JPH08273585A - Secondary ion mass spectrometer - Google Patents
Secondary ion mass spectrometerInfo
- Publication number
- JPH08273585A JPH08273585A JP7073097A JP7309795A JPH08273585A JP H08273585 A JPH08273585 A JP H08273585A JP 7073097 A JP7073097 A JP 7073097A JP 7309795 A JP7309795 A JP 7309795A JP H08273585 A JPH08273585 A JP H08273585A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- holder
- cooling
- secondary ion
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001816 cooling Methods 0.000 claims abstract description 16
- 150000002500 ions Chemical group 0.000 claims description 25
- 238000000605 extraction Methods 0.000 claims description 15
- 239000003507 refrigerant Substances 0.000 abstract description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 5
- 239000002826 coolant Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000001073 sample cooling Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Landscapes
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は二次イオン質量分析装置
に関し、特に試料冷却機構を備えた二次イオン質量分析
装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a secondary ion mass spectrometer, and more particularly to a secondary ion mass spectrometer equipped with a sample cooling mechanism.
【0002】[0002]
【従来の技術】従来の試料を冷却する二次イオン質量分
析装置のイオン発生部の構成を示す断面図を図3に示
す。試料1は試料ホルダー2に装着され、試料1を冷却
するには冷媒例えば液化窒素を冷媒導入部3に導入し
て、熱伝導部4を介して冷却される。なお、この熱伝導
部は予備排気室から搬送機構により試料ホルダー2を真
空を破らずに搬送した際に、試料ホルダー2を保持する
機能も有している。2. Description of the Related Art FIG. 3 is a sectional view showing the structure of an ion generating part of a conventional secondary ion mass spectrometer for cooling a sample. The sample 1 is mounted on the sample holder 2, and in order to cool the sample 1, a coolant, for example, liquefied nitrogen is introduced into the coolant introduction part 3 and is cooled via the heat conduction part 4. The heat conducting section also has a function of holding the sample holder 2 when the sample holder 2 is conveyed from the preliminary exhaust chamber by the conveying mechanism without breaking the vacuum.
【0003】冷媒の導入によって試料1を冷却したのち
に、一次イオン10をこの試料1に照射し、その際に発
生した二次イオン11は引き出し電極5により収集され
て、質量分析器に導入されて必要な二次イオンが分離さ
れ質量分析が行なわれる。After cooling the sample 1 by introducing a cooling medium, the sample 1 is irradiated with primary ions 10 and the secondary ions 11 generated at that time are collected by the extraction electrode 5 and introduced into the mass spectrometer. Then, the required secondary ions are separated and mass spectrometry is performed.
【0004】[0004]
【発明が解決しようとする課題】上述した従来の二次イ
オン質量分析装置は、試料ホルダー2の裏面側の低温部
に熱を逃がすことによって試料1を冷却している。試料
1及び試料ホルダー2に流れ込む熱は、試料1の前面に
対向する装置構成物、例えば引き出し電極5などからの
熱輻射であり、主に熱伝導によって低温部である冷媒導
入部3に伝達される。ここで、冷媒導入から充分に時間
が経過して試料1の温度が一定に達した際の試料1と冷
媒導入部3との温度差は、その間の熱抵抗と流入する熱
量に比例する。In the above-mentioned conventional secondary ion mass spectrometer, the sample 1 is cooled by radiating heat to the low temperature portion on the back surface side of the sample holder 2. The heat flowing into the sample 1 and the sample holder 2 is heat radiation from a device component facing the front surface of the sample 1, for example, the extraction electrode 5, and is mainly transferred to the refrigerant introduction part 3 which is a low temperature part by heat conduction. It Here, the temperature difference between the sample 1 and the coolant introduction part 3 when the temperature of the sample 1 reaches a constant temperature after a sufficient time has elapsed from the introduction of the coolant is proportional to the thermal resistance during that period and the amount of heat that flows in.
【0005】熱抵抗には、熱伝導の良いCuやAl等か
ら作られている試料ホルダー2と熱伝導部4との接触熱
抵抗も含まれるが、真空中では大気中よりも接触熱抵抗
の影響が大きくなる。そのため図4に示したように、試
料1と冷媒導入部との温度差が大きく、しかも温度が一
定になる迄の時間が長くなり充分な冷却効果が得られな
いという問題があった。The thermal resistance includes the contact thermal resistance between the sample holder 2 made of Cu or Al, which has good thermal conductivity, and the thermal conductive portion 4, but the contact thermal resistance in vacuum is higher than that in the atmosphere. The impact will increase. Therefore, as shown in FIG. 4, there is a problem that the temperature difference between the sample 1 and the refrigerant introduction part is large, and the time until the temperature becomes constant becomes long, so that a sufficient cooling effect cannot be obtained.
【0006】又試料ホルダー2が熱伝導部4に十分に保
持されていない場合、試料温度が定常状態に達するまで
の時間や到達の温度が変動するという問題があった。Further, when the sample holder 2 is not sufficiently held by the heat conducting portion 4, there is a problem that the time until the sample temperature reaches the steady state and the temperature at which the sample temperature reaches the temperature vary.
【0007】本発明の目的は、短時間で試料の温度を下
げ定常状態にできる二次イオン質量分析装置を提供する
ことにある。An object of the present invention is to provide a secondary ion mass spectrometer capable of lowering the temperature of a sample in a short time to bring it to a steady state.
【0008】[0008]
【課題を解決するための手段】本発明の二次イオン質量
分析装置は、真空槽内に設置され試料を保持する試料ホ
ルダーと、この試料ホルダーに対向して設けられ前記試
料に照射された一次イオンにより発生する二次イオンを
引き出す為の引き出し電極と、この引き出し電極を冷却
する為の冷却手段とを含むことを特徴とするものであ
る。A secondary ion mass spectrometer according to the present invention comprises a sample holder installed in a vacuum chamber for holding a sample, and a primary holder which is provided so as to face the sample holder and irradiates the sample. It is characterized in that it includes an extraction electrode for extracting secondary ions generated by ions and a cooling means for cooling the extraction electrode.
【0009】[0009]
【実施例】次に、本発明の実施例について図面を参照し
て説明する。図1は本発明の一実施例のイオン発生部の
構成を示す断面図である。Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is a cross-sectional view showing the structure of an ion generating part according to an embodiment of the present invention.
【0010】図1において二次イオン質量分析装置のイ
オン発生部は、真空槽(図示せず)内に設置され試料1
を保持する試料ホルダー2と、この試料ホルダー2に対
向して設けられ試料1に照射された一次イオン10によ
り発生する二次イオン11を効率よく引き出す為の引出
し電極5と、CuやAl等からなる熱伝導部7を介して
引出し電極5に接する冷媒導入部6と、試料ホルダー2
を冷却する為の熱伝導部4と冷媒導入部3とから主に構
成されている。二次イオン質量分析装置では、二次イオ
ン収集の効率を上げるために、引き出し電極5が試料1
の前面に対向して近接して設置されている。そのため試
料ホルダー2が見込む立体角は2πに近い値となってい
る。In FIG. 1, the ion generating part of the secondary ion mass spectrometer is installed in a vacuum chamber (not shown) and the sample 1
A sample holder 2 that holds the sample holder 2; an extraction electrode 5 that is provided so as to face the sample holder 2 for efficiently extracting secondary ions 11 generated by the primary ions 10 with which the sample 1 is irradiated; And the sample holder 2 which is in contact with the extraction electrode 5 via the heat conducting portion 7
It is mainly composed of a heat conducting portion 4 and a coolant introducing portion 3 for cooling. In the secondary ion mass spectrometer, the extraction electrode 5 is set to the sample 1 in order to improve the efficiency of secondary ion collection.
It is installed close to the front of the. Therefore, the solid angle expected by the sample holder 2 is a value close to 2π.
【0011】このように構成された本実施例によれば、
冷媒導入部3,6に液化窒素からなる冷媒8A,8Bを
導入することにより、従来の試料ホルダー2だけでなく
引出し電極5を−120℃迄冷却することができる。According to the present embodiment thus constructed,
By introducing the refrigerants 8A and 8B made of liquefied nitrogen into the refrigerant introducing portions 3 and 6, not only the conventional sample holder 2 but also the extraction electrode 5 can be cooled to -120 ° C.
【0012】ここで、絶対温度T〔K〕の物体から輻射
される熱エネルギーはTの4乗に比例することが知られ
ている。冷却時の引き出し電極5の温度は−120℃に
なる為、そこから輻射される熱エネルギーは、従来の室
温の場合の1/10以下に低減される。従って、引き出
し電極5を冷却することで試料1及び試料ホルダー2に
流入する輻射熱が大幅に低減することになる。Here, it is known that the thermal energy radiated from an object having an absolute temperature T [K] is proportional to the fourth power of T. Since the temperature of the extraction electrode 5 at the time of cooling becomes −120 ° C., the thermal energy radiated from the extraction electrode 5 is reduced to 1/10 or less of the conventional room temperature. Therefore, by cooling the extraction electrode 5, the radiant heat flowing into the sample 1 and the sample holder 2 is significantly reduced.
【0013】図2に、本実施例において液化窒素を冷媒
導入部3,6に同時に導入開始してからの試料1及び冷
媒導入部3の温度変化を示す。図2に示したように、試
料1と冷媒導入部3の温度差は従来よりも1/5以下と
なり、試料温度の到達温度として従来よりも70度低い
−160℃が得られた。又試料1の温度が定常に達する
までの時間を約1/2にすることができた。さらに、試
料ホルダーを搬送してから冷却を開始するが、冷却毎の
ばらつきを低減することができた。FIG. 2 shows the temperature changes of the sample 1 and the refrigerant introducing part 3 after the introduction of liquefied nitrogen into the refrigerant introducing parts 3 and 6 simultaneously started in this embodiment. As shown in FIG. 2, the temperature difference between the sample 1 and the refrigerant introduction part 3 was ⅕ or less of the conventional temperature, and the reached temperature of the sample temperature was −160 ° C., which is 70 degrees lower than the conventional temperature. Further, the time required for the temperature of Sample 1 to reach a steady state could be reduced to about 1/2. Further, although cooling is started after the sample holder is transported, it is possible to reduce the variation for each cooling.
【0014】これによって、2−4族化合物半導体のよ
うに蒸気圧が高い元素からなる試料や一次イオン照射時
の熱によって壊れやすい試料においても、安定して二次
イオン質量分析を行なうことが可能となる。As a result, secondary ion mass spectrometry can be stably performed even in a sample made of an element having a high vapor pressure such as a 2-4 group compound semiconductor or a sample which is easily broken by heat during irradiation of primary ions. Becomes
【0015】なお、本実施例は冷媒に液化窒素を使用し
ているが他の冷媒を用いてもよいことはもちろんであ
る。Although liquefied nitrogen is used as the refrigerant in this embodiment, it goes without saying that other refrigerants may be used.
【0016】[0016]
【発明の効果】以上説明したように本発明は、試料ホル
ダーに対向して設けられた引き出し電極を冷却する為の
手段を設けることにより、短時間で試料の温度を下げ定
常状態にできる為、熱によって壊れやすい試料でも安定
して二次イオン質量分析を行うことができるという効果
がある。As described above, according to the present invention, the temperature of the sample can be lowered to a steady state in a short time by providing the means for cooling the extraction electrode provided facing the sample holder. There is an effect that secondary ion mass spectrometry can be stably performed even on a sample that is easily broken by heat.
【図1】本発明の一実施例の構成図。FIG. 1 is a configuration diagram of an embodiment of the present invention.
【図2】実施例における試料温度の時間依存性を示す
図。FIG. 2 is a diagram showing the time dependence of sample temperature in Examples.
【図3】従来の二次イオン質量分析装置の構成図。FIG. 3 is a block diagram of a conventional secondary ion mass spectrometer.
【図4】従来の二次イオン質量分析装置の試料温度の時
間依存性を示す図。FIG. 4 is a diagram showing time dependence of sample temperature of a conventional secondary ion mass spectrometer.
1 試料 2 試料ホルダー 3 冷媒導入部 4 熱伝導部 5 引き出し電極 6 冷媒導入部 7 熱伝導部 8,8A,8B 冷媒 1 sample 2 sample holder 3 refrigerant introduction part 4 heat conduction part 5 extraction electrode 6 refrigerant introduction part 7 heat conduction part 8, 8A, 8B refrigerant
Claims (1)
ホルダーと、この試料ホルダーに対向して設けられ前記
試料に照射された一次イオンにより発生する二次イオン
を引き出す為の引き出し電極と、この引き出し電極を冷
却する為の冷却手段とを含むことを特徴とする二次イオ
ン質量分析装置。1. A sample holder installed in a vacuum chamber for holding a sample, and an extraction electrode provided opposite to the sample holder for extracting secondary ions generated by primary ions with which the sample is irradiated. A secondary ion mass spectrometer, comprising: a cooling unit for cooling the extraction electrode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7073097A JPH08273585A (en) | 1995-03-30 | 1995-03-30 | Secondary ion mass spectrometer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7073097A JPH08273585A (en) | 1995-03-30 | 1995-03-30 | Secondary ion mass spectrometer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08273585A true JPH08273585A (en) | 1996-10-18 |
Family
ID=13508499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7073097A Pending JPH08273585A (en) | 1995-03-30 | 1995-03-30 | Secondary ion mass spectrometer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08273585A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2391701B (en) * | 2001-03-07 | 2005-08-03 | Advanced Tech Materials | Thermal regulation of an ion implantation system |
WO2012096412A1 (en) * | 2011-01-14 | 2012-07-19 | Canon Kabushiki Kaisha | Sample analysis method and analyzer |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61751B2 (en) * | 1978-04-19 | 1986-01-10 | Sony Corp | |
JPS62100936A (en) * | 1985-10-28 | 1987-05-11 | Shimadzu Corp | Sample contamination preventive method for analyzer utilizing charged particle beam |
JPS62132157A (en) * | 1985-12-04 | 1987-06-15 | Hitachi Ltd | Mass spectrograph |
-
1995
- 1995-03-30 JP JP7073097A patent/JPH08273585A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61751B2 (en) * | 1978-04-19 | 1986-01-10 | Sony Corp | |
JPS62100936A (en) * | 1985-10-28 | 1987-05-11 | Shimadzu Corp | Sample contamination preventive method for analyzer utilizing charged particle beam |
JPS62132157A (en) * | 1985-12-04 | 1987-06-15 | Hitachi Ltd | Mass spectrograph |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2391701B (en) * | 2001-03-07 | 2005-08-03 | Advanced Tech Materials | Thermal regulation of an ion implantation system |
WO2012096412A1 (en) * | 2011-01-14 | 2012-07-19 | Canon Kabushiki Kaisha | Sample analysis method and analyzer |
JP2012159493A (en) * | 2011-01-14 | 2012-08-23 | Canon Inc | Mass spectrometry and mass spectrograph |
US9267902B2 (en) | 2011-01-14 | 2016-02-23 | Canon Kabushiki Kaisha | Method of analyzing sample using secondary ion emitted from sample and analyzer for performing analysis method |
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Legal Events
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Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 19971021 |