JPH0830028B2 - Fluorine-containing alicyclic compound and method for producing the same - Google Patents

Fluorine-containing alicyclic compound and method for producing the same

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Publication number
JPH0830028B2
JPH0830028B2 JP63146243A JP14624388A JPH0830028B2 JP H0830028 B2 JPH0830028 B2 JP H0830028B2 JP 63146243 A JP63146243 A JP 63146243A JP 14624388 A JP14624388 A JP 14624388A JP H0830028 B2 JPH0830028 B2 JP H0830028B2
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JP
Japan
Prior art keywords
same
integer
group
fluorine
organic group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63146243A
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Japanese (ja)
Other versions
JPS6485949A (en
Inventor
晃 大森
義喜 清水
元伸 久保
孔三郎 中村
透 丸野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Daikin Kogyo Co Ltd
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Application filed by Nippon Telegraph and Telephone Corp, Daikin Kogyo Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP63146243A priority Critical patent/JPH0830028B2/en
Publication of JPS6485949A publication Critical patent/JPS6485949A/en
Publication of JPH0830028B2 publication Critical patent/JPH0830028B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyethers (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は含フツ素脂環式化合物及びその製造法に関す
る。
TECHNICAL FIELD The present invention relates to a fluorine-containing alicyclic compound and a method for producing the same.

(従来の技術) 従来、含フツ素エポキシ化合物としては例えばUSP4,0
45,408号に下記構造式の化合物等が開示されている。
(Prior Art) Conventionally, as a fluorine-containing epoxy compound, for example, USP 4,0
No. 45,408 discloses compounds having the following structural formula.

これらの化合物は、硬化剤及び/又は触媒の存在下で
熱、光、電子線などの活性エネルギー線の照射によつて
硬化し得るもので、接着剤等の原料として、又、硬化物
は光学材料として有用である。しかしながら、これらの
化合物は耐水性が不満足であり、又屈折率が高く光学用
ガラスとの整合性などの点で不十分であつた。
These compounds can be cured by irradiation with active energy rays such as heat, light, and electron beams in the presence of a curing agent and / or a catalyst, and are used as raw materials for adhesives, and cured products are optical. It is useful as a material. However, these compounds are unsatisfactory in water resistance, have a high refractive index and are insufficient in terms of compatibility with optical glass.

(発明が解決しようとする問題点) 本発明の目的は耐水性、屈折率を初め、耐熱性、強度
等にも優れた含フツ素脂環式化合物及びその製造法を提
供することにある。
(Problems to be Solved by the Invention) An object of the present invention is to provide a fluorine-containing alicyclic compound having excellent water resistance, refractive index, heat resistance, strength and the like, and a method for producing the same.

(問題点を解決するための手段) 本発明は、一般式 (Mは、式 で示される置換基を有していてもよい環式脂肪族炭化
水素基の少なくとも1ケから成る2価の有機基であり、
Rは炭素数1〜5のアルキル基、OH、CH3、NH2、ハロゲ
ン、炭素数1〜20のフルオロアルキル基を示し、l1、l2
及びl3はそれぞれ0又は1〜10の整数で、置換基Rの数
を示し、その整数が2以上である場合、Rは同一でも同
一でなくてもよく、その整数が1である場合でも一つの
有機基においてRが2以上ある場合、Rは同一でも同一
でなくてもよく、前記置換基を有していてもよい環式脂
肪族炭化水素基の2ケ以上から成る有機基である場合
は、O,S,CH2により連結されていてもよく、又、縮合環
を形成してもよい。Xは であり、YはH又はCH3、nは0又は0〜30の正数を
示す。)で表わされる含フツ素脂環式化合物およびその
製造法に係る。
(Means for Solving Problems) The present invention provides a general formula (M is the formula A divalent organic group consisting of at least one cycloaliphatic hydrocarbon group which may have a substituent,
R represents an alkyl group having 1 to 5 carbon atoms, OH, CH 3 , NH 2 , halogen, or a fluoroalkyl group having 1 to 20 carbon atoms, l 1 , l 2
And l 3 are each 0 or an integer of 1 to 10 and represent the number of substituents R, and when the integer is 2 or more, R may be the same or different, and even when the integer is 1. When R is 2 or more in one organic group, R may be the same or different and is an organic group composed of 2 or more of the above-mentioned cycloaliphatic hydrocarbon groups which may have a substituent. In this case, they may be linked by O, S, CH 2 or may form a condensed ring. X is And Y is H or CH 3 , and n is 0 or a positive number from 0 to 30. ) Related to a fluorine-containing alicyclic compound represented by

本発明の一般式(1)において、Mで示される環式脂
肪族炭化水素基から成る2価の有機基の好適な代表例と
しては例えば 等で示される2価の基を挙げることができる。ここで
Rは置換基を示し、l1、l2及びl3はそれぞれ0又は1〜
10の整数で、置換基Rの数を示し、その整数が2以上で
ある場合、Rは同一でも同一でなくてもよく、その整数
が1である場合でも一つの有機基においてRが2以上あ
る場合、Rは同一でも同一でなくてもよい。置換基とし
ては例えば炭素数1〜5のアルキル基、OH、CH3、NH2
ハロゲン(F、Cl、Brなど)、炭素数1〜20のフルオロ
アルキル基を挙げることができる。
In the general formula (1) of the present invention, a preferable representative example of the divalent organic group represented by M and consisting of the cycloaliphatic hydrocarbon group is, for example, And a divalent group represented by Here, R represents a substituent, and l 1 , l 2 and l 3 are 0 or 1 to 1 respectively.
An integer of 10 indicates the number of substituents R, and when the integer is 2 or more, the Rs may be the same or different, and even when the integer is 1, R is 2 or more in one organic group. In some cases, R may or may not be the same. As the substituent, for example, an alkyl group having 1 to 5 carbon atoms, OH, CH 3 , NH 2 ,
Examples thereof include halogen (F, Cl, Br, etc.) and fluoroalkyl groups having 1 to 20 carbon atoms.

Xはグリシジル基(Gly基)又はこれとアクリル酸若
しくはメタクリル酸を反応させて得られる基であり、n
は0又は正数で、特に0〜30の範囲の数が好ましい。
X is a glycidyl group (Gly group) or a group obtained by reacting this with acrylic acid or methacrylic acid, and n
Is 0 or a positive number, and particularly preferably a number in the range of 0-30.

本発明の上記含フツ素化合物は例えば一般式 (Mは上記に同じ)で表わされる化合物に(a)エピ
クロルヒドリンと脱塩化水素剤を反応させる、又は
(b)エピクロルヒドリンと脱塩化水素剤を反応させた
後、更にアクリル酸若しくはメタクリル酸を反応させる
ことにより得られる。
The fluorine-containing compound of the present invention has, for example, the general formula The compound represented by (M is the same as above) is reacted with (a) epichlorohydrin and a dehydrochlorinating agent, or (b) after reacting epichlorohydrin and a dehydrochlorinating agent, further reacted with acrylic acid or methacrylic acid. It is obtained by

反応には必ずしも溶媒は必要でないが、メチルエチル
ケトン(MEK)、メチルイソブチルケトン(MIBK)など
を用いることも可能である。化合物(2)に対してECH
を約2〜100倍モル使用するのが好ましい。またNaOH、K
OH、LiOH、Ca(OH)2などの脱塩化水素剤を化合物(2)
のOH当量に対して約1〜20当量を使用するのが好まし
い。触媒は必ずしも必要ではないが、トリメチルベンジ
ルアンモニウムクロライド、テトラメチルアンモニウム
ブロマイド等の第4級アンモニウム塩を反応系に対して
約0.01〜10重量%の割合で使用することも出来る。反応
温度は適宜選択できるが約50〜200℃の範囲が好まし
い。
A solvent is not always necessary for the reaction, but methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK) and the like can also be used. ECH for compound (2)
Is preferably used in a molar amount of about 2 to 100 times. Also NaOH, K
Compound (2) with dehydrochlorination agents such as OH, LiOH, and Ca (OH) 2
It is preferred to use about 1-20 equivalents to the OH equivalents of. A catalyst is not always necessary, but a quaternary ammonium salt such as trimethylbenzylammonium chloride or tetramethylammonium bromide can be used in a proportion of about 0.01 to 10% by weight based on the reaction system. The reaction temperature can be appropriately selected, but is preferably in the range of about 50 to 200 ° C.

次に上記で得られたジグリシジルエーテル類とアクリ
ル酸若しくはメタクリル酸の反応においても、溶媒は必
ずしも必要ではないが、ベンゼン、トルエン、キシレ
ン,MEK、MIBKなどを使用することができる。ジグリシジ
ルエーテル類のエポキシ基1当量に対して、酸を約1〜
50モル使用するのが好ましい。トリメチルベンジルアン
モニウムクロライド、テトラメチルアンモニウムブロマ
イド等の第4級アンモニウム塩又はトリメチルアミン、
トリエチルアミン等の3級アミンを触媒として、反応系
に対して約0.01〜10重量%の割合で使用する。熱重合禁
止剤としてハイドロキノン、ハイドロキノンモノエチル
エーテル、カテコール、t−ブチルカテコール、フエノ
チアジン等を反応系に対して約0.001〜10重量%の割合
で加えるのが好ましい。反応温度は適宜選択できる約50
〜200℃の範囲が好ましい。
Next, in the reaction of the above-obtained diglycidyl ethers with acrylic acid or methacrylic acid, a solvent is not always necessary, but benzene, toluene, xylene, MEK, MIBK and the like can be used. About 1 to about 1 equivalent of epoxy group of diglycidyl ether
It is preferable to use 50 mol. Quaternary ammonium salts such as trimethylbenzylammonium chloride, tetramethylammonium bromide or trimethylamine,
A tertiary amine such as triethylamine is used as a catalyst in an amount of about 0.01 to 10% by weight based on the reaction system. It is preferable to add hydroquinone, hydroquinone monoethyl ether, catechol, t-butylcatechol, phenothiazine or the like as a thermal polymerization inhibitor at a ratio of about 0.001 to 10% by weight based on the reaction system. The reaction temperature can be appropriately selected about 50
A range of up to 200 ° C is preferred.

目的物である一般式(1)の本発明の含フツ素化合物
は通常の方法、例えば抽出、濃縮、蒸留、再結晶等の方
法により、分離、精製することが出来る。
The target fluorine-containing compound of the present invention represented by the general formula (1) can be separated and purified by a conventional method such as extraction, concentration, distillation, recrystallization and the like.

本発明の含フツ素化合物のうち、XがGly基であるエ
ポキシ化合物は、例えば((a) ポリアミン、ポリオ
ール、酸無水物等のエポキシ樹脂に使用されている硬化
剤、 (b) イミダゾール類、ルイス酸(BF3錯体など)等
のエポキシ樹脂に使用されている熱硬化触媒、 (c) ジアゾニウム塩、スルホニウム塩、ホスホニウ
ム塩等のエポキシ樹脂に使用されている光硬化触媒など
と混合して、接着剤等として用いることができる。
Among the fluorine-containing compounds of the present invention, an epoxy compound in which X is a Gly group is, for example, ((a) a curing agent used in epoxy resins such as polyamines, polyols and acid anhydrides, (b) imidazoles, Mixing with a thermosetting catalyst used for epoxy resin such as Lewis acid (BF 3 complex), (c) a photocuring catalyst used for epoxy resin such as diazonium salt, sulfonium salt, phosphonium salt, etc., It can be used as an adhesive or the like.

又、本発明の含フツ素化合物のうち、アクリル酸若し
くはメタクリル酸の付加した化合物は、例えばアゾ化合
物(アゾビスイソブチロニトリルなど)または過酸化物
(過酸化ベンゾイルなど)等の熱重合開始剤として公知
の化合物を添加して接着剤とすることができる。さら
に、光重合開始剤(ベンゾフエノンなど)等を添加し
て、接着剤とすることも可能である。又、この場合には
ビニル系化合物(アクリル酸メチル、アクリル酸−2−
ヒドロキエチルなど)と混合して、上記の開始剤を加え
て接着剤等として用いることもできる。
Among the fluorine-containing compounds of the present invention, the compounds to which acrylic acid or methacrylic acid is added are, for example, the thermal polymerization initiation of azo compounds (azobisisobutyronitrile etc.) or peroxides (benzoyl peroxide etc.) A known compound as an agent can be added to form an adhesive. Further, a photopolymerization initiator (benzophenone, etc.) or the like may be added to form an adhesive. In this case, vinyl compounds (methyl acrylate, acrylic acid-2-
It can also be used as an adhesive or the like by adding the above-mentioned initiator to the mixture.

(発明の効果) 本発明の含フツ素化合物は耐水性、屈折率を初め、強
度等に優れ、各種の硬化剤、硬化触媒、開始剤の存在下
で熱、光、電子線などの活性エネルギー線の照射によつ
て硬化し得るもので、このように用いることにより優れ
た接着剤を提供することができ、又、硬化物は光学材料
として有用である。
(Effect of the invention) The fluorine-containing compound of the present invention is excellent in water resistance, refractive index, strength, etc., and in the presence of various curing agents, curing catalysts, initiators, active energy such as heat, light, and electron beams. It can be cured by irradiation with rays, and by using it in this way, an excellent adhesive can be provided, and the cured product is useful as an optical material.

(実施例) 以下に参考例及び実施例を挙げて説明する。(Example) Below, a reference example and an example are given and demonstrated.

参考例1 〔ビス(1,1,1,3,3,3−ヘキサフルオロ−2−ヒドロキ
シイソプロピル)ベンゼンの合成〕 ベンゼン117g(1.5モル)と無水塩化アルミニウム31g
(0.23モル)を攪拌機を備えた1のフラスコに入れ、
攪拌しながら室温下約5g/分の割合でヘキサフルオロア
セトン500g(3モル)を導入した。反応混合物を減圧下
蒸留し、m−体とp−体のモル比が85対15のビス(1,1,
1,3,3,3−ヘキサフルオロ−2−ヒドロキシイソプロピ
ル)ベンゼン(102〜106℃/20mmHg)517g(1.26モル)
を得た。ヘキサフルオロアセトンを基準にした収率は、
84%であつた。
Reference Example 1 [Synthesis of bis (1,1,1,3,3,3-hexafluoro-2-hydroxyisopropyl) benzene] 117 g (1.5 mol) of benzene and 31 g of anhydrous aluminum chloride
(0.23 mol) in a flask equipped with a stirrer,
While stirring, 500 g (3 mol) of hexafluoroacetone was introduced at a rate of about 5 g / min at room temperature. The reaction mixture was distilled under reduced pressure to give bis (1,1,1,2) in which the molar ratio of m-form to p-form was 85:15.
1,3,3,3-hexafluoro-2-hydroxyisopropyl) benzene (102-106 ℃ / 20mmHg) 517g (1.26mol)
I got The yield based on hexafluoroacetone is
It was 84%.

参考例2 参考例1で調製したビス(1,1,1,3,3,3−ヘキサフル
オロ−2−ヒドロキシイソプロピル)ベンゼン300g(0.
73モル)とイソプロパノール300mlからなる混合物をハ
ステロイ製のオートクレープに入れ、触媒ロジウムを担
持させたカーボン粉末(ロジウム含有量、合量に対して
5重量%)30gを加え、攪拌しながら、155℃に加熱後、
水素で60kg/cm2Gに加圧し、4.5時間反応させた。
Reference Example 2 300 g of bis (1,1,1,3,3,3-hexafluoro-2-hydroxyisopropyl) benzene prepared in Reference Example 1 (0.
(73 mol) and 300 ml of isopropanol were placed in a Hastelloy autoclave, and 30 g of carbon powder supporting the catalyst rhodium (rhodium content, 5% by weight relative to the total amount) was added, and the mixture was stirred at 155 ° C. After heating to
It was pressurized to 60 kg / cm 2 G with hydrogen and reacted for 4.5 hours.

室温まで冷却し、触媒を担持させたカーボン粉末を別
後、イソプロパノールを留去し、残渣を減圧蒸留した。
含フツ素脂環式ジオールであるビス(1,1,1,3,3,3−ヘ
キサフルオロ−2−ヒドロキシイソプロピル)シクロヘ
キサン(96〜100℃/6mmHg)287g(0.69モル)を得た。
収率は94%であつた。1 H−NMR(CCl4中、δppm) 3.1(2H,s,OH),1.1〜2.5(10H,br,−CH−,-CH2-) 実施例1 参考例2で得られたビス(1,1,1,3,3,3−ヘキサフル
オロ−2−ヒドロキシイソプロピル)シクロヘキサン
(化合物A)86g(0.21モル)とエピクロルヒドリン382
g(4.13モル)を混合し、水酸化ナトリウム16.9g(0.42
モル)と水2mlを加え、攪拌下で加熱還流させた。10時
間反応後、ガラスフイルターで、過して生成した塩化ナ
トリウムを除去し、減圧下に余剰のエピクロルヒドリン
を留去した。残渣をゲルパーミエイシヨンクロマトグラ
フイー(GPC)により調べたところ一般式(1)におけ
るn=0,1,2の化合物が93:6:1(クロマトグラム上面積
比)の割合で含まれていた。GPC条件はカラムShodex KF
-801,KF-802,各30cm、溶媒はクロロホルムである。残渣
を蒸留して138〜150℃/1mmHgの留分として一般式(1)
におけるn=0である化合物Aのジグリシジルエーテル
50gを得た。1 H−NMR(CDCl3中、TMS基準、δppm) 1.4,2.0 br 10H シクロヘキサン環 −CH−,-CH2- 2.7 m 4H 3.1 m 2H 3.7 m 4H 実施例2 参考例2記載の方法に従つて得られた化合物Aを10℃
で1週間放置したところ結晶が析出した。このものを過
し、トリクロロトリフルオロエタンで洗浄して1,4−ビ
ス(1,1,1,3,3,3−ヘキサフルオロ−2−ヒドロキシイ
ソプロピル)シクロヘキサン(化合物B)26g(0.063モ
ル)を得た。この化合物にエピクロルヒドリン117g(1.
26モル)を混合し水酸化ナトリウム5.1g(0.13モル)と
水0.6mlを加え、10時間攪拌下に還流させた。生成した
塩化ナトリウムを別し、余剰のエピクロルヒドリンを留
去し、残渣を蒸留して147〜151℃/1mmHgの留分として化
合物Bのジグリシジルエーテル16gを得た。1 H−NMR(CDCl3中、TMS基準、δppm) 1.4,2.0 br 10H シクロヘキサン環 −CH−,-CH2- 2.7 m 4H 3.1 m 2H 3.7 m 4H 実施例3 実施例1に記載した方法に従い合成した化合物Aのジ
グリシジルエーテル57g(0.108モル)とアクリル酸18.0
g(0.25モル)をトルエン100mlに加え、更にトリメチル
ベンジルアンモニウムクロリド1g、p−メトキシフエノ
ール0.1gを加え、攪拌しながら加熱還流させた。14時間
経過した時点で加熱を停止し、室温まで冷却した。反応
液を飽和食塩水を用いて水層が酸性を示さなくなるまで
洗浄し、無水硫酸ナトリウム上で乾燥した後、p−メト
キシフエノール0.1gを加え、1〜2mmHgの圧力下で80〜9
0℃に加熱して脱溶媒し、粘調液として一般式(1)に
おけるn=0、Xが である化合物C(63g)を得た。
After cooling to room temperature, the carbon powder supporting the catalyst was separated, isopropanol was distilled off, and the residue was distilled under reduced pressure.
287 g (0.69 mol) of bis (1,1,1,3,3,3-hexafluoro-2-hydroxyisopropyl) cyclohexane (96 to 100 ° C / 6 mmHg), which is a fluorine-containing alicyclic diol, was obtained.
The yield was 94%. 1 H-NMR (δppm in CCl 4 ) 3.1 (2H, s, OH), 1.1 to 2.5 (10H, br, -CH-, -CH 2- ) Example 1 Bis (1 obtained in Reference Example 2 , 1,1,3,3,3-Hexafluoro-2-hydroxyisopropyl) cyclohexane (Compound A) 86 g (0.21 mol) and epichlorohydrin 382
g (4.13 mol) are mixed and sodium hydroxide 16.9 g (0.42 mol
Mol) and 2 ml of water were added, and the mixture was heated to reflux with stirring. After reacting for 10 hours, excess sodium chloride was removed with a glass filter, and excess epichlorohydrin was distilled off under reduced pressure. When the residue was examined by gel permeation chromatography (GPC), the compound of n = 0,1,2 in the general formula (1) was contained at a ratio of 93: 6: 1 (area ratio on the chromatogram). It was GPC conditions are columns Shodex KF
-801, KF-802, 30 cm each, the solvent is chloroform. The residue is distilled to obtain the general formula (1) as a fraction of 138-150 ℃ / 1mmHg.
Diglycidyl ether of compound A in which n = 0 in
Obtained 50 g. 1 H-NMR (in CDCl 3 , TMS standard, δppm) 1.4,2.0 br 10H Cyclohexane ring -CH-, -CH 2 -2.7 m 4H 3.1 m 2H 3.7 m 4H Example 2 Compound A obtained according to the method described in Reference Example 2 was treated at 10 ° C.
When left for 1 week, crystals were precipitated. Pass this, wash with trichlorotrifluoroethane and wash with 1,4-bis (1,1,1,3,3,3-hexafluoro-2-hydroxyisopropyl) cyclohexane (Compound B) 26 g (0.063 mol) Got 117 g of epichlorohydrin (1.
26 mol) were mixed, 5.1 g (0.13 mol) of sodium hydroxide and 0.6 ml of water were added, and the mixture was refluxed under stirring for 10 hours. The produced sodium chloride was separated, the excess epichlorohydrin was distilled off, and the residue was distilled to obtain 16 g of diglycidyl ether of compound B as a fraction at 147 to 151 ° C / 1 mmHg. 1 H-NMR (in CDCl 3 , TMS standard, δppm) 1.4,2.0 br 10H Cyclohexane ring -CH-, -CH 2 -2.7 m 4H 3.1 m 2H 3.7 m 4H Example 3 57 g (0.108 mol) of diglycidyl ether of Compound A synthesized according to the method described in Example 1 and 18.0 acrylic acid
g (0.25 mol) was added to 100 ml of toluene, 1 g of trimethylbenzylammonium chloride and 0.1 g of p-methoxyphenol were added, and the mixture was heated to reflux with stirring. After 14 hours, heating was stopped and the mixture was cooled to room temperature. The reaction solution was washed with saturated saline until the aqueous layer showed no acidity, dried over anhydrous sodium sulfate, 0.1 g of p-methoxyphenol was added, and 80-9 under a pressure of 1-2 mmHg.
The solvent is removed by heating at 0 ° C., and as a viscous liquid, n = 0 and X in the general formula (1) To obtain Compound C (63 g).

IR(液膜、cm1) 3400 OH, 2900 CH,CH2, 1722 C=O, 1635C=C, 1402 C=C 実施例4 実施例3におけるアクリル酸の代りにメタクリル酸2
1.5gを用いる以外は実施例3と同様に操作して一般式
(1)における n=0、Xが である化合物D(64g)を得た。
IR (liquid film, cm 1 ) 3400 OH, 2900 CH, CH 2 , 1722 C = O, 1635 C = C, 1402 C = C Example 4 Methacrylic acid 2 in place of acrylic acid in Example 3
The same operation as in Example 3 was carried out except that 1.5 g was used, and n = 0 and X in the general formula (1) were A compound D (64 g) was obtained.

IR(液膜、cm1) 3400 OH, 2900 CH,CH2, 1725 C=O, 1640C=C, 1404 C=C 試験例1 実施例1〜2の化合物及び下記比較例1の化合物の屈
折率(nD 23)を測定した結果を第1表に示す。
IR (liquid film, cm 1 ) 3400 OH, 2900 CH, CH 2 , 1725 C = O, 1640 C = C, 1404 C = C Test Example 1 Refractive indices of the compounds of Examples 1 and 2 and the compound of Comparative Example 1 below. The results of measuring (n D 23 ) are shown in Table 1.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C08G 59/30 NHR 65/28 NQP 65/48 NQH // C09J 163/00 JFM (72)発明者 中村 孔三郎 東京都千代田区内幸町1丁目1番6号 日 本電信電話株式会社内 (72)発明者 丸野 透 東京都千代田区内幸町1丁目1番6号 日 本電信電話株式会社内 (56)参考文献 特開 昭62−89719(JP,A) 米国特許3706772(US,A) 米国特許3879430(US,A) Amer.Chem.Soci.,Vo l.31,No.1(1971),P.546−551─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Internal reference number FI Technical display location C08G 59/30 NHR 65/28 NQP 65/48 NQH // C09J 163/00 JFM (72) Inventor Kozaburo Nakamura 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo Nihon Telegraph and Telephone Corp. (72) Inventor Toru Maruno 1-1-6 Uchisaiwaicho, Chiyoda-ku, Tokyo Nihon Telegraph and Telephone Corp. (56) Reference Document JP-A-62-89719 (JP, A) US Patent 3706772 (US, A) US Patent 3879430 (US, A) Amer. Chem. Soci. , Vol. 31, No. 1 (1971), p. 546−551

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】一般式 (Mは、式 で示される置換基を有していてもよい環式脂肪族炭化水
素基の少なくとも1ケから成る2価の有機基であり、R
は炭素数1〜5のアルキル基、OH、CH3、NH2、ハロゲ
ン、炭素数1〜20のフルオロアルキル基を示し、l1、l2
及びl3はそれぞれ0又は1〜10の整数で、置換基Rの数
を示し、その整数が2以上である場合、Rは同一でも同
一でなくてもよく、その整数が1である場合でも1つの
有機基においてRが2以上ある場合、Rは同一でも同一
でなくてもよく、前記置換基を有していてもよい環式脂
肪族炭化水素基の2ケ以上から成る有機基である場合
は、O,S,CH2により連結されていてもよく、又、縮合環
を形成してもよい。Xは であり、YはH又はCH3、nは0又は0〜30の正数を示
す。)で表わされる含フツ素脂環式化合物。
1. A general formula (M is the formula R is a divalent organic group consisting of at least one cyclic aliphatic hydrocarbon group which may have a substituent,
Represents an alkyl group having 1 to 5 carbon atoms, OH, CH 3 , NH 2 , halogen, or a fluoroalkyl group having 1 to 20 carbon atoms, l 1 , l 2
And l 3 are each 0 or an integer of 1 to 10 and represent the number of substituents R, and when the integer is 2 or more, R may be the same or different, and even when the integer is 1. When R is 2 or more in one organic group, R may be the same or different and is an organic group composed of 2 or more cyclic aliphatic hydrocarbon groups which may have the above-mentioned substituents. In this case, they may be linked by O, S, CH 2 or may form a condensed ring. X is And Y is H or CH 3 , and n is 0 or a positive number from 0 to 30. ) A fluorine-containing alicyclic compound represented by
【請求項2】一般式 (Mは、式 で示される置換基を有していてもよい環式脂肪族炭化水
素基の少なくとも1ケから成る2価の有機基であり、R
は炭素数1〜5のアルキル基、OH、CH3、NH2、ハロゲ
ン、炭素数1〜20のフルオロアルキル基を示し、l1、l2
及びl3はそれぞれ0又は1〜10の整数で、置換基Rの数
を示し、その整数が2以上である場合、Rは同一でも同
一でなくてもよく、その整数が1である場合でも一つの
有機基においてRが2以上ある場合、Rは同一でも同一
でなくてもよく、前記置換基を有していてもよい環式脂
肪族炭化水素基の2ケ以上から成る有機基である場合
は、O,S,CH2により連結されていてもよく、又縮合環を
形成してもよい。)で表わされる化合物に(a)エピク
ロルヒドリンと脱塩化水素剤を反応させる、又は(b)
エピクロルヒドリンと脱塩化水素剤を反応させた後、更
にアクリル酸若しくはメタクリル酸を反応させることを
特徴とする一般式 (Mは上記に同じ。Xは 又は であり、YはH又はCH3、nは0又は0〜30の正数を示
す。)で表わされる含フツ素脂環式化合物の製造法。
2. General formula (M is the formula R is a divalent organic group consisting of at least one cyclic aliphatic hydrocarbon group which may have a substituent,
Represents an alkyl group having 1 to 5 carbon atoms, OH, CH 3 , NH 2 , halogen, or a fluoroalkyl group having 1 to 20 carbon atoms, l 1 , l 2
And l 3 are each 0 or an integer of 1 to 10 and represent the number of substituents R, and when the integer is 2 or more, R may be the same or different, and even when the integer is 1. When R is 2 or more in one organic group, R may be the same or different and is an organic group composed of 2 or more of the above-mentioned cycloaliphatic hydrocarbon groups which may have a substituent. In this case, they may be linked by O, S, CH 2 or may form a condensed ring. ) Is reacted with epichlorohydrin and a dehydrochlorination agent, or (b)
A general formula characterized by reacting epichlorohydrin with a dehydrochlorinating agent and then further reacting with acrylic acid or methacrylic acid. (M is the same as above. X is Or And Y is H or CH 3 , and n is 0 or a positive number from 0 to 30. ) A method for producing a fluorine-containing alicyclic compound represented by:
JP63146243A 1987-06-15 1988-06-14 Fluorine-containing alicyclic compound and method for producing the same Expired - Lifetime JPH0830028B2 (en)

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EP3960788A4 (en) * 2019-06-12 2023-01-25 Daikin Industries, Ltd. Fluorine-containing epoxy resin for electrical materials and method for manufacturing same

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JP2748432B2 (en) * 1988-09-20 1998-05-06 旭硝子株式会社 Adhesive for optical element
JP4037470B2 (en) * 1994-06-28 2008-01-23 エルピーダメモリ株式会社 Semiconductor device
US7125943B2 (en) * 2002-08-07 2006-10-24 Central Glass Company, Limited Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions
JP5549054B2 (en) * 2008-01-18 2014-07-16 ダイキン工業株式会社 Multifunctional acrylate
JP5842316B2 (en) * 2010-01-20 2016-01-13 ダイキン工業株式会社 Light-resistant sealing resin composition
WO2021117486A1 (en) * 2019-12-12 2021-06-17 ダイキン工業株式会社 Composition, curable composition, and cured product

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US3706772A (en) 1971-03-23 1972-12-19 Us Navy Fluorodiglycidyl ethers
US3879430A (en) 1973-09-13 1975-04-22 Us Navy Highly fluorinated diglycidyl ethers

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* Cited by examiner, † Cited by third party
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JPS6289719A (en) * 1985-10-15 1987-04-24 Sanyo Kokusaku Pulp Co Ltd Novel vinyl ester resin and production thereof

Patent Citations (2)

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US3706772A (en) 1971-03-23 1972-12-19 Us Navy Fluorodiglycidyl ethers
US3879430A (en) 1973-09-13 1975-04-22 Us Navy Highly fluorinated diglycidyl ethers

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Amer.Chem.Soci.,Vol.31,No.1(1971),P.546−551

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3960788A4 (en) * 2019-06-12 2023-01-25 Daikin Industries, Ltd. Fluorine-containing epoxy resin for electrical materials and method for manufacturing same

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