JPH08290128A - Cleaning method using supercritical and subcritical fluid - Google Patents
Cleaning method using supercritical and subcritical fluidInfo
- Publication number
- JPH08290128A JPH08290128A JP9515195A JP9515195A JPH08290128A JP H08290128 A JPH08290128 A JP H08290128A JP 9515195 A JP9515195 A JP 9515195A JP 9515195 A JP9515195 A JP 9515195A JP H08290128 A JPH08290128 A JP H08290128A
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- JP
- Japan
- Prior art keywords
- fluid
- supercritical
- subcritical
- cleaned
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、超臨界および亜臨界流
体を用いた靴等の難洗浄物の洗浄をも可能とする洗浄方
法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning method capable of cleaning difficult-to-clean objects such as shoes using supercritical and subcritical fluids.
【０００２】[0002]
【従来の技術】耐圧洗浄容器内に半導体等の被洗浄物を
収納し、超臨界供給手段により、超臨界流体を被洗浄物
に接触させ、被洗浄物に超臨界流体を接触させると、被
洗浄物に付着する水分、有機物が超臨界流体に溶解し、
超臨界流体に移動する。水分や有機物を溶解した超臨界
流体を、適宜の手段により、耐圧洗浄容器から除去する
と、精密洗浄された被洗浄物が得られる。水分が除去さ
れているので、煩らわしい乾燥仕上げが不要である。こ
れは、図２の純物質の状態図と超臨界流体のグラフに見
られるように臨界点近傍で、圧力および温度の条件がＰ
＞Ｐc （臨界圧力），Ｔ＞Ｔo （臨界温度）である高密
度流体のことを意味する超臨界流体がもつ他に見られな
い特性の （１）わずかの圧力変化で大きな密度変化が得られる。
一般に物質の溶解度は密度と比例するので、圧力変化の
みにより大きな溶解度差が得られることになる。 （２）超臨界流体の密度は、液体と類似しているが、低
粘性，高拡散性である。したがって、物質移動の面でよ
り有利になる。 をたくみに利用した半導体基板等の洗浄に用いられるよ
うになった最新の洗浄技術である。2. Description of the Related Art An object to be cleaned such as a semiconductor is housed in a pressure-resistant cleaning container, and a supercritical fluid is brought into contact with the object to be cleaned by a supercritical supply means. Moisture and organic substances adhering to the washed material dissolve in the supercritical fluid,
Move to supercritical fluid. By removing the supercritical fluid in which water or organic matter is dissolved from the pressure-resistant cleaning container by an appropriate means, a precisely cleaned object to be cleaned can be obtained. Since the water is removed, a troublesome dry finish is unnecessary. This is in the vicinity of the critical point as shown in the phase diagram of the pure substance and the graph of the supercritical fluid in FIG.
> P c (critical pressure), T> T o (critical temperature), which is a high-density fluid, which means that there is no other characteristic of a supercritical fluid. (1) A small density change causes a large density change. can get.
Since the solubility of a substance is generally proportional to the density, a large difference in solubility can be obtained only by a pressure change. (2) The density of supercritical fluid is similar to that of liquid, but it has low viscosity and high diffusivity. Therefore, it becomes more advantageous in terms of mass transfer. This is the latest cleaning technology that has come to be used for cleaning semiconductor substrates, etc.
【０００３】これまでの半導体基板の洗浄は洗浄対象に
応じた溶剤槽を順次に通過させ、洗い落す、例えば、油
脂分を対象としては、有機溶液槽（トリクレン、アセト
ンなど）で、金属除去を対象としては、酸、アルカリ溶
液槽（例えば、Ｈ2 Ｏ2 −ＮＨ4 ・ＯＨ，ＨＣｌ−Ｈ2
Ｏ2 の混液など）で、また、基板表面に発生する自然酸
化膜に対しては、ＨＦ溶液槽で洗い、これらの薬液を超
純水で洗い流して、最終段階でスピンドライなどで、半
導体の性能や製造を阻害する水分を完全に除いて、それ
ぞれの製造工程へと渡す、所謂ウェット洗浄法と呼ばれ
るものであったが、これに代わって開発され、数多くの
提案がある。その原理は、いずれも、第一に、超臨界流
体の粘度が小さいことは、狭い部分への侵入がし易いこ
とを示し、該流体の密度が大きいことは、基板に付着・
含浸する汚染物質、特に有機質の流体への溶解性が高い
こと、第二に、上記した洗浄作用は、汚染物質を含有す
る超臨界流体をもたらすが、その密度を小さくすること
により溶解作用が小さくなり、その分、上記した含有成
分を液状及び固体状に析出する。従って、減圧された分
離槽で、これらの成分を回収し、循環する流体を洗浄化
できることを利用して成る。Conventional cleaning of semiconductor substrates is carried out by sequentially passing through a solvent tank according to the object to be cleaned and washing it off. For example, in the case of fats and oils, an organic solution tank (triclene, acetone, etc.) is used for metal removal. The target is an acid or alkaline solution tank (for example, H 2 O 2 —NH 4 OH, HCl—H 2
For a natural oxide film generated on the substrate surface with a mixed solution of O 2 , etc.), rinse with a HF solution bath, rinse these chemicals with ultrapure water, and spin dry etc. Although it was a so-called wet cleaning method in which water that hinders performance and manufacturing was completely removed and passed to each manufacturing process, it was developed in place of this, and there are many proposals. In each of the principles, firstly, the fact that the viscosity of the supercritical fluid is small indicates that the supercritical fluid easily penetrates into a narrow portion, and the fact that the density of the fluid is large means that the fluid adheres to the substrate.
High solubility in impregnated pollutants, especially organic fluids. Secondly, the above-mentioned cleaning action results in a supercritical fluid containing pollutants, but by reducing its density the dissolution action is reduced. Then, correspondingly, the above-mentioned contained components are precipitated in a liquid state and a solid state. Therefore, the fact that these components can be recovered and the circulating fluid can be washed in a depressurized separation tank is utilized.
【０００４】叙上の如き物性は亜臨界流体をももつ。亜
臨界流体とは、圧力−温度状態図において臨界点付近の
状態にある流体をいい、この領域では、流体は、物性的
に不安定な状態であるので、超臨界流体とは区別され
る。しかして、特開平３−２６１１２８号に示される洗
浄方法にあっては、溶媒として「亜臨界状態を含む超臨
界ガス」と指定する。採用されるガスとしては、炭酸ガ
ス、酸化窒素、エタン、プロパン等が用いられるが、特
に、炭酸ガスは、不燃性、無害、低廉であり、しかも、
臨界温度が３１℃、臨界圧力が７９．２気圧であって、
取扱いが容易であるので好ましく用いられている。The above physical properties also have a subcritical fluid. The subcritical fluid is a fluid in the state near the critical point in the pressure-temperature phase diagram. In this region, the fluid is in a physically unstable state, and is therefore distinguished from the supercritical fluid. Therefore, in the cleaning method disclosed in JP-A-3-261128, "supercritical gas containing a subcritical state" is designated as the solvent. Carbon dioxide, nitric oxide, ethane, propane and the like are used as the gas to be adopted, but in particular, carbon dioxide is nonflammable, harmless and inexpensive, and
The critical temperature is 31 ° C, the critical pressure is 79.2 atm,
It is preferably used because it is easy to handle.
【０００５】[0005]
【発明が解決しようとする課題】叙上の従来の技術にあ
っては、全く被洗浄物を洗浄流体中に浸漬し、汚染物質
を流体中に溶解させることで洗浄を達成させるとしてい
るが、汚染物の剥離は完全溶解によってのみなされるこ
とはなく、未溶解で固体状に分離して流体中に移行する
ものも多い。つまり、作用した洗浄流体中には固体状の
汚染物質も多く存在し浮遊しており、これが被洗浄物に
再付着する。In the above conventional technique, the cleaning is accomplished by immersing the object to be cleaned in the cleaning fluid and dissolving the contaminants in the fluid. Decontamination of contaminants is not considered to be due to complete dissolution, but many are undissolved and separated into solids and transferred into the fluid. That is, many solid contaminants are present in the acted cleaning fluid and are floating, and these adhere to the object to be cleaned again.
【０００６】かかる再付着が許容されない物にあって
は、再度洗浄流体で洗浄するという工程が追加されねば
ならないという不便がある。また、単純に溶解作用のみ
に依存したのでは、時間がかかり能率的ではない。しか
し、強制攪拌を流体に加えるとすると耐圧洗浄容器の設
計の難度が高まり実用化が困難となる。なを、これによ
っても前述の再付着は解決されることはない。特に被洗
浄物が靴の如き難洗浄物の場合にあっては、完全な洗浄
は期し難い。[0006] In the case where such reattachment is not allowed, there is the inconvenience that a step of cleaning again with a cleaning fluid must be added. In addition, simply relying on the dissolution action alone is time consuming and inefficient. However, if forced agitation is added to the fluid, the pressure-resistant cleaning container becomes more difficult to design and practically used. However, this does not solve the above-mentioned redeposition. Especially when the object to be cleaned is a difficult-to-clean object such as shoes, it is difficult to completely clean it.
【０００７】本発明は、従来の技術の有するこのような
問題点に鑑みてなされたものであり、その目的とすると
ころは、例え、靴のような難洗浄物であっても、別段の
強制攪拌手段を耐圧洗浄容器内に配備しなくても強制的
な剥離作用でもって被洗浄物から汚染物質を再付着させ
ることなく、系外に完全に除去することのできる超臨界
および亜臨界流体を用いた洗浄方法を提供しようとする
ものである。The present invention has been made in view of the above problems of the prior art. The object of the present invention is to forcibly separate even difficult-to-clean articles such as shoes. Supercritical and subcritical fluids that can be completely removed outside the system without redepositing contaminants from the object to be cleaned by the forced peeling action without disposing stirring means inside the pressure-resistant cleaning container. The cleaning method used is to be provided.
【０００８】[0008]
【課題を解決するための手段】上記目的を達成するため
に、本発明における洗浄方法は、耐圧洗浄器内にて被洗
浄物を必要に応じてエントレーナを添加した超臨界およ
び亜臨界流体に浸漬し、次いで該耐圧洗浄器内の該流体
を洗浄器外に急速に流出させること、あるいは該洗浄器
内容積を急速に拡大させることにより該流体密度を急速
に膨脹させることで汚染物質表面で強い攪乱あるいは大
量の気泡を発生させ、この流れ作用あるいはバブリング
作用でもって汚染物質を迅速に強制剥離・強制溶解させ
て被洗浄物の洗浄を行うとしたものである。In order to achieve the above object, the cleaning method according to the present invention is such that an object to be cleaned is immersed in a supercritical and subcritical fluid containing an entrainer if necessary in a pressure-proof cleaning device. Then, the fluid in the pressure-resistant washer is rapidly discharged to the outside of the washer, or the volume of the washer is rapidly expanded to rapidly expand the fluid density, so that the surface of the contaminant can be strengthened. Disturbance or a large amount of air bubbles are generated, and by this flow action or bubbling action, contaminants are promptly forcibly peeled and forcibly dissolved to wash the object to be washed.
【０００９】この際、超臨界および亜臨界流体に難溶解
性の無機質化合物や極性物質が汚染物質の場合、これら
の物質を逆ミセル中に取り込み再付着を防止することが
できる親油性界面活性剤を混合すると良い。また、超臨
界および亜臨界流体の膨脹を間欠的に作用させ、流れ作
用あるいはバブリング作用を制御すると良い。At this time, when the inorganic compound or polar substance which is hardly soluble in supercritical and subcritical fluids is a pollutant, a lipophilic surfactant capable of incorporating these substances into the reverse micelles and preventing reattachment It is good to mix. Further, it is preferable to control the flow action or the bubbling action by causing the expansion of the supercritical and subcritical fluids to act intermittently.
【００１０】耐圧洗浄器内にて被洗浄物に対して、必要
に応じてエントレーナを添加した超臨界および亜臨界流
体を噴射口ノズルからジェット流状態で直接吹き付ける
とともに、該耐圧洗浄器内の該流体を洗浄器外に急速に
流出させること、あるいは該洗浄器内容積を急速に拡大
させることにより急速に膨脹させることで強い攪乱ある
いは大量の気泡を発生させ、この流れ作用あるいはバブ
リング作用とジェット噴射の衝撃エネルギーとでもって
汚染物質を迅速に強制剥離・強制溶解させて被洗浄物の
洗浄を行うとしたものである。Supercritical and subcritical fluids to which an entrainer is added, if necessary, are sprayed directly from the injection nozzle to the object to be cleaned in the pressure-resistant cleaning device in a jet flow state. Rapid flow of fluid out of the washer or rapid expansion of the inside volume of the washer causes rapid expansion to generate strong turbulence or a large amount of bubbles, and this flow action or bubbling action and jet injection The impact energy is used to quickly remove the contaminants by force and dissolve the contaminants to clean the object to be cleaned.
【００１１】この際、超臨界および亜臨界流体に難溶解
性の無機質化合物や極性物質が汚染物質の場合、これら
の物質を逆ミセル中に取り込み再付着を防止することが
できる親油性界面活性剤を混合すると良い。At this time, when the inorganic compound or polar substance which is hardly soluble in the supercritical and subcritical fluids is a pollutant, a lipophilic surfactant capable of incorporating these substances into the reverse micelle and preventing reattachment It is good to mix.
【００１２】[0012]
【作用】超臨界流体の最大の特徴は、密度を大幅に変化
させることができ、これ故に一種類の溶媒で多種類の液
体溶媒に匹敵し得る点にある。しかして、耐圧洗浄器内
の該流体は密度の変動で浸漬されている靴等の難洗浄物
における各種汚染物の溶媒として作用し得る。亜臨界流
体にあっても同様である。The most important feature of supercritical fluids is that the density can be changed significantly, and therefore one kind of solvent can be compared with many kinds of liquid solvents. Thus, the fluid in the pressure-resistant cleaning device can act as a solvent for various contaminants in the difficult-to-clean product such as shoes that are immersed due to the change in density. The same applies to subcritical fluids.
【００１３】一方、流体密度を急速に膨脹させると特異
の現象を呈する。すなわち、流体を器外に急速に流出さ
せると容器中の流体は圧力を保とうとして密度を変化
（膨脹）させる。これは、容器容積の急速な拡大、つま
り、洗浄容器を回収槽と連通させて実質的な容積の拡大
を図るときにも生じる。On the other hand, when the fluid density is rapidly expanded, a peculiar phenomenon is exhibited. That is, when the fluid rapidly flows out of the container, the fluid in the container changes its density (expansion) in order to maintain the pressure. This also occurs when the container volume is rapidly expanded, that is, when the cleaning container is communicated with the recovery tank to substantially expand the volume.
【００１４】この膨脹の際に、超臨界域にあっては非常
に強い攪乱と微小気泡が生じ、亜臨界域近くにあっては
攪乱と大量のより大粒の気泡所謂バブリングが生じる。
これは、亜臨界並びにこの近くの超臨界域の流体の不安
定さ、つまり、大きさの異なるクラスターの混在で密度
揺らぎの大きな状態への急速な移転で生じるものと解さ
れる。During this expansion, very strong disturbance and minute bubbles are generated in the supercritical region, and disturbance and a large amount of larger bubbles, so-called bubbling, occur in the vicinity of the subcritical region.
It is understood that this is caused by the instability of the fluid in the subcritical region and the supercritical region in the vicinity thereof, that is, the rapid transfer to the state of large density fluctuation due to the mixture of clusters of different sizes.
【００１５】よって、この状態下にあっては、溶媒本来
の溶解力に加えて、強い攪乱とバブリングという物理的
な洗浄作用が付加されることとなる。この攪乱とバブリ
ングは再付着のおそれのある固形汚物に対し、強制剥離
のみでなく、強制浮上をもさせ、そのまま排出ラインを
伝って器外に出してしまうので、再付着のおそれを解消
し、再洗浄の要を無くす。Therefore, under this condition, in addition to the original solvent power of the solvent, a physical washing action of strong disturbance and bubbling is added. This disturbance and bubbling not only forcibly peels off solid waste that may reattach, but also forcibly ascends, and it goes out of the device along the discharge line as it is, eliminating the risk of reattachment. Eliminates the need for rewashing.
【００１６】流体中に界面活性剤を混合すると、固形の
汚染物や不溶解の無機質化合物や極性物質をミセル中に
取り込み、キャリアとして好適な大気泡を形成するので
洗浄作用が化学的，物理的に一段とアップする。また、
この攪乱とバブリングを間欠的に作動させると、不作動
中に溶解したものを一気に捕捉することとなり、化学的
洗浄と物理的洗浄が好都合に組み合い、高能率な洗浄と
なる。When a surfactant is mixed in the fluid, solid contaminants, insoluble inorganic compounds and polar substances are taken into the micelles to form large bubbles suitable as carriers, so that the cleaning action is chemical and physical. To further improve. Also,
If this disturbance and bubbling are operated intermittently, the dissolved substances will be trapped at once in a non-operation, and chemical cleaning and physical cleaning will be favorably combined, resulting in highly efficient cleaning.
【００１７】請求項４記載の発明においては、叙上の諸
現象が被洗浄物表面と内部の付着液と含浸液中で発生す
るが、これに加えてジェット噴射による衝撃エネルギー
にて被洗浄物表面の汚れを剥離し、また、当該ジェット
噴射は被洗浄物表面に浮き出た汚れを伴なった液を洗い
流す。被洗浄物は流体中に浸漬されていないので、再付
着の心配は全く無い。あたかもシャワー洗浄のように迅
速に洗浄を完了する。In the invention of claim 4, various phenomena described above occur in the surface of the object to be cleaned and in the adhering liquid and the impregnating liquid on the surface of the object to be cleaned. The stains on the surface are peeled off, and the jet spray flushes away the liquid accompanied by the stains floating on the surface of the object to be cleaned. Since the object to be cleaned is not immersed in the fluid, there is no fear of reattachment. The washing is completed as quickly as shower washing.
【００１８】請求項５記載の発明においては、上述の請
求項４記載の発明の作用に前記した界面活性剤の作用が
加わる。In the invention of claim 5, the action of the above-mentioned surfactant is added to the action of the invention of claim 4 described above.
【００１９】[0019]
【実施例】実施例について図を参照して説明する。図１
は、本発明の方法を実施するための装置構成の一例を示
し、流体ボンベ１は管系２にて耐圧洗浄容器３に連絡さ
れ、管系２配設のシャットバルブ４の開弁操作で超臨界
および亜臨界流体６を耐圧洗浄容器３に供給する。容器
３には難洗浄物である靴等の被洗浄物５が収容される。EXAMPLES Examples will be described with reference to the drawings. FIG.
Shows an example of an apparatus configuration for carrying out the method of the present invention, in which the fluid cylinder 1 is connected to the pressure-resistant cleaning container 3 by the pipe system 2, and the shut valve 4 provided in the pipe system 2 is operated to open the valve. The critical and subcritical fluid 6 is supplied to the pressure resistant cleaning container 3. The container 3 accommodates an object 5 to be cleaned, such as shoes, which is difficult to clean.
【００２０】当該被洗浄物５は請求項１〜３記載の発明
の場合にあっては、流体６中に浸漬されるが、請求項４
〜５記載の発明の場合にあっては、浸漬されずに支持さ
れる。流体６にエントレーナを添加したり、界面活性剤
を混合するには、該管系２にエントレーナ若しくは界面
活性剤槽７にポンプ８及び弁９を備えた管系１０を接続
すればよい。In the case of the invention described in claims 1 to 3, the article to be cleaned 5 is immersed in the fluid 6,
In the case of the inventions described in 5 to 5, it is supported without being dipped. To add an entrainer to the fluid 6 or to mix a surfactant, an entrainer or a surfactant tank 7 may be connected to the pipe system 2 and a pipe system 10 equipped with a pump 8 and a valve 9.
【００２１】他方、容器３には排出管系１１が接続さ
れ、シャットバルブ１２及び流量制御バルブ１３を備え
て、大気に放散したり、あるいは、回収のためフィルタ
ー１４を介して貯槽１５に接続される。容器３底には、
洗浄剤の流体６排出用の管系１６が接続し、シャットバ
ルブ１７及び流量制御バルブ１８を介して大気に放散、
あるいは、該排出管系１１にジョイントして該貯槽１５
に回収される。On the other hand, a discharge pipe system 11 is connected to the container 3, and a shut valve 12 and a flow rate control valve 13 are provided so as to diffuse into the atmosphere or to be connected to a storage tank 15 through a filter 14 for recovery. It At the bottom of container 3,
The pipe system 16 for discharging the fluid 6 of the cleaning agent is connected, and is diffused to the atmosphere through the shut valve 17 and the flow control valve 18.
Alternatively, the storage tank 15 is jointed to the discharge pipe system 11.
Will be collected.
【００２２】請求項４〜５記載の発明の場合にあって
は、被洗浄物５の内外に当射し得るように、容器３に噴
射口ノズル（図示省略）を多点設するか若しくは回転支
持（図示省略）すれば良い。In the case of the invention described in claims 4 to 5, in order to irradiate the inside and outside of the object to be cleaned 5, the container 3 is provided with a plurality of injection nozzles (not shown) or is rotated. It may be supported (not shown).
【００２３】[0023]
【発明の効果】本発明は、以上説明したように構成され
ているので、以下に記載されるような効果を奏する。請
求項１〜３記載の発明にあっては、洗浄に有効な攪乱と
バブリング作用を別段の攪拌装置を導入することなく奏
させているので、装置の大規模化，コストアップ化を避
けて従来の洗浄力を上まわる強力な洗浄効果を実現して
いる。Since the present invention is configured as described above, it has the following effects. In the inventions according to claims 1 to 3, since the disturbance and the bubbling action effective for cleaning are performed without introducing a separate stirring device, it is possible to avoid the increase in the size and cost of the device. Has achieved a powerful cleaning effect that exceeds the cleaning power of.
【００２４】請求項４〜５記載の発明にあっては、上記
効果にシャワー効果が加わり、迅速化が達成される。In the inventions according to claims 4 to 5, the shower effect is added to the above-mentioned effect, and the speeding up is achieved.
【図１】本発明方法の要領説明図である。FIG. 1 is a diagram for explaining the procedure of the method of the present invention.
【図２】純物質の状態図と超臨界流体のグラフである。FIG. 2 is a phase diagram of a pure substance and a graph of a supercritical fluid.
１ 流体ボンベ ２ 管系 ３ 耐圧洗浄容器 ４ シャットバルブ ５ 被洗浄物 ６ 超臨界および亜臨界流体 ７ 界面活性剤槽 ８ ポンプ ９ 弁 １０ 管系 １１ 排出管系 １２ シャットバルブ １３ 流量制御バルブ １４ フィルター １５ 貯槽 １６ 管系 １７ シャットバルブ １８ 流量制御バルブ DESCRIPTION OF SYMBOLS 1 Fluid cylinder 2 Pipe system 3 Pressure-resistant cleaning container 4 Shut valve 5 Cleaning object 6 Supercritical and subcritical fluid 7 Surfactant tank 8 Pump 9 valve 10 Pipe system 11 Exhaust pipe system 12 Shut valve 13 Flow control valve 14 Filter 15 Storage tank 16 Pipe system 17 Shut valve 18 Flow control valve
Claims (5)
てエントレーナを添加した超臨界および亜臨界流体に浸
漬し、次いで該耐圧洗浄器内の該流体を洗浄器外に急速
に流出させること、あるいは該洗浄器内容積を急速に拡
大させることにより該流体密度を急速に膨脹させること
で汚染物質表面で強い攪乱あるいは大量の気泡を発生さ
せ、この流れ作用あるいはバブリング作用でもって汚染
物質を迅速に強制剥離・強制溶解させて被洗浄物の洗浄
を行うことを特徴とする超臨界および亜臨界流体を用い
た洗浄方法。1. An object to be cleaned is immersed in a supercritical fluid and a subcritical fluid to which an entrainer is added, if necessary, in the pressure-resistant cleaning device, and then the fluid in the pressure-resistant cleaning device is rapidly discharged to the outside of the cleaning device. Or by rapidly expanding the internal volume of the scrubber to rapidly expand the fluid density to generate a strong disturbance or a large amount of bubbles on the surface of the pollutant, and the pollutant is caused by this flow action or bubbling action. A cleaning method using a supercritical fluid and a subcritical fluid, characterized in that the object to be cleaned is washed by rapidly forcibly peeling and forcibly dissolving it.
機質化合物や極性物質が汚染物質の場合、これらの物質
を逆ミセル中に取り込み再付着を防止することができる
親油性界面活性剤を混合するとした請求項１記載の超臨
界および亜臨界流体を用いた洗浄方法。2. When an inorganic compound or a polar substance, which is hardly soluble in supercritical and subcritical fluids, is a contaminant, a lipophilic surfactant capable of incorporating these substances into reverse micelles and preventing re-adhesion is used. The cleaning method using a supercritical fluid and a subcritical fluid according to claim 1, which are mixed.
に作用させ、流れ作用あるいはバブリング作用を制御す
るとした請求項１又は請求項２記載の超臨界および亜臨
界流体を用いた洗浄方法。3. The cleaning method using a supercritical fluid and a subcritical fluid according to claim 1, wherein the expansion action of the supercritical fluid and the subcritical fluid acts intermittently to control the flow action or the bubbling action.
要に応じてエントレーナを添加した超臨界および亜臨界
流体を噴射口ノズルからジェット流状態で直接吹き付け
るとともに、該耐圧洗浄器内の該流体を請求項１記載の
手法により急速に膨脹させることで強い攪乱あるいは大
量の気泡を発生させ、この流れ作用あるいはバブリング
作用とジェット噴射の衝撃エネルギーとでもって汚染物
質を迅速に強制剥離・強制溶解させて被洗浄物の洗浄を
行うことを特徴とする超臨界および亜臨界流体を用いた
洗浄方法。4. A supercritical fluid and a subcritical fluid, to which an entrainer is added if necessary, are directly sprayed in a jet flow state from a jet nozzle onto the object to be cleaned in the pressure resistant cleaning device. The fluid is rapidly expanded by the method according to claim 1 to generate a strong turbulence or a large amount of bubbles, and the flow action or bubbling action and the impact energy of the jet injection force the contaminants to be rapidly separated. A cleaning method using a supercritical fluid and a subcritical fluid, characterized in that the material to be cleaned is forcibly dissolved and washed.
機質化合物や極性物質が汚染物質の場合、これらの物質
を逆ミセル中に取り込み再付着を防止することができる
親油性界面活性剤を混合するとした請求項４記載の超臨
界および亜臨界流体を用いた洗浄方法。5. When a pollutant is an inorganic compound or polar substance that is hardly soluble in supercritical and subcritical fluids, a lipophilic surfactant that can prevent the redeposition by incorporating these substances into reverse micelles. The cleaning method using a supercritical fluid and a subcritical fluid according to claim 4, wherein the cleaning is performed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9515195A JP2832190B2 (en) | 1995-04-20 | 1995-04-20 | Cleaning method using supercritical and subcritical fluids |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9515195A JP2832190B2 (en) | 1995-04-20 | 1995-04-20 | Cleaning method using supercritical and subcritical fluids |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08290128A true JPH08290128A (en) | 1996-11-05 |
| JP2832190B2 JP2832190B2 (en) | 1998-12-02 |
Family
ID=14129800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9515195A Expired - Fee Related JP2832190B2 (en) | 1995-04-20 | 1995-04-20 | Cleaning method using supercritical and subcritical fluids |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2832190B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998013149A1 (en) * | 1996-09-25 | 1998-04-02 | Shuzurifuresher Kaihatsukyodokumiai | Washing means using liquefied gas of high density |
| WO2001047566A1 (en) * | 1999-12-27 | 2001-07-05 | Kabushiki Kaisha Sr Kaihatsu | Method and device for disinfection/sterilization of medical instruments |
| SG109403A1 (en) * | 1998-03-21 | 2005-03-30 | Arai Kunio | Method for using high density compressed liquefied gases in cleaning applications |
| US7189350B2 (en) | 1999-12-27 | 2007-03-13 | Kabushiki Kaisha Sr Kaihatsu | Method of sterilizing medical instruments |
| EP2202009A1 (en) | 2008-12-25 | 2010-06-30 | Sharp Kabushiki Kaisha | Cleaning apparatus |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101147908A (en) * | 2002-05-20 | 2008-03-26 | 松下电器产业株式会社 | Washing method |
-
1995
- 1995-04-20 JP JP9515195A patent/JP2832190B2/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998013149A1 (en) * | 1996-09-25 | 1998-04-02 | Shuzurifuresher Kaihatsukyodokumiai | Washing means using liquefied gas of high density |
| SG109403A1 (en) * | 1998-03-21 | 2005-03-30 | Arai Kunio | Method for using high density compressed liquefied gases in cleaning applications |
| WO2001047566A1 (en) * | 1999-12-27 | 2001-07-05 | Kabushiki Kaisha Sr Kaihatsu | Method and device for disinfection/sterilization of medical instruments |
| AU752509B2 (en) * | 1999-12-27 | 2002-09-19 | Kabushiki Kaisha Sr Kaihatsu | Method and device for disinfection/sterilization of medical instruments |
| US6610251B1 (en) | 1999-12-27 | 2003-08-26 | Kabushiki Kaisha Sr Kaihatsu | Method of sterilizing medical instruments |
| US7189350B2 (en) | 1999-12-27 | 2007-03-13 | Kabushiki Kaisha Sr Kaihatsu | Method of sterilizing medical instruments |
| EP2202009A1 (en) | 2008-12-25 | 2010-06-30 | Sharp Kabushiki Kaisha | Cleaning apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2832190B2 (en) | 1998-12-02 |
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