JPH08323878A - Biaxially oriented film of syndiotactic polystyrene - Google Patents

Biaxially oriented film of syndiotactic polystyrene

Info

Publication number
JPH08323878A
JPH08323878A JP13063495A JP13063495A JPH08323878A JP H08323878 A JPH08323878 A JP H08323878A JP 13063495 A JP13063495 A JP 13063495A JP 13063495 A JP13063495 A JP 13063495A JP H08323878 A JPH08323878 A JP H08323878A
Authority
JP
Japan
Prior art keywords
film
amax
hsmax
syndiotactic polystyrene
molecular orientation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13063495A
Other languages
Japanese (ja)
Inventor
Tomonori Yoshinaga
知則 吉永
Naonobu Oda
尚伸 小田
Tadashi Okudaira
正 奥平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP13063495A priority Critical patent/JPH08323878A/en
Publication of JPH08323878A publication Critical patent/JPH08323878A/en
Pending legal-status Critical Current

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  • Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)

Abstract

PURPOSE: To improve flatness by a method wherein a biaxially oriented film is constituted of a styrene polymer, having syndiotactic structure satisfying a specified formula and provided with a specified thickness. CONSTITUTION: A biaxially oriented film is constituted of a polystyrene polymer, having syndiotactic structure and satisfying the formula of [Amax/90( deg.)]X[HSmax/R]<=0.01, and is provided with the thickness of 25μm or less. In the case of a sheet type sample, squares, having one side of 100mm long, are cut out of four apexes of a rectangular specimen and the direction of orientation of particles are obtained while the maximum value among the angles of directions of orientations of other three points when the direction of orientation of particles at a measured point at first is specified as 0 deg.. Hsmax is the maximum dimensional changing rate upon the dry heat treatment for 30min at 200 deg.C while contraction is specified so as to be positive. R is equal to Dmm/100mm and the maximum value is 1 (one). D means a distance between a point, whereat the direction of orientation of particles is measured at first, and a point, whereat Amax is shown, and here D is a distance between the intersecting points of diagonals of squares, employed for the measurement.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は金属蒸着後に優れた平面
性を有するシンジオタクチックポリスチレン系二軸延伸
フィルム、さらに詳しく言えば、金属蒸着フィルムコン
デンサー用や包装用フィルムとして用いる場合に、金属
蒸着後に良好な平面性を有する厚さ25μm以下のシン
ジオタクチックポリスチレン系二軸延伸フィルムに関す
るものである。
FIELD OF THE INVENTION The present invention relates to a syndiotactic polystyrene biaxially stretched film having excellent flatness after metal vapor deposition, more specifically, metal vapor deposition film, when used as a film for capacitors or packaging, metal vapor deposition The present invention relates to a syndiotactic polystyrene-based biaxially stretched film having a thickness of 25 μm or less having good flatness.

【0002】[0002]

【従来の技術】シンジオタクチックポリスチレン系二軸
延伸フィルムは耐熱性、電気特性、透明性などに優れた
ものが開発され(特開平1−110122号、同1−1
68709号、同1−182346号、同2−2797
31号、同3−74437号、同3−109453号、
同3−99828号、同3−124427号、同3−1
31644号など)、磁気テープ用、コンデンサー用、
包装用等、各種のフィルム用途に展開が期待されてい
る。特に電気特性を活かしたコンデンサー用途や、耐熱
性を活かした包装用途への展開が期待されている。フィ
ルムコンデンサーの小型化・高容量化に伴い、用いられ
るフィルムは特に金属蒸着フィルムコンデンサーにおい
て年々薄くなる傾向がある。さらに、コンデンサーには
フィルムを積層して用いるため、フィルムの平面性に対
しては金属蒸着前はもちろん、蒸着後でも高い精度が要
求される。これまでのシンジオタクチックポリスチレン
系二軸延伸フィルムは金属蒸着後の平面性が損なわれる
傾向があり、特に厚み25μm以下のフィルムではこの
平面性の乱れが顕著であるため、絶縁破壊電圧の低下な
どコンデンサーとして重要な特性が損なわれていた。ま
た、包装用フィルムとしては従来よりガスバリア性を必
要とする用途にはアルミ蒸着フィルムが用いられること
が多いが、アルミ蒸着後の平面性が悪い場合、製袋時に
歪みが生じるなどの問題が生じる。従来のシンジオタク
チックポリスチレン系二軸延伸フィルムではこの傾向が
あった。特開平6−91750にシンジオタクチックポ
リスチレン系二軸延伸フィルムの平面性を改善する方法
が開示されているが、この方法では金属蒸着前の平面性
は満足されるが金属蒸着処理を施した際の平面性は必ず
しも満足されるものではなかった。
2. Description of the Related Art Syndiotactic polystyrene biaxially stretched films have been developed that have excellent heat resistance, electrical properties, transparency, etc. (Japanese Patent Laid-Open Nos. 1-110122 and 1-11).
68709, 1-182346, 2-2797.
No. 31, No. 3-74437, No. 3-109453,
3-99828, 3-124427, 3-1
31644), magnetic tapes, capacitors,
It is expected to be applied to various film applications such as packaging. In particular, it is expected to be applied to capacitors that make use of electrical characteristics and packaging that makes use of heat resistance. With the miniaturization and higher capacity of film capacitors, the films used tend to become thinner year by year, especially in metal evaporated film capacitors. Further, since a film is used by being laminated on the capacitor, high accuracy is required for the flatness of the film not only before metal deposition but also after metal deposition. Conventional syndiotactic polystyrene-based biaxially stretched films tend to lose flatness after metal deposition, and especially in a film having a thickness of 25 μm or less, this flatness is significantly disturbed, so that the breakdown voltage is lowered. The important characteristics of the condenser were lost. Further, as a packaging film, an aluminum vapor deposition film is often used for applications that conventionally require gas barrier properties, but if the flatness after aluminum vapor deposition is poor, problems such as distortion during bag making occur. . This tendency was observed in the conventional biaxially stretched syndiotactic polystyrene film. Japanese Unexamined Patent Publication (Kokai) No. 6-91750 discloses a method for improving the flatness of a syndiotactic polystyrene biaxially stretched film. In this method, the flatness before metal deposition is satisfied, but when the metal deposition treatment is performed. The flatness of was not always satisfactory.

【0003】[0003]

【発明が解決しようとする課題】金属蒸着を施した後の
平面性を向上させた、厚み25μm以下のシンジオタク
チックポリスチレン系二軸延伸フィルムを提供すること
を目的とする。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a syndiotactic polystyrene biaxially stretched film having a thickness of 25 μm or less, which has improved flatness after metal vapor deposition.

【0004】[0004]

【課題を解決するための手段】本発明者らは金属蒸着後
の平面性を向上させるべく鋭意検討を重ねた結果、シン
ジオタクチックポリスチレン系フィルムのマイクロ波で
求めた分子配向方向のフィルム幅方向となす角度(以下
分子配向角と表記)と、200℃で30分乾熱処理した
際の寸法変化率(以下寸法変化率と表記)とをある範囲
にすることで金属蒸着後の平面性を満足させることが可
能であることを見出し、本発明に到達したものである。
即ち、本発明は下記式(1)によって求められる値が
0.01以下であることを特徴とする厚さ25μm以下
のシンジオタクチックポリスチレン系フィルムに関す
る。 〔Amax/90(°)〕×〔HSmax/R〕 (1) 本発明に用いられるシンジオタクチックポリスチレン系
重合体は、高度なシンジオタクチック構造をとるポリス
チレン系重合体を指すが、高度なシンジオタクチック構
造とは主鎖の炭素−炭素結合が平面ジグザグ構造をとっ
た場合に作る平面に対し、側鎖であるフェニル基又は置
換フェニル基が交互に逆方向に位置する立体構造を有す
るものであるり、そのタクテイシテイは13C核磁気共鳴
法により定量され、本発明に用いられるシンジオタクチ
ックポリスチレン系重合体は、連続する構成単位が2個
の場合のダイアッドで75%以上、好ましくは80%以
上、あるいはペンタッド(構成単位が5個)で30%以
上、好ましくは50%以上のシンジオタクチック構造で
あることが望ましい。該ポリスチレン系重合体として
は、ポリスチレン、ポリ(アルキルスチレン){例えば
ポリ(p-、m-又はo-メチルスチレン)、ポリ(2,4-、2,
5-、3,4-又は3,5-ジメチルスチレン)、ポリ(p-ターシ
ャリーブチルスチレン)など}、ポリ(ハロゲン化スチ
レン){例えばポリ(p-、m-又はo-クロロスチレン)、
ポリ(p-、m-又はo-ブロモスチレン)、ポリ(p-、m-又
はo-フルオロスチレン)、ポリ(o-メチル-p- フルオロ
スチレン)など}、ポリ(ハロゲン置換アルキルスチレ
ン){例えばポリ(p-、m-又はo-クロロメチルスチレ
ン)など}、ポリ(アルコキシスチレン){例えばポリ
(p-、m-又はo-メトキシスチレン)、ポリ(p-、m-又は
o-エトキシスチレン)など}、ポリ(カルボキシアルキ
ルスチレン){例えばポリ(p-、m-又はo-カルボキシメ
チルスチレン)など}、ポリ(アルキルエーテルスチレ
ン){例えばポリ(p-ビニルベンジルプロピル)な
ど}、ポリ(アルキルシリルスチレン){例えばポリ
(p-トリメチルシリルスチレン)など}、さらにはポリ
(ビニルベンジルジメトキシホスファイド)などが挙げ
られる。
Means for Solving the Problems As a result of intensive investigations by the present inventors to improve the flatness after vapor deposition of metal, the molecular orientation direction of the syndiotactic polystyrene-based film in the film width direction determined by microwave Satisfies the flatness after metal deposition by setting the angle (hereinafter referred to as molecular orientation angle) and the dimensional change rate after dry heat treatment at 200 ° C. for 30 minutes (hereinafter referred to as dimensional change rate) to within certain ranges. The inventors have found that it is possible to achieve the present invention and arrived at the present invention.
That is, the present invention relates to a syndiotactic polystyrene film having a thickness of 25 μm or less, characterized in that the value determined by the following formula (1) is 0.01 or less. [Amax / 90 (°)] × [HSmax / R] (1) The syndiotactic polystyrene-based polymer used in the present invention refers to a polystyrene-based polymer having a high syndiotactic structure. The tactic structure has a three-dimensional structure in which phenyl groups or substituted phenyl groups, which are side chains, are alternately located in opposite directions to the plane created when the main chain carbon-carbon bond has a planar zigzag structure. The tacticity thereof is quantified by the 13C nuclear magnetic resonance method, and the syndiotactic polystyrene polymer used in the present invention has a dyad of two consecutive constitutional units of 75% or more, preferably 80% or more. Alternatively, it is desirable that the pentad (5 units) has a syndiotactic structure of 30% or more, preferably 50% or more. . Examples of the polystyrene-based polymer include polystyrene, poly (alkylstyrene) (for example, poly (p-, m- or o-methylstyrene), poly (2,4-, 2,
5-, 3,4- or 3,5-dimethylstyrene), poly (p-tertiarybutylstyrene), etc., poly (halogenated styrene) {eg poly (p-, m- or o-chlorostyrene),
Poly (p-, m- or o-bromostyrene), poly (p-, m- or o-fluorostyrene), poly (o-methyl-p-fluorostyrene), etc.}, poly (halogen-substituted alkylstyrene) { For example, poly (p-, m- or o-chloromethylstyrene), etc., poly (alkoxystyrene) {for example, poly (p-, m- or o-methoxystyrene), poly (p-, m-or
o-ethoxystyrene), etc., poly (carboxyalkylstyrene) {eg poly (p-, m- or o-carboxymethylstyrene) etc., poly (alkyletherstyrene) {eg poly (p-vinylbenzylpropyl) etc. }, Poly (alkylsilylstyrene) {eg, poly (p-trimethylsilylstyrene), etc.}, and further poly (vinylbenzyldimethoxyphosphide) and the like.

【0005】本発明においては、前記ポリスチレン系重
合体のなかで、特にポリスチレンが好適である。また、
本発明で用いるシンジオタクチック構造を有するポリス
チレン系重合体は、必ずしも単一化合物である必要はな
く、シンジオタクティシティが前記範囲内であればアタ
クチック構造やアイソタクチック構造のポリスチレン系
重合体との混合物や、共重合体及びそれらの混合物でも
よい。
In the present invention, polystyrene is particularly preferable among the polystyrene polymers. Also,
The polystyrene polymer having a syndiotactic structure used in the present invention is not necessarily a single compound, and if the syndiotacticity is within the above range, a polystyrene polymer having an atactic structure or an isotactic structure is used. It may be a mixture of, a copolymer and a mixture thereof.

【0006】本発明の二軸延伸シンジオタクチックポリ
スチレンフィルムはシンジオタクチックポリスチレンを
常法で溶融押し出しした後、逐次または同時二軸延伸を
行い、150〜280℃の温度で緊張および/または弛
緩熱固定することによるか、あるいは延伸、熱固定を適
当に組み合わせた製膜順で得られるものであるが、好ま
しくフィルム中央部の雰囲気温度をフィルム端部の雰囲
気温度より高くしたゾーンにおいて横延伸を行い、続い
てフィルム中央部、端部の温度を前段よりそれぞれ10
〜40℃高くしたゾーン(温度は中央部>端部)で2段
目の横延伸を行う行程を含み、さらに好ましくは中央部
と端部の雰囲気温度の差が20〜40℃である必要があ
る。
In the biaxially stretched syndiotactic polystyrene film of the present invention, the syndiotactic polystyrene is melt-extruded by a conventional method, and then sequentially or simultaneously biaxially stretched and subjected to tension and / or relaxation heat at a temperature of 150 to 280 ° C. It can be obtained by fixing, or by a film-forming sequence in which stretching and heat-setting are appropriately combined, but preferably transverse stretching is performed in a zone in which the atmosphere temperature at the center of the film is higher than the atmosphere temperature at the film end. Then, the temperature at the center of the film and the temperature at the edges are 10
It is necessary to include the step of performing the second horizontal stretching in a zone (temperature is the central part> the end part) raised by -40 ° C., and more preferably the difference in the atmospheric temperature between the central part and the end part is 20 to 40 ° C. is there.

【0007】マイクロ波によって求められる分子配向は
主に非晶部分のシンジオタクチックポリスチレン分子鎖
がどの程度並び揃っているかを評価するパラメーターで
ある。測定結果は配向楕円の形で得られ、シンジオタク
チックポリスチレン分子の場合、その強度が弱い方向の
配向が高い。即ちこの楕円の短軸方向に分子鎖が配向し
ている。この短軸方向とフィルム幅方向とのなす角度を
もって分子配向角とする。この値が0°に近づくほど分
子鎖は幅方向に配向し、90°に近づくほど縦方向に配
向していることを表している。発明者らは、このマイク
ロ波により求めた分子配向角がフィルム幅面内で分布を
持っている場合、その最大と最小の差の程度によって金
属蒸着処理後の平面性が左右されることを見出した。即
ちフィルム面内で分子配向角の最大と最小の差が大きい
と金属蒸着処理後の平面性が悪化する傾向があった。但
し、フィルム面内で分子配向角の最大と最小の差が大き
い場合でも200℃で30分乾熱処理した際の寸法変化
率が小さい場合には後加工後の平面性は保たれる傾向が
あることも見い出し、それぞれの値が下記式(1)を満
たす場合には良好な金属蒸着後の平面性が得られること
を見い出した。 〔Amax/90(°)〕×〔HSmax/R〕≦0.01 (1)
The molecular orientation determined by microwaves is a parameter that mainly evaluates the degree of alignment of the syndiotactic polystyrene molecular chains in the amorphous portion. The measurement results are obtained in the form of an orientation ellipse, and in the case of syndiotactic polystyrene molecules, the orientation in the direction of weak strength is high. That is, the molecular chains are oriented in the minor axis direction of this ellipse. The angle formed by the minor axis direction and the film width direction is the molecular orientation angle. As this value approaches 0 °, the molecular chains are oriented in the width direction, and as the value approaches 90 °, they are oriented in the longitudinal direction. The inventors have found that when the molecular orientation angle obtained by this microwave has a distribution within the film width plane, the degree of difference between the maximum and the minimum determines the planarity after the metal deposition treatment. . That is, when the difference between the maximum and the minimum of the molecular orientation angle in the film plane is large, the flatness after the metal deposition treatment tends to deteriorate. However, even if the difference between the maximum and the minimum of the molecular orientation angle in the film plane is large, the flatness after post-processing tends to be maintained if the dimensional change rate is small after dry heat treatment at 200 ° C. for 30 minutes. It was also found that when each value satisfies the following formula (1), good flatness after metal deposition can be obtained. [Amax / 90 (°)] × [HSmax / R] ≦ 0.01 (1)

【0008】実施例 以下に実施例にて本発明を具体的に説明するが、本発明
はこれら実施例のみに限定されるものではない。なお、
フィルムの評価方法を以下に示す。 (1)分子配向角 マイクロ波を用いて主に非晶部の分子鎖の配向状態を評
価できる装置である神崎製紙(株)製 分子配向計(M
OA−2001A)を用いて、ロール状試料の場合は機
械方向に1000mm、機械直交方向に試料全幅の長方形
を切り出し、シート状サンプルの場合は試料形状に内接
する面積最大の長方形を描き、該長方形の頂点と2辺を
共有する100mm四方の正方形を4つの頂点から切り出
し、分子配向方向をマイクロ波によって求め、最初に測
定した点の分子配向方向を0°とし、他の3点の分子配
向方向の角度のうちの最大値を求め、Amaxとした。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. In addition,
The evaluation method of the film is shown below. (1) Molecular Orientation Angle A molecular orientation meter (M, manufactured by Kanzaki Paper Mfg. Co., Ltd.)
OA-2001A) is used to cut out a rectangle of 1000 mm in the machine direction in the case of a roll sample and the full width of the sample in the machine orthogonal direction, and in the case of a sheet sample, draw a rectangle with the largest area inscribed in the sample shape. A 100 mm square that shares two sides with the apex of is cut out from the four apexes, the molecular orientation direction is determined by microwaves, and the molecular orientation direction of the first measured point is 0 °, and the other three points are oriented. The maximum value of the angles was calculated as Amax.

【0009】(2)寸法変化率 分子配向角を求めるために描いた長方形の対角線の交点
を中心に直径50mmの真円を描き、この円より少し大き
くフィルムを切る。このフィルム片を200℃に加熱し
たギアオーブン中に無荷重の状態で吊るし、30分放置
した後取り出してデジタイザーによって寸法変化後の座
標を読み取り、中心を通る直線に沿って最も寸法が変化
した場所の、前述の真円が変化した図形によって切られ
る線分の長さBmmを求め、次の式(1)によって最大寸
法変化方向における寸法変化率(HSmax)を求め
た。 (HSmaxまたはHS200)=(50−B)/50 (1)
(2) Dimensional change rate A true circle with a diameter of 50 mm is drawn around the intersection of the diagonal lines of the rectangle drawn to determine the molecular orientation angle, and the film is cut slightly larger than this circle. This film piece is hung in a gear oven heated to 200 ° C with no load, left for 30 minutes, taken out, the coordinates after dimension change are read by a digitizer, and the location where the dimension changes most along a straight line passing through the center The length Bmm of the line segment cut by the above-described figure in which the perfect circle is changed was obtained, and the dimensional change rate (HSmax) in the maximum dimensional change direction was obtained by the following equation (1). (HSmax or HS200) = (50−B) / 50 (1)

【0010】(3)蒸着後の平面性 真空蒸着機を用いてアルミニウムをフィルムの片面に蒸
着した。このときの加熱手段は誘導加熱方式を用い、真
空度 4×10-4torr、蒸着速度 3000Å/s
ecの条件で蒸着膜の厚さが500Åとなるように蒸着
した後、次の基準に従い、1級〜5級のランク付けを行
った。 1級;強い張力をかけても波打ち全面にあり 2級;強い張力をかけても波打ち一部あり 3級;強い張力をかけると波打ちなし 4級;弱い張力をかけると波打ちなし 5級;張力をかけなくても波打ちなし
(3) Flatness after vapor deposition Aluminum was vapor-deposited on one side of the film using a vacuum vapor deposition machine. At this time, an induction heating method is used as a heating means, the degree of vacuum is 4 × 10 −4 torr, and the vapor deposition rate is 3000 Å / s.
After the vapor deposition was carried out under the condition of ec so that the thickness of the vapor deposition film would be 500 Å, the grades 1 to 5 were ranked according to the following criteria. 1st grade; there is a wavy surface even with strong tension 2nd grade; there is some wavy even with strong tension 3rd grade; no waviness when strong tension is applied 4th grade; no waviness when weak tension is applied 5th grade; tension No waviness without applying

【0011】実施例1 滑剤として、平均粒子径0.5μm、ばらつき度20
%、面積形状係数80%のシリカをシンジオタクチック
ポリスチレン(重量平均分子量250,000)99.
5重量%に対して0.5重量%添加したポリマーチップ
と、滑剤の添加されていないポリマーチップを重量比で
2対8の割合で混合した後、乾燥し、290℃で溶融
し、800μmのリップギャップのTダイから押し出
し、50℃の冷却ロールに静電印荷法により密着 冷却
固化し、厚み約350μmの無定形シートを得た。該無
定形シートをまず表面温度350℃に加熱した赤外線加
熱ヒーターをフィルムとの距離20mmで予熱した後、
連続して表面温度130℃に加熱したゴムロールを用い
て縦方向に1.8倍延伸した後、表面温度110℃に加
熱したセラミックロールを用いて縦方向に2.20倍延
伸した。次にテンターで、110℃で予熱し、フィルム
中央部の雰囲気が150℃、フィルム端部の雰囲気が1
20℃となるようにしたゾーンに於いて横方向に1.8
倍延伸し、さらにフィルムを冷却することなく、フィル
ム中央部の雰囲気が170℃、フィルム端部の雰囲気が
140℃となるようにしたゾーンに於いて横方向に1.
8倍延伸した。次いで、260℃で緊張熱固定、230
℃で幅方向に3%弛緩処理を連続で行い、厚み23μm
のフィルムを得た。このフィルムは、Amax=18.
5°、HSmax=0.042、D=1300mmであっ
た。従って、〔Amax/90(°)〕×〔HSmax
/R〕=0.0086であった。このフィルムの蒸着後
の平面性は5級であった。
Example 1 As a lubricant, the average particle size was 0.5 μm and the degree of dispersion was 20.
%, Silica having an area shape factor of 80% is syndiotactic polystyrene (weight average molecular weight 250,000) 99.
Polymer chips added with 0.5 wt% to 5 wt% and polymer chips without added lubricant were mixed at a weight ratio of 2 to 8, then dried and melted at 290 ° C. It was extruded from a T-die having a lip gap, and was brought into close contact with a cooling roll at 50 ° C. by an electrostatic loading method to be cooled and solidified to obtain an amorphous sheet having a thickness of about 350 μm. The amorphous sheet is first preheated with an infrared heater heated to a surface temperature of 350 ° C. at a distance of 20 mm from the film,
After continuously stretching 1.8 times in the machine direction using a rubber roll heated to a surface temperature of 130 ° C., it was stretched 2.20 times in the machine direction using a ceramic roll heated to a surface temperature of 110 ° C. Next, preheat at 110 ° C with a tenter, the atmosphere at the center of the film is 150 ° C, and the atmosphere at the edges of the film is 1
1.8 in the lateral direction in the zone where the temperature was set to 20 ° C.
The film was stretched twice and further cooled without cooling the film. In the zone where the atmosphere at the center of the film was 170 ° C. and the atmosphere at the film edge was 140 ° C., 1.
It was stretched 8 times. Then, heat fixing with tension at 260 ° C, 230
3% relaxation treatment continuously in the width direction at ℃, thickness 23μm
Was obtained. This film has Amax = 18.
5 °, HSmax = 0.042, D = 1300 mm. Therefore, [Amax / 90 (°)] × [HSmax
/ R] was 0.0086. The flatness of this film after vapor deposition was grade 5.

【0012】実施例2 実施例1と同様の条件で溶融押し出しし、厚さ140μ
mの無定形シートを得、縦延伸を実施例1と同じ条件で
行った。次いでテンターで、110℃で予熱し、フィル
ム中央部の雰囲気が140℃、フィルム端部の雰囲気が
120℃となるようにしたゾーンに於いて横方向に1.
5倍延伸し、さらにフィルムを冷却することなく、フィ
ルム中央部の雰囲気が170℃、フィルム端部の雰囲気
が140℃となるようにしたゾーンに於いて横方向に
2.13倍延伸した。次いで、260℃で緊張熱固定、
230℃で幅方向に3%弛緩処理を連続で行い、厚み
8.5μmのフィルムを得た。このフィルムは、Ama
x=13.0°、HSmax=0.034、D=116
0mmであった。従って、〔Amax/90(°)〕×
〔HSmax/R〕=0.0049であった。このフィ
ルムの蒸着後の平面性は5級であった。
Example 2 Melt extrusion was performed under the same conditions as in Example 1 to obtain a thickness of 140 μm.
A m-shaped amorphous sheet was obtained, and longitudinal stretching was performed under the same conditions as in Example 1. Then, by preheating with a tenter at 110 ° C., the atmosphere at the center of the film was 140 ° C. and the atmosphere at the edge of the film was 120 ° C.
The film was stretched 5 times, and further, without cooling the film, it was stretched 2.13 times in the transverse direction in a zone in which the atmosphere at the center of the film was 170 ° C. and the atmosphere at the edge of the film was 140 ° C. Then, heat fixing with tension at 260 ° C,
A relaxation treatment of 3% was continuously performed in the width direction at 230 ° C. to obtain a film having a thickness of 8.5 μm. This film is Ama
x = 13.0 °, HSmax = 0.034, D = 116
It was 0 mm. Therefore, [Amax / 90 (°)] ×
[HSmax / R] was 0.0049. The flatness of this film after vapor deposition was grade 5.

【0013】実施例3 実施例1と同様にして厚さ300μmの無定形シートを
得、縦延伸を実施例1と同じ条件で行い、次いでテンタ
ーで、110℃で予熱し、フィルム中央部の雰囲気が1
50℃、フィルム端部の雰囲気が120℃となるように
したゾーンに於いて横方向に1.8倍延伸し、フィルム
中央部の雰囲気が180℃、フィルム端部の雰囲気が1
40℃となるようにしたゾーンに於いて横方向に1.8
倍延伸した。次いで、260℃で緊張熱固定、230℃
で幅方向に3%弛緩処理を連続で行い、厚み20μmの
フィルムを得た。このフィルムは、Amax=19.6
°、HSmax=0.040、D=890mmであった。
従って、〔Amax/90(°)〕×〔HSmax/
R〕=0.0098であった。このフィルムの蒸着後の
平面性は4級であった。
Example 3 An amorphous sheet having a thickness of 300 μm was obtained in the same manner as in Example 1, longitudinal stretching was carried out under the same conditions as in Example 1, and then preheated at 110 ° C. in a tenter, and the atmosphere in the center of the film was changed. Is 1
The film was stretched 1.8 times in the transverse direction in a zone where the atmosphere at the film edge was 120 ° C. at 50 ° C., the atmosphere at the center of the film was 180 ° C., and the atmosphere at the film edge was 1.
1.8 in the lateral direction in the zone where the temperature was set to 40 ° C.
It was stretched twice. Then, heat fixing at 260 ℃, 230 ℃
Then, 3% relaxation treatment was continuously performed in the width direction to obtain a film having a thickness of 20 μm. This film has Amax = 19.6.
°, HSmax = 0.040, D = 890 mm.
Therefore, [Amax / 90 (°)] × [HSmax /
R] was 0.0098. The flatness of this film after vapor deposition was grade 4.

【0014】実施例4 溶融押し出し、縦延伸及び横延伸を実施例1と同じ条件
で行い、次いで、240℃で緊張熱固定、220℃で幅
方向に3%弛緩処理を連続で行い、厚み22μmのフィ
ルムを得た。このフィルムは、Amax=17.3°、
HSmax=0.051、D=1005mmであった。従
って、〔Amax/90(°)〕×〔HSmax/R〕
=0.0098であった。このフィルムの蒸着後の平面
性は3級であった。
Example 4 Melt extrusion, longitudinal stretching and transverse stretching were carried out under the same conditions as in Example 1, followed by tension heat fixing at 240 ° C. and continuous 3% relaxation treatment at 220 ° C. in the width direction to give a thickness of 22 μm. I got a film of. This film has Amax = 17.3 °,
HSmax = 0.051 and D = 1005 mm. Therefore, [Amax / 90 (°)] × [HSmax / R]
= 0.0098. The flatness of this film after vapor deposition was grade 3.

【0015】実施例5 実施例2と同様にフィルムを製膜し、鋏を用いて任意の
形に切り、試料を得た。このフィルムは、Amax=
6.0°、HSmax=0.034、D=450mmであ
った。従って、〔Amax/90(°)〕×〔HSma
x/R〕=0.0050であった。このフィルムの蒸着
後の平面性は5級であった。
Example 5 A film was formed in the same manner as in Example 2 and cut into arbitrary shapes with scissors to obtain a sample. This film has Amax =
It was 6.0 °, HSmax = 0.034, and D = 450 mm. Therefore, [Amax / 90 (°)] × [HSma
x / R] = 0.0050. The flatness of this film after vapor deposition was grade 5.

【0016】比較例1 実施例1と同様にして溶融押し出しし、厚さ250μm
の無定形シートを得、表面温度260℃に加熱した赤外
線加熱ヒーターをフィルムとの距離20mmで予熱した
後、連続して130℃に加熱したゴムロールを用いて縦
方向に3.2倍延伸する。次にテンターを用い、110
℃で予熱し、横方向に120℃で3.2倍延伸し、26
0℃で緊張熱固定した後、230℃で幅方向に3%弛緩
処理し、厚み22μmのフィルムを得た。このフィルム
は、Amax=23.0°、HSmax=0.037、
D=835mmであった。従って、〔Amax/90
(°)〕×〔HSmax/R〕=0.0113であっ
た。このフィルムの蒸着後の平面性は2級であった。
Comparative Example 1 Melt extrusion was carried out in the same manner as in Example 1 to obtain a thickness of 250 μm.
The amorphous sheet is obtained, preheated with an infrared heater heated to a surface temperature of 260 ° C. at a distance of 20 mm from the film, and continuously stretched 3.2 times in the machine direction using a rubber roll heated to 130 ° C. Next, using a tenter, 110
Preheat at ℃, and then draw 3.2 times transversely at 120 ℃, 26
After fixing by tension heat at 0 ° C., relaxation treatment was performed at 230 ° C. in the width direction by 3% to obtain a film having a thickness of 22 μm. This film has Amax = 23.0 °, HSmax = 0.037,
It was D = 835 mm. Therefore, [Amax / 90
(°)] × [HSmax / R] = 0.113. The flatness of this film after vapor deposition was grade 2.

【0017】比較例2 実施例1と縦延伸工程までを同じ条件で行い、横延伸を
テンターを用い、110℃で予熱し、横方向に120℃
で3.5倍延伸し、220℃で熱固定した後、200℃
で幅方向に2%弛緩処理し、厚み24μmのフィルムを
得た。このフィルムは、Amax=19.7°、HSm
ax=0.065、D=1260mmであった。従って、
〔Amax/90(°)〕×〔HSmax/R〕=0.
0142であった。このフィルムの蒸着後の平面性は1
級であった。
Comparative Example 2 The same steps as in Example 1 up to the longitudinal stretching step were carried out, the transverse stretching was preheated at 110 ° C. using a tenter, and 120 ° in the transverse direction.
Stretched 3.5 times and heat set at 220 ℃, then 200 ℃
Was subjected to 2% relaxation treatment in the width direction to obtain a film having a thickness of 24 μm. This film has Amax = 19.7 °, HSm
It was ax = 0.065 and D = 1260 mm. Therefore,
[Amax / 90 (°)] × [HSmax / R] = 0.
It was 0142. The flatness of this film after vapor deposition is 1
It was class.

【0018】比較例3 溶融押し出し、縦延伸、及び横延伸を比較例1と同じ条
件で行い、緊張及び弛緩熱固定条件を比較例2と同様に
して厚み23μmのフィルムを得た。このフィルムは、
Amax=26.2°、HSmax=0.067、D=
1100mmであった。従って、〔Amax/90
(°)〕×〔HSmax/R〕=0.0195であっ
た。このフィルムの蒸着後の平面性は1級であった。実
施例1、2、3、4、5、比較例1、2、3の物性と評
価結果を表1に示す。
Comparative Example 3 Melt extrusion, longitudinal stretching, and transverse stretching were performed under the same conditions as in Comparative Example 1, and tension and relaxation heat fixation conditions were the same as in Comparative Example 2 to obtain a film having a thickness of 23 μm. This film is
Amax = 26.2 °, HSmax = 0.067, D =
It was 1100 mm. Therefore, [Amax / 90
(°)] × [HSmax / R] = 0.195. The flatness of this film after vapor deposition was first grade. Table 1 shows the physical properties and evaluation results of Examples 1, 2, 3, 4, 5, and Comparative Examples 1, 2, and 3.

【0019】[0019]

【表1】 〔Amax/90(°)〕×〔HSmax/R〕 (1) 表1より、実施例1、2、3、4、5は金属蒸着後の平
面性に優れることがわかる。
[Table 1] [Amax / 90 (°)] × [HSmax / R] (1) From Table 1, it can be seen that Examples 1, 2, 3, 4, and 5 are excellent in flatness after metal deposition.

【0020】[0020]

【発明の効果】本発明は分子配向角と寸法変化率とを前
記特許請求の範囲の記載の通りにすることにより、金属
蒸着後の平面性に極めて優れた厚み25μm以下のシン
ジオタクチックポリスチレン系二軸延伸フィルムを提供
することが可能となる。
EFFECTS OF THE INVENTION In the present invention, the molecular orientation angle and the dimensional change rate are set as described in the above-mentioned claims, so that the syndiotactic polystyrene system having a thickness of 25 μm or less, which is extremely excellent in flatness after metal deposition. It is possible to provide a biaxially stretched film.

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成7年7月24日[Submission date] July 24, 1995

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0011[Correction target item name] 0011

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0011】実施例1 滑剤として、平均粒子径0.5μm、ばらつき度20
%、面積形状係数80%のシリカをシンジオタクチック
ポリスチレン(重量平均分子量250,000)99.
5重量%に対して0.5重量%添加したポリマーチップ
と、滑剤の添加されていないポリマーチップを重量比で
2対8の割合で混合した後、乾燥し、290℃で溶融
し、800μmのリップギャップのTダイから押し出
し、50℃の冷却ロールに静電印荷法により密着 冷却
固化し、厚み約350μmの無定形シートを得た。該無
定形シートをまず表面温度350℃に加熱した直径10
mmの棒状窒化硅素製赤外線ヒーター3本(反射した赤
外線がフィルムにが当たるように調製したステンレス製
の傘を有する)を用いて、フィルムとの距離20mmで
予熱した後、連続して表面温度130℃に加熱したゴム
ロールを用いて縦方向に1.8倍延伸した後、表面温度
110℃に加熱したセラミックロールを用いて縦方向に
2.20倍延伸した。次にテンターで、110℃で予熱
し、フィルム中央部の雰囲気が150℃、フィルム端部
の雰囲気が120℃となるようにしたゾーンに於いて横
方向に1.8倍延伸し、さらにフィルムを冷却すること
なく、フィルム中央部の雰囲気が170℃、フィルム端
部の雰囲気が140℃となるようにしたゾーンに於いて
横方向に1.8倍延伸した。次いで、260℃で緊張熱
固定、230℃で幅方向に3%弛緩処理を連続で行い、
厚み23μmのフィルムを得た。このフィルムは、Am
ax=18.5°、HSmax=0.042、D=13
00mmであった。従って、〔Amax/90(°)〕×
〔HSmax/R〕=0.0086であった。このフィ
ルムの蒸着後の平面性は5級であった。
Example 1 As a lubricant, the average particle size was 0.5 μm and the degree of dispersion was 20.
%, Silica having an area shape factor of 80% is syndiotactic polystyrene (weight average molecular weight 250,000) 99.
Polymer chips added with 0.5 wt% to 5 wt% and polymer chips without added lubricant were mixed at a weight ratio of 2 to 8, then dried and melted at 290 ° C. It was extruded from a T-die having a lip gap, and was brought into close contact with a cooling roll at 50 ° C. by an electrostatic loading method to be cooled and solidified to obtain an amorphous sheet having a thickness of about 350 μm. First, the amorphous sheet was heated to a surface temperature of 350 ° C. to obtain a diameter of 10
3 mm rod-shaped silicon nitride infrared heaters (reflected red
Made of stainless steel so that the outside wire hits the film
(With an umbrella) , preheated at a distance of 20 mm from the film, and continuously stretched 1.8 times in the machine direction using a rubber roll heated to a surface temperature of 130 ° C., and then heated to a surface temperature of 110 ° C. Using the above-mentioned ceramic roll, it was drawn 2.20 times in the machine direction. Next, the film was preheated with a tenter at 110 ° C. and stretched 1.8 times in the transverse direction in a zone in which the atmosphere at the center of the film was 150 ° C. and the atmosphere at the edges of the film was 120 ° C., and the film was further stretched. Without cooling, the film was stretched laterally 1.8 times in a zone in which the atmosphere at the center of the film was 170 ° C. and the atmosphere at the edge of the film was 140 ° C. Next, tension heat fixing is performed at 260 ° C., and 3% relaxation treatment is continuously performed at 230 ° C. in the width direction,
A film having a thickness of 23 μm was obtained. This film is Am
ax = 18.5 °, HSmax = 0.042, D = 13
It was 00 mm. Therefore, [Amax / 90 (°)] ×
[HSmax / R] was 0.0086. The flatness of this film after vapor deposition was grade 5.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 実質的にシンジオタクチック構造を有す
るスチレン系重合体から成り、下記式(1)を満足す
る、厚さ25μm以下のシンジオタクチックポリスチレ
ン系二軸延伸フィルム。 〔Amax/90(°)〕×〔HSmax/R〕≦0.01 (1) Amax :ロール状試料の場合は機械方向に1000
mm、機械直交方向に試料全幅の長方形を切り出し、シー
ト状サンプルの場合は試料形状に内接する面積最大の長
方形を描き、該長方形の頂点と2辺を共有する100mm
四方の正方形を4つの頂点から切り出し、分子配向方向
をマイクロ波によって求め、最初に測定した点の分子配
向方向を0°とした時の他の3点の分子配向方向の角度
のうちの最大値(単位:°) HSmax:200℃で30分乾熱処理した際の最大の
寸法変化をおこした方向での寸法変化率(収縮を正で表
す) R=Dmm/1000mm:ただし、Rが1を越える場合に
は1とする。 D :分子配向方向を求めた時の最初に測定した
点とAmaxを示した点との距離。ただし、分子配向方
向測定に用いた正方形の対角線の交点間の距離をいう。
1. A biaxially stretched syndiotactic polystyrene film having a thickness of 25 μm or less, which is substantially made of a styrene polymer having a syndiotactic structure and satisfies the following formula (1). [Amax / 90 (°)] × [HSmax / R] ≦ 0.01 (1) Amax: 1000 in the machine direction in the case of a roll sample
mm, a rectangle with the full width of the sample is cut out in the machine orthogonal direction, and in the case of a sheet-like sample, draw a rectangle with the largest area inscribed in the sample shape, and 100 mm that shares two sides with the vertex of the rectangle.
A square is cut out from four vertices, the molecular orientation direction is determined by microwaves, and the maximum value of the angles of the other three points when the molecular orientation direction of the first measured point is 0 ° (Unit: °) HSmax: Dimensional change rate in the direction of maximum dimensional change during dry heat treatment at 200 ° C for 30 minutes (shrinkage is expressed as positive) R = Dmm / 1000mm: However, R exceeds 1 In this case, set to 1. D: Distance between the first measured point and the point indicating Amax when the molecular orientation direction was determined. However, it refers to the distance between the intersections of the square diagonals used for measuring the molecular orientation direction.
【請求項2】 請求項1記載のフィルムのAmaxが2
0°以下であることを特徴とするシンジオタクチックポ
リスチレン系二軸延伸フィルム。
2. The Amax of the film according to claim 1 is 2
A biaxially stretched syndiotactic polystyrene film, which is 0 ° or less.
【請求項3】 請求項1記載のフィルムの200℃で3
0分乾熱処理した際の最大の寸法変化を起こした方向で
の寸法変化率(収縮を正で表す)が−0.05〜0.0
5であることを特徴とするシンジオタクチックポリスチ
レン系二軸延伸フィルム。
3. The film according to claim 1 at 3 ° C. at 3 ° C.
The dimensional change rate (contraction is expressed as positive) in the direction in which the maximum dimensional change occurs during 0 minute dry heat treatment is -0.05 to 0.0
5. A syndiotactic polystyrene-based biaxially stretched film which is No. 5.
JP13063495A 1995-05-29 1995-05-29 Biaxially oriented film of syndiotactic polystyrene Pending JPH08323878A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13063495A JPH08323878A (en) 1995-05-29 1995-05-29 Biaxially oriented film of syndiotactic polystyrene

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13063495A JPH08323878A (en) 1995-05-29 1995-05-29 Biaxially oriented film of syndiotactic polystyrene

Publications (1)

Publication Number Publication Date
JPH08323878A true JPH08323878A (en) 1996-12-10

Family

ID=15038946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13063495A Pending JPH08323878A (en) 1995-05-29 1995-05-29 Biaxially oriented film of syndiotactic polystyrene

Country Status (1)

Country Link
JP (1) JPH08323878A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021070863A1 (en) * 2019-10-11 2021-04-15 王子ホールディングス株式会社 Resin composition suitable for use as film for film capacitor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021070863A1 (en) * 2019-10-11 2021-04-15 王子ホールディングス株式会社 Resin composition suitable for use as film for film capacitor

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