JPH08307063A - Electric circuit board and its production - Google Patents

Electric circuit board and its production

Info

Publication number
JPH08307063A
JPH08307063A JP7121892A JP12189295A JPH08307063A JP H08307063 A JPH08307063 A JP H08307063A JP 7121892 A JP7121892 A JP 7121892A JP 12189295 A JP12189295 A JP 12189295A JP H08307063 A JPH08307063 A JP H08307063A
Authority
JP
Japan
Prior art keywords
electric circuit
circuit board
conductor
manufacturing
electric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP7121892A
Other languages
Japanese (ja)
Inventor
Kazuhiro Seto
一弘 瀬戸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP7121892A priority Critical patent/JPH08307063A/en
Publication of JPH08307063A publication Critical patent/JPH08307063A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/191Disposition
    • H01L2924/19101Disposition of discrete passive components
    • H01L2924/19105Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits

Abstract

PURPOSE: To form a pattern using photolithography technology by composing the electric insulation film in an electric circuit board, having through holes for connecting the electric insulation film with a conductor layer, of a heat- resistant resin formed by resin coating method. CONSTITUTION: Copper is deposited, as a conductor 2, on the entire surface of a ceramic board 1, e.g. an alumina board. A mask pattern of photoresist is then formed by photolithography technology. Subsequently, unnecessary part of the conductor 2 is removed by etching to obtain a desired pattern. After removing the photoresist, a heat-resistant polyimide resin layer 5 is formed by photolithography technology and through holes are made therein before being heat treated. An insulation film is provided using a convenient facility, e.g. a spin coater, and a pattern can be formed using photolithography technology.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は,電子装置等に使用され
る電子部品素子等を搭載し電気的回路を形成する電気回
路基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electric circuit board on which electronic component elements used in an electronic device or the like are mounted to form an electric circuit.

【0002】[0002]

【従来の技術】従来,電子装置等に使用される電子部品
素子等を搭載し電気的回路を形成する電気回路基板に
は,多層配線プリント基板,セラミック多層配線基板,
及び薄膜多層配線基板等がある。多層配線プリント基板
は,ガラスエポキシ材によるプリント基板上に貼られた
銅箔をエッチング等で導体パターンを形成し絶縁樹脂を
介し同時に導体パターンを複数層形成してなる。
2. Description of the Related Art Conventionally, an electric circuit board for mounting an electronic component element used in an electronic device or the like to form an electric circuit includes a multilayer wiring printed board, a ceramic multilayer wiring board,
And thin-film multilayer wiring boards. The multilayer wiring printed circuit board is formed by forming a conductive pattern by etching a copper foil attached to the printed circuit board made of a glass epoxy material, and simultaneously forming a plurality of conductive pattern layers via an insulating resin.

【0003】また,セラミック多層配線基板は,セラミ
ック微粉末とバインダ樹脂よりなるセラミックインキ及
び銀等の金属微粉末とバインダ樹脂よりなる金属インキ
とを交互に印刷等で導体パターンを形成しつつ重畳しそ
の後バインダ樹脂を昇華後セラミックと金属を同時燃焼
することで製造される。
Further, in the ceramic multilayer wiring board, ceramic fine powder and ceramic ink made of a binder resin, and metal fine powder made of silver or the like and metal ink made of a binder resin are alternately printed to form a conductive pattern and overlap each other. After that, the binder resin is sublimated and then the ceramic and the metal are simultaneously burned to produce the resin.

【0004】一方,薄膜多層配線基板は,セラミック多
層配線基板,あるいはシリコン基板上に導体金属及び絶
縁材料を真空蒸着,スパッタ蒸着,CVD蒸着等の薄膜
成膜技術による成膜とフォトリソグラフィー技術と各構
成材料のエッチング技術による導体及び絶縁膜のパター
ンを交互に重畳形成することで製造される。
On the other hand, the thin film multi-layer wiring board is a ceramic multi-layer wiring board or a silicon substrate on which a conductive metal and an insulating material are deposited by a thin film deposition technique such as vacuum deposition, sputter deposition, or CVD deposition and photolithography technique. It is manufactured by alternately forming the patterns of the conductor and the insulating film by the etching technique of the constituent materials.

【0005】[0005]

【発明が解決しようとする課題】しかしながら,前述し
た多層配線プリント基板やセラミック多層配線基板で
は,導体幅及び導体間隔は最低50μm程度以上必要な
ため微細配線による基板の小型化の実現が困難であっ
た。
However, in the above-mentioned multilayer wiring printed circuit board and ceramic multilayer wiring board, it is difficult to realize miniaturization of the board by fine wiring because the conductor width and the conductor spacing are required to be at least 50 μm or more. It was

【0006】一方,比較してより微細配線が可能である
前記薄膜多層配線基板では,成膜工程に要する費用が高
額で,価格の高い基板になってしまうという欠点があっ
た。
On the other hand, the thin-film multi-layer wiring board, which is capable of finer wiring, has the drawback that the film-forming process requires a high cost and becomes a high-priced board.

【0007】そこで,本発明の技術的課題は,微細配線
が可能である高性能多層配線基板を低コストで安定し生
産可能にできる電気回路基板とその製造方法とを提供す
ることにある。
SUMMARY OF THE INVENTION Therefore, a technical object of the present invention is to provide an electric circuit board and a method of manufacturing the electric circuit board capable of stably producing a high-performance multilayer wiring board capable of fine wiring at a low cost.

【0008】[0008]

【課題を解決するための手段】本発明によれば,セラミ
ック基板またはシリコン基板上に形成された少なくとも
2層の導体層と,前記導体層間に形成された電気絶縁膜
と,前記電気絶縁膜に前記導体層を電気的に接続するた
めのスルーホールとを有する電気回路基板において,前
記電気絶縁膜が樹脂塗装方法により形成された耐熱樹脂
により構成されていることを特徴とする電気回路基板が
得られる。
According to the present invention, at least two conductor layers formed on a ceramic substrate or a silicon substrate, an electric insulating film formed between the conductor layers, and the electric insulating film are formed on the electric insulating film. An electric circuit board having a through hole for electrically connecting the conductor layer, wherein the electric insulating film is made of a heat-resistant resin formed by a resin coating method. To be

【0009】また,本発明によれば,前記電気回路基板
において,前記樹脂塗装方法は,塗布,浸漬,印刷,及
びスプレー塗装の内から選択された少なくとも一種の方
法であることを特徴とする電気回路基板が得られる。
According to the present invention, in the electric circuit board, the resin coating method is at least one method selected from coating, dipping, printing, and spray coating. A circuit board is obtained.

【0010】また,本発明によれば,前記いずれかの電
気回路基板において,前記導体層のうちの少なくとも一
層は真空蒸着及びスパッタ蒸着の内の少なくとも一種の
部品から選択された薄膜プロセスにより形成されている
ことを特徴とする電気回路基板が得られる。
Further, according to the present invention, in any one of the electric circuit boards, at least one of the conductor layers is formed by a thin film process selected from at least one of vacuum vapor deposition and sputter vapor deposition. An electric circuit board is obtained.

【0011】また,本発明によれば,前記したいずれか
の電気回路基板において,前記電気回路基板は,電子部
品及びモジュール部品の内の少なくとも一種が搭載され
て電気的回路を形成していることを特徴とする電気回路
基板が得られる。
According to the present invention, in any one of the above-mentioned electric circuit boards, the electric circuit board is mounted with at least one of electronic parts and module parts to form an electric circuit. An electric circuit board is obtained.

【0012】また,本発明によれば,前記電気回路基板
において,前記電子部品は,半導体ベアチップ,抵抗,
コンデンサ,及びコイルの内から選択された少なくとも
一種であり,前記モジュール部品は,前記電子部品は複
数個実装されたハイブリッドIC(集積回路)であるこ
とを特徴とする電気回路基板が得られる。
According to the present invention, in the electric circuit board, the electronic component is a semiconductor bare chip, a resistor,
An electric circuit board is obtained, which is at least one selected from a capacitor and a coil, and the module component is a hybrid IC (integrated circuit) in which a plurality of the electronic components are mounted.

【0013】また,本発明によれば,前記したいずれか
の電気回路基板において,前記耐熱樹脂は感光性樹脂で
あり,前記スルーホールはフォトリソグラフィー技術に
より形成されていることを特徴とする電気回路基板が得
られる。
According to the present invention, in any one of the electric circuit boards described above, the heat resistant resin is a photosensitive resin and the through holes are formed by a photolithography technique. A substrate is obtained.

【0014】また,本発明によれば,前記したいずれか
の電気回路基板において,前記耐熱樹脂の前記スルーホ
ールはすり鉢状であり,前記スルホールの導体膜は前記
スルーホールの中心軸方向に対し仰角30°以上のテー
パーを有することを特徴とする電気回路基板が得られ
る。
According to the present invention, in any one of the above-mentioned electric circuit boards, the through hole of the heat resistant resin has a mortar shape, and the conductor film of the through hole has an elevation angle with respect to a central axis direction of the through hole. An electric circuit board having a taper of 30 ° or more is obtained.

【0015】また,本発明によれば,前記したいずれか
の電気回路基板において,前記部品の発熱を電気回路上
でまたは電気回路に関係なく設置された金属あるいは熱
伝導性の優れた材料により前記部品を搭載した面の温度
上昇を緩和する構成を有することを特徴とする電気回路
基板が得られる。
Further, according to the present invention, in any one of the above-mentioned electric circuit boards, the heat generation of the component is performed by a metal or a material having excellent thermal conductivity which is installed on the electric circuit or irrespective of the electric circuit. It is possible to obtain an electric circuit board having a structure for reducing a temperature rise of a surface on which components are mounted.

【0016】また,本発明によれば,前記したいずれか
の電気回路基板において,前記電気回路基板の前記導体
層の形状および配置の少なくとも一部はストリップ線路
構造であり,前記導体層の内の電気信号を通す信号導体
の上部あるいは下部に前記電気絶縁膜を介し前記導体層
として接地導体が配置され,所定の導体幅および前記信
号導体と前記接地導体との間隔が所望の特性インピーダ
ンスに設計され構成されていることを特徴とする電気回
路基板が得られる。
According to the present invention, in any one of the above electric circuit boards, at least a part of the shape and arrangement of the conductor layers of the electric circuit board has a strip line structure, and A ground conductor is arranged as the conductor layer above or below a signal conductor through which an electric signal is passed, via the electric insulating film, and a predetermined conductor width and a distance between the signal conductor and the ground conductor are designed to have a desired characteristic impedance. An electric circuit board is obtained which is characterized in that it is configured.

【0017】また,本発明によれば,前記したいずれか
の電気回路基板において,前記導体層の内の前記部品の
駆動用の直流あるいは低周波電流が流れる駆動導体の上
部あるいは下部に電気絶縁性を有する前記電気絶縁膜を
介し前記導体層として接地導体を配置したことを特徴と
する電気回路基板が得られる。
Further, according to the present invention, in any one of the above-mentioned electric circuit boards, an electric insulation is provided on an upper part or a lower part of a drive conductor through which a direct current or a low frequency current for driving the component in the conductor layer flows. An electric circuit board is obtained in which a ground conductor is arranged as the conductor layer via the electric insulating film having a.

【0018】また,本発明によれば,前記電気回路基板
において,前記電気絶縁膜が金属酸化皮膜であることを
特徴とする電気回路基板が得られる。
Further, according to the present invention, in the electric circuit board, the electric circuit board is obtained in which the electric insulating film is a metal oxide film.

【0019】また,本発明によれば,前記電気回路基板
において,前記駆動導体と前記接地導体の少なくとも一
方は複数層であり,前記電気絶縁膜を介し一方が他の一
方に挟み込まれていることを特徴とする電気回路基板が
得られる。
Further, according to the invention, in the electric circuit board, at least one of the drive conductor and the ground conductor is a plurality of layers, and one of them is sandwiched by the other through the electric insulating film. An electric circuit board is obtained.

【0020】また,本発明によれば,セラミック基板ま
たはシリコン基板上に,スルーホールを有する電気絶縁
膜を介して,前記スルホールを介して接続された少なく
とも2層の導体層を形成する電気回路基板の製造方法に
おいて,前記電気回路基板の前記電気絶縁膜を耐熱樹脂
の樹脂塗装方法により形成することを特徴とする電気回
路基板の製造方法が得られる。
Further, according to the present invention, an electric circuit board on which at least two conductor layers connected to each other through the through hole are formed on the ceramic substrate or the silicon substrate through the electric insulating film having the through hole. In the method of manufacturing the electric circuit board, the electric insulating film of the electric circuit board is formed by a resin coating method of heat resistant resin.

【0021】また,本発明によれば,前記電気回路基板
の製造方法において,前記樹脂塗装方法は,塗布,浸
漬,印刷,及びスプレー塗装の内から選択された少なく
とも一種であることを特徴とする電気回路基板の製造方
法が得られる。
According to the present invention, in the method for manufacturing the electric circuit board, the resin coating method is at least one selected from coating, dipping, printing, and spray coating. A method of manufacturing an electric circuit board is obtained.

【0022】また,本発明によれば,前記いずれかの電
気回路基板の製造方法において,前記導体層のうちの少
なくとも一層を真空蒸着及びスパッタ蒸着の内から選択
された薄膜プロセスにより形成することを特徴とする電
気回路基板の製造方法が得られる。
According to the present invention, in any one of the methods for manufacturing an electric circuit board, at least one of the conductor layers is formed by a thin film process selected from vacuum deposition and sputter deposition. A method of manufacturing a characteristic electric circuit board is obtained.

【0023】また,本発明によれば,前記したいずれか
の電気回路基板の製造方法において,電子部品及びモジ
ュール部品の内の少なくとも一種を搭載して電気回路を
形成することを特徴とする電気回路基板の製造方法が得
られる。
Further, according to the present invention, in any one of the methods for manufacturing an electric circuit board described above, an electric circuit is formed by mounting at least one of an electronic component and a module component. A method of manufacturing a substrate is obtained.

【0024】また,本発明によれば,前記電気回路基板
の製造方法において,前記電子部品は,半導体ベアチッ
プ,抵抗,コンデンサ,及びコイルの内の少なくとも一
種であり,前記モジュール部品は複数個の前記電子部品
が実装されたハイブリッドICであることを特徴とする
電気回路基板の製造方法が得られる。
Further, according to the present invention, in the method of manufacturing an electric circuit board, the electronic component is at least one of a semiconductor bare chip, a resistor, a capacitor, and a coil, and the module component is a plurality of the above. A method for manufacturing an electric circuit board is obtained, which is a hybrid IC on which electronic components are mounted.

【0025】また,本発明によれば,前記したいずれか
の電気回路基板の製造方法において,前記耐熱樹脂は感
光性樹脂であり,前記スルーホールをフォトリソグラフ
ィー技術により形成することを特徴とする電気回路基板
の製造方法が得られる。
Further, according to the present invention, in any one of the above-mentioned methods for manufacturing an electric circuit board, the heat-resistant resin is a photosensitive resin, and the through hole is formed by a photolithography technique. A method of manufacturing a circuit board is obtained.

【0026】また,本発明によれば,前記したいずれか
の電気回路基板の製造方法において,前記耐熱樹脂の前
記スルーホールはすり鉢状であり,前記スルホールの導
体膜は,前記スルーホールの中心軸方向に対し仰角30
°以上のテーパーを有するように形成することを特徴と
する電気回路基板の製造方法が得られる。
Further, according to the present invention, in any one of the methods for manufacturing an electric circuit board described above, the through hole of the heat resistant resin has a mortar shape, and the conductor film of the through hole has a central axis of the through hole. Elevation angle 30 to direction
A method for manufacturing an electric circuit board is obtained, which is characterized in that it is formed to have a taper of not less than °.

【0027】また,本発明によれば,前記したいずれか
の電気回路基板の製造方法において,前記部品の発熱を
電気回路上でまたは電気回路に関係なく設置された金属
あるいは熱伝導性の優れた材料により前記部品を搭載し
た面の温度上昇を緩和するように形成したことを特徴と
する電気回路基板の製造方法が得られる。
Further, according to the present invention, in any one of the above-described methods for manufacturing an electric circuit board, the heat generated by the component is placed on the electric circuit or irrespective of the electric circuit, or the metal is excellent in thermal conductivity. A method of manufacturing an electric circuit board is obtained in which the material is formed so as to reduce the temperature rise of the surface on which the component is mounted.

【0028】また,本発明によれば,前記したいずれか
の電気回路基板の製造方法において,前記電気回路基板
の前記導体層の形状および配置の少なくとも一部はスト
リップ線路構造であり,前記導体層の内の電気信号を通
す信号導体の上部あるいは下部に前記電気絶縁膜を介し
前記導体層として接地導体が配置され所定の導体幅およ
び前記信号導体と前記接地導体との間隔が所望の特性イ
ンピーダンスを有するように構成したことを特徴とする
電気回路基板の製造方法が得られる。
According to the present invention, in any one of the methods for manufacturing an electric circuit board described above, at least a part of the shape and arrangement of the conductor layer of the electric circuit board has a strip line structure, A ground conductor is arranged as the conductor layer above or below a signal conductor through which an electric signal is passed through the electric insulating film, and a predetermined conductor width and a space between the signal conductor and the ground conductor have a desired characteristic impedance. A method of manufacturing an electric circuit board is obtained which is configured to have.

【0029】また,本発明によれば,前記電気回路基板
の製造方法において,前記導体層の内で前記部品の駆動
用の直流あるいは低周波電流が流れる駆動導体の上部あ
るいは下部に電気絶縁膜を介し前記導体層として前記接
地導体を配置することを特徴とする電気回路基板の製造
方法が得られる。
Further, according to the present invention, in the method of manufacturing the electric circuit board, an electric insulating film is formed on the upper or lower part of the drive conductor in the conductor layer through which direct current or low frequency current for driving the component flows. A method for manufacturing an electric circuit board is obtained, in which the ground conductor is arranged as the conductor layer via the conductor layer.

【0030】また,本発明によれば,前記電気回路基板
の製造方法において,前記電気絶縁膜が金属酸化皮膜で
あることを特徴とする電気回路基板の製造方法が得られ
る。
Also, according to the present invention, there is provided a method for manufacturing an electric circuit board, wherein the electric insulating film is a metal oxide film.

【0031】また,本発明によれば,前記電気回路基板
の製造方法において,前記駆動導体と前記接地導体の少
なくとも一方は複数層であり,前記電気絶縁膜を介し一
方が他の一方に挟み込むことを特徴とする電気回路基板
の製造方法が得られる。
Further, according to the present invention, in the method for manufacturing an electric circuit board, at least one of the drive conductor and the ground conductor has a plurality of layers, and one of them is sandwiched by the other via the electric insulating film. A method for manufacturing an electric circuit board is obtained.

【0032】さらに,本発明によれば,前記電気回路基
板の製造方法において,前記電気絶縁膜は,窒化ケイ素
から形成されていることを特徴とする電気回路基板の製
造方法が得られる。
Furthermore, according to the present invention, in the method of manufacturing the electric circuit board, the method of manufacturing the electric circuit board is characterized in that the electric insulating film is formed of silicon nitride.

【0033】即ち,本発明は,アルミナなどのセラミッ
ク基板またはシリコン基板などの上に真空蒸着,スパッ
タ蒸着などの薄膜プロセスを利用し複数の導体層を形成
し,該導体層間に耐熱樹脂による電気的絶縁膜が塗布,
浸漬,印刷,スプレー塗装等の樹脂塗装方法により形成
され,かつ該電気絶縁膜に上下導体層を電気的接続する
ためのスルーホールを有する,半導体ベアチップあるい
は抵抗,コンデンサ,コイル等の電子部品あるいは複数
個の電子部品が搭載されたハイフリットIC等のモジュ
ール部品が複数個搭載され,電気的回路を形成する電気
回路基板である。また,本発明において,前記樹脂は感
光性を有し前記スルーホールはフォトリソグラフィー技
術を用い形成されることでより効果が得られる。
That is, according to the present invention, a plurality of conductor layers are formed on a ceramic substrate such as alumina or a silicon substrate using a thin film process such as vacuum vapor deposition or sputter vapor deposition, and an electrical resistance of a heat resistant resin is formed between the conductor layers. Insulation film is applied,
A semiconductor bare chip or an electronic component such as a resistor, a capacitor, a coil or the like, which is formed by a resin coating method such as dipping, printing or spray coating and has through holes for electrically connecting the upper and lower conductor layers to the electric insulating film. This is an electric circuit board on which a plurality of module parts such as a high frit IC on which individual electronic parts are mounted are mounted to form an electric circuit. Further, in the present invention, the resin has photosensitivity, and the through hole is formed by using a photolithography technique, so that the effect is further obtained.

【0034】また,前記スルーホールはすり鉢状に導体
膜鉛直方向に対し仰角30°以上のテーパーを有するこ
とで段切れによる導体断線等の因子を排除して信頼性の
高い安定した製品が得られる。
Further, since the through hole has a mortar-like taper with an elevation angle of 30 ° or more with respect to the vertical direction of the conductor film, factors such as conductor disconnection due to step breakage can be eliminated and a highly reliable and stable product can be obtained. .

【0035】また半導体チップ等の発熱に対し電気回路
パターンやまた電気回路に関係なく熱を伝導させるため
熱伝導性に優れた金属等の材料を設置した構成により高
密度実装と高信頼性のうえから更に高性能である製品が
得られる。
Further, in order to conduct heat to the heat generated by the semiconductor chip or the like regardless of the electric circuit pattern or the electric circuit, a material such as a metal having excellent thermal conductivity is installed to realize high density mounting and high reliability. To obtain products with higher performance.

【0036】また高速電気信号を通すため所望の特性イ
ンピーダンス設計に従い導体パターン寸法及び所定間隔
を介し接地パターンを設けているため信号の伝送効率も
向上し,また半導体チップ等の駆動電流が流れる導体近
傍に接地導体を配置し電磁ノイズを地絡させる構造であ
り,更に駆動電流導体と接地導体との電気容量が非常に
薄い金属酸化絶縁皮膜を用いることで大きくなり,また
更に駆動電流導体と接地導体を交互に積層挟み込む構造
とすることでより電気容量が大きくなり電磁ノイズ対策
の効果がより得られる。
Further, in order to pass a high-speed electric signal, a ground pattern is provided through a conductor pattern dimension and a predetermined interval in accordance with a desired characteristic impedance design, so that signal transmission efficiency is improved, and a conductor such as a semiconductor chip in which a driving current flows is provided. It has a structure in which a ground conductor is placed on the ground to cause electromagnetic noise, and the capacitance between the drive current conductor and the ground conductor is increased by using a very thin metal oxide insulating film. By alternately sandwiching and sandwiching, the electric capacity becomes larger, and the effect of electromagnetic noise countermeasures is further obtained.

【0037】[0037]

【作用】前述の電気回路基板構成にすることにより,本
発明においては,微細高密度配線基板が低コスト工程に
て製造でき,またスルーホールの壁面が傾斜を持つため
上下導体間の接続断線の不具合が解消され,更に発熱部
品の放熱構造を併せて持て高性能でありかつ信頼性の高
い電気回路基板が実現できる。
With the above electric circuit board structure, in the present invention, a fine high-density wiring board can be manufactured in a low cost process, and since the wall surface of the through hole has an inclination, there is no disconnection between the upper and lower conductors. It is possible to realize a high-performance and highly reliable electric circuit board that eliminates defects and also has a heat dissipation structure for heat-generating components.

【0038】また前述電気回路基板はストリップ線路構
造の伝送線路設計が可能な構造であり,これにより信号
伝送の効率が向上し,また半導体チップ等を駆動するた
めの電源線路導体と接地導体間で大きい電気容量が得ら
れる構造を実現し,良好な電磁ノイズ対策が達成でき
る。
Further, the above-mentioned electric circuit board has a structure capable of designing a transmission line of a strip line structure, whereby the efficiency of signal transmission is improved, and between the power supply line conductor and the ground conductor for driving the semiconductor chip or the like. A structure that can obtain a large electric capacity is realized, and good measures against electromagnetic noise can be achieved.

【0039】[0039]

【実施例】以下,本発明の実施例について図面を参照し
て説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0040】図1は,本発明の第1実施例に係る電気回
路基板を用いた電気回路製品構成の断面図である。
FIG. 1 is a sectional view of an electric circuit product structure using the electric circuit board according to the first embodiment of the present invention.

【0041】図1において,アルミナ等のセラミック基
板1の上に接地導体2(以下,単に導体2と呼ぶ)が形
成されている。その上に,スルホール5aを備えたポリ
イミド樹脂からなる耐熱絶縁樹脂層5が形成され,その
上に導体2及び半導体トランジスタ等の実装部品を駆動
させるための駆動電源線路導体4(以下,単に導体4と
呼ぶ)が形成されている。さらに,その上に,スルホー
ル6a及び6bを有する耐熱絶縁樹脂層5と同様の耐熱
絶縁樹脂層6が形成されている。この耐熱絶縁樹脂層6
の上及びスルホール6a及び6b上に導体2及び4が形
成されている。さらに,その上に,スルーホール7a〜
7fを備えたポリイミド樹脂からなる耐熱絶縁樹脂層7
が設けられている。さらに,耐熱絶縁樹脂層7の上及び
スルーホール7a〜7fに導体2及び4及び配線導体3
(以下,単に導体3と呼ぶ)が夫々形成されている。さ
らに,それらを覆って,スルーホール8a,8b,8
c,8dを有するポリイミド樹脂からなる耐熱絶縁樹脂
層8が設けられている。その上に導体2,3,及び4が
夫々設けられている。耐熱絶縁樹脂層8上には,半導体
ベアチップ10と,電子部品11,12等が,ボンディ
ングワイヤ13を介して夫々の導体2,3,及び4に接
続されている。これらの半導体ベアチップ10と電子部
品11,12はコーティング樹脂9でコーティングされ
ている。
In FIG. 1, a ground conductor 2 (hereinafter simply referred to as conductor 2) is formed on a ceramic substrate 1 made of alumina or the like. A heat-resistant insulating resin layer 5 made of polyimide resin having a through hole 5a is formed thereon, and a drive power line conductor 4 (hereinafter, simply referred to as the conductor 4) for driving the conductor 2 and mounted components such as semiconductor transistors is formed thereon. Called) is formed. Further, a heat resistant insulating resin layer 6 similar to the heat resistant insulating resin layer 5 having the through holes 6a and 6b is formed thereon. This heat-resistant insulating resin layer 6
Conductors 2 and 4 are formed on the upper side and on the through holes 6a and 6b. Furthermore, the through holes 7a-
Heat-resistant insulating resin layer 7 made of polyimide resin with 7f
Is provided. Furthermore, the conductors 2 and 4 and the wiring conductor 3 are provided on the heat-resistant insulating resin layer 7 and in the through holes 7a to 7f.
(Hereinafter, simply referred to as the conductor 3) are formed. Further, by covering them, the through holes 8a, 8b, 8
A heat-resistant insulating resin layer 8 made of a polyimide resin having c and 8d is provided. Conductors 2, 3, and 4 are provided thereon, respectively. On the heat-resistant insulating resin layer 8, the semiconductor bare chip 10 and the electronic components 11, 12 and the like are connected to the respective conductors 2, 3, and 4 via the bonding wires 13. The semiconductor bare chip 10 and the electronic components 11 and 12 are coated with a coating resin 9.

【0042】次に,図1の電気回路基板の製造方法につ
いて説明する。図1において,アルミナ等のセラミック
基板1の上に導体2をスパッタ蒸着にて2μm厚みの銅
膜をセラミック基板1全面に成膜した後,フォトレジス
トによるマスクパターン膜をフォトリソグラフィー技術
を用い成膜した。その後,エッチングにて導体2の不要
部分を除去し,所望のパターンにし,フォトレジスト膜
を除去後,ポリイミド樹脂からなる耐熱絶縁樹脂層5を
フォトリソグラフィー技術を利用しスルーホールを形
成,熱処理し成膜した。その後,前述導体形成方法と同
様にし,導体3を形成し,更にその上に耐熱絶縁樹脂層
5の形成方法と同様にポリイミド樹脂からなる耐熱絶縁
樹脂層6を成膜し,同様に導体3およびポリイミド樹脂
からなる耐熱絶縁樹脂層7及び8を重畳成膜し,回路基
板を形成した。
Next, a method of manufacturing the electric circuit board of FIG. 1 will be described. In FIG. 1, a conductor 2 is sputter-deposited on a ceramic substrate 1 made of alumina or the like to form a copper film having a thickness of 2 μm on the entire surface of the ceramic substrate 1, and then a mask pattern film made of photoresist is formed by using a photolithography technique. did. After that, an unnecessary portion of the conductor 2 is removed by etching to form a desired pattern, the photoresist film is removed, and then a through hole is formed in the heat resistant insulating resin layer 5 made of polyimide resin by using a photolithography technique, and heat treatment is performed. Filmed After that, the conductor 3 is formed in the same manner as the conductor forming method described above, and the heat-resistant insulating resin layer 6 made of polyimide resin is further formed thereon similarly to the method of forming the heat-resistant insulating resin layer 5, and the conductor 3 and Heat-resistant insulating resin layers 7 and 8 made of a polyimide resin were superposed to form a circuit board.

【0043】またその後,半導体ベアチップ10及び電
子部品11,12を実装後,半導体ベアチップ10をボ
ンディングワイヤ13により電気的接続をし,これらを
コーティング樹脂9でコーティングし,電気回路製品を
製造した。
After that, after mounting the semiconductor bare chip 10 and the electronic components 11 and 12, the semiconductor bare chip 10 is electrically connected by the bonding wire 13, and these are coated with the coating resin 9 to manufacture an electric circuit product.

【0044】このように,第1実施例で得られた電気回
路基板は従来スパッタ蒸着等で成膜しエッチングにてパ
ターンを形成していた絶縁膜が,スピンコーター等の簡
易設備にて塗布成膜しフォトリソグラフィー技術を用い
るパターンを形成できるため飛躍的に生産性が向上しか
つ工程に関わる費用の低減が実現できた。
As described above, in the electric circuit board obtained in the first embodiment, the insulating film, which was conventionally formed by sputtering deposition or the like and patterned by etching, is applied by a simple equipment such as a spin coater. Since it is possible to form a film and form a pattern using photolithography technology, the productivity is dramatically improved and the cost related to the process is reduced.

【0045】図2は,本発明の第1実施例に係る電気回
路基板構成部の耐熱絶縁樹脂膜15のスルーホール17
と配線導体14及び16との接続部の模式拡大断面図で
ある。図2において,耐熱絶縁樹脂膜15のスルーホー
ル17は,すり鉢状に形成され壁面は導体16の鉛直方
向に対する仰角θが30°から60°の間の角度になる
ように加工されている。
FIG. 2 is a through-hole 17 of the heat-resistant insulating resin film 15 of the electric circuit board component according to the first embodiment of the present invention.
FIG. 7 is a schematic enlarged cross-sectional view of a connection portion between the wiring conductor and the wiring conductors 14 and 16. In FIG. 2, the through hole 17 of the heat resistant insulating resin film 15 is formed in a mortar shape, and the wall surface is processed so that the elevation angle θ with respect to the vertical direction of the conductor 16 is an angle between 30 ° and 60 °.

【0046】このような構造において,配線導体間の接
合部である耐熱絶縁樹脂層のスルーホールが図2で示さ
れるようにすり鉢状のテーパーがあり接続部における断
線および接続不良等の不具合が解消され飛躍的に製品の
歩留まりが向上し信頼性の高い回路基板の製造が実現で
きた。
In such a structure, the through-holes of the heat-resistant insulating resin layer, which are the joints between the wiring conductors, have a mortar-shaped taper as shown in FIG. 2 and the problems such as disconnection and connection failure at the connection are eliminated. As a result, the yield of products has improved dramatically, and it has been possible to manufacture highly reliable circuit boards.

【0047】図3は,本発明の第1実施例に係る電気回
路基板上の発熱部品の放熱構造の説明に供せられる断面
図である。図3において,電気回路基板22上に実装さ
れた発熱部品21の発熱を放熱するように放熱構造18
に示す導体層と絶縁層を交互に重ねたヒートバス,ある
いは放熱構造19に示す導体金属によるヒートパス,あ
るいは放熱構造20に示すように配線回路を発熱部品2
1近傍に密集させたヒートパスを構成した。このよう
に,電気回路基板に,ヒートパス放熱構造を具備するこ
とにより発熱部品21の発熱を放熱経路23,24,2
5にて放熱し部品搭載面の温度上昇を緩和できるため発
熱部品近傍の温度上昇による不具合がなくなり,高密度
実装性と高信頼性を合せ持つ高性能な回路基板が実現さ
れた。
FIG. 3 is a sectional view provided for explaining the heat dissipation structure of the heat generating component on the electric circuit board according to the first embodiment of the present invention. In FIG. 3, a heat dissipation structure 18 is provided to dissipate heat generated by the heat generating component 21 mounted on the electric circuit board 22.
The heat bath in which the conductor layers and the insulating layers are alternately stacked, or the heat path by the conductor metal shown in the heat dissipation structure 19, or the wiring circuit as shown in the heat dissipation structure 20.
A heat path densely packed in the vicinity of 1 was constructed. As described above, by providing the electric circuit board with the heat path heat dissipation structure, the heat generated by the heat generating component 21 is dissipated through the heat dissipation paths 23, 24, 2.
Since heat can be dissipated in step 5 and the temperature rise on the component mounting surface can be mitigated, problems due to temperature rise in the vicinity of heat-generating components have been eliminated, and a high-performance circuit board that has both high-density mountability and high reliability has been realized.

【0048】図4は,本発明の第1実施例に係る電気回
路基板のストリップライン構造を説明する模式断面図で
ある。図4において,電気信号線路導体27の伝送特性
インピーダンスを50Ωあるいは75Ωになるように,
電気回路基板26内部の電気信号線路導体27の厚み及
び幅と,接地導体28との間隔であるポリイミド樹脂か
らなる耐熱絶縁樹脂層29の厚みをコントロールした。
FIG. 4 is a schematic sectional view for explaining the stripline structure of the electric circuit board according to the first embodiment of the present invention. In FIG. 4, the transmission characteristic impedance of the electric signal line conductor 27 is set to 50Ω or 75Ω,
The thickness and width of the electric signal line conductor 27 inside the electric circuit board 26 and the thickness of the heat-resistant insulating resin layer 29 made of polyimide resin, which is the distance from the ground conductor 28, were controlled.

【0049】このように,高速電気信号等をより高効率
で伝搬するためストリップライン伝送線路構造を実現す
ることができた。
In this way, a stripline transmission line structure could be realized in order to propagate high-speed electrical signals and the like with higher efficiency.

【0050】図5は,本発明の第1実施例に係る電気回
路基板の半導体チップ等を駆動するための電源線路から
放射される電磁ノイズを地絡させる構造を説明する模式
断面図である。図5において,駆動電源線路導体33の
一部は接地導体31及び32に金属酸化皮膜34及び3
5を介し挟み込まれる構成であり,本実施例では金属酸
化皮膜34及び35の形成方法として,前述した絶縁樹
脂形成方法にてポリイミド樹脂からなる耐熱絶縁樹脂層
36あるいは37を形成し,その後,タンタル膜をスパ
ッタ蒸着及びフォトリソグラフィー及びエッチングにて
1000オングストロームのパターンを成膜し,陽極化
成法によりタンタルを酸化し更に前述した工法を用い電
気回路基板30を製造した。尚,耐熱絶縁樹脂層38中
の導体39,40は電気信号線路導体である。
FIG. 5 is a schematic sectional view for explaining a structure for grounding electromagnetic noise radiated from a power supply line for driving a semiconductor chip or the like of an electric circuit board according to the first embodiment of the present invention. In FIG. 5, a part of the drive power line conductor 33 is formed on the ground conductors 31 and 32 by the metal oxide films 34 and 3.
5, the heat-resistant insulating resin layer 36 or 37 made of polyimide resin is formed by the above-described insulating resin forming method as the method of forming the metal oxide films 34 and 35, and then tantalum is formed. A 1000 angstrom pattern was formed on the film by sputter deposition, photolithography and etching, tantalum was oxidized by anodization, and the electric circuit board 30 was manufactured by the above-mentioned method. The conductors 39 and 40 in the heat resistant insulating resin layer 38 are electric signal line conductors.

【0051】このように,電源線路等による電磁ノイズ
を,図5に示す構造とする事で非常に大容量のバイパス
コンデンサーを具備でき不要なノイズを非常に効果的に
地絡させるため,高性能でありかつ高信頼性である電気
回路基板が実現できた。
As described above, by constructing the structure shown in FIG. 5 for the electromagnetic noise due to the power supply line, etc., a very large capacity bypass capacitor can be provided and unnecessary noise can be grounded very effectively. And a highly reliable electric circuit board has been realized.

【0052】図6は,本発明の第2実施例に係る電気回
路基板を用いた電気回路製品構成の断面図である。図6
において,不純物をドープされていないSiウエハ又は
アルミナ等のセラミック基板1の上に接地導体2(以
下,単に導体2と呼ぶ)が形成されている。その上に,
スルホール5bを備えた窒化ケイ素(Si3 4 )から
なる耐熱絶縁樹脂層5が形成され,その上に導体2及び
半導体トランジスタ等の実装部品を駆動させるための駆
動電源線路導体4(以下,単に導体4と呼ぶ)が形成さ
れている。さらに,その上に,スルホール6c及び6d
を有するポリイミド樹脂からなる耐熱絶縁樹脂層6が形
成されている。この耐熱絶縁樹脂層6の上及びスルホー
ル6c及び6d上に導体2及び4が形成されている。さ
らに,その上に,スルーホール7h〜7jを備えたポリ
イミド樹脂からなる耐熱絶縁樹脂層7が設けられてい
る。さらに,耐熱絶縁樹脂層7の上及びスルーホール7
h〜7jに導体2及び4及び配線導体3(以下,単に導
体3と呼ぶ)が夫々形成されている。さらに,それらを
覆って,スルーホール8f〜8hを有するポリイミド樹
脂からなる耐熱絶縁樹脂層8が設けられている。その上
に導体2,3,及び4が夫々設けられている。さらに,
耐熱絶縁樹脂層8上には,耐熱絶縁樹脂層51が設けら
れ,前述したものと同様に導体2,3,及び4が設けら
れている。導体2,3,4上には,電子部品54,5
5,56がそれぞれ設けられている。これらの電子部品
54,55,56は,図1の第1実施例と同様に,コー
ティング樹脂9でコーティングされる。尚,符号57,
58,59はアース端子,電源端子,信号ライン入力端
子を夫々示している。
FIG. 6 is a sectional view of the electric circuit product structure using the electric circuit board according to the second embodiment of the present invention. Figure 6
In, a ground conductor 2 (hereinafter simply referred to as a conductor 2) is formed on a ceramic substrate 1 such as a Si wafer or alumina which is not doped with impurities. in addition,
A heat resistant insulating resin layer 5 made of silicon nitride (Si 3 N 4 ) having a through hole 5b is formed, and a conductor 2 and a drive power line conductor 4 (hereinafter, simply referred to as a drive power line conductor for driving a mounted component such as a semiconductor transistor) thereon. (Referred to as conductor 4) is formed. Furthermore, on it, through holes 6c and 6d
A heat-resistant insulating resin layer 6 made of a polyimide resin having a is formed. Conductors 2 and 4 are formed on the heat-resistant insulating resin layer 6 and on the through holes 6c and 6d. Furthermore, a heat-resistant insulating resin layer 7 made of polyimide resin having through holes 7h to 7j is provided thereon. Further, on the heat-resistant insulating resin layer 7 and through holes 7
The conductors 2 and 4 and the wiring conductor 3 (hereinafter, simply referred to as the conductor 3) are formed on h to 7j, respectively. Further, a heat resistant insulating resin layer 8 made of polyimide resin having through holes 8f to 8h is provided so as to cover them. Conductors 2, 3, and 4 are provided thereon, respectively. further,
A heat-resistant insulating resin layer 51 is provided on the heat-resistant insulating resin layer 8, and conductors 2, 3, and 4 are provided in the same manner as described above. Electronic components 54, 5 are provided on the conductors 2, 3, 4
5, 56 are provided respectively. These electronic components 54, 55 and 56 are coated with the coating resin 9 as in the first embodiment shown in FIG. Incidentally, reference numeral 57,
Reference numerals 58 and 59 denote a ground terminal, a power supply terminal and a signal line input terminal, respectively.

【0053】次に,図6の電気回路基板の製造方法につ
いて説明する。図6において,アルミナ等のセラミック
基板1の上に導体2をスパッタ蒸着にて2μm厚みの銅
膜をセラミック基板1全面に成膜した。次に,Si3
4 からなる耐熱絶縁樹脂層5をフォトリソグラフィー技
術を利用しスルーホール5bを形成,スパッタ蒸着法を
用いて成膜した。なお,その後,前述導体形成方法と同
様にし,導体4を形成し,更にその上にポリイミド樹脂
からなる耐熱絶縁樹脂層6及び7を成膜し,同様に導体
3およびポリイミド樹脂からなる耐熱絶縁樹脂層8,5
1を重畳成膜した。導体2,3,4を夫々形成後,その
一部をエッチングにより除去した後,周辺部を耐熱絶縁
樹脂層51で充填し,第1実施例と同様に,電子部品5
4,55,56を搭載,ボンディングワイヤ13により
電気的接続をし,これらを実施例1と同様にコーティン
グ樹脂9でコーティングして(図示せず)電気回路製品
を製造した。
Next, a method for manufacturing the electric circuit board of FIG. 6 will be described. In FIG. 6, a conductor 2 is sputter-deposited on a ceramic substrate 1 such as alumina to form a copper film having a thickness of 2 μm on the entire surface of the ceramic substrate 1. Next, Si 3 N
A heat resistant insulating resin layer 5 made of 4 was formed by using a photolithography technique to form through holes 5b and using a sputter deposition method. After that, the conductor 4 is formed in the same manner as the above-described conductor forming method, and the heat-resistant insulating resin layers 6 and 7 made of a polyimide resin are further formed thereon, and the heat-resistant insulating resin made of the conductor 3 and the polyimide resin is also formed. Layers 8 and 5
1 was superposed and formed. After forming the conductors 2, 3 and 4, respectively, and removing a part of them by etching, the peripheral portion is filled with the heat-resistant insulating resin layer 51, and the electronic component 5 is formed as in the first embodiment.
4, 55, and 56 were mounted and electrically connected by the bonding wire 13, and these were coated with the coating resin 9 (not shown) in the same manner as in Example 1 to manufacture an electric circuit product.

【0054】尚,上記実施例において,耐熱絶縁樹脂層
5として,Si3 4 を用いたが,二酸化ケイ素(Si
2 )を用いることができる。しかし,Si3 4 は,
SiO2 に比べて,2倍以上の誘電率を備え,絶縁破壊
電圧も高く,導体2と導体4との間の耐電圧が高く,容
量も大きいので,バイパスコンデンサとして使用するこ
とができるので,Si3 4 が好ましい。また,Si3
4 膜は,SiO2 等に比べて緻密であり,吸湿性もな
く,湿気に強いバイパスコンデンサを構成することがで
きる。また,Si3 4 は,酸化タンタルは等に比べて
緻密な厚膜が成膜できるので,比較的耐電圧の高く,破
壊されにくいパイパスコンデンサーが得られる。
Although Si 3 N 4 is used as the heat-resistant insulating resin layer 5 in the above-mentioned embodiment, silicon dioxide (Si
O 2 ) can be used. However, Si 3 N 4
Compared with SiO 2 , it has a dielectric constant more than twice, has a high dielectric breakdown voltage, a high withstand voltage between conductors 2 and 4, and has a large capacity, so it can be used as a bypass capacitor. Si 3 N 4 is preferred. In addition, Si 3
The N 4 film is denser than SiO 2 or the like, has no hygroscopicity, and can form a bypass capacitor that is resistant to moisture. Further, since Si 3 N 4 can form a dense thick film as compared with tantalum oxide or the like, a bypass capacitor having a relatively high withstand voltage and being hardly broken can be obtained.

【0055】また,この耐熱絶縁樹脂層5の形成方法と
して,スパッタ蒸着を用いたが,CVD法によっても成
膜することができる。
As the method for forming the heat resistant insulating resin layer 5, sputter deposition was used, but it can be formed by the CVD method.

【0056】尚,本実施例ではアルミナ基板を使用した
が,如何なるセラミック基板であっても,あるいはシリ
コン基板やガラス基板,プラスチック基板またはそのほ
かの物であっても本発明の効果は同様に得られることは
言うまでもない。更に導体材質は本実施例では銅である
が,これについても電気が流れる如何なる材質であって
も本発明の効果は同等に得られる。更に耐熱絶縁樹脂と
して本実施例ではポリイミド樹脂を用いたが,これにつ
いてもどのような材質であっても本発明構造が得られる
ような物であれば,同様な効果が得られる。更に金属酸
化皮膜についても同様に如何なる金属酸化皮膜を如何な
る製造方法にて適用したとしても,効果の大小如何に関
わらず本発明の効果は得られる。
Although the alumina substrate is used in this embodiment, the same effects of the present invention can be obtained by using any ceramic substrate, silicon substrate, glass substrate, plastic substrate or other materials. Needless to say. Further, the conductor material is copper in the present embodiment, but the effect of the present invention can be obtained equally with any material through which electricity flows. Further, although the polyimide resin is used as the heat-resistant insulating resin in this embodiment, the same effect can be obtained as long as the structure of the present invention can be obtained with any material. Further, regarding the metal oxide film, even if any metal oxide film is applied by any manufacturing method, the effect of the present invention can be obtained regardless of the magnitude of the effect.

【0057】[0057]

【発明の効果】以上説明したように,本発明によれば,
従来スパッタ蒸着等で成膜しエッチングにてパターンを
形成していた絶縁膜が,スピンコーター等の簡易設備に
て塗布成膜しフォトリソグラフィー技術を用いるパター
ンを形成できるため飛躍的に生産性が向上しかつ工程に
要する費用の低減が実現できる電気回路基板とその製造
方法とを提供することができる。
As described above, according to the present invention,
The insulating film, which was conventionally formed by sputtering deposition and formed by etching, can be applied by a simple facility such as a spin coater to form a pattern using photolithography technology, which dramatically improves productivity. In addition, it is possible to provide an electric circuit board and a method for manufacturing the electric circuit board that can reduce the cost required for the process.

【0058】また,本発明によれば,配線導体間の接合
部である絶縁樹脂層のスルーホールをすり鉢状のテーパ
ーがあり接続部における断線および接続不良等の不具合
が解消され飛躍的に製品の歩留まりが向上し信頼性の高
い回路基板の製造が実現できる電気回路基板とその製造
方法とを提供することができる。
Further, according to the present invention, the through hole of the insulating resin layer, which is a joint between wiring conductors, has a mortar-like taper, and problems such as disconnection and connection failure at the connection portion are solved, and the product is dramatically improved. It is possible to provide an electric circuit board and a method for manufacturing the electric circuit board, which can improve the yield and realize the manufacture of a highly reliable circuit board.

【0059】また,本発明によれば,電気回路基板に,
ヒートパス放熱構造を具備することにより発熱部品の発
熱を放熱経路にて放熱し部品搭載面の温度上昇を緩和で
きるため発熱部品近傍の温度上昇による不具合がなくな
り,高密度実装性と高信頼性を合せ持つ高性能な回路基
板が実現できる電気回路基板とその製造方法とを提供す
ることができる。
Further, according to the present invention, the electric circuit board,
With the heat-path heat dissipation structure, the heat generated by the heat-generating components can be radiated through the heat-dissipating path, and the temperature rise on the component mounting surface can be mitigated. It is possible to provide an electric circuit board that can realize a high-performance circuit board and a manufacturing method thereof.

【0060】また,本発明によれば,高速電気信号等を
より高効率で伝搬するためストリップライン伝送線路構
造を実現し,また電源線路等による電磁ノイズを非常に
大容量のバイパスコンデンサーを具備でき不要なノイズ
を非常に効果的に地絡させるため,高性能でありかつ高
信頼性である電気回路基板が実現できる電気回路基板と
その製造方法とを提供することができる。
Further, according to the present invention, a stripline transmission line structure is realized in order to propagate a high-speed electric signal or the like with higher efficiency, and a bypass capacitor having a very large capacity for electromagnetic noise due to a power supply line or the like can be provided. Since the unnecessary noise is grounded very effectively, it is possible to provide an electric circuit board capable of realizing an electric circuit board having high performance and high reliability, and a manufacturing method thereof.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例に係る電気回路基板を用い
た電気回路製品構成の断面図である。
FIG. 1 is a cross-sectional view of an electric circuit product configuration using an electric circuit board according to a first embodiment of the present invention.

【図2】本発明の第1実施例に係る電気回路基板の耐熱
絶縁樹脂のスルーホールと配線導体及び接続部の模式拡
大断面図である。
FIG. 2 is a schematic enlarged cross-sectional view of a through hole of a heat-resistant insulating resin, a wiring conductor, and a connecting portion of the electric circuit board according to the first embodiment of the present invention.

【図3】本発明の第1実施例に係る電気回路基板上の発
熱部品の放熱構造の説明に供せられる断面図である。
FIG. 3 is a cross-sectional view provided for explaining the heat dissipation structure of the heat generating component on the electric circuit board according to the first embodiment of the present invention.

【図4】本発明の第1実施例に係る電気回路基板のスト
リップライン構造を説明する模式断面図である。
FIG. 4 is a schematic cross-sectional view illustrating a stripline structure of the electric circuit board according to the first embodiment of the present invention.

【図5】本発明の第1実施例に係る電気回路基板の電源
線路から放射される電磁ノイズ対策構造の説明に供せら
れる模式断面図である。
FIG. 5 is a schematic cross-sectional view provided for explaining a structure for preventing electromagnetic noise radiated from the power supply line of the electric circuit board according to the first embodiment of the present invention.

【図6】本発明の第2実施例に係る電気回路基板を用い
た電気回路製品構成の断面図である。
FIG. 6 is a cross-sectional view of an electric circuit product configuration using the electric circuit board according to the second embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 セラミック基板 2,28,31,32 (接地)導体 3,14,16 (配線)導体 4,33 (駆動電源線路)導体 5,6,7,8,15,29a,29b,29c,3
6,37,38,51耐熱絶縁樹脂層 9 コーティング樹脂 10 半導体ベアチップ 11,12,54,55,56 電子部品 13 ボンディングワイヤ 17 スルーホール 18,19,20 放熱構造 21 発熱部品 22,26,30 電気回路基板 23,24,25 放熱経路 27,39,40 電気信号線路導体 34,35 金属酸化皮膜
1 Ceramic Substrate 2, 28, 31, 32 (Ground) Conductor 3, 14, 16 (Wiring) Conductor 4, 33 (Drive Power Supply Line) Conductor 5, 6, 7, 8, 15, 29a, 29b, 29c, 3
6,37,38,51 Heat-resistant insulating resin layer 9 Coating resin 10 Semiconductor bare chip 11,12,54,55,56 Electronic component 13 Bonding wire 17 Through hole 18,19,20 Heat dissipation structure 21 Heating component 22,26,30 Electric Circuit board 23, 24, 25 Heat dissipation path 27, 39, 40 Electric signal line conductor 34, 35 Metal oxide film

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B05D 7/00 B05D 7/00 H H01L 21/768 H01L 21/90 B ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Internal reference number FI Technical display location B05D 7/00 B05D 7/00 H H01L 21/768 H01L 21/90 B

Claims (25)

【特許請求の範囲】[Claims] 【請求項1】 セラミック基板またはシリコン基板上に
形成された少なくとも2層の導体層と,前記導体層間に
形成された電気絶縁膜と,前記電気絶縁膜に前記導体層
を電気的に接続するためのスルーホールとを有する電気
回路基板において,前記電気絶縁膜が樹脂塗装方法によ
り形成された耐熱樹脂により構成されていることを特徴
とする電気回路基板。
1. A method for electrically connecting at least two conductor layers formed on a ceramic substrate or a silicon substrate, an electric insulation film formed between the conductor layers, and the electric insulation film to the conductor layers. An electric circuit board having a through hole, wherein the electric insulating film is made of a heat-resistant resin formed by a resin coating method.
【請求項2】 請求項1の電気回路基板において,前記
樹脂塗装方法は,塗布,浸漬,印刷,及びスプレー塗装
の内から選択された少なくとも一種の方法であることを
特徴とする電気回路基板。
2. The electric circuit board according to claim 1, wherein the resin coating method is at least one method selected from coating, dipping, printing, and spray coating.
【請求項3】 請求項1又は2記載の電気回路基板にお
いて,前記導体層のうちの少なくとも一層は真空蒸着及
びスパッタ蒸着の内の少なくとも一種の部品から選択さ
れた薄膜プロセスにより形成されていることを特徴とす
る電気回路基板。
3. The electric circuit board according to claim 1, wherein at least one of the conductor layers is formed by a thin film process selected from at least one of vacuum vapor deposition and sputter vapor deposition. An electric circuit board characterized by.
【請求項4】 請求項1乃至3の内のいずれかに記載の
電気回路基板において,前記電気回路基板は,電子部品
及びモジュール部品の内の少なくとも一種が搭載されて
電気的回路を形成していることを特徴とする電気回路基
板。
4. The electric circuit board according to claim 1, wherein at least one of an electronic component and a module component is mounted on the electric circuit substrate to form an electric circuit. An electric circuit board characterized in that
【請求項5】 請求項4記載の電気回路基板において,
前記電子部品は,半導体ベアチップ,抵抗,コンデン
サ,及びコイルの内から選択された少なくとも一種であ
り,前記モジュール部品は,前記電子部品は複数個実装
されたハイブリッドICであることを特徴とする電気回
路基板。
5. The electric circuit board according to claim 4,
The electronic component is at least one selected from a semiconductor bare chip, a resistor, a capacitor, and a coil, and the module component is a hybrid IC in which a plurality of the electronic components are mounted. substrate.
【請求項6】 請求項1乃至5の内のいずれかに記載の
電気回路基板において,前記耐熱樹脂は感光性樹脂であ
り,前記スルーホールはフォトリソグラフィー技術によ
り形成されていることを特徴とする電気回路基板。
6. The electric circuit board according to claim 1, wherein the heat resistant resin is a photosensitive resin, and the through holes are formed by a photolithography technique. Electric circuit board.
【請求項7】 請求項1乃至6の内のいずれかに記載の
電気回路基板において,前記耐熱樹脂の前記スルーホー
ルはすり鉢状であり,前記スルホールの導体膜は前記ス
ルーホールの中心軸方向に対し仰角30°以上のテーパ
ーを有することを特徴とする電気回路基板。
7. The electric circuit board according to claim 1, wherein the through hole of the heat resistant resin has a mortar shape, and the conductor film of the through hole extends in a central axis direction of the through hole. On the other hand, an electric circuit board having a taper with an elevation angle of 30 ° or more.
【請求項8】 請求項4乃至7の内のいずれかに記載の
電気回路基板において,前記部品の発熱を電気回路上で
または電気回路に関係なく設置された金属あるいは熱伝
導性の優れた材料により前記部品を搭載した面の温度上
昇を緩和する構成を有することを特徴とする電気回路基
板。
8. The electric circuit board according to any one of claims 4 to 7, wherein a metal or a material having excellent thermal conductivity is installed on the electric circuit for generating heat of the component or irrespective of the electric circuit. An electric circuit board having a structure for reducing a temperature rise of a surface on which the component is mounted.
【請求項9】 請求項1乃至8の内のいずれかに記載の
電気回路基板において,前記電気回路基板の前記導体層
の形状および配置の少なくとも一部はストリップ線路構
造であり,前記導体層の内の電気信号を通す信号導体の
上部あるいは下部に前記電気絶縁膜を介し前記導体層と
して接地導体が配置され,所定の導体幅および前記信号
導体と前記接地導体との間隔が所望の特性インピーダン
スに設計され構成されていることを特徴とする電気回路
基板。
9. The electric circuit board according to claim 1, wherein at least a part of the shape and arrangement of the conductor layer of the electric circuit board is a strip line structure, A ground conductor is arranged as the conductor layer above or below a signal conductor through which an electric signal is passed through the electric insulating film, and a predetermined conductor width and a distance between the signal conductor and the ground conductor are set to a desired characteristic impedance. An electric circuit board that is designed and configured.
【請求項10】 請求項4乃至9の内のいずれかに記載
の電気回路基板において,前記導体層の内の前記部品の
駆動用の直流あるいは低周波電流が流れる駆動導体の上
部あるいは下部に電気絶縁性を有する前記電気絶縁膜を
介し前記導体層として接地導体を配置したことを特徴と
する電気回路基板。
10. The electric circuit board according to any one of claims 4 to 9, wherein an electric circuit is provided above or below a drive conductor in which a DC or low-frequency current for driving the component in the conductor layer flows. An electric circuit board, wherein a ground conductor is arranged as the conductor layer via the electrically insulating film having an insulating property.
【請求項11】 請求項10記載の電気回路基板におい
て,前記電気絶縁膜が金属酸化皮膜であることを特徴と
する電気回路基板。
11. The electric circuit board according to claim 10, wherein the electric insulating film is a metal oxide film.
【請求項12】 請求項11記載の電気回路基板におい
て,前記駆動導体と前記接地導体の少なくとも一方は複
数層であり,前記電気絶縁膜を介し一方が他の一方に挟
み込まれていることを特徴とする電気回路基板。
12. The electric circuit board according to claim 11, wherein at least one of the drive conductor and the ground conductor is a plurality of layers, and one is sandwiched by the other via the electric insulating film. And electrical circuit board.
【請求項13】 セラミック基板またはシリコン基板上
に,スルーホールを有する電気絶縁膜を介して,前記ス
ルホールを介して接続された少なくとも2層の導体層を
形成する電気回路基板の製造方法において,前記電気回
路基板の前記電気絶縁膜を耐熱樹脂の樹脂塗装方法によ
り形成することを特徴とする電気回路基板の製造方法。
13. A method for manufacturing an electric circuit board, comprising: forming on a ceramic substrate or a silicon substrate at least two conductor layers connected via the through holes via an electric insulating film having through holes. A method of manufacturing an electric circuit board, characterized in that the electric insulating film of the electric circuit board is formed by a resin coating method of heat resistant resin.
【請求項14】 請求項13記載の電気回路基板の製造
方法において,前記樹脂塗装方法は,塗布,浸漬,印
刷,及びスプレー塗装から選択された少なくとも一種で
あることを特徴とする電気回路基板の製造方法。
14. The method of manufacturing an electric circuit board according to claim 13, wherein the resin coating method is at least one selected from coating, dipping, printing, and spray coating. Production method.
【請求項15】 請求項13又は14記載の電気回路基
板の製造方法において,前記導体層のうちの少なくとも
一層を真空蒸着及びスパッタ蒸着の内から選択された薄
膜プロセスにより形成することを特徴とする電気回路基
板の製造方法。
15. The method of manufacturing an electric circuit board according to claim 13, wherein at least one of the conductor layers is formed by a thin film process selected from vacuum deposition and sputter deposition. Manufacturing method of electric circuit board.
【請求項16】 請求項13乃至15の内のいずれかに
記載の電気回路基板の製造方法において,電子部品及び
モジュール部品の内の少なくとも一種を搭載して電気回
路を形成することを特徴とする電気回路基板の製造方
法。
16. The method for manufacturing an electric circuit board according to claim 13, wherein at least one of an electronic component and a module component is mounted to form an electric circuit. Manufacturing method of electric circuit board.
【請求項17】 請求項16記載の電気回路基板の製造
方法において,前記電子部品は,半導体ベアチップ,抵
抗,コンデンサ,及びコイルの内の少なくとも一種であ
り,前記モジュール部品は複数個の前記電子部品が実装
されたハイブリッドICであることを特徴とする電気回
路基板の製造方法。
17. The method of manufacturing an electric circuit board according to claim 16, wherein the electronic component is at least one of a semiconductor bare chip, a resistor, a capacitor, and a coil, and the module component is a plurality of the electronic components. A method for manufacturing an electric circuit board, wherein the method is a hybrid IC mounted with.
【請求項18】 請求項13乃至17の内のいずれかに
記載の電気回路基板の製造方法において,前記耐熱樹脂
は感光性樹脂であり,前記スルーホールをフォトリソグ
ラフィー技術により形成することを特徴とする電気回路
基板の製造方法。
18. The method for manufacturing an electric circuit board according to claim 13, wherein the heat-resistant resin is a photosensitive resin, and the through holes are formed by a photolithography technique. Method for manufacturing electric circuit board.
【請求項19】 請求項13乃至18の内のいずれかに
記載の電気回路基板の製造方法において,前記耐熱樹脂
の前記スルーホールはすり鉢状であり,前記スルホール
の導体膜は,前記スルーホールの中心軸方向に対し仰角
30°以上のテーパーを有するように形成することを特
徴とする電気回路基板の製造方法。
19. The method for manufacturing an electric circuit board according to claim 13, wherein the through hole of the heat resistant resin has a mortar shape, and the conductor film of the through hole is formed of the through hole. A method for manufacturing an electric circuit board, which is formed so as to have a taper with an elevation angle of 30 ° or more with respect to a central axis direction.
【請求項20】 請求項13乃至19の内のいずれかに
記載の電気回路基板の製造方法において,前記部品の発
熱を電気回路上でまたは電気回路に関係なく設置された
金属あるいは熱伝導性の優れた材料により前記部品を搭
載した面の温度上昇を緩和するように形成したことを特
徴とする電気回路基板の製造方法。
20. The method of manufacturing an electric circuit board according to claim 13, wherein the heat generated by the component is installed on the electric circuit or independently of the electric circuit. A method of manufacturing an electric circuit board, which is formed by using an excellent material so as to reduce a temperature rise of a surface on which the component is mounted.
【請求項21】 請求項13乃至20の内のいずれかに
記載の電気回路基板の製造方法において,前記電気回路
基板の前記導体層の形状および配置の少なくとも一部は
ストリップ線路構造であり,前記導体層の内の電気信号
を通す信号導体の上部あるいは下部に前記電気絶縁膜を
介し前記導体層として接地導体が配置され所定の導体幅
および前記信号導体と前記接地導体との間隔が所望の特
性インピーダンスを有するように構成したことを特徴と
する電気回路基板の製造方法。
21. The method of manufacturing an electric circuit board according to claim 13, wherein at least a part of the shape and arrangement of the conductor layer of the electric circuit board has a strip line structure, A ground conductor is arranged as the conductor layer above or below the signal conductor through which an electric signal is passed in the conductor layer through the electric insulation film, and a predetermined conductor width and a space between the signal conductor and the ground conductor have desired characteristics. A method of manufacturing an electric circuit board, which is configured to have impedance.
【請求項22】 請求項21記載の電気回路基板の製造
方法において,前記導体層の内で前記部品の駆動用の直
流あるいは低周波電流が流れる駆動導体の上部あるいは
下部に電気絶縁膜を介し前記導体層として前記接地導体
を配置することを特徴とする電気回路基板の製造方法。
22. The method of manufacturing an electric circuit board according to claim 21, wherein a direct-current or low-frequency current for driving the component in the conductor layer flows through an electric insulating film above or below the drive conductor. A method of manufacturing an electric circuit board, wherein the ground conductor is arranged as a conductor layer.
【請求項23】 請求項22記載の電気回路基板の製造
方法において,前記電気絶縁膜が金属酸化皮膜であるこ
とを特徴とする電気回路基板の製造方法。
23. The method of manufacturing an electric circuit board according to claim 22, wherein the electric insulating film is a metal oxide film.
【請求項24】 請求項22記載の電気回路基板の製造
方法において,前記駆動導体と前記接地導体の少なくと
も一方は複数層であり,前記電気絶縁膜を介し一方が他
の一方に挟み込むことを特徴とする電気回路基板の製造
方法。
24. The method for manufacturing an electric circuit board according to claim 22, wherein at least one of the drive conductor and the ground conductor has a plurality of layers, and one of the drive conductor and the ground conductor is sandwiched by the other via the electric insulating film. And a method for manufacturing an electric circuit board.
【請求項25】 請求項22記載の電気回路基板の製造
方法において,前記電気絶縁膜は,窒化ケイ素から形成
されていることを特徴とする電気回路基板の製造方法。
25. The method of manufacturing an electric circuit board according to claim 22, wherein the electric insulating film is formed of silicon nitride.
JP7121892A 1995-03-09 1995-05-19 Electric circuit board and its production Withdrawn JPH08307063A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7121892A JPH08307063A (en) 1995-03-09 1995-05-19 Electric circuit board and its production

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4985795 1995-03-09
JP7-49857 1995-03-09
JP7121892A JPH08307063A (en) 1995-03-09 1995-05-19 Electric circuit board and its production

Publications (1)

Publication Number Publication Date
JPH08307063A true JPH08307063A (en) 1996-11-22

Family

ID=26390301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7121892A Withdrawn JPH08307063A (en) 1995-03-09 1995-05-19 Electric circuit board and its production

Country Status (1)

Country Link
JP (1) JPH08307063A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002111222A (en) * 2000-10-02 2002-04-12 Matsushita Electric Ind Co Ltd Multilayer substrate
US6477284B1 (en) 1999-06-14 2002-11-05 Nec Corporation Photo-electric combined substrate, optical waveguide and manufacturing process therefor
JP2007165932A (en) * 2007-02-22 2007-06-28 Matsushita Electric Ind Co Ltd Multilayer substrate
JP2009010411A (en) * 2008-08-22 2009-01-15 National Institute Of Advanced Industrial & Technology Multilayer fine wiring structure
JP2009164425A (en) * 2008-01-08 2009-07-23 Oki Semiconductor Co Ltd Real-time monitor device and operating method
WO2010114300A3 (en) * 2009-03-31 2011-01-20 주식회사 잉크테크 Method for manufacturing thin metal laminated film
JP2021500233A (en) * 2017-12-05 2021-01-07 オソン メディカル イノベーション ファウンデーション Thin film electrode separation method using coefficient of thermal expansion

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6477284B1 (en) 1999-06-14 2002-11-05 Nec Corporation Photo-electric combined substrate, optical waveguide and manufacturing process therefor
JP2002111222A (en) * 2000-10-02 2002-04-12 Matsushita Electric Ind Co Ltd Multilayer substrate
JP2007165932A (en) * 2007-02-22 2007-06-28 Matsushita Electric Ind Co Ltd Multilayer substrate
JP2009164425A (en) * 2008-01-08 2009-07-23 Oki Semiconductor Co Ltd Real-time monitor device and operating method
JP2009010411A (en) * 2008-08-22 2009-01-15 National Institute Of Advanced Industrial & Technology Multilayer fine wiring structure
WO2010114300A3 (en) * 2009-03-31 2011-01-20 주식회사 잉크테크 Method for manufacturing thin metal laminated film
JP2021500233A (en) * 2017-12-05 2021-01-07 オソン メディカル イノベーション ファウンデーション Thin film electrode separation method using coefficient of thermal expansion

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