JPH0827276A - Silicon-containing combustionproof material - Google Patents

Silicon-containing combustionproof material

Info

Publication number
JPH0827276A
JPH0827276A JP16031594A JP16031594A JPH0827276A JP H0827276 A JPH0827276 A JP H0827276A JP 16031594 A JP16031594 A JP 16031594A JP 16031594 A JP16031594 A JP 16031594A JP H0827276 A JPH0827276 A JP H0827276A
Authority
JP
Japan
Prior art keywords
group
silicon
formula
chemical
polymer compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16031594A
Other languages
Japanese (ja)
Inventor
Masayoshi Ito
正義 伊藤
Masahiko Mitsuzuka
雅彦 三塚
Kenji Iwata
健二 岩田
Koji Inoue
浩二 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP16031594A priority Critical patent/JPH0827276A/en
Publication of JPH0827276A publication Critical patent/JPH0827276A/en
Pending legal-status Critical Current

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  • Fireproofing Substances (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)

Abstract

PURPOSE:To obtain the subject material, light in weight, excellent in processability, having high heat resistance, and generating no toxic gas or smoke when combusted, useful for automotive parts, etc., containing a silicon- contg. high-molecular compound having specific bonds in its recurring unit. CONSTITUTION:This material contains a silicon-contg. high-molecular compound (or a cured product thereof) having each at least one Si-H bond and CidenticalC bond in its recurring unit. It is preferable that the compound has a structure expressed by formula I, II or III (R<1>-R<3> are each H, a 1-30C alkyl, alkenyl, alkynyl, or an aromatic group such as phenyl or naphthyl; R<4> is a 1-30C alkylene, alkenyl, alkynylene, or a divalent aromatic group such as phenylene or naphthyl) and 500-1000000 in weight-average molecular weight.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、構造中にケイ素を含む
ことを特徴とする耐燃焼性材料に関する。
FIELD OF THE INVENTION The present invention relates to a combustion resistant material characterized by containing silicon in its structure.

【0002】[0002]

【従来の技術】建築物およびそれに使用される材料に対
しては、その建物の用途、構造、規模に応じた耐火性、
防火性が求められている。火災時に有害な延焼性の発
炎、変形、透熱ならびに発煙、有害ガスの発生を生じな
いような材料の開発が進められてきた。近年建築物の高
層化により一層これらの要求が高まりつつある。さらに
は自動車、航空機のエンジン周辺の部品、宇宙用材料、
電子部品など、軽量で耐熱性や耐燃焼性に優れた材料開
発が望まれている。
2. Description of the Related Art For buildings and materials used for them, fire resistance depending on the use, structure and scale of the building,
Fire resistance is required. The development of materials that do not cause harmful flame spread, deformation, heat transmission, smoke generation, and generation of harmful gas in the event of fire has been advanced. In recent years, these requirements have been increasing due to the increase in the number of buildings. In addition, parts around engines of automobiles and aircraft, materials for space,
It is desired to develop materials that are lightweight and have excellent heat resistance and combustion resistance, such as electronic parts.

【0003】このためにポリウレタン、不飽和ポリエス
テル樹脂、エポキシ樹脂、ポリオレフィン、ポリスチレ
ンなどの工業用樹脂に、リン、ハロゲンその他の無機元
素または無機塩類等を含む難燃剤を配合させる方法が一
般的に採用されている。またフェノール樹脂、ユリア樹
脂、メラミン樹脂、ケイ素樹脂などの熱硬化性樹脂、ポ
リイミド、ポリ塩化ビニリデン、ポリテトラフルオロエ
チレンなどの樹脂は比較的高い耐燃焼性を有する。しか
しこれらの樹脂の耐燃焼性は充分でなく、耐燃焼性の高
いポリ塩化ビニリデン、ポリテトラフルオロエチレンな
どでは有害なハロゲンガスを発生させるなど問題が多
い。
For this reason, a method is generally adopted in which a flame retardant containing phosphorus, halogen or other inorganic elements or inorganic salts is mixed with an industrial resin such as polyurethane, unsaturated polyester resin, epoxy resin, polyolefin or polystyrene. Has been done. Thermosetting resins such as phenol resin, urea resin, melamine resin, and silicon resin, and resins such as polyimide, polyvinylidene chloride, and polytetrafluoroethylene have relatively high combustion resistance. However, the flame resistance of these resins is not sufficient, and there are many problems such as generation of harmful halogen gas with polyvinylidene chloride, polytetrafluoroethylene, etc., which have high flame resistance.

【0004】[0004]

【発明が解決しようとする課題】本発明者らは、軽量
で、加工性に優れ、高い耐熱性を有し、かつ燃焼時には
有害なガスや煙を発生させない材料の開発に鋭意努力し
た結果、ある種の構造を有する含ケイ素材料がこれらの
条件を満足させることを見いだし、本発明に至った。
DISCLOSURE OF INVENTION Problems to be Solved by the Invention The inventors of the present invention have made diligent efforts to develop a material that is lightweight, has excellent workability, has high heat resistance, and does not generate harmful gas or smoke during combustion. The inventors have found that a silicon-containing material having a certain structure satisfies these conditions, and have reached the present invention.

【0005】[0005]

【課題を解決するための手段】本発明は、繰り返し単位
に少なくとも1個のSi−H結合とC≡C結合を有する
含ケイ素高分子化合物、または該含ケイ素高分子化合物
の硬化物を含んでなる耐燃焼性材料である。
The present invention comprises a silicon-containing polymer compound having at least one Si-H bond and a C≡C bond in a repeating unit, or a cured product of the silicon-containing polymer compound. Combustion resistant material.

【0006】本発明における含ケイ素高分子化合物と
は、繰り返し単位中に少なくとも1個のSi−H結合と
1個のC≡C結合を有するものであって、この繰り返し
部分が少なくとも全高分子の1/3以上を占める。例え
ば構造式(1)(化4)
The silicon-containing polymer compound in the present invention has at least one Si--H bond and one C≡C bond in a repeating unit, and the repeating portion is at least one polymer. / 3 or more. For example, structural formula (1) (chemical formula 4)

【0007】[0007]

【化4】 (式中、R1は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基であって、これらはハロゲン、
水酸基、アミノ基、カルボキシル基などの置換基を含ん
でいてもよい。)、構造式(2)(化5)
[Chemical 4] (In the formula, R 1 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and these are halogen,
It may contain a substituent such as a hydroxyl group, an amino group or a carboxyl group. ), Structural formula (2) (chemical formula 5)

【0008】[0008]

【化5】 (式中、R2は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基であって、これらはハロゲン、
水酸基、アミノ基、カルボキシル基などの置換基を含ん
でいてもよい。)または構造式(3)(化6)
Embedded image (In the formula, R 2 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and these are halogen,
It may contain a substituent such as a hydroxyl group, an amino group or a carboxyl group. ) Or structural formula (3) (Chemical formula 6)

【0009】[0009]

【化6】 (式中、R3は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基、R4は炭素数が1から30個
のアルキレン基、アルケニレン基、アルキニレン基、フ
ェニレン基やナフチレン基などの二価の芳香族基であっ
て、これらはハロゲン、水酸基、アミノ基、カルボキシ
ル基などの置換基を含んでいてもよい。)で表されるも
のである。具体的には、構造式(4)(化7)
[Chemical 6] (In the formula, R 3 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and R 4 is an alkylene group having 1 to 30 carbon atoms. , An alkenylene group, an alkynylene group, a phenylene group, a naphthylene group, or another divalent aromatic group, which may contain a substituent such as a halogen, a hydroxyl group, an amino group, or a carboxyl group.). It is something. Specifically, structural formula (4) (Chemical formula 7)

【0010】[0010]

【化7】 、構造式(5)(化8)[Chemical 7] , Structural formula (5) (chemical formula 8)

【0011】[0011]

【化8】 、構造式(6)(化9)Embedded image , Structural formula (6) (chemical formula 9)

【0012】[0012]

【化9】 、構造式(7)(化10)[Chemical 9] , Structural formula (7) (chemical formula 10)

【0013】[0013]

【化10】 、構造式(8)(化11)[Chemical 10] , Structural formula (8) (chemical formula 11)

【0014】[0014]

【化11】 、構造式(9)(化12)[Chemical 11] , Structural formula (9) (chemical formula 12)

【0015】[0015]

【化12】 、構造式(10)(化13)[Chemical 12] , Structural formula (10) (chemical formula 13)

【0016】[0016]

【化13】 、構造式(11)(化14)[Chemical 13] , Structural formula (11) (Chemical formula 14)

【0017】[0017]

【化14】 、構造式(12)(化15)Embedded image , Structural formula (12) (chemical formula 15)

【0018】[0018]

【化15】 、構造式(13)(化16)[Chemical 15] , Structural formula (13) (chemical formula 16)

【0019】[0019]

【化16】 、構造式(14)(化17)Embedded image Structural formula (14) (Chemical formula 17)

【0020】[0020]

【化17】 、構造式(15)(化18)[Chemical 17] , Structural formula (15)

【0021】[0021]

【化18】 、構造式(16)(化19)Embedded image , Structural formula (16) (chemical formula 19)

【0022】[0022]

【化19】 、構造式(17)(化20)[Chemical 19] , Structural formula (17) (chemical formula 20)

【0023】[0023]

【化20】 、構造式(18)(化21)Embedded image , Structural formula (18) (chemical formula 21)

【0024】[0024]

【化21】 、構造式(19)(化22)[Chemical 21] , Structural formula (19) (chemical formula 22)

【0025】[0025]

【化22】 、構造式(20)(化23)[Chemical formula 22] Structural formula (20) (Chemical formula 23)

【0026】[0026]

【化23】 、構造式(21)(化24)[Chemical formula 23] , Structural formula (21)

【0027】[0027]

【化24】 、構造式(22)(化25)[Chemical formula 24] , Structural formula (22)

【0028】[0028]

【化25】 、構造式(23)(化26)[Chemical 25] Structural formula (23) (Chemical formula 26)

【0029】[0029]

【化26】 、構造式(24)(化27)[Chemical formula 26] Structural formula (24) (Chemical formula 27)

【0030】[0030]

【化27】 、構造式(25)(化28)[Chemical 27] , Structural formula (25) (chemical formula 28)

【0031】[0031]

【化28】 、構造式(26)(化29)[Chemical 28] , Structural formula (26) (chemical formula 29)

【0032】[0032]

【化29】 、構造式(27)(化30)[Chemical 29] Structural formula (27) (Chemical formula 30)

【0033】[0033]

【化30】 、構造式(28)(化31)Embedded image , Structural formula (28) (Chemical formula 31)

【0034】[0034]

【化31】 、構造式(29)(化32)[Chemical 31] , Structural formula (29) (chemical formula 32)

【0035】[0035]

【化32】 、構造式(30)(化33)Embedded image , Structural formula (30) (Chemical Formula 33)

【0036】[0036]

【化33】 、構造式(31)(化34)[Chemical 33] , Structural formula (31) (chemical formula 34)

【0037】[0037]

【化34】 、構造式(32)(化35)Embedded image , Structural formula (32) (chemical formula 35)

【0038】[0038]

【化35】 、構造式(33)(化36)Embedded image , Structural formula (33) (chemical formula 36)

【0039】[0039]

【化36】 、構造式(34)(化37)Embedded image , Structural formula (34) (Chemical Formula 37)

【0040】[0040]

【化37】 、構造式(35)(化38)Embedded image , Structural formula (35)

【0041】[0041]

【化38】 、構造式(36)(化39)[Chemical 38] , Structural formula (36) (Chemical formula 39)

【0042】[0042]

【化39】 、構造式(37)(化40)[Chemical Formula 39] , Structural formula (37) (Chemical formula 40)

【0043】[0043]

【化40】 、構造式(38)(化41)[Chemical 40] , Structural formula (38) (chemical formula 41)

【0044】[0044]

【化41】 、構造式(39)(化42)Embedded image Structural formula (39) (Chemical formula 42)

【0045】[0045]

【化42】 、構造式(40)(化43)Embedded image , Structural formula (40) (Chemical formula 43)

【0046】[0046]

【化43】 、構造式(41)(化44)[Chemical 43] , Structural formula (41)

【0047】[0047]

【化44】 、構造式(42)(化45)[Chemical 44] , Structural formula (42)

【0048】[0048]

【化45】 、構造式(43)(化46)Embedded image , Structural formula (43) (Chemical formula 46)

【0049】[0049]

【化46】 、構造式(44)(化47)Embedded image , Structural formula (44)

【0050】[0050]

【化47】 、または構造式(45)(化48)[Chemical 47] , Or structural formula (45)

【0051】[0051]

【化48】 などである。重量平均分子量に特に制限はないが、好ま
しくはく500〜1000000、より好ましくは50
0〜500000である。形態は液状または固体状であ
る。これらの含ケイ素高分子化合物は単独で用いること
が望ましいが、他の種々の高分子化合物と共存させて用
いることも可能である。
Embedded image And so on. The weight average molecular weight is not particularly limited, but is preferably 500 to 1,000,000, more preferably 50.
It is 0-500000. The form is liquid or solid. These silicon-containing polymer compounds are preferably used alone, but can also be used together with other various polymer compounds.

【0052】これらの含ケイ素高分子化合物の製造方法
は、本発明者らが提案しているように(特願平5−43
596、特願平5−179709、特願平5−2230
09、特願平5−236445、特願平6−4231
0、特願平6−6791)、例えば、反応式(46)
(化49)
The method for producing these silicon-containing polymer compounds has been proposed by the present inventors (Japanese Patent Application No. 5-43).
596, Japanese Patent Application No. 5-179709, Japanese Patent Application No. 5-2230
09, Japanese Patent Application No. 5-236445, Japanese Patent Application No. 6-4231
0, Japanese Patent Application No. 6-6791), for example, reaction formula (46)
(Chemical 49)

【0053】[0053]

【化49】 (式中、R1は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基であって、これらはハロゲン、
水酸基、アミノ基、カルボキシル基などの置換基を含ん
でいてもよい。)、反応式(47)(化50)
[Chemical 49] (In the formula, R 1 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and these are halogen,
It may contain a substituent such as a hydroxyl group, an amino group or a carboxyl group. ), Reaction formula (47)

【0054】[0054]

【化50】 (式中、R2は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基であって、これらはハロゲン、
水酸基、アミノ基、カルボキシル基などの置換基を含ん
でいてもよい。)、反応式(48)(化51)
Embedded image (In the formula, R 2 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and these are halogen,
It may contain a substituent such as a hydroxyl group, an amino group or a carboxyl group. ), Reaction formula (48) (Chemical formula 51)

【0055】[0055]

【化51】 (式中、R3は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基、R4は炭素数が1から30個
のアルキレン基、アルケニレン基、アルキニレン基、フ
ェニレン基やナフチレン基などの二価の芳香族基であっ
て、これらはハロゲン、水酸基、アミノ基、カルボキシ
ル基などの置換基を含んでいてもよい。)または反応式
(49)(化52)
[Chemical 51] (In the formula, R 3 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and R 4 is an alkylene group having 1 to 30 carbon atoms. A divalent aromatic group such as an alkenylene group, an alkynylene group, a phenylene group or a naphthylene group, which may contain a substituent such as a halogen, a hydroxyl group, an amino group or a carboxyl group) or a reaction formula. (49) (Chemical 52)

【0056】[0056]

【化52】 (式中、R3は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基、R4は炭素数が1から30個
のアルキレン基、アルケニレン基、アルキニレン基、フ
ェニレン基やナフチレン基などの二価の芳香族基であっ
て、これらはハロゲン、水酸基、アミノ基、カルボキシ
ル基などの置換基を含んでいてもよい。)のような方法
を採用できるが、本発明はこれらの製造方法に特に限定
されるものではない。
Embedded image (In the formula, R 3 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and R 4 is an alkylene group having 1 to 30 carbon atoms. , An alkenylene group, an alkynylene group, a phenylene group and a naphthylene group, and other divalent aromatic groups, which may contain a substituent such as a halogen, a hydroxyl group, an amino group and a carboxyl group.). However, the present invention is not particularly limited to these production methods.

【0057】また、本発明における耐燃焼性材料は上述
の該含ケイ素高分子化合物の硬化物を含んでなるもので
ある。硬化物は、該ケイ素高分子化合物を溶融後または
溶媒に溶解後、種々の形状物(成型体、フィルム、繊維
等)に成形された含ケイ素高分子化合物を、空気、窒
素、アルゴン、ヘリウム等のガス雰囲気中にて加熱する
ことによって得られる。加熱温度は100〜1000
℃、好ましくは100〜700℃、さらに好ましくは1
50〜500℃である。加熱時間に特に制限はないが、
1分〜100時間である。温度や時間は、含ケイ素高分
子化合物の種類、形状、形態および硬化物の使用目的に
よって異なる。硬化反応は通常加熱によって行い得る
が、この他ヘキサメチレンテトラミン、ジアミン類、酸
無水物などの硬化剤、または先に我々が提案しているよ
うに、過酸化ベンゾイル、クメンヒドロペルオキシド、
ジ-t-ブチルペルオキシド、過安息香酸t-ブチル、過酸
化水素、過硫酸カリウム、アゾビスイソブチロニトリ
ル、ジアゾアミノアゾベンゼンなどのラジカル開始剤
(特開平6−46941、特開平6−46942)や白
金、イリジウム、パラジウム、ロジウム、ルテニウム、
ニッケル、コバルトなどの遷移金属またはそれらの錯体
などの触媒(特開平6−45544、特開平6−469
40)を共存させて行うこともできる。また含ケイ素高
分子化合物とポリイミド、ポリアミド、フェノール樹
脂、エポキシ樹脂、ポリエーテルエステルケトン、ポリ
スルホン、ポリオキサジアゾールなどの種々の高分子化
合物を共存させて行うこともできる。
Further, the combustion resistant material in the present invention comprises a cured product of the above silicon-containing polymer compound. The cured product is obtained by melting the silicon polymer compound or dissolving it in a solvent, and then forming the silicon-containing polymer compound into various shapes (molded bodies, films, fibers, etc.), air, nitrogen, argon, helium, etc. It can be obtained by heating in a gas atmosphere. Heating temperature is 100-1000
℃, preferably 100-700 ℃, more preferably 1
It is 50 to 500 ° C. The heating time is not particularly limited,
1 minute to 100 hours. The temperature and time vary depending on the type, shape and form of the silicon-containing polymer compound and the purpose of use of the cured product. The curing reaction can usually be carried out by heating, but other curing agents such as hexamethylenetetramine, diamines, acid anhydrides, or benzoyl peroxide, cumene hydroperoxide, as proposed previously by us,
Radical initiators such as di-t-butyl peroxide, t-butyl perbenzoate, hydrogen peroxide, potassium persulfate, azobisisobutyronitrile, diazoaminoazobenzene (JP-A-6-46941, JP-A-6-46942). Or platinum, iridium, palladium, rhodium, ruthenium,
A catalyst such as a transition metal such as nickel or cobalt or a complex thereof (JP-A-6-45544 and JP-A-6-469).
40) can coexist. It is also possible to coexist with a silicon-containing polymer compound and various polymer compounds such as polyimide, polyamide, phenol resin, epoxy resin, polyether ester ketone, polysulfone and polyoxadiazole.

【0058】本発明における耐燃焼性材料は、上述の含
ケイ素高分子化合物またはその硬化物を主なる構成成分
として含むもので、それぞれ単独で、または他の材料と
混合してなるものである。すなわち耐燃焼性材料は、例
えば含ケイ素高分子化合物やその硬化物を所定の形状に
成型することによって、また該含ケイ素高分子化合物と
他の高分子化合物とをブレンドやポリマーアロイ化する
ことによって、さらには炭素繊維、炭化ケイ素繊維、ガ
ラス繊維などとの複合材にすることなどによって得られ
る。また、耐燃焼性材料は、他の材料の表面を該含ケイ
素高分子化合物またはその硬化物でコーテイングするこ
となどの方法によっても得られる。
The flammability-resistant material in the present invention contains the above-mentioned silicon-containing polymer compound or a cured product thereof as a main constituent component, and is used either alone or as a mixture with another material. That is, the flame-resistant material is obtained, for example, by molding a silicon-containing polymer compound or a cured product thereof into a predetermined shape, or by blending or polymer-forming the silicon-containing polymer compound with another polymer compound. Further, it can be obtained by forming a composite material with carbon fiber, silicon carbide fiber, glass fiber and the like. The flame resistant material can also be obtained by a method such as coating the surface of another material with the silicon-containing polymer compound or a cured product thereof.

【0059】[0059]

【実施例】以下、本発明を実施例によって説明する。 実施例1 特願平5−43596に記載されている方法に従いポリ
(フェニルシリレンエチニレン-1,3-フェニレンエチニ
レン)を合成した。10lのガラス製反応容器に、Mg
(OH)2を500℃にて3hr排気焼成したMgOを4
98g、フェニルシランを228g、m-ジエチニルベンゼ
ンを266g、および溶媒としてベンゼンを4lを仕込ん
だ。次にアルゴン雰囲気中にて30℃で1hr、40℃で
1hr、50℃で1hr、60℃で1hr、さらに80℃で2
hr、合計6hr反応させた。反応終了後、反応液を濾過し
MgOを分離除去した。濾過した反応液中の溶媒をポリ
マーが析出しない程度に減圧留去した後、溶液を8lの
ヘキサン中に注入し、ポリマーを析出させた。得られた
ポリマーを60℃にて減圧乾燥させ、最終的に319g
の淡黄色の粉末を得た(収率65%)。ポリマーの重量
平均分子量は6900、数平均分子量は2300であっ
た。またその構造はIR、NMRにより確認したところ
構造式(14)(化53)
EXAMPLES The present invention will be described below with reference to examples. Example 1 Poly (phenylsilyleneethynylene-1,3-phenyleneethynylene) was synthesized according to the method described in Japanese Patent Application No. 5-43596. In a 10 l glass reaction vessel, Mg
(OH) 2 was exhausted and calcined at 500 ° C. for 3 hours to remove MgO 4
98 g, 228 g of phenylsilane, 266 g of m-diethynylbenzene, and 4 l of benzene as a solvent were charged. Next, in an argon atmosphere, 30 ° C for 1 hr, 40 ° C for 1 hr, 50 ° C for 1 hr, 60 ° C for 1 hr, and 80 ° C for 2 hr.
The reaction was carried out for a total of 6 hours. After the reaction was completed, the reaction solution was filtered to separate and remove MgO. The solvent in the filtered reaction liquid was distilled off under reduced pressure to such an extent that the polymer was not precipitated, and then the solution was poured into 8 l of hexane to precipitate the polymer. The polymer obtained was dried under reduced pressure at 60 ° C., and finally 319 g
Was obtained as a pale yellow powder (yield 65%). The polymer had a weight average molecular weight of 6,900 and a number average molecular weight of 2,300. Its structure was confirmed by IR and NMR to be structural formula (14) (Chemical Formula 53)

【0060】[0060]

【化53】 であることがわかった。Embedded image It turned out to be.

【0061】得られたポリマーを窒素奮囲気中150℃
にて溶融し、長さ70cm、幅6.5cm、厚さ3.0cmの
形状の成型体(I)を得た。TGAによれば成型体
(I)のアルゴン中でのTd5(5%重量減少温度)は8
60℃でその耐熱性は極めて高く、比重は1.14であ
った。燃焼性の指標を得るために成型体(I)の空気中
でのTGAを測定した。Td5は567℃であった。また
成型体(I)を空気中にて、都市ガスの燃焼炎中さらし
たところ、成型体(I)の加熱部分は赤く変化したが、
燃えることはなく、炎を取り除くことによって元の状態
に戻った。
The obtained polymer was heated to 150 ° C. in a nitrogen atmosphere.
It was melted in the above to obtain a molded product (I) having a length of 70 cm, a width of 6.5 cm and a thickness of 3.0 cm. According to TGA, Td 5 (5% weight loss temperature) of the molded body (I) in argon is 8
The heat resistance was extremely high at 60 ° C., and the specific gravity was 1.14. The TGA of the molded product (I) in air was measured to obtain an index of flammability. Td 5 was 567 ° C. Also, when the molded body (I) was exposed in the combustion flame of city gas in the air, the heated part of the molded body (I) turned red,
It did not burn, and it returned to its original state by removing the flame.

【0062】実施例2 実施例1において得られた成型体(I)を、さらに窒素
奮囲気にて300℃、400℃または500℃にて2hr
熱処理を行ない、3個の硬化物を得た。この熱処理時に
おける熱分解ガスは殆どなく、また形状変化も殆ど認め
られなかった。TGAによれば硬化物のアルゴン中での
Td5(5%重量減少温度)は860℃で、比重はいずれ
も1.14であった。硬化物の空気中でのTGAを測定
したところ、Td5は567℃であった。また硬化物は、
いずれも空気中では都市ガスの燃焼炎中で燃えなかっ
た。次に日本工業規格JIS K 7201に従い、この
硬化物の酸素指数(試料が燃焼し続けるのに必要な最低
の酸素濃度)を測定した。300℃、400℃または5
00℃で熱処理することによって得られた硬化物の試料
の酸素指数はそれぞれ34、42、55であった。酸素
指数以上の酸素濃度でこれらの試料はそれぞれ燃焼した
が、燃焼炎は小さく、燃焼速度は遅く、かつ燃焼時の発
煙はまったく認められなかった。
Example 2 The molded body (I) obtained in Example 1 was further treated with nitrogen atmosphere at 300 ° C., 400 ° C. or 500 ° C. for 2 hours.
Heat treatment was performed to obtain three cured products. There was almost no pyrolysis gas during this heat treatment, and almost no change in shape was observed. According to TGA, the cured product had Td 5 (5% weight loss temperature) in argon of 860 ° C. and a specific gravity of 1.14. When TGA of the cured product was measured in air, Td 5 was 567 ° C. The cured product is
None of them burned in the burning flame of city gas in the air. Next, according to Japanese Industrial Standard JIS K 7201, the oxygen index of this cured product (the minimum oxygen concentration necessary for the sample to continue burning) was measured. 300 ° C, 400 ° C or 5
The oxygen indexes of the cured product samples obtained by heat treatment at 00 ° C. were 34, 42 and 55, respectively. Each of these samples burned at an oxygen concentration higher than the oxygen index, but the burning flame was small, the burning rate was slow, and no smoke was observed during burning.

【0063】比較例1〜2 繰り返し単位中にSi−H結合を有せずにC≡C結合の
み、またはC≡C結合を有せずにSi−H結合のみを有
する、構造式(50)(化54)
Comparative Examples 1 and 2 Structural formula (50) in which the repeating unit does not have a Si—H bond but has only a C≡C bond or does not have a C≡C bond but has only a Si—H bond. (Chemical 54)

【0064】[0064]

【化54】 または構造式(51)(化55)[Chemical 54] Or structural formula (51)

【0065】[0065]

【化55】 で表される2種類の高分子化合物の空気中でのTd5を測
定した。構造式(50)、構造式(51)で表される含
ケイ素高分子化合物の測定値はそれぞれ525℃、55
0℃であった。
[Chemical 55] The Td 5 of two types of polymer compounds represented by The measured values of the silicon-containing polymer represented by Structural Formula (50) and Structural Formula (51) are 525 ° C. and 55, respectively.
It was 0 ° C.

【0066】[0066]

【発明の効果】本発明は、ある特定の構造からなる含ケ
イ素高分子化合物またはその硬化物を主成分とする新規
な耐燃焼性材料を提供するものである。本耐燃焼性材料
は成型により種々の形状をなし得、軽量でかつ耐熱性に
も優れている。
Industrial Applicability The present invention provides a novel flammability resistant material containing a silicon-containing polymer compound having a specific structure or a cured product thereof as a main component. The present combustion resistant material can be formed into various shapes by molding, is lightweight and has excellent heat resistance.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 井上 浩二 神奈川県横浜市栄区笠間町1190番地 三井 東圧化学株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Koji Inoue Mitsui Toatsu Chemical Co., Ltd. 1190 Kasama-cho, Sakae-ku, Yokohama-shi, Kanagawa

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 繰り返し単位に少なくとも1個のSi−
H結合とC≡C結合を有する含ケイ素高分子化合物、ま
たは該含ケイ素高分子化合物の硬化物を含んでなる耐燃
焼性材料。
1. A repeating unit containing at least one Si-
A flammability-resistant material comprising a silicon-containing polymer compound having an H bond and a C≡C bond, or a cured product of the silicon-containing polymer compound.
【請求項2】 含ケイ素高分子化合物が、構造式(1)
(化1) 【化1】 (式中、R1は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基であって、これらはハロゲン、
水酸基、アミノ基、カルボキシル基などの置換基を含ん
でいてもよい。)で表されるものである請求項1記載の
耐燃焼性材料。
2. The silicon-containing polymer compound has a structural formula (1):
(Chemical formula 1) [Chemical formula 1] (In the formula, R 1 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and these are halogen,
It may contain a substituent such as a hydroxyl group, an amino group or a carboxyl group. ) The flame-resistant material according to claim 1, which is represented by
【請求項3】 含ケイ素高分子化合物が、構造式(2)
(化2) 【化2】 (式中、R2は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基であって、これらはハロゲン、
水酸基、アミノ基、カルボキシル基などの置換基を含ん
でいてもよい。)で表されるものである請求項1記載の
耐燃焼性材料。
3. The silicon-containing polymer compound has a structural formula (2):
(Chemical formula 2) [Chemical formula 2] (In the formula, R 2 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and these are halogen,
It may contain a substituent such as a hydroxyl group, an amino group or a carboxyl group. ) The flame-resistant material according to claim 1, which is represented by
【請求項4】 含ケイ素高分子化合物が構造式(3)
(化3) 【化3】 (式中、R3は水素または炭素数が1から30個のアル
キル基、アルケニル基、アルキニル基、フェニル基やナ
フチル基などの芳香族基、R4は炭素数が1から30個
のアルキレン基、アルケニレン基、アルキニレン基、フ
ェニレン基やナフチレン基などの二価の芳香族基であっ
て、これらはハロゲン、水酸基、アミノ基、カルボキシ
ル基などの置換基を含んでいてもよい。)で表されるも
のである請求項1記載の耐燃焼性材料。
4. The silicon-containing polymer compound has a structural formula (3):
(Chemical Formula 3) [Chemical Formula 3] (In the formula, R 3 is hydrogen or an aromatic group having 1 to 30 carbon atoms such as an alkyl group, an alkenyl group, an alkynyl group, a phenyl group and a naphthyl group, and R 4 is an alkylene group having 1 to 30 carbon atoms. , An alkenylene group, an alkynylene group, a phenylene group, a naphthylene group, or another divalent aromatic group, which may contain a substituent such as a halogen, a hydroxyl group, an amino group, or a carboxyl group.). The combustion resistant material according to claim 1, which is a material.
【請求項5】 含ケイ素高分子化合物が、重量平均分子
量500ないし1000000のものである請求項1、
2、3または4記載の耐燃焼性材料。
5. The silicon-containing polymer compound has a weight average molecular weight of 500 to 1,000,000.
The flammability resistant material according to 2, 3 or 4.
【請求項6】 該含ケイ素高分子化合物の硬化物が、含
ケイ素高分子化合物を100〜1000℃の温度で熱処
理することによって得られる硬化物である請求項1記載
の耐燃焼性材料。
6. The flame resistant material according to claim 1, wherein the cured product of the silicon-containing polymer compound is a cured product obtained by heat-treating the silicon-containing polymer compound at a temperature of 100 to 1000 ° C.
JP16031594A 1994-07-12 1994-07-12 Silicon-containing combustionproof material Pending JPH0827276A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16031594A JPH0827276A (en) 1994-07-12 1994-07-12 Silicon-containing combustionproof material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16031594A JPH0827276A (en) 1994-07-12 1994-07-12 Silicon-containing combustionproof material

Publications (1)

Publication Number Publication Date
JPH0827276A true JPH0827276A (en) 1996-01-30

Family

ID=15712303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16031594A Pending JPH0827276A (en) 1994-07-12 1994-07-12 Silicon-containing combustionproof material

Country Status (1)

Country Link
JP (1) JPH0827276A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002105284A (en) * 2000-10-02 2002-04-10 Teijin Chem Ltd Flame-retardant epoxy resin composition and laminated plate using the same
JP2010159348A (en) * 2009-01-08 2010-07-22 Mitsui Chemicals Inc Phenol resin-cured article
RU2655901C2 (en) * 2016-06-15 2018-05-29 Андрей Сергеевич Субботин Method for creating a fire-resistant siloxane composition and composition obtained by this method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002105284A (en) * 2000-10-02 2002-04-10 Teijin Chem Ltd Flame-retardant epoxy resin composition and laminated plate using the same
JP2010159348A (en) * 2009-01-08 2010-07-22 Mitsui Chemicals Inc Phenol resin-cured article
RU2655901C2 (en) * 2016-06-15 2018-05-29 Андрей Сергеевич Субботин Method for creating a fire-resistant siloxane composition and composition obtained by this method

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