JPH08303676A - Harm removing treatment piping - Google Patents
Harm removing treatment pipingInfo
- Publication number
- JPH08303676A JPH08303676A JP11050895A JP11050895A JPH08303676A JP H08303676 A JPH08303676 A JP H08303676A JP 11050895 A JP11050895 A JP 11050895A JP 11050895 A JP11050895 A JP 11050895A JP H08303676 A JPH08303676 A JP H08303676A
- Authority
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- Japan
- Prior art keywords
- pressure
- orifice
- gas
- valve
- flow rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Pipe Accessories (AREA)
- Treating Waste Gases (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体の製造過程で使
用したガスを除害処理装置に排出するための除害処理配
管に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abatement treatment pipe for discharging a gas used in a semiconductor manufacturing process to an abatement treatment apparatus.
【0002】[0002]
【従来の技術】半導体の製造過程においては、有毒で爆
発性を有する危険な反応ガスが多種使用されている。こ
れらのガスは、使用後は除害処理装置に送って除害処理
をした後、外部に排出している。2. Description of the Related Art In the manufacturing process of semiconductors, various kinds of toxic and explosive dangerous reaction gases are used. After use, these gases are sent to a detoxification treatment device to be detoxified and then discharged to the outside.
【0003】例えば、図5に示す除害処理配管がある。
ここでガスAは、通常はバルブV1を開、バルブV2を閉
とし反応炉等の半導体製造装置F側に供給している。し
かし、その後ガスAが無くなってボンベを交換すると
き、あるいは他のガスに交換する必要が生じたとき等
は、管路h(タンクの元弁からバルブV2までの間)に
残ったガスAを除害して排出する必要がある。この時は
バルブV1を閉、バルブV2,V3を開とするが、管路h
の残圧はボンベ内圧と同じ略150kgf/cm2と高圧であるか
ら一旦バッファタンクBで圧力を減圧緩和している。ま
た真空吸引装置DによってガスAを除害処理装置E内へ
導入している。For example, there is an abatement treatment pipe shown in FIG.
Here, the gas A is normally supplied to the semiconductor manufacturing apparatus F side such as a reaction furnace with the valve V 1 opened and the valve V 2 closed. However, when the gas A disappears after that and the cylinder needs to be replaced, or when it is necessary to replace it with another gas, the gas A remaining in the conduit h (between the main valve of the tank and the valve V 2 ) Need to be removed and discharged. At this time, the valve V 1 is closed and the valves V 2 and V 3 are opened.
Since the residual pressure is as high as about 150 kgf / cm 2 which is the same as the internal pressure of the cylinder, the pressure is temporarily reduced by the buffer tank B. Further, the gas A is introduced into the abatement processing device E by the vacuum suction device D.
【0004】ところが、この除害処理装置Eには時間当
りの処理能力があるから一度に大量のガスを送っても能
力オーバーとなり処理しきれないし、このまま送り続け
ると効率が落ちることもある。かと言って、バルブV3
等を絞って少量のガスを送るようにしては逆に処理時間
がかかり過ぎて能率が悪い。従って、単純には除害処理
装置Eの最大処理能力分の流量を一定に流すということ
が好ましい。そこで、従来はマスフローコントローラC
を用いてガスAを最適流量にコントロールした上で除害
処理装置Eに送るようにしていた。However, since the detoxification processing device E has a processing capacity per hour, even if a large amount of gas is sent at one time, the capacity will be exceeded and the processing cannot be completed, and if it is continued to be sent, the efficiency may decrease. However, the valve V 3
On the contrary, if a small amount of gas is sent by squeezing the gas, it takes too much processing time, resulting in poor efficiency. Therefore, it is preferable that the flow rate corresponding to the maximum processing capacity of the abatement processing apparatus E is simply kept constant. Therefore, conventionally, the mass flow controller C
Was used to control the gas A to an optimum flow rate and then sent to the harm removal treatment apparatus E.
【0005】[0005]
【発明が解決しようとする課題】マスフローコントロー
ラCは、大きく分けて熱式質量流量計と流量制御弁及び
制御回路部の三要素からなっている。熱式質量流量計は
極めて小径のセンサパイプを利用したものであるし、ま
た、流量制御弁の弁体,弁座の開閉量も微少(ミクロン
オーダー)である。両者は流量制御の上で重要な構成で
あるが、一方でガスAは主に反応性の強いガスであるか
ら反応生成物を発生しやすく、特に上記したセンサパイ
プ内や開閉弁部にこれが生成し、詰まることがある。特
にセンサーパイプは数ミクロン狭くなっても流量制御に
直接影響するからマスフローコントローラCの流量は変
化し、除害処理装置Eに送る流量が変動(過流量となる
ことが多い)するという問題がある。The mass flow controller C is roughly divided into three elements, which are a thermal mass flow meter, a flow rate control valve and a control circuit section. The thermal mass flow meter uses a sensor pipe having an extremely small diameter, and the opening / closing amount of the valve body and the valve seat of the flow control valve is minute (micron order). Both of them are important components for controlling the flow rate. On the other hand, since the gas A is mainly a highly reactive gas, reaction products are likely to be generated, and in particular, the gas A is generated in the sensor pipe and the on-off valve portion described above. And may get stuck. In particular, even if the sensor pipe is narrowed by a few microns, it directly affects the flow rate control, so the flow rate of the mass flow controller C changes and the flow rate sent to the abatement processing device E fluctuates (often becomes an excessive flow rate). .
【0006】また、一般にマスフローコントローラは高
価であるから低コストの配管系を構成するには好ましく
ない。In addition, since mass flow controllers are generally expensive, they are not preferable for constructing a low cost piping system.
【0007】本発明は、上記の問題点を解決するもの
で、反応生成物が原因で流量変動が起るようなことがな
く、極めて効率的で安価な除害処理配管を提供すること
を目的とする。The present invention is intended to solve the above problems, and an object thereof is to provide an extremely efficient and inexpensive detoxification treatment pipe without causing fluctuations in flow rate due to reaction products. And
【0008】[0008]
【課題を解決するための手段】本発明は、ガスを除害処
理装置側に略一定流量で流入するようにした除害処理配
管において、管路内に圧力調整弁(レギュレータバル
ブ)とオリフィスを直列に配管し、除害処理装置に送る
ようにした除害処理配管である。According to the present invention, in a detoxification treatment pipe in which gas is allowed to flow into a detoxification treatment device side at a substantially constant flow rate, a pressure regulating valve (regulator valve) and an orifice are provided in a pipe line. It is a detoxification treatment pipe that is connected in series and sent to the abatement treatment device.
【0009】そして、上記圧力調整弁の一次側には、ガ
スボンベ側の高圧ガスを一旦減圧する減圧緩和手段を設
け、前記オリフィスの二次側には真空吸引手段を設けて
も良い。また、上記圧力調整弁とオリフィスは1つの弁
本体内に組合せることが望ましい。Decompression relief means for temporarily decompressing the high pressure gas on the gas cylinder side may be provided on the primary side of the pressure control valve, and vacuum suction means may be provided on the secondary side of the orifice. Further, it is desirable to combine the pressure regulating valve and the orifice in one valve body.
【0010】[0010]
【作用】上記圧力調整弁(レギュレータバルブ以下同
じ)は、高圧の一次側圧力の変動に対応して二次側圧力
すなわちオリフィスの入口側圧力を低圧一定にするよう
に働く。またオリフィスの出口側は除害処理装置、また
は真空ポンプ等に接続されておりその圧力はほぼ一定で
ある。従って、オリフィスの前後は略一定差圧となり略
一定のガス流量を除害処理装置側へ送り出すことができ
る。The pressure adjusting valve (the same applies to the regulator valve below) functions to keep the secondary pressure, that is, the inlet pressure of the orifice, at a low pressure in response to fluctuations in the primary pressure of the high pressure. The outlet side of the orifice is connected to a detoxification treatment device, a vacuum pump, or the like, and the pressure is almost constant. Therefore, there is a substantially constant differential pressure before and after the orifice, and a substantially constant gas flow rate can be sent to the abatement treatment device side.
【0011】圧力調整弁の一次側の圧力は徐々に降下す
るが、この調整弁はいわゆる自力式であるから一旦二次
側圧力を設定すれば途中の制御は必要なく、一次側と二
次側の圧力差がなくなるまで設定圧が得られるように機
能するので扱いやすい。また、この圧力調整弁の品種や
仕様は多種類あるし、オリフィスも容易に手に入る。従
って、これら圧力調整弁の設定圧力やオリフィス径を適
宜選定すれば、各々の除害処理装置の処理能力や状況に
応じて、効率的な流量を選定してより短時間内で除害処
理を終えることができる。The pressure on the primary side of the pressure regulating valve gradually drops, but since this regulating valve is a so-called self-powered type, once the secondary side pressure is set, control on the way is not required and the primary side and the secondary side are not required. It functions so that the set pressure can be obtained until there is no pressure difference, so it is easy to handle. There are many types and specifications of this pressure control valve, and an orifice is easily available. Therefore, if the set pressure of these pressure control valves and the orifice diameter are appropriately selected, an efficient flow rate is selected according to the processing capacity and situation of each abatement processing device, and the abatement processing is performed within a shorter time. I can finish.
【0012】尚、圧力調整弁やオリフィスにも反応生成
物が生じることは避けられないが、ミクロンオーダーの
生成ぐらいでは機能的に問題にならない。そして、配管
系が簡素で構成部品自身の価格が安価であるから低コス
トの除害処理配管となる。Although it is unavoidable that reaction products are also generated in the pressure regulating valve and the orifice, it does not become a functional problem when they are produced in the order of microns. Since the piping system is simple and the prices of the components themselves are low, the cost of the abatement treatment piping is low.
【0013】[0013]
【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1は、除害処理配管の一例を示す配管図、図2
は同じく他の実施例を示す配管図である。尚、図4に示
した配管例と同様の構成については同一符号を付した。
先ず、図1より除害処理配管の概要は従来と同様である
が、バルブV3の下流側にレギュレータバルブRV1とオリ
フィスO1を直列に配管接続し、その下流側に除害処理
装置Eを直結したものである。レギュレータバルブRVは
自力式圧力調整弁で、ここでは高圧対応型の減圧弁(1
次圧250kgf/cm2,2次圧−76cmHg〜3kgf/cm2)を用い
ている。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a piping diagram showing an example of detoxification treatment piping, FIG.
FIG. 8 is a piping diagram showing another embodiment of the present invention. The same components as those in the piping example shown in FIG. 4 are designated by the same reference numerals.
First, from FIG. 1, the outline of the abatement treatment pipe is the same as the conventional one, but a regulator valve RV 1 and an orifice O 1 are connected in series on the downstream side of the valve V 3 , and the abatement treatment device E is provided on the downstream side. Is a direct connection. The regulator valve RV is a self-powered pressure regulating valve, and here, a pressure reducing valve (1
A secondary pressure of 250 kgf / cm 2 and a secondary pressure of −76 cmHg to 3 kgf / cm 2 ) are used.
【0014】この圧力調整弁は高圧の一次側圧力の変動
に対応して二次側圧力を減圧して、ある一定の圧力にな
るように設定できるようになっている。オリフィスO1
も市販のものを利用でき、レギュレータバルブを通って
一定圧力に下がったガスを定流量で除害処理装置Eに流
すようになっている。従って、管路hに残ったガスAは
バルブV1を介して設定圧に減圧され、オリフィスO1を
通過して一定流量で除害処理装置Eに送られる。The pressure adjusting valve can be set to reduce the secondary pressure in response to fluctuations in the primary pressure of the high pressure so that the pressure becomes constant. Orifice O 1
Also, a commercially available product can be used, and the gas lowered to a constant pressure through the regulator valve is made to flow to the abatement processing device E at a constant flow rate. Therefore, the gas A remaining in conduit h is reduced to the set pressure through the valves V 1, through the orifice O 1 is sent to a detoxification treatment apparatus E at a constant flow rate.
【0015】次に図2は、他の実施例を示すが除害処理
配管の概要は上記と同様である。しかし、上記例ではオ
リフィスの開度や流量によっては、レギュレータバルブ
の二次側の圧力がかなり低い値となる可能性があり、レ
ギュレータバルブだけで、二次側の圧力を安定してコン
トロールすることが困難になる場合がある。これを防止
するため、図2ではレギュレータバルブの一次側、詳し
くはバルブV2とV3の間にガスボンベ側の高圧ガスを一
旦減圧緩和する手段、例えばバッファタンクBを設け、
圧力を下げて二次側圧力の安定化を可能としている。Next, FIG. 2 shows another embodiment, but the outline of the detoxification treatment pipe is the same as above. However, in the above example, depending on the opening degree and flow rate of the orifice, the pressure on the secondary side of the regulator valve may be a very low value.Therefore, the regulator valve alone should be used to stably control the pressure on the secondary side. Can be difficult. In order to prevent this, in FIG. 2, a means for temporarily reducing the pressure of the high pressure gas on the gas cylinder side, for example, a buffer tank B, is provided between the primary side of the regulator valve, specifically between the valves V 2 and V 3 .
It is possible to stabilize the secondary pressure by lowering the pressure.
【0016】オリフィスO2は、上記例と同様の働きを
なし、このオリフィスO2の二次側に真空吸引手段とな
るバキュームジェネレータDを設け、オリフィスO2の
前後の差圧がより一定になるようになし、一定流量のガ
スを除害処理装置Eに送るようにしている。P1,P2は
レギュレータバルブRV2の一次側と二次側の圧力で圧力
計を設けこれを取り出せるようにしておいても良い。The orifice O 2 is no functions similarly to the above example, a vacuum generator D as a vacuum suction means on the secondary side of the orifice O 2 provided, the differential pressure across the orifice O 2 becomes more constant Therefore, a constant flow rate of gas is sent to the abatement processing apparatus E. P 1 and P 2 may be provided with pressure gauges for the pressures on the primary side and the secondary side of the regulator valve RV 2 so that they can be taken out.
【0017】以上によって管路hに残ったガスAは、バ
ルブV1を閉、バルブV2及びV3を開とすると、高圧の
ガスはバッファタンクBで減圧されて、レギュレータバ
ルブRV2に導入され、これによって設定圧に減圧され、
オリフィスO2を通過して一定流量でバキュームジェネ
レータDを介して除害処理装置Eに送られる。With respect to the gas A remaining in the conduit h as described above, when the valve V 1 is closed and the valves V 2 and V 3 are opened, the high pressure gas is decompressed in the buffer tank B and introduced into the regulator valve RV 2 . It is reduced to the set pressure by this,
After passing through the orifice O 2 , it is sent to the abatement treatment device E at a constant flow rate through the vacuum generator D.
【0018】図3に示すレギュレータバルブRV3は、継
手G内にオリフィスO3を内装し、この継手Gをバルブ
の接続口にねじ込み溶接して組込んだもので、レギュレ
ータバルブを構成する1つの弁本体に一体的にオリフィ
スを組合せた例である。このようにすればさらに配管系
が簡素かつコンパクトにまとまるので都合が良い。A regulator valve RV 3 shown in FIG. 3 has an orifice O 3 inside a joint G, and the joint G is screwed and welded into a connection port of the valve. This is an example in which an orifice is integrally combined with the valve body. This is convenient because the piping system can be more simply and compactly assembled.
【0019】次に、この除害処理配管について実験を行
った。その結果を図4(a),(b)に示す。 〔実験例1〕図2に示す除害処理配管(但しガスタンク
AとバルブV1及び除害処理装置Eは除いている。)に
ついて、N2を用いてバッファタンクB内にPB=10kgf/c
m2,500ccを封入し、オリフィスO2の二次側流量Qをマ
スフローメーターで測定した。この時の流量Qと時間T
及びレギュレータバルブRV2の一次側圧力P1と時間Tと
の特性を測定した。尚、レギュレータバルブRV2の二次
側設定圧力P2は74Torr,オリフィスO2のオリフィス径
はφ0.5mmであった。この時の結果を図4(a)に示す。こ
のように二次側流量Q=2.3l/minを約130秒間にわたっ
て一定に流し、バッファタンク内のN2をほぼ一定流量
で流し切ることができた。Next, an experiment was conducted on this detoxification treatment pipe. The results are shown in FIGS. 4 (a) and 4 (b). [Experimental Example 1] Regarding the abatement treatment pipe shown in FIG. 2 (however, the gas tank A, the valve V 1 and the abatement treatment device E are excluded), N 2 is used to put PB = 10 kgf / c in the buffer tank B.
A secondary flow rate Q of the orifice O 2 was measured with a mass flow meter by enclosing m 2 and 500 cc. Flow rate Q and time T at this time
Also, the characteristics of the primary pressure P 1 of the regulator valve RV 2 and the time T were measured. The secondary set pressure P 2 of the regulator valve RV 2 was 74 Torr, and the orifice diameter of the orifice O 2 was φ0.5 mm. The result at this time is shown in FIG. In this way, the secondary side flow rate Q = 2.3 l / min was made to flow constantly for about 130 seconds, and N 2 in the buffer tank could be made to flow off at a substantially constant flow rate.
【0020】〔実験例2〕次に、オリフィスO2を変え
て上記と同様の実験データを採った。但し、レギュレー
タバルブRV2の二次側設定圧力P2は710Torr,オリフィス
O2のオリフィス径はφ0.32mmとした。この時の結果を
図4(b)に示す。この場合には二次側流量Qを、ほぼ500
cc/minと一定とすることができ、これを約550秒間流し
続けてほぼ全量を流し切ることができた。上記2例と
も、得られた流量特性は従来のマスフローコントローラ
を使用した時の特性とほぼ同等である。[Experimental Example 2] Next, the same experimental data as the above was taken by changing the orifice O 2 . However, the secondary set pressure P 2 of the regulator valve RV 2 was 710 Torr, and the orifice diameter of the orifice O 2 was φ0.32 mm. The result at this time is shown in FIG. In this case, the secondary side flow rate Q is approximately 500
It could be kept constant at cc / min, and it could be flowed for about 550 seconds to drain almost all the amount. In both of the above examples, the obtained flow rate characteristics are almost the same as the characteristics when the conventional mass flow controller is used.
【0021】[0021]
【発明の効果】本発明によれば、簡単な部品構成で効率
的かつ安価な除害処理配管を提供することができた。According to the present invention, it is possible to provide an efficient and inexpensive detoxification treatment pipe with a simple component structure.
【図1】 本発明の除害処理配管の実施例を示す配管図
である。FIG. 1 is a piping diagram showing an embodiment of the abatement treatment piping of the present invention.
【図2】 本発明の除害処理配管の他の実施例を示す配
管図である。FIG. 2 is a piping diagram showing another embodiment of the abatement treatment piping of the present invention.
【図3】 レギュレータバルブとオリフィスを組合せた
例を示す一部断面図である。FIG. 3 is a partial cross-sectional view showing an example in which a regulator valve and an orifice are combined.
【図4】 本発明による除害処理配管の性能試験データ
で、一次側圧力と時間及び二次側流量と時間の特性線図
である。FIG. 4 is a characteristic diagram of performance test data of a detoxification treatment pipe according to the present invention, showing a primary pressure and time and a secondary flow rate and time.
【図5】 従来の除害処理配管の一例を示す配管図であ
る。FIG. 5 is a piping diagram showing an example of a conventional abatement treatment piping.
A…ガス B…バッファータ
ンク C…マスフローコントローラ D…バキュームジ
ェネレータ E…除害処理装置 F…半導体製造装
置 O…オリフィス V…開閉弁 RV…レギュレータバルブ G…継手A ... Gas B ... Buffer tank C ... Mass flow controller D ... Vacuum generator E ... Detoxification treatment device F ... Semiconductor manufacturing device O ... Orifice V ... Open / close valve RV ... Regulator valve G ... Joint
───────────────────────────────────────────────────── フロントページの続き (72)発明者 川島 正治 三重県桑名市大福2番地日立金属株式会社 桑名工場内 (72)発明者 松岡 亨 三重県桑名市大福2番地日立金属株式会社 桑名工場内 (72)発明者 石川 誠 三重県桑名市大福2番地日立金属株式会社 桑名工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shoji Kawashima 2 Daifuku, Hitachi Metals Co., Ltd. Kuwana City, Mie Prefecture Hitachi Metals Co., Ltd. Kuwana Plant (72) Inventor Toru Matsuoka 2 Daifuku, Kuwana City, Mie Prefecture Hitachi Metals Co., Ltd. Kuwana Plant ( 72) Inventor Makoto Ishikawa 2 Daifuku, Kuwana City, Mie Hitachi Metals Co., Ltd. Kuwana Factory
Claims (3)
すようにした除害処理配管において、管路内に圧力調整
弁とオリフィスを直列に配管し、前記除害処理装置に送
るようにしたことを特徴とする除害処理配管。1. A detoxification treatment pipe in which a gas is caused to flow to a detoxification treatment device side at a substantially constant flow rate, in which a pressure regulating valve and an orifice are piped in series in a pipe line and sent to the detoxification treatment device. The detoxification treatment pipe characterized in that
ベ側の高圧ガスを一旦減圧する減圧緩和手段を備え、前
記オリフィスの二次側には真空吸引手段を備えたことを
特徴とする請求項1記載の除害処理配管。2. A pressure reducing valve for temporarily reducing the high pressure gas on the gas cylinder side is provided on the primary side of the pressure control valve, and a vacuum suction means is provided on the secondary side of the orifice. Item 1. The harm removal treatment pipe according to item 1.
本体内に組合せたことを特徴とする請求項1又は2記載
の除害処理配管。3. The harm removal treatment pipe according to claim 1, wherein the pressure regulating valve and the orifice are combined in one valve body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11050895A JPH08303676A (en) | 1995-05-09 | 1995-05-09 | Harm removing treatment piping |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11050895A JPH08303676A (en) | 1995-05-09 | 1995-05-09 | Harm removing treatment piping |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08303676A true JPH08303676A (en) | 1996-11-22 |
Family
ID=14537563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11050895A Pending JPH08303676A (en) | 1995-05-09 | 1995-05-09 | Harm removing treatment piping |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08303676A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0980701A1 (en) * | 1998-08-20 | 2000-02-23 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Gas recovery unit |
-
1995
- 1995-05-09 JP JP11050895A patent/JPH08303676A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0980701A1 (en) * | 1998-08-20 | 2000-02-23 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Gas recovery unit |
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