JPH08248222A - Color filter and color liquid crystal element - Google Patents

Abstract

PURPOSE: To obtain a color liquid crystal display element which is formed of thin films, has no pattern defects and has an excellent display grade by arranging plural color filter layers specified in the weight ratios of pigments dispersed and contained in resins and the resins apart spaced intervals from each other. CONSTITUTION: The weight ratio (P/V) of the pigments and resins of the color filter layers formed by dispersing and containing the pigments into the resins is set in a range of 1/3<=P/V<=3/2. Where, the weight of the pigments is defined as P and the weight of the resins as V. The color filters have color filter patterns arranged with the plural color filter layers apart spacings from each other and light shielding layers for shielding the light in the spacings between the adjacent color filter layers. The photosensitive resins for forming such color filters are arom. polyamide resins and polyimide resins which are capable of forming cured films at <=200 deg.C and have, for example, photosensitive groups within their molecules. The resins which have no specific light absorption characteristic in a visible light wavelength region of (400 to 700nm) are more particularly preferable.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a color filter,
And a color liquid crystal device having a color filter provided on the inner surface of the substrate, which displays by electro-optical change generated between a pair of substrates provided with a plurality of electrodes forming a unit of display element, more specifically, The present invention relates to a high-quality color liquid crystal device having excellent display quality without alignment defects by controlling the content ratio of the coloring material to the resin when using a color filter formed of a coloring resin.

[0002]

2. Description of the Related Art Conventionally, as a liquid crystal element as described above,
TN (Twisted) is used as an electro-optical modulation material between two substrates on which transparent electrodes are formed orthogonally on the upper and lower substrates.
nematic) A time-division drive type liquid crystal element (commonly referred to as a simple matrix system) having a structure in which a liquid crystal or a ferroelectric liquid crystal is sandwiched, or a switching element such as a thin film transistor (commonly called TFT) is provided for each display pixel. An active matrix drive type liquid crystal element having a structure (commonly called an active matrix system) is used.

In such a panel structure, in order to perform color display, it is necessary to dispose a transmission type color filter having red, green and blue colors on the liquid crystal element surface. In this case, in order to reduce the parallax when the color display element is obliquely viewed, the color filter is exclusively arranged inside the liquid crystal element.

Such a color liquid crystal element having a built-in color filter is usually formed by the following two methods.

That is, the first method is as shown in FIG.
As shown in (a), the pattern of the color filter 3 aligned with the electrode pattern is formed on the substrate 1 on which the pattern of the transparent electrode 2 is formed, the protective layer 4 is formed if necessary, and then the alignment film 5 is formed. A color liquid crystal element can be obtained by laminating, rubbing the alignment film 5, bonding it to a counter substrate, and injecting liquid crystal into a gap between the substrates.

As a second method, as shown in FIG. 4B, a color filter 3 is formed on a substrate 1, a protective layer 4 is formed if necessary, and then ITO [Indium Tin Oxide (Indium Tin Oxide) is used. Oxide)]
After forming a layer of the transparent electrode 2 such as by sputtering or vapor deposition and providing a photoresist pattern on the layer of the transparent electrode 2, the pattern of the transparent electrode 2 is formed by alignment with the color filter pattern by etching. Then, the photoresist pattern is removed, an alignment film 5 is further laminated, and after rubbing treatment, it is attached to a counter substrate and a liquid crystal is injected into a gap between the substrates to obtain a color liquid crystal element.

In each structure in which the color filter is arranged inside the liquid crystal element as described above, the influence of the surface of the color filter pattern, the state of the side surface shape, and the physical properties of the color filter itself on the liquid crystal element is greatly involved.

By the way, as a color filter, as a method advantageous in terms of process characteristics, a method characterized in that it is formed by using a coloring resin in which a coloring material is mixed with a photosensitive resin capable of fine patterning only by a photolithography process has been conventionally used. It has been known that in such a color filter, a coloring material is mixed in advance in the photosensitive resin, and the amount of the mixture mainly affects the behavior against photocuring and the characteristics of the colored resin film after formation. Was causing the problem.

For example, there is a problem of patterning accuracy such as film peeling due to poor photo-curing, pattern edge portion roughness, pattern surface roughness, and film cracks and cracks in the process after the color filter is formed. Defects in these color filters directly lead to alignment defects of the liquid crystal, and there is a drawback that a color liquid crystal device having poor display quality can be obtained.

[0010]

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and in a method of forming a color filter by a photolithography process of a photosensitive coloring resin which is advantageous in process characteristics, By controlling the ratio of the coloring material to be dispersed in the resin, it is possible to form a high-quality color filter that maintains the surface and side shapes of the color filter pattern in a good condition with a thin film and does not have pattern defects, and also has alignment defects. It is an object of the present invention to provide a color liquid crystal device having no display quality and excellent display quality.

[0011]

In order to achieve the above-mentioned object, the present inventors have focused on the weight ratio of the coloring material and the photosensitive resin constituting the photosensitive coloring resin used in forming the color filter. Then, by experiments, a color liquid crystal element having a color filter that does not cause alignment defects of the liquid crystal was found.

That is, in the present invention, a pigment is dispersed and contained in a resin, the weight of the pigment is P, and the weight of the resin is V.
And the weight ratio (P / V) is 1/3 ≦ P / V ≦ 3 /
A color filter pattern in which a plurality of color filter layers set in the range of 2 are arranged at intervals.
And a light-shielding layer that shields the gap between adjacent color filter layers.

In the present invention, a pair of substrates, a liquid crystal disposed between the pair of substrates, and a pigment are dispersed and contained in a resin, the weight of the pigment is P, and the weight of the resin is V. When the weight ratio (P / V) is set in the range of 1/3 ≦ P / V ≦ 3/2, a plurality of color filter layers are arranged at intervals and adjacent to each other. A light shielding layer that shields the space between the color filter layers,
A color liquid crystal device having an electrode provided on the color filter pattern and an alignment film provided on the electrode.

[0014]

BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below.
As the photosensitive resin used to form the color filter suitable for the present invention, it is possible to use an ordinary resist material, but especially mechanical properties when forming a color liquid crystal element, heat resistance, It is preferable to use the following materials which are excellent in various properties such as light resistance and solvent resistance.

That is, a cured film can be obtained at 200 ° C. or lower, for example, a cured film can be formed by heat at 150 ° C. for about 30 minutes, for example, an aromatic polyamide having a photosensitive group in its molecule. Resin and polyimide resin, especially
Those that do not have specific light absorption characteristics in the visible light wavelength range (400 to 700 nm) (light transmittance of about 90% or more)
Is preferred. From this viewpoint, an aromatic polyamide resin is particularly preferable.

Further, the photosensitive group in the present invention may be any aromatic chain having a photosensitive hydrocarbon unsaturated group as shown below, for example, (1) benzoic acid esters

[0017]

Embedded image

(Wherein R ₁ is CHX = CY-COO-Z
-, X is -H or _-C 6 _H 5, Y is -H or _-CH 3,
Z represents-or an ethyl group or a glycidyl group) (2) benzyl acrylates

[0019]

Embedded image

(Wherein Y represents —H or CH ₃ ) (3) Diphenyl ethers

[0021]

Embedded image

(Wherein R ₂ is CHX = CY-CONH
_{-, CH 2 = CY-COO-} (CH 2) 2 -OCO- or _{CH 2 = CY-COO-CH} 2 - which the containing one or more, X, Y represents the same group) (4) chalcone Chains of other compounds

[0023]

[Chemical 4]

(In the formula, R ₃ represents H-, an alkyl group or an alkoxy group)

[0025]

Embedded image

And the like.

Specific examples of aromatic polyamide resins and polyimide resins having these groups in the molecule are lysocoat PA-1000C (manufactured by Ube Industries Ltd.) and lithocoat PI-400 (Ube Industries Ltd. ) And the like.

Generally, photosensitive resins used in the photolithography process have excellent durability such as mechanical properties, heat resistance, light resistance, solvent resistance and the like, although there are differences depending on their chemical structures. On the other hand, the photosensitive polyamino resin such as the polyamide resin and the polyimide resin is a resin system excellent in their durability even in terms of chemical structure, and the durability of the color filter formed using them is also very high. It will be good.

The coloring material used for forming the color filter of the present invention is not particularly limited as long as it can obtain desired spectral characteristics among organic pigments and inorganic pigments. In this case, each material can be used alone or as a mixture of some of them, and an organic pigment is most preferable as a coloring material in view of the color characteristics and various performances of the color filter.

The organic pigments include azo pigments such as soluble azo pigments, insoluble azo pigments and condensed azo pigments, phthalocyanine pigments, and indigo pigments, anthraquinone pigments, perylene pigments, perinone pigments, dioxazine pigments, quinacridone pigments, A condensed polycyclic pigment containing an isoindolinone type, a phthalone type, a methine / azomethine type, other metal complex type, or a mixture of some of these is used.

In the present invention, the coloring resin used to form the color filter is the above-mentioned coloring material having the desired spectral characteristics in the above-mentioned photosensitive polyamino resin solution, the photosensitive resin amount being V (gr), and the coloring material. When P is the amount of P (gr), the P / V ratio is 1/3 ≦ P / V ≦ 3/2, and the mixture is sufficiently dispersed by ultrasonic waves or three rolls, ball mill, sand mill, etc. After that, a filter with a size of about 1 μm is used to remove those having a large particle size to prepare.

Here, 1/3 ≦ P / V specified in the present invention
Explaining specifically for ≦ 3/2, when the type and amount of the coloring material are set to obtain the desired spectral characteristics,
The value of the photosensitive resin amount V is set to a certain range by experiments, mainly from the viewpoint of forming the color filter or the viewpoint of occurrence of alignment defects in the liquid crystal.

That is, when P / V> 3/2, the amount of the coloring material becomes too large, and the following problems occur. It is difficult to prepare a uniformly dispersed colored resin, which causes large variations in color, and in particular, the roughness of the surface of the formed color filter becomes rough, which causes disorder of alignment with respect to liquid crystal.

Light absorption of the coloring material during photocuring becomes large, and photocuring failure of the photosensitive resin itself occurs, which leads to defects such as cracks, cracks, and film peeling during development, and induces disorder of alignment with respect to liquid crystal. .

Increased scattering by the coloring material during photocuring,
And since there are few binder components, color fill
The edge portion cannot be patterned properly and becomes jagged, which induces disorder of alignment with respect to the liquid crystal.

The film quality after formation of the color filter is also fragile because it contains a large amount of coloring material, which leads to defects such as cracks and cracks mainly due to spacers and the like during the formation of a liquid crystal element, and induces disorder of alignment with respect to liquid crystal. Problems such as
It is difficult to form a color liquid crystal element with excellent display quality.

On the other hand, when P / V <1/3, the resin content becomes too large and the following problems occur. That is, the film thickness of the color filter layer becomes thicker and the step difference between pixels becomes larger, which causes the disorder of the alignment with respect to the liquid crystal.

The thickness of the color filter layer becomes thicker,
Patterning of the photosensitive resin cannot be done cleanly. As a result, the disorder of the alignment with respect to the liquid crystal is induced from the disordered portion of the pattern.

The thickness of the color filter layer becomes thicker,
When forming a liquid crystal element, the amount of dents in the color filter layer due to the spacer also becomes large, making it difficult to maintain a uniform cell gap and causing cracks and breaks in the color filter from these dents, causing alignment disorder with respect to the liquid crystal. To do. As such, it is difficult to form a color liquid crystal element having excellent display quality even in these cases.

Each of the above-mentioned problems leads to alignment defects even if the color filter layer is covered with a protective film, a transparent electrode, an alignment film, etc., and the disorder of the alignment film on the surface in contact with the liquid crystal is retained. .

Therefore, in order to form a color liquid crystal element having excellent display quality, the P / V ratio is set within the range of 1 / 3≤P / V≤3 / 2 from the viewpoint of not disturbing the alignment of the liquid crystal. A color filter formed of the regulated photosensitive colored resin is required.

In the range of the P / V ratio specified in the present invention, the basic color characteristics, film thickness, performance, etc. of the color filter other than the viewpoint of the liquid crystal alignment are sufficiently satisfactory for practical use. Can be formed.

The color filter of the present invention is formed into a pattern by a photolithography process in which the above-mentioned colored resin is applied onto a substrate by a coating device such as a spinner or a roll coater, and its layer thickness is determined according to desired spectral characteristics. Although it is determined, it is usually about 0.5 to 5 μm, preferably 1 to 2
About μm is desirable.

Although the color filter of the present invention is composed of a good material having sufficient durability itself, in particular, in order to protect the color filter layer from various environmental conditions, Polyamide, polyimide, polyurethane, polycarbonate, silicon-based organic resin, Si ₃ N ₄ , SiO ₂ ,
An inorganic film of SiO, Al ₂ O ₃ , Ta ₂ O ₃ or the like can be provided as a protective layer by spin coating, roll coating, or vapor deposition. Further, after forming the protective layer, depending on the material, an alignment treatment may be performed to make it applicable to a device using liquid crystal.

The layer thickness of this protective layer is generally 0.2.
It is set in the range of 10 to 10 μm, preferably 0.5 to 5 μm.

When it is necessary to further increase the adhesiveness between the color filter layer and the underlying substrate, a color filter pattern may be formed after applying a thin coating of a silane coupling agent or the like on the substrate in advance. It is more effective to form a color filter by using a coloring resin containing a small amount of a silane coupling agent or the like.

In some cases, for the purpose of improving the display characteristics and filling the gaps between the pixels, a metal thin film having a light-shielding ability such as chromium or aluminum is formed by a vapor deposition method in accordance with each pixel. Alternatively, a light-shielding resin layer in which a material having a light-shielding ability such as carbon black, a complex oxide black pigment, and metal powder is dispersed in a photosensitive polyamino resin can be formed by a coating method.

Examples of the material of the alignment film used in the present invention include polyvinyl alcohol, polyimide, polyamide imide, polyester, polycarbonate, polyvinyl acetal, polyvinyl chloride, polyvinyl acetate,
Resins such as polyamide, polystyrene, cellulose resin, melamine resin, urea resin, acrylic resin, or photosensitive polyimide, photosensitive polyamide, cyclized rubber photoresist, phenol novolac photoresist or electron beam photoresist [methacrylate (monomer (monomer , Oligomer), epoxidized-1,4-polybutadiene, etc.] and the like.

As the liquid crystal material used in the present invention, in addition to general TN type liquid crystal, particularly suitable one is a liquid crystal having bistability, which has ferroelectricity, and specifically, chiral. Smectic C phase (SmC ^* ), H phase (SmH ^* ), I phase (SmI ^* ), J phase (SmJ ^* ),
K phase (SmK ^* ), G phase (SmG ^* ) or F phase (Sm
A liquid crystal of F ^* ) can be used.

Regarding this ferroelectric liquid crystal, "LE JOURNAL DE Fijique Rute"("LE JO
URNAL DE PHYSIQUE LETTRE
S ") 1975, No. 36 (L-69)," Ferroelectric Liquid Crystals "(" Ferro
electric Liquid Crystal
s ");" Applied Physics Letters "
("Applied Physics Letter
s ") 1980, No. 36 (11)," Submicro.
Second Bi-Stable Electro-Optic Switching In Liquid Crystals "(" Su
bmicro Second Bistble Ele
ctropic Switching in Li
"quid Crystals");"Solid State Physics" 198
1 year, 16 (141), "Liquid crystal" and the like, and the ferroelectric liquid crystal disclosed therein can be used in the present invention.

Specific examples of the ferroelectric liquid crystal include, for example, desiloxybenzylidene-p'-amino-2-methylbutylcinnamate (DOBAMBC), hexyloxybenzylidene-p'-amino-2-chloropropylcinnamate (HOBACPC). ), 4-o- (2-methyl)-
Butyl resorcylidene-4'-octylaniline (MB
RA8).

When a device is formed using these materials, the device may be supported by a block or the like in which a heater is embedded, if necessary, in order to maintain the temperature state in which the liquid crystal compound becomes a chiral smectic phase. it can.

A typical method for forming a color filter of the present invention will be described below with reference to the drawings. 1A to 1C are process diagrams illustrating a method for forming a color filter substrate of the present invention. First, as shown in FIG. 1A, a coloring material having a desired spectral characteristic is previously prepared to have a P / V ratio of 1/3 to 3/2.
Polyamino resin liquid (NMP
A colored resin film 7 of the first color is formed on a predetermined substrate 1 using a resin solution such as a solution) by an arbitrary coating method such as a spinner so as to have a predetermined film thickness, and is formed at an appropriate temperature. Pre-bake under conditions. Then, as shown in FIG. 1B, light having the sensitivity of the photosensitive resin (for example, ultraviolet rays from a high-pressure mercury lamp) is passed through a photomask 8 having a predetermined pattern shape corresponding to the pattern to be formed. The colored resin film is exposed to light to cure the pattern portion.

Then, as shown in FIG. 1 (c), the colored resin film 7 having the photo-cured portion 7a is used as a main component of a solvent (for example, N-methyl-2-pyrrolidone-based solvent) which dissolves only the unexposed portion. After developing with ultrasonic waves etc.,
A rinse treatment (for example, 1,1,1-trichloroethane or the like) is performed. Then, post-baking treatment is performed to form the patterned colored resin film 9 of the present invention as shown in FIG.
Can be obtained.

Further, if necessary, that is, depending on the number of colors of the color filters used, the arrangement shown in FIGS.
For the steps up to (d), P / V the coloring material corresponding to each color
Repeatedly using the colored resin liquids dispersed in the range of 1/3 to 3/2, for example, the patterned colored resin films 9 and 9a of different colors as shown in FIG. It is possible to form a color filter having three colors of 9b.

The color filter used in the present invention, as shown in FIG. 1 (f), has a protective layer 4 formed of the above-mentioned materials on the upper part of the filter. Good.

[0057]

EXAMPLES The present invention will be specifically described with reference to the following reference examples. In the text,% is based on weight.

Reference Example 1 On a glass substrate, a blue coloring resin material [Heliogen Blue (Helioge) capable of obtaining desired spectral characteristics is obtained.
n Blue) L7080 (trade name, manufactured by BASF Corporation,
C. I. No. 74160) was mixed with PA-1000C (trade name, manufactured by Ube Industries, Ltd., polymer content = 10%, solvent = N-methyl-2-pyrrolidone) at each P / V ratio shown in Table 1 below and dispersed. The prepared photosensitive colored resin material] was applied to each film thickness shown in Table 1 by a spinner coating method.

Next, the colored resin layer was prebaked at 70 ° C. for 30 minutes, and then exposed with a high pressure mercury lamp through a pattern mask corresponding to the pattern shape to be formed. After completion of the exposure, development is carried out using ultrasonic waves with a dedicated developing solution (developing solution containing N-methyl-2-pyrrolidone as a main component) which dissolves only the unexposed portion of the colored resin film, and After treatment with a rinse liquid containing 1,1,1-trichloroethane as a main component), post-baking was performed at 200 ° C. for 30 minutes to form a blue colored resin film having a pattern shape.

Subsequently, a green colored resin material [Lionol Green 6YK] was used as a second color on the glass substrate on which the blue colored pattern was formed.
(Product name, manufactured by Toyo Ink Co., CI No. 7426
5) PA-1000C (trade name, manufactured by Ube Industries, polymer content = 10%, solvent = N-methyl-2-pyrrolidone)
To a predetermined position on the glass substrate in the same manner as described above, except that a photosensitive colored resin material prepared by mixing and dispersing each P / V ratio shown in Table 1 below is used. Formed.

Further, as a third color, on the glass substrate on which the blue and green patterns are formed in this way,
Red colored resin material [Irgazin Red (Irgazin
Red) BPT (trade name, Ciba-Geigy (Ciba-
Geigy), C.I. I. No. 71127) to PA
-1000C (Brand name, Ube Industries, Polymer content = 1
0%, solvent = N-methyl-2-pyrrolidone) was mixed in the respective P / V ratios shown in the following Table 1 and dispersed to produce a photosensitive colored resin material] To form a red colored pattern at a predetermined position on the glass substrate,
A colored pattern of three color stripes of R (red), G (green) and B (blue) was obtained.

On the color filter pattern thus obtained, a transparent resin material [P
A-1000C (trade name, manufactured by Ube Industries, Ltd., polymer content =
10%, solvent = N-methyl-2-pyrrolidone)] was formed by a spinner coating method to a film thickness of about 0.5 μm.

Next, an ITO film having a thickness of 500Å was formed on the protective layer and the flattening layer by a sputtering method, aligned with a color filter pattern and patterned to obtain a transparent electrode pattern, on which an alignment film was formed. , Polyimide forming solution (Hitachi Chemical Industries "PIQ") 300
Apply with a spinner rotating at 0 rpm and apply 3 at 150 ° C.
Heating was performed for 0 minutes to form a 2000 Å polyimide film. Then, the surface of this polyimide coating film was rubbed. "CS-1014" (trade name) manufactured by Chisso Corporation, which is a ferroelectric liquid crystal, is formed by bonding the thus formed color filter substrate and the facing substrate to each other to form a cell group.
Was injected and sealed to obtain a color liquid crystal device of the present invention.

The obtained color liquid crystal element was observed with a crossed Nicols polarization microscope to evaluate the alignment defect state of the liquid crystal molecules inside. The results are shown in Table 1.

[0065]

[Table 1] (Note) ○: Good state with no alignment defects ×: State with alignment defects

Reference Example 2 A color liquid crystal device of the present invention using a thin film transistor was formed as follows. First, thin film transistor substrates were sequentially formed as shown in FIG. That is, as shown in FIG. 2A, an ITO pixel electrode 10 having a layer thickness of 1000 Å is formed into a desired pattern on a glass substrate (trade name: 7059, manufactured by Corning Incorporated) 1 by a photolithography process, and then this surface is formed. Further, Al was vacuum-deposited to a layer thickness of 1000 Å, and the deposited layer was patterned into a desired shape by a photolithography process to form a gate electrode 11 as shown in FIG. 2 (b).

Subsequently, a photosensitive polyimide resin (trade name:
(Semicofine, manufactured by Toray Industries, Inc.) is applied to the surface of the substrate 1 on which the electrodes are provided to form an insulating layer 13, and a through hole that forms a contact portion between the drain electrode 17 and the pixel electrode 10 by pattern exposure and development processing. Figure 12
It was formed as shown in (c).

Here, the substrate 1 is set at a predetermined position in the deposition tank, SiH ₄ diluted with H ₂ is introduced into the deposition tank, and the electrodes 10, 11 are formed in a vacuum by a glow discharge method.
And a photoconductive layer (intrinsic layer) 14 made of a-Si having a layer thickness of 2000 Å is deposited on the entire surface of the substrate 1 on which the insulating layer 13 is provided, and then the photoconductive layer 14 is continuously processed by the same operation. , N + layer 15 having a layer thickness of 1000 Å was laminated as shown in FIG. The substrate 1 was taken out of the deposition tank, and each of the n + layer 15 and the photoconductive layer 14 was patterned in this order into a desired shape by a dry etching method as shown in FIG. 2 (e).

Next, in this way, the photoconductive layers 14 and n are formed.
1000 Å of Al on the surface of the substrate on which the + layer 15 is provided
2 is vacuum-deposited to a desired thickness, and then this Al-deposited layer is patterned into a desired shape by a photolithography process.
Source electrode 16 and drain electrode 1 as shown in (f)
Formed 7.

Finally, as shown in FIG. 2 (g), a negative resist (eg, Tokyo Ohka ODUR) is formed on the entire surface of the substrate as a transparent insulating layer 13a, and a polyimide resin is applied to the entire surface to a thickness of 1200 Å. Then, it is heated and cured at 250 ° C. for 1 hour to form an alignment film 5b made of a polyimide resin layer, and then, the surface of the alignment film 5b of the polyimide resin layer is rubbed to have an alignment function of aligning liquid crystals. I was granted.

Thus, an electrode substrate (FIG. 2 (h)) made of a polyimide resin layer having an orientation function was formed.
Next, a color filter is used as a counter electrode substrate in Reference Example 1.
Was formed in the same manner as.

On the color filter pattern thus obtained, ITO was formed into a film having a thickness of 500 Å by a sputtering method to form a transparent electrode layer, and then a polyimide resin was applied to a thickness of 1200 Å and the temperature was set at 250 ° C. After heat-curing for a period of time to form a polyimide resin layer, the surface of the resin layer was rubbed to impart an orientation function to form a color filter substrate.

Then, this substrate and the substrate having the thin film transistor formed previously were opposed to each other and bonded to each other, and then TN type liquid crystal was injected into the gap and sealed to obtain a color liquid crystal element of the present invention. The alignment state of the obtained color liquid crystal element was similar to that of Reference Example 1.

Reference Example 3 A color liquid crystal device of the present invention was obtained in the same manner as in Reference Example 2 except that a three-color filter was provided on the electrodes of the counter substrate. The alignment state of the obtained color liquid crystal element was similar to that of Reference Example 1.

Reference Example 4 A three-color filter was provided on the thin film transistor substrate as shown in FIG. 3 instead of on the counter electrode substrate. That is, a thin film transistor substrate having a color filter was formed in the same manner as in Reference Example 2 except that the mosaic color filter pattern was formed on the pixel electrode pattern formed on the glass substrate. The substrate thus obtained and the counter electrode substrate were opposed to each other and bonded to each other, and TN type liquid crystal was injected and sealed in the gap to obtain a color liquid crystal element of the present invention. The alignment state of the obtained color liquid crystal element was similar to that of Reference Example 1.

[0076]

As described above, according to the present invention,
Ratio of the coloring material dispersed in the photosensitive resin, that is, P
By controlling the / V ratio within the range of 1/3 ≦ P / V ≦ 3/2, it is possible to obtain a color filter with a thin film with high precision and a clean surface and side surface shape, and further, to reduce defects. A uniform and stable color filter can be obtained. Therefore, by arranging such a high quality color filter inside the liquid crystal element,
It is possible to provide a color liquid crystal element having excellent display quality without alignment defects.

Further, according to the present invention, since a high-performance resin material and a coloring material are used, a color filter having a fine pattern, which is excellent in various characteristics, can be easily manufactured, and as a result, reliability is improved. A highly reliable color liquid crystal element can be provided.

[Brief description of drawings]

FIG. 1 is a process chart for explaining a method for forming a color filter substrate according to the present invention.

FIG. 2 is a process drawing for explaining a method for forming a thin film transistor substrate in a color liquid crystal device using a thin film transistor.

FIG. 3 is a perspective view of a thin film transistor substrate having a color filter according to Reference Example 4 of the present invention.

FIG. 4 is a schematic cross-sectional view of a color filter substrate used in a conventional color liquid crystal device.

[Explanation of symbols]

 1, S Substrate 2 Transparent electrode 3 Color filter 4 Protective layer 5, 5b Alignment film 7 Colored resin film 7a Photo-cured part 8 Photomask 9, 9a, 9b Patterned colored resin film 10, 24a, 24b, 24c, 24d Pixel electrode 11, 21a, 21b, 21c, 21d gate electrode 12 through hole 13, 13a insulating layer 14 photoconductive layer 15 n + layer 16, 23a, 23b source electrode 17 drain electrode 21aa, 21bb gate line 22a, 22b, 22c, 22d thin film transistor

 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Tatsuo Murata 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Inc. (72) Inventor Nobuyuki Sekimura 3-30-2 Shimomaruko, Ota-ku, Tokyo Canon Within the corporation

Claims (12)

[Claims] 1. A weight ratio (P / V) in which a pigment is dispersed and contained in a resin, where P is the weight of the pigment and V is the weight of the resin, 1/3 ≦ P / V ≦ A color filter having a color filter pattern formed by arranging a plurality of color filter layers set in a range of 3/2 at intervals, and a light shielding layer for shielding the space between adjacent color filter layers from light. 2. The color filter according to claim 1, wherein the light shielding layer is a layer containing a metal. 3. The color filter according to claim 1, wherein the light shielding layer is a layer containing carbon black, a black pigment or a metal dispersed therein. 4. The color filter according to claim 1, wherein the resin is a photosensitive resin. 5. The color filter according to claim 4, wherein the photosensitive resin is a resin having an aromatic polyamide resin or an aromatic polyimide resin having a photosensitive group bonded in the molecule. 6. The color filter according to claim 1, wherein a protective layer is provided on the color filter pattern. 7. A weight in which a pair of substrates, a liquid crystal disposed between the pair of substrates, and a pigment are dispersed and contained in a resin, where the weight of the pigment is P and the weight of the resin is V. A color filter pattern in which a plurality of color filter layers having a ratio (P / V) set within a range of 1/3 ≦ P / V ≦ 3/2 are arranged at intervals, and adjacent color filter layers. A color liquid crystal device having a light-shielding layer that shields the space between the electrodes, an electrode provided on the color filter pattern, and an alignment film provided on the electrode. 8. The color liquid crystal device according to claim 7, wherein the light shielding layer is a layer containing a metal. 9. The color liquid crystal element according to claim 7, wherein the light shielding layer is a layer containing carbon black, a black pigment or a metal dispersed therein. 10. The resin according to claim 7, which is a photosensitive resin.
The described color liquid crystal device. 11. The color liquid crystal device according to claim 10, wherein the photosensitive resin is a resin having an aromatic polyamide resin or an aromatic polyimide resin in which a photosensitive group is bonded in the molecule. 12. The color liquid crystal device according to claim 7, wherein a protective layer is provided on the color filter pattern.