JPH08253345A - Composition for low-temperature sealing - Google Patents

Composition for low-temperature sealing

Info

Publication number
JPH08253345A
JPH08253345A JP8174695A JP8174695A JPH08253345A JP H08253345 A JPH08253345 A JP H08253345A JP 8174695 A JP8174695 A JP 8174695A JP 8174695 A JP8174695 A JP 8174695A JP H08253345 A JPH08253345 A JP H08253345A
Authority
JP
Japan
Prior art keywords
low
composition
sealing
glass
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8174695A
Other languages
Japanese (ja)
Other versions
JP3125971B2 (en
Inventor
Makoto Shiratori
誠 白鳥
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Techno Glass Co Ltd
Original Assignee
Toshiba Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Glass Co Ltd filed Critical Toshiba Glass Co Ltd
Priority to JP07081746A priority Critical patent/JP3125971B2/en
Publication of JPH08253345A publication Critical patent/JPH08253345A/en
Application granted granted Critical
Publication of JP3125971B2 publication Critical patent/JP3125971B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • C03C8/245Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders containing more than 50% lead oxide, by weight

Abstract

PURPOSE: To improve water resistance, insulating characteristics and fluidity in sealing of a composition for low-temperature sealing, incorporating a glass powder having a specific composition and a low-expansion ceramic filler powder. CONSTITUTION: Raw materials are blended so as to give a composition having 50-75wt.% of PbO, 1-20wt.% of PbF2 , 6-12wt.% of B2 O3 , 1-10wt.% of TeO2 , 1-5wt.% of ZnO, 0.5-2wt.% of SiO2 , 0.5-2wt.% of Al2 O3 and 0-10wt.% of Bi2 O3 . The raw materials are heated melted, deaerated, stirred, made to flow, annealed and ground to give glass powder. The glass powder in an amount of 5-90vol.% is mixed with 10-50vol.% of low-expansion ceramic filler powder to give the objective composition for low-temperature sealing.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、380℃以下の温度で
封着することができる封着用組成物に関し、特にICセ
ラミックパッケージの封着に好適な低温封着用組成物に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sealing composition which can be sealed at a temperature of 380 ° C. or lower, and more particularly to a low temperature sealing composition suitable for sealing an IC ceramic package.

【0002】[0002]

【従来の技術】低融点ガラスフリットは、ガラス、セラ
ミックスや金属の封着あるいは被覆のために広く使用さ
れている。半導体分野においても半導体チップをアルミ
ナ等のセラミックパッケージに気密封止する際に使用さ
れている。ICセラミックパッケージの封着に用いられ
る低融点ガラスフリットに求められる主な条件として
は、以下のようなものが挙げられる。 ICに悪影響を及ぼさないように低温で封着が可能で
あること。 絶縁特性を長期にわたり良好に維持するために耐水性
が良いこと。 熱膨張係数がセラミックパッケージのそれと一致して
いること。
2. Description of the Related Art Low-melting-point glass frits are widely used for sealing or coating glass, ceramics and metals. It is also used in the semiconductor field when hermetically sealing a semiconductor chip in a ceramic package such as alumina. The main conditions required for the low melting point glass frit used for sealing the IC ceramic package are as follows. Capable of sealing at low temperature so as not to adversely affect the IC. Good water resistance to maintain good insulation properties for a long period of time. The coefficient of thermal expansion should match that of the ceramic package.

【0003】これらのうち、封着温度の低温化は、年々
集積度が高まり微細化する回路保護のためにも強く望ま
れていることであるが、従来から知られているPbO−
23 系、PbO−B2 3 −Bi2 3 系のガラス
に低膨脹フィラー粉末を添加した封着用組成物は、低融
点化に限界があり、400℃以下での封着は困難なもの
であった。このほかに本発明者が特願平5-219180号とし
て提案したPbO−B2 3 −TeO2 系のガラスを用
いたものもあるが、これも封着には450℃程度の温度
を必要とする。
Of these, the lowering of the sealing temperature is strongly desired for the protection of the circuit, which is becoming more integrated and finer year by year.
A sealing composition obtained by adding a low expansion filler powder to a B 2 O 3 based or PbO—B 2 O 3 —Bi 2 O 3 based glass has a limit to lowering the melting point, and sealing at 400 ° C. or lower is not possible. It was difficult. The present inventors Besides this there is also one using the proposed PbO-B 2 O 3 -TeO 2 based glass as Japanese Patent Application No. 5-219180, the also sealing requires temperatures of about 450 ° C. And

【0004】このため、400℃以下で封着可能な組成
開発が進められ、特開昭63-315536号公報に代表される
PbO−B2 3 −Tl2 O系組成物や、特開平5-9747
0 号公報に記載のPbO−B2 3 −Bi2 3 −F2
系組成物などが開発されてきた。
For this reason, the development of a composition capable of sealing at 400 ° C. or lower has been promoted, and a PbO-B 2 O 3 -Tl 2 O-based composition represented by JP-A-63-315536 and a composition of JP-A No. -9747
Described in 0 JP PbO-B 2 O 3 -Bi 2 O 3 -F 2
System compositions and the like have been developed.

【0005】[0005]

【発明が解決しようとする課題】上記特開昭63-315536
号公報に記載のPbO−B2 3 −Tl2 O系低温封着
用フリットは、Tl2 Oの作用により封着温度を低くで
きるものの、有害物質であるタリウムを含むため、製造
時、封着作業時の各工程において粉塵の飛散防止などの
ための設備導入が必要となり、今後、使用製品の廃棄等
にともなう環境対策の面からも好ましくない。またこの
低温封着用フリットを構成するガラスは、アルミナ等の
セラミックスに比べて熱膨張係数が非常に大きいため、
熱膨張係数を整合させるために多量の低膨脹フィラーを
混合しなければならず、封着時の流動性を損なう欠点が
あった。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention JP-A-63-315536
PbO-B 2 O 3 -Tl 2 O based cold sealing frit described in JP, although can be lowered sealing temperature by the action of Tl 2 O, since thallium is toxic substances, during manufacture, the sealing It is necessary to introduce equipment to prevent dust scattering in each process during work, which is not preferable from the viewpoint of environmental measures such as disposal of used products in the future. Further, the glass constituting the frit for low temperature sealing has a very large coefficient of thermal expansion as compared with ceramics such as alumina,
A large amount of low expansion filler must be mixed in order to match the coefficient of thermal expansion, and there is a drawback that the fluidity during sealing is impaired.

【0006】上記特開平5-97470 号公報に記載のPbO
−B2 3 −Bi2 3 −F2 系組成物は、400℃以
下の温度で封着が可能であるが、この組成物は耐水性に
難があり、長期間に渡る使用において絶縁不良が起こり
やすいことが懸念される。
The PbO described in the above-mentioned JP-A-5-97470.
The -B 2 O 3 -Bi 2 O 3 -F 2 type composition can be sealed at a temperature of 400 ° C or lower, but this composition has poor water resistance, and thus it can be used as an insulating material for long-term use. There is concern that defects may occur.

【0007】本発明は、このような事情を考慮してなさ
れたもので、実質的にタリウムを含有せず、380℃以
下の温度で短時間に気密封着することができ、かつ耐水
性に優れた低温封着用組成物を提供することを目的とす
る。
The present invention has been made in consideration of such circumstances, and it is substantially free of thallium and can be hermetically sealed at a temperature of 380 ° C. or less in a short time, and has water resistance. An object is to provide an excellent low-temperature sealing composition.

【0008】[0008]

【課題を解決するための手段】本発明は上記目的を達成
するために、PbO−B2 3 −Bi2 3 系ガラスに
おいてPbOの一部をPbF2 で置換して軟化点を下げ
るとともに、TeO2を含有させて耐水性の向上を図っ
たものである。
In order to achieve the above object, the present invention reduces the softening point by substituting a part of PbO with PbF 2 in a PbO-B 2 O 3 -Bi 2 O 3 system glass. , TeO 2 are contained to improve water resistance.

【0009】すなわち本発明は、質量百分率で、PbO
50〜75%,PbF2 1〜20%,B2 3 6〜1
2%,TeO2 1〜10%,ZnO 1〜5%,SiO
2 0.5〜2%,Al2 3 0.5〜2%,Bi2 3
0〜10%,からなる組成を有するガラス粉末50〜9
0体積%と、低膨脹セラミックフィラー粉末10〜50
体積%からなる低温封着用組成物である。
That is, according to the present invention, PbO is used in terms of mass percentage.
50~75%, PbF 2 1~20%, B 2 O 3 6~1
2%, TeO 2 1-10%, ZnO 1-5%, SiO
2 0.5-2%, Al 2 O 3 0.5-2%, Bi 2 O 3
Glass powder 50-9 having a composition of 0-10%
0% by volume and low expansion ceramic filler powder 10-50
It is a low-temperature sealing composition composed of volume%.

【0010】また、前記低膨脹セラミックフィラー粉末
として、チタン酸鉛、β−ユークリプタイト、コージェ
ライト、ジルコンから選ばれる1種または2種以上を使
用するものである。
As the low expansion ceramic filler powder, one or more selected from lead titanate, β-eucryptite, cordierite and zircon is used.

【0011】[0011]

【作用】以下に本発明を構成するガラスの各成分の作用
と、その組成範囲を上記のように限定した理由を説明す
る。
The function of each component of the glass constituting the present invention and the reason for limiting the composition range as described above will be described below.

【0012】PbOは低融点ガラスを構成するための主
要成分であるが、50%未満では十分な低融性が維持で
きず、75%を越えるとガラスが不安定な状態となる。
好ましくは55〜75%の範囲である。ただし、溶融段
階でF2 が揮発し、その分のPbF2 がPbOに変化し
てガラス中に存在することもあり得るので、分析組成に
おいてはPbOの量が前記上限値を多少上回ることも予
測される。
PbO is a main component for constituting a low melting point glass, but if it is less than 50%, a sufficiently low melting property cannot be maintained, and if it exceeds 75%, the glass becomes unstable.
It is preferably in the range of 55 to 75%. However, it is possible that F 2 volatilizes in the melting stage, and PbF 2 corresponding to that amount is changed to PbO and is present in the glass. Therefore, it is also predicted that the amount of PbO slightly exceeds the upper limit value in the analytical composition. To be done.

【0013】PbF2 は封着温度を下げる成分として本
発明において必須の成分であるが、1%未満ではその効
果は小さく、20%を越えるとガラスが不安定になる。
好ましくは3〜15%である。この組成範囲は、原料組
成がそのままガラス化した場合の値であるので、分析組
成において上記とは逆にPbF2 の量は低めに出ること
が予想される。なお、本発明においては分析により検出
されたF分はPbF2として存在しているものとする。
PbF 2 is an essential component in the present invention as a component for lowering the sealing temperature, but if it is less than 1%, its effect is small, and if it exceeds 20%, the glass becomes unstable.
It is preferably 3 to 15%. Since this composition range is a value when the raw material composition is vitrified as it is, it is expected that the amount of PbF 2 will be rather low in the analytical composition, contrary to the above. In the present invention, the F component detected by the analysis is assumed to exist as PbF 2 .

【0014】B2 3 はガラスを安定にする効果がある
が、6%未満ではガラスが結晶化してしまい、12%を
越えると軟化点が高くなり過ぎ、初期の目的を達成でき
ない。好ましくは7〜10%の範囲である。
B 2 O 3 has an effect of stabilizing the glass, but if it is less than 6%, the glass is crystallized, and if it exceeds 12%, the softening point becomes too high and the initial purpose cannot be achieved. It is preferably in the range of 7 to 10%.

【0015】TeO2 はガラスの耐水性向上に著しい効
果を示し、またガラスを安定化させる成分として本発明
に必須のものであるが、1%未満ではその効果が小さ
く、10%を越えると軟化点が上昇するとともに熱膨脹
係数が大きくなるため実用的でない。好ましくは2〜8
%の範囲内である。
TeO 2 has a remarkable effect on improving the water resistance of the glass, and is an essential component of the present invention as a component for stabilizing the glass, but if it is less than 1%, its effect is small, and if it exceeds 10%, it softens. This is not practical because the coefficient of thermal expansion increases as the point increases. Preferably 2-8
It is within the range of%.

【0016】ZnOは本発明のガラスにおいてその添加
によりガラスの熱膨張係数を小さくする効果があるが、
1%未満ではその効果が十分でなく、5%を越えると軟
化点が高くなる。好ましくは2〜4%の範囲である。
ZnO has the effect of reducing the coefficient of thermal expansion of glass by the addition thereof in the glass of the present invention.
If it is less than 1%, the effect is not sufficient, and if it exceeds 5%, the softening point becomes high. It is preferably in the range of 2 to 4%.

【0017】SiO2 はガラスの結晶化傾向を抑制し、
Al2 3 はガラスを安定化させてガラスの耐水性を改
善する効果があるが、それぞれ0.5%未満ではその効
果が小さく、2%を越えると軟化点が高くなり過ぎるた
め好ましくない。
SiO 2 suppresses the tendency of glass to crystallize,
Al 2 O 3 has the effect of stabilizing the glass and improving the water resistance of the glass, but if it is less than 0.5%, the effect is small, and if it exceeds 2%, the softening point becomes too high, which is not preferable.

【0018】Bi2 3 はガラスの濡れ性・溶融性を改
善し、またガラスを安定化させる効果があるが、10%
を越えて含有させるとガラスの粘性が高くなりすぎ流動
性を低下させる。
Bi 2 O 3 has the effect of improving the wettability and meltability of glass and stabilizing the glass, but it is 10%.
If it is contained in an amount exceeding the above range, the viscosity of the glass becomes too high and the fluidity is lowered.

【0019】以上の組成を有する低融点ガラスは、それ
自体ではアルミナ等のセラミックスに比べて熱膨張係数
が大きいため、低膨脹セラミックフィラーを混合して被
封着物と熱膨張係数を近似させて用いる。低膨脹セラミ
ックフィラーとしては、チタン酸鉛、β−ユークリプタ
イト、コージェライト、ジルコンから選ばれる1種また
は2種以上を使用し、上記低融点ガラスに10〜50体
積%加える。これら低膨脹セラミックフィラーの粒径
は、60メッシュの篩を通過したものであればとくに問
題なく使用できるが、封着対象物によって粒径を適切に
選択して使用することが好ましい。たとえば、被封着物
がアルミナや窒化アルミのように小さな熱膨張係数を持
つものの場合、粒径が60メッシュから100メッシュ
の篩の間にあるものを使用した方がフィラー添加量を少
なくできるため、封着温度の上昇をまねかない利点があ
る。ただし、粒径の粗いフィラーを使用した場合にはフ
リットの機械的強度が低下する虞があるので、フィラー
の粒径は封着時に要求される熱膨張係数や機械的強度等
の諸特性に応じて選択することが望ましい。
The low-melting glass having the above composition has a large thermal expansion coefficient by itself as compared with ceramics such as alumina. Therefore, a low-expansion ceramic filler is mixed and used to approximate the thermal expansion coefficient of the adherend. . As the low expansion ceramic filler, one or more selected from lead titanate, β-eucryptite, cordierite and zircon is used, and 10 to 50% by volume is added to the low melting point glass. The particle size of these low expansion ceramic fillers can be used without any particular problem as long as they pass through a 60-mesh screen, but it is preferable to select and use the particle size appropriately depending on the object to be sealed. For example, when the material to be sealed has a small coefficient of thermal expansion such as alumina or aluminum nitride, it is possible to reduce the amount of filler added by using a material having a particle size between 60 mesh and 100 mesh sieve. It has the advantage of not increasing the sealing temperature. However, if a filler with a coarse particle size is used, the mechanical strength of the frit may decrease, so the particle size of the filler depends on various characteristics such as the coefficient of thermal expansion and mechanical strength required for sealing. It is desirable to select.

【0020】本発明において、低膨脹セラミックフィラ
ーの添加量が10体積%未満であると熱膨張係数を下げ
る効果が小さく、所望の値に調整することができず、5
0体積%を越えると封着時の流動性が悪くなり、気密性
や封着強度が損なわれる虞があるので好ましくない。好
ましい範囲は20〜45体積%、より好ましくは25〜
40体積%である。
In the present invention, if the addition amount of the low expansion ceramic filler is less than 10% by volume, the effect of lowering the coefficient of thermal expansion is small and the desired value cannot be adjusted.
If it exceeds 0% by volume, the fluidity at the time of sealing may be deteriorated, and the airtightness and the sealing strength may be deteriorated, which is not preferable. The preferred range is 20 to 45% by volume, more preferably 25 to
40% by volume.

【0021】[0021]

【実施例】以下、本発明の実施例について説明する。表
1に本発明の実施例を、表2に比較例を示す。
Embodiments of the present invention will be described below. Table 1 shows examples of the present invention, and Table 2 shows comparative examples.

【0022】鉛丹、フッ化鉛、硼酸、酸化テルル、亜鉛
華、珪石粉、水酸化アルミニウム、酸化ビスマスを表
1、表2に示す組成となるように調合し、それぞれ白金
るつぼに収容して電気炉中で1000℃で1時間加熱し
た。融液は脱泡、均質化のため充分に攪拌し、鉄板上に
流し出した後、適当な温度で徐冷した。その後、この低
融点ガラスを粉砕し、ボールミル等により45μm以下
に微粉砕した。次にアルミナセラミックと熱膨張係数を
整合させるため、各表に示す混合率でセラミックフィラ
ーを混合して封着用組成物を得た。なお、混合したセラ
ミックフィラーの粒径は100メッシュの篩を通過した
ものを使用した。
Red lead, lead fluoride, boric acid, tellurium oxide, zinc oxide, silica powder, aluminum hydroxide, and bismuth oxide were compounded so as to have the compositions shown in Tables 1 and 2 and housed in platinum crucibles. It heated at 1000 degreeC in the electric furnace for 1 hour. The melt was sufficiently stirred for defoaming and homogenization, poured onto an iron plate, and then gradually cooled at an appropriate temperature. Then, the low melting glass was pulverized and finely pulverized to 45 μm or less by a ball mill or the like. Next, in order to match the coefficient of thermal expansion with that of the alumina ceramic, ceramic fillers were mixed at the mixing ratio shown in each table to obtain a sealing composition. The particle size of the mixed ceramic filler used was one that passed through a 100-mesh sieve.

【0023】得られた封着用組成物それぞれについて、
熱機械分析法(TMA)により30〜250℃の範囲に
おける熱膨張係数を測定し、表中にα(×10-7/℃)
として示した。表中の封着温度(℃)は、封着用組成物
粉末により直径20mmのボタンを作成し、これを加熱
していきボタンが軟化してその直径が23mmを越えた
温度を記載した。また、セラミックフィラーを混合して
いない低融点ガラスについて、ガラス転移点および耐水
性を測定し、これも表中に記した。ガラス転移点は示差
熱分析法(DTA法)によって求め、耐水性は日本光学
硝子工業会法にしたがい、中間粒度のサンプルを沸騰水
中で1時間煮沸し、その前後での重量の減量率で示し
た。
For each of the obtained sealing compositions,
The thermal expansion coefficient in the range of 30 to 250 ° C was measured by thermomechanical analysis (TMA), and α (× 10 -7 / ° C) was recorded in the table.
Indicated as. The sealing temperature (° C.) in the table is the temperature at which a button having a diameter of 20 mm was prepared from the composition powder for sealing and the button was heated to soften the button and the diameter thereof exceeded 23 mm. Further, the glass transition point and the water resistance of the low melting point glass in which the ceramic filler was not mixed were measured, and this is also shown in the table. The glass transition point is determined by a differential thermal analysis method (DTA method), and the water resistance is shown by the weight loss rate before and after boiling an intermediate particle size sample in boiling water for 1 hour according to the Japan Optical Glass Industry Association method. It was

【0024】[0024]

【表1】 [Table 1]

【表1】 [Table 1]

【表2】 [Table 2]

【0025】表1に示した実施例試料の耐水性は、低融
点ガラス組成にTeO2 を含有しているため、非常に良
い値を示している。これにより絶縁特性も長期間良好に
保たれる。セラミックフィラーを混合した封着用組成物
の熱膨張係数も67〜70×10-7/℃とアルミナセラ
ミックのそれと良く一致しており、この状態での封着温
度も実施例試料ではすべて380℃以下であった。
The water resistance of the example samples shown in Table 1 shows a very good value because TeO 2 was contained in the low melting point glass composition. As a result, the insulating property is kept good for a long time. The coefficient of thermal expansion of the sealing composition mixed with the ceramic filler was 67 to 70 × 10 −7 / ° C., which was in good agreement with that of alumina ceramics, and the sealing temperature in this state was 380 ° C. or less for all the example samples. Met.

【0026】次に、これら封着用組成物をペースト状に
加工し、2枚のアルミナ板の間に塗布して380℃の温
度で15分間加熱保持し、冷却後の封着状態を観察し
た。表1に示すように本発明の実施例は、いずれの試料
においてもアルミナ板同士が強固に封着されており、封
着部にクラックや気泡の存在も認められず、封着状態は
良好なものと判断された。
Next, these sealing compositions were processed into a paste, applied between two alumina plates, heated and held at a temperature of 380 ° C. for 15 minutes, and the sealed state after cooling was observed. As shown in Table 1, in the examples of the present invention, the alumina plates were firmly sealed to each other in any of the samples, no cracks or bubbles were observed in the sealed portion, and the sealed state was good. It was decided.

【0027】これに対し、表2に示した比較例No.1
は、ガラス組成にPbF2 を含まないため、ガラス転移
点(Tg)が高く、この結果、セラミックフィラーとの
混合物の封着温度も高い値を示した。比較例No.2
は、PbF2 を過剰に添加した例であるが、ガラスが不
安定となって結晶化を起こし、また流動性が悪く封着温
度も高いものであった。比較例No.3および5は、そ
れぞれB2 3 、TeO2 を過剰添加した結果、封着温
度が高くなってしまった。比較例No.4は、封着温度
は実施例と同等であるが、耐水性が極端に劣り、絶縁特
性における信頼性が低い。
On the other hand, Comparative Example No. 1 shown in Table 2 1
Had a high glass transition point (Tg) because it did not contain PbF 2 in the glass composition, and as a result, the sealing temperature of the mixture with the ceramic filler also showed a high value. Comparative Example No. Two
Is an example in which PbF 2 was excessively added, but the glass became unstable and crystallization occurred, and the fluidity was poor and the sealing temperature was high. Comparative Example No. In Nos. 3 and 5, the sealing temperature became high as a result of excessive addition of B 2 O 3 and TeO 2 , respectively. Comparative Example No. In No. 4, the sealing temperature was the same as that of the example, but the water resistance was extremely poor, and the reliability of the insulation characteristics was low.

【0028】これら比較例についても実施例と同様にペ
ースト状に加工し、2枚のアルミナ板の間に塗布して3
80℃の温度で15分間加熱保持し、冷却後の封着状態
を観察した。その結果、比較例No.1,2,3,5の
試料では流動性が悪く、接着面が充分に濡れないため、
簡単に剥がれてしまった。比較例No.6,7,8の試
料は封着温度が390℃であるため、380℃の温度条
件では十分な接着強度は得られなかった。
Also in these comparative examples, similarly to the examples, they were processed into a paste and applied between two alumina plates to form a paste.
The mixture was heated and held at a temperature of 80 ° C. for 15 minutes, and the sealed state after cooling was observed. As a result, Comparative Example No. Since the fluidity of samples 1, 2, 3 and 5 is poor and the adhesive surface is not wet enough,
It came off easily. Comparative Example No. Since the sealing temperature of the samples 6, 7, and 8 was 390 ° C, sufficient adhesive strength could not be obtained under the temperature condition of 380 ° C.

【0029】なお、上記実施例では、アルミナセラミッ
クと熱膨張係数を整合するようにセラミックフィラーの
混合率を選択した例を示したが、これに限ることなく、
被封着物と熱膨張係数を近似できるように上記範囲内で
調整して使用できる。また、半導体セラミックパッケー
ジに限らず、低温での封着が要求される様々な用途に適
用可能である。特に本発明の低温封着用組成物は、絶縁
性に対する信頼性が高いので、半導体パッケージのほ
か、各種表示デバイスのパッケージやその他の電子部品
の封止にも好適する。
In the above embodiment, an example was shown in which the mixing ratio of the ceramic filler was selected so as to match the coefficient of thermal expansion with that of alumina ceramic, but the present invention is not limited to this.
It can be used by adjusting within the above range so that the coefficient of thermal expansion can be approximated to that of the adherend. Further, the present invention can be applied not only to semiconductor ceramic packages but also to various applications that require sealing at low temperatures. In particular, the low-temperature sealing composition of the present invention has high reliability with respect to insulation properties, and is therefore suitable for sealing various display device packages and other electronic components as well as semiconductor packages.

【0030】[0030]

【発明の効果】以上説明したように、本発明の低温封着
用組成物は、実質的にタリウムを含まないので、製造・
使用の各工程で粉塵の飛散防止などのための設備導入を
必要とせず、製品の取扱いも容易である。
As described above, the low-temperature sealing composition of the present invention contains substantially no thallium, so that
It is not necessary to install equipment to prevent dust scattering in each process of use, and the product is easy to handle.

【0031】また耐水性に優れているため絶縁特性に対
する信頼性が高く、380℃以下の低温での封着が可能
で、封着時の流動性にも優れているので、封着部に気泡
やリークを生ずることもない。したがって、高信頼性を
要求される電子部品などの封着に極めて好適するもので
ある。
Further, since it is excellent in water resistance, it has a high reliability with respect to insulation characteristics, can be sealed at a low temperature of 380 ° C. or less, and has excellent fluidity at the time of sealing. And no leaks will occur. Therefore, it is extremely suitable for sealing electronic components that require high reliability.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 質量百分率で、PbO 50〜75%,
PbF2 1〜20%,B2 3 6〜12%,TeO2
〜10%,ZnO 1〜5%,SiO2 0.5〜2%,
Al2 3 0.5〜2%,Bi2 3 0〜10%,から
なる組成を有するガラス粉末50〜90体積%と、低膨
脹セラミックフィラー粉末10〜50体積%からなるこ
とを特徴とする低温封着用組成物。
1. PbO 50-75% by mass percentage,
PbF 2 1 to 20%, B 2 O 3 6 to 12%, TeO 2 1
-10%, ZnO 1-5%, SiO 2 0.5-2%,
50 to 90% by volume of glass powder having a composition of 0.5 to 2% of Al 2 O 3 and 0 to 10% of Bi 2 O 3 and 10 to 50% by volume of low expansion ceramic filler powder. A composition for low-temperature sealing.
【請求項2】 前記低膨脹セラミックフィラー粉末が、
チタン酸鉛、β−ユークリプタイト、コージェライト、
ジルコンから選ばれる1種または2種以上であることを
特徴とする請求項1記載の低温封着用組成物。
2. The low expansion ceramic filler powder comprises:
Lead titanate, β-eucryptite, cordierite,
The low-temperature sealing composition according to claim 1, which is one kind or two or more kinds selected from zircon.
JP07081746A 1995-03-14 1995-03-14 Low temperature sealing composition Expired - Fee Related JP3125971B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP07081746A JP3125971B2 (en) 1995-03-14 1995-03-14 Low temperature sealing composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07081746A JP3125971B2 (en) 1995-03-14 1995-03-14 Low temperature sealing composition

Publications (2)

Publication Number Publication Date
JPH08253345A true JPH08253345A (en) 1996-10-01
JP3125971B2 JP3125971B2 (en) 2001-01-22

Family

ID=13755009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP07081746A Expired - Fee Related JP3125971B2 (en) 1995-03-14 1995-03-14 Low temperature sealing composition

Country Status (1)

Country Link
JP (1) JP3125971B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016108272A1 (en) * 2014-12-28 2016-07-07 日本山村硝子株式会社 Low-temperature sealing material
JP2019214494A (en) * 2018-06-13 2019-12-19 国立大学法人 鹿児島大学 Glass, glass paste, and manufacturing method of glass
CN112299720A (en) * 2020-11-16 2021-02-02 成都光明光电有限责任公司 Low temperature sealing glass

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6777358B2 (en) 2002-07-25 2004-08-17 Nortel Networks Limited Sealing glass composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016108272A1 (en) * 2014-12-28 2016-07-07 日本山村硝子株式会社 Low-temperature sealing material
JPWO2016108272A1 (en) * 2014-12-28 2017-10-05 日本山村硝子株式会社 Low temperature sealing material
JP2019214494A (en) * 2018-06-13 2019-12-19 国立大学法人 鹿児島大学 Glass, glass paste, and manufacturing method of glass
CN112299720A (en) * 2020-11-16 2021-02-02 成都光明光电有限责任公司 Low temperature sealing glass
CN112299720B (en) * 2020-11-16 2022-04-12 成都光明光电有限责任公司 Low temperature sealing glass

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