and transport rollers 61, 62, 63 for transporting the photosensitive lithographic printing plate.
There is. The surface of the photosensitive lithographic printing plate is brushed with a brush roller 68. Pump from development replenisher tank 21
The replenisher is supplied at 22. Further, a cleaning solution 97, which will be described later, in a cleaning process is replenished to the developing solution by the bellows pump 34.

Next, in the cleaning process, there are a plurality of cleaning tanks,
It has a multi-stage countercurrent system. From the side closer to the developing process, there are cleaning tanks 30a, 30b, 30c, 30d. In addition, a squeeze (not shown) is provided above each tank to wipe off the surface of the photosensitive lithographic printing plate. Further, in the frontmost cleaning tank, a cleaning liquid is sucked by a pump (not shown) and is sprayed on the surface of the photosensitive lithographic printing plate through a nozzle. Similarly, pumps (not shown) are provided in the other cleaning tanks. Further, the water 361 used as the cleaning liquid is previously treated as pure water by the electrodialysis treatment means 362 which is partitioned by the cation exchange membrane and the anion exchange membrane alternately. The treated pure water and the source cleaning replenisher 363 are mixed in the cleaning replenisher tank 364 to form the cleaning replenisher 367, which is replenished in the cleaning step. The overflow of the last cleaning tank 30a is made to flow into the developing process, and the cleaning waste liquid can be substantially eliminated.

Next, in the finisher process and the drying process, as shown in FIG.
As described above, the photosensitive lithographic printing plate is rinsed, dried, and discharged by the conveying roller. It should be noted that a means for treating with a reverse osmosis membrane or a means for treating with a cation exchange resin and an anion exchange resin may be used.

(Experiment 1) The photosensitive lithographic printing plate was continuously treated, and the treatment amount was 5 times the developer replenisher relative to the developer amount in the developing tank.
After doubling, 1 liter of the processed developing solution was sampled, placed in a thermostatic bath at 55 ° C. and left for 4 days, and the weight of the precipitate was measured. The PS plate, developer, development replenisher, finish solution and finish replenisher used in the experiment are as follows.

PS plate manufactured by Konica Corporation (SUP, KX, S
LP-N, KH, KM, KW, SWN-N, SNN-
N) Treated with the same area ratio.

Development tank liquid Sodium silicate (Japanese Industrial Standard Sodium Silicate No. 3) 100 parts Sodium hydroxide 8 parts Sodium sulfite 4 parts Ethylenediaminetetraacetic acid tetrasodium salt 1 part Water 688 parts Development replenisher (50 ml / m ² ) Sodium silicate (Japanese Industrial Standard Sodium Silica No. 3) 100 parts Sodium hydroxide aqueous solution (48%) 58 parts Sodium isopropylnaphthalene sulfonate (Aerosol OS, American Cyanamid) 10 parts Sodium sulfite 5 parts Benzyl alcohol 20 parts Ethylenediaminetetraacetic acid 4 Sodium salt 1 part Water 700 parts Finish liquid (desensitizer) Gum arabic 40 parts Dextrin 160 parts 85% Phosphoric acid 10 parts Citric acid 25 parts 98% Sodium hydroxide 1 part Water 1000 parts Sodium dilaurylsulfosuccinate 20 parts Polyoxyethylene noniphenyl ether (HLB = 7.8) 10 parts Sol Fatty acid ester (HLB = 4.3) 10 parts of dioctyl azelate 20 parts 10 parts finish replenisher oleate (desensitizer) (20ml / m ²⁾ dextrin 78.6 parts gum arabic 29.0 parts of 85% phosphoric acid 30.3 parts cresol formaldehyde ( Number average molecular weight of about 400) 1.6 parts Amogen K (Daiichi Kogyo Seiyaku Co., Ltd. double-sided activator) 0.4 parts Water 500 parts The experimental results are shown in [Table 1] below.

[0084]

[Table 1]

As shown in [Table 1], in the examples of the present invention, there are few precipitates and there is no cleaning waste liquid, which is good. Similar results were obtained for the electrodialysis treatment and reverse osmosis treatment.

[Embodiment 2] (Embodiment 2-1) Next, an embodiment according to claims 4, 5, 6, and 7 will be described.

FIG. 3 is a schematic block diagram of a photosensitive lithographic printing plate processing apparatus. As shown in the figure, the exposed photosensitive lithographic printing plate is inserted from the left side in the figure, is developed, washed, finished and dried, and is discharged from the right side in the figure. The carrying roller 60 carries the photosensitive lithographic printing plate to the developing step. The developing tank 20 is a developing tank and has conveying rollers 61, 62, 63 for conveying the photosensitive lithographic printing plate. The surface of the photosensitive lithographic printing plate is brushed with a brush roller 68. A developer replenisher having an alkaline property is supplied from a developer replenisher tank 21 by a pump 22. Further, the cleaning solution in the cleaning step, which will be described later, is replenished to the developing solution by the bellows pump 34.

Next, in the cleaning process, there are a plurality of cleaning tanks,
It has a multi-stage countercurrent system. From the side closer to the developing process, there are cleaning tanks 30a, 30b, 30c, 30d. In addition, a squeeze (not shown) is provided above each tank to wipe off the surface of the photosensitive lithographic printing plate. Further, in the frontmost cleaning tank, a cleaning liquid is sucked in by a pump (not shown), and the photosensitive lithographic printing plate surface is sprayed from a nozzle. Similarly, pumps (not shown) are provided in the other cleaning tanks. Further, the cleaning replenisher tank 36 of the alkaline cleaning replenisher is replenished by the pump 98. In the cleaning process, the cleaning tank replenisher is supplied to the rear cleaning tank, and the cleaning tank overflow is sequentially overflowed to the front cleaning tank, and the overflow liquid of the front cleaning tank is poured into the developing process to substantially remove the cleaning waste liquid. You can get rid of it. Next, in the finisher process, the finish replenisher tank 74 is replenished with the finish replenisher by the pump 75 and rinsed. A replenisher containing an acidic buffer having a pH of 6 or less when the treatment replenisher for the rinsing solution treatment or the desensitizing solution treatment is mixed with the alkaline cleaning replenisher in the same amount is supplied. Conveying rollers (not shown) convey the photosensitive lithographic printing plate to dry.

(Embodiment 2-2) An embodiment according to claims 8 and 9 will be described.

FIG. 4 is a schematic diagram of the cleaning replenisher in the cleaning process. The washing process has multiple washing tanks and is a multi-stage countercurrent system. Cleaning tank 30 from the side closer to the development process
There are a, 30b, 30c and 30d. Dilution water (tap water) 366 is supplied separately from alkaline cleaning concentrate replenisher 365, and cleaning tank 3
Mixed at 0d, the substantial wash replenisher has an additive concentration of 0.
It is an aqueous solution with a pH of 9 to 14 in the range of 01 to 30 g / liter. A chelating agent is contained in this additive. In addition, dilution water (tap water) 366 is sent by pump 369,
The alkaline cleaning concentrated replenisher 365 is pumped by the pump 368. Alternatively, as shown in FIG. 3, the cleaning replenishing liquid 36 may be supplied in advance. Further, water and the concentrated liquid can be mixed and supplied in the middle of the supply pipe.

(Experiment 2) The amount of the cleaning replenisher was supplied at 30 mm liter / m ² and the photosensitive lithographic printing plate was treated with 20 m ² for one day. The cleaning liquid in each cleaning tank is 4 liters, and the cleaning tank is 5 tanks. It was observed after left for 2 months. Note that P
The S plate, the developing solution, the developing replenishing solution, the finishing solution, and the finishing replenishing solution were the same as those used in Experiment 1. The experimental results are shown in [Table 2] below.

[0092]

[Table 2]

As shown in [Table 2], in the examples of the present invention, the amount of precipitate was small and good.

(Experiment 3) The conveyance speed of the photosensitive lithographic printing plate was changed by the processing apparatus of Experiment 2 to obtain the standard 1400 of the sample 1.
It was tested to what extent the samples 2 and 3 of the present invention had the same developability with respect to the developability of mm / min. The PS plate, the developing solution, the developing replenishing solution, the finishing solution, and the finishing replenishing solution were the same as those used in Experiment 1. The experimental results are shown in [Table 3] below.

[0095]

[Table 3]

As shown in [Table 3], in the examples of the present invention, the activity of the developer is high, and rapid processing is possible. Further, the developer dilution rate is determined so that the activity at the start is the activity at the time of the continuous processing. Or by adjusting the prescription, the cleaning solution can be started only with water. The amount of sediment is small, and there is no waste liquid for washing, which is good. Similar results were obtained for the electrodialysis treatment and reverse osmosis treatment.

[Embodiment 3] Next, an embodiment according to claim 10 will be described.

FIG. 5 is a schematic diagram of the cleaning process. Figure 1 shows the development process, cleaning process, finisher process and drying process.
The description is omitted because it is similar to the above. The washing process will be described. In the washing process, there are a plurality of washing tanks and a multi-stage countercurrent system is used. From the side closer to the developing process, there are cleaning tanks 30a, 30b, 30c, 30d. Further, the cleaning replenisher in a cleaning liquid replenishing tank (not shown) is replenished in the cleaning tank. The liquid temperature adjustment control unit 42 of the liquid temperature adjustment control means includes a cooler 43 and a heater.
44, the thermometer 45 is controlled to adjust the liquid temperature. tank
46 is a tank for adjusting the temperature of the washing tank, and the liquid is a pump
It is sent to each cleaning tank 30 by 47. The temperature of the cleaning liquid is adjusted through a pipe 48 in the cleaning tank to eliminate uneven cleaning.

[Embodiment 4] Further, claims 11, 12, 13 and
An embodiment relating to 14 will be described.

FIG. 6 is a schematic diagram of the cleaning process of the processing apparatus. The developing process, the finisher process, and the drying process are the same as those in FIG. The washing process will be described. In the washing process, there are a plurality of washing tanks 30 and a multi-stage countercurrent system is used. From the side closer to the developing process, the cleaning tanks 30a, 30b, 30
There are c and 30d. In addition, a squeeze 96 is provided above each tank to wipe off the surface of the photosensitive lithographic printing plate. Further, in the frontmost cleaning tank, the cleaning solution is sucked by the pump 93a, filtered through the filter filtration 41 of the filter filtering means, and then sprayed on both sides of the photosensitive lithographic printing plate. Similarly, pumps 93b, 93c, 93d are provided in the other cleaning tanks. The cleaning replenishing liquid in the cleaning liquid replenishing tank 36 is replenished in the cleaning tank by the bellows pump 91 under the control of the replenishment controller 37 by detecting the liquid surface of the front cleaning tank 30a by the liquid level detection sensor 49. The cleaning liquid in the cleaning tank is forcibly discharged by the pump 391 of the forced discharging means 39. Further, the overflow liquid in the frontmost cleaning tank (not shown) is designed to be poured into the developing process to eliminate the cleaning waste liquid. The liquid temperature adjustment control unit 42 controls the cooler 43, the heater 44, and the thermometer 45 to adjust the liquid temperature. A liquid for adjusting the temperature of the cleaning tank of the tank 46 is sent to each cleaning tank 30 by the pump 47. The temperature of the cleaning liquid is controlled through a pipe 48 in the cleaning tank. The overflow pipe 99 is designed to overflow if the pump or the like should fail.

As another modified example, in the method for treating a photosensitive lithographic printing plate having a cleaning tank, the cleaning tank is subjected to cleaning treatment by adjusting the cleaning liquid temperature of the liquid temperature adjusting means in the range of 30 ° C. to 50 ° C. Eliminates uneven cleaning. In addition, the set temperature is adjusted in the range of 1 ° C to 20 ° C to reduce the amount of precipitates, especially when the washing treatment is performed in a small amount.

[0102]

The above-mentioned structure has the following effects.

According to a first aspect of the present invention, the washing step of the photosensitive lithographic printing plate is a multi-stage countercurrent type washing tank, and a washing solution containing a chelating agent is added backward to the conveying direction of the photosensitive lithographic printing plate in the washing tank. From the rear washing tank of the photosensitive lithographic printing plate in the conveying direction of the photosensitive lithographic printing plate in the front direction, and supplied as a dilution water or a dissolved water to the developing step of supplying a concentrated developing replenisher to the photosensitive lithographic printing plate. Since the plate is treated, it is possible to substantially eliminate the cleaning waste liquid and to suppress the generation of precipitates.

According to a second aspect of the present invention, the washing step of the photosensitive lithographic printing plate is performed by using a multi-stage countercurrent type washing tank, and the water used for the washing solution for the photosensitive lithographic printing plate is previously charged with a cation exchange resin and an anion. At least one of treatment with an exchange resin, treatment with an electrodialyzer divided by cation exchange membranes and anion exchange membranes, and treatment with a reverse osmosis membrane was made pure water, and front washing was performed in front of the multiple washing tanks. Since the photosensitive lithographic printing plate is processed by supplying the cleaning liquid in the tank as dilution water or dissolved water in the developing step of supplying the concentrated development replenisher, there is no waste liquid of the cleaning water and the precipitation can be suppressed.

According to a third aspect of the present invention, as the evaporation correction of the developing solution in the developing step of the photosensitive lithographic printing plate, at least one cleaning water in a plurality of cleaning tanks in the cleaning step is supplied and corrected. In addition to the effect according to claim 1 or 2, the cleaning waste liquid can be eliminated.

According to a fourth aspect of the present invention, the photosensitive lithographic printing plate is processed by developing the photosensitive lithographic printing plate with an alkaline developing solution and then washing it in a washing step of a plurality of washing tanks supplied with an alkaline washing replenishing solution. Therefore, the cleaning is effectively performed, and the amount of the replenishing water is reduced, so that the precipitation can be suppressed even if the cleaning liquid remains.

According to a fifth aspect of the present invention, a cleaning replenisher is supplied to a rear cleaning tank located behind the plurality of cleaning tanks in the conveying direction of the photosensitive lithographic printing plates, and the overflow solution of the cleaning solution is sequentially supplied to the photosensitive lithographic printing plates. In addition to the effect of claim 4, by pouring into a cleaning tank in front of the conveying direction of, the waste liquid of the cleaning liquid is eliminated, and a precipitate is easily generated due to a small amount of the cleaning liquid by the multi-stage countercurrent method. However, even if the cleaning liquid remains, the precipitate can be suppressed.

According to a sixth aspect of the present invention, when the process replenisher in each step of the rinsing process or the desensitizing process of the photosensitive lithographic printing plate is mixed with the alkaline cleaning replenisher in the same amount, the pH value is 6.0. By using the following acidic buffer, the finish of the photosensitive lithographic printing plate becomes stable for a long period of time, similar to the effect of claim 4 or 5.

According to a seventh aspect of the present invention, when the developing solution in the alkaline developing step is completely renewed with a new developing solution, the washing solution in the washing step is simultaneously replaced with water to process the photosensitive lithographic printing plate. In addition to the effects of any one of claims 4 to 6, when the continuous image processing is continued, the high activity can be stably maintained with a small amount of the developing replenisher.

According to the eighth aspect, the cleaning replenisher for the cleaning agent in the cleaning step of the processing apparatus for processing the photosensitive lithographic printing plate is pH.
The amount of the additive is in the range of 9 to 14, and the concentration of the additive is 0.01 to 30 g / liter.

According to the ninth aspect, a chelating agent is contained in the additive, so that the precipitate can be suppressed similarly to the effect of the eighth aspect.

According to a tenth aspect of the present invention, in a photosensitive lithographic printing plate processing apparatus in which the washing step is a multi-stage countercurrent type washing tank, the washing solution temperature is adjusted in at least one of the washing tanks. By providing the means, variations in finish sensitivity of the photosensitive lithographic printing plate are eliminated.

According to claim 11, in a photosensitive lithographic printing plate processing apparatus in which the washing step is a multi-stage countercurrent type washing tank, the washing liquid temperature is adjusted in at least one of the washing tanks. By providing the means and the filter filtration means for filtering the cleaning liquid, it is possible to eliminate variations in the finish sensitivity of the photosensitive lithographic printing plate, and to suppress the generation of precipitates especially when a small amount is processed.

According to a twelfth aspect of the present invention, in a photosensitive lithographic printing plate processing apparatus in which the washing step uses a multi-stage countercurrent type washing tank, the washing step is rearward and rearward with respect to the conveying direction of the photosensitive lithographic printing plate. A cleaning liquid replenishing means for replenishing the cleaning liquid to the cleaning tank, a liquid level detecting means for detecting the liquid level of the cleaning liquid in the front cleaning tank in the cleaning step, and a forced discharging means for forcibly discharging the cleaning liquid in the front cleaning tank. By including the above, variation in finish sensitivity can be reduced. In particular, it is possible to reduce fluctuations during high-volume processing and low-volume processing.

Further, in claim 13, a washing step is provided, and the temperature of the washing liquid in the washing step for treating the photosensitive lithographic printing plate is controlled.
By adjusting the temperature in the range of 30 ° C to 50 ° C and washing the photosensitive lithographic printing plate, the photosensitive lithographic printing plate can be rapidly processed.

Further, in claim 14, a washing step is provided, and the photosensitive lithographic printing plate is washed by adjusting the liquid temperature of the washing liquid in the washing step for treating the photosensitive lithographic printing plate within the range of 1 ° C to 20 ° C. By doing so, it is possible to suppress the generation of precipitates particularly in the case of a small amount of treatment. In addition, it is effective to perform a large amount of processing rapidly at a high temperature if the processing apparatus is capable of adjusting the temperature.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of a photosensitive lithographic printing plate processing apparatus.

FIG. 2 is a schematic configuration diagram of a photosensitive lithographic printing plate processing apparatus.

FIG. 3 is a schematic configuration diagram of a photosensitive lithographic printing plate processing apparatus.

FIG. 4 is a schematic configuration diagram of a cleaning replenisher in a cleaning process.

FIG. 5 is a schematic configuration diagram of a cleaning process of the processing apparatus.

FIG. 6 is a schematic configuration diagram of a cleaning process.

[Explanation of symbols]

 10 casing 20 developing tank 21 developing replenisher tank 22 pump 23 pump 24 nozzle 25 developing solution 30 cleaning tank 30a, 30b, 30c, 30d cleaning tank 33 cleaning replenishing means 34 bellows pump 35 pump 36 cleaning replenisher tank 361 water 362 electrodialysis Treatment means 363 Source cleaning replenisher 364 Cleaning replenisher tank 365 Additive 366 Diluting water 367 Cleaning replenisher 368 Pump 369 Pump 37 Replenishment controller 38 Water 39 Forced discharge means 391 Pump 41 Filter filtration 42 Cleaning fluid temperature control controller 43 Cooler 44 Heater 45 Thermometer 46 Tank 47 Pump 48 Piping 49 Liquid level detection sensor 60, 61, 62, 63, 64, 65, 66, 67 Transport roller 68 Brush roller 72 Finisher tank 74 Finish replenisher tank 75 Pump 76 Pump 77 Nozzle 80 Drying room 91 Bellows pump 92 Pumps 93a, 93b, 93c, 93d Pump 94 Conveying path 95 Conveying path 96 Squeeze 97 Cleaning liquid 98 Pump 99 Overflow Tube

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁶ Identification code Office reference number FI technical display location G03F 7/32 501

Claims (14)

[Claims] 1. A washing process of a photosensitive lithographic printing plate is a multi-stage countercurrent type washing bath, and a washing liquid containing a chelating agent is washed backward in the feeding direction of the photosensitive lithographic printing plates in the washing baths. Supplied from the tank as a dilution water or dissolved water to the developing step of supplying the concentrated developing replenisher solution in the front step of the cleaning step with the cleaning solution of the front cleaning tank in front of the conveying direction of the photosensitive lithographic printing plate. A method for treating a photosensitive lithographic printing plate, which comprises treating the photosensitive lithographic printing plate. 2. The washing step of the photosensitive lithographic printing plate is a multi-stage countercurrent type washing tank, and water used as a washing solution for the photosensitive lithographic printing plate is previously treated with a cation exchange resin and an anion exchange resin, At least one of treatment with an electrodialysis device partitioned by cation exchange membranes and anion exchange membranes and treatment with a reverse osmosis membrane was used as pure water, and the cleaning liquid in the front cleaning tank in front of the plurality of cleaning tanks was treated as described above. A method for treating a photosensitive lithographic printing plate, which comprises treating the photosensitive lithographic printing plate by supplying it as dilution water or dissolved water in a developing process in which a concentrated developing replenisher is supplied in a step prior to the washing step. 3. The evaporation correction of the developer in the developing step of the photosensitive lithographic printing plate is performed by supplying at least one cleaning water of a plurality of cleaning tanks in the cleaning step to correct the evaporation. The method for treating a photosensitive lithographic printing plate as described in 1 or 2. 4. Treating the photosensitive lithographic printing plate by developing the photosensitive lithographic printing plate with an alkaline developing solution and then washing in a washing step of a plurality of washing tanks supplied with an alkaline washing replenishing solution in a subsequent step. A method for treating a photosensitive lithographic printing plate characterized by: 5. A cleaning replenisher is supplied to a rear cleaning tank rearward with respect to the direction in which the photosensitive lithographic printing plates in the plurality of cleaning tanks are conveyed,
The method for treating a photosensitive lithographic printing plate according to claim 4, wherein the overflow liquid of the cleaning liquid is sequentially poured into a cleaning tank in front of the conveying direction of the photosensitive lithographic printing plate. 6. A pH of 6 when the replenishing solution for each step of the rinsing step or the desensitizing step after the washing step of the photosensitive lithographic printing plate is mixed with the alkaline washing replenishing solution in the same amount. 6. The method for treating a photosensitive lithographic printing plate according to claim 4 or 5, which has an acidic buffer of 0.0 or less. 7. The photosensitive lithographic printing plate is treated by updating the cleaning solution in the cleaning step to water at the same time when the developing solution in the alkaline developing step is completely renewed with a new developing solution. Item 7. A method for processing a photosensitive lithographic printing plate according to any one of Items 4 to 6. 8. A cleaning replenisher for the cleaning step of a processing apparatus for processing a photosensitive lithographic printing plate has a pH of 9 to 14 and an additive concentration of 0.01 to 30 g / liter as an aqueous solution. A cleaning agent for a photosensitive lithographic printing plate characterized by: 9. The cleaning agent for the photosensitive lithographic printing plate according to claim 8, wherein the additive contains a chelating agent. 10. A photosensitive lithographic printing plate processing apparatus comprising a multi-stage countercurrent type washing tank as a washing step subsequent to the developing step, wherein a washing solution for adjusting the washing solution temperature in at least one of the washing tanks. An apparatus for processing a photosensitive lithographic printing plate, comprising a temperature control means. 11. A processing apparatus for a photosensitive lithographic printing plate comprising a multi-stage countercurrent type washing tank as a washing step after the developing step, wherein a washing solution for adjusting the washing solution temperature in at least one of the washing tanks. A photosensitive lithographic printing plate processing apparatus comprising: a temperature control unit; and a filter filtration unit that filters the cleaning liquid. 12. A photosensitive lithographic printing plate processing apparatus comprising a multi-stage countercurrent type washing tank as a washing step after the developing step, wherein the washing step is backward with respect to the conveying direction of the photosensitive lithographic printing plate. Cleaning liquid replenishing means for replenishing the rear cleaning tank with cleaning liquid, liquid level detecting means for detecting the liquid level of the cleaning liquid in the front cleaning tank in the cleaning step, and forced discharge means for forcibly discharging the cleaning liquid in the front cleaning tank. And a photosensitive lithographic printing plate processing apparatus. 13. A photosensitive lithographic printing plate is prepared by providing a washing step after the developing step and adjusting the liquid temperature of the washing liquid in the washing step for treating the photosensitive lithographic printing plate in the range of 30 ° C. to 50 ° C. A method for treating a photosensitive lithographic printing plate, which comprises performing a washing treatment. 14. A photosensitive lithographic printing plate is prepared by providing a washing step after the developing step, and adjusting the liquid temperature of the washing liquid in the washing step for treating the photosensitive lithographic printing plate within the range of 1 ° C. to 20 ° C. A method for treating a photosensitive lithographic printing plate, which comprises performing a washing treatment.