JPH08319575A - Method for metal-plating carbon fine grain - Google Patents

Method for metal-plating carbon fine grain

Info

Publication number
JPH08319575A
JPH08319575A JP12654495A JP12654495A JPH08319575A JP H08319575 A JPH08319575 A JP H08319575A JP 12654495 A JP12654495 A JP 12654495A JP 12654495 A JP12654495 A JP 12654495A JP H08319575 A JPH08319575 A JP H08319575A
Authority
JP
Japan
Prior art keywords
carbon fine
plating
metal
spherulite
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12654495A
Other languages
Japanese (ja)
Inventor
Kiyoharu Takeda
清春 竹田
Mikio Miyake
幹夫 三宅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUJI SEIKO HONSHA
Fuji Seiko Honsha Co Ltd
Original Assignee
FUJI SEIKO HONSHA
Fuji Seiko Honsha Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUJI SEIKO HONSHA, Fuji Seiko Honsha Co Ltd filed Critical FUJI SEIKO HONSHA
Priority to JP12654495A priority Critical patent/JPH08319575A/en
Publication of JPH08319575A publication Critical patent/JPH08319575A/en
Pending legal-status Critical Current

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  • Inorganic Compounds Of Heavy Metals (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE: To form a uniform metallic film on the surface of carbon fine grains. CONSTITUTION: Carbon fine grains constituted of mesophase spherulites are subjected to oxidation treatment, are deposited with Pd (NH3 )4 Cl2 by impregnation and are applied with electroless plating. By the oxidation treatment, acidic functional groups are introduced into the surface of the spherulites, Pd is deposided over the acidic functional groups, and by the electroless plating, a uniform metallic film can be formed via Pd.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、炭素微粒子の表面に
均一な金属皮膜を形成することができる炭素微粒子の金
属めっき方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for metal plating of carbon fine particles capable of forming a uniform metal coating on the surface of carbon fine particles.

【0002】[0002]

【従来の技術】粒径数μm程度の炭素微粒子の表面に強
磁性の金属皮膜を形成することにより、回転軸受の真空
シール用磁性流体や、電磁波シールド用塗料の充填材等
を得ることができる。また、一般的な導電性の金属皮膜
を形成することにより、導電性のトナーや充填材などの
用途に使用することができる。
2. Description of the Related Art By forming a ferromagnetic metal film on the surface of carbon fine particles having a particle size of several μm, it is possible to obtain a magnetic fluid for a vacuum seal of a rotary bearing, a filler of a paint for electromagnetic wave shielding and the like. . Further, by forming a general conductive metal film, it can be used for applications such as conductive toner and filler.

【0003】一方、粉体に対する金属めっき方法とし
て、いわゆるシランカップリング法が知られている。こ
のものは、まず、水とエタノールとからなる混合溶媒に
アミノシランカップリング剤を稀釈し、粉体を投入する
ことによってシランカップリング処理を施す。次いで、
化学結合によってPdを粉体に担持させ、Pdに対して
無電解金属めっきを施す。
On the other hand, a so-called silane coupling method is known as a metal plating method for powder. This product is first subjected to a silane coupling treatment by diluting an aminosilane coupling agent in a mixed solvent consisting of water and ethanol and introducing powder. Then
Pd is supported on the powder by chemical bonding, and Pd is subjected to electroless metal plating.

【0004】[0004]

【発明が解決しようとする課題】かかる従来技術による
ときは、シランカップリング剤が猛毒であるために、取
扱いが厄介であり、作業管理が極めて面倒であるという
問題が避けられなかった。また、炭素微粒子として一般
的なカーボンブラックを使用すると、全体が塊状に凝集
し易く、各粒子の表面に均一な皮膜を形成することが極
めて困難であるという問題があった。
In the prior art, however, the problem that the silane coupling agent is extremely poisonous, the handling is troublesome, and the work management is extremely troublesome is unavoidable. Further, when general carbon black is used as the carbon fine particles, there is a problem that the whole is easily aggregated in a lump and it is extremely difficult to form a uniform film on the surface of each particle.

【0005】そこで、この発明の目的は、かかる従来技
術の問題に鑑み、炭素微粒子としてメソフェーズ球晶を
使用し、シランカップリング処理に代えてPd(N
3 4Cl2 の含浸担持を採用することによって、取
扱いや作業管理が容易であり、各粒子の表面に均一な金
属皮膜を形成することができる炭素微粒子の金属めっき
方法を提供することにある。
Therefore, in view of the problems of the prior art, an object of the present invention is to use mesophase spherulites as carbon fine particles, and replace Pd (N) with silane coupling treatment.
To provide a metal plating method for carbon fine particles, which is easy to handle and manage by employing H 3 ) 4 Cl 2 impregnated and supported and which can form a uniform metal film on the surface of each particle. is there.

【0006】[0006]

【課題を解決するための手段】かかる目的を達成するた
めのこの発明の構成は、メソフェーズ球晶からなる炭素
微粒子を酸化処理し、Pd(NH3 4 Cl2 を含浸担
持させ、無電解めっきを施すことをその要旨とする。
Means for Solving the Problems The constitution of the present invention for attaining the above object is to carry out oxidation treatment of carbon fine particles composed of mesophase spherulites, impregnate and carry Pd (NH 3 ) 4 Cl 2, and carry out electroless plating. The point is to apply.

【0007】なお、無電解めっきをするに際し、還元
剤、錯化剤を併用することができる。
When performing electroless plating, a reducing agent and a complexing agent can be used together.

【0008】また、無電解めっきをするに際し、めっき
液のpHを制御してもよい。
When performing electroless plating, the pH of the plating solution may be controlled.

【0009】[0009]

【作用】かかる発明の構成によるときは、メソフェーズ
球晶は、芳香環のエッジ部が表面に露出するラメラ構造
からなるため、酸化処理することにより、水酸基、カル
ボキシル基等の親水性の酸性官能基を表面に導入するこ
とができる。なお、酸化処理は、適当な濃度の硝酸、硫
酸、過酸化水素等の酸化剤水溶液に浸漬し、または空気
中において加熱処理して行なうことができる。
According to the structure of the invention, the mesophase spherulites have a lamellar structure in which the edge portion of the aromatic ring is exposed on the surface. Therefore, by oxidation treatment, hydrophilic acidic functional groups such as hydroxyl groups and carboxyl groups are formed. Can be introduced to the surface. The oxidation treatment can be carried out by immersing in an oxidant aqueous solution of nitric acid, sulfuric acid, hydrogen peroxide or the like having an appropriate concentration, or by performing heat treatment in the air.

【0010】Pd(NH3 4 Cl2 の含浸担持は、た
とえば、Pd(NH3 4 Cl2 の5mM水溶液(pH
11)中に酸化処理済の球晶を投入し、減圧する。球晶
表面の酸性官能基は、強アルカリ性水溶液中においてプ
ロトンを放出し、負に帯電しているから、[Pd(NH
3 4 2+を容易に吸着することができる。
Pd (NH 3 ) 4 Cl 2 is impregnated and supported by, for example, a 5 mM aqueous solution of Pd (NH 3 ) 4 Cl 2 (pH:
The spherulite that has been subjected to the oxidation treatment is put into 11) and the pressure is reduced. Since the acidic functional group on the surface of the spherulite releases a proton in a strongly alkaline aqueous solution and is negatively charged, [Pd (NH
3 ) 4 ] 2+ can be easily adsorbed.

【0011】無電解めっきは、めっき浴による。Ni源
またはCu源と、還元剤、錯化剤とからなるめっき液を
調合し、Pdを担持させた球晶を投入すると、均一なN
i皮膜またはCu皮膜を球晶表面に形成することができ
る。
The electroless plating depends on a plating bath. A plating solution composed of a Ni source or a Cu source, a reducing agent, and a complexing agent is prepared, and a spherulite carrying Pd is added to obtain a uniform N.
An i coating or a Cu coating can be formed on the spherulite surface.

【0012】なお、Ni源としては、硫酸ニッケル、塩
化ニッケル等を使用することができ、Cu源としては、
硫酸銅、塩化銅等を使用することができる。また、還元
剤としては、次亜リン酸ナトリウム、水素化ホウ素カリ
ウム、ヒドラジン等が使用でき、錯化剤としては、リン
ゴ酸2ナトリウム、アンモニア、エチレンジアミン、グ
リシン、ピリジン等を使用することができる。還元剤
は、球晶表面のPdを還元し、錯化剤は、めっき液の劣
化を防止する。
As the Ni source, nickel sulfate, nickel chloride or the like can be used, and as the Cu source,
Copper sulfate, copper chloride, etc. can be used. Further, sodium hypophosphite, potassium borohydride, hydrazine and the like can be used as the reducing agent, and disodium malate, ammonia, ethylenediamine, glycine, pyridine and the like can be used as the complexing agent. The reducing agent reduces Pd on the surface of the spherulite, and the complexing agent prevents deterioration of the plating solution.

【0013】無電解めっきをするに際し、NaOH水溶
液等によりpHを一定に制御すれば、一層均一な厚膜を
球晶表面に形成することが可能である。
When electroless plating is performed, if the pH is controlled to be constant with an aqueous solution of NaOH, a more uniform thick film can be formed on the spherulite surface.

【0014】[0014]

【発明の効果】以上説明したように、この発明によれ
ば、メソフェーズ球晶を使用し、Pd(NH3 )Cl2
の含浸担持を採用することによって、親水性の酸化官能
基を介して球晶表面にPdを一様に担持させることがで
き、このPdを介して均一な金属皮膜を形成することが
できるから、全体としての取扱いや作業管理が容易であ
る上、得られる製品品質も極めて良好であるという優れ
た効果がある。
As described above, according to the present invention, mesophase spherulites are used and Pd (NH 3 ) Cl 2 is used.
By adopting the impregnating and supporting method, it is possible to uniformly support Pd on the spherulite surface through the hydrophilic oxidation functional group, and a uniform metal film can be formed through this Pd. There is an excellent effect that the handling and the work management as a whole are easy and the quality of the obtained product is extremely good.

【0015】[0015]

【実施例1】粒径6μmのメソフェーズ球晶からなる炭
素微粒子を20%硝酸水溶液に投入し、100℃で10
時間酸化処理した。未処理の球晶表面には、殆んど酸性
官能基が存在しないが、酸化処理後の球晶表面には、5
0mg当り約175μmolの酸性官能基が存在した。
Example 1 Carbon fine particles having a particle size of 6 μm and made of mesophase spherulite were put into a 20% aqueous nitric acid solution, and the mixture was heated at 100 ° C.
Oxidized for a period of time. Almost no acidic functional groups were present on the untreated spherulite surface, but 5 on the spherulite surface after oxidation treatment.
There was about 175 μmol acidic functional group per 0 mg.

【0016】酸化処理した球晶は、Pd(NH3 4
2 の5mM水溶液(pH11)中に投入し、エバポレ
ータを用いて90℃で3時間Pdを含浸担持させた。な
お、球晶の投入量は、水溶液20ml当り58.2mg
とした。
The oxidized spherulites are Pd (NH 3 ) 4 C
was placed in l 2 of 5mM aqueous (pH 11), it was impregnated bearing 3 hours Pd at 90 ° C. using an evaporator. The amount of spherulite added was 58.2 mg per 20 ml of the aqueous solution.
And

【0017】含浸担持後の球晶は、Pdによって表面が
一様に被覆されており、球晶自体の凝集やPdの凝集は
見られなかった。
The surface of the spherulites after impregnated and supported was uniformly covered with Pd, and neither agglomeration of spherulites nor agglomeration of Pd was observed.

【0018】次に、硫酸ニッケル2.5mmol、次亜
リン酸ナトリウム6.5mmol、リンゴ酸2ナトリウ
ム2.5mmolを含むめっき液200mlに対し、P
dを含浸担持させた球晶50mgを投入し、NaOH水
溶液によってpH7.0を保持しながら60℃で30分
撹拌することにより、Pdの還元および無電解Niめっ
きを行なった。
Next, P was added to 200 ml of a plating solution containing nickel sulfate 2.5 mmol, sodium hypophosphite 6.5 mmol, and disodium malate 2.5 mmol.
50 mg of spherulite in which d was impregnated and supported was charged, and Pd was reduced and electroless Ni plating was performed by stirring at 60 ° C. for 30 minutes while maintaining pH 7.0 with an aqueous NaOH solution.

【0019】得られた球晶は、Niによって表面が一様
に被覆されており、凝集も見られなかった。なお、Ni
の膜厚は、約0.8μmであり、その飽和磁化は、バル
クNiの飽和磁化が58.6emu/gであるのに対
し、27emu/gであった。
The surface of the obtained spherulite was uniformly covered with Ni, and no aggregation was observed. Note that Ni
Had a film thickness of about 0.8 μm, and its saturation magnetization was 27 emu / g, whereas the saturation magnetization of bulk Ni was 58.6 emu / g.

【0020】[0020]

【実施例2】実施例1において、無電解めっきをするに
際し、pH8.0に保持することにより、Niの膜厚を
約2μmにすることができた。
Example 2 In Example 1, by maintaining the pH at 8.0 during electroless plating, the film thickness of Ni could be about 2 μm.

【0021】[0021]

【実施例3】実施例1、実施例2において、めっき液の
硫酸ニッケルを塩化ニッケルに代えることにより、同等
のNi皮膜を形成することができた。
[Example 3] In Examples 1 and 2, an equivalent Ni film could be formed by replacing nickel sulfate in the plating solution with nickel chloride.

【0022】また、硫酸ニッケル、塩化ニッケルに代え
て、硫酸銅または塩化銅を使用することにより、同等の
Cu皮膜を形成することができた。
Further, by using copper sulfate or copper chloride instead of nickel sulfate or nickel chloride, an equivalent Cu film could be formed.

【0023】[0023]

【比較例1】実施例1、実施例2において、メソフェー
ズ球晶の酸化処理を省略した。
Comparative Example 1 In Examples 1 and 2, the oxidation treatment of mesophase spherulites was omitted.

【0024】球晶自体が凝集し、球晶表面にPdの均一
な担持ができず、均一なNi皮膜を形成することもでき
なかった。
The spherulite itself aggregated, Pd could not be uniformly supported on the spherulite surface, and a uniform Ni film could not be formed.

【0025】[0025]

【比較例2】実施例1、実施例2において、Pd(NH
3 4 Cl2 の含浸担持に代えて、PdCl2 による還
元担持を採用した。
[Comparative Example 2] In Example 1 and Example 2, Pd (NH
3 ) Instead of impregnating and supporting 4 Cl 2 , reducing and supporting with PdCl 2 was adopted.

【0026】結果は、比較例1と同等であった。The results were comparable to those of Comparative Example 1.

【0027】[0027]

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 メソフェーズ球晶からなる炭素微粒子を
酸化処理し、Pd(NH3 4 Cl2 を含浸担持させ、
無電解めっきを施すことを特徴とする炭素微粒子の金属
めっき方法。
1. A carbon fine particle composed of mesophase spherulites is subjected to an oxidation treatment to impregnate and carry Pd (NH 3 ) 4 Cl 2 .
A method for metal plating of carbon fine particles, which comprises performing electroless plating.
【請求項2】 無電解めっきをするに際し、還元剤、錯
化剤を併用することを特徴とする請求項1記載の炭素微
粒子の金属めっき方法。
2. The method of metal plating of carbon fine particles according to claim 1, wherein a reducing agent and a complexing agent are used together when performing electroless plating.
【請求項3】 無電解めっきをするに際し、めっき液の
pHを制御することを特徴とする請求項1または請求項
2記載の炭素微粒子の金属めっき方法。
3. The method of metal plating of carbon fine particles according to claim 1, wherein the pH of the plating solution is controlled during electroless plating.
JP12654495A 1995-05-25 1995-05-25 Method for metal-plating carbon fine grain Pending JPH08319575A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12654495A JPH08319575A (en) 1995-05-25 1995-05-25 Method for metal-plating carbon fine grain

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12654495A JPH08319575A (en) 1995-05-25 1995-05-25 Method for metal-plating carbon fine grain

Publications (1)

Publication Number Publication Date
JPH08319575A true JPH08319575A (en) 1996-12-03

Family

ID=14937816

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12654495A Pending JPH08319575A (en) 1995-05-25 1995-05-25 Method for metal-plating carbon fine grain

Country Status (1)

Country Link
JP (1) JPH08319575A (en)

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