JPH08313894A - Color filter substrate and color liquid crystal display device - Google Patents

Abstract

PURPOSE: To obtain a color filter substrate for a color liquid crystal display device which exhibits excellent display quality in a high-temp. and high-humidity atmosphere and has high affinity by specifying the surface roughness of the color filter forming surface side of first transparent conductive layer. CONSTITUTION: This color filter substrate 1 is constituted by forming color filter layers 4 consisting of a black matrix 5 and colored layers 6 on the first transparent conductive layer 3 for electrodeposition disposed on an insulating transparent substrate 2. Further, a second transparent conductive layer 7 for driving liquid crystals is formed on these color filter layers 4. The color filter layer 4 forming surface side of the first transparent conductive layer 3 has a surface of which the surface roughness (Rmax) at a measurement length of 10000nm is >=10nm and more preferably 10 to 50nm. As a result, the first transparent conductive layer 3 acts as an anchor link to the color filter layers 4 and the color filter layers 4 are held with sufficient adhesive power onto the first transparent conductive layer 3.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter substrate and a color liquid crystal display device, and more particularly to a color liquid crystal display device having excellent display quality and high reliability, and a color filter substrate used for the same.

[0002]

2. Description of the Related Art In recent years, a color liquid crystal display device has been attracting attention as a flat display. Generally, a color liquid crystal display device includes a color filter substrate having a black matrix and a plurality of colors (usually, three primary colors of red (R), green (G), and blue (B)) and a counter electrode substrate. It has a structure in which a liquid crystal layer is sandwiched between. Then, a color image is obtained by controlling the light transmittance of the liquid crystal layer in the portion corresponding to each pixel of the colored layers R, G, B of each color. Therefore, the color filter substrate is essential for the color liquid crystal display device, and is an important member that affects the display quality itself of the color liquid crystal display device.

Conventionally, for the black matrix and the coloring layer of the color filter substrate, a dyeing method is applied in which a dyeing base material is applied, and a pattern formed by exposing and developing through a photomask is dyed. , A pigment dispersion method of exposing and developing through a photomask,
Further, it is formed by a printing method or the like in which each color is printed with printing ink. In recent years, the manufacturing cost is lower, and
There is a demand for high-performance color filter substrates, and in order to meet such demands, the use efficiency of the paint is high and the formation time of the black matrix and the coloring layer is short (tens of seconds).
Attention is focused on color filter substrates manufactured by the electrodeposition method, which has excellent production capacity.

In the above electrodeposition method, a transparent conductive layer for electrodeposition is formed on a transparent substrate, a positive resist layer is formed on the transparent conductive layer, and exposure is performed through a mask having a predetermined pattern. Then, the exposed portion is dissolved and removed to expose a predetermined portion of the transparent conductive layer, and then, while the transparent substrate is immersed in an electrodeposition liquid of a predetermined color, electricity is applied from the transparent conductive layer around the transparent substrate to energize it. Then, the black matrix and the coloring layer are sequentially provided to form the color filter layer by repeating such electrodeposition operation. After the color filter layer including the black matrix and the colored layer is formed in this way, the entire surface of the substrate is irradiated with ultraviolet rays to remove the positive resist layer, and then the liquid crystal layer is driven on the color filter layer. Forming a transparent conductive layer of
Polyimide is applied as an alignment layer, baked, and then subjected to alignment treatment (rubbing) to obtain a color filter substrate.

A method of manufacturing a color filter substrate using the above electrodeposition method has hitherto been disclosed in, for example, Japanese Patent Laid-Open No. 61-20.
3403, JP-A-61-270701, and the like.

[0006]

In the color filter substrate manufactured by the electrodeposition method as described above, the color filter layer including the black matrix and the coloring layer is formed on the transparent conductive layer for electrodeposition. However, the adhesive force between the transparent conductive layer and the color filter layer is the adhesion between the color filter layer and the transparent substrate which are directly formed on a transparent substrate such as a conventional glass substrate by a dyeing method, a pigment dispersion method, a printing method or the like. There is a problem that it is inferior to strength. The causes of the low adhesion of the color filter layer in the electrodeposition method are considered as follows. The transparent conductive layer is formed of a metal oxide such as indium tin oxide (ITO).
The surface tension of metal oxides such as O is much higher than the surface tension of transparent substrates such as glass substrates. Therefore, when an electrodeposition film (color filter layer) having a relatively small surface tension such as a black matrix or a colored layer using a polymer compound as a vehicle is formed on a metal oxide such as ITO, the wettability of both Will be extremely bad. Furthermore, the surface hydroxyl groups of metal oxides such as ITO are less than that of glass substrates,
Therefore, the hydrogen bond existing between the color filter layer and the metal oxide such as ITO is smaller than the hydrogen bond existing between the color filter layer and the glass substrate.

If the adhesive force between the transparent conductive layer and the color filter layer is not sufficient as described above, in a color liquid crystal display device manufactured by sealing the liquid crystal layer between the color filter substrate and the counter electrode substrate, There is a problem that the color filter layer is peeled off when left in a high humidity atmosphere for a long time, the image quality is deteriorated, and it is difficult to drive the color liquid crystal display device accurately.

The problem of the low adhesion of the color filter layer in the electrodeposition method as described above is that the transparent conductive layer for electrodeposition is previously patterned and the color filter layer is formed only on this transparent conductive layer ( JP-A-59-114572
No.) is a similar problem.

The present invention has been made in view of the above circumstances, and has a highly reliable color liquid crystal display device which exhibits excellent display quality even in a high temperature and high humidity atmosphere, and this color liquid crystal display. An object is to provide a color filter substrate used in an apparatus.

[0010]

In order to achieve such an object, a color filter substrate of the present invention is an insulating transparent substrate, a first transparent conductive layer formed on the transparent substrate, A color filter layer and a second transparent conductive layer, which are sequentially stacked on the first transparent conductive layer, and the surface roughness (Rmax) of the first transparent conductive layer on the color filter layer forming surface side. Is 10 at a measurement length of 10,000 nm.
The thickness is set to be nm or more.

In the color filter substrate of the present invention, the surface roughness (Rmax) is in the range of 10 to 50 nm at a measurement length of 10,000 nm, and the first transparent conductive layer is the color filter. The structure is provided only at a predetermined position in the layer formation region, and further, the structure is such that a protective film is provided between the color filter layer and the second transparent conductive layer.

The color liquid crystal display device of the present invention is a color liquid crystal display device having a color filter substrate and a counter electrode substrate facing each other, and a liquid crystal layer sealed between the both substrates, wherein the color filter substrate is The color filter substrate is any one of the above.

[0013]

The first transparent conductive layer for electrodeposition formed on an insulating transparent substrate has a large surface tension and a small number of functional groups on the surface, but the surface roughness (Rma) of this first transparent conductive layer is large.
By setting x) to 10 nm or more at a measurement length of 10,000 nm, the first transparent conductive layer acts as an anchor link with respect to the color filter layer, and the color filter layer is formed on the first transparent conductive layer. Holds with sufficient adhesion.

[0014]

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic diagram showing an example of the color filter substrate of the present invention. In FIG. 1, a color filter substrate 1 of the present invention has a color filter layer 4 composed of a black matrix 5 and a coloring layer 6 formed on a first transparent conductive layer 3 for electrodeposition provided on an insulating transparent substrate 2. Further, a second transparent conductive layer 7 for driving a liquid crystal is formed on the color filter layer 4. The surface of the first transparent conductive layer 3 on which the color filter layer 4 is formed has a surface roughness (Rma) at a measurement length of 10,000 nm.
x) is 10 nm or more, preferably 10 to 50 nm.

An insulative transparent substrate 2 constituting such a color filter substrate 1 is an inflexible rigid material such as quartz glass, Pyrex glass, or synthetic quartz plate.
Alternatively, a flexible material having flexibility such as a transparent resin film or an optical resin plate can be used. Among them, 7059 glass manufactured by Corning Co., Ltd. is a material having a small coefficient of thermal expansion, is excellent in dimensional stability and workability in high temperature heat treatment, and is a non-alkali glass containing no alkali component in the glass. It is suitable for a color filter substrate used in a color liquid crystal display device for LCD according to the method.

The first transparent conductive layer 3 and the second transparent conductive layer 7 constituting the color filter substrate 1 are made of indium tin oxide (ITO), zinc oxide (ZnO), tin oxide (SnO), etc., and Using the alloy or the like, sputtering method, vacuum deposition method, ion plating method, CV
It can be formed by a general film forming method such as the D method. The surface roughness (Rmax) of the first transparent conductive layer 3 can be set to 10 nm or more by controlling the film forming conditions as described above, but the surface roughness becomes particularly large as a film forming method. It is preferable to use a vacuum deposition method.
Here, the surface roughness (Rmax) of the first transparent conductive layer 3
Is measured by STM (Scanning Tunneling Microscope), and the maximum surface roughness (R
max). If the surface roughness is less than 10 nm, the anchor link action of the first transparent conductive layer 3 cannot be obtained, and the adhesive force between the transparent conductive layer 3 and the color filter layer 4 becomes insufficient.

The thickness of such a first transparent conductive layer 3 is 9
The thickness can be about 0 to 190 nm, preferably about 100 to 175 nm. The thickness of the second transparent conductive layer 7 for driving the liquid crystal is about 20 to 200 nm, preferably 9
It can be about 0 to 190 nm.

The colored layer 6 constituting the color filter layer 4 of the color filter substrate 1 has a desired pattern such as a red pattern 6R, a green pattern 6G and a blue pattern 6B such as a mosaic type, a stripe type, a triangle type and a four pixel arrangement type. The black matrixes 5 are arranged and provided between the colored patterns and outside the colored layer 6 forming region.

In the color filter substrate of the present invention described above, the first transparent conductive layer 3 for electrodeposition is formed on the entire surface of the transparent substrate 2, but in the color filter substrate of the present invention,
The transparent conductive layer 3 may be provided only in a predetermined portion of the area where the color filter layer 4 is formed. An example of such a color filter substrate of the present invention will be described with reference to FIGS.

First, the color filter substrate 1 of the present invention shown in FIG. 2 is the first transparent conductive film for electrodeposition provided in a region corresponding to the formation region of the color filter layer 4 on the insulating transparent substrate 2. A layer 3 and a color filter layer 4 including a black matrix 5 and a coloring layer 6 are formed on the transparent conductive layer 3, and a second transparent conductive layer 7 for driving a liquid crystal is formed on the color filter layer 4. Has been done.

In the color filter substrate 1 of the present invention shown in FIG. 3, the first transparent conductive layer 3 provided on the insulating transparent substrate 2 is formed on the colored layer 6 in the formation region of the color filter layer 4. It is formed only in the corresponding region.

Further, the color filter substrate of the present invention is
A protective film may be provided between the color filter layer 4 including the black matrix 5 and the colored layer 6 and the second transparent conductive layer 7 for driving the liquid crystal. FIG. 4 is a schematic configuration diagram showing an example in which a protective film 8 is provided between the color filter layer 4 and the second transparent conductive layer 7 in the color filter substrate 1 of the present invention shown in FIG. Such a protective film 8 can be formed using, for example, a thermosetting polymer material such as an acrylic resin, an epoxy resin, a urethane resin or an ultraviolet curable polymer material. The thickness of the protective film 8 is 0.2
The thickness can be about 10 to 10 μm, preferably about 0.5 to 5 μm. In addition, also in the color filter substrate of another aspect of the present invention shown in FIGS. 2 and 3, the protective layer can be provided between the color filter layer 4 and the second transparent conductive layer 7 for driving the liquid crystal. Of course.

Next, a method for manufacturing the color filter substrate of the present invention will be described by taking the color filter substrate 1 shown in FIG. 1 as an example.

First, the transparent conductive layer 3 is formed on the entire surface of the insulative transparent substrate 2 having a multi-faceted surface, using a known means such as electron heating vapor deposition, using a transparent conductive material such as indium tin oxide (ITO) ( FIG. 5A). In the formation of the transparent conductive layer 3, the surface roughness (Rmax) of the transparent conductive layer 3 is set to 10 nm or more when the measurement length is 10,000 nm.

Next, a photoresist is applied on the transparent conductive layer 3 to form a resist layer 10, and the resist layer 10 is exposed through a photomask 11 corresponding to a desired pattern, for example, a black matrix pattern ( Figure 5
(B)). Then, the transparent conductive layer 3 is exposed to a shape corresponding to the black matrix pattern by developing and drying, and the transparent substrate 2 is immersed in an electrodeposition bath in which a black pigment is dispersed, and a voltage is applied to the transparent conductive layer 3. A black electrodeposition material is deposited by applying, washed thoroughly with water, and then dried to form a pinhole-free black matrix 5 (FIG. 5C).

Similarly, by forming the red pattern 6R, the green pattern 6G, and the blue pattern 6B, the color filter layer 4 is formed (FIG. 5D).

The electrodeposition material used in the above steps is generally made of an organic material (polymer material), and its original form is well known as an electrodeposition coating method. In electrodeposition coating,
There are cation electrodeposition and anion electrodeposition due to electrochemical reaction with the main electrode. This is classified according to whether the electrodeposited material exists as a cation or behaves as an anion.
Examples of the organic polymer substance used for electrodeposition include various organic polymer substances such as natural fats and oils, synthetic fats and oils, alkyd resins, polyester resins, acrylic resins and epoxy resins.

In the anion type, maleated oil and polybutadiene resin have been known for a long time, and the electrodeposition material is cured by an oxidative polymerization reaction. The cation type is mostly an epoxy resin and can be used alone or modified. Other,
So-called polyamino resins such as melamine resins and acrylic resins are often used, and a strong colored layer can be formed by thermosetting, photocuring or the like.

In electrodeposition in the production of a color filter substrate, the finely pulverized pigment or dye is dispersed in an anion or cation type electrodeposition bath and co-deposited with the ionic polymer material on the conductive part.

Next, a second transparent conductive layer 7 is formed so as to cover the color filter layer 4 composed of the black matrix 5 and the colored layer 6 (FIG. 5 (E)). This transparent conductive layer 7
Is made of indium tin oxide (ITO), zinc oxide (ZnO), tin oxide (SnO), etc., and their alloys as described above, and is generally used for sputtering, vacuum deposition, ion plating, CVD, etc. Can be formed by a typical film forming method.

Next, the color liquid crystal display device of the present invention will be described. The color liquid crystal display device of the present invention is one in which a liquid crystal layer is sealed between the color filter substrate and the counter electrode substrate as described above.

FIG. 6 is a partial sectional view showing an example of such a color liquid crystal display device of the present invention. In FIG.
In the color liquid crystal display device 21 of the present invention, the color filter substrate 1 of the present invention and the counter electrode substrate 23 of the present invention as described above are opposed to each other at a predetermined interval, the peripheral portion is sealed by a seal member 24, and a space between both substrates is provided. The liquid crystal layer 25 having a thickness of about 5 to 10 μm is formed. Polarizing plates 26 and 27 are provided outside the color filter substrate 1 and the counter electrode substrate 23, respectively. In addition, the liquid crystal layer 2 of the color filter substrate 1
An alignment layer 29 is provided on the surface in contact with 5.

The counter electrode substrate 23 constituting the color liquid crystal display device 21 is provided with a transparent electrode 32 for driving liquid crystal and a thin film transistor (TFT) 33 on a transparent substrate 31, and an alignment layer 34 covering the transparent electrode 32. Are formed. On the counter electrode substrate 23, a group of gate lines (not shown) for opening and closing the thin film transistors (TFTs) 33, a group of signal lines (not shown) for supplying a video signal, and a take-out portion of a corner on the color filter substrate side. A voltage supply line is provided to the color filter electrode that has been transferred from (transferred (provided to one to three take-out parts depending on the design)). These leads 35 are typically
The thin film transistor (TFT) 33 is made of a metal such as Al and is formed collectively in the manufacturing process. The thin film transistor (TFT) 33 is connected to the transparent electrode 32 and is also connected to an electrical connection line 42 from an external drive IC 41. ing. In addition, on the surface of the counter electrode substrate 23 in contact with the liquid crystal layer 25, the alignment layer 34 is formed.
Is provided.

Alignment layer 29 provided on the color filter substrate 1 and alignment layer 3 provided on the counter electrode substrate 23.
Reference numeral 4 is a layer containing at least one of polyimide-based, polyamide-based, polyurethane-based and polyurea-based organic compounds, and has a thickness of 0.01 to 1 μm, preferably about 0.03 to 0.5 μm. Can be Such alignment layers 29 and 34 are applied by a known application method such as various printing methods and then baked and then subjected to an alignment treatment (rubbing).

In this color liquid crystal display device 21, each of the colored patterns 6R, 6G and 6B of the color filter substrate 1 constitutes a pixel, and the liquid crystal driving device corresponding to each pixel is illuminated with illumination light from the polarizing plate 27 side. The liquid crystal layer 25 operates as a shutter by turning on and off the transparent electrode of, and each pixel of the colored patterns 6R, 6G, and 6B transmits light to perform color display. By using the above-described color filter substrate 1 of the present invention, such a color liquid crystal display device 21 exhibits excellent display quality even in an environment of high temperature and high humidity and becomes highly reliable.

In the above-mentioned embodiment, the TFT is used as the driving method.
Although the active matrix system is used, the color liquid crystal display device of the present invention is not limited to this.
For example, methods such as simple matrix and segment, MI
Needless to say, an active matrix method using a two-terminal element such as M (metal / insulator / metal) may be used.

Next, the present invention will be described in more detail with reference to more specific examples. (Example 1) Indium tin oxide (ITO) was formed on a glass substrate (AS manufactured by Asahi Glass Co., Ltd.) having a thickness of 1.1 mm.
Is the first IT for electro-deposition by forming a film by electronic heating vapor deposition.
O transparent conductive layer (80 nm thick, sheet resistance 20 Ω / S
Q) was formed. The surface roughness (Rmax) of this first ITO transparent conductive layer was measured by STM (Scanning Tunneling Microsc
ope) (KURASURF-101 manufactured by Kurabo Industries Ltd.) is shown in FIG. From the results shown in FIG. 7, measurement length 1
The surface roughness (Rmax) at 30,000 nm is 32.
It was 4 nm.

Next, a photosensitive resist (OFPR-800 manufactured by Tokyo Ohka Kogyo Co., Ltd.) was formed on the ITO transparent conductive layer.
Of the resist layer (thickness 2.
5 μm) was formed. The resist layer was exposed through a photomask having a black matrix pattern. This exposure is performed by an ultraviolet exposure device (JL3300 manufactured by Oak Manufacturing Co., Ltd.) having an ultra-high pressure mercury lamp
Was irradiated with an ultraviolet ray of 70 mJ / cm ² .
Next, the exposed portion was developed and removed to form a resist layer having a black matrix pattern.

Then, the above ITO transparent conductive layer was used as an anode in an electrodeposition liquid for black matrix having the following composition,
Using a platinum electrode as a cathode, a glass substrate was immersed so that the electrode interval was 50 mm, and the electrodeposition was performed by energizing at a DC voltage of 28 V and 25 ° C. for 20 seconds. Next, the glass substrate taken out from the electrodeposition liquid was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a black matrix.

(Electrodepositing solution for black matrix) Acrylic resin 750.0 parts by weight (Toa Gosei Chemical Co., Ltd. Aron S-4030) Melamine resin (Sumitomo Chemical Co., Ltd. M-66B) 250.0 parts by weight Triethylamine 61.8 parts by weight carbon black 333.0 parts by weight deionized water 11935.2 parts by weight Next, the unexposed part of the resist layer was exposed through a photomask having a pattern for a red pattern. This exposure was performed by irradiating ultraviolet rays of 100 mJ / cm ² using an ultraviolet exposure device (JL3300 manufactured by Oak Manufacturing Co., Ltd.) having an ultrahigh pressure mercury lamp. next,
The exposed part is developed and removed, and I
The TO transparent conductive layer was exposed.

Next, electrodeposition was carried out in the same manner as black matrix formation, using the ITO transparent conductive layer as an anode and the platinum electrode as a cathode in an electrodeposition liquid for red pattern having the following composition. Next, the glass substrate taken out from the electrodeposition liquid was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a red pattern layer having good transparency.

(Electrodepositing solution for red pattern) Acrylic resin 750.0 parts by weight (Toa Gosei Chemical Co., Ltd. Aron S-4030) Melamine resin (Sumitomo Chemical Co., Ltd. M-66B) 250.0 parts by weight Triethylamine 61.8 parts by weight Pigment Red 48S (manufactured by Sanyo Industry Co., Ltd.) 500.0 parts by weight Deionized water 13438.2 parts by weight Further, the unexposed part of the resist layer is a photomask having a pattern for a green pattern. Through the same procedure, exposure was performed in the same manner as in the formation of the red pattern, and then the exposed portion was developed and removed, and the ITO transparent conductive layer was exposed in the pattern for the green pattern.

Next, a red pigment (Pigment Red 48
An electrodeposition solution for a green pattern was prepared in the same manner as the electrodeposition solution for the red pattern layer except that a green pigment (phthalocyanine green) was used instead of S). Then, in the green pattern electrodeposition liquid, the ITO transparent conductive layer as an anode,
Using a platinum electrode as a cathode, the substrate was dipped so that the electrode interval was 50 mm, and the electrodeposition was performed by energizing at a DC voltage of 30 V and 25 ° C for 20 seconds. Next, the glass substrate taken out from the electrodeposition liquid was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a green pattern layer having good transparency.

Furthermore, the unexposed portion of the resist layer is
Through a photomask having a pattern for a blue pattern, exposure is performed as in the case of forming a red pattern, and then,
The exposed part is developed and removed, and I
The TO transparent conductive layer was exposed.

Then, a red pigment (Pigment Red 48
An electrodeposition solution for blue pattern was prepared in the same manner as the above-mentioned electrodeposition solution for red pattern layer except that a blue pigment (phthalocyanine blue) was used instead of S). Then, the ITO transparent conductive layer was used as an anode and the platinum electrode was used as a cathode in the electrodeposition liquid for blue pattern, the substrate was dipped so that the electrode interval was 80 mm, and electricity was applied for 20 seconds at a DC voltage of 30 V and 25 ° C. I put on my clothes. Next, the glass substrate taken out from the electrodeposition solution was thoroughly washed with water and then dried at 80 ° C. for 10 minutes to form a blue pattern layer having good transparency.

Then, 200 mJ / cm ² of ultraviolet rays were irradiated, and the remaining resist layer was developed and peeled off. As a result, a color filter layer having a black matrix, a red pattern, a green pattern and a blue pattern was formed. Then, it was cured at 200 ° C. for 1 hour to obtain a color filter substrate.

The color filter substrate thus obtained was immersed in boiling water for 1 hour, and a tape peeling test was performed before and after the immersion. As a result, there was no color filter layer that fell off before and after immersion, and the color filter layer was ITO. It was confirmed that it was held on the transparent conductive layer with high adhesiveness. (Example 2) Indium tin oxide (ITO) was formed on a glass substrate (AS manufactured by Asahi Glass Co., Ltd.) having a thickness of 1.1 mm.
Of the first ITO transparent conductive layer for electrodeposition (thickness 120 nm, sheet resistance 12Ω
/ SQ) was formed. The surface roughness (Rmax) of this first ITO transparent conductive layer was measured by STM (Scanning Tunneling Mic).
roscope) (KURASURF-101 manufactured by Kurabo Industries, Ltd.), and the surface roughness (R
max) was 13 nm.

Then, a color filter layer consisting of a black matrix, a red pattern, a green pattern and a blue pattern was formed on this ITO transparent conductive layer in the same manner as in Example 1. Then, it was cured at 200 ° C. for 1 hour to obtain a color filter substrate.

The color filter substrate thus obtained was immersed in boiling water for 1 hour, and a tape peeling test was conducted before and after the immersion. As a result, there was no color filter layer that fell off before and after immersion, and the color filter layer was ITO. It was confirmed that it was held on the transparent conductive layer with high adhesiveness. (Comparative Example) Glass substrate having a thickness of 1.1 mm (Asahi Glass Co., Ltd.)
A film made of indium tin oxide (ITO) is formed on the manufactured AS) by a sputtering method, and the first ITO transparent conductive layer for electrodeposition (thickness 113 nm, sheet resistance 13 Ω / SQ).
Was formed. The surface roughness (Rmax) of this first ITO transparent conductive layer was measured by STM (Scanning Tunneling Microscop).
e) (KURASURF-101 manufactured by Kurabo Industries, Ltd.) is shown in FIG. From the results shown in FIG.
Surface roughness (Rmax) at 000 nm is 7.1 nm
Met.

Then, a color filter layer consisting of a black matrix, a red pattern, a green pattern and a blue pattern was formed on this ITO transparent conductive layer in the same manner as in Example 1. Then, it was cured at 200 ° C. for 1 hour to obtain a color filter substrate.

A tape peeling test before and after immersion was performed on this color filter substrate in the same manner as in the example. As a result, good adhesion was observed between the color filter layer and the ITO transparent conductive layer before immersion, but peeling of the color filter layer occurred after immersion. (Example of color liquid crystal display device) A second liquid crystal driving device is formed on a color filter layer of each color filter substrate manufactured in Examples 1, 2 and Comparative Example by a sputtering method.
The ITO transparent conductive layer (thickness 40 nm) of was formed. Next, the alignment layer coating liquid (AL-3046 manufactured by Japan Synthetic Rubber Co., Ltd.) is applied on the ITO transparent conductive layer of each color filter substrate by spinner coating (2000 rpm, 10 seconds) to form a 500 Å-thick alignment layer. After that, a rubbing treatment was performed.

On the other hand, a gate electrode was formed by using Cr in a predetermined pattern on one surface of a 1.1 mm-thick glass substrate (7059 manufactured by Corning Co., Ltd.), and an ITO film was used for driving a liquid crystal. A transparent electrode was formed. Then, a SiN _x layer was formed so as to cover the gate electrode to form a gate insulating layer, and an amorphous silicon (a-Si) layer was formed on the gate electrode via the SiN _x layer. Further, a Cr source electrode is formed so as to be connected to one end of the a-Si layer, and a-
A Cr drain electrode was formed so as to be connected to the other end of the Si layer and the transparent electrode to form a thin film transistor (TFT). Next, an alignment layer was formed on the transparent electrodes and the TFTs in the same manner as the color filter substrate described above, and a rubbing treatment was performed to prepare a counter electrode substrate including the transparent electrodes and the TFTs as shown in FIG.

A color filter liquid crystal display device was manufactured using such a color filter substrate (Examples 1 and 2 and comparative example) and a counter electrode substrate, and after leaving it in an environment of 80 ° C. and 90% RH for 500 hours. , Displayed a color image. As a result, the color liquid crystal display devices using the color filter substrates of Example 1 and Example 2 displayed good color images with excellent brightness. However, a defect occurred in the color liquid crystal display device using the color filter substrate of the comparative example.

[0055]

As described in detail above, according to the present invention, the surface roughness (Rmax) of the first transparent conductive layer for electrodeposition formed on the insulating transparent substrate is set to 10 nm or more. Therefore, an anchor link effect is developed between the color filter layer formed on this surface and having a low surface tension, and the color filter layer is retained on the first transparent conductive layer with sufficient adhesive force. The color filter substrate and the counter electrode substrate thus constructed are opposed to each other, and the liquid crystal layer is sealed between the two substrates to form a color liquid crystal display device, thereby providing excellent display quality even when left in a high temperature and high humidity atmosphere. It is possible to provide a highly reliable color liquid crystal display device which can be stably driven and can be accurately driven.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram showing an example of a color filter substrate of the present invention.

FIG. 2 is a schematic configuration diagram showing another example of the color filter substrate of the present invention.

FIG. 3 is a schematic configuration diagram showing another example of the color filter substrate of the present invention.

FIG. 4 is a schematic configuration diagram showing another example of the color filter substrate of the present invention.

FIG. 5 is a drawing for explaining the manufacturing method of the color filter substrate of the present invention.

FIG. 6 is a partial cross-sectional view showing an example of a color liquid crystal display device of the present invention.

FIG. 7 is a diagram showing a surface shape of a first ITO transparent conductive layer formed in Example 1.

FIG. 8 is a diagram showing a surface shape of a first ITO transparent conductive layer formed in a comparative example.

[Explanation of symbols]

 1 ... Color filter substrate 2 ... Transparent substrate 3 ... First transparent conductive layer 4 ... Color filter layer 5 ... Black matrix 6 ... Coloring layer 7 ... Second transparent conductive layer 8 ... Protective film 21 ... Color liquid crystal display device 23 ... Counter electrode substrate 25 ... Liquid crystal layer

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroyoshi Omiga 3-20-17 Shinohara Higashi, Kohoku Ward, Yokohama City, Kanagawa Prefecture

Claims (5)

[Claims] 1. An insulative transparent substrate, a first transparent conductive layer formed on the transparent substrate, a color filter layer and a second transparent conductive layer sequentially stacked on the first transparent conductive layer. And a surface roughness (Rmax) of the first transparent conductive layer on the side of the color filter layer forming surface is a measurement length of 10,
A color filter substrate having a thickness of 10 nm or more at 000 nm. 2. The surface roughness (Rmax) is measured length 1
The color filter substrate according to claim 1, wherein the color filter substrate has a range of 10 to 50 nm at 10,000 nm. 3. The color filter substrate according to claim 1, wherein the first transparent conductive layer is provided only in a predetermined portion of the formation region of the color filter layer. 4. The color filter substrate according to claim 1, further comprising a protective film between the color filter layer and the second transparent conductive layer. 5. A color liquid crystal display device comprising a color filter substrate and a counter electrode substrate facing each other, and a liquid crystal layer sealed between the both substrates, wherein the color filter substrate is defined by any one of claims 1 to 4. A color liquid crystal display device, which is the color filter substrate according to any one of the claims.