JPH0843617A - Production of color filter - Google Patents

Abstract

PURPOSE:To obtain a process for production of color filter which prevents generation of pinholes, white drop-outs, etc., and has good quality free from defects, such as unequal coloration, even with the color filter having fine and intricate pixel arrangement by relatively moving a material to be coated and an electrodeposition liquid and/or recovered liquid and bringing electrodes into contact with this electrodeposition liquid or recovered liquid. CONSTITUTION:This process for production of color filter includes a stage for forming coating film of desired hue by electrodeposition coating on the material which is to be coated and has the electrodes. The material to be coated and the electrodeposition liquid and/or recovered liquid are relatively moved prior to execution of the electrodeposition coating to bring at least the electrodes into contact with the electrodeposition liquid and/or recovered liquid. These contact treatments are executed on the surface of the substrate which is the material to be coated and on the surface of which the electrodes are formed. The electrodeposition coating is merely necessitated to be executed in succession if the electrodeposition liquid is used for the treatment. The electrodeposition is executed by immersing the material to be coated into the electrodeposition liquid after liquid draining is executed to some extent after the treatment when the treatment is executed by the recovered liquid, etc.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a color filter used for color display of a liquid crystal display device by an electrodeposition method, and more specifically, a mosaic pattern which is said to be difficult by the electrodeposition method. The present invention relates to a method of manufacturing even a color filter having a complicated pixel arrangement such as a triangle shape without defects.

[0002]

2. Description of the Related Art Recently, in a liquid crystal display device or the like, a color filter is often formed on a surface of a conductive layer to display a color image. Known methods for producing the color filter include (1) dyeing method, (2) pigment dispersion (color resist) method, (3) printing method, and (4) electrodeposition method. The method (1) requires a dye-proof step so that the colored pixel pattern is not dyed when the colored layers having different hues are provided, and the process is complicated. The method (2) blocks oxygen during exposure for forming the pixel pattern. A film or nitrogen seal is required, the process is complicated, and the light absorption due to the blended pigment is large, so the exposure amount at the time of patterning must be increased. With method (3), the accuracy of the pixel pattern and overall planarity are required. However, the method (4) has a drawback that it is difficult to manufacture complicated pixel arrangements other than the stripe-shaped pixel arrangement at the beginning.

Among these, the electrodeposition method has attracted attention because of its relatively simple process, high productivity, and high utilization efficiency of coloring materials. As described above, the electrodeposition method could not initially manufacture a color filter having a complicated pixel arrangement, but many manufacturing methods have been proposed to overcome this problem (Japanese Patent Laid-Open No. 61-203403). , JP-A-61
-279803, JP-A-4-172304, JP-A-4-280201, JP-A-4-287.
002, JP-A-4-326304, JP-A-4-362601, etc.).

In the method of manufacturing a color filter by the electrodeposition method proposed above, further complication and miniaturization of pixel arrangement have been studied in response to the demand for higher definition of color display. However, the size of the pixel is about 20 to 300 .mu.m, which is extremely fine.
287002, JP-A-4-326304,
When the resist disclosed in Japanese Patent Application Laid-Open No. 4-362601 is colored in the opened portion, it is necessary to electrodeposit the fine recesses as described above. It has become difficult to sufficiently diffuse and permeate, defects such as pinholes and white spots (non-colored portions) frequently occur in pixels, and the number of defective products increases, resulting in a decrease in product yield.

[0005]

SUMMARY OF THE INVENTION It is an object of the present invention to prevent the occurrence of pinholes, white spots, etc. even in a color filter having a fine and complicated pixel arrangement, and to provide a good quality without defects such as uneven coloring. An object of the present invention is to provide a method for producing a color filter having a high quality by an electrodeposition method. Another object of the present invention is to have a high degree of freedom in pixel arrangement, a non-translucent layer can be arranged between color filter pixels without a gap, and it is easy to deal with an increase in size, and mass production is easy. It is to provide a manufacturing method of a color filter.

[0006]

According to the present invention, in a method for producing a color filter, which comprises a step of forming a coating film of a desired hue on an object to be coated having an electrode by electrodeposition coating,
Before the electrodeposition coating, the article to be coated and the electrodeposition liquid and / or the recovery liquid are relatively moved so that at least the electrode is brought into contact with the electrodeposition liquid and / or the recovery liquid. Color filter manufacturing method (hereinafter referred to as "first method")
Will be provided. Further, according to the present invention, when a photosensitive resin layer is formed on an object to be coated having (A1) electrodes and the photosensitive resin layer is exposed to light, the solubility of the photosensitive resin layer in a developing solution is at least three stages. A step of performing pattern exposure so as to obtain different states, and (B1) developing and removing the photosensitive resin layer of the pattern portion to expose the electrode, and at least the exposed electrode and the electrodeposition solution and / or the recovery solution After the contact treatment is performed by sequentially moving the film, the operation of forming a coating film of a desired hue by performing electrodeposition coating is sequentially performed on the corresponding pattern portions in order of increasing or decreasing solubility of the photosensitive resin layer in the developing solution. A process for forming a coating film having a plurality of hues by repeating the process is provided (hereinafter, referred to as "second method").
Further, according to the present invention, (A2) a step of forming a photosensitive resin layer on an object to be coated having an electrode, exposing the photosensitive resin layer through a photomask, and then developing to expose the electrode;
2) a step of forming a coating film having a desired hue by performing electrodeposition coating after at least the exposed electrode and the electrodeposition liquid and / or the recovery liquid are brought into contact with each other by relatively moving, (C2) A step of exposing the photosensitive resin layer in an area other than the formed coating film area after exposure through a photomask to expose the electrode, and (D2) at least the electrode exposed in the step (C2), and electrodeposition A step of forming a coating film having a hue different from the hue of the step (B2) by electrodeposition coating, after relatively moving the solution and / or the recovery solution to perform contact treatment.
2) A method for manufacturing a color filter (hereinafter, referred to as "third method") is provided, which includes the step of repeating the steps (C2) and (D2) a required number of times.

The present invention will be described in more detail below. The object to be coated having an electrode used in the first to third methods of the present invention is not particularly limited, but a substrate having a conductive layer corresponding to an electrode on the surface, on which a color filter is formed, is preferable. The substrate is preferably a transparent plate in view of the performance of the color filter, and various kinds of glass, polyimide, polyphenylene sulfide, epoxy resin, acrylic resin, polyester resin, polycarbonate resin and the like can be mentioned. The conductive layer is usually formed of a transparent conductive film such as ITO (indium-tin oxide) or tin oxide, but electrodes of non-linear elements (TFT (thin film transistor), MIM (two-terminal element), etc.) are formed. May be.

In the first to third methods of the present invention, the contact treatment performed by relatively moving at least the electrode and the electrodeposition liquid and / or the recovery liquid includes (1) at least the electrode and the electrodeposition liquid. And / or a method of moving the coating object with respect to the electrodeposition liquid and / or the recovery liquid so as to come into contact with the recovery liquid, (2) the electrodeposition liquid and / or the recovery liquid with respect to at least the electrode of the coating object Examples thereof include a method of moving, (3) a method of using the methods of (1) and (2) together. Specifically, (a) electrodeposition liquid and /
Or dip at least the electrode of the object to be coated in the recovered liquid.
A method of repeating the pulling operation, (b) a method of immersing at least the electrode of the object to be coated in an electrodeposition solution and / or a recovery solution, and moving at least the electrode in the solution, (c) an electrodeposition solution and / or Alternatively, a method of immersing at least the electrode of the object to be coated in the flow of the recovered liquid for a desired time, (d) a method of fluidizing the electrodeposition liquid and / or the recovered liquid to at least the electrode of the object to be coated by spraying, etc. be able to. These contact treatments
It is indispensable to perform it on the surface of the substrate to be coated on which the electrodes are formed, but there is no problem even if it is performed on the surface of the substrate on which the electrodes are not formed.

More specifically, in the above method (a),
The immersion time of the electrode, the pulling time, the number of repetitions, etc. can be appropriately set depending on the shape and size of the electrode, the properties (temperature, viscosity, etc.) of the electrodeposition liquid and / or the recovery liquid, and are usually selected from the following conditions. Preferably. Immersion time is 3 to 180
Seconds, preferably 5 to 60 seconds, as well as pulling times. The number of repetitions is 1 to 10 times, preferably 3 to
Six times is desirable. The temperature at which these operations are performed is preferably around the temperature at which the electrodeposition coating in the subsequent step is performed. Outside the range of each of the above conditions, it is difficult to obtain the effect of preventing pinholes, white spots, and the like, or the process takes too long to reduce productivity, which is not preferable.

In the above method (b), the moving speed, moving distance, moving direction, etc. of the electrode in the electrodeposition liquid and / or the recovery liquid are determined by the shape and size of the electrode, the electrodeposition liquid and / or the recovery liquid. Although it can be appropriately set depending on the properties (temperature, viscosity, etc.), it is usually preferable to select from the following conditions. Movement speed is 50
cm / min to 50 m / min, preferably 5 to 30 m / min. The moving distance and moving direction depend on the size and shape of the electrodeposition liquid tank and / or the recovery liquid tank, and the tank is the size of the electrode. On the other hand, if you do not have much room, you may reciprocate. If it is out of the range of each of the above conditions, it is difficult to obtain the effect of preventing the occurrence of pinholes, white spots, etc., and the process takes time,
This is not preferable because productivity is likely to decrease.

In the above method (c), the flow rate and the immersion time of the electrodeposition liquid and / or the recovery liquid can be appropriately set depending on the properties (temperature, viscosity, etc.) of the liquid, but are usually selected from the following conditions. Is preferred. The flow rate is 1 to 200 cm / sec, preferably 5 to 100 cm / sec, and the immersion time is 3 to 1
It is 80 seconds, preferably 5 to 60 seconds. The dipping direction of the electrode may be any direction with respect to the flow of the liquid, but it is preferable that the electrode is directed to the upstream side. Further, during immersion, these liquids may be pressurized with a pump or the like and sprayed onto the electrodes.

There is no particular limitation on the method for causing the electrodeposition liquid and / or the recovery liquid to flow down to the electrode in the method (d), and the liquid may be flowed down on the electrode under normal pressure or under pressure, for example, a pump. It may be flowed down to the electrode directly or through a spray nozzle. The conditions at this time include the properties (temperature, viscosity, etc.) of the electrodeposition liquid and / or the recovery liquid, the pressure and the flow rate,
The size can be appropriately set depending on the size and shape of the electrode, the flowing time, and the like, but usually can be set appropriately from the following conditions. The liquid temperature at the time of flowing is not particularly limited, but the lower limit is 10 ° C,
Particularly, it is preferably 15 ° C., the upper limit is 40 ° C., and particularly preferably 35 ° C. It is preferable in terms of process control that the liquid temperature is ± 5 ° C., which is the temperature at which electrodeposition coating is subsequently performed. The flow-down time is not particularly limited, but the lower limit is preferably 1 second, preferably 5 seconds, more preferably 10 seconds. If the flow-down time is less than 1 second, it is not preferable because the object of the present invention to prevent the occurrence of pinholes and white spots and to produce a color filter having good quality without defects such as coloring unevenness is not sufficiently achieved. . There is no particular upper limit, but 300
If flowed down in seconds, it is possible to prevent the occurrence of pinholes, white spots, etc., which is the object of the present invention, to produce a color filter having good quality without defects such as coloring unevenness, and to flow for more time. However, it is useless in the process, and is preferably 200 seconds, more preferably 90 seconds. If the pressure of the flowing electrodeposition liquid and / or the recovery liquid is too high, the liquid is atomized and scattered to contaminate the surroundings or destroy the already electrodeposited colored film, which is not preferable. 10 kg /
cm ² or less is sufficient. Also, the flow rate is not particularly limited, but normally, it may be 10 ml / min to 100 liters / min for a 300 mm × 300 mm size substrate,
It is particularly preferably 50 ml / min to 50 liters / min. At this time, a higher effect can be obtained by applying ultrasonic waves to the electrodeposition liquid and / or the recovery liquid to be flowed down. Outside the range of each of the above conditions, the effect of preventing the occurrence of pinholes, white spots, etc. is difficult to obtain, and the process is time-consuming and the productivity is lowered.

If necessary for this contact treatment, a liquid obtained by appropriately diluting the electrodeposition liquid with water or a liquid that can be arbitrarily mixed with the electrodeposition liquid without adversely affecting the electrodeposition coating in the subsequent step is used. Alternatively, it can be used as a mixture with an electrodeposition liquid and / or a recovery liquid.

After completion of the contact treatment, electrodeposition coating is carried out.
When an electrodeposition liquid is used in the treatment, electrodeposition coating may be subsequently performed. When the treatment is a recovery liquid or the like, the liquid is drained to some extent after the treatment and then the electrodeposition liquid is removed. It may be dipped in and electroplated. The electrodeposition liquid and / or the recovery liquid used for the contact treatment may be non-colored (does not include dyes and / or pigments), but electrodeposition coating for post-process electrodeposition coating It is preferable to use one having the same hue as the liquid.

In the first to third methods of the present invention, the (coloring) electrodeposition liquid and the electrodeposition coating used for electrodeposition coating for forming a coating film having a desired hue are described in, for example, JP-A-61-2.
03403, JP-A-63-210901,
JP-A-4-3122, JP-A-4-280201, JP-A-4-287002, JP-A-4-32
Known electrodeposition liquids such as 8801 and JP-A-4-326305 can be used. More specifically, the colored electrodeposition liquid uses, for example, a cationic or anionic resin as a resin component, a dye and / or a pigment as a coloring component, and an acidic or basic substance is further added to water. A dissolved and / or dispersed coating material or the like can be used. Furthermore, an organic solvent or the like may be added in order to facilitate the dissolution and / or dispersion of the resin in the colored electrodeposition liquid, to improve the bath stability or to obtain a smooth coating film, and the like.

The organic solvent may be any one which can disperse or dissolve the resin and the like, and various glycol ethers such as ethylene glycol monobutyl ether, ethylene glycol monohexyl ether, ethylene glycol monophenyl ether and propylene. Glycol monomethyl ether, propylene glycol monophenyl ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether and the like; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and isophorone; ethers such as dibutyl ether, dioxane and tetrahydrofuran; Alcohols such as methoxybutanol, diacetone alcohol, butanol, isopropanol ; Hydrocarbons such as toluene, xylene, hexane and the like; esters such as ethyl acetate, butyl acetate, 2-methoxyethyl acetate, acetic acid 2
-Methoxypropyl, benzyl acetate, phenoxyethyl acetate, ethyl benzoate, etc .; acid amides such as dimethylformamide, N, N-dimethylacetamide, dimethylsulfoxide, etc. can be mentioned, and they can be used alone or as a mixture. You can

As the cationic resin used as the resin component of the colored electrodeposition liquid, for example, acrylic resin, epoxy resin, urethane resin, polybutadiene resin, polyamide resin, etc., amino group and / or ammonium group,
Examples of the resin having a sulfonium group or the like introduced therein include resins that are solubilized or dispersed in water with an acid or an acidic substance such as formic acid, acetic acid, propionic acid, and lactic acid.

The anionic resin used as the resin component of the colored electrodeposition liquid is, for example, acrylic resin,
Resins such as polyester resins, maleated oil resins, polybutadiene resins, epoxy resins, etc. that have carboxyl groups introduced, such as resins that are solubilized or dispersed in water with basic substances such as triethylamine, diethylamine, dimethylethanolamine, and ammonia. Can be mentioned. Furthermore, the film-forming component of the colored electrodeposition liquid may have photosensitivity, and among the resin compositions used for forming the above-mentioned photosensitive film, those suitable for electrodeposition can also be used. Alternatively, a photopolymerization initiator may be used in combination. Further, as the resin component of the colored electrodeposition liquid, a highly thermosetting electrodeposition resin composition, for example, a mixture of acrylic resin and melamine resin may be used.

The hue of the colored electrodeposition liquid can be appropriately selected according to the purpose. The dye and / or pigment used in the colored electrodeposition liquid is selected according to the desired hue, but the transparency of the resulting coating film, the stability of the colored electrodeposition liquid, the electrodeposition characteristics,
It is desirable to select a dye that does not cause a problem with respect to the durability of the coating film. From this viewpoint, an oil-soluble or dispersible dye is preferable. Specific examples include azo type, anthraquinone type, benzodifuran type, condensed methine type and the like. As the pigment, for example, azo lake type,
Anthraquinone-based, quinacridone-based, phthalocyanine-based, isoindolinone-based, thioindigo-based organic pigments, yellow lead, iron oxide, chrome vermillion, chrome green, ultramarine blue, navy blue, cobalt blue, cobalt green,
Inorganic pigments such as emerald green, titanium white and carbon black are suitable. Further, depending on the desired hue, two or more kinds of the dyes and / or pigments may be mixed and used as long as the characteristics are not impaired. Regarding the dyes and / or pigments, "COL
"OUR INDEX" or the like may be referred to. In the present invention, the predetermined hue can be prepared by using the above pigment.

The use ratio of the dye and / or pigment is appropriately selected depending on the purpose, hue, type of dye and / or pigment used, film thickness during drying, etc., and preferably with respect to the entire colored electrodeposition liquid, 0.1 to 15% by weight, particularly preferably 0.1.
About 5 to 10% by weight is suitable.

The above-mentioned colored electrodeposition liquid is prepared by a resin, a dye and / or a pigment, an acidic substance or a basic substance and, if necessary, an organic solvent, a dispersion aid for the dye or the pigment, and leveling for improving the smoothness of the coating film. Mixing agents, viscosity modifiers, various auxiliaries such as defoaming agents, etc., commonly used sand mills,
Sufficiently disperse using a disperser such as a roll mill or an attritor, and then dilute with water to a predetermined concentration, preferably about 4 to 25% by weight of solid content, particularly preferably 6 to 20% by weight, and electrodeposition. Can be carried out by a method suitable for The colored electrodeposition liquid thus obtained forms a coating film by electrodeposition coating on the exposed conductive layer.

The thickness of the coating film is not particularly limited and can be appropriately selected according to the performance required for the color filter.
When dried, it is usually 0.3 to 5 μm, preferably 0.5 to 3 μm.
It may be about m.

The conditions for the electrodeposition coating are appropriately selected depending on the kind of the colored electrodeposition liquid to be used, the intended film thickness of the coating film, etc., but the voltage is usually 5 to 500 V, preferably 10 to 3
The direct current of 00V is preferable, and the electrodeposition time is usually 3 to
300 seconds, preferably 5 to 200 seconds, liquid temperature is usually 10
It is desirable that the temperature is 35 ° C, preferably 15 to 30 ° C.
At this time, when the electrodeposition time for obtaining the desired film thickness has elapsed, the energization is stopped, the substrate is taken out of the bath, and the excess bath solution is thoroughly washed with water etc. and dried to form a coating film. You can

The drying conditions can be appropriately selected depending on the conditions of the post-process and the like, but it is generally required that the water content on the surface of the coating film can be dried, for example, 150 ° C. or lower, preferably 60 ° C.
At ~ 120 ° C, usually 0.5 minutes to 1 hour, preferably 5 to
It is desirable to dry for about 30 minutes.

In the first to third methods of the present invention,
The recovered liquid is usually an object to be coated after electrodeposition coating incorporated in an electrodeposition coating process (corresponding to an electrode in the present invention).
It means cleaning liquids mainly composed of water, which are used for collecting and reusing the electrodeposition liquid accompanying when the liquid is pulled up from the electrodeposition tank.

The method for forming the photosensitive resin layer used in the second and third methods of the present invention is not particularly limited, and a generally known method such as a dipping method, a roll coating method, a spin coating method or an electrostatic coating is used. Method, electrodeposition method, transfer (dry film) method and the like are used. As the resin composition forming the photosensitive resin layer, a photosensitive resin composition comprising a compound selected from a quinonediazide compound, a diazomeldrum acid compound, a nitrobenzyl group-containing compound and the like, and a resin soluble in an alkaline aqueous solution (for example, Resins described in JP-B-37-3627, JP-B-43-28403, JP-B-45-9610, IEEE Trans.Elec. Dev., ED-28, No. 11, 1300 (1981), etc. (Composition etc.), a so-called chemically amplified photosensitive resin composition comprising a compound that generates an acid by light and a resin that releases a free carboxylic acid group by the generated acid (for example, JP-A-59-45439). Japanese Patent Laid-Open No. 2-3
09358, Journal of Synthetic Organic Chemistry, 49 (5), 4
37-450 (1991) and the like), a photosensitive resin composition containing a compound that generates a base by light (for example, the resin composition described in JP-A-4-134348, etc.) ), A photosensitive resin composition comprising a compound having an addition polymerizable unsaturated group and a photopolymerization initiator (for example, JP-B-40-12104 and JP-B-46).
-42450, JP-A-51-58106,
JP-A-54-155292, JP-A-61-123
603, JP-A-60-221403, JP-A-4-212161, etc.) and the like. Of course, various commercially available photosensitive resin compositions may be appropriately selected and used. These photosensitive resin compositions act as a positive type or a negative type, and either of them can be used in the present invention, but a positive type that can dissolve even if the photosensitive resin layer is exposed several times is preferable.

The film thickness of the photosensitive resin layer thus formed is not particularly limited and can be appropriately selected according to the performance required for the color filter, but is usually 0.3 when dried.
˜20 μm, preferably about 1 to 10 μm. The adjustment of the film thickness is appropriately selected depending on the method of forming the photosensitive resin layer used and the photosensitive resin composition. For example, when the photosensitive resin layer is formed by the spin coating method, it can be easily determined from the rotation speed and rotation time of the spin coater, the coating temperature, the viscosity of the photosensitive resin composition, and the like. If necessary, the photosensitive resin layer may be applied a plurality of times.

In the second method of the present invention, the photosensitive resin layer formed on the object to be coated having an electrode has a solubility of at least 3 in the developing solution when exposed to light.
Pattern exposure is performed in different stages (including unexposed portions) (hereinafter referred to as step (A1)).

The state in which the solubility in the developing solution differs in at least three stages means that the exposure amount (including the unexposed portion) is changed for each pattern of the photosensitive resin layer to chemically change the resin layer by light irradiation. The degree of change is in at least three stages, and by setting the development conditions described later, selective development for each pattern of the photosensitive resin layer becomes possible.

When the solubility of the photosensitive resin layer in the developing solution is different in at least three stages (including the unexposed portion),
It can be performed by various exposure methods, for example,
(1) A method of performing a single exposure through a photomask having a pattern having at least three different light transmittances, (2)
Ordinary photomask (consisting of a light transmitting part and a light non-transmitting part)
And the like, and a method of appropriately moving the photomask and / or the photosensitive resin layer and then performing exposure with different exposure amounts at least twice. More specifically, for example, in the above method (1), a photomask having a pattern having at least three different light transmittances can be used, and an example of the mask is shown in FIG. The difference in light transmittance for each step can be changed depending on the properties of the photosensitive resin layer, the exposure conditions, the development conditions described below, and the like. However, when the steps are arranged in descending order of light transmittance, The light transmittance ratio (next / previous ratio) is usually 90% or less,
It is preferably 70 to 1%. For example, in the case of a photomask having a pattern in which the light transmittance is different in four stages, the light transmittance of each stage is 100% and 20 to 3 when the pattern having the maximum light transmittance is 100%.
Those of 0%, 3 to 10% and 0% can be used (see FIG. 1).

Further, in the method (2), as shown in FIGS. 3 to 5, after exposure using an ordinary photomask (consisting of a light transmitting portion and a light non-transmitting portion), the mask and / or the photosensitive material are exposed. The photosensitive resin layer is appropriately moved and then exposed at different exposure amounts at least twice. The movement of the photomask and / or the photosensitive resin layer is in the same plane, and light is transmitted at the time of each exposure. It is not particularly limited as long as the portions to be covered do not overlap each other, and the moving direction and the moving amount may be appropriately selected according to the performance required for the color filter, and the adjustment of the exposure amount changes the exposure time, This can be done by changing the distance, changing the output of the light source, or combining these appropriately.

For the exposure, a light source that can generate a large amount of ultraviolet rays, for example, a low pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a metal halide lamp, a xenon lamp, an excimer laser, an SOR (synchrotron orbit radiation), etc. can be used. . If necessary, radiation other than ultraviolet rays may be used. The exposure conditions can be appropriately selected according to the photosensitive resin composition used, the exposure apparatus, the exposure method, and the like.

In the step (A1) of the second method, after the exposure, the exposed state can be a pattern in which the solubility of the photosensitive resin layer in the developing solution is different in at least three stages.

Next, in the second method, the photosensitive resin layer in the pattern portion is developed and removed to expose a part of the electrodes, and at least the exposed electrodes and the electrodeposition solution and / or the recovery solution are made to face each other. Of the photosensitive resin layer having a higher solubility in the developing solution or the smaller solubility in the developing solution is sequentially repeated by sequentially performing an electrodeposition coating to form a coating film having a desired hue. Thus, a coating film having a plurality of hues is formed (hereinafter referred to as step (B1)).

That is, in the step (B1), when, for example, a positive photosensitive resin layer is used, first, only the positive photosensitive resin layer in a portion corresponding to the pattern having the maximum exposure amount is selectively developed. After the removal, the exposed electrode and the electrodeposition liquid and / or the recovery liquid are moved relative to each other for contact treatment, and then electrodeposition coating is performed to form a coating film of a desired hue, and then the exposure amount is next larger. Only the positive photosensitive resin layer in the part corresponding to the pattern is selectively developed and removed, and the exposed electrode and the electrodeposition liquid and / or the recovery liquid are relatively moved to perform contact treatment and then electrodeposition coating. The coating film having a plurality of different hues can be formed by sequentially repeating the process of forming a coating film having a desired hue.

When a negative type photosensitive resin layer is used, first, only the negative type photosensitive resin layer in the portion corresponding to the pattern having the minimum exposure amount is selectively developed and removed to form an exposed electrode. , The electrodeposition liquid and / or the recovery liquid are moved relative to each other for contact treatment, and then electrodeposition coating is performed to form a coating film having a desired hue, and then a portion corresponding to a pattern having the next smallest exposure amount is formed. Only the negative photosensitive resin layer is selectively developed and removed, and the exposed electrode is relatively moved to the electrodeposition liquid and / or the recovery liquid, and after contact treatment, electrodeposition coating is performed to form a coating film having a desired hue. By sequentially repeating the step of forming a film, it is possible to form a coating film having a plurality of different hues.

The developing conditions depend on the exposure amount of the portion to be selectively removed, the solubility of the photosensitive resin layer used in the developing solution, the type and concentration of the developing solution, the developing temperature, the developing time, and the like. It may vary, and the conditions suitable for the paint used for forming the photosensitive resin layer may be appropriately selected.

Examples of the developing solution include acidic aqueous solutions, alkaline aqueous solutions, and various organic solvents.
For example, an aqueous solution in which an acidic substance is dissolved can be used as the acidic developing solution. Examples of the acidic substance include acetic acid, propionic acid, lactic acid, citric acid, oxalic acid, malonic acid,
Examples thereof include organic acids such as succinic acid and inorganic acids such as hydrochloric acid, nitric acid, sulfuric acid and phosphoric acid. For example, when an aqueous lactic acid solution is used as a developer, the lactic acid concentration is usually 0.01 to 50% by weight, It is preferably 0.05 to 25% by weight, and the temperature is usually 10
To 70 ° C, preferably 15 to 50 ° C, the developing time is usually 2
It may be appropriately selected from the range of ˜600 seconds, preferably 20-300 seconds. As an alkaline developer,
An aqueous solution in which a basic substance is dissolved can be used. Examples of the basic substance include sodium carbonate, potassium carbonate, sodium hydrogen carbonate, sodium metasilicate, tetraalkylammonium hydroxide (such as a methyl group and an ethyl group as the alkyl group), sodium hydroxide, potassium hydroxide and the like. For example, when an aqueous solution of sodium carbonate is used in the developer, the concentration of sodium carbonate is usually 0.01 to 25% by weight, preferably 0.05 to 20% by weight, and the temperature is usually 10 to 70 ° C, preferably Is 15 to 50 ° C., and the developing time is usually 2 to 600 seconds, preferably 20 to 300 seconds.

Furthermore, an organic solvent may be used as the developing solution, for example, alcohols, glycol ethers, ketones, chlorinated hydrocarbons and the like can be used. Further, a surfactant or a defoaming agent may be added to these developers for improving wettability and defoaming. Among these developers, it is preferable to use an aqueous solution from the viewpoints of toxicity and work environment.

The third method is to repeat the steps of exposure-development-contact treatment-electrodeposition coating. Specifically, first,
A photosensitive resin layer is formed on an object to be coated having an electrode, and the photosensitive resin layer is exposed through a photomask and then developed to expose the electrode (hereinafter referred to as step (A2)). This (A2)
The photosensitive resin layer in the process may be appropriately selected from those described above. The exposure may be performed by a conventionally known method, and the development may be appropriately selected from the above-mentioned conditions.

Next, in the third method, at least the exposed electrode and the electrodeposition liquid and / or the recovery liquid are relatively moved and brought into contact with each other, and then electrodeposition coating is performed to form a coating film having a desired hue. (Hereinafter referred to as step (B2)). Various conditions in the step (B2) may be selected from the above-mentioned ranges.

Next, in the third method, the photosensitive resin layer in the area other than the formed coating film area is exposed through a photomask and then developed to expose the electrodes (hereinafter referred to as step (C2)). . The step (C2) is performed in the same manner as the step (A2). The region other than the coating film region formed in the step (C2) may be a portion other than the coating film of the desired hue formed in the process (B2), that is, a portion of the photosensitive resin layer, and in the step (B2) The area where the coating film is formed and (C
The positional relationship with the exposure area in step 2) is appropriately selected according to the performance required for the color filter.

After the step (C2), in the third method, after at least the electrode exposed in the step (C2) and the electrodeposition solution and / or the recovery solution are relatively moved and brought into contact with each other,
A coating film having a hue different from that of the step (B2) is formed by electrodeposition coating (hereinafter referred to as the step (D2)). Conditions such as electrodeposition in the step (D2) may be appropriately selected from the above range.

Further, in the third method, the steps (C2) and (D2) are repeated a necessary number of times (hereinafter referred to as step (E2)). The number of times required in the step (E2) is not particularly limited, but is usually 4 times, preferably 2 times.

In the first to third methods of the present invention, the coating film formed to have a desired hue may have the above-mentioned pigment and /
Alternatively, it also includes a light-shielding layer formed using a dye. The light-shielding layer may be formed by forming a metal layer by another method, such as plating, to form the light-shielding layer. The metal layer can be formed even after the steps (B1) and (A2), (C2) and (E2). Examples of the method for forming the metal layer include electroplating method and electroless plating method. These plating methods use various commonly used plating solutions and require a color filter from the usual plating treatment conditions. It may be appropriately selected according to the performance to be performed. The metals used in the plating solution are copper, nickel, chrome,
Examples include general metals such as silver, gold and rhodium that can be subjected to plating and the like, alloy compounds composed of these metals, and mixtures of these metals in a plating solution. The thickness of the metal layer may be appropriately selected according to the performance required for the color filter, but is usually 100 nm to
It is about 3 μm. The light-shielding layer made of a metal layer can also serve as an electrode auxiliary line in addition to improving the contrast and color purity of the color filter, which reduces the signal delay and the heat generation inside the cell when the screen is enlarged. Also has. Further, the obtained plural colored layers having different hues may be transferred onto another substrate, if necessary.

Although the desired color filter is manufactured in this manner, it is possible to further improve weather resistance, chemical resistance and the like by further performing heating / curing or photocuring. The heating
The conditions for curing are, for example, a temperature of 100
~ 280 ° C, preferably 150-250 ° C for 5 minutes
It can be performed under conditions of 4 hours, preferably 15 minutes to 1 hour.

[0047]

The method for producing the color filter of the present invention is
It is possible to easily produce a color filter having a fine and complicated pixel arrangement, which has been difficult in the past by the electrodeposition method, with good quality without defects such as coloring unevenness by preventing the occurrence of pinholes and white spots. Further, the degree of freedom in pixel arrangement is high, the non-translucent layer can be arranged between the color filter pixels without a gap, and it is easy to deal with the increase in size, and mass production can be facilitated.

[0048]

EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited thereto.

[0049]

[Synthesis Example 1] Production of colored electrodeposition liquid (Y-1, Y-2, Y-3 and Y-4) Acrylic resin (trade name "Aron S-4030" manufactured by Toa Gosei Kagaku Co., Ltd.) was used as triethylamine. Was neutralized until the pH became about 8, and deionized water was added thereto to prepare an aqueous resin solution (S). Next, carbon black, an azo metal salt red pigment, phthalocyanine green, and phthalocyanine blue were added to the resin aqueous solution (S) under stirring to prepare black, red, green, and blue pigment dispersions, respectively.
Separately from this, a melamine resin (trade name “M-66B”, manufactured by Sumitomo Chemical Co., Ltd.) was mixed with the acrylic resin, and the mixture was neutralized with triethylamine until the pH reached about 8, and deionized. A resin aqueous solution (T) containing water was prepared.

By adding the resin aqueous solution (T) to the pigment dispersion liquid of each color, a colored electrodeposition liquid having the composition shown in Table 1 was obtained. The obtained colored electrodeposition liquid is thermosetting and has anion type electrodeposition property.

[0051]

[Table 1]

[0052]

Example 1 300 × 3 having a thickness of 1.0 mm and an ITO (indium-tin oxide) film having a thickness of 100 nm on the surface.
A positive photoresist (made by Tokyo Ohka Kogyo Co., Ltd.) on a 00 mm Pyrex glass substrate (hereinafter referred to as original plate 1)
A trade name "OFPR-800") was applied by a spin coater and dried at 80 ° C for 10 minutes to form a positive photosensitive resin layer having a film thickness of 2.5 µm.

Next, a photomask having a repeating pattern based on a light-transmitting portion of 50 μm × 100 μm surrounded by a light-impermeable portion having a width of 20 μm on the right and left sides and a width of 30 μm on the upper and lower sides was adhered onto the photosensitive resin layer. Then, using a UV exposure device (manufactured by Oak Co., Ltd., trade name "JL-3300") having an ultra-high pressure mercury lamp, 70 mJ /
Irradiation with ultraviolet rays of cm ² . Subsequently, it is developed with an aqueous solution of tetramethylammonium hydroxide having a concentration of 2.4% by weight to selectively remove the positive photosensitive resin layer corresponding to only the light transmitting portion of the mask to expose the ITO film surface, wash it with water and dry it. did.

Next, the colored electrodeposition liquid (Y-2) at 25 ° C. was applied to the ITO of the original plate 1 at a flow rate of 10 l / min using a small pump.
It was flowed on the surface for 30 seconds to perform contact treatment. Next, using the original plate 1 as an anode, the colored electrodeposition liquid (Y-2) was placed in an electrodeposition tank for 3 times.
Using a stainless steel plate of 00 × 300 mm as a cathode, a DC voltage of 40 V was applied at 25 ° C. for 10 seconds, and electrodeposition coating was performed. After washing the original plate 1 with ion-exchanged water, 140 ° C
It was dried and cured for 10 minutes and the thickness of the colored coating film was measured and found to be 2.2 μm.

When the original plate 1 was observed under a microscope at a magnification of 100, no pinholes or white spots were found in the portion of the original plate 1 corresponding to the light transmitting portion of the mask, and the original plate 1 was completely colored red. It was

[0056]

Comparative Example 1 The same procedure as in Example 1 was carried out except that the electrodeposition solution was not flowed down. The obtained original plate was used in Example 1.
When observed with a microscope in the same manner as above, many pinholes and white spots were observed.

[0057]

Examples 2-1 to 2-4 The same processes as in Example 1 were carried out except that the contact treatment shown in Table 2 was performed. The obtained results are shown in Table 2.

[0058]

[Table 2]

[0059]

Example 3 300 × 3 having a thickness of 1.1 mm and having an ITO (indium-tin oxide) film having a thickness of 100 nm on the surface.
A positive type photoresist (manufactured by Tokyo Ohka Kogyo Co., Ltd., trade name "OFPR-") is attached to a 00 mm trade name "Corning 7059 glass" (manufactured by Corning Co., Ltd.) (hereinafter referred to as original plate 2).
800 ") is applied by a spin coating method, and is applied at 80 ° C for 1 hour.
It was dried for 0 minutes to form a positive photosensitive resin layer having a film thickness of 3 μm.

Next, a photomask (not shown) having a pattern having three different light transmittances was adhered onto the photosensitive resin layer, and a UV exposure device (manufactured by Oak Manufacturing Co., Ltd.) having an ultra-high pressure mercury lamp was used. , Product name "JL-3300")
Was irradiated with 70 mJ / cm ² of ultraviolet light. At this time, the positive photosensitive resin layer corresponding to the highest light transmittance portion of the photomask is exposed to 70 mJ / cm ² of ultraviolet rays at the second highest light transmittance portion. The layer was irradiated with 11 mJ / cm ² of ultraviolet rays, and the photosensitive resin layer corresponding to the portion having the lowest light transmittance was not irradiated with ultraviolet rays.

Next, when the film was developed with a tetramethylammonium hydroxide aqueous solution having a concentration of 2.4% by weight, the positive photosensitive resin layer in the portion having the highest light transmittance of the mask was selectively removed, and the ITO film surface was removed. Exposed. After washing with water and drying, contact treatment was carried out under the conditions of Example 2-3 using the recovery liquid for black electrodeposition liquid (Y-1) kept at 25 ° C. After draining, the original plate 2 was used as an anode, and a stainless steel plate of 300 × 300 mm was used as a cathode in a electrodeposition tank containing a black electrodeposition liquid (Y-1), and a DC voltage of 25 V was applied at 25 ° C. for 60 seconds, It was electrodeposited. The original plate 2 was pulled up from the tank, washed with ion-exchanged water, and dried (100 ° C., 5 minutes).

Then, the film was developed with a tetramethylammonium hydroxide aqueous solution having a concentration of 3.4% by weight, and no change was observed in the portion corresponding to the portion having the lowest light transmittance of the black colored coating film and the photomask. However, the positive photosensitive resin layer in the portion corresponding to the portion having the second highest light transmittance of the photomask was selectively removed. After washing and drying
The original plate 2 was subjected to a contact treatment using the colored electrodeposition liquid (Y-2) under the conditions of Example 2-3, and then the original plate 2 was immersed in a colored electrodeposition liquid (Y-2) bath to obtain (Y When electrodeposition coating was performed in the same manner as in -1), no change was observed in the previously formed black colored coating film and the like, and a red colored coating film was formed. It was dried at 110 ° C. for 10 minutes and partially cured.

Next, the entire surface of the original plate 2 was irradiated with ultraviolet rays of 200 mJ / cm ² , and then developed with a 2% aqueous sodium hydroxide solution containing 5% of a surfactant (Kao Corporation, trade name "Perex NBL"). Residual photoresists other than the applied colored coating film part are removed, washed with water and dried, and then the product name is "OFPR-800" (manufactured by Tokyo Ohka Kogyo Co., Ltd.).
Was spin-coated to a film thickness of 3 μm.

Next, a photomask different from the one described above, which has a pattern having three different light transmittances, is moved by one with respect to the red colored coating film of the original plate 2 and the photoresist is recoated (shown in FIG. 4). 70mJ / cm in close contact with the original plate 2
Irradiated with ² ultraviolet rays. When developed with a tetramethylammonium hydroxide aqueous solution having a concentration of 2.4% by weight,
No change was observed in the black and red colored coating films, and no change was observed in the part corresponding to the lowest light transmittance of the photomask, and the part corresponding to the highest light transmittance in the mask. The positive photosensitive resin layer of was selectively removed.

After performing the same contact treatment and electrodeposition coating as in the case of (Y-2) on the colored electrodeposition liquid (Y-3),
When the original plate 2 was washed with ion-exchanged water, the black and red colored coating films formed previously, and the positive photosensitive resin layer of the portion corresponding to the portion having the second highest and lowest light transmittance of the photomask No change was observed in any part, and a green colored coating film was formed. It was dried at 100 ° C. for 10 minutes and partially cured. Subsequently, it was developed with an aqueous solution of tetramethylammonium hydroxide having a concentration of 3.4% by weight, and no change was observed in the portions corresponding to the lowest light transmittance of the black, red and green colored coating films and the mask. Not observed, the positive photosensitive resin layer in the portion corresponding to the portion having the second highest light transmittance of the mask was selectively removed. Next, after washing with water and drying, the colored electrodeposition liquid (Y-4) was used to carry out contact treatment and electrodeposition coating in the same manner as (Y-2) and (Y-3) to prepare a color filter. Finally, 200mJ on the whole surface of original plate 2
After irradiating ultraviolet rays of / cm ² , it was developed with a 2% sodium hydroxide aqueous solution containing 5% of a surfactant (Kao Corporation, trade name "Perex NBL"), and the residual photo other than the colored coating film part The resist was removed. As a result of microscopic observation, defects such as pinholes were not recognized in the colored coating film.

180 ° C. for further curing
After heating for 30 minutes, a color filter having a black light-shielding pattern excellent in transparency, uniformity, and flatness and having no defects such as pinholes and having high accuracy was obtained.

[0067]

Example 4 A positive type photoresist (trade name “OFPR-800” manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied onto a glass substrate (hereinafter referred to as “original plate 3”) similar to that in Example 3 by a spin coater. , Dried at 80 ℃ for 10 minutes, film thickness 3μm
To form a positive photosensitive resin layer. Subsequently, light of ultra-high pressure mercury lamp was irradiated at 70 mJ / cm ² through a photomask (FIG. 2) having a predetermined light shielding pattern.

Next, when the film was developed with a tetramethylammonium hydroxide aqueous solution having a concentration of 2.4% by weight, the positive photoresist in the exposed portion was selectively removed, and the ITO was removed.
The film surface was exposed. After washing and drying with water, the original plate 3 was contacted with the colored electrodeposition liquid (Y-1) kept at 25 ° C. under the conditions described in Example 2-2, and the original plate 3 was used as an anode, and the black electrodeposition liquid (Y-
In an electrodeposition tank containing 1), a stainless steel plate of 300 × 300 mm is used as a cathode and a DC voltage of 25 V is set to 25 ° C.
Was applied for 60 seconds for electrodeposition coating. The original plate 3 was pulled up from the tank, washed with ion-exchanged water, and dried (100 ° C., 5 minutes).

Then, exposure was carried out at 70 mJ / cm ² using a photomask having a pattern shown in FIG. 3, and the film was developed with a tetramethylammonium hydroxide aqueous solution having a concentration of 3.4% by weight. Not observed, the ITO film corresponding to the exposed portion was exposed. After washing with water and drying, the original plate 3 was subjected to Example 1 using the colored electrodeposition liquid (Y-2).
Contact treatment was carried out under the same conditions as above. Similarly to the case of (Y-1), a DC voltage of 25 V was applied at 25 ° C. for 60 seconds to perform electrodeposition coating. The original plate 3 was pulled out of the tank, washed with ion-exchanged water, dried, and heat-treated at 110 ° C. for 10 minutes. As a result, a red mosaic pixel pattern was obtained. Upon microscopic observation, no defects such as pinholes were observed.

Then, the entire surface of the original plate 3 was irradiated with ultraviolet rays of 200 mJ / cm ² and then developed with a 2% aqueous sodium hydroxide solution containing 5% of a surfactant (Kao Corporation, trade name “Perex NBL”). Residual photoresist other than the applied colored coating is removed, washed with water and dried, and then the product name is "OFPR-800" (Tokyo Ohka Kogyo Co., Ltd.).
Manufactured) was spin-coated to a film thickness of 3 μm. The mosaic pattern is exposed (70 mJ / cm ² ) so as to be adjacent to the red mosaic pattern of the original plate 3 on which the photoresist has been re-coated (position shown in FIG. 4), and tetramethylammonium hydroxy with a concentration of 2.4% by weight is used. When developed with an aqueous solution of water, no change was observed in the black and red coating layers, and the ITO film corresponding to the exposed portion was exposed. After washing with water and drying, the original plate 3 is contact-treated in the same manner as in (Y-2),
DC voltage 2 in the electrodeposition tank containing the colored electrodeposition liquid (Y-3)
5 V was applied at 25 ° C. for 60 seconds to perform electrodeposition coating. Master 3
Is removed from the tank, washed with ion-exchanged water, and dried to 100
Heat treatment was performed at 10 ° C. for 10 minutes.

Then, the mask is moved to the position shown in FIG.
After exposure at 0 mJ / cm ² , development was performed with a tetramethylammonium hydroxide aqueous solution having a concentration of 3.4% by weight. After washing with water and drying, the colored electrodeposition liquid (Y-4) was used (Y-
In the same manner as in 1), (Y-2) and (Y-3), contact treatment and electrodeposition coating were performed to prepare a color filter. Finally, the entire surface of the original plate 3 was irradiated with ultraviolet rays of 200 mJ / cm ² , and then developed with a 2% sodium hydroxide aqueous solution containing 5% of a surfactant (Kao Corporation, trade name “Perex NBL”), and colored coating. The residual photoresist except the film portion was removed. As a result of microscopic observation, defects such as pinholes were not recognized in the colored coating film.

Finally, in order to complete the curing, 180
By heating at 30 ° C. for 30 minutes, a color filter having a black light-shielding pattern having excellent transparency, uniformity and flatness, and having no defects such as pinholes and high accuracy was obtained.

[0073]

[Example 5] A positive type photoresist (manufactured by Tokyo Ohka Kogyo Co., Ltd., trade name "OFPR-800") was applied to a glass substrate (hereinafter referred to as original plate 4) similar to that in Example 3 with a spin coater. , Dried at 80 ℃ for 10 minutes, film thickness 3μm
To form a positive photosensitive resin layer. Subsequently, light of ultra-high pressure mercury lamp was irradiated at 70 mJ / cm ² through a photomask (FIG. 2) having a predetermined light shielding pattern.

Next, when the film was developed with an aqueous solution of sodium hydroxide having a concentration of 0.4% by weight, the positive photoresist in the exposed portion was selectively removed, and the ITO film surface was exposed. After washing with water and drying, the original plate 4 was contact-treated with the colored electrodeposition liquid (Y-1) kept at 25 ° C. under the conditions described in Example 2-2 to prepare the original plate 4.
Was used as an anode, and a 300 × 300 mm stainless steel plate was used as a cathode in an electrodeposition tank containing a black electrodeposition liquid (Y-1), and a DC voltage of 25 V was applied at 25 ° C. for 60 seconds for electrodeposition coating. The original plate 4 was pulled out of the tank, washed with ion-exchanged water, and dried (100 ° C., 5 minutes).

Then, exposure was carried out at 150 mJ / cm ² using a photomask having a pattern shown in FIG. 4, and development was carried out with an aqueous solution of sodium hydroxide having a concentration of 0.75% by weight. No change was observed in the black coating layer. The ITO film corresponding to the exposed portion was exposed. After washing with water and drying, the original plate 4 was contact-treated with the colored electrodeposition liquid (Y-2) under the same conditions as in Example 1. As in the case of (Y-1), DC voltage 25V
Was applied at 25 ° C. for 60 seconds to perform electrodeposition coating. The original plate 3 is pulled out of the tank, washed with ion-exchanged water, and then dried at 110 ° C.
Heat treatment was performed for 10 minutes. As a result, a red mosaic pixel pattern was obtained. Upon microscopic observation, no defects such as pinholes were observed.

Next, the mosaic pattern was exposed (150 mJ / cm ² ) so as to be adjacent to the red mosaic pixel pattern (at the position shown in FIG. 4) and developed with a 0.75 wt% sodium hydroxide aqueous solution. No change was observed in the black and red coating layers, and the ITO film corresponding to the exposed portion was exposed. After washing with water and drying, the original plate 4 is contact-treated in the same manner as in the case of (Y-2), and a DC voltage of 25 V is applied at 25 ° C. for 60 seconds in an electrodeposition tank containing the colored electrodeposition liquid (Y-3). Then, it was electrodeposited. The original plate 4 was pulled out of the tank, washed with ion-exchanged water, dried, and heat-treated at 100 ° C. for 10 minutes.

Next, the entire surface of the portion corresponding to the pixel of the color filter was exposed at 150 mJ / cm ² , and then developed with an aqueous sodium hydroxide solution having a concentration of 1.0% by weight. After washing with water and drying, the colored electrodeposition liquid (Y-4) was used to carry out contact treatment and electrodeposition coating in the same manner as in the case of (Y-1), (Y-2) and (Y-3) to form a color filter. Created.

Finally, the entire surface of the original plate 4 was irradiated with ultraviolet rays of 300 mJ / cm ² , and then developed with a 2% sodium hydroxide aqueous solution containing 5% of a surfactant (Kao Corporation, trade name "Perex NBL"). Then, the remaining photoresist other than the colored coating film portion was removed. As a result of microscopic observation, defects such as pinholes were not recognized in the colored coating film.

180 ° C. for further curing
After heating for 30 minutes, a color filter having a black light-shielding pattern having excellent transparency, uniformity and flatness, and having no defects such as pinholes and having high accuracy was obtained.

[Brief description of drawings]

FIG. 1 is an enlarged schematic view of an example of a photomask having a pattern in which light transmittance is different in four stages.

FIG. 2 is an enlarged schematic view showing a photomask for forming a light shielding layer used in Example 4.

FIG. 3 is an enlarged schematic view showing a photomask for forming a colored coating film used in Example 4.

FIG. 4 is an enlarged schematic diagram showing a state in which a photomask is laterally moved once in Example 4.

FIG. 5 is an enlarged schematic view showing a state in which a photomask is laterally moved twice in Example 4.

[Explanation of symbols]

 1: Light transmittance 100% part 2: Light transmittance 25% part 3: Light transmittance 5% part 4: Light transmittance 0% part 5: Light transmittance 0% part 6: First exposure area (light transmittance 100A) 6A: first exposed area 7: second exposed area (light transmittance 100%) 7A: second exposed area 8: third exposed area (light transmittance 100) %) 9: 100% light transmittance portion 10: 0% light transmittance portion

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroyoshi Omiga 3-20-17-3 Shinohara East, Kohoku Ward, Yokohama City, Kanagawa Prefecture (20) Teruhisa Kuroki 3-23-1, Miyauchi, Nakahara Ward, Kawasaki City, Kanagawa Prefecture − 208 (72) Inventor Norikatsu Ono 3-1-47-811 Yatsu, Narashino City, Chiba Prefecture

Claims (3)

[Claims] 1. A method for producing a color filter, which comprises a step of forming a coating film having a desired hue on an object to be coated having electrodes by electrodeposition coating, and before the electrodeposition coating, the object to be coated and the electrodeposition coating. A method for producing a color filter, wherein at least an electrode is brought into contact with an electrodeposition liquid and / or a recovery liquid by relatively moving the liquid and / or the recovery liquid. 2. A state in which a photosensitive resin layer is formed on an object to be coated having (A1) electrodes and the photosensitive resin layer is exposed to light, the solubility of the photosensitive resin layer in a developing solution differs in at least three stages. Pattern exposure so that
(B1) The photosensitive resin layer in the pattern portion is developed and removed,
After exposing the electrodes, at least the exposed electrodes and the electrodeposition liquid and / or the recovery liquid are moved relative to each other for contact treatment, and then electrodeposition coating is performed to form a coating film of a desired hue. A step of forming a coating film having a plurality of hues by sequentially repeating the pattern portions corresponding to the order of increasing or decreasing solubility in the developing solution of the hydrophobic resin layer,
A method for producing a color filter, which comprises: 3. (A2) a step of forming a photosensitive resin layer on an object to be coated having an electrode, exposing the photosensitive resin layer through a photomask and then developing to expose the electrode, and (B2) at least A step of forming a coating film having a desired hue by performing electrodeposition coating after bringing the exposed electrode and the electrodeposition liquid and / or the recovery liquid into contact with each other by moving them relative to each other; A step of exposing the photosensitive resin layer in an area other than the film area through a photomask and then developing to expose the electrode;
2) At least the electrode exposed in the step (C2),
A step of forming a coating film having a hue different from the hue of the step (B2) by electrodeposition coating after the electrodeposition solution and / or the recovery solution are relatively moved and contact-treated, and (E2) A process for producing a color filter, which comprises repeating the steps (C2) and (D2) a required number of times.